KR890016653A - Anti-reflective coating method of A1 layer - Google Patents

Anti-reflective coating method of A1 layer Download PDF

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Publication number
KR890016653A
KR890016653A KR1019880004895A KR880004895A KR890016653A KR 890016653 A KR890016653 A KR 890016653A KR 1019880004895 A KR1019880004895 A KR 1019880004895A KR 880004895 A KR880004895 A KR 880004895A KR 890016653 A KR890016653 A KR 890016653A
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KR
South Korea
Prior art keywords
layer
coating method
reflective coating
microseconds
sputter
Prior art date
Application number
KR1019880004895A
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Korean (ko)
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KR960009098B1 (en
Inventor
김응석
Original Assignee
이만용
금성 반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 이만용, 금성 반도체 주식회사 filed Critical 이만용
Priority to KR1019880004895A priority Critical patent/KR960009098B1/en
Publication of KR890016653A publication Critical patent/KR890016653A/en
Application granted granted Critical
Publication of KR960009098B1 publication Critical patent/KR960009098B1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음No content

Description

Al 층상의 반사방지 코팅방법Anti-Layer Coating Method on Al Layer

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 1 도는 본 발명에따른 공정을 나타낸 도면. 제 2 도는 본 발명의 일실시태양을 나타낸 도면. 제 3 도는 Al 층상에 방사방지막을 부착시키지 않은 경우의 실시태양을 나타낸 도면이다.1 shows a process according to the invention. 2 is a diagram showing an embodiment of the present invention. 3 is a view showing an embodiment when no anti-radiation film is attached on the Al layer.

Claims (2)

웨이퍼상의 A1층에 Ta.Six을 약150Å정도로 스퍼터링 증착시키는 Al층상의 반사방지 코팅방법.Anti-reflective coating method on Al layer which sputter-deposits Ta.Six to about 150 microseconds to A1 layer on a wafer. 제 1 항에 있어서 X가 0.5내지 5 인 코팅방법.The coating method according to claim 1, wherein X is 0.5-5. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019880004895A 1988-04-29 1988-04-29 Semiconductor device wiring method KR960009098B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019880004895A KR960009098B1 (en) 1988-04-29 1988-04-29 Semiconductor device wiring method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019880004895A KR960009098B1 (en) 1988-04-29 1988-04-29 Semiconductor device wiring method

Publications (2)

Publication Number Publication Date
KR890016653A true KR890016653A (en) 1989-11-29
KR960009098B1 KR960009098B1 (en) 1996-07-10

Family

ID=19273970

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880004895A KR960009098B1 (en) 1988-04-29 1988-04-29 Semiconductor device wiring method

Country Status (1)

Country Link
KR (1) KR960009098B1 (en)

Also Published As

Publication number Publication date
KR960009098B1 (en) 1996-07-10

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