KR20230074004A - Method for producing AGM peptide that specifically binds to nucleolin - Google Patents
Method for producing AGM peptide that specifically binds to nucleolin Download PDFInfo
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- KR20230074004A KR20230074004A KR1020220155305A KR20220155305A KR20230074004A KR 20230074004 A KR20230074004 A KR 20230074004A KR 1020220155305 A KR1020220155305 A KR 1020220155305A KR 20220155305 A KR20220155305 A KR 20220155305A KR 20230074004 A KR20230074004 A KR 20230074004A
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- South Korea
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- lys
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- leu
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 108090000765 processed proteins & peptides Proteins 0.000 title claims abstract description 35
- 102100021010 Nucleolin Human genes 0.000 title claims abstract description 7
- 108010044762 nucleolin Proteins 0.000 title claims abstract description 7
- 238000000034 method Methods 0.000 claims abstract description 38
- 239000000243 solution Substances 0.000 claims description 125
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 claims description 118
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 117
- 239000011347 resin Substances 0.000 claims description 111
- 229920005989 resin Polymers 0.000 claims description 111
- -1 t-Butyloxycarbonyl Chemical group 0.000 claims description 67
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 49
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 41
- 150000001413 amino acids Chemical class 0.000 claims description 29
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 claims description 28
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 27
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 26
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 26
- 238000011068 loading method Methods 0.000 claims description 26
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 claims description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 24
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims description 21
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 21
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 21
- 102000020313 Cell-Penetrating Peptides Human genes 0.000 claims description 20
- 108010051109 Cell-Penetrating Peptides Proteins 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 16
- 125000006239 protecting group Chemical group 0.000 claims description 16
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims description 14
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 14
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 claims description 14
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 14
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 13
- 229940044174 4-phenylenediamine Drugs 0.000 claims description 13
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 13
- 239000003153 chemical reaction reagent Substances 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- JFLSOKIMYBSASW-UHFFFAOYSA-N 1-chloro-2-[chloro(diphenyl)methyl]benzene Chemical compound ClC1=CC=CC=C1C(Cl)(C=1C=CC=CC=1)C1=CC=CC=C1 JFLSOKIMYBSASW-UHFFFAOYSA-N 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 7
- QRCAKJZXURDSRP-UHFFFAOYSA-N 2-chloropyridine Chemical compound ClC1=NC=CC=C1.ClC1=NC=CC=C1 QRCAKJZXURDSRP-UHFFFAOYSA-N 0.000 claims description 6
- BNIDBPBBKOFHJO-UHFFFAOYSA-N 4-methoxyaniline Chemical compound COC1=CC=C(N)C=C1.COC1=CC=C(N)C=C1 BNIDBPBBKOFHJO-UHFFFAOYSA-N 0.000 claims description 6
- XUJNEKJLAYXESH-UWTATZPHSA-N D-Cysteine Chemical compound SC[C@@H](N)C(O)=O XUJNEKJLAYXESH-UWTATZPHSA-N 0.000 claims description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 6
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 claims description 6
- PEECTLLHENGOKU-UHFFFAOYSA-N n,n-dimethylpyridin-4-amine Chemical compound CN(C)C1=CC=NC=C1.CN(C)C1=CC=NC=C1 PEECTLLHENGOKU-UHFFFAOYSA-N 0.000 claims description 6
- HCZMHWVFVZAHCR-UHFFFAOYSA-N 2-[2-(2-sulfanylethoxy)ethoxy]ethanethiol Chemical compound SCCOCCOCCS HCZMHWVFVZAHCR-UHFFFAOYSA-N 0.000 claims description 5
- 239000003929 acidic solution Substances 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 239000011259 mixed solution Substances 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 229960001592 paclitaxel Drugs 0.000 claims description 4
- 125000001312 palmitoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 claims description 4
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 claims description 3
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 claims description 3
- 238000010532 solid phase synthesis reaction Methods 0.000 claims description 3
- 125000001917 2,4-dinitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C(=C1*)[N+]([O-])=O)[N+]([O-])=O 0.000 claims description 2
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 claims description 2
- HNPWTDUZIXAJSA-UHFFFAOYSA-N 5,5-dimethyl-2-(3-methylbutanoyl)cyclohexane-1,3-dione Chemical group CC(C)CC(=O)C1C(=O)CC(C)(C)CC1=O HNPWTDUZIXAJSA-UHFFFAOYSA-N 0.000 claims description 2
- KDXKERNSBIXSRK-RXMQYKEDSA-N D-lysine Chemical compound NCCCC[C@@H](N)C(O)=O KDXKERNSBIXSRK-RXMQYKEDSA-N 0.000 claims description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical group CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 125000006242 amine protecting group Chemical group 0.000 claims description 2
- 229940107816 ammonium iodide Drugs 0.000 claims description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N guanidine group Chemical group NC(=N)N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 claims description 2
- 125000002883 imidazolyl group Chemical group 0.000 claims description 2
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 claims description 2
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims description 2
- XQABVLBGNWBWIV-UHFFFAOYSA-N 4-methoxypyridine Chemical compound COC1=CC=NC=C1 XQABVLBGNWBWIV-UHFFFAOYSA-N 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 206010028980 Neoplasm Diseases 0.000 abstract description 13
- 201000011510 cancer Diseases 0.000 abstract description 12
- 238000003786 synthesis reaction Methods 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 102000004196 processed proteins & peptides Human genes 0.000 abstract description 6
- 238000003745 diagnosis Methods 0.000 abstract description 3
- 238000012377 drug delivery Methods 0.000 abstract description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 402
- 238000006243 chemical reaction Methods 0.000 description 102
- 238000002360 preparation method Methods 0.000 description 61
- 125000003088 (fluoren-9-ylmethoxy)carbonyl group Chemical group 0.000 description 42
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 description 39
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical compound OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 description 38
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 36
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 28
- 238000003756 stirring Methods 0.000 description 28
- 239000012295 chemical reaction liquid Substances 0.000 description 18
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 14
- 238000004458 analytical method Methods 0.000 description 14
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 14
- 238000000746 purification Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- DVBUCBXGDWWXNY-SFHVURJKSA-N (2s)-5-(diaminomethylideneamino)-2-(9h-fluoren-9-ylmethoxycarbonylamino)pentanoic acid Chemical compound C1=CC=C2C(COC(=O)N[C@@H](CCCN=C(N)N)C(O)=O)C3=CC=CC=C3C2=C1 DVBUCBXGDWWXNY-SFHVURJKSA-N 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- 238000003776 cleavage reaction Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 11
- 239000008213 purified water Substances 0.000 description 11
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000007017 scission Effects 0.000 description 9
- HNICLNKVURBTKV-NDEPHWFRSA-N (2s)-5-[[amino-[(2,2,4,6,7-pentamethyl-3h-1-benzofuran-5-yl)sulfonylamino]methylidene]amino]-2-(9h-fluoren-9-ylmethoxycarbonylamino)pentanoic acid Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1COC(=O)N[C@H](C(O)=O)CCCN=C(N)NS(=O)(=O)C1=C(C)C(C)=C2OC(C)(C)CC2=C1C HNICLNKVURBTKV-NDEPHWFRSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000004108 freeze drying Methods 0.000 description 8
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- 230000008878 coupling Effects 0.000 description 7
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- SWZCTMTWRHEBIN-QFIPXVFZSA-N (2s)-2-(9h-fluoren-9-ylmethoxycarbonylamino)-3-(4-hydroxyphenyl)propanoic acid Chemical compound C([C@@H](C(=O)O)NC(=O)OCC1C2=CC=CC=C2C2=CC=CC=C21)C1=CC=C(O)C=C1 SWZCTMTWRHEBIN-QFIPXVFZSA-N 0.000 description 6
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 6
- CBPJQFCAFFNICX-IBGZPJMESA-N (2s)-2-(9h-fluoren-9-ylmethoxycarbonylamino)-4-methylpentanoic acid Chemical compound C1=CC=C2C(COC(=O)N[C@@H](CC(C)C)C(O)=O)C3=CC=CC=C3C2=C1 CBPJQFCAFFNICX-IBGZPJMESA-N 0.000 description 5
- QXVFEIPAZSXRGM-DJJJIMSYSA-N (2s,3s)-2-(9h-fluoren-9-ylmethoxycarbonylamino)-3-methylpentanoic acid Chemical compound C1=CC=C2C(COC(=O)N[C@@H]([C@@H](C)CC)C(O)=O)C3=CC=CC=C3C2=C1 QXVFEIPAZSXRGM-DJJJIMSYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 229940086542 triethylamine Drugs 0.000 description 5
- IUTPJBLLJJNPAJ-UHFFFAOYSA-N 3-(2,5-dioxopyrrol-1-yl)propanoic acid Chemical compound OC(=O)CCN1C(=O)C=CC1=O IUTPJBLLJJNPAJ-UHFFFAOYSA-N 0.000 description 4
- XZEIEWPMMMPSFY-UHFFFAOYSA-N 4-methoxypyridine Chemical compound COC1=CC=NC=C1.COC1=CC=NC=C1 XZEIEWPMMMPSFY-UHFFFAOYSA-N 0.000 description 4
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 4
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 description 4
- 239000003446 ligand Substances 0.000 description 4
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- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000001291 vacuum drying Methods 0.000 description 4
- BMJRTKDVFXYEFS-MGBGTMOVSA-N (2r)-2,6-bis(9h-fluoren-9-ylmethoxycarbonylamino)hexanoic acid Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1COC(=O)N[C@@H](C(=O)O)CCCCNC(=O)OCC1C2=CC=CC=C2C2=CC=CC=C21 BMJRTKDVFXYEFS-MGBGTMOVSA-N 0.000 description 3
- BUBGAUHBELNDEW-SFHVURJKSA-N (2s)-2-(9h-fluoren-9-ylmethoxycarbonylamino)-4-methylsulfanylbutanoic acid Chemical compound C1=CC=C2C(COC(=O)N[C@@H](CCSC)C(O)=O)C3=CC=CC=C3C2=C1 BUBGAUHBELNDEW-SFHVURJKSA-N 0.000 description 3
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- 238000006845 Michael addition reaction Methods 0.000 description 3
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- RCINICONZNJXQF-MZXODVADSA-N taxol Chemical compound O([C@@H]1[C@@]2(C[C@@H](C(C)=C(C2(C)C)[C@H](C([C@]2(C)[C@@H](O)C[C@H]3OC[C@]3([C@H]21)OC(C)=O)=O)OC(=O)C)OC(=O)[C@H](O)[C@@H](NC(=O)C=1C=CC=CC=1)C=1C=CC=CC=1)O)C(=O)C1=CC=CC=C1 RCINICONZNJXQF-MZXODVADSA-N 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
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- OKDGRDCXVWSXDC-UHFFFAOYSA-N 2-chloropyridine Chemical compound ClC1=CC=CC=N1 OKDGRDCXVWSXDC-UHFFFAOYSA-N 0.000 description 1
- YEDUAINPPJYDJZ-UHFFFAOYSA-N 2-hydroxybenzothiazole Chemical compound C1=CC=C2SC(O)=NC2=C1 YEDUAINPPJYDJZ-UHFFFAOYSA-N 0.000 description 1
- FPQQSJJWHUJYPU-UHFFFAOYSA-N 3-(dimethylamino)propyliminomethylidene-ethylazanium;chloride Chemical compound Cl.CCN=C=NCCCN(C)C FPQQSJJWHUJYPU-UHFFFAOYSA-N 0.000 description 1
- 229960000549 4-dimethylaminophenol Drugs 0.000 description 1
- 208000024172 Cardiovascular disease Diseases 0.000 description 1
- 239000007821 HATU Substances 0.000 description 1
- 239000012317 TBTU Substances 0.000 description 1
- 241000289690 Xenarthra Species 0.000 description 1
- CLZISMQKJZCZDN-UHFFFAOYSA-N [benzotriazol-1-yloxy(dimethylamino)methylidene]-dimethylazanium Chemical compound C1=CC=C2N(OC(N(C)C)=[N+](C)C)N=NC2=C1 CLZISMQKJZCZDN-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000001093 anti-cancer Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- RROBIDXNTUAHFW-UHFFFAOYSA-N benzotriazol-1-yloxy-tris(dimethylamino)phosphanium Chemical compound C1=CC=C2N(O[P+](N(C)C)(N(C)C)N(C)C)N=NC2=C1 RROBIDXNTUAHFW-UHFFFAOYSA-N 0.000 description 1
- 230000005907 cancer growth Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 229940127089 cytotoxic agent Drugs 0.000 description 1
- 231100000135 cytotoxicity Toxicity 0.000 description 1
- 230000003013 cytotoxicity Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- BGRWYRAHAFMIBJ-UHFFFAOYSA-N diisopropylcarbodiimide Natural products CC(C)NC(=O)NC(C)C BGRWYRAHAFMIBJ-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 230000005847 immunogenicity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- BCVXHSPFUWZLGQ-UHFFFAOYSA-N mecn acetonitrile Chemical compound CC#N.CC#N BCVXHSPFUWZLGQ-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
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- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 1
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- 238000006467 substitution reaction Methods 0.000 description 1
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- 231100000057 systemic toxicity Toxicity 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000001225 therapeutic effect Effects 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 239000003053 toxin Substances 0.000 description 1
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- C07K1/00—General methods for the preparation of peptides, i.e. processes for the organic chemical preparation of peptides or proteins of any length
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- C07K1/00—General methods for the preparation of peptides, i.e. processes for the organic chemical preparation of peptides or proteins of any length
- C07K1/06—General methods for the preparation of peptides, i.e. processes for the organic chemical preparation of peptides or proteins of any length using protecting groups or activating agents
- C07K1/061—General methods for the preparation of peptides, i.e. processes for the organic chemical preparation of peptides or proteins of any length using protecting groups or activating agents using protecting groups
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- C07—ORGANIC CHEMISTRY
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- C07K7/00—Peptides having 5 to 20 amino acids in a fully defined sequence; Derivatives thereof
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- C07K7/06—Linear peptides containing only normal peptide links having 5 to 11 amino acids
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- C07K7/08—Linear peptides containing only normal peptide links having 12 to 20 amino acids
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- C07K2319/01—Fusion polypeptide containing a localisation/targetting motif
- C07K2319/03—Fusion polypeptide containing a localisation/targetting motif containing a transmembrane segment
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
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Abstract
Description
본 발명은 뉴클레오린에 특이적으로 결합하는 AGM 펩타이드를 제조하는 방법에 관련된 것이다.The present invention relates to a method for preparing an AGM peptide that specifically binds to nucleolin.
암-특이적 리간드를 약학적 담체로서 이용하는 것은 종래의 약물에 의해 달성되는 것보다 상대적으로 화학요법제제의 조직 또는 세포 특이적 전달을 가능하게 하여, 전신 독성을 감소시킨다(Allen TM. Nat Rev Cancer. 2002;2: 750-63). 암-특이적 리간드 중에서, 나노입자 및 항체는 임상 암 진단 및 치료에서 널리 연구되어왔다(Yao VJ, et al. J Control Release. 2016; 240: 267-86). 초기 단계에서 개별 환자의 암을 감지 및 모니터링하고 치료 효과를 높이기 위해 장기간에 걸쳐 항암제를 전달할 수 있기 때문에, 동시에 진단 및 치료를 할 수 있는(theragnostic) 나노입자와 항체는 개인 맞춤형 의약품 분야에서 큰 가능성을 보이고 있다(Palmieri D, et al. Proc Natl Acad Sci U S A. 2015; 112: 9418-23). 나노입자는 유망한 약물 운반체 시스템이지만, 순환 불안정성, 부적절한 조직 분포 및 세포 독성 때문에 실제 적용에 한계를 나타낸다(Sukhanova A, et al. NanoscaleRes Lett. 2018; 13: 44). 또한, 치료용 항체는 크기가 커서 종양 조직으로의 전달 및 확산이 느리다는 한계가 있다(Epenetos AA, et al. Cancer Res. 1986; 46: 3183-91).The use of cancer-specific ligands as pharmaceutical carriers enables tissue- or cell-specific delivery of chemotherapeutic agents relative to that achieved by conventional drugs, thereby reducing systemic toxicity (Allen TM. Nat Rev Cancer 2002;2: 750-63). Among cancer-specific ligands, nanoparticles and antibodies have been widely studied in clinical cancer diagnosis and treatment (Yao VJ, et al. J Control Release. 2016; 240: 267-86). Theragnostic nanoparticles and antibodies have great promise in the field of personalized medicine, as they can detect and monitor cancer in individual patients at an early stage and deliver anti-cancer drugs over a long period of time to increase the effectiveness of treatment. (Palmieri D, et al. Proc Natl Acad Sci USA. 2015; 112: 9418-23). Although nanoparticles are promising drug carrier systems, their practical application is limited due to circulatory instability, inadequate tissue distribution and cytotoxicity (Sukhanova A, et al. NanoscaleRes Lett. 2018; 13: 44). In addition, therapeutic antibodies have limitations in that delivery and diffusion to tumor tissues are slow due to their large size (Epenetos AA, et al. Cancer Res. 1986; 46: 3183-91).
고전적인 진단 및 치료 방법에 대한 대안으로, 치료 효율을 높이고 나노입자 및 항체 암 치료법과 관련된 부작용을 줄이기 위해서, 암-특이 펩타이드가 사용될 수 있다(Mori T. Curr Pharm Des. 2004; 10: 2335-43). 펩타이드 리간드는 쉬운 대량 합성, 낮은 면역원성, 무독성 대사산물의 생성 및 높은 in vivo 생체적합성을 포함하여 많은 장점을 가지고 있다(McGregor DP. Curr Opin Pharmacol. 2008; 8: 616-9). As an alternative to classical diagnostic and treatment methods, cancer-specific peptides can be used to increase treatment efficiency and reduce side effects associated with nanoparticle and antibody cancer therapies (Mori T. Curr Pharm Des. 2004; 10: 2335- 43). Peptide ligands have many advantages, including facile large-scale synthesis, low immunogenicity, generation of non-toxic metabolites, and high in vivo biocompatibility (McGregor DP. Curr Opin Pharmacol. 2008; 8: 616-9).
본 연구자들은 선행연구로서 암세포에 특이적으로 결합하며, 항암제와의 접합체가 암 성장을 억제하는 AGM 펩타이드라 명명된 펩타이드 리간드 시리즈들을 발명하였다(Jae Il Kim, et al. Theranostics 2020. Vol. Issue 20).As a preceding study, the present researchers invented a series of peptide ligands named AGM peptides that specifically bind to cancer cells and inhibit cancer growth when conjugated with anticancer drugs (Jae Il Kim, et al. Theranostics 2020. Vol. Issue 20 ).
상기 펩타이드는 암 세포에 특이적으로 결합하는 AGM 펩타이드 또는 AGM 펩타이드-PEG 접합체, 암세포에 특이적으로 결합하고 항암활성을 나타내는 AGM 펩타이드-PEG-약물 접합체, 암세포에 특이적으로 결합하며 세포투과성 펩타이드가 결합된 AGM-펩타이드-PEG-CPP 융합 펩타이드를 포함한다.The peptide is an AGM peptide or AGM peptide-PEG conjugate that specifically binds to cancer cells, an AGM peptide-PEG-drug conjugate that specifically binds to cancer cells and exhibits anticancer activity, and a cell-penetrating peptide that specifically binds to cancer cells. and a conjoined AGM-peptide-PEG-CPP fusion peptide.
본 연구자들은 선행연구로서 발명한 상기 AGM 펩타이드 만의 특이적이고 최적화된 제조방법을 개발하고자 하였고, 이하 이를 제시하고자 한다.The present researchers tried to develop a specific and optimized manufacturing method for the AGM peptide, which was invented as a prior study, and will be presented below.
본 발명은 뉴클레오린에 특이적으로 결합하는 AGM 펩타이드를 제조하는 방법을 제공함에 그 목적이 있다.An object of the present invention is to provide a method for preparing an AGM peptide that specifically binds to nucleolin.
본 발명이 이루고자 하는 기술적 과제는 이상에서 언급한 기술적 과제로 제한되지 않으며, 언급되지 않은 또 다른 기술적 과제들은 아래의 기재로부터 당업계 통상의 기술자에게 명확하게 이해될 수 있을 것이다.The technical problem to be achieved by the present invention is not limited to the above-mentioned technical problem, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.
본 명세서에서 특별한 표시가 없는 한, 아미노산 및 보호기의 지정에 사용되는 약어는 IUPAC-IUB의 생화학 용어 위원회 (Commission of Biochemical Nomenclature)에서 권장하는 용어에 기초한다 (Biochemistry, 11:1726-1732(1972); Pure & Appl. Chem., Vol. 56, No. 5, pp. 595-624, 1984).Unless otherwise indicated herein, the abbreviations used for the designation of amino acids and protecting groups are based on terms recommended by the Commission of Biochemical Nomenclature of IUPAC-IUB (Biochemistry, 11:1726-1732 (1972)). (Pure & Appl. Chem., Vol. 56, No. 5, pp. 595-624, 1984).
본 발명의 일 양태로서, 다음의 단계를 포함하는, 뉴클레오린(Nucleolin)에 특이적으로 결합하는 AGM 펩타이드를 제조하는 방법을 제공한다:As one aspect of the present invention, there is provided a method for producing an AGM peptide that specifically binds to nucleolin, comprising the following steps:
(a) 고체상(solid-phase) 합성 방법으로 레진이 부착된 하기 화학식 20으로 표시되는 펩타이드를 수득하는 단계; 및(a) obtaining a resin-attached peptide represented by Formula 20 by a solid-phase synthesis method; and
(b) 상기 단계 (a)에서 수득한 펩타이드에서 레진과 보호기를 제거하여, 하기 화학식 22로 표시되는 펩타이드를 수득하는 단계:(b) removing a resin and a protecting group from the peptide obtained in step (a) to obtain a peptide represented by Formula 22:
[화학식 20][Formula 20]
Am-dKn-dC-O-ResinA m -dK n -dC-O-Resin
[화학식 21][Formula 21]
Arg(R1)-His(R2)-Gly-Ala-Met-Val-Tyr(R3)-Leu-Lys(R4)-PEGk-D-Lys{Arg(R1)-His(R2)-Gly-Ala-Met-Val-Tyr(R3)-Leu-Lys(R4)-PEGk}Arg(R 1 )-His(R 2 )-Gly-Ala-Met-Val-Tyr(R 3 )-Leu-Lys(R 4 )-PEG k -D-Lys{Arg(R 1 )-His(R 2 )-Gly-Ala-Met-Val-Tyr(R 3 )-Leu-Lys(R 4 )-PEG k }
[화학식 22][Formula 22]
Bm-dKn-dC-OHB m -dK n -dC-OH
[화학식 23][Formula 23]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEGk-D-Lys{Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEGk}Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG k -D-Lys {Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG k }
(상기 화학식 20 내지 23에 있어서, 상기 A는 하기 화학식 21로 표시되고, 상기 B는 하기 화학식 23으로 표시되며, (In
상기 R1은 구아니딘 보호기, 상기 R2는 이미다졸 보호기 또는 티오 보호기, 상기 R3는 수소 또는 히드록시 보호기, R4는 수소 또는 아민 보호기이고,R 1 is a guanidine protecting group, R 2 is an imidazole protecting group or a thio protecting group, R 3 is hydrogen or a hydroxy protecting group, and R 4 is hydrogen or an amine protecting group;
상기 dK와 dC는 각각 D-Lys과 D-Cys를 의미하며,The dK and dC mean D-Lys and D-Cys, respectively,
상기 m과 n은 각각 1과 0 또는 2와 1이고,wherein m and n are 1 and 0 or 2 and 1, respectively;
상기 k는 4 내지 20 중 어느 하나의 정수임).Wherein k is any one integer from 4 to 20).
상기 R1은 터트-부틸옥시카보닐기(t-Butyloxycarbonyl), 벤질옥시카보닐기(Benzyloxycarbonyl), 니트로기(Nitro), Pmc기(2,2,5,7,8-pentamethylchroman-6-sulfonyl), Mtr기(4-methoxy-2,3,6-trimethylbenzene sulfonyl), Mts기(2,3,6-trimethyl Benzenesulfonyl), Mtb기 (trimethoxybenzenesulfonyl), Mds기(4-methoxy-2,6-dimethylbenzenesulfonyl), MIS기(1,2-Dimethylindole-3-sulfonyl), EDOT-2-sulfonyl기(3,4-ethylenedioxythiophene-2-sulfonyl), Pbf기(2,2,4,6,7-pentamethyldihydrobenzofuran-5-sulfonyl) 또는 Tos기(4-Toluenesulphonyl)일 수 있고, 바람직한 일 실시예에 따를 때 Pbf기일 수 있으나, 이에 제한되는 것은 아니다.Wherein R 1 is tert-butyloxycarbonyl group (t-Butyloxycarbonyl), benzyloxycarbonyl group (Benzyloxycarbonyl), nitro group (Nitro), Pmc group (2,2,5,7,8-pentamethylchroman-6-sulfonyl), Mtr group (4-methoxy-2,3,6-trimethylbenzene sulfonyl), Mts group (2,3,6-trimethyl Benzenesulfonyl), Mtb group (trimethoxybenzenesulfonyl), Mds group (4-methoxy-2,6-dimethylbenzenesulfonyl), MIS group (1,2-Dimethylindole-3-sulfonyl), EDOT-2-sulfonyl group (3,4-ethylenedioxythiophene-2-sulfonyl), Pbf group (2,2,4,6,7-pentamethyldihydrobenzofuran-5-sulfonyl ) or Tos group (4-Toluenesulphonyl), and according to a preferred embodiment, it may be a Pbf group, but is not limited thereto.
상기 R2는 메틸기(Methyl), 터트-부틸옥시카보닐기,(tert-Buthyloxycarbonyl) 트리페닐메틸기(Triphenylmethyl), Mmt기(4-Monomethoxytrityl), BOM기(Benzyloxymethylacetal), MBom기(3-methoxybebzyloxymethyl) 또는 Mtt기(methyltrityl)일 수 있고, 바람직한 일 실시예에 따를 때 트리페닐메틸기일 수 있으나, 이에 제한되는 것은 아니다.Wherein R 2 is a methyl group (Methyl), tert-butyloxycarbonyl group, (tert-Butyloxycarbonyl) triphenylmethyl group (Triphenylmethyl), Mmt group (4-Monomethoxytrityl), BOM group (Benzyloxymethylacetal), MBom group (3-methoxybebzyloxymethyl), or It may be an Mtt group (methyltrityl), and according to a preferred embodiment, it may be a triphenylmethyl group, but is not limited thereto.
상기 R3는 수소, 터트-부틸기(t-Butyl), 트리페닐메틸기(triphenylmethyl), 2-클로로트리페닐메틸기(2-chlorotriphenylmethyl) 벤질기(Benzyl), 페닐기(phenyl), 알릴기(allyl), 메틸기(methyl), 벤질포스포기(benzyl phospho), SO3nP기(2,2-dimethylpropylsulfo), 포스포기(phosphor), Clt기(2-chlorotrityl), DMAE기(dimethylaminoethyl), 프로파질기(propargyl) 또는 PO(NMe2)2)기(bis-dimethylamino-phosphono)일 수 있고, 바람직한 일 실시예에 따를 때 터트-부틸기(t-Butyl)일 수 있으나, 이에 제한되는 것은 아니다.Wherein R 3 is hydrogen, tert-butyl group (t-Butyl), triphenylmethyl group (triphenylmethyl), 2-chlorotriphenylmethyl group (2-chlorotriphenylmethyl) benzyl group (Benzyl), phenyl group (phenyl), allyl group (allyl) , methyl group (methyl), benzyl phospho group (benzyl phospho), SO3nP group (2,2-dimethylpropylsulfo), phospho group (phosphor), Clt group (2-chlorotrityl), DMAE group (dimethylaminoethyl), propargyl group (propargyl) Alternatively, it may be a PO(NMe 2 ) 2 ) group (bis-dimethylamino-phosphono), and according to a preferred embodiment, it may be a tert-butyl group (t-Butyl), but is not limited thereto.
상기 R4는 수소, 터트-부틸옥시카보닐기(tert-Buthyloxycarbonyl), 트리페닐메틸기(triphenylmethyl), Dde기((4,4-dimethyl-2,6-dioxocyclohex-1-ylidene)ethyl), Ddiv기((4,4-dimethyl-2,6-dioxocyclohex-1-ylidene)-3-methylbuty), Alloc기(Allyloxycarbonyl), 메틸기(methyl), 메틸, 터트-부틸옥시카보닐기(methyl, tert-Buthyloxycarbonyl), Dnp기(2,4-dinitrophenyl), 헥사데카노일기(hexadecanoyl), Mmt기(4-Monomethoxytrityl), Mtt기(methyltrityl), Mca기(7-methoxycoumarin-4-acetyl), 9-플루오레닐메틸카보닐기(9-Fluorenylmethylcarbonyl), 벤질옥시카보닐기, pNZ기(p-Nitrobenzyloxycarbonyl), 아지도기(Azido), 아세틸기(Acetyl), Pryoc기(Propargyloxycarbonyl) 또는 트리플루오로아세틸기(Trifluoroacetyl)일 수 있고, 바람직한 일 실시예에 따를 때 터트-부틸옥시카보닐기(tert-Buthyloxycarbonyl)일 수 있으나, 이에 제한되는 것은 아니다.R 4 is hydrogen, tert-butyloxycarbonyl group, triphenylmethyl group, Dde group ((4,4-dimethyl-2,6-dioxocyclohex-1-ylidene)ethyl), Ddiv group ((4,4-dimethyl-2,6-dioxocyclohex-1-ylidene)-3-methylbuty), Alloc group (Allyloxycarbonyl), methyl group (methyl), methyl, tert-Butyloxycarbonyl group (methyl, tert-Butyloxycarbonyl) , Dnp group (2,4-dinitrophenyl), hexadecanoyl group (hexadecanoyl), Mmt group (4-Monomethoxytrityl), Mtt group (methyltrityl), Mca group (7-methoxycoumarin-4-acetyl), 9-fluorenyl Methylcarbonyl group (9-Fluorenylmethylcarbonyl), benzyloxycarbonyl group, pNZ group (p-Nitrobenzyloxycarbonyl), azido group (Azido), acetyl group (Acetyl), Pryoc group (Propargyloxycarbonyl) or trifluoroacetyl group (Trifluoroacetyl) And, according to a preferred embodiment, it may be a tert-butyloxycarbonyl group, but is not limited thereto.
상기 작용기에 대한 보호기는 Protecting Groups in Organic Synthesis (Greene and Wuts, John Wiley & Sons, 1991)에 상세히 기재되어 있다.Protecting groups for these functional groups are described in detail in Protecting Groups in Organic Synthesis (Greene and Wuts, John Wiley & Sons, 1991).
상기 레진은 2-클로로트리틸 레진(2-Chlorotrityl), 트리틸 레진(Trityl), 4-메틸트리틸 레진(4-Methyltrityl) 또는 4-메톡시트리틸 레진(4-Methoxytrityl)일 수 있고, 바람직한 일 실시예에 따를 때 2-클로로트리틸 레진일 수 있으나, 이에 제한되는 것은 아니다.The resin may be 2-Chlorotrityl, Trityl, 4-Methyltrityl or 4-Methoxytrityl, According to a preferred embodiment, it may be 2-chlorotrityl resin, but is not limited thereto.
상기 레진은 디클로로메탄(Dichloromethane), 테트라히드로퓨란(Tetrahydrofurane), 에틸아세테이트(Ethylacetate), 아세톤(Acetone), 디메틸포름아마이드(Dimethylformamide). 아세토니트릴(Acetonitrile) 및 디메틸설폭사이드(Dimethylsulfoxide)로 이루어진 군으로부터 선택된 하나 이상의 용매와 혼합될 수 있고, 바람직한 일 실시예에 따를 때 디클로로메탄(Dichloromethane; DCM)과 혼합될 수 있으나, 이에 제한되는 것은 아니다.The resin is dichloromethane, tetrahydrofurane, ethylacetate, acetone, and dimethylformamide. It may be mixed with one or more solvents selected from the group consisting of acetonitrile and dimethylsulfoxide, and according to a preferred embodiment, it may be mixed with dichloromethane (DCM), but is limited thereto no.
상기 단계 (a)는 고체상 합성 방법으로서 아미노산을 순차적으로 연결시켜 나가는 형태의 합성 방법일 수 있다. 이러한 경우, 상기 단계 (a)는 첫번째 아미노산을 레진에 로딩하는 단계를 포함할 수 있고, 최종 수득 펩타이드에 대한 높은 순도와 높은 수율을 달성하기 위해 특정 첫번째 아미노산의 선택, 특정 레진 대비 당량, 특정 로딩율, 특정 반응용액, 특정 부가단계 등을 가질 수 있다.The step (a) may be a solid-phase synthesis method in which amino acids are sequentially linked. In this case, the step (a) may include loading the first amino acid into the resin, and in order to achieve high purity and high yield of the final peptide, selection of a specific first amino acid, equivalent weight relative to a specific resin, and specific loading It can have a specific reaction rate, specific reaction solution, specific addition step, etc.
상기 단계 (a)는 DCM(Dichloromethane)과 혼합된 레진에, 첫번째 아미노산과 하기 염기 시약들로 이루어진 군에서 선택된 어느 하나를 함께 반응시켜, 상기 레진에 첫번째 아미노산을 로딩하는 단계를 포함하는 것인 방법일 수 있으나, 하기 나열된 염기 시약들로 제한되는 것은 아니다:The step (a) comprises the step of loading the first amino acid into the resin by reacting a first amino acid with one selected from the group consisting of the following base reagents in a resin mixed with DCM (Dichloromethane). , but is not limited to the base reagents listed below:
피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene). Pyridine, Imidazole, Pyrrolidine, Cyclohexylamine, Morpholine, Piperidine, 4-Methoxypyridine, 2 -Chloropyridine (2-Chloropyridine), 4-dimethylaminopyridine (4-Dimethylaminopyridine), aniline (Aniline), 4-Methoxyaniline (4-Methoxyaniline), 4-phenylenediamine (4-Phenylenediamine), ethylamine ( Ethylamine), diethylamine, triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene).
상기 단계 (a)는 상기 레진에 첫번째 아미노산을 로딩한 후, DCM, MeOH(Methanol) 및 하기 염기 시약들로 이루어진 군에서 선택된 어느 하나를 포함하는 용액과 반응시켜 캡핑(capping)하는 단계를 더 포함하는 것인 방법일 수 있으나, 하기 나열된 염기 시약들로 제한되는 것은 아니다:The step (a) further comprises loading the first amino acid on the resin, followed by capping by reacting with a solution containing any one selected from the group consisting of DCM, MeOH (Methanol), and the following base reagents. It may be a method of doing, but is not limited to the base reagents listed below:
피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene).Pyridine, Imidazole, Pyrrolidine, Cyclohexylamine, Morpholine, Piperidine, 4-Methoxypyridine, 2 -Chloropyridine (2-Chloropyridine), 4-dimethylaminopyridine (4-Dimethylaminopyridine), aniline (Aniline), 4-Methoxyaniline (4-Methoxyaniline), 4-phenylenediamine (4-Phenylenediamine), ethylamine ( Ethylamine), diethylamine, triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene).
상기 캡핑하는 단계는 DCM, MeOH 및 하기 염기 시약들로 이루어진 군에서 선택된 어느 하나를, (10 내지 20): (1 내지 5): (1)의 부피비(v/v), (11 내지 20): (1 내지 5): (1)의 부피비(v/v), (12 내지 20): (1 내지 5): (1)의 부피비(v/v), (13 내지 20): (1 내지 5): (1)의 부피비(v/v), (14 내지 20): (1 내지 5): (1)의 부피비(v/v), (15 내지 20): (1 내지 5): (1)의 부피비(v/v), (15 내지 20): (1 내지 4): (1)의 부피비(v/v) 또는 (15 내지 20): (1 내지 3): (1)의 부피비(v/v)로 포함하는 용액과 반응시키는 것인 방법일 수 있으나, 하기 나열된 염기 시약들과 상기 부피비로 제한되는 것은 아니다:In the capping step, DCM, MeOH, and any one selected from the group consisting of the following base reagents, (10 to 20): (1 to 5): volume ratio (v / v) of (1), (11 to 20) : (1 to 5): (1) volume ratio (v / v), (12 to 20): (1 to 5): (1) volume ratio (v / v), (13 to 20): (1 to 5): (1) volume ratio (v / v), (14 to 20): (1 to 5): (1) volume ratio (v / v), (15 to 20): (1 to 5): ( 1) volume ratio (v / v), (15 to 20): (1 to 4): (1) volume ratio (v / v) or (15 to 20): (1 to 3): (1) volume ratio It may be a method of reacting with a solution containing (v / v), but is not limited to the base reagents listed below and the above volume ratio:
피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene).Pyridine, Imidazole, Pyrrolidine, Cyclohexylamine, Morpholine, Piperidine, 4-Methoxypyridine, 2 -Chloropyridine (2-Chloropyridine), 4-dimethylaminopyridine (4-Dimethylaminopyridine), aniline (Aniline), 4-Methoxyaniline (4-Methoxyaniline), 4-phenylenediamine (4-Phenylenediamine), ethylamine ( Ethylamine), diethylamine, triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene).
상기 단계 (a)는 디클로로메탄(Dichloromethane), 테트라히드로퓨란(Tetrahydrofurane), 에틸아세테이트(Ethylacetate), 아세톤(Acetone), 디메틸포름아마이드(Dimethylformamide). 아세토니트릴(Acetonitrile) 및 디메틸설폭사이드(Dimethylsulfoxide)로 이루어진 군으로부터 선택된 하나 이상의 용매 조건 하에서 수행될 수 있고, 바람직한 일 실시예에 따를 때 디클로로메탄 용매 조건 하에서 수행될 수 있으나, 이에 제한되는 것은 아니다.Step (a) is dichloromethane, tetrahydrofurane, ethyl acetate, acetone, dimethylformamide. Acetonitrile (Acetonitrile) and dimethyl sulfoxide (Dimethylsulfoxide) can be carried out under the conditions of one or more solvents selected from the group consisting of, according to a preferred embodiment it can be carried out under dichloromethane solvent conditions, but is not limited thereto.
상기 단계 (a)는 피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene)로 이루어진 군에서 선택된 하나 이상의 염기 시약 조건 하에서 수행될 수 있고, 바람직한 일 실시예에 따를 때 피페리딘 또는 DIPEA(또는 DIEA) 염기 시약 조건 하에서 수행될 수 있으나, 이에 제한되는 것은 아니다.Step (a) is pyridine, imidazole, pyrrolidine, cyclohexylamine, morpholine, piperidine, 4-methoxypyridine ( 4-Methoxypyridine), 2-Chloropyridine, 4-Dimethylaminopyridine, Aniline, 4-Methoxyaniline, 4-phenylenediamine Phenylenediamine), Ethylamine, Diethylamine, Triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene) It may be performed under one or more base reagent conditions selected from the group consisting of, and according to a preferred embodiment, it may be performed under piperidine or DIPEA (or DIEA) base reagent conditions, but is not limited thereto.
상기 단계 (a)는 DCC(N,N′-Dicyclohexylcarbodiimide), DIC(N,N'-Diisopropylcarbodiimide), BOP(Benzotriazol-1-yloxytris(dimethylamino)phosphonium hexafluorophosphate), PyBOP(Benzotriazol-1-yloxytripyrrolidinophosphonium hexafluorophosphate), HBTU(2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyluronium hexafluorophosphate), TBTU(2-(1H-Benzotriazole-1-yl)-1,1,3,3-tetramethylaminium tetrafluoroborate), HATU(1-[Bis(dimethylamino)methylene]-1H-1,2,3-triazolo[4,5-b]pyridinium 3-oxide hexafluorophosphate), TATU(1-[Bis(dimethylamino)methylene]-1H-1,2,3-triazolo[4,5-b]pyridinium 3-Oxide Tetrafluoroborate), CDI(1,1'-Carbonyldiimidazole), HOBt(Hydroxybenzotriazole) 및 EDC·HCl(1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide)로 이루어진 군에서 선택된 하나 이상의 결합 시약 조건 하에서 수행될 수 있고, 바람직한 일 실시예에 따를 때 HBTU 또는 HOBt 결합 시약 조건 하에서 수행될 수 있으나, 이에 제한되는 것은 아니다.In step (a), DCC (N, N′-Dicyclohexylcarbodiimide), DIC (N, N′-Diisopropylcarbodiimide), BOP (Benzotriazol-1-yloxytris (dimethylamino) phosphonium hexafluorophosphate), PyBOP (Benzotriazol-1-yloxytripyrrolidinophosphonium hexafluorophosphate), HBTU(2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyluronium hexafluorophosphate), TBTU(2-(1H-Benzotriazole-1-yl)-1,1,3,3-tetramethylaminium tetrafluoroborate ), HATU(1-[Bis(dimethylamino)methylene]-1H-1,2,3-triazolo[4,5-b]pyridinium 3-oxide hexafluorophosphate), TATU(1-[Bis(dimethylamino)methylene]-1H -1,2,3-triazolo[4,5-b]pyridinium 3-Oxide Tetrafluoroborate), CDI (1,1'-Carbonyldiimidazole), HOBt (Hydroxybenzotriazole) and EDC HCl (1-Ethyl-3-(3- dimethylaminopropyl) carbodiimide), and according to a preferred embodiment, it may be performed under conditions of HBTU or HOBt binding reagent, but is not limited thereto.
구체적인 일 실시예에 따를 때, 상기 단계 (a)는 첫번째 아미노산으로 D-Cys(R2)를 선택하여 상기 레진에 로딩하는 단계를 포함할 수 있으나, 어떠한 반응용액 등의 조건을 선택하는지에 따라 달라질 수 있을 것이며, 이에 제한되는 것은 아니다.According to a specific embodiment, the step (a) may include selecting D-Cys (R 2 ) as the first amino acid and loading it into the resin, but depending on which reaction solution or other conditions are selected, may vary, but is not limited thereto.
구체적으로, 상기 단계 (a)는 레진의 몰수 대비 0.1 내지 0.5, 0.1 내지 0.45, 0.1 내지 0.4, 0.1 내지 0.35 또는 0.1 내지 0.3 당량의 첫번째 아미노산을 상기 레진에 로딩하는 단계를 포함할 수 있으나, 이에 제한되는 것은 아니다.Specifically, the step (a) may include loading the resin with the first amino acid in an amount of 0.1 to 0.5, 0.1 to 0.45, 0.1 to 0.4, 0.1 to 0.35, or 0.1 to 0.3 equivalents based on the number of moles of the resin. It is not limited.
구체적으로, 상기 단계 (a)는 0.1 내지 0.5, 0.1 내지 0.45, 0.1 내지 0.4, 0.1 내지 0.35 또는 0.1 내지 0.3 mmol/g의 로딩율로 첫번째 아미노산을 상기 레진에 로딩하는 단계를 포함할 수 있으나, 이에 제한되는 것은 아니다.Specifically, step (a) may include loading the first amino acid into the resin at a loading rate of 0.1 to 0.5, 0.1 to 0.45, 0.1 to 0.4, 0.1 to 0.35, or 0.1 to 0.3 mmol/g, It is not limited thereto.
상기 단계 (b)는 산성 용액의 존재 하에서 수행되는 것일 수 있다.The step (b) may be performed in the presence of an acidic solution.
구체적으로, 상기 단계 (b)는 삼불화초산(TFA), 트리이소프로필실렌(TIS), 에틸렌디옥시디에산싸이올(DODT), 디메틸설파이드(DMS) 및 아이오딘화암모늄(NH4I)으로 이루어진 군에서 선택된 것들의 조합을 포함하는 혼합용액의 존재 하에서 수행될 수 있고, 바람직한 일 실시예에 따를 때 이들 모두를 포함할 수 있으며, 당업자의 실시 조건에 따라 정제수를 더 포함할 수 있으나, 이에 제한되는 것은 아니다.Specifically, the step (b) is trifluoroacetic acid (TFA), triisopropylsilene (TIS), ethylenedioxydiesate acid thiol (DODT), dimethyl sulfide (DMS) and ammonium iodide (NH 4 I) It may be performed in the presence of a mixed solution containing a combination of those selected from the group consisting of, and may include all of them according to a preferred embodiment, and may further include purified water according to the practice conditions of those skilled in the art, It is not limited thereto.
보다 구체적인 일 실시예로서, 상기 단계 (b)는 삼불화초산(TFA), 트리이소프로필실렌(TIS), 에틸렌디옥시디에산싸이올(DODT), 디메틸설파이드(DMS) 및 정제수를 (30 내지 40): (1): (1): (1 내지 5): (1 내지 5) 부피비(v/v), 또는 (30 내지 40): (1): (1): (1 내지 3): (1 내지 4) 부피비(v/v), 또는 (30 내지 40): (1): (1): (1 내지 3): (1 내지 3) 부피비(v/v)로 포함하는 혼합용액의 존재 하에서 수행될 수 있으나, 이에 제한되는 것은 아니다.As a more specific embodiment, the step (b) includes trifluoroacetic acid (TFA), triisopropylsilene (TIS), ethylenedioxydiesatethiol (DODT), dimethylsulfide (DMS) and purified water (30 to 40): (1): (1): (1 to 5): (1 to 5) volume ratio (v/v), or (30 to 40): (1): (1): (1 to 3): (1 to 4) volume ratio (v / v), or (30 to 40): (1): (1): (1 to 3): (1 to 3) volume ratio (v / v) It may be performed in the presence, but is not limited thereto.
상기 화학식 22로 표시되는 펩타이드는 구체적으로 하기 화학식 24 또는 25로 표시되는 펩타이드일 수 있다:The peptide represented by Chemical Formula 22 may be specifically a peptide represented by
[화학식 24][Formula 24]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)-D-Cys-OHArg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys (Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )-D-Cys -OH
[화학식 25][Formula 25]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)-D-Lys{Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)}-D-Cys-OH.Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys (Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )-D-Lys {Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )}-D -Cys-OH.
상기 제조하는 방법은, 상기 단계 (b)에서 수득한 펩타이드와 하기 화학식 3으로 표시되는 MPA-PTX(3-maleimidopropionicacid-Paclitaxel) 복합체를 함께 반응시키는 단계 (c)를 더 포함할 수 있다:The preparation method may further include a step (c) of reacting the peptide obtained in step (b) with a 3-maleimidopropionicacid-Paclitaxel (MPA-PTX) complex represented by
[화학식 3][Formula 3]
. .
상기 제조하는 방법은, 상기 단계 (b)에서 수득한 펩타이드와 하기 화학식 6으로 표시되는 MPA-AGM-130(3-maleimidopropionicacid-AGM-130) 복합체를 함께 반응시키는 단계 (d)를 더 포함할 수 있다:The preparation method may further include a step (d) of reacting the peptide obtained in step (b) with the MPA-AGM-130 (3-maleimidopropionicacid-AGM-130) complex represented by
[화학식 6][Formula 6]
. .
상기 제조하는 방법은, 상기 단계 (b)에서 수득한 펩타이드와 하기 화학식 9로 표시되는 세포 투과성 펩타이드(CPP)를 함께 반응시키는 단계 (e)를 더 포함할 수 있다:The preparation method may further include a step (e) of reacting the peptide obtained in step (b) with a cell penetrating peptide (CPP) represented by
[화학식 9][Formula 9]
. .
상기 반응시키는 단계에 있어서, pH 7.0 내지 10.0, 7.0 내지 9.9, 7.0 내지 9.8, 7.0 내지 9.7, 7.0 내지 9.6, 7.0 내지 9.5, 7.0 내지 9.4, 7.0 내지 9.3, 7.0 내지 9.2, 7.0 내지 9.1, 7.0 내지 9.0, 7.0 내지 8.9, 7.0 내지 8.8, 7.0 내지 8.7, 7.0 내지 8.6, 7.0 내지 8.5, 7.0 내지 8.4, 7.0 내지 8.3, 7.0 내지 8.2, 7.0 내지 8.1, 7.0 내지 8.0, 6.5 내지 9.0, 6.5 내지 8.9, 6.5 내지 8.8, 6.5 내지 8.7, 6.5 내지 8.6, 6.5 내지 8.5, 6.5 내지 8.4, 6.5 내지 8.3, 6.5 내지 8.2, 6.5 내지 8.1 또는 6.5 내지 8.0 조건 하에서 수행될 수 있고, 최종 수득 펩타이드의 높은 수율과 높은 순도를 확보하는 측면에서 바람직하게는 pH 6.5 내지 8.0 조건 하에서 수행될 수 있으나, 이에 제한되는 것은 아니다.In the reaction step, pH 7.0 to 10.0, 7.0 to 9.9, 7.0 to 9.8, 7.0 to 9.7, 7.0 to 9.6, 7.0 to 9.5, 7.0 to 9.4, 7.0 to 9.3, 7.0 to 9.2, 7.0 to 9.1, 7.0 to 9.0, 7.0 to 8.9, 7.0 to 8.8, 7.0 to 8.7, 7.0 to 8.6, 7.0 to 8.5, 7.0 to 8.4, 7.0 to 8.3, 7.0 to 8.2, 7.0 to 8.1, 7.0 to 8.0, 6.5 to 9.0, 6.5 to 8 .9, 6.5 to 8.8, 6.5 to 8.7, 6.5 to 8.6, 6.5 to 8.5, 6.5 to 8.4, 6.5 to 8.3, 6.5 to 8.2, 6.5 to 8.1 or 6.5 to 8.0. In terms of securing purity, it may be preferably carried out under pH 6.5 to 8.0 conditions, but is not limited thereto.
상기 반응시키는 단계에 있어서, 디클로로메탄(Dichloromethane), 테트라히드로퓨란(Tetrahydrofurane), 에틸아세테이트(Ethylacetate), 아세톤(Acetone), 디메틸포름아마이드(Dimethylformamide). 아세토니트릴(Acetonitrile) 및 디메틸설폭사이드(Dimethylsulfoxide)로 이루어진 군으로부터 선택된 하나 이상의 용매 조건 하에서 수행될 수 있고, 바람직한 일 실시예에 따를 때 아세토니트릴, 디클로로메탄 또는 이의 조합인 용매 조건 하에서 수행될 수 있으나, 이에 제한되는 것은 아니다.In the reaction step, dichloromethane, tetrahydrofurane, ethyl acetate, acetone, dimethylformamide. It may be performed under the condition of one or more solvents selected from the group consisting of acetonitrile and dimethylsulfoxide, and according to a preferred embodiment, it may be performed under the condition of acetonitrile, dichloromethane, or a combination thereof. , but is not limited thereto.
이하, 일 실시예로서 제공되는 반응 공정들에 대해 개략적으로 설명하고자 한다. 이는 앞으로 기술될 실시예들에 대한 이해도를 돕기 위한 목적으로서 예시적인 것인 바, 본 발명의 범위가 이에 제한되는 것은 아니다.Hereinafter, reaction processes provided as an example will be briefly described. This is illustrative for the purpose of helping understanding of the embodiments to be described in the future, and the scope of the present invention is not limited thereto.
1. AGM-330d의 제조1. Manufacture of AGM-330d
2-클로로트리틸 클로라이드 레진에 첫번째 아미노산을 로딩한다. 두번째로 곁사슬에 보호기를 포함한 아미노산을 시퀀스에 따라 순차적으로 아마이드 커플링을 하여 곁사슬에 보호기를 포함한 AGM-330d를 제조한다. 그 후 산성용액을 이용하여 레진과 보호기를 제거하고 정제 및 동결건조로 AGM-330d(화학식 1)을 얻는다.Load the first amino acid into the 2-chlorotrityl chloride resin. Second, AGM-330d including a protecting group on the side chain is prepared by performing amide coupling sequentially according to the amino acid sequence including the protecting group on the side chain. Thereafter, the resin and the protecting group are removed using an acidic solution, and AGM-330d (Formula 1) is obtained by purification and lyophilization.
2. AGM-330t의 제조2. Manufacture of AGM-330t
2-클로로트리틸 클로라이드 레진에 첫번째 아미노산을 로딩한다. 두번째로 곁사슬에 보호기를 포함한 아미노산을 시퀀스에 따라 순차적으로 아마이드 커플링을 하여 곁사슬에 보호기를 포함한 AGM-330t를 제조한다. 그 후 산성용액을 이용하여 레진과 보호기를 제거하고 정제 및 동결건조로 AGM-330t(화학식 2)을 얻는다.Load the first amino acid into the 2-chlorotrityl chloride resin. Second, AGM-330t including a protecting group on the side chain is prepared by performing amide coupling sequentially according to the amino acid sequence including the protecting group on the side chain. Thereafter, the resin and the protecting group are removed using an acidic solution, and AGM-330t (Formula 2) is obtained by purification and freeze-drying.
3. MPA-PTX의 제조3. Preparation of MPA-PTX
3-Maleimido-propionic acid (MPA; 화학식 12)와 Paclitaxel(PTX; 화학식 13)의 에스테르화 반응을 통하여 MPA-PTX(화학식 3)를 합성한다.MPA-PTX (Formula 3) is synthesized through an esterification reaction between 3-maleimido-propionic acid (MPA; Formula 12) and Paclitaxel (PTX; Formula 13).
4. MPA-AGM-130의 제조4. Preparation of MPA-AGM-130
첫번째 단계로 AGM-130(화학식 14)의 옥심의 -OH에 PMB(p-Methoxybenzyl) 보호기를 도입하여 PMB-AGM-130(화학식 15)을 합성한다. 두번째 단계에서 PMB-AGM-130(화학식 15)과 3-Maleimido-propionic acid(화학식 12)의 에스테르화 반응을 통하여 MPA-PMB-AGM-130(화학식 16)을 합성한 뒤 마지막 단계로 PMB 탈 보호화 반응을 동해 MPA-AGM-130(화학식 6)을 합성한다.As a first step, PMB-AGM-130 (Formula 15) is synthesized by introducing a PMB (p-Methoxybenzyl) protecting group into -OH of the oxime of AGM-130 (Formula 14). In the second step, MPA-PMB-AGM-130 (Formula 16) is synthesized through esterification of PMB-AGM-130 (Formula 15) and 3-Maleimido-propionic acid (Formula 12), and then PMB is deprotected in the last step. The reaction is carried out to synthesize MPA-AGM-130 (Formula 6).
5. CPP의 제조5. Preparation of CPP
먼저, 2-클로로트리틸 클로라이드 레진에 첫번째 아미노산을 로딩한다. 두번째로 곁사슬에 보호기를 포함한 아미노산을 시퀀스에 따라 순차적으로 아마이드 커플링을 하여 곁사슬에 보호기를 포함한 CPP를 제조한다. 그 후 산성용액을 이용하여 레진과 보호기를 제거하고 정제 및 동결건조로 CPP(화학식 9)을 얻는다.First, the first amino acid is loaded into the 2-chlorotrityl chloride resin. Second, amino acids containing a protecting group in the side chain are sequentially subjected to amide coupling according to the sequence to prepare CPP including a protecting group in the side chain. Thereafter, the resin and the protecting group are removed using an acidic solution, and CPP (Formula 9) is obtained by purification and lyophilization.
6. AGM-331d와 AGM-331t의 제조6. Manufacture of AGM-331d and AGM-331t
AGM-330d 및 AGM-330t 각각과 MPA-PTX를 PBS buffer하에서 1,4-Michael addition 반응을 통하여 AGM-331d와 AGM-330t 각각을 얻는다.AGM-330d and AGM-330t, respectively, and MPA-PTX were subjected to 1,4-Michael addition reaction in PBS buffer to obtain AGM-331d and AGM-330t, respectively.
7. AGM-332d와 AGM-332t의 제조7. Manufacture of AGM-332d and AGM-332t
AGM-330d 및 AGM-330t 각각과 MPA-AGM-130를 PBS buffer하에서 1,4-Michael addition 반응을 통하여 AGM-332d와 AGM-332t를 얻는다.AGM-330d and AGM-330t, respectively, and MPA-AGM-130 were subjected to 1,4-Michael addition reaction in PBS buffer to obtain AGM-332d and AGM-332t.
8. AGM-380d와 AGM-380t의 제조8. Manufacture of AGM-380d and AGM-380t
AGM-330d 및 AGM-330t 각각과 CPP를 20% ACN aq. (pH 7.0)하에서 1,4-Michael addition 반응을 통하여 AGM-380d 및 AGM-380t 각각을 얻는다(mCPP=monomeric CPP).AGM-330d and AGM-330t respectively and CPP were mixed with 20% ACN aq. AGM-380d and AGM-380t are respectively obtained through 1,4-Michael addition reaction at pH 7.0 (mCPP=monomeric CPP).
본 발명의 제조하는 방법에 따를 때, 뉴클레오린에 특이적으로 결합하는 AGM 펩타이드를 높은 순도와 높은 수율로 수득할 수 있어, 암 치료요법에서 진단 및 표적 약물 전달에 유용하게 이용될 수 있는 AGM 펩타이드의 대량합성이 가능한 방법을 제시할 수 있다.According to the production method of the present invention, AGM peptides that specifically bind to nucleolin can be obtained in high purity and yield, which can be usefully used for diagnosis and targeted drug delivery in cancer therapy. A method for mass synthesis of peptides can be presented.
다만, 상기한 효과로 한정되는 것은 아니며, 상세한 설명 또는 청구범위에 기재된 발명의 구성으로부터 추론 가능한 모든 효과를 포함하는 것으로 이해되어야 한다.However, it should be understood that it is not limited to the above effects, and includes all effects that can be inferred from the configuration of the invention described in the detailed description or claims.
도 1은 AGM-330d 제조공정을 개략적으로 나타낸 것이다.
도 2는 AGM-330t 제조공정을 개략적으로 나타낸 것이다.
도 3은 MPA-PTX의 제조공정을 개략적으로 나타낸 것이다.
도 4는 AGM-331d의 제조공정을 개략적으로 나타낸 것이다.
도 5는 AGM-331t의 제조공정을 개략적으로 나타낸 것이다.
도 6은 MPA-AGM-130의 제조공정을 개략적으로 나타낸 것이다.
도 7은 AGM-332d의 제조공정을 개략적으로 나타낸 것이다.
도 8은 AGM-332t의 제조공정을 개략적으로 나타낸 것이다.
도 9는 CPP의 제조공정을 개략적으로 나타낸 것이다.
도 10은 AGM-380d의 제조공정을 개략적으로 나타낸 것이다.
도 11은 AGM-380t의 제조공정을 개략적으로 나타낸 것이다.
도 12는 AGM-330d에 대한 MALDI-TOF Mass 분석결과이다.
도 13은 AGM-330t에 대한 MALDI-TOF Mass 분석결과이다.
도 14는 AGM-331d에 대한 MALDI-TOF Mass 분석결과이다.
도 15는 AGM-331t에 대한 MALDI-TOF Mass 분석결과이다.
도 16은 AGM-332t에 대한 MALDI-TOF Mass 분석결과이다.
도 17은 AGM-380d에 대한 MALDI-TOF Mass 분석결과이다.
도 18은 AGM-380t에 대한 MALDI-TOF Mass 분석결과이다.
도 19는 첫번째 아미노산 로딩율에 따른 AGM-330t의 Crude 순도(%)를 나타낸 것이다.1 schematically shows an AGM-330d manufacturing process.
Figure 2 schematically shows the AGM-330t manufacturing process.
Figure 3 schematically shows the manufacturing process of MPA-PTX.
Figure 4 schematically shows the manufacturing process of AGM-331d.
5 schematically shows the manufacturing process of AGM-331t.
Figure 6 schematically shows the manufacturing process of MPA-AGM-130.
Figure 7 schematically shows the manufacturing process of AGM-332d.
8 schematically shows the manufacturing process of AGM-332t.
9 schematically shows the manufacturing process of CPP.
10 schematically shows the manufacturing process of AGM-380d.
11 schematically shows the manufacturing process of AGM-380t.
12 is a MALDI-TOF mass analysis result for AGM-330d.
13 is a MALDI-TOF mass analysis result for AGM-330t.
14 is a MALDI-TOF mass analysis result for AGM-331d.
15 is a MALDI-TOF mass analysis result for AGM-331t.
16 is a MALDI-TOF mass analysis result for AGM-332t.
17 is a MALDI-TOF mass analysis result for AGM-380d.
18 is a MALDI-TOF mass analysis result for AGM-380t.
Figure 19 shows the crude purity (%) of AGM-330t according to the first amino acid loading rate.
이하, 보다 구체적으로 설명하기 위해 실시예를 들어 상세하게 설명하기로 한다. 그러나, 하기 실시예는 예시적인 것으로, 본 발명의 범위가 이에 제한되는 것은 아니다.Hereinafter, an example will be described in detail for a more detailed explanation. However, the following examples are illustrative, and the scope of the present invention is not limited thereto.
실시예 1. AGM-330d의 제조Example 1. Preparation of AGM-330d
1. Fmoc-D-Cys(Trt)-O-Resin의 제조1. Preparation of Fmoc-D-Cys(Trt)-O-Resin
(1) 불림 (Swelling)(1) Swelling
반응기에 248.2g의 2-클로로트리틸 클로라이드 레진(2-Chlorotrityl chloride resin; 350 mmol; Loading capacity: 1.41 mmol/g)을 넣는다. 여기에 디클로로메탄(Dichloromethane; DCM; 3.5L (10 L/mol)을 넣고, 25℃에서 30분 동안 교반한 다음 용매를 제거한다.248.2g of 2-chlorotrityl chloride resin (2-Chlorotrityl chloride resin; 350 mmol; Loading capacity: 1.41 mmol/g) was put into the reactor. Dichloromethane (DCM; 3.5L (10 L/mol) was added thereto, stirred at 25° C. for 30 minutes, and then the solvent was removed.
(2) Fmoc-D-Cys(Trt)-O-Resin의 제조(2) Preparation of Fmoc-D-Cys(Trt)-O-Resin
Fmoc-D-Cys(Trt)-OH(40.9 g, 0.2 eq.)과 DIEA(N-N-Diisopropylethylamine; 24.4 mL, 0.4 eq.)를 DCM(3.5 L)에 완전히 용해한다. 이 용액을 반응기에 첨가한 후 25℃에서 1시간 동안 교반한다. 반응액을 제거하고 DCM(3.5 L)으로 2분 동안 2회 세척한다. 반응기에 캡핑(capping) 용액(DCM: MeOH: DIEA = 85: 10: 5, v/v, 3.5L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DCM(3.5 L), DMF(Dimethylformamide; 3.5L) 순으로 2분 동안 각 3회씩 세척한다. 세척 후 레진을 샘플링하여 측정한 로딩율은 0.19 mmol/g이다.Completely dissolve Fmoc-D-Cys(Trt)-OH (40.9 g, 0.2 eq.) and DIEA (N-N-Diisopropylethylamine; 24.4 mL, 0.4 eq.) in DCM (3.5 L). After adding this solution to the reactor, it is stirred at 25° C. for 1 hour. Remove the reaction solution and wash twice for 2 minutes with DCM (3.5 L). A capping solution (DCM: MeOH: DIEA = 85: 10: 5, v/v, 3.5 L) was added to the reactor and stirred twice at 25° C. for 15 minutes. Remove the reaction solution and wash the resin three times each for 2 minutes in the order of DCM (3.5 L) and DMF (Dimethylformamide; 3.5 L). The loading factor determined by sampling the resin after washing is 0.19 mmol/g.
2. Fmoc-D-Lys(Fmoc)-D-Cys(Trt)-O-Resin의 제조2. Preparation of Fmoc-D-Lys(Fmoc)-D-Cys(Trt)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. DMF에 용해된 Fmoc-D-Lys(Fmoc)-OH(124.0 g, 3.0 eq.) 1.75 L, DMF에 용해된 HBTU(2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyluronium hexafluorophosphate; 79.6 g, 3.0eq) 1.75L를 차례대로 넣고 DIEA(36.6 mL, 3.0 eq.)을 첨가한 후 25℃에서 반응을 시작한다. 1시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). 1.75 L of Fmoc-D-Lys(Fmoc)-OH (124.0 g, 3.0 eq.) in DMF, HBTU (2-(1H-benzotriazol-1-yl)-1,1,3,3 in DMF -tetramethyluronium hexafluorophosphate; 79.6 g, 3.0eq) 1.75L was added in turn, DIEA (36.6 mL, 3.0 eq.) was added, and the reaction was started at 25°C. After 1 hour, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
3. Fmoc-PEG3. Fmoc-PEG 66 -D-Lys(Fmoc-PEG-D-Lys(Fmoc-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. DMF에 용해된 Fmoc-NH-PEG6-COOH(161.2 g, 4.0 eq.) 1.75 L, DMF에 용해된 HBTU(106.2 g, 4.0 eq) 1.75L를 차례대로 넣고 DIEA(48.8 mL, 4.0 eq.)을 첨가한 후 25℃에서 반응을 시작한다. 1시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). 1.75 L of Fmoc-NH-PEG 6 -COOH (161.2 g, 4.0 eq.) dissolved in DMF and 1.75 L of HBTU (106.2 g, 4.0 eq) dissolved in DMF were sequentially added and DIEA (48.8 mL, 4.0 eq.) After adding, the reaction starts at 25 °C. After 1 hour, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
4. Fmoc-Lys(Boc)-PEG4. Fmoc-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Lys(Boc)-PEG-D-Lys(Fmoc-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Lys(Boc)-OH (164.0 g, 5.0 eq.) 및 HOBt(Hydroxybenzotriazole; 93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(Diisopropylcarbodiimide; 55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Lys(Boc)-OH (164.0 g, 5.0 eq.) and HOBt (Hydroxybenzotriazole; 93.0 g, 5.0 eq.) were dissolved in DMF (3.5 L) and placed in a reactor. After adding DIC (Diisopropylcarbodiimide; 55.0 mL, 5.0 eq.) to the reactor, the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
5. Fmoc-Leu-Lys(Boc)-PEG5. Fmoc-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Leu-OH(123.7 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Leu-OH (123.7 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
6. Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG6. Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Tyr(tBu)-OH(160.9 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF (3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Tyr(tBu)-OH (160.9 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction mixture was removed and washed twice for 2 minutes with DMF (3.5 L).
7. Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG7. Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Val-OH(118.8 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Val-OH (118.8 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
8. Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG8. Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Met-OH(130.1 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Met-OH (130.1 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
9. Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG9. Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Ala-OH(109.0 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Ala-OH (109.0 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
10. Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG10. Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Gly-OH(104.1 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) dissolved in DMF was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Gly-OH (104.1 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
11. Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG11. Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-His(Trt)-OH(217.0 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (3.5 L) was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-His(Trt)-OH (217.0 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
12. Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG12. Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys(Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys(Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 )-D-Cys(Trt)-O-Resin의 제조) -D-Cys (Trt) -O-Resin Preparation
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(3.5 L)로 2분 동안 6회 세척한다. Fmoc-Arg(Pbf)-OH(227.1 g, 5.0 eq.) 및 HOBt(93.0 g, 5.0 eq.)를 DMF(3.5 L)에 용해하여 반응기에 넣는다. DIC(55.0 mL, 5.0 eq.)를 반응기에 첨가한 후 25℃에서 반응을 시작한다. 3시간 후 반응액을 제거하고 DMF(3.5 L)로 2분 동안 2회 세척한다. To remove Fmoc, 20% piperidine in DMF (3.5 L) was added to the reactor and stirred twice at 25° C. for 15 minutes. The reaction liquid is removed and the resin is washed 6 times for 2 minutes with DMF (3.5 L). Fmoc-Arg(Pbf)-OH (227.1 g, 5.0 eq.) and HOBt (93.0 g, 5.0 eq.) are dissolved in DMF (3.5 L) and placed in a reactor. DIC (55.0 mL, 5.0 eq.) is added to the reactor and the reaction is started at 25°C. After 3 hours, the reaction solution was removed and washed twice for 2 minutes with DMF (3.5 L).
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 3.5 L)을 넣고 25℃에서 15 분 동안 2 회 교반 한다. 반응액을 제거하고 레진을 DMF (3.5 L)로 2 분 동안 6회, DCM (3.5 L)로 2분 동안 3회 세척 후 질소건조 한다. To remove Fmoc, 20% piperidine in DMF (3.5 L) was added to the reactor and stirred twice at 25°C for 15 minutes. After removing the reaction solution, the resin was washed 6 times for 2 minutes with DMF (3.5 L) and 3 times with DCM (3.5 L) for 2 minutes, and dried with nitrogen.
13. 화학식 1로 표시되는 AGM-330d Crude의 제조를 위한 Global cleavage 13. Global cleavage for the manufacture of AGM-330d Crude represented by
건조된 레진에 냉각된 Cleavage cocktail (10.5 L, TFA: TIS: DODT: PW: DMS = 85: 2.5: 2.5: 5.0: 5.0, v:v)를 가하고 상온에서 2시간 교반한 후, PW (Purified water) 에 용해된 NH4I(52.6 mmol, 7.6 g) 10.0 mL을 넣어 30분 더 교반한 뒤 IPC (In-process control) 를 하고 반응이 종결됨을 확인한 후 반응을 끝낸다. Cleavage 액을 Drain 하고, 차가운 에테르 42.0L에 서서히 첨가하고 30분간 교반한다. 석출된 고체를 감압 여과하고 에테르 8.0 L로 2회 세척 후 12시간 이상 질소 건조하여 215.0 g, 순도 68.9%의 AGM-330d Crude 화합물을 수득하였다. Cleavage cocktail (10.5 L, TFA: TIS: DODT: PW: DMS = 85: 2.5: 2.5: 5.0: 5.0, v:v) was added to the dried resin, stirred at room temperature for 2 hours, and purified water (PW) was added. ) was added to 10.0 mL of NH 4 I (52.6 mmol, 7.6 g) dissolved in it, stirred for another 30 minutes, followed by IPC (In-process control), and after confirming that the reaction was complete, the reaction was terminated. Drain the Cleavage solution and slowly add it to 42.0L of cold ether and stir for 30 minutes. The precipitated solid was filtered under reduced pressure, washed twice with 8.0 L of ether, and then dried with nitrogen for more than 12 hours to obtain 215.0 g of AGM-330d Crude compound having a purity of 68.9%.
14.14.
화학식 1로 표시되는 AGM-330d 제조를 위한 정제 공정 Purification process for manufacturing AGM-330d represented by
AGM-330d Crude 215 g을 용해 후 GF/C 필터 및 0.45 μm HVHP 멤브레인 필터로 여과한다. Crude 액을 정제 후 동결건조 하여 하기 화학식 1(또는 화학식 24)로 표시되는 AGM-330d 144.2 g을 수득하였다(화학식 24: Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)-D-Cys-OH).After dissolving 215 g of AGM-330d Crude, it is filtered through a GF/C filter and a 0.45 μm HVHP membrane filter. The crude liquid was purified and lyophilized to obtain 144.2 g of AGM-330d represented by Formula 1 (or Formula 24) (Formula 24: Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6- D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )-D-Cys-OH).
AGM-330d 제조공정 개략도는 도 1과 같고, 이의 MALDI-TOF Mass 분석 결과는 도 12와 같다.A schematic diagram of the AGM-330d manufacturing process is shown in FIG. 1, and the MALDI-TOF mass analysis result thereof is shown in FIG. 12.
[화학식 1][Formula 1]
실시예 2. AGM-330t의 제조Example 2. Preparation of AGM-330t
1. Fmoc-D-Cys(Trt)-O-Resin의 제조 1. Preparation of Fmoc-D-Cys(Trt)-O-Resin
(1) 불림 (Swelling)(1) Swelling
반응기에 135.1g의 2-클로로트리틸 클로라이드 레진(200 mmol, Loading capacity: 1.48 mmol/g)을 넣는다. 여기에 DCM 2.0L를 넣고, 20-30℃에서 30분 동안 교반 후 용매를 제거한다. 135.1 g of 2-chlorotrityl chloride resin (200 mmol, Loading capacity: 1.48 mmol/g) is put into the reactor. 2.0L of DCM is added here, and the solvent is removed after stirring at 20-30° C. for 30 minutes.
(2) Fmoc-D-Cys(Trt)-O-Resin의 제조(2) Preparation of Fmoc-D-Cys(Trt)-O-Resin
Fmoc-D-Cys(Trt)-OH(23.4 g, 0.2 eq.)과 DIEA(13.9 mL, 0.4 eq.)를 DCM 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 1시간 교반한다. 반응액을 제거하고 DCM 2.0L로 2분씩 2회 세척한다. 반응기에 캡핑(capping) 용액 (DCM : MeOH : DIEA = 85 : 10 : 5, v/v) 2.0L을 넣고 20-30℃에서 15분 동안 교반한다(2회 반복). 반응액을 제거하고 레진을 DCM 2.0L, DMF 2.0L 순으로 20-30℃에서 2분씩 각 3회 세척한다. 세척 후 레진을 샘플링하여 측정한 로딩율은 0.14 mmol/g이다.Dissolve Fmoc-D-Cys(Trt)-OH (23.4 g, 0.2 eq.) and DIEA (13.9 mL, 0.4 eq.) in 2.0 L of DCM. After adding this solution to the reactor, it is stirred for 1 hour at 20-30°C. Remove the reaction solution and wash twice for 2 minutes each with 2.0 L of DCM. 2.0 L of a capping solution (DCM: MeOH: DIEA = 85: 10: 5, v/v) was added to the reactor and stirred at 20-30° C. for 15 minutes (repeated twice). Remove the reaction solution and wash the resin three times at 20-30 ° C for 2 minutes each in the order of DCM 2.0L and DMF 2.0L. The loading factor determined by sampling the resin after washing is 0.14 mmol/g.
2. Fmoc-D-Lys(Fmoc)-D-Cys(Trt)-O-Resin의 제조2. Preparation of Fmoc-D-Lys(Fmoc)-D-Cys(Trt)-O-Resin
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 2.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-D-Lys(Fmoc)-OH (43.1 g, 3.0 eq.)를 DMF 1.0 L에 용해한다. HBTU (27.7 g, 3.0 eq.), DIEA (12.7 mL, 3.0 eq.)를 DMF 1.0 L에 용해한다. 두 용액을 반응기에 넣고 20-30℃에서 1시간 교반한다. 반응액을 제거하고 DMF 2.0 L로 2분씩 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 2.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 2.0 L of DMF at 20-30 ° C for 2 minutes each. Dissolve Fmoc-D-Lys(Fmoc)-OH (43.1 g, 3.0 eq.) in 1.0 L of DMF. Dissolve HBTU (27.7 g, 3.0 eq.) and DIEA (12.7 mL, 3.0 eq.) in 1.0 L of DMF. The two solutions are put into a reactor and stirred at 20-30°C for 1 hour. Remove the reaction solution and wash twice for 2 minutes with 2.0 L of DMF.
3. Fmoc-D-Lys(Fmoc)-D-Lys[Fmoc-D-Lys(Fmoc)]-D-Cys(Trt)-O-Resin의 제조3. Preparation of Fmoc-D-Lys(Fmoc)-D-Lys[Fmoc-D-Lys(Fmoc)]-D-Cys(Trt)-O-Resin
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 2.0 L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-D-Lys(Fmoc)-OH (71.8 g, 5.0 eq.)를 DMF 1.0 L에 용해한다. HBTU (46.1 g, 5.0 eq.), DIEA (21.2 mL, 5.0 eq.)를 DMF 1.0 L에 용해한다. 두 용액을 반응기에 넣고 20-30℃에서 2시간 교반한다. 반응액을 제거하고 DMF 2.0 L로 2분씩 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 2.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 2.0 L of DMF at 20-30° C. for 2 minutes each. Dissolve Fmoc-D-Lys(Fmoc)-OH (71.8 g, 5.0 eq.) in 1.0 L of DMF. Dissolve HBTU (46.1 g, 5.0 eq.) and DIEA (21.2 mL, 5.0 eq.) in 1.0 L of DMF. The two solutions are put into a reactor and stirred at 20-30°C for 2 hours. Remove the reaction solution and wash twice for 2 minutes with 2.0 L of DMF.
4. Fmoc-PEG4. Fmoc-PEG 66 -D-Lys{Fmoc-PEG-D-Lys{Fmoc-PEG 66 }-D-Lys[Fmoc-PEG}-D-Lys[Fmoc-PEG 66 -D-Lys{Fmoc-PEG-D-Lys{Fmoc-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 2.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-NH-PEG6-COOH (112.0 g, 8.0 eq.)를 DMF 1.0L에 용해한다. HBTU (73.8 g, 8.0 eq.), DIEA (33.9 mL, 8.0 eq.)를 DMF 1.0 L에 용해한다. 두 용액을 반응기에 넣고 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 2.0L로 2분씩 2회 세척한다. Add 20% piperidine (20% piperidine in DMF; 2.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 2.0 L of DMF at 20-30 ° C for 2 minutes each. Dissolve Fmoc-NH-PEG6-COOH (112.0 g, 8.0 eq.) in 1.0 L of DMF. Dissolve HBTU (73.8 g, 8.0 eq.) and DIEA (33.9 mL, 8.0 eq.) in 1.0 L of DMF. The two solutions are put into a reactor and stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 2.0 L of DMF for 2 minutes each.
5. Fmoc-Lys(Boc)-PEG5. Fmoc-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Lys(Boc)-PEG-D-Lys{Fmoc-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Lys(Boc)-PEG}-D-Lys[Fmoc-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Lys(Boc)-PEG-D-Lys{Fmoc-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Lys(Boc)-OH (114.0 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC(37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0 mL로 2분씩 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Lys(Boc)-OH (114.0 g, 10 eq.) and HOBt (16.4 g, 5 eq.) were dissolved in 1.0 L of DMF. After putting this solution in a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice for 2 minutes with 1.0 mL of DMF.
6. Fmoc-Leu-Lys(Boc)-PEG6. Fmoc-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Leu-OH (86.0 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분씩 2회 세척한다. Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Leu-OH (86.0 g, 10 eq.) and HOBt (16.4 g, 5 eq.) were dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 1.0 L of DMF for 2 minutes each.
7. Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG7. Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Tyr(tBu)-OH (111.8 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0 L로 2분 동안 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Tyr(tBu)-OH (111.8 g, 10 eq.) and HOBt (16.4 g, 5 eq.) were dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice for 2 minutes with 1.0 L of DMF.
8. Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG8. Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Val-Tyr(tBu)-Leu(Boc)-Lys-PEG-D-Lys{Fmoc-Val-Tyr(tBu)-Leu(Boc)-Lys-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Val-OH (82.6 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0 L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분씩 2회 세척한다. Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Val-OH (82.6 g, 10 eq.) and HOBt (16.4 g, 5 eq.) are dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 1.0 L of DMF for 2 minutes each.
9. Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG9. Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Met-OH (90.4 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분씩 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Met-OH (90.4 g, 10 eq.) and HOBt (16.4 g, 5 eq.) were dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 1.0 L of DMF for 2 minutes each.
10. Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG10. Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Ala-OH (75.7 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분씩 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Ala-OH (75.7 g, 10 eq.) and HOBt (16.4 g, 5 eq.) were dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 1.0 L of DMF for 2 minutes each.
11. Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG11. Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Gly-OH (72.3 g, 10 eq.), HOBt (16.4 g, 5 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분씩 2회 세척한다. Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-Gly-OH (72.3 g, 10 eq.) and HOBt (16.4 g, 5 eq.) were dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 1.0 L of DMF for 2 minutes each.
12. Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG12. Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-His(Trt)-OH (150.7 g, 10 eq.), HOBt (16.4 g, 5.0 eq.)을 DMF 1.0L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분 동안 2회 세척한다.Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Fmoc-His(Trt)-OH (150.7 g, 10 eq.) and HOBt (16.4 g, 5.0 eq.) are dissolved in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice for 2 minutes with 1.0 L of DMF.
13. Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG13. Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }-D-Lys[Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG}-D-Lys[Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 -D-Lys{Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG-D-Lys{Fmoc-Arg(Pbf)-His(Trt)-Gly-Ala-Met-Val-Tyr(tBu)-Leu-Lys(Boc)-PEG 66 }]-D-Cys(Trt)-O-Resin의 제조}] -D-Cys (Trt) -O-Resin Preparation
(1) DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)을 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Fmoc-Arg(Pbf)-OH (157.8 g, 10 eq.), HOBt (16.4 g, 5.0 eq.)을 DMF 1.0 L에 용해한다. 이 용액을 반응기에 넣고 DIC (37.7 mL, 10 eq.)를 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DMF 1.0L로 2분씩 2회 세척한다.(1) Add 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stir twice for 15 minutes at 20-30°C to remove Fmoc. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Dissolve Fmoc-Arg(Pbf)-OH (157.8 g, 10 eq.) and HOBt (16.4 g, 5.0 eq.) in 1.0 L of DMF. After putting this solution into a reactor and adding DIC (37.7 mL, 10 eq.) to the reactor, the mixture was stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice with 1.0 L of DMF for 2 minutes each.
(2) DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 1.0L)를 넣고 20-30℃에서 15분씩 2회 교반하여 Fmoc을 제거한다. 반응액을 제거하고 DMF 1.0L로 20-30℃에서 2분씩 6회 세척한다. Vacuum 하에서 레진을 건조한다.(2) Fmoc was removed by adding 20% piperidine (20% piperidine in DMF; 1.0L) dissolved in DMF and stirring twice for 15 minutes at 20-30°C. Remove the reaction solution and wash 6 times with 1.0L of DMF at 20-30℃ for 2 minutes each. Dry the resin under vacuum.
14. 화학식 2로 표시되는 AGM-330t Crude 제조를 위한 cleavage 반응14. Cleavage reaction for manufacturing AGM-330t crude represented by
건조된 레진에 냉각된 cleavage cocktail 3.0 L (TFA : TIS : DODT : H2O : DMS = 85 : 2.5 : 2.5 : 5 : 5, v/v, 10 mM NH4I)를 서서히 가하고 15-30℃에서 3시간 동안 교반한다. 2시간 후, NH4I (4.4 g, 10 mM)을 50.0 mL H2O에 녹여서 넣는다. 반응 종결을 HPLC로 확인 후 cleavage 용액을 드레인(drain)하여 회수한다. 디에틸 에터(Diethyl ether) 9.0L에 cleavage액을 서서히 첨가하고 30분 동안 교반한다. 석출된 고체를 감압 여과하고 디에틸 에터 3.0L로 세척 후 질소 건조 및 진공 건조하여 206.0 g, 순도 47.4%의 crude를 수득하였다. Cooled cleavage cocktail 3.0 L (TFA : TIS : DODT : H 2 O : DMS = 85 : 2.5 : 2.5 : 5 : 5, v/v, 10 mM NH 4 I) was slowly added to the dried resin, and the temperature was 15-30℃. stirred for 3 hours. After 2 hours, NH 4 I (4.4 g, 10 mM) was dissolved in 50.0 mL H 2 O and added. After confirming the completion of the reaction by HPLC, the cleavage solution is drained and recovered. The cleavage solution was slowly added to 9.0 L of diethyl ether and stirred for 30 minutes. The precipitated solid was filtered under reduced pressure, washed with 3.0 L of diethyl ether, dried with nitrogen and vacuum dried to obtain 206.0 g of crude with a purity of 47.4%.
15. 화학식 2로 표시되는 AGM-330t 제조를 위한 정제 공정15. Purification process for manufacturing AGM-330t represented by
AGM-330t Crude 206.6 g을 용해 후 GF/C 필터 및 0.45 μm HVHP 멤브레인 필터로 여과한다. Crude 액을 정제 후 동결건조 하여 화학식 2(또는 화학식 25)로 표시되는 AGM-330t 73.1 g을 수득하였다(화학식 25: Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)-D-Lys{Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)}-D-Cys-OH).After dissolving 206.6 g of AGM-330t Crude, it is filtered through a GF/C filter and a 0.45 μm HVHP membrane filter. The crude liquid was purified and lyophilized to obtain 73.1 g of AGM-330t represented by Formula 2 (or Formula 25) (Formula 25: Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )-D-Lys{Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6- D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )}-D-Cys-OH).
AGM-330t 제조공정 개략도는 도 2와 같고, 이의 MALDI-TOF Mass 분석 결과는 도 13과 같다.A schematic diagram of the AGM-330t manufacturing process is shown in FIG. 2, and the MALDI-TOF mass analysis result thereof is shown in FIG. 13.
[화학식 2][Formula 2]
실시예 3. AGM-331d의 제조Example 3. Preparation of AGM-331d
1. 화학식 3으로 표시되는 MPA-PTX의 제조1. Preparation of MPA-PTX represented by
파클리탁셀(Paclitaxel; 5.86 mmol, 5.0 g, 1.0 eq.)을 무수 DCM 84 mL에 완전히 녹인 후 DMAP(4-Dimethylaminopyridine; 0.0293 mmol, 3.6 mg, 0.005 eq.)을 넣어 녹인다. 온도를 0℃로 냉각 후 MPA(3-Maleimidopropionic acid; 7.33 mmol, 1.24 g, 1.25 eq)와 DIC (6.45 mmol, 997.5 μl, 1.1 eq.)를 차례로 투입하고 25℃에서 8시간 교반한다. 반응이 완료된 반응 혼합물에 DCM 90 mL을 더하고 NH4Cl 과포화 용액 200 mL, NaHCO3 과포화 용액 200 mL, PW (Purified water) 200 mL을 이용하여 각각 1회씩 차례로 추출한다. DCM층을 Na2SO4를 처리하고 여과하여 농축한다. 농축 완료된 반응 혼합물에 DCM 100mL을 넣고 완전히 녹인 후 이 액을 헥산 500 mL에 천천히 적가하여 결정화 한다. 결정화된 고체를 여과 후 건조하여 5.9g의 MPA-PTX 화합물을 수득하였다. After completely dissolving Paclitaxel (5.86 mmol, 5.0 g, 1.0 eq.) in 84 mL of anhydrous DCM, add DMAP (4-Dimethylaminopyridine; 0.0293 mmol, 3.6 mg, 0.005 eq.) and dissolve. After cooling the temperature to 0 ° C, MPA (3-Maleimidopropionic acid; 7.33 mmol, 1.24 g, 1.25 eq) and DIC (6.45 mmol, 997.5 μl, 1.1 eq.) were sequentially added and stirred at 25 ° C for 8 hours. 90 mL of DCM was added to the reaction mixture after the reaction was completed, and extraction was sequentially performed once each using 200 mL of a supersaturated NH 4 Cl solution, 200 mL of a supersaturated NaHCO 3 solution, and 200 mL of PW (Purified water). The DCM layer was treated with Na 2 SO 4 and concentrated by filtration. After adding 100 mL of DCM to the concentrated reaction mixture and completely dissolving it, the solution was slowly added dropwise to 500 mL of hexane to crystallize. The crystallized solid was filtered and dried to obtain 5.9 g of an MPA-PTX compound.
MPA-PTX의 제조공정 개략도는 도 3과 같다.A schematic diagram of the manufacturing process of MPA-PTX is shown in FIG.
[화학식 3][Formula 3]
2. 화학식 4로 표시되는 AGM-331d의 제조2. Preparation of AGM-331d represented by
PBS 버퍼 272 mL, PW (Purified water) 266 mL 혼합용액(pH: ~7.4)에 AGM-330d (0.60 mmol, 1.81 g, 1.15 eq.)을 완전히 녹인후 ACN 90 mL에 MPA-PTX (0.52 mmol, 520 mg, 1.0 eq.)를 완전히 녹인 용액을 첨가하여 상온에서 6시간 교반한다. 반응이 완료되면 정제 및 동결건조를 수행하여 AGM-331d 2.1 g을 수득하였다.After completely dissolving AGM-330d (0.60 mmol, 1.81 g, 1.15 eq.) in PBS buffer 272 mL and PW (Purified water) 266 mL mixed solution (pH: ~7.4), MPA-PTX (0.52 mmol, A solution in which 520 mg, 1.0 eq.) was completely dissolved was added and stirred at room temperature for 6 hours. Upon completion of the reaction, purification and lyophilization were performed to obtain 2.1 g of AGM-331d.
AGM-331d의 제조공정 개략도는 도 4와 같고, 이의 MALDI-TOF Mass 분석 결과는 도 14와 같다.A schematic diagram of the manufacturing process of AGM-331d is shown in FIG. 4, and the MALDI-TOF mass analysis result thereof is shown in FIG. 14.
[화학식 4][Formula 4]
실시예 4. AGM-331t의 제조Example 4. Preparation of AGM-331t
PBS 버퍼 640 mL, PW (Purified water) 450 mL 혼합용액(pH: ~7.4)에 AGM-330t (1.0 mmol, 6.0 g, 1.0 eq.) 완전히 녹인 후 ACN 180 mL에 MPA-PTX (1.0 mmol, 1.0 g, 1.0 eq.)를 완전히 녹인용액을 첨가하여 상온에서 4시간 교반한다. 반응이 완료되면 정제 및 동결건조하여 화학식 5로 표시되는 AGM-331t 2.7 g을 수득하였다.After completely dissolving AGM-330t (1.0 mmol, 6.0 g, 1.0 eq.) in a mixed solution (pH: ~7.4) of 640 mL of PBS buffer and 450 mL of PW (Purified water), MPA-PTX (1.0 mmol, 1.0 eq.) was added to 180 mL of ACN. g, 1.0 eq.) was completely dissolved and stirred at room temperature for 4 hours. Upon completion of the reaction, 2.7 g of AGM-331t represented by
AGM-331t의 제조공정 개략도는 도 5와 같고, 이의 MALDI-TOF Mass 분석 결과는 도 15와 같다.A schematic diagram of the manufacturing process of AGM-331t is shown in FIG. 5, and the MALDI-TOF mass analysis result thereof is shown in FIG. 15.
[화학식 5][Formula 5]
실시예 5. AGM-332d의 제조Example 5. Preparation of AGM-332d
1. MPA-AGM-130의 제조1. Preparation of MPA-AGM-130
(1) PMB-AGM-130의 제조 (1) Manufacture of PMB-AGM-130
500 mL 반응기에 AGM-130 (29.6 mmol, 10.0 g, 1.0 eq.)을 250 mL DMF에 녹이고 K2CO3 (59.1 mmol, 7.8 g, 2.0 eq.)를 넣고 20-30℃에서 15분간 교반한다. Ice-bath에서 반응 온도를 낮춰서 PMB-Cl(p-methoxybenzyl chloride) (44.3 mmol, 6.0 mL, 1.5 eq.)를 천천히 10분 동안 넣는다. PMB-Cl 첨가 후, ice-bath 제거하고 다시 반응온도를 상온으로 올려 2시간 30분간 교반한다. 반응 종결 후, H2O 500 mL를 천천히 넣고 30분간 교반한다. 형성된 고체를 필터하고 H2O 250 mL로 2번 세척하고 디에틸 에터 250 mL로 세척한다. 그 후, 16시간 동안 진공건조 한다. 진공건조 후, PMB-AGM-130 11.5 g을 수득하였다.Dissolve AGM-130 (29.6 mmol, 10.0 g, 1.0 eq.) in 250 mL DMF in a 500 mL reactor, add K 2 CO 3 (59.1 mmol, 7.8 g, 2.0 eq.) and stir at 20-30 °C for 15 minutes. . After lowering the reaction temperature in an ice-bath, PMB-Cl (p-methoxybenzyl chloride) (44.3 mmol, 6.0 mL, 1.5 eq.) was slowly added for 10 minutes. After adding PMB-Cl, the ice-bath was removed, and the reaction temperature was raised to room temperature and stirred for 2 hours and 30 minutes. After completion of the reaction, 500 mL of H 2 O was slowly added and stirred for 30 minutes. Filter the formed solid and wash twice with 250 mL of H 2 O and 250 mL of diethyl ether. After that, vacuum drying for 16 hours. After vacuum drying, 11.5 g of PMB-AGM-130 was obtained.
(2) PMB-MPA-AGM-130의 제조 (2) Manufacture of PMB-MPA-AGM-130
MPA(3-Maleimidopropionic acid; 19.6 mmol, 3.3 g, 1.5 eq.)와 HBTU (19.6 mmol, 7.5 g, 1.5 eq.)를 DMF 130 mL에 녹이고, 트리에틸 아민(triethyl amine; 19.6 mmol, 2.7 mL, 1.5 eq.)를 넣고 20-30℃에서 16시간 동안 교반한다. 디에틸 에터를 150mL 넣고 고체화한다. 고체를 거르고 에터(ether) 100 mL로 세척하여 8.4g을 얻었다. 이 고체에는 두가지 다른 큰 불순물이 있어서, 아세토나이트릴을 3~4배정도 사용하여 두 번 용매 결정화를 통해 원심 분리하고 DCM으로 같은 과정을 반복해서 1회 원심 분리한다. 진공 건조 후, PMB-AGM-130 2.9g을 수득하였다.Dissolve MPA (3-Maleimidopropionic acid; 19.6 mmol, 3.3 g, 1.5 eq.) and HBTU (19.6 mmol, 7.5 g, 1.5 eq.) in 130 mL of DMF, and triethyl amine (19.6 mmol, 2.7 mL, 1.5 eq.) and stirred at 20-30°C for 16 hours. 150mL of diethyl ether was added and solidified. The solid was filtered and washed with 100 mL of ether to obtain 8.4 g. There are two other large impurities in this solid, so it is centrifuged twice through solvent crystallization using acetonitrile three to four times and centrifuged once by repeating the same process with DCM. After vacuum drying, 2.9 g of PMB-AGM-130 was obtained.
(3) 화학식 6으로 표시되는 MPA-AGM-130의 제조 (3) Preparation of MPA-AGM-130 represented by
MPA-PMB-AGM-130 (4.1 mmol, 2.5 g, 1.0 eq.)에 DCM:TFA (2:1) 비율로 만든 용액 25 mL를 넣고 20-30℃에서 2시간 동안 교반 한다. 반응액을 감압 농축하고, 아세톤(acetone) 10 mL를 넣어서 다시 재 감압 농축을 진행한다. 농축 후, 에터 20 mL로 고체화하고, 에터 20 mL로 2번 세척한다. 진공 건조 후, MPA-AGM-130 1.68g을 수득하였다. Add 25 mL of a solution prepared in a DCM:TFA (2:1) ratio to MPA-PMB-AGM-130 (4.1 mmol, 2.5 g, 1.0 eq.) and stir at 20-30 °C for 2 hours. The reaction solution was concentrated under reduced pressure, and 10 mL of acetone was added thereto, and again concentrated under reduced pressure. After concentration, solidify with 20 mL of ether, and wash twice with 20 mL of ether. After vacuum drying, 1.68 g of MPA-AGM-130 was obtained.
MPA-AGM-130의 제조공정 개략도는 도 6과 같다.A schematic diagram of the manufacturing process of MPA-AGM-130 is shown in FIG.
[화학식 6][Formula 6]
2. 화학식 7로 표시되는 AGM-332d의 제조2. Preparation of AGM-332d represented by
AGM-332d의 제조공정 개략도는 도 7과 같다.A schematic diagram of the manufacturing process of AGM-332d is shown in FIG.
[화학식 7][Formula 7]
실시예 6. AGM-332t의 제조Example 6. Preparation of AGM-332t
(1) MPA-AGM-130 (5.1 mmol, 2.5 g, 3.0 eq.)을 860 mL DMF에 녹여 ice-bath에서 15분간 교반한다. AGM-330t (1.7 mmol, 10.4 g, 1.0 eq)를 860 mL PBS (pH: ~7.4) 용액에 녹이고 이 용액을 MPA-AGM-130 용액에 넣는다. Ice-bath를 치우고, 20-30℃에서 21시간 동안 교반한다. 반응액을 0.45 μm 필터 종이로 필터한다. (1) Dissolve MPA-AGM-130 (5.1 mmol, 2.5 g, 3.0 eq.) in 860 mL DMF and stir for 15 minutes in an ice-bath. Dissolve AGM-330t (1.7 mmol, 10.4 g, 1.0 eq) in 860 mL PBS (pH: ~7.4) solution and add this solution to MPA-AGM-130 solution. Remove the ice-bath and stir for 21 hours at 20-30°C. Filter the reaction solution with 0.45 μm filter paper.
(2) 반응액 속 DMF 제거를 위해 반응액을 컬럼에 넣고 메인 피크(Main peak)만 분리하여 DMF를 제거한다. 메인 피크 분리 후, 아세토나이트릴(ACN)을 제거하기 위해 감압 농축을 진행한다. 농축 후, 정제와 염-치환 공정을 진행하고 동결건조 후, 화학식 8로 표시되는 AGM-332t 제품 5.0g을 수득하였다.(2) To remove DMF in the reaction solution, the reaction solution is put into a column and only the main peak is separated to remove DMF. After separating the main peak, concentration is performed under reduced pressure to remove acetonitrile (ACN). After concentration, purification and salt-exchange processes were performed, and after lyophilization, 5.0 g of AGM-332t product represented by
AGM-332t의 제조공정 개략도는 도 8과 같고, 이의 MALDI-TOF Mass 분석 결과는 도 16과 같다.A schematic diagram of the manufacturing process of AGM-332t is shown in FIG. 8, and the MALDI-TOF mass analysis result thereof is shown in FIG. 16.
[화학식 8][Formula 8]
실시예 7. AGM-380d의 제조Example 7. Preparation of AGM-380d
1. 화학식 9로 표시되는 세포투과성 펩타이드(Cell Penetrating Peptide; CPP)의 제조 1. Preparation of Cell Penetrating Peptide (CPP) represented by
(1) Fmoc-Arg(Pbf)-O-Resin의 제조(1) Preparation of Fmoc-Arg(Pbf)-O-Resin
1) 불림 (Swelling)1) Swelling
반응기에 142.0 g의 2-클로로트리틸 클로라이드 레진(2-Chlorotrityl chloride resin; 200 mmol, Loading capacity: 1.48 mmol/g)을 넣는다. 여기에 DCM (2.0 L)을 넣고 20-30℃에서 30분 동안 교반한 후 용매를 제거한다142.0 g of 2-Chlorotrityl chloride resin (200 mmol, Loading capacity: 1.48 mmol/g) was put into the reactor. DCM (2.0 L) was added thereto, stirred at 20-30 ° C for 30 minutes, and then the solvent was removed.
2) Fmoc-Arg(Pbf)-O-Resin의 제조2) Preparation of Fmoc-Arg(Pbf)-O-Resin
Fmoc-Arg(Pbf)-OH (389.2 g, 3.0 eq.)과 DIC (209.2 mL, 6.0 eq.)를 DCM 500 mL에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 교반한다. 반응액을 제거하고 DCM(2.0L)로 2분 동안 2회 세척한다. 반응기에 캡핑(capping) 용액 (DCM : MeOH : DIC = 85 : 10 : 5, v/v) 2.0L을 넣고 20-30℃에서 15분 동안 교반한다(2회 반복). 반응액을 제거하고 레진을 DCM(2.0L), DMF(2.0L) 순으로 20-30℃에서 2분 동안 각 2회씩 세척한다. 공정 중 시험(치환율 측정)을 진행한다.Dissolve Fmoc-Arg(Pbf)-OH (389.2 g, 3.0 eq.) and DIC (209.2 mL, 6.0 eq.) in 500 mL of DCM. After adding this solution to the reactor, it is stirred at 20-30°C for 3 hours. Remove the reaction solution and wash twice for 2 minutes with DCM (2.0 L). 2.0 L of a capping solution (DCM: MeOH: DIC = 85: 10: 5, v/v) was added to the reactor and stirred at 20-30° C. for 15 minutes (repeated twice). After removing the reaction solution, the resin is washed with DCM (2.0L) and DMF (2.0L) in that order at 20-30°C for 2 minutes twice each. Conduct an in-process test (measurement of substitution rate).
(2) Fmoc-Ala-Arg(Pbf)-O-Resin의 제조(2) Preparation of Fmoc-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF (2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Ala-OH (186.8 g, 3.0 eq.) 및 HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0 L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed with DMF (2.0 L) 6 times for 2 minutes at 20-30°C. Dissolve Fmoc-Ala-OH (186.8 g, 3.0 eq.) and HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(3) Fmoc-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (3) Preparation of Fmoc-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Leu-OH (212.0 g, 3.0 eq.) 및 HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction solution was removed and the resin was washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Leu-OH (212.0 g, 3.0 eq.) and HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(4) Fmoc-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (4) Preparation of Fmoc-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Lys(Boc)-OH (281.1 g, 3.0 eq.) 및 HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Lys(Boc)-OH (281.1 g, 3.0 eq.) and HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(5) Fmoc-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (5) Preparation of Fmoc-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Leu-OH (212.0 g, 3.0 eq.) 및 HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Leu-OH (212.0 g, 3.0 eq.) and HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(6) Fmoc-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (6) Preparation of Fmoc-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Ile-OH (212.0 g, 3.0 eq.) 및 HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF (2.0 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction solution was removed and the resin was washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Ile-OH (212.0 g, 3.0 eq.) and HOBt (81.1 g, 3.0 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(7) Fmoc-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (7) Preparation of Fmoc-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF (2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Arg(Pbf)-OH (389.2 g, 3.0 eq.) 및 HOBt (89.2 g, 3.3 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0 L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed with DMF (2.0 L) 6 times for 2 minutes at 20-30°C. Dissolve Fmoc-Arg(Pbf)-OH (389.2 g, 3.0 eq.) and HOBt (89.2 g, 3.3 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(8) Fmoc-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (8) Preparation of Fmoc-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Leu-OH (353.4 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Leu-OH (353.4 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(9) Fmoc-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (9) Preparation of Fmoc-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
1) Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF (2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Ile-OH (353.4 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF 2.0 L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간동안 교반한다. 반응액을 제거하고 DMF (2.0 L)로 2분 동안 2회 세척한다. 1) To remove Fmoc, add 20% piperidine in DMF (2.0L) dissolved in DMF to the reactor and stir twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed with DMF (2.0 L) 6 times for 2 minutes at 20-30°C. Dissolve Fmoc-Ile-OH (353.4 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
2) Fmoc-Ile-OH (212.0 g, 3.0 eq.) 및 HOBT (148.6 g, 5.5 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0 L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반하여 더블 커플링을 진행한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.2) Dissolve Fmoc-Ile-OH (212.0 g, 3.0 eq.), HOBT (148.6 g, 5.5 eq.), and DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, double coupling is performed by stirring at 20-30° C. for 3 hours. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(10) Fmoc-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조(10) Preparation of Fmoc-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
1) Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0 L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Arg(Pbf)-OH (648.8 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다. 1) To remove Fmoc, add 20% piperidine in DMF (2.0L) dissolved in DMF to the reactor and stir twice at 20-30°C for 15 minutes. The reaction liquid is removed and the resin is washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Arg(Pbf)-OH (648.8 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
2) Fmoc-Arg(Pbf)-OH (389.1 g, 3.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반하여 더블 커플링을 진행한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회 세척한다.2) Dissolve Fmoc-Arg(Pbf)-OH (389.1 g, 3.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, double coupling is performed by stirring at 20-30° C. for 3 hours. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(11) Fmoc-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조 (11) Preparation of Fmoc-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Met-OH (371.5 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF 500 mL에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회 세척한다.To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction solution was removed and the resin was washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Met-OH (371.5 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 500 mL of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(12) Fmoc-Ile-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조(12) Preparation of Fmoc-Ile-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin
1) Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Ile-OH (353.4 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF 2.0 L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회 세척한다. 1) To remove Fmoc, add 20% piperidine in DMF (2.0L) dissolved in DMF to the reactor and stir twice at 20-30°C for 15 minutes. The reaction solution was removed and the resin was washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Ile-OH (353.4 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
2) Fmoc-Ile-OH (353.4 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF에 용해된 50% DMSO 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반하여 더블 커플링을 진행한다. 반응액을 제거하고 DMF(2.0 L)로 2분 동안 2회 세척한다.2) Dissolve Fmoc-Ile-OH (353.4 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 2.0 L of 50% DMSO dissolved in DMF. After adding this solution to the reactor, double coupling is performed by stirring at 20-30° C. for 3 hours. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(13) Fmoc-Arg(Pbf)-Ile-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조(13) Fmoc-Arg(Pbf)-Ile-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin manufacturing
1) Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0L)로 20-30℃에서 2분 동안 6회 세척한다. Fmoc-Arg(Pbf)-OH (648.8 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 2시간 동안 교반한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회 세척한다. 1) To remove Fmoc, add 20% piperidine in DMF (2.0L) dissolved in DMF to the reactor and stir twice at 20-30°C for 15 minutes. The reaction solution was removed and the resin was washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve Fmoc-Arg(Pbf)-OH (648.8 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 2 hours at 20-30°C. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
2) Fmoc-Arg(Pbf)-OH (648.8 g, 5.0 eq.) 및 HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.)를 DMF에 용해된 50% DMSO 2.0L에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반하여 더블 커플링을 진행한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회 세척한다.2) Fmoc-Arg(Pbf)-OH (648.8 g, 5.0 eq.) and HOBt (148.6 g, 5.5 eq.), DIC (156.6 mL, 5.0 eq.) dissolved in 2.0 L of 50% DMSO dissolved in DMF do. After adding this solution to the reactor, double coupling is performed by stirring at 20-30° C. for 3 hours. Remove the reaction solution and wash twice for 2 minutes with DMF (2.0 L).
(14) 3-MPA-Arg(Pbf)-Ile-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O-Resin의 제조(14) 3-MPA-Arg(Pbf)-Ile-Met-Arg(Pbf)-Ile-Leu-Arg(Pbf)-Ile-Leu-Lys(Boc)-Leu-Ala-Arg(Pbf)-O- Resin manufacturing
Fmoc을 제거하기 위해 반응기에 DMF에 용해된 20%의 피페리딘(20% piperidine in DMF; 2.0L)를 넣고 20-30℃에서 15분 동안 2회 교반한다. 반응액을 제거하고 레진을 DMF(2.0L)로 20-30℃에서 2분 동안 6회 세척한다. MPA(3-Maleimidoproponic acid; 101.5 g, 3.0 eq.) 및 HOBt (89.2 g, 3.3 eq.), DIC (93.9 mL, 3.0 eq.)를 DMF 2.0 L 에 용해한다. 이 용액을 반응기에 첨가한 후 20-30℃에서 3시간 동안 교반한다. 반응액을 제거하고 DMF(2.0L)로 2분 동안 2회, DCM(2.0L)로 2분 동안 2회 세척 후 레진을 건조한다. To remove Fmoc, 20% piperidine in DMF (2.0L) was added to the reactor and stirred twice at 20-30°C for 15 minutes. The reaction solution was removed and the resin was washed 6 times with DMF (2.0 L) at 20-30° C. for 2 minutes. Dissolve MPA (3-Maleimidoproponic acid; 101.5 g, 3.0 eq.), HOBt (89.2 g, 3.3 eq.), and DIC (93.9 mL, 3.0 eq.) in 2.0 L of DMF. After adding this solution to the reactor, it is stirred for 3 hours at 20-30°C. After removing the reaction solution, washing twice for 2 minutes with DMF (2.0L) and twice for 2 minutes with DCM (2.0L), the resin is dried.
(15) CPP (TFA salt) 제조를 위한 Global cleavage 반응(15) Global cleavage reaction for producing CPP (TFA salt)
건조된 레진에 냉각된 cleavage cocktail 7.0 L (TFA : TIS : H2O = 95 : 2.5 : 2.5 )를 서서히 가하고 15-30℃에서 3시간 동안 교반한다. 반응 종결을 HPLC로 확인 후 cleavage 용액을 드레인(drain)하여 회수한다. 냉각된 디에틸 에터(diethyl ether; 28.0L)에 cleavage액을 서서히 첨가하고 30분 동안 교반한다. 석출된 고체를 얻기 위해 감압 여과하고 디에틸 에터 10L로 3회 세척 후 질소 건조 및 진공 건조하여 266.3 g의 CPP Crude를 수득하였다.Cooled cleavage cocktail 7.0 L (TFA : TIS : H2O = 95 : 2.5 : 2.5 ) was slowly added to the dried resin and stirred at 15-30℃ for 3 hours. After confirming the completion of the reaction by HPLC, the cleavage solution is drained and recovered. The cleavage solution was slowly added to cooled diethyl ether (28.0L) and stirred for 30 minutes. In order to obtain the precipitated solid, it was filtered under reduced pressure, washed three times with 10 L of diethyl ether, dried with nitrogen and vacuum dried to obtain 266.3 g of CPP Crude.
(16) 화학식 9로 표시되는 CPP 제조를 위한 정제 공정 (16) Purification process for producing CPP represented by
Crude 화합물 226.3 g을 용해 후 GF/C 필터 및 0.45 μm HVHP 멤브레인 필터로 여과한다. Crude 액을 컬럼에 주입하여 정제 후, 분취액을 모아 동결건조 하여 정제된 CPP 94.7 g을 수득하였다(3-MPA-Arg-Ile-Met-Arg-Ile-Leu-Arg-Ile-Leu-Lys-Leu-Ala-Arg-OH). After dissolving 226.3 g of the crude compound, it is filtered through a GF/C filter and a 0.45 μm HVHP membrane filter. After purification by injecting the crude liquid into a column, aliquots were collected and lyophilized to obtain 94.7 g of purified CPP (3-MPA-Arg-Ile-Met-Arg-Ile-Leu-Arg-Ile-Leu-Lys- Leu-Ala-Arg-OH).
CPP의 제조공정 개략도는 도 9와 같다.A schematic diagram of the manufacturing process of CPP is shown in FIG.
[화학식 9][Formula 9]
2. 화학식 10으로 표시되는 AGM-380d의 제조2. Preparation of AGM-380d represented by
AGM-330d (6.2g, 2.04 mmol)를 20% 아세트나이트릴 수용액(ACN aq; 620 mL, pH: ~ 7.0 adjust NH4OH)에 완전히 녹인 후 CPP(5.5 g, 3.07 mmol)을 넣고 반응을 진행하여 밤샌(Overnight) 후 반응을 종결한다. 반응액을 GF/C 필터 및 0.45 μm HVHP 멤브레인 필터로 여과 후 정제 및 염 치환 공정을 진행하고 동결건조 하여 6.57 g AGM-330d-mCPP(AGM-380d)의 화합물을 수득하였다.After completely dissolving AGM-330d (6.2g, 2.04 mmol) in 20% acetonitrile aqueous solution (ACN aq; 620 mL, pH: ~ 7.0 adjust NH 4 OH), CPP (5.5 g, 3.07 mmol) was added and the reaction proceeded. to terminate the reaction after overnight. The reaction solution was filtered through a GF/C filter and a 0.45 μm HVHP membrane filter, followed by purification and salt replacement, and lyophilization to obtain 6.57 g of AGM-330d-mCPP (AGM-380d) compound.
AGM-380d의 제조공정 개략도는 도 10과 같고, 이의 MALDI-TOF Mass 분석 결과는 도 17과 같다.A schematic diagram of the manufacturing process of AGM-380d is shown in FIG. 10, and the MALDI-TOF mass analysis result thereof is shown in FIG. 17.
[화학식 10][Formula 10]
실시예 8. AGM-380t의 제조Example 8. Preparation of AGM-380t
AGM-330t (22.4 mmol, 136 g, 1.0 eq.)과 CPP (33.7 mmol, 60.7 g, 1.5 eq.)를 반응기에 넣는다. 여기에 PBS (25% 아세토나이트릴 포함, pH: ~ 7.0) 6800 mL를 넣고 20-30℃에서 2시간 동안 교반한다. 반응이 완료되면 반응액을 회전농축기에 넣고 감압 농축하여 아세토나이트릴을 제거한 후 정제를 진행한다. 정제 후 동결 건조하여 최종 화학식 11로 표시되는 AGM-380t 101.4g을 수득하였다.AGM-330t (22.4 mmol, 136 g, 1.0 eq.) and CPP (33.7 mmol, 60.7 g, 1.5 eq.) are put into a reactor. Add 6800 mL of PBS (containing 25% acetonitrile, pH: ~ 7.0) and stir at 20-30°C for 2 hours. When the reaction is complete, the reaction solution is put into a rotary concentrator and concentrated under reduced pressure to remove acetonitrile, and then purification is performed. After purification, lyophilization was performed to obtain 101.4 g of AGM-380t represented by the final formula (11).
AGM-380t의 제조공정 개략도는 도 11과 같고, 이의 MALDI-TOF Mass 분석 결과는 도 18과 같다.A schematic diagram of the manufacturing process of AGM-380t is shown in FIG. 11, and the MALDI-TOF mass analysis result thereof is shown in FIG. 18.
[화학식 11][Formula 11]
실험예. 첫번째 아미노산의 로딩율과 순도 간 관계experimental example. Relationship between the loading rate and purity of the first amino acid
일반적으로 펩타이드 화합물 제조시, 최종 합성 수율을 향상시키기 위하여 첫번째 아미노산을 레진에 로딩할 때 레진의 몰 수 대비 아미노산을 2.0 eq. 이상 과량으로 투입하여 레진에 아미노산을 최대한 많이 로딩한다. 그러나 AGM-330d와 AGM-330t의 경우, 레진에 대한 첫번째 아미노산의 로딩율이 증가하면 할수록 아미노산의 응집(Aggregation)과 입체장애(Steric hindrance) 현상으로 합성 순도가 현저하게 감소되는 것을 확인하였다. In general, when preparing a peptide compound, when loading the first amino acid into a resin in order to improve the final synthesis yield, 2.0 eq. By adding an excessive amount, the amino acid is loaded into the resin as much as possible. However, in the case of AGM-330d and AGM-330t, it was confirmed that as the loading ratio of the first amino acid to the resin increased, the synthesis purity was remarkably reduced due to amino acid aggregation and steric hindrance.
도 19는 자동합성기를 이용하여 AGM-330t Crude의 합성 시 레진에 대한 첫번째 아미노산의 사용량을 조절하여 로딩율에 따른 최종 제품 Crude 순도 경향을 나타낸 결과이다. 실험결과 로딩율이 증가할수록 AGM-330t Crude의 순도는 현저히 저하됨을 확인하였다. 19 is a result showing the final product crude purity trend according to the loading ratio by adjusting the amount of the first amino acid for the resin when synthesizing AGM-330t Crude using an automatic synthesizer. As a result of the experiment, it was confirmed that the purity of AGM-330t Crude significantly decreased as the loading rate increased.
도 19의 실험 결과를 바탕으로 로딩율은 0.1 ~ 0.3 mmol/g, 레진의 몰수 대비 아미노산의 당량은 0.1 ~ 0.3 eq.로 설정하였다. 아미노산 당량이 0.1 eq일 때 Crude 순도가 37.0%로 가장 높지만, 제품의 생산성을 고려하여 상기 모든 실시예에서는 아미노산 당량을 0.2 eq.을 사용하여 AGM-330d와 AGM-330t의 대량 합성을 실시하였다.Based on the experimental results of FIG. 19, the loading ratio was set to 0.1 to 0.3 mmol/g, and the equivalent weight of amino acid relative to the number of moles of resin was set to 0.1 to 0.3 eq. When the amino acid equivalent is 0.1 eq, the crude purity is the highest at 37.0%, but considering the productivity of the product, mass synthesis of AGM-330d and AGM-330t was performed using 0.2 eq.
본 발명의 범위는 후술하는 청구범위에 의하여 나타내어지며, 청구범위의 의미 및 범위 그리고 그 균등 개념으로부터 도출되는 모든 변경 또는 변형된 형태가 본 발명의 범위에 포함되는 것으로 해석되어야 한다.The scope of the present invention is indicated by the following claims, and all changes or modifications derived from the meaning and scope of the claims and equivalent concepts should be interpreted as being included in the scope of the present invention.
Claims (20)
(a) 고체상(solid-phase) 합성 방법으로 레진이 부착된 하기 화학식 20으로 표시되는 펩타이드를 수득하는 단계; 및
(b) 상기 단계 (a)에서 수득한 펩타이드에서 레진과 보호기를 제거하여, 하기 화학식 22로 표시되는 펩타이드를 수득하는 단계:
[화학식 20]
Am-dKn-dC-O-Resin
[화학식 21]
Arg(R1)-His(R2)-Gly-Ala-Met-Val-Tyr(R3)-Leu-Lys(R4)-PEGk-D-Lys{Arg(R1)-His(R2)-Gly-Ala-Met-Val-Tyr(R3)-Leu-Lys(R4)-PEGk}
[화학식 22]
Bm-dKn-dC-OH
[화학식 23]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEGk-D-Lys{Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEGk}
(상기 화학식 20 내지 23에 있어서, 상기 A는 하기 화학식 21로 표시되고, 상기 B는 하기 화학식 23으로 표시되며,
상기 R1은 구아니딘 보호기, 상기 R2는 이미다졸 보호기 또는 티오 보호기, 상기 R3는 수소 또는 히드록시 보호기, R4는 수소 또는 아민 보호기이고,
상기 dK와 dC는 각각 D-Lys과 D-Cys를 의미하며,
상기 m과 n은 각각 1과 0 또는 2와 1이고,
상기 k는 4 내지 20 중 어느 하나의 정수임).
A method for producing an AGM peptide that specifically binds to nucleolin, comprising the following steps:
(a) obtaining a resin-attached peptide represented by Formula 20 by a solid-phase synthesis method; and
(b) removing a resin and a protecting group from the peptide obtained in step (a) to obtain a peptide represented by Formula 22:
[Formula 20]
A m -dK n -dC-O-Resin
[Formula 21]
Arg(R 1 )-His(R 2 )-Gly-Ala-Met-Val-Tyr(R 3 )-Leu-Lys(R 4 )-PEG k -D-Lys{Arg(R 1 )-His(R 2 )-Gly-Ala-Met-Val-Tyr(R 3 )-Leu-Lys(R 4 )-PEG k }
[Formula 22]
B m -dK n -dC-OH
[Formula 23]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG k -D-Lys {Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG k }
(In Chemical Formulas 20 to 23, A is represented by the following Chemical Formula 21, and B is represented by the following Chemical Formula 23,
R 1 is a guanidine protecting group, R 2 is an imidazole protecting group or a thio protecting group, R 3 is hydrogen or a hydroxy protecting group, and R 4 is hydrogen or an amine protecting group;
The dK and dC mean D-Lys and D-Cys, respectively,
wherein m and n are 1 and 0 or 2 and 1, respectively;
Wherein k is any one integer from 4 to 20).
The method according to claim 1, wherein R 1 is tert-butyloxycarbonyl group (t-Butyloxycarbonyl), benzyloxycarbonyl group (Benzyloxycarbonyl), nitro group (Nitro), Pmc group (2,2,5,7,8-pentamethylchroman- 6-sulfonyl), Mtr group (4-methoxy-2,3,6-trimethylbenzene sulfonyl), Mts group (2,3,6-trimethyl Benzenesulfonyl), Mtb group (trimethoxybenzenesulfonyl), Mds group (4-methoxy-2, 6-dimethylbenzenesulfonyl), MIS group (1,2-Dimethylindole-3-sulfonyl), EDOT-2-sulfonyl group (3,4-ethylenedioxythiophene-2-sulfonyl), Pbf group (2,2,4,6,7- pentamethyldihydrobenzofuran-5-sulfonyl) or Tos group (4-Toluenesulphonyl) method.
The method according to claim 1, wherein the R 2 is a methyl group (Methyl), tert-butyloxycarbonyl group, (tert-Butyloxycarbonyl) triphenylmethyl group (Triphenylmethyl), Mmt group (4-Monomethoxytrityl), BOM group (Benzyloxymethylacetal), MBom group ( 3-methoxybebzyloxymethyl) or Mtt group (methyltrityl).
The method according to claim 1, wherein the R 3 is hydrogen, tert-butyl group (t-Butyl), triphenylmethyl group (triphenylmethyl), 2-chlorotriphenylmethyl group (2-chlorotriphenylmethyl) benzyl group (Benzyl), phenyl group (phenyl), Allyl group (allyl), methyl group (methyl), benzyl phospho group (benzyl phospho), SO3nP group (2,2-dimethylpropylsulfo), phospho group (phosphor), Clt group (2-chlorotrityl), DMAE group (dimethylaminoethyl), pro A method of propargyl or PO(NMe 2 ) 2 ) group (bis-dimethylamino-phosphono).
The method according to claim 1, wherein R 4 is hydrogen, tert-butyloxycarbonyl group (tert-Butyloxycarbonyl), triphenylmethyl group (triphenylmethyl), Dde group ((4,4-dimethyl-2,6-dioxocyclohex-1-ylidene) ethyl), Ddiv group ((4,4-dimethyl-2,6-dioxocyclohex-1-ylidene)-3-methylbuty), Alloc group (Allyloxycarbonyl), methyl group (methyl), methyl, tert-butyloxycarbonyl group (methyl , tert-Butyloxycarbonyl), Dnp group (2,4-dinitrophenyl), hexadecanoyl group (hexadecanoyl), Mmt group (4-Monomethoxytrityl), Mtt group (methyltrityl), Mca group (7-methoxycoumarin-4-acetyl), 9-Fluorenylmethylcarbonyl group, benzyloxycarbonyl group, pNZ group (p-Nitrobenzyloxycarbonyl), azido group, acetyl group (Acetyl), Pryoc group (Propargyloxycarbonyl) or trifluoroacetyl group (Trifluoroacetyl) method.
The method according to claim 1, wherein the resin is 2-chlorotrityl resin (2-Chlorotrityl), trityl resin (Trityl), 4-methyltrityl resin (4-Methyltrityl) or 4-methoxytrityl resin (4-Methoxytrityl ) method.
피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene).
The method according to claim 1, wherein the step (a) is a step of loading the first amino acid into the resin by reacting the first amino acid with any one selected from the group consisting of the following base reagents in the resin mixed with DCM (Dichloromethane) How to include:
Pyridine, Imidazole, Pyrrolidine, Cyclohexylamine, Morpholine, Piperidine, 4-Methoxypyridine, 2 -Chloropyridine (2-Chloropyridine), 4-dimethylaminopyridine (4-Dimethylaminopyridine), aniline (Aniline), 4-Methoxyaniline (4-Methoxyaniline), 4-phenylenediamine (4-Phenylenediamine), ethylamine ( Ethylamine), diethylamine, triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene).
피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene).
The method according to claim 1, wherein step (a) is capped by loading the first amino acid on the resin and then reacting with a solution containing any one selected from the group consisting of DCM, MeOH (Methanol) and the following base reagents The method further comprising the steps of:
Pyridine, Imidazole, Pyrrolidine, Cyclohexylamine, Morpholine, Piperidine, 4-Methoxypyridine, 2 -Chloropyridine (2-Chloropyridine), 4-dimethylaminopyridine (4-Dimethylaminopyridine), aniline (Aniline), 4-Methoxyaniline (4-Methoxyaniline), 4-phenylenediamine (4-Phenylenediamine), ethylamine ( Ethylamine), diethylamine, triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene).
피리딘(Pyridine), 이미다졸(Imidazole), 피롤리딘(Pyrrolidine), 사이클로헥실아민(Cyclohexylamine), 몰포린(Morpholine), 피페리딘(Piperidine), 4-메톡시피리딘(4-Methoxypyridine), 2-클로로피리딘(2-Chloropyridine), 4-디메틸아미노피리딘(4-Dimethylaminopyridine), 아닐린(Aniline), 4-메톡시아닐린(4-Methoxyaniline), 4-페닐렌디아민(4-Phenylenediamine), 에틸아민(Ethylamine), 디에틸아민(Diethylamine), 트리에틸아민(Triethylamine), DIPEA(N,N-Diisopropylethylamine) 및 DBU(1,8-Diazabicyclo[5.4.0]undec-7-ene).
The method according to claim 8, wherein the capping step comprises DCM, MeOH, and any one selected from the group consisting of the following base reagents in a volume ratio (v/v) of (10 to 20): (1 to 5): (1) Method of reacting with a solution of:
Pyridine, Imidazole, Pyrrolidine, Cyclohexylamine, Morpholine, Piperidine, 4-Methoxypyridine, 2 -Chloropyridine (2-Chloropyridine), 4-dimethylaminopyridine (4-Dimethylaminopyridine), aniline (Aniline), 4-Methoxyaniline (4-Methoxyaniline), 4-phenylenediamine (4-Phenylenediamine), ethylamine ( Ethylamine), diethylamine, triethylamine, DIPEA (N,N-Diisopropylethylamine) and DBU (1,8-Diazabicyclo[5.4.0]undec-7-ene).
The method according to claim 1, wherein step (a) comprises loading D-Cys(R 2 ) as the first amino acid into the resin.
Wherein step (a) comprises loading 0.1 to 0.3 equivalents of D-Cys (R 2 ) to the resin relative to the number of moles of the resin.
The method according to claim 1, wherein step (a) comprises loading D-Cys(R 2 ) into the resin at a loading rate of 0.1 to 0.3 mmol/g.
The method of claim 1, wherein step (b) is performed in the presence of an acidic solution.
The method according to claim 1, wherein step (b) is trifluoroacetic acid (TFA), triisopropylsilene (TIS), ethylenedioxydiesatethiol (DODT), dimethyl sulfide (DMS) and ammonium iodide (NH 4 A method that is carried out in the presence of a mixed solution containing a combination of those selected from the group consisting of I).
The method according to claim 1, wherein R 1 is a Pbf group, R 2 is a triphenylmethyl group, R 3 is a tert-butyl group, and R 4 is a tert-butyloxycarbonyl group.
[화학식 24]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)-D-Cys-OH
[화학식 25]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)-D-Lys{Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6-D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG6)}-D-Cys-OH.
The method according to claim 1, wherein the peptide represented by Chemical Formula 22 is a peptide represented by Chemical Formula 24 or 25:
[Formula 24]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys (Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )-D-Cys -OH
[Formula 25]
Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys (Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )-D-Lys {Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 -D-Lys(Arg-His-Gly-Ala-Met-Val-Tyr-Leu-Lys-PEG 6 )}-D -Cys-OH.
[화학식 3]
.
The method according to claim 1, further comprising the step (c) of reacting the peptide obtained in step (b) with a 3-maleimidopropionicacid-Paclitaxel (MPA-PTX) complex represented by Formula 3 below:
[Formula 3]
.
[화학식 6]
.
The method according to claim 1, further comprising the step (d) of reacting the peptide obtained in step (b) with the MPA-AGM-130 (3-maleimidopropionicacid-AGM-130) complex represented by Formula 6:
[Formula 6]
.
[화학식 9]
.
The method according to claim 1, further comprising the step (e) of reacting the peptide obtained in step (b) with a cell penetrating peptide (CPP) represented by Formula 9 below:
[Formula 9]
.
The method according to any one of claims 17 to 19, wherein the reacting is performed under conditions of pH 6.5 to 8.0.
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