KR950002136A - 면 발광형 제 2 고조파 생성소자 - Google Patents
면 발광형 제 2 고조파 생성소자 Download PDFInfo
- Publication number
- KR950002136A KR950002136A KR1019940014928A KR19940014928A KR950002136A KR 950002136 A KR950002136 A KR 950002136A KR 1019940014928 A KR1019940014928 A KR 1019940014928A KR 19940014928 A KR19940014928 A KR 19940014928A KR 950002136 A KR950002136 A KR 950002136A
- Authority
- KR
- South Korea
- Prior art keywords
- harmonic
- superlattice
- layer
- generating element
- phase matching
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18341—Intra-cavity contacts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/355—Non-linear optics characterised by the materials used
- G02F1/3556—Semiconductor materials, e.g. quantum wells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/37—Non-linear optics for second-harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18355—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a defined polarisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0207—Substrates having a special shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0604—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising a non-linear region, e.g. generating harmonics of the laser frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0604—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising a non-linear region, e.g. generating harmonics of the laser frequency
- H01S5/0605—Self doubling, e.g. lasing and frequency doubling by the same active medium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3202—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/327—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Plasma & Fusion (AREA)
- Led Devices (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
본 발명은 상온에서 고효율이고 고출력의 제2고조파를 발생할 수 있고, 또한 소형, 저에너지소비, 저제조 코스트의 면 발광형 제2고조파 생성 소자를 제공하기 위한 것이다. 공진기 내의 반도체 결정의 〈100〉이 광사 방향과 5°이상의 각을 이루는 경우(특히 〈111〉,〈211〉,〈110〉중의 어떤 것이 광사 방향과 거의 일치하는 경우)에는, 제2고조파가 효율좋게 생성되고, 또한, 광사측 반사경(10)과 스페이서층(6) 사이에, Ⅲ-Ⅴ 또는 Ⅱ-Ⅵ족계 화합물 반도체로 되는 제2고조파 발생부(9)를 형성하면 제2고조파를 보다 고효율로 생성할 수 있고, 또한, 스페이서층(6)을 초격자에 의해 형성하는 것도 가능하고, 활성층(6) 및 스페이서층(4),(6)을 초격자에 의해 형성할 수도 있으며, 스페이서층이나 활성층에 위상 정합층으로서의 작용을 갖게 하는 것에 의해 고효율의 제2고조파를 생성할 수도 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 제2고조파 생성소자의 일 실시예를 도시한 것으로서, 소자전체를 도시한 단면설명도, 제2도는 1도에 있어서 a부의 각 층의 단면 설명도, 제3도는 본 발명에 따른 제2고조파 생성소자의 다른 실시예를 도시한 각층의 단면설명도, 제4도는 본 발명의 작용을 설명하기 위한, 비선형계수로 되는 행렬 및 기판의 방향을 도시한 도면, 제5도는 본 발명의 작용을 설명하기 위한, 비선형계수로 되는 행렬 및 기판의 방향을 도시한 도면.
Claims (7)
- Ⅲ-Ⅴ족계 또는 Ⅱ-Ⅵ족계 화합물 반도체 결정으로 이루어지는 활성층과, 상기 활성층의 양측에 형성된 스페이서층과, 양 스페이서층의 활성층과는 반대측에 위치하게 형성되고, 한쪽이 제2고조파를 소정율로 투과시키는 한 쌍의 반사경을 공진기로서 갖게 되는 면 발광형 제2고조파 생성 소자로서, 상기 공진기 내의 반도체 결정의 〈100〉방위가 방사 방향과 5°이상의 각도를 이루는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
- 제1항에 있어서, 상기 공진기내의 반도체 결정의 〈111〉,〈211〉,〈110〉방위중의 어떤것이 광사출방향과 거의 일치하는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
- 제1항 또는 제2항에 있어서, 상기 제2고조파를 투과시키는 반사경과 상기 반사경쪽에 위치하는 스페이서층 사이에, Ⅲ-Ⅴ족계 또는 Ⅱ-Ⅵ족계 화합물 반도체 로 이루어지는 위상정합층이 형성되어 있는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
- 제1항 내지 제3항중의 어느 한 항에 있어서, 상기 위상정합층이 상기 공진기내의 반도체 결정과 동일한 방위를 갖는 초격자에 의해 구성되며 상기 초격자가 실효적으로 비선형 계수의 크기를 변조할 수 있는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
- 제1항 내지 제3항중의 어느 한 항에 있어서, 상기 위상정합층이 초격자에 의해 구성되며 상기 초격자가 비선형 계수의 부호를 반전시킬 수 있는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
- 제1항 내지 제5항 중의 어느 한 항에 있어서, 제2고조파 출력단에 마련된 스페이서층이 위상정합층으로서도 작용하는 초격자에 의해 이루어지는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
- 제1항 내지 제5항중의 어느 한 항에 있어서, 활성층 및 스페이서층이 위상정합층으로서도 작용하는 초격자에 의해 형성되는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP93-186877 | 1993-06-30 | ||
JP5186877A JPH0730181A (ja) | 1993-06-30 | 1993-06-30 | 面発光型第2高調波生成素子 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950002136A true KR950002136A (ko) | 1995-01-04 |
Family
ID=16196250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940014928A KR950002136A (ko) | 1993-06-30 | 1994-06-28 | 면 발광형 제 2 고조파 생성소자 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0632553B1 (ko) |
JP (1) | JPH0730181A (ko) |
KR (1) | KR950002136A (ko) |
DE (1) | DE69402120T2 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69610567T2 (de) * | 1995-01-20 | 2001-05-31 | Matsushita Electric Ind Co Ltd | Lichtemittierende Halbleitervorrichtung und Herstellungsverfahren |
US7502393B2 (en) | 2004-12-02 | 2009-03-10 | Canon Kabushiki Kaisha | Light-emitting device having resonator and light source unit including the light-emitting device |
JP2007165562A (ja) | 2005-12-13 | 2007-06-28 | Seiko Epson Corp | 光源装置、および光源装置を備えたプロジェクタ |
US8891158B2 (en) * | 2013-03-15 | 2014-11-18 | Northrup Grumman Systems Corporation | Distributed thermal system for nonlinear optical frequency conversion |
US10218146B2 (en) * | 2013-10-25 | 2019-02-26 | Atla Lasers As | Laser crystal |
DE102021116391A1 (de) | 2021-06-24 | 2022-12-29 | Universität Stuttgart, Körperschaft Des Öffentlichen Rechts | Strahlungsfeldbereitstellungsvorrichtung |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63280484A (ja) * | 1987-05-12 | 1988-11-17 | Matsushita Electric Ind Co Ltd | 半導体装置 |
US5051617A (en) * | 1990-06-29 | 1991-09-24 | National Research Council Canada | Multilayer semiconductor waveguide device for sum frequency generation from contra-propagating beams |
JP2721436B2 (ja) * | 1990-11-07 | 1998-03-04 | 沖電気工業株式会社 | 第2高調波発生装置 |
JP2751656B2 (ja) * | 1991-03-29 | 1998-05-18 | 日本電気株式会社 | 面発光型光第二高調波素子 |
JPH04307524A (ja) * | 1991-04-04 | 1992-10-29 | Seiko Epson Corp | 第二高調波発生装置 |
JP3244529B2 (ja) * | 1992-04-16 | 2002-01-07 | アジレント・テクノロジーズ・インク | 面発光型第2高調波生成素子 |
-
1993
- 1993-06-30 JP JP5186877A patent/JPH0730181A/ja active Pending
-
1994
- 1994-06-17 EP EP94304409A patent/EP0632553B1/en not_active Expired - Lifetime
- 1994-06-17 DE DE69402120T patent/DE69402120T2/de not_active Expired - Fee Related
- 1994-06-28 KR KR1019940014928A patent/KR950002136A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP0632553B1 (en) | 1997-03-19 |
EP0632553A3 (ko) | 1995-01-25 |
DE69402120T2 (de) | 1997-06-26 |
JPH0730181A (ja) | 1995-01-31 |
EP0632553A2 (en) | 1995-01-04 |
DE69402120D1 (de) | 1997-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR930022639A (ko) | 면발광형 제2고조파 생성소자 | |
JP4747841B2 (ja) | 波長変換レーザ装置および画像表示装置 | |
JP3013121B2 (ja) | 光波長変換装置 | |
JP2005521910A (ja) | 非被覆ブリュースタ表面を用いてキャビティ内共振を増強した第4高調波の生成 | |
KR950002136A (ko) | 면 발광형 제 2 고조파 생성소자 | |
US20060120415A1 (en) | Blue laser beam oscillating method and system | |
KR980006669A (ko) | 레이저 광 발생장치 | |
US5422903A (en) | Surface emitting second harmonic generating device | |
KR100863199B1 (ko) | 고조파 빔 발생용 레이저 장치 및 방법 | |
JP2004295088A (ja) | 波長変換素子 | |
JP4719918B2 (ja) | レーザー光の波長変換法 | |
KR950012951A (ko) | 반도체 레이저 장치 | |
JP3163566B2 (ja) | 2次高調波発生デバイス | |
JPS61184890A (ja) | 光学双安定装置 | |
KR960032066A (ko) | 제2고조파 발생 장치 | |
JP4862960B2 (ja) | 波長変換レーザ装置および画像表示装置 | |
KR950010329A (ko) | 제2고조파 발생 장치 | |
JPH0714666U (ja) | 固体レーザ装置 | |
SU1602322A1 (ru) | Кольцевой лазер | |
JPH1195269A (ja) | レーザ光発生装置 | |
KR970002421A (ko) | 제2고조파 발생장치 | |
JPS60101518A (ja) | 音響光学装置 | |
KR940009711A (ko) | 광변환장치 | |
JP2738155B2 (ja) | 導波路型波長変換素子 | |
JPH09197456A (ja) | 紫外線用光学部品および波長変換素子ならびに紫外線光源 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |