KR910009566A - 전자적용을 위한 높은 감광성 할로겐화구리의 제조방법 및 그로써 제조된 엘레멘트 - Google Patents
전자적용을 위한 높은 감광성 할로겐화구리의 제조방법 및 그로써 제조된 엘레멘트 Download PDFInfo
- Publication number
- KR910009566A KR910009566A KR1019900018118A KR900018118A KR910009566A KR 910009566 A KR910009566 A KR 910009566A KR 1019900018118 A KR1019900018118 A KR 1019900018118A KR 900018118 A KR900018118 A KR 900018118A KR 910009566 A KR910009566 A KR 910009566A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive
- copper
- particles
- copper halide
- halide
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/725—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G3/00—Compounds of copper
- C01G3/04—Halides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G3/00—Compounds of copper
- C01G3/04—Halides
- C01G3/05—Chlorides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (9)
- a)조 할로겐화구리의 백분율 기준으로 염화제일주석 1-10중량% 또는 산 1-5중량% 존재하에 상기 조 할로겐화 구리를 수성 보울-분쇄시켜 미세하고, 균일한 입자들의 슬러리를 얻고, 기울여 따르고, 상기 입자들을 세척하며 그들로 부터의 불순물을 제거하고 나서 상기 물을 제거하고, 상기 입자들을 건조시키거나, b)조 할로겐화 구리 백분율 기준으로 산 또는 염화 제일 주석 1-10중량% 존재하에 아세토니트릴내에 상기 조 할로겐화구리를 용해시키고, 그로부터 순수한 할로겐화 구리의 미세입자들을 회복시키고나서, 상기 입자들을 암모니아와 접촉시켜 a) 또는 b)에 따라 제조된 상기 할로겐화 구리입자들을 감광시키는 단계들로 구성되는, 조 할로겐화 물질로부터 정제된 높은 감광성 할로겐화 구리를 제조하기 위한 방법.
- 제1항에 있어서, 상기 할로겐화 구리가 염화구리인 방법.
- 제1항에 있어서, 상기 감광성 염이 결합제에 분산되고, 지지체상에 코우팅처리되어 감광성 엘레멘트가 형성되는 방법.
- 제3항에 있어서, 상기 결합제가 폴리비닐 알콜인 방법.
- 제1항에 있어서, 상기 감광성 염이 액체에 분산되어 슬러리로 제조되고, 상기 슬러리가 지지체상에 적용되어 감광성 엘레멘트가 형성되는 방법.
- 제5항에 있어서, 상기 액체가 아세토니트릴, 물, 톨루엔 또는 그의 혼합물로 구성되는 군으로부터 선택되는 방법.
- 제3항에 있어서, 감광성 물을 형성시키는 상기 코우팅이 암모니아 증기와의 접촉으로 감광화 되어지는 방법.
- 상형성방식으로 노출되고, 현상되고, 정착되고, 건조되고, 상기 상이 그위에 전도성 물질을 적용시킴으로써 향상되는 제7항의 방법에 따라 제조된 엘레멘트.
- 제8항에 있어서, 상기 상의 그위에 구리의 무전해 적용으로 향상되는 엘레멘트.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43486489A | 1989-11-08 | 1989-11-08 | |
US434864 | 1989-11-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR910009566A true KR910009566A (ko) | 1991-06-28 |
Family
ID=23726010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900018118A KR910009566A (ko) | 1989-11-08 | 1990-11-07 | 전자적용을 위한 높은 감광성 할로겐화구리의 제조방법 및 그로써 제조된 엘레멘트 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0427220A3 (ko) |
JP (1) | JPH03240038A (ko) |
KR (1) | KR910009566A (ko) |
CN (1) | CN1053134A (ko) |
CA (1) | CA2029479A1 (ko) |
IE (1) | IE903994A1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5319437A (en) * | 1991-07-26 | 1994-06-07 | Kollmorgen Corporation | Handheld portable spectrophotometer |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3790380A (en) * | 1969-05-28 | 1974-02-05 | Hughes Aircraft Co | Image recording medium and process |
US3993802A (en) * | 1971-07-29 | 1976-11-23 | Photocircuits Division Of Kollmorgen Corporation | Processes and products for making articles for electroless plating |
AU527203B2 (en) * | 1978-05-01 | 1983-02-24 | Eric John Grimsey | A composition of matter comprising cuprous chloride in aqueou acetonitride, acrylonitile or 2-hydroxycano-ethane, and its use in purifying copper salts |
EP0082015A1 (en) * | 1981-12-16 | 1983-06-22 | Konica Corporation | Method of forming an image with a photographic cuprous halide material |
US4904576A (en) * | 1987-07-31 | 1990-02-27 | Action Exploration Services | Photosensitive cuprous halide materials and methods for their preparation |
-
1990
- 1990-11-06 IE IE399490A patent/IE903994A1/en unknown
- 1990-11-07 KR KR1019900018118A patent/KR910009566A/ko not_active Application Discontinuation
- 1990-11-07 CA CA002029479A patent/CA2029479A1/en not_active Abandoned
- 1990-11-07 EP EP19900121264 patent/EP0427220A3/en not_active Withdrawn
- 1990-11-08 CN CN90109863A patent/CN1053134A/zh active Pending
- 1990-11-08 JP JP2301263A patent/JPH03240038A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0427220A2 (en) | 1991-05-15 |
EP0427220A3 (en) | 1992-05-27 |
CA2029479A1 (en) | 1991-05-09 |
IE903994A1 (en) | 1991-05-08 |
JPH03240038A (ja) | 1991-10-25 |
CN1053134A (zh) | 1991-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITB | Written withdrawal of application |