KR950007604A

KR950007604A - Method of manufacturing a thin film (EL) display device

Info

Publication number: KR950007604A
Application number: KR1019930016585A
Authority: KR
Inventors: 윤태용
Original assignee: 이헌조; 주식회사 금성사
Priority date: 1993-08-25
Filing date: 1993-08-25
Publication date: 1995-03-21

Abstract

본 발명은 EL 표시자의 제조방법에 관한 것으로 소비전력을 감소시키고 고정화하기 위한 것이다.The present invention relates to a method for manufacturing an EL indicator, and to reduce and fix power consumption.

종래에는 투명전극을 사용하였다. 따라서 금속전극과 투명전극의 전기 전도도의 차이로 인하여 소비전력이 많았다.In the past, a transparent electrode was used. Therefore, the power consumption was high due to the difference in electrical conductivity between the metal electrode and the transparent electrode.

본 발명은 투명전극 대신 금속전극을 사용한 것으로 투명기판(1) 위에 화소영역은 복수개의 섭라인을 갖는 금속전극(11)을 형성하는 공정과, 전면에 제 1절연층(3)과 발광층(4), 제 2절연층(5)을 차례로 형성하는 공정과, 제 2절연층(5) 위에 금속전극(11)과 수직방향으로 금속전극(11)의 섭라인 영역에서 교차되도록 배면전극(6)을 형성하는 공정으로 이루어진다.According to the present invention, a metal electrode is used instead of a transparent electrode. A process of forming a metal electrode 11 having a plurality of sublines in a pixel region on a transparent substrate 1, and a first insulating layer 3 and a light emitting layer 4 on the front surface ), And forming a second insulating layer (5) in sequence, and the back electrode (6) on the second insulating layer (5) so as to intersect in the sub-line region of the metal electrode 11 in a vertical direction with the metal electrode (11) It is made of a process of forming.

Description

Manufacturing method of thin film EL display element

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 2도는 본 발명의 EL 표시소자의 구조 단면도,2 is a structural cross-sectional view of the EL display element of the present invention;

제 3도는 본 발명의 EL 표시소자의 구조 평면도.3 is a plan view of the structure of the EL display element of the present invention.

Claims

The pixel region is formed on the transparent substrate 1 in the process of forming a metal electrode 11 having a plurality of sublines, followed by the first insulating layer 3, the light emitting layer 4, and the second insulating layer 5 on the front surface. And forming a back electrode 6 on the second insulating layer 5 so that the metal electrode 11 intersects in the sub-line region in a vertical direction with the metal electrode 11. A method of manufacturing a thin film EL display element.

The method of manufacturing a thin film EL display device according to claim 1, wherein the sub-line line width of the metal electrode is 11-13 μm and the line spacing is 13-17 μm.

※ Note: The disclosure is based on the initial application.