KR950002136A - 면 발광형 제 2 고조파 생성소자 - Google Patents

면 발광형 제 2 고조파 생성소자 Download PDF

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KR950002136A
KR950002136A KR1019940014928A KR19940014928A KR950002136A KR 950002136 A KR950002136 A KR 950002136A KR 1019940014928 A KR1019940014928 A KR 1019940014928A KR 19940014928 A KR19940014928 A KR 19940014928A KR 950002136 A KR950002136 A KR 950002136A
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harmonic
superlattice
layer
generating element
phase matching
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노리히데 야마다
요시카쯔 이찌무라
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쟈크 에이.레넬
휴렛트 팩카드 캄파니
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Publication of KR950002136A publication Critical patent/KR950002136A/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18341Intra-cavity contacts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/355Non-linear optics characterised by the materials used
    • G02F1/3556Semiconductor materials, e.g. quantum wells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/37Non-linear optics for second-harmonic generation
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    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18355Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a defined polarisation
    • HELECTRICITY
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    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109Frequency multiplication, e.g. harmonic generation
    • HELECTRICITY
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    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0206Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/0207Substrates having a special shape
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    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0604Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising a non-linear region, e.g. generating harmonics of the laser frequency
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    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0604Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising a non-linear region, e.g. generating harmonics of the laser frequency
    • H01S5/0605Self doubling, e.g. lasing and frequency doubling by the same active medium
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    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
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    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3202Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth
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    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/327Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser

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Abstract

본 발명은 상온에서 고효율이고 고출력의 제2고조파를 발생할 수 있고, 또한 소형, 저에너지소비, 저제조 코스트의 면 발광형 제2고조파 생성 소자를 제공하기 위한 것이다. 공진기 내의 반도체 결정의 〈100〉이 광사 방향과 5°이상의 각을 이루는 경우(특히 〈111〉,〈211〉,〈110〉중의 어떤 것이 광사 방향과 거의 일치하는 경우)에는, 제2고조파가 효율좋게 생성되고, 또한, 광사측 반사경(10)과 스페이서층(6) 사이에, Ⅲ-Ⅴ 또는 Ⅱ-Ⅵ족계 화합물 반도체로 되는 제2고조파 발생부(9)를 형성하면 제2고조파를 보다 고효율로 생성할 수 있고, 또한, 스페이서층(6)을 초격자에 의해 형성하는 것도 가능하고, 활성층(6) 및 스페이서층(4),(6)을 초격자에 의해 형성할 수도 있으며, 스페이서층이나 활성층에 위상 정합층으로서의 작용을 갖게 하는 것에 의해 고효율의 제2고조파를 생성할 수도 있다.

Description

면 발광형 제2고조파 생성소자
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 제2고조파 생성소자의 일 실시예를 도시한 것으로서, 소자전체를 도시한 단면설명도, 제2도는 1도에 있어서 a부의 각 층의 단면 설명도, 제3도는 본 발명에 따른 제2고조파 생성소자의 다른 실시예를 도시한 각층의 단면설명도, 제4도는 본 발명의 작용을 설명하기 위한, 비선형계수로 되는 행렬 및 기판의 방향을 도시한 도면, 제5도는 본 발명의 작용을 설명하기 위한, 비선형계수로 되는 행렬 및 기판의 방향을 도시한 도면.

Claims (7)

  1. Ⅲ-Ⅴ족계 또는 Ⅱ-Ⅵ족계 화합물 반도체 결정으로 이루어지는 활성층과, 상기 활성층의 양측에 형성된 스페이서층과, 양 스페이서층의 활성층과는 반대측에 위치하게 형성되고, 한쪽이 제2고조파를 소정율로 투과시키는 한 쌍의 반사경을 공진기로서 갖게 되는 면 발광형 제2고조파 생성 소자로서, 상기 공진기 내의 반도체 결정의 〈100〉방위가 방사 방향과 5°이상의 각도를 이루는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
  2. 제1항에 있어서, 상기 공진기내의 반도체 결정의 〈111〉,〈211〉,〈110〉방위중의 어떤것이 광사출방향과 거의 일치하는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
  3. 제1항 또는 제2항에 있어서, 상기 제2고조파를 투과시키는 반사경과 상기 반사경쪽에 위치하는 스페이서층 사이에, Ⅲ-Ⅴ족계 또는 Ⅱ-Ⅵ족계 화합물 반도체 로 이루어지는 위상정합층이 형성되어 있는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
  4. 제1항 내지 제3항중의 어느 한 항에 있어서, 상기 위상정합층이 상기 공진기내의 반도체 결정과 동일한 방위를 갖는 초격자에 의해 구성되며 상기 초격자가 실효적으로 비선형 계수의 크기를 변조할 수 있는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
  5. 제1항 내지 제3항중의 어느 한 항에 있어서, 상기 위상정합층이 초격자에 의해 구성되며 상기 초격자가 비선형 계수의 부호를 반전시킬 수 있는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
  6. 제1항 내지 제5항 중의 어느 한 항에 있어서, 제2고조파 출력단에 마련된 스페이서층이 위상정합층으로서도 작용하는 초격자에 의해 이루어지는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
  7. 제1항 내지 제5항중의 어느 한 항에 있어서, 활성층 및 스페이서층이 위상정합층으로서도 작용하는 초격자에 의해 형성되는 것을 특징으로 하는 면 발광형 제2고조파 생성 소자.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940014928A 1993-06-30 1994-06-28 면 발광형 제 2 고조파 생성소자 KR950002136A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-186877 1993-06-30
JP5186877A JPH0730181A (ja) 1993-06-30 1993-06-30 面発光型第2高調波生成素子

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KR950002136A true KR950002136A (ko) 1995-01-04

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DE69610567T2 (de) * 1995-01-20 2001-05-31 Matsushita Electric Ind Co Ltd Lichtemittierende Halbleitervorrichtung und Herstellungsverfahren
US7502393B2 (en) 2004-12-02 2009-03-10 Canon Kabushiki Kaisha Light-emitting device having resonator and light source unit including the light-emitting device
JP2007165562A (ja) 2005-12-13 2007-06-28 Seiko Epson Corp 光源装置、および光源装置を備えたプロジェクタ
US8891158B2 (en) * 2013-03-15 2014-11-18 Northrup Grumman Systems Corporation Distributed thermal system for nonlinear optical frequency conversion
US10218146B2 (en) * 2013-10-25 2019-02-26 Atla Lasers As Laser crystal
DE102021116391A1 (de) 2021-06-24 2022-12-29 Universität Stuttgart, Körperschaft Des Öffentlichen Rechts Strahlungsfeldbereitstellungsvorrichtung

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JPS63280484A (ja) * 1987-05-12 1988-11-17 Matsushita Electric Ind Co Ltd 半導体装置
US5051617A (en) * 1990-06-29 1991-09-24 National Research Council Canada Multilayer semiconductor waveguide device for sum frequency generation from contra-propagating beams
JP2721436B2 (ja) * 1990-11-07 1998-03-04 沖電気工業株式会社 第2高調波発生装置
JP2751656B2 (ja) * 1991-03-29 1998-05-18 日本電気株式会社 面発光型光第二高調波素子
JPH04307524A (ja) * 1991-04-04 1992-10-29 Seiko Epson Corp 第二高調波発生装置
JP3244529B2 (ja) * 1992-04-16 2002-01-07 アジレント・テクノロジーズ・インク 面発光型第2高調波生成素子

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EP0632553B1 (en) 1997-03-19
EP0632553A3 (ko) 1995-01-25
DE69402120T2 (de) 1997-06-26
JPH0730181A (ja) 1995-01-31
EP0632553A2 (en) 1995-01-04
DE69402120D1 (de) 1997-04-24

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