KR920012512A - Manufacturing System of Aluminum (AI) Film by Arc Discharge Induction Ion Plating - Google Patents

Manufacturing System of Aluminum (AI) Film by Arc Discharge Induction Ion Plating Download PDF

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Publication number
KR920012512A
KR920012512A KR1019900022395A KR900022395A KR920012512A KR 920012512 A KR920012512 A KR 920012512A KR 1019900022395 A KR1019900022395 A KR 1019900022395A KR 900022395 A KR900022395 A KR 900022395A KR 920012512 A KR920012512 A KR 920012512A
Authority
KR
South Korea
Prior art keywords
ion plating
film
evaporation source
arc discharge
aluminum
Prior art date
Application number
KR1019900022395A
Other languages
Korean (ko)
Other versions
KR930002442B1 (en
Inventor
정재인
이영백
문종호
홍재화
강정수
Original Assignee
정명식
포항종합제철 주식회사
백덕현
재단법인산업 과학기술연구소
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Publication date
Application filed by 정명식, 포항종합제철 주식회사, 백덕현, 재단법인산업 과학기술연구소 filed Critical 정명식
Priority to KR1019900022395A priority Critical patent/KR930002442B1/en
Publication of KR920012512A publication Critical patent/KR920012512A/en
Application granted granted Critical
Publication of KR930002442B1 publication Critical patent/KR930002442B1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음No content

Description

이아크 방전 유도 이온플레이팅에 의한 알루미늄(Al) 피막의 제조 시스템Production system of aluminum (Al) film by two arc discharge induced ion plating

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 제조시스템에서의 증발원, 이온화전극및 필라멘트의 배치 및 관련기구를 설명하는 개략도, 제2도는(가)는 수냉식 증발원 홀더의 정면도, (나)는 수냉식 증발원 홀더 측면도.1 is a schematic diagram illustrating the arrangement and associated mechanism of the evaporation source, ionization electrode and filament in the manufacturing system of the present invention, FIG. 2 is a front view of the water-cooled evaporation source holder, and (b) is a side view of the water-cooled evaporation source holder.

Claims (1)

무개스 아아크 방전 유도 이온플레이팅에 의한 Al 피막의 제조에 있어서, 증발원(3)으로 그라파이트 화합물 또는 나이트라이드 화합물 보우트를 사용하고 증발원의 적정 가열을 위하여 수냉식 금속 블록의 증발원 홀더(7)를 사용하며, 증발원(3)에 인접하여 하나의 이온화전극(2) 및 하나 이상의 필라멘트(4)를 교차되며 마주보게 설치하고, 필라멘트(4)의 전류를 40A이상 흐르게 하고 이온화 전극의 전압을 60V 이상으로 인가하여 이온화전극(2)에 5A이상의 아아크 전류를 형성시키고 기판(6)에 200mA이상의 전류를 흐르게 하여 증발되는 Al을 높은 이온화율로 아아크 방전 이온플레이팅 시킴을 특징으로 하는, 피막 특성이 우수한 알루미늄(Al)피막의 제조시스템.In the production of Al film by gas-free arc discharge induced ion plating, a graphite compound or nitride compound boat is used as the evaporation source 3, and an evaporation source holder 7 of a water-cooled metal block is used for proper heating of the evaporation source. One ionizing electrode 2 and one or more filaments 4 are disposed to face each other and face each other adjacent to the evaporation source 3, the current of the filament 4 flows 40 A or more, and the voltage of the ionizing electrode is applied to 60 V or more. To form an arc current of 5 A or more in the ionization electrode 2 and to flow a current of 200 mA or more in the substrate 6 to cause arc-discharge ion plating to evaporate Al at a high ionization rate. Al) film production system. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900022395A 1990-12-29 1990-12-29 Method for making an aluminium coating by arc-discharge induction ion-plating KR930002442B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900022395A KR930002442B1 (en) 1990-12-29 1990-12-29 Method for making an aluminium coating by arc-discharge induction ion-plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900022395A KR930002442B1 (en) 1990-12-29 1990-12-29 Method for making an aluminium coating by arc-discharge induction ion-plating

Publications (2)

Publication Number Publication Date
KR920012512A true KR920012512A (en) 1992-07-27
KR930002442B1 KR930002442B1 (en) 1993-03-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900022395A KR930002442B1 (en) 1990-12-29 1990-12-29 Method for making an aluminium coating by arc-discharge induction ion-plating

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KR (1) KR930002442B1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100384449B1 (en) * 1999-12-13 2003-05-22 재단법인 포항산업과학연구원 Manufacturing method of Al films having good adhesion
KR100430410B1 (en) * 2000-08-24 2004-05-04 재단법인 포항산업과학연구원 Manufacturing method of Aluminum films by ion plating
KR102107446B1 (en) 2019-11-17 2020-05-07 주식회사 지에스아이 Coating Apparatus, Coating Method And Coating Layer manufactured using the same method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100384449B1 (en) * 1999-12-13 2003-05-22 재단법인 포항산업과학연구원 Manufacturing method of Al films having good adhesion
KR100430410B1 (en) * 2000-08-24 2004-05-04 재단법인 포항산업과학연구원 Manufacturing method of Aluminum films by ion plating
KR102107446B1 (en) 2019-11-17 2020-05-07 주식회사 지에스아이 Coating Apparatus, Coating Method And Coating Layer manufactured using the same method

Also Published As

Publication number Publication date
KR930002442B1 (en) 1993-03-30

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