KR20210153298A - Capsule type chemical solution supply apparatus and chemical solution supply method using the same - Google Patents

Abstract

A chemical solution supply apparatus includes: a plurality of capsule-type cartridges, each of which has a cartridge nozzle for storing only a single supply amount of a chemical solution as an object to which the chemical solution is to be supplied; and a nozzle arm part having an arm and a plurality of arm nozzles coupled to the arm for moving the plurality of cartridges to the object. One among the plurality of cartridges is combined with a corresponding one among the plurality of arm nozzles, so that the cartridge nozzle and the arm nozzle constitute a nozzle. The single supply amount of the chemical solution stored in the cartridge is emitted to the object through the nozzle.

Description

Cartridge type chemical solution supply apparatus and chemical solution supply method using the same

The present invention relates to a chemical solution supply device, and more particularly, to a cartridge-type chemical solution supply device and a chemical solution supply method using the same.

A semiconductor device is manufactured by performing a plurality of unit processes such as a deposition process of depositing a thin film on a semiconductor wafer, a photo and etching process for patterning the deposited thin film, and a cleaning process for removing particles and process by-products. During the photolithography and etching process, a photosensitive agent application and development process, a wet etching process using an etchant, and a spray cleaning process during the cleaning process are performed by supplying a certain amount of a chemical solution onto the semiconductor wafer.

In general, a semiconductor device for forming a photoresist pattern on a wafer includes a coating device for applying a photoresist solution on the wafer to form a photoresist film, and a photoresist film on the wafer to form a photoresist pattern after exposure. A developing device for applying a developer, which is a chemical solution, is provided.

Such a semiconductor device includes a chemical solution supply device for supplying a photoresist solution or a developer solution, and a conventional chemical solution processing device 10 is shown in FIG. 1 .

Referring to FIG. 1, the conventional chemical supplying device 10 includes a chemical container 11 containing a chemical solution CL, a pump 12 for discharging a chemical solution CL accommodated in the chemical solution container 11, the pump ( A filter 13 connected to 12) for filtering the chemical solution discharged from the pump 12, and spraying for supplying the chemical solution CL filtered through the filter 13 to the surface of the wafers (W, 21) and a spraying section having a nozzle (14). The conventional chemical solution supply device 10 is provided with a plurality of valves 15, 16, 17 arranged in the chemical solution supply line 18 to supply or block the chemical solution.

The chemical liquid in the chemical liquid container 11 is supplied to the injection unit through the chemical liquid supply line 18 through the pump 12 and the filter 13 according to the opening and closing of the valve 15-17. The spray unit sprays the chemical liquid CL onto the surface of the wafer 21 in the process chamber 20 through the spray nozzle 14 . The wafer 21 is seated on the wafer support 22 in the chamber 20 and is rotated by the rotation shaft 23 during the chemical application process.

The conventional chemical solution supplying device 10 shown in FIG. 1 exemplifies only supplying one type of chemical solution, and individual nozzles and pipes must be used according to the type of chemical solution. Therefore, as the types of chemical solutions increase, the piping becomes very complicated, the price increases due to expensive parts, and the size of the device increases.

That is, the conventional chemical solution supply device 10 includes a pump 12 , a filter 13 , a chemical solution supply line 18 , and a valve 15-17 , and thus uses many fittings of pipes. . Accordingly, leakage of the chemical occurs, and this leakage acts as a contamination source of the device, resulting in generation of particles.

In addition, the method of supplying a large-capacity chemical solution using a bottle or canister has a high probability of chemical deterioration and contamination. may cause deterioration. In addition, due to the use of many parts, there is a problem in that the defective rate increases according to the aging of the parts, and the operation rate is lowered due to an increase in the defective action time. Accordingly, there has been a demand for a chemical solution supply system capable of supplying a variety of chemical solutions with a small capacity.

An object of the present invention is to provide a cartridge-type chemical solution supplying device capable of supplying a predetermined amount of a chemical solution by simplifying the structure without the use of expensive parts, and a chemical solution supply method using the same.

It is an object of the present invention to provide a cartridge-type chemical solution supplying device capable of simply supplying a variety of chemical solutions with a small capacity, which can prevent deterioration and contamination of a chemical solution, and a method for supplying a chemical solution using the same.

A drug supply apparatus of the present invention for achieving the above object includes: a plurality of capsule-type cartridges, each having a cartridge nozzle, for storing only a single supply amount of a drug solution as an object to which the drug solution is to be supplied; and a nozzle arm having an arm and a plurality of female nozzles coupled to the arm for moving the plurality of cartridges to the object. One cartridge among the plurality of cartridges is combined with a corresponding one female nozzle among the plurality of female nozzles, so that the cartridge nozzle and the female nozzle constitute one nozzle, and the chemical liquid for one supply stored in the cartridge is stored in the nozzle. It can be emitted to the object through the.

The nozzle may include a vacuum region for maintaining a vacuum state when the cartridge and the female nozzle are coupled; and a chemical solution discharge volume region that is located below the vacuum region to store and discharge the chemical solution. The nozzle may be configured such that the cartridge is adsorbed and coupled to the female nozzle when the vacuum is turned on, and the cartridge is separated from the female nozzle when the vacuum is turned off.

The female nozzle may include: a vacuum line having a vacuum hole therein for maintaining the vacuum region in a vacuum state; and a vacuum and N2 line for discharging the chemical solution of the one-time supply contained in the cartridge or filling the cartridge with the chemical solution for the single supply. the cartridge further includes a nozzle tip at the tip of the cartridge nozzle; When the vacuum of the chemical discharge volume area is turned on, the chemical solution for the one-time supply is supplied and stored in the cartridge through the nozzle tip, and when the vacuum of the chemical solution discharge volume area is turned off, the chemical solution passes through the nozzle tip. It is possible to release the drug solution of the one-time supply stored in the cartridge to the object.

The female nozzle may further include a plurality of O-rings for maintaining a vacuum state in the vacuum region, thereby preventing the cartridge from being separated from the female nozzle.

The medicament supply device may further include a cartridge bath in which the plurality of cartridges are mounted. Each of the plurality of cartridges may be a cartridge provided with the drug solution in the one-time supply amount filled by the manufacturer. When the chemical liquid stored in the cartridge is discharged to the object, the cartridge may be separated from the female nozzle and disposed of.

The medicament supply device further includes a cartridge bath accommodating the plurality of cartridges and a plurality of spare cartridges for replacing damaged cartridges among the plurality of cartridges, wherein the cartridge bath includes the one cartridge among the plurality of cartridges. The plurality of female nozzles may be rotatable to correspond to the one female nozzle.

The chemical solution supply device may further include a chemical solution supply module for supplying the chemical solution for the one-time supply to each of the cartridges. The chemical solution supply module is for supplying the chemical solution for the one time to the cartridge through the nozzle tip of the nozzle in which the one cartridge and the female nozzle are coupled, so that the single cartridge is filled with the chemical solution in a single supply amount. supply port; and a cartridge recovery unit for recovering an empty or damaged cartridge separated from the female nozzle by discharging the filled chemical to the object.

The chemical solution supply device may further include an air valve for controlling the supply of the chemical solution so that only the chemical solution for the one-time supply is provided from the chemical solution container to the supply port of the chemical solution supply module.

In addition, the chemical supply device of the present invention includes a chemical container in which a chemical is accommodated: a plurality of cartridge nozzles each having a cartridge nozzle for storing only a single supply amount of a chemical as an object to which the chemical is to be supplied among the chemical in the chemical container. capsule cartridge; a cartridge bath accommodating the plurality of cartridges; a chemical solution supply module having a plurality of supply ports for supplying the chemical solution for the one-time supply to each cartridge; and a nozzle arm having a female nozzle coupled to each of the plurality of cartridges to configure the plurality of nozzles and an arm coupled to the plurality of female nozzles, respectively. When each of the cartridges is filled with the one-time supply amount of the chemical liquid, the cartridge bath is rotatable so that the one cartridge among the plurality of cartridges corresponds to the one female nozzle among the plurality of female nozzles, the cartridge nozzle and the moving the nozzle by the arm so that the nozzle configured by coupling the female nozzle corresponds to a corresponding one of the plurality of supply ports of the chemical solution supply module; When the chemical solution filled in the cartridge is discharged to the object, the nozzle may be transferred by the arm so that the nozzle filled with the chemical solution corresponds to the object.

In addition, the method for supplying a drug solution of the present invention provides a plurality of capsule-type cartridges filled with a drug solution in a single supply amount to be supplied to an object; moving one of the plurality of cartridges filled with the one-time supply amount of the chemical to the object; and discharging the one-time supply amount of the drug solution filled in the cartridge to the object and applying the same.

Providing the plurality of cartridges includes providing a plurality of cartridges filled with the drug solution of the single supply by a manufacturer mounted in a cartridge bath, and the method includes providing the plurality of cartridges filled with the drug solution of the single supply amount by the manufacturer. coupling one of the cartridges to a corresponding one of the plurality of female nozzles coupled to the arm to constitute a nozzle; and disposing of the empty cartridge by separating it from the female nozzle when the chemical solution stored in the nozzle is discharged to the object. The configuration of the nozzle and the separation and disposal of the empty cartridge may be repeatedly performed until the chemical is applied to all objects.

The method further maintains the temperature of the chemical solution filled in the plurality of cartridges mounted on the cartridge bath or controlling the temperature of the chemical solution to be maintained differently depending on the type of the chemical solution filled in the plurality of cartridges may include The temperature of the chemical may be controlled by constantly flowing the cooling water into the cartridge or by controlling the flow rate of the cooling water flowing inside the cartridge bath to control the temperature of the chemical.

In addition, the drug solution supply method using the drug solution supply device for supplying the drug solution stored in the drug solution container of the present invention to the subject is one of a plurality of capsule-type cartridges for one-time supply of the drug solution to be supplied to the subject among the drug solution in the drug solution container. fill the cartridge of moving the cartridge filled with the chemical solution of the one-time supply to the object; and discharging the one-time supply amount of the chemical filled in the cartridge to the object and applying it on the object.

Filling the cartridge with the chemical solution for the one-time supply includes: moving the arm so that the one of the plurality of cartridges corresponds to the one of the plurality of female nozzles connected to the arms; coupling the one cartridge to the one female nozzle to form a nozzle composed of a cartridge nozzle and a female nozzle of the cartridge; and filling the cartridge with the chemical solution of the one-time supply using a nozzle tip of the front end of the cartridge nozzle.

Until the chemical solution is applied to all the objects, the cartridge filling to the chemical liquid discharging operation are repeatedly performed, and the method is when the chemical liquid filled in the nozzle is discharged to the object, the cartridge is separated from the female nozzle let; and collecting the empty cartridge separated from the female nozzle for reuse.

According to an embodiment of the present invention, by providing a cartridge-type chemical solution supplying device capable of supplying a predetermined amount of a chemical solution by simplifying the structure without using expensive parts, it is possible to reduce the manufacturing cost and reduce the size and volume, thereby reducing the size and volume of the device. can increase competitiveness.

In addition, by simply supplying a variety of chemical solutions with a small volume, it is possible to prevent deterioration and contamination of the chemical solution.

In addition, it is a small capacity or standardized chemical liquid supply method that supplies a desired amount of chemical by configuring a nozzle for supplying a chemical solution in the form of a cartridge. It is applicable to all fields that require the supply of chemical solutions.

1 is a view showing a conventional chemical liquid supply device.
2 is a front view of a cartridge-type chemical liquid supply device according to an embodiment of the present invention.
3 is a side view of a cartridge-type chemical liquid supply device according to an embodiment of the present invention.
4 is a top view of a cartridge-type chemical liquid supply device according to an embodiment of the present invention.
5 is an enlarged cross-sectional view of a nozzle unit in the cartridge-type chemical liquid supply apparatus according to an embodiment of the present invention.
6 is an enlarged cross-sectional view of one nozzle constituting the nozzle unit in the chemical liquid supplying apparatus according to the embodiment of the present invention.
7 is a view for explaining nozzle coupling and chemical liquid filling and discharging operations in the chemical liquid supply apparatus according to an embodiment of the present invention.
8 is a view for explaining the operation of filling and discharging the chemical solution of the nozzle in the chemical solution supply apparatus according to the embodiment of the present invention.
9(a)-(d) are diagrams illustrating an example in which a cartridge nozzle is mounted on a female nozzle of an arm part to configure a nozzle for discharging a chemical in the chemical solution supplying apparatus according to an embodiment of the present invention.
10(a)-(d) are diagrams illustrating an example in which the cartridge nozzle is separated from the female nozzle of the female part and the nozzle is disassembled in the chemical solution supplying apparatus according to the embodiment of the present invention.

Embodiments of the technical idea of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided so that the disclosed content may be thorough and complete, and the spirit of the present invention may be sufficiently conveyed to those skilled in the art.

Since the present invention may have various changes and may have various forms, embodiments (or examples) will be described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents and substitutes included in the spirit and scope of the present invention.

Terms such as first, second, etc. may be used to describe various elements, but the elements are not limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, a first component may be referred to as a second component, and similarly, a second component may be referred to as a first component.

Terms such as top, bottom, top, bottom, or top, bottom, etc. are used to distinguish relative positions of components. For example, for convenience, when naming the upper part of the drawing as the upper part and the lower part of the drawing as the lower part, the upper part may be named lower without departing from the scope of the present invention, and the lower part may be named upper part. .

The terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. The singular expression includes the plural expression unless the context clearly dictates otherwise. In the present application, terms such as “comprise” or “have” are intended to designate that a feature, number, step, operation, component, part, or combination thereof described in the specification exists, but one or more other features It is to be understood that it does not preclude the possibility of the presence or addition of numbers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in a commonly used dictionary should be interpreted as having a meaning consistent with the meaning in the context of the related art, and should not be interpreted in an ideal or excessively formal meaning unless explicitly defined in the present application. does not

In the drawings, the size and volume of the components are exaggerated for clarity, and parts indicated by the same reference numerals throughout the specification mean the same components.

2 is a front view of the chemical solution supplying apparatus according to an embodiment of the present invention, FIG. 3 is a side view of the chemical liquid supplying apparatus according to the embodiment of the present invention, and FIG. 4 is a top view of the chemical liquid supplying apparatus according to the embodiment of the present invention. to be.

2 to 4 , the chemical solution supplying apparatus 1000 according to an embodiment of the present invention may include a chemical solution supply nozzle unit 100 . The nozzle unit 100 is a unit for supplying a chemical solution of a desired capacity to the surface of a target, for example, a substrate (wafer), and a chemical solution container 600 , for example, a large amount of chemical solution in the bottle 600 . It is to supply only the amount necessary for the process of (CL) to the substrate.

The nozzle unit 100 may largely include two parts, for example, the nozzle arm part 110 and the capsule-type cartridge 150 . The nozzle arm 110 may convey the cartridge 150 in which the chemical solution is stored to a chemical solution processing device (not shown). The chemical processing device may include any device for receiving and processing the chemical solution from the cartridge 150 . For example, the chemical processing apparatus may include a semiconductor device for processing a chemical, such as a coating apparatus or a developing apparatus. The nozzle arm unit 110 may include a nozzle arm 120 and a plurality of arm nozzles 130 . The arm 120 may be configured as a high-speed and precise position control drive of three axes (X, Y, Z- Axis). The arm 120 can move up and down and left and right, so that the cartridge 150 can be transferred to the chemical treatment device.

The plurality of cartridges 150 are mounted in a cartridge bath 200 to be described later, and each cartridge may have a movable capsule shape. In the cartridge 150 , a chemical solution to be used in a unit process may be supplied and stored by the arm 120 , or a chemical solution stored in the cartridge 150 may be provided as an object by the arm 120 . The plurality of cartridges 150 may include a normal cartridge 151 in which a chemical solution is to be stored and a spare cartridge (see 155 in FIG. 5 ) to replace the normal cartridge 151 . The spare cartridge 155 can be used by immediately replacing the normal cartridge 151 when the normal cartridge 151 is damaged and cannot be used or when a chemical solution is changed.

Referring to FIG. 6 , the nozzle unit 100 is for increasing the coupling force of the cartridge 150 , for example, the cartridge nozzle 160 and the female nozzle 130 of the nozzle arm 110 . It may further include an O-ring (O-ring) 170 . The O-ring 170 prevents the cartridge 150, for example, the cartridge nozzle 160 from being separated from the female nozzle 130, and a plurality of O-rings 171 and 175, for example, the first O-ring. A 171 and a second O-ring 175 may be provided. When the cartridge nozzle 160 and the female nozzle 130 are coupled, a vacuum state is maintained by the plurality of O-rings 171 and 175 to prevent the cartridge nozzle 160 from being separated from the female nozzle 130 . can

The plurality of female nozzles 130 are combined with a plurality of cartridges 150 in which the chemical solution is stored. The plurality of cartridges 150 and the plurality of female nozzles 130 are coupled to each to constitute a plurality of nozzles NZ1 and NZ2 for discharging the chemical solution. The plurality of nozzles NZ1 and NZ2 may supply a chemical to an object to which the chemical is to be discharged by the arm 120 , for example, a substrate or a wafer in the chemical processing apparatus.

Specifically, referring to FIGS. 5 and 6 , the plurality of cartridges 150 are coupled to the plurality of female nozzles 130 , respectively, and a cartridge nozzle 160 having a nozzle tip (NZT) at its distal end is provided. can do. The female nozzle 130 and the cartridge nozzle 160 are combined to form a nozzle NZ having a nozzle tip NZT. As described above, the nozzle NZ may include a plurality of nozzles NZ1 and NZ2 including the first and second nozzles NZ1 and NZ2. The chemical liquid CL accommodated in the nozzles NZ1 and NZ2 may be discharged through the nozzle tip NZT and applied to an object, for example, a substrate (or wafer).

For example, a chemical solution to be used in a unit process may be supplied through the first nozzle NZ1 , and then a chemical solution to be used in the next unit process may be supplied through the second nozzle NZ2 . In the embodiment of the present invention, the nozzles NZ1 and NZ2 are illustrated as being composed of two nozzles, but the number of nozzles is not limited thereto and may be changed as needed.

The inner space of the cartridge nozzle 160 may be divided into a vacuum area VA1 arranged at the upper side with respect to the second O-ring 175 and a chemical solution discharge volume area VA2 arranged at the lower side. The vacuum area VA1 limited to the plurality of O-rings 171 and 175 is an area for controlling the pneumatic pressure for detachment and attachment of the cartridge nozzle 160 and the female nozzle 130 . The drug solution discharge volume area VA2 is an area for inhaling, storing, and discharging a desired amount of a drug solution by a user.

The vacuum area VA1 maintains a vacuum state when the cartridge nozzle 160 and the female nozzle 130 are coupled to each other so that the cartridge nozzle 160 is adsorbed to the female nozzle 130 , and the cartridge nozzle When 160 and the female nozzle 130 are separated, the vacuum region VA1 may be in a vacuum state so that the cartridge nozzle 160 can be easily separated from the female nozzle 130 .

In the chemical discharge volume area VA2, in a state in which the cartridge nozzle 160 and the female nozzle 130 are coupled, a vacuum state is maintained and when vacuum pressure is supplied through the N2 gas path, the chemical solution is supplied to the nozzle tip ( NZT) is charged and stored in the cartridge 150, when the vacuum state is released and N2 gas is supplied, the chemical is discharged from the cartridge 150 through the nozzle tip (NZT).

The nozzle unit 100 may further include a vacuum hole VH1 for controlling the pneumatic pressure of the inner space of the cartridge nozzle 160 , for example, the vacuum region VA1 . The vacuum hole VH1 may be formed in a portion corresponding to the vacuum area VA of the female nozzle 130 . The nozzle unit 100 may further include a vacuum hole (see VH2 in FIG. 7 ) for controlling the pneumatic pressure of the inner space of the cartridge nozzle 160 , for example, the chemical discharge volume area VA2 . The vacuum hole VH2 may be formed in a portion corresponding to the chemical solution discharge volume area VA2 of the female nozzle 130 .

Referring back to FIGS. 2 to 5 , the chemical solution supplying device 1000 according to an embodiment of the present invention may include a cartridge bath 200 in which a cartridge 150 in the form of a capsule is mounted. The cartridge bath 200 includes a plurality of pockets 210 , and the plurality of capsule-type cartridges 150 may be mounted in the plurality of pockets. As described above, the plurality of cartridges 150 may include a normal cartridge 151 and a spare cartridge 155 .

The cartridge bath 200 rotates so that a corresponding one of the plurality of cartridges 150 corresponds to one female nozzle 130 through a rotation operation to supply a chemical solution, and the cartridge is placed in the female nozzle 130 A nozzle 160 may be coupled thereto, and for filling the chemical solution, the cartridge bath 200 rotates through a rotation operation so that one of the plurality of cartridges 150 is supplied with the chemical solution supply module 300 to be described later. By rotating to correspond to the port 310, it is possible to fill the medicament in the cartridge (150). The supply operation of the cartridge 150 of the cartridge bath 200 may be made manually or automatically.

The chemical solution supplying device 1000 according to an embodiment of the present invention may further include a chemical solution supply module 300 for supplying the chemical solution to the cartridge 150 mounted on the cartridge bath 200 . The chemical solution supply module 300 supplies only a single dose of the chemical solution provided from the chemical solution containers 600 to the cartridges 150 mounted on the cartridge bath 200 for a unit process. For this purpose, a plurality of supply ports 310 , for example, a first supply port 311 and a second supply port 315 may be provided.

For example, the chemical liquid CL1 provided from the first chemical liquid container 610 among the chemical liquid containers 600 is supplied to the cartridge 150 through the first supply port 311, and the second chemical liquid container ( The chemical solution CL2 provided from the 650 may be supplied to the cartridge 150 through the second supply port 315 . Although not shown in the drawing, in order to supply different chemical solutions CL1 and CL2 to the cartridge 150 , the internal space of the chemical solution supply module 300 may be partitioned.

The chemical solution supply module 300 may further include a cartridge remover 350 for recovering a cartridge in which the stored chemical solution is used in a unit process or a damaged cartridge. The cartridge recovery unit 350 may include a first recovery port 351 and a second recovery port 355 for recovering the cartridge 150 . Among the cartridges 350 recovered through the cartridge recovery unit 350, the cartridges 350 from which the chemical solution is discharged may be gathered in one place and reused, and the damaged cartridges 350 may be disposed of. At this time, when the number of cartridges recovered through the cartridge recovery unit 350 exceeds a predetermined number, an element (not shown) for detecting this and notifying the user may be further provided. These elements may be controlled by the controller 800 .

Although not shown in FIGS. 2 to 4 , the cartridge bath 200 and the chemical solution supply module 300 maintain a constant temperature of the chemical solution (CL1, CL2) supplied to the inside from the chemical solution container (610, 650). Cooling water lines for flowing a refrigerant (cooling water) for cooling may be provided. At this time, the same temperature may be constantly maintained regardless of the type of the chemical liquids CL1 and CL2, or may be individually maintained at different temperatures according to the type of the chemical liquid CL1 and CL2. A plurality of temperature sensors for sensing the temperature of the cooling water lines may be further provided, and temperature control through these temperature sensors may be controlled by the controller 800 . Process performance can be improved by controlling the chemical liquids CL1 and CL2 using the cooling water to a constant temperature.

At this time, the flow rate of the coolant (refrigerant) of the cartridge bath 200 or the chemical solution supply module 300 also varies according to the amount of the chemical solution used. When the capacity of the cartridge bath is limited due to the space problem of the chemical supply device, the temperature control effect in the cartridge bath can be obtained by accelerating or decelerating the flow rate of the cooling water (refrigerant). The cooling water may be recovered and reused.

The chemical solution supply apparatus 1000 according to the embodiment of the present invention may further include an air valve (micro air value) 400 and a chemical solution filter 500 . The air valve 400 controls the flow rate of the chemical liquid by the amount determined by the user, for example, so that the chemical liquid of one supply amount is filled in the cartridge 150 . The air valve 400 may include a first air valve 410 for controlling the flow rate of the first chemical solution CL1 and a second air valve 450 for controlling the flow rate of the second chemical solution CL2. can The first and second air valves 410 and 450 are to be monitored and controlled by the controller 800 so that an amount of chemical liquid determined by a user is supplied to the first and second supply ports 311 and 315. can

The chemical filter 500 filters the chemical solution provided from the chemical solution container 600 to remove fine impurities in the chemical solution, and the chemical solution filter 500 includes the first chemical solution supplied from the first chemical solution container 610 . A first chemical solution filter 510 for filtering the chemical solution CL1 and a second chemical solution filter 550 for filtering the second chemical solution CL2 supplied from the second chemical solution container 650 may be provided. have.

By pressurizing N2 through the N2 supply pipe 770 , the chemical solutions CL1 and CL2 are injected into the chemical solution filters 510 and 550 through the chemical solution supply pipe 750 , and the chemical solution filters 510 and 550 are vented. is opened so that the chemical solutions CL1 and CL2 are buffered in the chemical solution filters 510 and 550, and when the chemical solution is buffered, the vent is closed. The chemical solutions CL1 and CL2 buffered in the chemical solution filters 510 and 550 pass through the air valves 410 and 450 by N2 pressurization and through the chemical solution discharge pipe 710 to the first of the chemical solution supply module 300 . and the second supply ports 311 and 315, and when the desired amount of the chemical is supplied, the N2 pressurization is stopped to prevent the overflow of the chemical.

In order to supply and fill a predetermined amount of the chemical solution to the cartridge nozzle 160 , the flow rate of the chemical solution flowing through the chemical solution discharge pipe 710 may be measured, and this may be displayed as a flow rate. To this end, a sensor and a monitor (not shown) may be further provided. The analog signal measured by the sensor and the monitor is converted into a digital signal and provided to the controller 800 , and the controller 800 may control the flow rate of the chemical based on the digital signal. An analog/digital converter for converting the analog signal into a digital signal may be provided inside the controller 800 or may be provided separately from the controller 800 . The sensor may include an ultrasonic wave micro sensor. As described above, the controller 800 may control the overall operation of the chemical solution supplying apparatus 1000 .

In the embodiment of the present invention, when it is detected through the sensor and the monitor that the amount of chemical liquid determined by the user is supplied to the supply ports 311 and 315 of the chemical liquid supply module 300, the air valve 410 is primarily , 450) is turned off, and secondly, by blocking the N2 supplied through the N2 supply pipe 770 to the chemical liquid containers 610 and 650, and controlling so that N2 is no longer supplied, the chemical liquid containers 610 and 650. It is possible to prevent excess supply (overflow) from the supply port (311, 315) of the chemical solution supply module (300).

Referring to FIG. 7 , each of the nozzles NZ1 and NZ2 is a vacuum line VL1 communicating with the vacuum hole VH1 and a vacuum line communicating with the N2 hole VH2 and a pneumatic pressure consisting of an N2 line VL2. Plumbing may be provided. Hereinafter, since the configurations and actions of the first and second nozzles NZ1 and NZ2 are the same, only the first nozzle NZ1 will be described. The coupling of the female nozzle 130 and the cartridge nozzle 160 of the first nozzle NZ1 and the chemical liquid filling and discharging operation of the first nozzle NZ1 will be described as follows.

First, when the vacuum line VL1 is vacuum-on and vent-off, the vacuum region VA1 becomes a vacuum state so that the cartridge nozzle 160 is attached to the female nozzle 130 . It is adsorbed and coupled, and a vacuum state is maintained through the O-rings 171 and 175 to prevent separation of the cartridge nozzle 160 from the female nozzle 130 .

Next, when the vacuum line VL1 is vacuum off and vent on, the vacuum state of the vacuum region VA1 is released, and the cartridge nozzle 160 is discharged from the female nozzle 130 . ) can be easily separated.

When the cartridge 150 is filled with the chemical liquid, the arm 120 supplies the chemical liquid to the nozzle NZ1 in a state in which the cartridge nozzle 160 is coupled to the arm nozzle 130 to form the nozzle NZ1. It moves left and right to correspond to the first supply port 311 of the module 300 and then descends, and the vacuum and N2 line VL2 is vacuum on and N2 off. Accordingly, the chemical liquid discharge volume area VA2 is in a vacuum state, so that the chemical liquid is sucked from the first common product port 311 to the nozzle NZ1 through the nozzle tip NZT, and the cartridge 150 is charged. can be

When the chemical solution filled in the cartridge 150 is discharged, the vacuum and the N2 line VL2 are filled with the chemical solution in the nozzle NZ1 in which the cartridge nozzle 160 is coupled to the female nozzle 130 . This vacuum is turned off (vacuum off) and N2 on (N2 on). Therefore, the vacuum state of the chemical solution discharge volume region VA2 is released by injecting N2 gas into the vacuum and the N2 line VL2, and the chemical solution charged and stored in the nozzle NZ1 through the nozzle tip NZT is determined. It can be released to the target according to the recipe.

Hereinafter, with reference to FIGS. 1 to 8 , a method of supplying a chemical solution to an object using the chemical solution supplying apparatus 1000 according to an embodiment of the present invention will be described in detail.

First, the chemical liquid (CL) to be used in the process is accommodated in the chemical liquid container (600). The chemical container 600 is pressurized using N2 supplied through the N2 supply pipe 770 . The chemical container 600 is pressurized through a normal pressurization method and a selective pressurization method. The user may set one of the normal pressurization method and the selective pressurization method as the pressurization method. The pressurization method is a method of continuously supplying N2 to the chemical container 600 to pressurize. The selective pressurization method is a method of selectively N2 pressurizing the chemical container 600 .

When the selective pressurization method is applied, only when the chemical solution is supplied to the chemical solution filter 500, N2 is selectively pressurized through an air valve (not shown) so that the chemical solution CL passes through the chemical solution supply pipe 750 and the The chemical solution flows through the filter 500, the vent of the chemical solution filter 500 is opened so that the chemical solution is buffered in the chemical solution filter 500, and when the chemical solution is buffered, the vent of the chemical solution filter is closed. The chemical solution buffered in the chemical solution filter 500 is filtered and flows to the supply port 310 of the chemical solution supply module 300 through the air valve 400 and the chemical solution discharge line 710 through N2 pressurization. A one-time supply of the chemical solution from the chemical container 600 is supplied to the supply port 310 so that the level of the chemical solution reaches a preset reference value, and the N2 pressurization is stopped to control the overflow of the chemical solution.

The arm 120 moves to a position of the cartridge 150 disposed in the cartridge bath 200 for providing a chemical solution to be used in the process of the cartridge bath 200 . At this time, the cartridge 150 is disposed in the cartridge bath 200 in an empty state for filling the chemical solution. The arm 120 moves downward to form a nozzle NZ by adsorbing the cartridge nozzle 160 to the arm nozzle 130 using a vacuum as described in FIG. 6 , and the cartridge nozzle 160 . The arm 120 adsorbed to the arm nozzle 130 moves upward and moves from the chemical solution 600 to the position of the supply port 310 to which the chemical solution is provided, so that the chemical solution required for the unit process is filled. can At this time, it is possible to control the amount of the chemical to be sucked into the cartridge 150 from the supply port 310 through the air valve (400).

The cartridge nozzle 160 is coupled to the female nozzle 130 with reference to the coupling flowchart of the female nozzle 130 and the cartridge nozzle 160 of the nozzle NZ in FIGS. 9(a) to (d). A detailed description of the operation is as follows.

First, as shown in Fig. 9 (a), the arm 120 moves upward (1). As shown in Fig. 9(b), in a state in which the arm 120 is moved upward, the cartridge bath 200 rotates (1) to move the cartridge 150 (cartridge nozzle 160) to the arm nozzle ( 130) to (2). As shown in Fig. 9(c), the arm 120 moves downward (1), and the nozzle vacuum is on, for example, the vacuum line VL of the vacuum region VA is vacuumed on ( 2), the cartridge nozzle 160 is coupled to the female nozzle 130 to form a nozzle NZ (3). As shown in Fig. 9(d), the arm 120 moves upward (1), and in the nozzle vacuum on state (2), the nozzle NZ is moved to the chemical discharge position, for example, to a position corresponding to the object. move (4).

When the chemical solution is stored in the cartridge nozzle 160 , the arm 120 may move to an object and supply the stored chemical solution to the chemical processing device. A chemical solution discharge operation is performed by controlling the N2 supply time through the controller 800 , and the chemical solution processing apparatus processes a substrate (wafer) according to a predetermined recipe.

When the discharging operation of the chemical is completed, the arm 120 moves to the cartridge supply ports 311 and 315 designated by the user to refill the cartridge 150 with the chemical solution in the same manner as described above, and transfer the filled chemical to the chemical solution. It serves as a processing device to process the next substrate (wafer). These chemical filling and discharging operations are repeated until processing for all wafers is completed. At this time, if the user's chemical solution is the same and there is no problem such as damage to the cartridge, the cartridge can be reused without change until all the wafers are processed.

When the same chemical treatment for all wafers is finished or a cartridge is damaged, the cartridge 150 must be replaced. The arm 120 of the nozzle unit 100 moves to the recovery ports 351 and 355 of the cartridge recovery unit 350 and repeats the method of changing the cartridge to exchange the cartridge. The exchange and separation method of these cartridges is as follows.

The arm 120 moves to a position corresponding to the designated recovery ports 351 and 355 of the cartridge recovery unit 350 and then moves downward. The arm 120 moves to the left and right in a state in which it moves downward, and then moves upward. At this time, the vacuum of the female nozzle 130 is turned off, so that the cartridge nozzle 160 is easily separated from the female nozzle 130 . The separated cartridge 150 is recovered through the nozzle recovery unit 350 and can be simply collected according to the user's needs. When the cartridge is removed, the arm 120 moves to the home position of the cartridge removal unit 350 . Such an operation may be repeatedly performed according to a recipe determined by the user.

The cartridge nozzle 160 is separated from the female nozzle 130 with reference to the flowchart in which the cartridge nozzle 160 from which the chemical is discharged is separated from the female nozzle 130 in FIGS. A detailed description of the operation is as follows.

First, as shown in Fig. 10 (a), the arm 120 is moved upward (1), and the nozzle NZ, in which the arm nozzle 130 and the cartridge nozzle 160 are coupled, is removed from the cartridge recovery unit. It moves to correspond to the home position of (350) (2). As shown in Figure 10 (b), the arm 120 is moved to the lower side (1), and positioned at the home position of the cartridge recovery unit 350 (2). As shown in Fig. 10(c), the arm 120 moves downward (1), the nozzle vacuum is off (2), and moves left and right to the cartridge removal position (3). As shown in Fig. 10(d), the arm 120 is moved upward (1), and the cartridge 150, for example, the cartridge nozzle 160, is separated from the arm nozzle 130 (2). , the arm 120 moves to the home position (3).

The chemical liquid supplying apparatus 1000 according to an embodiment of the present invention uses a method of filling the empty cartridge 150 mounted on the cartridge bath 200 with the chemical liquid CL and providing the chemical liquid to the chemical processing apparatus. That is, as described above, the empty cartridge 150 is mounted in the cartridge bath 200, and the chemical solution (CL) supplied from the chemical solution container 600 through the chemical solution supply module 300 is filled in the empty cartridge, , a method of processing the substrate (wafer) by providing the chemical liquid (CL) filled in the cartridge 150 to the chemical processing apparatus. If the same chemical solution is used, the cartridge can be recovered and cleaned and then used continuously, and the cartridge can be changed only when the chemical solution is changed or the cartridge is damaged. In one embodiment, since a method is used to fill the cartridge with a chemical solution supplied separately from the chemical container 600 in a fixed amount and apply it on a substrate (wafer), as shown in FIGS. 2 to 4, the chemical supply device Reference numeral 1000 may include a chemical solution container 600 , chemical solution supply lines 710 , 750 , 770 , a filter 500 , an air valve 400 , and a chemical solution supply module 300 .

Unlike the above embodiment in which the chemical is directly charged into the cartridge, the chemical supplying device 1000 according to another embodiment of the present invention uses a cartridge filled with a predetermined amount of the chemical provided by the manufacturer to inject the chemical solution (CL) into the chemical solution. It is to use the method provided by the processing device. That is, a cartridge 150 filled with a predetermined amount of chemical liquid CL is mounted in the cartridge bath 200 , and the cartridge 150 is coupled to the female nozzle 130 to form a nozzle NZ, and the nozzle By using the arm 120 of the unit 100, the cartridge 150 is provided as a chemical processing module for substrate (wafer) processing.

In another embodiment, the cartridge 150 filled with a quantity of the chemical provided by the manufacturer is mounted on the cartridge bath 200, and the chemical solution CL filled in the cartridge 150 is discharged on the substrate (wafer), The cartridge from which the chemical solution is discharged is separated from the female nozzle 130 and then disposed of. Then, the next wafer is treated with a substrate (wafer) by supplying a chemical solution using another cartridge 150 filled with a predetermined amount of the chemical solution, and the cartridge is disposed of. This operation is repeatedly performed for all substrates (wafers) to be processed.

1 to FIG. In 4, the chemical solution container 600, the chemical solution supply lines 710, 750, and 770, the filter 500, the air valve 400, and the chemical solution supply ports 311 and 315 of the chemical solution supply module are unnecessary.

In the chemical solution supplying apparatus 1000 according to another embodiment, the coupling and separation operation between the cartridge bath 200 and the nozzle unit 100 on which the cartridge 150 is mounted and the chemical liquid discharging method are the same as the operation according to the embodiment same. That is, since the operation of the chemical liquid supplying apparatus 1000 according to another embodiment is the same as the operation after the chemical liquid filling operation of the chemical liquid supplying apparatus 1000 according to the embodiment, a detailed description thereof will be omitted.

In the case of collecting the cartridge 150 through the cartridge recovery unit 350 provided in the chemical solution supply module 300 , the chemical solution supplying device 1000 according to another embodiment, as in the first embodiment, separates and recovers the cartridge. is the same as the operation described with reference to FIGS. 10(a)-(d), and thus a detailed description thereof will be omitted.

As in other embodiments, when using a cartridge filled with a chemical solution provided by the manufacturer, the chemical solution supply device 1000 can be configured more simply.

Those of ordinary skill in the art to which the present invention pertains, since the present invention can be embodied in other specific forms without changing the technical spirit or essential characteristics thereof, the embodiments described above are illustrative in all respects and not limiting. have to understand The scope of the present invention is indicated by the following claims rather than the above detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalent concepts should be interpreted as being included in the scope of the present invention. do.

100: nozzle unit 110: nozzle arm part
120: arm 130: arm nozzle
150, 151, 155: cartridge 160: cartridge nozzle
200: cartridge bath 210: pocket
300: chemical supply module 310, 311, 315: supply port
350: cartridge recovery unit 351, 355: recovery port
400, 410, 450: air valve 500, 510, 550: chemical filter
600, 610, 650: chemical container 710, 750, 770: supply pipe
800: controller

Claims (20)

A plurality of capsule-type cartridges, each having a cartridge nozzle, for storing only a one-time supply amount of the drug solution as a subject to be supplied with the drug solution; and
and a nozzle arm having an arm and a plurality of female nozzles coupled to the arm for moving the plurality of cartridges to the object,
One cartridge among the plurality of cartridges is combined with a corresponding one female nozzle among the plurality of female nozzles, so that the cartridge nozzle and the female nozzle constitute one nozzle, and the one-time supply of the chemical liquid stored in the cartridge is stored in the nozzle. A chemical solution supply device, characterized in that it is discharged to the object through the. The method of claim 1, wherein the nozzle is
a vacuum region for maintaining a vacuum state when the cartridge and the female nozzle are coupled; and
The chemical solution supply device, which is located below the vacuum region and is separated into a chemical solution discharge volume region for storing and discharging the chemical solution. 3. The method of claim 2,
The nozzle is configured such that the cartridge is adsorbed to and coupled to the female nozzle when the vacuum in the vacuum region is turned on, and the cartridge is separated from the female nozzle when the vacuum in the vacuum region is turned off chemical liquid supply device. 3. The method of claim 2,
The female nozzle may include: a vacuum line having a vacuum hole therein for maintaining the vacuum region in a vacuum state; and
and a vacuum and N2 line for discharging the chemical solution of the one-time supply contained in the cartridge or filling the cartridge with the chemical solution for the one-time supply. 5. The method of claim 4,
The cartridge further includes a nozzle tip at the front end of the cartridge nozzle,
When the vacuum of the chemical discharge volume area is turned on, the chemical solution for the one-time supply is supplied to and stored in the cartridge through the nozzle tip, and when the vacuum of the chemical solution discharge volume area is turned off, the chemical solution passes through the nozzle tip. A drug solution supply device, characterized in that the drug solution stored in the cartridge is discharged to the object for the one-time supply. 5. The method of claim 4,
The female nozzle further includes a plurality of O-rings for maintaining a vacuum state in the vacuum region, thereby preventing the cartridge from being separated from the female nozzle. According to claim 1,
Further comprising a cartridge bath on which the plurality of cartridges are mounted,
Each of the plurality of cartridges is a cartridge provided with the drug solution in the one-time supply amount filled by the manufacturer,
When the chemical solution stored in the cartridge is discharged to the target, the cartridge is separated from the female nozzle and disposed of. According to claim 1,
Further comprising a cartridge bath for accommodating the plurality of cartridges and a plurality of spare cartridges for replacing damaged cartridges among the plurality of cartridges,
and the cartridge bath is rotatable so that the one cartridge among the plurality of cartridges corresponds to the one female nozzle among the plurality of female nozzles. 9. The method of claim 8,
Further comprising a chemical solution supply module for supplying the chemical solution for the one-time supply to each cartridge,
The chemical solution supply module is for supplying the chemical solution for the one time to the cartridge through the nozzle tip of the nozzle in which the single cartridge and the female nozzle are coupled, so that the single cartridge is filled with the chemical solution in a single supply amount. supply port; and
and a cartridge recovery unit for recovering an empty or damaged cartridge separated from the female nozzle by discharging the filled chemical to the object. 10. The method of claim 9,
The chemical liquid supply apparatus according to claim 1, further comprising an air valve for controlling the supply of the chemical liquid so that only the chemical liquid for the one-time supply is provided from the chemical liquid container to the supply port of the chemical liquid supply module. The chemical container containing the chemical liquid:
a plurality of capsule-type cartridges each having cartridge nozzles for storing only a one-time supply amount of a drug solution as an object to which the drug solution is to be supplied among the drug solution in the drug container;
a cartridge bath accommodating the plurality of cartridges;
a chemical solution supply module having a plurality of supply ports for supplying the chemical solution for the one-time supply to each cartridge; and
Comprising a nozzle arm having a female nozzle coupled to each of the plurality of cartridges constituting the plurality of nozzles and an arm coupled to the plurality of female nozzles, respectively,
When each of the cartridges is filled with the one-time supply amount of the chemical solution, the cartridge bath is rotatable so that the one cartridge among the plurality of cartridges corresponds to the one female nozzle among the plurality of female nozzles, the cartridge nozzle and the Moves the nozzle by the arm so that the nozzle configured by coupling the arm nozzle corresponds to a corresponding one supply port among a plurality of supply ports of the chemical solution supply module,
When the chemical liquid filled in the cartridge is discharged to the object, the chemical liquid supply device, characterized in that the nozzle is transferred by the arm so that the nozzle filled with the chemical liquid corresponds to the object. providing a plurality of capsule-type cartridges filled with a single supply amount of a drug to be supplied to an object;
moving one of the plurality of cartridges filled with the one-time supply amount of the chemical to the object; and
and discharging and applying the drug solution of the one-time supply amount filled in the cartridge to the object. 13. The method of claim 12,
Providing the plurality of cartridges includes providing a plurality of cartridges filled with the drug solution of the one-time supply by the manufacturer mounted in a cartridge bath,
the method
forming a nozzle by coupling one of the plurality of cartridges filled with the one-time supply amount of the chemical to a corresponding one of the plurality of female nozzles coupled to the arm; and
When the chemical liquid stored in the nozzle is discharged to the object, the method further comprises disposing of an empty cartridge by separating it from the female nozzle,
The configuration of the nozzle and the separation and disposal operations of the empty cartridge are repeatedly performed until the chemical is applied to all objects. The method according to claim 13, wherein the temperature of the chemical solution is maintained at a constant level, or the temperature of the chemical solution is maintained differently depending on the type of the chemical solution filled in the plurality of cartridges. including more,
The chemical solution supply method, characterized in that the temperature of the chemical solution is controlled by constantly flowing cooling water into the cartridge or by controlling the flow rate of the cooling water flowing inside the cartridge bath. A chemical solution supply method using a chemical solution supply device for supplying a chemical solution stored in a chemical solution container to an object, the method comprising:
filling one of a plurality of capsule-type cartridges with a one-time supply amount of a drug to be supplied to the subject among the drug solution in the drug container;
moving the cartridge filled with the chemical solution of the one-time supply to the object; and
A method of supplying a chemical solution, comprising discharging the drug solution of the one-time supply amount charged in the cartridge to the target object and applying it on the target object. 16. The method of claim 15,
Filling the cartridge with the chemical solution for the one-time supply is
moving the arm such that the one of the plurality of cartridges corresponds to the one of the plurality of female nozzles connected to the arm;
coupling the one cartridge to the one female nozzle to form a nozzle composed of a cartridge nozzle and a female nozzle of the cartridge; and
and filling the cartridge with the chemical solution for the one-time supply using a nozzle tip at the tip of the cartridge nozzle. 17. The method of claim 16,
Until the chemical solution is applied to all the objects, the cartridge charging to the chemical solution discharging operation is repeatedly performed,
the method
when the chemical liquid filled in the nozzle is discharged to the object, separating the cartridge from the female nozzle; and
The method for supplying a chemical solution, characterized in that it further comprises collecting the empty cartridge separated from the female nozzle for reuse. The method according to claim 15, further comprising controlling an amount of the chemical solution through an air valve so that only the chemical solution for the one-time supply is supplied to the cartridge from the chemical solution container. 16. The method of claim 15,
The nozzle may include a vacuum region for maintaining a vacuum state when the cartridge and the female nozzle are coupled; and a chemical solution discharge volume area located below the vacuum area to store and discharge the chemical solution,
The method of claim 1, wherein the cartridge is adsorbed and coupled to the female nozzle when the vacuum is turned on, and the cartridge is separated from the female nozzle when the vacuum is turned off. 16. The method of claim 15,
The female nozzle may include: a vacuum line having a vacuum hole therein for maintaining the vacuum region in a vacuum state; and a vacuum and N2 line for discharging the chemical solution of the one-time supply contained in the cartridge or filling the cartridge with the chemical solution for the one-time supply,
When the vacuum of the chemical discharge volume area is turned on, the chemical solution for one supply is filled in the cartridge through the nozzle tip of the cartridge, and when the vacuum in the chemical discharge volume area is turned off, the cartridge passes through the nozzle tip A method of supplying a chemical solution, characterized in that the chemical solution stored in the one-time supply is released to the object.

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