KR920701284A - 광경화성수지조성물 및 광경화성수지의 제조방법 - Google Patents
광경화성수지조성물 및 광경화성수지의 제조방법Info
- Publication number
- KR920701284A KR920701284A KR1019910701212A KR910701212A KR920701284A KR 920701284 A KR920701284 A KR 920701284A KR 1019910701212 A KR1019910701212 A KR 1019910701212A KR 910701212 A KR910701212 A KR 910701212A KR 920701284 A KR920701284 A KR 920701284A
- Authority
- KR
- South Korea
- Prior art keywords
- photocurable resin
- manufacturing
- resin composition
- composition
- photocurable
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
- C08F290/128—Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
- C08C19/00—Chemical modification of rubber
- C08C19/28—Reaction with compounds containing carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
- C08C19/00—Chemical modification of rubber
- C08C19/30—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule
- C08C19/34—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule reacting with oxygen or oxygen-containing groups
- C08C19/36—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule reacting with oxygen or oxygen-containing groups with carboxy radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L19/00—Compositions of rubbers not provided for in groups C08L7/00 - C08L17/00
- C08L19/006—Rubber characterised by functional groups, e.g. telechelic diene polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1796990 | 1990-01-30 | ||
JP90-17969 | 1990-01-30 | ||
PCT/JP1991/000105 WO1991011473A1 (en) | 1990-01-30 | 1991-01-29 | Photocurable resin composition and process for producing photocurable resin |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920701284A true KR920701284A (ko) | 1992-08-11 |
KR940003366B1 KR940003366B1 (ko) | 1994-04-21 |
Family
ID=11958563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910701212A KR940003366B1 (ko) | 1990-01-30 | 1991-01-29 | 광경화성수지조성물 및 광경화성수지의 제조방법 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0465672B1 (ko) |
KR (1) | KR940003366B1 (ko) |
CA (1) | CA2050580A1 (ko) |
DE (1) | DE69123186T2 (ko) |
WO (1) | WO1991011473A1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4308386A1 (de) * | 1993-03-16 | 1994-09-22 | Vianova Kunstharz Ag | Kathodisch abscheidbare, Polybutadien-Pfropfcopolymerisate enthaltende Lackbindemittel |
US9598507B2 (en) | 2013-12-04 | 2017-03-21 | Kuraray Co., Ltd. | Modified liquid diene-based rubber and production process for the same |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5150333A (ja) * | 1974-10-28 | 1976-05-01 | Japan Synthetic Rubber Co Ltd | Denchakuyotoryo |
JPS5338114B2 (ko) * | 1975-02-13 | 1978-10-13 | ||
JPS51116893A (en) * | 1975-04-08 | 1976-10-14 | Ube Ind Ltd | Photo-setting compositions |
JPS5550006A (en) * | 1978-10-06 | 1980-04-11 | Nippon Zeon Co Ltd | Preparation of novel modified resin |
DE3172280D1 (en) * | 1980-12-29 | 1985-10-17 | Sumitomo Chemical Co | Modified epoxy resin composition and process for the preparation thereof |
JPS63150304A (ja) * | 1986-12-12 | 1988-06-23 | Mitsubishi Petrochem Co Ltd | 紫外線硬化性樹脂 |
JPH05150333A (ja) * | 1991-07-29 | 1993-06-18 | Canon Inc | 磁気記憶部付フイルムを用いるカメラ |
JPH05192887A (ja) * | 1992-01-20 | 1993-08-03 | Ishikawajima Harima Heavy Ind Co Ltd | ロボットハンド |
-
1991
- 1991-01-29 DE DE69123186T patent/DE69123186T2/de not_active Expired - Fee Related
- 1991-01-29 CA CA002050580A patent/CA2050580A1/en not_active Abandoned
- 1991-01-29 KR KR1019910701212A patent/KR940003366B1/ko not_active IP Right Cessation
- 1991-01-29 WO PCT/JP1991/000105 patent/WO1991011473A1/ja active IP Right Grant
- 1991-01-29 EP EP91902798A patent/EP0465672B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0465672A4 (en) | 1992-06-10 |
KR940003366B1 (ko) | 1994-04-21 |
DE69123186T2 (de) | 1997-03-13 |
CA2050580A1 (en) | 1991-07-31 |
WO1991011473A1 (en) | 1991-08-08 |
DE69123186D1 (de) | 1997-01-02 |
EP0465672A1 (en) | 1992-01-15 |
EP0465672B1 (en) | 1996-11-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20000308 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |