JPWO2024070848A1 - - Google Patents
Info
- Publication number
- JPWO2024070848A1 JPWO2024070848A1 JP2024549260A JP2024549260A JPWO2024070848A1 JP WO2024070848 A1 JPWO2024070848 A1 JP WO2024070848A1 JP 2024549260 A JP2024549260 A JP 2024549260A JP 2024549260 A JP2024549260 A JP 2024549260A JP WO2024070848 A1 JPWO2024070848 A1 JP WO2024070848A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
- H02J50/12—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling of the resonant type
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J7/00—Circuit arrangements for charging or discharging batteries or for supplying loads from batteries
- H02J7/90—Regulation of charging or discharging current or voltage
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Computer Networks & Wireless Communication (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263377957P | 2022-09-30 | 2022-09-30 | |
| PCT/JP2023/034100 WO2024070848A1 (ja) | 2022-09-30 | 2023-09-20 | プラズマ処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024070848A1 true JPWO2024070848A1 (https=) | 2024-04-04 |
Family
ID=90477596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024549260A Pending JPWO2024070848A1 (https=) | 2022-09-30 | 2023-09-20 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250232956A1 (https=) |
| JP (1) | JPWO2024070848A1 (https=) |
| KR (1) | KR20250084144A (https=) |
| CN (1) | CN119949022A (https=) |
| TW (1) | TW202431340A (https=) |
| WO (1) | WO2024070848A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2024004256A1 (https=) * | 2022-06-29 | 2024-01-04 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2414120B (en) * | 2004-05-11 | 2008-04-02 | Splashpower Ltd | Controlling inductive power transfer systems |
| JP6136025B2 (ja) * | 2012-03-15 | 2017-05-31 | パナソニックＩｐマネジメント株式会社 | 非接触充電装置の給電装置 |
| JP6218650B2 (ja) | 2014-03-11 | 2017-10-25 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP2016015808A (ja) * | 2014-07-01 | 2016-01-28 | 株式会社豊田自動織機 | 受電機器及び非接触電力伝送装置 |
| JP2017093175A (ja) * | 2015-11-11 | 2017-05-25 | 株式会社ダイヘン | 高周波電源装置および非接触電力伝送システム |
| JP7350613B2 (ja) * | 2019-10-17 | 2023-09-26 | 東京エレクトロン株式会社 | 基板処理装置 |
| KR102378573B1 (ko) * | 2020-06-12 | 2022-03-23 | 한양대학교 산학협력단 | 플라즈마 생성기 |
| KR20240100400A (ko) * | 2021-11-12 | 2024-07-01 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치, 기판 처리 시스템, 전력 공급 시스템 및 전력 공급 방법 |
-
2023
- 2023-09-20 JP JP2024549260A patent/JPWO2024070848A1/ja active Pending
- 2023-09-20 KR KR1020257012584A patent/KR20250084144A/ko active Pending
- 2023-09-20 CN CN202380067985.7A patent/CN119949022A/zh active Pending
- 2023-09-20 WO PCT/JP2023/034100 patent/WO2024070848A1/ja not_active Ceased
- 2023-09-27 TW TW112137000A patent/TW202431340A/zh unknown
-
2025
- 2025-03-28 US US19/094,138 patent/US20250232956A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20250084144A (ko) | 2025-06-10 |
| US20250232956A1 (en) | 2025-07-17 |
| TW202431340A (zh) | 2024-08-01 |
| WO2024070848A1 (ja) | 2024-04-04 |
| CN119949022A (zh) | 2025-05-06 |