KR940017857U - 스퍼터링 장치 - Google Patents
스퍼터링 장치Info
- Publication number
- KR940017857U KR940017857U KR2019920027751U KR920027751U KR940017857U KR 940017857 U KR940017857 U KR 940017857U KR 2019920027751 U KR2019920027751 U KR 2019920027751U KR 920027751 U KR920027751 U KR 920027751U KR 940017857 U KR940017857 U KR 940017857U
- Authority
- KR
- South Korea
- Prior art keywords
- sputtering device
- sputtering
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019920027751U KR0131335Y1 (ko) | 1992-12-30 | 1992-12-30 | 스퍼터링 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019920027751U KR0131335Y1 (ko) | 1992-12-30 | 1992-12-30 | 스퍼터링 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940017857U true KR940017857U (ko) | 1994-07-28 |
KR0131335Y1 KR0131335Y1 (ko) | 1999-02-01 |
Family
ID=19348883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019920027751U KR0131335Y1 (ko) | 1992-12-30 | 1992-12-30 | 스퍼터링 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0131335Y1 (ko) |
-
1992
- 1992-12-30 KR KR2019920027751U patent/KR0131335Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0131335Y1 (ko) | 1999-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20070809 Year of fee payment: 10 |
|
EXPY | Expiration of term |