KR20210135217A - 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널 - Google Patents

네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널 Download PDF

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Publication number
KR20210135217A
KR20210135217A KR1020217023351A KR20217023351A KR20210135217A KR 20210135217 A KR20210135217 A KR 20210135217A KR 1020217023351 A KR1020217023351 A KR 1020217023351A KR 20217023351 A KR20217023351 A KR 20217023351A KR 20210135217 A KR20210135217 A KR 20210135217A
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KR
South Korea
Prior art keywords
resin composition
photosensitive resin
negative photosensitive
group
cured film
Prior art date
Application number
KR1020217023351A
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English (en)
Korean (ko)
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KR102675832B1 (ko
Inventor
유스케 후쿠자키
마사히데 세노오
Original Assignee
도레이 카부시키가이샤
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Publication date
Application filed by 도레이 카부시키가이샤 filed Critical 도레이 카부시키가이샤
Publication of KR20210135217A publication Critical patent/KR20210135217A/ko
Application granted granted Critical
Publication of KR102675832B1 publication Critical patent/KR102675832B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
KR1020217023351A 2019-03-05 2020-03-02 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널 KR102675832B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019039268 2019-03-05
JPJP-P-2019-039268 2019-03-05
PCT/JP2020/008738 WO2020179744A1 (fr) 2019-03-05 2020-03-02 Composition de résine photosensible négative, procédé de production de film durci l'utilisant, et panneau tactile

Publications (2)

Publication Number Publication Date
KR20210135217A true KR20210135217A (ko) 2021-11-12
KR102675832B1 KR102675832B1 (ko) 2024-06-14

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020217023351A KR102675832B1 (ko) 2019-03-05 2020-03-02 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널

Country Status (4)

Country Link
JP (1) JP7405075B2 (fr)
KR (1) KR102675832B1 (fr)
CN (1) CN113474730A (fr)
WO (1) WO2020179744A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009519991A (ja) 2005-12-20 2009-05-21 チバ ホールディング インコーポレーテッド オキシムエステル光開始剤
JP2014522394A (ja) 2011-05-25 2014-09-04 アメリカン・ダイ・ソース・インコーポレーテッド オキシムエステル基および／またはアシル基の化合物
WO2014185435A1 (fr) 2013-05-15 2014-11-20 ラサ工業株式会社 Composition de matériau isolant
WO2017110689A1 (fr) 2015-12-25 2017-06-29 東レ株式会社 Composition de résine photosensible, film durci, stratifié, élément pour panneau tactile, et procédé de fabrication de film durci

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106104381B (zh) * 2014-03-17 2019-12-13 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法、以及半导体装置
JP6776014B2 (ja) 2015-06-15 2020-10-28 株式会社Ｄｎｐファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
KR102217045B1 (ko) * 2016-07-29 2021-02-18 후지필름 가부시키가이샤 착색 조성물, 컬러 필터, 패턴 형성 방법, 고체 촬상 소자, 및 화상 표시 장치
WO2018105532A1 (fr) * 2016-12-05 2018-06-14 旭化成株式会社 Composition de résine photosensible, stratifié de résine photosensible, procédé de production de motif de résine et procédé de production de motif de film durci
JP7119390B2 (ja) 2017-03-02 2022-08-17 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜
JP7153651B2 (ja) * 2017-08-10 2022-10-14 株式会社Ｄｎｐファインケミカル 感光性着色樹脂組成物及びその硬化物、カラーフィルタ、並びに表示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009519991A (ja) 2005-12-20 2009-05-21 チバ ホールディング インコーポレーテッド オキシムエステル光開始剤
JP2014522394A (ja) 2011-05-25 2014-09-04 アメリカン・ダイ・ソース・インコーポレーテッド オキシムエステル基および／またはアシル基の化合物
WO2014185435A1 (fr) 2013-05-15 2014-11-20 ラサ工業株式会社 Composition de matériau isolant
WO2017110689A1 (fr) 2015-12-25 2017-06-29 東レ株式会社 Composition de résine photosensible, film durci, stratifié, élément pour panneau tactile, et procédé de fabrication de film durci

Also Published As

Publication number Publication date
KR102675832B1 (ko) 2024-06-14
TW202035471A (zh) 2020-10-01
JPWO2020179744A1 (fr) 2020-09-10
CN113474730A (zh) 2021-10-01
WO2020179744A1 (fr) 2020-09-10
JP7405075B2 (ja) 2023-12-26

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