KR950006745A - Manufacturing method of information recording medium - Google Patents

Manufacturing method of information recording medium Download PDF

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Publication number
KR950006745A
KR950006745A KR1019930016974A KR930016974A KR950006745A KR 950006745 A KR950006745 A KR 950006745A KR 1019930016974 A KR1019930016974 A KR 1019930016974A KR 930016974 A KR930016974 A KR 930016974A KR 950006745 A KR950006745 A KR 950006745A
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KR
South Korea
Prior art keywords
layer
depositing
dielectric layer
photoresist
manufacturing
Prior art date
Application number
KR1019930016974A
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Korean (ko)
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KR950007298B1 (en
Inventor
김광수
Original Assignee
배순훈
대우전자 주식회사
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Priority to KR1019930016974A priority Critical patent/KR950007298B1/en
Publication of KR950006745A publication Critical patent/KR950006745A/en
Application granted granted Critical
Publication of KR950007298B1 publication Critical patent/KR950007298B1/en

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers

Abstract

본 발명은 정보기록매체의 제조방법에 관한 것으로, 기판상에 하부유전체층을 증착하고, 상기 하부유전체층에 기록층을 증착하며, 상기 기록층에는 상부유전체층을, 상부 유전체층에는 반사층을 증착 형성하고, 상기 반사층에는 자외선 경화수지를 코팅하여 보호층을 형성하는 통상의 정보기록 매체의 제조방법에서 상기 기판상에 하부유전체층을 증착하기 전에 마스크층을 증착하는 공정과, 상기 마스크층에 포토레지스터를 도포하고, 상기 포토레지스터를 노광 및 현상처리 한후, 습식에칭하고, 세척 건조하여 빔 조사공을 형성하는 공정을 첨가하므로서 기판과 기록층사이에 광픽업장치에서 조사된 레이저빔스폿의 조사위치와 조사범위를 제어하는 마스크층을 형성한 것이다.The present invention relates to a method of manufacturing an information recording medium, comprising depositing a lower dielectric layer on a substrate, depositing a recording layer on the lower dielectric layer, depositing an upper dielectric layer on the recording layer, and a reflective layer on the upper dielectric layer, In the method of manufacturing a conventional information recording medium in which a protective layer is coated on a reflective layer to form a protective layer, a process of depositing a mask layer before depositing a lower dielectric layer on the substrate, and applying a photoresist to the mask layer, After exposing and developing the photoresist, wet etching, washing and drying to form beam irradiation holes are added to control the irradiation position and irradiation range of the laser beam spot irradiated from the optical pickup apparatus between the substrate and the recording layer. The mask layer is formed.

(제2도)(Figure 2)

Description

정보기록매체의 제조방법Manufacturing method of information recording medium

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명에 따른 정보기록매체의 제조방법의 공정도,2 is a flowchart of a method of manufacturing an information recording medium according to the present invention;

제3도는 본 발명의 다른실시예에 따른 정보기록매체의 제조방법의 공정도,3 is a flowchart of a method of manufacturing an information recording medium according to another embodiment of the present invention;

제4도는 제2도의 제조공정에 의하여 제조된 정보기록매체의 종단면도.4 is a longitudinal sectional view of an information recording medium manufactured by the manufacturing process of FIG.

Claims (2)

기판 상에 마스크층을 증착하는 공정과, 상기 마스크층에 패턴형성을 위해 포토레지스터를 도포하고, 상기 포토레지스터를 노광 및 현상처리한 다음 습식에 칭하고, 세척 및 건조하여 빔조사공을 형성하는 공정과, 이와 같이 빔조사공이 형성된 마스크층에 하부유전체층을 증착하는 공정과, 상기 하부유전체층에 기록층을 증착하는 공정과, 기록층위에 상부유전체층을 증착하는 공정과, 상부 유전체층에 반사층을 증착하는 공정과 상기 반사층에 자외선 경화수지를 도포하여 보호층을 형성하는 공정으로 이루어진 것을 특징으로 하는 정보기록매체의 제조방법.A process of depositing a mask layer on a substrate, applying a photoresist to the mask layer for pattern formation, exposing and developing the photoresist, and then wetting, washing and drying to form beam irradiation holes And depositing a lower dielectric layer on the mask layer on which the beam irradiation holes are formed, depositing a recording layer on the lower dielectric layer, depositing an upper dielectric layer on the recording layer, and depositing a reflective layer on the upper dielectric layer. And applying a UV curable resin to the reflective layer to form a protective layer. 제1항에 있어서, 마스크층을 증착하는 공정과, 상기 마스크층에 패턴형성을 위해 포터레지스터를 도포하고, 상기 포토레지스터를 노광 및 현상처리한 다음 습식 에칭하고, 세척 및 건조하여 빔조사공을 형성하는 공정을 하부유전체층 증착공정과 기록층 증착공정사이에서 행하는 것을 특징으로 하는 정보기록매체의 제조방법.The method of claim 1, further comprising depositing a mask layer, applying a port register to the mask layer for pattern formation, exposing and developing the photoresist, wet etching, cleaning, and drying the beam irradiation hole. A method of manufacturing an information recording medium, characterized in that the forming step is performed between the lower dielectric layer deposition process and the recording layer deposition process. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019930016974A 1993-08-30 1993-08-30 Production method of information recording medium KR950007298B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019930016974A KR950007298B1 (en) 1993-08-30 1993-08-30 Production method of information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930016974A KR950007298B1 (en) 1993-08-30 1993-08-30 Production method of information recording medium

Publications (2)

Publication Number Publication Date
KR950006745A true KR950006745A (en) 1995-03-21
KR950007298B1 KR950007298B1 (en) 1995-07-07

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

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KR (1) KR950007298B1 (en)

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Publication number Publication date
KR950007298B1 (en) 1995-07-07

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