KR850002110A - Vacuum Thin Film Forming Apparatus - Google Patents

Vacuum Thin Film Forming Apparatus Download PDF

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Publication number
KR850002110A
KR850002110A KR1019840004043A KR840004043A KR850002110A KR 850002110 A KR850002110 A KR 850002110A KR 1019840004043 A KR1019840004043 A KR 1019840004043A KR 840004043 A KR840004043 A KR 840004043A KR 850002110 A KR850002110 A KR 850002110A
Authority
KR
South Korea
Prior art keywords
thin film
forming apparatus
film forming
work piece
vacuum thin
Prior art date
Application number
KR1019840004043A
Other languages
Korean (ko)
Other versions
KR890004617B1 (en
Inventor
미쓰그 에노모도 (외 1)
Original Assignee
야마쟈기 로꾸야
시티즌 도께이 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 야마쟈기 로꾸야, 시티즌 도께이 가부시끼가이샤 filed Critical 야마쟈기 로꾸야
Publication of KR850002110A publication Critical patent/KR850002110A/en
Application granted granted Critical
Publication of KR890004617B1 publication Critical patent/KR890004617B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음No content

Description

진공박막형성장치(眞空薄膊形成裝置)Vacuum Thin Film Forming Apparatus

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제4도는 본 발명의 실시예에 의한 치구의 요부를 나타낸 사시도. 제5도는 동지지축의 로울러에의 삽착단부를 나타낸 사시도. 제6도는 동체인과 로울러와의 연결상태를 나타낸 축방향에 따른 단면도.4 is a perspective view showing the main portion of the jig according to the embodiment of the present invention. 5 is a perspective view showing the insertion end portion of the coaxial support shaft to the roller. Figure 6 is a cross-sectional view along the axial direction showing the connection state of the fuselage chain and the roller.

Claims (2)

진공용기내에 증발원과 피가공물과를 간격을 두고 배설하고, 상기 발열원에서의 증발물질을 상기 피가공물에 부착시켜서 박막을 형성하는 진공박막 형성장치에 있어서, 상기한 피가공물을 지지하는 치구를 적어도 대치된 1쌍의 스프로켓에 엔드레스상으로 장력을 주어 설치한 체인과 이 체인의 복수의 연결핀과 각각 회전자재하게 간격을 두고 장착되어 일체적으로 회전하는 지지축과 이 지지축에 고설된 피고가공물 취부구와 상기한 각 로울러를 접설하여 회전시켜 주는 진공용기내의 소정영역에 걸쳐 고설설치된 가이드레일로 구성됨을 특징으로 하는 진공박막 형성장치.A vacuum thin film forming apparatus in which a vapor evaporation source and a work piece are disposed at intervals in a vacuum container, and the evaporation material from the heat generating source is attached to the work piece to form a thin film, wherein at least the jig supporting the work piece is replaced. Chains installed by tensioning a pair of sprockets in endless form and a plurality of connecting pins of the chains, each of which is pivotally mounted at intervals and integrally rotated support shafts, and the work piece attached to the support shafts A vacuum thin film forming apparatus, comprising: a guide rail installed over a predetermined area in a vacuum container which is in contact with and rotates a sphere and the rollers. 제1항에 있어서, 로울러의 지지축이 착탈자재하게 장착되어 있음을 특징으로 하는 진공박막 형성장치.The vacuum thin film forming apparatus according to claim 1, wherein the support shaft of the roller is detachably mounted. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019840004043A 1983-08-03 1984-07-11 Apparatus for forming thin film in a vacuum KR890004617B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP58142143A JPS6033350A (en) 1983-08-03 1983-08-03 Vacuum film forming apparatus
JP58-142143 1983-08-03
JP142,143 1983-08-03

Publications (2)

Publication Number Publication Date
KR850002110A true KR850002110A (en) 1985-05-06
KR890004617B1 KR890004617B1 (en) 1989-11-20

Family

ID=15308361

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840004043A KR890004617B1 (en) 1983-08-03 1984-07-11 Apparatus for forming thin film in a vacuum

Country Status (4)

Country Link
JP (1) JPS6033350A (en)
KR (1) KR890004617B1 (en)
GB (1) GB2144453B (en)
HK (1) HK81587A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6210272A (en) * 1985-07-05 1987-01-19 Seiko Electronic Components Ltd Rotary type vapor deposition device
JP2010095745A (en) * 2008-10-15 2010-04-30 Sumitomo Electric Ind Ltd Film-forming method and film-forming apparatus
KR101909810B1 (en) 2017-03-02 2018-12-18 박현철 Injection mold for molding products with thread

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55146927A (en) * 1979-05-07 1980-11-15 Citizen Watch Co Ltd Film forming device
JPS5743983A (en) * 1980-08-30 1982-03-12 Shimadzu Corp Film preparing apparatus

Also Published As

Publication number Publication date
KR890004617B1 (en) 1989-11-20
JPS6033350A (en) 1985-02-20
GB2144453B (en) 1986-06-11
GB2144453A (en) 1985-03-06
HK81587A (en) 1987-11-13
GB8419870D0 (en) 1984-09-05

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