KR850005843A - 치환된 헥사히드로 아릴퀴놀리진의 제조방법 - Google Patents

치환된 헥사히드로 아릴퀴놀리진의 제조방법 Download PDF

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KR850005843A
KR850005843A KR1019850000635A KR850000635A KR850005843A KR 850005843 A KR850005843 A KR 850005843A KR 1019850000635 A KR1019850000635 A KR 1019850000635A KR 850000635 A KR850000635 A KR 850000635A KR 850005843 A KR850005843 A KR 850005843A
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알. 후프 조엘
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제임스 에프. 노톤
머크 앤트캄파니 인코포레이티드
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Abstract

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Description

치환된 헥사히드로 아릴퀴놀리진의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (6)

  1. 하기 구조식 (Ⅱa)의 화합물을, 약 0℃ 내지 불활성 용매의 환류 온도에서 약 0.5내지 48시간동안 산 수용체의 존재하에 불활성 용매중에서 일반식 R4-X-할로의 아실화제로 처리시킴을 특징으로 하여 하기 일반식(Ⅰ)의 화합물을 제조하는 방법.
    상기식에서, Ar은 R1,R2벤조-[b] 푸로, R1,R2벤조-[b] 티에노-, 티에노-및 푸로-등으로부터 선택된 방향족 헤테로사이클을 나타내며;
    R1및 R2는 각각, 1) 수소, 2) 할로, 3) 히드록시, 4)C1-3알콕시, 또는, 5) C1-6알킬이며;
    R3는 1) 수소, 2)(여기서 R은 수소 또는 C1-3알킬이다), 3) 치환되지 않거나 또는 하나 이상의 하기의 것을 치환된 C1-6알킬이며; a) 히드록시, b) 카르복시, c) C1-3알콕시카르보닐, d) 할로, e) C1-3알콕시, f) -CONR6R7[여기서 R6및 R7은 동일하거나 다르며 수소 또는 C1-5알킬이거나 또는 함께 직접 결합하여 5내지 7의 환상(memberedring)을 형성하거나 또는 O,N, 및 S로 부터 선택된 헤테로원자를 통해 함께 결합되어, 부착되는 질소원자와 6-원 헤테로 사이클을 형성한다]또는 g) -NR6R7
    R4는 1) -OR8(여기서 R8은 수소 또는 치환되지 않거나 또는 하나이상의 a) OR, 또는 b) -NRCOR로 치환된 C1-6알킬이다), 2) -N(R8)2, 3) -CO2R8, 4) -CONR6R7, 5) 치환되지 않거나 또는 a) OR8b) 할로, c) CO2R8, d) CONR6R7등으로 치환된 C1-6알킬, 6) C2-5알켄일, 7) C2-5알킨일, 8) C3-6사이클로알킬, 9) N,O 및 S로 부터 선택된 헤테로원자 2개까지를 갖는 5 또는 6원 헤테로사이클 10) 치환되지 않거나 하나 이상의 a) 할로, 또는 b) OR로 치환되 탄소수 6내지 10의 카르보사이클 아릴이거나, 또는 R5는 1) 수소, 2) 치환되지 않거나 또는 하나 이상의 a) OR8b) -NR8COR8또는 c) CO2R8등으로 치환된 C1-6알킬 3) -CO2R8또는 4) -CONR6R7이며;
    R3및 R4는 직접 또는 O,N 및 S로부터 선택된 헤테로원자를 통해 함께 결합하여 부착되는 질소원자와 5 또는 6-원 헤테로사이클을 형성한다.
  2. 제1항에 있어서, Ar은 R1,R2-벤조[b] 푸로 또는 R1,R2-벤조[b] 티에노-이고; R1및 R2는 수소 또는 할로이며; R3는 C1-6알킬이고; X는 -SO2-이며, R4는 C1-6알킬, 디(C1-3알킬) 아미노, 할로-C1-6알킬, 히드록시-C1-6알킬, C2-5알켄일, C6-10카르보실 아릴, 5 또는 6-원 헤테로사이클, -CO2R8, C1-6알킬-CO2R8, 또는-C1-6알킬 -CONR6R7이며; R5는 수소 또는 C1-6알킬인 방법.
  3. 제2항에 있어서, R1및 R2는 수소이고, R3는 메틸이고, R4는 C1-6알킬, 히드록시-C1-6알킬, 디(C1-3알킬)아미노, 2-푸르푸릴, 또는 C1-3알콕시카르보닐 에틸이며 R5는 수소인 방법.
  4. 제3항에 있어서, Ar은 벤조[b] 푸로-이고 R3는 -CH3이고, X는 -SO2-이며 R4는 -CH2CH3, -N(CH3)2, -CH2CH2OR 또는 -CH2CH2CH2OR(여기서 R은 수소 또는 메틸이다)인 화합물을 제조하는 방법.
  5. 제1항에 있어서, N-(1,3,4,6,712ba-헥사히드로-2H-벤조[b] 푸로[2,3a]-퀴놀리진-2β-일)-N-메틸-2-히드록시에탄술폰 아미드; N-(1,3,4,6,7,12ba-헥사히드로-2H-벤조[b] 푸로[2,3a]-퀴놀리진-2β-일)-N-메틸-3-히드록시프로판술폰아미드; N-(1,3,4,6,7,12ba-헥사히드로-2H-벤조[b] 푸로[2,3a]-퀴놀리진-2β-일)-N-메틸-3-메탄술폰아미드; (+)-N-(1,3,4,6,7,12ba-헥사히드로-2H-벤조[b] 푸로-[2,3a]-퀴놀리진-2β-일)-N,N',N'-트리메틸술퍼아미드; N-(1,3,4,6,7,12ba-헥사히드로-2H-벤조[b]-티에닐-[2,3a]-퀴놀리진-2β-일)-N-메틸-메탄술폰아미드; 또는 이의 약리학적으로 허용되는 염을 제조하는 방법.
  6. 하기 구조식(1)의 화합물을 일반식 HOCH2CH-X-할로(여기서 X는 -CO-, -CS- 또는 SO2-이고 할로는 클로로, 브로모 또는 요오드이다)의 아실화제로 처리시키거나;
    하기 일반식(2)의 화합물을 ⅰ) R9이 -COR10, -CO2OH4Ar, 또는 -CO2R10일 때 알칼리 또는 산; ⅱ) R9이 -Si(R11)3일때 산; 또는 ⅲ) R9이 -CO2CH2Ar일때 가수소분해로 탈보호시키거나;
    하기 구조식(3)의 화합물을 SO2로 처리하고 이어서 산화에틸렌으로 처리하거나; 하기 일반식(4)의 화합물을 R9가 H 또는 -CO2CH2Ar일때 촉매적으로 수소화시키거나; 하기구조식(5)의 화합물을 환원시키거나; 하기 구조식(6)의 화합물을 환원시키거나;하기 구조식(7)의 화합물을 각각 강염기 또는 활성금속으로 처리하고 이어서 포름알데히드로 처리하거나; 하기 구조식(8)의 화합물을 환원시키거나; 하기 구조식(9)의 화합물을 환원시키거나; 하기 구조식(10)의 화합물을 환원시키거나; 하기 구조식(11)의 화합물을 환원시키거나; 하기 구조식(12)의 화합물을 환원시키거나; 하기 구조식(13)의 화합물을 환원시키거나; 하기구조식(14)의 화합물을 환원시키거나; 하기 구조식(15)의 화합물을 환원시키거나; 하기 일반식(16)의 화합물을 가열시키거나; 하기 구조식(17)의 화합물을로 처리하거나; 하기 구조식(18)의 화합물을 PPA, POCl3또는 HCl로 처리하거나; 하기 구조식(19)의 화합물을 산 촉매전위 반응시킴을 특징으로 하여 하기 구조식(I')의 화합물을 제조하는 방법.
    상기식(2)에서 R9은 -COR10, -CO2CH2Ar, -CO2R10또는 -Si(R11)3이며, 상기식(7)에서 R12는 수소 또는 할로이다.
     ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850000635A 1984-02-02 1985-02-01 치환된 헥사히드로 아릴퀴놀리진 및 이의 제조방법 KR900003651B1 (ko)

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IL74147A (en) 1988-08-31
NZ210982A (en) 1988-04-29
GR850211B (ko) 1985-05-24
EP0154142A1 (en) 1985-09-11
ATE44529T1 (de) 1989-07-15
IL74147A0 (en) 1985-04-30
KR900003651B1 (ko) 1990-05-28
ZA85789B (en) 1986-09-24
CA1240677A (en) 1988-08-16
ES8609323A1 (es) 1986-07-16
ES539799A0 (es) 1986-07-16
AU3822085A (en) 1985-08-08
DE3571438D1 (en) 1989-08-17
PT79871A (en) 1985-02-01
DK45385D0 (da) 1985-02-01
EP0154142B1 (en) 1989-07-12
AU576550B2 (en) 1988-09-01
IE850253L (en) 1985-08-02
JPS60188385A (ja) 1985-09-25
DK45385A (da) 1985-09-18
PT79871B (en) 1986-12-15

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