KR20220021183A - Plasma reactor - Google Patents

Abstract

A plasma reactor according to one aspect of the present invention comprises: a reaction main body formed with a gas inlet part on one side and formed with a gas outlet part on the other side; a magnetic core part surrounding one part of the reaction main body; a primary winding coupled to the magnetic core part, and connected to a power supply part to generate a plasma of a gas in the reaction main body; a first additional winding formed along a front surface of the reaction main body and disposed to penetrate through the magnetic core part; and a second additional winding formed opposite to the first additional winding along a rear surface of the reaction main body and disposed to penetrate through the magnetic core part. Therefore, the present invention is capable of efficiently controlling a plasma.

Description

Plasma reactor

The present invention relates to a plasma apparatus, and more particularly, to a plasma reactor.

In general, plasma discharge is used for gas excitation to generate an active gas. The active gas is widely used in various fields, and is typically used in various processes such as semiconductor or display manufacturing processes, for example, deposition, etching, and ashing.

In recent years, wafers and LCD glass substrates for manufacturing semiconductor devices are becoming larger. Therefore, there is a demand for a highly scalable plasma reactor having a high control capability for plasma generation and a large-area processing capability. Furthermore, as the volume of the process chamber is increased according to the enlargement of the substrate, a plasma reactor capable of remotely supplying a high-density active gas sufficiently is required.

On the other hand, the plasma reactor is one using a transformer coupled plasma (transformer coupled plasma, TCP) and one using an inductively coupled plasma (inductively coupled plasma, ICP). A plasma reactor using a transformer coupled plasma (TCP) has a structure in which a magnetic core having a primary winding is mounted on a reaction body of a toroidal structure. A plasma reactor using inductively coupled plasma (ICP) has a structure in which an inductively coupled antenna is mounted on a reaction body of a hollow tube structure.

In a plasma reactor using a transformer coupled plasma, power control for stable plasma generation and maintenance is important. In general, power is controlled through a primary winding of a transformer, but in this case, it is difficult to distinguish a plasma generating step and a maintaining step, so that it is difficult to control power.

An object of the present invention is to solve various problems including the above problems, and to provide a plasma reactor capable of efficiently controlling plasma power. However, these problems are exemplary, and the scope of the present invention is not limited thereto.

Plasma reactor according to an aspect of the present invention for solving the above problems, a gas inlet portion is formed on one side and a gas outlet portion formed on the other side, a reaction body, a magnetic core portion surrounding a portion of the reaction body, and the A primary winding coupled to a magnetic core and connected to a power supply to generate gas plasma in the reaction body, a first auxiliary winding formed along the front surface of the reaction body and disposed to penetrate through the magnetic core; and a second auxiliary winding formed to face the first auxiliary winding along the rear surface of the reaction body and disposed to penetrate through the magnetic core portion.

According to the plasma reactor, the first auxiliary winding and the second auxiliary winding are not directly connected to the primary winding and may be inductively coupled through the magnetic core part.

According to the plasma reactor, the central portion of the third auxiliary winding may be grounded so that the phases of both sides thereof are reversed.

According to the plasma reactor, an inner hole is formed along an inner circumferential surface of the reaction body, an annular loop space surrounding the inner hole is formed inside the reaction body, and the primary winding is the magnetic core along an outer circumferential surface of the reaction body It may include an outer winding formed to penetrate the portion and an inner winding formed to penetrate the magnetic core portion along the inner circumferential surface of the reaction body, wherein one end of the inner winding and one end of the outer winding are selectively connectable to each other.

According to the plasma reactor, the first auxiliary winding and the second auxiliary winding may be selectively connected to the primary winding.

According to the plasma reactor, the first auxiliary winding and the second auxiliary winding may be selectively connected to the primary winding by at least one switch disposed outside the power supply unit.

According to the plasma reactor, the first auxiliary winding and the second auxiliary winding may be selectively connected to the primary winding by at least one switch disposed inside the power supply unit.

According to the plasma reactor, it may further include a third auxiliary winding selectively connected to the first auxiliary winding or the second auxiliary winding, arranged to wind the magnetic core part.

According to the plasma reactor, the third auxiliary winding may be formed to penetrate at least a portion of the magnetic core portion along the surface of the reaction body.

According to the plasma reactor, the reaction body may have a toroidal structure in which gas flows into the gas inlet, branches into two flow paths in the annular loop space, is activated, and then is laminated again and discharged to the gas outlet.

According to the plasma reactor, the reaction body may be composed of a conductive metal or an insulating material having an insulating coating.

According to the plasma reactor according to an embodiment of the present invention made as described above, it is possible to efficiently control plasma by adding an additional winding in addition to the primary winding. Of course, the scope of the present invention is not limited by these effects.

1 is a schematic circuit diagram showing a plasma reactor according to an embodiment of the present invention.
2 to 4 are schematic circuit diagrams showing plasma reactors according to other embodiments of the present invention.
5 is a schematic perspective view showing a plasma reactor according to another embodiment of the present invention.
6 is a cross-sectional view illustrating the plasma reactor of FIG. 5 .
7 is an exploded perspective view illustrating a partial configuration of the plasma reactor of FIG. 5 .
8 is an exploded perspective view showing a partial configuration of a plasma reactor according to another embodiment of the present invention.
9 is a schematic cross-sectional view illustrating a plasma processing system according to an embodiment of the present invention.

Hereinafter, several preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The embodiments of the present invention are provided to more completely explain the present invention to those of ordinary skill in the art, and the following examples may be modified in various other forms, and the scope of the present invention is as follows It is not limited to an Example. Rather, these embodiments are provided so as to more fully and complete the present disclosure, and to fully convey the spirit of the present invention to those skilled in the art. In addition, in the drawings for convenience of description, the size of at least some of the components may be exaggerated or reduced. In the drawings, like numbers refer to like elements.

1 is a schematic circuit diagram showing a plasma reactor 50 according to an embodiment of the present invention.

Referring to FIG. 1 , the plasma reactor 50 may include a reaction body RB and a transformer TF.

The reaction body RB may define a reaction space in which plasma is generated. The reaction body RB may have a gas inlet formed on one side thereof and a gas outlet formed on the other side thereof. The gas introduced into the reaction body RB may be activated by plasma and discharged as an active gas.

A primary side of the transformer TF may be connected to the power supply unit PS, and a secondary side thereof may be coupled to the reaction body RB to generate a plasma of gas in the reaction body RB. For example, the magnetic core portion MC is provided to surround a portion of the reaction body RB, and the primary winding FC is coupled to the magnetic core portion MC to generate a plasma of gas within the reaction body RB. It may be connected to the power supply unit PS so that it can be generated. Accordingly, the plasma generated in the reaction body RB may become a secondary side of the transformer TF.

When electric power is applied to the primary winding FC, a magnetic force is generated in the magnetic core part MC, and an induced electromotive force is generated in the secondary side of the transformer TF, that is, in the reaction body RB, by the change of the magnetic force. of plasma can be generated. In this sense, this plasma may be referred to as a transformer coupled plasma (TCP).

The power supply unit PS may supply power to the transformer TF. For example, the power supply unit PS may supply switching power using one or more switching semiconductor devices. For example, the power supply unit PS may include an inverter device including one or more semiconductor transistors. Furthermore, the power supply unit PS may further include an additional circuit for controlling the power supply, for example, a resonance circuit.

The first auxiliary winding AC1 may be formed along one surface of the reaction body RB, and may be formed to at least partially wind the magnetic core part MC. For example, the first auxiliary winding AC1 may be formed along the front surface of the reaction body RB and disposed to penetrate the magnetic core part MC.

The second auxiliary winding AC2 may be formed along the other surface of the reaction body RB and may be formed to at least partially wind the magnetic core part MC. For example, the second auxiliary winding AC2 may be formed along the rear surface of the reaction body RB and disposed to penetrate the magnetic core part MC.

More specifically, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be inductively coupled through the magnetic core unit MC without being directly connected to the primary winding FC. For example, when power is applied to the primary winding FC, a magnetic force is generated in the magnetic core part MC, and the change in the magnetic force induces the first and second secondary windings AC1 and AC2. An electromotive force may be generated.

Furthermore, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be respectively disposed on the front and rear surfaces of the reaction body RB to face each other. In this case, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be capacitively coupled to each other by a difference in induced electromotive force generated by the primary winding FC. Accordingly, power by capacitive coupling of the first auxiliary winding AC1 and the second auxiliary winding AC2 may be additionally applied to the reaction body RB.

The first auxiliary winding AC1 and the second auxiliary winding AC2 may contribute to plasma generation and maintenance of the gas in the reaction body RB together with the primary winding FC. For example, initial ignition is required to generate plasma in the reaction body RB. Since high energy is required for the initial ignition of plasma, power by capacitive coupling of the first auxiliary winding AC1 and the second auxiliary winding AC2 together with the induced electromotive force by the primary winding FC into the reaction body RB can be approved together. Optionally, power supply by the first auxiliary winding AC1 and the second auxiliary winding AC2 may be stopped after plasma ignition.

In some embodiments, optionally, a third auxiliary winding AC3 may be added to be selectively connected to the first auxiliary winding AC1 or the second auxiliary winding AC2. The third auxiliary winding AC3 may be disposed to wind the magnetic core part MC at least once so as to be inductively coupled to the magnetic core part MC. For example, the third auxiliary winding AC3 may be formed to penetrate at least a portion of the magnetic core part MC along the surface of the reaction body RB.

The first auxiliary winding AC1 may be selectively connected to the third auxiliary winding AC3 through the first switch S1 , and the second auxiliary winding AC2 is the third auxiliary winding through the second switch S2 . (AC3) can be selectively connected. In some embodiments, the third auxiliary winding AC3 is divided into two parts, a first part of which is connected to the first auxiliary winding AC1 through a first switch S1, and a second part is a second part It may be selectively connected to the second auxiliary winding AC2 through the switch S2. Accordingly, it is possible to control the connection of the first auxiliary winding AC1, the second auxiliary winding AC2, and the third auxiliary winding AC3 through the first switch S1 and the second switch S2.

The third auxiliary winding AC3 is connected to the first auxiliary winding AC1 and the second auxiliary winding AC2 to increase the power supply by the first auxiliary winding AC1 and the second auxiliary winding AC2. can

Furthermore, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be coupled to each other through the third switch S3 and connected to the ground through the fourth switch S4 . Accordingly, the operation of the first auxiliary winding AC1 and the second auxiliary winding AC2 may be controlled through the third switch S3 and/or the fourth switch S4 .

For example, the first switch S1 , the second switch S2 , the third switch S3 , and the fourth switch S4 may include a relay element. Furthermore, the first switch S1 , the second switch S2 , the third switch S3 , and the fourth switch S4 may be disposed outside the power supply unit PS.

According to the plasma reactor 50, in addition to the electromotive force induced by the primary winding (FC), additional power by the first auxiliary winding (AC1), the second auxiliary winding (AC2) and the third auxiliary winding (AC3) is selectively required. Accordingly, it is possible to efficiently control plasma generation and maintenance in the reaction body RB by supplying more.

2 to 4 are schematic circuit diagrams showing plasma reactors 50a, 50b, and 50c according to other embodiments of the present invention. The plasma reactors 50a, 50b, and 50c are additions or modifications of some configurations to the plasma reactor 50 of FIG. 1 , and may be referenced to each other, and overlapping descriptions will be omitted.

Referring to FIG. 2 , in the plasma reactor 50a, a predetermined portion of the third auxiliary winding AC3 may be grounded. For example, the central portion T1 of the third auxiliary winding AC3 may be grounded, and the phases of both sides of the central portion may be reversed according to the above. More specifically, a tab portion may be formed in the central portion T1 of the third auxiliary winding AC3 to be connected to the ground portion.

Accordingly, the potential difference between both sides of the third auxiliary winding AC3 may be increased, and further, the potential difference between the first auxiliary winding AC1 and the second auxiliary winding AC2 to which the third auxiliary winding AC3 is connected may increase. there is. Accordingly, the power supply by the first auxiliary winding AC1 and the second auxiliary winding AC2 can be increased.

Referring to FIG. 3 , in the plasma reactor 50b, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be selectively connected to the primary winding FC.

For example, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be selectively connected to the primary winding FC by at least one switch disposed inside the power supply unit PS. More specifically, the first auxiliary winding AC1 is selectively connected to the primary winding FC by a fifth switch S5 disposed inside the power supply unit PS, and the second auxiliary winding AC2 is connected to the power supply unit ( PS) may be selectively connected to the primary winding FC by the sixth switch S6 disposed inside.

For example, the fifth switch S5 and the sixth switch S6 may include a relay element and may be configured as an internal component of the power supply unit PS.

When the fifth switch S5 and/or the sixth switch S6 is turned on, the first auxiliary winding AC1 and/or the second auxiliary winding AC2 is connected to the primary winding FC. It may be connected to receive power from the power supply unit PS. Accordingly, the first auxiliary winding AC1 and/or the second auxiliary winding AC2 functions as the primary side of the transformer TF on the extension line of the primary winding FC, and generates a magnetic force in the magnetic core MC to react An induced electromotive force may be transmitted to the main body RB. Furthermore, the first auxiliary winding AC1 and the second auxiliary winding AC2 may be disposed to face each other and capacitively coupled, so that additional power may be additionally transferred to the reactive body RB by capacitive coupling.

Accordingly, according to the plasma reactor 50b, plasma generation and maintenance efficiency can be further increased by using the first auxiliary winding AC1 and the second auxiliary winding AC2 in addition to the primary winding FC.

Referring to FIG. 4 , in the plasma reactor 50c, the first auxiliary winding AC1 and the second auxiliary winding AC2 are connected to the primary winding FC by at least one switch disposed inside the power supply unit PS. It can be optionally connected. More specifically, the first auxiliary winding AC1 is selectively connected to the primary winding FC by a fifth switch S5 disposed outside the power supply unit PS, and the second auxiliary winding AC2 is connected to the power supply unit ( PS) may be selectively connected to the primary winding FC by the sixth switch S6 disposed inside.

As described above, when the fifth switch S5 and/or the sixth switch S6 is turned on, the first auxiliary winding AC1 and/or the second auxiliary winding AC2 is the primary It may be connected to the winding FC to receive power from the power supply unit PS.

5 is a schematic perspective view showing a plasma reactor 100 according to another embodiment of the present invention, FIG. 6 is a cross-sectional view showing the plasma reactor 100 of FIG. 5, and FIG. 7 is the plasma reactor 100 of FIG. ) is an exploded perspective view showing a part of the configuration. The plasma reactor 100 may be an example in which the plasma reactors 50 , 50a , 50b , and 50c of FIGS. 1 to 4 are specifically implemented.

Referring to FIG. 5 , the plasma reactor 100 may include a reaction body 110 , a magnetic core part 130 , and a primary winding 140 .

The reaction body 110 is provided as a specific example of the reaction body RB of FIGS. 1 to 4 , and may define a reaction space in which plasma is generated. For example, the reaction body 110 may have a gas inlet 120 formed on one side thereof, a gas outlet 130 formed on the other side thereof, and an annular roof space 112 formed therein. Accordingly, the gas may be introduced into the gas inlet 120 , branched into two flow passages in the annular roof space 112 , activated, and then combined again and discharged to the gas outlet 130 . Accordingly, the reaction body 110 may have a toroidal structure, and the annular loop space 112 may be referred to as a toroidal reaction space.

The reaction body 110 may be formed in one structure or may be composed of several blocks. The reaction body 110 may be formed of a conductive metal with an insulating coating or an insulating material such as quartz. The reaction body 110 may be formed in a tube shape to have an annular loop space 112 or a block structure in which an annular loop space 112 is processed inside.

In some embodiments, the reactive body 110 may include a front surface 114 , a rear surface 115 , an outer peripheral surface 116 , and an inner peripheral surface 117 . Furthermore, an inner hole 111 is formed in the reaction body 110 along the inner circumferential surface 117 , and an annular loop space 112 may be formed therein to surround the inner hole 111 . Furthermore, receiving grooves may be formed on the front surface 114 , the rear surface 115 , the outer circumferential surface 116 , and the inner circumferential surface 117 so that parts can be disposed.

The magnetic core part 130 may be provided as an example of the magnetic core part MC of FIGS. 1 to 4 , and may function as a core of the transformer TF. The magnetic core part 130 may be formed in a shape surrounding a portion of the reaction body 110 .

For example, the magnetic core unit 130 may include one or a plurality of magnetic cores. The magnetic cores may be spaced apart along the extension direction of the reaction body 110 and may be disposed to substantially surround the reaction body 110 by one turn. The magnetic cores may be made of a magnetic material, for example, ferrite.

In some embodiments, each magnetic core in the magnetic core unit 130 may be formed in a single annular structure or in a structure in which a plurality of pieces are combined. For example, the two pieces may be disposed to face each other, and the two pieces may be in contact with each other or may be disposed apart from each other within the limit where the magnetic force line forms a closed loop.

In some embodiments, the magnetic core part 130 may be separately coupled to both sides of the annular loop space 112 . For example, the magnetic core portion 130 may be divided into a first portion surrounding the left portion of the annular roof space 112 and a second portion surrounding the right portion of the annular roof space. For example, when the reaction body 110 is formed in the form of an annular tube as a whole, the magnetic cores may be disposed along the annular tube. More specifically, the four magnetic cores may be arranged in a cross shape to gather at the center of the inner hole 111 of the reaction body 110 .

The primary winding 140 may be provided as an example of the primary winding FC of FIGS. 1 to 4 . The primary winding 140 is connected to the power supply unit (see PS of FIGS. 1 to 4 ), and may be disposed to surround a portion of the magnetic core unit 130 . For example, the primary winding 140 is wound on a portion of the magnetic core part 130 by one or more turns. The loop of the magnetic core part 130 and the loop of the primary winding 140 may be arranged in a substantially vertical direction.

More specifically, the primary winding 140 includes an outer winding 142 formed to penetrate the magnetic core 130 along the outer circumferential surface 116 of the reaction body 110 and an inner circumferential surface 117 of the reaction body 110 . Accordingly, the inner winding 144 formed to penetrate the magnetic core 130 may be included. For example, the outer winding 142 and the inner winding 144 may be coupled to the receiving grooves of the outer circumferential surface 116 and the inner circumferential surface 117 , respectively.

Furthermore, one end of the inner winding 144 and one end of the outer winding 142 may be selectively connected to each other to form the primary winding 140 as a whole. Accordingly, the primary winding 140 may form a winding structure of at least two turns through the inner winding 144 and the outer winding 142 . On the other hand, when a switch is interposed between the inner winding 144 and the outer winding 142 , the number of rotations of the primary winding 140 may be adjusted through a selective connection.

This structure may constitute the transformer TF of FIGS. 1 to 4 as a whole. The primary winding 140 is wound around the magnetic core part 130 , and the annular loop space 112 of the reaction body 110 may be disposed to surround the magnetic core part 130 . That is, the annular loop space 112 may be the secondary side of the transformer TF. Accordingly, when a primary current flows in the primary winding 140 , a magnetic force is induced in the magnetic core part 130 , and a secondary current is induced in the annular loop space 112 by this induced magnetic force to form plasma. can

The first auxiliary winding 152 may be provided as an example of the first auxiliary winding AC1 of FIGS. 1 to 4 . For example, the first auxiliary winding 152 may be formed along the front surface 114 of the reaction body 110 and may be disposed to penetrate the magnetic core portion 130 . For example, the first auxiliary winding 152 may be coupled to the receiving groove portion of the front surface (114).

The second auxiliary winding 154 may be provided as an example of the second auxiliary winding AC2 of FIGS. 1 to 4 . For example, the second auxiliary winding 154 may be formed along the rear surface 115 on the reaction body 110 and may be disposed to penetrate the magnetic core portion 130 . For example, the second additional winding 154 may be coupled to the receiving groove of the rear surface 115 .

The first auxiliary winding 152 and the second auxiliary winding 154 are respectively disposed on the front surface 114 and the rear surface 115 of the reaction body 110 , and interposed between the annular loop space 112 of the reaction body 110 . can be placed facing each other. Accordingly, the first auxiliary winding 152 and the second auxiliary winding 154 may be capacitively coupled to each other.

1 to 4 , the first auxiliary winding 152 and the second auxiliary winding 154 may be inductively coupled to the magnetic core unit 130 or selectively connected to the primary winding 140 .

According to the plasma reactor 100 , plasma is formed in the reaction body 110 , and gases in the annular loop space 112 may be activated by the plasma. Such an active gas may include radicals, ions, and the like. Such an active gas may be supplied to a required place through the gas discharge unit 125 . In this sense, the plasma reactor 100 may be referred to as a remote plasma generator (RPG), a remote plasma source (RPS), or a remote plasma system (RPS). However, the present invention is not limited by these names.

The active gas generated in the above-described plasma reactor 100 may be used as a cleaning gas for cleaning a chamber in a manufacturing apparatus such as a semiconductor, a display, or a solar cell, or may be used as a process gas for processing a substrate.

8 is an exploded perspective view showing a partial configuration of a plasma reactor 100a according to another embodiment of the present invention. The plasma reactor 100a is a part of the plasma reactor 100 in which some components are added or modified, and the description of FIGS. 1 to 7 may be referred to, and repeated description will be omitted.

Referring to FIG. 8 , the plasma reactor 100a may further include a third auxiliary winding 156 . The third auxiliary winding 156 may be provided as an example of the third auxiliary winding AC3 of FIGS. 1 to 4 .

The third additional winding 156 may be formed to penetrate at least a portion of the magnetic core part 130 . For example, the third auxiliary winding 156 may be formed along the surface of the reaction body 110 . More specifically, the third additional winding 156 may be formed on any part of the surface 114 , the rear surface 115 , the outer peripheral surface 116 , and the inner peripheral surface 117 of the reaction body 110 .

1 to 4 , the third auxiliary winding 156 may be selectively connected to the first auxiliary winding 152 and/or the second auxiliary winding 154 .

9 is a schematic cross-sectional view illustrating a plasma processing system 200 according to an embodiment of the present invention.

Referring to FIG. 9 , the plasma processing system 200 may include a plasma reactor 100 and a process chamber 210 .

The process chamber 210 may include a processing space for processing the substrate S, and may be connected to the gas discharge unit 125 of the plasma reactor 100 to receive a processing gas. For example, the process chamber 210 may include a substrate support 220 for seating the substrate S. The process chamber 210 may be used to form a thin film on the substrate S, etch the thin film on the substrate S, ashing the organic material on the substrate S, or clean the substrate S.

In order to clean the process chamber 210 , the plasma reactor 100 generates an active process gas for a cleaning process and sends it to the process chamber 210 through the gas outlet 125 or a substrate in the process chamber 210 . For processing, the active process gas may be provided to the process chamber 210 through the gas exhaust unit 125 .

According to the plasma processing system 200 , the active gas may be provided to the process chamber 210 through the plasma reactor 100 without directly forming plasma in the process chamber 210 .

In the plasma processing system 200 , the plasma reactor 100 may be transformed into the structure of the plasma reactors 50 , 50a , 50b , and 50c of FIGS. 1 to 4 or the plasma reactor 100a of FIG. 8 .

Although the present invention has been described with reference to the embodiments shown in the drawings, which are merely exemplary, those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Therefore, the true technical protection scope of the present invention should be determined by the technical spirit of the appended claims.

50, 50a, 50b, 100: plasma reactor
110: reactor body
120: gas inlet
125: gas outlet
130: magnetic core part
140: primary winding
162: secondary winding
164: resonant capacitor
200: substrate processing system
210: process chamber
220: substrate support

Claims (11)

a reaction body having a gas inlet formed on one side and a gas outlet formed on the other side;
a magnetic core portion surrounding a portion of the reaction body;
a primary winding coupled to the magnetic core and connected to a power supply to generate a plasma of gas in the reaction body;
a first auxiliary winding formed along the front surface of the reaction body and disposed to penetrate the magnetic core portion; and
and a second auxiliary winding formed to face the first auxiliary winding along the rear surface of the reaction body and disposed to penetrate through the magnetic core portion,
plasma reactor. The method of claim 1,
The first auxiliary winding and the second auxiliary winding are not directly connected to the primary winding and are inductively coupled through the magnetic core part,
plasma reactor. The method of claim 1,
An inner hole is formed in the reaction body along an inner circumferential surface, and an annular loop space surrounding the inner hole is formed inside the reaction body,
The primary winding may include an outer winding formed to penetrate the magnetic core portion along an outer circumferential surface of the reaction body; and
an inner winding formed to penetrate the magnetic core portion along the inner circumferential surface of the reaction body;
One end of the inner winding and one end of the outer winding are selectively connectable to each other,
plasma reactor. The method of claim 1,
wherein the first and second secondary windings are selectively coupled to the primary winding;
plasma reactor. 5. The method of claim 4,
the first auxiliary winding and the second auxiliary winding are selectively connected to the primary winding by at least one switch disposed outside the power supply;
plasma reactor. 5. The method of claim 4,
The first auxiliary winding and the second auxiliary winding are selectively connected to the primary winding by at least one switch disposed inside the power supply unit,
plasma reactor. The method of claim 1,
Further comprising a third auxiliary winding selectively connected to the first auxiliary winding or the second auxiliary winding and arranged to wind the magnetic core portion,
plasma reactor. 8. The method of claim 7,
the third auxiliary winding is formed along the surface of the reactive body to penetrate at least a portion of the magnetic core portion;
plasma reactor. 8. The method of claim 7,
The center of the third auxiliary winding is grounded so that the phases of both sides thereof are reversed,
plasma reactor. The method of claim 1,
The reaction body is
A toroidal structure in which gas flows into the gas inlet, branches into two flow paths in the annular loop space, is activated, and then is combined again and discharged to the gas outlet,
plasma reactor. 11. The method of claim 10,
The reaction body is
which is composed of a conductive metal or insulator with an insulating coating,
plasma reactor.

Images