KR20240081365A - 임프린트 장치, 물품 제조 방법, 결정 방법, 및 기록 매체 - Google Patents

임프린트 장치, 물품 제조 방법, 결정 방법, 및 기록 매체 Download PDF

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Publication number
KR20240081365A
KR20240081365A KR1020230163981A KR20230163981A KR20240081365A KR 20240081365 A KR20240081365 A KR 20240081365A KR 1020230163981 A KR1020230163981 A KR 1020230163981A KR 20230163981 A KR20230163981 A KR 20230163981A KR 20240081365 A KR20240081365 A KR 20240081365A
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KR
South Korea
Prior art keywords
substrate
imprint
mold
imprint material
partial region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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KR1020230163981A
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English (en)
Korean (ko)
Inventor
게이지 야마시타
Original Assignee
캐논 가부시끼가이샤
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Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20240081365A publication Critical patent/KR20240081365A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020230163981A 2022-11-30 2023-11-23 임프린트 장치, 물품 제조 방법, 결정 방법, 및 기록 매체 Pending KR20240081365A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2022-190922 2022-11-30
JP2022190922A JP2024078506A (ja) 2022-11-30 2022-11-30 インプリント装置、物品製造方法、決定方法及びプログラム

Publications (1)

Publication Number Publication Date
KR20240081365A true KR20240081365A (ko) 2024-06-07

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ID=91191581

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230163981A Pending KR20240081365A (ko) 2022-11-30 2023-11-23 임프린트 장치, 물품 제조 방법, 결정 방법, 및 기록 매체

Country Status (3)

Country Link
US (1) US20240176231A1 (https=)
JP (1) JP2024078506A (https=)
KR (1) KR20240081365A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020226093A1 (ja) * 2019-05-08 2020-11-12 東京エレクトロン株式会社 接合装置、接合システム及び接合方法
TWI874401B (zh) * 2019-05-22 2025-03-01 加拿大商弗瑞爾公司 用於傳送設置之對準方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4854383B2 (ja) * 2006-05-15 2012-01-18 アピックヤマダ株式会社 インプリント方法およびナノ・インプリント装置
JP5214683B2 (ja) * 2010-08-31 2013-06-19 株式会社東芝 インプリントレシピ作成装置及び方法並びにインプリント装置及び方法
JP6602033B2 (ja) * 2015-03-31 2019-11-06 キヤノン株式会社 インプリント装置、供給量分布の作成方法、インプリント方法、及び物品の製造方法
JP6590667B2 (ja) * 2015-11-30 2019-10-16 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7397721B2 (ja) * 2020-03-06 2023-12-13 キヤノン株式会社 決定方法、インプリント方法、インプリント装置、物品の製造方法及びプログラム

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US20240176231A1 (en) 2024-05-30
JP2024078506A (ja) 2024-06-11

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