KR920007418B1 - Forming method of black matrix for crt - Google Patents
Forming method of black matrix for crt Download PDFInfo
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- KR920007418B1 KR920007418B1 KR1019900010093A KR900010093A KR920007418B1 KR 920007418 B1 KR920007418 B1 KR 920007418B1 KR 1019900010093 A KR1019900010093 A KR 1019900010093A KR 900010093 A KR900010093 A KR 900010093A KR 920007418 B1 KR920007418 B1 KR 920007418B1
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- panel
- water
- black matrix
- washing
- photosensitive resin
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/18—Luminescent screens
- H01J29/30—Luminescent screens with luminescent material discontinuously arranged, e.g. in dots, in lines
- H01J29/32—Luminescent screens with luminescent material discontinuously arranged, e.g. in dots, in lines with adjacent dots or lines of different luminescent material, e.g. for colour television
- H01J29/327—Black matrix materials
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Abstract
Description
제1도는 종래의 칼라 음극선관의 블랙메트릭스 형성방법에 따른 제조 공정의 흐름도.1 is a flowchart of a manufacturing process according to a method for forming a black matrix of a conventional color cathode ray tube.
제2도는 본 발명의 칼라 음극선관의 블랙메트릭스 형성방법에 따른 제조 공정의 흐름도.2 is a flow chart of a manufacturing process according to the method of forming a black matrix of the color cathode ray tube of the present invention.
본 발명은 칼라 암극선관의 블랙메트릭스 형성방법에 관한 것이다.The present invention relates to a method for forming a black matrix of color dark polar tube.
칼라 음극선관의 패널 내면에 대한 종래의 블랙메트릭스 형성방법은 제1도에 도시되고 하기하는 바와 같은 제조공정을 가진다.A conventional black matrix forming method for the inner surface of a panel of a color cathode ray tube has a manufacturing process as shown in FIG. 1 and described below.
……→수세단계(水洗段階 ; 물로써 기제조된 패널을 세정한다.)→NaOH 세정단계(액온이 약 80℃인 10내지 15%의 과산화수소로 형광체 유기물질 및 알루미늄등을 제거한다.)→수세단계→HF 세정(약 12 내지 14%의 불화수소로 흑연 성분을 제거한다.)→온수 수세단계 : 약 45℃의 물로써 상기한 약품들을 세정한다.→건조단계 : 열풍으로서 상기한 패널을 건조시킨다. 이와 같은 전처리 공정이 완료되면 감광성 수지막을 도포하고 이를 현상하며, 이에 이어 흑연분산액을 분사 도포한후 최종의 블랙 매트릭스를 현상 완성한다.… … → washing with water (washing the prepared panel with water) → washing with NaOH (removing the phosphor organic matter and aluminum with 10 to 15% hydrogen peroxide with a liquid temperature of about 80 ° C) → washing with water → HF cleaning (removing the graphite component with about 12 to 14% hydrogen fluoride) → Hot water washing step: Clean the above chemicals with water at about 45 ° C → Drying step: Dry the above panel with hot air . When the pretreatment process is completed, the photosensitive resin film is coated and developed, followed by spray coating of the graphite dispersion, followed by development of the final black matrix.
이상과 같은 종래의 블랙 매트릭스 형성방법에 의하면 양질의 블랙 매트릭스를 얻을 수 없게 되는 바, 그 직접적인 요인은 상기 감광성 수지층의 형성상태가 불량하기 때문인 것이다. 이와 같은 요인은 감광성 수지막 형성공정상의 결함에 의해 발생되는 것으로 그 중요한 원인은 패널과 감광성 수지의 온도차인 것이다. 이러한 온도차는 상기한 감광성 수지막의 얼룩을 야기시키게 되는데, 상기한 바와 같이 전처리과정의 상온 이상의 약물(80℃)과 세정수(45℃) 및 열풍에 의해 패널이 가열되기 때문인 것이다.According to the conventional black matrix forming method as described above, a good black matrix cannot be obtained, and the direct factor is that the formation state of the photosensitive resin layer is poor. Such a factor is caused by a defect in the photosensitive resin film forming process, and an important reason is a temperature difference between the panel and the photosensitive resin. This temperature difference causes staining of the photosensitive resin film, because the panel is heated by the drug (80 ° C.), washing water (45 ° C.) and hot air above the normal temperature of the pretreatment process as described above.
본 발명은 상기한 문제점을 개선할 수 있는 칼라 음극선관의 블랙메트릭스 형성방법을 제공함에 그 목적이 있다.An object of the present invention is to provide a method for forming a black matrix of color cathode ray tube that can improve the above problems.
상기의 목적을 달성하기 위하여 본 발명은, 칼라 음극선관의 패널 내면에 블랙 매트릭스를 형성하는 방법에 있어서, 상온수를 통한 수세공정과, 수세된 패널을 고속 회전시켜 원심력으로 건조시키도록 하는 건조단계를 포함하는 점에 그 특징이 있다.In order to achieve the above object, the present invention, in the method of forming a black matrix on the inner surface of the panel of the color cathode ray tube, the washing step through the normal temperature water, and the drying step to dry the centrifugal force by rotating the washed panel at high speed Its features are included.
이하 첨부된 도면을 참조하면서 본 발명의 한 실시예를 상세히 설명한다.Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings.
가) 수세단계(水洗段階) ; 약 45℃의 물로써 기 제조된 패널을 세척한다.A) water washing step; The pre-made panels are washed with water at about 45 ° C.
나) NaOH 세정단계(洗淨段階) ; 액온이 약 80℃인 10 내지 15%의 과산화수소로 형광체 유기물질 및 알루미늄등을 제거한다.B) NaOH washing step (iii); 10 to 15% hydrogen peroxide having a liquid temperature of about 80 ° C. removes the phosphor organic material and aluminum.
다) 수세단계(水洗段階) ; 약 45℃의 물로서 약물처리된 패널을 세척한다.C) water washing step; The drug treated panel is washed with water at about 45 ° C.
라) HF 세정단계 ; 약 12내지 14%의 불화수소로 약 2차에 걸쳐 약물처리하여 흑연 성분을 제거한다.D) HF cleaning step; About 12 to 14% of hydrogen fluoride is drug treated twice to remove the graphite component.
마) 수세단계 ; 상온수(≒25℃)의 물로써 상이한 단계들을 통하여 약물처리된 패널을 세척함과 아울러 그 온도를 낮춘다.E) washing phase; The drug treated panel is washed through different steps with water at room temperature (≒ 25 ° C.) and the temperature is lowered.
바) 원심건조단계 ; 상기한 패널을 약 300 내지 400RPM정도로 회전시켜 패널에 부착된 물기를 제거하여 건조한다.F) centrifugal drying step; The panel is rotated to about 300 to 400 RPM to remove moisture from the panel and dried.
사) 감광성 수지막 형성 단계 ; 충분히 건조된 패널의 내면에 액온이 약 20 내지 23℃인 감광성 수지를 도포한 후 이를 건조한다.G) forming a photosensitive resin film; After applying the photosensitive resin whose liquid temperature is about 20-23 degreeC to the inner surface of the fully dried panel, it dries.
아) 감광성 수지막 현상 단계 ; 상기한 감광성 수지막을 소정의 형상으로 감광한 후 이를 물로써 현상한다.A) photosensitive resin film developing step; The photosensitive resin film is exposed to a predetermined shape and then developed with water.
자) 흑연 도포단계 ; 상기한 패널의 내면에 흑연 분산액을 도포한 후 이를 건조한다.I) graphite coating step; The graphite dispersion is applied to the inner surface of the panel and then dried.
아) 완성단계 ; 패널의 내면에 과산화 수소를 주입한 후 고압의 세정수로 이를 세척(현상)하여 블랙 매트릭스를 완성한다.H) completion stage; Hydrogen peroxide is injected into the inner surface of the panel and then washed (developed) with high pressure washing water to complete the black matrix.
이상과 같은 단계를 가지는 본 발명은 전기한 바와 같이 감광성 수지와 과산화 수소의 반응 속도, 즉 감광성 수지막의 분해속도를 제어할 수 있는 상온수에 의한 세정단계와 고속회전에 의한 건조단계들을 포함한다. 이러한 본 발명에 의하면, 상기한 감광성 수지가 도포되기 전의 패널의 온도가 과잉되게 상승되는 현상이 방지된다. 따라서 감광성 수지막과 과산화수소의 반응온도가 저감되므로 그 반응속도가 완화된다. 나아가서는 급격한 반응에 의한 감광성 수지막 상의 얼룩이 발생되지 않게 되며 이로 인해 최종의 산물인 블랙 매트릭스의 형성상태가 매우 양호하게 된다.The present invention having the above steps includes a washing step with normal temperature water and a drying step by high-speed rotation, which can control the reaction rate of the photosensitive resin and hydrogen peroxide, that is, the decomposition rate of the photosensitive resin film as described above. According to the present invention, a phenomenon in which the temperature of the panel before the above-mentioned photosensitive resin is applied is excessively raised is prevented. Therefore, since the reaction temperature of the photosensitive resin film and hydrogen peroxide is reduced, the reaction rate is moderated. Furthermore, the stain on the photosensitive resin film due to the rapid reaction is not generated, and thus the formation state of the final product black matrix becomes very good.
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019900010093A KR920007418B1 (en) | 1990-07-04 | 1990-07-04 | Forming method of black matrix for crt |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019900010093A KR920007418B1 (en) | 1990-07-04 | 1990-07-04 | Forming method of black matrix for crt |
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| Publication Number | Publication Date |
|---|---|
| KR920003369A KR920003369A (en) | 1992-02-29 |
| KR920007418B1 true KR920007418B1 (en) | 1992-08-31 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019900010093A KR920007418B1 (en) | 1990-07-04 | 1990-07-04 | Forming method of black matrix for crt |
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| KR (1) | KR920007418B1 (en) |
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- 1990-07-04 KR KR1019900010093A patent/KR920007418B1/en not_active IP Right Cessation
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| KR920003369A (en) | 1992-02-29 |
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