KR20230019863A - 주기적인 오정합의 1차원 측정을 위한 계측 타겟 - Google Patents

주기적인 오정합의 1차원 측정을 위한 계측 타겟 Download PDF

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Publication number
KR20230019863A
KR20230019863A KR1020227045136A KR20227045136A KR20230019863A KR 20230019863 A KR20230019863 A KR 20230019863A KR 1020227045136 A KR1020227045136 A KR 1020227045136A KR 20227045136 A KR20227045136 A KR 20227045136A KR 20230019863 A KR20230019863 A KR 20230019863A
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KR
South Korea
Prior art keywords
target
metrology
overlay
measurement
sample
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Pending
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KR1020227045136A
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English (en)
Korean (ko)
Inventor
요엘 펠러
마크 기노브커
Original Assignee
케이엘에이 코포레이션
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Publication of KR20230019863A publication Critical patent/KR20230019863A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020227045136A 2020-06-04 2021-05-28 주기적인 오정합의 1차원 측정을 위한 계측 타겟 Pending KR20230019863A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063034414P 2020-06-04 2020-06-04
US63/034,414 2020-06-04
US17/098,835 2020-11-16
US17/098,835 US11686576B2 (en) 2020-06-04 2020-11-16 Metrology target for one-dimensional measurement of periodic misregistration
PCT/US2021/034658 WO2021247384A1 (en) 2020-06-04 2021-05-28 Metrology target for one-dimensional measurement of periodic misregistration

Publications (1)

Publication Number Publication Date
KR20230019863A true KR20230019863A (ko) 2023-02-09

Family

ID=78817281

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227045136A Pending KR20230019863A (ko) 2020-06-04 2021-05-28 주기적인 오정합의 1차원 측정을 위한 계측 타겟

Country Status (7)

Country Link
US (2) US11686576B2 (https=)
EP (1) EP4150405A4 (https=)
JP (2) JP2023528464A (https=)
KR (1) KR20230019863A (https=)
CN (1) CN115917435A (https=)
TW (1) TWI907412B (https=)
WO (1) WO2021247384A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102580204B1 (ko) 2023-03-02 2023-09-19 (주)오로스 테크놀로지 1차원 오버레이 오차 측정을 위한 오버레이 마크, 이를 이용한 광학 수차 평가 방법, 이를 이용한 오버레이 마크 품질 평가 방법, 오버레이 측정 장치, 오버레이 측정 방법 및 반도체 소자의 제조방법
KR102923174B1 (ko) 2023-04-10 2026-02-06 (주)오로스테크놀로지 광 결정 층을 구비하는 오버레이 마크, 이를 이용한 오버레이 측정 방법, 측정 장치 및 반도체 소자의 제조방법, 광 결정 층을 최적화하는 방법
KR102875280B1 (ko) 2023-07-03 2025-10-23 (주) 오로스테크놀로지 오버레이 마크 및 이를 이용한 오버레이 측정 장치, 오버레이 측정 방법 및 반도체 소자의 제조방법

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Publication number Publication date
EP4150405A4 (en) 2024-08-14
CN115917435A (zh) 2023-04-04
WO2021247384A1 (en) 2021-12-09
JP2026041836A (ja) 2026-03-10
TWI907412B (zh) 2025-12-11
US20210381825A1 (en) 2021-12-09
EP4150405A1 (en) 2023-03-22
JP2023528464A (ja) 2023-07-04
US11686576B2 (en) 2023-06-27
TW202212773A (zh) 2022-04-01
US20240035812A1 (en) 2024-02-01

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