KR920000476B1 - Color filter for lcd - Google Patents

Abstract

The color filter for liquid crystal display is prepared by forming silicon nitride film (8) between transparent resin film (6) to smooth and protect filter surface and transparent electroconductive film (7) for electrode. Black matrix (2) and patterns of blue, green and red filters (3,4,5) are placed on the glass substrate (1). The silicon nitride film (8) is formed and grown by decomposing ammonia and silane gases at 130-250 deg.C in a plasma chemical reactor. The film thickness of (6), (7) and (8) is 1-1.5 μm, 500-1000 angstrom and 3000-5000 angstrom, respectively.

Description

Color Filters for Liquid Crystal Displays

1 is a plan view of a color filter for a liquid crystal display.

2 is a partial cross-sectional view of a color filter for a liquid crystal display manufactured by the prior art.

3 is a cross-sectional view showing a part of a color filter for a liquid crystal display manufactured according to the present invention.

* Explanation of symbols for the main parts of the drawings

1: glass substrate 2: black matrix

3: blue filter 4: green filter

5: red filter 6: transparent resin film

7 transparent conductive film (ITO) 8 silicon nitride film

The present invention relates to a color filter for a liquid crystal display, and more particularly, to form a silicon nitride film between an organic transparent polyimide resin and an inorganic transparent conductive film (ITO) applied for flattening and protecting the surface of the filter. The present invention relates to a color filter which prevents the peeling phenomenon of the transparent conductive film and prevents contamination of the transparent conductive film.

In general, the plane of the color filter for a liquid crystal display is as shown in FIG. 1, and the cross section has the configuration as shown in FIG. 2, which is briefly described as follows.

That is, after forming a light blocking chromium (Cr) film on the glass substrate 1, the black matrix 2 is formed using methods, such as photosensitive material application and mask exposure. Next, a blue resin having a predetermined spectral characteristic is applied, a photosensitive material is applied to form a photosensitive material pattern, a photosensitive material and a blue resin are developed to form a pattern, and then the photosensitive material is removed to remove the blue filter ( 3) make Next, the green filter 4 and the blue filter 5 are made by repeating the same procedure as above using the green red resin.

A color filter is manufactured by forming a protective layer, which is a transparent resin film 6, on the color filter pattern manufactured as described above, and forming a transparent conductive film 7 for electrodes on the transparent resin film 6. do.

As mentioned above, a problem that arises in manufacturing a filter is, firstly, when the transparent conductive film 7 is deposited on the transparent resin film 6, which is an organic transparent polyimide resin, by a sputtering method or the like. As a result, the transparent resin film 6 as a protective layer erodes and mixes in the transparent conductive film 7, thereby making the transparent conductive film 7 very uneven and contaminating, causing disconnection of the transparent conductive film 7 as a signal electrode. When mounted on a liquid crystal display device, the desired image signal could not be obtained.

Second, since the material of the transparent resin film 6 as the protective layer has no affinity in terms of the material properties of the organic transparent polyimide resin and the inorganic transparent conductive film 7, there is a problem in reliability.

Therefore, the present invention is drawn to solve the defects such as peeling phenomenon and disconnection of the transparent conductive film accompanying the material properties of the transparent resin film and the transparent conductive film when manufacturing the color filter according to the prior art, between the transparent resin film and the transparent conductive film It is an object of the present invention to provide a color filter via a silicon nitride film having mutual affinity.

In order to achieve the above object, the color filter according to the present invention is formed on the color filter pattern by interposing a silicon nitride film having mutual affinity between the transparent resin film formed for planarization and protection of the surface and the transparent conductive film for electrodes. It features.

Hereinafter, the color filter according to the present invention will be described in more detail with reference to the illustrated drawings.

The color filter manufactured by the present invention has a cross section as shown in FIG. 3, which is manufactured as follows.

After chromium (Cr) is coated on the glass substrate 1 by sputtering or electron beam deposition, a photoresist is applied, dried, exposed and developed through a black matrix mask, and then exposed to a photoresist pattern. The chromium film is subsequently wet-etched to form a chromium pattern, and the photosensitive material is removed to form the black matrix 2.

The blue resin is rotated and coated with a thickness of 0.5 to 1.5 µm on the formed black matrix 2 so as to exhibit a predetermined spectral characteristic. Then, a photosensitive material is coated on the mask to expose the mask, and the photosensitive material and the blue resin are developed to develop a blue filter. The blue filter 3 is formed by forming a pattern of and removing a photosensitive material. Next, apply green resin to the thickness of 0.5 ~ 1.5㎛ to show the predetermined spectral characteristics, and then apply the photoresist on it, expose it through the mask of the green filter pattern, then develop the photoresist and green resin. The green filter pattern is formed, and the photosensitive material is subsequently removed to form the green filter 4.

On the other hand, the red filter 5 is formed in the same way as above to complete the color filter of the three primary colors desired by the operator.

In order to flatten the surface of the filter on the completed color filter pattern as described above, a transparent polyimide resin is applied in a thickness of 1 to 1.5 µm to form a transparent resin film 6 to complete the pattern, and then Remove unnecessary resin.

After the pattern is completed as described above, the silicon nitride film 8 is grown to a thickness of 300 to 5000 Pa by decomposing ammonia and xylene gas at a temperature of 130 to 250 ° C. using a plasma chemical reaction gas phase apparatus (CVD). Here, the thickness of the silicon nitride film 8 is preferably 3000 kPa or less, but difficult to control. However, in order to overcome this, the growth of more than 5000 성장 is not preferable because it only increases the loss of light transmittance and does not affect the adhesion of the film.

The unnecessary portion grown on the silicon nitride film 8 manufactured by the plasma chemical vapor deposition device (CVD) by the sputtering method to a thickness of 500 to 1000 mW, and then grown outside the actual filter surface. In order to remove the photoresist, the photosensitive material is applied and the mask exposure is performed in the same manner as the fabrication of the filter pattern to perform wet and dry etching in the order of the transparent conductive film (ITO) and silicon nitride, respectively, to finally complete the filter.

The color filters thus produced are used in correspondence with the respective pixels of the liquid crystal display to enable screen display of three primary colors.

In the above, a filter using a dye-type organic resin is used as an example in the manufacture of a color filter according to the present invention. However, the organic resin may be applied to other methods, that is, in the case of producing a filter by dyeing an organic material. It belongs.

Advantages arising from manufacturing the color filter as described above, first, the silicon nitride film has a strong adhesive force to the organic polyimide resin and the inorganic transparent conductive film (ITO), there is no fear of peeling.

Second, since the transparent conductive film ITO is laminated on the silicon nitride film, it is possible to fundamentally prevent the incidence of impurities generated by laminating the organic transparent polyimide resin film in the prior art.

Claims (3)

A transparent resin film 6 formed on the glass substrate 1 for flattening and protecting the surface of the filter on the color filter pattern of the black matrix 2 and the blue, green, and red filters 3, 4, and 5, respectively. And a silicon nitride film (8) formed between the electrode and the transparent conductive film (7) for electrodes. The color filter for liquid crystal display according to claim 1, wherein in forming the silicon nitride film 8, ammonia and xylene gas are decomposed and grown at a temperature of 130 to 250 DEG C using a plasma chemical reactor field apparatus. . The thickness of the said transparent resin film 6 is 1-1.5 micrometers, the thickness of the silicon nitride film 8 is 3000-5000 micrometers, and the transparent conductive film 7 has a thickness of 500-1000 micrometers. Each color filter for liquid crystal display, characterized in that formed.

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