KR20170069652A - Microwave Plasma Diagnostic Apparatus - Google Patents

Microwave Plasma Diagnostic Apparatus Download PDF

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Publication number
KR20170069652A
KR20170069652A KR1020150177126A KR20150177126A KR20170069652A KR 20170069652 A KR20170069652 A KR 20170069652A KR 1020150177126 A KR1020150177126 A KR 1020150177126A KR 20150177126 A KR20150177126 A KR 20150177126A KR 20170069652 A KR20170069652 A KR 20170069652A
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KR
South Korea
Prior art keywords
antenna
ring
plasma
transmission
receiving
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KR1020150177126A
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Korean (ko)
Inventor
유신재
김정형
김대웅
성대진
Original Assignee
충남대학교산학협력단
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Priority to KR1020150177126A priority Critical patent/KR20170069652A/en
Publication of KR20170069652A publication Critical patent/KR20170069652A/en

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0062—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by using microwaves

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

The present invention provides a microwave plasma diagnostic apparatus. The microwave plasma diagnostic apparatus includes an antenna body portion electrically connected to ground and formed of a conductor; A transmitting antenna core formed as a conductor and being provided with a variable high frequency wave radiated from the outside to radiate the variable high frequency wave into a plasma and passing through the antenna body portion; A transmission antenna insulation tube formed of an insulator and embedded in the antenna body portion and arranged to surround the transmission antenna core; A receiving antenna isolation ring formed of an insulator and buried in a ring shape on one surface of the antenna body coaxial with the transmission antenna core; And a reception antenna conductive ring formed as a conductor and receiving a variable high frequency signal received through the plasma and embedded in the reception antenna isolation ring. One end of the transmission antenna core and one side of the reception antenna conductive ring are exposed to the outside.

Description

Microwave Plasma Diagnostic Apparatus "

More particularly, the present invention relates to an apparatus for extracting an electron density (or a plasma density) by detecting a cutoff frequency of a plasma.

Plasma processes are widely used for ion implantation, etching, deposition, surface treatment, and disinfection. In the plasma process, there are various techniques for measuring the electron density. However, this technique is difficult to calculate the absolute value of the electron density. In addition, such a technique is sensitive to the surrounding environment, so that monitoring of the plasma process condition is practically limited.

Dry etching and deposition uses plasma. Processes using various plasma are used in semiconductors, displays, and the like. Therefore, it is important to accurately diagnose and utilize the plasma. In order to diagnose the plasma, a plasma diagnosis method using a microwave having a relatively small amount of interference by plasma and high accuracy has been developed. The cut-off probe is one of the diagnostic methods using microwaves. The cut-off probe includes a radiation probe that emits an electromagnetic wave and a detection probe that receives the electromagnetic wave that transmitted the plasma. From the transmission spectrum transmitted through the plasma, the plasma density can be determined. The cuf-off peak in the transmission spectrum has information about the plasma density. The plasma density can be measured by measuring the cuf-off peak having a value close to the plasma frequency. The operation principle of the cut-off probe is described in Korean Patent No. 10-1225010.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to provide a compact high-frequency, ultra-low frequency plasma diagnostic apparatus with high sensitivity.

A microwave plasma diagnosis apparatus according to an embodiment of the present invention includes an antenna body portion electrically connected to ground and formed of a conductor; A transmitting antenna core formed as a conductor and being provided with a variable high frequency wave radiated from the outside to radiate the variable high frequency wave into a plasma and passing through the antenna body portion; A transmission antenna insulation tube formed of an insulator and embedded in the antenna body portion and arranged to surround the transmission antenna core; A receiving antenna isolation ring formed of an insulator and buried in a ring shape on one surface of the antenna body coaxial with the transmission antenna core; And a reception antenna conductive ring formed as a conductor and receiving a variable high frequency signal received through the plasma and embedded in the reception antenna isolation ring. One end of the transmission antenna core and one side of the reception antenna conductive ring are exposed to the outside.

In one embodiment of the present invention, the ultra-high frequency plasma diagnostic apparatus may further include a spectrum analyzer for providing the variable high frequency signal to the transmission antenna core and analyzing the variable high frequency signal received through the reception antenna ring.

In one embodiment of the present invention, the spectrum analyzer may further include a processor for calculating a transmission coefficient of a very high frequency, extracting a plasma cutoff frequency from the transmission coefficient, and converting the plasma cutoff frequency to a plasma density.

According to an embodiment of the present invention, there is provided a receiver comprising: a receiving antenna connector formed as a conductor and connected to the receiving antenna ring and disposed through the antenna body; And a receiving antenna connection part formed of an insulator and arranged to surround the receiving antenna connection part and formed of an insulator.

In one embodiment of the present invention, one surface of the receiving antenna insulating ring, one surface of the receiving antenna conductive ring, one end of the transmitting antenna core, and one end of the transmitting antenna insulating tube are exposed on one surface of the antenna body, Can be aligned in the same plane.

In one embodiment of the present invention, the receive antenna isolation ring may be disposed so as not to contact the transmit antenna isolation tube.

In one embodiment of the present invention, the receiving antenna insulating ring is disposed to contact the transmitting antenna insulating tube, and the receiving antenna insulating ring and the transmitting antenna insulating tube may be integrally formed.

In one embodiment of the present invention, the receive antenna isolation ring is disposed in contact with the transmit antenna isolation tube, and the receive antenna isolation ring and the transmit antenna isolation tube may be configured to be separate.

In one embodiment of the present invention, the receiving antenna connection portion, the receiving antenna connection insulating portion, and the antenna body portion form a coaxial cable structure, and the characteristic impedance of the concentric axial cable structure may be 50 ohms.

In one embodiment of the present invention, the transmission antenna core, the transmission antenna insulation tube, and the antenna body form a coaxial cable structure, and the characteristic impedance of the coaxial cable structure may be 50 ohms.

The microwave plasma diagnostic apparatus according to an embodiment of the present invention may have a concentric shaft structure, may be compact, increase space utilization, and provide high signal sensitivity.

1 is a conceptual diagram illustrating a microwave plasma diagnostic apparatus according to an embodiment of the present invention.
FIG. 2 is a plan view and a cross-sectional view illustrating the microwave plasma diagnostic apparatus of FIG. 1;
3 is a view for explaining a microwave plasma diagnostic apparatus according to another embodiment of the present invention.
4 is a view for explaining a microwave plasma diagnostic apparatus according to another embodiment of the present invention.
FIG. 5 is a graph illustrating a result of measurement of a transmission coefficient of a microwave using a microwave plasma diagnostic apparatus according to an exemplary embodiment of the present invention.

Plasma processes are widely used in semiconductor manufacturing, flat panel display device manufacturing, and solar cell manufacturing. In order to ensure the reliability of the plasma process, a technique for monitoring plasma process conditions or process reproducibility is required. The electron density is directly related to the radicla density. The electron density or the radical density is closely related to the speed of the deposition or etching process. Langmuir probe and laser Thomson scattering are tools that can measure the electron density. These methods are very limited for use in plasma processes. For example, the Langmuir probe has problems such as noise caused by plasma power generation RF power source, deposition on the probe during thin film deposition, and etching the probe during etching. In the case of laser Thompson scattering, the system is large and complex.

The method to improve this is the cutoff probe method using the amplitude of the transmission spectrum. Plasma has a unique plasma frequency. The plasma frequency is directly related to the plasma density. The plasma frequency can directly measure the electron density of the plasma. When the frequency of the electromagnetic wave is equal to or higher than the plasma frequency, the electromagnetic wave propagates through the plasma. On the other hand, if the frequency of the electromagnetic wave is less than the plasma frequency, the electromagnetic wave can not pass through the plasma and is cut off. When a variable frequency oscillator continuously transmits frequencies from 300 KHz to 6 GHz to the transmitting antenna, the electromagnetic waves emitted from the transmitting antenna are received by the receiving antenna and converted into receiving electrical signals. In this case, electromagnetic waves having a plasma frequency lower than the plasma density determined according to the electron density can not pass through the plasma, so that they are not received by the receiving antenna or only very weak signals are received. That is, the cutoff was found by measuring the intensity or amplitude of the transmission spectrum.

However, such a cutoff measuring method has a transmitting antenna and a receiving antenna which are spaced apart from each other, and the space utilization capability is degraded. In addition, in order to increase the space utilization and signal sensitivity, when the transmission antenna and the reception antenna are disposed too close to each other, the signal of the transmission antenna is directly transmitted to the reception antenna, so that it is difficult to find the cutoff frequency.

According to an embodiment of the present invention, the transmit antenna and the receive antenna can be designed in a concentric structure to increase the space utilization and improve the signal-to-noise ratio by more than 20 dB.

According to an embodiment of the present invention, a ring-shaped reception antenna is formed around a transmission antenna, thereby increasing space utilization and improving signal sensitivity by 20 dB or more.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following drawings, like reference numerals refer to like elements, and the size of each element in the drawings may be exaggerated for clarity and convenience of explanation.

1 is a conceptual diagram illustrating a microwave plasma diagnostic apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view and a cross-sectional view illustrating the microwave plasma diagnostic apparatus of FIG. 1;

1 and 2, the microwave plasma diagnostic apparatus 100 includes an antenna body portion 116, a transmitting antenna core 112, a transmitting antenna insulating tube 114, a receiving antenna insulating ring 124, And an antenna conductive ring 122. The antenna body 116 is electrically grounded and formed as a conductor. The transmission antenna core 112 is formed of a conductor and is arranged to penetrate the antenna body portion 116 by radiating the variable high-frequency wave into the plasma by receiving a variable high-frequency wave from the outside. The transmission antenna insulation tube 114 is formed of an insulator and is embedded in the antenna body 116 and disposed to surround the transmission antenna core 112. The reception antenna isolation ring 124 is formed of an insulator and embedded in a ring shape on one surface of the antenna body part 116 coaxial with the transmission antenna core 112. The receive antenna conductive ring 122 is formed as a conductor and receives a variable high frequency signal received through the plasma and embedded in the receive antenna isolation ring 124. One end of the transmission antenna core 112 and one side of the reception antenna conductive ring 122 are exposed to the outside.

The chamber can house the object to be processed and maintain a vacuum. The chamber is equipped with a plasma generating means, and the plasma generating means can form a plasma.

The microwave plasma diagnostic apparatus 100 may be installed in direct contact with the plasma within the chamber. The microwave plasma diagnostic apparatus can monitor plasma in real time and monitor the operating state. The microwave plasma diagnostic apparatus calculates an electron density or a plasma density by measuring a plasma frequency.

The antenna body portion 116 is formed of a conductor such as aluminum, and may be in the form of a disk or a plate. The antenna body 116 is electrically grounded and may be coupled to the transmission antenna core 112 to provide antenna characteristics and electrical characteristics of the transmission line. The antenna body 116 may be electrically grounded and coupled to the receive antenna conductive ring 122 to provide antenna characteristics and electrical characteristics of the transmission line. Preferably, the antenna body portion 116 may be in the form of a cylinder-shaped disk.

The transmission antenna core 112 may be disposed through the center of the antenna body 116. The transmission antenna core 112 may be connected to the spectrum analyzer through a coaxial cable. The transmission antenna core 112 may be wire-shaped, and the diameter of the transmission antenna core 112 may be several hundred micrometers to several millimeters.

The transmission antenna isolation tube 114 may electrically isolate the transmission antenna core 112 from the antenna body portion 116. The diameter and thickness of the transmission antenna isolation tube 114 may be the same as the diameter and thickness of the dielectric tube of a coaxial cable having a typical characteristic impedance of 50 ohms. Accordingly, the transmission antenna core 112, the transmission antenna insulation tube 114, and the antenna body 116 perform the same function as the transmission line, and the characteristic impedance of the transmission line can be set to 50 ohms. For example, the outer conductor may be removed from a conventional coaxial cable, and a dielectric tube and an inner core may be inserted into the antenna body. The outer conductor of a typical coaxial cable is replaced by the antenna body portion so that the same characteristic impedance characteristics can be easily achieved.

In order to improve the thermal characteristics, the transmission antenna insulating tube 114 may be replaced with a ceramic dielectric material such as alumina.

The reception antenna isolation ring 124 may be embedded in a ring-shaped groove formed on one surface of the antenna body 116 concentrically with respect to the transmission antenna core. One side of the receiving antenna insulator ring 124 may be exposed to the outside. The receive antenna isolation ring 124 may be a toroidal shape having a rectangular cross section. The receiving antenna insulating ring 124 may be formed of a ceramic material such as polytetrafluoroethylene (PTFE) or alumina, which has excellent insulation properties and heat resistance.

The receive antenna conductive ring 122 may be a metal or metal alloy with good conductivity such as copper. The receive antenna conductive ring 122 preferably forms a complete loop, but may not form a complete loop. The reception antenna conductive ring 122 may be embedded in a ring-shaped groove formed in the reception antenna isolation ring, and one side of the reception antenna conductive ring 122 may be exposed to the outside. The receive antenna conductive ring 122 may be a toroidal shape having a rectangular cross section. The receiving Athena insulating ring 124 and the receiving antenna conductive ring 122 may have a concentric circular structure.

The receiving antenna conductive ring 122 is connected to the spectrum analyzer 160 through a coaxial cable. To this end, the receive antenna connection 126 is formed as a conductor and is connected to the receive antenna ring 122 and disposed through the antenna body 116. The reception antenna connection insulator 128 is formed of an insulator and is arranged to surround the reception antenna connection and is formed of an insulator. The receive antenna connection 126, the receive antenna connection isolation 128, and the antenna body 116 may function as coaxial cables. The characteristic impedance of the receiving antenna connection part 126, the receiving antenna connection insulation part 128, and the antenna body part 116 may be 50 ohms. For example, the outer conductor of a typical 50 ohm coaxial cable is easily removed to achieve a 50 ohm characteristic, the inner core is used as a receive antenna connection, and the dielectric tube can be used as the receive antenna connection insulation.

The spectrum analyzer 160 provides the variable high frequency signal to the transmission antenna core 112 and analyzes the variable high frequency signal received through the reception antenna ring 122. The spectrum analyzer 160 may be a conventional network analyzer. The spectrum analyzer 160 can calculate a transmission coefficient S21 of a very high frequency.

The spectrum analyzer 160 may provide the transmission antenna core 112 with a very high frequency signal that varies with time. The range of the ultra high frequency to be scanned may be several hundred MHz to several tens GHz. The spectrum analyzer 160 may be a network analyzer. The spectrum analyzer 160 may measure the transmission coefficient S21.

The processing unit 170 may analyze the transmission coefficient S21 to extract a plasma cutoff frequency, and convert the plasma cutoff frequency to a plasma density. The cutoff frequency may correspond to a plasma density or an electron density.

One end of the receive antenna isolation ring 124, one side of the receive antenna conductive ring 122, one end of the transmit antenna core 112, and one end of the transmit antenna isolation tube 114 are connected to the antenna body 116 ), And can be aligned in the same plane. Specifically, one surface of the antenna body, one surface of the receiving antenna insulating ring, one surface of the receiving antenna conductive ring, one end of the transmitting antenna core, and one end of the transmitting antenna insulating tube may be disposed on the same plane.

The receive antenna isolation ring 124 may be disposed so as not to contact the transmission antenna isolation tube 114. A protruding portion 116a of the antenna body is disposed between the receiving antenna insulating ring 124 and the transmitting antenna insulating tube 114 so that the receiving antenna conducting ring 122 is electrically connected to the transmitting antenna core 112 It may be desirable to be shielded. The microwave plasma diagnostic apparatus of this structure provides high sensitivity, increases the space utilization, reduces the influence on the plasma, and significantly improves the spatial resolution when a plurality of the plasma display apparatuses are installed.

According to an alternative embodiment of the present invention, when a plurality of antenna structures are disposed in one antenna body to form a two-dimensional array, the spatial resolution can provide spatial resolution of 10 millimeters or less.

3 is a view for explaining a microwave plasma diagnostic apparatus according to another embodiment of the present invention. A description overlapping with those described in Figs. 1 and 2 will be omitted.

Referring to FIG. 3, the microwave plasma diagnostic apparatus 100a includes an antenna body portion 116, a transmitting antenna core 112, a transmitting antenna insulating tube 114, a receiving antenna insulating ring 124, (Not shown). The antenna body 116 is electrically grounded and formed as a conductor. The transmission antenna core 112 is formed of a conductor and is arranged to penetrate the antenna body portion 116 by radiating the variable high-frequency wave into the plasma by receiving a variable high-frequency wave from the outside. The transmission antenna insulation tube 114 is formed of an insulator and is embedded in the antenna body 116 and disposed to surround the transmission antenna core 112. The reception antenna isolation ring 124 is formed of an insulator and embedded in a ring shape on one surface of the antenna body part 116 coaxial with the transmission antenna core 112. The receive antenna conductive ring 122 is formed as a conductor and receives a variable high frequency signal received through the plasma and embedded in the receive antenna isolation ring 124. One end of the transmission antenna core 112 and one side of the reception antenna conductive ring 122 are exposed to the outside.

The receiving antenna isolation ring 124 is disposed to contact the transmission antenna isolation tube 114, and the reception antenna isolation ring and the transmission antenna isolation tube may be integrated.

4 is a view for explaining a microwave plasma diagnostic apparatus according to another embodiment of the present invention. A description overlapping with those described in Figs. 1 and 2 will be omitted.

4, the microwave plasma diagnostic apparatus 100b includes an antenna body portion 116, a transmission antenna core 112, a transmission antenna insulation tube 114, a reception antenna isolation ring 124, (Not shown). The antenna body 116 is electrically grounded and formed as a conductor. The transmission antenna core 112 is formed of a conductor and is arranged to penetrate the antenna body portion 116 by radiating the variable high-frequency wave into the plasma by receiving a variable high-frequency wave from the outside. The transmission antenna insulation tube 114 is formed of an insulator and is embedded in the antenna body 116 and disposed to surround the transmission antenna core 112. The reception antenna isolation ring 124 is formed of an insulator and embedded in a ring shape on one surface of the antenna body part 116 coaxial with the transmission antenna core 112. The receive antenna conductive ring 122 is formed as a conductor and receives a variable high frequency signal received through the plasma and embedded in the receive antenna isolation ring 124. One end of the transmission antenna core 112 and one side of the reception antenna conductive ring 122 are exposed to the outside.

The reception antenna isolation ring 124 is disposed to be in contact with the transmission antenna isolation tube 114 and the reception antenna isolation ring 124 and the transmission antenna isolation tube 114 may be configured separately.

FIG. 5 is a graph illustrating a result of measurement of a transmission coefficient of a microwave using a microwave plasma diagnostic apparatus according to an exemplary embodiment of the present invention.

Referring to FIG. 5, the conventional method includes a microwave radiation probe and a microwave receiving probe in a manner that the present inventor measured for comparison. In this structure, the radiation probe and the receiving probe are spaced apart from each other.

The transmission coefficient S21 of the microwave signal according to an embodiment of the present invention shows a signal increase of about 20 dB or more as compared with the conventional method. Therefore, the signal-to-noise bar is remarkably improved.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

112: transmitting antenna core
114: Transmission antenna insulation tube
116: Antenna body part
122: receiving antenna conductive ring
124: receiving antenna insulating ring

Claims (10)

An antenna body formed of an electrically grounded conductor;
A transmitting antenna core formed as a conductor and being provided with a variable high frequency wave radiated from the outside to radiate the variable high frequency wave into a plasma and passing through the antenna body portion;
A transmission antenna insulation tube formed of an insulator and embedded in the antenna body portion and arranged to surround the transmission antenna core;
A receiving antenna isolation ring formed of an insulator and buried in a ring shape on one surface of the antenna body coaxial with the transmission antenna core;
And a reception antenna conductive ring formed as a conductor and receiving a variable high frequency signal received through the plasma and embedded in the reception antenna isolation ring,
Wherein one end of the transmitting antenna core and one side of the receiving antenna conductive ring are exposed to the outside. The method according to claim 1,
Further comprising a spectrum analyzer for providing the variable high frequency signal to the transmitting antenna core and analyzing the variable high frequency signal received through the receiving antenna ring. The method according to claim 1,
Wherein the spectrum analyzer calculates a transmission coefficient of a very high frequency wave,
Further comprising a processor for extracting a plasma cutoff frequency from the transmission coefficient and converting the plasma cutoff frequency to a plasma density. The method according to claim 1,
A receiving antenna connection formed with a conductor and connected to the receiving antenna ring and disposed through the antenna body; And
And a receiving antenna connection insulator formed of an insulator and arranged to surround the receiving antenna connection part and formed of an insulator. The method according to claim 1,
One surface of the receiving antenna insulating ring, one surface of the receiving antenna conductive ring, one end of the transmitting antenna core, and one end of the transmitting antenna insulating tube are exposed on one surface of the antenna body and are aligned on the same plane. Microwave plasma diagnostic system. The method according to claim 1,
Wherein the receiving antenna isolation ring is disposed so as not to contact the transmission antenna isolation tube. The method according to claim 1,
Wherein the receiving antenna insulating ring is arranged to be in contact with the transmitting antenna insulating tube, and the receiving antenna insulating ring and the transmitting antenna insulating tube are integrally formed. The method according to claim 1,
Wherein the receiving antenna isolation ring is disposed in contact with the transmission antenna isolation tube, and the reception antenna isolation ring and the transmission antenna isolation tube are configured to be separated. 5. The method of claim 4,
Wherein the receiving antenna connecting portion, the receiving antenna connecting insulating portion, and the antenna body portion form a coaxial cable structure, and the characteristic impedance of the concentric axial cable structure is 50 ohms. The method according to claim 1,
Wherein the transmission antenna core, the transmission antenna isolation tube, and the antenna body form a coaxial cable structure, and the characteristic impedance of the coaxial cable structure is 50 ohms.
KR1020150177126A 2015-12-11 2015-12-11 Microwave Plasma Diagnostic Apparatus KR20170069652A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020159003A1 (en) 2019-01-31 2020-08-06 한국표준과학연구원 Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried
KR20200095022A (en) 2019-01-31 2020-08-10 한국표준과학연구원 Flat device for plasma diagnostics
KR20200112126A (en) 2019-03-21 2020-10-05 한국표준과학연구원 Wafer type apparatus with embedded flat device for plasma diagnostics
KR20200112131A (en) 2019-03-21 2020-10-05 한국표준과학연구원 Electrostatic chuck with embedded flat device for plasma diagnostics
KR20210106301A (en) 2020-02-20 2021-08-30 한국표준과학연구원 Plasma processing apparatus with embedded flat device for plasma diagnostics
KR102340564B1 (en) 2021-02-19 2021-12-20 한국표준과학연구원 Device for measuring plasma ion density and Apparatus for plasma diagnostics using the same
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020159003A1 (en) 2019-01-31 2020-08-06 한국표준과학연구원 Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried
KR20200095022A (en) 2019-01-31 2020-08-10 한국표준과학연구원 Flat device for plasma diagnostics
US20210116393A1 (en) * 2019-01-31 2021-04-22 Korea Research Institute Of Standards And Science Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried
US11867643B2 (en) * 2019-01-31 2024-01-09 Korea Research Institute Of Standards And Science Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried
KR20200112126A (en) 2019-03-21 2020-10-05 한국표준과학연구원 Wafer type apparatus with embedded flat device for plasma diagnostics
KR20200112131A (en) 2019-03-21 2020-10-05 한국표준과학연구원 Electrostatic chuck with embedded flat device for plasma diagnostics
KR20210106301A (en) 2020-02-20 2021-08-30 한국표준과학연구원 Plasma processing apparatus with embedded flat device for plasma diagnostics
KR20210128979A (en) 2020-02-20 2021-10-27 한국표준과학연구원 Plasma processing apparatus with embedded flat device for plasma diagnostics
KR102340564B1 (en) 2021-02-19 2021-12-20 한국표준과학연구원 Device for measuring plasma ion density and Apparatus for plasma diagnostics using the same
EP4047633A1 (en) 2021-02-19 2022-08-24 Korea Research Institute Of Standards And Science Device for measuring plasma ion density and apparatus for diagnosing plasma using the same
US11735397B2 (en) 2021-02-19 2023-08-22 Korea Research Institute Of Standards And Science Device for measuring plasma ion density and apparatus for diagnosing plasma using the same
KR20230007899A (en) 2021-07-06 2023-01-13 한국표준과학연구원 Electrostatic chuck with plasma diagnostics

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