KR20230099149A - Crucible damage prevention method of electron beam heating type thin film evaporator and Crucible damage prevention device for the same - Google Patents

Abstract

The present invention relates to a method and apparatus for preventing damage to a crucible of an electron beam heating type thin film deposition apparatus. The damage prevention device is installed in a deposition chamber including a crucible accommodating a deposition material and an electron beam emitter for outputting an electron beam for heating and evaporating the deposition material at regular intervals, and when the electron beam emitter outputs an electron beam a gas analyzer for analyzing the partial pressure of each gas in the deposition chamber; and a beam output stop module for stopping the electron beam emitter based on the analysis information of the gas analyzer.
The crucible damage prevention device of the electron beam heating method thin film deposition apparatus of the present invention made as described above continuously checks the state of gas change inside the deposition chamber during deposition, and emits an electron beam when damage to the crucible by the electron beam is expected. By automatically stopping the unit, it is possible to prevent damage to the crucible and poor deposition.

Description

Crucible damage prevention method of electron beam heating type thin film evaporator and Crucible damage prevention device for the same}

The present invention relates to a thin film deposition apparatus, and more particularly, to prevent damage to a crucible of an electron beam heating type thin film deposition apparatus, which provides good deposition efficiency and significantly reduces maintenance costs by preventing damage to the crucible by electron beams. It relates to methods and damage prevention devices.

An organic electroluminescent device (OLED) is a device using an electroluminescent phenomenon that emits light when a current flows through a fluorescent organic compound, and is used as a basic material for lightweight and thin flat panel display devices because it does not require a backlight. In such an organic electroluminescent device, the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer, which are the remaining constituent layers except for the anode and the cathode electrode, are made of organic thin films, and are laminated on a substrate by a vacuum thermal evaporation method. .

In the vacuum thermal deposition method, a substrate to be deposited is installed in a deposition chamber, a mask sheet is covered on the substrate, and heat is applied to an evaporation source so that the deposition material evaporated from the evaporation source passes through the mask sheet and is deposited on the substrate.

The deposition chamber provides an airtight space in which a vacuum atmosphere is maintained and contains various components. The substrate holder built into the deposition chamber horizontally supports the substrate so that stable deposition can be achieved. In addition, a diffuser source is installed at the bottom of the substrate holder, and the diffuser source evaporates the deposition material from the bottom of the substrate so that the deposition material in a gaseous state rises and is deposited on the substrate.

In order to evaporate the deposition material, it is necessary to heat the deposition material, and there are various methods of heating the deposition material. For example, resistance heating deposition, electron beam deposition, arc deposition, laser deposition, and the like are known. Resistance heating deposition is heating a crucible in which a deposition material is accommodated, and electron beam deposition is a heating method in which an electron beam directly collides with the deposition material.

However, the electron beam deposition method has a disadvantage in that the crucible is damaged when the electron beam collides with the crucible, although the evaporation efficiency of the deposition material is good. In other words, the crucible is damaged when the electron beam is applied to the bottom surface of the crucible when the evaporation material, which is the material filled in the crucible, is gradually consumed and finally exhausted. In some cases, the crucible itself is heated and evaporated, and the crucible material is deposited on the substrate. Of course, this phenomenon is a factor that greatly reduces the quality of the product. There is a demand for a device for preventing damage to the crucible by automatically stopping the output of the electron beam before the material inside the crucible is exhausted.

Korean Patent Publication No. 10-2008-0105854 (electron beam deposition equipment) Korean Patent Registration No. 10-1680258 (Crucible for electron beam evaporation apparatus)

The present invention has been created to solve the above problems, and when damage to the crucible by electron beam is expected, the crucible of the electron beam heating type thin film deposition apparatus can prevent damage to the crucible and deposition defects by automatically stopping the electron beam emitter. Its purpose is to provide a method for preventing damage.

An apparatus for preventing damage to a crucible of an electron beam heating method thin film deposition apparatus of the present invention as a means of solving problems for achieving the above object is to output a crucible accommodating a deposition material and an electron beam for heating and evaporating the deposition material at regular time intervals. a gas analyzer installed in the deposition chamber equipped with the electron beam emitter and analyzing the partial pressure of each gas in the deposition chamber when the electron beam emitter outputs the electron beam; and a beam output stop module for stopping the electron beam emitter based on the analysis information of the gas analyzer.

In addition, the gas analyzer grasps the partial pressure of the deposition material gas generated when the electron beam is output, and the beam output stop module determines that the partial pressure of the deposition material gas at a certain point in time is 50% lower than the average partial pressure of the deposition material gas. The electron beam emitter is stopped when it falls below.

In addition, the gas analyzer determines the partial pressure of the crucible material gas generated when the electron beam is output, and the beam output stop module determines that the partial pressure of the crucible material gas at a certain point in time is 20% or more than the average partial pressure of the crucible material gas. When high, stop the electron beam emitter.

Also, a controller connected to the gas analyzer and controlling the beam output stop module and a communication unit for transmitting analyzed gas partial pressure information to a manager are further included.

In addition, a sensor unit for detecting the concentration of each gas inside the deposition chamber and transmitting detection information to a controller is further installed inside the deposition chamber.

In addition, a notification unit is installed outside the deposition chamber to display the fact that the electron beam emitting unit is stopped by operating when the electron beam emitting unit is stopped.

In addition, the crucible damage prevention method of the electron beam heating method thin film deposition apparatus of the present invention as a means of solving the problems for achieving the above object is provided with an electron beam emitter for heating and evaporating the deposition material by applying an electron beam to the deposition material accommodated in the crucible A sensing step of detecting gas around the crucible during deposition to prevent damage to the crucible by the electron beam when the deposition apparatus is driven; a gas component identification step of identifying the components of the gas sensed through the sensing step; a gas partial pressure analysis step of analyzing the partial pressure of the crucible material gas when the identified gas is the crucible material gas from which the crucible evaporated as a result of gas component identification; and a beam output stop module driving step of stopping electron beam output when the analyzed gas partial pressure is equal to or greater than a reference value.

In addition, the reference value is that the partial pressure of the crucible material gas at the time of gas partial pressure analysis is 20% of the average partial pressure of the crucible material gas.

In addition, the crucible damage prevention method of the electron beam heating method thin film deposition apparatus of the present invention as a means of solving the problems for achieving the above object is provided with an electron beam emitter for heating and evaporating the deposition material by applying an electron beam to the deposition material accommodated in the crucible A sensing step of detecting gas around the crucible during deposition to prevent damage to the crucible by the electron beam when the deposition apparatus is driven; a gas component identification step of identifying the components of the gas sensed through the sensing step; a gas partial pressure analysis step of analyzing the partial pressure of the deposition material gas when the identified gas is a deposition material gas in which the deposition material is evaporated as a result of gas component identification; and a beam output stopping module driving step of stopping electron beam output when the analyzed gas partial pressure is less than a reference value.

In addition, in the reference value, the partial pressure of the deposition material at the time of gas partial pressure analysis is 50% of the average partial pressure of the deposition material gas.

The crucible damage prevention method of the electron beam heating method thin film deposition apparatus of the present invention made as described above continuously checks the state of gas change inside the deposition chamber while deposition is in progress, and when damage to the crucible by the electron beam is expected, the electron beam is emitted. By automatically stopping the unit, it is possible to prevent damage to the crucible and poor deposition.

1 is a block diagram of a deposition apparatus equipped with a crucible damage prevention device according to an embodiment of the present invention.
2 is a configuration diagram showing another example of a deposition apparatus equipped with an apparatus for preventing damage to a crucible according to an embodiment of the present invention.
3 is a block diagram showing the overall structure of the crucible damage prevention device shown in FIG.
4 is a view for explaining a method for preventing damage to a crucible according to an embodiment of the present invention.
5 is a view for explaining another example of a method for preventing damage to a crucible according to an embodiment of the present invention.
FIG. 6 is a graph showing a change in partial pressure of a deposition material gas generated by the electron beam generator of FIG. 3 .
FIG. 7 is a graph showing a change in partial pressure of a crucible material gas generated by the electron beam generating unit of FIG. 3 .
8 is a graph in which FIGS. 6 and 7 are superimposed.

Hereinafter, one embodiment according to the present invention will be described in more detail with reference to the accompanying drawings.

The present invention relates to an apparatus and method for preventing damage to a crucible by electron beams. A deposition apparatus employing an electron beam to heat the crucible has a disadvantage in that the crucible itself melts and evaporates when the electron beam is transmitted to the crucible, so care must be taken not to exhaust the deposition material in the crucible.

However, depending on circumstances, a worker may not know that the deposition material is exhausted. In order to solve this problem, a device for automatically stopping the output of the electron beam when the crucible is exhausted is required. The damage prevention device of the present invention plays a role of automatic stop.

The basic configuration of the crucible damage prevention apparatus of the present invention is installed in a deposition chamber having a crucible accommodating a deposition material and an electron beam emitter for outputting an electron beam for heating and evaporating the deposition material at regular time intervals, the electron beam a gas analyzer for analyzing the partial pressure of each gas in the deposition chamber when the emitter outputs the electron beam; and a beam output stop module for stopping the electron beam emitter based on the analysis information of the gas analyzer.

In addition, the method for preventing damage to the crucible of the present invention is to prevent damage to the crucible due to the electron beam when driving a deposition apparatus equipped with an electron beam emitter for heating and evaporating the deposition material by applying an electron beam to the deposition material accommodated in the crucible, a sensing step of sensing gas around the crucible during deposition; a gas component identification step of identifying the components of the gas sensed through the sensing step; a gas partial pressure analysis step of analyzing the partial pressure of the crucible material gas when the identified gas is the crucible material gas from which the crucible evaporated as a result of gas component identification; and an electron beam output stopping step of stopping electron beam output when the analyzed gas partial pressure is equal to or greater than a reference value.

In addition, another method of preventing damage to the crucible of the present invention is to prevent damage to the crucible by the electron beam when driving a deposition apparatus equipped with an electron beam emitter for heating and evaporating the deposition material by applying an electron beam to the deposition material accommodated in the crucible. As one, a sensing step of sensing the gas around the crucible during deposition; a gas component identification step of identifying the components of the gas sensed through the sensing step; a gas partial pressure analysis step of analyzing the partial pressure of the deposition material gas when the identified gas is a deposition material gas in which the deposition material is evaporated as a result of gas component identification; and an electron beam output stopping step of stopping electron beam output when the analyzed gas partial pressure is less than a reference value.

1 is a block diagram of a deposition apparatus equipped with a crucible damage prevention device according to a basic embodiment of the present invention.

Prior to the description of the crucible damage prevention device, the basic configuration of the deposition device 10 will be described first.

As shown, the deposition apparatus 10 has a deposition chamber 11, a substrate holder 13, a crucible 17, an electron beam emitter 21, and a vacuum pump 23.

The deposition chamber 11 provides an inner space 11a where deposition is performed, and a vacuum state is maintained by the operation of the vacuum pump 23 . A door (not shown) through which the substrate 15 enters and exits is provided on the side of the deposition chamber 11 .

The substrate holder 13 is a support structure that horizontally supports the substrate 15 to be deposited. Depending on the type of deposition apparatus 10, the substrate holder 13 may move up and down. Also, the crucible 17 is a container for accommodating the deposition material 19 . The material of the crucible 17 may be copper.

The electron beam emitter 21 outputs an electron beam by supplying current to an internal filament. The electron beam emitted from the electron beam emitter 21 is bent by a magnetic induction action using an electromagnet and collides with the deposition material 19 . When the electron beam collides with the deposition material 19, the deposition material 19 is heated and evaporated. The deposition material 19 may be aluminum as a metal material to be deposited on the substrate.

A damage prevention device according to an embodiment of the present invention includes a gas analyzer 41 and a beam output stop module 43 .

The gas analyzer 41 serves to analyze the partial pressure of each gas within the deposition chamber 11 when the electron beam emitter 21 outputs an electron beam, that is, when deposition is in progress. If the output electron beam is applied only to 100% of the deposition material 19, only aluminum gas is detected in the deposition chamber, and the partial pressure of the aluminum gas is checked. Also, if 95% of the electron beam is applied to the deposition material 19 and 5% to the crucible 17, aluminum gas and copper gas are simultaneously detected inside the deposition chamber 11, and the partial pressures of each gas are checked. And, when the evaporation material 19 is almost exhausted and the bottom of the crucible 17 comes out, 30% of the electron beam collides with the evaporation material 19 and 70% collides with the crucible 17, compared to aluminum gas. The partial pressure of copper increases.

The detection of the aluminum gas and the copper gas and the partial pressure measurement and analysis are performed by the gas analyzer 41 . That is, the gas analyzer 41 grasps the partial pressure of the deposition material gas generated during deposition.

The beam output stop module 43 serves to stop the electron beam emitter 21 based on the analysis information of the gas analyzer 41 . That is, as a result of the determination based on the analysis information, when the deposition material 19 has already been exhausted or exhaustion is imminent, the output of the electron beam is blocked.

The criterion for determining whether the deposition material is exhausted or exhausted is imminent is the gas analysis information. That is, the determination is made by analyzing the partial pressure of the aluminum gas (deposition material) and the partial pressure of the copper gas (crucible) in the detection gas. For example, if the partial pressure of the aluminum gas is less than the reference value, the output of the electron beam is stopped.

The 'reference value' may vary depending on the case. For example, when the partial pressure of the deposition material gas at a certain point during deposition falls below 50% compared to the average partial pressure of the deposition material gas, the reference value may be used. Alternatively, when the partial pressure of the crucible material gas at a certain point in time during deposition is higher than the average partial pressure of the crucible material gas by 20% or more, the reference value may be used.

A description thereof is as follows with reference to FIGS. 6 to 8 . FIG. 6 is a graph showing changes in partial pressure of the deposition material gas generated by the electron beam generator 21 of FIG. 3, and FIG. 7 shows changes in partial pressure of the crucible material gas generated by the electron beam generator 21 of FIG. it's a graph 8 is a graph in which FIGS. 6 and 7 are overlapped.

6 shows the partial pressure of the aluminum gas inside the deposition chamber according to time while the deposition process is in progress. As is known, the electron beam emitting unit 21 does not continuously output electron beams, but repeats output and stop. In other words, it operates for n seconds and stops for m seconds. For example, as shown in FIG. 6 , approximately 20 seconds of operation and 10 seconds of stop operation are repeated.

In the graph of FIG. 6, the first heating section (A), the second heating section (B), the third heating section (C), and the fourth heating section (D) are displayed. Each heating section is a section in which electron beams are output from the electron beam emitting unit 21 . The average partial pressure in each heating section can be easily obtained through the gas analyzer 41.

However, in the 4th heating section (D), it can be seen that the partial pressure is rapidly reduced while the 4th heating is in progress. The average partial pressure in the 4th heating section (D) is relatively lower than that in the 1st, 2nd, and 3rd heating sections (A, B, C). The reason why the average partial pressure of the deposition material gas is lowered is that the amount of the deposition material is reduced. (If the deposition material is not replenished), the average partial pressure of the deposition material gas in the 5th heating section (not shown) will be further lowered. However, if the crucible is sufficiently filled with the deposition material 19 and the deposition material is stably supplied, the average partial pressure in all heating sections will maintain a certain range.

As described above, the certain point in time at which the average partial pressure decreases means a heating section in which the average partial pressure decreases among the continuously progressing heating sections.

Anyway, in FIG. 6, since the average partial pressure of the fourth heating section is smaller than the average partial pressure of the preceding heating section, the output of the electron beam must be temporarily stopped to prevent damage to the crucible.

In this embodiment, the criterion for stopping the electron beam emitter 21 is the partial pressure in the heating section in which the average partial pressure is lowered (the fourth heating section in FIG. heating section) when it is less than 50% of the average partial pressure. However, these criteria may vary from case to case.

Meanwhile, in FIG. 6 , the criterion for stopping the electron beam emitter 21 is determined as the decrease in the partial pressure of the deposition material gas, but, unlike this, the crucible material gas, that is, the increase in the partial pressure of the copper gas may be used as the criterion. That is, when the partial pressure of the copper gas becomes higher than the reference value during deposition, the electron beam emitter 21 is stopped to prevent further damage to the crucible. The detection of copper gas itself means melting and evaporation of the crucible.

7 shows the partial pressure of the copper gas inside the deposition chamber over time while the deposition process is in progress. Copper gas is generated when the electron beam emitting portion 21 operates. Of course, if 100% of the electron beam is transmitted only to the deposition material 19, the partial pressure of the copper gas will be zero. However, since a certain amount of the electron beam is inevitably transferred to the crucible 17, the partial pressure of the copper gas increases when the electron beam is output.

Referring to FIG. 7 , it can be seen that the partial pressure of the copper gas increases in the first heating section (A), the second heating section (B), the third heating section (C), and the fourth heating section (D). In particular, in the 4th heating section (D), the partial pressure of the copper gas increased remarkably. This means that the collision of the electron beam with respect to the crucible 17 starts while the fourth heating is in progress. If the 5th heating is performed in this state, the partial pressure of the copper gas will increase further.

As shown in FIG. 7, since the average partial pressure in the fourth heating section D is significantly higher than the average partial pressure in the preceding heating section, the electron beam emitter 21 is stopped to prevent damage to the crucible.

In this embodiment, the criterion for stopping the electron beam emitting unit 21 is that the partial pressure of the copper gas in the heating section in which the partial pressure of the copper gas is increased (the fourth heating section in FIG. It is when it is more than 20% of the average partial pressure of the heating section). However, the stopping criteria may vary from case to case.

Referring to FIG. 8 , it can be seen that the partial pressure of the aluminum gas is lowered and the partial pressure of the copper gas is increased in the fourth heating section (D). It can be seen that the crucible was opened as the deposition material was exhausted while the 4th heating was in progress. This phenomenon occurs when the remaining amount of the deposition material 19 is lost.

2 is a configuration diagram showing another example of a deposition apparatus equipped with a crucible damage prevention device according to an embodiment of the present invention, and FIG. 3 is a block diagram showing the overall structure of the crucible damage prevention device shown in FIG. 2 am.

Hereinafter, the same reference numerals as the above reference numerals indicate the same members having the same function.

As shown, the damage prevention device 40 according to another example further includes a sensor unit 30, a controller 45, a communication unit 48, and a notification unit.

The sensor unit 30 is composed of a deposition material sensor 31 and a crucible material sensor 33 . The deposition material sensor 31 is a sensing means for detecting the concentration of the deposition material gas inside the deposition chamber 11, that is, aluminum gas, during deposition. In addition, the crucible material sensor 33 serves to detect the concentration of the crucible material gas, that is, the copper gas. Concentration information of each gas detected by the deposition material sensor 31 and the crucible material sensor 33 is transmitted to the controller 45 .

The controller 45 is connected to the sensor unit 30 and the gas analyzer 41 and controls the beam output stopping module 43 . The controller 45 transmits the concentration of the deposition material gas and the concentration of the crucible material gas to the external manager 49 through the communication unit 48 . The manager 49 may forcibly turn on/off the beam output stop module 43 through the controller 45 based on the transmitted concentration information.

The communication unit 48 is a short-distance wireless communication means, and transmits the information analyzed by the gas analyzer 41 to the manager. The manager 49 displays gas partial pressure information and concentration information of the gas analyzer through the monitor of the control computer.

The notification unit is driven when the electron beam emitting unit 21 is stopped, and serves to externally indicate the fact that the electron beam emitting unit 21 is stopped. The reason for this is to allow the administrator to perform maintenance quickly. A warning lamp 47 can be used as a notification unit, and a speaker can be applied in addition to this.

4 is a flowchart illustrating a method for preventing damage to a crucible according to an embodiment of the present invention. 4 shows a method when the partial pressure of the crucible material gas during deposition becomes higher than the reference value described above.

As shown, the crucible damage prevention method according to the present embodiment includes a sensing step 103, a gas component identification step 105, a gas partial pressure analysis step 107, and a beam output stop module driving step 109. .

The sensing step 103 is a process of sensing gas around the crucible 17 while deposition is in progress. For the sensing step 103, the deposition material sensor 31 and the crucible material sensor 33 operate simultaneously. In some cases, only the crucible water gel sensor 33 may be operated.

The gas component determination step 105 is a process of determining the components of the gas sensed through the sensing step. It is to determine whether the sensed gas is air, crucible material gas, or deposition material gas.

As a result of detecting the gas component, if it is not the crucible material gas, the sensing step 103 is repeated. However, when the sensed gas is a crucible material, the gas partial pressure analysis step 107 is performed using the gas analyzer 41 to determine the partial pressure of the crucible material gas.

Through gas partial pressure analysis, if the partial pressure of the crucible material gas is greater than the reference value described above, that is, if it is higher than the average partial pressure of the crucible material gas by 20% or more, the beam output stop module driving step 109 is performed to immediately output the electron beam. Stop. If the partial pressure is lower than the reference value, the sensing step 103 is repeated.

5 is a flowchart illustrating another example of a method for preventing damage to a crucible according to an embodiment of the present invention. The damage prevention method shown in FIG. 5 is a process that proceeds when the partial pressure of the deposition material gas is lower than the reference value described above.

As shown, the method for preventing damage to the crucible shown in FIG. 5 includes a sensing step 103, a gas component identification step 105, a gas partial pressure analysis step 107, and a beam output stop module driving step 109. .

As described above, the sensing step 103 is a process of sensing the gas around the crucible 17 while the deposition is in progress, and the gas component identification step 105 determines the gas components sensed through the sensing step. It is a process of understanding As a result of detecting the gas component, if it is not the deposition material gas, the sensing step 103 is repeated.

However, when the sensed gas is a deposition material, a gas partial pressure analysis step 107 is performed using the gas analyzer 41 to determine the partial pressure of the deposition material gas. Through gas partial pressure analysis, if the partial pressure of the deposition material gas is below the reference value described above, that is, if it drops below 50% compared to the average partial pressure of the deposition material gas, the beam output stop module driving step 109 is performed to Stop the output immediately. If the partial pressure is higher than the reference value, the sensing step 103 is repeated.

In the above, the present invention has been described in detail through specific embodiments, but the present invention is not limited to the above embodiments, and various modifications are possible by those skilled in the art within the scope of the technical idea of the present invention.

10: deposition apparatus 11: deposition chamber 11a: inner space
13: substrate holder 15: substrate 17: crucible
19: deposition material 21: electron beam emitter 23: vacuum pump
30: sensor unit 31: deposition material sensor 33: crucible material sensor
40: damage prevention device 41: gas analyzer 43: beam output stop module
45: controller 47: warning lamp 48: communication unit
49;manager
A: 1st heating section B: 2nd heating section C: 3rd heating section
D: 4th heating section

Claims (10)

It is installed in a deposition chamber having a crucible accommodating the deposition material and an electron beam emitter for outputting an electron beam for heating and evaporating the deposition material at regular time intervals,
a gas analyzer for analyzing the partial pressure of each gas in the deposition chamber when the electron beam emitter outputs an electron beam;
Including a beam output stop module for stopping the electron beam emitter based on the analysis information of the gas analyzer,
Crucible damage prevention device of electron beam heating type thin film deposition apparatus. According to claim 1,
The gas analyzer grasps the partial pressure of the deposition material gas generated when the electron beam is output,
The beam output stop module stops the electron beam emitter when the partial pressure of the deposition material gas at a certain point in time falls below 50% compared to the average partial pressure of the deposition material gas.
Crucible damage prevention device of electron beam heating type thin film deposition apparatus. According to claim 1,
The gas analyzer determines the partial pressure of the crucible material gas generated when the electron beam is output,
The beam output stop module stops the electron beam emitter when the partial pressure of the crucible material gas at a certain point in time is higher than the average partial pressure of the crucible material gas by 20% or more.
Crucible damage prevention device of electron beam heating type thin film deposition apparatus. According to claim 2 or 3,
A controller connected to the gas analyzer and controlling a beam output stop module;
A communication unit for transmitting the analyzed gas partial pressure information to a manager is further included.
Crucible damage prevention device of electron beam heating type thin film deposition apparatus. According to claim 4,
A sensor unit for detecting the concentration of each gas inside the deposition chamber and transmitting the detection information to the controller is further installed inside the deposition chamber,
Crucible damage prevention device of electron beam heating type thin film deposition apparatus. According to claim 4,
A notification unit is installed outside the deposition chamber to display the fact that the electron beam emitting unit is stopped by driving when the electron beam emitting unit is stopped,
Crucible damage prevention device of electron beam heating type thin film deposition apparatus. To prevent damage to the crucible caused by the electron beam during driving of a deposition apparatus equipped with an electron beam emitter for heating and evaporating the deposition material by applying an electron beam to the deposition material accommodated in the crucible,
a sensing step of sensing gas around the crucible during deposition;
a gas component identification step of identifying the components of the gas sensed through the sensing step;
a gas partial pressure analysis step of analyzing the partial pressure of the crucible material gas when the identified gas is the crucible material gas from which the crucible evaporated as a result of gas component identification;
Including a beam output stop module driving step of stopping electron beam output when the analyzed gas partial pressure is greater than a reference value,
Method for preventing crucible damage in electron beam heating thin film deposition apparatus. According to claim 7,
In the reference value, the partial pressure of the crucible material gas at the time of gas partial pressure analysis is 20% of the average partial pressure of the crucible material gas,
Method for preventing crucible damage in electron beam heating thin film deposition apparatus. To prevent damage to the crucible caused by the electron beam during driving of a deposition apparatus equipped with an electron beam emitter for heating and evaporating the deposition material by applying an electron beam to the deposition material accommodated in the crucible,
a sensing step of sensing gas around the crucible during deposition;
a gas component identification step of identifying the components of the gas sensed through the sensing step;
a gas partial pressure analysis step of analyzing the partial pressure of the deposition material gas when the identified gas is a deposition material gas in which the deposition material is evaporated as a result of gas component identification;
Including a beam output stop module driving step of stopping electron beam output when the analyzed gas partial pressure is less than the reference value,
Method for preventing crucible damage in electron beam heating thin film deposition apparatus. According to claim 9,
In the reference value, the partial pressure of the deposition material at the time of gas partial pressure analysis is 50% of the average partial pressure of the deposition material gas.
Method for preventing crucible damage in electron beam heating thin film deposition apparatus.

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