KR20220014972A - Cleaning apparatus and cleaning method - Google Patents

Abstract

A cleaning device is provided to clean a chemical solution discharging device comprising a chemical solution discharging unit discharging a chemical solution onto a substrate and a chemical solution supplying unit supplying the chemical solution to the chemical solution discharging unit. The cleaning device may comprise a flow unit provided to perform a pumping operation for sucking and discharging the cleaning solution along first and second paths so that the cleaning solution can repeatedly flow between the first and second paths when there are the first path through which a cleaning solution capable of cleaning the chemical solution discharging unit and the chemical solution supplying unit flows from the outside to the chemical solution supplying unit through the chemical solution discharging unit; and the second path through which the cleaning solution flows to the outside through the chemical solution discharging unit from the chemical solution supplying unit.

Description

CLEANING APPARATUS AND CLEANING METHOD

The present invention relates to a cleaning apparatus and a cleaning method. More particularly, the present invention relates to a cleaning apparatus and a cleaning method for cleaning a chemical solution discharging device comprising a chemical solution discharging unit discharging a chemical solution onto a substrate and a chemical solution supplying unit supplying a chemical solution to the chemical solution discharging unit.

In manufacturing a display device such as an organic EL device, a chemical solution discharging process of discharging a chemical solution such as a photoresist or a developer solution to a substrate may be performed.

The chemical solution discharging process may be performed by using a chemical solution discharging device including a chemical solution discharging unit discharging a chemical to the substrate and a chemical solution supplying unit supplying a chemical solution to the chemical solution discharging unit.

The chemical liquid discharging unit may be a slit nozzle having a discharge surface such as a nozzle lip, and the chemical liquid supply unit may be a pump performing a pumping operation to supply the chemical to the chemical liquid discharging unit.

In addition, the chemical solution discharging unit and the chemical solution supply unit may be connected by a connection line, and the chemical solution to the chemical solution supply unit may be supplied from the chemical solution storage unit for storing the chemical solution.

If the chemical discharge device is continuously used, sludge due to chemical solutions such as photoresist and developer may be generated. may act as a cause.

Accordingly, even in the prior art, a cleaning process of periodically cleaning the chemical liquid discharging device is performed.

The aforementioned cleaning process can be mainly achieved by allowing the cleaning liquid to flow from the chemical liquid supply unit to the outside through the connection line and the chemical liquid discharge unit.

However, since the direction in which the cleaning liquid flows in the cleaning process is performed only in the same one direction as the direction in which the chemical liquid flows in the chemical liquid discharging process, sufficient cleaning power to remove the sludge may not be provided.

Therefore, in the related art, there is a problem in that the sludge stagnant in the chemical solution supply unit and the chemical solution discharge unit cannot be sufficiently removed, and as a result, the chemical solution supply unit itself needs to be replaced or the chemical solution discharge unit itself needs to be washed separately.

SUMMARY OF THE INVENTION One object of the present invention is to provide a cleaning apparatus capable of providing sufficient cleaning power to a cleaning liquid when cleaning a chemical liquid discharging apparatus for discharging a chemical liquid.

Another object of the present invention is to provide a cleaning apparatus capable of providing sufficient cleaning power to a cleaning liquid when cleaning a chemical liquid ejecting apparatus including a slit nozzle for ejecting a photoresist or a developer.

Another object of the present invention is to provide a cleaning method capable of providing sufficient cleaning power to a cleaning liquid when cleaning a chemical liquid discharging device for discharging a chemical liquid.

A cleaning apparatus according to exemplary embodiments for achieving an object of the present invention cleans a chemical liquid discharge device comprising a chemical liquid discharge unit for discharging a chemical liquid onto a substrate, and a chemical liquid supply unit for supplying the chemical liquid to the chemical liquid discharge unit. a first path through which a cleaning liquid capable of cleaning the chemical liquid discharge unit and the chemical liquid supply unit flows from the outside to the chemical liquid supply unit through the chemical liquid discharge unit; When the second path is configured to flow to the outside through the discharge unit, the washing solution is sucked along the first path and the second path so that the washing solution can reciprocally flow between the first path and the second path and a flow unit provided to perform a pumping operation for discharging.

In exemplary embodiments, when further comprising a first connection line provided to connect between the chemical solution discharge unit and the chemical solution supply unit, the first path and the second path are the chemical solution discharge unit, the first connection It is provided by a line and the chemical solution supply unit, and suction and discharge of the cleaning solution in the flow unit may be performed by a pumping operation of the chemical solution supply unit.

In exemplary embodiments, the chemical solution supply unit for application to the flow unit includes a discharge pumping operation for discharging the cleaning solution to a discharge pumping operation function for supplying the chemical solution to the chemical solution discharge unit, and a suction pumping operation for sucking the cleaning solution It is provided to add a function, or is provided to have a structure in which a discharge pump performing a pumping operation for discharging the chemical solution or the cleaning solution and a suction pump performing a pumping operation for sucking the cleaning solution are provided together, or discharging the chemical solution It may be provided to have a structure in which a chemical liquid discharge pump for performing a pumping operation, a cleaning liquid discharge pump for performing a pumping operation for discharging the cleaning liquid, and a suction pump for performing a pumping operation for sucking the cleaning liquid are formed together.

In exemplary embodiments, further comprising a bath accommodating the cleaning liquid, the bath by performing a suction pumping operation using the flow portion in a state in which the discharge surface of the chemical liquid discharge portion is dipping into the cleaning liquid accommodated in the bath By performing a discharge pumping operation using the flow part so that the cleaning liquid accommodated in the flow unit flows along the first path, and the cleaning liquid flowing along the first path is discharged to the bath, the cleaning liquid is discharged into the second path. 2 to flow along a path.

In exemplary embodiments, a supply line for supplying the cleaning liquid to the bath is provided at an upper end of the bath, and a discharge line for discharging the cleaning liquid from the bath may be provided on a lower surface of one end of the bath. .

In example embodiments, the bottom surface of the bath may be provided to have an inclined structure that decreases from the other side of the bath toward one side where the discharge line is provided.

In exemplary embodiments, the chemical solution storage unit for storing the chemical solution in the chemical solution discharging device, and the chemical solution storage unit and the chemical solution supply unit can be connected so that the chemical solution can be supplied from the chemical solution storage unit to the chemical solution supply unit When further comprising a second connection line provided to be provided and a valve provided on the second connection line, the first path and the second path up to the second connection line provided between the chemical supply unit and the valve can be extended

In exemplary embodiments, a branch line branching from the second connection line between the chemical solution supply unit and the valve, and a cleaning solution supply unit provided to supply the cleaning solution to the chemical solution supply unit through the branch line; Further comprising a bath accommodating a chemical liquid discharge unit, wherein the cleaning liquid supplied through the branch line by performing a discharge pumping operation using the flow portion to flow the cleaning liquid along the second path is discharged into the bath and performing a suction pumping operation using the flow part to flow the cleaning solution along the first path, so that the cleaning solution discharged into the bath is sucked into the chemical solution supply unit.

In exemplary embodiments, a discharge line for discharging the cleaning liquid from the bath is provided on the bottom surface of one end of the bath, and the bottom surface of the bath is lowered from the other side of the bath toward one side on which the discharge line is provided. It may be provided to have an inclined structure.

In example embodiments, the control unit may further include a control unit for controlling each of the number of pumping operations for sucking the cleaning liquid in the flow unit and the number of pumping operations for discharging the cleaning liquid.

A cleaning apparatus according to exemplary embodiments for achieving another object of the present invention includes a slit nozzle for discharging a chemical solution including a photoresist or a developer on a substrate, and a pumping operation to supply the chemical solution to the slit nozzle A cleaning apparatus for cleaning a chemical liquid discharging device comprising a chemical liquid supply unit provided to perform When the first path is formed by a first path through which a cleaning solution that can be cleaned flows from the outside to the chemical solution supply unit through the slit nozzle, and a second path through which the cleaning solution flows from the chemical solution supply unit to the outside through the slit nozzle, the first path and the second path may be provided by the chemical solution discharge unit, the first connection line, and the chemical solution supply unit, and the cleaning solution may reciprocally flow between the first path and the second path. Suction and discharge of the cleaning solution in the first path and the second path may be performed by a pumping operation of the chemical solution supply unit.

In exemplary embodiments, the chemical solution supply unit for suction and discharge of the cleaning solution includes a discharge pumping operation for discharging the cleaning solution to a discharge pumping operation function for supplying the chemical solution to the chemical solution discharge unit, and suction for sucking the cleaning solution It is provided to add a pumping operation function, or is provided to have a structure in which a discharge pump performing a pumping operation for discharging the chemical solution or the cleaning solution and a suction pump performing a pumping operation for sucking the cleaning solution are provided together, or It may be provided to have a structure in which a chemical liquid discharge pump for performing a pumping operation to discharge, a cleaning liquid discharge pump for performing a pumping operation to discharge the cleaning liquid, and a suction pump for performing a pumping operation for sucking the cleaning liquid are formed together.

In exemplary embodiments, further comprising a bath accommodating the cleaning liquid, wherein a suction pumping operation using the chemical liquid supply unit is performed in a state in which the nozzle surface of the slit nozzle is dipped into the cleaning liquid accommodated in the bath. By performing a discharge pumping operation using the chemical solution supply unit so that the cleaning liquid accommodated in the bath flows along the first path, and the cleaning liquid flowing along the first path is discharged into the bath, the cleaning liquid is discharged to flow along the second path.

In exemplary embodiments, a supply line for supplying the cleaning liquid to the bath is provided at an upper end of the bath, and a discharge line for discharging the cleaning liquid from the bath is provided on a lower surface of one end of the bath, the The bottom of the bath may be provided to have an inclined structure that decreases from the other side of the bath toward one side at which the discharge line is provided.

In exemplary embodiments, the control unit may further include a control unit for controlling each of the number of pumping operations for sucking the cleaning liquid from the chemical supply unit and the number of pumping operations for discharging the cleaning liquid.

A cleaning method according to exemplary embodiments for achieving another object of the present invention cleans a chemical solution discharging device comprising a chemical solution discharging unit discharging a chemical solution onto a substrate and a chemical solution supplying unit supplying the chemical solution to the chemical solution discharging unit In order to do this, performing a suction pumping operation to flow a cleaning liquid capable of cleaning the chemical liquid discharge unit and the chemical liquid supply unit from the outside through the chemical liquid discharge unit to a first path passing through the chemical liquid supply unit, and discharge pumping operation and flowing the cleaning solution from the chemical solution supply unit to a second path passing through the outside through the chemical solution discharge unit, and the washing solution will flow reciprocally along the first path and the second path. It is possible to alternately perform the suction pumping operation and the discharge pumping operation.

In exemplary embodiments, when the cleaning liquid from the outside consists of the cleaning liquid accommodated in the bath, the suction pumping operation is performed in a state in which the discharge surface of the chemical liquid discharge unit is dipping into the cleaning liquid accommodated in the bath. The cleaning liquid is discharged along the second path by performing the discharge pumping operation so that the cleaning liquid accommodated in the apparatus flows along the first path, and the cleaning liquid flowing along the first path is discharged into the bath can be made to flow.

In exemplary embodiments, a second connection provided to connect between the chemical solution storage unit and the chemical solution supply unit so that the chemical solution discharging device supplies the chemical solution from the chemical solution storage unit for storing the chemical solution to the chemical solution supply unit A line, a valve provided in the second connection line, a branch line branching from the second connection line between the chemical liquid supply unit and the valve, and a branch line provided to supply the cleaning liquid to the chemical liquid supply unit through the branch line When the cleaning liquid supply unit further includes a bath accommodating the cleaning liquid supply unit and the chemical liquid discharge unit, the cleaning liquid supplied through the branch line is supplied through the branch line by performing the discharge pumping operation to flow the cleaning liquid along the second path. The cleaning liquid discharged into the bath may be sucked into the chemical liquid supply unit by flowing the cleaning liquid along the first path by performing the suction pumping operation.

In example embodiments, the valve may be closed when the cleaning liquid is supplied through the branch line.

In example embodiments, the method may further include controlling each of the number of pumping operations for sucking the cleaning liquid and the number of pumping operations for discharging the cleaning liquid.

In the cleaning apparatus and cleaning method according to exemplary embodiments of the present invention, since the cleaning liquid can reciprocally flow between the chemical liquid supply unit and the chemical liquid discharge unit by alternately suctioning and discharging the cleaning liquid, the cleaning liquid during cleaning of the chemical liquid discharging device It will be able to provide sufficient cleaning power.

Accordingly, the cleaning apparatus and cleaning method according to exemplary embodiments of the present invention may sufficiently remove sludge from the chemical liquid discharge unit and the chemical liquid supply unit by providing sufficient cleaning power to the cleaning liquid.

Therefore, since the cleaning apparatus and the cleaning method according to exemplary embodiments of the present invention can sufficiently remove sludge from the chemical solution discharge unit and the chemical solution supply unit, an advantage that the chemical solution discharge unit does not need to be separately cleaned can be expected, and the sludge An advantage of reducing the number of replacements of the chemical supply unit can be expected due to the residual of

In addition, since the cleaning apparatus and cleaning method according to the exemplary embodiments of the present invention can sufficiently remove sludge, it is also possible to minimize a device defect of the chemical liquid discharge apparatus itself due to the residual sludge, and the chemical liquid discharge process It will also be possible to minimize process defects that occur during implementation.

However, the effects of the present invention are not limited to the above-mentioned effects, and may be variously expanded without departing from the spirit and scope of the present invention.

1 is a schematic diagram for explaining a chemical discharging apparatus to which a cleaning apparatus according to exemplary embodiments of the present invention is applied.
FIG. 2 is a schematic diagram for explaining a chemical liquid discharging unit provided in the chemical liquid discharging device of FIG. 1 .
3 is a schematic diagram for explaining a cleaning apparatus according to exemplary embodiments of the present invention.
4 is a schematic diagram for explaining a cleaning apparatus according to exemplary embodiments of the present invention.
FIG. 5 is a schematic view for explaining an example of a bath provided in the cleaning apparatus of FIG. 4 .
FIG. 6 is a schematic view for explaining another example of a bath provided in the cleaning apparatus of FIG. 4 .
7 is a schematic diagram for explaining a cleaning apparatus according to exemplary embodiments of the present invention.

Since the present invention may have various changes and may have various forms, embodiments will be described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents and substitutes included in the spirit and scope of the present invention. In describing each figure, like reference numerals have been used for like elements. Terms such as first, second, etc. may be used to describe various elements, but the elements should not be limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. The terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. The singular expression includes the plural expression unless the context clearly dictates otherwise. In the present application, terms such as "comprises" or "consisting of" are intended to designate that a feature, number, step, operation, component, part, or combination thereof described in the specification exists, but one or more other features It is to be understood that this does not preclude the possibility of addition or existence of numbers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the related art, and should not be interpreted in an ideal or excessively formal meaning unless explicitly defined in the present application. does not

Hereinafter, preferred embodiments of the present invention will be described in more detail with reference to the accompanying drawings. The same reference numerals are used for the same components in the drawings, and duplicate descriptions of the same components are omitted.

1 is a schematic diagram for explaining a chemical liquid discharging apparatus to which a cleaning apparatus according to exemplary embodiments of the present invention is applied.

Referring to FIG. 1 , in the chemical liquid discharging apparatus 100 to which the cleaning apparatus according to the exemplary embodiments of the present invention is applied, a chemical liquid such as a photoresist or a developer is applied to a substrate 10 when a display element such as an organic EL element is manufactured. can be used to discharge

The aforementioned chemical discharging device 100 may include a chemical discharging unit 11 for discharging a chemical to the substrate 10 and a chemical supplying unit 13 for supplying a chemical to the chemical discharging unit 11, and a chemical discharging unit ( 11) and the chemical solution supply unit 13 may be connected by a connection line 15 (hereinafter, referred to as a 'first connection line').

In addition, although not shown, the chemical discharging apparatus 100 may further include a conveying unit for supporting and conveying the substrate 10 when discharging the chemical. It may consist of stages and the like.

FIG. 2 is a schematic diagram for explaining a chemical liquid discharging unit provided in the chemical liquid discharging device of FIG. 1 .

Referring to FIG. 2 , since the chemical discharge unit 11 discharges a chemical solution such as a photoresist or a developer, it may be a slit nozzle having a discharge surface 21 such as a nozzle lip in a portion facing the substrate 10 .

Although not shown, the discharge surface 21 such as the nozzle lip may be provided to have a structure connected to the flow path provided in the chemical solution discharge unit 11 , and the aforementioned flow path supplies the chemical solution from the first connection line 15 . may be provided to receive.

Referring back to FIG. 1 , the chemical solution supply unit 13 may be a pump that performs a pumping operation to supply the chemical solution to the chemical solution discharge unit 11 .

However, since the chemical solution supply unit 13 in the chemical solution discharge device 100 only needs to supply the chemical solution to the chemical solution discharge unit 11, it may consist of only a discharge pump, etc. Since the cleaning liquid must be sucked from the chemical liquid discharge unit 11 and the cleaning liquid must be discharged to the chemical liquid discharge unit 11, a suction pump for suctioning the cleaning liquid and a discharge pump for discharging the cleaning liquid will have to be made together.

The chemical solution discharging device 100 may include a chemical solution storage unit 17 for storing the chemical solution, and the chemical solution supply unit 13 receives the chemical solution from the chemical solution storage unit 17 and continues to the chemical solution discharge unit 11 . can be supplied with the drug.

And between the chemical solution storage unit 17 and the chemical solution supply unit 13 may also be connected by a connection line 19 (hereinafter, referred to as a 'second connection line').

Therefore, the aforementioned chemical solution discharging device 100 supplies a chemical solution from the chemical solution storage unit 17 to the chemical solution discharge unit 11 through the chemical solution supply unit 13 and discharges the chemical solution to the substrate 10 transferred by the conveying unit. A chemical liquid discharging process may be performed.

If the chemical solution discharging device 100 is continuously used, sludge may be generated due to the chemical solution such as photoresist and developer. have.

Hereinafter, a cleaning device for cleaning the chemical liquid discharging device will be described.

3 is a schematic diagram for explaining a cleaning apparatus according to exemplary embodiments of the present invention.

Referring to FIG. 3 , the cleaning apparatus 300 according to exemplary embodiments of the present invention cleans the chemical solution discharging unit 11 and the chemical solution supplying unit 13 with the chemical solution supply unit 13 and the chemical solution discharge unit 11 . It may include a flow part 31 that is provided to allow the cleaning liquid to flow.

In particular, the flow unit 31 may be provided to reciprocately flow between the chemical solution supply unit 13 and the chemical solution discharge unit 11 .

Therefore, the flow unit 31 may be provided to perform a pumping operation for sucking and discharging the cleaning solution between the chemical solution supply unit 13 and the chemical solution discharge unit 11 .

The suction of the cleaning liquid by the aforementioned flow part 31 may be made along a first path that flows from the outside to the chemical liquid supply part 13 through the chemical liquid discharge part 11 , and the cleaning liquid by the aforementioned flow part 31 . The discharge may be made along a second path that flows from the chemical solution supply unit 13 to the chemical solution discharge unit 11 .

The first path is a path through which the cleaning solution flows in the order of the chemical solution discharge unit 11, the first connection line 15, and the chemical solution supply unit 13, and the second path is a path through which the cleaning solution opposite to the first path flows through the chemical solution supply unit ( 13), the first connection line 15 , and the chemical liquid discharge unit 11 are sequentially flowed.

Accordingly, in the cleaning apparatus 300 according to exemplary embodiments of the present invention, the cleaning liquid is removed by performing a pumping operation for sucking and discharging the cleaning liquid along the first and second paths using the flow unit 31 . Flowing back and forth between the first path and the second path may be performed.

In addition, the flow unit 31 according to the exemplary embodiments of the present invention sucks the cleaning solution from the chemical solution discharge unit 11 and discharges the cleaning solution to the chemical solution discharge unit 11. It may be provided to add a suction pumping operation function for sucking the cleaning liquid to the discharge pumping operation function for supplying the chemical solution.

The aforementioned flow unit 31 discharges the cleaning solution to the chemical solution supply unit 13 that discharges and supplies the chemical solution to the existing chemical solution discharge unit 11. It can be achieved by adding a suction pumping operation function for sucking the cleaning solution. This can be achieved by having a mixing pump member capable of both a suction pumping function and an exhaust pumping function.

On the other hand, the flow unit 31 according to exemplary embodiments of the present invention includes a discharge pump that performs a pumping operation for discharging a chemical or cleaning solution, and a suction pump that performs a pumping operation for sucking the cleaning solution. It may be provided to have.

The aforementioned flow unit 31 uses the existing chemical solution supply unit 13 to perform a pumping operation for discharging the chemical solution or cleaning solution, as well as adding a suction pump that performs a pumping operation for sucking the cleaning solution. have.

In addition, the flow unit 31 according to the exemplary embodiments of the present invention includes a cleaning liquid discharge pump that performs a pumping operation to discharge the cleaning liquid in addition to the existing chemical liquid supply unit 13, and a suction that performs a pumping operation for sucking the cleaning liquid It can be achieved by providing the pump to have a structure made together.

In this case, the cleaning liquid discharge pump and the suction pump may be formed of the aforementioned mixing pump member, or the cleaning liquid discharge pump and the suction pump may be provided respectively.

And the flow unit 31 according to exemplary embodiments of the present invention may be provided to be disposed at the same place as the chemical solution supply unit 13 is disposed.

In addition, in the flow part 31 according to exemplary embodiments of the present invention, as mentioned above, since the cleaning solution can achieve suction and discharge by adding its function to the existing chemical solution supply part 13, hereinafter, the flow part 31 and the chemical solution supply unit 13 will be described as the same member.

The aforementioned chemical solution discharging device 100 includes a chemical storage unit 17 for storing a chemical solution, and a chemical solution storage unit 17 and a chemical solution supply unit 13 to supply a chemical solution from the chemical solution storage unit 17 to the chemical solution supply unit 13 . ) may further include a second connection line 19 provided to connect between, and a valve 33 provided on the second connection line 19 .

Accordingly, the first path and the second path applied to the cleaning apparatus 300 in the present invention may extend to the second connection line 19 provided between the chemical solution supply unit 13 and the valve 33 .

That is, in the cleaning apparatus 300 according to exemplary embodiments of the present invention, the chemical solution discharge unit 11 , the first connection line 15 , the chemical solution supply unit 13 , and the second connection before the valve 33 . The cleaning liquid is sucked up to the line 19 and the cleaning liquid is drawn from the second connection line 19 before the valve 33 to the outside through the chemical solution supply part 13 , the first connection line 15 and the chemical solution discharge part 11 . It may be provided to discharge.

In addition, the cleaning apparatus 300 according to the exemplary embodiments of the present invention controls each of the number of pumping operations for sucking the cleaning liquid from the flow unit 31 or the chemical supply unit 13 and the number of pumping operations for discharging the cleaning liquid. A control unit 35 may be further included.

Accordingly, the control unit 35 may be used to control the number of suction pumping operations and the number of discharge pumping operations to be different, respectively, according to the conditions of the cleaning process.

For example, one suction pumping action and one discharge pumping action are controlled to be repeated 10 times as a set, or two suction pumping actions and two discharge pumping actions are controlled to be repeated 10 times as a set, or Two suction pumping operations and one discharge pumping operation may be controlled to be repeated 10 times as a set, or one suction pumping operation and two discharge pumping operations may be controlled to be repeated 10 times as a set.

That is, the cleaning apparatus 300 according to the exemplary embodiments of the present invention sets the cleaning process conditions in accordance with the optimum conditions by controlling the number of suction pumping operations and the number of discharge pumping operations to be different, respectively, using the control unit 35 . can

As described above, in the cleaning apparatus 300 according to the exemplary embodiments of the present invention, since the cleaning liquid can reciprocate between the chemical liquid supply unit 13 and the chemical liquid discharge unit 11 of the chemical liquid discharge device 100 , the cleaning liquid can reciprocate. When the cleaning process for the discharge device 100 is performed, sufficient cleaning power may be provided to the cleaning liquid.

Therefore, the cleaning apparatus 300 according to exemplary embodiments of the present invention may sufficiently remove sludge from the chemical liquid discharge unit 11 and the chemical liquid supply unit 13 by providing sufficient cleaning power to the cleaning liquid.

In addition, since the cleaning apparatus 300 according to the exemplary embodiments of the present invention can use the chemical liquid supply unit 13 provided in the existing chemical liquid discharging apparatus 100 for suction and discharge of the cleaning liquid, the device configuration is more could be simplified.

Hereinafter, a cleaning apparatus according to exemplary embodiments of the present invention will be described in more detail.

4 is a schematic diagram for explaining a cleaning apparatus according to exemplary embodiments of the present invention.

Referring to FIG. 4 , the cleaning apparatus 300 according to exemplary embodiments of the present invention may further include a bath 41 accommodating a cleaning liquid for cleaning the chemical liquid discharge unit 11 and the chemical liquid supply unit 13 . can

FIG. 5 is a schematic diagram for explaining an example of a bath provided in the cleaning apparatus of FIG. 4 , and FIG. 6 is a schematic diagram for explaining another example of a bath provided in the cleaning apparatus of FIG. 4 .

First, referring to FIG. 5 , the bath 41 in the cleaning apparatus 300 according to exemplary embodiments of the present invention is provided to not only accommodate the cleaning liquid but also to have a size in which the chemical liquid discharge unit 11 is accommodated. It can be, and it can be provided to have a structure in which the inlet is open because the chemical liquid discharge unit 11 must be accommodated.

In addition, a discharge line 51 for discharging the cleaning liquid may be further provided on the bottom surface of one end of the aforementioned bath 41 .

The aforementioned discharge line 51 may be provided to discharge the cleaning liquid as well as the sludge removed through the cleaning process.

In addition, the discharge line 51 may be provided with a valve 53 capable of performing an opening/closing operation for discharging the cleaning liquid from the bath 41 .

Although not shown, a supply line capable of supplying a cleaning solution to the bath 41 may be provided at the upper end of the bath 41 .

The aforementioned supply line may be provided to supply the cleaning liquid for the first time in performing the cleaning process, and may be provided to supply the cleaning liquid when the cleaning liquid is discharged through the discharge line 51 .

And referring to FIG. 6 , the bottom surface of the bath 41 in the cleaning apparatus 300 according to exemplary embodiments of the present invention is lowered from the other side of the bath 41 to one side on which the discharge line 51 is provided. It may be provided to have an inclined structure 61 .

That is, the bottom surface of the bath 41 is high so that the other side is high and the discharge line 51 is provided so that when the slurry removed by the cleaning process is discharged toward the bath 41, the other side is high so as to flow down to the side where the discharge line 51 is provided. It can be provided to have this low inclination structure (61).

Referring back to FIG. 4 , in the cleaning apparatus 300 according to exemplary embodiments of the present invention, in a state in which the discharge surface 21 of the chemical discharge unit 11 is dipped in the cleaning liquid accommodated in the bath 41 , the flow unit 31 or by performing a suction pumping operation using the chemical solution supply unit 13, the cleaning solution accommodated in the bath 41 may flow along the first path, and the cleaning solution flowing along the first path may flow through the bath ( 41), the cleaning liquid may flow along the second path by performing a discharge pumping operation using the flow unit 31 or the chemical liquid supply unit 13 to be discharged.

Therefore, in the cleaning process using the cleaning apparatus 300 according to the exemplary embodiments of the present invention, the discharge surface 21 of the chemical liquid discharge unit 11 is dipping the bath 41 into the supplied cleaning liquid, and then the suction is performed. Through the pumping operation, the cleaning liquid in the bath 41 is discharged to the chemical solution discharge unit 11, the first connection line 15, and the chemical solution supply unit 13 and further to the second connection line 19 before the valve 33. It can flow to be suctioned along 1 path, and through the discharge pumping operation, the second connection line 19 before the valve 33 , the chemical solution supply unit 13 , the first connection line 15 , and the chemical solution discharge unit 11 ) to be discharged to the bath 41 along the second path.

And in the cleaning process using the cleaning apparatus 300 according to the exemplary embodiments of the present invention, the cleaning liquid is first The flow may be made to flow back and forth between the path and the second path.

However, when performing the cleaning process using the cleaning apparatus 300 according to the exemplary embodiments of the present invention, the cleaning liquid should not remain in the chemical liquid discharging device 100. Therefore, when suction and discharge of the cleaning liquid are alternately performed, the cleaning liquid It should be ensured that the discharge of

In this way, the cleaning apparatus 300 according to the exemplary embodiments of the present invention has a configuration in which the cleaning liquid is supplied from the outside by providing the bath 41 and the cleaning liquid being suctioned is discharged back to the bath 41. have.

In the cleaning apparatus 300 according to exemplary embodiments of the present invention having the aforementioned bath 41 , the cleaning liquid reciprocates between the chemical liquid supply unit 13 and the chemical liquid discharge unit 11 of the chemical liquid discharge device 100 . Because it can flow, sufficient cleaning power can be provided to the cleaning liquid when the cleaning process for the chemical liquid discharge device 100 is performed, and as a result, the sludge from the chemical liquid discharge unit 11 and the chemical liquid supply unit 13 can be sufficiently removed. will be able

7 is a schematic diagram for explaining a cleaning apparatus according to exemplary embodiments of the present invention.

Referring to FIG. 7 , the cleaning apparatus 300 according to exemplary embodiments of the present invention includes a branch line 37 branched from the second connection line 19 between the chemical solution supply unit 13 and the valve 33 , and , may further include a cleaning solution supply unit 39 provided to supply the cleaning solution to the chemical solution supply unit 13 through the branch line 37 , and a bath 41 accommodating the chemical solution discharge unit 11 .

However, when the cleaning liquid from the outside is supplied by the cleaning liquid supply unit 39 , the cleaning liquid may not be separately supplied to the bath 41 from the outside.

And the aforementioned bath 41 may be provided to have a structure in which the discharge line 51 and the bottom surface are inclined as in FIGS. 4 to 6 except for the supply line for supplying the cleaning liquid from the outside.

Accordingly, in performing the cleaning process using the cleaning apparatus 300 according to the exemplary embodiments of the present invention, the discharge pumping operation using the flow unit 31 or the chemical liquid supply unit 13 is performed to follow the second path. By flowing the cleaning liquid, the cleaning liquid supplied through the branch line 37 can be discharged to the bath 41, and a suction pumping operation using the flow part 31 or the chemical liquid supply part 13 is performed to remove By flowing the cleaning liquid along one path, the cleaning liquid discharged to the bath 41 may be sucked into the chemical liquid supply unit 13 and further to the second line before the valve 33 .

Similarly, in the cleaning process using the cleaning apparatus 300 according to the exemplary embodiments of the present invention, the cleaning liquid is produced by alternately performing suction of the cleaning liquid in the first path and discharge of the cleaning liquid in the second path. It is possible to flow reciprocally between the first path and the second path, and since the cleaning liquid must not remain in the chemical liquid discharging device 100, when the cleaning liquid suction and discharge are alternately performed, the cleaning liquid must be discharged last something to do.

As described above, the cleaning apparatus 300 according to exemplary embodiments of the present invention includes a branch line 37 , a cleaning liquid supply unit 39 , and a bath 41 to supply a cleaning liquid from the outside to the bath 41 . It may have a configuration in which the washing liquid discharged to the bath 41 is sucked while discharging, and then discharged back to the bath 41 .

However, when the cleaning liquid is supplied through the cleaning liquid supply unit 39 and discharged into the bath 41 and the cleaning liquid discharged into the bath 41 is sucked and discharged back to the bath 41, the second connection line 19 ) will have to be controlled so that the valve 33 provided in the closed.

The cleaning device 300 according to exemplary embodiments of the present invention having the aforementioned cleaning solution supply unit 39, branch line 37, and bath 41, and also the chemical solution supply unit 13 of the chemical solution discharging device 100, and Since the cleaning liquid can reciprocally flow between the chemical liquid discharge units 11 , sufficient cleaning power can be provided to the cleaning liquid when the cleaning process is performed on the chemical liquid discharge device 100 , and as a result, the chemical liquid discharge unit 11 and the chemical liquid It will be possible to sufficiently remove the sludge from the supply unit 13 .

The slit nozzle cleaning method according to the exemplary embodiments may be applied to manufacturing a display device such as a liquid crystal display device or an organic EL device.

Although the above has been described with reference to the preferred embodiments of the present invention, those skilled in the art can variously modify and change the present invention within the scope without departing from the spirit and scope of the present invention as set forth in the following claims. You will understand that you can.

10: substrate 11: chemical liquid discharge part
13: chemical supply unit 15: first connection line
17: chemical storage unit 19: second connection line
21: discharge surface 31: flow part
33: valve 35: control unit
37: branch line 39: cleaning solution supply unit
41 bath 51 discharge line
100: chemical liquid discharging device 300: cleaning device

Claims (20)

Doedoe provided so as to be able to clean the chemical solution discharging device comprising a chemical solution discharging unit for discharging the chemical solution onto the substrate and a chemical solution supply unit for supplying the chemical solution to the chemical solution discharging unit,
a first path through which a cleaning solution capable of cleaning the chemical solution discharging unit and the chemical solution supply unit flows from the outside to the chemical solution supply unit through the chemical solution discharging unit, and the cleaning solution flows from the chemical solution supply unit to the outside through the chemical solution discharging unit performing a pumping operation for sucking and discharging the cleaning liquid along the first and second paths so that the cleaning liquid can reciprocately flow between the first and second paths when the second path is formed. A cleaning apparatus comprising a flow part provided to do so. According to claim 1,
When further comprising a first connection line provided to connect between the chemical solution discharging unit and the chemical solution supply unit, the first path and the second path are connected by the chemical solution discharging unit, the first connection line, and the chemical solution supply unit provided,
Suction and discharge of the cleaning liquid from the flow part is a cleaning apparatus, characterized in that performed by the pumping operation of the chemical supply part. 3. The method of claim 2,
The chemical solution supply unit for application to the flow unit is provided to add a discharge pumping operation for discharging the cleaning liquid, and a suction pumping operation for sucking the cleaning liquid to the discharge pumping operation for supplying the chemical liquid to the chemical liquid discharge unit, or the A discharge pump for performing a pumping operation for discharging the chemical or the cleaning liquid and a suction pump for performing a pumping operation for suctioning the cleaning liquid are provided to have a structure together, or a chemical discharge pump for performing a pumping operation for discharging the chemical , a cleaning liquid discharge pump for performing a pumping operation for discharging the cleaning liquid, and a suction pump for performing a pumping operation for sucking the cleaning liquid. According to claim 1,
Further comprising a bath accommodating the cleaning solution,
The cleaning liquid accommodated in the bath flows along the first path by performing a suction pumping operation using the flow unit in a state in which the discharge surface of the chemical liquid discharge unit is dipped into the washing liquid accommodated in the bath, and the first path The cleaning apparatus according to claim 1, wherein the cleaning liquid flows along the second path by performing a discharge pumping operation using the flow part so that the cleaning liquid flowing along the flow can be discharged into the bath. 5. The method of claim 4,
A supply line for supplying the cleaning liquid to the bath is provided at an upper end of the bath, and a discharge line for discharging the cleaning liquid from the bath is provided on a lower surface of one end of the bath. 6. The method of claim 5,
The bottom surface of the bath is a cleaning apparatus, characterized in that it is provided to have an inclined structure that decreases from the other side of the bath toward one side where the discharge line is provided. According to claim 1,
A second connection line provided to connect between the chemical solution storage unit and the chemical solution supply unit so that the chemical solution discharging device stores the chemical solution and supply the chemical solution from the chemical solution storage unit to the chemical solution supply unit; , When further comprising a valve provided in the second connection line,
The first path and the second path extend to the second connection line provided between the chemical solution supply unit and the valve. 8. The method of claim 7,
A branch line branching from the second connection line between the chemical solution supply unit and the valve, a cleaning solution supply unit configured to supply the cleaning solution to the chemical solution supply unit through the branch line, and a bath accommodating the chemical solution discharge unit including,
The cleaning liquid supplied through the branch line is discharged to the bath by flowing the cleaning liquid along the second path by performing a discharge pumping operation using the flow part, and a suction pumping operation using the flow part The cleaning apparatus according to claim 1, wherein the cleaning liquid discharged into the bath is sucked into the chemical liquid supply unit by flowing the cleaning liquid along the first path. 9. The method of claim 8,
A discharge line for discharging the cleaning liquid from the bath is provided on the bottom surface of one end of the bath, and the bottom surface of the bath is provided to have an inclined structure that is lowered from the other side of the bath toward one side where the discharge line is provided. cleaning device with According to claim 1,
The cleaning apparatus further comprising: a control unit for controlling each of the number of pumping operations for sucking the cleaning liquid from the flow unit and the number of pumping operations for discharging the cleaning liquid. A slit nozzle for discharging a chemical solution including a photoresist or a developer onto a substrate; A cleaning device for cleaning a chemical liquid discharging device including a first connection line provided to
a first path through which the cleaning liquid capable of cleaning the slit nozzle and the chemical liquid supply unit flows from the outside to the chemical liquid supply unit through the slit nozzle, and the cleaning liquid flows from the chemical liquid supply unit to the outside through the slit nozzle When configured as a second path, the first path and the second path are provided by the chemical solution discharge unit, the first connection line, and the chemical solution supply unit,
Suction and discharge of the cleaning solution in the first path and the second path are performed by a pumping operation of the chemical solution supply unit so that the washing solution can flow reciprocally between the first path and the second path cleaning device with 12. The method of claim 11,
The chemical liquid supply unit for suction and discharge of the cleaning liquid is provided to add a discharge pumping operation for discharging the cleaning liquid, and a suction pumping operation for sucking the cleaning liquid to the discharge pumping operation function for supplying the chemical liquid to the chemical liquid discharge unit, or , a discharge pump for performing a pumping operation for discharging the chemical or the cleaning liquid and a suction pump for performing a pumping operation for sucking the cleaning liquid are provided to have a structure together, or a chemical solution for performing a pumping operation for discharging the chemical A cleaning apparatus, characterized in that it is provided to have a structure in which a discharge pump, a cleaning liquid discharge pump performing a pumping operation for discharging the cleaning liquid, and a suction pump performing a pumping operation for sucking the cleaning liquid are formed together. 12. The method of claim 11,
Further comprising a bath accommodating the cleaning solution,
The cleaning liquid accommodated in the bath flows along the first path by performing a suction pumping operation using the chemical liquid supply unit in a state in which the nozzle surface of the slit nozzle is dipped into the cleaning liquid accommodated in the bath, and the first path The cleaning apparatus according to claim 1, wherein the cleaning liquid flows along the second path by performing a discharge pumping operation using the chemical solution supply unit so that the cleaning liquid flowing along the path is discharged to the bath. 13. The method of claim 12,
A supply line for supplying the cleaning liquid to the bath is provided at an upper end of the bath, and a discharge line for discharging the cleaning liquid from the bath is provided on a bottom surface of one end of the bath, and the bottom surface of the bath is the other side of the bath A cleaning apparatus, characterized in that it is provided to have an inclined structure that is lowered toward one side where the discharge line is provided. 12. The method of claim 11,
The cleaning apparatus further comprising: a control unit for controlling each of the number of pumping operations for sucking the cleaning liquid from the chemical supply unit and the number of pumping operations for discharging the cleaning liquid. A cleaning method for cleaning a chemical solution discharging device comprising: a chemical solution discharging unit discharging a chemical solution onto a substrate; and a chemical solution supply unit supplying the chemical solution to the chemical solution discharging unit, the cleaning method comprising:
performing a suction pumping operation to flow a cleaning solution capable of cleaning the chemical solution discharging unit and the chemical solution supplying unit from the outside through the chemical solution discharging unit to a first path passing through the chemical solution supply unit; and
performing a discharge pumping operation to flow the cleaning solution from the chemical solution supply unit through the chemical solution discharge unit to a second path passing through the outside;
and alternately performing the suction pumping operation and the discharge pumping operation so that the cleaning liquid reciprocates along the first path and the second path. 17. The method of claim 16,
When the cleaning liquid from the outside consists of a cleaning liquid accommodated in the bath, by performing the suction pumping operation in a state in which the discharge surface of the chemical liquid discharge unit is dipped into the cleaning liquid accommodated in the bath, the cleaning liquid accommodated in the bath is the first cleaning characterized in that the cleaning liquid flows along the second path by performing the discharge pumping operation to flow along a path and to discharge the cleaning liquid flowing along the first path to the bath Way. 17. The method of claim 16,
A second connection line provided to connect the chemical solution storage unit and the chemical solution supply unit so that the chemical solution discharging device can supply the chemical solution from the chemical solution storage unit storing the chemical solution to the chemical solution supply unit, and the second connection line a valve provided in the , a branch line branching from the second connection line between the chemical solution supply unit and the valve, and a cleaning solution supply unit provided to supply the cleaning solution to the chemical solution supply unit through the branch line; When further comprising a bath accommodating wealth,
performing the discharge pumping operation to flow the cleaning liquid along the second path so that the cleaning liquid supplied through the branch line is discharged into the bath, and performing the suction pumping operation to flow the cleaning liquid along the first path The cleaning method according to claim 1, wherein the cleaning liquid discharged into the bath is sucked into the chemical liquid supply unit by flowing the cleaning liquid. 19. The method of claim 18,
The cleaning method according to claim 1, wherein the valve is closed when the cleaning liquid is supplied through the branch line. 17. The method of claim 16,
The cleaning method further comprising the step of controlling each of the number of pumping operations for sucking the cleaning liquid and the number of pumping operations for discharging the cleaning liquid.

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