KR950006647Y1 - Lamp on/off monitoring apparatus of exposing machine - Google Patents

Lamp on/off monitoring apparatus of exposing machine Download PDF

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Publication number
KR950006647Y1
KR950006647Y1 KR92014216U KR920014216U KR950006647Y1 KR 950006647 Y1 KR950006647 Y1 KR 950006647Y1 KR 92014216 U KR92014216 U KR 92014216U KR 920014216 U KR920014216 U KR 920014216U KR 950006647 Y1 KR950006647 Y1 KR 950006647Y1
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South Korea
Prior art keywords
lamp
quot
state
semiconductor exposure
turned
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KR92014216U
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Korean (ko)
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KR940004334U (en
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김병규
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문정환
금성일렉트론 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

내용 없음.No content.

Description

반도체 노광장비의 램프「온/오프」모니터링 장치Lamp ON / OFF monitoring device for semiconductor exposure equipment

제 1 도는 일반적인 반도체 노광장비의 개략적인 구조를 보인 계통도1 is a schematic diagram showing a schematic structure of a general semiconductor exposure equipment.

제 2 도 및 제 3 도는 본 고안 램프「온/오프」모니터링 장치를 설명하기 위한 도면으로서, 제 2 도는 본 고안장치의 구조 및 설치위치를 보인 사시도2 and 3 are views for explaining the "on / off" monitoring device of the subject innovation lamp, Figure 2 is a perspective view showing the structure and the installation position of the subject innovation device

제 3 도는 본 고안 장치의 작동 회로도3 is an operating circuit diagram of the device of the present invention

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

16 : 램프 하우징 2 : LED16: lamp housing 2: LED

40 : 부저(Buzzer) 50 : 램프「온/오프」모니터수단40: Buzzer 50: Lamp ON / OFF monitoring means

본 고안은 반도체 노광장치, 예컨대 수은램프(Lamp)에서 방사된 빛을 소정의 경로로 전달하여 웨이퍼(Wafer)표면에 마스크(Mask)의 일정패턴을 노광(Expose)시키는 스테퍼(Stepper)에 있어서, 수은랜프의 「온/오프」상태를 작업자에게 알려주기 위한 장치에 관한 것으로, 특히 램프의 「온/오프」상태에 따라 점멸하는 엘이디(이하 "LED"라 총칭함)와 램프「오프」시 경보하는 부저(Buzzer)를 가지는 램프 「온/오프」모니터수단을 구비하여 수은램프의 「온/오프」상태를 작업자기 용이하게 알 수 있도록 한 반도체 노광장비의 램프「온/오프」모니터링 장치에 관한 것이다.The present invention is in a stepper for exposing a predetermined pattern of the mask (Mask) on the surface of the wafer by transferring the light emitted from the semiconductor exposure apparatus, for example, a mercury lamp in a predetermined path, Apparatus for informing the operator of the "on / off" status of mercury lamps, especially LEDs flashing according to the "on / off" status of the lamp (hereinafter collectively referred to as "LED") and alarms when the lamp is "off" A lamp " on / off " monitoring device for semiconductor exposure equipment provided with a lamp " on / off " monitor means having a buzzer to enable an operator to easily know the " on / off " state of a mercury lamp. will be.

통상, 반도체 제조공정중 단위공정을 행함에 있어서는 웨이퍼 표면에 마스크의 일정패턴을 노광시키는 익스포우즈 공정을 행하게 되는데, 이러한 공정에 사용되는 장비가 반도체 노광장비, 예컨대 스테퍼이다.Usually, in performing a unit process in a semiconductor manufacturing process, the exposure process which exposes a predetermined pattern of a mask on the wafer surface is performed, The equipment used for this process is a semiconductor exposure apparatus, for example, a stepper.

상기와 같은 반도체 노광장비는 광원부에서 방사된 빛을 소정의 경로로 전달하여 웨이퍼 척 위에 장착된 웨이퍼에 마스크이 일정패턴을 익스포으즈 시킴으로써 웨이퍼에 일정한 패턴을 형성하는 작용을 하게 되는 바, 이를 첨부도면에 의거하여 보다 상세히 설명하면 다음과 같다.The semiconductor exposure apparatus as described above transmits the light emitted from the light source unit through a predetermined path to form a predetermined pattern on the wafer by exposing a predetermined pattern on the wafer mounted on the wafer chuck. In more detail based on the following.

즉, 일반적인 반도체 노광장비는 제 1 도에 도시한 바와 같이, 장비본체(1)의 상부에 설치된 광원부의 수은램프(2)로부터 빛이 방사되고, 이 빛은 제 1 반사미러(spherical mirror)(3)와 제 1A1미러(4)를 거쳐 아큐이트 슬릿(arcuate slit)(5)을 통과하면서 불량한 빛이 차단된 양질의 일정한 빛상태로 제 2 A1미러(6)에 입사되며, 이와같이 입사된 빛은 바로 반사되어 제 2 반사미러(7)와 제 3, 제 4 A1미러(8)(9) 및 제 3 반사미러(10)를 가지는 광학부를 통해 포토마스크(11)를 입사된다. 포토마스크(11)로 입사된 빛은 마스크(11)의 패턴형태를 가지고 사다리꼴미러(12)의 제 1 반사면(12a), 요면경(Concave mirror)(13), 철면경(Convex)(14)다시 요면경(13) 및 사다리꼴 미러(12)의 제 2 반사면(12b)의 경로로 웨이퍼(15)의 표면에 입사되어 마스크(11)의 일정패턴을 웨이퍼(15)에 노광시키는 작용을 하게 되는 것이다.That is, in the general semiconductor exposure apparatus, as shown in FIG. 1, light is emitted from the mercury lamp 2 of the light source unit installed on the upper part of the apparatus body 1, and the light is emitted from the first spherical mirror ( 3) and the first A1 mirror (4) passes through the accumulate slit (5) and enters the second A1 mirror (6) in a high quality constant light condition in which bad light is blocked. Is directly reflected and enters the photomask 11 through the optical unit having the second and second mirrors 7, 3, 4 A1 mirrors 8 and 9 and the third reflecting mirror 10. The light incident on the photomask 11 has a pattern of the mask 11 and has a first reflective surface 12a of the trapezoidal mirror 12, a concave mirror 13, and a convex 14. The surface of the wafer 15 is incident on the surface of the wafer 15 by the path of the second mirror surface 12b of the concave mirror 13 and the trapezoidal mirror 12 to expose a predetermined pattern of the mask 11 to the wafer 15. .

한편, 상기한 광원부의 수은램프(2)는 소정형상의 램프 하우징(16)에 의해 에워싸여 밀폐되어 있는데, 이 램프 하우징(16)은 램프(2)의 과열로 인한 폭발을 방지하기 위해 일측에 연결된 턱트호스(Duct Hose)(17)로 하우징(16) 내부의 뜨거운 공기를 배기시킴으로써 램프 하우징(16)을 냉각시키도록 되어있다. 즉, 턱트호스 (17)가 고온의 공기를 뽑아내면서 경화되어 파손되면, 램프 하우징(16)의 온도가 올라가게 되고, 온도감지센서(도시되지 않음)에 의해 램프(2)가 「오프」되게 되어 있는 것이다,Meanwhile, the mercury lamp 2 of the light source unit is enclosed and sealed by a lamp housing 16 having a predetermined shape, and the lamp housing 16 is disposed at one side to prevent explosion due to overheating of the lamp 2. The lamp housing 16 is cooled by exhausting hot air inside the housing 16 with a connected Duct Hose 17. In other words, when the duct hose 17 is hardened while taking out the hot air, the temperature of the lamp housing 16 is increased, and the lamp 2 is turned off by a temperature sensor (not shown). That is,

도면중 미설명 부호 18 은 램프(2)의 후방으로 방사된 빛을 전방으로 반사시키는 반사경, 19 는 빛을 선택적으로 차단하는 셔터(Shutter), 20 은 웨이퍼 스테이지를 전, 후 및 좌, 우로 이동시켜 촛점을 맞추기 위한 캐리지(Carrige), 21 은 마스크와 웨이퍼의 패턴을 검사하는 현미경 스코프(Scope)를 각각 보인 것이며, 가는 일정쇄선으로 도시한 것은 빛의 전달 및 전송경로를 보이고 있는 것이다.In the drawing, reference numeral 18 denotes a reflector for reflecting the light radiated to the rear of the lamp 2 in front, 19 a shutter for selectively blocking the light, 20 moves the wafer stage before, after, left, and right. The carriage, 21, shows a microscope scope for inspecting the mask and the pattern of the wafer, and the thin line shows the transmission and transmission path of light.

그러나, 상기한 바와 같은 일반적인 반도체 노광장비에 있어서는, 상기한 과정으로 램프(2)가 「오프」되어도 이를 알려주는 장치가 설치되어 있지 않아 작업자는 계속작업을 하게 된다. 즉, 일반적인 반도체 노광장비는 램프 하우징(16)의 과열로 인한 램프(2)「오프」시, 또는 순간 정전 발생으로 인한 램프(2)시 이에 대한 경보를 하는 장치가 없으므로 램프(2)가 「오프」된 상태에서 작업을 계속 진행하는 경우가 다발하고 있었으며, 이에따라 장비의 에러발생 및 제품의 품질이 저하되는 문제가 있었다.However, in the above-described general semiconductor exposure equipment, even if the lamp 2 is "off" in the above-described process, no device is provided to inform the operator of the operation. That is, the general semiconductor exposure equipment has no device for alarming when the lamp 2 "off" due to overheating of the lamp housing 16 or when the lamp 2 due to the instantaneous power failure occurs. There were many cases where the work was continued in the "off" state, and accordingly, there was a problem that the error of the equipment and the quality of the product were deteriorated.

이를 감안하여 안출한 본 고안의 목적은 수은램프의 「온/오프」상태를 작업자가 용이하게 알 수 있도록 한 반도체 노광장비의 램프「온/오프」모니터링 장치를 제공함에 있다.In view of this, an object of the present invention is to provide a lamp " on / off " monitoring device for semiconductor exposure equipment that allows an operator to easily know the " on / off " state of a mercury lamp.

상기와 같은 본 고안의 목적을 달성하기 위하여, 반도체 노광장비에 있어서, 수은램프가 수납된 램프 하우징의 일측에 상기 수은램프의 「온/오프」상태에 따라 점멸하는 LED와, 램프「오프」시 경보7음을 발생하는 부저를 가지는 램프「온/오프」모니터수단을 설치하여 램프「온/오프」상태를 용이하게 알 수 있도록 한 반도체 노광장비의 램프「온/오프」모니터링 장치가 제공된다.In order to achieve the object of the present invention as described above, in the semiconductor exposure equipment, LED blinking in accordance with the "on / off" state of the mercury lamp on one side of the lamp housing in which the mercury lamp is accommodated, and the lamp "off" A lamp " on / off " monitoring device for a semiconductor exposure apparatus provided with a lamp " on / off " monitor means having a buzzer for generating an alarm sound 7 can be easily known.

이와같이 된 본 고안에 의한 반도체 노광장비의 램프「온/오프」모니터링 장치에 의하면, 작업도중 램프의 작업도중 램프의 「온/오프」상태를 용이하게 알 수 있으므로 종래와 같이 램프가 「오프」된 상태에서 「오프」된 상태에서 작업을 진행하는 일을 방지할 수 있고, 장비의 신속한 조치가 가능하게 되므로 장비의 가동율을 향상시킬 수 있을 뿐만 아니라 품질을 보다 높일 수 있다는 등의 효과가 있다.According to the lamp " on / off " monitoring device of the semiconductor exposure apparatus according to the present invention, it is possible to easily know the " on / off " state of the lamp during the operation of the lamp during the operation. It is possible to prevent the work to proceed in the "off" state in the state, and the rapid action of the equipment can be not only to improve the operation rate of the equipment, but also to increase the quality.

이하, 상기한 바와 같은 본 고안에 의한 반도체 노광장비의 램프「온/오프」모니터링 장치를 첨부도면에 도시한 실시예를 따라서 보다 상세히 설명한다.Hereinafter, a lamp " on / off " monitoring device for a semiconductor exposure apparatus according to the present invention as described above will be described in more detail with reference to the embodiment shown in the accompanying drawings.

제 2 도는 본 고안에 의한 램프「온/오프」모니터링 장치의 구성을 보인 사시도이고, 제 3 도는 제 2 도에 도시한 본 고안 장치의 작동 회로도로서 이에 도시한 바와 같이, 본 고안에 의한 반도체 노광장비의 램프「온/오프」모니터링 장치는 수은램프(도시되지 않음)가 수납된 램프 하우징(16)의 외부일측에 수은램프의「온/오프」상태에 따라 점멸하는 LED(30)와 램프「오프」시 경보음을 발하는 부저(40)를 가지는 램프「온/오프」모니터수단(50)을 설치하여 외부에서 램프의 「온/오프」상태를 쉽게 알 수 있도록 구성한 것이다.FIG. 2 is a perspective view showing the configuration of a lamp " on / off " monitoring device according to the present invention, and FIG. 3 is an operation circuit diagram of the device according to the present invention shown in FIG. The lamp "on / off" monitoring device of the equipment includes an LED 30 and a lamp that blink on the outer side of the lamp housing 16 in which the mercury lamp (not shown) is stored according to the "on / off" state of the mercury lamp. The lamp " on / off " monitor means 50 having a buzzer 40 which emits an alarm sound at the time of off is provided so that the " on / off " state of the lamp can be easily known from the outside.

즉, 본 고안 장치는 램프가 턴온(Turn On)되었을 경우는 LED(30)가 점등되고, 반대로 램프가 턴오프되었을 경우는 LED(30)가 소등됨과 함께 부저(40)에서 경보음이 울리도록 구성되어 작업중 램프의 「온/오프」상태를 보다 쉽게 확인할 수 있도록 되어 있는바, 이러한 본 고안에 의한 램프「온/오프」모니터링 장치의 작용을 제 3 도의 작동회로도를 참조하여 보다 상세히 살펴보면 다음과 같다.That is, the device of the present invention is that the LED 30 is turned on when the lamp is turned on, and when the lamp is turned off, the LED 30 is turned off and the buzzer 40 sounds. It is configured to make it easier to check the "on / off" state of the lamp during operation. Looking at the operation of the lamp "on / off" monitoring device according to the present invention in more detail with reference to the operation circuit diagram of FIG. same.

먼저, 램프 오프시에는 포토 티알(Q1)이 「오프」상태가 되면서 LED(30)는 소등되고, 디씨 5V의 전압이 걸려 티알(Q2)이 「온」되어 제 1 릴레이(R0) 및 제 1 컨택트(C0)가 「온」됨과 아울러 푸시버튼(PB)은 노멀 클로우즈(Normal Closed)상태이므로 제 2 릴레이(R1) 및 제 2, 제 3 컨택트(C1-1)(C1-2)가 「온」되어 부저(40)가 「온」되면서 경보음을 발생하게 된다. 이후, 리세트 스위치를 누르게 되면, 제 2 릴레이(R1)제 2 릴레이(R1) 및 제 2, 제 3 컨택트(C1-1)(C1-2)가 「오프」되면서 부저(40)는 「오프」되어 경보음이 그치게 된다.First, when the lamp is turned off, the LED 30 is turned off while the photoelectric Q 1 is turned “off”, and a voltage of 5 V is applied so that the titanium Q 2 is turned “on” so that the first relay R 0 is turned off. And since the first contact C 0 is turned on and the push button PB is in a normally closed state, the second relay R 1 and the second and third contacts C 1-1 (C 1 ). 1-2 ) is "on" and the buzzer 40 is "on" and generates an alarm sound. Subsequently, when the reset switch is pressed, the second relay R 1 , the second relay R 1 , and the second and third contacts C 1-1 and C 1-2 are “off” while the buzzer 40 is turned off. ) Is "off" and the alarm sound stops.

한편, 램프 온시에는 포토 티알(Q1)이 「온」되면서 LED(30)는 점등되고, 저전위가 걸리게 됨으로써 티알(Q2)은 「오프」상태가 유지되므로 부저(40)「오프」상태가 유지되는 것이다.On the other hand, when the lamp is turned on, the LED 30 is turned on while the photo thial Q 1 is turned on, and the low potential is applied, so that the thial Q 2 is kept in the "off" state, so that the buzzer 40 is in the "off" state. Will be maintained.

이상에서 상세히 설명한 바와 같이, 본 고안에 의한 반도체 노광장비의 램프「온/오프」모니터링 장치는 램프 하우징에 램프의 「온/오프」상태를 모니터하기 위한 LED와 부저를 설치하여 외부에서 램프의 「온/오프」상태를 쉽게 알 수 있도록 구성한 것으로, 이와같이 된 본 고안 장치에 의하면, 작업도중 램프의 「온/오프」상태를 쉽게 알 수 있으므로 종래와 같이 램프가 「오프」된 상태에서 작업을 진행하는 오류를 방지할 수 있고, 장비의 신속한 조치가 가능하게 되므로 장비의 가동율을 향상시킬 수 있을 뿐만 아니라 제품의 품질을 보다 높일 수 있게 되는 등의 효과가 있다.As described in detail above, the lamp " on / off " monitoring device for semiconductor exposure equipment according to the present invention is provided with an LED and a buzzer for monitoring the " on / off " state of the lamp in the lamp housing. It is configured so that the on / off state can be easily understood. According to the device of the present invention, the “on / off” state of the lamp can be easily seen during the operation. Therefore, the work is performed while the lamp is “off” as in the prior art. This can prevent errors, and the rapid action of the equipment can not only improve the operation rate of the equipment, but also improve the quality of the product.

Claims (1)

반도체 노광장비에 있어서, 수은램프가 수납된 램프 하우징(16)의 외부 일측에 상기 램프의 「온/오프」상태에 따라 점멸하는 LED(30)와 램프「오프」시 경보음을 발하는 부저(40)를 가지는 램프「온/오프」모니터수단(50)을 설치하여, 램프의 「온/오프」상태를 쉽게 알 수 있도록 한 것을 특징으로 하는 반도체 노광장비의 램프「온/오프」모니터링 장치.In the semiconductor exposure apparatus, an LED 30 flashing according to the "on / off" state of the lamp and a buzzer 40 which emits an alarm sound when the lamp is "off" on an external side of the lamp housing 16 in which the mercury lamp is stored. A lamp " on / off " monitoring device for semiconductor exposure equipment, characterized by providing a lamp " on / off "
KR92014216U 1992-07-30 1992-07-30 Lamp on/off monitoring apparatus of exposing machine KR950006647Y1 (en)

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