KR910007705B1 - Resin having sensitivity to light and method of making a flourescent screen pattern with the same - Google Patents

Resin having sensitivity to light and method of making a flourescent screen pattern with the same Download PDF

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KR910007705B1
KR910007705B1 KR1019880017340A KR880017340A KR910007705B1 KR 910007705 B1 KR910007705 B1 KR 910007705B1 KR 1019880017340 A KR1019880017340 A KR 1019880017340A KR 880017340 A KR880017340 A KR 880017340A KR 910007705 B1 KR910007705 B1 KR 910007705B1
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photosensitive resin
pure water
film pattern
fluorescent film
face
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KR1019880017340A
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KR900010868A (en
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정수민
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삼성전관 주식회사
김정배
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22Applying luminescent coatings
    • H01J9/227Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines

Abstract

A fluorescent film pattern is formed by coating a photosensitive resin compsn. on the face-interior surface of the color braun tube, light-exposing the fixed plate by the ultraviolet irradiation, disperse-adhering a fluorescent powder on the face-interior surface, and treating a fluorescent film pattern formed by washing the surface with boric acid water. The resin compsn. is composed of 3% polyvinyl pyrrolidone, 0.4% diazonium cpd., 75% pure water, 0.5-5% ethylene glycol, 0.5-5% urea, 0.5-5% acetamide, 0.5-10% butanediol, 0.5-5% paraaldehyde, 0.5-5% dioxane and 0.5-5% surfactant.

Description

감광성 수지 조성물 및 그것을 사용한 형광막 패턴형성 방법Photosensitive resin composition and fluorescent film pattern formation method using the same

제1a∼e도는 본 발명의 감광성수지 조성물을 사용한 형광막 패턴 형성과정을 설명하기 위한 도면이다.1A to 1E are views for explaining a process of forming a fluorescent film pattern using the photosensitive resin composition of the present invention.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

1 : 페이스(face) 2: 감광층1: face 2: photosensitive layer

3 : 새도우 마스크 4 : 형광체막3: shadow mask 4: phosphor film

5 : 형광막 패턴5: fluorescent film pattern

본 발명은 고감도의 감광성수지 조성물 및 그것을 사용한 칼라브라운관의 형광막 패턴 형성방법에 관한 것이다.The present invention relates to a highly sensitive photosensitive resin composition and a method for forming a fluorescent film pattern of a color brown tube using the same.

일반적으로 칼라브라운관에서 화면의 선명도는 적, 청, 녹 3색의 형광막 패턴이 얼마나 미세하고 정연하게 도트, 혹은 스트라이프 형상으로 화면부(face plate)의 내측면에 형성될 수 있는가에 죄우된다.In general, the clarity of the screen in the color CRT depends on how fine and square the fluorescent film pattern of three colors of red, blue, and green can be formed on the inner surface of the face plate in a dot or stripe shape.

이들 형광체가 페이스 내측면에서 소정의 패턴을 이루도록 도포하는 방법으로서는, 형광체가 혼합된 감광성수지 조성물을 이용하는 슬러리도포법과, 수은여기 자외선에 노광되어 다이조늄염이 분해되며 염화아연이 공기중의 수분을 흡수하여 접착성을 띠는 디아조늄염으로 된 감광제에 의해 드라이법에 있다.As a method of applying these phosphors to form a predetermined pattern on the inner surface of the face, a slurry coating method using a photosensitive resin composition in which phosphors are mixed, a mercury-excited ultraviolet ray is decomposed to decompose a dizonium salt, and zinc chloride absorbs moisture in the air. It is in the dry process by the photosensitive agent of the diazonium salt which absorbs and adheres.

또한 본 발명과 동일 출원인에 의한 것으로서 이들 양법의 단점을 보완한 대한민국 특허 공고번호 90-1601의 형광체 제조방법은, 순수 10∼50%(중량 %, 이하 동일), 폴리비닐알콜 5∼30%, 중크롬산염 0.05∼5%, 디에티렌글리콜 0.5∼5%, 에틸렌글리콜 0.5∼5%, 요소 0.5∼5%, 아세트아미드 0.5∼5%, 부탄디올 0.5∼10%, 파라알데히드 0.5∼5%, 디옥산 0.5∼5% 및 계면활성제 0.5∼5%의 감광성 수지 조성물을 페이스 내측면에 도포하고, 형광막 마스크를 통해 자외선을 조사하여 소정부위만을 노광시키고 이어서 페이스 내측면에 형광체 분말을 산포하여 노광부에 부착시키고, 비노광부의 형광체를 물로 제거한 후 붕산수로 처리하여 형광체 패턴을 수축 고착시키는 공정순으로 행해진다.In addition, the method of producing phosphors of Korean Patent Publication No. 90-1601, which is made by the same applicant as the present invention and supplements the disadvantages of these two methods, is 10 to 50% pure (by weight or less), 5 to 30% polyvinyl alcohol, Dichromate 0.05-5%, diethylene glycol 0.5-5%, ethylene glycol 0.5-5%, urea 0.5-5%, acetamide 0.5-5%, butanediol 0.5-10%, paraaldehyde 0.5-5%, dioxane A photosensitive resin composition of 0.5 to 5% and 0.5 to 5% of a surfactant is applied to the inner surface of the face, and ultraviolet rays are irradiated through a fluorescent film mask to expose only a predetermined portion, and then the phosphor powder is dispersed on the inner surface of the face to expose the exposed portion. It adheres, and removes the fluorescent substance of a non-exposed part with water, and processes with boric acid water, and shrinks and fixes a fluorescent substance pattern.

그러나 이와 같은 폴리비닐 알콜-중 크롬산염 성분의 감광성수지 조성물을 사용하여 형광막 패턴을 형성하는 종래의 방법에 의하면, 사용하는 감광성수지 성분의 감도 및 결정성이 낮아 노광시에 "포그(흐림)"현상이 나타나고 노광시간이 걸이질 수 밖에 없기 때문에, 브라운관 화면의 선명도를 좌우하는 형광막 패턴의 정연성 및 선명도는 떨어지며 작업시간 또한 길어진다는 문제점을 안고 있다.However, according to the conventional method of forming a fluorescent film pattern using such a photosensitive resin composition of polyvinyl alcohol-chromic acid component, the sensitivity and crystallinity of the photosensitive resin component to be used are low and "fog" during exposure. "Because the phenomenon appears and the exposure time can only be taken, the neatness and sharpness of the fluorescent film pattern which determines the clarity of the CRT screen is inferior and the working time is also long.

따라서, 본 발명의 제1목적은 정연하고 선명한 형광막 패턴형성을 위한 고감도의 감광성수지 조성물을 제공함에 있다.Accordingly, a first object of the present invention is to provide a highly sensitive photosensitive resin composition for forming a square and clear fluorescent film pattern.

본 발명의 제2목적은 상기한 고감도의 감광성수지 조성물을 사용한, 정연하고 선명한 형광막 패턴형성 방법을 제공함에 있다.A second object of the present invention is to provide a method for forming a square and clear fluorescent film pattern using the above-described highly sensitive photosensitive resin composition.

상기 제1목적을 달성하기 위해 본 발명은 소정의 감광성 수지 성분 및 순수와 디에틸렌글리콜 0.5∼5%, 에틸렌글리콜 0.5∼5%, 요소 0.5∼5%, 아세트아미드 0.5∼5%, 부탄디올 0.5∼10%, 파라알데히드 0.5∼5%, 디옥산 0.5∼5% 및 계면활성제 0.5∼5%를 함유한 감광성수지 조성물에 있어서, 상기 조성물의 감광성수지 성분으로서 폴리비닐알콜과 중크롬산염 대신에 폴리비닐 피롤리돈 3% 및 디아조늄화합물 0.4%를 사용하고 순수의 함량을 75%로 하거나, 또는 디아세톤 아크릴아미드화 폴리비닐알콜 2% 및 중크롬산염 0.06%를 사용하고 순수의 함량을 72%로 조성함을 특징으로 한다.In order to achieve the first object, the present invention provides a predetermined photosensitive resin component and 0.5-5% of diethylene glycol with pure water, 0.5-5% of ethylene glycol, 0.5-5% of urea, 0.5-5% of acetamide, and 0.5-5 of butanediol. A photosensitive resin composition containing 10%, 0.5-5% of paraaldehyde, 0.5-5% of dioxane, and 0.5-5% of a surfactant, wherein polyvinyl pi is used instead of polyvinyl alcohol and dichromate as a photosensitive resin component of the composition. Using 3% of ralidone and 0.4% of diazonium compound and 75% of pure water, or 2% of diacetone acrylamide polyvinyl alcohol and 0.06% of dichromate and 72% of pure water It is characterized by.

상기 제2목적을 달성하기 위해서 본 발명는 칼라브라운관의 적, 청, 녹 형광막 패턴을 형성함에 있어서, 폴리비닐 피롤리돈 3%, 디아조늄화합물 0.4% 및 순수 75%, 또는 디아세톤 아크릴아미드화 폴리비닐알콜 2%, 중크롬산염 0.06%, 디에틸렌글리콜 0.5∼5%, 에틸렌글리콜 0.5∼5%, 요소 0.5∼5%, 아세트아미드 0.5∼5%, 부탄디올 0.5∼10%, 파라알데히드 0.5∼5%, 디옥산 0.5∼5% 및 계면활성제 0.5∼5%를 함유하여 조성된 감광성수지 조성물을 칼라브라운관의 페이스 내측면에 도포, 건조하고, 새도우마스크를 통해 자외선을 조사하여 소정부위만을 노광시키고, 이어서 페이스 내측면에 형광체 분말을 산포부착하고, 순수로 페이스 내측면을 세정하여 형성되는 패턴을 붕산수로 처리하여 수축고착시킴을 특징으로 한다.In order to achieve the second object of the present invention, in forming a red, blue, and green fluorescent film pattern of a color brown tube, polyvinyl pyrrolidone 3%, diazonium compound 0.4% and pure water 75%, or diacetone acrylamide Polyvinyl alcohol 2%, dichromate 0.06%, diethylene glycol 0.5-5%, ethylene glycol 0.5-5%, urea 0.5-5%, acetamide 0.5-5%, butanediol 0.5-10%, paraaldehyde 0.5-5 %, Dioxane 0.5-5% and surfactant 0.5-5% of the photosensitive resin composition is applied to the inner surface of the face of the color brown tube, dried, and irradiated with ultraviolet rays through a shadow mask to expose only a predetermined portion, Subsequently, the phosphor powder is deposited on the inner surface of the face, and the pattern formed by washing the inner surface of the face with pure water is contracted and fixed by treating with boric acid water.

이하 본 발명을 실시예 및 도면을 참조하여 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to Examples and drawings.

[실시예 1]Example 1

먼저, 본 발명의 고감도 감광성수지 조성물은 빛의 조사에 의한 광가교특성과 결정성을 갖는 불용성 폴리비닐 피롤리돈과, 상기 폴리비닐 피롤리돈과 산화반응하여 감광성을 유지시켜주는 디아조늄 화합물을 각각 3%, 0.4% 함유한 감광성수지 성분과 순수 75%, 건조성 및 결정성을 주는 가소제로서 디에틸렌글리콜, 에틸렌글리콜, 요소, 아세트아미드를 각각 0.5∼5%, 부탄디올 0.5∼10%, 파라알데히드 및 디옥산을 각각 0.5∼5%, 그리고 계면활성제 0.5∼5% 함유하고 있다.First, the high-sensitivity photosensitive resin composition of the present invention is an insoluble polyvinyl pyrrolidone having photocrosslinking properties and crystallinity by irradiation of light and a diazonium compound which maintains photosensitivity by oxidizing with the polyvinyl pyrrolidone. 3% and 0.4% of the photosensitive resin component, 75% of pure water, and a plasticizer giving dryness and crystallinity, respectively 0.5-5% of diethylene glycol, ethylene glycol, urea and acetamide, 0.5-10% of butanediol, and para It contains 0.5 to 5% of aldehyde and dioxane and 0.5 to 5% of surfactant, respectively.

상기한 성분의 조성비로 이루어진 본 발명의 감광성수지 조성물의 조성과정은, 실온에서 순수와 폴리비닐 피롤리돈 및 디아조늄화합물을 계속 교반하면서 디에틸렌글리콜과 에틸렌글리콜을 넣은 후 약 10분 정도 교반하여 잘 혼합한 다음, 요소, 아세트아미드, 부탄디올을 차례로 첨가하고, 계속 교반하면서 파라알데히드와 디옥산을 섞고 계면활성제를 투입하여 행하는데 상기 과정을 거쳐 조성된 조성물을 400메쉬로 여과하여 사용한다.The composition process of the photosensitive resin composition of the present invention consisting of the composition ratio of the above components, after stirring the pure water and polyvinyl pyrrolidone and diazonium compound at room temperature while adding diethylene glycol and ethylene glycol for about 10 minutes After mixing well, urea, acetamide and butanediol are added sequentially, followed by mixing paraaldehyde and dioxane while continuing stirring and adding a surfactant. The composition obtained through the above process is filtered through 400 mesh.

다음으로 상기와 같은 과정을 거쳐 조성된 감광성수지 조성물을 사용하여 형광막 패턴을 형성하는 방법을 제1도를 참조하여 상세히 설명한다.Next, a method of forming a fluorescent film pattern using the photosensitive resin composition prepared through the above process will be described in detail with reference to FIG. 1.

(a)는 감광층(2) 형성단계로서, 칼라브라운관 페이스(1)의 내측면에 상기한 감광성수지 조성물을 도포하여 형성한다.(a) is a step of forming the photosensitive layer 2, and is formed by applying the above-described photosensitive resin composition to the inner surface of the color-brown tube face (1).

(b)는 노광단계로서, (a)단계에서 형성, 건조된 감광층(2)위에 새도우 마스크(3)를 장착하고 자외선을 조사한다. 이때 자외선 조사위치는 형광체가 고착되어야 할 위치에 상당한다. 이와 같이 새도우 마스크(3)의 구멍을 통해 자외선이 조사된 첫째색의 노광부위는 점착성과 물에 대한 불용성을 가지게 된다.(b) is an exposure step, and the shadow mask 3 is mounted on the photosensitive layer 2 formed and dried in step (a) and irradiated with ultraviolet rays. At this time, the ultraviolet irradiation position corresponds to the position where the phosphor should be fixed. As described above, the first color exposed portion irradiated with ultraviolet rays through the hole of the shadow mask 3 has adhesiveness and insoluble to water.

(c)는 형광체막 형성단계로서, 첫째색의 형광체 분말을 분사법 혹은 슬라이딩법으로 분사하여 형광체막(4)을 형성한다.(c) is a phosphor film forming step, and the phosphor film 4 is formed by spraying the phosphor powder of the first color by the spraying method or the sliding method.

(d)는 세정단계로서, 순수로 세정하면 (b)의 노광단계에서 자외선이 조사된 노광부위의 불용성에 의하여 형광체 분말이 부착된 노광부위 역시 불용화되므로 노광부위 이외의 형광체 분말은 제거되어 형광막 패턴이 형성된다.(d) is a washing step. When washing with pure water, the exposed part to which the phosphor powder is attached is also insoluble due to the insolubility of the exposed part irradiated with ultraviolet rays in the exposing step of (b). A film pattern is formed.

(e)는 붕산염처리 단계로서, (c)의 세정단계에서 형성되는 첫째색의 형광막 패턴(5)을 붕산수로 처리하여 형광막 패턴(5)을 수축 고착시킨다.(e) is a borate treatment step, in which the fluorescent film pattern 5 of the first color formed in the washing step of (c) is treated with boric acid water to shrink and fix the fluorescent film pattern 5.

둘째 및 셋째색의 형광막 패턴은 상기의 (a)-(e)단계를 동일한 과정으로 반복하여 형성한다.The second and third color fluorescent film patterns are formed by repeating steps (a) to (e) in the same process.

[실시예 2]Example 2

[실시예 1]의 조성물에서 다른 성분은 그대로 하고 감광성 수지 성분인 폴리비닐 피롤리돈 및 디아조늄화합물만을 디아세톤 아크릴아미드화 폴리비닐알콜 2%와 중크롬산염 0.06%으로 대체하여 조성한 감광성수지 조성물을 사용하여 [실시예 1]에서와 동일하게 실시하여 형광막 패턴을 형성한다.The photosensitive resin composition prepared by replacing the other components in the composition of [Example 1] with only polyvinyl pyrrolidone and a diazonium compound of photosensitive resin components with diacetone acrylamide polyvinyl alcohol 2% and dichromate 0.06% Using the same procedure as in [Example 1], a fluorescent film pattern was formed.

상기 실시예 1 및 2에서 얻은 형광막 패턴을, 종래의 감광성 수지 조성물을 사용한 형광막 패턴과 비교하여 노광감도 및 노광 시간을 측정한 결과를 [표 1]에 나타내었다.Table 1 shows the results of measuring the exposure sensitivity and the exposure time by comparing the fluorescent film patterns obtained in Examples 1 and 2 with the fluorescent film pattern using the conventional photosensitive resin composition.

[표 1]TABLE 1

Figure kpo00002
Figure kpo00002

1. 동일조도에서 종래의 방법을 100으로 하였을 때의 비교값.1. Comparison value when the conventional method is 100 in the same illuminance.

2. 동일조도에서 종래의 방법으로 노광했을 때 일정패턴의 폭이 되는 시간을 100으로 하였을 때의 비교값.2. The comparison value when the time which becomes the width | variety of a fixed pattern is 100 when exposed by the conventional method in the same illuminance.

이상 설명한 바와 같이 본 발명의 고감도 감광성수지 조성물을 사용하여 형성된 형광막 패턴은 종래의 조성물을 이용한 것에 비해 정연성 및 선명도가 현저히 뛰어나 고화질의 칼라브라운관을 제공하여 줄 뿐만 아니라 노광감도가 향상되어 노광시간이 감소되므로 작업시간을 줄일 수 있는 잇점이 있다.As described above, the fluorescent film pattern formed by using the high-sensitivity photosensitive resin composition of the present invention is significantly superior in neatness and clarity as compared with the conventional composition, thereby providing a high-quality color brown tube, as well as improving the exposure sensitivity, thereby increasing exposure time. There is an advantage in that the working time can be reduced since it is reduced.

Claims (2)

소정의 감광성수지 성분 및 순수와 디에틸렌글리콜 0.5∼5%, 에틸렌글리콜 0.5∼5%, 요소 0.5∼5%, 아세트아미드 0.5∼5%, 부탄디올 0.5∼10%, 파라알데히드 0.5∼5%, 디옥산 0.5∼5% 및 계면활성제 0.5∼5%를 함유한 감광성수지 조성물에 있어서, 상기 조성물의 감광성수지 성분으로서 폴리비닐 피롤리돈 3% 및 디아조늄화합물 0.4%를 사용하고 순수의 함량을 75%로 하거나, 또는 디아세톤 아크릴 아미드화 폴리비닐 알콜 2% 및 중크롬산염 0.06%를 사용하고 순수의 함량을 72%로 조성함을 특징으로 하는 감광성수지 조성물.Predetermined photosensitive resin component and pure water and diethylene glycol 0.5-5%, ethylene glycol 0.5-5%, urea 0.5-5%, acetamide 0.5-5%, butanediol 0.5-10%, paraaldehyde 0.5-5%, di In the photosensitive resin composition containing 0.5 to 5% of oxane and 0.5 to 5% of a surfactant, 3% of polyvinyl pyrrolidone and 0.4% of diazonium compound are used as the photosensitive resin component of the composition, and the content of pure water is 75%. Or 2% diacetone acrylamide polyvinyl alcohol and 0.06% dichromate, and the content of pure water is 72%. 칼라브라운관의 적, 청, 녹 형광막 패턴형성 방법에 있어서, 폴리비닐 피롤리돈 3%, 디아조늄화합물 0.4%, 순수 75% 또는, 디아세톤 아크릴 아미드화 폴리비닐 알콜 2%, 중크롬산염 0.06%, 순수 72%와 디에틸렌 글리콜 0.5∼5%, 에틸렌글리콜 0.5∼5%, 요소 0.5∼5%, 아세트아미드 0.5∼5%, 부탄디올 0.5∼10%, 파라알데히드 0.5∼5%, 디옥산 0.5∼5% 및 계면활성제 0.5∼5%를 함유하여 조성된 감광성 수지 조성물을 칼라브라운관의 페이스 내측면에 도포 건조하고, 새도우 마스크를 통해 자외선을 조사하여 소정부위만을 노광시키고, 이어서 페이스 내측면에 형광체 분말을 산포 부착하고, 순수로 페이스 내측면을 세정하여 형성되는 형광막 패턴을 붕산수로 처리하여 수축고착시킴을 특징으로 하는 형광막 패턴 형성방법.In the red, blue, and green fluorescent film pattern formation method of a color-brown tube, polyvinyl pyrrolidone 3%, diazonium compound 0.4%, pure water 75%, or diacetone acrylamide polyvinyl alcohol 2%, dichromate 0.06% , 72% pure water and 0.5-5% diethylene glycol, 0.5-5% ethylene glycol, 0.5-5% urea, 0.5-5% acetamide, 0.5-10% butanediol, 0.5-5% paraaldehyde, 0.5-5% dioxane The photosensitive resin composition containing 5% and 0.5 to 5% of the surfactant is applied to the face inner surface of the color brown tube and dried, and irradiated with ultraviolet rays through a shadow mask to expose only a predetermined portion, and then the phosphor powder on the face inner surface. The method of forming a fluorescent film pattern, characterized in that to form a shrinkage, and to clean the inner surface of the face with a pure water treatment by shrinking and fixing the fluorescent film pattern with boric acid.
KR1019880017340A 1988-12-23 1988-12-23 Resin having sensitivity to light and method of making a flourescent screen pattern with the same KR910007705B1 (en)

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