KR20220170561A - Roller and substrate processing apparatus - Google Patents

Abstract

The present invention relates to a roller and a substrate processing facility which comprise: an inner wheel formed in a hollow shape, wherein both sides of the inner wheel are opened; an outer wheel formed in a hollow shape, wherein both sides of the outer wheel are opened and the outer wheel is installed on the outside of the inner wheel to be spaced apart from the inner wheel; a buffer member installed between the inner wheel and the outer wheel; first cover members installed on both sides of the inner wheel; and second cover member installed on both sides of the outer wheel. By reducing a frictional force between the roller and an object to be processed, generation of foreign matters can be suppressed and a space where a substrate is processed can be kept clean.

Description

Roller and substrate processing apparatus {Roller and substrate processing apparatus}

The present invention relates to a roller and a substrate treatment facility, and more particularly, to a roller and a substrate treatment facility capable of keeping a space where a substrate is processed clean by suppressing the generation of foreign substances.

A manufacturing process of a flat panel display such as a liquid crystal display includes a deposition process of forming various films on a substrate. For example, in the deposition process, a substrate is mounted on a tray, and a thin film is deposited by supplying a deposition material to the substrate while carrying the tray into a chamber and transporting the tray in one direction.

Meanwhile, as the flat panel display becomes larger, the size and load of the tray on which the substrate is mounted also increases. In the deposition process, the tray on which the substrate is mounted is conveyed in a vertical or inclined position by rotating the roller. ) will occur. Particles contaminate the processing space of the substrate and adhere to the substrate to deteriorate the quality of the substrate. In addition, since the tray cannot be stably conveyed when the rollers are worn out, the worn rollers must be replaced with new rollers, which increases maintenance costs due to replacement of the rollers.

KR10-1499526 B

The present invention provides a roller and substrate treatment facility capable of suppressing wear caused by heavy objects and improving service life.

The present invention provides a roller and a substrate processing facility capable of preventing a substrate processing space from being contaminated and improving substrate quality.

A roller device according to an embodiment of the present invention includes an inner ring formed in a hollow shape on both sides of which are open; An outer ring formed in a hollow shape with both sides open and installed on the outside of the inner ring to be spaced apart from the inner ring; a buffer member installed between the inner ring and the outer ring; First cover members installed on both sides of the inner ring; and a second cover member installed on both sides of the outer ring.

A key groove concavely recessed may be formed on an inner surface of the inner ring, and a first coupling groove or a first coupling protrusion coupled to the buffer member may be formed on an outer surface of the inner ring.

The outer ring may have a second coupling groove or a second coupling protrusion coupled to the shock absorbing member formed on an inner surface facing the inner ring.

The outer ring may include at least one of non-ferrous metal, bearing steel, tool steel, stainless steel, and alloy tool steel.

An anti-wear layer containing a material having a higher hardness than a material forming the outer ring may be included on the surface of the outer ring.

The wear-resistant layer may include at least one of AlCrBN, TiN, and CrN.

The wear-resistant layer may be formed by heat treating the outer ring using any one of heat treatment, nitriding treatment, plasma treatment, and plating treatment.

The buffer member may include at least one of fluororubber, polyimide, fluororubber composite, polyimide composite, urethane, silicone, and polytetrafluoroethylene fibers.

The buffer member may further include a conductive material.

The buffer member may be heat treated at a temperature higher than the temperature of the processing space in which it is used.

The buffer member is formed in a hollow shape with both sides open, and may include a third coupling groove or a third coupling protrusion coupled to at least one of the inner ring and the outer ring on at least one of the inner and outer surfaces of the buffer member. .

The first cover member is installed on both sides of the inner race to cover a portion of the buffer member, and the second cover member is installed on both sides of the outer race to cover the remainder of the buffer member, and the first cover member and The second cover member may be disposed so as not to contact each other.

The first cover member includes a first area in contact with the inner ring and a second area covering the buffer member, and the second cover member includes a third area in contact with the outer ring and a fourth area covering the buffer member. The first cover member and the second cover member are disposed so that at least a portion of the second area and at least a portion of the fourth area overlap each other, and are spaced apart from each other in the radial direction and the width direction of the outer ring. can

The first cover member and the second cover member may include stepped portions engaged with each other in the second region and the fourth region.

A separation distance between the first cover member and the second cover member in the radial direction of the outer ring may be 0.5 mm to 3 mm.

The first cover member and the second cover member may be disposed to be spaced apart from the buffer member.

A substrate processing facility according to an embodiment of the present invention includes a chamber forming a processing space for a substrate; a tray for supporting a substrate; And rotatably installed in the chamber to convey the tray, it may include a roller of the above substrate.

According to the embodiment of the present invention, the impact or pressure applied to the roller by the tray, which is a heavy object, can be reduced. Therefore, it is possible to suppress the phenomenon of abrasion of the surface of the roller by reducing the frictional force between the tray and the roller. Therefore, by reducing the amount of particles generated as the surface of the roller is worn, it is possible to prevent the processing space of the substrate and the substrate from being contaminated by the particles. In addition, it is possible to extend the life of the roller, and to form a part of the roller to be replaceable, thereby reducing the cost required for manufacturing and replacing the roller.

1 is a view schematically showing a substrate processing facility according to an embodiment of the present invention.
2 is a view showing the internal structure of a substrate processing facility according to an embodiment of the present invention.
Figure 3 is an exploded perspective view of a roller according to an embodiment of the present invention.
Figure 4 is a perspective view of a roller according to an embodiment of the present invention.
Fig. 5 is a cross-sectional view of the roller taken along the line A-A' shown in Fig. 4;
6 is a view showing an operating state of a roller according to an embodiment of the present invention.
7 is a graph showing experimental results for verifying the performance of a roller according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in a variety of different forms, only these embodiments will complete the disclosure of the present invention, and will fully cover the scope of the invention to those skilled in the art. It is provided to inform you. In order to describe the invention in detail, the drawings may be exaggerated, and like reference numerals refer to like elements in the drawings.

1 is a diagram schematically showing a substrate processing facility according to an embodiment of the present invention, and FIG. 2 is a diagram showing an internal structure of a substrate processing facility according to an embodiment of the present invention.

1 and 2, a substrate processing facility according to an embodiment of the present invention includes a tray 200 for supporting a substrate S and a chamber 100 forming a processing space for the substrate S. , Rollers 145a and 145b installed in the chamber 100 to transport the tray 200 may be included. A substrate processing facility may include various devices such as a deposition device and an etching device. Here, a substrate processing facility will be described as an example of a sputtering device, which is one of the deposition devices.

First, the substrate S may be various plates in which a process of manufacturing an electronic device is in progress or has been completed, for example, a substrate in which a process of manufacturing an oxide semiconductor is in progress. Of course, the substrate may be various, such as a substrate in which a process of manufacturing a display device is in progress, a substrate in which a process of manufacturing a semiconductor device is in progress, and the like.

Such a substrate (S) may be mounted on the tray 200 and carried into the chamber 100 . The tray 200 may be formed to support the substrate S vertically or inclinedly. The tray 200 may include a frame 200a for mounting the substrate S and a support rod 200b installed on the frame 200a so as to contact the rollers 145a and 145b. The frame 200a is formed to have the same or similar shape to that of the substrate S, and may be formed in a frame shape capable of supporting an edge of the substrate S. For example, when the substrate S is formed in a rectangular plate shape, the frame 200a may be formed in a rectangular frame shape. However, the shape of the frame 200a may be formed in a shape different from that of the substrate S, and the substrate It may be formed in various shapes that can stably support (S). The support rod 200b is formed in a bar shape extending in one direction, and may be formed to have a curved surface on at least a portion contactable with the rollers 145a and 145b. For example, the support rod 200b may be formed to have a cylindrical shape. The support rod 200b may be installed at the lower end of the frame 200a so as to extend in a horizontal direction. Through this configuration, the tray 200 is seated on the rollers 145a and 145b through the support rods 200b in a state in which the substrate S is vertically or inclinedly mounted on the frame 200a, and the rollers 145a and 145b It may be transported inside the chamber 100 by rotation.

The chamber 100 forms a processing space for the substrate S therein, and a plurality of chambers are arranged in a line in one direction, for example, in a process progress direction, and may be serially connected to each other. The chamber 100 may include a load lock chamber 100a, a heater chamber 100b, and process chambers 100c, 100d, and 100e. In this case, the load lock chamber 100a, the heater chamber 100b, and the process chambers 100c, 100d, and 100e may be disposed in order based on the direction in which the substrate S is loaded into the chamber 100.

The load lock chamber 100a is a space into which unprocessed substrates S are carried in and processed substrates S are taken out, and can be switched to a vacuum or atmospheric pressure atmosphere. A gate valve (not shown) for carrying in and out of the substrate S may be formed in the load lock chamber 100a, and a pressure control means (not shown) for forming a vacuum or converting to an atmospheric pressure atmosphere is installed in the load lock chamber 100a. It can be.

The heater chamber 100b is installed on one side of the load lock chamber 100a and may form a heating space for heating a substrate S, for example, an unprocessed substrate, carried in through the load lock chamber 100a. A gate valve (not shown) may be formed on a side of the heater chamber 100b in contact with the load lock chamber 100a to allow the substrate S to enter and exit. In addition, a heating means (not shown) for heating the substrate S and a pressure control means (not shown) for forming a vacuum in the heating space may be installed in the heater chamber 100b. Accordingly, a vacuum may be maintained inside the heater chamber 100b while processing the substrate S.

The process chambers 100c, 100d, and 100e may form a processing space of the substrate S, that is, a space in which a film formation process is performed on the substrate S, for example, a film formation space. A plurality of process chambers 100c, 100d, and 100e may be provided, for example, three. The plurality of process chambers 100c, 100d, and 100e are connected in series, and a gate valve (not shown) is installed between the process chambers 100c, 100d, and 100e to allow the tray 200 to enter and exit each of the process chambers 100c, 100d, and 100e. can In addition, a pressure control unit (not shown) may be installed in each of the process chambers 100c, 100d, and 100e to form a vacuum in the film formation space.

At one side of the process chambers 100c, 100d, and 100e, target chambers 110a, 110b, and 110c capable of supplying materials for film formation on the substrate S may be installed. The target chambers 110a, 110b, and 110c may be installed in the plurality of process chambers 100c, 100d, and 100e, respectively, and disposed in a direction crossing the direction in which the plurality of process chambers 100c, 100d, and 100e are connected. It can be. The target chambers 110a, 110b, and 110c may be provided in the same number as the process chambers 100c, 100d, and 100e, and different types of materials may be supplied to the process chambers 100c, 100d, and 100e. That is, target chambers 110a, 110b, and 110c may be provided in each of the process chambers 100c, 100d, and 100e, and the insides of the process chambers 100c, 100d, and 100e and the target chambers 110a, 110b, and 110c are mutually related to each other. can be intertwined

A power supply unit 130 may be connected to the target chambers 110a, 110b, and 110c to vaporize a target, which is a film formation material. A gas supply unit 120 may be connected to the process chambers 100c, 100d, and 100e to supply process gas or atmosphere gas in order to create an optimal environment for the film formation space.

Referring to FIG. 2 , a transport unit 140 for transporting the tray 200 may be provided inside the chamber 100 . The transport unit 140 includes actuators 141a and 141b generating rotational force, shafts 143a and 143b rotatably connected to the actuators 141a and 141b, and rollers 145a and 145a connected to the shafts 143a and 143b. 145b) may be included.

Meanwhile, the unprocessed substrate S is carried into the load lock chamber 100a, passes through the heater chamber 100b, and is processed in the process chambers 100c, 100d, and 100e. Then, the substrate S on which the film formation process has been performed, for example, the substrate S is transferred from the process chambers 100c, 100d, and 100e to the outside through the heater chamber 100b and the load lock chamber 100a. . Hereinafter, the direction in which the unprocessed substrate S is conveyed is referred to as a process direction, and the direction in which the processed substrate S is conveyed is referred to as a carrying direction.

At least four transport units 140 are provided in each of the load lock chamber 100a, the heater chamber 100b, and the process chambers 100c, 100d, and 100e to transport the tray 200 in the process direction and the delivery direction. At this time, the transport unit 140 may include a first transport unit 140a for transporting the tray 200 in the process direction and a second transport unit 140b for transporting the tray 200 in the delivery direction. there is. The first transport unit 140a includes a first actuator 141a generating rotational force, a first shaft 143a rotatably connected to the first actuator 141a, and a first shaft 143a connected to the first shaft 143a. A roller 145a may be included. At this time, at least two first transport units 140a are provided in each of the load lock chamber 100a, the heater chamber 100b, and the process chambers 100c, 100d, and 100e to transport the tray 200 in the process direction. . At this time, the first rollers 145a and 145b of the first transport unit 140a are arranged in a row in the direction in which the load lock chamber 100a, the heater chamber 100b, and the process chambers 100c, 100d, and 100e are arranged. A first transport path may be formed to support the tray 200 and transport it in a process direction.

In addition, the second transport unit 140b includes a second actuator 141b that generates rotational force, a second shaft 143b rotatably connected to the second actuator 141b, and a second shaft 143b connected to the second shaft 143b. It may include two rollers (145b). The second roller 145b is arranged in a row in the direction in which the load lock chamber 100a, the heater chamber 100b, and the process chambers 100c, 100d, and 100e are arranged, and crosses the direction in which the chambers 100 are arranged. It may be arranged to be spaced apart from the first roller 145a in the direction. Accordingly, the second rollers 145b may support the tray 200 and form a second transport path to transport the tray 200 in the delivery direction. As such, the first conveyance unit 140a and the second transfer unit 140b have different positions where the first roller 145a and the second roller 145b are disposed, and may have almost the same structure.

On the other hand, the tray 200 may be provided with a heavy material to stably support the substrate (S). For example, the tray 200 may have a weight of about 100 to 400 kg. Then, the tray 200 is seated on the rollers 145a and 145b and transported by rotation of the rollers 145a and 145b. As such, the rollers 145a and 145b contact or collide with the tray 200 in the process of conveying the tray 200 and receive the load of the tray 200 as it is. As a result, the surfaces of the rollers 145a and 145b that come into contact with or collide with the tray 200 are worn, and a large amount of particles are generated. Accordingly, in the present invention, a phenomenon in which the surfaces of the rollers 145a and 145b are abraded can be suppressed or prevented by absorbing or buffering a portion of the load of the tray 200 applied to the rollers 145a and 145b.

3 is an exploded perspective view of a roller according to an embodiment of the present invention, FIG. 4 is a perspective view of a roller according to an embodiment of the present invention, and FIG. 5 is a cross-sectional view of the roller taken along the line AA' shown in FIG. .

3 to 5, the roller according to the embodiment of the present invention is formed in a hollow inner ring 1451 open on both sides and a hollow inner ring 1451 open on both sides and spaced apart from the inner ring 1451. An outer ring 1452 installed outside the inner ring 1451 as much as possible, a buffer member 1453 installed between the inner ring 1451 and the outer ring 1452, and a first cover member installed on both sides of the inner ring 1451 ( 1454) and a second cover member 1455 installed on both sides of the outer ring 1452. In addition, a fixing member 1456 for fixing the first cover member 1454 and the second cover member 1455 to the inner ring 1451 and the outer ring 1452 may be included. Hereinafter, the direction in which the rollers 145a and 145b extend is referred to as the width direction of the rollers 145a and 145b, and the direction crossing the width direction is referred to as the radial direction of the rollers 145a and 145b. The width direction of the inner ring 1451 and the width direction of the outer ring 1452 are the same as those of the rollers 145a and 145b, and the radial direction of the inner ring 1451 and the radial direction of the outer ring 1452 are the same as the rollers 145a and 145b. ) is the same as the radial direction of

The inner ring 1451 may be formed in a hollow cylindrical shape with both sides open so that the shafts 143a and 143b may be inserted. At this time, a key (not shown) formed to protrude may be formed on a part of the shafts 143a and 143b inserted into the inner ring 1451, and a keyway 1451a into which the key can be inserted is formed on the inner surface of the inner ring 1451. can be formed. The key groove 1451a may be formed to extend along at least a portion of the inner ring 1451 in the width direction. In addition, a first coupling groove 1451c into which a part of the shock absorbing member 1453 can be inserted may be formed on an outer surface of the inner ring 1451 . 3 shows that a first coupling groove 1451c concavely recessed from the outer surface of the inner ring 1451 is formed on the outer surface of the inner ring 1451, but on the outer surface of the inner ring 1451, a first coupling groove 1451c protrudes convexly from the outer surface. 1 coupling protrusion (not shown) may be formed. The first coupling groove 1451c may be formed to extend in the width direction of the inner ring 1451, and a plurality of first coupling grooves 1451c may be formed to be spaced apart in the circumferential direction of the inner ring 1451. When the rollers 145a and 145b are rotated, the first coupling groove 1451c can maintain a coupled state between the buffer member 1453 and the inner ring 1451. Insertion grooves 1451b into which fixing members 1456 are inserted may be formed on both side surfaces of the inner ring 1451 to couple the first cover member 1454 to the inner ring 1451 . A plurality of insertion grooves 1451b may be formed to be spaced apart from each other on the side of the inner ring 1451 . The inner ring 1451 may be formed of a material of high hardness so as to rotate at high speed while supporting the tray 200, which is a heavy object. The inner ring 1451 may be formed of a metal of high hardness, such as non-ferrous metal, bearing steel, alloy tool steel, stainless steel, tool steel, and the like.

The outer ring 1452 may be formed in a hollow cylindrical shape with both sides open so that the inner ring 1451 may be inserted therein. At this time, the inner diameter of the outer ring 1452 may be formed larger than the outer diameter of the inner ring 1451. This is to secure a space into which the buffer member 1453 can be inserted between the inner ring 1451 and the outer ring 1452. In addition, the outer diameter of the outer ring 1452, for example, may decrease from both edges to the middle in the width direction of the outer ring 1452. Accordingly, a seating groove (not shown) having an arc-shaped curved surface in the width direction of the outer ring 1452 and being concavely depressed may be formed on the outer surface of the outer ring 1452 . A portion of the tray 200, that is, a portion of the support rod 200b may be inserted into the seating groove to stably support and transport the tray 200. A second coupling groove 1452b for inserting a part of the shock absorbing member 1453 may be formed on an inner surface of the outer ring 1452 . In FIG. 3, it is shown that a second coupling groove 1452b concavely recessed on the inner surface of the outer ring 1452 is formed, but on the inner surface of the outer ring 1452, a second coupling protrusion (not shown) protrudes convexly from the inner surface. may be formed. The second coupling groove 1452b may be formed to extend in the width direction of the outer ring 1452, and a plurality of second coupling grooves 1452b may be formed to be spaced apart in the circumferential direction of the outer ring 1452. When the rollers 145a and 145b are rotated, the second coupling groove 1452b can maintain a coupling state between the buffer member 1453 and the outer ring 1452. An insertion hole 1452a into which a fixing member 1456 is inserted may be formed on both sides of the outer ring 1452 to couple the second cover member 1455 to the outer ring 1452. A plurality of insertion holes 1452a may be formed to be spaced apart from each other on the side of the inner ring 1451 . The outer ring 1452 may be formed of a material of high hardness so that it can rotate at high speed while supporting the tray 200, which is a heavy object. The outer ring 1452 may be formed of a metal of high hardness, such as non-ferrous metal, bearing steel, alloy tool steel, stainless steel, tool steel, and the like. In addition, an anti-wear layer (not shown) may be formed on the surface of the outer ring 1452 to suppress wear. The wear-resistant layer may have a higher hardness than the outer ring 1452 and include a material that does not react with a film formation material during film formation of the substrate S. For example, the wear-resistant layer may include at least one of AlCrBN, TiN, and CrN. Alternatively, the wear-resistant layer may be formed to a predetermined thickness on the surface of the outer ring 1452 by treating the outer ring 1452 with at least one of heat treatment, nitriding treatment, plating treatment, and plasma treatment. For example, the outer ring 1452 may be plated with chromium (Cr) to form an anti-wear layer containing chromium (Cr) on the surface of the outer ring 1452, and carbon gas, which is the main component of diamond, is used. A wear-resistant layer containing carbon may be formed on the surface of the outer ring 1452 by generating plasma in a vacuum state (DLC: Diamond Like Coating). The anti-wear layer may be formed on the surface of the outer ring 1452 to a thickness of about 1 to 100 μm, or about 3 to 60 μm. If the thickness of the anti-wear layer is too thin, wear of the outer ring 1452 cannot be suppressed. On the other hand, if the thickness of the anti-wear layer is too thick, it is possible to suppress wear of the outer ring 1452, but there is a problem in that the manufacturing cost of the rollers 145a and 145b increases.

The inner ring 1451 may be inserted inside the outer ring 1452, and a buffer member 1453 may be inserted between the inner ring 1451 and the outer ring 1452. The buffer member 1453 serves to absorb or buffer an external force applied through the outer ring 1452 between the inner ring 1451 and the outer ring 1452, that is, the pressure applied by the tray 200. Conventionally, since the rollers are formed as a single structure, the pressure by the tray 200 is applied to the rollers 145a and 145b as they are. In this case, there is a problem in that a large amount of particles are generated due to friction between the tray and the roller, and damage is caused to the shaft connected to the roller. However, when the buffer member 1453 is disposed between the inner ring 1451 and the outer ring 1452, the external force or pressure applied by the outer ring 1452 is absorbed or buffered by the buffer member 1453 so that the surface of the outer ring 1452 It is possible to suppress a phenomenon of wear and to suppress a phenomenon in which external force or pressure is transferred to the inner ring 1451 and the shafts 143a and 143b connected to the inner ring 1451 as they are.

The buffer member 1453 may be formed in a hollow shape with both sides open so as to be inserted into the space between the inner ring 1451 and the outer ring 1452, for example, a hollow cylindrical shape with both sides open. In addition, on the inner and outer surfaces of the buffer member 1453, there are third coupling protrusions that can be inserted into the first coupling groove 1451c formed on the inner race 1451 and the second coupling groove 1452b formed on the outer race 1452. (1453a) may be formed. The third coupling protrusion 1453a may be formed to a size that can be inserted into the first coupling groove 1451c and the second coupling groove 1452b, and may extend in the width direction of the buffer member 1453. . Here, it has been described that the third coupling protrusion 1453a is formed on the buffer member 1453, but when the first coupling protrusion is formed on the outer surface of the inner ring 1451 and the first coupling protrusion is formed on the outer ring 1452 For example, a third coupling groove (not shown) into which the first and second coupling protrusions can be inserted may be formed in the buffer member 1453 . In this case, the third coupling protrusion 1453a may be formed to a height of 10 mm or less, or about 0.1 to 5 mm. In the case of the third coupling groove, it may be formed to a depth of 10 mm or less, or about 0.1 to 5 mm. The third coupling protrusion 1453a or the third coupling groove may be formed by a knurling method of compressing or cutting the shock absorbing member 1453 using a tool.

The buffer member 1453 may be formed of a material that has elasticity, is not greatly deformed by an external force, and can be quickly restored. For example, the buffer member 1453 is formed of a material having a Young's modulus of 12 MPa or less, or about 5 to 8 MPa, and an Elongation at Break of 150% to 700%, or 200 to 400% in a tensile test. It can be. At this time, if the Young's modulus or elongation upon breakage of the buffer member 1453 is too low, the external force applied to the outer ring 1452 cannot be sufficiently absorbed or buffered. On the other hand, if the Young's modulus or elongation upon breakage of the buffer member 1453 is too high, the external force applied to the outer ring 1452 can be sufficiently absorbed or buffered, but the buffer member 1453 is greatly deformed and the outer ring 1452 moves up and down. direction, the tray 200 cannot be stably supported. In addition, the buffer member 1453 may be formed of a material having a shore hardness of 60sh or more or 70sh or more to ensure durability. At this time, if the Shoyer hardness is lower than 60sh, it may be damaged by an external force applied to the outer ring 1452, and when the rollers 145a and 145b rotate, the buffer member 1453 is combined with the outer ring 1452 or the inner ring 1451 It may not hold its original state and may be twisted or deformed. The buffer member 1453 may be formed of at least one of fluororubber, polyimide, fluororubber composite, polyimide composite, urethane, silicone, and polytetrafluoroethylene fiber (Teflon). In this case, when the buffer member 1453 is formed of polyimide, a coating film may be formed of polytetrafluoroethylene fibers on the surface of the polyimide.

In addition, the buffer member 1453 may include a conductive material to control the surface resistance of the rollers 145a and 145b, for example, the outer ring 1452. The conductive material may include at least one of carbon black and carbon nanotubes. In this case, the buffer member 1453 may include a conductive material to control the surface resistance of the outer ring 1452 to about 10 ³ to about 10 ¹⁰ Ω or about 10 ⁵ to about 10 ⁸ Ω. In this way, if the surface resistance of the outer ring 1452 is controlled by the buffer member 1453, static electricity is generated on the rollers 145a and 145b during the film formation of the substrate S, and particles or particles generated as the outer ring 1452 wears away. It is possible to prevent other foreign substances from being moved to the substrate (S).

Meanwhile, during the film formation process, the inside of the chamber 100, for example, the process chambers 100c, 100d, and 100e is heated to a temperature of 150° C. or higher. Accordingly, when the buffer member 1453 is exposed to a high-temperature environment, a degassing phenomenon in which a material forming the buffer member 1453 is released as a gas may occur. When the degassing phenomenon occurs in the buffer member 1453 in this way, the internal atmosphere of the process chambers 100c, 100d, and 100e may be affected. Therefore, when the buffer member 1453 is manufactured, after heat-treating the buffer member 1453 at a temperature equal to or higher than the internal temperature of the process chambers 100c, 100d, and 100e in which the film is formed, a gap between the inner ring 1451 and the outer ring 1452 is formed. It is good to insert When the buffer member 1453 is heat-treated in this way, the buffer member 1453 is degassed, and thus, a phenomenon in which gas is discharged from the buffer member 1453 during a film formation process can be suppressed or prevented.

When the buffer member 1453 is inserted between the inner ring 1451 and the outer ring 1452, the inner ring 1451 and the outer ring 1452 are closed using the first cover member 1454 and the second cover member 1455. can make it At this time, the first cover member 1454 is fixed to the inner race 1451 by a fixing member 1456, and the second cover member 1455 is fixed to the outer race 1452 by a fixing member 1456. In this case, the first cover member 1454 and the second cover member 1455 may be separated from the buffer member 1453 by a predetermined distance. When an external force is applied to the outer ring 1452, the buffer member 1453 may be deformed according to the magnitude of the external force. For example, when an external force is applied in a vertical direction, the buffer member 1453 may contract in the direction in which the external force is applied and expand or expand in a direction crossing the direction in which the external force is applied. Accordingly, by disposing the first cover member 1454 and the second cover member 1455 apart from the buffer member 1453 by a predetermined distance, a space in which the buffer member 1453 can be deformed may be secured. At this time, the distance (G1) between the first cover member 1454 and the second cover member 1455 and the buffer member 1453 should be greater than 0 mm and less than 10 mm in consideration of contraction and expansion of the buffer member 1453. can If the distance G1 between the first cover member 1454 and the second cover member 1455 and the buffer member 1453 is too short, the buffer member 1453 cannot sufficiently absorb or buffer the external force. If the distance G1 between the first cover member 1454 and the second cover member 1455 and the buffer member 1453 is too long, the amount of deformation of the buffer member 1453 increases and the moving distance of the outer wheel 1452 increases. increased, so that the tray 200 cannot be transported stably.

The first cover member 1454 is formed in a ring shape and can be divided into a first area fixed to the inner ring 1451 in a radial direction and a second area covering a part of the buffer member 1453. The second cover member 1455 is formed in a ring shape, and a third area fixed to the outer ring 1452 and a portion remaining after being covered by the first cover member 1454 in the buffer member 1453, for example, the buffer member ( 1453) can be divided into a fourth area covering the rest. At this time, the first through hole 1454a for inserting the fixing member 1456 is formed in the first area of the first cover member 1454, and the fixing member 1456 is formed in the third area of the second cover member 1455. A second through hole 1455a for inserting may be formed. The first cover member 1454 and the second cover member 1455 may be respectively installed on the inner ring 1451 and the outer ring 1452 so as not to contact each other. The first cover member 1454 and the second cover member 1455 may be fixed to the inner race 1451 and the outer race 1452 such that a part of the second area and a part of the fourth area overlap each other and do not contact each other. Accordingly, stepped portions 1454b and 1455b engaging with each other may be formed in the second region of the first cover member 1454 and the fourth region of the second cover member 1455, respectively. For example, an 'b'-shaped first step 1454b is formed in the second area of the first cover member 1454, and a 'a'-shaped second step 1455b is formed in the fourth area of the second cover member 1455. ) can be formed. The first step 1454b of the first cover member 1454 and the second step 1455b of the second cover member 1455 are interdigitated with each other, and the width and diameter directions of the rollers 145a and 145b may be arranged so as to be spaced apart from each other. A distance G2 between the first cover member 1454 and the second cover member 1455 in the radial direction of the rollers 145a and 145b may be about 0.5 to 3 mm or about 1 to 2 mm. If the separation distance G2 between the first cover member 1454 and the second cover member 1455 is too short, the deformation of the buffer member 1453 is too limited, so that the buffer member 1453 is applied to the outer ring 1452 External forces cannot be sufficiently absorbed or buffered. On the other hand, if the distance G2 between the first cover member 1454 and the second cover member 1455 is too long, the deformation of the buffer member 1453 increases the movement distance of the outer wheel 1452, causing the tray 200 to move. cannot be stably supported and transported.

The first cover member 1454 and the second cover member 1455 may be spaced apart from each other and disposed without contacting each other in the width and diameter directions of the outer ring 1452 . Accordingly, a space in which the outer ring 1452 can flow can be secured by the load of the tray 200, and a moving distance of the outer ring 1452 can be limited in the radial direction of the outer ring 1452.

Through this configuration, the rollers 145a and 145b can absorb or buffer the external force applied by the tray 200 to reduce the frictional force between the tray 200 and the outer ring 1452 . Therefore, by suppressing wear of the outer ring 1452 and reducing the amount of particles generated, contamination of the substrate S by particles can be suppressed. In addition, the rollers 145a and 145b are formed by assembling an inner ring 1451, an outer ring 1452, a buffer member 1453, a first cover member 1454, and a second cover member 1455. Therefore, if one of these parts is damaged or manufactured to have a new material or shape, only that part can be easily replaced.

6 is a view showing an operating state of a roller according to an embodiment of the present invention.

Figure 6 (a) is a view showing the state of the roller (145a, 145b) before conveying the tray 200. Referring to (a) of FIG. 6, prior to conveying the tray 200, the buffer member 1453, the first cover member 1454, and the second cover in a state in which no external force is applied to the rollers 145a and 145b Members 1455 are spaced apart from each other.

Figure 6 (b) is a view showing the state of the roller (145a, 145b) when the tray 200 is transported. Referring to (b) of FIG. 6 , when the tray 200 is transported, the tray 200 is seated on top of the rollers 145a and 145b, and the load of the tray 200 is applied to the rollers 145a and 145b. It is passed on. At this time, the buffer member 1453 installed inside the rollers 145a and 145b by the load of the tray 200 contracts in the vertical direction and expands in the horizontal direction, so that the buffer member 1453 extends to the first cover member 1454. And it comes into contact with the second cover member 1455. In addition, the outer ring 1452 descends as much as the buffer member 1453 contracts in the vertical direction (indicated by “T” in FIG. 6(b)). At this time, the descending distance of the outer ring 1452 may be limited by the first cover member 1454 and the second cover member 1455. That is, the first cover member 1454 and the second cover member 1455 are spaced apart by G2 in the radial direction of the rollers 145a and 145b, and the first step 1454b and the second step 1455b are engaged with each other. Since the outer ring 1452 is arranged in a supporting shape, the outer ring 1452 can descend by a maximum separation distance between the first cover member 1454 and the second cover member 1455 . As such, while the shock absorber 1453 contracts and expands, that is, is deformed, by the load of the tray 200, the outer ring 1452 descends in the direction in which the load of the tray 200 is applied, thereby reducing the pressure applied by the tray 200 can be absorbed or buffered. Accordingly, frictional force between the tray 200 and the outer ring 1452 is reduced, and wear of the outer ring 1452 can be reduced.

Hereinafter, experimental results conducted to verify the performance of the roller according to an embodiment of the present invention will be described.

7 is a graph showing experimental results for verifying the performance of a roller according to an embodiment of the present invention.

A plurality of roller samples were prepared for the experiment.

As a roller sample, roller sample 1 formed as one structure, and roller samples 2 to 4 including an outer ring, an inner ring, a buffer member, and first and second cover members were prepared. At this time, roller sample 1 was entirely made of bearing steel. In the roller samples 2 to 4, the outer ring, inner ring, and first and second cover members were made of bearing steel, and the buffer member was made of a material capable of absorbing or buffering an external force. And, for roller sample 2, an antiwear layer containing AlCrBN was formed on the surface of the outer ring. For roller sample 2, a buffer member made of fluororubber was used, for roller sample 3, a buffer member made of urethane was used, and for roller sample 4, a buffer member made of a composite of polyimide and fluororubber was used.

The amount of wear for each roller sample was measured using an experimental device for testing the amount of wear. In the experiment, the roller sample was rotated while pressing the roller sample with a preset pressure using the pressure roller of the test apparatus, and the weight of the roller sample was measured at each preset rotation number. The amount of wear is a value calculated by calculating the difference between the weight of the roller sample measured before the experiment and the weight of the roller sample measured after the experiment.

Figure 7 shows the results of rotating the roller samples, measuring the weight of the roller samples every 500,000 rotations, and calculating the amount of wear. As a result of measuring the weight of the roller samples after rotating the roller samples 500,000 times, the weight of the roller sample 1 was reduced by about 0.6 g compared to before the experiment. On the other hand, the weight of roller samples 2 to 4 decreased by about 0.1 g compared to before the experiment.

This is because in the case of roller sample 1, since it receives the pressure applied by the pressure roller as it is, roller sample 1 has a large amount of wear due to friction with the pressure roller, but in the case of roller samples 2 to 4, It is judged that the amount of wear is small because the pressure is absorbed or buffered. In this way, when the buffer member is installed on the roller, it is possible to reduce wear of the roller by absorbing an external force applied to the roller to the buffer member.

In order to confirm the performance according to the type of buffer member, roller samples 2 to 4 were further rotated 500,000 times, the weight of the roller samples was measured, and the amount of wear was calculated. As a result of the calculation, the wear amount of roller sample 2 was the smallest, and the wear amount increased in the order of roller sample 4 and roller sample 3. However, roller samples 2 to 4 showed less wear than roller sample 1 at a higher number of rotations than roller sample 1, and it was confirmed that they could be used for conveying the tray. However, in the case of roller sample 3, since the amount of wear increases rapidly at about 700,000 revolutions, it is determined that it can be used until about 700,000 revolutions. In the case of roller sample 4, since the amount of wear is less than that of roller sample 3, it is determined that it can be used up to a higher rotational speed than roller sample 3. For example, if the roller can be used until the amount of wear of the roller is about 0.5 g, the roller sample 4 can be used up to about 800,000 revolutions.

Thereafter, in order to confirm the service life of the roller sample 2, the roller sample 2 was further rotated 1,000,000 times, and the weight of the roller sample 2 was measured to calculate the wear amount thereof. It was confirmed that the amount of abrasion of the roller sample 2 was less than 0.5 g and could be used until the number of rotations was about 2,000,000. The fact that the wear amount of roller sample 2 is smaller than that of roller sample 4 to which the buffer member containing fluororubber is applied is believed to be due to the components contained in the buffer member. In addition, in the case of roller sample 2, an anti-wear layer was formed on the outer ring, so it was determined that the amount of wear was significantly smaller than that of roller sample 4 in which no anti-wear layer was formed.

If a buffer member is installed on the roller through this experiment, the amount of wear on the roller can be reduced compared to the case without the buffer member, and the service life of the roller can be increased depending on the type and composition of the buffer member and whether or not an anti-wear layer is formed on the outer ring. It was found that it could be increased.

As such, in the detailed description of the present invention, specific embodiments have been described, but various modifications are possible without departing from the scope of the present invention. Therefore, the scope of the present invention should not be limited to the described embodiments and should not be defined, and should be defined by not only the claims to be described below, but also those equivalent to these claims.

100: chamber 110a, 110b, 110c: target chamber
120: gas supply unit 130: power supply unit
140: transport unit 141a, 141b: driver
143a, 143b: shaft 145a, 145b: roller
1451: inner ring 1452: outer ring
1453: buffer member 1454: first cover member
1455: second cover member

Claims (17)

An inner ring formed in a hollow shape with both sides open;
An outer ring formed in a hollow shape with both sides open and installed on the outside of the inner ring to be spaced apart from the inner ring;
a buffer member installed between the inner ring and the outer ring;
First cover members installed on both sides of the inner ring; and
A roller comprising a; second cover member installed on both sides of the outer ring. The method of claim 1,
A keyway that is concavely recessed is formed on the inner surface of the inner ring,
A roller having a first coupling groove or a first coupling protrusion engaged with the buffer member on the outer surface of the inner ring. The method of claim 2,
The outer ring is a roller in which a second coupling groove or a second coupling protrusion coupled to the buffer member is formed on an inner surface facing the inner ring. The method of claim 1,
The outer ring is a roller comprising at least one of non-ferrous metal, bearing steel, tool steel, stainless steel and alloy tool steel. The method of claim 4,
A roller comprising an anti-wear layer containing a material having a higher hardness than a material forming the outer ring on the surface of the outer ring. The method of claim 5,
The wear-resistant layer includes at least one of AlCrBN, TiN and CrN. The method of claim 5,
The wear-resistant layer is formed on the surface of the outer ring by heat-treating the outer ring by any one of heat treatment, nitriding treatment, plasma treatment, and plating treatment. The method of claim 1,
The roller of claim 1 , wherein the buffer member includes at least one of fluororubber, polyimide, fluororubber composite, polyimide composite, urethane, silicone, and polytetrafluoroethylene fibers. The method of claim 8,
The roller of the buffer member further comprises a conductive material. The method of claim 1,
The buffer member is a roller heat-treated at a temperature equal to or higher than the temperature of the processing space used. The method of claim 3,
The buffer member is formed in a hollow shape with both sides open,
A roller comprising a third coupling groove or a third coupling protrusion coupled to at least one of the inner race and the outer race on at least one of the inner and outer surfaces of the buffer member. The method of claim 1,
The first cover member is installed on both sides of the inner ring to cover a portion of the buffer member, and the second cover member is installed on both sides of the outer ring to cover the remainder of the buffer member,
The first cover member and the second cover member are disposed so as not to contact each other. The method of claim 1,
The first cover member includes a first area in contact with the inner ring and a second area covering the buffer member,
The second cover member includes a third area in contact with the outer ring and a fourth area covering the buffer member,
The first cover member and the second cover member overlap each other at least a part of the second area and at least a part of the fourth area, and are spaced apart from each other in the radial direction and the width direction of the outer ring. The method of claim 13,
The first cover member and the second cover member include stepped steps engaged with each other in the second area and the fourth area. The method of claim 14,
A roller in which the separation distance between the first cover member and the second cover member in the radial direction of the outer ring is 0.5 mm to 3 mm. The method of claim 13,
The first cover member and the second cover member are disposed to be spaced apart from the roller. a chamber forming a processing space for a substrate;
a tray for supporting a substrate; and
A substrate processing facility comprising a roller according to any one of claims 1 to 16, which is rotatably installed in the chamber to transport the tray.

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