KR900010868A - Photosensitive resin composition and fluorescent film pattern formation method using the same - Google Patents

Photosensitive resin composition and fluorescent film pattern formation method using the same Download PDF

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Publication number
KR900010868A
KR900010868A KR1019880017340A KR880017340A KR900010868A KR 900010868 A KR900010868 A KR 900010868A KR 1019880017340 A KR1019880017340 A KR 1019880017340A KR 880017340 A KR880017340 A KR 880017340A KR 900010868 A KR900010868 A KR 900010868A
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KR
South Korea
Prior art keywords
photosensitive resin
resin composition
pure water
film pattern
fluorescent film
Prior art date
Application number
KR1019880017340A
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Korean (ko)
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KR910007705B1 (en
Inventor
정수민
Original Assignee
김정배
삼성전관 주식회사
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Application filed by 김정배, 삼성전관 주식회사 filed Critical 김정배
Priority to KR1019880017340A priority Critical patent/KR910007705B1/en
Publication of KR900010868A publication Critical patent/KR900010868A/en
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Publication of KR910007705B1 publication Critical patent/KR910007705B1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22Applying luminescent coatings
    • H01J9/227Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines

Abstract

내용 없음No content

Description

감광성 수지 조성물 및 그것을 사용한 형광막 패턴 형성방법Photosensitive resin composition and fluorescent film pattern formation method using the same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도 (가)~(마)는 본 발명의 감광성수지 조성물을 사용한 형광막 패턴 형성과정을 설명하기 위한 도면이다.1 (a) to (e) are views for explaining a process of forming a fluorescent film pattern using the photosensitive resin composition of the present invention.

Claims (4)

소정의 감광성수지 성분 및 순수와 요소 0.5-5%, 계면활성제 0.5-5%, 아세트아미드 0.5-5%, 에틸렌글리콜 0.5-5%, 파라알데히드 0.5-5%, 디옥산 0.5-5%, 디에틸렌 글리콜 0.5-10%, 부탄디올 0.5-10%를 함유한 감광성수지 조성물에 있어서, 상기 조성물의 감광성수지 성분으로서 폴리비닐 피톨리돈과 디아지드화물의 혼합물 또는 디아세톤 아크릴 아미드화 폴리비닐 알콜과 중크롬산염의 혼합물 중의 어느 하나로 이루어짐을 특징으로 하는 감광성 수지 조성물.Predetermined photosensitive resin components and pure water and urea 0.5-5%, surfactant 0.5-5%, acetamide 0.5-5%, ethylene glycol 0.5-5%, paraaldehyde 0.5-5%, dioxane 0.5-5%, di A photosensitive resin composition containing 0.5-10% of ethylene glycol and 0.5-10% of butanediol, wherein as a photosensitive resin component, a mixture of polyvinyl phytolidone and diazide or a diacetone acrylamide polyvinyl alcohol and dichromate The photosensitive resin composition characterized by consisting of any one of the mixtures. 제1항에 있어서, 감광성 수지 성분으로 사용되는 폴리 비닐 필롤리돈, 디아지드화물과 순수의 중량비가 3%, 0.04%, 75%인 것을 특징으로 하는 감광성수지 조성물.The photosensitive resin composition according to claim 1, wherein the weight ratio of polyvinyl pyrrolidone, diazide and pure water used as the photosensitive resin component is 3%, 0.04%, and 75%. 제1항에 있어서, 감광성 수지 조성물로서 사용되는 디아세톤 아크릴 아미드화 폴리비닐 알콜, 중크롬삼염과 순수의 중량비가 20%, 0.06, 72% 인것을 특징으로 하는 감광성 수지 조성물.The photosensitive resin composition according to claim 1, wherein the weight ratio of diacetone acrylamide amidated polyvinyl alcohol, dichromic trichloride and pure water used as the photosensitive resin composition is 20%, 0.06, 72%. 칼라 브라운관의 적, 청, 녹 형광막 패턴형성 방법에 있어서, 폴리비닐 피롤리드 3% 디아지드 화물 0.4% 순수 75% 또는, 디아세톤 아크릴 아미드화 폴리비닐 알콜 2%, 중크롬산염 0.06%, 순수 72%와 요소 0.5% 계면활성제 0.5-5%, 아세트아미드 0.5-5%, 디옥산 0.5-5%, 디에틸렌 글리콜 0.5-10%로 조성된 감광성 수지 조성물을 칼라 브라운관의 페이스 내측면에 도포 건조하고 새도우 마스크를 통해 자외선을 조사하여 소정부위만을 노광 시키고, 이어서 페이스 내측면에 형광체 분말을 산포부착하고, 순수로 페이스 내측면을 세정하여 형성되는 형광막 패턴을 붕산수로 처리하여 수축고착 시킴을 특징으로 하는 형광막 패턴 형성방법.In red, blue and green fluorescent film pattern formation method of color CRT, polyvinyl pyrrolid 3% diazide 0.4% pure 75% or diacetone acrylamide polyvinyl alcohol 2%, dichromate 0.06%, pure water 72 The photosensitive resin composition composed of% and urea 0.5% surfactant 0.5-5%, acetamide 0.5-5%, dioxane 0.5-5%, diethylene glycol 0.5-10% was applied and dried on the inner surface of the face of the color CRT. Ultraviolet rays are irradiated through a shadow mask to expose only a predetermined portion, and then the phosphor powder is deposited on the inner surface of the face, and the phosphor film pattern formed by washing the inner surface of the face with pure water is shrink-fixed by treating with boric acid. A method of forming a fluorescent film pattern. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019880017340A 1988-12-23 1988-12-23 Resin having sensitivity to light and method of making a flourescent screen pattern with the same KR910007705B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019880017340A KR910007705B1 (en) 1988-12-23 1988-12-23 Resin having sensitivity to light and method of making a flourescent screen pattern with the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019880017340A KR910007705B1 (en) 1988-12-23 1988-12-23 Resin having sensitivity to light and method of making a flourescent screen pattern with the same

Publications (2)

Publication Number Publication Date
KR900010868A true KR900010868A (en) 1990-07-09
KR910007705B1 KR910007705B1 (en) 1991-09-30

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Application Number Title Priority Date Filing Date
KR1019880017340A KR910007705B1 (en) 1988-12-23 1988-12-23 Resin having sensitivity to light and method of making a flourescent screen pattern with the same

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KR910007705B1 (en) 1991-09-30

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