KR20230170134A - Photosensitive element, laminated body, method for forming resist pattern, and method for producing printed circuit board - Google Patents

Abstract

The photosensitive element is intended to provide a photosensitive element capable of forming a resist pattern with few microscopic omissions, and includes a support film, an intermediate layer, and a photosensitive layer in this order, wherein the support film has a thickness of 20 μm or more. A photosensitive element is provided, wherein the number of particles with a diameter of 5 μm or more contained in the support film is 30 particles/mm ² or less.

Description

Photosensitive element, laminate, method of forming resist pattern, and method of manufacturing printed wiring board {PHOTOSENSITIVE ELEMENT, LAMINATED BODY, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD}

The present disclosure relates to a method of forming a photosensitive element, a laminate, a resist pattern, and a method of manufacturing a printed wiring board.

Conventionally, in the field of printed wiring board manufacturing, a photosensitive resin composition is used as a resist material used for etching or plating, and a layer formed using the photosensitive resin composition on a support film (hereinafter also referred to as “photosensitive layer”) A photosensitive element having a is widely used.

A printed wiring board is manufactured using the photosensitive element described above, for example, using the following procedures. That is, first, the photosensitive layer of the photosensitive element is laminated on a circuit forming substrate such as a copper clad laminate. At this time, the photosensitive layer is laminated so that the surface opposite to the surface in contact with the support film is in close contact with the circuit forming surface of the circuit formation substrate. In addition, lamination is performed, for example, by heat-pressing the photosensitive layer on a circuit formation substrate (normal pressure lamination method).

Next, using a mask film or the like, a desired area of the photosensitive layer is exposed to light through a support film to generate radicals. The generated radicals contribute to the crosslinking reaction (photocuring reaction) of the photopolymerizable compound through several reaction paths. Next, after peeling off the support film, the uncured portion of the photosensitive layer is dissolved or dispersed and removed with a developer to form a resist pattern. Next, using the resist pattern as a resist, an etching process or a plating process is performed to form a conductor pattern, and finally, the photocured portion (resist pattern) of the photosensitive layer is peeled (removed).

However, in the exposure method using the above-mentioned film, there are cases where minute omissions occur in the formed resist pattern.

Therefore, in recent years, a manufacturing method that reduces minute omissions in the resist pattern by peeling off the support film before exposure and then exposing the photosensitive layer has been studied. However, when the photosensitive layer is exposed to light after peeling off the support film, oxygen in the air comes into contact with the generated radicals, which rapidly stabilizes (deactivates) the radicals, making it difficult for the photocuring reaction of the photopolymerizable compound to proceed. Lose. Therefore, in this manufacturing method, for the purpose of reducing the influence of oxygen mixing when peeling off the support film and exposing it to light, it is recommended to use a photosensitive element provided with an intermediate layer having gas barrier properties between the support film and the photosensitive layer. It is being examined (for example, see Patent Documents 1 to 3).

Patent Document 1: Japanese Patent No. 5483734 Patent Document 2: Japanese Patent Publication No. 2013-24913 Patent Document 3: Japanese Patent No. 5551255

Recently, with the spread of high-fine wire package substrates, further refinement of conductor patterns is progressing. There is a continuing demand for photosensitive elements used to form such fine conductor patterns that can form resist patterns with few microscopic omissions.

In the photosensitive element provided with an intermediate layer having gas barrier properties between the support film and the photosensitive layer as described in Patent Documents 1 to 3 above, even when the support film is peeled off and the photosensitive layer is exposed, a resist pattern with few minor omissions is formed. The demands that were said to be formed could not necessarily be fully satisfied. In particular, when using an exposure machine capable of forming a high-resolution resist pattern (hereinafter also referred to as a “high-resolution exposure machine”), small omissions occurring in the resist pattern are becoming more of a problem.

The present disclosure has been made in consideration of the problems of the prior art, and aims to provide a photosensitive element capable of forming a resist pattern with few minor omissions, a laminate, a method of forming a resist pattern, and a method of manufacturing a printed wiring board. Do it as

In order to achieve the above object, the present disclosure provides a photosensitive element comprising a support film, an intermediate layer, and a photosensitive layer in this order, wherein the support film has a thickness of 20 μm or more and a diameter of 5 μm included in the support film. A photosensitive element is provided, wherein the number of the above particles is 30 particles/mm ² or less. With such a photosensitive element, it is possible to form a resist pattern with few microscopic omissions.

One of the reasons why an excellent resist pattern with few microscopic omissions can be formed by the photosensitive element of the present disclosure is that shape traces derived from particles such as a lubricant contained in the support film are transferred to the intermediate layer. The present inventors believe that this may become difficult. That is, from the viewpoint of productivity, the support film may contain a lubricant for adding slipperiness to the surface of the support film. This lubricant may be incorporated into one or both sides of the support film by coating or spraying, and may be incorporated into one or both sides (including the inside) of the support film by kneading. In addition, the support film may contain particles other than the above lubricant due to the production process of the support film, etc. Due to the presence of particles such as such a lubricant, traces of the shape of the particles may be transferred to other layers (for example, intermediate layers, etc.) in contact with the particles. If traces of the particle shape are transferred to the middle layer, even when the support film is peeled off and exposed, the exposure light is scattered by the irregularities (shape traces of the particles) on the surface of the middle layer, resulting in the occurrence of minute omissions in the resist pattern. I knew what was going on. In particular, it was found that when a high-resolution exposure machine (for example, a projection exposure machine) was used to expose under harsh conditions with a low amount of energy (resulting in low curing), minor omissions in the resist pattern occurred significantly.

It was found that this phenomenon (i.e., transfer of shape traces of particles such as a lubricant to the intermediate layer) is likely to occur when the intermediate layer is formed on a support film having large particles on the surface in contact with the intermediate layer. Additionally, surprisingly, even if large particles exist on the side opposite to the side in contact with the middle layer of the support film, in the lamination process of the photosensitive element, the side opposite to the side in contact with the middle layer of the support film is caused by roll pressure. It was also found that traces of the shape of large particles present in are sometimes transferred to the middle layer.

As a result of careful study, the present inventors found that the number of particles with a diameter of 5 μm or more in particles such as lubricant contained in the support film should be 30 particles/mm ² or less, and that the thickness of the support film should be 20 It was discovered that by setting the thickness to ㎛ or more, transfer of shape traces derived from particles such as a lubricant to the intermediate layer can be suppressed even after going through the intermediate layer formation process on the support film and the lamination process of the photosensitive element. Therefore, according to the photosensitive element of the present disclosure, minor omissions in the resist pattern can be significantly reduced. In particular, by using a support film with a specific thickness, even when large particles are present on the side opposite to the side in contact with the middle layer of the support film, the influence of those particles is suppressed, resulting in an excellent resist pattern with few minor omissions. can be formed. Additionally, even when a high-resolution exposure machine is used, minor omissions in the register pattern can be sufficiently reduced.

Additionally, in the photosensitive element, the number of particles with a diameter of 5 μm or more on the surface in contact with the intermediate layer of the support film may be 10 particles/mm ² or less. With these photosensitive elements, it is possible to form a resist pattern with fewer minor omissions.

Additionally, in the photosensitive element, the intermediate layer may contain polyvinyl alcohol. According to this photosensitive element, deactivation of radicals generated by actinic light used for exposure can be further suppressed, and the resolution of the formed resist pattern can be improved.

Additionally, in the photosensitive element, the support film may be a polyester film. According to this photosensitive element, the mechanical strength and heat resistance of the support film can be improved, defects such as wrinkles in the middle layer that occur when forming the middle layer on the support film can be suppressed, and workability can be improved. You can.

The present disclosure also provides a process of disposing the photosensitive layer, the intermediate layer, and the support film in this order on a substrate, using the photosensitive element of the present disclosure, and removing the support film, through the intermediate layer. A method of forming a resist pattern is provided, comprising a step of exposing a photosensitive layer to actinic light, and a step of removing the uncured portion of the photosensitive layer and the intermediate layer from the substrate. Since this method of forming a resist pattern forms a resist pattern using the photosensitive element of the present disclosure, it is possible to form a resist pattern with few microscopic omissions.

Additionally, the exposure may be performed using a high-resolution exposure machine with a lens numerical aperture of 0.05 or more. According to this resist pattern forming method, since the resist pattern is formed using the photosensitive element of the present disclosure, a resist pattern with few minor omissions can be formed at high resolution.

The present disclosure also provides a laminate comprising a substrate, a photosensitive layer, and an intermediate layer in this order, and the number of recesses with a diameter of 3 μm or more is 30/mm ² or less on the surface of the intermediate layer opposite to the photosensitive layer side. provides. The present inventors have found that when a laminate is manufactured using a photosensitive element having a support film containing particles of 5 μm or more in diameter, traces of shapes derived from the particles with a diameter of 5 μm or more are transferred to the intermediate layer of the manufactured laminate. It was discovered that a concave portion with a diameter of 3 μm or more was formed. In other words, there is a relationship between the number of particles with a diameter of 5 μm or more contained in the support film being 30 pieces/mm ² or less and the number of recesses with a diameter of 3 μm or more on the side of the intermediate layer opposite to the photosensitive layer being 30 pieces/mm ² or less. has And, according to a laminate including an intermediate layer in which the number of recesses with a diameter of 3 μm or more is 30/mm ² or less, a resist pattern with few microscopic omissions can be formed.

The present disclosure also includes a process of exposing the photosensitive layer to actinic light through the intermediate layer in the laminate of the present disclosure, and a process of removing the uncured portion of the photosensitive layer and the intermediate layer from the substrate. Provides a method of forming a resist pattern, including: Since this method of forming a resist pattern forms a resist pattern using the laminate of the present disclosure, it is possible to form a resist pattern with few microscopic omissions.

The present disclosure also provides a method of manufacturing a printed wiring board, including a step of forming a conductor pattern by etching or plating a substrate on which a resist pattern is formed by the method of forming a resist pattern of the present disclosure. In this method of manufacturing a printed wiring board, since the resist pattern is formed by the method of forming a resist pattern of the present disclosure, a resist pattern with few microscopic omissions can be formed, and the method of manufacturing a printed wiring board is suitable for increasing the density of the printed wiring board. can be provided.

According to the present disclosure, it is possible to provide a photosensitive element capable of forming a resist pattern with few microscopic omissions, a laminate, a method of forming a resist pattern, and a method of manufacturing a printed wiring board.

[Figure 1] A schematic cross-sectional view showing one embodiment of the photosensitive element of the present disclosure.
[FIG. 2] A diagram schematically showing an example of the manufacturing process of a printed wiring board using a semi-additive method.
[Figure 3] SEM photo of the resist pattern obtained in Example 3.
[Figure 4] SEM photo of the resist pattern obtained in Comparative Example 1.

Hereinafter, preferred embodiments of the present disclosure will be described in detail, referring to the drawings as necessary. In the following embodiments, it goes without saying that the components (including element steps, etc.) are not necessarily essential, except in cases where they are specifically specified or where they can clearly be considered essential in principle. This is the same for numerical values and ranges, and should not be construed as unreasonably limiting the present disclosure.

In addition, in this specification, (meth)acrylic acid means at least one of acrylic acid and the corresponding methacrylic acid. Additionally, the same applies to other similar expressions such as (meth)acrylate.

In addition, in this specification, the term "process" is included in this term not only as an independent process, but also in cases where the process cannot be clearly distinguished from other processes as long as the desired effect of the process is achieved.

In addition, in this specification, the numerical range indicated using "~" represents a range that includes the numerical values written before and after "~" as the minimum and maximum values, respectively. In addition, in the numerical range described in stages in this specification, the upper or lower limit of the numerical range at a certain level may be replaced with the upper or lower limit of the numerical range at another level. In addition, in the numerical range described in this specification, the upper or lower limit of the numerical range may be replaced with the value shown in the examples. In addition, in this specification, the term "layer" includes not only the structure of the shape formed on the entire surface when observed in plan view, but also the structure of the shape formed on a part of the layer.

[Photosensitive element]

As shown in 1, the photosensitive element 1 of the present embodiment includes a support film 2, an intermediate layer 3, and a photosensitive layer 4 in this order, and other layers such as a protective layer 5. Additional layers may be provided. Hereinafter, each layer in the photosensitive element according to the present embodiment will be described in detail.

＜Support Film＞

In the photosensitive element of this embodiment, the thickness of the support film is 20 μm or more, and the number of particles with a diameter of 5 μm or more contained in the support film is 30 particles/mm ² or less. When the thickness of the support film and the number of particles contained in the support film are within the above range, transfer of shape traces of particles such as lubricant present in the support film to the intermediate layer can be suppressed, and scattering of the actinic light used for exposure ( For example, since diffuse reflection) can be suppressed, excellent patterning properties can be obtained and a resist pattern with few minor omissions can be formed. On the other hand, in the conventional photosensitive element, even if the support film is peeled off before the exposure process from the viewpoint of improving resolution, light scattering is prevented in the exposure process by transfer of particle shape traces such as lubricant to the intermediate layer. As a result, minor omissions are likely to occur in the register pattern after development. Additionally, when a high-resolution exposure machine is used, the influence of light scattering becomes greater, and minute omissions are more likely to occur in the resist pattern after development. When such a photosensitive element is used in the manufacture of printed wiring boards, it becomes a factor in the occurrence of open defects during etching and short defects during plating, thereby lowering the manufacturing yield of printed wiring boards.

The thickness of the support film is 20 μm or more, but may be 25 μm or more, or 45 μm or more. By setting the thickness of the support film to 20 ㎛ or more, transfer of particle shape traces from the support film to the intermediate layer during lamination of the photosensitive element can be suppressed. Therefore, when exposing the photosensitive layer through the intermediate layer, scattering of the exposure light is prevented. This can be suppressed, making it possible to form a register pattern with fewer minor omissions. In particular, when particles of 5 μm or more in diameter are contained on the side opposite to the side in contact with the middle layer of the support film, and when manufacturing a laminate by laminating a photosensitive element on a substrate, the particles contained in the support film Separately, if foreign matter adheres to the surface opposite to the surface in contact with the middle layer of the support film due to the influence of static electricity, etc., by setting the thickness of the support film to 20㎛ or more, the particles and the adhesion due to the influence of static electricity, etc. Transfer of particle shape traces originating from foreign matter to the intermediate layer can be significantly suppressed, and as a result, the occurrence of minute omissions in the resist pattern can be significantly suppressed. Additionally, the thickness of the support film may be 200 μm or less, or 100 μm or less. By setting the thickness of the support film to 200 μm or less, it is easy to obtain economic benefits. In addition, “thickness of the support film” means the length in the direction perpendicular to the plane direction of the support film, and “particle shape traces” mean “shape traces derived from particles of a lubricant or the like.”

The number of particles with a diameter of 5 μm or more contained in the support film is 30 pieces/mm ² or less, but from the viewpoint of further preventing scattering of the exposure light due to transfer of particle shape traces, the number of particles with a diameter of 5 μm or more is 25. It may be 1 piece/mm ² or less, 20 pieces/mm ² or less, 10 pieces/mm ² or less, 5 pieces/mm ² or less, or 1 piece/mm ² or less. By setting the number of particles with a diameter of 5 μm or more to 30 particles/mm ² or less, it becomes difficult for microscopic omissions to occur in the resist pattern formed using the photosensitive element according to the present embodiment, thereby creating a resist pattern with fewer microscopic omissions. can be formed. In addition, when such a photosensitive element is used in the manufacture of printed wiring boards, the occurrence of open defects during etching and the occurrence of short defects during plating can be suppressed, and a decrease in the manufacturing yield of printed wiring boards can be suppressed. In addition, the lower limit of the number of particles with a diameter of 5 μm or more contained in the support film is 0 particles/mm ² .

Here, particles with a diameter of 5 ㎛ or more included in the support film mean a diameter of 5 ㎛ or more when observed using a polarizing microscope (however, if the shape of the observed particle is not circular, the diameter of the circumscribed circle of that shape is means), and refers to particles present on the surface of the support film. In addition, the particles are not particularly limited as long as they provide irregularities to the layer in contact with the support film, but for example, a lubricant included to add slipperiness to the surface of the support film, intentionally attached to the support film ( Organic particles or inorganic particles (hereinafter also referred to as “attached particles”), foreign substances, aggregates (for example, lubricant aggregates, aggregates of adhesive particles, or gelled polymers, monomers as raw materials, support film production) (agglomerates formed when the catalyst used in the production, inorganic or organic fine particles included as necessary aggregate during film production), lubricants and adhesives generated when the lubricant layer (layer containing the lubricant) is applied on the support film, etc. Including swelling caused by The shape of the particles is not particularly limited, but may be a regular shape such as a sphere or an irregular shape. In addition, the material of the particles is not particularly limited, but may be organic or inorganic such as metal. In addition, in order to reduce the number of particles with a diameter of 5 μm or more to 30 particles/mm ^{2 or} less, particles with a small particle size or particles with excellent dispersibility may be selectively used among these particles.

Additionally, the number of particles with a diameter of 5 μm or more can be measured using a polarizing microscope. More specifically, both sides of the support film are observed with a polarizing microscope, the number of particles with a diameter of 5 μm or more on both sides of the support film is counted, and the obtained number is calculated as the number of particles with a diameter of 5 μm or more contained in the support film. It is called Sui. In addition, when the support film is transparent (i.e., haze is 5% or less), the surface is focused on one side and the other side of the support film, and the number of particles with a diameter of 5 ㎛ or more is counted. Measure. The measurement area is set to a size of 1 mm square, measured at at least 10 locations, and the average value is taken as the number of particles with a diameter of 5 μm or more contained in the support film. Additionally, an aggregate formed by agglomeration of primary particles with a diameter of 5 μm or more and primary particles with a diameter of less than 5 μm is counted as one. In addition, in this specification, “aggregation” means a state in which particles (e.g., primary particles) are in contact with each other or are close to each other at 1 μm or less and form a larger aggregate compared to each particle.

Additionally, the number of particles with a diameter of 2 μm or more and less than 5 μm contained in the support film may be 1000 particles/mm ² or less, 500 particles/mm ² or less, or 10 particles/mm ² or less. Additionally, the lower limit of the number of such particles is 0 particles/mm ² . The number of particles with a diameter of 2 μm or more and less than 5 μm is correlated with the number of particles with a diameter of 5 μm or more. If the number of particles with a diameter of 5 μm or more is small, the number of particles with a diameter of 2 μm or more and less than 5 μm also decreases.

Furthermore, the number of particles with a diameter of less than 2 μm contained in the support film is not particularly limited. Even if many particles with a diameter of less than 2 μm are contained in the support film, their influence on light scattering is not significant. The factor is that when light is irradiated to the photosensitive layer in the exposure process, the photocuring reaction of the photosensitive layer occurs not only in the light irradiation area, but also, to a small extent, in the lateral direction (perpendicular to the direction of light irradiation) where the light is not directly irradiated. You can also proceed with . For this reason, when the particle diameter is small (less than 2㎛), even when the photocuring reaction proceeds in the transverse direction, it is difficult for traces of particle shape that cause insufficient curing to be transferred to the intermediate layer, resulting in minute traces in the formed resist pattern. It is difficult for omissions to occur. On the other hand, when the particle diameter is large, such as 5㎛ or more, when the photocuring reaction proceeds in the lateral direction, particle shape traces that cause insufficient curing are likely to be transferred to the intermediate layer, and the formed resist pattern I found out that it leads to minor omissions. In particular, in the case of high-resolution exposure machines with a numerical aperture (NA) of 0.05 or more, which represents the resolution of the lens, for example, projection exposure machines that use actinic light with attenuated energy, photocuring progresses in areas where light is not directly irradiated. Since this is difficult, it was found that minute omissions in the formed register pattern are more likely to occur.

The support film may have particles such as a lubricant on the side opposite to the side in contact with the middle layer of the support film, and may have particles such as a lubricant on the side in contact with the middle layer of the support film. In addition, the number of particles with a diameter of 5 μm or more on the surface in contact with the intermediate layer of the support film is 10 particles/mm ² or less, 5 particles/mm from the viewpoint of further preventing scattering of the exposure light due to transfer of particle shape traces. It may be ² or less, or 1 piece/mm ² or less. Additionally, the lower limit of the number of such particles is 0 particles/mm ² . By setting this range, there is a tendency to easily form a register pattern with fewer minor omissions. When adding a lubricant to a support film, for example, a lubricant layer is formed on the support film using a known method such as roll coat, flow coat, spray coat, curtain flow coat, dip coat, or slit die coat. can do. In order to fulfill the function of the lubricant, the support film having a lubricant or a lubricant layer may contain 1000 pieces/mm ² or more of the lubricant with a diameter of less than 1 μm.

A layer (region) without particles may exist in the support film. In the support film, the thickness of the layer without particles may be 17 μm or more, 19 μm or more, or 21 μm or more. When the thickness of the particle-free layer is 17 μm or more, there is a tendency to further suppress minor omissions occurring in the resist pattern. In particular, even if foreign substances adhere to the surface opposite to the surface in contact with the middle layer of the support film due to the influence of static electricity or the like, there is a tendency to further suppress minor omissions occurring in the resist pattern. In addition, "thickness of layer without particles" means the length of the region where particles do not exist in the direction perpendicular to the surface direction of the support film (thickness direction), and more specifically, in the thickness direction. means the maximum value of the distance between a plane perpendicular to the thickness direction (a straight line in cross-sectional observation) that touches the opposing sides of the two closest particles. In addition, when the particle-containing layer exists only on one side of the support film, the “thickness of the layer without particles” is defined as the support film surface on the opposite side from the side where the particle-containing layer exists, and the thickness of the layer on that surface. It refers to the distance between a plane perpendicular to the thickness direction (a straight line in cross-sectional observation) that touches the side opposite the surface of a nearby particle. The thickness of the layer without particles can be measured by observing the cross section of the support film with a scanning electron microscope (SEM). Additionally, when observing by SEM, processing may be performed using a focused ion beam processing observation device (FIB). Additionally, the average surface depth of particles with a diameter of 5 μm or more contained in the support film may be 2 μm or less, 1 μm or less, or 0.5 μm or less. Here, the average surface depth of particles with a diameter of 5 μm or more refers to the average value of the depth at which particles with a diameter of 5 μm or more are embedded in the support film when the cross section of the support film is observed with a scanning electron microscope.

In the photosensitive element of one aspect of the present embodiment, the thickness of the support film may be 20 μm or more, and the surface roughness Rz of the surface in contact with the intermediate layer of the support film may be 500 nm or less. When the thickness of the support film and the surface roughness of the surface in contact with the middle layer of the support film are within the above range, excellent patterning properties can be obtained and a resist pattern with few microscopic omissions can be formed. Additionally, from the viewpoint of further suppressing the occurrence of minor omissions in the resist pattern, the surface roughness Rz may be 300 nm or less, 100 nm or less, or 80 nm or less. From the viewpoint of adhesive force between the support film and the intermediate layer, the surface roughness Rz may be 1 nm or more, 5 nm or more, 15 nm or more, or 25 nm or more. In addition, in this specification, surface roughness Rz refers to a value measured using a commercially available surface roughness shape measuring device based on the method specified in JIS B0601. For example, using HANDYSURF E-35A (manufactured by Tokyo Seimitsu Co., Ltd.), measurement is possible under the conditions of a measurement width of 4000 μm and a speed of 0.6 mm/s.

In this embodiment, since the support film is removed before exposure, it is not necessary to use a support film with high transparency, but the haze of the support film is 0.01 to 5.0%, 0.01 to 2.0%, 0.01 to 1.5%, and 0.01 to 1.0. %, or may be 0.01 to 0.5%. If this haze is 0.01% or more, the support film itself tends to become easier to manufacture, and if it is 5.0% or less, it tends to become easier to obtain. Here, “haze” means cloudiness. Haze in the present disclosure refers to a value measured using a commercially available haze meter (turbidity meter) based on the method specified in JIS K 7105. Haze can be measured, for example, with a commercially available turbidity meter such as NDH-5000 (manufactured by Nippon Denshoku Kogyo Co., Ltd.).

The material of the support film can be used without particular restrictions. Examples include polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), and polyethylene-2,6-naphthalate (PEN), and polyolefins such as polypropylene and polyethylene. By using a polyester film as a support film, there is a tendency to improve the mechanical strength and resistance to heat of the support film. Additionally, by using a polyester film, defects such as wrinkles in the middle layer that occur when forming the middle layer on the support film can be suppressed, and workability tends to be improved. In addition, the support film may be a single layer or a multilayer.

Additionally, as the support film, you may obtain a support film that can be used as a support film for a photosensitive element among commercially available general industrial films. Specifically, for example, PET films "QS Series" (made by Toray Co., Ltd.), "A4100" (made by Toyobo Seki Co., Ltd.), "KFX" (made by Teijin DuPont Film Co., Ltd.), etc. can be mentioned.

＜Middle layer＞

The photosensitive element of this embodiment has an intermediate layer between the support film and the photosensitive layer. Thereby, even if the support film is peeled and exposed, deterioration of the resolution of the formed resist pattern can be suppressed. Additionally, from the viewpoint of further improving gas barrier properties, the adhesive force between the support film and the intermediate layer may be smaller than the adhesive force between the intermediate layer and the photosensitive layer. In other words, it can be said that when the support film is peeled from the photosensitive element, unintentional peeling between the intermediate layer and the photosensitive layer is suppressed. Additionally, the middle layer can also be called an oxygen shielding layer. Additionally, the intermediate layer may have water solubility or may have solubility in a developing solution. The intermediate layer is a layer formed using a resin composition for forming an intermediate layer described later.

(Resin composition for forming intermediate layer)

The resin contained in the resin composition for forming the intermediate layer has an oxygen permeability coefficient of 1 × 10 ^-13 cm ³ (STP) cm/(cm ² ·s · Pa) or less, from the viewpoint of workability and oxygen shielding properties. It may be ^-14 cm ³ (STP) cm/(cm ² ·s·Pa) or less, or 1×10 ^–15 cm ³ (STP) cm/(cm ² ·s·Pa) or less. The resin composition for forming the intermediate layer may contain a water-soluble resin. By including a water-soluble resin, the solubility of the formed intermediate layer tends to improve. Additionally, since layer separation between the formed intermediate layer and the photosensitive layer can be easily maintained for a long period of time, stability tends to be improved. Examples of water-soluble resins include polyvinyl alcohol, polyvinylpyrrolidone, and the like. The resin composition for forming the intermediate layer may contain polyvinyl alcohol from the viewpoint of having a low oxygen transmission coefficient and being able to further suppress deactivation of radicals generated by actinic light used for exposure. Polyvinyl alcohol can be obtained, for example, by saponifying polyvinyl acetate, which can be obtained by polymerizing vinyl acetate. The saponification degree of the polyvinyl alcohol used in this embodiment may be 50 mol% or more, 70 mol% or more, or 80 mol% or more. By using polyvinyl alcohol with a degree of saponification of 50 mol% or more, the gas barrier properties of the intermediate layer can be further improved, and the resolution of the formed resist pattern tends to be further improved. In addition, "degree of saponification" in this specification refers to a value measured based on JIS K 6726 (1994) (test method for polyvinyl alcohol) specified in the Japanese Industrial Standards. Additionally, the upper limit of this degree of saponification may be 100 mol%.

The average degree of polymerization of polyvinyl alcohol may be 300 to 3500, 300 to 2500, or 300 to 1000. Additionally, the average degree of polymerization of polyvinylpyrrolidone may be 10,000 to 100,000, or 10,000 to 50,000. As for the polyvinyl alcohol, two or more types of polyvinyl alcohol having different degrees of saponification, viscosity, degree of polymerization, modified species, etc. may be used in combination.

Additionally, the resin composition for forming the intermediate layer may contain a resin that has solubility in a developing solution. As the resin having solubility in a developing solution, for example, component (A) used in the photosensitive resin composition described later may be included, and component (B) may be included. By including a resin that is soluble in a developer, the adhesion between the formed intermediate layer and the photosensitive layer tends to improve, and also tends to facilitate the formation of a photosensitive layer on the formed intermediate layer.

The resin composition for forming an intermediate layer may contain at least one type of solvent as needed in order to improve the handleability of the resin composition or to adjust the viscosity and storage stability. Examples of solvents include water and organic solvents. Examples of organic solvents include methanol, acetone, toluene, and mixed solvents thereof. From the viewpoint of improving drying efficiency when forming the intermediate layer, methanol may be included. In addition, when the resin composition for forming the intermediate layer contains a water-soluble resin, water, and methanol, the content of methanol is 1 to 100 parts by mass, 10 to 80 parts by mass, based on 100 parts by mass of water, from the viewpoint of solubility in the water-soluble resin. parts, or 20 to 60 parts by mass. The content of the water-soluble resin may be 1 to 50 parts by mass, or 10 to 30 parts by mass, based on 100 parts by mass of water.

Additionally, the resin composition for forming the intermediate layer may contain known additives such as surfactants, plasticizers, and leveling agents. Examples of the leveling agent include silicone-based leveling agents, and examples of commercially available silicone-based leveling agents include Polyflow KL-401 (manufactured by Kyoeisha Chemical Co., Ltd.). When containing a leveling agent, the content of the leveling agent may be 0.01 to 2.0 parts by mass or 0.05 to 1.0 parts by mass with respect to 100 parts by mass of the resin composition for forming an intermediate layer from the viewpoint of ease of formation of the intermediate layer.

The surfactant may include a silicone-based surfactant or a fluorine-based surfactant from the viewpoint of improving peelability from the support film. These surfactants can be used individually or in combination of two or more types. When containing a surfactant, the content of the surfactant is 0.01 to 1.0 parts by mass, 0.05 to 0.5 parts by mass, or 0.1 to 0.3 parts by mass, based on 100 parts by mass of the resin composition for forming the intermediate layer, from the viewpoint of ease of forming the intermediate layer. It can be a buoy.

The plasticizer may include, for example, a polyhydric alcohol compound from the viewpoint of improving the ease of forming the intermediate layer. For example, glycerins such as glycerin, diglycerin, and triglycerin, (poly)alkyl such as ethylene glycol, diethylene glycol, triethylene glycol, tetra ethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, and polypropylene glycol. Examples include rene glycols and trimethylolpropane. These plasticizers can be used individually or in combination of two or more types.

The thickness of the intermediate layer is not particularly limited, but may be 12 μm or less, 10 μm or less, or 8 μm or less from the viewpoint of developability. Additionally, the thickness of the middle layer may be 1.0 μm or more, 1.5 μm or more, or 2 μm or more from the viewpoint of ease of forming the middle layer and resolution.

In addition, the intermediate layer in this embodiment may have photosensitivity, but its photosensitivity is lower than that of the photosensitive layer. Additionally, the intermediate layer does not have to be photosensitive. When the intermediate layer does not have photosensitivity, the photosensitivity stability of the photosensitive layer tends to be further improved. In addition, "photosensitive" means, for example, when a photosensitive layer is exposed, heat treated after exposure as necessary, and then developed using a developer for removing uncured portions of the photosensitive layer, the resist. It refers to something that can form a pattern.

＜Photosensitive layer＞

The photosensitive layer of this embodiment is a layer formed using the photosensitive resin composition described later. The photosensitive resin composition can be used according to the desired purpose as long as it is a resin composition whose properties change when irradiated with light (for example, is photocured), and may be of a negative type or a positive type. The photosensitive resin composition may contain (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator. Additionally, if necessary, (D) a photosensitizer, (E) a polymerization inhibitor, or other components may be contained. Hereinafter, each component used in the photosensitive resin composition of this embodiment will be described in more detail.

((A) Binder polymer)

(A) The binder polymer (hereinafter also referred to as “(A) component”) can be manufactured, for example, by radically polymerizing a polymerizable monomer. Examples of the polymerizable monomer include polymerizable styrene derivatives substituted at the α-position or aromatic ring such as styrene, vinyltoluene and α-methylstyrene, acrylamides such as diacetone acrylamide, acrylonitrile, Ethers of vinyl alcohol such as vinyl-n-butyl ether, alkyl (meth)acrylic acid, benzyl esters of (meth)acrylic acid such as benzyl methacrylate, tetrahydrofurfuryl (meth)acrylic acid, and dimethylamino (meth)acrylic acid. Ethyl ester, (meth)acrylic acid diethylaminoethyl ester, (meth)acrylic acid glycidyl ester, 2,2,2-trifluoroethyl (meth)acrylate, 2,2,3,3-tetrafluoropropyl (meth)acrylate, (meth)acrylic acid, α-bromoacrylic acid, α-chloracrylic acid, β-furyl (meth)acrylic acid, β-styryl (meth)acrylic acid, maleic acid, maleic anhydride, monomethyl maleate , maleic acid monoesters such as monoethyl maleate and monoisopropyl maleate, fumaric acid, cinnamic acid, α-cyanocinnamic acid, itaconic acid, crotonic acid, and propiolic acid. These can be used individually or in combination of two or more types.

Among these, from the viewpoint of improving plasticity, (meth)acrylic acid alkyl ester may be included. Examples of (meth)acrylic acid alkyl esters include compounds represented by the following general formula (II), and compounds in which the alkyl groups of these compounds are substituted with hydroxyl groups, epoxy groups, halogen groups, etc.

H ₂ C=C(R ⁶ )-COOR ⁷ (II)

In general formula (II), R ⁶ represents a hydrogen atom or a methyl group, and R ⁷ represents an alkyl group having 1 to 12 carbon atoms. Examples of the alkyl group having 1 to 12 carbon atoms represented by R ⁷ include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, and Structural isomers of these groups can be mentioned.

Examples of (meth)acrylic acid alkyl esters represented by the general formula (II) include (meth)acrylic acid methyl ester, (meth)acrylic acid ethyl ester, (meth)acrylic acid propyl ester, (meth)acrylic acid butyl ester, ( Meth)acrylic acid pentyl ester, (meth)acrylic acid hexyl ester, (meth)acrylic acid heptyl ester, (meth)acrylic acid octyl ester, (meth)acrylic acid 2-ethylhexyl ester, (meth)acrylic acid nonyl ester, (meth)acrylic acid decyl ester , (meth)acrylic acid undecyl ester, (meth)acrylic acid dodecyl ester, etc. These can be used individually or in combination of two or more types.

In addition, (A) component may contain a carboxyl group from the viewpoint of alkaline developability. Component (A) containing a carboxyl group can be manufactured, for example, by radically polymerizing a polymerizable monomer having a carboxyl group and another polymerizable monomer. The polymerizable monomer having the carboxyl group may be (meth)acrylic acid or methacrylic acid. In addition, the acid value of component (A) containing a carboxyl group may be 50 to 250 mgKOH/g.

The carboxyl group content of component (A) (mixing ratio of polymerizable monomers having a carboxyl group relative to the total amount of polymerizable monomers used in the binder polymer) is 12 to 50 mass% from the viewpoint of improving alkali developability and alkali resistance in a balanced manner, It may be 12 to 40 mass%, 15 to 35 mass%, or 15 to 30 mass%. When the carboxyl group content is 12% by mass or more, alkali developability tends to improve, and when the carboxyl group content is 50% by mass or less, alkali resistance tends to be excellent.

In addition, component (A) may use styrene or a styrene derivative as a polymerizable monomer from the viewpoint of adhesion and chemical resistance. When the above-mentioned styrene or styrene derivative is used as the polymerizable monomer, the content (mixing ratio of styrene or styrene derivative to the total amount of polymerizable monomer used in component (A)) is from the viewpoint of further improving adhesion and chemical resistance, It may be 10 to 60 mass%, or 15 to 50 mass%. If this content is 10% by mass or more, adhesion tends to improve, and if it is 60% by mass or less, the size of peeling pieces can be suppressed during development, and the lengthening of the time required for peeling tends to be suppressed.

In addition, component (A) may use benzyl (meth)acrylic acid as a polymerizable monomer from the viewpoint of resolution and aspect ratio. The content of the structural unit derived from benzyl (meth)acrylic acid in component (A) may be 15 to 50 mass% from the viewpoint of further improving resolution and aspect ratio.

These binder polymers can be used individually or in combination of two or more types. Component (A) when two or more types are used in combination include, for example, two or more binder polymers made of different polymerizable monomers, two or more binder polymers with different weight average molecular weights, and two or more binder polymers with different degrees of dispersion. More than one type of binder polymer can be mentioned.

(A) Component can be manufactured by a normal method. Specifically, it can be produced, for example, by radically polymerizing (meth)acrylic acid alkyl ester, (meth)acrylic acid, styrene, etc.

The weight average molecular weight of component (A) may be 20,000 to 300,000, 40,000 to 150,000, 40,000 to 120,000, or 50,000 to 80,000 from the viewpoint of improving mechanical strength and alkali developability in a balanced manner. When the weight average molecular weight of component (A) is 20,000 or more, developer resistance tends to be excellent, and when it is 300,000 or less, prolonged development time tends to be suppressed. In addition, the weight average molecular weight in this specification is a value measured by gel permeation chromatography (GPC) and converted using a calibration curve prepared using standard polystyrene.

The content of the component (A) may be 30 to 80 parts by mass, 40 to 75 parts by mass, or 50 to 70 parts by mass, based on 100 parts by mass of the total solid content of component (A) and component (B) described later. . (A) When the content of component is within this range, the coating film properties of the photosensitive resin composition and the strength of the photocured portion become better.

((B) Photopolymerizable compound)

The photosensitive resin composition according to this embodiment may contain (B) a photopolymerizable compound (hereinafter also referred to as "(B) component"). The component (B) can be used without particular limitation as long as it is a photopolymerizable compound or a photocrosslinkable compound. For example, a compound having at least one ethylenically unsaturated bond in the molecule can be used.

(B) As a component, the photopolymerizable compound which has an ethylenically unsaturated bond described in International Publication No. 2015/177947 is mentioned, for example. These can be used individually or in combination of two or more types.

From the viewpoint of balanced improvement of resolution, adhesion, and suppression of register fringing, component (B) may contain a bisphenol-type (meth)acrylate compound. The bisphenol-type (meth)acrylate compound may be a compound represented by the following general formula (III).

In general formula (III), R ¹ , R ² , R ³ and R ⁴ each independently represent a hydrogen atom or a methyl group. X and Y each independently represent an ethylene group or a propylene group, and It is sometimes called ".). p ₁ , p ₂ , q ₁ and q ₂ each independently represent a numerical value from 0 to 40. However, p ₁ + q ₁ and p ₂ + q ₂ are both 1 or more. When X is an ethylene group and Y is a propylene group, p ₁ + p ₂ is 1 to 40, and q ₁ + q ₂ is 0 to 20. When X is a propylene group and Y is an ethylene group, p ₁ + p ₂ is 0 to 20, and q ₁ + q ₂ is 1 to 40. Since p ₁ , p ₂ , q ₁ and q ₂ represent the number of structural units of the EO group or PO group, they represent an integer value in a single molecule, and represent a rational number that is the average value in a collection of multiple types of molecules. In addition, the EO group and the PO group may each exist continuously in a block form or may exist randomly.

When using a bisphenol-type (meth)acrylate compound as component (B), the content of the compound is 1 to 50 based on the total solid content of component (A) and component (B) from the viewpoint of further improving chemical resistance. It may be mass%, or 3-40 mass%.

In addition, the content of the bisphenol-type (meth)acrylate compound is 30 to 99% by mass, 50 to 97% by mass, or 60 to 95% by mass, based on the total solid content of component (B), from the viewpoint of further improving chemical resistance. It may be mass%.

In addition, the content of the compound represented by general formula (III) in which the total number of EO groups and PO groups is 1 to 7 is relative to the total solid content of component (A) and component (B) from the viewpoint of better resolution. , 1 to 40 mass%, 2 to 38 mass%, or 3 to 28 mass%.

Additionally, from the viewpoint of further improving followability to the unevenness of the substrate, a compound obtained by reacting α,β-unsaturated carboxylic acid with a polyhydric alcohol may be contained. As such a compound, polyalkylene glycol di(meth)acrylate having both an EO group and a PO group in the molecule, dipentaerythritol (meth)acrylate having an EO group, etc. can be used. Examples of commercially available compounds as dipentaerythritol (meth)acrylate having an EO group include "DPEA-12" manufactured by Nippon Kayaku Co., Ltd., etc. The content of dipentaerythritol (meth)acrylate having an EO group is 1 to 10% by mass, or 1.5 to 5% by mass, from the viewpoint of better resolution, relative to the total solid content of component (A) and component (B). It can be %.

Compounds commercially available as polyalkylene glycol di(meth)acrylates having both an EO group and a PO group include, for example, polyalkyl having an EO group: 6 (average value) and a PO group: 12 (average value). Len glycol dimethacrylate ("FA-023M", "FA-024M" manufactured by Hitachi Chemical Industries, Ltd.), etc. are mentioned.

In addition, in the molecule of polyalkylene glycol di(meth)acrylate having both an EO group and a PO group, the EO group and the PO group may each exist continuously in a block form or may exist randomly. Additionally, the PO group may be either an oxy-n-propylene group or an oxyisopropylene group. Additionally, in the (poly)oxyisopropylene group, the secondary carbon of the propylene group may be bonded to an oxygen atom, or the primary carbon may be bonded to an oxygen atom.

The content of component (B) may be 20 to 70 parts by mass, 25 to 60 parts by mass, or 30 to 50 parts by mass with respect to 100 parts by mass of the total solid content of component (A) and component (B). (B) If the content of component is within this range, in addition to the resolution, adhesion, and suppression of resist hem generation of the photosensitive resin composition, photosensitivity and coating film properties also become better.

((C) Photopolymerization initiator)

The photosensitive resin composition according to this embodiment may contain at least one type of (C) photoinitiator (hereinafter also referred to as "(C) component"). The component (C) is not particularly limited as long as it can polymerize the component (B), and can be appropriately selected from commonly used photopolymerization initiators.

(C) As a component, for example, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, 2-methyl-1-[4-(methylthio)phenyl] -Aromatic ketones such as 2-morpholino-propanone-1, quinones such as alkylanthraquinone, benzoin ether compounds such as benzoin alkyl ether, benzoin compounds such as benzoin and alkylbenzoin, and benzyl dimethyl ketal. 2, such as benzyl derivatives, 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, etc. , 4,5-triarylimidazole dimer, 9-phenylacridine, and acridine derivatives such as 1,7-(9,9'-acridinyl)heptane. These can be used individually or in combination of two or more types.

Among these, 2,4,5-triarylimidazole dimer may be contained from the viewpoint of improving resolution. Examples of the 2,4,5-triarylimidazole dimer include 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-chlorophenyl)- 4,5-bis-(m-methoxyphenyl)imidazole dimer, and 2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer. Among these, 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer may be contained from the viewpoint of improving photosensitivity stability.

As a 2,4,5-triarylimidazole dimer, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole is B -CIM (manufactured by Hodogaya Chemical Co., Ltd., product name) is commercially available.

Component (C) further improves photosensitivity and adhesion, and may contain at least one type of 2,4,5-triarylimidazole dimer from the viewpoint of further suppressing the light absorption of component (C). It may also contain 2-(2-chlorophenyl)-4,5-diphenylimidazole dimer. Additionally, the structure of the 2,4,5-triarylimidazole dimer may be symmetric or asymmetric.

The content of component (C) is 0.01 to 30 parts by mass, 0.1 to 10 parts by mass, 1 to 7 parts by mass, 1 to 6 parts by mass, based on 100 parts by mass of the total solid content of component (A) and component (B). It may be 1 to 5 parts by mass, or 2 to 5 parts by mass. When the content of component (C) is 0.01 parts by mass or more, photosensitivity, resolution, and adhesion tend to improve, and when it is 30 parts by mass or less, the resist shape tends to be excellent.

((D) photosensitizer)

The photosensitive resin composition according to this embodiment may contain (D) a photosensitizer (hereinafter also referred to as "(D) component"). By containing (D) component, the absorption wavelength of the actinic light used for exposure can be utilized effectively.

(D) Components include, for example, pyrazolines, dialkylaminobenzophenones, anthracenes, coumarins, xanthons, oxazoles, benzooxazoles, thiazoles, benzothiazoles, triazoles, stilbenes, Triazines, thiophenes, naphthalimides, and triarylamines can be mentioned. These can be used individually or in combination of two or more types. From the viewpoint of being able to utilize the absorption wavelength of the actinic light used for exposure more effectively, component (D) may contain pyrazolines, anthracenes, or dialkylaminobenzophenones, and among them, dialkylaminobenzophenones. Benzophenones may be included. Compounds commercially available as dialkylaminobenzophenones include, for example, "EAB" manufactured by Hodogaya Chemical Co., Ltd.

When containing component (D), the content is 1.0 parts by mass or less, 0.5 parts by mass or less, 0.15 parts by mass or less, and 0.12 parts by mass or less with respect to 100 parts by mass of the total solid content of component (A) and component (B). , or may be 0.10 parts by mass or less. If the content of component (D) is 1.0 parts by mass or less with respect to 100 parts by mass of the total solid content of component (A) and component (B), deterioration of resist shape and resist hem generation can be suppressed, and resolution can be improved. There is a tendency to Additionally, the content of component (D) may be 0.01 parts by mass or more with respect to 100 parts by mass of the total solid content of component (A) and component (B) from the viewpoint of easily obtaining high photosensitivity and high resolution.

((E) Polymerization inhibitor)

The photosensitive resin composition according to this embodiment may contain (E) a polymerization inhibitor (hereinafter also referred to as "(E) component"). By containing (E) component, there is a tendency that the exposure amount required to photocure the photosensitive resin composition can be adjusted to the optimal exposure amount for exposure with a projection exposure machine.

(E) Component may contain a compound represented by the following general formula (I) from the viewpoint of further improving resolution.

In general formula (I), R ⁵ is a halogen atom, a hydrogen atom, an alkyl group with 1 to 20 carbon atoms, a cycloalkyl group with 3 to 10 carbon atoms, an amino group, an aryl group, a mercapto group, an alkylmercapto group with 1 to 10 carbon atoms, The alkyl group represents a carboxyl alkyl group having 1 to 10 carbon atoms, an alkoxy group or a heterocyclic group having 1 to 20 carbon atoms, and m and n are selected so that m is an integer of 2 or more, n is an integer of 0 or more, and m + n = 6. It is an integer, and when n is an integer of 2 or more, R ⁵ may be the same or different. Additionally, the aryl group may be substituted with an alkyl group having 1 to 20 carbon atoms.

R ⁵ may be a hydrogen atom or an alkyl group having 1 to 20 carbon atoms from the viewpoint of further improving compatibility with component (A). The alkyl group having 1 to 20 carbon atoms represented by R ⁵ may be an alkyl group having 1 to 4 carbon atoms. From the viewpoint of further improving resolution, m may be 2 or 3, or may be 2.

The compound represented by the general formula (I) may be an alkyl catechol from the viewpoint of further improving resolution.

The content of component (E) is 0.03 to 0.3 parts by mass, 0.03 to 0.2 parts by mass, 0.05 to 0.15 parts by mass, or 0.05 to 0.1 parts by mass, based on 100 parts by mass of the total solid content of component (A) and component (B). You can continue. By setting the content of component (E) to 0.3 parts by mass or less, the exposure time can be shortened, which tends to contribute to improving the efficiency of mass production. In addition, by setting the content of component (E) to 0.03 parts by mass or more, the photoreaction in the photocured portion can sufficiently proceed, and by improving the reaction rate, the resist swelling property tends to be suppressed and the resolution can be improved. .

In addition, the content of component (E) may be 0.05 to 0.4 parts by mass, 0.05 to 0.2 parts by mass, or 0.05 to 0.1 parts by mass with respect to 100 parts by mass of solid content of component (A). When the content of component (E) is 0.05 parts by mass or more relative to component (A), the thermal stability of the photosensitive resin composition tends to be improved, and when it is 0.4 parts by mass or less, yellowing of the photosensitive resin composition can be suppressed. There tends to be.

(Other ingredients)

The photosensitive resin composition according to the present embodiment contains, if necessary, 0.01 to 20 parts by mass of the additives described in International Publication No. 2015/177947, based on 100 parts by mass of the total solid content of component (A) and component (B). can do. These additives can be used individually or in combination of two or more.

In addition, the photosensitive resin composition according to the present embodiment may contain at least one organic solvent as needed in order to improve the handleability of the photosensitive resin composition or to adjust the viscosity and storage stability. As the organic solvent, any commonly used organic solvent can be used without particular limitation. Specifically, for example, the organic solvent described in International Publication No. 2015/177947 is mentioned. These can be used individually or in combination of two or more types.

＜Protective layer＞

The photosensitive element of this embodiment may have a protective layer laminated on the side opposite to the side in contact with the middle layer of the photosensitive layer. As a protective layer, for example, a polymer film such as polyethylene or polypropylene may be used. In addition, the same polymer film as the above-mentioned support film may be used, or a different polymer film may be used.

Hereinafter, a method for manufacturing a photosensitive element in which a support film, an intermediate layer, a photosensitive layer, and a protective layer are sequentially laminated will be described.

＜Manufacturing method of photosensitive element＞

First, for example, a water-soluble resin containing polyvinyl alcohol is gradually added to water heated to 70 to 90°C so that the solid content is 10 to 20% by mass and stirred for about 1 hour to uniformly dissolve, forming polyvinyl alcohol. A resin composition for forming an intermediate layer containing vinyl alcohol is obtained. In addition, in this specification, "solid content" refers to the non-volatile content of the resin composition excluding volatile substances such as water and organic solvents. In other words, it refers to components other than solvents such as water and organic solvents that remain without volatilizing in the drying process, and includes those in the form of liquid, starch syrup, and wax at room temperature around 25°C.

Next, the resin composition for forming an intermediate layer is applied on the support film and dried to form an intermediate layer. In addition, when the density of particles such as a lubricant is different on both sides of the support film, an intermediate layer may be formed on the side of the support film with few particles using a resin composition for forming an intermediate layer. Application of the resin composition for forming the intermediate layer onto the support film can be performed by known methods such as roll coat, comma coat, gravure coat, air knife coat, die coat, bar coat, and spray coat. .

In addition, drying of the applied resin composition for forming an intermediate layer is not particularly limited as long as at least part of the solvent such as water can be removed, but drying may be performed at 70 to 150°C for 5 to 30 minutes. After drying, the amount of residual solvent in the intermediate layer may be 2% by mass or less from the viewpoint of preventing diffusion of the solvent in subsequent processes.

Next, the photosensitive resin composition may be applied and dried on the intermediate layer of the support film on which the intermediate layer is formed in the same manner as the application of the resin composition for forming the intermediate layer, thereby forming a photosensitive layer on the intermediate layer. By laminating a protective layer on the photosensitive layer formed in this way, a photosensitive element can be produced including a support film, an intermediate layer, a photosensitive layer, and a protective layer in this order. Additionally, a photosensitive element is provided with the support film, the intermediate layer, the photosensitive layer, and the protective layer in this order by bonding an intermediate layer formed on a support film and a photosensitive layer formed on a protective layer. You can get it. When manufacturing the photosensitive element according to this embodiment by such bonding, workability tends to improve.

The thickness of the photosensitive layer in the photosensitive element can be appropriately selected depending on the application, but the thickness after drying may be 1 to 200 μm, 5 to 100 μm, or 10 to 50 μm. When the thickness of the photosensitive layer is 1 μm or more, industrial coating becomes easy and productivity tends to improve. Additionally, when the thickness of the photosensitive layer is 200 μm or less, the photosensitivity is high and the photocurability of the bottom of the resist is excellent, so there is a tendency to form a resist pattern with excellent resolution and aspect ratio.

The melt viscosity of the photosensitive layer in the photosensitive element at 110°C can be appropriately selected depending on the type of substrate in contact with the photosensitive layer, but after drying, at 110°C, it is 50 to 10,000 Pa·s, 100 to 5,000 Pa·s. , or it may be 200 to 1000 Pa·s. If the melt viscosity at 110°C is 50 Pa·s or more, wrinkles and voids do not occur in the lamination process, and productivity tends to improve. In addition, if the melt viscosity at 110°C is 10000 Pa·s or less, the adhesion to the substrate during the lamination process improves, and adhesive defects tend to be reduced.

The photosensitive element according to this embodiment can be suitably used, for example, in the resist pattern formation method and the printed wiring board manufacturing method described later.

[Method of forming register pattern]

The method of forming a resist pattern according to the present embodiment includes the step (i) of arranging the photosensitive layer, the intermediate layer, and the support film in this order on a substrate using the photosensitive element (hereinafter referred to as "(i) ) (also referred to as “photosensitive layer and intermediate layer forming process”), and (ii) removing the support film and exposing the photosensitive layer to actinic light through the intermediate layer (hereinafter, also referred to as “(ii) exposure process”) ) and (iii) a step of removing the uncured portion of the photosensitive layer and the intermediate layer from the substrate (hereinafter also referred to as “(iii) development step”), and may include other steps as necessary. . In addition, a resist pattern can be called a photocured material pattern of a photosensitive resin composition, and can also be called a relief pattern. Additionally, depending on the purpose, the resist pattern in this embodiment may be used as a resist or may be used for other purposes such as a protective film.

((i) Photosensitive layer and intermediate layer formation process)

In the photosensitive layer and intermediate layer forming process, the photosensitive layer and the intermediate layer are formed on a substrate using the photosensitive element. The substrate is not particularly limited, but usually a substrate for circuit formation having an insulating layer and a conductor layer formed on the insulating layer, or a die pad (base material for a lead frame) such as an alloy base material, etc. are used.

As a method of forming the photosensitive layer and the intermediate layer on the substrate, for example, when using a photosensitive element having a protective layer, the protective layer is removed, and then the photosensitive layer of the photosensitive element is pressed to the substrate while heating. A photosensitive layer and an intermediate layer can be formed on the photosensitive layer. Thereby, it is possible to obtain a laminate including the substrate, photosensitive layer, intermediate layer, and support film in this order.

When carrying out the photosensitive layer and intermediate layer formation process using a photosensitive element, it may be carried out under reduced pressure from the viewpoint of adhesion and followability. Heating during compression may be performed at a temperature of 70 to 130°C, and compression may be performed at a pressure of 0.1 to 1.0 MPa (1 to 10 kgf/cm ² ), but these conditions can be appropriately selected as needed. Additionally, when the photosensitive layer of the photosensitive element is heated to 70 to 130°C, it is not necessary to preheat the substrate in advance, but the substrate may be preheated to further improve adhesion and followability.

((ii) Exposure process)

In the exposure process, the support film is removed and the photosensitive layer is exposed to actinic light through the intermediate layer. As a result, the exposed portion irradiated with actinic rays may be photocured, and a photocured portion (latent image) may be formed, or the unexposed portion not irradiated with actinic rays may be photocured, and a photocured portion may be formed. You can stay. When the photosensitive layer and the intermediate layer are formed using the photosensitive element, the support film present on the photosensitive layer is peeled off and then exposed. By exposing the photosensitive layer through the intermediate layer, resolution is improved and minute omission of the resist pattern can be further suppressed.

As an exposure method, a known exposure method can be applied, for example, a method of irradiating actinic light on an image through a negative or positive mask pattern called artwork (mask exposure method) ), LDI (Laser Direct Imaging) exposure method, or a method of irradiating the image of a photomask as an image through a lens using actinic light that projects the image (projection exposure method). Among them, the projection exposure method may be used from the viewpoint of further suppressing the occurrence of minor omissions in the resist pattern. That is, the photosensitive element and the like related to this embodiment are applied by the projection exposure method. Additionally, the projection exposure method can also be said to be an exposure method that uses actinic light with an attenuated amount of energy.

The light source of actinic light is not particularly limited as long as it is a commonly used and known light source. For example, carbon arc lamp, mercury vapor arc lamp, ultra-high pressure mercury lamp, high pressure mercury lamp, xenon lamp, gas laser such as argon laser, YAG laser, etc. Light sources that effectively emit ultraviolet rays, such as solid-state lasers and semiconductor lasers such as gallium nitride-based blue-violet lasers, are used. Additionally, a light source that effectively emits visible light, such as a photographic flood bulb or solar lamp, may be used. Among these, from the viewpoint of improving resolution and alignment in a balanced manner, a light source capable of emitting i-line monochromatic light with an exposure wavelength of 365 nm, a light source capable of emitting h-line monochromatic light with an exposure wavelength of 405 nm, or ihg crosstalk ( A light source capable of emitting actinic light with a clean exposure wavelength may be used, and in particular, a light source capable of emitting i-line monochromatic light with an exposure wavelength of 365 nm may be used. Examples of a light source capable of emitting i-line monochromatic light with an exposure wavelength of 365 nm include an ultra-high pressure mercury lamp.

((iii) Development process)

In the development process, the uncured portion and intermediate layer of the photosensitive layer are removed from the substrate. Through the development process, a resist pattern consisting of a photocured portion of the photosensitive layer is formed on the substrate. If the middle layer is water-soluble, the middle layer may be removed by washing with water, and then the uncured portions other than the photocured portion may be removed with a developer. If the middle layer is soluble in the developer, the uncured portions other than the photocured portion may be removed. The middle layer along with the flowering area may be removed with a developer. The development method includes wet development.

In the case of wet development, development can be performed by a known wet development method using a developing solution corresponding to the photosensitive resin composition. Wet development methods include, for example, dip method, paddle method, high-pressure spray method, brushing, slapping, scrubbing, rock immersion, etc., etc. , From the viewpoint of improving resolution, the high-pressure spray method is most suitable. These wet development methods may be developed individually or in combination of two or more methods.

The developing solution is appropriately selected depending on the composition of the photosensitive resin composition. Examples include alkaline aqueous solutions and organic solvent developers.

From the standpoint of safety, stability, and good operability, an alkaline aqueous solution may be used as the developer. Examples of bases in alkaline aqueous solutions include alkali hydroxides such as hydroxides of lithium, sodium or potassium, alkali carbonates such as carbonates or bicarbonates of lithium, sodium, potassium or ammonium, alkali metal phosphates such as potassium phosphate and sodium phosphate, and pyrolates. Alkali metal pyrophosphates such as sodium phosphate and potassium pyrophosphate, sodium borate, sodium metasilicate, tetramethylammonium hydroxide, ethanolamine, ethylenediamine, diethylenetriamine, 2-amino-2-hydroxymethyl-1,3- Propanediol, 1,3-diamino-2-propanol and morpholine are used.

The alkaline aqueous solution used for development includes a dilute solution of 0.1 to 5% by mass of sodium carbonate, a dilute solution of 0.1 to 5% by mass of potassium carbonate, a dilute solution of 0.1 to 5% by mass of sodium hydroxide, and a diluted solution of 0.1 to 5% by mass of sodium borate. Solutions, etc. can be used. Additionally, the pH of the alkaline aqueous solution used for development may be in the range of 9 to 11, and the temperature of the alkaline aqueous solution can be adjusted according to the developability of the photosensitive layer. Additionally, the alkaline aqueous solution may contain, for example, a surfactant, an antifoaming agent, or a small amount of an organic solvent to promote development. In addition, organic solvents used in alkaline aqueous solutions include, for example, 3-acetone alcohol, acetone, ethyl acetate, alkoxyethanol having an alkoxy group of 1 to 4 carbon atoms, ethyl alcohol, isopropyl alcohol, butyl alcohol, and diethylene glycol mono. Examples include methyl ether, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether.

Organic solvents Examples of organic solvents used in the developer include 1,1,1-trichloroethane, N-methylpyrrolidone, N,N-dimethylformamide, cyclohexanone, methyl isobutyl ketone, and γ- Examples include butyrolactone. From the viewpoint of preventing ignition, water may be added to these organic solvents in the range of 1 to 20% by mass to form an organic solvent developer.

(Other processes)

In the resist pattern forming method according to the present embodiment, after removing the uncured portion in the development step, heating at 60 to 250° C. or exposure at an exposure dose of 0.2 to 10 J/cm ² is performed as necessary to form a resist pattern. A process of further hardening may be included.

[Laminate]

The laminate of the present embodiment may include a substrate, a photosensitive layer, and an intermediate layer in this order, and may further include a support film on the side of the intermediate layer opposite to the photosensitive layer. In addition, in the laminate of the present embodiment, the diameter on the surface opposite to the photosensitive layer side of the intermediate layer (however, when the shape of the concave portion is not circular, it means the diameter of the circumscribed circle of that shape) is 3 μm or more. The number of recesses is 30/mm ² or less. In addition, the number of recesses with a diameter of 3 μm or more may be 25 or less/mm ² , 20 or less/mm ² , 10 or less/mm ² , 5 or less/mm ² or ^{1 or} less. . The lower limit of the number of such recesses is 0/mm ² . Additionally, the number of recesses can be measured using a scanning electron microscope. By setting the number of recesses with a diameter of 3 μm or more to 30 pieces/mm ² or less, it becomes difficult for minute omissions to occur in the resist pattern formed using the laminate, and a resist pattern with few minute omissions can be formed. And, when such a laminate is used in the manufacture of printed wiring boards, the occurrence of open defects during etching and the occurrence of short defects during plating can be suppressed, and a decrease in the manufacturing yield of printed wiring boards can be suppressed. In addition, from the viewpoint of being able to form a resist pattern with fewer microscopic omissions, the number of recesses with a diameter of 1.2 μm or more and less than 3 μm is 1000 pieces/mm ² or less, 500 pieces/mm 2 or less, or 10 pieces/mm ² or less. Although it may be mm ² or less, the lower limit of the number of such recesses is 0/mm ² . Also, from the same viewpoint, the depth of the concave portion may be 5 μm or less. Also, from the same point of view, in the above-mentioned laminate, there is no need to have a support film on the side opposite to the photosensitive layer of the middle layer, that is, in the laminate, the side opposite to the photosensitive layer of the middle layer may be exposed.

The number of recesses with a diameter of 3 μm or more on the surface of the intermediate layer opposite to the photosensitive layer can be reduced by reducing the number of particles contained in the support film, especially the number of particles with a diameter of 5 μm or more. Similarly, the number of recesses with a diameter of 1.2 μm or more and less than 3 μm on the side opposite to the photosensitive layer of the intermediate layer is the number of particles contained in the support film, especially the number of particles with a diameter of 2 μm or more and less than 5 μm. It can be reduced by reducing it.

The number of recesses with a diameter of 3 μm or more can be measured by observation using a scanning electron microscope (for example, SU-1500 (made by Hitachi Seisakusho Co., Ltd.)). Observation can be performed at any 10 locations. The measurement area is set to a size of 1 mm square, measured at 10 arbitrary locations, and the average value is taken as the number of recesses with a diameter of 3 μm or more in the intermediate layer. In addition, when the laminated body is provided with a support film, you may measure after peeling off the support film.

The substrate is not particularly limited, but the same substrate as the substrates listed in the resist pattern formation method may be used. The surface roughness Rz of the substrate may be 100 nm or less, 80 nm or less, or 50 nm or less from the viewpoint of improving resolution. Additionally, the surface roughness Rz of the substrate is not particularly limited, but may be 1 nm or more.

The laminate of this embodiment may be manufactured by pressing the photosensitive element onto the substrate so that the photosensitive layer of the photosensitive element is in close contact with the substrate. The laminate of the present embodiment is a resist pattern comprising a step of exposing a photosensitive layer to actinic light through an intermediate layer in the laminate, and a step of removing the uncured portion of the photosensitive layer and the intermediate layer from the substrate. It can be used in the formation method of . Thereby, it is possible to form a register pattern with few minor omissions.

[Manufacturing method of printed wiring board]

The method for manufacturing a printed wiring board according to the present embodiment includes a step of forming a conductor pattern by etching or plating a substrate on which a resist pattern is formed by the above resist pattern formation method, and, if necessary, a resist pattern removal step. Other processes such as these may also be included. The method for manufacturing a printed wiring board according to the present embodiment can be suitably used for forming a conductor pattern by using the method for forming a resist pattern using the photosensitive element or the laminate. Among these, the method for forming a conductor pattern by plating treatment Application to the method of forming is more suitable. Additionally, a conductor pattern can also be referred to as a circuit.

In the etching process, the resist pattern formed on the substrate provided with the conductor layer is used as a mask, and the conductor layer of the substrate not covered by the resist is etched away to form a conductor pattern.

The method of etching treatment is appropriately selected depending on the conductor layer to be removed. Examples of the etching solution include a cupric chloride solution, a ferric chloride solution, an alkaline etching solution, and a hydrogen peroxide-based etching solution. Since the etch factor is good, the ferric chloride solution is used. It's okay too.

On the other hand, in the plating process, copper or solder, etc. are plated on the conductor layer of the substrate not covered with the resist, using the resist pattern formed on the substrate provided with the conductor layer as a mask. After the plating treatment, the resist is removed by removing the resist pattern described later, and the conductor layer covered by the resist is etched to form a conductor pattern.

The method of plating treatment may be electroplating treatment or electroless plating treatment, but among these, electroless plating treatment may be used. Electroless plating treatments include, for example, copper plating such as copper sulfate plating and copper pyrophosphate plating, solder plating such as high-slow solder plating, and nickel plating such as Watts bath (nickel sulfate-nickel chloride) plating and nickel sulfuramine plating. Gold plating includes gold plating, hard gold plating, and soft gold plating.

After the etching process or plating process, the resist pattern on the substrate is removed. The resist pattern can be removed, for example, by peeling with an aqueous solution that is stronger alkaline than the alkaline aqueous solution used in the development process. As this strongly alkaline aqueous solution, for example, a 1 to 10 mass% aqueous sodium hydroxide solution, a 1 to 10 mass% potassium hydroxide aqueous solution, etc. are used. Among these, 1 to 5% by mass aqueous sodium hydroxide solution or aqueous potassium hydroxide solution may be used.

Examples of the resist pattern removal method include an immersion method and a spray method, and these may be used individually or in combination.

When the resist pattern is removed after plating, the desired printed wiring board can be manufactured by etching the conductor layer covered with the resist to form a conductor pattern. The etching method at this time is appropriately selected depending on the conductor layer to be removed. For example, the etching solution described above can be applied.

The method for manufacturing a printed wiring board according to this embodiment is applicable to manufacturing not only a single-layer printed wiring board but also a multi-layer printed wiring board, and is also applicable to manufacturing a printed wiring board having a small-diameter through hole, etc.

The method for manufacturing a printed wiring board according to the present embodiment can be suitably used for manufacturing a high-density package board, particularly for manufacturing a wiring board by a semi-additive method. Additionally, an example of the manufacturing process of a wiring board using a semi-additive method is shown in FIG. 2.

In FIG. 2(a), a substrate (substrate for circuit formation) on which a conductor layer 40 is formed on an insulating layer 50 is prepared. The conductor layer 40 is, for example, a copper layer. In FIG. 2(b), the photosensitive layer 30 and the intermediate layer 20 are formed on the conductor layer 40 of the substrate through the photosensitive layer and intermediate layer forming process. In FIG. 2(c), through the exposure process, actinic light 80 that projects an image of a photomask is irradiated onto the photosensitive layer 30 through the intermediate layer 20, thereby forming the photosensitive layer 30. A photocuring zone is formed. In FIG. 2(d), the resist pattern 32, which is the photocured portion, is formed on the substrate by removing regions other than the photocured portion (including the intermediate layer) formed by the exposure step from the substrate through the development process. . In Fig. 2(e), the plating layer 60 is formed on the conductor layer 40 of the substrate not covered with the resist by plating using the resist pattern 32, which is the photocuring portion, as a mask. In Fig. 2(f), after the resist pattern 32, which is a photocurable portion, is peeled off with a strong alkali aqueous solution, the conductor layer 40 masked by the resist pattern 32 is removed by flash etching, and then etched. A conductor pattern 70 including the plating layer 62 after treatment and the conductor layer 42 after etching treatment is formed. The conductor layer 40 and the plating layer 60 may be made of the same or different materials. When the conductor layer 40 and the plating layer 60 are made of the same material, the conductor layer 40 and the plating layer 60 may be integrated. In addition, although the projection exposure method was explained in FIG. 2, the resist pattern 32 may be formed by using a mask exposure method and a direct drawing exposure method together.

Although preferred embodiments of the present disclosure have been described above, the present disclosure is not limited to the above embodiments in any way.

Example

Hereinafter, the present disclosure will be described in more detail based on examples, but the present disclosure is not limited to the following examples. Additionally, unless specifically stated, “part” and “%” are on a mass basis.

First, the binder polymer (A-1) shown in Tables 2 and 3 below was synthesized according to Synthesis Example 1.

<Synthesis Example 1>

As polymerizable monomers, 125 g of methacrylic acid, 25 g of methyl methacrylate, 125 g of benzyl methacrylate (1), and 225 g of styrene were mixed with 1.5 g of azobisisobutyronitrile to prepare solution a.

Additionally, 1.2 g of azobisisobutyronitrile was dissolved in 100 g of a mixed solution of 60 g of methyl cellosolve and 40 g of toluene (mass ratio 3:2) to prepare solution b.

Meanwhile, 400 g of a mixed solution of methyl cellosolve and toluene (hereinafter also referred to as “mixed solution It was stirred while blowing nitrogen gas and heated to 80°C.

The solution a was added dropwise to the mixed solution x in the flask at a constant dropping rate over 4 hours, and then stirred at 80°C for 2 hours. Next, the solution b was added dropwise to the solution in the flask at a constant dropping rate over 10 minutes, and then the solution in the flask was stirred at 80°C for 3 hours. Additionally, the solution in the flask was heated to 90°C over 30 minutes, kept at 90°C for 2 hours, and then cooled to room temperature to obtain a solution of the binder polymer (A-1). The solution of this binder polymer (A-1) was prepared by adding mixed liquid x so that the non-volatile component (solid content) was 50% by mass.

The weight average molecular weight of the binder polymer (A-1) was 50,000, and the acid value was 163 mgKOH/g. In addition, the acid value was measured by neutralization titration method. Specifically, 30 g of acetone was added to 1 g of the binder polymer solution, and after uniformly dissolving, an appropriate amount of phenolphthalein, an indicator, was added to the binder polymer solution, and titration was performed using a 0.1 N KOH aqueous solution. Measured. The weight average molecular weight was measured by gel permeation chromatography (GPC) and derived by conversion using a standard polystyrene calibration curve. The conditions of GPC are shown below.

-GPC conditions-

Pump: Hitachi L-6000 type (made by Hitachi Seisakusho Co., Ltd.)

Column: 3 total as shown below (Column specification: 10.7mmϕ×300mm, all manufactured by Hitachi Kasei Co., Ltd.)

Gelpack　GL-R420

Gelpack　GL-R430

Gelpack　GL-R440

Eluent: Tetrahydrofuran

Sample concentration: 120 mg of a binder polymer with a solid content of 50% by mass was collected and dissolved in 5 mL of tetrahydrofuran to prepare a sample.

Measurement temperature: 25℃

Flow rate: 2.05mL/min

Detector: Hitachi L-3300 type RI (made by Hitachi Seisakusho Co., Ltd.)

<Preparation of resin composition for forming intermediate layer>

Next, the resin compositions 1 and 2 for intermediate layer formation were obtained by mixing each component shown in Tables 1 and 2 below in the amounts (unit: parts by mass) shown in the tables. In addition, the compounding amounts other than the solvent and organic solvent in Table 1 and Table 2 are all compounding amounts in solid content.

<Preparation of photosensitive resin composition>

Next, a photosensitive resin composition was obtained by mixing each component shown in Table 3 below in the amount (unit: mass part) shown in the table. In addition, the compounding amounts other than the organic solvent in Table 3 are all compounding amounts in solid content.

The details of each component in Tables 1 to 3 are as follows.

*1: Polyvinyl alcohol, PVA-205 (made by Kuraray Co., Ltd., degree of saponification = 80 mol%)

*2: Polyvinyl pyrrolidone K-30 (made by Nippon Shokubai Co., Ltd.)

*3: Polyflow KL-401 (made by Kyoeisha Chemical Co., Ltd.)

(A) Ingredient: Binder polymer

*4: (A-1) (binder polymer (A-1) obtained in Synthesis Example 1)

Methacrylic acid/methyl methacrylate/benzyl methacrylate/styrene=25/5/25/45 (mass ratio), weight average molecular weight=50,000, solid content=50% by mass, methyl cellosolve/toluene=3/2( mass ratio) solution

(B) Component: Photopolymerizable compound having an ethylenically unsaturated bond

*5: FA-321M (made by Hitachi Kasei Co., Ltd.)

2,2-bis(4-(methacryloxypentaethoxy)phenyl)propane

*6: FA-024M (made by Hitachi Kasei Co., Ltd.)

EOPO modified dimethacrylate

*7: BP-2EM (made by Kyoeisha Chemical Co., Ltd.)

2,2-bis(4-(methacryloxypolyethoxy)phenyl)propane

*8: BPE-80N (manufactured by Shinnakamura Kagaku Kogyo Co., Ltd.)

2,2-bis(4-(methacryloxypolyethoxy)phenyl)propane

*9: DPEA-12 (made by Nippon Kayaku Co., Ltd.)

Ethylene oxide modified dipentaerythritol hexaacrylate

(C) Component: Photopolymerization initiator

*10: B-CIM (made by Hodogaya Kagaku Kogyo Co., Ltd.)

2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole

(D) Ingredient: Photosensitizer

*11: EAB (made by Hodogaya Kagaku Kogyo Co., Ltd.)

4,4'-bis(diethylamino)benzophenone

(E) Ingredient: Polymerization inhibitor

*12: TBC (made by DIC Corporation)

4-tert-butylcatechol

[Examples 1 to 14 and Comparative Examples 1 to 4]

＜Production of photosensitive elements＞

As a support film for the photosensitive element, PET films shown in Tables 4 to 6 below were prepared. The results of measuring the number of particles with a diameter of 5 μm or more contained in each PET film are shown in Tables 4 to 6 below. Additionally, all PET films are transparent.

The number of particles with a diameter of 5 μm or more was determined by observing both sides of the support film with a polarizing microscope, measuring the number of particles with a diameter of 5 μm or more, and adding up the numbers. In addition, in this observation, the observation was focused on the surface of one side and the other side of the support film. In addition, the number n of the measurement area (size of 1 mm angle) of the support film was set to 10, and the average value was obtained.

(Production of the middle layer)

When the density of particles (lubricant) is different on both sides of the PET film, the intermediate layer 1 or 2 was formed on the side of the PET film with less lubricant using the resin composition 1 or 2 for forming the intermediate layer.

When forming the intermediate layer 1 using the intermediate layer forming resin composition 1, each component of the intermediate layer forming resin composition 1 other than water was slowly added to room temperature water, and after addition, the entire amount was heated to 90°C. After reaching 90°C, it was stirred for 1 hour and cooled to room temperature. Next, resin composition 1 for intermediate layer formation is applied to the PET film (support film) so that the thickness is uniform, and dried in a hot air convection dryer at 95°C for 10 minutes to form intermediate layer 1 with a thickness of 5 μm after drying. did.

When forming the intermediate layer 2 using the intermediate layer forming resin composition 2, the intermediate layer forming resin composition 2 (acrylic resin composition) is applied on the support film so that the thickness is uniform, and then dried in a hot air convection dryer at 100°C. It was dried for 10 minutes to form intermediate layer 2 with a thickness of 5 μm after drying.

(Production of photosensitive layer)

Next, the photosensitive resin composition was applied onto the middle layer of the support film to have a uniform thickness, and dried in a hot air convection dryer at 100°C for 10 minutes to form a photosensitive layer with a thickness of 10 μm after drying. Hereinafter, the photosensitive layer formed using photosensitive resin composition 1 is also referred to as photosensitive layer 1, and the photosensitive layer formed using photosensitive resin composition 2 is also referred to as photosensitive layer 2.

Next, a polyethylene film (protective layer) (manufactured by Tama Poly Co., Ltd., "NF-15") is bonded on this photosensitive layer, and a PET film (support film), an intermediate layer, and a photosensitive layer are formed. And, a photosensitive element with protective layers laminated in this order was obtained. In addition, in the case of Example 1 in Table 4 below, intermediate layer 1 was formed on QS63 (support film) using resin composition 1 for intermediate layer formation, and then photosensitive resin composition 1 was used on intermediate layer 1. This means that photosensitive layer 1 was formed.

＜Production of laminate＞

The copper surface of a copper-clad laminate (substrate, manufactured by Hitachi Kasei Co., Ltd., "MCL-E-67"), which is a glass epoxy material with 12㎛ thick copper foil laminated on both sides, was treated with acid and washed with water, then washed with air. It was dry. The copper-clad laminate was heated to 80°C, and while the protective layer was peeled off, each of the photosensitive elements was pressed to the copper-clad laminate so that the photosensitive layer was in contact with the copper surface. Compression was performed using a heat roll at 110°C, at a pressure of 0.40 MPa and at a roll speed of 1.0 m/min. In this way, a laminate was obtained in which the substrate, photosensitive layer, intermediate layer, and support film were laminated in that order. These laminates were used as test pieces in the tests shown below. As a laminator, HLM-3000 (manufactured by Taisei Laminator Co., Ltd.) was used.

<Evaluation of laminate>

The support film is peeled from the laminate, and a concave portion with a diameter of 3 μm or more (hereinafter also referred to as an “intermediate layer concave portion”) on the side opposite to the photosensitive layer side of the intermediate layer is examined using a scanning electron microscope SU-1500. Observation was made using (manufactured by Hitachi Seisakusho Co., Ltd.). The number n of measurement areas (size of 1 mm square) of the middle layer was set to 10, the average value was obtained, and evaluation was made according to the following criteria. The results are shown in Tables 4 to 6 below.

A: The number of concave parts with a diameter of 3 μm or more is less than 5.

B: The number of recesses with a diameter of 3 μm or more is 5 to 30.

C: The number of recesses with a diameter of 3 μm or more exceeds 30.

＜Light sensitivity measurement test＞

The support film was peeled off from the test piece, a Hitachi 41-stage tablet was placed on the middle layer of the test piece, and a projection exposure machine (manufactured by Ushio Denki Co., Ltd., “UX-2240SM-)” equipped with a high-pressure mercury lamp with a wavelength of 365 nm was used. XJ01", NA: 0.063) and adjusting the irradiation amount to obtain a predetermined amount of irradiation energy (exposure amount) at which the number of steps (number of resist curing steps) of the resist pattern after development becomes 7, the photosensitive layer is exposed through the middle layer. exposed.

Next, using a 1% by mass aqueous sodium carbonate solution at 30°C, the photosensitive layer was spray developed for twice the shortest developing time, and the unexposed portion was removed. Here, when the middle layer was water-soluble (in the case of middle layer 1), the photosensitive layer was developed after washing with water. In addition, when the middle layer had solubility in the developer (in the case of middle layer 2), the middle layer was removed along with the unexposed portion by development. In addition, the shortest development time was determined by measuring the time for the unexposed portion to be completely removed by the development process described above.

After that, the number of steps of the resist pattern (photocured portion) formed on the substrate at each exposure dose was measured. Next, a calibration curve between the exposure amount and the number of steps was created, and the exposure amount (unit: mJ/cm ² ) at which the number of step steps was 7 was determined, and it was set as the photosensitivity of the photosensitive resin composition. The results are shown in Tables 4 to 6 below. The smaller the value of this exposure amount, the better the photosensitivity.

＜Resolution measurement test＞

The support film is peeled from the test piece, and a wiring pattern with a line width/space width of z/z (z=2 to 20 (varying at 1 μm intervals)) (unit: μm) is placed on the middle layer of the test piece as a resolution evaluation pattern. A glass mask having a , a projection exposure machine (Ushio Denki Co., Ltd., "UX-2240SM-XJ01") having a high-pressure mercury lamp with a wavelength of 365 nm was used, and the number of remaining steps after development on a Hitachi 41-step tablet was 7. The photosensitive layer was exposed through the intermediate layer with a sufficient amount of irradiation energy. After exposure, the same development process as the above photosensitivity measurement test was performed. After development, the resist pattern was observed using an optical microscope. Among the space widths between line portions (exposed portions) from which unexposed portions were neatly removed through development, the smallest value (unit: ㎛) was considered an index for resolution evaluation. Additionally, the smaller this value, the better the resolution. The results are shown in Tables 4 to 6 below.

＜Evaluation of omissions in register patterns＞

Among the resist patterns obtained in the above resolution measurement test, 15 resist patterns with a line width of 10 μm (the length perpendicular to the line width is 1 mm) were examined using a scanning electron microscope SU-1500 (made by Hitachi Seisakusho Co., Ltd.). It was used, observed, and evaluated based on the following standards. The results are shown in Tables 4 to 6 below. Additionally, the SEM photograph of the resist pattern obtained in Example 3 is shown in FIG. 3, and the SEM photograph of the resist pattern obtained in Comparative Example 1 is shown in FIG. 4.

A: The formed resist pattern has less than 5 minor omissions of 3 ㎛ or more in diameter.

B: The formed resist pattern has 5 to 20 minor omissions with a diameter of 3 ㎛ or more.

C: The formed resist pattern has 20 or more minute omissions with a diameter of 3 μm or more.

Details of the support films in Tables 4 to 6 are as follows.

QS63: Biaxially oriented PET film with a three-layer structure that has a lubricant layer on one side and a lubricant layer on the other side, but contains a very small number of lubricants (made by Toray Corporation, on the side in contact with the middle layer) Number of particles with a diameter of 5 ㎛ or more (hereinafter simply referred to as “particle number on the middle layer surface”): 1 piece/mm ² or less, surface roughness Rz on the surface in contact with the middle layer: 66 nm)

A1517: Biaxially oriented PET film with a two-layer structure having a lubricant layer on one side (manufactured by Toyobo Seki Co., Ltd., number of particles on the middle layer side: 10 pieces/mm ² or less, surface roughness on the side in contact with the middle layer) Rz：35nm)

A4100: Biaxially oriented PET film with a two-layer structure having a lubricant layer on one side (manufactured by Toyobo Seki Co., Ltd., number of particles on the middle layer side: 10 pieces/mm ² or less, surface roughness on the side in contact with the middle layer) Rz：35nm)

G2H: Biaxially oriented PET film with a single-layer structure (lubricant mixing type) containing a lubricant (manufactured by Teijin DuPont Film Co., Ltd., number of particles on the middle layer: exceeding 10 pieces/mm ² ; on the side in contact with the middle layer) Surface roughness Rz：920nm)

HPE: Biaxially oriented PET film with a three-layer structure having a lubricant layer on the front and back (manufactured by Teijin DuPont Film Co., Ltd., number of particles on the middle layer: exceeding 10 pieces/mm ² ; on the side in contact with the middle layer) surface roughness Rz: 700nm)

KFX: Biaxially oriented PET film with a two-layer structure having a lubricant layer on one side (manufactured by Teijin DuPont Film Co., Ltd., number of particles on the middle layer: 10 pieces/mm ² or less, surface on the side in contact with the middle layer) Roughness Rz：50nm)

In Examples 1 to 14, when exposure was performed using a high-resolution projection exposure machine under conditions with a low energy amount and the number of remaining steps was 7, there were few minor omissions in the resist pattern, and Comparative Examples 1 to 4 In , it was confirmed that many minor omissions occurred in the register pattern.

Additionally, when exposure was performed using a projection exposure machine under conditions where the number of remaining steps was 11, there was a slight omission in the register pattern compared to the above evaluation (when exposure was performed under conditions where the number of remaining steps was 7). The number of occurrences has decreased. Additionally, even when exposure was performed using the mask exposure method or the LDI exposure method instead of the projection exposure method under the condition that the number of remaining steps was 7, the number of small omissions in the register pattern decreased compared to the above evaluation. .

Industrial applicability

According to the present disclosure, it is possible to provide a photosensitive element capable of forming a resist pattern with few microscopic omissions, a laminate, a method of forming a resist pattern, and a method of manufacturing a printed wiring board.

One… Photosensitive element, 2… Support film, 3, 20… Middle layer, 4, 30… Photosensitive layer, 5… Protective layer, 32… Register pattern, 40… Conductor layer, 42... Conductor layer after etching treatment, 50... Insulating layer, 60... Plating layer, 62... Plating layer after etching treatment, 70... Conductor pattern, 80… active rays.

Claims (19)

A photosensitive element comprising a support film, an intermediate layer, and a photosensitive layer in this order, wherein the support film has a thickness of 20 μm or more, and the number of particles with a diameter of 5 μm or more contained in the support film is 30 particles/mm ² or less. ,
A photosensitive element wherein the number of particles with a diameter of 2 μm or more and less than 5 μm contained in the support film is 1000 particles/mm ² or less. In claim 1,
A photosensitive element, wherein the support film has a thickness of 25 μm or more. In claim 1,
A photosensitive element, wherein the support film has a thickness of 45 μm or more. In claim 1,
A photosensitive element wherein the number of particles with a diameter of 5 μm or more contained in the support film is 25 particles/mm ² or less. In claim 1,
A photosensitive element wherein the number of particles with a diameter of 5 μm or more contained in the support film is 20 particles/mm ² or less. In claim 1,
A photosensitive element in which a particle-free layer is present in the support film. In claim 6,
A photosensitive element, wherein the layer without the particles has a thickness of 17 μm or more. In claim 1,
A photosensitive element wherein the surface roughness Rz of the surface in contact with the intermediate layer of the support film is 1 nm or more and 500 nm or less. In claim 1,
A photosensitive element wherein the number of particles with a diameter of 5 μm or more on the surface in contact with the intermediate layer of the support film is 10 particles/mm ² or less. In claim 1,
A photosensitive element in which the intermediate layer contains at least one selected from the group consisting of polyvinyl alcohol and polyvinylpyrrolidone. In claim 10,
A photosensitive element wherein the polyvinyl alcohol has an average degree of polymerization of 300 to 3500. In claim 10,
A photosensitive element wherein the polyvinylpyrrolidone has an average degree of polymerization of 10,000 to 100,000. In claim 1,
A photosensitive element wherein the intermediate layer contains a binder polymer or a photopolymerizable compound. In claim 1,
A photosensitive element wherein the thickness of the intermediate layer is 1.0 μm or more and 12 μm or less. In claim 1,
A photosensitive element wherein the support film is a polyester film. In claim 1,
A photosensitive element used for exposure by a high-resolution exposure machine with a lens numerical aperture of 0.05 or more. A step of arranging the photosensitive layer, the intermediate layer, and the support film in this order on a substrate using the photosensitive element according to any one of claims 1 to 16;
removing the support film and exposing the photosensitive layer to actinic light through the intermediate layer;
A process of removing the uncured portion of the photosensitive layer and the intermediate layer from the substrate
A method of forming a register pattern, comprising: In claim 17,
A method of forming a resist pattern in which the exposure is performed using a high-resolution exposure machine with a lens numerical aperture of 0.05 or more. A method of manufacturing a printed wiring board, comprising the step of forming a conductor pattern by etching or plating a substrate on which a resist pattern is formed by the resist pattern formation method according to claim 17.