KR20220026503A - Crucible, evaporation source, and vapor deposition apparatus - Google Patents

Abstract

The present invention is to provide a crucible, an evaporation source, and a vapor deposition apparatus in which the durability of a gasket can be extended. To this end, both surfaces of the gasket (150) are flat, a concave portion (113) in which the gasket (150) is arranged along an opening (111) in a crucible body (110), the bottom surface of the concave portion (113) is flat, a surface of a cover (140) coming in contact with the gasket (150) is also flat, the linear expansion coefficient of the material of the gasket (150) is greater than the linear expansion coefficient of the material of the crucible body (110), the gasket (150) is arranged to have a gap from the side surface inside the concave portion (113) under a temperature environment for non-deposition, and the gasket (150) is configured to be in tight contact with the inner side and bottom surfaces of the concave portion (113) and the cover (140) by thermal expansion under a temperature environment for deposition.

Description

Crucible, evaporation source and deposition apparatus

[0001] The present invention relates to a crucible, an evaporation source and a vapor deposition apparatus used for performing vacuum vapor deposition.

In the vapor deposition apparatus which performs vacuum vapor deposition, the evaporation source for evaporating or sublimating a film-forming material (evaporation material) is provided. And this evaporation source is equipped with the crucible in which the film-forming material is accommodated. Referring to FIG. 18, a crucible according to a conventional example will be described. 18 is a schematic cross-sectional view showing a part of a crucible according to a conventional example. The crucible 500 includes a crucible body 510 having an opening for putting in and taking out a container for accommodating a film forming material, a cover 520 for blocking the opening of the crucible body 510 , and a crucible body 510 and a cover 520 . ) and a metal gasket 530 for sealing the gap. In the crucible 500 according to this conventional example, annular projections 511 and 521 are provided on each of the crucible body 510 and the lid 520 , and these annular projections 511 and 521 are provided with a gasket 530 . A configuration that allows you to dig into the By employing such a configuration, stable sealing properties are obtained.

However, in the case of the configuration as described above, marks in which the annular protrusions 511 and 521 dig into the gasket 530 remain. Therefore, if it is used several times, the desired sealing property cannot be obtained, and it has to replace with the new gasket 530, and there exists a subject that cost increases.

Patent Document 1: Japanese Patent Laid-Open No. 2014-198863 Patent Document 2: Japanese Patent No. 3747324

It is an object of the present invention to provide a crucible, an evaporation source, and a deposition apparatus capable of extending the durability of the gasket.

The present invention, in order to solve the above problems,

a crucible body having an opening for loading and unloading a container for accommodating a film-forming material;

a cover for blocking the opening;

A crucible comprising a metal gasket sealing a gap between the crucible body and the lid,

Both sides of the gasket are constituted by a plane,

A concave portion in which the gasket is disposed is provided in the crucible body along the opening portion, and a bottom surface of the concave portion is constituted by a flat surface,

It is constituted by a shaving plane in contact with the gasket in the cover or a member installed between the cover and the gasket,

the coefficient of linear expansion of the material of the gasket is greater than the coefficient of linear expansion of the material of the crucible body;

Under the non-evaporation temperature environment, the gasket is disposed with a gap between the inner side surface of the concave portion and the inner side surface of the concave portion. and a bottom surface and the cover or a member installed between the cover and the gasket to be in close contact with the member.

According to the present invention, since both the bottom surface of the concave portion installed in the crucible body and the surface in contact with the gasket among the cover or a member installed between the cover and the gasket are configured as flat surfaces, marks of projections are left on the gasket as in the prior art. there is no Moreover, under the temperature environment at the time of vapor deposition, the gasket thermally expands, and since it closely_contact|adheres with respect to the member provided between the inner side and bottom surface of a recessed part, and a cover, or a cover and a gasket, sufficient sealing property is obtained.

As described above, according to the present invention, the durability life of the gasket can be extended.

1 is a schematic configuration diagram of a vapor deposition apparatus.
2 is a schematic configuration diagram of a crucible according to Embodiment 1 of the present invention.
3 is a schematic configuration diagram of a gasket according to Embodiment 1 of the present invention.
4 is a schematic configuration diagram of a crucible body according to Embodiment 1 of the present invention.
5 is a schematic configuration diagram of a cover according to Embodiment 1 of the present invention.
6 is an explanatory diagram of the behavior of the crucible according to the first embodiment of the present invention.
7 is an explanatory diagram of the behavior of the crucible according to the first embodiment of the present invention.
8 is a schematic cross-sectional view showing a part of an evaporation source according to Example 2 of the present invention.
9 is a control flowchart of an evaporation source according to Embodiment 2 of the present invention.
10 is a schematic cross-sectional view showing a part of an evaporation source according to Example 3 of the present invention.
11 is a schematic cross-sectional view showing a part of an evaporation source according to Example 4 of the present invention.
12 is a schematic cross-sectional view showing a part of an evaporation source according to Example 5 of the present invention.
13 is a schematic cross-sectional view showing a part of a crucible according to Example 6 of the present invention.
14 is a schematic cross-sectional view showing a part of an evaporation source according to Example 7 of the present invention.
15 is a schematic cross-sectional view showing a part of an evaporation source according to Example 8 of the present invention.
16 is a schematic cross-sectional view showing a part of an evaporation source according to Example 9 of the present invention.
17 is a schematic cross-sectional view showing a part of an evaporation source according to Example 10 of the present invention.
18 is a schematic cross-sectional view showing a part of a crucible according to a conventional example.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, with reference to the drawings, a form for carrying out the present invention will be described in detail by way of example based on examples. However, the dimensions, materials, shapes, relative arrangements, and the like of the components described in this embodiment are not intended to limit the scope of the present invention to only them, unless otherwise specified.

(Example 1)

A crucible, an evaporation source, and a deposition apparatus according to Embodiment 1 of the present invention will be described with reference to FIGS. 1 to 7 .

<Deposition device>

1 is a schematic configuration diagram of a vapor deposition apparatus. The vapor deposition apparatus 1 is equipped with the chamber 2 comprised so that the inside may become a state close to vacuum (pressure-reduced atmosphere) by the vacuum pump 3, and the evaporation source 10 arrange|positioned inside the chamber 2 are doing The evaporation source 10 is responsible for evaporating or subliming the material by heating the material (film-forming material, vapor-depositing material) of the substance to be vapor-deposited on the board|substrate B. The substance evaporated or sublimed by the evaporation source 10 adheres to the deposition surface (surface on the evaporation source 10 side) of the substrate B provided inside the chamber 2, whereby a thin film is formed on the substrate B. do.

And the evaporation source 10 is equipped with the crucible 100, the heating heater 200 which heats the crucible 100, and the control apparatus 300 which controls the heating heater 200. As shown in FIG. On the other hand, in the control device 300 according to the present embodiment, not only the heating heater 200 but also the vacuum pump 3 and the like are configured to control the operation of the entire deposition apparatus 1 .

<The Crucible>

Fig. 2 is a schematic configuration diagram of a crucible according to the first embodiment of the present invention, in which (a) is a plan view of the crucible, and (b) is a cross-sectional view taken along line AA in (a) of the same figure. Fig. 3 is a schematic configuration diagram of a gasket according to the first embodiment of the present invention, in which (a) is a plan view of the gasket, and (b) is a cross-sectional view taken along line BB in (a) of the same figure. 4 is a schematic configuration diagram of a crucible body according to Embodiment 1 of the present invention, in which (a) is a front view of the crucible body (a view from the side where the gasket is disposed), (b) of the same drawing is the same It is CC sectional drawing in (a) of a figure. 5 is a schematic configuration diagram of the cover according to the first embodiment of the present invention, in which (a) is a rear view of the cover (viewed from the side where the gasket is in close contact), and (b) of the same figure is It is DD sectional drawing in (a).

The crucible 100 according to the present embodiment includes a crucible body 110 having an opening 111 for putting in and taking out a container 130 for accommodating a film forming material 120 , and a cover 140 for blocking the opening 111 . and a metal gasket 150 sealing the gap between the crucible body 110 and the cover 140 . The crucible body 110 and the cover 140 are fixed by a fixture 160 . On the other hand, for the fixture 160, various known techniques such as bolts and nuts can be employed. In addition, the crucible main body 110 is provided with the discharge port 112 for discharging the film-forming material 120 which evaporates or sublimes toward the board|substrate B. As shown in FIG.

The gasket 150 is constituted by a plate-shaped member having an opening 151 in the center. That is, both surfaces of the gasket 150 are constituted by a flat surface. The crucible body 110 is provided with a recess 113 in which the gasket 150 is disposed along the opening 111 . The bottom surface (surface to which the gasket 150 is in contact) of this recessed part 113 is comprised by the flat surface. In addition, the crucible main body 110 is provided with a screw shaft 114 . Also, in the lid 140 according to the present embodiment, a recess 141 in which the gasket 150 is disposed is provided. The bottom surface of this recessed part 141 (including the surface which the gasket 150 contact|connects) is also comprised by the plane. In addition, the cover 140 is provided with an insertion hole 142 through which the screw shaft 114 is inserted. Thereby, the cover 140 is attached to the crucible main body 110 so that the screw shaft 114 is inserted into each insertion hole 142, and is fixed by the fastener 160 (nut). On the other hand, although the opening 151 is provided in the center of the gasket 150 in the present embodiment, the opening 151 is not required to be provided.

<The behavior of the crucible>

6 and 7 are explanatory diagrams of the behavior of the crucible according to the first embodiment of the present invention. Fig. 6 shows the relationship between the crucible body and the gasket when viewed from the front side of the crucible body, and Fig. 7 shows the crucible when viewed in cross section. 6 (a) and 7 (a) show a state under a temperature environment (under a room temperature environment) at the time of non-evaporation, and FIGS. 6 (b) and 7 (b) show a temperature environment at the time of deposition. indicates the status.

In this embodiment, the material of each member is selected so that the coefficient of linear expansion of the material of the gasket 150 is larger than the coefficient of linear expansion of the material of the crucible body 110 and larger than the coefficient of linear expansion of the material of the lid 140 . is becoming For example, it is preferable that the material of the gasket 150 be aluminum and the material of the crucible main body 110 and the lid 140 is titanium.

And, under the temperature environment at the time of non-evaporation, the gasket 150 is configured so as to be disposed with a gap between the inner side surface of the concave portion 113 of the crucible body 110 and a gap (Fig. 6(a)). Reference). On the other hand, in the present embodiment, under a non-evaporating temperature environment, the gasket 150 is configured to be disposed in a state with a gap also between the inner side surface of the concave portion 141 of the lid 140 . At this time, it may be set such that a minute gap is formed between the gasket 150 and the lower surface of the concave portion 113 and between the gasket 150 and the lower surface of the concave portion 141 (see (a) of FIG. 7 ). , it can also be set so that there is no gap.

When vapor deposition is performed, in order to evaporate or sublimate the film-forming material 120, the crucible 100 is heated by the heating heater 200, and the crucible 100 becomes a high temperature state. Under such a temperature environment at the time of deposition, the gasket 150 is brought into close contact with the inner side and bottom surfaces of the concave portion 113 of the crucible body 110 and the cover 140 due to thermal expansion (see FIG. 6 ). (b) and FIG. 7 (b)). On the other hand, in the present embodiment, under the temperature environment at the time of deposition, the gasket 150 comes into close contact with the inner side surface and the bottom surface of the recess 141 of the cover 140 due to thermal expansion (FIG. 7). of (b)).

<Excellent points of the crucible, the evaporation source and the deposition apparatus according to the present embodiment>

According to the present embodiment, the bottom surface of the concave portion 113 installed in the crucible body 110 and the surface of the cover 140 in contact with the gasket 150 are all flat. Therefore, as in the prior art, the marks of the projections are not left on the gasket 150 . Therefore, the durability life of the gasket 150 can be extended, and the gasket 150 can be used more than the prior art. Thereby, cost can also be suppressed. In addition, under the temperature environment at the time of deposition, the gasket 150 thermally expands, and since the inner side and bottom surfaces of the concave portion 113 of the crucible body 110 and the cover 140 are in close contact with each other, sufficient sealing property is obtained. lose As described above, according to this embodiment, sufficient sealing properties can be obtained at the time of vapor deposition.

(Example 2)

In this embodiment, the configuration of an evaporation source to which a countermeasure against leakage of the film-forming material after the deposition process is performed is shown. Since it is the same as Example 1 about a basic structure and operation, the same code|symbol is attached|subjected about the same structural part, and the description is abbreviate|omitted suitably. Fig. 8 is a schematic cross-sectional view showing a part of an evaporation source according to Example 2 of the present invention, and is an enlarged cross-sectional view showing a configuration different from Example 1; 9 is a control flowchart of an evaporation source according to Embodiment 2 of the present invention. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment.

The crucible 100A is provided with the crucible main body 110, a container (not shown), the cover 140A, the gasket 150, and the fixture 160 similarly to Example 1. In the lid 140A according to the present embodiment, unlike the first embodiment, the concave portion 141 is not provided. In the present embodiment, the side of the cover 140A opposite to the gasket 150 is configured as a flat surface. Also in this embodiment, the same effect as in the first embodiment can be obtained.

And, in the evaporation source 10A according to the present embodiment, as a heating heater for heating the crucible 100A, the first heater 210 for heating the crucible body 110, and for heating the gasket 150 A second heater 220 is provided. In the present embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 after the deposition is finished. Afterwards, the second heater 220 is turned off. Hereinafter, a method of controlling the evaporation source 10A according to the present embodiment will be described with reference to the control flow of FIG. 9 .

In the control device 300, upon receiving a command to start the vapor deposition process (S0), the first heater 210 (a heater for a crucible) is turned on (S1), and further, the second heater 220 (a heater for a gasket) is turned on (S1). is turned on (S2). In addition, the timing for turning on these may be done in reverse order, and may do it simultaneously. When the first heater 210 and the second heater 220 are turned on, the crucible 100A is heated, and when the environmental temperature in the crucible becomes a certain level or higher, the film-forming material is evaporated or sublimated, and a vapor deposition process is performed. Then, the control device 300 determines whether to end the deposition based on a preset program process ( S4 ). Accordingly, the deposition process is continued while the deposition is not finished (S3), and when it is determined that the deposition is finished, the first heater 210 is turned off (S5).

Thereafter, the control device 300 determines whether to turn off the second heater 220 (S6). Here, the timing for turning off the second heater 220 by the control device 300 is set based on the fact that the temperature of the crucible main body 110 is lowered to a temperature at which the film-forming material neither sublimes nor evaporates. . For example, it may be determined whether the elapsed time after turning off the first heater 210 reaches a predetermined time, and the second heater 220 may be set to be turned off at the timing when the time has elapsed. . That is, what is necessary is just to set the time required for the temperature of the crucible main body 110 until the 1st heater 210 is turned off and until the film-forming material falls to the temperature which neither sublimes nor evaporates. On the other hand, this time can be set based on experimental data, empirical rules, or the like. In addition, a sensor for measuring the temperature of the crucible body 110 is installed, and the second heater 220 is turned off at a timing when the temperature measured by the sensor is lowered to a temperature at which the film-forming material neither sublimes nor evaporates. control can also be employed. As described above, the control device 300 determines whether to turn off the second heater 220 (S6), and turns off the second heater 220 (S7), thereby controlling heating of the crucible 100A is terminated (S8).

As described above, according to the evaporation source 10A according to the present embodiment, the gasket 150 is heated and expanded even after the first heater 210 is turned off until the second heater 220 is turned off. Therefore, sealing property can be obtained. Then, the timing for turning off the second heater 220 by the control device 300 is set based on the fact that the temperature of the crucible main body 110 is lowered to a temperature at which the film-forming material neither sublimes nor evaporates. . Accordingly, even when the first heater 210 is turned off, the sealing function is exhibited while the film-forming material is sublimated or evaporated.

(Example 3)

10 is a schematic cross-sectional view showing a part of an evaporation source according to Example 3 of the present invention, and is an enlarged cross-sectional view showing a configuration different from that of Example 1. FIG. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment.

The crucible 100B is provided with the crucible main body 110, a container (not shown), the cover 140B, the gasket 150, and the fixture 160 similarly to Example 1. FIG. In the lid 140B according to the present embodiment, the concave portion 141 is not provided as in the second embodiment. In the present embodiment, the side of the cover 140B opposite to the gasket 150 is configured as a flat surface.

In addition, in the evaporation source 10B according to the present embodiment, as in the second embodiment, as a heating heater for heating the crucible 100B, a first heater 210 for heating the crucible body 110 and a gasket ( A second heater 220 for heating 150 is provided. In addition, in the present embodiment, the second heater 220 is provided between the cover 140B and the gasket 150 . The surface in contact with the gasket 150 of the second heater 220 is constituted by a flat surface. In this embodiment, under the temperature environment at the time of deposition, the gasket 150 is in close contact with the inner side and bottom surfaces of the concave portion 113 of the crucible body 110 and the second heater 220 due to thermal expansion. becomes Also in this embodiment, the same effect as in the first embodiment can be obtained. On the other hand, the heating heater can employ|adopt the structure in which the heater wire was provided in the non-conductive metal plate. By employing the heating heater configured in this way as the second heater 220 , the gasket 150 is brought into close contact with the second heater 220 and exhibits a stable sealing function. On the other hand, since the contact|adhesion surface with the gasket 150 in the 2nd heater 200 becomes a sealing surface, it is preferable to process so that smoothness may become high.

Also in this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of vapor deposition, and vapor deposition After the end, the first heater 210 is turned off, and then the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

(Example 4)

11 is a schematic cross-sectional view showing a part of an evaporation source according to a fourth embodiment of the present invention, and is an enlarged cross-sectional view showing a configuration different from that of the first embodiment. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment.

The crucible 100C is provided with the crucible main body 110, a container (not shown), the cover 140C, the gasket 150, and the fixture 160 similarly to Example 1. In the lid 140C according to the present embodiment, as in the second embodiment, the concave portion 141 is not provided. In the present embodiment, the side of the cover 140C opposite to the gasket 150 is configured as a flat surface.

Further, in the evaporation source 10C according to the present embodiment, as in the second embodiment, as a heating heater for heating the crucible 100C, the first heater 210 for heating the crucible body 110, and a gasket A second heater 220 for heating 150 is provided. In addition, in the present embodiment, the second heater 220 is fixed to the cover 140C so that the second heater 220 is disposed inside the opening 151 of the gasket 150 . In this embodiment, as in the first and second embodiments, under the temperature environment at the time of deposition, the gasket 150 is thermally expanded, and the inner side and bottom surface of the concave portion 113 of the crucible body 110 and the cover (140C) is in close contact. Also in this embodiment, the same effect as in the first embodiment can be obtained.

Also in this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of vapor deposition, and vapor deposition After the end, the first heater 210 is turned off, and then the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

(Example 5)

12 is a schematic cross-sectional view showing a part of an evaporation source according to a fifth embodiment of the present invention, and is an enlarged cross-sectional view showing a configuration different from that of the first embodiment. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment.

The crucible 100D is provided with the crucible main body 110, the container (not shown), the cover 140D, the gasket 150D, and the fixture 160 similarly to Example 1. FIG. In the gasket 150D according to the present embodiment, unlike the first embodiment, the opening 151 is not provided. However, also in this embodiment, it is possible to employ a configuration in which the opening 151 is provided. In addition, in the cover 140D according to the present embodiment, unlike the first embodiment, not the gasket 150D, but a recess 141D for arranging the second heater 220 is provided. On the other hand, in the present embodiment, the contact surface (contact surface) with the gasket 150D of the lid 140D is constituted by a flat surface.

Further, in the evaporation source 10D according to the present embodiment, as in the second embodiment, as a heating heater for heating the crucible 100D, a first heater 210 for heating the crucible body 110, and a gasket ( A second heater 220 for heating 150D) is provided. And, in the present embodiment, the second heater 220 is fixed to the cover 140D so that the second heater 220 is disposed inside the recess 141D installed in the cover 140D. In this embodiment, as in the first and second embodiments, under the temperature environment at the time of deposition, the gasket 150D undergoes thermal expansion, and the inner side and bottom surface of the concave portion 113 of the crucible body 110 and the cover. (140D) is in close contact. Also in this embodiment, the same effect as in the first embodiment can be obtained.

Also in this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of vapor deposition, and vapor deposition After the end, the first heater 210 is turned off, and then the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

(Example 6)

13 is a schematic cross-sectional view showing a part of a crucible according to a sixth embodiment of the present invention, and is an enlarged cross-sectional view illustrating a configuration different from that of the first embodiment. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment.

The crucible 100E according to the present embodiment, similarly to the first embodiment, includes a crucible body 110 , a container (not shown), a cover 140E, a gasket 150 , and a fixture 160 . are doing In the lid 140E according to the present embodiment, as in the second embodiment, the concave portion 141 is not provided. In the present embodiment, the side opposite to the gasket 150 in the lid 140E is formed as a flat surface. Therefore, it is the same as that of Example 1 about that the surface which the gasket 150 in the lid|cover 140E contacts is flat. Also in this embodiment, the same effect as in the first embodiment can be obtained.

And, in this embodiment, the spring 170 as a pressing member which presses the gasket 150 toward the bottom surface of the recessed part 113 of the crucible main body 110 is provided. That is, in a state in which the spring 170 is disposed between the nut serving as the fixture 160 and the cover 140E, the fixture 160 is tightly tightened. Thereby, the gasket 150 is pressed against the lid 140E, and is pressed toward the bottom surface of the concave portion 113 of the crucible body 110 . By adopting the above configuration, it is possible to suppress the occurrence of a gap between the gasket 150 and the bottom surface of the concave portion 113 of the crucible body 110 even under a non-evaporating temperature environment (under a room temperature environment). can Therefore, the leakage of the film-forming material after a vapor deposition process can be suppressed.

(Example 7)

14 is a schematic cross-sectional view showing a part of an evaporation source according to a seventh embodiment of the present invention, and is an enlarged cross-sectional view illustrating a configuration different from that of the first embodiment. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment. Also in the evaporation source 10F according to the present embodiment, as in the first embodiment, the crucible 100F, the heating heater for heating the crucible 100F, and a control device 300 for controlling the operation of the heating heater (FIG. 1) see) is provided.

The crucible 100F is provided with the crucible main body 110, a container (not shown), the cover 140F, the gasket 150, and the fastener 160 similarly to Example 1. In the lid 140F according to the present embodiment, as in the second embodiment, the concave portion 141 is not provided. In the present embodiment, the side opposite to the gasket 150 in the lid 140F is configured as a flat surface. Therefore, it is the same as that of Example 1 about that the surface which the gasket 150 in the lid|cover 140F contacts is flat. Also in this embodiment, the same effect as in the first embodiment can be obtained.

And in the present embodiment, similarly to the sixth embodiment, the spring 170 as a pressing member for pressing the gasket 150 toward the bottom surface of the concave portion 113 of the crucible main body 110 is provided. Also in this embodiment, the same effect as in the sixth embodiment can be obtained.

In addition, in the evaporation source 10F according to the present embodiment, as a heating heater for heating the crucible 100F, the first heater 210 for heating the crucible body 110 and the gasket 150 for heating A second heater 220 is provided. In the present embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of deposition, and after the deposition is finished, After the first heater 210 is turned off, the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

As described above, in the present Example, since the effect of Example 6 is added to the effect of Example 2, the leakage of the film-forming material after vapor deposition can be suppressed more reliably.

(Example 8)

15 is a schematic cross-sectional view illustrating a part of an evaporation source according to Example 8 of the present invention, and is an enlarged cross-sectional view showing a configuration different from Example 1; The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment. Also in the evaporation source 10G according to the present embodiment, as in the first embodiment, the crucible 100G, the heating heater for heating the crucible 100G, and a control device 300 for controlling the operation of the heating heater (FIG. 1) see) is provided.

The crucible 100G is provided with the crucible main body 110, a container (not shown), the cover 140G, the gasket 150, and the fixture 160 similarly to Example 1. In the lid 140G according to the present embodiment, as in the second embodiment, the concave portion 141 is not provided. In the present embodiment, the side of the cover 140G opposite to the gasket 150 is configured as a flat surface.

Further, in the evaporation source 10G according to the present embodiment, as in the second embodiment, as a heating heater for heating the crucible 100G, a first heater 210 for heating the crucible body 110 and a gasket ( A second heater 220 for heating 150 is provided. In addition, in the present embodiment, the second heater 220 is provided between the cover 140G and the gasket 150 . The surface in contact with the gasket 150 of the second heater 220 is constituted by a flat surface. In this embodiment, under the temperature environment at the time of deposition, the gasket 150 is in close contact with the inner side and bottom surfaces of the concave portion 113 of the crucible body 110 and the second heater 220 due to thermal expansion. becomes Also in this embodiment, the same effect as in the first embodiment can be obtained.

Also in this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of vapor deposition, and vapor deposition After the end, the first heater 210 is turned off, and then the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

And, in this embodiment, similarly to the sixth and seventh embodiments, a spring 170 as a pressing member for urging the gasket 150 toward the bottom surface of the concave portion 113 of the crucible body 110 is provided.

(Example 9)

16 is a schematic cross-sectional view showing a part of an evaporation source according to a ninth embodiment of the present invention, and is an enlarged cross-sectional view illustrating a configuration different from that of the first embodiment. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment. Also in the evaporation source 10H according to the present embodiment, similarly to the first embodiment, the crucible 100H, the heating heater for heating the crucible 100H, and a control device 300 for controlling the operation of the heating heater (FIG. 1) see) is provided.

The crucible 100H includes a crucible main body 110 , a container (not shown), a cover 140H, a gasket 150 , and a fixture 160 , similarly to the first embodiment. In the lid 140H according to the present embodiment, as in the second embodiment, the concave portion 141 is not provided. In the present embodiment, the side of the cover 140H opposite to the gasket 150 is configured as a flat surface.

Further, in the evaporation source 10H according to the present embodiment, as in the second embodiment, as a heating heater for heating the crucible 100H, a first heater 210 for heating the crucible body 110, and a gasket ( A second heater 220 for heating 150 is provided. In addition, in the present embodiment, the second heater 220 is fixed to the cover 140H so that the second heater 220 is disposed inside the opening 151 of the gasket 150 . In this embodiment, similarly to Embodiments 1 and 2, under the temperature environment at the time of deposition, the gasket 150 is thermally expanded, and the inner side and bottom surfaces of the concave portion 113 of the crucible body 110 and the cover ( 140H) in close contact. Also in this embodiment, the same effect as in the first embodiment can be obtained.

Also in this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of vapor deposition, and vapor deposition After the end, the first heater 210 is turned off, and then the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

And in this embodiment, similarly to Examples 6-8, the spring 170 as a biasing member which presses the gasket 150 toward the bottom surface of the recessed part 113 of the crucible main body 110 is provided.

(Example 10)

17 is a schematic cross-sectional view showing a part of an evaporation source according to a tenth embodiment of the present invention, and is an enlarged cross-sectional view illustrating a configuration different from that of the first embodiment. The overall configuration of the vapor deposition apparatus according to the present embodiment is the same as that of the first embodiment. Also in the evaporation source 10I according to the present embodiment, as in the first embodiment, the crucible 100I, the heating heater for heating the crucible 100I, and a control device 300 for controlling the operation of the heating heater (FIG. 1) see) is provided.

The crucible 100I is provided with the crucible main body 110, a container (not shown), the cover 140I, the gasket 150I, and the fixture 160 similarly to Example 1. In the gasket 150I according to the present embodiment, unlike the first embodiment, the opening 151 is not provided. However, also in this embodiment, it is possible to employ a configuration in which the opening 151 is provided. In addition, in the lid 140I according to the present embodiment, unlike the first embodiment, not the gasket 150I, but a recess 141I for arranging the second heater 220 is provided. On the other hand, in the present embodiment, the contact surface (contact surface) with the gasket 150 in the lid 140I is constituted by a flat surface.

Further, in the evaporation source 10I according to the present embodiment, as in the second embodiment, as a heating heater for heating the crucible 100I, a first heater 210 for heating the crucible body 110 and a gasket ( A second heater 220 for heating 150I) is provided. And, in this embodiment, the second heater 220 is fixed to the cover 140I so that the second heater 220 is disposed inside the recess 141I installed in the cover 140I. In this embodiment, similarly to Embodiments 1 and 2, under the temperature environment at the time of deposition, the gasket 150I undergoes thermal expansion, and the inner side and bottom surfaces of the concave portion 113 of the crucible body 110 and the cover ( 140I) in close contact. Also in this embodiment, the same effect as in the first embodiment can be obtained.

Also in this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 at the time of vapor deposition, and vapor deposition After the end, the first heater 210 is turned off, and then the second heater 220 is turned off. Also in this embodiment, the same effect as in the second embodiment can be obtained.

And, in this Example, similarly to Examples 6-9, the spring 170 as a biasing member which presses the gasket 150 toward the bottom surface of the recessed part 113 of the crucible main body 110 is provided.

(Other)

In Examples 3 and 8, a configuration was shown in which the second heater was provided between the cover and the gasket, and the gasket was in close contact with the second heater instead of the cover. However, in this embodiment, the second heater may also function as a cover. Thereby, it becomes unnecessary to provide a cover separately, and it can reduce the number of parts. As a 2nd heater, by employ|adopting the structure in which the heater wire was provided in the non-conductive metal plate, the function as a cover can also be provided. Moreover, since the contact surface (adherence surface) with the gasket in a 2nd heater becomes a sealing surface, it is preferable to process so that smoothness may become high.

For the shape of the gasket 150, the opening 111 and the concave portion 113 installed in the crucible body 110, and the concave portion 141 installed in the cover 140, the shape shown in each embodiment It is not limited. The planar shape of the opening 111 and the concave part 113 provided in the crucible main body 110 and the concave part 141 provided in the cover 140 is similar to the planar shape of the gasket 150 (dimensions are A shape slightly larger than the gasket 150) may be used. For example, in the first embodiment, the outer wall surface of the gasket 150 has a configuration in which planes are connected to each other by a curved surface (so-called R surface). There is no need to install the side. The same applies to the inner wall surface of the opening 151 in the gasket 150 . When such a configuration is adopted, the same shape may be adopted for the inner wall surface of the concave portion 113 and the inner wall surface of the opening 111 in the crucible main body 110 (circle diagram in FIG. 4 ). see). The same applies to the shape of the inner wall surface of the concave portion 141 of the lid 140 (refer to the drawing in the circle in FIG. 5).

1: deposition apparatus
2: Chamber
3: vacuum pump
10: evaporation source
100: crucible
110: crucible body
111: opening
112: outlet
113: recess
114: screw shaft
120: film-forming material
130: courage
140: cover
141: concave
142: insertion hole
150: gasket
151: opening
160: fixture
170: spring
200: heating heater
210: first heater
220: second heater
300: control unit

Claims (5)

a crucible body having an opening for loading and unloading a container for accommodating a film-forming material;
a cover for blocking the opening;
A crucible comprising a metal gasket sealing a gap between the crucible body and the lid,
Both sides of the gasket are constituted by a plane,
A concave portion in which the gasket is disposed is provided in the crucible body along the opening portion, and a bottom surface of the concave portion is constituted by a flat surface,
It is constituted by a shaving plane in contact with the gasket in the cover or a member installed between the cover and the gasket,
the coefficient of linear expansion of the material of the gasket is greater than the coefficient of linear expansion of the material of the crucible body;
Under the non-evaporation temperature environment, the gasket is disposed with a gap between the inner side surface of the concave portion and the inner side surface of the concave portion. and a bottom surface and the cover or a member installed between the cover and the gasket to be in close contact with each other. According to claim 1,
and a pressing member for pressing the gasket toward the bottom surface of the concave portion. The crucible according to claim 1 or 2,
a first heater for heating the crucible body;
a second heater for heating the gasket;
and a control device that turns on both the first heater and the second heater during vapor deposition and turns off the second heater after turning off the first heater after completion of the vapor deposition. . 4. The method of claim 3,
The timing for turning off the second heater by the control device is set based on the fact that the temperature of the crucible main body is lowered to a temperature at which the film-forming material neither sublimes nor evaporates. chamber and
A vapor deposition apparatus comprising: the evaporation source according to claim 3 provided in the chamber and performing vapor deposition on a vapor deposition surface of a substrate provided in the chamber.

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