KR940014917A - Tin Plating Method by Pulse Current - Google Patents

Tin Plating Method by Pulse Current Download PDF

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Publication number
KR940014917A
KR940014917A KR1019920023036A KR920023036A KR940014917A KR 940014917 A KR940014917 A KR 940014917A KR 1019920023036 A KR1019920023036 A KR 1019920023036A KR 920023036 A KR920023036 A KR 920023036A KR 940014917 A KR940014917 A KR 940014917A
Authority
KR
South Korea
Prior art keywords
tin plating
tin
pulse current
plating method
soda
Prior art date
Application number
KR1019920023036A
Other languages
Korean (ko)
Other versions
KR950004236B1 (en
Inventor
김창하
Original Assignee
이해욱
한국전기통신공사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이해욱, 한국전기통신공사 filed Critical 이해욱
Priority to KR1019920023036A priority Critical patent/KR950004236B1/en
Publication of KR940014917A publication Critical patent/KR940014917A/en
Application granted granted Critical
Publication of KR950004236B1 publication Critical patent/KR950004236B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

주석산 소다 90g/L, 가성소다 7.5g/L아세트산 소다 15g/L를 함유한 주석소다 도금욕에 상용스프링 인청동을 침지시킨후, 15mA/cm2의 전류밀도로서 주석을 도금할때, 펄스주기를 20 내지 40msec로 하고 듀티사이클을 10 내지 40%로 하여 주석표면의 경도를 최대로 하는 펄스전류에 의한 주석도금방법.Tartaric acid in soda 90g / L, sodium hydroxide 7.5g / L sodium acetate, soda tin plating bath containing 15g / L was immersed a commercially available spring phosphor bronze, plated with tin to a current density of 15mA / cm 2, the pulse period A tin plating method using a pulse current that maximizes the hardness of the tin surface by setting 20 to 40 msec and a duty cycle of 10 to 40%.

Description

펄스전류에 의한 주석도금방법Tin Plating Method by Pulse Current

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 듀티사이클과 펄스주기에 따른 표면경도를 나타내는 그래프.1 is a graph showing surface hardness according to duty cycle and pulse period.

Claims (1)

주석산 소다90g/L, 가성소다 7.5g/L아세트산 소다 15g/L를 함유한 소다욕에 상승스프링 인청동을 침지시켜 평균전류밀도 15mA/cm2로 가하여 펄스전류에 의하여 주석을 도금하는 방법에 있어서, 펄스주기는 20 내지 40msec로 듀티사이클은 10 내지 40%로 하는 것을 특징으로 하는 펄스전류에 의한 주석도금방법.In the tartrate soda 90g / L, sodium hydroxide 7.5g / L sodium acetate method by immersing the 15g / L rising spring phosphor bronze in a bath containing soda was added at an average current density of 15mA / cm 2 coated with tin by the pulse current, The tin plating method according to the pulse current, characterized in that the pulse period is 20 to 40msec and the duty cycle is 10 to 40%. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920023036A 1992-12-02 1992-12-02 Method for coating a tin by the pulse current KR950004236B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920023036A KR950004236B1 (en) 1992-12-02 1992-12-02 Method for coating a tin by the pulse current

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920023036A KR950004236B1 (en) 1992-12-02 1992-12-02 Method for coating a tin by the pulse current

Publications (2)

Publication Number Publication Date
KR940014917A true KR940014917A (en) 1994-07-19
KR950004236B1 KR950004236B1 (en) 1995-04-27

Family

ID=19344492

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920023036A KR950004236B1 (en) 1992-12-02 1992-12-02 Method for coating a tin by the pulse current

Country Status (1)

Country Link
KR (1) KR950004236B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5750017A (en) * 1996-08-21 1998-05-12 Lucent Technologies Inc. Tin electroplating process

Also Published As

Publication number Publication date
KR950004236B1 (en) 1995-04-27

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