KR20220164942A - Optical system - Google Patents

Abstract

According to various embodiments of the present invention, an optical system comprises: a stage supporting transparent materials or translucent materials; a light source emitting a beam; a first lens through which the beam passes, and which forms a first bezel beam region; a second lens through which the beam which has passed through the first lens passes; a third lens through which the beam which has passed through the second lens passes, and which forms a second bezel beam region on the transparent materials or translucent materials; and a scanner located between the second lens and the third lens. The scanner can include: a first mirror reflecting the beam passing through the second lens to the third lens in a first direction of the stage; and a second mirror reflecting the beam passing through the second lens to the third lens in a second direction of the stage, which crosses the first direction. Therefore, the time required for processing a subject can be improved.

Description

Optical system {OPTICAL SYSTEM}

Various embodiments below relate to an optical system.

BACKGROUND ART A process for manufacturing flexible glass in which flexibility is imparted to glass by performing hole processing on glass that is difficult to bend has been developed. In an exemplary process of processing a hole in glass, after an optical system for forming a laser Bessel beam is fixed, a lower stage supporting the glass, which is an object to be processed, may be moved to perform hole processing in the glass.

According to various embodiments, it is possible to provide an optical system that improves the processing speed of an object to be processed and secures a degree of freedom in the shape of the object to be processed.

An optical system according to various embodiments includes a stage supporting a transparent material or a translucent material; a light source that emits a beam; a first lens through which the beam passes and forms a first Bessel beam region; a second lens through which the beam passing through the first lens passes; a third lens through which the beam passing through the second lens passes, and forms a second Bessel beam region in the transparent material or the translucent material; and a scanner positioned between the second lens and the third lens, wherein the scanner includes a first mirror that reflects a beam passing through the second lens to the third lens along a first direction of the stage. ; and a second mirror for reflecting the beam passing through the second lens to the third lens along a second direction of the stage intersecting the first direction.

An optical system according to various embodiments includes a stage supporting a transparent material or a translucent material; a light source that emits a beam; a first lens through which the beam passes and forms a first Bessel beam region; a second lens through which the beam passing through the first lens passes; a third lens through which the beam passing through the second lens passes, and forms a second Bessel beam region in the transparent material or the translucent material; and a scanner positioned between the second lens and the third lens, wherein the scanner may include a mirror that reflects a beam passing through the second lens to the third lens along one direction of the stage. can

According to various embodiments, it is possible to improve the processing speed of the object to be processed and to secure the degree of freedom in the shape of the object to be processed. Specifically, in order to process a high-aspect-ratio hole in an object (e.g. glass), an optical system that makes a beam (e.g. a laser beam) into a Bessel beam is fixed in place, an object is placed under the optical system, and In the case where hole processing is performed by a process system including a stage supporting the stage, the processing time for the object is quickly improved and the degree of freedom in the shape of the hole processing for the object is minimized without moving the stage or by minimizing the movement of the stage. can improve

1 is a diagram of an optical system according to various embodiments.
2 is a diagram of a scanner according to an embodiment.
3 is a diagram illustrating various light paths from a mirror to a transparent material in an optical system according to an exemplary embodiment.
4 is a diagram illustrating a relationship between optical elements of an optical system according to an exemplary embodiment.
5 is a diagram of a portion of an optical system including a third lens according to one embodiment.
6 is a diagram of a portion of an optical system including a third lens according to another embodiment.
7 is a view of a transparent material manufactured using an optical system according to various embodiments.
8 is an enlarged view of a portion E1 of the transparent material of FIG. 7 .

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. However, since various changes can be made to the embodiments, the scope of the patent application is not limited or limited by these embodiments. It should be understood that all changes, equivalents or substitutes to the embodiments are included within the scope of rights.

Terms used in the examples are used only for the purpose of explanation and should not be construed as limiting. Singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, terms such as "include" or "have" are intended to designate that there is a feature, number, step, operation, component, part, or combination thereof described in the specification, but one or more other features It should be understood that the presence or addition of numbers, steps, operations, components, parts, or combinations thereof is not precluded.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by a person of ordinary skill in the art to which the embodiment belongs. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the related art, and unless explicitly defined in the present application, they should not be interpreted in an ideal or excessively formal meaning. don't

In addition, in the description with reference to the accompanying drawings, the same reference numerals are given to the same components regardless of reference numerals, and overlapping descriptions thereof will be omitted. In describing the embodiment, if it is determined that a detailed description of a related known technology may unnecessarily obscure the gist of the embodiment, the detailed description will be omitted.

In addition, in describing the components of the embodiment, terms such as first, second, A, B, (a), and (b) may be used. These terms are only used to distinguish the component from other components, and the nature, order, or order of the corresponding component is not limited by the term. When an element is described as being “connected,” “coupled to,” or “connected” to another element, that element may be directly connected or connected to the other element, but there may be another element between the elements. It should be understood that may be "connected", "coupled" or "connected".

Components included in one embodiment and components including common functions will be described using the same names in other embodiments. Unless stated to the contrary, descriptions described in one embodiment may be applied to other embodiments, and detailed descriptions will be omitted to the extent of overlap.

1 is a diagram of an optical system according to various embodiments.

Referring to FIG. 1 , an optical system 10 according to various embodiments uses a scanner 160 while minimizing or inactivating the movement of a stage 150 supporting a transparent material and/or a translucent material TM. It is possible to improve the processing speed of the transparent material and/or the semi-transparent material TM and improve the degree of freedom of the processing shape of the transparent material and/or the semi-transparent material TM. In one embodiment, the transparent material and/or translucent material TM may be glass, sapphire, and/or other transparent/translucent materials.

The optical system 10 may include a light source 110 , a first lens 120 , a second lens 130 , a third lens 140 , a stage 150 and a scanner 160 .

The light source 110 may emit an optical beam LB. In one embodiment, the light source 110 may emit a laser beam. In one embodiment, the light source 110 may emit a laser beam of a single wavelength. In another embodiment, the light source 110 may emit various laser beams of different wavelengths. The light source 110 may be positioned upstream of the light path LP defined in the optical system 10 .

The first lens 120 may be configured to pass the optical beam LB emitted from the light source 110 and condense the passing optical beam LB to an area. In an embodiment, the first lens 120 may form the first Bessel beam region 121 downstream of the first lens 120 on the optical path LP. In one embodiment, the first lens 120 may have a geometric shape having a vertex 122 . For example, the first lens 120 may have a substantially conical shape. In an embodiment, the first Bessel beam region 121 may be substantially formed along the light path LP from the apex 122 . In one embodiment, the first Bessel beam region 121 may not be formed up to the second lens 130 but may be formed upstream of the second lens 130 on the optical path LP. In one embodiment, the first lens 120 may be an axicon lens.

The second lens 130 may be configured to pass the optical beam LB that has passed through the first lens 120 and condense the passing optical beam LB to an area.

The third lens 140 may be configured to pass the optical beam LB that passed through the second lens 130 and condense the passing optical beam LB to an area. The third lens 140 may receive the optical beam LB coming from the second lens 130 through the scanner 160 . In an embodiment, the third lens 140 may form the second Bessel beam region 141 downstream of the third lens 140 on the optical path LP. In an embodiment, the third Bessel beam region 141 is formed on the transparent material and/or translucent material TM, through the transparent material and/or translucent material TM, and/or through the transparent material and/or translucent material ( TM) can be formed below. The formation position, strength, and orientation of the third Bessel beam region 141 may determine the processing shape of the transparent material and/or the translucent material TM. In one embodiment, the third lens 140 may be a telecentric lens. In another embodiment, the third lens 140 may be an f-theta lens.

The stage 150 may support the transparent and/or translucent material TM while the transparent and/or translucent material TM is being processed. In one embodiment, the position and direction of the stage 150 may be substantially fixed without moving while the transparent material and/or translucent material TM is being processed. In other words, the movement of the stage 150 may be activated before or after processing the transparent material and/or translucent material TM. In some embodiments, the stage 150, before or after processing the transparent and/or translucent material TM, along tangential directions of the support surface 151 on which the transparent and/or translucent material TM is placed. By means of a translational motion and/or a rotational motion about the respective axis of the tangential directions, a suitable position and orientation of the transparent and/or translucent material TM to be machined can be predetermined. In another embodiment, the movement of the stage 150 may be activated even while the transparent material and/or translucent material TM is being processed.

The scanner 160 may transmit the optical beam LB passing through the second lens 130 to the third lens 140 . In one embodiment, the scanner 160 is located between the second lens 130 and the third lens 140 on the optical path LP, that is, downstream of the second lens 130 and between the third lens 140. may be located upstream. In one embodiment, the second lens 130 may be spaced apart from the scanner 160 by a first focal distance f ₁ . In one embodiment, the third lens 140 may be spaced apart from the scanner 160 by a second focal distance f ₂ . In one embodiment, scanner 160 may be a galvanometer scanner.

In one embodiment, the orientation of the scanner 160 may be determined when the movement of the stage 150 is substantially inactivated while the transparent and/or translucent material TM is being processed. Adjusting the orientation of the scanner 160 while the transparent and/or semi-transparent material TM is being processed substantially eliminates manipulation of the movement of the stage 150, so that the transparent and/or translucent material TM is processed. Processing speed can be improved. This can eliminate the hassle of calculating and determining the appropriate position/orientation of the transparent material and/or translucent material TM before processing in order to process the transparent material and/or translucent material TM into a desired shape. The degree of freedom in the shape of the transparent material and/or the translucent material TM may be improved.

In one embodiment, the first lens 120, the second lens 130, the third lens 140 and the scanner 160 may be fixed in place. 'Fixed in place' means that the 'positions' of the first lens 120, second lens 130, third lens 140 and scanner 160 do not substantially change during processing. However, that the scanner 160 is 'fixed in place' does not mean that the direction in which the scanner 160 reflects the optical beam LB is fixed.

2 is a diagram of a scanner according to an embodiment.

Referring to FIG. 2 , a scanner 260 (eg, the scanner 160) according to an embodiment is configured to perform a first direction (eg, an X direction) and/or a second direction (eg, a Y direction) crossing the first direction. ), it is possible to perform two-dimensional scanning of the optical beam LB. The scanner 260 may include a first scanner 261 and a second scanner 265 .

The first scanner 261 may reflect an optical beam LB incident to the scanner 260 (eg, from the first lens 130 of FIG. 1 ) in a first direction. The first scanner 261 is connected to a first actuator 262 that generates power, a first drive shaft 263 driven by receiving power from the first actuator 262, and a first drive shaft 263, 1 may include a first mirror 264 that receives power from the driving shaft 263 and determines the position of the optical beam LB in the first direction.

The second scanner 265 may reflect the optical beam LB incident from the first scanner 261 in the second direction. The second scanner 265 is connected to a second actuator 266 that generates power, a second drive shaft 267 driven by receiving power from the second actuator 266, and a second drive shaft 267, A second mirror 268 configured to receive power from two driving shafts 267 and determine a position of the optical beam LB in the second direction may be included.

In an embodiment, the first scanner 261 may be positioned upstream on the optical path LP, and the second scanner 265 may be positioned downstream on the optical path LP. In another embodiment not shown, the first scanner 261 may be positioned downstream on the optical path LP, and the second scanner 265 may be positioned upstream on the optical path LP.

The scanner 260 according to another embodiment not shown may be configured as a single scanner. For example, the scanner 260 may include only the first scanner 261 or only the second scanner 265 . This can implement one-dimensional (or linear control) of the optical beam LB.

3 is a diagram illustrating various light paths from a mirror to a transparent material in an optical system according to an exemplary embodiment.

Referring to FIG. 3 , in the optical system 30 (eg, the optical system 10) according to an embodiment, mirrors 364 and 368 (eg, the first scanner 360) of the scanner 360 (eg, the scanner 260) By adjusting the orientation of the first mirror 264 and/or the second mirror 268, the optical beam LB passes through the third lens 340 and is formed on a transparent material and/or a translucent material TM. The position and/or orientation of the beam regions 341; 342; 343 may vary. For example, when the mirrors 364 and 368 are in the first orientation R1, the optical beam LB substantially passes through an area on one side (eg, a left area) of the third lens 340 and is transparent. A Bessel beam region 341 may be formed in one side region (eg, a left region) of the material and/or the translucent material TM. When the mirrors 364 and 368 are in the second orientation R2, the optical beam LB passes substantially through the middle region of the third lens 340 and the middle of the transparent and/or translucent material TM. A Bessel beam region 342 may be formed in the region. When the mirrors 364 and 368 are in the third orientation R3, the optical beam LB substantially passes through an area on the other side of the third lens 340 (eg, a right area), and the transparent material and/or A Bessel beam region 343 may be formed on the other side region (eg, right region) of the translucent material TM. The position and/or orientation of the Bessel beam regions 341; 342; 343 formed on the transparent material and/or the translucent material TM is a first direction crossing the thickness direction of the transparent material and/or the translucent material TM, respectively. (eg, the X direction of FIG. 2) and/or the orientations (R1; R2; R3) of the mirrors 364 and 368 in the second direction (eg, the Y direction of FIG. 2).

4 is a diagram illustrating a relationship between optical elements of an optical system according to an exemplary embodiment.

Referring to FIG. 4 , a first lens 420 (eg, the first lens 120) and a second lens 430 (eg, the second lens 420) are optical elements included in the optical system 40 according to an embodiment. The first Bessel beam region 421 ( Example: The processing spot size and processing depth of the first Bessel beam region 121 and the second Bessel beam region 441 (eg, the second Bessel beam region 141) may be determined.

In an embodiment, a depth of focus (DOF) of the first Bessel beam region 421 may be determined by Equation 1 below.

[Equation 1]

Here, z _max is the processing depth of the first Bessel beam region 421, w ₀ is half of the total width of the optical beam LB incident to the first lens 420, and θ ₀ is the width of the first lens 420. This refers to the angle formed by the outermost beam of the first Bessel beam region 421 with respect to the optical axis L.

In an embodiment, the core radius of the processing spot of the first Bessel beam region 421 may be determined by Equation 2 below.

[Equation 2]

Here, ρ ₀ is the core radius of the processing spot of the first Bessel beam region 421, c is a predetermined first constant (eg, 2.4048), k is a predetermined second constant, and θ ₀ is a first This refers to the angle formed by the outermost beam of the first Bessel beam region 421 with respect to the optical axis L of the lens 420 .

In an embodiment, the processing depth of the second Bessel beam region 441, that is, the final processing depth of the transparent material and/or translucent material (eg, transparent material and/or translucent material (TM)) is expressed in Equation 3 below. can be determined by

[Equation 3]

Here, z _max,f is the processing depth of the second Bessel beam region 441, z _max is the processing depth of the first Bessel beam region 421, and f ₁ is the distance between the second lens 430 and the scanner 460. is the first focal length (or the distance between the core of the first Bessel beam region 421 and the second lens 430), f ₂ is the second focal length between the third lens 440 and the scanner 460 (or distance between the core of the second Bessel beam region 441 and the third lens 440).

In an embodiment, the core radius of the processing spot of the second Bessel beam region 441 may be determined by Equation 4 below.

[Equation 4]

Here, ρ _0,f is the core radius of the processing spot of the second Bessel beam region 441, ρ ₀ is the core radius of the processing spot of the first Bessel beam region 421, f ₁ is the second lens 430 and The first focal length between the scanners 460 (or the distance between the core of the first Bessel beam region 421 and the second lens 430), f ₂ is the distance between the third lens 440 and the scanner 460 It refers to the second focal length (or the distance between the core of the second Bessel beam region 441 and the third lens 440).

As described above, the size and depth of the processing spot formed on the transparent material and/or translucent material (eg, the transparent material and/or translucent material TM) is determined by the first focal length f ₁ and the second focal distance f It can be seen that it is determined according to the ratio of ₂ ). In the optical system 40 according to an embodiment, by setting the first focal length f ₁ larger than the second focal length f ₂ to make a small processing spot, the processing spot is processed at a ratio of f ₂ /f ₁ It is possible to determine a small size of and a small depth of the machining spot at a ratio of (f ₂ /f ₁ ) ² .

5 is a diagram of a portion of an optical system including a third lens according to one embodiment.

Referring to FIG. 5 , in the optical system 50 (eg, the optical system 10) according to an embodiment, the third lens 540 (eg, the third lens 140) may be an f-theta lens. have. The optical beam LB passes through the mirrors 564 and 568 (eg, the first mirror 264 and/or the second mirror 268) of the scanner 560 (eg, the scanner 260) to a third lens ( 540), various light paths LP1 and LP2 are formed according to the orientations R1 and R2 of the mirrors 564 and 568, and the light path for the transparent material and/or the translucent material TM The slopes of the fields LP1 and LP2 may also vary.

For example, when the mirrors 564 and 568 are in the first orientation R1, the optical path LP1 of the optical beam LB passing through the third lens 540 is a transparent material and/or a translucent material ( It may be substantially parallel to the thickness direction of the TM, and may be substantially fully telecentric with respect to the transparent and/or translucent material TM. Meanwhile, when the mirrors 564 and 568 are in the second orientation R2, the optical path LP2 of the optical beam LB passing through the third lens 540 is made of a transparent material and/or a translucent material TM. It may be tilted by a telecentricity error (e) with respect to the thickness direction of .

As described above, when the third lens 540 is configured as an f-theta lens, a vertical through hole may be formed in a central area of a scannable area for a transparent material and/or a translucent material TM. Through-holes may be formed that are inclined from the central area to the outer area.

In the processing method using the optical system 50 according to an embodiment, the area of the optical path LP1 to which the optical beam LB descends substantially vertically with respect to the central area of the third lens 540 (eg : Processing may be performed on the transparent material and/or the translucent material TM along with the movement (eg, position and/or orientation adjustment) of the stage (eg, the stage 150) using only the central region. In some embodiments, a transparent material and/or a translucent material may be used by using an area (eg, an outer area) of the optical path LP2 that is tilted based on the central area of the third lens 540 and the optical beam LB descends. An inclined through hole may be formed in (TM).

6 is a diagram of a portion of an optical system including a third lens according to another embodiment.

Referring to FIG. 6 , in the optical system 60 (eg, the optical system 10) according to an embodiment, the third lens 640 (eg, the third lens 140) may be a telecentric lens. have. The optical beam LB passes through the mirrors 664 and 668 (eg, the first mirror 264 and/or the second mirror 268) of the scanner 660 (eg, the scanner 260) through a third lens ( 640), various light paths LP1 and LP2 may be formed according to the orientations R1 and R2 of the mirrors 664 and 668. In this embodiment, the light paths LP1 and LP2 for the transparent material and/or translucent material TM may be substantially parallel to the thickness direction of the transparent material and/or translucent material TM.

For example, when the mirrors 564 and 568 are in the first orientation R1, the optical path LP1 of the optical beam LB passing through the third lens 540 is a transparent material and/or a translucent material ( substantially parallel to the thickness direction of the TM), and may be substantially completely telecentric with respect to the transparent and/or translucent material TM. Meanwhile, even when the mirrors 564 and 568 are in the second orientation R2, the optical path LP2 of the optical beam LB passing through the third lens 540 also includes a transparent material and/or a translucent material TM. It is substantially parallel to the thickness direction of and may be substantially completely telecentric with respect to the transparent and/or translucent material (TM).

As described above, when the third lens 640 is configured as a telecentric lens, vertical through-hole(s) may be formed over the entire scannable area for the transparent material and/or the translucent material TM. . Compared to the case where the third lens 540 described above with reference to FIG. 5 is composed of an f-theta lens, the scannable effective processing area is relatively wide, so the movement of the stage (eg, the stage 150) can be minimized or There may be advantages to being able to substantially disable it, and relatively improved processing speeds can be achieved.

In some embodiments, an inclined through hole may be formed in the transparent material and/or the translucent material TM by adjusting the position and/or orientation of the stage.

7 is a view of a transparent material manufactured using an optical system according to various embodiments, and FIG. 8 is an enlarged view of a portion E1 of the transparent material of FIG. 7 .

Referring to FIGS. 7 and 8 , when an optical system (eg, the optical system 10) according to various embodiments is used, a plurality of through holes TH defining various trajectories are formed on a transparent material TM. can do. For example, a substantially linear trajectory (L1) extending in one direction (eg, +X/−X direction) using the scanner 260 for one-dimensional and/or two-dimensional scanning described with reference to FIG. 2 above. ) may be formed. As another example, by using the scanner 260 for two-dimensional scanning described above with reference to FIG. 2, a plurality of substantially linear trajectories L11 extending in one direction (eg, -X/+X direction) After forming the two through holes TH, a plurality of through holes TH having a substantially curved trajectory L12 having one radius of curvature R are formed, and then a plurality of through holes TH are formed in the other direction (eg, +X/ A plurality of through holes TH having a substantially linear trajectory L13 extending in the -X direction) may be formed.

An optical system 10 according to various embodiments includes a stage 150 supporting a transparent or translucent material TM; a light source 110 that emits a beam LB; a first lens 120 through which the beam LB passes and forms a first Bessel beam region 121; a second lens 130 through which the beam LB passing through the first lens 120 passes; a third lens 140 through which the beam LB passing through the second lens 130 passes and forms a second Bessel beam region 141 in the transparent material or the translucent material TM; and a scanner 160 positioned between the second lens 130 and the third lens 140, wherein the scanners 160 and 260 include a beam LB passing through the second lens 130. ) to the third lens 140 along the first direction X of the stage 150; and reflecting the beam LB passing through the second lens 130 to the third lens 140 along the second direction Y of the stage 150 crossing the first direction X. A second mirror 268 may be included.

In an embodiment, the third lens 140 may form the second Bessel beam region 141 in a thickness direction of the transparent material or the translucent material TM.

In one embodiment, the third lenses 140 and 640 may be telecentric lenses.

In an embodiment, the third lens 140 may form the second Bessel beam region 141 in a thickness direction of the transparent material or the translucent material TM or in a direction crossing the thickness direction. have.

In one embodiment, the third lenses 140 and 540 may be f-theta lenses.

In an embodiment, the first lens 120 may form the first Bessel beam region 121 in at least a part of an area between the first lens 120 and the second lens 130 .

In one embodiment, the first lens 120 may be an exicon lens.

In one embodiment, the scanner 160 may be a galvanometer scanner.

In one embodiment, the first lens 120, the second lens 130, the third lens 140 and the scanner 160 may be fixed in place.

In one embodiment, the first focal distance (f 1 ) between the second lens 130 and the scanner 160 is the second focal distance (f ₁ ) between the scanner 160 and the third lens 140 ₂ ) can be greater than

In one embodiment, on the optical path LP between the second lens 130 and the third lens 140, the first mirror 264 is larger than the second mirror 268 in the optical path LP. ) can be located upstream of.

An optical system 10 according to various embodiments includes a stage 150 supporting a transparent or translucent material TM; a light source 110 that emits a beam LB; a first lens 120 through which the beam LB passes and forms a first Bessel beam region 121; a second lens 130 through which the beam LB passing through the first lens 120 passes; a third lens 140 through which the beam LB passing through the second lens 130 passes and forms a second Bessel beam region 141 in the transparent material or the translucent material TM; and a scanner 160 positioned between the second lens 130 and the third lens 140, wherein the scanners 160 and 260 include a beam LB passing through the second lens 130. ) to the third lens 140 along one direction (X, Y) of the stage 150, a mirror 264; 268 may be included.

In an embodiment, the third lens 140 may form the second Bessel beam region 141 in a thickness direction of the transparent material or the translucent material TM.

In one embodiment, the third lenses 140 and 640 may be telecentric lenses.

In an embodiment, the third lens 140 may form the second Bessel beam region 141 in a thickness direction of the transparent material or the translucent material TM or in a direction crossing the thickness direction. have.

In one embodiment, the third lenses 140 and 540 may be f-theta lenses.

In an embodiment, the first lens 120 may form the first Bessel beam region 121 in at least a part of an area between the first lens 120 and the second lens 130 .

In one embodiment, the first lens 120 may be an exicon lens.

In one embodiment, the scanner 160 may be a galvanometer scanner.

In one embodiment, the stage 150 is configured to translate in the first direction X and the second direction Y, and the stage comprises a first axis in the first direction X and the second direction X. It can be configured to rotate about an axis in two directions (Y).

As described above, although the embodiments have been described with limited drawings, those skilled in the art can apply various technical modifications and variations based on the above. For example, the described techniques may be performed in an order different from the method described, and/or components of the described system, structure, device, circuit, etc. may be combined or combined in a different form than the method described, or other components may be used. Or even if it is replaced or substituted by equivalents, appropriate results can be achieved.

Therefore, other implementations, other embodiments, and equivalents of the claims are within the scope of the following claims.

Claims (20)

a stage supporting a transparent material or a translucent material;
a light source that emits a beam;
a first lens through which the beam passes and forms a first Bessel beam region;
a second lens through which the beam passing through the first lens passes;
a third lens through which the beam passing through the second lens passes and forms a second Bessel beam region in the transparent material or the translucent material; and
a scanner positioned between the second lens and the third lens;
including,
the scanner
a first mirror for reflecting the beam passing through the second lens to the third lens along the first direction of the stage; and
a second mirror for reflecting the beam passing through the second lens to the third lens along a second direction of the stage intersecting the first direction;
An optical system comprising a. According to claim 1,
The third lens forms the second Bessel beam region in a thickness direction of the transparent material or the translucent material. According to claim 2,
The optical system of claim 1 , wherein the third lens is a telecentric lens. According to claim 1,
The third lens forms the second Bessel beam region in a thickness direction of the transparent material or the translucent material or in a direction crossing the thickness direction. According to claim 4,
The third lens is an f-theta lens. According to claim 1,
The optical system of claim 1 , wherein the first lens forms the first Bessel beam region in at least a part of an area between the first lens and the second lens. According to claim 6,
The optical system of claim 1 , wherein the first lens is an axicon lens. According to claim 1,
The optical system of the scanner is a galvanometer scanner. According to claim 1,
wherein the first lens, the second lens, the third lens and the scanner are fixed in position. According to claim 1,
A first focal distance between the second lens and the scanner is greater than a second focal distance between the scanner and the third lens. According to claim 1,
On an optical path between the second lens and the third lens, the first mirror is located upstream of the optical path than the second mirror. a stage supporting a transparent material or a translucent material;
a light source that emits a beam;
a first lens through which the beam passes and forms a first Bessel beam region;
a second lens through which the beam passing through the first lens passes;
a third lens through which the beam passing through the second lens passes and forms a second Bessel beam region in the transparent material or the translucent material; and
a scanner positioned between the second lens and the third lens;
including,
The optical system of claim 1 , wherein the scanner includes a mirror that reflects the beam passing through the second lens to the third lens along one direction of the stage. According to claim 12,
The third lens forms the second Bessel beam region in a thickness direction of the transparent material or the translucent material. According to claim 13,
The optical system of claim 1 , wherein the third lens is a telecentric lens. According to claim 12,
The third lens forms the second Bessel beam region in a thickness direction of the transparent material or the translucent material or in a direction crossing the thickness direction. According to claim 15,
The third lens is an f-theta lens. According to claim 12,
The optical system of claim 1 , wherein the first lens forms the first Bessel beam region in at least a part of an area between the first lens and the second lens. 18. The method of claim 17,
The optical system of claim 1 , wherein the first lens is an axicon lens. According to claim 12,
The optical system of the scanner is a galvanometer scanner. According to claim 12,
wherein the stage is configured to translate in the first direction and the second direction, and wherein the stage is configured to rotate about a first axis in the first direction and an axis in the second direction.

Images