KR20240105262A - Resin composition - Google Patents

Abstract

[Project] Provision of a resin composition that can produce a cured product with excellent crack resistance, high peel strength, and low dielectric loss tangent.
[Solution] 1 selected from the group consisting of (A) epoxy resin, (B) active ester curing agent, (C) compound represented by formula (C-1), and compound represented by formula (C-2) A resin composition containing one or more types of curing accelerators, and (D) a curing accelerator (excluding those corresponding to component (C)).

Description

Resin composition {RESIN COMPOSITION}

The present invention relates to a resin composition. Furthermore, the present invention relates to a resin sheet, a printed wiring board, and a semiconductor device obtained by using the resin composition.

As a manufacturing technology for printed wiring boards, a manufacturing method using a build-up method is known in which insulating layers and conductor layers are alternately stacked. In the manufacturing method using the build-up method, the insulating layer is generally formed by curing the resin composition. As such a resin composition, for example, the resin composition disclosed in Patent Document 1 is known.

[Patent Document 1] Japanese Patent Publication No. 2016-26261

The insulating layer of a printed wiring board is required to have a low dielectric loss tangent from the viewpoint of improving electrical characteristics. For this reason, it is possible to include an active ester-based curing agent in the resin composition. However, if an active ester-based curing agent is included, the crack resistance of the cured product may decrease or the peeling strength between the resin composition and the conductor layer may decrease.

The present invention was created in view of the above problems, and provides a resin composition capable of obtaining a cured product with excellent crack resistance, high peel strength, and low dielectric loss tangent; a resin sheet including a resin composition layer containing the resin composition; a printed wiring board including an insulating layer formed from a cured product of the resin composition; and, a semiconductor device including the printed wiring board; The purpose is to provide.

As a result of intensive studies to solve the above problems, the present inventor has found that even when using an active ester-based curing agent (B), by using a combination of component (C) having a specific structure in addition to component (D) as a curing accelerator, It was discovered that an unexpected and remarkable effect was obtained in that a cured product with excellent crack resistance, high peel strength, and low dielectric loss tangent could be obtained, and the present invention was completed.

That is, the present invention includes the following.

[1] (A) epoxy resin,

(B) an active ester-based curing agent,

(C) at least one type of curing accelerator selected from the group consisting of a compound represented by the formula (C-1) and a compound represented by the formula (C-2), and

(D) A resin composition containing a curing accelerator (excluding those corresponding to component (C)).

In the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ are each independently a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms, and R ¹⁵ represents a divalent aliphatic hydrocarbon group or a divalent aromatic hydrocarbon group.

In the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group which may have 6 to 10 carbon atoms, and R ²⁵ represents a single bond, a divalent aliphatic hydrocarbon group which may have a substituent, an oxygen atom, or a sulfonyl group.

[2] The resin composition according to [1], further comprising (E) an inorganic filler.

[3] The resin composition according to [1] or [2], wherein the content of component (B) is 5% by mass or more and 25% by mass or less when the nonvolatile component in the resin composition is 100% by mass.

[4] The resin composition according to any one of [1] to [3], wherein the content of component (C) is 0.01% by mass or more and 1.5% by mass or less when the non-volatile component in the resin composition is 100% by mass.

[5] The resin composition according to any one of [1] to [4], wherein the content of component (D) is 0.01% by mass or more and 0.5% by mass or less when the nonvolatile component in the resin composition is 100% by mass.

[6] The resin composition according to any one of [1] to [5], wherein the component (D) contains either an imidazole-based curing accelerator or an amine-based curing accelerator.

[7] In the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a phenyl group. The resin composition according to any one of [1] to [6].

[8] In the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ are each independently a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or The resin composition according to any one of [1] to [7], which represents a phenyl group.

[9] In the formula (C-1), R ¹⁵ represents an alkylene group which may have a substituent, or a divalent aromatic hydrocarbon group which may have a substituent. The resin composition according to any one of [1] to [8]. .

[10] In the formula (C-2), R ²⁵ represents a single bond, an alkylene group that may have a substituent, an oxygen atom, or a sulfonyl group. The resin composition according to any one of [1] to [9].

[11] The resin composition according to any one of [1] to [10], for forming an insulating layer.

[12] A resin sheet comprising a support and a resin composition layer provided on the support and containing the resin composition according to any one of [1] to [11].

[13] A printed wiring board comprising an insulating layer formed by a cured product of the resin composition according to any one of [1] to [11].

[14] A semiconductor device including the printed wiring board described in [13].

According to the present invention, a resin composition capable of obtaining a cured product having excellent crack resistance, high peel strength, and low dielectric loss tangent; a resin sheet including a resin composition layer containing the resin composition; a printed wiring board including an insulating layer formed from a cured product of the resin composition; and, a semiconductor device including the printed wiring board; can be provided.

Hereinafter, the present invention will be described by showing embodiments and examples. However, the present invention is not limited to the embodiments and examples shown below, and may be implemented with any modification without departing from the scope of the claims and equivalents of the present invention.

[Resin composition]

The resin composition of the present invention is selected from the group consisting of (A) an epoxy resin, (B) an active ester-based curing agent, (C) a compound represented by the formula (C-1), and a compound represented by the formula (C-2) It contains one or more selected curing accelerators, and (D) a curing accelerator (excluding those corresponding to component (C)). With such a resin composition, it becomes possible to obtain a cured product with excellent crack resistance, high peel strength, and low dielectric loss tangent. In addition, the resin composition usually makes it possible to obtain a cured product with a small surface roughness after roughening treatment.

In the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ are each independently a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group preferably having 6 to 10 carbon atoms, and R ¹⁵ represents a divalent aliphatic hydrocarbon group that may have a substituent, or a divalent aromatic hydrocarbon group that may have a substituent.

In the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group which may have 6 to 10 carbon atoms, and R ²⁵ represents a single bond, a divalent aliphatic hydrocarbon group which may have a substituent, an oxygen atom, or a sulfonyl group.

The resin composition may, if necessary, contain arbitrary components such as (E) an inorganic filler, (F) a thermoplastic resin, (G) a curing agent, (H) a radically polymerizable compound, and (I) other additives. Hereinafter, each component contained in the resin composition will be described in detail.

In addition, in the present invention, unless otherwise specified, the content of each component in the resin composition is the value when the non-volatile component in the resin composition is 100% by mass, and the non-volatile component refers to the content excluding the solvent in the resin composition. It refers to all non-volatile components. In addition, in the present invention, the resin component in the resin composition refers to the component excluding the (E) inorganic filler among the non-volatile components of the resin composition.

<(A) Epoxy resin>

The resin composition contains (A) epoxy resin as (A) component. (A) By containing an epoxy resin in the resin composition, a cured product with low dielectric properties and excellent peel strength can be obtained. (A) Epoxy resins may be used individually, or two or more types may be used in combination.

(A) As the epoxy resin, for example, bixylenol type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AF type epoxy resin, dicyclopentadiene type epoxy resin, tris. Phenol type epoxy resin, naphthol novolak type epoxy resin, phenol novolak type epoxy resin, tert-butyl-catechol type epoxy resin, naphthalene type epoxy resin, naphthol type epoxy resin, anthracene type epoxy resin, glycidylamine type epoxy. Resin, glycidyl ester type epoxy resin, glycidyl cyclohexane type epoxy resin, cresol novolac type epoxy resin, biphenyl type epoxy resin, linear aliphatic epoxy resin, epoxy resin with butadiene structure, alicyclic epoxy resin, complex Cyclic epoxy resin, spiro ring-containing epoxy resin, cyclohexane type epoxy resin, cyclohexanedimethanol type epoxy resin, naphthylene ether type epoxy resin, trimethylol type epoxy resin, tetraphenylethane type epoxy resin, phenolphthalimidine type epoxy resin, etc. can be mentioned. Epoxy resins may be used individually, or two or more types may be used in combination.

The resin composition preferably contains, as component (A), an epoxy resin having two or more epoxy groups in one molecule. From the viewpoint of significantly obtaining the desired effect of the present invention, the ratio of the epoxy resin having two or more epoxy groups in one molecule relative to 100 mass% of the epoxy resin (A) is preferably 50 mass% or more, more preferably It is 60 mass% or more, especially preferably 70 mass% or more.

Epoxy resins include epoxy resins that are liquid at a temperature of 20°C (hereinafter sometimes referred to as “liquid epoxy resins”) and epoxy resins that are solid at a temperature of 20°C (hereinafter sometimes referred to as “solid epoxy resins”). There is. The resin composition may contain only a liquid epoxy resin as component (A), may contain only a solid epoxy resin, or may contain a combination of a liquid epoxy resin and a solid epoxy resin.

As the liquid epoxy resin, a liquid epoxy resin having two or more epoxy groups in one molecule is preferable.

Liquid epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AF type epoxy resin, naphthalene type epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, and phenol novolac type epoxy resin. , an alicyclic epoxy resin having an ester skeleton, a cyclohexane-type epoxy resin, a cyclohexanedimethanol-type epoxy resin, a glycidylamine-type epoxy resin, and an epoxy resin having a butadiene structure, a glycidylcyclohexane-type epoxy resin, and phenol. Phthalimidine type epoxy resin is preferable, and bisphenol A type epoxy resin and bisphenol F type epoxy resin are more preferable.

Specific examples of the liquid epoxy resin include "HP4032", "HP4032D", and "HP4032SS" (naphthalene type epoxy resin) manufactured by DIC Corporation; "828US", "jER828EL", "825", and "Epicoat 828EL" (bisphenol A type epoxy resin) manufactured by Mitsubishi Chemical Corporation; “jER807” and “1750” (bisphenol F type epoxy resin) manufactured by Mitsubishi Chemical Corporation; "jER152" (phenol novolac type epoxy resin) manufactured by Mitsubishi Chemical Corporation; “630” and “630LSD” (glycidylamine type epoxy resin) manufactured by Mitsubishi Chemical Corporation; “ZX1059” manufactured by Nittetsu Chemical & Materials (mixture of bisphenol A-type epoxy resin and bisphenol F-type epoxy resin); “EX-721” (glycidyl ester type epoxy resin) manufactured by Nagase Chemtex Corporation; “Celoxide 2021P” manufactured by Daicel Corporation (alicyclic epoxy resin with an ester skeleton); “PB-3600” manufactured by Daicel Corporation (epoxy resin with a butadiene structure); “ZX1658” and “ZX1658GS” (liquid 1,4-glycidylcyclohexane type epoxy resin) manufactured by Nittetsu Chemical & Materials, etc. are included. These may be used individually, or two or more types may be used in combination.

As the solid epoxy resin, a solid epoxy resin having two or more epoxy groups per molecule is preferable, a solid epoxy resin having three or more epoxy groups per molecule is more preferable, and an aromatic resin having three or more epoxy groups per molecule is more preferable. Solid epoxy resin is more preferred.

As solid epoxy resins, non-xylenol type epoxy resin, naphthalene type epoxy resin, naphthalene type tetrafunctional epoxy resin, cresol novolak type epoxy resin, dicyclopentadiene type epoxy resin, trisphenol type epoxy resin, naphthol type epoxy resin, Phenyl type epoxy resin, naphthylene ether type epoxy resin, anthracene type epoxy resin, bisphenol A type epoxy resin, bisphenol AF type epoxy resin, and tetraphenylethane type epoxy resin are preferable, and biphenyl type epoxy resin is more preferable.

Specific examples of solid epoxy resins include "HP4032H" (naphthalene-type epoxy resin), "HP-4700", "HP-4710" (naphthalene-type tetrafunctional epoxy resin), and "N-690" (cresol novolac) manufactured by DIC. type epoxy resin), “N-695” (cresol novolac type epoxy resin), “HP-7200”, “HP-7200HH”, “HP-7200H” (dicyclopentadiene type epoxy resin), “EXA-7311” ", "EXA-7311-G3", "EXA-7311-G4", "EXA-7311-G4S", "HP6000", "HP6000L" (naphthylene ether type epoxy resin); “EPPN-502H” (trisphenol-type epoxy resin), “NC7000L” (naphthol novolak-type epoxy resin), “NC3000H”, “NC3000”, “NC3000L”, and “NC3100” (biphenyl-type epoxy resin) manufactured by Nippon Kayaku Co., Ltd. profit); “ESN475V” (naphthalene type epoxy resin), “ESN485” (naphthol novolak type epoxy resin) manufactured by Nittetsu Chemical &Materials; “YX4000H”, “YL6121” (biphenyl-type epoxy resin), “YX4000HK” (bixylenol-type epoxy resin), and “YX8800” (anthracene-type epoxy resin) manufactured by Mitsubishi Chemical Corporation; “PG-100” and “CG-500” manufactured by Osaka Gas Chemicals, “YL7760” (bisphenol AF type epoxy resin), “YL7800” (fluorene type epoxy resin), and “jER1010” (solid phase) manufactured by Mitsubishi Chemical. Bisphenol A type epoxy resin), “jER1031S” (tetraphenylethane type epoxy resin); and "WHR-991S" (phenolphthalimidine type epoxy resin) manufactured by Nippon Kayaku Co., Ltd. These may be used individually, or two or more types may be used in combination.

(A) When a liquid epoxy resin and a solid epoxy resin are used in combination as components, their amount ratio (liquid epoxy resin:solid epoxy resin) is preferably 1:0.1 to 1:20 in mass ratio, more preferably 1:0.1 to 1:20. is 1:0.3 to 1:10, particularly preferably 1:0.5 to 1:5. When the ratio of the liquid epoxy resin and the solid epoxy resin is within this range, the desired effect of the present invention can be significantly achieved.

The epoxy equivalent of component (A) is preferably 50 g/eq. to 5000 g/eq., more preferably 50 g/eq. to 3000 g/eq., more preferably 80 g/eq. to 2000 g/eq., more preferably 110 g/eq. to 1000 g/eq. By falling within this range, a cured product with a sufficient crosslink density can be obtained. Epoxy equivalent is the mass of epoxy resin containing 1 equivalent of epoxy group. This epoxy equivalent can be measured according to JIS K7236.

The weight average molecular weight (Mw) of component (A) is preferably 100 to 5000, more preferably 150 to 3000, and even more preferably 200 to 1500 from the viewpoint of significantly obtaining the desired effect of the present invention. The weight average molecular weight of an epoxy resin is the weight average molecular weight in terms of polystyrene measured by gel permeation chromatography (GPC).

The content of component (A) is preferably 20% by mass or more, more preferably 30% by mass, when the resin component in the resin composition is 100% by mass, from the viewpoint of obtaining a cured product showing good mechanical strength and insulation reliability. % or more, more preferably 40 mass % or more, preferably 75 mass % or less, preferably 70 mass % or less, more preferably 65 mass % or less, even more preferably 60 mass % or less.

The content of component (A) is preferably 3% by mass or more, more preferably 5% by mass, when the nonvolatile component in the resin composition is 100% by mass, from the viewpoint of obtaining a cured product showing good mechanical strength and insulation reliability. It is mass % or more, more preferably 8 mass % or more. The upper limit of the content of the epoxy resin is preferably 35 mass% or less, more preferably 30 mass% or less, and particularly preferably 25 mass% or less from the viewpoint of significantly obtaining the desired effect of the present invention.

<(B) Active ester-based hardener>

The resin composition contains (B) an active ester-based curing agent as component (B). The (B) active ester-based curing agent as component (B) does not include anything corresponding to the component (A) described above. (B) The active ester-based curing agent can usually form a bond through reaction with the (A) epoxy resin and cure the resin composition. Since the resin composition contains component (B), a cured product with small surface roughness after roughening treatment can be obtained. Furthermore, in the present invention, by using component (A) and (B) active ester-based curing agent in combination, a cured product with excellent peeling strength between plating can be obtained and dielectric properties can also be lowered. (B) Component may be used individually, or may be used in combination of two or more types.

(B) The active ester-based curing agent generally contains two highly reactive ester groups per molecule, such as phenol esters, thiophenol esters, N-hydroxyamine esters, and esters of heterocyclic hydroxy compounds. Compounds having the above are preferably used. The active ester-based curing agent is preferably obtained by condensation reaction of a carboxylic acid compound and/or a thiocarboxylic acid compound with a hydroxy compound and/or a thiol compound. In particular, from the viewpoint of improving heat resistance, active ester-based curing agents obtained from carboxylic acid compounds and hydroxy compounds are preferable, and active ester-based curing agents obtained from carboxylic acid compounds, phenol compounds, and/or naphthol compounds are more preferable. Examples of carboxylic acid compounds include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, and pyromellitic acid. Phenol compounds or naphthol compounds include, for example, hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthaline, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m- Cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, Trihydroxybenzophenone, tetrahydroxybenzophenone, phloroglucine, benzenetriol, dicyclopentadiene type diphenol compound, phenol novolac, etc. are mentioned. Here, “dicyclopentadiene-type diphenol compound” refers to a diphenol compound obtained by condensing two molecules of phenol with one molecule of dicyclopentadiene.

Specifically, the component (B) includes a dicyclopentadiene-type active ester-based curing agent, a naphthalene-type active ester-based curing agent containing a naphthalene structure, an active ester-based curing agent containing an acetylated product of phenol novolac, and a phenol novolac. Examples include an active ester-based curing agent containing a benzoylate, an active ester-based curing agent that is an acetylated product of phenol novolak, and an active ester-based curing agent containing a styryl group and a naphthalene structure. As the dicyclopentadiene-type active ester-based curing agent, an active ester-based curing agent containing a dicyclopentadiene-type diphenol structure is preferable. “Dicyclopentadiene-type diphenol structure” refers to a divalent structural unit consisting of phenylene-dicyclopentylene-phenylene.

Among them, the component (B) is more preferably at least one selected from an active ester-based curing agent containing a styryl group and a naphthalene structure, and a naphthalene-type active ester-based curing agent containing a naphthalene structure, and naphthalene containing a naphthalene structure. A type activated ester-based curing agent is more preferable.

Commercially available products of component (B) include active ester curing agents containing a dicyclopentadiene type diphenol structure, such as “EXB9451”, “EXB9460”, “EXB9460S”, “HPC-8000-65T”, and “HPC-8000H-” 65TM”, “EXB-8000L-65TM” (manufactured by DIC); As a naphthalene-type active ester curing agent containing a naphthalene structure, “HP-B-8151-62T”, “EXB9416-70BK”, “EXB-8100L-65T”, “EXB-8150L-65T”, and “EXB-8150-65T” ", "HPC-8150-60T", "HPC-8150-62T" (manufactured by DIC), "PC1300-02-65T" (manufactured by Airwater); As a phosphorus-containing active ester compound, "EXB9401" (manufactured by DIC Corporation); As an active ester curing agent containing an acetylated product of phenol novolac, "DC808" (manufactured by Mitsubishi Chemical Corporation); As an active ester curing agent containing the benzoylate of phenol novolak, "YLH1026" (manufactured by Mitsubishi Chemical Corporation); As an active ester-based curing agent that is an acetylated product of phenol novolak, "DC808" (manufactured by Mitsubishi Chemical Corporation); Examples of active ester curing agents that are benzoylates of phenol novolak include "YLH1026" (manufactured by Mitsubishi Chemical Corporation), "YLH1030" (manufactured by Mitsubishi Chemical Corporation), and "YLH1048" (manufactured by Mitsubishi Chemical Corporation); “EXB-8500-65T” (manufactured by DIC); Examples of the active ester-based curing agent containing a styryl group and a naphthalene structure include "PC1300-02-65MA" (manufactured by Airwater).

The active ester group equivalent of component (B) is preferably 50 g/eq from the viewpoint of lowering the dielectric loss tangent and obtaining a cured product with excellent peel strength. to 500 g/eq., more preferably 50 g/eq. to 400 g/eq., more preferably 100 g/eq. to 300 g/eq. The active ester group equivalent is the mass of the active ester-based curing agent containing 1 equivalent of the active ester group.

The amount ratio of (A) the epoxy resin and (B) the active ester-based curing agent is a ratio of [total number of active groups of the active ester-based curing agent]/[total number of epoxy groups of the epoxy resin], and is preferably 0.01 or more, more preferably Preferably it is 0.3 or more, more preferably 0.5 or more, preferably 5 or less, more preferably 3 or less, and even more preferably 2 or less. Here, the “epoxy group number of the epoxy resin” is the sum of all the values obtained by dividing the mass of the non-volatile component of the epoxy resin present in the resin composition by the epoxy equivalent. In addition, the “active group number of the active ester curing agent” is a value obtained by dividing the mass of the non-volatile component of the active ester curing agent present in the resin composition by the active ester group equivalent. By keeping the amount ratio of the epoxy resin and the active ester-based curing agent within this range, it becomes possible to significantly obtain the effects of the present invention.

The content of component (B) is preferably 20% by mass or more when the resin component in the resin composition is 100% by mass from the viewpoint of obtaining a cured product that has a small surface roughness after roughening treatment and is excellent in peeling strength and dielectric loss tangent. , more preferably 25 mass% or more, further preferably 30 mass% or more, preferably 55 mass% or less, more preferably 50 mass% or less, and even more preferably 45 mass% or less. Since the resin composition of the present invention contains a combination of component (C) and component (D), a cured product with excellent crack resistance and peel strength can be obtained even if the content of component (B) is increased to lower the dielectric loss tangent. .

The content of component (B) is preferably 5% by mass when the nonvolatile component in the resin composition is 100% by mass from the viewpoint of obtaining a cured product that has a small surface roughness after roughening treatment and is excellent in peeling strength and dielectric loss tangent. or more, more preferably 7 mass% or more, and even more preferably 8 mass% or more. Moreover, the upper limit is preferably 25 mass% or less, more preferably 20 mass% or less, and even more preferably 15 mass% or less. Since the resin composition of the present invention contains a combination of component (C) and component (D), a cured product with excellent crack resistance and peel strength can be obtained even if the content of component (B) is increased to lower the dielectric loss tangent. .

<(C) at least one type of curing accelerator selected from the group consisting of a compound represented by the formula (C-1) and a compound represented by the formula (C-2)>

The resin composition contains, as component (C), (C) at least one type of curing accelerator selected from the group consisting of a compound represented by the formula (C-1) and a compound represented by the formula (C-2). As component (C), one or more types of curing accelerators selected from the group consisting of (C) a compound represented by the formula (C-1) and a compound represented by the formula (C-2) include the component (A) and (B) Components are not included. Component (C) usually functions as a catalyst in the reaction between the epoxy resin (A) and the curing agent such as the component (B) and the component (G), and can promote curing of the resin composition. In the present invention, by using component (C) and component (D) described later in combination, a cured product that has excellent crack resistance and excellent peeling strength between plating can be obtained. (C) Component may be used individually, or may be used in combination of two or more types.

In the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ are each independently a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group preferably having 6 to 10 carbon atoms, and R ¹⁵ represents a divalent aliphatic hydrocarbon group that may have a substituent, or a divalent aromatic hydrocarbon group that may have a substituent.

In the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group which may have 6 to 10 carbon atoms, and R ²⁵ represents a single bond, a divalent aliphatic hydrocarbon group which may have a substituent, an oxygen atom, or a sulfonyl group.

In the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ are each independently a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms.

The monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms, which may have a substituent, is preferably a monovalent aliphatic hydrocarbon group having 1 to 4 carbon atoms, more preferably a monovalent aliphatic hydrocarbon group having 1 to 3 carbon atoms, and carbon A monovalent aliphatic hydrocarbon group having 1 or 2 atoms is more preferable. The number of carbon atoms in question does not include the number of carbon atoms in the substituent. Specific examples of the monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent include an alkyl group having 1 to 5 carbon atoms which may have a substituent, an alkenyl group having 2 to 5 carbon atoms which may have a substituent, and an alkynyl group having 2 to 5 carbon atoms, which may have a substituent. Among them, the aliphatic hydrocarbon group having 1 to 5 carbon atoms, which may have a substituent, is preferably an alkyl group having 1 to 5 carbon atoms, which may have a substituent, from the viewpoint of significantly obtaining the effects of the present invention.

The alkyl group having 1 to 5 carbon atoms, which may have a substituent, may be linear, branched, or cyclic. The alkyl group is preferably an alkyl group with 1 to 5 carbon atoms, more preferably an alkyl group with 1 to 4 carbon atoms, preferably an alkyl group with 1 to 3 carbon atoms, and an alkyl group with 1 or 2 carbon atoms. Particularly desirable. The number of carbon atoms in question does not include the number of carbon atoms of the substituent. Examples of such alkyl groups include methyl group, ethyl group, propyl group, isopropyl group, butyl group, sec-butyl group, isobutyl group, tertiary-butyl group, pentyl group, etc., and methyl group and ethyl group. desirable.

The alkenyl group having 1 to 5 carbon atoms, which may have a substituent, may be linear, branched, or cyclic. The alkenyl group is preferably an alkenyl group with 2 to 5 carbon atoms, more preferably an alkenyl group with 2 to 4 carbon atoms, and more preferably an alkenyl group with 2 to 3 carbon atoms. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of such alkenyl groups include ethynyl group, propynyl group, butynyl group, and pentynyl group.

The alkynyl group having 1 to 5 carbon atoms, which may have a substituent, may be linear, branched, or cyclic. The alkynyl group is preferably an alkynyl group with 2 to 5 carbon atoms, more preferably an alkynyl group with 2 to 4 carbon atoms, and more preferably an alkynyl group with 2 to 3 carbon atoms. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of such alkynyl groups include ethynyl group, propynyl group, butynyl group, sec-butynyl group, isobutynyl group, tertiary-butynyl group, and pentynyl group.

Specific examples of the monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms which may have a substituent include an aryl group having 6 to 10 carbon atoms which may have a substituent, and heteroaryl having 6 to 10 carbon atoms which may have a substituent. etc. can be mentioned. Among them, the monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms, which may have a substituent, is preferably an aryl group having 6 to 10 carbon atoms, which may have a substituent, from the viewpoint of significantly obtaining the effects of the present invention.

Examples of the aryl group having 6 to 10 carbon atoms that may have a substituent include a phenyl group and a naphthyl group, and a phenyl group is preferable.

Examples of heteroaryl groups having 6 to 10 carbon atoms that may have a substituent include groups formed by removing one hydrogen atom from pyrrole, furan, thiophene, etc.

Among them, it is preferable that R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a phenyl group, and each represents a substituent. It is more preferable to represent a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms, which may have a substituent, more preferably to represent an alkyl group having 1 to 5 carbon atoms, which may have a substituent, and especially preferably to represent a methyl group or an ethyl group. do.

The monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms and the monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms represented by R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ may have a substituent. Substituents include, for example, halogen atom, alkyl group, alkoxy group, aryl group, arylalkyl group, silyl group, acyl group, acyloxy group, carboxyl group, sulfo group, cyano group, nitro group, hydroxy group, mercapto group, and oxo. etc. can be mentioned.

R ¹⁵ represents a divalent aliphatic hydrocarbon group which may have a substituent, or a divalent aromatic hydrocarbon group which may have a substituent.

The divalent aliphatic hydrocarbon group which may have a substituent is preferably a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, more preferably a divalent aliphatic hydrocarbon group having 1 to 6 carbon atoms, and 2 having 1 to 4 carbon atoms. An aliphatic hydrocarbon group is more preferable. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of the divalent aliphatic hydrocarbon group that may have a substituent include an alkylene group that may have a substituent, an alkenylene group that may have a substituent, and an alkynylene group that may have a substituent. Among them, the divalent aliphatic hydrocarbon group that may have a substituent is preferably an alkylene group that may have a substituent from the viewpoint of significantly obtaining the effects of the present invention.

The alkylene group, which may have a substituent, may be straight-chain, branched, or cyclic. A straight-chain or branched hydrocarbon group is preferable, and a straight-chain hydrocarbon group is more preferable. As the alkylene group, an alkylene group with 1 to 10 carbon atoms is preferable, an alkylene group with 1 to 6 carbon atoms is more preferable, and an alkylene group with 1 to 4 carbon atoms is still more preferable. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of alkylene groups include methylene group, ethylene group, 1-methylethylene group, propylene group, n-butylene group, s-butylene group, t-butylene group, pentylene group, hexylene group, heptylene group, and octylene group. , nonylene group, decylene group, etc., and methylene group, ethylene group, propylene group, n-butylene group, s-butylene group, and t-butylene group are preferable, and methylene group, ethylene group, and 1-methylethylene are preferable. group, propylene group, n-butylene group, s-butylene group, and t-butylene group are more preferable, and methylene group, ethylene group, propylene group, and n-butylene group are particularly preferable.

The alkenylene group, which may have a substituent, may be straight-chain, branched, or cyclic. A straight-chain or branched hydrocarbon group is preferable, and a straight-chain hydrocarbon group is more preferable. As the alkenylene group, an alkenylene group with 2 to 10 carbon atoms is preferable, an alkenylene group with 2 to 6 carbon atoms is more preferable, and an alkenylene group with 3 or 4 carbon atoms is still more preferable. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of the alkenylene group include ethenylene group, propenylene group, butenylene group, pentenylene group, hexenylene group, heptenylene group, octenylene group, nonenylene group, and decenylene group.

The alkynylene group, which may have a substituent, may be linear, branched, or cyclic. A linear or branched hydrocarbon group is preferable, and a straight chain is more preferable. As the alkynylene group, an alkynylene group with 2 to 10 carbon atoms is preferable, an alkynylene group with 2 to 6 carbon atoms is more preferable, and an alkynylene group with 3 or 4 carbon atoms is still more preferable. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of the alkynylene group include ethynylene group, pyropynylene group, butynylene group, pentynylene group, hexynylene group, heptynylene group, octynylene group, nonylnylene group, and decynylene group.

The divalent aromatic hydrocarbon group that may have a substituent is preferably a divalent aromatic hydrocarbon group having 3 to 20 carbon atoms, more preferably a divalent aromatic hydrocarbon group having 6 to 14 carbon atoms, and 2 having 6 to 10 carbon atoms. A divalent aromatic hydrocarbon group is more preferable. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of the divalent aromatic hydrocarbon group that may have a substituent include an arylene group that may have a substituent, a heteroarylene group that may have a substituent, etc. Among them, the divalent aromatic hydrocarbon group that may have a substituent is preferably an arylene group that may have a substituent from the viewpoint of significantly obtaining the effects of the present invention.

The arylene group, which may have a substituent, is preferably an arylene group with 6 to 20 carbon atoms, more preferably with 6 to 14 carbon atoms, and even more preferably with 6 to 10 carbon atoms. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of the arylene group include phenylene group, naphthylene group, anthracenylene group, etc., and phenylene group is preferable.

The heteroarylene group which may have a substituent is preferably a heteroarylene group having 3 to 20 carbon atoms, more preferably a heteroarylene group having 6 to 14 carbon atoms, and a heteroarylene group having 6 to 10 carbon atoms. It is more desirable. The number of carbon atoms of the substituent is not included in the number of carbon atoms. Examples of heteroarylene groups that may have substituents include groups formed by removing two hydrogen atoms from pyrrole, furan, thiophene, indole, benzofuran, benzothiophene, etc.

Among them, as R ¹⁵ , an alkylene group which may have a substituent or a divalent aromatic hydrocarbon group which may have a substituent is preferable, and an alkylene group which may have a substituent is more preferable.

The divalent aliphatic hydrocarbon group and divalent aromatic hydrocarbon group represented by R ¹⁵ may have a substituent. The substituent is the same as the substituent that the monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ¹¹ may have.

Examples of the compound represented by the formula (C-1) include compound (i) exemplified below, but are not limited thereto.

In the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group optionally having 6 to 10 carbon atoms, and is the same as R ¹¹ in the formula (C-1).

R ²¹ , R ²² , R ²³ , and R ²⁴ each independently preferably represent a hydrogen atom, a divalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a phenyl group, and each represents a hydrogen atom, or It is more preferable to represent a phenyl group.

In the formula (C-2), R ²⁵ represents a single bond, a divalent aliphatic hydrocarbon group that may have a substituent, an oxygen atom, or a sulfonyl group, and the divalent aliphatic hydrocarbon group represents R ¹⁵ in the formula (C-1). It is the same as the divalent aliphatic hydrocarbon group which may have a substituent indicated by .

As R ²⁵ , a divalent aliphatic hydrocarbon group which may have a substituent is preferable, and an alkylene group which may have a substituent is more preferable.

Compounds represented by the formula (C-2) include, but are not limited to, compound (ii) shown below.

(C) Components may be commercially available. Examples of commercial products include "G-8009L" manufactured by Daiichi Kogyo Seiyaku Corporation and "P200H50" manufactured by Mitsubishi Chemical Corporation.

The content of component (C) is preferably 0.05% by mass or more, more preferably 0.1% by mass or more, when the resin component in the resin composition is 100% by mass, from the viewpoint of obtaining a cured product with excellent crack resistance. Preferably it is 0.3 mass% or more, preferably 5 mass% or less, preferably 4 mass% or less, more preferably 3 mass% or less, and even more preferably 1.5 mass% or less.

The content of component (C) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, when the non-volatile component in the resin composition is 100% by mass, from the viewpoint of obtaining a cured product with excellent crack resistance, More preferably, it is 0.1 mass% or more, preferably 1.5 mass% or less, more preferably 1 mass% or less, and particularly preferably 0.5 mass% or less.

When the content of component (A) when the nonvolatile component in the resin composition is 100% by mass is set to a, and the content of component (C) when the nonvolatile component in the resin composition is set to 100% by mass is set to c. , (c/a) × 100 is preferably 0.1 or more, more preferably 0.5 or more, further preferably 1 or more, 1.5 or more, and preferably 15 or less from the viewpoint of significantly obtaining the effect of the present invention. , more preferably 10 or less, further preferably 5 or less, 3.5 or less.

When the non-volatile component in the resin composition is 100% by mass and the content of component (B) is set to b, (c/b) x 100 is preferably 0.1 from the viewpoint of significantly obtaining the effects of the present invention. or more, more preferably 1 or more, further preferably 2.5 or more, preferably 15 or less, more preferably 10 or less, even more preferably 5 or less.

<(D) Curing accelerator>

In addition to the above-mentioned components, the resin composition further contains a curing accelerator (excluding those corresponding to component (C)) as an optional component and (D) component. The (D) hardening accelerator as this (D) component does not include those corresponding to the above-mentioned (A) component, (B) component, and (C) component. The component (D) usually functions as a catalyst in the reaction between the epoxy resin (A) and the curing agent such as the component (B) and the component (G), and can promote curing of the resin composition. The resin composition of the present invention obtains a cured product with excellent crack resistance by using in combination, in addition to (D) a curing accelerator, a curing accelerator having a specific structure and (C) a group represented by the general formula (C-1). It becomes possible.

(D) Components include, for example, imidazole-based curing accelerators (excluding compounds represented by the formula (C-1) and compounds represented by the formula (C-2)), amine-based curing accelerators, and guanidine-based curing accelerators. A hardening accelerator, a phosphorus-based hardening accelerator, a metal-based hardening accelerator, etc. are mentioned. Among them, as the component (D), either an imidazole-based curing accelerator or an amine-based curing accelerator is preferable. (D) Components may be used individually, or may be used in combination of two or more types.

Examples of imidazole-based curing accelerators include 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, and 2-ethyl-4-methyl. Imidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methyl Midazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl -4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium Trimellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-undecyl imidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s- Triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazineisocyanuric acid adduct, 2-phenylimidazoleisocyanuric acid addition Water, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro-1H-pyrrolo[1,2 -a] Imidazole compounds such as benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline, 2-phenylimidazoline, and imidazole compounds and epoxy resins Adduct forms include, and 2-ethyl-4-methylimidazole and 1-benzyl-2-phenylimidazole are preferred.

As the imidazole-based curing accelerator, a commercial product may be used, for example, "1B2PZ" manufactured by Shikoku Kasei Kogyo Co., Ltd., etc.

Examples of amine-based curing accelerators include trialkylamines such as triethylamine and tributylamine, 4-dimethylaminopyridine, benzyldimethylamine, 2,4,6,-tris(dimethylaminomethyl)phenol, 1, Examples include 8-diazabicyclo(5,4,0)-undecene, and 4-dimethylaminopyridine and 1,8-diazabicyclo(5,4,0)-undecene are preferred.

As the amine-based curing accelerator, a commercial product may be used, for example, "DMAP" manufactured by Tokyo Kasei Kogyo Co., Ltd., etc.

Examples of guanidine-based curing accelerators include dicyandiamide, 1-methylguanidine, 1-ethylguanidine, 1-cyclohexylguanidine, 1-phenylguanidine, 1-(o-tolyl)guanidine, dimethylguanidine, and diphenylguanidine. , trimethylguanidine, tetramethylguanidine, pentamethylguanidine, 1,5,7-triazabicyclo[4.4.0]deca-5-ene, 7-methyl-1,5,7-triazabicyclo[4.4.0] Deca-5-ene, 1-methylbiguanide, 1-ethylbiguanide, 1-n-butylbiguanide, 1-n-octadecylbiguanide, 1,1-dimethylbiguanide, 1, 1-diethyl biguanide, 1-cyclohexyl biguanide, 1-allyl biguanide, 1-phenyl biguanide, 1-(o-tolyl) biguanide, etc., dicyandiamide, 1,5,7-triazabicyclo[4.4.0]deca-5-ene is preferred.

Examples of phosphorus-based curing accelerators include triphenylphosphine, phosphonium borate compounds, tetraphenylphosphonium tetraphenyl borate, n-butylphosphonium tetraphenyl borate, tetrabutylphosphonium decanoate, and (4-methylphenyl)triphenyl. Examples include phosphonium thiocyanate, tetraphenylphosphonium thiocyanate, butyltriphenylphosphonium thiocyanate, and triphenylphosphine and tetrabutylphosphonium decanoate are preferred.

Examples of the metal-based curing accelerator include organometallic complexes or organometallic salts of metals such as cobalt, copper, zinc, iron, nickel, manganese, and tin. Specific examples of organometallic complexes include organic cobalt complexes such as cobalt (II) acetylacetonate and cobalt (III) acetylacetonate, organic copper complexes such as copper (II) acetylacetonate, and zinc (II) acetylacetonate. Examples include organic zinc complexes, organic iron complexes such as iron(III) acetylacetonate, organic nickel complexes such as nickel(II) acetylacetonate, and organic manganese complexes such as manganese(II) acetylacetonate. Examples of organometallic salts include zinc octylate, tin octylate, zinc naphthenate, cobalt naphthenate, tin stearate, and zinc stearate.

The content of component (D) is preferably 0.05% by mass or more, more preferably 0.1% by mass or more, when the resin component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention. More preferably, it is 0.3 mass% or more, preferably 5 mass% or less, more preferably 3 mass% or less, further preferably 1.5 mass% or less, and 1 mass% or less.

The content of component (D) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, when the non-volatile component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention. , more preferably 0.1 mass% or more, preferably 5 mass% or less, more preferably 1 mass% or less, even more preferably 0.5 mass% or less.

Let d be the content of component (D) when the nonvolatile component in the resin composition is 100% by mass, and c be the content of component (C) when the nonvolatile component in the resin composition is 100% by mass. , c/d is preferably 0.1 or more, more preferably 0.5 or more, further preferably 1 or more, preferably 30 or less, more preferably 18 or less, from the viewpoint of obtaining a cured product with excellent crack resistance. , more preferably 10 or less, 5 or less, 4 or less, and 3 or less.

When b is the content of component (B) when the non-volatile component in the resin composition is 100% by mass, b/(c+d) is preferably 1 or more, more preferably 5 or more, and even more preferably Preferably it is 10 or more and 15 or more, preferably 150 or less, more preferably 50 or less, and even more preferably 30 or less, 25 or less, and 20 or less. Since the resin composition of the present invention contains a combination of component (C) and component (D), a cured product with excellent crack resistance and peel strength can be obtained even if the content of component (B) is increased to lower the dielectric loss tangent. .

<(E) Weapon Filler>

The resin composition may contain (E) an inorganic filler as an optional component in addition to the components mentioned above. (E) By containing an inorganic filler in the resin composition, it becomes possible to obtain a cured product with excellent dielectric properties.

As the material for the inorganic filler, an inorganic compound is used. Examples of inorganic filler materials include silica, alumina, glass, cordierite, silicon oxide, barium sulfate, barium carbonate, talc, clay, mica powder, zinc oxide, hydrotalcite, boehmite, aluminum hydroxide, magnesium hydroxide, and carbonic acid. Calcium, magnesium carbonate, magnesium oxide, boron nitride, aluminum nitride, manganese nitride, aluminum borate, strontium carbonate, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, zirconium oxide, barium titanate, barium titanate zirconate, zirconate. Examples include barium acid, calcium zirconate, zirconium phosphate, and zirconium tungstate phosphate. Among these, silica is particularly suitable. Examples of silica include amorphous silica, fused silica, crystalline silica, synthetic silica, and hollow silica. Moreover, as silica, spherical silica is preferable. (E) Inorganic fillers may be used individually or in combination of two or more types.

(E) Commercially available inorganic fillers include, for example, “SP60-05” and “SP507-05” manufactured by Nittetsu Chemical &Materials; "YC100C", "YA050C", "YA050C-MJE", "YA010C", "SC2500SQ", "SO-C4", "SO-C2", and "SO-C1" manufactured by Adomatex Corporation; “UFP-30”, “DAW-03”, and “FB-105FD” manufactured by Denka Co., Ltd., “Real Pen NSS-3N”, “Real Pen NSS-4N”, and “Real Pen NSS-5N” manufactured by Tokuyama Co., Ltd.; “Cell Spears” and “MGH-005” manufactured by Taiheyo Cement Co., Ltd.; "BA-1" etc. are mentioned.

(E) The average particle diameter of the inorganic filler is preferably 0.01 μm or more, more preferably 0.05 μm or more, particularly preferably 0.1 μm or more, from the viewpoint of significantly obtaining the desired effect of the present invention. It is 5㎛ or less, more preferably 2㎛ or less, and even more preferably 1㎛ or less.

(E) The average particle diameter of the inorganic filler can be measured by a laser diffraction/scattering method based on Mie scattering theory. Specifically, the particle size distribution of the inorganic filler can be prepared on a volume basis using a laser diffraction scattering type particle size distribution measuring device, and the median diameter can be measured as the average particle size. The measurement sample can be obtained by weighing 100 mg of inorganic filler and 10 g of methyl ethyl ketone in a vial bottle and dispersing them by ultrasonic waves for 10 minutes. For the measurement sample, use a laser diffraction type particle size distribution measuring device, use a light source wavelength of blue and red, measure the volume-based particle size distribution of the inorganic filler using a flow cell method, and determine the median diameter from the obtained particle size distribution. Calculate the average particle diameter as . Examples of the laser diffraction type particle diameter distribution measuring device include "LA-960" manufactured by Horiba Chemical Industry Co., Ltd. and "SALD-2200" manufactured by Shimazu Chemical Industry Co., Ltd., etc.

(E) The specific surface area of the inorganic filler is preferably 1 m2/g or more, more preferably 2 m2/g or more, particularly preferably 3 m2/g or more from the viewpoint of significantly obtaining the desired effect of the present invention. am. There is no particular limitation on the upper limit, but it is preferably 60 m2/g or less, 50 m2/g or less, or 40 m2/g or less. The specific surface area of the inorganic filler is measured by adsorbing nitrogen gas to the surface of the sample using a BET fully automatic specific surface area measuring device (Macsorb HM-1210 manufactured by Mountec) and calculating the specific surface area using the BET multi-point method. It is obtained by doing.

(E) The inorganic filler is preferably treated with a surface treatment agent from the viewpoint of improving moisture resistance and dispersibility. Examples of the surface treatment agent include fluorine-containing silane coupling agents such as 3,3,3-trifluoropropyltrimethoxysilane; Aminosilane coupling agents such as 3-aminopropyltriethoxysilane, N-phenyl-8-aminooctyl-trimethoxysilane, and N-phenyl-3-aminopropyltrimethoxysilane; Epoxysilane-based coupling agents such as 3-glycidoxypropyltrimethoxysilane; Mercaptosilane-based coupling agents such as 3-mercaptopropyltrimethoxysilane; Silane-based coupling agent; Alkoxysilanes such as phenyltrimethoxysilane; Organosilazane compounds such as hexamethyldisilazane, titanate-based coupling agents, etc. can be mentioned. In addition, surface treatment agents may be used individually, or two or more types may be used in arbitrary combination.

Commercially available surface treatment agents include, for example, “KBM403” (3-glycidoxypropyltrimethoxysilane), manufactured by Shin-Etsu Chemical Kogyo Co., Ltd., and “KBM803” (3-mercaptopropyltrimethoxysilane), manufactured by Shin-Etsu Chemical Co., Ltd. silane), “KBE903” (3-aminopropyltriethoxysilane) manufactured by Shin-Etsu Chemical Kogyoso, “KBM573” (N-phenyl-3-aminopropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Kogyoso, Shin-Etsu Chemical “SZ-31” (hexamethyldisilazane) manufactured by Kogyo Corporation, “KBM103” (phenyltrimethoxysilane) manufactured by Shin-Etsu Chemical Kogyo Corporation, and “KBM-4803” (long chain epoxy type silane couple) manufactured by Shin-Etsu Chemical Kogyo Corporation ring agent), "KBM-7103" (3,3,3-trifluoropropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd., etc.

The degree of surface treatment with the surface treatment agent is preferably within a predetermined range from the viewpoint of improving the dispersibility of the inorganic filler. Specifically, 100 parts by mass of the inorganic filler is preferably surface-treated with a surface treatment agent in an amount of 0.2 to 5 parts by mass, preferably in an amount of 0.2 to 3 parts by mass, and preferably in an amount of 0.3 to 2 parts by mass. It is preferable that the surface is treated.

The degree of surface treatment by a surface treatment agent can be evaluated by the amount of carbon per unit surface area of the inorganic filler. From the viewpoint of improving the dispersibility of the inorganic filler, the amount of carbon per unit surface area of the inorganic filler is preferably 0.02 mg/m 2 or more, more preferably 0.1 mg/m 2 or more, and still more preferably 0.2 mg/m 2 or more. On the other hand, from the viewpoint of suppressing an increase in the melt viscosity of the resin varnish and the melt viscosity in sheet form, 1 mg/m 2 or less is preferable, 0.8 mg/m 2 or less is more preferable, and 0.5 mg/m 2 or less is still more preferable.

(E) The amount of carbon per unit surface area of the inorganic filler can be measured after the surface-treated inorganic filler is washed with a solvent (for example, methyl ethyl ketone (MEK)). Specifically, a sufficient amount of MEK as a solvent is added to the inorganic filler surface-treated with a surface treatment agent, and ultrasonic cleaning is performed at 25°C for 5 minutes. After removing the supernatant and drying the solids, the amount of carbon per unit surface area of the inorganic filler can be measured using a carbon analyzer. As a carbon analyzer, "EMIA-320V" manufactured by Horiba Sesakusho, etc. can be used.

(E) The content of the inorganic filler is preferably 60% by mass or more, more preferably 70% by mass or more, when the non-volatile component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the effect of the present invention. , more preferably 75 mass% or more, preferably 90 mass% or less, preferably 85 mass% or less, preferably 80 mass% or less.

<(F) Thermoplastic resin>

The resin composition of the present invention may further contain (F) a thermoplastic resin as an optional component. The (F) thermoplastic resin as this (F) component does not include those corresponding to the above-mentioned (A) to (D) components.

(F) Thermoplastic resins include, for example, polyimide resin, phenoxy resin, polyvinyl acetal resin, polyolefin resin, polybutadiene resin, polyamidoimide resin, polyetherimide resin, polysulfone resin, polyethersulfone resin, Polyphenylene ether resin, polycarbonate resin, polyether ether ketone resin, polyester resin, etc. can be mentioned. (F) In one embodiment, the thermoplastic resin preferably contains a thermoplastic resin selected from the group consisting of polyimide resin and phenoxy resin, and more preferably contains phenoxy resin. In addition, thermoplastic resins may be used individually, or may be used in combination of two or more types.

Specific examples of the polyimide resin include “SLK-6100” manufactured by Shin-Etsu Chemical Co., Ltd., “Lika Coat SN20” and “Rica Coat PN20” manufactured by Nippon Rika Co., Ltd.

Examples of the phenoxy resin include bisphenol A skeleton, bisphenol F skeleton, bisphenol S skeleton, bisphenol acetophenone skeleton, novolak skeleton, biphenyl skeleton, fluorene skeleton, dicyclopentadiene skeleton, norbornene skeleton, and naphthalene skeleton. , a phenoxy resin having at least one skeleton selected from the group consisting of anthracene skeleton, adamantane skeleton, terpene skeleton, and trimethylcyclohexane skeleton. The terminal of the phenoxy resin may be any functional group such as a phenolic hydroxyl group or an epoxy group.

Specific examples of the phenoxy resin include "1256" and "4250" manufactured by Mitsubishi Chemical Corporation (both phenoxy resins containing a bisphenol A skeleton); “YX8100” manufactured by Mitsubishi Chemical Corporation (phenoxy resin containing bisphenol S skeleton); “YX6954” manufactured by Mitsubishi Chemical Corporation (phenoxy resin containing bisphenol acetophenone skeleton); “FX280” and “FX293” manufactured by Nittetsu Chemical & Materials, Inc.; "YL7500BH30", "YX6954BH30", "YX7553", "YX7553BH30", "YL7769BH30", "YL6794", "YL7213", "YL7290", "YL7482" and "YL789" manufactured by Mitsubishi Chemical Corporation 1BH30”; etc. can be mentioned.

Examples of the polyvinyl acetal resin include polyvinyl formal resin and polyvinyl butyral resin, with polyvinyl butyral resin being preferred. Specific examples of polyvinyl acetal resins include S-REC BH series, BX series (for example, BX-5Z), KS series (for example, KS-1), BL series and BM series manufactured by Sekisui Chemical Co., Ltd.; etc. can be mentioned.

Examples of polyolefin resins include ethylene-based copolymer resins such as low-density polyethylene, ultra-low-density polyethylene, high-density polyethylene, ethylene-vinyl acetate copolymer, ethylene-ethyl acrylate copolymer, and ethylene-methyl acrylate copolymer; and polyolefin-based polymers such as polypropylene and ethylene-propylene block copolymer.

Examples of the polybutadiene resin include hydrogenated polybutadiene skeleton-containing resin, hydroxyl group-containing polybutadiene resin, phenolic hydroxyl group-containing polybutadiene resin, carboxyl group-containing polybutadiene resin, acid anhydride group-containing polybutadiene resin, and epoxy group-containing polybutadiene. Resins, polybutadiene resins containing isocyanate groups, polybutadiene resins containing urethane groups, polyphenylene ether-polybutadiene resins, etc. can be mentioned.

Specific examples of polyamide-imide resin include “Viromax HR11NN” and “Viromax HR16NN” manufactured by Toyobo Co., Ltd. Specific examples of polyamideimide resins include modified polyamideimides such as "KS9100" and "KS9300" (polyamideimide containing a polysiloxane skeleton) manufactured by Resonax.

Specific examples of the polyether sulfone resin include "PES5003P" manufactured by Sumitomo Chemical Co., Ltd.

Specific examples of polysulfone resins include polysulfone “P1700” and “P3500” manufactured by Solvay Advanced Polymers.

Specific examples of polyphenylene ether resin include "NORYL SA90" manufactured by SABIC. Specific examples of polyetherimide resin include “Ultem” manufactured by GE Corporation.

Examples of polycarbonate resins include carbonate resins containing hydroxy groups, carbonate resins containing phenolic hydroxyl groups, carbonate resins containing carboxyl groups, carbonate resins containing acid anhydride groups, carbonate resins containing isocyanate groups, carbonate resins containing urethane groups, and the like. Specific examples of polycarbonate resin include "FPC0220" manufactured by Mitsubishi Gas Chemical Co., Ltd., "T6002" and "T6001" (polycarbonate diol) manufactured by Asahi Kasei Corporation, and "C-1090" and "C-2090" manufactured by Kuraray Co., Ltd. , “C-3090” (polycarbonate diol), etc. Specific examples of polyetheretherketone resin include "Sumipro K" manufactured by Sumitomo Chemical Co., Ltd.

Examples of polyester resin include polyethylene terephthalate resin, polyethylene naphthalate resin, polybutylene terephthalate resin, polybutylene naphthalate resin, polytrimethylene terephthalate resin, polytrimethylene naphthalate resin, and polycyclohexane dimethyl terephthalate. Phthalate resin, etc. can be mentioned.

(F) The weight average molecular weight (Mw) of the thermoplastic resin is preferably 5,000 or more, more preferably 8,000 or more, further preferably 10,000 or more, especially preferably 20,000 or more from the viewpoint of significantly obtaining the effects of the present invention. and is preferably 100,000 or less, more preferably 70,000 or less, further preferably 60,000 or less, and particularly preferably 50,000 or less.

(F) The content of the thermoplastic resin is preferably 0.5% by mass or more, more preferably 1% by mass or more, when the resin component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention. , more preferably 1.5 mass% or more, preferably 6 mass% or less, preferably 5 mass% or less, more preferably 4 mass% or less, further preferably 3 mass% or less.

(F) The content of the thermoplastic resin is preferably 0.1% by mass or more, more preferably 0.5% by mass, when the non-volatile component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention. or more, more preferably 1 mass% or more, preferably 5 mass% or less, more preferably 3 mass% or less, and even more preferably 2 mass% or less.

<(G) Hardener>

In addition to the components mentioned above, the resin composition may further contain (G) a curing agent as an optional component. The (G) hardener as this (G) component does not include those corresponding to the above-mentioned (A) to (F) components. The (G) curing agent can usually form a bond through a reaction with the (A) epoxy resin and harden the resin composition. (G) Examples of the curing agent include phenol-based curing agents, naphthol-based curing agents, benzoxazine-based curing agents, cyanate ester-based curing agents, and carbodiimide-based curing agents. Among them, from the viewpoint of improving insulation reliability, the (G) curing agent is preferably at least one of a phenol-based curing agent, a naphthol-based curing agent, and a carbodiimide-based curing agent, and is preferably one of a phenol-based curing agent and a naphthol-based curing agent. It is more preferable that it contains a phenol-based curing agent. (G) One type of hardening agent may be used individually, or two or more types may be used together.

As the phenol-based curing agent and the naphthol-based curing agent, a phenol-based curing agent having a novolac structure or a naphthol-based curing agent having a novolac structure is preferable from the viewpoint of heat resistance and water resistance. Furthermore, from the viewpoint of adhesion to the conductor layer, a nitrogen-containing phenol-based curing agent is preferable, and a triazine skeleton-containing phenol-based curing agent is more preferable.

Specific examples of phenol-based curing agents and naphthol-based curing agents include, for example, “MEH-7700”, “MEH-7810”, and “MEH-7851” manufactured by Meiwa Kasei Co., Ltd., “NHN” and “CBN” manufactured by Nippon Kayaku Co., Ltd. ”, “GPH”, “SN170”, “SN180”, “SN190”, “SN475”, “SN485”, “SN495”, “SN-495V”, “SN375”, “SN395” manufactured by Shin-Nittetsu Sumikin Kagaku Corporation. ", "TD-2090", "LA-7052", "LA-7054", "LA-1356", "LA3018-50P", and "EXB-9500" manufactured by DIC Corporation.

Specific examples of the benzoxazine-based curing agent include “HFB2006M” manufactured by Showa Kobunshi Corporation and “P-d” and “F-a” manufactured by Shikoku Kasei Kogyo Corporation.

Examples of cyanate ester-based curing agents include bisphenol A dicyanate, polyphenol cyanate, oligo(3-methylene-1,5-phenylenecyanate), and 4,4'-methylenebis(2,6-dimethyl. phenylcyanate), 4,4'-ethylidenediphenyldicyanate, hexafluorobisphenol A dicyanate, 2,2-bis(4-cyanate)phenylpropane, 1,1-bis(4-cyanate) natephenylmethane), bis(4-cyanate-3,5-dimethyl)phenyl)methane, 1,3-bis(4-cyanatephenyl-1-(methylethylidene))benzene, bis(4-cyanate) Bifunctional cyanate resins such as natephenyl)thioether and bis(4-cyanatephenyl)ether, polyfunctional cyanate resins derived from phenol novolak and cresol novolac, etc., some of these cyanate resins are triazineized. Prepolymers, etc. can be mentioned. Specific examples of cyanate ester-based curing agents include "PT30" and "PT60" (phenol novolak-type polyfunctional cyanate ester resin), "ULL-950S" (polyfunctional cyanate ester resin), and "BA230" manufactured by Lonza Corporation. , “BA230S75” (a prepolymer in which part or all of bisphenol A dicyanate is triazylated to form a trimer), etc.

Specific examples of carbodiimide-based curing agents include “V-03” and “V-07” manufactured by Nisshinbo Chemical Co., Ltd.

(G) When a curing agent is contained as a component, the ratio of (A) epoxy resin, (B) active ester-based curing agent, and (G) curing agent is [total number of epoxy groups of epoxy resin]: [(B) active ester-based curing agent. The ratio of the curing agent and (G) the total number of active groups of the curing agent] is preferably in the range of 1:0.01 to 1:5, more preferably 1:0.3 to 1:3, and even more preferably 1:0.5 to 1:2. desirable. Here, the “epoxy group number of the epoxy resin” is the sum of all the values obtained by dividing the mass of the non-volatile component of the epoxy resin present in the resin composition by the epoxy equivalent. In addition, “the number of active groups of the (B) active ester curing agent and (G) curing agent” is the sum of the mass of the active ester curing agent and the non-volatile components of the curing agent present in the resin composition divided by the active group equivalent. . By keeping the amount ratio of component (B) and component (G) with the epoxy resin within this range, the effect of the present invention can be significantly achieved.

When containing a curing agent as a component (G), the amount ratio of the epoxy resin and all (G) curing agents is the ratio of [total number of epoxy groups in the epoxy resin]:[total number of active groups in the (G) curing agent], 1: The range of 0.01 to 1:1 is preferable, 1:0.03 to 1:0.5 is more preferable, and 1:0.05 to 1:0.3 is still more preferable. Here, “the number of active groups of the (G) curing agent” is a value obtained by dividing the mass of the non-volatile component of the (G) curing agent present in the resin composition by the active group equivalent. (G) As the component, the effect of the present invention can be significantly achieved by keeping the amount ratio of the epoxy resin and the curing agent within this range.

The content of component (G) is preferably 1% by mass or more, more preferably 2% by mass or more, when the resin component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention, More preferably, it is 3% by mass or more, preferably 15% by mass or less, preferably 10% by mass or less, more preferably 8% by mass or less, and even more preferably 7% by mass or less.

(G) The content of the curing agent is preferably 0.1% by mass or more, more preferably 0.2% by mass or more, when the non-volatile component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention. , more preferably 0.3% by mass or more. The upper limit is preferably 5 mass% or less, more preferably 3 mass% or less, and even more preferably 2 mass% or less.

<(H) radically polymerizable compound>

The resin composition of the present invention may further contain a (H) radically polymerizable compound as an optional component. The (H) radically polymerizable resin as this (H) component does not include the components corresponding to the above-mentioned (A) to (G) components. (H) The radical polymerizable compound may be used individually or in combination of two or more types.

(H) In one embodiment, the radically polymerizable compound is a radically polymerizable compound having an ethylenically unsaturated bond. (H) The radically polymerizable compound is not particularly limited, but includes, for example, allyl group, 3-cyclohexenyl group, 3-cyclopentenyl group, p-vinylphenyl group, m-vinylphenyl group, o-vinylphenyl group, etc. unsaturated hydrocarbon group; It has a radical polymerizable group such as α,β-unsaturated carbonyl group such as acryloyl group, methacryloyl group, maleimide group (2,5-dihydro-2,5-dioxo-1H-pyrrol-1-yl group), etc. You can. (H) The radically polymerizable compound preferably has two or more radically polymerizable groups.

(H) The radically polymerizable compound may be, for example, a (meth)acrylic radically polymerizable compound, a styrene-based radically polymerizable compound, an allyl-based radically polymerizable compound, or a maleimide-based radically polymerizable compound.

A (meth)acrylic radically polymerizable compound is, for example, a compound having one or more, preferably two or more, acryloyl groups and/or methacryloyl groups. Examples of (meth)acrylic radically polymerizable compounds include cyclohexane-1,4-dimethanol di(meth)acrylate, cyclohexane-1,3-dimethanol di(meth)acrylate, and tricyclodecanedi. Methanol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,8-octanediol di. (meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylol ethane tri(meth)acrylate low molecular weight (molecular weight less than 1000) aliphatic (meth)acrylic acid ester compounds such as glycerin tri(meth)acrylate, pentaerythritol tetra(meth)acrylate; Dioxane glycol di(meth)acrylate, 3,6-dioxa-1,8-octanediol di(meth)acrylate, 3,6,9-trioxaundecane-1,11-dioldi(meth) Acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene, ethoxylated bisphenol A di. low molecular weight (molecular weight less than 1000) ether-containing (meth)acrylic acid ester compounds such as (meth)acrylate and propoxylated bisphenol A di(meth)acrylate; Tris(3-hydroxypropyl)isocyanurate tri(meth)acrylate, tris(2-hydroxyethyl)isocyanurate tri(meth)acrylate, ethoxylated isocyanuric acid tri(meth)acrylate low molecular weight (molecular weight less than 1000) isocyanurate-containing (meth)acrylic acid ester compounds; and high molecular weight (molecular weight 1000 or more) acrylic acid ester compounds such as (meth)acrylic modified polyphenylene ether resin. Commercially available products of (meth)acrylic radically polymerizable compounds include, for example, “A-DOG” (dioxane glycol diacrylate) manufactured by Shinnakamura Chemical Co., Ltd. and “DCP-A” manufactured by Kyoesha Chemical Co., Ltd. (Tricyclodecane dimethanol diacrylate), “DCP” (Tricyclodecane dimethanol dimethacrylate), Nippon Kayaku Co., Ltd.’s “KAYARAD R-684” (Tricyclodecane dimethanol diacrylate), “KAYARAD R-604” (dioxane glycol diacrylate), “SA9000” manufactured by SABIC, and “SA9000-111” (methacryl-modified polyphenylene ether).

A styrene-based radically polymerizable compound is, for example, a compound having one or more, preferably two or more, vinyl groups directly bonded to an aromatic carbon atom. Examples of styrene-based radically polymerizable compounds include divinylbenzene, 2,4-divinyltoluene, 2,6-divinylnaphthalene, 1,4-divinylnaphthalene, 4,4'-divinylbiphenyl, Low molecular weight (molecular weight less than 1000) styrene-based compounds such as 1,2-bis(4-vinylphenyl)ethane, 2,2-bis(4-vinylphenyl)propane, and bis(4-vinylphenyl)ether; and high molecular weight (molecular weight 1000 or more) styrene-based compounds such as vinylbenzyl-modified polyphenylene ether resin and styrene-divinylbenzene copolymer. Commercially available products of styrene-based radically polymerizable compounds include, for example, “ODV-XET (X03)”, “ODV-XET (X04)”, and “ODV-XET ( )-divinylbenzene copolymer), “OPE-2St 1200” and “OPE-2St 2200” (vinylbenzyl modified polyphenylene ether resin) manufactured by Mitsubishi Gas Chemical Co., Ltd.

An allyl-based radically polymerizable compound is, for example, a compound having one or more allyl groups, preferably two or more allyl groups. Examples of allyl-based radically polymerizable compounds include diallyl diphenate, triallyl trimellitate, diallyl phthalate, diallyl isophthalate, diallyl terephthalate, diallyl 2,6-naphthalenedicarboxylic acid, and 2,3-naphthalene. Aromatic carboxylic acid allyl ester compounds such as diallyl carboxylic acid; isocyanuric acid allyl ester compounds such as 1,3,5-triallyl isocyanurate and 1,3-diallyl-5-glycidyl isocyanurate; epoxy-containing aromatic allyl compounds such as 2,2-bis[3-allyl-4-(glycidyloxy)phenyl]propane; benzoxazine-containing aromatic allyl compounds such as bis[3-allyl-4-(3,4-dihydro-2H-2,3-benzoxazin-3-yl)phenyl]methane; ether-containing aromatic allyl compounds such as 1,3,5-triallyl ether benzene; Allylsilane compounds such as diallyldiphenylsilane, etc. can be mentioned. Commercially available allyl-based radically polymerizable compounds include “TAIC” (1,3,5-triaryl isocyanurate) manufactured by Nippon Kasei Co., Ltd. and “DAD” (diallyl diphenate) manufactured by Nisshoku Technofine Chemical Co., Ltd. , “TRIAM-705” (triallyl trimellitate) manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., brand name “DAND” (diallyl 2,3-naphthalenecarboxylic acid) manufactured by Nisshoku Technofine Chemicals, and “ ALP-d" (bis[3-allyl-4-(3,4-dihydro-2H-1,3-benzoxazin-3-yl)phenyl]methane), "RE-810NM" manufactured by Nippon Kayaku Co., Ltd. (2,2-bis[3-allyl-4-(glycidyloxy)phenyl]propane), “DA-MGIC” (1,3-diallyl-5-glycidyl isoci) manufactured by Shikoku Kasei Kokyo Co., Ltd. Anurate), etc. can be mentioned.

A maleimide-based radically polymerizable compound is, for example, a compound having one or more, preferably two or more, maleimide groups. The maleimide-based radically polymerizable compound may be an aliphatic maleimide compound containing an aliphatic amine skeleton or an aromatic maleimide compound containing an aromatic amine skeleton, and commercially available products include, for example, “SLK-” manufactured by Shin-Etsu Chemical Co., Ltd. 2600”, “BMI-1500”, “BMI-1700”, “BMI-3000J”, “BMI-689”, “BMI-2500” (maleimide compound containing dimerdiamine structure) manufactured by Designer Molercules Inc., Designer “BMI-6100” (aromatic maleimide compound) manufactured by Molercules Inc., “MIR-5000-60T” and “MIR-3000-70MT” (biphenylaralkyl type maleimide compound) manufactured by Nippon Kayaku, K.I. Examples include "BMI-70" and "BMI-80" manufactured by Kasei Corporation, and "BMI-2300" and "BMI-TMH" manufactured by Yamato Kasei Kogyo Corporation. Additionally, as a maleimide-based radically polymerizable compound, a maleimide resin (a maleimide compound containing an indan ring skeleton) disclosed in Public Invention Association Publication No. 2020-500211 may be used.

(H) The ethylenically unsaturated bond equivalent weight of the radically polymerizable compound is preferably 20 g/eq. to 3000 g/eq., more preferably 50 g/eq. to 2500 g/eq., more preferably 70 g/eq. to 2000 g/eq., particularly preferably 90 g/eq. to 1500 g/eq. The ethylenically unsaturated bond equivalent is the mass of the radically polymerizable compound per equivalent of the ethylenically unsaturated bond.

(H) The weight average molecular weight (Mw) of the radically polymerizable compound is preferably 40,000 or less, more preferably 10,000 or less, further preferably 5,000 or less, and particularly preferably 3,000 or less. The lower limit is not particularly limited, but can be, for example, 150 or more.

The content of component (H) is preferably 1% by mass or more, more preferably 3% by mass or more, when the resin component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention, More preferably, it is 5 mass% or more, preferably 15 mass% or less, preferably 10 mass% or less, and more preferably 8 mass% or less.

The content of component (H) is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, when the non-volatile component in the resin composition is 100% by mass, from the viewpoint of significantly obtaining the desired effect of the present invention. , more preferably 1 mass% or more, preferably 5 mass% or less, more preferably 4 mass% or less, and even more preferably 3 mass% or less.

<(I) Other additives>

In addition to the components mentioned above, the resin composition may further contain other additives as optional components. Examples of such additives include elastomers (excluding those corresponding to component (F)), organic fillers, thickeners, anti-foaming agents, leveling agents, adhesion imparting agents, flame retardants, etc. These may be used individually, or two or more types may be used in combination at any ratio.

The resin composition can be manufactured, for example, by mixing the above-mentioned components in any order. Additionally, in the process of mixing each component, heating and/or cooling may be performed by appropriately adjusting the temperature. Additionally, during or after mixing each component, stirring may be performed using a stirring device such as a mixer to uniformly disperse each component. Additionally, if necessary, the resin composition may be subjected to defoaming treatment.

<Physical properties and uses of resin composition>

Since the resin composition contains component (A), component (B), component (C), and component (D) in combination, it is possible to obtain a cured product with excellent crack resistance, high peel strength, and low dielectric loss tangent. It becomes possible. In addition, the resin composition usually makes it possible to obtain a cured product with a small surface roughness after roughening treatment.

The cured product obtained by curing the resin composition at 100°C for 30 minutes, at 170°C for 30 minutes, and further at 190°C for 1 hour exhibits excellent crack resistance. Therefore, an insulating layer with excellent crack resistance is formed. Specifically, a layer made of a cured resin composition is formed on an inner layer circuit board on which 25 copper patterns are formed. The layer consisting of the cured material is roughened, and a copper plating layer is formed on the roughened surface. At this time, the number of gold cracks in the 25 copper patterns is preferably 2 or less, more preferably 1 or less, and even more preferably 0. Crack resistance can be measured by the method described in the Examples described later.

The cured product obtained by curing the resin composition at 100°C for 30 minutes, at 170°C for 30 minutes, and further at 190°C for 1 hour can increase the peeling strength between plating. Therefore, when an insulating layer is formed from this cured material, an insulating layer with a high peeling strength between the cured material and the conductor layer can be obtained. The peeling strength between the insulating layer and the conductor layer may be preferably 0.4 kgf/cm or more, and more preferably 0.5 kgf/cm or more. The upper limit of the peeling strength is not particularly limited, but may be, for example, 10.0 kgf/cm or less. Peel strength can be measured by the method described in the Examples described later.

The cured product obtained by heat curing the resin composition at 200°C for 90 minutes has a low dielectric loss tangent. Therefore, when an insulating layer is formed with this cured material, an insulating layer with a low dielectric loss tangent can be obtained. The dielectric loss tangent of the cured product is preferably less than 0.0035, more preferably less than 0.0030, and even more preferably less than 0.0030, less than 0.0030, 0.0025 or less, and less than 0.0025. The lower limit is not particularly limited, but may be 0.0001 or more. The dielectric loss tangent can be measured by the method described in the Examples described later.

The cured product of the resin composition usually exhibits the characteristic of low arithmetic mean roughness (Ra) of the surface of the insulating layer after roughening treatment. The arithmetic mean roughness (Ra) of the surface of the insulating layer after roughening treatment may be preferably less than 400 nm, more preferably less than 200 nm, even more preferably less than 100 nm, and even more preferably less than 100 nm. The lower limit is not particularly limited and can be, for example, 1 nm or more, 2 nm or more, etc. Arithmetic average roughness (Ra) can be measured by the method described in the Examples described later.

The resin composition of the present invention is suitable as a resin composition for insulation purposes, and is particularly suitable as a resin composition for forming an insulating layer. Therefore, for example, the resin composition is suitable as a resin composition for forming an insulating layer of a printed wiring board (a resin composition for forming an insulating layer of a printed wiring board). The resin composition is suitable as a resin composition for forming an interlayer insulating layer of a printed wiring board (resin composition for forming an interlayer insulating layer of a printed wiring board). In addition, the resin composition is suitable as a resin composition for forming the insulating layer (resin composition for forming an insulating layer for forming a conductor layer) for forming a conductor layer (including a rewiring layer) formed on the insulating layer. . The resin composition also includes sheet-like laminate materials such as resin sheets and prepregs, solder resists, underfill materials, die bonding materials, semiconductor sealants, hole filling resins, component filling resins, multichip packages, package-on-packages, wafer-level packages, It can be used in a wide range of applications where the resin composition can be used, such as panel level packaging and system-in-package.

In addition, for example, when a semiconductor chip package is manufactured through the following processes (1) to (6), the resin composition according to the present embodiment is used to form a redistribution formation layer as an insulating layer for forming a redistribution layer. It is also suitable as a resin composition for sealing a semiconductor chip (a resin composition for forming a redistribution layer) and a resin composition for sealing a semiconductor chip (a resin composition for sealing a semiconductor chip). When a semiconductor chip package is manufactured, a redistribution layer may be additionally formed on the sealing layer.

(1) A process of laminating a temporarily fixed film on a substrate,

(2) A process of temporarily fixing a semiconductor chip on a temporarily fixing film,

(3) Process of forming a sealing layer on the semiconductor chip,

(4) A process of peeling the base material and temporarily fixed film from the semiconductor chip,

(5) A process of forming a redistribution layer as an insulating layer on the surface of the semiconductor chip from which the substrate and temporarily fixed film are peeled, and

(6) Process of forming a redistribution layer as a conductor layer on the redistribution forming layer

The above resin composition can be used even when the printed wiring board is a circuit board with built-in components.

[Resin sheet]

The resin sheet of the present invention includes a support and a resin composition layer formed from the resin composition of the present invention provided on the support.

The thickness of the resin composition layer is preferably 50 μm or less, more preferably 40 μm or less, from the viewpoint of reducing the thickness of the printed wiring board and providing a cured product with excellent insulating properties even if the cured product of the resin composition is a thin film. More preferably, it is 30 μm or less. The lower limit of the thickness of the resin composition layer is not particularly limited, but can usually be 5 μm or more.

Examples of the support include films made of plastic materials, metal foils, and release papers, and films and metal foils made of plastic materials are preferred.

When using a film made of a plastic material as a support, examples of the plastic material include polyethylene terephthalate (hereinafter sometimes abbreviated as “PET”), polyethylene naphthalate (hereinafter sometimes abbreviated as “PEN”) .), polyester, polycarbonate (hereinafter sometimes abbreviated as “PC”), acrylic, polymethyl methacrylate (PMMA), cyclic polyolefin, triacetylcellulose (TAC), and polyether sulfide (PES). ), polyether ketone, polyimide, etc. Among them, polyethylene terephthalate and polyethylene naphthalate are preferable, and inexpensive polyethylene terephthalate is especially preferable.

When using a metal foil as a support, examples of the metal foil include copper foil, aluminum foil, etc., and copper foil is preferable. As the copper foil, a foil made of the simple metal of copper may be used, or a foil made of an alloy of copper and other metals (e.g., tin, chromium, silver, magnesium, nickel, zirconium, silicon, titanium, etc.) can be used. there is.

The support may be subjected to mat treatment, corona treatment, or antistatic treatment on the surface joined to the resin composition layer.

Additionally, as the support, you may use a support with a mold release layer that has a mold release layer on the surface bonded to the resin composition layer. Examples of the release agent used in the release layer of the support with a release layer include at least one type of release agent selected from the group consisting of alkyd resin, polyolefin resin, urethane resin, and silicone resin. The support with the release layer may be a commercially available product, for example, "SK-1", "AL-5", and "AL-" manufactured by Lintec, which are PET films with a release layer containing an alkyd resin-based release agent as a main component. 7”, “Lumira T60” manufactured by Torres, “Purex” manufactured by Teijin, and “Unifill” manufactured by Unichika.

The thickness of the support is not particularly limited, but is preferably in the range of 5 μm to 75 μm, and more preferably in the range of 10 μm to 60 μm. In addition, when using a support body with a release layer, it is preferable that the entire thickness of the support body with a release layer is within the above range.

In one embodiment, the resin sheet may further include other layers as needed. Examples of such other layers include a protective film similar to the support provided on the side of the resin composition layer that is not bonded to the support (that is, the side opposite to the support). The thickness of the protective film is not particularly limited, but is, for example, 1 μm to 40 μm. By laminating a protective film, adhesion of dust or the like to the surface of the resin composition layer and scratches can be suppressed.

The resin sheet can be manufactured, for example, by preparing a resin varnish in which a resin composition is dissolved in an organic solvent, applying this resin varnish on a support using a die coater, etc., and further drying to form a resin composition layer. .

Examples of organic solvents include ketones such as acetone, methyl ethyl ketone (MEK), and cyclohexanone; Acetic acid esters such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate; Carbitols such as cellosolve and butylcarbitol; aromatic hydrocarbons such as toluene and xylene; and amide-based solvents such as dimethylformamide, dimethylacetamide (DMAc), and N-methylpyrrolidone. Organic solvents may be used individually, or two or more types may be used in combination.

Drying may be performed by known methods such as heating or hot air spraying. Drying conditions are not particularly limited, but the resin composition layer is dried so that the content of the organic solvent is 10% by mass or less, preferably 5% by mass or less. It also varies depending on the boiling point of the organic solvent in the resin varnish, but for example, when using a resin varnish containing 30% by mass to 60% by mass of an organic solvent, the resin is dried at 50°C to 150°C for 3 to 10 minutes. A composition layer can be formed.

The resin sheet can be wound into a roll and stored. When the resin sheet has a protective film, it becomes usable by peeling off the protective film.

[Printed wiring board]

A printed wiring board according to one embodiment of the present invention includes an insulating layer formed of a cured material obtained by curing the above-described resin composition.

A printed wiring board can be manufactured, for example, by a method including the following steps (I) and (II) using the above-mentioned resin sheet.

(I) A process of laminating a resin sheet on an inner layer substrate so that the resin composition layer of the resin sheet is bonded to the inner layer substrate.

(II) Process of curing the resin composition layer to form an insulating layer

The “inner layer substrate” used in step (I) is a member that becomes the substrate of the printed wiring board, for example, glass epoxy substrate, metal substrate, polyester substrate, polyimide substrate, BT resin substrate, and thermosetting polyphenylene. Ether substrates, etc. can be mentioned. Additionally, the substrate may have a conductor layer on one or both sides, and this conductor layer may be pattern-processed. An inner layer substrate in which a conductor layer is formed on one or both sides of the substrate is sometimes referred to as an “inner layer circuit board.” In addition, when manufacturing a printed wiring board, an intermediate product on which an insulating layer and/or a conductor layer must be additionally formed is also included in the “inner layer substrate.” If the printed wiring board is a circuit board with embedded components, an inner layer board with embedded components may be used.

Lamination of the inner layer substrate and the resin sheet can be performed, for example, by heat-pressing the resin sheet to the inner layer substrate from the support side. As a member for heat-pressing the resin sheet to the inner layer substrate (hereinafter also referred to as “heat-pressing member”), for example, a heated metal plate (SUS head plate, etc.) or a metal roll (SUS roll, etc.) can be used. In addition, it is preferable not to press the heat-compression member directly onto the resin sheet, but to press it through an elastic material such as heat-resistant rubber so that the resin sheet sufficiently follows the surface irregularities of the inner layer substrate.

Lamination of the inner layer substrate and the resin sheet may be performed by a vacuum lamination method. In the vacuum lamination method, the heat-pressing temperature is preferably in the range of 60°C to 160°C, more preferably in the range of 80°C to 140°C, and the heat-compression pressure is preferably in the range of 0.098MPa to 1.77MPa, more preferably is in the range of 0.29 MPa to 1.47 MPa, and the heat compression time is preferably in the range of 20 seconds to 400 seconds, more preferably in the range of 30 seconds to 300 seconds. Lamination can preferably be carried out under reduced pressure conditions of 26.7 hPa or less.

Lamination can be performed using a commercially available vacuum laminator. Examples of commercially available vacuum laminators include a vacuum pressurization laminator manufactured by Meiki Sesakusho, a vacuum applicator manufactured by Nikko Materials, and a batch vacuum pressurization laminator.

After lamination, the laminated resin sheets may be smoothed by, for example, pressing a heat-pressing member from the support side under atmospheric pressure. The press conditions for the smoothing treatment can be the same as the heat-pressing conditions for the above-mentioned lamination. Smoothing treatment can be performed using a commercially available laminator. Additionally, the lamination and smoothing treatment may be performed continuously using the commercially available vacuum laminator described above.

The support may be removed between step (I) and step (II), and may be removed after step (II).

In step (II), the resin composition layer is cured to form an insulating layer made of a cured resin composition. The curing conditions of the resin composition layer are not particularly limited, and the conditions employed when forming the insulating layer of a printed wiring board may be used. The resin composition layer may be cured by irradiation of active energy rays such as ultraviolet rays, but is usually thermally cured by heating.

For example, the heat curing conditions of the resin composition layer vary depending on the type of the resin composition, but in one embodiment, the curing temperature is preferably 120°C to 240°C, more preferably 150°C to 220°C, More preferably, it is 170°C to 210°C. The curing time is preferably 5 minutes to 120 minutes, more preferably 10 minutes to 100 minutes, and even more preferably 15 minutes to 100 minutes.

Before thermally curing the resin composition layer, the resin composition layer may be preheated at a temperature lower than the curing temperature. For example, prior to heat curing the resin composition layer, the resin composition layer is cured at a temperature of 50°C to 120°C, preferably 60°C to 115°C, more preferably 70°C to 110°C for 5 minutes or more. Preheating may be performed preferably for 5 minutes to 150 minutes, more preferably for 15 minutes to 120 minutes, and even more preferably for 15 minutes to 100 minutes.

The method of manufacturing a printed wiring board may further include (III) a step of perforating the insulating layer, (IV) a step of roughening the insulating layer, and (V) a step of forming a conductor layer. When the support is removed after step (II), the support is removed between steps (II) and (III), between steps (III) and (IV), or between steps (IV) and (V). It may be carried out in . Additionally, if necessary, the formation of the insulating layer and the conductor layer in steps (I) to (V) may be repeated to form a multilayer wiring board.

Process (III) is a process of drilling into the insulating layer, thereby forming holes such as via holes and through holes in the insulating layer. Step (III) may be performed using, for example, a drill, laser, plasma, or the like, depending on the composition of the resin composition used to form the insulating layer. The size and shape of the hole may be determined appropriately according to the design of the printed wiring board.

Process (IV) is a process of roughening the insulating layer. Usually, in this process (IV), removal of smear is also performed. The procedures and conditions of the roughening process are not particularly limited. For example, the insulating layer can be roughened by performing swelling treatment with a swelling liquid, roughening treatment with an oxidizing agent, and neutralization treatment with a neutralizing liquid in this order.

Examples of the swelling liquid used in the roughening treatment include an alkaline solution and a surfactant solution, and an alkaline solution is preferred. As an alkaline solution, a sodium hydroxide solution and a potassium hydroxide solution are more preferable. Examples of commercially available swelling liquids include "Swelling Deep Securiganth P" and "Swelling Deep Securiganth SBU" manufactured by Atotech Japan. The swelling treatment using the swelling liquid is not particularly limited, but can be performed, for example, by immersing the insulating layer in a swelling liquid of 30°C to 90°C for 1 minute to 20 minutes. From the viewpoint of suppressing swelling of the resin of the insulating layer to an appropriate level, it is preferable to immerse the insulating layer in a swelling liquid of 40°C to 80°C for 5 to 15 minutes.

Examples of the oxidizing agent used in the roughening treatment include an alkaline permanganate solution obtained by dissolving potassium permanganate or sodium permanganate in an aqueous solution of sodium hydroxide. The roughening treatment with an oxidizing agent such as an alkaline permanganic acid solution is preferably performed by immersing the insulating layer in an oxidizing agent solution heated to 60°C to 100°C for 10 to 30 minutes. Additionally, the concentration of permanganate in the alkaline permanganate solution is preferably 5% by mass to 10% by mass. Examples of commercially available oxidizing agents include alkaline permanganate solutions such as "Concentray Compact CP" and "Dosing Solution Securiganth P" manufactured by Atotech Japan.

As a neutralizing liquid used in the roughening treatment, an acidic aqueous solution is preferable, and examples of commercially available products include "Reduction Solution Securigant P" manufactured by Atotech Japan. Treatment with a neutralizing liquid can be performed by immersing the treated surface, which has undergone roughening treatment with an oxidizing agent, in a neutralizing liquid at 30°C to 80°C for 5 to 30 minutes. In terms of workability, etc., a method of immersing the object that has been roughened with an oxidizing agent in a neutralizing liquid at 40°C to 70°C for 5 to 20 minutes is preferable.

In one embodiment, the arithmetic mean roughness Ra of the surface of the insulating layer after roughening treatment may be preferably less than 400 nm, more preferably less than 200 nm, more preferably less than 100 nm, and even more preferably less than 100 nm. The lower limit is not particularly limited and can be, for example, 1 nm or more, 2 nm or more, etc. The arithmetic mean roughness (Ra) of the surface of the insulating layer can be measured using a non-contact surface roughness meter.

Step (V) is a step of forming a conductor layer, and the conductor layer is formed on the insulating layer. The conductor material used in the conductor layer is not particularly limited. In a suitable embodiment, the conductor layer comprises one or more metals selected from the group consisting of gold, platinum, palladium, silver, copper, aluminum, cobalt, chromium, zinc, nickel, titanium, tungsten, iron, tin and indium. . The conductor layer may be a single metal layer or an alloy layer, and the alloy layer may be, for example, an alloy of two or more metals selected from the above group (e.g., nickel-chromium alloy, copper-nickel alloy, and copper-titanium A layer formed of an alloy) may be mentioned. Among them, from the viewpoint of versatility of forming the conductor layer, cost, ease of patterning, etc., a single metal layer of chromium, nickel, titanium, aluminum, zinc, gold, palladium, silver or copper, or a nickel-chromium alloy, copper-nickel alloy , an alloy layer of a copper-titanium alloy is preferred, and a mono-metal layer of chromium, nickel, titanium, aluminum, zinc, gold, palladium, silver or copper, or an alloy layer of a nickel-chromium alloy is more preferable, and a mono-metal layer of copper This is more preferable.

The conductor layer may have a single-layer structure or a multi-layer structure in which two or more single metal layers or alloy layers made of different types of metals or alloys are laminated. When the conductor layer has a multi-layer structure, the layer in contact with the insulating layer is preferably a single metal layer of chromium, zinc, or titanium, or an alloy layer of nickel-chromium alloy.

The thickness of the conductor layer is generally 3 μm to 35 μm, preferably 5 μm to 30 μm, depending on the desired design of the printed wiring board.

The conductor layer is preferably formed by plating. For example, a conductor layer having a desired wiring pattern can be formed by plating the surface of the insulating layer using a semi-additive method, a full additive method, or the like. From the viewpoint of ease of manufacture, it is preferable to form by the semi-additive method. Hereinafter, an example of forming a conductor layer by a semi-additive method will be shown.

A plating layer is formed on the surface of the insulating layer by electroless plating. Next, on the formed plating seed layer, a mask pattern is formed to expose a portion of the plating seed layer corresponding to the desired wiring pattern. After forming a metal layer on the exposed plating layer by electrolytic plating, the mask pattern is removed. Thereafter, the unnecessary plating seed layer can be removed by etching or the like to form a conductor layer with a desired wiring pattern.

[Semiconductor device]

A semiconductor device according to an embodiment of the present invention includes the printed wiring board described above. This semiconductor device can be manufactured using the printed wiring board described above.

Examples of semiconductor devices include various semiconductor devices used in electrical appliances (e.g., computers, mobile phones, digital cameras, televisions, etc.) and vehicles (e.g., motorcycles, automobiles, trains, ships, aircraft, etc.). You can.

[Example]

Hereinafter, the present invention will be described in detail by way of examples. However, the present invention is not limited to the following examples. In the following description, “part” and “%” indicating quantity mean “part by mass” and “% by mass”, respectively, unless otherwise specified. In addition, the operations described below were performed in an environment at room temperature and pressure, unless otherwise specified.

<Example 1>

15 parts of biphenyl-type epoxy resin (“NC-3000H” manufactured by Nippon Kayaku Co., Ltd.), 5 parts of bisphenol-type epoxy resin (“ZX1059” manufactured by Nittetsu Chemical & Materials Co., Ltd.), and aminotriazine skeleton cresol novolak resin (DIC) 2 parts of active ester-based curing agent (“HP-B-8151-62T” manufactured by DIC, containing 62% by mass of solid content and 38% by mass of toluene), 26 parts of phenoxy 3 parts of resin (“YX6954BH30” manufactured by Mitsubishi Chemical Co., Ltd.) and 100 parts of spherical silica (“SOC2” manufactured by Adomatex Co., Ltd.) are mixed with a silane coupling agent having an N-phenyl-3-aminopropyl group (“KBM-” manufactured by Shin-Etsu Chemical Co., Ltd. 573") 0.6 parts spherical silica, average particle diameter 0.5㎛) 150 parts, 4-dimethylaminopyridine ("DMAP" manufactured by Tokyo Kasei Kogyo Co., Ltd.) 0.2 parts, curing accelerator (Daiichi Kogyo Seiyaku Co., Ltd. " 0.5 part of "G-8009L") was mixed and stirred at room temperature until a uniform solution was obtained to obtain a resin varnish.

Using an applicator, the obtained resin varnish was applied onto the release-treated surface of a PET film (thickness 38 μm), then dried in a gear oven at 100°C for 180 seconds to volatilize the solvent. In this way, a resin sheet having a resin composition with a thickness of 25 μm was obtained on the PET film.

<Examples 2 to 19, Comparative Examples 1 to 3>

A resin varnish was prepared by mixing each component in the mixing ratio shown in the table below and stirring at room temperature until a uniform solution was obtained. Additionally, a resin sheet was obtained in the same manner as Example 1.

*In the table, the content of components (A) to (H) represents the content when the nonvolatile component in the resin composition is 100% by mass.

Abbreviations in the table are as follows.

(A) Ingredient

・ZX1059: Bisphenol type epoxy resin (“ZX1059” manufactured by Nittetsu Chemical & Materials)

・NC3000H: Biphenyl type epoxy resin (“NC3000H” manufactured by Nippon Kayaku Co., Ltd.)

(B) Ingredient

HP-B-8151-62T: Active ester curing agent (“HP-B-8151-62T” manufactured by DIC, containing 62% by mass of solid content and 38% by mass of toluene)

PC-1300-02-65MA: Active ester curing agent (“PC-1300-02-65MA” manufactured by Airwater, containing 65% by mass of solid content and 35% by mass of toluene)

(C) Ingredient

·P200H50: (manufactured by Mitsubishi Chemical Corporation, compound represented by the structural formula below)

·G-8009L: (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., compound represented by the structural formula below)

(D) Ingredient

・DMAP: 4-dimethylaminopyridine (“DMAP” manufactured by Tokyo Kasei Kogyo Co., Ltd.)

・1B2PZ: 1-Benzyl-2-phenylimidazole (“1B2PZ” manufactured by Shikoku Kasei Kogyo Co., Ltd.)

(E) Ingredient

SO-C2: 100 parts by mass of spherical silica (“SO-C2” manufactured by Adomatex Co., Ltd.) and 0.6 parts by mass of a silane coupling agent having an N-phenyl-3-aminopropyl group (“KBM-573” manufactured by Shin-Etsu Chemical Co., Ltd.) Globular silica surface treated by , average particle diameter 0.5㎛)

(F) Ingredient

YX7553BH30: Phenoxy resin (“YX7553BH30” manufactured by Mitsubishi Chemical Corporation, containing 30% by mass of solid content, 35% by mass of methyl ethyl ketone, and 35% by mass of cyclohexanone)

(G) Ingredient

LA-3018-50P: Aminotriazine skeleton cresol novolak resin (“LA-3018-50P” manufactured by DIC, containing 50% by mass of solid content and 50% by mass of propylene glycol monoethyl ether)

V-03: Carbodiimide resin-containing liquid (“V-03” manufactured by Nisshinbo Chemical, containing 50% by mass of solid content and 50% by mass of toluene)

(H) component

SA9000: Polyphenylene ether resin (“SA9000” manufactured by SABIC)

・BMI689: Maleimide resin (“BMI689” manufactured by Designer Molercules Inc.)

(I) Ingredient

・U-CAT SA810: Heat base generator (“U-CAT SA810” manufactured by San-Apro)

・U-CAT SA506: Heat base generator (“U-CAT SA506” manufactured by San-Apro)

[Evaluation of crack resistance, peel strength, and arithmetic mean roughness (Ra)]

<Production of samples>

The copper foil on both sides of the glass cloth-based epoxy resin double-sided laminate (copper foil thickness 18 ㎛, board thickness 0.3 mm, size 500 mm x 500 mm, Panasonic Corporation's "R5715ES") on which the inner layer circuit was formed was etched, and the L/S was etched. Twenty-five copper patterns of 1mm/1mm and 5cm in length were produced to obtain a concavo-convex substrate. After that, the copper surface was roughened by etching 1 μm with “CZ8100” manufactured by Meck Corporation, and an inner layer circuit board was obtained.

The resin sheets obtained in each example and each comparative example were laminated on both sides of the inner layer circuit board using a batch type vacuum pressurization laminator (two-stage build-up laminator CVP700 manufactured by Nichigo Moton Co., Ltd.). Lamination was performed by decompressing for 30 seconds to bring the atmospheric pressure to 13 hPa or less, and then compressing at 100°C and a pressure of 0.74 MPa for 30 seconds. Next, heat pressing was performed at 100°C and a pressure of 0.5 MPa for 60 seconds.

The laminated resin sheets were heated at 100°C for 30 minutes, then at 170°C for 30 minutes, and the resin composition layer was heat-cured to form an insulating layer. The obtained laminated sample is referred to as “laminated sample A.”

Next, the following swelling treatment, roughening treatment, and electroless plating treatment were performed on the obtained laminated sample A.

Swelling treatment:

The above-mentioned laminated sample A was added to a swelling liquid at 60°C (an aqueous solution containing “Swelling Deep Securigant P” manufactured by Atotech Japan and “Sodium Hydroxide” manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and the swelling temperature was 60°C for 10 minutes. It was shaken for a minute. Afterwards, it was washed with pure water.

Harmonization treatment (permanganate treatment):

The laminated sample that had been swollen was placed in an 80°C sodium permanganate conditioned aqueous solution (“Concentrate Compact CP” manufactured by Atotech Japan, “Sodium Hydroxide” manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and shaken for 20 minutes at a conditioned temperature of 80°C. . Afterwards, it was washed for 10 minutes with a cleaning solution at 40°C (“Reduction Securigant P” manufactured by Atotech Japan, “Sulfuric Acid” manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and then further washed with pure water to obtain laminated sample B.

Electroless plating process:

The surface of laminated sample B was treated with an alkaline cleaner (“Cleaner Securigant 902” manufactured by Atotech Japan) at 60°C for 5 minutes to degrease and clean. After washing, the cured product was treated with a 25°C predip solution (“Predip Neogant B” manufactured by Atotech Japan) for 2 minutes. Thereafter, the cured product was treated with an activator liquid (“Activator Neogant 834” manufactured by Atotech Japan) at 40°C for 5 minutes to attach a palladium catalyst. Next, the laminated sample B was treated with a reducing solution (“Reducer Neogant WA” manufactured by Atotech Japan) at 30°C for 5 minutes.

Next, the laminated sample B was placed in a chemical copper solution (“Basic Printgant MSK-DK,” “Copper Printgant MSK,” “Stabilizer Printgant MSK,” and “Reducer Cu” all manufactured by Atotech Japan) and electrolyzed. Plating was performed until the plating thickness was about 0.1㎛. After electroless plating, annealing was applied at a temperature of 120°C for 30 minutes to remove remaining hydrogen gas. All processes up to the electroless plating process were performed while shaking the laminated sample B with a treatment liquid of 2 L on a beaker scale.

Next, electrolytic plating was performed on the electroless plating-treated laminated sample B until the plating thickness reached 25 μm. As electrolytic copper plating, copper sulfate solution (“Copper sulfate pentahydrate” manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., “Sulfuric acid” manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., “Basic Leveler Caparacid HL” manufactured by Atotech Japan, “Corrective agent” manufactured by Atotech Japan Using "Kapparacid GS"), electrolytic plating was performed with a current of 0.6 A/cm2 until the plating thickness reached about 25㎛. After the copper plating treatment, the cured product was heated at 190°C for 1 hour to further cure the cured product. In this way, a laminated sample C in which a copper plating layer was laminated on the upper surface was obtained.

<Evaluation of crack resistance>

With respect to laminated sample C, the presence or absence of gold cracks occurring on the surface was confirmed using an optical microscope, and evaluated based on the following criteria.

○: There are no gold cracks in the 25 copper patterns.

△: There is between 1 and 2 gold cracks in 25 copper patterns.

×: There are three or more gold cracks in 25 copper patterns.

<Evaluation of peel strength>

In laminated sample C, a 10 mm wide incision was made on the surface of the copper plating layer. After that, using a tensile tester (“AC-50C-SL” manufactured by TSE), the load (kgf/cm) when 35 mm was removed in the vertical direction at a speed of 50 mm/min at room temperature was measured, It was evaluated based on the following criteria.

◎: Peel strength is 0.5kgf/cm or more

○: Peel strength is 0.4kgf/cm or more, less than 0.5kgf/cm

×: Peel strength is less than 0.4kgf/cm

<Measurement of arithmetic mean roughness (Ra)>

The arithmetic mean roughness of the surface of the insulating layer of laminated sample B was obtained using a non-contact surface roughness meter (“WYKO NT3300” manufactured by Viko Instruments) in VSI mode with a 50x lens, with a measurement range of 121 ㎛ × 92 ㎛. The Ra value was obtained from numerical values. The average value of 10 points selected at random was calculated to obtain a measurement value, and evaluated based on the following criteria.

◎: Arithmetic average roughness (Ra) is less than 100nm

○: Arithmetic average roughness (Ra) is 100 nm or more and less than 200 nm.

△: Arithmetic average roughness (Ra) is 200 nm or more and less than 400 nm

×: Arithmetic average roughness (Ra) is 400 nm or more

[Evaluation of genetic loss tangent]

<Production of evaluation samples>

The resin compositions obtained in each Example and each Comparative Example were uniformly applied onto a release-treated PET film (“PET501010” manufactured by Lintec) with a die coater so that the thickness of the resin composition layer after drying was 40 μm, and 90 It was dried at 130°C (average 110°C) for 5 minutes. Afterwards, heat treatment was performed at 200°C for 90 minutes in a nitrogen atmosphere and peeled from the support to obtain a cured product (thickness of 40 μm). The cured product was cut into 80 mm in length and 2 mm in width to serve as an evaluation sample.

<Evaluation of dielectric loss tangent>

For the evaluation sample, the dielectric loss tangent was measured at a measurement frequency of 5.8 GHz and a measurement temperature of 23°C by the cavity resonance perturbation method (ASTM D2520) using HP8362B manufactured by Agilent Technologies. Measurements were performed on two test pieces, the average value was calculated, and the results were evaluated based on the following criteria.

◎: Dielectric loss tangent is less than 0.0025

○: Dielectric loss tangent is 0.0025 or more and less than 0.0030.

△: Dielectric loss tangent is 0.0030 or more and less than 0.0035

×: Dielectric loss tangent of 0.0035 or more

In Examples 1 to 19, it has been confirmed that even when components (E) to (G) are not contained, the same results as in the above examples are obtained, although there is a difference in degree.

Claims (14)

(A) epoxy resin,
(B) an active ester-based curing agent,
(C) at least one type of curing accelerator selected from the group consisting of a compound represented by the formula (C-1) and a compound represented by the formula (C-2), and
(D) A resin composition containing a curing accelerator (excluding those corresponding to component (C)).

In the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ are each independently a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group preferably having 6 to 10 carbon atoms, and R ¹⁵ represents a divalent aliphatic hydrocarbon group that may have a substituent, or a divalent aromatic hydrocarbon group that may have a substitution.
In the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, or a substituent. It represents a monovalent aromatic hydrocarbon group which may have 6 to 10 carbon atoms, and R ²⁵ represents a single bond, a divalent aliphatic hydrocarbon group which may have a substituent, an oxygen atom, or a sulfonyl group. The resin composition according to claim 1, further comprising (E) an inorganic filler. The resin composition according to claim 1, wherein the content of component (B) is 5% by mass or more and 25% by mass or less when the nonvolatile component in the resin composition is 100% by mass. The resin composition according to claim 1, wherein the content of component (C) is 0.01% by mass or more and 1.5% by mass or less when the non-volatile component in the resin composition is 100% by mass. The resin composition according to claim 1, wherein the content of component (D) is 0.01% by mass or more and 5% by mass or less when the non-volatile component in the resin composition is 100% by mass. The resin composition according to claim 1, wherein component (D) contains either an imidazole-based curing accelerator or an amine-based curing accelerator. The method of claim 1, wherein in the formula (C-1), R ¹¹ , R ¹² , R ¹³ , and R ¹⁴ each independently represent a hydrogen atom, a monovalent aliphatic hydrocarbon group having 1 to 5 carbon atoms, or a phenyl group. , resin composition. The method of claim 1, wherein in the formula (C-2), R ²¹ , R ²² , R ²³ , and R ²⁴ are each independently a hydrogen atom or a monovalent aliphatic hydrocarbon having 1 to 5 carbon atoms which may have a substituent. A resin composition representing a group or a phenyl group. The resin composition according to claim 1, wherein in the general formula (C-1), R ¹⁵ represents an alkylene group which may have a substituent, or a divalent aromatic hydrocarbon group which may have a substituent. The resin composition according to claim 1, wherein in the formula (C-2), R ²⁵ represents a single bond, an alkylene group that may have a substituent, an oxygen atom, or a sulfonyl group. The resin composition according to claim 1, which is used for forming an insulating layer. A resin sheet comprising a support and a resin composition layer provided on the support and containing the resin composition according to any one of claims 1 to 11. A printed wiring board comprising an insulating layer formed from a cured product of the resin composition according to any one of claims 1 to 11. A semiconductor device comprising the printed wiring board according to claim 13.