KR20250060918A - 합성 광학 소자, 조명 유닛, 노광 장치, 및 노광 방법 - Google Patents

합성 광학 소자, 조명 유닛, 노광 장치, 및 노광 방법 Download PDF

Info

Publication number
KR20250060918A
KR20250060918A KR1020257011364A KR20257011364A KR20250060918A KR 20250060918 A KR20250060918 A KR 20250060918A KR 1020257011364 A KR1020257011364 A KR 1020257011364A KR 20257011364 A KR20257011364 A KR 20257011364A KR 20250060918 A KR20250060918 A KR 20250060918A
Authority
KR
South Korea
Prior art keywords
light
substrate
light source
optical element
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257011364A
Other languages
English (en)
Korean (ko)
Inventor
마사야 이와나가
도모나리 스즈키
슈지 다케나카
도모유키 오카와
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20250060918A publication Critical patent/KR20250060918A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/142—Coating structures, e.g. thin films multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020257011364A 2022-10-24 2022-10-24 합성 광학 소자, 조명 유닛, 노광 장치, 및 노광 방법 Pending KR20250060918A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/039506 WO2024089737A1 (ja) 2022-10-24 2022-10-24 合成光学素子、照明ユニット、露光装置、及び露光方法

Publications (1)

Publication Number Publication Date
KR20250060918A true KR20250060918A (ko) 2025-05-07

Family

ID=90830265

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257011364A Pending KR20250060918A (ko) 2022-10-24 2022-10-24 합성 광학 소자, 조명 유닛, 노광 장치, 및 노광 방법

Country Status (5)

Country Link
JP (1) JPWO2024089737A1 (https=)
KR (1) KR20250060918A (https=)
CN (1) CN119948408A (https=)
TW (1) TW202422239A (https=)
WO (1) WO2024089737A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006201476A (ja) 2005-01-20 2006-08-03 Canon Inc 露光装置及びデバイスの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006047384A (ja) * 2004-07-30 2006-02-16 Dainippon Printing Co Ltd 露光装置
CN100468093C (zh) * 2006-05-25 2009-03-11 联华电子股份有限公司 分色滤光阵列的形成方法
JP2021193429A (ja) * 2020-06-08 2021-12-23 株式会社ブイ・テクノロジー 露光用の光源装置、照明装置、露光装置、及び露光方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006201476A (ja) 2005-01-20 2006-08-03 Canon Inc 露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
TW202422239A (zh) 2024-06-01
WO2024089737A1 (ja) 2024-05-02
CN119948408A (zh) 2025-05-06
JPWO2024089737A1 (https=) 2024-05-02

Similar Documents

Publication Publication Date Title
KR20010031353A (ko) 사진석판 장치 및 방법
KR102047505B1 (ko) 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20170113310A (ko) 조명 장치, 광학 장치, 임프린트 장치, 투영 장치 및 물품의 제조 방법
JP4678493B2 (ja) 光源ユニット、照明光学装置、露光装置、および露光方法
KR20250060918A (ko) 합성 광학 소자, 조명 유닛, 노광 장치, 및 노광 방법
TWI885424B (zh) 照明單元、曝光裝置、及曝光方法
TWI876438B (zh) 光源單元、照明單元、曝光裝置、及曝光方法
TWI920814B (zh) 曝光裝置
TWI915658B (zh) 光源單元、照明單元、曝光裝置、及曝光方法
JP4376227B2 (ja) リソグラフィ装置用投影装置
TW202409743A (zh) 光源單元、照明單元、曝光裝置、及曝光方法
WO2025095001A1 (ja) 露光装置
JP2010118383A (ja) 照明装置、露光装置、及びデバイス製造方法
TW202340878A (zh) 曝光裝置
TW202505314A (zh) 空間光調變單元及曝光裝置
WO2025013286A1 (ja) 照明ユニット、露光装置、及び露光方法
TW202431029A (zh) 照明光學系統、曝光裝置及元件的製造方法
KR20250160466A (ko) 구동 방법, 광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법
TW202318108A (zh) 曝光裝置及元件製造方法
WO2025079172A1 (ja) 光源ユニット、照明ユニット、露光装置、及び露光方法
WO2026014337A1 (ja) 方法、調整方法、及び露光装置
JP5470984B2 (ja) 照明装置、露光装置、及びデバイス製造方法

Legal Events

Date Code Title Description
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13 Search requested

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D13-SRH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000