KR890008343A - 피복제품 및 이의 생산 방법 - Google Patents

피복제품 및 이의 생산 방법 Download PDF

Info

Publication number
KR890008343A
KR890008343A KR1019880015060A KR880015060A KR890008343A KR 890008343 A KR890008343 A KR 890008343A KR 1019880015060 A KR1019880015060 A KR 1019880015060A KR 880015060 A KR880015060 A KR 880015060A KR 890008343 A KR890008343 A KR 890008343A
Authority
KR
South Korea
Prior art keywords
substrate
coated
coating
product
coated article
Prior art date
Application number
KR1019880015060A
Other languages
English (en)
Other versions
KR960015223B1 (ko
Inventor
씨.커스터 러셀
레지스터 아놀드
존콕 아네트
제이. 휴겐 스테판
버크하트 로버트
딘 케빈
Original Assignee
알렉산더 골드스테인
오보닉 신써틱 머티어리얼즈 컴퍼니, 아이엔씨.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 알렉산더 골드스테인, 오보닉 신써틱 머티어리얼즈 컴퍼니, 아이엔씨. filed Critical 알렉산더 골드스테인
Publication of KR890008343A publication Critical patent/KR890008343A/ko
Application granted granted Critical
Publication of KR960015223B1 publication Critical patent/KR960015223B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)

Abstract

내용 없음

Description

피복제품 및 이의 생산 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 피복물을 기판에 도모하기 위한 마이크로파 진공 증착 시스템의 부분적인 가상도이다.
제2도는 본 발명의 피복제품을 만들기 위한 마이크로파 플라즈마를 이용한 CVD 방법의 계통도이다.
제3도는 본 발명의 피복제품을 만들기 위한 고주파 플라즈마를 이용한 CVD 방법의 계통도이다.

Claims (13)

  1. 실란, 알켄 및 산소원료의 알켄-실란 플라즈마 반응생성물을 플라즈마를 이용한 화학 증착법으로 침적시키는 것을 특징으로 하는 : (a) 기판(221) : 및 (b)이 기판위에 있는 실제로 무정형인 접착성이 있고 내마모성이 있는 투명한 피복물(231)로 구성된 피복제품(201).
  2. 제1항에 있어서, 피복물의 두께가 2-5미크론 일때 가스스팩트럼에서 측정한 투과율이 89%인 피복제품(201).
  3. 제1항에 있어서, 피복물의 두께가 2-5미크론 일때 380나모미터 파장에서의 투과율이 20%인 피복제품(201).
  4. 제1항에 있어서, 기판이 중합체 기판인 피복제품(201).
  5. 제4항에 있어서, 기판(221)이 폴리아크릴레이트, 폴리카보네이트, 폴리(알릴 카보네이트), 폴리(아크릴레이트), 폴리(에스테르) 및 폴리우레탄으로 구성된 그룹으로 부터 선택된 중합체인 피복제품(201).
  6. 제1항에 있어서, 피복된 제품의 기판이 금속성 기판 또는 반도체 기판인 피복제품(201).
  7. 제1항에 있어서, 피복된 제품이 플라스틱 제1기판위에 금속성 테입인 제2기판이 얹혀있는 것으로 이루어진 피복제품(201).
  8. 제7항에 있어서, 금속성 테입인 제1기판이 자석매체인 피복제품(201).
  9. 제6항에 있어서, 제1금속 기판이 연질 금속 기판인 피복제품(201).
  10. 제6항에 있어서, 반도체 기판이 무정형실리콘으로 구성된 피복제품(201).
  11. 제1항에 있어서, 기판(221)이 유리기판인 피복제품(201).
  12. 제1항에 있어서, 피복물이 (a) 피복할 기판(101)을 진공 챔버(1)에 넣고 : (b) 최소한 하나의 불포화 탄화수소, 최소한 하나의 실란과 최소한 하나의 산소원료로 구성된 침적용 기체를 집어넣은 뒤 : (C) 플라즈마를 만들어 기판과 접촉시켜 기체를 분해하고 실란, 불포화 탄화수소 및 산소원료의 반응생성물을 기판위에 증착시키는 : 것으로 구성된 방법으로 제조하는 피복제품(201).
  13. 제11항에 있어서, 중착용 가스에 불활성 기체가 더 포함된 피복제품(201).
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880015060A 1987-11-16 1988-11-16 피복제품 및 이의 생산 방법 KR960015223B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US121,019 1987-11-16
US07/121,019 US4783374A (en) 1987-11-16 1987-11-16 Coated article and method of manufacturing the article

Publications (2)

Publication Number Publication Date
KR890008343A true KR890008343A (ko) 1989-07-10
KR960015223B1 KR960015223B1 (ko) 1996-11-04

Family

ID=22393970

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880015060A KR960015223B1 (ko) 1987-11-16 1988-11-16 피복제품 및 이의 생산 방법

Country Status (7)

Country Link
US (1) US4783374A (ko)
EP (1) EP0317134B1 (ko)
JP (1) JPH01159380A (ko)
KR (1) KR960015223B1 (ko)
AT (1) ATE92978T1 (ko)
CA (1) CA1329567C (ko)
DE (1) DE3883165T2 (ko)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3838905A1 (de) * 1988-11-17 1990-05-31 Knut Dipl Phys Dr Enke Kratzfester gebrauchsgegenstand, verfahren zu seiner herstellung sowie vorrichtung zur durchfuehrung dieser verfahren
US5231048A (en) * 1991-12-23 1993-07-27 United Solar Systems Corporation Microwave energized deposition process wherein the deposition is carried out at a pressure less than the pressure of the minimum point on the deposition system's paschen curve
US5846649A (en) * 1994-03-03 1998-12-08 Monsanto Company Highly durable and abrasion-resistant dielectric coatings for lenses
US5618619A (en) * 1994-03-03 1997-04-08 Monsanto Company Highly abrasion-resistant, flexible coatings for soft substrates
DE19625534A1 (de) * 1996-06-26 1998-01-02 Hoechst Ag Kratzfest beschichtete Platte aus einem kristallisierbaren Thermoplast
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
US6421417B1 (en) 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
AU2001247975A1 (en) * 2000-02-18 2001-08-27 University Of Cincinnati Plasma polymerized primers for metal pretreatment
US6577802B1 (en) * 2000-07-13 2003-06-10 Corning Incorporated Application of silane-enhanced adhesion promoters for optical fibers and fiber ribbons
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
US7169489B2 (en) 2002-03-15 2007-01-30 Fuelsell Technologies, Inc. Hydrogen storage, distribution, and recovery system
US20030234010A1 (en) * 2002-06-25 2003-12-25 Redmond Scott D. Methods and apparatus for converting internal combustion engine (ICE) vehicles to hydrogen fuel
US7011768B2 (en) * 2002-07-10 2006-03-14 Fuelsell Technologies, Inc. Methods for hydrogen storage using doped alanate compositions
US20040065171A1 (en) 2002-10-02 2004-04-08 Hearley Andrew K. Soild-state hydrogen storage systems
JP3840170B2 (ja) * 2002-10-11 2006-11-01 外男 林 金属蒸着加工レンズの製造方法
US6905773B2 (en) * 2002-10-22 2005-06-14 Schlage Lock Company Corrosion-resistant coatings and methods of manufacturing the same
US7867627B2 (en) 2004-12-13 2011-01-11 Silcotek Corporation Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures
GB0505517D0 (en) * 2005-03-17 2005-04-27 Dupont Teijin Films Us Ltd Coated polymeric substrates
US20090104460A1 (en) * 2006-10-31 2009-04-23 Gary Barone Silicon-based decorative coatings
KR100791557B1 (ko) * 2006-11-03 2008-01-04 선우에이엠씨주식회사 플라스틱-금속박막 필름 및 그 제조방법
DE102008028537B4 (de) 2008-06-16 2012-11-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden einer Kratzschutzbeschichtung auf einem Kunststoffsubstrat
FR3007678B1 (fr) 2013-06-28 2015-07-31 Essilor Int Procede de fabrication d'une lentille ophtalmique comportant une etape de marquage laser pour realiser des gravures permanentes sur une surface de ladite lentille ophtalmique
DE102014118487A1 (de) 2014-12-12 2016-06-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden eines transparenten Mehrschichtsystems mit Kratzschutzeigenschaften
EP3680098A1 (de) 2019-01-11 2020-07-15 Carl Freudenberg KG Verbundmaterial mit haftvermittlerschicht auf basis von si, c und o

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0035146B1 (en) * 1980-02-15 1988-10-12 Matsushita Electric Industrial Co., Ltd. Semiconductor photoelectric device
US4465738A (en) * 1983-06-15 1984-08-14 Borg-Warner Corporation Wettable coatings for inorganic substrates
US4568614A (en) * 1984-06-27 1986-02-04 Energy Conversion Devices, Inc. Steel article having a disordered silicon oxide coating thereon and method of preparing the coating
US4837048A (en) * 1985-10-24 1989-06-06 Canon Kabushiki Kaisha Method for forming a deposited film
US4743662A (en) * 1986-11-03 1988-05-10 Dow Corning Corporation Infusible preceramic polymers via plasma treatment
US4777090A (en) * 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
ZA884511B (en) * 1987-07-15 1989-03-29 Boc Group Inc Method of plasma enhanced silicon oxide deposition

Also Published As

Publication number Publication date
DE3883165T2 (de) 1993-12-02
KR960015223B1 (ko) 1996-11-04
CA1329567C (en) 1994-05-17
JPH01159380A (ja) 1989-06-22
EP0317134B1 (en) 1993-08-11
US4783374A (en) 1988-11-08
EP0317134A3 (en) 1990-05-09
DE3883165D1 (de) 1993-09-16
ATE92978T1 (de) 1993-08-15
EP0317134A2 (en) 1989-05-24

Similar Documents

Publication Publication Date Title
KR890008343A (ko) 피복제품 및 이의 생산 방법
CA2241678C (en) Silicon dioxide deposition by plasma activated evaporation process
US8227984B2 (en) Barrier coatings
US5369722A (en) Optical inorganic waveguide with a substantially planar organic substrate
TW573298B (en) Method to produce a hybrid-disk and said hybrid-disk
EP0748260B2 (en) Ion beam process for deposition of highly abrasion-resistant coatings
US5888593A (en) Ion beam process for deposition of highly wear-resistant optical coatings
CA2156571A1 (en) Coated Substrate and Process for Its Formation
AR032859A1 (es) Recubrimiento hidrofilo fotoinducido y metodo de hacerlo
PT101159A (pt) Processo de revestimento de substratos de vidro
CN101233259A (zh) 沉积耐刮擦膜的方法
EP0299754A3 (en) Method of plasma enhanced silicon oxide deposition
ATE65803T1 (de) Ueberzogener gegenstand sowie verfahren zu seiner herstellung.
DE69533546D1 (de) Hochabriebfeste, flexible beschichtungen für weiche substrate
WO2001066820A1 (en) Diamond-like glass thin films
JPH05500069A (ja) 基材の保護被覆、型式ＳｉＣｘＮｙＯｚＨｔの化合物のプラズマ蒸着により基材を保護する方法、得られた被覆及び前記方法を実施する装置
JP3403219B2 (ja) 金属支持体表面に珪素含有沈着物を形成させる方法および金属支持体の耐蝕処理方法
DE59302657D1 (de) Verfahren zur Herstellung von Aufdampfmaterial für die Herstellung mittelbrechender optischer Schichten
CA2074331A1 (en) Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cycle siloxanes
SE9201827D0 (sv) Barriaerfilm samt foerfarande foer framstaellning daerav
NO973829L (no) Fremgangsmåte ved fremstilling av et beskyttende belegg på flaten av glass- eller keramiske varer
KR910020199A (ko) 폴리카보네이트 기판용 다층 피복물 및 그 제조방법
US5656363A (en) Layer construction with an organic layer and a transparent cover layer which is harder than the organic layer and process for its production
MY105070A (en) Surface priming of polycarbonate substrates
CN111378968A (zh) 一种防腐蚀纳米涂层及其等离子体制备方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
NORF Unpaid initial registration fee