KR20250084144A - 플라즈마 처리 장치 - Google Patents

플라즈마 처리 장치 Download PDF

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Publication number
KR20250084144A
KR20250084144A KR1020257012584A KR20257012584A KR20250084144A KR 20250084144 A KR20250084144 A KR 20250084144A KR 1020257012584 A KR1020257012584 A KR 1020257012584A KR 20257012584 A KR20257012584 A KR 20257012584A KR 20250084144 A KR20250084144 A KR 20250084144A
Authority
KR
South Korea
Prior art keywords
unit
plasma processing
transmission
power
processing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257012584A
Other languages
English (en)
Korean (ko)
Inventor
노조무 나가시마
다이스케 요시코시
구니히코 야마가타
사토루 데루우치
도모타카 스키가라
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20250084144A publication Critical patent/KR20250084144A/ko
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
    • H02J50/12—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling of the resonant type
    • H02J7/007—
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J7/00—Circuit arrangements for charging or discharging batteries or for supplying loads from batteries
    • H02J7/90—Regulation of charging or discharging current or voltage
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
KR1020257012584A 2022-09-30 2023-09-20 플라즈마 처리 장치 Pending KR20250084144A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263377957P 2022-09-30 2022-09-30
US63/377,957 2022-09-30
PCT/JP2023/034100 WO2024070848A1 (ja) 2022-09-30 2023-09-20 プラズマ処理装置

Publications (1)

Publication Number Publication Date
KR20250084144A true KR20250084144A (ko) 2025-06-10

Family

ID=90477596

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257012584A Pending KR20250084144A (ko) 2022-09-30 2023-09-20 플라즈마 처리 장치

Country Status (6)

Country Link
US (1) US20250232956A1 (https=)
JP (1) JPWO2024070848A1 (https=)
KR (1) KR20250084144A (https=)
CN (1) CN119949022A (https=)
TW (1) TW202431340A (https=)
WO (1) WO2024070848A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2024004256A1 (https=) * 2022-06-29 2024-01-04

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015173027A (ja) 2014-03-11 2015-10-01 東京エレクトロン株式会社 プラズマ処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2414120B (en) * 2004-05-11 2008-04-02 Splashpower Ltd Controlling inductive power transfer systems
JP6136025B2 (ja) * 2012-03-15 2017-05-31 パナソニックＩｐマネジメント株式会社 非接触充電装置の給電装置
JP2016015808A (ja) * 2014-07-01 2016-01-28 株式会社豊田自動織機 受電機器及び非接触電力伝送装置
JP2017093175A (ja) * 2015-11-11 2017-05-25 株式会社ダイヘン 高周波電源装置および非接触電力伝送システム
JP7350613B2 (ja) * 2019-10-17 2023-09-26 東京エレクトロン株式会社 基板処理装置
KR102378573B1 (ko) * 2020-06-12 2022-03-23 한양대학교 산학협력단 플라즈마 생성기
KR20240100400A (ko) * 2021-11-12 2024-07-01 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 시스템, 전력 공급 시스템 및 전력 공급 방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015173027A (ja) 2014-03-11 2015-10-01 東京エレクトロン株式会社 プラズマ処理装置

Also Published As

Publication number Publication date
US20250232956A1 (en) 2025-07-17
TW202431340A (zh) 2024-08-01
JPWO2024070848A1 (https=) 2024-04-04
WO2024070848A1 (ja) 2024-04-04
CN119949022A (zh) 2025-05-06

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Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000