KR940002606A - Method for manufacturing sensing film of thin film gas sensor - Google Patents

Method for manufacturing sensing film of thin film gas sensor Download PDF

Info

Publication number
KR940002606A
KR940002606A KR1019920013734A KR920013734A KR940002606A KR 940002606 A KR940002606 A KR 940002606A KR 1019920013734 A KR1019920013734 A KR 1019920013734A KR 920013734 A KR920013734 A KR 920013734A KR 940002606 A KR940002606 A KR 940002606A
Authority
KR
South Korea
Prior art keywords
film
sensing film
thin film
substrate
gas sensor
Prior art date
Application number
KR1019920013734A
Other languages
Korean (ko)
Other versions
KR950009013B1 (en
Inventor
신현우
Original Assignee
이헌조
주식회사 금성사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이헌조, 주식회사 금성사 filed Critical 이헌조
Priority to KR1019920013734A priority Critical patent/KR950009013B1/en
Publication of KR940002606A publication Critical patent/KR940002606A/en
Application granted granted Critical
Publication of KR950009013B1 publication Critical patent/KR950009013B1/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Abstract

본 발명은 박막센서의 감지막 제조방법에 관한 것으로서, 특히 스퍼터링방법을 이용항 챔버내의 히터로서 기판의 온도를 상승시켜서 감지막을 성장시킬 수 있게 함으로 별도의 열처리 없이도 감도가 양호하고 동작온도가 안정된 신뢰도가 높은 박막센서를 제조하고자 한것에 목적을 둔것이다.The present invention relates to a method for manufacturing a sensing film of a thin film sensor, and in particular, by using a sputtering method to increase the temperature of a substrate as a heater in a chamber, the sensing film can be grown, so that the sensitivity is good and the operating temperature is stable without a separate heat treatment. The purpose is to manufacture high-quality thin film sensors.

상기와 같은 목적을 가진 본 발명은 기판위에 증착한 감지막에 타게트로서 Sn02또는 Pt, Pd, Au를 스퍼터링시킬 수 있게 한 것을 특징으로 한다.The present invention having the above object is characterized in that it is possible to sputter Sn0 2 or Pt, Pd, Au as a target on the sensing film deposited on the substrate.

Description

박막 가스센서의 감지막 제조방법Method for manufacturing sensing film of thin film gas sensor

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 일반적인 산화주석 반도체 가스센서 구조도.1 is a structure of a typical tin oxide semiconductor gas sensor.

제2도는 본 발명의 박막 가스센서의 감지막 제조공정도.2 is a manufacturing process of the sensing film of the thin film gas sensor of the present invention.

제3도는 본 발명의 히터로서 열처리하는 스프터링장치의 구성도.3 is a block diagram of a sputtering apparatus for heat treatment as a heater of the present invention.

제4도는 본 발명의 열처리온도에 따른 감도특성도.4 is a sensitivity characteristic according to the heat treatment temperature of the present invention.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

1 : 기판 2 : SiO2 1 substrate 2 SiO 2

3 : NiFe히터 4 : 절연막3: NiFe heater 4: insulating film

5 : Au 전극 6 : SnO2감지막5 Au electrode 6 SnO 2 detection film

Claims (2)

기판(1) 위에 SiO2층(2)과 NiFe히터(3)와 절연막(4) 및 Au전극(5)을 증착한 다음, 상기 기판(1)을 스퍼터링장치 내의 히터(H)에 취부한 다음, 순수한 SnO2또는 SnO2에 Pt, Au, Pd가 한 종류 이상 포함된 타게트를 이용하여 고주파 마그네트론 스퍼터링하여서 감지막을 형성하여 제조함을 특징으로 하는 박막 가스센서의 감지막 제조방법.After depositing a SiO 2 layer (2), a NiFe heater (3), an insulating film (4), and an Au electrode (5) on the substrate (1), the substrate (1) was mounted on a heater (H) in a sputtering apparatus. And manufacturing a sensing film by forming a sensing film by sputtering high frequency magnetron using a target containing at least one of Pt, Au, and Pd in pure SnO 2 or SnO 2 . 제1항에 있어서, 시터의 온도를 증가시켜 시터에 취부된 기판의 온도를 250℃∼750℃까지 변화시키고 스퍼터링 9w/㎝로 하며 혼합가스는 Ar 25Sccm, O25Sccm, 압력은 10mtorr로 하여서 감지막을 형성하여 제조함을 특징으로 하는 박막 가스센서의 감지막 제조방법.According to claim 1, the temperature of the sheet is increased by changing the temperature of the substrate mounted on the sheet from 250 ℃ to 750 ℃, sputtering 9w / cm and the mixed gas is Ar 25 Sccm, O 2 5 Sccm, pressure is sensed by 10 mtorr Method for manufacturing a sensing film of a thin film gas sensor, characterized in that the film is formed by forming. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920013734A 1992-07-31 1992-07-31 Sensing layer manufacturing method of gas sensor KR950009013B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920013734A KR950009013B1 (en) 1992-07-31 1992-07-31 Sensing layer manufacturing method of gas sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920013734A KR950009013B1 (en) 1992-07-31 1992-07-31 Sensing layer manufacturing method of gas sensor

Publications (2)

Publication Number Publication Date
KR940002606A true KR940002606A (en) 1994-02-17
KR950009013B1 KR950009013B1 (en) 1995-08-10

Family

ID=19337291

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920013734A KR950009013B1 (en) 1992-07-31 1992-07-31 Sensing layer manufacturing method of gas sensor

Country Status (1)

Country Link
KR (1) KR950009013B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210123596A (en) * 2020-04-03 2021-10-14 한국전자기술연구원 A flexible gas sensor and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210123596A (en) * 2020-04-03 2021-10-14 한국전자기술연구원 A flexible gas sensor and its manufacturing method

Also Published As

Publication number Publication date
KR950009013B1 (en) 1995-08-10

Similar Documents

Publication Publication Date Title
Ogita et al. Ga2O3 thin films for high-temperature gas sensors
JP4099252B2 (en) Method for depositing metal oxide layer on substrate by sputtering induction and optical working layer system
JP2002042582A (en) Manufacturing method of substrate with transparent conductive film, and the substrate manufactured by the method, and touch panel using the substrate
KR940002606A (en) Method for manufacturing sensing film of thin film gas sensor
KR970077672A (en) Method for producing a tantalum oxide thin film layer with increased dielectric properties and capacitor using the layer
EP0374005B1 (en) Method of producing a sensor for detecting gas, und sensor therefor
JP3166290B2 (en) Gas sensor
KR950006452A (en) Manufacturing Method of Thin Film Gas Sensor
KR950020822A (en) Piezoelectric Digital Touch Panel
JPH06213853A (en) Manufacture of gas detecting element
KR960002673A (en) Metal thin film formation method of a semiconductor device
JPH04273050A (en) Gas sensor
KR950020952A (en) Piezoelectric Analytical Touch Panel
JPS6054724B2 (en) Temperature sensor and its manufacturing method
JP2646246B2 (en) Method for producing gas-sensitive membrane element
JPH07198648A (en) Gas detecting film and manufacture thereof
JPS5947845B2 (en) Transparent conductive film manufacturing method
KR950019720A (en) Thin film gas sensor and manufacturing method
JPH0236549A (en) Thin film device
KR900004690B1 (en) Co gas sensor
JP2622144B2 (en) Method for producing gas-sensitive thin film
JPS62188222A (en) Manufacture of semiconductor compound
JPS5670448A (en) Oxygen sensor
JPS6030893B2 (en) How to manufacture the sensor
JP3000726B2 (en) Gas sensor

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20050607

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee