KR910012344A - Improved electrocatalyst coating composition and method of preparing electrode using same - Google Patents

Improved electrocatalyst coating composition and method of preparing electrode using same Download PDF

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KR910012344A
KR910012344A KR1019900020120A KR900020120A KR910012344A KR 910012344 A KR910012344 A KR 910012344A KR 1019900020120 A KR1019900020120 A KR 1019900020120A KR 900020120 A KR900020120 A KR 900020120A KR 910012344 A KR910012344 A KR 910012344A
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oxide
mole percent
coating
titanium
coating composition
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시이 카알슨 리차아드
엘 하아디 케네스
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캐스린 이이 켄트
엘텍 시스템즈 코오포레이션
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18After-treatment
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Catalysts (AREA)

Abstract

내용 없음No content

Description

개선된 전기촉매적 코우팅 조성물 및 이를 사용한 전극의 제조방법Improved electrocatalyst coating composition and method of preparing electrode using same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (21)

알칼리성 조건하에 증진된 안정성의 코우팅을 갖는 전기 전도성 금속 기판으로 구성되는, 할로겐-함유 용액의 전기분해증 낮은 pH에서 감소된 산소 발생을 갖는 전극으로서, 이때 코우팅이 코우팅에 존재하는 산화물의 100몰%를 기준으로, 15-25몰%의 산화 이리듐, 35-50몰%의 산화 루데늄 및 30-45몰%의 산화 티타늄으로 구성되고, 이로 인해 코우팅이ㅣ 1:1 이하의 티타늄 대 이리듐 및 루데늄의 총 산화물의 몰비를 갖고, 여기서 산화루데늄 대 산화이리듐이의 몰비가 1.5:1-3:1인 전극.Electrolysis of halogen-containing solutions, consisting of electrically conductive metal substrates with a coating of enhanced stability under alkaline conditions, with reduced oxygen evolution at low pH, wherein the coating of oxides present in the coating Based on 100 mole percent, it consists of 15-25 mole percent iridium oxide, 35-50 mole percent rudenium oxide and 30-45 mole percent titanium oxide, resulting in a coating of less than 1: 1 titanium. An electrode having a molar ratio of total oxides to iridium and rudenium, wherein the molar ratio of rudenium oxide to iridium oxide is 1.5: 1-3: 1. 제1항에 있어서, 상기 전도성 금속 기판이 티타늄, 탄탈, 지르코늄, 니오븀, 알루니늄, 텅스텐 및 합금으로 부터 선택된 금속 및 이들의 금속간 혼합물로 구성되는 전극.The electrode of claim 1, wherein the conductive metal substrate is comprised of a metal selected from titanium, tantalum, zirconium, niobium, aluminium, tungsten, and an alloy and an intermetallic mixture thereof. 제1항에 있어서, 상기 전도성 금속 기판이 티나늄, 또는 티타늄을 함유하는 합금 또는 금속간 혼합물로 구성되는 전극.The electrode of claim 1, wherein the conductive metal substrate is comprised of titanium or an alloy or intermetallic mixture containing titanium. 제3항에 있어서, 상기 전도성 금속 기판이 어닐링되고 부식된 티타늄 기판으로 구성되는 전극.4. The electrode of claim 3, wherein the conductive metal substrate is comprised of an annealed and corroded titanium substrate. 제1항에 있어서, 상기 코우팅이 혼합 산화물의 비-균질성이나 반반한 코우팅이고, 근본적으로 18-22몰% 산화 이리듐, 35-40몰% 산화루데늄 및 40-44몰% 산화 티타늄으로 구성되며, 이때 산화 루데늄 대 산화 이리듐의 몰비가 1.7:1 내지 2.2:1인 저늑.The method of claim 1 wherein said coating is a non-homogeneous or smooth coating of a mixed oxide and consists essentially of 18-22 mol% iridium oxide, 35-40 mol% rudenium oxide and 40-44 mol% titanium oxide. Wherein the molar ratio of ruthenium oxide to iridium oxide is between 1.7: 1 and 2.2: 1. 제1항에 있어서, 상기 전극이, 약 2내지 약4범위내의 pH인 브라인의 전기 분해에 사용되는 막 전지내양극인 전극.The electrode of claim 1, wherein the electrode is an anode in a membrane cell used for electrolysis of brine at a pH in the range of about 2 to about 4. 4. 성분 100몰%를 기준으로 15-25몰%의 이리늄, 35-50몰%의 루데늄 및 30-45몰%의 티아늄을 제공하는 비율로, 이리듐, 루데늄 및 타타늄의 가용성 성분을 함유하는 산성 수성 매질로 구성되고, 이로 인해 1:1 이하의 산화 티타늄 대 이리듐 및 루데늄의 총 산화물의 몰비를 갖고, 여기서, 루데늄 대 이리듐의 몰비가 1.5:1-3:1인 금속기판상에 혼합 금속 산화물 코우팅을 제공하기에 적합한 코우팅 조성물.Based on 100 mole percent of the component, 15-25 mole percent of irinium, 35-50 mole percent of rudenium and 30-45 mole percent of thianium are provided. Consisting of an acidic aqueous medium containing, thereby having a molar ratio of titanium oxide to total oxide of iridium and rudenium of less than 1: 1, wherein the molar ratio of rudenium to iridium is 1.5: 1-3: 1 A coating composition suitable for providing a mixed metal oxide coating to a. 제7항에 있어서, 상기 산성 수성 매질이 물내 강한 무기산을 함유하고 약 0.2내지 약 0.8범위내의 pH인 코우팅 조성물.8. The coating composition of claim 7, wherein the acidic aqueous medium contains a strong inorganic acid in water and has a pH in the range of about 0.2 to about 0.8. 제8항에 있어서, 상기 강한 무기산이 염산인 코우팅 조성물.The coating composition of claim 8, wherein said strong inorganic acid is hydrochloric acid. 제7항에 있어서, 상기 가용성 성분이 양립가능하고 염화물, 브롬화물, 요오드화물 및 암모늄 클로로염으로 부터 선택되는 코우팅 조성물.8. The coating composition of claim 7, wherein said soluble component is compatible and is selected from chlorides, bromide, iodides and ammonium chloro salts. 제10항에 있어서, 상기 모든 가용성 성분이 염화물이고, 상기 수성 매질이 염산을 함유하는 코우팅 조성물.A coating composition according to claim 10, wherein all of the soluble components are chlorides and the aqueous medium contains hydrochloric acid. 제7항에 있어서, 상기 비율이, 성분의 100몰%를 기준으로, 18-22몰% 이리듐, 35-40몰% 루데늄 및 40-44몰% 티타늄을 제공하고, 이때, 루데늄 대 이리듐의 몰비가 1.7:1 내지 2.2:1인 코우팅 조성물.8. The method of claim 7, wherein the ratio provides 18-22 mole percent iridium, 35-40 mole percent rudenium and 40-44 mole percent titanium, based on 100 mole percent of the components, wherein ruthenium to iridium A coating composition having a molar ratio of 1.7: 1 to 2.2: 1. 제7항에 있어서, 전기전도성 밸브 금속기판상에 상기 혼합 금속 산화물의 전기촉매적 코우팅을 제공하는 코우팅조성물.8. The coating composition of claim 7, wherein said coating composition provides an electrocatalyst coating of said mixed metal oxide on an electrically conductive valve metal substrate. 적어도 약 450℃의 온도에서 적어도 약 0.25시간 동안 티타늄 기판을 어닐링시키고: 결과 형성된 어닐링된 표면을 강한 부식제로 부식시켜 거치게된 표면을 생성시키고: 결과형성된 부실된 표면에 코우팅에 존재하는 산화물의 100몰%를 기준으로, 15-25몰%의 산화 이리듐, 35-50몰%의 산화 루데늄 및 30-45몰%의 산화 티나늄으로서, 코우팅이 1:1 이하의 산화 타타늄 대 이리듐 및 루데늄의 총산화 물의 몰비를 갖고, 여기서, 산화 루데늄대 산화 이리듐의 몰비가 1.5:1-3:1이도록하는 양의, 성분들의 혼합된 산화물 코우팅을 제공하기 위해 열적으로 분해 가능한 상기 성분들로 구성된 수성 코우팅 조성물을 적용시키고; 결과 형성된 코우팅된 기판을 적어도 약 440℃의 온도에서 적어도 약3분 동안 가열시키는 것으로 구성된, 전기전도성 금속 기판사어에 전기총매적 코우팅이 전극에 존재할 경우, 클로르-알카리 전지에 있어서 성능이 증진된 전기촉매적 코우팅을 갖는 전극을 제조하는 방법.Annealing the titanium substrate for at least about 0.25 hours at a temperature of at least about 450 ° C .: corroding the resulting annealed surface with a strong caustic to produce a roughened surface: 100 of the oxide present in the coating on the resulting stale surface 15-25 mole percent iridium oxide, 35-50 mole percent rudenium oxide and 30-45 mole percent titanium oxide, based on mole percent, with a coating of less than 1: 1 titanium oxide to iridium and Said components thermally degradable to provide a mixed oxide coating of the components in an amount such that the molar ratio of ruthenium oxide to total oxide of ruthenium oxide is 1.5: 1-3: 1 Applying an aqueous coating composition consisting of; Improved performance in chlor-alkaline cells when the electrolytic coating is present on the electrode in an electrically conductive metal substrate, consisting of heating the resulting coated substrate at a temperature of at least about 440 ° C. for at least about 3 minutes. To produce an electrode having an electrocatalyst coated. 제14항에 있어서, 상기 어닐링된 기판이 적어도 실질적으로 약 실온까지 냉각되고, 결과형성된 냉각된 기판이 그다음 부식되는 방법.The method of claim 14, wherein the annealed substrate is cooled to at least substantially room temperature and the resulting cooled substrate is then corroded. 제14항에 있어서, 상기 어닐링된 기판이 강한 무기산 부식제로 부식되는 방법.15. The method of claim 14, wherein the annealed substrate is corroded with a strong inorganic acid caustic. 제14항에 있어서, 상기 부식된 표면이 상기 코우팅 조성물을 적용시키기전에 물 세정되는 방법.The method of claim 14, wherein the corroded surface is water washed prior to applying the coating composition. 제14항에 있어서, 상기 부식된 표면이 거칠게, 부식된 표면인 방법.The method of claim 14, wherein the corroded surface is a rough, corroded surface. 제14항에 있어서, 상기 코우팅 조성물이 정전 스프레이 적용에 의해 상기 티타늄 기판에 적용되는 방법.The method of claim 14, wherein the coating composition is applied to the titanium substrate by electrostatic spray application. 제14항에 있어서, 상기 티타늄 기판이 약600℃ 내지 약 875℃이내의 온도에서 어닐링되는 방법.The method of claim 14, wherein the titanium substrate is annealed at a temperature within about 600 ° C. to about 875 ° C. 16. 할로겐-함유 용액의 전기분해중 낮은 pH에서 감소된 산소 발생을 갖는 반면 알칼리성 조건하에 증진된 안정성의 코우팅을 갖는, 제14항의 방법에 의해 생성되는 전극.The electrode produced by the method of claim 14, having reduced oxygen evolution at low pH during electrolysis of the halogen-containing solution while having enhanced stability coating under alkaline conditions. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900020120A 1989-12-08 1990-12-07 Improved electrocatalyst coating composition and method of preparing electrode using same KR910012344A (en)

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AU (1) AU640719B2 (en)
BR (1) BR9006109A (en)
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100407710B1 (en) * 2001-11-08 2003-12-01 (주) 테크윈 Catalytic oxide anode manufacturing method by high temperature sintering
KR100898173B1 (en) * 2008-07-09 2009-05-19 금강엔지니어링 주식회사 Electrode manufacturing methode for treatment wastewater
KR20160120377A (en) 2015-04-07 2016-10-18 주식회사 마텍스코리아 Electrode manufacturing method having a carbon nano-plane structure

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Publication number Priority date Publication date Assignee Title
US7566389B2 (en) 2003-10-08 2009-07-28 Akzo Nobel N.V. Electrode
EP2390385B1 (en) * 2010-05-25 2015-05-06 Permelec Electrode Ltd. Anode for electrolysis and manufacturing method thereof
DE102010023418A1 (en) 2010-06-11 2011-12-15 Uhde Gmbh Single or multi-sided substrate coating
JP5456744B2 (en) * 2010-11-04 2014-04-02 ペルメレック電極株式会社 Electrolytic sampling method
IT1403585B1 (en) * 2010-11-26 2013-10-31 Industrie De Nora Spa ANODE FOR CHLORINE ELECTROLYTIC EVOLUTION

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US3853739A (en) * 1972-06-23 1974-12-10 Electronor Corp Platinum group metal oxide coated electrodes
JPS5137877A (en) * 1974-09-27 1976-03-30 Asahi Chemical Ind Denkaiyodenkyoku oyobi sonoseizoho
US4457824A (en) * 1982-06-28 1984-07-03 General Electric Company Method and device for evolution of oxygen with ternary electrocatalysts containing valve metals
JPS60162787A (en) * 1984-01-31 1985-08-24 Tdk Corp Electrode for electrolysis
US4564434A (en) * 1984-09-28 1986-01-14 Busse Machukas Vladimir B Electrode for electrolysis of solutions of electrolytes

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100407710B1 (en) * 2001-11-08 2003-12-01 (주) 테크윈 Catalytic oxide anode manufacturing method by high temperature sintering
KR100898173B1 (en) * 2008-07-09 2009-05-19 금강엔지니어링 주식회사 Electrode manufacturing methode for treatment wastewater
KR20160120377A (en) 2015-04-07 2016-10-18 주식회사 마텍스코리아 Electrode manufacturing method having a carbon nano-plane structure

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DE69022386D1 (en) 1995-10-19
NO905305L (en) 1991-06-10
AU640719B2 (en) 1993-09-02
NO905305D0 (en) 1990-12-07
EP0437178B1 (en) 1995-09-13
CA2030092C (en) 1998-11-03
EP0437178A1 (en) 1991-07-17
ATE127863T1 (en) 1995-09-15
ES2076349T3 (en) 1995-11-01
NO302858B1 (en) 1998-05-04
JPH03188291A (en) 1991-08-16
DE69022386T2 (en) 1996-03-07
BR9006109A (en) 1991-09-24

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