KR950004474U - 전극간격 외장 측정기가 부착된 반도체 식각장비 - Google Patents

전극간격 외장 측정기가 부착된 반도체 식각장비

Info

Publication number
KR950004474U
KR950004474U KR2019930012659U KR930012659U KR950004474U KR 950004474 U KR950004474 U KR 950004474U KR 2019930012659 U KR2019930012659 U KR 2019930012659U KR 930012659 U KR930012659 U KR 930012659U KR 950004474 U KR950004474 U KR 950004474U
Authority
KR
South Korea
Prior art keywords
measuring instrument
external electrode
electrode gap
etching equipment
gap measuring
Prior art date
Application number
KR2019930012659U
Other languages
English (en)
Other versions
KR960009902Y1 (ko
Inventor
소순종
김종선
정철원
김영선
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR2019930012659U priority Critical patent/KR960009902Y1/ko
Publication of KR950004474U publication Critical patent/KR950004474U/ko
Application granted granted Critical
Publication of KR960009902Y1 publication Critical patent/KR960009902Y1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019930012659U 1993-07-09 1993-07-09 전극간격 외장 측정기가 부착된 반도체 식각장비 KR960009902Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930012659U KR960009902Y1 (ko) 1993-07-09 1993-07-09 전극간격 외장 측정기가 부착된 반도체 식각장비

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930012659U KR960009902Y1 (ko) 1993-07-09 1993-07-09 전극간격 외장 측정기가 부착된 반도체 식각장비

Publications (2)

Publication Number Publication Date
KR950004474U true KR950004474U (ko) 1995-02-18
KR960009902Y1 KR960009902Y1 (ko) 1996-11-18

Family

ID=19358814

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930012659U KR960009902Y1 (ko) 1993-07-09 1993-07-09 전극간격 외장 측정기가 부착된 반도체 식각장비

Country Status (1)

Country Link
KR (1) KR960009902Y1 (ko)

Also Published As

Publication number Publication date
KR960009902Y1 (ko) 1996-11-18

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