KR20230065009A - Plasma diagnosis system - Google Patents

Abstract

A plasma diagnosis system according to one embodiment of the present invention comprises: a plurality of probes which are installed inside a plasma chamber generating plasma and include one radiation probe that emits electromagnetic waves and a plurality of receiving probes that receive the electromagnetic waves; and a network analyzer which is connected to the plurality of probes and measures plasma characteristics using the electromagnetic waves transmitted between the one radiation probe and the plurality of receiving probes to analyze the distribution of plasma characteristics inside the plasma chamber, wherein a distance between the radiation probe and one among the plurality of receiving probes is different from a distance between the radiation probe and another one of the plurality of receiving probes. According to the present invention, the plasma diagnosis system can easily analyze the three-dimensional distribution of plasma characteristics inside the plasma chamber by measuring plasma characteristics at different heights inside the plasma.

Description

Plasma Diagnosis System {PLASMA DIAGNOSIS SYSTEM}

The present invention relates to a plasma diagnosis system, and more particularly, to a plasma diagnosis system capable of analyzing the distribution of plasma characteristics inside a plasma chamber.

The plasma process is a process for implementing etching and deposition of microcircuits in the process of manufacturing devices or panels such as semiconductors or displays. As the line width of a fine circuit to be implemented is reduced and the structure becomes more complex, there is an increasing demand for monitoring plasma characteristics that directly affect a plasma process and controlling the process.

Representative characteristics of plasma include plasma electron density, temperature, sheath thickness, etc. By diagnosing these plasma characteristics quantitatively at various locations inside the plasma chamber, the spatial characteristics of the change in process characteristics, such as detection of process problems and detection of process completion points, can be measured. Dispersion can be analyzed in real time.

An optical method and an electrical method are used to spatially decompose the plasma characteristic distribution inside the plasma. In the case of an optical method, a spatial distribution of plasma may be analyzed by measuring an optical signal generated in the plasma using a plurality of spatially spaced lenses. In this case, a relative error between the lenses may occur due to calibration of the light collection system including each lens and deviation due to contamination of individual viewing windows at each measurement location. Therefore, difficulties may arise in measuring the spatial spread. In another optical method, plasma characteristics in a depth direction may be measured using a lens having an adjustable focal length, and three-dimensional plasma characteristics may be measured by rotating a lens axis vertically and horizontally. In this case, since the lens focal point or the lens axis must be rotated at each point inside the plasma, it takes a lot of time to perform 3D measurement, and a wide area is required on the wall of the plasma chamber to secure the lens viewing angle. A window is required.

In the case of the electrical method, the flow of ions and electrons coming from the plasma is measured in each electric probe disposed two-dimensionally on the inside or on the electrostatic chuck in contact with the plasma to measure the spatial characteristics of the plasma. dispersion can be analyzed. In this case, although the plasma characteristics of the plasma located at the end of the electric probe can be measured in two dimensions, there is a limit to measuring the plasma characteristics inside the plasma. In another electrical method, plasma characteristics may be measured by disposing a small probe tip-shaped antenna for two-dimensionally applying microwaves inside or on an electrostatic chuck in contact with plasma. In this case, although the plasma characteristics of the plasma located at the end of the small antenna can be measured in two dimensions, there is a limit to obtaining the plasma characteristics inside the plasma.

The present invention is to solve the problems of the background art described above, and to provide a plasma diagnosis system capable of analyzing the distribution of plasma characteristics inside a plasma chamber.

A plasma diagnosis system according to an embodiment of the present invention includes a plurality of probes installed inside a plasma chamber generating plasma and including one radiation probe emitting electromagnetic waves and a plurality of receiving probes receiving the electromagnetic waves; and a network analyzer connected to the plurality of probes and analyzing plasma characteristic distribution inside the plasma chamber by measuring plasma characteristics using the electromagnetic waves transmitted between the one radiation probe and the plurality of receiving probes, A distance between the radiation probe and any one of the plurality of receiving probes is different from a distance between the radiation probe and another one of the plurality of receiving probes.

The radiation probe and the receiving probe may be installed on a lower electrode inside the plasma chamber.

The radiation probe and the receiving probe may be installed on a lower focus ring installed at an edge of a lower electrode inside the plasma chamber.

The radiation probe and the receiving probe may be installed on an upper focus ring installed at an edge of an upper electrode inside the plasma chamber.

The radiation probe and the receiving probe may be installed on a wall surface of the plasma chamber.

The network analyzer includes a radiation port connected to the radiation probe and transmitting a radiation signal, a receiving port connected to the receiving probe and transmitting a received signal, and measuring the plasma characteristics using the radiation signal and the received signal. wealth may be included.

The probe includes an antenna module installed inside the plasma chamber, and the antenna module includes an antenna module body, an antenna installed in the antenna module body and radiating or receiving the electromagnetic wave, and connecting the antenna to the network analyzer. Connections may be included.

The radiation probe or the receiving probe may have a spherical tip or a hemispherical tip.

In addition, a plasma diagnosis system according to another embodiment of the present invention is installed inside a plasma chamber that generates plasma, radiates electromagnetic waves and receives the electromagnetic waves, and is connected to the plurality of sensors and uses the electromagnetic waves. and a network analyzer for measuring plasma characteristics and analyzing a plasma characteristic distribution inside the plasma chamber, and the sensor includes a first probe unit and a second probe unit having different sensing intervals.

The first probe unit includes a first radiation probe emitting the electromagnetic wave and a first receiving probe receiving the electromagnetic wave, the first radiation probe and the first receiving probe being spaced apart from each other at a first sensing interval, , The second probe unit includes a second radiation probe emitting the electromagnetic wave and a second receiving probe receiving the electromagnetic wave, and the second radiation probe and the second receiving probe have a distance different from the first sensing interval. 2 may be spaced apart from each other at a sensing interval.

A first virtual line connecting the first sensing interval may cross a second virtual line connecting the second sensing interval.

The plurality of sensors may be installed on a lower electrode inside the plasma chamber.

The plasma diagnosis system according to an embodiment of the present invention measures plasma characteristics at different heights inside the plasma by making the intervals between the radiation probe and the receiving probe different from each other, thereby facilitating the three-dimensional distribution of plasma characteristics inside the plasma chamber. can be analyzed

1 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to an embodiment of the present invention.
2 is a detailed plan arrangement view of a plurality of probes of a plasma diagnosis system according to an embodiment of the present invention.
FIG. 3 is a diagram for explaining another embodiment of a method of driving the plasma diagnostic system of FIG. 2 .
FIG. 4 is a diagram explaining another embodiment of a method of driving the plasma diagnosis system of FIG. 2 .
5 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention.
FIG. 6 is a detailed plane arrangement view of a plurality of probes of the plasma diagnosis system of FIG. 5 .
7 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention.
FIG. 8 is a detailed plan arrangement view of a plurality of probes installed on a lower focus ring of the plasma chamber of FIG. 7 .
FIG. 9 is a detailed plan arrangement view of a plurality of probes installed on an upper focus ring of the plasma chamber of FIG. 7 .
10 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention.
FIG. 11 is a detailed plan layout view of a plurality of probes of the plasma diagnosis system of FIG. 10 .
12 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention.
13 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention.
FIG. 14 is a detailed plan layout view of a plurality of sensors of the plasma diagnosis system of FIG. 13 .
15 is a cross-sectional view taken along line XV-XV of FIG. 14;
16 is a cross-sectional view taken along line XVI-XVI of FIG. 14;

Hereinafter, various embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. This invention may be embodied in many different forms and is not limited to the embodiments set forth herein.

In order to clearly describe the present invention, parts irrelevant to the description are omitted, and the same reference numerals are assigned to the same or similar components throughout the specification.

Then, a plasma diagnosis system according to an embodiment of the present invention will be described in detail with reference to FIGS. 1 and 2 .

1 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to an embodiment of the present invention, and FIG. 2 is a detailed plan arrangement view of a plurality of probes of the plasma diagnosis system according to an embodiment of the present invention.

As shown in FIGS. 1 and 2 , the plasma diagnosis system according to an embodiment of the present invention includes a plurality of probes 100 and a network analyzer 200 .

The plurality of probes 100 may be installed on the lower electrode 20 located inside the plasma chamber 10 generating plasma. The lower electrode 20 may be used as a ground electrode or an electrostatic chuck. As shown in FIG. 2 , the lower electrode 20 may have a circular shape in plan view, and a lower focus ring 25 may be installed surrounding an edge of the lower electrode 20 .

In this embodiment, the plurality of probes 100 are installed only on the lower electrode 20, but are not necessarily limited thereto and may also be installed on the upper electrode 30 facing the lower electrode 20, and the upper electrode 30 An upper focus ring 35 may be installed surrounding the edge of the .

The plurality of probes 100 may emit electromagnetic waves or receive electromagnetic waves. Electromagnetic waves may include super high frequency (SHF). Ultra-high frequency belongs to the domain of radio waves or radio waves having a long wavelength among electromagnetic waves, and belongs to the domain of microwaves when further subdivided. The frequency range of the ultra-high frequency ranges from several tens of KHz to 20 GHz, and the wavelength range of the ultra-high frequency ranges from 1.5 cm to several thousand meters. The probe 100 may be an antenna having a spherical tip or a hemispherical tip 101 . Since the probe has a spherical tip or a hemispherical tip, sensitivity of microwave radiation and reception signals between the spherical tips can be improved compared to the flat tip. Accordingly, since a transmission spectrum having an effective intensity level can be obtained even between probes disposed relatively far apart, restrictions on a distance between probes are reduced, and a plurality of probes may be disposed close or far apart.

The plurality of probes 100 may include a radiation probe 110 emitting ultra-high frequencies and a plurality of receiving probes 120 receiving ultra-high frequencies. Since the radiation probe 110 and the receiving probe 120 are antennas having spherical or semicircular tips, high frequency transmission of high signal strength is performed using high capacitance between the radiation probe 110 and the receiving probe 120. characteristics and a high signal to noise ratio (SNR).

In this embodiment, one radiation probe 110 and a plurality of receiving probes 120 may be disposed. The radiation probe 110 may be positioned at the center of the lower electrode 20 on a plane, and the plurality of receiving probes 120 may be positioned surrounding the radiation probe 110 .

The network analyzer 200 is connected to the plurality of probes 100 and can measure plasma characteristics inside the plasma, for example, a transmission spectrum, by using electromagnetic waves transmitted between the radiation probe 110 and the reception probe 120 .

The network analyzer 200 may include a radiating port 210 , a receiving port 220 , and a measurement unit 230 .

The radiation port 210 is connected to the radiation probe 110 through a radiation connection line 211 and may transmit a radiation signal. Among the plurality of probes 100 , a probe connected to the radiation port 210 corresponds to the radiation probe 110 .

The receiving port 220 is connected to the receiving probe 120 through a receiving connection line 221 and may transmit a received signal. Among the plurality of probes 100 , a probe connected to the receiving port 220 corresponds to the receiving probe 120 .

The measurement unit 230 may measure the plasma characteristic distribution inside the plasma using the radiation signal and the reception signal. That is, the measuring unit 230 may analyze the distribution of plasma characteristics at each position inside the plasma by using a signal change on the transmission spectrum of the ultra-high frequency obtained by passing through the plasma according to the plasma characteristics of the ultra-high frequency.

An interval d1 between the radiation probe 110 and one of the receiving probes 120 may be different from a distance d2 between the other one of the radiation probe 110 and the receiving probe 120 .

As shown in FIG. 1, the receiving probe 120 has a first receiving probe 121 adjacent to the radiation probe 110 at a first distance d1, and a second distance d2 from the radiation probe 110. It may include the second receiving probe 122 adjacent to . Therefore, the ultra-high frequency emitted from one radiation probe 110 may be received by the first receiving probe 121 and the second receiving probe 122 . At this time, the ultra-high frequency is transmitted from the radiation probe 110 to the first receiving probe 121 along the first signal path S1, and from the radiation probe 110 to the second receiving probe along the second signal path S2. Ultra-high frequency is transmitted to (122). Also, the maximum height h2 of the second signal path S2 from the surface of the lower electrode 20 is higher than the maximum height h1 of the first signal path S1 from the surface of the lower electrode 20. .

Therefore, the characteristics of the plasma located on the first signal path (S1) are measured using the ultra-high frequency transmitted along the first signal path (S1), and the ultra-high frequency transmitted along the second signal path (S2) is used. The characteristics of the plasma positioned on the second signal path S2 may be measured. That is, by obtaining and analyzing a plasma electron resonance peak, a plasma-sheath resonance peak, etc. on the ultra-high frequency transmission spectrum passing through the first signal path S1, the plasma characteristics on the first signal path S1 can be inferred, and the second signal Plasma characteristics on the second signal path S2 can be inferred by obtaining and analyzing a plasma electron resonance peak, a plasma-sheath resonance peak, and the like on the microwave transmission spectrum passing through the path S2. Accordingly, plasma characteristics may be measured at different heights h1 and h2 inside the plasma based on the lower electrode 20 . Accordingly, it is possible to easily analyze the distribution of plasma characteristics, which is a three-dimensional distribution of plasma characteristics.

FIG. 3 is a diagram for explaining another embodiment of a method for driving the plasma diagnosis system of FIG. 2 , and FIG. 4 is a diagram for explaining another embodiment of a method for driving the plasma diagnosis system of FIG. 2 .

As shown in FIG. 3 , the arrangement of the radiation probe 110 and the receiving probe 120 connected to the radiation port 210 may be adjusted by adjusting the radiation port 210 . That is, as shown in FIG. 3, the radiation probe 110 is not located in the center of the lower electrode 20 on a plane, but is located on the right side, and the receiving probe 120 is spaced apart from the radiation probe 110. can be placed in place. In this case, the receiving probe 120 is a first receiving probe 121 adjacent to the radiation probe 110 at a first distance d1, and a second distance adjacent to the radiation probe 110 at a second distance d2. It may include a receiving probe 122 and a third receiving probe 123 positioned at a third interval d3 from the radiation probe 110 . Accordingly, the ultra-high frequency emitted from one radiation probe 110 may be received by the first receiving probe 121 , the second receiving probe 122 , and the third receiving probe 123 . At this time, the ultra-high frequency is transmitted from the radiation probe 110 to the first receiving probe 121 along the first signal path S1, and from the radiation probe 110 to the second receiving probe along the second signal path S2. The ultra-high frequency is transmitted to 122, and the ultra-high frequency is transmitted from the radiation probe 110 to the third receiving probe 123 along the third signal path S3. And, the maximum height h3 of the third signal path S3 from the surface of the lower electrode 20, the maximum height h2 of the second signal path S2 from the surface of the lower electrode 20, and The maximum height h1 from the surface of the lower electrode 20 of one signal path S1 is different from each other. Therefore, the characteristics of the plasma located on the first signal path (S1) are measured using the ultra-high frequency transmitted along the first signal path (S1), and the ultra-high frequency transmitted along the second signal path (S2) is used. The characteristics of the plasma located on the second signal path S2 are measured, and the characteristics of the plasma located on the third signal path S3 are measured using the microwave transmitted along the third signal path S3. can Accordingly, the plasma characteristic distribution can be measured by measuring the characteristics of the plasma at each height h1 , h2 , and h3 at the left side of the lower electrode 20 on a plane.

Meanwhile, as shown in FIG. 4 , the arrangement of the radiation probe 110 and the receiving probe 120 connected to the radiation port 210 may be adjusted again by adjusting the radiation port 210 . That is, as shown in FIG. 4, the radiation probe 110 is not located in the center of the lower electrode 20 on a plane but is biased to the left side, and the receiving probe 120 is spaced apart from the radiation probe 110. can be placed in place. Therefore, differently from FIG. 3 , the plasma characteristic distribution can be measured by measuring the characteristics of the plasma at each height h1 , h2 , and h3 at the approximate right side of the lower electrode 20 on a plane.

Meanwhile, in the above embodiment, a plurality of probes are disposed on the lower electrode, but other embodiments in which a plurality of probes are disposed on the lower focus ring are also possible.

Hereinafter, a plasma diagnosis system according to another embodiment of the present invention will be described in detail with reference to FIGS. 5 and 6 .

FIG. 5 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention, and FIG. 6 is a detailed plan arrangement view of a plurality of probes of the plasma diagnosis system of FIG. 5 .

The other embodiments shown in FIGS. 5 and 6 are substantially the same as the embodiments shown in FIGS. 1 to 4 except for the disposition structure of the plurality of probes, so repeated descriptions are omitted.

As shown in FIGS. 5 and 6 , the plurality of probes 100 of the plasma diagnosis system according to another embodiment of the present invention may be installed on the lower focus ring 25 . The lower focus ring 25 may be installed at an edge of the lower electrode 20 inside the plasma chamber 10 .

The plurality of probes 100 may include a radiation probe 110 emitting ultra-high frequencies and a plurality of receiving probes 120 receiving ultra-high frequencies. One radiation probe 110 may be installed, and the receiving probe 120 may be installed spaced apart from the radiation probe 110 along the lower focus ring 25 . The receiving probe 120 includes a first receiving probe 121 adjacent to the radiation probe 110 at a first interval d1, and a second receiving probe positioned at a second interval d2 from the radiation probe 110 ( 122), a third receiving probe 123 positioned at a third distance d3 from the radiation probe 110, and a fourth receiving probe 124 positioned at a fourth distance d4 from the radiation probe 110 , The fifth receiving probe 125 positioned at a fifth distance d5 from the radiation probe 110, and the sixth receiving probe 126 positioned at a sixth distance d6 from the radiation probe 110 can do. In this embodiment, the reception probe 120 includes first to sixth reception probes, but is not necessarily limited thereto, and various numbers of reception probes are possible.

Therefore, the ultra-high frequency emitted from one radiation probe 110 may be received by the first to sixth receiving probes 121 , 122 , 123 , 124 , 125 , and 126 . At this time, since the ultra-high frequency transmitted along the first to sixth signal paths S1, S2, S3, S4, S5, and S6 can measure the characteristics of plasma located at different heights, three of the plasma characteristics Plasma characteristic distribution, which is a dimensional distribution, can be measured.

Meanwhile, in the above embodiment, the plurality of probes are disposed only on the lower focus ring, but other embodiments in which the plurality of probes are disposed on the lower focus ring and the upper focus ring are also possible.

Hereinafter, a plasma diagnosis system according to another embodiment of the present invention will be described in detail with reference to FIGS. 7 to 9 .

7 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention, and FIG. 8 is a specific plan arrangement view of a plurality of probes installed on a lower focus ring of the plasma chamber of FIG. 7, FIG. 9 is a detailed plan arrangement view of a plurality of probes installed on an upper focus ring of the plasma chamber of FIG. 7 .

The other embodiments shown in FIGS. 7 to 9 are substantially the same as the other embodiments shown in FIGS. 5 to 6 except for the disposition structure of the plurality of probes, so repeated descriptions are omitted.

As shown in FIGS. 7 to 9 , the plurality of probes 100 of the plasma diagnosis system according to another embodiment of the present invention may be installed on the lower focus ring 25 and the upper focus ring 35 . The lower focus ring 25 may be installed at an edge of the lower electrode 20 inside the plasma chamber 10 . The upper focus ring 35 may be installed at an edge of the upper electrode 30 inside the plasma chamber 10 . The plurality of probes 100 may include a radiation probe 110 emitting ultra-high frequencies and a plurality of receiving probes 120 receiving ultra-high frequencies. The radiation probe 110 includes a lower radiation probe 110d installed on the lower focus ring 25 and an upper radiation probe 110u installed on the upper focus ring 35 . The receiving probe 120 includes a lower receiving probe 120d installed on the lower focus ring 25 and an upper receiving probe 120u installed on the upper focus ring 35 . The ultra-high frequency emitted from one lower radiation probe 110d may be received by the first to sixth lower receiving probes 121d, 122d, 123d, 124d, 125d, and 126d. At this time, since the ultrahigh frequency transmitted along the first to sixth lower signal paths S1d, S2d, S3d, S4d, S5d, and S6d can measure the characteristics of plasma located at different heights, three-dimensional The distribution of plasma characteristics can be analyzed. Similarly, the ultra-high frequency emitted from one upper radiation probe 110u may be received by the first to sixth upper receiving probes 121u, 122u, 123u, 124u, 125u, and 126u. At this time, since the ultrahigh frequency transmitted along the first to sixth upper signal paths S1d, S2d, S3d, S4d, S5d, and S6d can measure the characteristics of plasma located at different heights, three-dimensional The distribution of plasma characteristics can be analyzed. The upper radiation probe 110u and the lower radiation probe 110d may be positioned facing each other or not facing each other. Similarly, the upper receiving probe 120u and the lower receiving probe 120d may also be positioned facing each other or not facing each other.

In this embodiment, the lower reception probes include first to sixth lower reception probes, but are not necessarily limited thereto, and various numbers of lower reception probes are possible. In addition, in this embodiment, the upper receiving probes include the first upper receiving probes to the sixth upper receiving probes, but are not necessarily limited thereto, and various numbers of upper receiving probes are possible.

Meanwhile, although the plurality of probes are disposed on the lower electrode in the above embodiment, other embodiments in which the plurality of probes are disposed on the wall surface of the plasma chamber are also possible.

Hereinafter, a plasma diagnosis system according to another embodiment of the present invention will be described in detail with reference to FIGS. 10 and 11 .

FIG. 10 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention, and FIG. 11 is a detailed plan arrangement view of a plurality of probes of the plasma diagnosis system of FIG. 10 .

The other embodiments shown in FIGS. 10 and 11 are substantially the same as those of the embodiment shown in FIGS. 1 to 4 except for the disposition structure of the plurality of probes, so repeated descriptions are omitted.

As shown in FIGS. 10 and 11 , the plurality of probes 100 of the plasma diagnosis system according to another embodiment of the present invention may be installed on the wall surface 11 of the plasma chamber 10 . The plurality of probes 100 may include a radiation probe 110 emitting ultra-high frequencies and a plurality of receiving probes 120 receiving ultra-high frequencies. One radiation probe 110 may be installed, and the receiving probe 120 may be installed spaced apart from the radiation probe 110 along a wall surface of the plasma chamber 10 . Ultra-high frequencies emitted from one radiation probe 110 may be received by the first to fourth receiving probes 121 , 122 , 123 , and 124 . At this time, since the ultra-high frequency transmitted along the first to fourth signal paths S1, S2, S3, and S4 can measure the characteristics of plasma located at different positions, the plasma characteristic distribution can be measured. . In this embodiment, the reception probe 120 includes first to fourth reception probes, but is not necessarily limited thereto, and various numbers of reception probes are possible.

Meanwhile, in the above embodiment, a plurality of probes are disposed on the lower electrode, but other embodiments in which the plurality of probes are manufactured as an antenna module and disposed inside the plasma chamber are also possible.

Hereinafter, a plasma diagnosis system according to another embodiment of the present invention will be described in detail with reference to FIG. 12 .

12 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention.

The other embodiment shown in FIG. 12 is substantially the same as the embodiment shown in FIGS. 1 to 4 except for the structure and arrangement of the plurality of probes, so repeated descriptions are omitted.

As shown in FIG. 12 , the plurality of probes 100 of the plasma diagnosis system according to another embodiment of the present invention may include a plurality of antenna modules 300 installed inside the plasma chamber 10 . The plurality of antenna modules 300 may be installed adjacent to the lower electrode 20 inside the plasma chamber 10 or installed adjacent to the wall surface of the plasma chamber 10 in the form of a module. However, it is not necessarily limited thereto, and the antenna module may be installed in various positions inside the plasma chamber 10 .

The plurality of antenna modules 300 may include a radiation antenna module 310 emitting ultra-high frequencies and a plurality of receiving antenna modules 320 receiving ultra-high frequencies.

The radiation antenna module 310 may include a radiation antenna module body 311 , a radiation antenna 312 , and a radiation connector 313 . The radiation antenna module body 311 may have an empty space therein. The radiation antenna 312 is installed on the radiation antenna module body 311 and can radiate electromagnetic waves. The radiation connection unit 313 may connect the radiation antenna 312 to the network analyzer 200 and may have a cable shape.

Similarly, the receiving antenna module 320 may include a receiving antenna module body 321 , a receiving antenna 322 , and a receiving connector 323 . The receiving antenna module body 321 may have an empty space therein. The receiving antenna 322 is installed in the receiving antenna module body 321 and can receive electromagnetic waves. The receiving connection unit 323 may connect the receiving antenna 322 to the network analyzer 200 and may have a cable shape.

Ultra-high frequencies radiated from one radiation antenna module 310 may be received by the first and second reception antenna modules 320a and 320b. At this time, since the ultrahigh frequency transmitted along the first signal path and the second signal path S1 and S2 can measure the characteristics of plasma located at different positions, a three-dimensional plasma characteristic distribution can be measured.

Meanwhile, in the above embodiment, ultra-high frequencies are transmitted from one radiation probe to a plurality of receiving probes, but other embodiments in which ultra-high frequencies are transmitted from a plurality of radiation probes to a plurality of receiving probes are also possible.

Hereinafter, a plasma diagnosis system according to another embodiment of the present invention will be described in detail with reference to FIGS. 13 to 16 .

13 is a schematic diagram of a plasma chamber including a plasma diagnosis system according to another embodiment of the present invention, FIG. 14 is a specific plan layout view of a plurality of sensors of the plasma diagnosis system of FIG. 13, and FIG. is a cross-sectional view taken along line XV-XV, and FIG. 16 is a cross-sectional view taken along line XVI-XVI in FIG.

The other embodiments shown in FIGS. 13 to 16 are substantially the same as those of the embodiment shown in FIGS. 1 to 4 except for structures of a plurality of sensors, so repeated descriptions are omitted.

As shown in FIGS. 13 to 16 , a plasma diagnosis system according to another embodiment of the present invention includes a plurality of sensors 400 and a network analyzer 200 .

The plurality of sensors 400 may be installed on the lower electrode 20 located inside the plasma chamber 10 generating plasma. The plurality of sensors 400 may emit electromagnetic waves and receive electromagnetic waves.

The sensor 400 may include a first probe unit 410 and a second probe unit 420 having different sensing intervals sd1 and sd2 .

The network analyzer 200 is connected to the plurality of sensors 400 and uses electromagnetic waves transmitted from the first probe unit 410 and the second probe unit 420 to measure plasma characteristics inside the plasma, for example, a transmission spectrum. can

The first probe unit 410 may include a first radiation probe 411 emitting electromagnetic waves and a first receiving probe 412 receiving electromagnetic waves. The first radiation probe 411 and the first receiving probe 412 may be spaced apart from each other with a first sensing interval sd1. In the first probe unit 410, ultrahigh frequency waves may be transferred from the first radiation probe 411 to the first receiving probe 412 along the first sensing path SS1.

The second probe unit 420 may include a second radiation probe 421 emitting electromagnetic waves and a second receiving probe 422 receiving electromagnetic waves. The second radiation probe 421 and the second receiving probe 422 may be spaced apart from each other with a second sensing distance SD2 different from the first sensing distance SD1. In the second probe unit 420 , microwaves may be transferred from the second radiation probe 421 to the second receiving probe 422 along the second sensing path SS2 . The first virtual line X1 connecting the first sensing interval sd1 may cross the second virtual line Y1 connecting the second sensing interval sd2 .

At this time, the maximum height h2 of the second sensing path SS2 from the surface of the lower electrode 20 is higher than the maximum height h1 of the first sensing path SS1 from the surface of the lower electrode 20. do.

Therefore, the first probe unit 410 measures the characteristics of the plasma located on the first sensing path SS1 using the microwave transmitted along the first sensing path SS1, and the second probe unit 420 may measure the characteristics of plasma located on the second sensing path SS2 by using an ultra-high frequency transmitted along the second sensing path SS2. Accordingly, plasma characteristics can be measured at different heights inside the plasma based on the lower electrode 20 . Accordingly, a three-dimensional plasma characteristic distribution inside the plasma chamber 10 may be analyzed.

Although the present invention has been described through preferred embodiments as described above, the present invention is not limited thereto and various modifications and variations are possible without departing from the concept and scope of the claims described below. Those working in the technical field to which it belongs will readily understand.

10: plasma chamber 20: lower electrode
25: lower focus ring 30: upper electrode
35: upper focus ring 100: probe
110: radiation probe 120: receiving probe
200: network analyzer 210: radiation port
220: receiving port 230: measuring unit

Claims (12)

A plurality of probes installed inside a plasma chamber generating plasma and including one radiation probe emitting electromagnetic waves and a plurality of receiving probes receiving the electromagnetic waves; and
A network analyzer connected to the plurality of probes and analyzing the distribution of plasma characteristics inside the plasma chamber by measuring plasma characteristics using the electromagnetic waves transmitted between the one radiation probe and the plurality of receiving probes
including,
A distance between the radiation probe and any one of the plurality of receiving probes is different from a distance between the radiation probe and another one of the plurality of receiving probes. In paragraph 1,
The radiation probe and the receiving probe are installed on a lower electrode inside the plasma chamber. In paragraph 1,
The radiation probe and the receiving probe are installed on a lower focus ring installed at an edge of a lower electrode inside the plasma chamber. In paragraph 3,
The radiation probe and the receiving probe are installed on an upper focus ring installed at an edge of an upper electrode inside the plasma chamber. In paragraph 1,
The radiation probe and the receiving probe are installed on a wall surface of the plasma chamber. In paragraph 1,
The network analyzer
a radiation port connected to the radiation probe and transmitting a radiation signal;
A receiving port connected to the receiving probe and transmitting a receiving signal; and
Measuring unit for measuring the plasma characteristics using the radiation signal and the received signal
A plasma diagnostic system comprising a. In paragraph 1,
The probe includes an antenna module installed inside the plasma chamber,
The antenna module
antenna module body,
An antenna installed in the antenna module body and radiating or receiving the electromagnetic wave, and
Connection unit for connecting the antenna to the network analyzer
Plasma diagnostic system comprising a. In paragraph 1,
The radiation probe or the receiving probe has a spherical tip or a hemispherical tip. A plurality of sensors installed inside a plasma chamber generating plasma, radiating electromagnetic waves and receiving the electromagnetic waves, and
A network analyzer connected to the plurality of sensors and measuring plasma characteristics using the electromagnetic waves to analyze the distribution of plasma characteristics inside the plasma chamber
including,
The sensor includes a first probe unit and a second probe unit having different sensing intervals. In paragraph 9,
The first probe unit includes a first radiation probe emitting the electromagnetic wave and a first receiving probe receiving the electromagnetic wave, the first radiation probe and the first receiving probe being spaced apart from each other at a first sensing interval, ,
The second probe unit includes a second radiation probe emitting the electromagnetic wave and a second receiving probe receiving the electromagnetic wave, wherein the second radiation probe and the second receiving probe have a second sensing interval different from the first sensing distance. Plasma diagnostic systems spaced apart from each other with a sensing interval. In paragraph 10,
A first virtual line connecting the first sensing interval intersects a second virtual line connecting the second sensing interval. In paragraph 10,
The plurality of sensors are installed on the lower electrode inside the plasma chamber.

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