KR920011628A - Metallic articles having supports in the form of improved plasma sprayed surfaces, methods of making flat metal surfaces and electrolyzers - Google Patents

Metallic articles having supports in the form of improved plasma sprayed surfaces, methods of making flat metal surfaces and electrolyzers

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KR920011628A
KR920011628A KR1019910024456A KR910024456A KR920011628A KR 920011628 A KR920011628 A KR 920011628A KR 1019910024456 A KR1019910024456 A KR 1019910024456A KR 910024456 A KR910024456 A KR 910024456A KR 920011628 A KR920011628 A KR 920011628A
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article
metal
micro inches
profilometer
average
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KR100235378B1 (en
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엠 어니스 린
시이 카알슨 리차아드
엘 하아디 케니스
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캐스린 이이 켄트
엘텍 시스템즈 코오포레이션
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Pinball Game Machines (AREA)

Abstract

내용 없음No content

Description

개량된 플라즈마 분무 표면 형태의 지지체를 가지는 금속성 물품, 평탄한 금속 표면을 제조하는 방법 및 전해조Metallic articles having supports in the form of improved plasma sprayed surfaces, methods of making flat metal surfaces and electrolyzers

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (33)

0.001016㎝(400마이크로인치)의 상한 및 0.000762㎝(300마이크로인치)의 하한의 프로필로미터를 기초하여, 최소한 약 40의 2.54㎝(1인치)당 평균 표면 정점들 및 최소한 약 0.00064㎝(250마이크로인치)의 프로필로미터로 측정된 평균 표면조도를 제공하는 지지체상의 플라즈마 분무 적용된 밸브 금속 표면으로 표면이 구성되는 증딘된 피복 부착력을 위해 적용된 금속-함유 표면을 가지는 지지체의 금속성 물품.At least about 40 2.54 cm (1 inch) average surface vertices and at least about 0.00064 cm (250 microns), based on an upper profile of 0.001016 cm (400 micro inches) and a lower limit of 0.000762 cm (300 micro inches) A metallic article of a support having a metal-containing surface applied for augmented coating adhesion, the surface being composed of a plasma spray applied valve metal surface on a support that provides an average surface roughness measured with a profilometer in inches). 제1항에 있어서, 상기 지지체가 하나 또는 그 이상의 금속, 합금, 금속간 혼합물, 세라믹 또는 서어멧의 밸브 금속 지지체로 구성되는 물품.The article of claim 1, wherein the support consists of one or more metal, alloy, intermetallic mixtures, ceramic or cermet valve metal supports. 제1항에 있어서, 상기 표면의 금속이 타이타늄, 탄탈륨, 니오븀, 알루미늄, 지르코늄, 망간 및 니켈의 금속간 혼합물, 합금 및 금속으로 구성되는 그룹으로부터 선택된 물품.The article of claim 1 wherein the metal on the surface is selected from the group consisting of intermetallic mixtures of titanium, tantalum, niobium, aluminum, zirconium, manganese and nickel, alloys and metals. 제1항에 있어서, 상기 표면이 20-100 마이크로 범위내의 크기를 가지는 밸브 금속 입자를 사용하여 얻은 플라즈마 분무 적용된 표면인 물품.The article of claim 1, wherein the surface is a plasma spray applied surface obtained using valve metal particles having a size in the range of 20-100 micros. 제1항에 있어서, 상기 금속성 물품이 산소-방출 애노드로 구성되는 물품.The article of claim 1, wherein the metallic article consists of an oxygen-releasing anode. 제1항에 있어서, 상기 금속성 물품이 산소-방출 애노도가 아닌 전극으로 구성되는 물품.The article of claim 1, wherein the metallic article consists of an electrode that is not an oxygen-releasing anodic. 제1항에 있어서, 상기 금속성 표면이 약 0.000533㎝(210마이크로인치)이하의 낮은 점들은 없는 최소한 약 0.000762㎝(300마이크로인치)의 프로필로미터로 측정된 평균 조도를 가지는 물품.The article of claim 1, wherein the metallic surface has an average roughness measured with a profilometer of at least about 0.000762 cm (300 microinches) free of low dots below about 0.000533 cm (210 microinches). 제1항에 있어서, 상기 표면이 약 0.001016㎝(400마이크로인치)의 상한 및 0.000762㎝(300마이크로인치)의 하한에 기초하여, 최소한 약 60의 2.54㎝(인치)당 프로필로미터로 측정된 평균 표면 정점을 가지는 물품.The mean of claim 1, wherein the surface is measured at a profile of at least about 60 2.54 cm (inch), based on an upper limit of about 0.001016 cm (400 micro inches) and a lower limit of 0.000762 cm (300 micro inches). Articles with surface vertices. 제1항에 있어서, 상기 표면이 최소한 약 0.000254㎝(1000마이크로인치)의 최대 정점 및 최하점 사이의 프로필로미터로 측정된 평균 거리를 가지는 물품.The article of claim 1, wherein the surface has an average distance measured with a profilometer between a maximum and a lowest point of at least about 0.000254 cm (1000 microinches). 제1항에 있어서, 상기 표면이 약 0.00381㎝(1500마이크로인치)내지 약 0.00889㎝(3500마이크로인치)의 최대 정점 및 최하점 사이의 프로필로미터로 측정된 평균 정점 높이를 가지는 물품.The article of claim 1, wherein the surface has an average peak height measured by a profilometer between a maximum and a lowest peak between about 0.00381 cm (1500 micro inches) and about 0.00889 cm (3500 micro inches). 제1항에 있어서, 상기 표면이 최소한 약 0.000254㎝(1000마이크로인치)의 프로필로미터로 측정된 평균높이를 가지는 물품.The article of claim 1, wherein the surface has an average height measured by a profilometer of at least about 0.000254 cm (1000 microinches). 제1항에 있어서, 상기 표면이 최소한 약 0.00381㎝(1500마이크로인치) 내지 약 0.00889㎝(3500마이크로인치)의 프로필로미터로 측정된 평균 정점 높이를 가지는 물품.The article of claim 1, wherein the surface has an average peak height measured by a profilometer of at least about 0.00381 cm (1500 microinch) to about 0.00889 cm (3500 microinch). 제1항에 있어서, 상기 표면이 피복된 물품.The article of claim 1, wherein the surface is coated. 제13항에 있어서, 상기 피복된 표면이 플래티늄 족 금속, 또는 금속 산화물 또는 그 혼합물을 포함하는 전기화학적 활성 표면 피복을 가지는 물품.The article of claim 13, wherein the coated surface has an electrochemically active surface coating comprising a platinum group metal, or metal oxide, or mixtures thereof. 제13항에 있어서, 상기 전기화학적으로 활성인 표면 피복이 플래티늄 족 금속 산화물, 마그네타이트, 페라이트 및 코발트 산화물 첨정석으로 구성되는 그룹으로부터 선택된 최소한 하나의 산화물을 포함하는 물품.The article of claim 13, wherein the electrochemically active surface coating comprises at least one oxide selected from the group consisting of platinum group metal oxides, magnetite, ferrite and cobalt oxide spinel. 제13항에 있어서, 상기 전기화학적으로 활성인 표면 피복이 밸브 금속의 최소한 하나의 산화물 및 플래티늄족 금속의 최소한 하나의 산화물의 혼합된 결절성 물질을 포함하는 물품.The article of claim 13, wherein the electrochemically active surface coating comprises a mixed nodular material of at least one oxide of a valve metal and at least one oxide of a platinum group metal. 제13항에 있어서, 상기 피복된 표면이 하나 또는 그 이상의 이산화망간, 이산화 납, 산화주석, 플래티네이트 치환체, 니켈-니켈 산화물 및 니켈+란타나이드 산화물을 포함하는 피복을 가지는 물품.The article of claim 13, wherein the coated surface has a coating comprising one or more manganese dioxide, lead dioxide, tin oxide, platinum substituents, nickel-nickel oxide, and nickel + lanthanide oxide. 제1항에 있어서, 상기 물품이 양극처리, 전기도금 또는 전해추출 전해조내의 애노드인 물품.The article of claim 1, wherein the article is an anode in anodizing, electroplating or electrolytic extraction electrolyzer. 제1항에 있어서, 상기 물품이 전기아연도금, 전기주석 도금, 황산나트륨 전해 또는 구리 박 도금에서 애노드인 물품.The article of claim 1, wherein the article is an anode in electro zinc plating, electro tin plating, sodium sulfate electrolysis or copper foil plating. (a)금속 표면을 평탄하게 하기 위해 표면의 홈에 밸브 금속으로 플라즈마 분무시키고, (b)증가된 피복 부착력의 표면 조도를 제공하기 위해 플라즈마 분무된 홈을 포함하는, 피복될 표면에 플라즈마 분무시키는 것으로 구성되는, 표면에 홈이 파여 평탄성을 잃은 표면을 중진된 피복 부착력의 평탄한 금속 표면으로 제조하는 방법.(a) plasma spraying with a valve metal in the grooves of the surface to flatten the metal surface, and (b) plasma spraying the surface to be coated, including plasma sprayed grooves to provide surface roughness of increased coating adhesion. A method of making a flat metal surface of intermediate coating adhesion, wherein the surface has been grooved in the surface and has lost flatness. 제20항에 있어서, 상기 홈을 용접 물질로 먼저 부분적으로 충전시키고 밸브 금속으로 플라즈마 분무시키는 방법.21. The method of claim 20, wherein the groove is first partially filled with a welding material and plasma sprayed with a valve metal. 제20항에 있어서, 상기 홈을 먼저 분쇄하여 플라즈마 분무 적용된 금속을 위한 분쇄 홈을 제공하는 방법.21. The method of claim 20, wherein the grooves are first milled to provide milled grooves for plasma sprayed metal. (a)피복을 제거하기 위해 피복된 금속 표면에 용융된 물질을 포함하는 용융물을 입히고, (b)상기 용융물로부터 상기 금속 표면을 분리하고, 냉각하고 그로부터 용융물 잔사를 제거하고, (c)상승된 온도에서 강산 또는 가성소다 부식제로 표면을 입자간 부식시키고, (d)상기 홈을 노출시키는 상기 부식된 표면을 세척하고, (e)금속 표면을 평탄하게 하고 표면 조도를 제공하기 위해 밸브 금속으로 상기 표면의 홈에 플라즈마 분무시키는 것으로 구성되는데, (f)여기서 상기 표면은 증진된 피복 부착력을 위한 표면 조도와 표면 평탄성을 가지고, 상기 표면 조도는 입자간 부식 및 플라즈마 분무에 의해 확립되고, 사용시 홈의 파이고 평탄성을 잃는 표면을, 재피복 하기 위해 평탄한 형태의 피복된 금속 표면을 제조하는 방법.(a) applying a melt comprising molten material to the coated metal surface to remove the coating, (b) separating the metal surface from the melt, cooling and removing the melt residue therefrom, and (c) the elevated Intergranularly corrodes the surface with a strong acid or caustic soda caustic at temperature, (d) cleans the corroded surface that exposes the grooves, and (e) the valve metal to smooth the metal surface and provide surface roughness. Plasma spraying the grooves of the surface, wherein (f) the surface has surface roughness and surface flatness for enhanced coating adhesion, the surface roughness being established by intergranular corrosion and plasma spraying, A method of making a coated metal surface in flat form for recoating a surface that loses pyro-flatness. 제23항에 있어서, 상기 용융물로부터 분리된 상기 표면은 중간-금속의 표면에서의 불순물을 포함하는 불순물의 최소한 실질적으로 연속적인 입자간 망상 구조를 제공하기에 충분한 시간 동안 상승된 온도 소결되는 방법.The method of claim 23, wherein the surface separated from the melt is sintered at elevated temperature for a time sufficient to provide at least a substantially continuous intergranular network of impurities including impurities at the surface of the intermediate-metal. 제23항에 있어서, 상기 홈들은 용정 물질로 먼저 부분적으로 충전되고 밸브 금속으로 플라즈마 분무되는 방법.The method of claim 23, wherein the grooves are first partially filled with molten material and plasma sprayed with the valve metal. 제23항에 있어서, 상기 홈들은 플라즈마 분무 적용된 금속을 위한 분쇄된 홈을 제공하기 위해 먼저 분쇄되는 방법.24. The method of claim 23, wherein the grooves are first milled to provide a milled groove for the plasma spray applied metal. 0.000762㎝(300마이크로인치)의 플로필로미터 하환 및 0.001016㎝(400마이크로인치)의 플로필로미터 상한에 기초하여, 최소한 약 40의 2.54㎝(인치)당 평균 표면 정점들 및 최소한 약 0.00064㎝(250마이크로인치)의 프로필로미터로 측정된 평균 표면 조도를 가지는 작동 표면으로서, 플라즈마 분무 적용된 밸브 금속의 거치면을 가지는 지지체 금속상에 전기화학적으로 활성인 표면 피복을 가지고 배쓰내에 침지된 에노드를 가지며, 전해조의 배쓰내에 포함된 용해 종의 전기 분해를 위한 전해조.Average surface vertices per 2.54 cm (at least) and at least about 0.00064 cm (250) based on a flophyrometer downlink of 0.000762 cm (300 micro inches) and an upper limit of 400 micro inches (floor) of 0.001016 cm (400 micro inches) A working surface having an average surface roughness measured in microns), having an electrochemically active surface coating on a support metal having a mounting surface of a plasma spray applied valve metal, the anode submerged in the bath, Electrolyzer for electrolysis of dissolved species contained in baths of electrolyzer. 제27항에 있어서, 상기 표면은 약 0.000533㎝(210마이크로인치) 이하의 낮은 점들이 없는 최소한 약 0.000762㎝ (300마이크로인치)DML 프로필로미터로 측정된 평균 조도를 가지는 전해조.28. The electrolytic cell of claim 27, wherein the surface has an average roughness measured at least about 0.000762 cm (300 micro inches) DML profilometer without low dots below about 0.000533 cm (210 micro inches). 제27항에 있어서, 상기 표면은 약 0.001016㎝(400마이크로인치)의 상한 및 0.000762㎝(300마이크로인치)의 하한에 기초하여, 최소한 약 60의 2.54㎝(인치)당 프로필로미터로 축정된 평균 표면 정점들을 가지는 전해조.28. The method of claim 27, wherein the surface averages at least about 60 2.54 cm per inch based on an upper limit of about 0.001016 cm (400 micro inches) and a lower limit of 0.000762 cm (300 micro inches). Electrolyte with surface vertices. 제27항에 있어서, 상기 표면은 최소한 약 0.00254㎝(1000마이크로인치)의 최하점 및 최대 정점 사이의, 프로필로미터로 측정된 평균 거리를 가지는 전해조.28. The electrolytic cell of claim 27, wherein the surface has an average distance measured in profilometer between the lowest and highest peaks of at least about 0.00254 cm (1000 microinches). 제27항에 있어서, 상기 표면은 약 0.00381㎝(1500마이크로인치) 내지 약 0.00889㎝(3500마이크로인치)의 최대 정점 및 최하점 사이의 프로필로미터로 측정된 평균 거리를 가지는 전해조.28. The electrolytic cell of claim 27, wherein the surface has an average distance measured by a profilometer between a maximum and a lowest point between about 0.00381 cm (1500 micro inches) and about 0.00889 cm (3500 micro inches). 제27항에 있어서, 상기 표면은 최소한 약 0.000254㎝(1000마이크로인치)의 프로필로미터로 측정된 평균 정점들 높이를 가지는 전해조.The electrolyzer of claim 27, wherein the surface has an average peak height measured by a profilometer of at least about 0.000254 cm (1000 microinches). 제27항에 있어서, 상기 표면은 최소한 약 0.00381㎝(1500마이크로인치) 내지 약 0.00762㎝(300마이크로인치)의 프로필로미터로 측정된 평균 정점들 높이를 가지는 전해조.28. The electrolytic cell of claim 27, wherein the surface has an average peak height measured by a profilometer of at least about 0.00381 cm (1,500 micro inches) to about 0.00762 cm (300 micro inches). ※ 참고사항：최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
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