KR20230166373A - TRANSPARENT SUBSTRATE WITH A MULTILAYER THIN FILM coating AND MULTYPLE GLAZING UNIT COMPRISING THE SAME - Google Patents

Abstract

In the transparent substrate provided with a thin film multilayer coating according to an embodiment of the present invention, the thin film multilayer coating includes a lower anti-reflection film, a lower metal protective layer, and a metal function with an infrared reflection function sequentially laminated on the transparent substrate. layer, an upper metal protective layer, an upper anti-reflection film, and an overcoat layer, wherein the overcoat layer includes yttrium oxide or a mixture of yttrium oxide and a metal oxide represented by the following formula (1).
[Formula 1]
(Y ₂ O ₃ ) _x (A) _y-
Here, 0.75≤x≤1, 0≤y≤0.25, x+y=1,
A may be one or more selected from titanium oxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), and zirconium-doped titanium oxide (TiZrO _x ).

Description

Transparent substrate with thin film multilayer coating and multiple glazing unit including same {TRANSPARENT SUBSTRATE WITH A MULTILAYER THIN FILM coating AND MULTYPLE GLAZING UNIT COMPRISING THE SAME}

It relates to a transparent substrate provided with a thin film multilayer coating and a multi-glazing unit including the same. Specifically, it relates to a transparent substrate provided with a thin multilayer coating including an overcoat layer with improved scratch resistance and a multiple glazing unit including the same.

Low-emissivity glass is glass in which a low-emissivity layer containing a metal with high reflectivity in the infrared region, such as silver (Ag), is deposited as a thin film. This low-emission glass is a functional material that reflects radiation in the infrared range, blocking solar radiant heat from outdoors to indoors in summer and conserving heating radiant heat from indoors to outdoors in winter, resulting in energy savings in buildings. Emissivity in glass refers to the degree to which the glass reflects long-wavelength (2,500 to 40,000 nm) infrared energy. The lower the emissivity, the better the reflection, and the more infrared energy is reflected. This reduces the movement of heat, lowers the thermal transmittance value, and increases the insulation effect. For example, regular uncoated glass has an emissivity of about 0.84, but the more it is coated, the lower the emissivity becomes. Glass with a low emissivity coating layer may have an emissivity of, for example, 0.10. If the emissivity is low, the shielding coefficient is also low.

On the other hand, coatings on low-emission glass typically consist of several layers, including a layer of dielectric material. When these coatings are deposited on a transparent substrate (glass substrate), they reduce light reflection and increase transmission, improving the visibility of objects behind the substrate.

In the case of such low-emissivity glass, it is manufactured by stacking multiple layers of thin films through a sputtering process. In addition, low-emissivity glass maximizes insulation performance through a double-layer glass process, but at this time, the multi-layer thin film can react with moisture in the atmosphere due to the time difference from production to double-layer processing. To minimize this, an overcoat layer is deposited on the top of the multilayer thin film. This overcoat layer also serves to prevent the multi-layer thin film from being damaged by brushes used in processes such as cleaning. That is, in order to protect the multilayer thin film from external stimuli, etc., an overcoat layer is deposited on the top of the thin film multilayer coating. The characteristics of the overcoat layer required to perform this role include high scratch resistance, low coefficient of friction, and low light absorption. However, in the case of the conventionally used overcoat layer, it did not show excellent scratch resistance properties while satisfying the light absorption characteristics. Therefore, an overcoat layer that has better scratch resistance properties and can be appropriately applied to thin multilayer coating of low-emissivity glass is required. It is becoming.

The present invention is intended to solve this problem, and is intended to provide a transparent substrate including a multi-layer thin film coating that has excellent scratch resistance and at the same time can maintain excellent light absorption properties, and a multiple glazing unit including the same.

However, the problems to be solved by the embodiments of the present invention are not limited to the above-mentioned problems and can be expanded in various ways within the scope of the technical idea included in the present invention.

In the transparent substrate provided with a thin film multilayer coating according to an embodiment of the present invention, the thin film multilayer coating includes a lower anti-reflection film, a lower metal protective layer, and a metal function with an infrared reflection function sequentially laminated on the transparent substrate. layer, an upper metal protective layer, an upper anti-reflection film, and an overcoat layer, wherein the overcoat layer includes yttrium oxide or a mixture of yttrium oxide and a metal oxide represented by the following formula (1).

[Formula 1]

(Y ₂ O ₃ ) _x (A) _y-

Here, 0.75≤x≤1, 0≤y≤0.25, x+y=1,

A may be one or more selected from titanium oxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), and zirconium-doped titanium oxide (TiZrO _x ).

The thickness of the overcoat layer may be 2 nm to 5 nm.

The thickness of the overcoat layer may be 2.9 nm to 3.5 nm.

In Formula 1, A may be zirconium oxide.

The thickness of the metal functional layer may be 7nm to 18nm.

The upper metal protective layer and the lower metal protective layer may each include one or more of titanium, nickel, chromium, and niobium, or an alloy thereof.

The upper metal protective layer and the lower metal protective layer may each include a nickel-chromium alloy.

The upper anti-reflection film and the lower anti-reflection film may include silicon nitride.

The lower anti-reflective film and the upper anti-reflective film may further include one or more nitrides, oxides, or oxynitrides selected from titanium (Ti), hafnium (Hf), zirconium (Zr), and aluminum (Al), respectively. .

The thickness of the lower anti-reflection film may be 30 nm to 45 nm, and the thickness of the upper anti-reflection film may be 35 nm to 50 nm.

The lower anti-reflective film may be thicker than the upper anti-reflective film.

The light absorption rate of the overcoat layer in the 550 nm wavelength range may be less than 2.3%.

A multiple glazing unit according to an embodiment of the present invention is a multiple glazing unit including two or more transparent substrates spaced apart from each other with a spacer in between, and at least one of the two or more transparent substrates is provided with the thin film multilayer coating described above. It is a transparent substrate.

According to one embodiment of the present invention, it is possible to provide an overcoat layer that has excellent scratch resistance and can also maintain excellent light absorption properties.

Figure 1 is a cross-sectional view of a transparent substrate provided with a thin film multilayer coating according to an embodiment of the present invention.
Figure 2 is a cross-sectional view of a multiple glazing unit according to an embodiment of the present invention.

Terms such as first, second, and third are used to describe, but are not limited to, various parts, components, regions, layers, and/or sections. These terms are used only to distinguish one part, component, region, layer or section from another part, component, region, layer or section. Accordingly, the first part, component, region, layer or section described below may be referred to as the second part, component, region, layer or section without departing from the scope of the present invention.

The terminology used herein is only intended to refer to specific embodiments and is not intended to limit the invention. As used herein, singular forms include plural forms unless phrases clearly indicate the contrary. As used in the specification, the meaning of "comprising" refers to specifying a particular characteristic, area, integer, step, operation, element and/or ingredient, and the presence or presence of another characteristic, area, integer, step, operation, element and/or ingredient. This does not exclude addition.

When a part is referred to as being “on” or “on” another part, it may be directly on or on the other part or may be accompanied by another part in between. In contrast, when a part is said to be "directly on top" of another part, there is no intervening part between them.

Although not defined differently, all terms including technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art in the technical field to which the present invention pertains. Terms defined in commonly used dictionaries are further interpreted as having meanings consistent with related technical literature and currently disclosed content, and are not interpreted in ideal or very formal meanings unless defined.

In the present invention, the terms “emissivity” and “transmittance” are used as commonly known in the art. “Emissivity” is a measure of how much light at a given wavelength is absorbed or reflected. Generally, the following equation is satisfied.

(emissivity) = 1 - (reflectance)

For construction purposes, the emissivity value of approximately 2500 to 50000 nm in the infrared spectrum is important.

As used herein, the term “transmittance” means visible light transmittance.

Although not defined differently, all terms including technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art in the technical field to which the present invention pertains. Terms defined in commonly used dictionaries are further interpreted as having meanings consistent with related technical literature and currently disclosed content, and are not interpreted in ideal or very formal meanings unless defined.

Hereinafter, embodiments of the present invention will be described in detail so that those skilled in the art can easily implement the present invention. However, the present invention may be implemented in many different forms and is not limited to the embodiments described herein.

Figure 1 is a cross-sectional view of a transparent substrate 100 provided with a thin film multilayer coating according to an embodiment of the present invention. The transparent substrate 100 equipped with a thin film multilayer coating in FIG. 1 is merely for illustrating the present invention, and the present invention is not limited thereto. Therefore, the transparent substrate 100 equipped with the thin film multilayer coating of FIG. 1 can be modified into various forms.

Referring to FIG. 1, a transparent substrate 100 equipped with a thin film multilayer coating according to an embodiment of the present invention includes a transparent substrate 110 and a thin film multilayer coating 120 formed on the transparent substrate 110. .

The transparent substrate 110 is not particularly limited, but is preferably made of a hard inorganic material such as glass or a polymer-based organic material.

The thin film multilayer coating 120 is sequentially formed from the transparent substrate 110, a lower anti-reflection film 20, a lower metal protective layer 30, a metal functional layer with an infrared reflection function 40, and an upper metal protective layer 50. ), an upper anti-reflection film 60, and an overcoat layer 70.

The lower anti-reflection film 20 and the upper anti-reflection film 60 each include at least one dielectric layer. The dielectric layer may include metal oxide, metal nitride, or metal oxynitride. The metal may include one or more of titanium (Ti), hafnium (Hf), zirconium (Zr), zinc (Zn), indium (In), tin (Sn), and silicon (Si).

The lower anti-reflection film 20 may be a single layer or may be formed as a laminate of two or more layers. At this time, in the case of a laminate of two or more layers, for example, each layer may contain silicon nitride (Si ₃ N ₄ ), and zirconium, etc. may be doped at different concentrations in each layer. The thickness of the lower anti-reflection film 20 may be 30 nm to 45 nm.

The upper anti-reflection film 60 may include silicon nitride (Si ₃ N ₄ ). In addition, as shown in FIG. 1, it may be formed as a single layer, or may be a laminate of two or more layers, but is not particularly limited. In addition, the upper anti-reflection film 60 may be formed directly on the upper metal protective layer 50 by directly contacting the upper metal protective layer 50. The thickness of the upper anti-reflection film 60 may be 30 nm or more, and more specifically, may be 35 nm to 50 nm.

Additionally, the lower anti-reflection film 20 and the upper anti-reflection film 60 may be additionally doped with aluminum or the like. By doping aluminum, the dielectric layer can be smoothly formed during the manufacturing process. In addition, in addition to zirconium and aluminum, various doping agents such as fluorine, carbon, nitrogen, boron, and phosphorus can be used to improve not only the optical properties of the film but also the formation speed of the dielectric layer by sputtering.

The metal functional layer 40 has infrared (IR) reflection characteristics. The metal functional layer 40 may include one or more of gold (Ag), copper (Cu), palladium (Pd), aluminum (Al), and silver (Ag). Specifically, it may include silver or silver alloy. Silver alloys may include silver-gold alloys and silver-palladium alloys. The thickness of the metal functional layer 40 may be 7 nm to 18 nm. If the thickness is too thin, the solar heat gain coefficient (SHGC) may increase. If the thickness is too thick, the color coordinates of the transparent color may move away from blue.

It includes a lower metal protective layer 30 and an upper metal protective layer 50 formed on the lower and upper surfaces of the metal functional layer 40, respectively. That is, the lower metal protection layer 30 located between the lower anti-reflection film 20 and the metal functional layer 40, and the upper metal protection layer located between the upper anti-reflection film 60 and the metal functional layer 40. It includes layer 30. The lower metal protective layer 30 and the upper metal protective layer 50 can prevent the metal functional layer 40 from being oxidized and corroded.

For this reason, in order to maximize the anti-oxidation effect, the thickness of the lower metal protective layer 30 and the upper metal protective layer 50 may be thickened. However, in this case, the transmittance of the transparent substrate 100 with the thin multilayer coating is reduced. This is undesirable because it decreases and the emissivity increases. Accordingly, in one embodiment of the present invention, the sum of the thicknesses of the lower metal protective layer 30 and the upper metal protective layer 50 is 0.6 nm to 2.25 nm. If the sum of the thicknesses of the lower metal protective layer 30 and the upper metal protective layer 50 is less than 0.6 nm, it is difficult to prevent corrosion of the metal functional layer 70, and if it exceeds 2.25 nm, the transmittance is lowered and the emissivity is lowered. As this increases, the properties as a transparent substrate deteriorate, which is not desirable.

Additionally, in one embodiment of the present invention, the thickness of the lower metal protective layer 30 is thicker than the thickness of the upper metal protective layer 50. By making the thickness of the lower metal protective layer 30 thicker than the thickness of the upper metal protective layer 50, durability, especially chemical durability, can be further increased. In the transparent substrate 100 on which the thin film multilayer coating 120 is formed, stress is applied to the upper anti-reflection film 60 located at the top, and as a result, the peeling of the thin film multilayer coating 120 is mainly caused by the lower part of the laminated structure. That is, it occurs on the side close to the transparent substrate 110. In one embodiment of the present invention, by making the thickness of the lower metal protective layer 30 thicker than the thickness of the upper metal protective layer 50, corrosion and peeling that may occur on the side close to the transparent substrate 110 are prevented. This can be effectively prevented, and thus better durability can be obtained compared to the case where the total thickness of the lower metal protective layer 30 and the upper metal protective layer 30 is the same. As a result, it is possible to obtain a thin film multilayer coating 120 with improved durability by achieving low emissivity performance, that is, low emissivity and high transmittance, and at the same time suppressing corrosion and peeling.

The thickness of the lower metal protective layer 30 may be 0.5 nm to 1.3 nm, and the thickness of the upper metal protective layer 50 may be 0.2 nm to 0.6 nm. The thickness ratio of the lower metal protective layer 30 to the total thickness of the lower metal protective layer 30 and the upper metal protective layer 50 may be greater than 0.5 and less than 1. Preferably, it may be greater than 0.6 and less than 0.8.

The lower metal protective layer 30 and the upper metal protective layer 50 may each include one or more of titanium, nickel, chromium, and niobium. More specifically, it may include a nickel-chromium alloy.

Additionally, the outermost layer of the thin film multilayer coating 120 includes an overcoat layer 70. That is, the overcoat layer 70 is included on the top of the upper metal protective layer 50, that is, on one side away from the transparent substrate 110.

In one embodiment of the present invention, the overcoat layer 7 has the following formula:

It includes yttrium oxide or yttria-stabilized zirconia represented by Formula 1.

[Formula 1]

(Y ₂ O ₃ ) _x (A) _y-

Here, 0.75≤x≤1, 0≤y≤0.25, x+y=1,

A may be one or more selected from titanium oxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), and zirconium-doped titanium oxide (TiZrO _x ). More preferably, it may be zirconium oxide.

The overcoat layer 70 is a layer disposed at the top of low-emissivity glass, and must have a thin thickness and be resistant to scratches. To this end, in this embodiment, it is characterized by containing more than 75 mol% of yttrium oxide. That is, it includes yttria-stabilized zirconia or yttrium oxide in which the proportion of yttrium oxide is 75 mol% or more. By including the overcoat layer 70 with a high proportion of yttrium oxide in this way, excellent physical durability can be achieved even at a thin thickness, and furthermore, the light absorption properties are also equal to or better than those of materials used as conventional overcoat layers. Better characteristics than that can be obtained. If the proportion of yttrium oxide is less than 75 mol%, scratch resistance may become poor. In other words, when the proportion of yttrium oxide is less than 75 mol%, the surface contact angle becomes small. As the surface contact angle decreases, the friction coefficient on the layer surface tends to increase, and as the friction coefficient increases, the scratch resistance becomes poor. , is not desirable.

The thickness of the overcoat layer 70 may be 2 nm to 5 nm, and more preferably 2.9 nm to 3.5 nm. If the thickness of the overcoat layer 70 is less than 2 nm, it may not have sufficient scratch resistance, making it difficult to protect the layers included in the thin film multilayer coating 120, and if it exceeds 5 nm, the amount of light absorption increases, resulting in low-emissivity glass. It is not desirable because it cannot be used appropriately for this purpose.

The overcoat layer 70 of this configuration has excellent scratch resistance and can more reliably protect the layers included in the thin film multilayer coating from the outside. In addition, while having such scratch resistance, the amount of light absorption is low, making it suitable for low-emission glass. It is possible to use it appropriately. In particular, the light absorption rate can be measured by forming only the overcoat layer 70 on 5 mm glass, and can be obtained from the following equation after measuring the transmittance and reflectance of the coated surface in the corresponding configuration.

Light absorption rate (%) = 100 - Transmittance (%) - Coating surface reflectance (%)

The overcoat layer 70 of this embodiment may be less than 2.3% in the wavelength band of 550 nm.

Figure 2 is a cross-sectional view of a multiple glazing unit 200 according to an embodiment of the present invention.

The multiple glazing unit 200 in FIG. 2 is merely for illustrating the present invention, and the present invention is not limited thereto. Therefore, the multiple glazing unit 200 of FIG. 2 can be modified into various forms.

As shown in Figure 2, the multiple glazing unit 200 according to an embodiment of the present invention is a multiple glazing unit 200 including two or more transparent substrates 110 and 140 spaced apart from each other, and two or more At least one of the transparent substrates is the transparent substrate 100 provided with the thin film multilayer coating 120 described above. The multiple glazing unit 200 includes two or more transparent substrates held by spacers 150, and one or more gas separation interfaces 130 are disposed between the two substrates. In Figure 2, the transparent substrate 140 other than the transparent substrate 100 provided with the thin film multilayer coating 120 is shown as having no separate thin film formed. However, in addition to this, the same thin film multilayer coating 120 is shown on the top, bottom, or It can be formed on both sides, and it is also possible for a different thin film to be formed.

In the case of the multiple glazing unit 200 according to an embodiment of the present invention, as described above, since it includes an overcoat layer 70 with improved scratch resistance in the thin film multilayer coating 120, the multiple glazing unit ( It is possible to more reliably prevent the layers included in the thin film multilayer coating 120 from being damaged during the process until completion of 200), and thus more improved durability and excellent optical properties can be achieved.

Hereinafter, the present invention will be described in more detail through experimental examples. However, these experimental examples are only for illustrating the present invention, and the present invention is not limited thereto.

Experiment example

-Manufacturing example

The transparent substrate was laminated on the transparent substrate in the following order: lower anti-reflection film/lower metal protective layer/metal functional layer/upper metal protective layer/upper anti-reflection film to form a transparent substrate with a thin film multilayer coating.

A 5 mm thick glass substrate (Product name: Hanlight Clear, manufactured by Korea Glass Industry Co., Ltd.) was used as a transparent substrate. As the lower anti-reflection film, a Si ₃ N ₄ layer was formed to a thickness of 42 nm, as a lower metal protective layer, a NiCr layer was formed to a thickness of 1.3 nm, as a metal functional layer, an Ag layer was formed to a thickness of 8 nm, and the upper metal As a protective layer, a NiCr layer was formed to a thickness of 0.6 nm, and as an upper anti-reflection film, a Si ₃ N ₄ layer was formed to a thickness of 40 nm. On the upper anti-reflection film, an overcoat layer was formed with a thickness of 3.5 nm using different materials, as shown in Table 1 below.

ingredient Comparative Example 1 TiZrO _x Comparative Example 2 (Y ₂ O ₃ ) _0.05 (ZrO ₂ ) _0.95 Comparative Example 3 (Y ₂ O ₃ ) _0.15 (ZrO ₂ ) _0.85 Comparative Example 4 (Y ₂ O ₃ ) _0.35 (ZrO ₂ ) _0.65 Comparative Example 5 (Y ₂ O ₃ ) _0.5 (ZrO ₂ ) _0.5 Example 1 (Y ₂ O ₃ ) _0.75 (ZrO ₂ ) _0.25 Example 2 Y ₂ O ₃

-Evaluation 1: Scratch resistance evaluation

In order to evaluate the physical durability of transparent substrates equipped with thin multilayer coatings of Examples and Comparative Examples having the laminated structure shown in Table 1, scratch resistance was tested using Scratch hardness tester 413 (manufactured by Erichsen). That is, after fixing the transparent substrate to the rotating plate, a test (EST scratch test) was conducted in which a circular scratch was artificially applied by applying force to the scratch tip using a load bar. At this time, the test was performed before heat treatment, then heat treated at 650°C for 10 minutes, cooled slowly, and then tested again (test after heat treatment). During the EST scratch test, the applied force was varied from 0.8N to 10N, and the force value when the first scratch was observed with the naked eye was defined as the scratch threshold force. In other words, the lower the scratch boundary value, the lower the scratch resistance, and the higher the scratch boundary value, the better the scratch resistance. The results are shown in Table 2 below.

Scratch boundary value before heat treatment (N) Scratch boundary value after heat treatment (N) Comparative Example 1 3 0.8 Comparative Example 2 7 0.8 Comparative Example 3 5 3 Comparative Example 4 9 0.8 Comparative Example 5 3 0.8 Example 1 5 One Example 2 10 9

As shown in Table 2, it was confirmed that Examples 1 and 2, in which the overcoat layer was formed by including 25 mol% or more of yttrium oxide, exhibited excellent scratch resistance both before and after heat treatment. -Evaluation 2: Same. Scratch boundary value evaluation when thickness

However, in the above evaluation, the thickness of the overcoat layer was deposited at the same 3.5 nm, but the thin film growth rate, which varies depending on the change in the yttrium oxide ratio (x value) in the material forming the overcoat layer, is As a result value that was not taken into account, the thickness of the final layer obtained was different. Therefore, in order to obtain the value when the thickness was the same, the thickness of the deposited thin film was measured with an atomic force microscope, and the scratch boundary value was corrected with the corresponding value. . The results are shown in Table 3 below.

Atomic force microscopy measurement thickness (nm) Scratch boundary value before heat treatment (N) Scratch boundary value after heat treatment (N) Scratch threshold before heat treatment/atomic force microscope measured thickness (N/nm) Scratch boundary value after heat treatment/atomic force microscope measured thickness (N/nm) Comparative Example 1 3.5 3 0.8 0.857 0.229 Comparative Example 2 12.85 7 0.8 0.545 0.062 Comparative Example 3 10.9 5 3 0.459 0.275 Comparative Example 4 8.64 9 0.8 1.042 0.093 Comparative Example 5 3.55 3 0.8 0.845 0.225 Example 1 3.02 5 One 1.656 0.331 Example 2 2.95 10 9 3.390 3.051

As shown in Table 3, even when corrected by the thickness value, the scratch resistance was poor in the comparative example, but in the case of Examples 1 and 2 of the present invention, it was confirmed that the scratch resistance was excellent.

-Evaluation 3: Measurement of surface contact angle

The surface contact angle of the overcoat layer is related to the stability of surface energy, and the more stable the surface energy, the higher the surface contact angle. Experimentally, as the friction coefficient tends to decrease as the surface contact angle increases, an experiment was conducted to measure the surface contact angle as an indicator instead of the friction coefficient. At this time, as the coefficient of friction decreases, the creation of scratches is suppressed and scratch resistance can be improved.

The surface contact angle was measured for the transparent substrates of Examples 1 and 2 and Comparative Examples 1 to 5 obtained in the preparation example. The surface contact angle was measured using Mouse-X from Surfacetech, and the values were measured before and after heat treatment in the same manner as in Evaluation 1, and the average values obtained by measuring each 5 times are shown in Table 4 below.

Contact angle (degrees) before heat treatment Contact angle after heat treatment (degrees) Comparative Example 1 46 37 Comparative Example 2 57 36 Comparative Example 3 48 48 Comparative Example 4 57 38 Comparative Example 5 65 52 Example 1 72 59 Example 2 83 69

As shown in Table 4, the contact angles before and after heat treatment in Examples 1 and 2 were higher than those in the comparative examples, indicating that the friction coefficient decreased in Examples 1 and 2, and thus It was confirmed that scratch resistance was improved in Examples 1 and 2. -Evaluation 4: Evaluation of light absorption characteristics

In order to be properly applied as an overcoat layer for low-emissivity glass, light absorption must be minimized, and the light absorption rate was measured for the configuration of this example.

That is, on a 5 mm thick glass substrate (Product name: Hanlight Clear, manufactured by Korea Glass Industry Co., Ltd.), an overcoat layer was formed with a thickness of 3 nm using the following materials, and the transmittance and coating surface reflectance were measured for each. The light absorption rate was measured from . The measurement results in each comparative example and example are shown in Table 5 below. Transmittance and coating surface reflectance are values for light with a wavelength of 550 nm, and light absorption is obtained by subtracting the transmittance and coating surface reflectance from 100.

ingredient Transmittance
@ 550 nm (A) [%] Coated surface reflectance @ 550 nm (B) [%] light absorption rate
(100-AB) [%] Comparative Example 1 TiZrO _x 86.84 8.6 4.56 Example 1 (Y ₂ O ₃ ) _0.75 (ZrO ₂ ) _0.25 89.17 8.61 2.22 Example 2 Y ₂ O ₃ 89.15 8.71 2.14

As shown in Table 5, it was confirmed that in the case of Examples 1 and 2, the light absorption value was very low, less than 2.3%. Considering the above evaluation results, according to the examples of the present invention, excellent It has scratch resistance but at the same time has a very low light absorption rate, so it was confirmed that when applied to low-emissivity glass, scratch resistance can be improved while minimizing changes in emissivity.

The present invention is not limited to the above-mentioned embodiments, but can be manufactured in various different forms, and those skilled in the art will be able to form other specific forms without changing the technical idea or essential features of the present invention. You will be able to understand that this can be implemented. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive.

100: Transparent substrate with thin multilayer coating
110: Transparent substrate
120: Multilayer thin film coating
20: Bottom anti-reflection film
30: Lower metal protective layer
40: Metal functional layer
50: upper metal protective layer
60: Top anti-reflection film
70: Overcoat
200: Multiple glazing units

Claims (13)

A transparent substrate equipped with a thin film multilayer coating,
The thin film multilayer coating includes a lower anti-reflective film, a lower metal protective layer, a metal functional layer with an infrared reflection function, an upper metal protective layer, an upper anti-reflective film, and an overcoat layer sequentially laminated from the transparent substrate,
The overcoat layer is a transparent substrate with a thin film multilayer coating containing yttrium oxide or a mixture of yttrium oxide and metal oxide represented by the following formula (1).
[Formula 1]
(Y ₂ O ₃ ) _x (A) _y-
Here, 0.75≤x≤1, 0≤y≤0.25, x+y=1,
A may be one or more selected from titanium oxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), and zirconium-doped titanium oxide (TiZrO _x ). According to paragraph 1,
A transparent substrate provided with a thin film multilayer coating wherein the overcoat layer has a thickness of 2 nm to 5 nm. According to paragraph 2,
A transparent substrate provided with a thin film multilayer coating wherein the overcoat layer has a thickness of 2.9 nm to 3.5 nm. According to paragraph 1,
In Formula 1, A is zirconium oxide. A transparent substrate equipped with a thin film multilayer coating. According to paragraph 1,
A transparent substrate equipped with a thin film multilayer coating wherein the metal functional layer has a thickness of 7 nm to 18 nm. According to paragraph 1,
The upper metal protective layer and the lower metal protective layer each include one or more of titanium, nickel, chromium, and niobium, or an alloy thereof. A transparent substrate provided with a thin film multilayer coating. According to clause 6,
The upper metal protective layer and the lower metal protective layer each include a nickel-chromium alloy. A transparent substrate provided with a thin film multilayer coating. According to paragraph 1,
The upper anti-reflection film and the lower anti-reflection film are a transparent substrate provided with a thin multilayer coating containing silicon nitride. According to clause 8,
The lower anti-reflection film and the upper anti-reflection film each further include at least one nitride, oxide, or oxynitride selected from titanium (Ti), hafnium (Hf), zirconium (Zr), and aluminum (Al). A thin film multilayer Transparent substrate with coating. According to clause 8,
The thickness of the lower anti-reflection film is 30 nm to 45 nm,
A transparent substrate provided with a thin film multilayer coating wherein the upper anti-reflection film has a thickness of 35 nm to 50 nm. According to clause 10,
The lower anti-reflective film is a transparent substrate provided with a thin multi-layer coating that is thicker than the upper anti-reflective film. According to paragraph 1,
A transparent substrate equipped with a thin film multilayer coating in which the light absorption rate of the overcoat layer in the 550 nm wavelength range is less than 2.3%. A multiple glazing unit comprising two or more transparent substrates spaced apart from each other with a spacer in between,
A multiple glazing unit wherein at least one of the two or more transparent substrates is a transparent substrate provided with a thin film multilayer coating according to claim 1.