KR20230094162A - Vapor deposition mask package and vapor deposition mask packaging method - Google Patents

Abstract

A deposition mask package according to the present disclosure includes a housing portion including a first opposing surface, a first buffer sheet positioned on the first opposing surface, a cover portion, and a first fixing portion. The lid portion includes a second opposing surface opposite to the first opposing surface of the accommodating portion, and overlaps the accommodating portion with the first buffer sheet and the deposition mask interposed therebetween. The first fixing part fixes the first cushioning sheet to the first opposing surface. When viewed in a direction normal to the first opposing surface, the first fixing portion is located outside the deposition mask.

Description

Deposition mask package and deposition mask packing method {VAPOR DEPOSITION MASK PACKAGE AND VAPOR DEPOSITION MASK PACKAGING METHOD}

The present disclosure relates to a deposition mask package and a deposition mask wrapping method.

BACKGROUND OF THE INVENTION In electronic devices such as smart phones and tablet PCs, high-precision display devices are required from the market. The display device has a pixel density of, for example, 400 ppi or more or 800 ppi or more.

As such a display device, an organic EL display device having good responsiveness and/or high contrast has attracted attention. As a method of forming pixels of an organic EL display device, a method of depositing a material constituting a pixel on a substrate is known. In this case, first, a deposition mask device having a deposition mask including a through hole and a frame supporting the deposition mask is prepared. Then, in the deposition apparatus, an evaporation material such as an organic material or an inorganic material is deposited in a state where the evaporation mask is brought into close contact with the substrate. As a result, the evaporation material adheres to the substrate to form a evaporation layer. The deposited layer constitutes a display area of an organic EL display device.

The deposition mask is wrapped when transporting. For example, a package provided with an accommodating part and a cover part is known. The deposition mask is held between the accommodating portion and the cover portion. However, depending on the structure of the package, there is a possibility that the deposition mask is plastically deformed.

Japanese Patent No. 6904502 International Publication No. 2018-061757

An object of an embodiment of the present disclosure is to provide a deposition mask packing body and a deposition mask packing method capable of suppressing plastic deformation of the deposition mask.

A deposition mask package according to the present disclosure is a package containing a deposition mask having a plurality of through holes. The deposition mask package includes a housing portion including a first opposing surface, a first buffer sheet positioned on the first opposing surface, a cover portion, and a first fixing portion. The lid portion includes a second opposing surface opposite to the first opposing surface of the accommodating portion, and overlaps the accommodating portion with the first buffer sheet and the deposition mask interposed therebetween. The first fixing part fixes the first cushioning sheet to the first opposing surface. When viewed in a direction normal to the first opposing surface, the first fixing portion is located outside the deposition mask.

A deposition mask wrapping method according to the present disclosure is a method of wrapping a deposition mask in which a plurality of through holes are formed. The deposition mask wrapping method includes a preparation process, a fixing process, a loading process, and a clamping process. In the preparation process, an accommodating portion including the first opposing surface and a cover portion including the second opposing surface are prepared. In the fixing process, on the first opposing surface, the first cushioning sheet is fixed at the first fixing part. In the loading process, a deposition mask is loaded on the first buffer sheet. In the sandwiching step, the covering portion is overlapped with the deposition mask so that the second opposing surface faces the first opposing surface, so that the deposition mask is sandwiched between the accommodating portion and the covering portion. When viewed in a direction normal to the first opposing surface, the first fixing portion is located outside the deposition mask.

According to the present disclosure, plastic deformation of the deposition mask can be suppressed.

1 is a diagram illustrating a deposition apparatus according to an embodiment of the present disclosure.
2 is a perspective view showing a deposition mask package according to an embodiment of the present disclosure.
FIG. 3 is an exploded perspective view of the vapor deposition mask package shown in FIG. 2;
Fig. 4 is a side view showing the shipping case shown in Fig. 2;
FIG. 5 is a cross-sectional view of the vapor deposition mask package shown in FIG. 2, and is a partial cross-sectional view corresponding to a position indicated by line AA in FIG.
Fig. 6 is a cross-sectional view of the deposition mask package shown in Fig. 2, and is a cross-sectional view corresponding to a position indicated by line BB in Fig. 3;
FIG. 7 is a plan view showing a buffer sheet, an insertion sheet, and a deposition mask stacked on the first opposing surface shown in FIG. 3;
8 is a cross-sectional view showing a preparation step of a deposition mask wrapping method according to an embodiment of the present disclosure.
9 is a cross-sectional view showing a fixing step of a deposition mask wrapping method according to an embodiment of the present disclosure.
Fig. 10 is a cross-sectional view showing a fixing step continuing from Fig. 9;
11 is a cross-sectional view illustrating a loading step of a deposition mask wrapping method according to an embodiment of the present disclosure.
12 is a cross-sectional view illustrating a fitting and supporting process of a deposition mask wrapping method according to an embodiment of the present disclosure.
13 is a cross-sectional view illustrating a binding step of a deposition mask wrapping method according to an embodiment of the present disclosure.
FIG. 14 is a cross-sectional view showing a modified example of the deposition mask stack shown in FIG. 6 .

In this specification and this drawing, unless otherwise specified, a term meaning a substance that is the basis of a certain configuration, such as a "substrate", "substrate", "plate", "sheet", or "film", They are not distinguished from one another on the basis of differences alone.

In this specification and this drawing, unless otherwise specified, the exact meaning of terms such as "parallel" or "orthogonal" or values of lengths or angles that specify shapes or geometrical conditions and their degrees, for example It is assumed that the analysis includes the range of the extent to which similar functions may be expected, regardless of the above.

In this specification and this drawing, unless otherwise specified, a certain component, such as a certain member or a certain area, is "on" or "below", "above" or "above" another structure, such as another member or other area. In the case of "downward", or "upward" or "downward", it includes the case where a certain element is in direct contact with another element. In addition, a case where a separate configuration is included between a certain configuration and another configuration, that is, a case where they are indirectly in contact with each other is also included. In addition, unless otherwise specified, the phrases such as "upper" or "upper side" or "upper side" or "lower side" or "lower side" or "lower side" may be reversed in the vertical direction.

In this specification and the drawings, unless otherwise specified, the same or similar reference numerals are assigned to the same parts or parts having similar functions, and repeated explanations thereof are omitted in some cases. In addition, the dimension ratio in the drawing may differ from the actual ratio for convenience of description, or a part of the configuration may be omitted from the drawing.

In this specification and this drawing, unless otherwise specified, you may combine with other embodiment or modified example within the range which does not generate a contradiction. Further, other embodiments or other embodiments and modified examples may be combined within a range in which contradiction does not occur. In addition, the modified examples may also be combined within a range in which contradiction does not occur.

In this specification and this drawing, unless otherwise specified, when a plurality of steps are disclosed in relation to a method such as a manufacturing method, other undisclosed steps may be performed between the disclosed steps. In addition, the order of the disclosed process is arbitrary within the range which does not generate a contradiction.

In this specification and this drawing, unless otherwise specified, the numerical range represented by the symbol "to" includes the numerical values placed before and after the symbol "to". For example, the numerical range defined by the expression “34 to 38% by mass” is the same as the numerical range defined by the expression “34% by mass or more and 38% by mass or less”.

In one embodiment of the present specification, a deposition mask used for patterning an organic material on a substrate in a desired pattern when manufacturing an organic EL display device and a method for manufacturing the same will be described as an example. However, it is not limited to these applications, and the present embodiment can be applied to deposition masks used in various applications. For example, the mask of the present embodiment may be used to manufacture a device for displaying or projecting an image or video for expressing virtual reality, so-called VR, augmented reality, or so-called AR.

A first aspect of the present disclosure,

A vapor deposition mask package in which a vapor deposition mask having a plurality of through holes is wrapped therein,

An accommodating portion including a first opposing surface;

A first buffer sheet positioned on the first opposing surface;

a cover portion including a second opposing surface opposite to the first opposing surface of the accommodating portion and overlapping the accommodating portion via the first buffer sheet and the deposition mask;

A first fixing part for fixing the first cushioning sheet to the first opposing surface,

When viewed in a direction normal to the first opposing surface, the first fixing portion is a deposition mask package positioned outside the deposition mask.

In the second aspect of the present disclosure, in the deposition mask package according to the first aspect described above,

The first buffer sheet is formed in a rectangular shape so as to follow a first direction and a second direction orthogonal to the first direction when viewed from the normal direction,

The first fixing portion may include two first fixing division members positioned outside the deposition mask on both sides in the first direction.

A third aspect of the present disclosure is the deposition mask package according to the second aspect described above,

The first fixing part may include two second fixing division members positioned outside the deposition mask on both sides in the second direction.

A fourth aspect of the present disclosure is a deposition mask package according to each of the above-mentioned first aspect to the above-mentioned third aspect,

An insertion sheet positioned between the deposition mask and the first buffer sheet,

The first fixing portion may be positioned outside the insertion sheet when viewed from the normal direction.

A fifth aspect of the present disclosure is a deposition mask package according to each of the above-described first to fourth aspects,

The accommodating portion and the cover portion may be connected via a hinge portion.

A sixth aspect of the present disclosure is a deposition mask package according to each of the above-described first to fifth aspects,

A second buffer sheet positioned on the second opposing surface,

The cover portion may overlap the accommodating portion with the first buffer sheet, the deposition mask, and the second buffer sheet interposed therebetween.

A seventh aspect of the present disclosure is the deposition mask package according to the sixth aspect described above,

A second fixing part for fixing the second cushioning sheet to the second opposing surface,

When viewed from the normal direction, the second fixing portion may be positioned outside the deposition mask.

An eighth aspect of the present disclosure is a deposition mask package according to each of the above-described first to seventh aspects,

A deposition mask positioned between the accommodating portion and the cover portion may be provided.

A ninth aspect of the present disclosure,

A deposition mask wrapping method for wrapping a deposition mask having a plurality of through holes formed thereon,

A preparation step of preparing an accommodating portion including a first opposing surface and a cover portion including a second opposing surface;

A fixing step of fixing a first cushioning sheet to the first opposing surface with a first fixing part;

a loading step of loading the deposition mask on the first buffer sheet;

a fitting step of overlapping the covering portion with the deposition mask so that the second opposing surface faces the first opposing surface, and sandwiching the deposition mask between the accommodating portion and the covering portion;

When viewed in a direction normal to the first opposing surface, the first fixing part is positioned outside the deposition mask.

EMBODIMENT OF THE INVENTION Hereinafter, one embodiment of this indication is described in detail, referring drawings. In addition, embodiment shown below is an example of embodiment of this indication, and this indication is limited only to these embodiment and is not interpreted.

As shown in FIG. 1 , the deposition apparatus 80 may include a deposition source (for example, a crucible 81 ), a heater 83 , and a deposition mask apparatus 10 . The deposition apparatus 80 may include an exhaust unit (not shown) for setting the inside of the deposition apparatus 80 to a vacuum atmosphere. The crucible 81 is provided inside the evaporation apparatus 80 and is configured to accommodate a evaporation material 90 such as an organic light emitting material. The heater 83 is configured to heat the crucible 81 . By heating the crucible 81 in a vacuum atmosphere, the evaporation material 90 evaporates.

The deposition mask device 10 may include a frame 15 and a deposition mask 20 fixed to the frame 15 . The frame 15 may include a frame opening 16 . The frame opening 16 overlaps an effective area 23 of the deposition mask 20 in which a through hole 25 described later is formed, as viewed in plan. The deposition mask 20 may be fixed and supported by the frame 15 in a stretched state. In this case, bending of the deposition mask 20 can be suppressed. A plurality of deposition masks 20 may be fixed to the frame 15 . "Planar view" is a term meaning viewing from the thickness direction of the deposition mask 20, and is a term meaning viewing from the vertical direction in FIG. 1, for example.

The deposition mask device 10 is positioned within the deposition device 80 so as to face the crucible 81 . The deposition mask device 10 may be located above the crucible 81 . The substrate 91 may be positioned so as to face the deposition mask 20 of the deposition mask device 10 . The substrate 91 is an object to which the evaporation material 90 is adhered. The substrate 91 may be located above the deposition mask 20 . The substrate 91 may be held by an electrostatic chuck 84 using electrostatic force. In this case, the electrostatic chuck 84 may be positioned above the substrate 91 .

As shown in FIG. 1 , the deposition apparatus 80 may include a magnet 85 disposed above the electrostatic chuck 84 . By providing the magnets 85, the deposition mask 20 can be attracted to the direction where the magnets 85 are positioned by magnetic force, so that the deposition mask 20 can be brought into close contact with the substrate 91. A cooling plate (not shown) may be interposed between the electrostatic chuck 84 and the magnet 85 to cool the substrate 91 during deposition.

When depositing the evaporation material 90 on the substrate 91, the evaporation material flying from the crucible 81 is attached to the substrate 91 through the frame opening 16 and each through hole 25. As a result, the evaporation material 90 is adhered to the substrate 91 in a pattern according to the pattern of the through hole 25 .

Next, the deposition mask 20 will be described. The deposition mask 20 may be produced by an etching process or a plating process.

As shown in FIGS. 2 and 3 , the deposition mask 20 may be formed in a rectangular shape so as to have a first direction D1 and a second direction D2 orthogonal to the first direction D1. . The first direction may be the longitudinal direction of the deposition mask 20 . The deposition mask 20 may include longitudinal end portions 21 located at both ends in the first direction D1. The deposition mask 20 may include at least one effective region 23 . The effective region 23 may be positioned between the two longitudinal end portions 21 . As shown in FIG. 3 , the deposition mask 20 may include one effective region 23 . However, the deposition mask 20 may include a plurality of effective regions 23 . The plurality of effective regions 23 may be arranged in the first direction D1 or may be arranged in the second direction D2. The plurality of effective regions 23 may be arranged in the first direction D1 and the second direction D2.

One effective area 23 may correspond to one display area of the organic EL display device. Alternatively, one effective area 23 may correspond to a plurality of display areas. The effective area 23 may have, for example, a substantially rectangular outline in plan view, but may have an outline of a shape other than a rectangle.

As shown in FIG. 1, the deposition mask 20 includes a first surface 20a, a second surface 20b located on the opposite side of the first surface 20a, and a plurality of through holes 25. may contain The through hole 25 extends from the first surface 20a of the deposition mask to the second surface 20b and penetrates the deposition mask 20 .

A through hole group 26 composed of a plurality of through holes 25 may be located in the effective area 23 . One effective area 23 may be composed of one through hole group 26 . The effective area 23 may be an area occupied by the group of through holes 26 . The group of through holes 26 may overlap the frame opening 16 of the frame 15 in plan view. The through hole group 26 is used as a term meaning an aggregate of a plurality of regularly arranged through holes 25 . The outermost through holes 25 constituting one through hole group 26 are the through holes 25 located on the outermost side among a plurality of regularly arranged through holes 25 similarly. On the outside of the peripheral through holes 25 in one through hole group 26, the through holes 25 arranged regularly and intended to pass the evaporation material 90 need not exist. As an example of regular arrangement, the through holes 25 may be arranged in parallel, for example. The group of through holes 26 may have a substantially rectangular outline in plan view, similarly to the effective area 23 .

The deposition mask 20 has a thickness T1 (see FIG. 5) extending from the first surface 20a to the second surface 20b. The thickness T1 may be, for example, 2 μm or more, 5 μm or more, 10 μm or more, or 15 μm or more. By setting the thickness T1 to 2 μm or more, the mechanical strength of the deposition mask 20 can be secured. Further, the thickness T1 may be, for example, 20 μm or less, 30 μm or less, 40 μm or less, or 50 μm or less. By setting the thickness T1 to 50 μm or less, generation of shadows can be suppressed. The shadow refers to a phenomenon in which the deposition material 90 adheres to the wall surface of the through hole 25 and the accuracy of the thickness of the deposition layer formed on the substrate 91 is lowered. The range of the thickness T1 is determined by a first group including 2 μm, 5 μm, 10 μm, and 15 μm, and/or a second group including 20 μm, 30 μm, 40 μm, and 50 μm. can also The range of the thickness T1 may be determined by a combination of any one of the values included in the first group described above and any one of the values included in the second group described above. The range of the thickness T1 may be determined by any combination of two of the values included in the first group described above. The range of the thickness T1 may be determined by any combination of two of the values included in the above-mentioned second group. For example, it may be 2 μm or more and 50 μm or less, 2 μm or more and 40 μm or less, 2 μm or more and 30 μm or less, 2 μm or more and 20 μm or less, 2 μm or more and 15 μm or less, or 2 μm or more and 15 μm or less. ㎛ or more and 10 μm or less, 2 μm or more and 5 μm or less, 5 μm or more and 50 μm or less, 5 μm or more and 40 μm or less, 5 μm or more and 30 μm or less, 5 μm or more and 20 μm or less 5 μm or more and 15 μm or less, 5 μm or more and 10 μm or less, 10 μm or more and 50 μm or less, 10 μm or more and 40 μm or less, 10 μm or more and 30 μm or less, 10 μm or more 20 μm or less, 10 μm or more and 15 μm or less, 15 μm or more and 50 μm or less, 15 μm or more and 40 μm or less, 15 μm or more and 30 μm or less, 15 μm or more and 20 μm or less 20 μm or more and 50 μm or less, 20 μm or more and 40 μm or less, 20 μm or more and 30 μm or less, 30 μm or more and 50 μm or less, 30 μm or more and 40 μm or less, 40 μm or more 50 micrometers or less may be sufficient.

The deposition mask 20 may be made of, for example, an iron alloy containing nickel. The iron alloy may further contain cobalt in addition to nickel. For example, as a material for the deposition mask 20, an iron alloy in which the total content of nickel and cobalt is 30% by mass or more and 54% by mass or less, and the content of cobalt is 0% by mass or more and 6% by mass or less. can be used. Specific examples of the iron alloy containing nickel include an invar material containing 34 mass% or more and 38 mass% or less nickel, and a low thermal expansion Fe-Ni-based plating containing 38 mass% or more and 54 mass% or less nickel. Alloys etc. are mentioned. As a specific example of the iron alloy containing nickel and cobalt, in addition to 30 mass % or more and 34 mass % or less nickel, the super invar material etc. which further contain cobalt are mentioned. By using such an iron alloy, the thermal expansion coefficient of the deposition mask 20 can be made low. For example, when a glass substrate is used as the substrate 91, the thermal expansion coefficient of the deposition mask 20 can be set to a low value equal to that of the glass substrate. Accordingly, in the deposition process, the shape accuracy and positional accuracy of the light emitting layer formed on the substrate 91 can be prevented from deteriorating due to a difference in thermal expansion coefficient between the deposition mask 20 and the substrate 91. .

As a material constituting the deposition mask 20, when the coefficient of thermal expansion is not required to be as low as that of the glass substrate, it may be composed of, for example, single element nickel instead of the iron alloy described above, or contain cobalt. You may be comprised from the nickel alloy which does. When it is comprised from the nickel alloy containing cobalt, as a material of the deposition mask 20, the content of cobalt is 8 mass % or more and 10 mass % or less of a nickel alloy can be used. When the deposition mask 20 is manufactured by plating, the plating solution for depositing the plating film constituting the deposition mask 20 can be stabilized by using such nickel or a nickel alloy. For this reason, while making management of plating process easy, handling property can be improved. In addition, the components of the plated film can be equalized, and the quality of the deposition mask 20 can be improved.

Next, the deposition mask package 30 in which the above-described deposition mask 20 is wrapped will be described. The deposition mask package 30 is configured to wrap a deposition mask 20 having a through hole group 26 in which a plurality of through holes 25 are formed.

As shown in FIGS. 2 and 3 , the deposition mask package 30 includes a housing part 31, a lid part 32, a first buffer sheet 33, and a first fixing part 34. And, the second buffer sheet 35, the second fixing part 36, and the deposition mask laminate 50 may be provided. The deposition mask stack 50 may be positioned between the accommodating portion 31 and the cover portion 32 . The deposition mask stack 50 may include the deposition mask 20 described above. As shown in FIG. 2 , the cover portion 32 may be positioned above the housing portion 31 in a state where the deposition mask 20 is wrapped.

The accommodating portion 31 and the cover portion 32 may be bound by an elastic belt 60 . In the example shown in FIG. 2 , the accommodating portion 31 and the lid portion 32 are bound by two elastic belts 60, but the displacement of the accommodating portion 31 and the lid portion 32 can be suppressed. If there is, the number of elastic belts 60 is arbitrary.

As shown in FIGS. 3 and 4 , the accommodating portion 31 may include a first opposing surface 37 . The first opposing surface 37 may be formed flat. Alternatively, the first opposing surface 37 may have small irregularities or not be formed flat, as long as the first cushioning sheet 33 described later can be fixed flat. The same concave portion as the concave portion 39 described later of the cover portion 32 may not be formed on the first opposing surface 37 .

As shown in FIGS. 5 and 6 , the lid portion 32 interposes the first buffer sheet 33 , the deposition mask laminate 50 and the second buffer sheet 35 in the accommodating portion 31 . so it overlaps The lid portion 32 may include a second opposing surface 38 and a concave portion 39 . The second opposing surface 38 faces the first opposing surface 37 of the accommodating portion 31 when the deposition mask 20 is wrapped. The concave portion 39 is located on the second opposing surface 38 and is formed so as to be recessed from the second opposing surface 38 . The second opposing surface 38 may be formed flat in an area other than the concave portion 39 . Alternatively, the second opposing surface 38 may be formed with small concavities and convexities, etc., as long as the second cushioning sheet 35 described later can be fixed in a flat shape in an area other than the concave portion 39. It does not have to be formed as As shown in FIGS. 3 and 7 , the concave portion 39 may be formed in a rectangular shape so as to have a longitudinal direction when viewed in the normal direction N. The longitudinal direction of the concave portion 39 may be along the longitudinal direction of the deposition mask 20 to be wrapped. The longitudinal direction of the concave part 39 may follow the 1st direction D1. The normal direction N may be a direction perpendicular to the first opposing surface 37 or a direction perpendicular to the second opposing surface 38 when the deposition mask 20 is wrapped. The normal direction N may follow the thickness direction of the deposition mask 20 .

As shown in FIG. 7 , the dimension L1 of the concave portion 39 in the first direction D1 may be smaller than the dimension L2 of the deposition mask 20 . In other words, the deposition mask 20 may extend outward from both sides in the first direction D1 with respect to the concave portion 39 . The end portion 21 of the deposition mask 20 in the longitudinal direction may overlap the second opposing surface 38 . When the deposition mask 20 is wrapped, the longitudinal end 21 of the deposition mask 20 may be held between the first opposing surface 37 and the second opposing surface 38 .

In the first direction D1, the dimension L1 of the concave portion 39 may be larger than the dimension L3 of the effective area 23. In the second direction D2 , the dimension W1 of the concave portion 39 may be larger than the dimension W2 of the deposition mask 20 . The concave portion 39 may extend outward from both sides of the deposition mask 20 in the second direction D2 . In this way, the entire effective area 23 may overlap the concave portion 39 . Accordingly, when the deposition mask package 30 receives an upward force or an impact during transportation, the effective region 23 of the deposition mask 20 can be bent into the concave portion 39 . For this reason, plastic deformation of the effective region 23 can be suppressed.

As shown in FIGS. 3 and 4 , the accommodating portion 31 and the cover portion 32 may constitute a packing case 40 . The packing case 40 may include a hinge portion 41 connecting the accommodating portion 31 and the cover portion 32 . In this case, the accommodating part 31 and the lid part 32 are connected via the hinge part 41, and the lid part 32 may be able to rotate with respect to the accommodating part 31. The packing case 40 may be made bendable. The packing case 40 may be expandable as shown in FIGS. 3 and 4 , or may be bendable as shown in FIGS. 2 and 6 .

As shown in FIG. 4 , the accommodating portion 31, the cover portion 32, and the hinge portion 41 may be integrally formed. Between the accommodating part 31 and the hinge part 41, the accommodating part side groove|channel 42 may be formed. Between the hinge part 41 and the cover part 32, the cover part side groove 43 may be formed. In this way, the accommodating part 31 and the cover part 32 may be made relatively rotatable, and the packing case 40 may be made bendable.

The packing case 40 may be formed of one or a plurality of corrugated cardboard sheets 44 . For example, the packing case 40 may be formed by overlapping two corrugated cardboard sheets 44 . Each corrugated cardboard sheet 44 includes two liners and a core having a wavy cross section interposed between the liners. When a plurality of corrugated cardboard sheets 44 are overlapped, the directions in which the wavy ridges or valleys of the cores of adjacent corrugated cardboard sheets 44 extend may be perpendicular to each other. In this case, the mechanical strength of the packing case 40 can be improved. The corrugated cardboard sheet 44 may be made of plastic.

When the packing case 40 is composed of two corrugated cardboard sheets 44, the concave portion 39 of the lid portion 32 may be composed of an opening 44a formed in one of the corrugated cardboard sheets 44. . In this case, the opening 44a may penetrate the corrugated cardboard sheet 44 . The opening 44a is formed in the corrugated cardboard sheet 44 constituting the second opposing surface 38 . The other corrugated cardboard sheet 44 may not have the opening 44a formed.

As shown in FIGS. 5 and 6 , the first cushioning sheet 33 may be positioned on the first opposing surface 37 . The first buffer sheet 33 may be a sheet for suppressing plastic deformation of the deposition mask 20 when the deposition mask package 30 receives a downward force or an impact during transportation. The first buffer sheet 33 may have a degree of flexibility capable of absorbing a force or shock applied to the deposition mask 20 while the deposition mask 20 is wrapped. The first buffer sheet 33 may have a mechanical strength sufficient to support the deposition mask stack 50 .

As shown in FIG. 7 , the first buffer sheet 33 may be formed in a rectangular shape so as to follow the first direction D1 and the second direction D2 when viewed from the normal direction N. The first buffer sheet 33 may have a longitudinal direction along the first direction D1.

The material of the first cushioning sheet 33 is arbitrary. For example, the first buffer sheet 33 may be made of a polyethylene terephthalate (PET) film. A PET film is relatively hard and wrinkles are hard to form. For this reason, plastic deformation of the deposition mask 20 can be effectively suppressed.

The thickness T2 of the first buffer sheet 33 shown in FIG. 5 is arbitrary. For example, the thickness T2 may be, for example, 0.05 mm or more, 0.08 mm or more, or 0.10 mm or more. By setting the thickness T2 to 0.05 mm or more, force or shock can be absorbed and mechanical strength can be secured. The thickness T2 may be, for example, 0.15 mm or less, 0.17 mm or less, or 0.20 mm or less. By setting the thickness T2 to 0.20 mm or less, the thickness of the deposition mask laminate 50 can be suppressed. The range of the thickness T2 may be determined by a first group including 0.05 mm, 0.08 mm, and 0.10 mm, and/or a second group including 0.15 mm, 0.17 mm, and 0.20 mm. The range of the thickness T2 may be determined by a combination of any one of the values included in the first group described above and any one of the values included in the second group described above. The range of the thickness T2 may be determined by any combination of two of the values included in the first group described above. The range of the thickness T2 may be determined by any combination of any two of the values included in the second group described above. For example, it may be 0.05 mm or more and 0.20 mm or less, 0.05 mm or more and 0.17 mm or less, 0.05 mm or more and 0.15 mm or less, 0.05 mm or more and 0.10 mm or less, 0.05 mm or more and 0.08 mm or less, or 0.08 mm or more and 0.20 mm or less, 0.08 mm or more and 0.17 mm or less, 0.08 mm or more and 0.15 mm or less, 0.08 mm or more and 0.10 mm or less, 0.10 mm or more and 0.20 mm or less, 0.10 mm or more and 0.17 mm or less 0.10 mm or more and 0.15 mm or less, 0.15 mm or more and 0.20 mm or less, 0.15 mm or more and 0.17 mm or less, or 0.17 mm or more and 0.20 mm or less may be sufficient.

As shown in FIGS. 5 to 7 , the dimension L4 of the first buffer sheet 33 may be larger than the dimension L2 of the deposition mask 20 in the first direction D1 . The first buffer sheet 33 may extend outward from both sides in the first direction D1 with respect to the deposition mask 20 . In the second direction D2 , the dimension W3 of the first buffer sheet 33 may be larger than the dimension W2 of the deposition mask 20 . The first buffer sheet 33 may extend outward from both sides of the deposition mask 20 in the second direction D2 . In this way, the entire deposition mask 20 may overlap the first buffer sheet 33 . Accordingly, when the deposition mask package 30 receives a downward force or an impact during transport, plastic deformation of the deposition mask 20 can be suppressed.

The first buffer sheet 33 may be coated with an antistatic coating to suppress generation of static electricity. For example, antistatic layers may be formed on both surfaces of the first buffer sheet 33 . An example of the first buffer sheet 33 coated with antistatic coating is polyester synthetic paper K2323-188-690mm manufactured by Toyobo Co., Ltd., sold under the trade name CRISPR (registered trademark).

As shown in FIGS. 5 and 6 , the first fixing part 34 may fix the first cushioning sheet 33 to the first opposing surface 37 . The first fixing part 34 may be interposed between the first opposing surface 37 and the first cushioning sheet 33 .

As shown in FIG. 7 , the first fixing part 34 may be positioned outside the deposition mask 20 when viewed in the normal direction N. The first fixing part 34 may be located inside the outer edge of the first cushioning sheet 33 . The first fixing part 34 may overlap the first buffer sheet 33 or may not overlap the deposition mask 20 . The 1st fixing part 34 may be located outside the recessed part 39 of the cover part 32. The 1st fixing part 34 does not have to overlap with the recessed part 39.

More specifically, as shown in FIGS. 3 and 7 , the first fixing part 34 has two first fixing parts 34 located outside the deposition mask 20 on both sides in the first direction D1. One fixed division member 45 may be included. The deposition mask 20 may be positioned between the two first fixed dividing members 45 , and the first fixed dividing member 45 may not overlap the deposition mask 20 . The 1st fixed division member 45 may extend elongately along the 2nd direction D2. In this case, the first fixed division member 45 may be formed in a rectangular shape with the second direction D2 as the longitudinal direction in plan view. The first fixed dividing member 45 may extend continuously or may be formed intermittently. In this case, the first fixed dividing member 45 may be formed in a rectangular shape having the second direction D2 as the longitudinal direction in plan view, or formed in an arbitrary shape such as a square shape, a circular shape, or an elliptical shape. it may be

The first fixing portion 34 may include two second fixing dividing members 46 positioned outside the deposition mask 20 on both sides in the second direction D2 . The deposition mask 20 may be positioned between the two second fixed dividing members 46 , and the second fixed dividing member 46 may not overlap the deposition mask 20 . The 2nd fixed division member 46 may extend elongately along the 1st direction D1. In this case, the second fixed dividing member 46 may be formed in a rectangular shape with the first direction D1 as the longitudinal direction in plan view. The second fixed dividing member 46 may extend continuously or may be formed intermittently. In this case, the second fixed dividing member 46 may be formed in a rectangular shape having the first direction D1 as the longitudinal direction in plan view, or formed in an arbitrary shape such as a square shape, a circular shape, or an elliptical shape. it may be

3 and 7 , the first fixed dividing member 45 is located on both sides of the second fixed dividing member 46 in the first direction D1, and the first fixed dividing member ( 45) extends in the second direction D2 to an outer edge portion to be described later of the second fixed dividing member 46. However, the second fixed dividing member 46 is located on both sides of the first fixed dividing member 45 in the second direction D2, and the second fixed dividing member 46 is located in the first direction D1. , may be extended to an outer edge portion of the first fixed dividing member 45 described below. Further, a gap may be formed between the first fixed dividing member 45 and the second fixed dividing member 46, or they may be connected without a gap.

The first fixed dividing member 45 and the second fixed dividing member 46 may be formed of double-sided tape. The double-sided tape may include a base material and an adhesive layer positioned on both sides of the base material. The substrate may be made of any synthetic resin. The adhesive layer may be made of any synthetic resin as long as it has adhesiveness. As an example of the double-sided tape, double-sided tape 665 manufactured by 3M sold under the trade name Scotch (registered trademark) is exemplified. However, the first cushioning sheet 33 may be fixed to the first opposing surface 37 with an adhesive. In this case, the first fixed dividing member 45 and the second fixed dividing member 46 may be formed by curing the adhesive.

The thickness T3 of the first fixed dividing member 45 and the second fixed dividing member 46 shown in FIG. 5 is arbitrary. For example, the thickness T3 may be, for example, 0.04 mm or more, 0.06 mm or more, or 0.07 mm or more. The adhesive force can be ensured by setting thickness T3 to 0.04 mm or more. The thickness T3 may be, for example, 0.09 mm or less, 0.10 mm or less, or 1.20 mm or less. By setting the thickness T3 to 1.20 mm or less, deformation of the first cushioning sheet 33 can be suppressed, and the first fixed dividing member 45 and the second fixed dividing member 46 cushion each other. can be suppressed The range of the thickness T3 may be determined by a first group including 0.04 mm, 0.06 mm, and 0.07 mm, and/or a second group including 0.09 mm, 0.10 mm, and 1.20 mm. The range of the thickness T3 may be determined by a combination of any one of the values included in the first group described above and any one of the values included in the second group described above. The range of the thickness T3 may be determined by any combination of any two of the values included in the first group described above. The range of the thickness T3 may be determined by any combination of two of the values included in the above-mentioned second group. For example, it may be 0.04 mm or more and 1.20 mm or less, 0.04 mm or more and 0.10 mm or less, 0.04 mm or more and 0.09 mm or less, 0.04 mm or more and 0.07 mm or less, 0.04 mm or more and 0.06 mm or less, or 0.06 mm or more and 1.20 mm or less, 0.06 mm or more and 0.10 mm or less, 0.06 mm or more and 0.09 mm or less, 0.06 mm or more and 0.07 mm or less, 0.07 mm or more and 1.20 mm or less, 0.07 mm or more and 0.10 mm or less 0.07 mm or more and 0.09 mm or less, 0.09 mm or more and 1.20 mm or less, 0.09 mm or more and 0.10 mm or less, or 0.10 mm or more and 1.20 mm or less may be sufficient.

As shown in FIGS. 5 and 6 , the second cushioning sheet 35 may be positioned on the second opposing surface 38 . The second buffer sheet 35 may be a sheet for suppressing plastic deformation of the deposition mask 20 when the deposition mask package 30 receives an upward force or an impact during transportation. The thickness of the second buffer sheet 35 may be the same as the thickness T2 of the first buffer sheet 33 . The second buffer sheet 35 may be configured similarly to the first buffer sheet 33 described above. For this reason, detailed description of the second buffer sheet 35 is omitted. In the example shown in FIG. 3, the second buffer sheet 35 is omitted for clarity of the drawing.

As shown in FIGS. 5 and 6 , the second fixing part 36 may fix the second cushioning sheet 35 to the second opposing surface 38 . The second fixing part 36 may be interposed between the second opposing surface 38 and the second cushioning sheet 35 .

As shown in FIG. 7 , the second fixing part 36 may be positioned outside the deposition mask 20 when viewed in the normal direction N. The second fixing part 36 may be located inside the outer edge of the second cushioning sheet 35 . The second fixing part 36 may overlap the second buffer sheet 35 or may not overlap the deposition mask 20 . The second fixing part 36 may be located outside the concave part 39 of the lid part 32 . The second fixing part 36 does not have to overlap the concave part 39 .

More specifically, as shown in FIGS. 3 and 7 , the second fixing part 36 has two first fixing parts 36 located outside the deposition mask 20 on both sides in the first direction D1. The three-fixed division member 47 may be included. The deposition mask 20 may be positioned between the two third fixed dividing members 47 , and the third fixed dividing member 47 may not overlap the deposition mask 20 . The 3rd fixed division member 47 may extend elongately along the 2nd direction D2. In this case, the third fixed division member 47 may be formed in a rectangular shape with the second direction D2 as the longitudinal direction in plan view. The 3rd fixed division member 47 may extend continuously or may be formed intermittently. In this case, the third fixed dividing member 47 may be formed in a rectangular shape having the second direction D2 as the longitudinal direction in plan view, or formed in an arbitrary shape such as a square shape, a circular shape, or an elliptical shape. may be The third fixed dividing member 47 may overlap the first fixed dividing member 45 or may not overlap the first fixed dividing member 45 .

The second fixing portion 36 may include two fourth fixing dividing members 48 positioned outside the deposition mask 20 on both sides in the second direction D2 . The deposition mask 20 may be positioned between the two fourth fixed dividing members 48 , and the fourth fixed dividing member 48 may not overlap the deposition mask 20 . The 4th fixed division member 48 may extend elongately along the 1st direction D1. In this case, the fourth fixed dividing member 48 may be formed in a rectangular shape with the first direction D1 as the longitudinal direction in plan view. The fourth fixed dividing member 48 may extend continuously or may be formed intermittently. In this case, the fourth fixed dividing member 48 may be formed in a rectangular shape having the first direction D1 as the longitudinal direction in plan view, or formed in an arbitrary shape such as a square shape, a circular shape, or an elliptical shape. it may be The fourth fixed dividing member 48 may overlap the second fixed dividing member 46 or may not overlap the second fixed dividing member 46 .

3 and 7 , the third fixed dividing member 47 is located on both sides of the fourth fixed dividing member 48 in the first direction D1, and the third fixed dividing member ( 47) extends to an outer edge portion described later of the fourth fixed dividing member 48 in the second direction D2. However, the fourth fixed dividing member 48 is located on both sides of the third fixed dividing member 47 in the second direction D2, and the fourth fixed dividing member 48 is located in the first direction D1. , may be extended to an outer edge portion of the third fixed dividing member 47 described later. Further, a gap may be formed between the third fixed dividing member 47 and the fourth fixed dividing member 48, or they may be connected without a gap.

The third fixed dividing member 47 and the fourth fixed dividing member 48 may be configured similarly to the first fixed dividing member 45 and the second fixed dividing member 46 . For example, the 3rd fixed division member 47 and the 4th fixed division member 48 may be comprised from double-sided tape similarly to the 1st fixed division member 45 and the 2nd fixed division member 46. The thickness of the third fixed dividing member 47 and the fourth fixed dividing member 48 may be the same as the thickness T3 of the first fixed dividing member 45 and the second fixed dividing member 46 described above. Detailed descriptions of the third fixed dividing member 47 and the fourth fixed dividing member 48 are omitted.

As shown in FIGS. 5 and 6 , the deposition mask stack 50 is located between the accommodating portion 31 and the cover portion 32 . More specifically, the deposition mask stack 50 is located between the first buffer sheet 33 and the second buffer sheet 35 . When the deposition mask 20 is wrapped, the deposition mask stack 50 may be held between the accommodating portion 31 and the cover portion 32 .

The deposition mask stack 50 may include one deposition mask 20 and a plurality of insertion sheets 51 . The insertion sheet 51 may be positioned on the first surface 20a and the second surface 20b of the deposition mask 20 . The deposition mask 20 may be positioned between the two insertion sheets 51 , or the deposition mask 20 may be held between the insertion sheets 51 . The first surface 20a of the deposition mask 20 may face the first opposing surface 37 of the accommodating portion 31 . However, the first surface 20a may face the second opposing surface 38 of the lid portion 32 .

The insertion sheet 51 may be positioned between the deposition mask 20 and the first buffer sheet 33 . Between the deposition mask 20 and the first buffer sheet 33, one or a plurality of insertion sheets 51 may be interposed. In this embodiment, two insertion sheets 51 are interposed between the deposition mask 20 and the first buffer sheet 33 . In FIG. 3 , the insertion sheet 51 positioned between the deposition mask 20 and the first buffer sheet 33 is omitted for clarity of the drawing.

The insertion sheet 51 may be positioned between the deposition mask 20 and the second buffer sheet 35 . Between the deposition mask 20 and the second buffer sheet 35, one or a plurality of insertion sheets 51 may be interposed. In this embodiment, two buffer sheets are interposed between the deposition mask 20 and the second buffer sheet 35 .

The insertion sheet 51 prevents the deposition mask 20 from being plastically deformed when the through hole 25 of the deposition mask 20 and the first buffer sheet 33 or the second buffer sheet 35 are caught with each other. It is a sheet to suppress. For this reason, both surfaces of the insertion sheet 51 may be formed in a flat shape. The insertion sheet 51 does not have to be formed with holes or irregularities. The insertion sheet 51 in contact with the deposition mask 20 need not be fixed to the deposition mask 20 . The insertion sheet 51 in contact with the first buffer sheet 33 does not have to be fixed to the first buffer sheet 33 . The insertion sheet 51 in contact with the second buffer sheet 35 need not be fixed to the second buffer sheet 35 .

As shown in FIG. 7 , the insertion sheet 51 may be formed in a rectangular shape so as to follow the first direction D1 and the second direction D2 when viewed from the normal direction N. The insertion sheet 51 may have a longitudinal direction along the first direction D1.

The material of the insertion sheet 51 is arbitrary. For example, the material of the insertion sheet 51 may be a material having a thermal expansion coefficient with a small difference from the thermal expansion coefficient of the deposition mask 20 . For example, the insertion sheet 51 may be made of 42 alloy. 42 alloy may be an iron alloy containing 42% nickel. The insertion sheet 51 may be made of a material containing fibers such as paper, as long as it can be suppressed from being caught in the through hole 25 of the deposition mask 20, for example, it is made of acrylic impregnated paper. There may be. The insertion sheet 51 may be made of the same material as the material of the deposition mask 20 .

The thickness T4 of the insertion sheet 51 shown in FIG. 5 is arbitrary. For example, the thickness T4 may be, for example, 20 μm or more, 70 μm or more, or 100 μm or more. By setting the thickness T4 to 20 μm or more, the mechanical strength of the insertion sheet 51 can be ensured, and the penetration hole 25 of the deposition mask 20 can be prevented from being caught on other members. The thickness T4 may be, for example, 200 μm or less, 250 μm or less, or 300 μm or less. By setting the thickness T4 to 300 μm or less, the thickness of the deposition mask laminate 50 can be suppressed. The range of the thickness T4 may be determined by a first group including 20 μm, 70 μm, and 100 μm, and/or a second group including 200 μm, 250 μm, and 300 μm. The range of the thickness T4 may be determined by a combination of any one of the values included in the first group described above and any one of the values included in the second group described above. The range of the thickness T4 may be determined by any combination of any two of the values included in the first group described above. The range of the thickness T4 may be determined by any combination of two of the values included in the above-mentioned second group. For example, it may be 20 μm or more and 300 μm or less, 20 μm or more and 250 μm or less, 20 μm or more and 200 μm or less, 20 μm or more and 100 μm or less, 20 μm or more and 70 μm or less, or 70 μm or more. ㎛ or more and 300 μm or less, 70 μm or more and 250 μm or less, 70 μm or more and 200 μm or less, 70 μm or more and 100 μm or less, 100 μm or more and 300 μm or less, 100 μm or more and 250 μm or less It may be 100 μm or more and 200 μm or less, 200 μm or more and 300 μm or less, 200 μm or more and 250 μm or less, or 250 μm or more and 300 μm or less.

As shown in FIG. 7 , in the first direction D1 , the dimension L5 of the insertion sheet 51 may be larger than the dimension L2 of the deposition mask 20 . The insertion sheet 51 may extend outward from both sides in the first direction D1 with respect to the deposition mask 20 . In the second direction D2 , the dimension W4 of the insertion sheet 51 may be larger than the dimension W2 of the deposition mask 20 . The insertion sheet 51 may extend outward from both sides in the second direction D2 with respect to the deposition mask 20 . In this way, the deposition mask 20 as a whole may be overlapped with the insertion sheet 51 . As a result, it is possible to suppress the deposition mask 20 from being caught on other members, and to suppress plastic deformation.

In the first direction D1, the dimension L5 of the insertion sheet 51 may be smaller than the dimension L4 of the first cushioning sheet 33. In other words, the first buffer sheet 33 may extend outward from both sides in the first direction D1 with respect to the insertion sheet 51 . In the second direction D2 , the dimension W4 of the insertion sheet 51 may be smaller than the dimension W3 of the first cushioning sheet 33 . In other words, the first buffer sheet 33 may extend outward from both sides in the second direction D2 with respect to the insertion sheet 51 . In this way, the entire insertion sheet 51 may be overlapped with the first cushioning sheet 33 . Similarly, the entire insertion sheet 51 may be overlapped with the second buffer sheet 35 .

As shown in FIG. 7 , when viewed in the normal direction N, the insertion sheet 51 does not need to overlap the first fixing portion 34 . In other words, the first fixing part 34 may be located outside the insertion sheet 51 . The insertion sheet 51 may be positioned between the two first fixed dividing members 45 . The insertion sheet 51 may be positioned between the two second fixed dividing members 46 . The insertion sheet 51 does not need to overlap the first fixed dividing member 45 or the second fixed dividing member 46 .

More specifically, as shown in FIG. 7 , in the first direction D1, the dimension L6 between the two first fixed dividing members 45 is the dimension L5 of the insertion sheet 51. ) may be greater than The dimension L6 is also referred to as the inner dimension of the first fixing part 34 in the first direction D1. The dimension L6 may be a dimension between the inner edge portions of the two first fixed dividing members 45 . The inner edge portion of the first fixed dividing member 45 may be a frame facing the insertion sheet 51 of the first fixed dividing member 45 in plan view.

In the first direction D1, the dimension L7 of the first fixing portion 34 may be smaller than the dimension L4 of the first cushioning sheet 33. The dimension L7 is also referred to as the outer dimension of the first fixing part 34 in the first direction D1. The dimension L7 may be a dimension between the outer edge portions of the two first fixed dividing members 45 . The outer edge portion of the first fixed dividing member 45 may be the edge on the side opposite to the insertion sheet 51 of the first fixed dividing member 45 in plan view.

In the second direction D2, the dimension W5 between the two second fixed dividing members 46 may be larger than the dimension W4 of the insertion sheet 51. The dimension W5 is also referred to as the inner dimension of the first fixing part 34 in the second direction D2. The dimension W5 may be larger than the dimension W1 of the concave portion 39 . The dimension W4 may be a dimension between the inner edge portions of the two second fixed dividing members 46 . The inner edge portion of the second fixed dividing member 46 may be an edge facing the insertion sheet 51 of the second fixed dividing member 46 in plan view.

In the second direction D2, the dimension W6 of the first fixing portion 34 may be smaller than the dimension W3 of the first cushioning sheet 33. The dimension W6 is also referred to as the outer dimension of the first fixing part 34 in the second direction D2. The dimension W6 may be a dimension between the outer edge portions of the two second fixed dividing members 46 . The outer edge portion of the second fixed dividing member 46 may be the edge opposite to the insertion sheet 51 of the second fixed dividing member 46 in a plan view.

The difference between the dimension L6 of the first fixing portion 34 and the dimension L1 of the concave portion 39 is the difference between the dimension W5 of the first fixing portion 34 and the dimension W1 of the concave portion 39. ) may be greater than the difference of In this case, the distance between the first fixed dividing member 45 and the concave portion 39 in the first direction D1 is defined as the distance between the second fixed dividing member 46 and the concave portion 39 in the second direction D2. ), the first fixed dividing member 45 can be separated from the concave portion 39. In this case, overlapping of the longitudinal end portion 21 of the deposition mask 20 with the first fixing portion 34 and the second fixing portion 36 can be suppressed, and the longitudinal end portion 21 facing the second Space for overlapping with the surface 38 can be secured. The dimension W3 of the first buffer sheet 33 and the second buffer sheet 35 in the second direction D2 can be reduced, and the accommodation portion 31 and the cover portion 32 in the second direction D2 ) can be made smaller.

As shown in FIG. 7 , when viewed in the normal direction N, the insertion sheet 51 does not have to overlap the second fixing portion 36 . In other words, the second fixing part 36 may be located outside the insertion sheet 51 . More specifically, the insertion sheet 51 may be positioned between the two third fixed dividing members 47 . The insertion sheet 51 may be positioned between the two fourth fixed dividing members 48 . The insertion sheet 51 does not need to overlap the third fixed dividing member 47 nor need to overlap the fourth fixed dividing member 48 .

The 2nd fixing part 36 may have the same planar shape as the 1st fixing part 34 mentioned above. The 2nd fixing part 36 may have the same inner dimension as the inner dimension L6 of the 1st fixing part 34 mentioned above, and the outer dimension L7 of the 1st fixing part 34 mentioned above You may have the same outer dimension. The 3rd fixed dividing member 47 may overlap so that it may coincide with the 1st fixed dividing member 45 in planar view. However, as long as the third fixed dividing member 47 does not overlap the insertion sheet 51 and the concave portion 39, it may or may not partially overlap the first fixed dividing member 45 in plan view. . The 2nd fixing part 36 may have the same inner dimension as the inner dimension W5 of the 1st fixing part 34 mentioned above, and the outer dimension W6 of the 1st fixing part 34 mentioned above You may have the same outer dimension. The fourth fixed dividing member 48 may overlap so as to coincide with the second fixed dividing member 46 in plan view. However, as long as the fourth fixed dividing member 48 does not overlap the insertion sheet 51 and the recess 39, it may or may not partially overlap the second fixed dividing member 46 in plan view. .

The vapor deposition mask package 30 may be housed in an exterior bag (not shown) and sealed. A drying agent may be accommodated in the sealed bag. In this case, deterioration of the deposition mask 20 due to moisture can be suppressed by drying the air inside the external bag.

Next, the deposition mask wrapping method according to the present embodiment will be described using FIGS. 8 to 13 . The deposition mask wrapping method is a method of wrapping the deposition mask 20 . The deposition mask wrapping method may include a preparatory process, a fixing process, a loading process, a holding process, and a binding process. 8 to 13, cross sections along the second direction D2 are shown.

As a preparatory process, as shown in FIG. 8, you may prepare the packing case 40 containing the accommodating part 31, the lid part 32, and the hinge part 41.

After the preparation step, the first cushioning sheet 33 may be fixed to the first opposing surface 37 as a fixing step. The first buffer sheet 33 may be fixed to the first opposing surface 37 by the first fixing part 34 .

For example, as shown in FIG. 9 , the first fixing division member 45 (see FIGS. 3 and 5 ) constituting the first fixing portion 34 is positioned at a desired position on the first opposing surface 37. fixed on When the first fixed dividing member 45 is made of double-sided tape, the first fixed dividing member 45 is attached to the first opposing surface 37 . Similarly, the second fixed dividing member 46 constituting the first fixing portion 34 is fixed to a desired position on the first opposing surface 37 . The first fixed dividing member 45 and the second fixed dividing member 46 may be fixed so as to be located outside the deposition mask 20 in a fitting step described later when viewed in the normal direction N. The 1st fixed dividing member 45 and the 2nd fixed dividing member 46 may be fixed so that it may be located outside the insertion sheet 51 in the fitting process mentioned later.

After that, as shown in FIG. 10 , the first cushioning sheet 33 is placed on the first opposing surface 37 at a desired position. As a result, the first buffer sheet 33 is adhered to the first fixed dividing member 45 and the second fixed divided member 46, and the first buffer sheet 33 is fixed to the first opposing surface 37. .

Similarly, as a fixing step, the second cushioning sheet 35 may be fixed to the second opposing surface 38 . The second cushioning sheet 35 may be fixed to the second opposing surface 38 by the second fixing part 36 .

For example, as shown in FIG. 9 , the third fixed dividing member 47 (see FIGS. 3 and 5 ) constituting the second fixing portion 36 is positioned at a desired position on the second opposing surface 38. fixed on When the third fixed dividing member 47 is made of a double-sided tape, the third fixed dividing member 47 is attached to the second opposing surface 38 . Similarly, the fourth fixed dividing member 48 constituting the second fixing portion 36 is fixed to a desired position on the second opposing surface 38 . The third fixed dividing member 47 and the fourth fixed dividing member 48 may be fixed so as to be positioned outside the deposition mask 20 in a fitting step described later when viewed in the normal direction N. The 3rd fixed dividing member 47 and the 4th fixed dividing member 48 may be fixed so that it may be located outside the insertion sheet 51 in the fitting process mentioned later.

After that, as shown in FIG. 10 , the second cushioning sheet 35 is placed on the second opposing surface 38 at a desired position. As a result, the second cushioning sheet 35 is adhered to the third fixed dividing member 47 and the fourth fixed dividing member 48, and the second buffering sheet 35 is fixed to the second opposing surface 38. .

After the fixing process, as the loading process, as shown in FIG. 11 , the deposition mask stack 50 including the deposition mask 20 may be loaded on the first buffer sheet 33 .

For example, first, two insertion sheets 51 are stacked on the first cushioning sheet 33 . The insertion sheet 51 is loaded at a desired position on the first cushioning sheet 33 . The insertion sheet 51 may be stacked at a position that does not overlap the first fixing portion 34 when viewed in the normal direction N. The insertion sheet 51 may be loaded in a position where it does not overlap the second fixing part 36 in a holding process described later.

Subsequently, the deposition mask 20 is placed on the insertion sheet 51 . The deposition mask 20 is placed on the insertion sheet 51 at a desired position. The deposition mask 20 is mounted at a position that does not overlap the first fixing part 34 . In this case, when viewed in the normal direction N, the first fixing part 34 is located outside the deposition mask 20 . The deposition mask 20 is loaded at a position that does not overlap the second fixing part 36 in a fitting and holding process described later. In this case, when viewed in the normal direction N, the second fixing part 36 is located outside the deposition mask 20 .

Then, two insertion sheets 51 are placed on the deposition mask 20 . The insertion sheet 51 located above the deposition mask 20 may be placed at the same position as the insertion sheet 51 located below the deposition mask 20 . In this way, the deposition mask stack 50 including the deposition mask 20 and the insertion sheet 51 is placed on the first buffer sheet 33 .

After the mounting step, as shown in FIG. 12 , the deposition mask 20 may be held between the accommodating portion 31 and the cover portion 32 as a holding step. By bending the packing case 40 via the hinge portion 41, the cover portion 32 overlaps the deposition mask stack 50. In this case, the second opposing surface 38 of the lid portion 32 opposes the first opposing surface 37 of the accommodating portion 31 . The second buffer sheet 35 fixed to the second opposing surface 38 is located between the deposition mask stack 50 and the lid 32, and is positioned at the uppermost position of the deposition mask stack 50. It abuts on the insertion sheet 51 to do. In this case, when viewed in the normal direction N, the second fixing part 36 may be positioned outside the deposition mask 20 . Thus, the deposition mask 20 does not have to overlap the second fixing part 36 . The concave portion 39 of the cover portion 32 may overlap the effective region 23 of the deposition mask 20 .

After the clamping step, as shown in FIG. 13 , the accommodating portion 31 and the cover portion 32 are bound by the elastic belt 60 as a binding step. In this way, the deposition mask 20 is wrapped, and the deposition mask package 30 according to the present embodiment is obtained. The deposition mask package 30 may be housed in an exterior bag (not shown).

The vapor deposition mask package 30 obtained as described above is transported to the destination. During transportation, force or impact in the vertical direction may be applied to the deposition mask 20 in some cases. Since the concave portion 39 is not formed on the first opposing surface 37 of the accommodating portion 31, downward bending of the deposition mask 20 can be suppressed. For this reason, plastic deformation of the deposition mask 20 can be suppressed. On the other hand, since the concave portion 39 is formed on the second opposing surface 38 of the cover portion 32, the deposition mask 20 can flex upward elastically. For this reason, the impact applied to the deposition mask 20 can be absorbed, and plastic deformation of the deposition mask 20 can be suppressed.

The deposition mask package 30 that has reached its destination may be unpacked by following a procedure reverse to the deposition mask packing method described above. In this way, the deposition mask 20 can be taken out. In this embodiment, since the deposition mask 20 is held between the insertion sheets 51, it is possible to suppress the deposition mask 20 from being caught on other members when the deposition mask 20 is taken out. . For this reason, while being able to suppress plastic deformation of the deposition mask 20, it is possible to improve the unwrap work efficiency of the deposition mask 20.

Thus, according to this embodiment, the first cushioning sheet 33 is positioned on the first opposing surface 37 of the accommodating portion 31, and the cover portion 32 is placed on the accommodating portion 31, the first cushioning sheet (33) and the deposition mask 20 are interposed therebetween. Accordingly, when the deposition mask 20 receives downward force or impact, the first buffer sheet 33 can absorb the force or impact. Accordingly, plastic deformation of the deposition mask 20 can be suppressed.

Moreover, according to this embodiment, the 1st buffer sheet 33 is fixed to the 1st opposing surface 37 by the 1st fixing part 34. When viewed in the normal direction N, the first fixing part 34 is located outside the deposition mask 20 . Accordingly, overlapping of the first fixing portion 34 with the deposition mask 20 can be suppressed. For this reason, even when the deposition mask 20 is held between the accommodating portion 31 and the cover portion 32, it is possible to suppress the remaining traces of the first fixing portion 34 on the deposition mask 20. there is. As a result, plastic deformation of the deposition mask 20 can be suppressed.

Further, according to the present embodiment, the first buffer sheet 33, when viewed from the normal direction N, has a first direction D1 and a second direction D2 orthogonal to the first direction D1. It is formed in a rectangular shape to follow. The first fixing part 34 includes two first fixing dividing members 45 positioned outside the deposition mask 20 on both sides in the first direction D1. Accordingly, the displacement of the first cushioning sheet 33 with respect to the first opposing surface 37 in the first direction D1 can be suppressed. For this reason, when the deposition mask 20 is placed on the first buffer sheet 33, it is possible to suppress the first buffer sheet 33 from shifting, thereby improving the efficiency of the wrapping operation of the deposition mask 20. can For example, when the first direction D1 is along the longitudinal direction of the deposition mask 20 , displacement of the first buffer sheet 33 can be effectively suppressed.

Further, according to the present embodiment, the first fixing part 34 includes two second fixing dividing members 46 positioned outside the deposition mask 20 on both sides in the second direction D2. are doing Accordingly, the displacement of the first cushioning sheet 33 with respect to the first opposing surface 37 in the second direction D2 can be suppressed. For this reason, when the deposition mask 20 is placed on the first buffer sheet 33, it is possible to suppress the first buffer sheet 33 from shifting, thereby improving the efficiency of the wrapping operation of the deposition mask 20. can

Moreover, according to this embodiment, the 1st fixing part 34 is located outside the insertion sheet 51 when seen from the normal direction N. Thereby, it can suppress that the insertion sheet 51 is deformed according to the thickness of the 1st fixing part 34. For this reason, plastic deformation of the deposition mask 20 by the insertion sheet 51 can be suppressed.

Moreover, according to this embodiment, the accommodating part 31 and the cover part 32 are connected via the hinge part 41. Thereby, the cover part 32 can be easily rotated with respect to the accommodating part 31. For this reason, after the deposition mask 20 and the insertion sheet 51 are placed on the first opposing surface 37 of the accommodating portion 31, the covering portion 32 can be easily overlapped with the deposition mask 20. .

Further, according to the present embodiment, the second cushioning sheet 35 is positioned on the second opposing surface 38 of the cover part 32, and the cover part 32 is located in the accommodating part 31, and the first buffering sheet (33), the deposition mask 20 and the second buffer sheet 35 interposed therebetween. Accordingly, when the deposition mask 20 receives an upward force or impact, the second buffer sheet 35 can absorb the force or impact. Accordingly, plastic deformation of the deposition mask 20 can be suppressed.

Further, according to the present embodiment, the second cushioning sheet 35 is fixed to the second opposing surface 38 by the second fixing part 36 . When viewed in the normal direction N, the second fixing part 36 is located outside the deposition mask 20 . Accordingly, overlapping of the second fixing portion 36 with the deposition mask 20 can be suppressed. For this reason, even when the deposition mask 20 is held between the accommodating portion 31 and the cover portion 32, it is possible to suppress the remaining traces of the second fixing portion 36 on the deposition mask 20. there is. As a result, plastic deformation of the deposition mask 20 can be suppressed.

It is possible to apply various changes to the embodiment described above. Modifications will be described below with reference to drawings as necessary. In the following description and the drawings used in the following description, the same reference numerals as those used for corresponding parts in the above-described embodiment are used for parts that can be configured in the same way as in the above-described embodiment, and overlapping omit the explanation. In addition, in the case where it is clear that the operation and effect obtained in the above-described embodiment can also be obtained in the modified example, the explanation may be omitted.

In this embodiment described above, an example in which the accommodating portion 31 and the cover portion 32 are connected via the hinge portion 41 has been described. However, it is not limited to this. For example, the accommodating part 31 and the cover part 32 may be formed separately. Even in this case, the accommodating portion 31 and the lid portion 32 are bound by the elastic belt 60, and the deposition mask 20 can be held between the accommodating portion 31 and the lid portion 32. .

In this embodiment described above, an example in which the first fixing portion 34 includes two first fixed dividing members 45 and two second fixed dividing members 46 has been described. However, it is not limited to this. For example, the first fixing portion 34 may include a total of three fixing division members 45 and 46 as long as the displacement of the first cushioning sheet 33 can be suppressed. For example, the first fixing portion 34 may include two first fixed dividing members 45 and one second fixed dividing member 46 . Alternatively, the first fixing portion 34 may include one first fixed dividing member 45 and two second fixed dividing members 46 . For example, the first fixing part 34 may include two fixing division members 45 and 46 in total, as long as the displacement of the first cushioning sheet 33 can be suppressed. For example, the first fixing portion 34 may include two first fixing dividing members 45 . Alternatively, the first fixing portion 34 may include two second fixing dividing members 46 . Alternatively, the first fixing portion 34 may include one first fixed dividing member 45 and one second fixed dividing member 46 . The same applies to the second fixing part 36 .

In the present embodiment described above, an example in which the deposition mask stack 50 includes one deposition mask 20 has been described. However, it is not limited to this. For example, as shown in FIG. 14 , the deposition mask stack 50 may include a plurality of deposition masks 20 . In this case, one or a plurality of insertion sheets 51 may be interposed between two adjacent deposition masks 20 . In the example shown in FIG. 14 , two insertion sheets 51 are interposed between two adjacent deposition masks 20 . In this way, when the insertion sheet 51 is interposed between the two adjacent deposition masks 20, it is possible to suppress the deposition masks 20 from being caught with each other. For this reason, plastic deformation of the deposition mask 20 can be suppressed. For example, when two insertion sheets 51 are interposed between two adjacent deposition masks 20, it is possible to effectively suppress the deposition masks 20 from being caught with each other.

Claims (9)

A vapor deposition mask package in which a vapor deposition mask having a plurality of through holes is wrapped therein,
An accommodating portion including a first opposing surface;
A first buffer sheet positioned on the first opposing surface;
a cover portion including a second opposing surface opposite to the first opposing surface of the accommodating portion and overlapping the accommodating portion via the first buffer sheet and the deposition mask;
A first fixing part for fixing the first cushioning sheet to the first opposing surface,
The deposition mask package of claim 1 , wherein the first fixing part is positioned outside the deposition mask when viewed in a direction normal to the first opposing surface. The method of claim 1, wherein the first buffer sheet is formed in a rectangular shape so as to follow a first direction and a second direction orthogonal to the first direction when viewed from the normal direction,
The deposition mask package according to claim 1 , wherein the first fixing part includes two first fixing dividing members positioned outside the deposition mask on both sides in the first direction. 3. The deposition mask package according to claim 2, wherein the first fixing part includes two second fixing dividing members positioned outside the deposition mask on both sides in the second direction. The method according to any one of claims 1 to 3, further comprising an insertion sheet positioned between the deposition mask and the first buffer sheet,
The deposition mask package of claim 1 , wherein the first fixing part is positioned outside the insertion sheet when viewed in the normal direction. The deposition mask package according to any one of claims 1 to 3, wherein the accommodating portion and the cover portion are connected via a hinge portion. The method according to any one of claims 1 to 3, comprising a second buffer sheet located on the second opposing surface,
The deposition mask package according to claim 1 , wherein the cover portion overlaps the accommodating portion with the first buffer sheet, the deposition mask, and the second buffer sheet interposed therebetween. The method of claim 6, further comprising a second fixing part fixing the second cushioning sheet to the second opposing surface,
When viewed in the normal direction, the second fixing part is positioned outside the deposition mask. The deposition mask package according to any one of claims 1 to 3, comprising a deposition mask positioned between the accommodating portion and the cover portion. A deposition mask wrapping method for wrapping a deposition mask having a plurality of through holes formed thereon,
A preparation step of preparing an accommodating portion including a first opposing surface and a cover portion including a second opposing surface;
A fixing step of fixing a first cushioning sheet to the first opposing surface with a first fixing part;
a loading step of loading the deposition mask on the first buffer sheet;
a fitting step of overlapping the covering portion with the deposition mask so that the second opposing surface faces the first opposing surface, and sandwiching the deposition mask between the accommodating portion and the covering portion;
The deposition mask wrapping method of claim 1 , wherein the first fixing part is positioned outside the deposition mask when viewed in a direction normal to the first opposing surface.

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