KR930017227A - Sound absorption coating method of elastic surface wave - Google Patents

Sound absorption coating method of elastic surface wave Download PDF

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Publication number
KR930017227A
KR930017227A KR1019920001443A KR920001443A KR930017227A KR 930017227 A KR930017227 A KR 930017227A KR 1019920001443 A KR1019920001443 A KR 1019920001443A KR 920001443 A KR920001443 A KR 920001443A KR 930017227 A KR930017227 A KR 930017227A
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KR
South Korea
Prior art keywords
photoresist
sound absorbing
absorbing agent
elastic surface
pattern
Prior art date
Application number
KR1019920001443A
Other languages
Korean (ko)
Inventor
고용태
Original Assignee
황선두
삼성전기 주식회사
Filing date
Publication date
Application filed by 황선두, 삼성전기 주식회사 filed Critical 황선두
Publication of KR930017227A publication Critical patent/KR930017227A/en

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Abstract

본 발명은 탄성표면파소자의 칩 가장자리쪽으로 탄성표면파 에너지가 전달되는 것을 방지하기 위하여 IDT전극의 외부에 흡음제를 도포하는 방법에 관한 것으로,IDT전극(2)의 패턴이 형성된 기판(1)상에 소정의 두께로 포토레지스터(4)를 도포하고 흡음제가 도포되어야 할 소정의 위치에 사진식각법으로 포토레지스트(4)의 패턴을 형성하고, 웨이피상에 스크린인쇄방법으로 흡음제(3)를 소정의 두께로 도포한 후 큐어링한 후, 포토레지스트(4)를 제거하는 단계들을 포함한다.The present invention relates to a method of applying a sound absorbing agent to the outside of the IDT electrode in order to prevent the surface acoustic wave energy from being transferred toward the chip edge of the surface acoustic wave device, and is provided on the substrate 1 on which the pattern of the IDT electrode 2 is formed. The photoresist 4 is applied to a predetermined thickness to form a pattern of the photoresist 4 by photolithography at a predetermined position where the sound absorbing agent is to be applied, and the sound absorbing agent 3 is screened on the wafer by a screen printing method. And after curing with coating, the photoresist 4 is removed.

Description

탄성표면파소지의 흡음제도포방법Sound absorption coating method of elastic surface wave

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명에 의한 도포방법.2 is a coating method according to the present invention.

Claims (4)

탄성표면과 소자의 흡음제(1)를 도포하는 방법에 있어서, IDT전극(2)의 패턴이 형성된 기판(1)상에 소정의 두께로 포토레지스트(4)를 도포하는 단계와, 흡음제(3)가 도포되어야 할 소정의 위치에 사진식각법으로 상기 포토레지스트(4)의 패턴을 형성하는 단계와, 스크린인쇄방법으로 상기 흡음제(3)를 소정의 두께로 도포한 후 큐어링하는 단계 및, 상기 큐어링고정이 완료된 후 상기 포토레지스트(4)를 제거하는 단계를 포함하는 것을 특징으로 하는 탄성표면파 소자의 흡음제도포방법.A method of applying the elastic surface and the sound absorbing agent 1 of an element, comprising: applying a photoresist 4 to a predetermined thickness on a substrate 1 on which a pattern of the IDT electrode 2 is formed; Forming a pattern of the photoresist 4 by a photolithography method at a predetermined position to be applied, and applying the sound absorbing agent 3 to a predetermined thickness by a screen printing method and curing the film; And removing the photoresist (4) after the curing has been completed. 제1항에 있어서, 포토레지스트(4)의 두께는 1내지 5㎛인 것을 특징으로 하는 탄성표면파소자의 흡음제 도포방법.The method of claim 1, wherein the thickness of the photoresist (4) is 1 to 5 mu m. 제1항에 있어서, 상기 흡음제(3)의 두께는 10내지 50㎛인 것을 특징으로 하는 탄성표면파소자의 흡음제도포방법.The method of claim 1, wherein the sound absorbing agent (3) has a thickness of 10 to 50 mu m. 제1항에 있어서, 상기 큐어링공정은 60 내지 130℃의 온도에서 1/2내지 2시간동안 수행되는 것을 특징으로 하는 탄성표면파 소자의 흡음제도포방법.The method of claim 1, wherein the curing process is carried out for 1/2 to 2 hours at a temperature of 60 to 130 ℃. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920001443A 1992-01-31 Sound absorption coating method of elastic surface wave KR930017227A (en)

Publications (1)

Publication Number Publication Date
KR930017227A true KR930017227A (en) 1993-08-30

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790749B1 (en) * 2006-11-30 2008-01-02 삼성전기주식회사 Saw device with composite electrode structures
KR100824868B1 (en) * 2002-06-12 2008-04-23 동부일렉트로닉스 주식회사 Coating apparatus and method of photoresist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100824868B1 (en) * 2002-06-12 2008-04-23 동부일렉트로닉스 주식회사 Coating apparatus and method of photoresist
KR100790749B1 (en) * 2006-11-30 2008-01-02 삼성전기주식회사 Saw device with composite electrode structures

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