KR20210018923A - Cartridge for containing vaporizable material and method therefor - Google Patents

Abstract

A system for thin film deposition comprises (i) forming a receptacle for receiving a vaporizable material and forming an aperture configured to allow vapor to escape from the cartridge, wherein (a) the receptacle and A gas permeable member arranged in the vapor path between the apertures; And (b) a baffle arranged in a vapor path between the gas permeable member and the aperture; And (ii) a heating element configured to heat the cartridge to vaporize the vaporizable material to produce a first vapor stream. The system is configured such that the first vapor stream condenses onto the gas permeable member to form an intermediate coating on the gas permeable member, and the system regasifies the intermediate coating to produce a second vapor stream. And the second vapor stream is discharged through the aperture.

Description

Cartridge for containing vaporizable material and method therefor

Cross-reference of related applications

This application claims the benefit and priority to U.S. Provisional Application No. 62/682,726, filed on June 8, 2018, the contents of which are incorporated herein by reference in their entirety.

Technical field

The subject matter of the present disclosure relates to materials for use in thermal vaporization processes. Specifically, an apparatus and method for thermally vaporizing a material are described herein.

Thermal vaporizers are generally used to deposit thin films in a wide variety of applications, including the manufacture of optoelectronic devices, semiconductor devices, and optical coatings. For example, various organic and/or inorganic layers of an optoelectronic device including an organic light emitting diode (OLED) and an organic photovoltaic device (OPV) may be deposited through a thermal evaporation process.

In general, vaporization is performed in a vacuum chamber by vaporizing or sublimating the source material, causing the vaporized source material to migrate to the target surface where the vaporized source material is cooled and deposited via desublimation. Vaporization of the source material is generally achieved by heating the material to a sublimation temperature using, for example, resistance heating or electron beam heating.

Various thermal vaporizer sources include "boat" type vaporization sources, "box" type vaporization sources, and Knudsen cell (or K-cell) sources. Boat type vaporization sources generally comprise a boat in the form of a resistive heating element provided with a recess for receiving the source material. During vaporization, an electric current passes through the boat, heating the boat to vaporize the source material. Box type vaporization sources are generally configured to contain the source material inside an enclosure with one or more apertures formed to allow vaporized material to escape upon heating. In the case of a vaporizer using an electron beam as a heat source, the source material is heated by the impact of a high-energy electron beam to vaporize the source material.

Thermal vaporizers may generally consist of a point source, a linear source or a surface source. For example, the point source is typically conditioned to discharge the vapor material at a single point. The linear source may be configured to spray vapor material from a generally linear nozzle or a series of nozzles arranged in a linear fashion. The surface source may be configured to spray vapor material from a series of nozzles arranged in a generally planar configuration.

In accordance with some embodiments, a system for thin film deposition comprises (i) forming a receptacle for receiving a vaporizable material and forming an aperture configured to allow vapor to escape from the cartridge, (a) a gas permeable member arranged in a vapor path between the receptacle and the aperture; And (b) a baffle arranged in a vapor path between the gas permeable member and the aperture; And (ii) a heating element configured to heat the cartridge to vaporize the vaporizable material to produce a first vapor stream. The system is configured such that the first vapor stream condenses onto the gas permeable member to form an intermediate coating on the gas permeable member, and the system regasifies the intermediate coating to produce a second vapor stream. And the second vapor stream is discharged through the aperture.

In accordance with some embodiments, (i) a cartridge used for thin film deposition includes a body forming a receptacle for receiving a vaporizable material and forming an aperture configured to allow vapor to be discharged from the cartridge; (ii) a gas permeable member arranged inside the body in a vapor path between the receptacle and the aperture; And (iii) a baffle arranged inside the body in a vapor path between the gas permeable member and the aperture.

Some embodiments will now be described by way of example with reference to the accompanying drawings.
1 is a perspective view of a vaporizer in an example.
2 is a cross-sectional view of the vaporizer of FIG. 1.
3 is a schematic diagram of a dispersible source material.
4A, 4B and 4C are perspective views of cartridges according to various embodiments.
5 is a perspective view of a vaporizer in an example.
6 is a perspective view of a linear vaporizer in one example.
7 is a cross-sectional view of the linear vaporizer of FIG. 6.
8a, 8b and FIG. 8C is a perspective view of a cartridge according to various embodiments.
9 is a perspective view of a cartridge in one example.
10 is a cross-sectional view of the cartridge of FIG. 9 in one example.
11 is a cross-sectional view of the cartridge of FIG. 9 in another example.
12 is a cross-sectional view of the cartridge of FIG. 9 in yet another example.
13A, 13B, and 13C are perspective views of cartridges according to various embodiments.
14A, 14B, and 14C are perspective views of cartridges according to various embodiments.
14D and 14E are cross-sectional views of cartridges according to various embodiments.
15A, 15B, and 15C are perspective views of cartridges according to various embodiments.
16A and 16B are cross-sectional views of a vaporizer provided with a cartridge according to various embodiments.
17 is a perspective view of a linear vaporizer in one example.
18 is a cross-sectional view of the linear vaporizer of FIG. 17;
19A, 19B, 19C, 19D, 19E and 19F illustrate a surface of a carrier member according to various embodiments.
20A, 20B, 20C, 20D, and 20E illustrate cross-sectional views of a carrier member coated with a vaporizable coating according to various embodiments.
21 is a schematic diagram of a carrier member coated with a vaporizable coating.
22, 23, 24, 25, 26, 27, 28, 29 and 30 show cartridges provided with one or more carrier members arranged therein according to various embodiments.
31A, 31B, 31C, and 31D illustrate cartridges provided with a vaporizable coating according to various embodiments.
32A shows a perspective view of a cartridge according to an embodiment.
Fig. 32B shows a cross-sectional view of the cartridge of Fig. 32A.
33A shows a perspective view of a cartridge according to an embodiment.
33B shows a cross-sectional view of the cartridge of FIG. 33A.
34A shows a cross-sectional view of a cartridge provided with a vaporizable coating in one embodiment.
34B shows a cross-sectional view of a cartridge provided with a vaporizable coating disposed inside a vaporizer in one embodiment.
35A shows a perspective view of an elongated carrier member provided with a vaporizable coating according to an embodiment.
Figure 35b shows a cross-sectional view of the elongated carrier member of Figure 35a.
36 shows a carrier member provided with a vaporizable coating according to an embodiment.
37 shows a carrier member provided with a vaporizable coating according to another embodiment.
38 shows a plurality of carrier members arranged inside a cartridge according to an embodiment.
39 shows an annular cartridge according to one embodiment.
Fig. 40 shows the annular cartridge of Fig. 39 disposed inside a carburetor according to an embodiment.
41 shows a cylindrical cartridge according to one embodiment.
42A shows a cross-sectional view of a cylindrical cartridge according to one embodiment.
42B shows a cross-sectional view of a cylindrical cartridge according to another embodiment.
42C shows a cross-sectional view of a cylindrical cartridge according to another embodiment.
43A shows a bottom view of a cylindrical cartridge according to one embodiment.
43B shows a bottom view of a cylindrical cartridge according to another embodiment.
44A shows a cross-sectional view of a cylindrical cartridge containing a vaporizable material according to one embodiment.
44B shows a cross-sectional view of a cylindrical cartridge containing a vaporizable coating disposed on a carrier member according to one embodiment.
44C shows a cross-sectional view of a cylindrical cartridge containing a vaporizable material provided in a chamber according to one embodiment.
44D shows a cross-sectional view of a cylindrical cartridge containing a plurality of vaporizable materials provided in a chamber according to one embodiment.
45 shows a cylindrical cartridge according to one embodiment.
46 shows a cross-sectional view of the cylindrical cartridge according to the embodiment of FIG. 45;
47 shows a cross-sectional view of a cylindrical cartridge containing a vaporizable material according to one embodiment.
48A shows an embodiment wherein the cartridge comprises a housing including a tapered portion.
48B shows an embodiment in which the housing of the cartridge is tapered to form a conical housing.
49 shows a perspective view of a cartridge according to an embodiment.
50A shows a cross-sectional view of the cartridge of FIG. 49 according to one embodiment.
50B shows a cross-sectional view of the cartridge of FIG. 49 according to another embodiment.
51A and 51B illustrate the operation of a cartridge in a physical vapor deposition system according to an embodiment.

It will be appreciated that for simplicity and clarity of illustration, where considered appropriate, reference numerals may be repeated between the drawings to indicate corresponding or similar elements. In addition, numerous specific details are set forth to provide a thorough understanding of the exemplary embodiments described herein. However, it will be appreciated by those of skill in the art that the exemplary embodiments described herein may be practiced without some of these specific details. In other instances, specific methods, procedures, and components have not been described in detail so as not to obscure the exemplary embodiments described herein.

1 shows an example of a crucible 100 for a vaporizer. For example, the crucible 100 may be used in a point source vaporizer. The crucible 100 is composed of a body including an upper portion 110 and a lower portion 120. The outlet 130 is formed by the upper portion 130 so that the vaporized source material can escape through it.

2 shows a cross section of the crucible 100 taken along line I-I. The crucible 100 includes a chamber 150 formed by the body of the crucible 100, configured to receive a source material. As shown, the upper portion 110 and the lower portion 120 of the crucible 100 may be joined together by a mechanical fastener (eg, thread), whereby the upper portion 110 is inside the chamber 150. It can be removed to facilitate placement of the source material.

The source material is generally provided in the form of powders, pellets and/or granules. To replenish the crucible 100 with this source material, the source material is typically dispensed from a storage container and placed inside the chamber 150 of the crucible 100. However, replenishing the crucible 100 in this manner is usually cumbersome and time-consuming due to the dispersible form (eg, powder, pellets and/or granules) from which the raw material is supplied. In addition, when the source material is supplied in a dispersible form, it is generally difficult to precisely control and monitor the filling amount (eg, the amount of source material provided inside the chamber 150 of the crucible 100). Changes in the charge amount can affect some deposition parameters, such as the uptime and stability of the deposition rate, so it is desirable to reduce or mitigate these changes.

It has also been found that, in at least some cases, source materials in dispersible form may have relatively poor thermal conductivity, especially under reduced pressure environments (eg vacuum). Now, referring to FIG. 3, it is assumed that the gap 310 formed between adjacent source materials 305 acts as a heat insulator, thereby suppressing the transfer or exchange of thermal energy therebetween. This can lead to uneven heating of the source material, causing certain portions of the source material to be exposed to higher temperatures than others. For example, in some cases, it may be desirable to heat the source material to a temperature substantially higher than the vaporization temperature of the source material to achieve a higher vaporization rate. In particular, in this case, the portion of the source material disposed close to the heating element may be subjected to an elevated temperature compared to the portion of the source material disposed away from such heating element. Thereby, especially when the source material is exposed to high temperatures for a long period of time, a portion of the source material may deteriorate, resulting in deterioration of device performance and/or film quality.

In one aspect, a cartridge for use in a physical vapor deposition apparatus is provided. For example, the cartridge can be configured for use in a carburetor. For example, the cartridge may be housed in a crucible of a carburetor.

Referring back to FIG. 2, the cartridge 200 is shown to be accommodated in the chamber 150. The cartridge 200 generally houses the source material therein so that when the crucible 100 and cartridge 200 are heated, the source material vaporizes to produce a vapor stream of vaporized source material. The vaporized source material may be delivered through the outlet 130 and deposited on a target substrate (not shown).

4A-4C illustrate a cartridge 200 according to various embodiments. The cartridge is generally referred to by the number 200, and it will be appreciated that different suffixes “a”, “b”, “c”, and the like are used to indicate different embodiments of the cartridge 200.

In FIG. 4A, cartridge 200a is shown to be a substantially cylindrical housing defining an opening 410. The opening 410 may be disposed substantially centrally on the end face of the cylindrical housing.

In FIG. 4B, the cartridge 200b is shown to be a substantially cylindrical housing defining a plurality of openings 412. The plurality of openings 412 may be formed on the end surface of the cylindrical housing.

In Fig. 4C, the cartridge 200c is shown to be a substantially cylindrical housing with a gas permeable member 420 on the end face. Examples of such gas permeable members 420 include, but are not limited to, screens, perforated plates, membranes, meshes, sieves, porous members (including porous ceramic members), and combinations thereof. The gas permeable member 420 is generally configured to allow passage of the vaporized source material through it while inhibiting the passage of solid material. In some embodiments, the gas permeable member 420 may be non-separably fixed to the housing, for example by welding.

5 shows a vaporizer 500 in one example. As shown, the crucible 100 is shown to be disposed inside the casing 530 of the vaporizer 500. The crucible 100 may be fixed inside the casing 530 by one or more support portions 510. The support 510 may include a material exhibiting relatively low thermal conductivity to reduce or mitigate the transfer of thermal energy between the crucible 100 and the casing 530. In this way, the temperature of the crucible 100 can be kept relatively constant and substantially uniform throughout. For example, one or more of the supports 510 may be formed using a ceramic material. The heating element 520 is shown disposed between the crucible 100 and the casing 530. For example, the heating element 520 may be disposed around the sidewall and bottom of the crucible 100 to heat the crucible 100 and the cartridge 200 contained therein.

6 shows an example crucible 600, which is configured to be used in a linear vaporizer. The crucible 600 includes a body formed by combining the upper portion 610 and the lower portion 620. A plurality of outlets 630 are formed in the upper portion 610 so that the vapor flow of the vaporized source material can exit through itself. Each of the upper portion 610 and the lower portion 620 includes flanges 640a and 640b for fastening the upper and lower portions to each other. For example, the upper portion 610 and the lower portion 620 may be mechanically fastened to each other using bolts, nuts, screws, clamps, or the like. One or more support portions 650 may be coupled to the flanges 640a and 640b to mount the crucible 600 to the carburetor 700, an example of which is shown in FIG. 7.

In FIG. 7, the crucible 600 is mounted inside the casing 730 by one or more supports 650, and the heating element 720 is used to heat the crucible 600 and the cartridge 200 accommodated therein. It is disposed between 600 and the casing 730.

In FIG. 8A, cartridge 200d includes a housing formed as a hollow rectangular prism defining one or more openings 810. One or more openings 810 are arranged linearly parallel to the longitudinal axis of the housing and are formed substantially centrally on the upper surface 821 of the housing.

In FIG. 8B, the cartridge 200e includes a housing formed as a hollow rectangular prism defining a plurality of openings 812. The plurality of openings 810 are arranged in rows and are formed on the upper surface 823 of the housing.

In Fig. 8C, the cartridge 200f includes a housing formed as a hollow rectangular prism having a gas permeable member 815 as an upper surface. Examples of such gas permeable members 815 include, but are not limited to, screens, perforated plates, membranes, meshes, sieves, porous members (including porous ceramic members), and combinations thereof. The gas permeable member 815 is generally configured to allow penetration of the vaporized source material through it while inhibiting the passage of the solid material. In some embodiments, the gas permeable member 815 may be non-separably secured to the housing, for example by welding.

9 shows another example of the vaporizer 900. The carburetor 900 is shown to include an elongated body 910. For example, the cross section of the elongated body 910 may have a substantially triangular shape when taken perpendicular to the longitudinal axis of the body 910. Thus, this configuration of the body 910 may also be referred to as a hollow triangular prism. The body 910 may be provided with an inner tube 920 extending through the body 910 to accommodate the heating element 930 therein. A filling hole 940 may also be provided for introducing the source material into the vaporizer 900. The crucible 950 is disposed at one end of the body 910. The crucible 950 may also be a hollow triangular prism in shape and configuration. In some examples, the body 910 and the crucible 950 may be inseparably coupled to each other. In another example, the body 910 and the crucible 950 may be detachably coupled to each other such that the crucible 950 may be removed from the body 910 to facilitate replenishment of the source material. The plurality of outlets 960 are arranged substantially parallel to the longitudinal axis of the body 910. For example, the plurality of outlets 960 may be formed along one of the vertices of the body 910.

10 shows a cross-sectional view of the vaporizer 900 taken along line II-II according to an example. In the example of FIG. 10, inner tube 920 is shown extending substantially the entire length of body 910. The cartridge 200 is configured to be accommodated in the crucible 950.

11 shows a cross-sectional view of a vaporizer 900 taken along line II-II according to another example. In the example of FIG. 11, an auxiliary heating element 932 is provided adjacent the crucible 950. For example, auxiliary heating element 932 can be received within compartment 1100 attached to crucible 950. In this way, the crucible 950 and the cartridge 200 contained therein can be heated by the heating element 930 and/or the auxiliary heating element 932.

12 shows a cross-sectional view of carburetor 900 taken along line II-II according to another example. In the example of FIG. 12, the compartment 1100 further includes a protrusion 1210 extending into or through the crucible 950. In some examples, the protrusion 1210 may partially extend into the crucible 950. In another example, the protrusion 1210 may extend substantially toward the end of the inner tube 920 through the crucible 950. A gap is provided between the end of the protrusion 1210 and the inner tube 920 to accommodate changes in geometry due to thermal expansion of various components during use.

13A-13C show various embodiments of a cartridge 200 having a triangular prism configuration. For example, such a cartridge 200 may be used in the vaporizer 900 illustrated in FIGS. 10 and/or 11.

In FIG. 13A, the cartridge 200g includes a housing defining an opening 1310. An opening 1310 is formed in the upper surface 1321 of the housing. The opening 1310 may be formed close to one of the vertices, for example. In another example, opening 1310 may be formed in another portion of upper surface 1321, such as at or near a central portion of upper surface 1321.

In FIG. 13B, the cartridge 200h includes a housing defining a plurality of openings 1312. A plurality of openings 1312 are formed in the upper surface 1323. The plurality of openings 1312 may be formed close to the circumference of the upper surface 1323 as shown in the figure, for example. However, it will be appreciated that the openings 1312 may be arranged in other configurations.

In Fig. 13C, the cartridge 200i includes a housing, and the gas permeable member 1315 forms an upper surface of the housing. Examples of such gas permeable members 1315 include, but are not limited to, screens, perforated plates, membranes, meshes, sieves, porous members (including porous ceramic members), and combinations thereof. The gas permeable member 1315 is generally configured to allow penetration of the vaporized source material through it, while inhibiting the passage of solid material. In some embodiments, the gas permeable member 1315 may be non-separably fixed to the housing, for example by welding.

14A-14E show various embodiments of a cartridge 200 having a triangular prism configuration. For example, such a cartridge 200 may be used in the carburetor 900 shown in FIG. 12, and the compartment 1100 for receiving the auxiliary heating element 932 has a protrusion extending toward the body 910 ( 1210).

In FIG. 14A, cartridge 200j includes a housing defining an opening 1410. An opening 1410 is formed in the upper surface 1421 of the housing. The opening 1410 may be formed close to one of the vertices, for example. In another example, opening 1410 may be formed in another portion of upper surface 1421, such as at or near a central portion of upper surface 1421. The housing further comprises a cavity 1431 for receiving the protrusion 1210 of the compartment 1100, for example. As shown in FIG. 14D, the cavity 1431 may extend through the housing substantially between the upper surface 1421 and the lower surface 1441 to form a through hole in one embodiment. In another embodiment shown in FIG. 14E, the cavity 1431 ′ may extend partially from the lower surface 1441 toward the upper surface 1421 to form a recess.

In FIG. 14B, cartridge 200k includes a housing defining a plurality of openings 1412. A plurality of openings 1412 are formed in the upper surface 1423. The plurality of openings 1412 may be formed proximate the perimeter of the upper surface 1423 as shown in the figure, for example. However, it will be appreciated that the opening 1412 may be arranged in other configurations. The housing further comprises a cavity 1431 for receiving the protrusion 1210 of the compartment 1100, for example. The cavity 1431 may extend substantially through the housing to form a through hole, or the cavity 1431 may partially extend from the lower surface toward the upper surface 1423 to form a recess.

In Fig. 14C, the cartridge 200l includes a housing, and the gas permeable member 1415 forms an upper surface of the housing. Examples of such gas permeable members 1415 include, but are not limited to, screens, perforated plates, membranes, meshes, sieves, porous members (including porous ceramic members), and combinations thereof. The gas permeable member 1415 is generally configured to allow the penetration of the vaporized source material through it while inhibiting the passage of the solid material. In some embodiments, the gas permeable member 1415 may be non-separably fixed to the housing, for example by welding. The housing further comprises a cavity 1431 for receiving the protrusion 1210 of the compartment 1100, for example. The cavity 1431 may extend substantially through the housing to form a through hole, or the cavity 1431 may partially extend from the lower surface toward the upper surface to form a recess.

15A-15C show various embodiments of a cartridge 200 having an elongated housing. For example, the cartridge 200 may be used in the carburetor 900 shown in FIGS. 9 to 12 by inserting the cartridge 200 into the body 910 of the carburetor 900 through the charging hole 940. .

In FIG. 15A, the cartridge 200m includes an elongated housing defining an opening 1510. The elongated housing may be substantially cylindrical. The opening 1510 may be formed in the sidewall of the elongated housing in the form of an elongated slot as shown in FIG. 15A.

In Fig. 15B, the cartridge 200n includes an elongated housing defining a plurality of openings 1512. The elongated housing may be substantially cylindrical. The plurality of openings 1512 may be formed in the sidewall of the elongated housing as a series of apertures. For example, the plurality of openings 1512 may be substantially uniformly distributed along the sidewall of the elongated housing.

In Fig. 15C, the cartridge 200p includes a gas permeable member 1515. For example, the elongated housing may be formed by a substantially gas permeable member 1515. In another example, the gas permeable member 1515 may substantially cover an outer surface of the housing. For example, the gas permeable member 1515 may cover the sidewall of the elongated housing and/or the end face(s) of the elongated housing.

16A shows an embodiment in which the cartridge 200 is provided inside the vaporizer 900. In FIG. 16A, the cartridge 200 is inserted into the body 910 of the vaporizer 900 through the charging hole 940. For example, the cartridge 200 may be fixed to the inner surface of the body 910 by one or more support members 1610. In the illustrated embodiment, each support member of one or more support members 1610 is illustrated as including a sleeve for receiving cartridge 200 and an arm connecting the sleeve to the inner surface of body 910. For example, the support member may be formed using a material having relatively low thermal conductivity, such as a ceramic material. If the cartridge 200 has been provided, the filling hole 940 may be sealed by a sealing member 1620. For example, the sealing member 1620 may be a screw, plug, or other suitable seal.

16B shows another embodiment in which the cartridge 200 is provided inside the vaporizer 900. As shown in FIG. 16B, the cartridge 200 may be connected to the sealing member 1620. For example, the cartridge 200 may be attached to the distal end of the sealing member 1620 by screws, threads, welding, bonding, or the like. In another example, the cartridge 200 may include a sealing member 1620, for example by integrally forming the sealing member 1620 with the cartridge 200. In some embodiments, an insulating material may be provided between the cartridge 200 and the sealing member 1620 to inhibit heat energy transfer between the cartridge 200 and the sealing member 1620. In this way, the temperature of the cartridge 200 can be kept relatively constant.

17 and 18 show a carburetor 1700, and the carburetor 1700 is a linear carburetor provided with a plurality of crucibles 1720a to 1720c. The vaporizer 1700 includes a body 1710 forming an outlet 1740. A plurality of crucibles 1720a to 1720c are disposed inside the body 1710. A cartridge may be provided inside each crucible 1720a to 1720c. In the illustrated embodiment, the first cartridge 200 is provided in the first crucible 1720a, the second cartridge 200' is provided in the second crucible 1720b, and the third crucible 1720c is provided with a third A cartridge 200" is provided. Each cartridge 200, 200', 200" may be provided with a different source material and/or vaporizable coating. For example, in the configuration shown in FIG. 18, the vapor material produced in each cartridge 200, 200 ′, 200 ″ may be mixed together before being discharged through outlet 1740.

In one aspect, a vaporizable source material is provided. The vaporizable source material includes a vaporizable coating disposed on the surface. For example, the surface may be the surface of the carrier member or the surface of the cartridge or crucible.

In some embodiments, the vaporizable coating includes an inorganic material. Examples of such inorganic materials include, but are not limited to, metals, metal alloys, and carbonaceous materials. Examples of metals include aluminum (Al), silver (Ag), copper (Cu), magnesium (Mg), molybdenum (Mo), ytterbium (Yb), zinc (Zn), cadmium (Cd), and mixtures or alloys thereof. have. Another example of a vaporizable coating includes fullerenes. For example, fullerenes may include C ₆₀ , C ₇₀ , C ₇₆ , C ₈₄ , or mixtures thereof.

In some embodiments, the vaporizable coating comprises substantially a metal. For example, the vaporizable coating may comprise substantially pure magnesium. In another embodiment, the vaporizable coating comprises substantially fullerene.

In some embodiments, the vaporizable coating comprises a mixture of metal and fullerene. For example, the vaporizable coating may comprise a mixture of magnesium and fullerene.

In some embodiments, a vaporizable coating may be formed using a physical vapor deposition (PVD) process, such as thermal vaporization. Without wishing to be bound by any particular theory, it is assumed that the purity of the material(s) forming the vaporizable coating may be improved in the process of forming the vaporizable coating, at least in some cases. For example, many commercially available materials generally contain certain amounts of impurities or contaminants. In addition, it has been found that even the presence of a relatively small amount of impurities (eg, ppm or less) in the source material can affect the properties of thin films formed using such materials. It is envisioned that by forming the vaporizable coating using a PVD process, the concentration of at least some impurities present in the starting material may be reduced due to such impurities having a different vaporization temperature than the material for forming the vaporizable coating.

In some embodiments, the surface to which the vaporizable coating is provided is a substantially flat surface. In some embodiments, the surface to which the vaporizable coating is provided is a non-flat surface. For example, a non-flat surface can be a porous surface. In another example, the non-planar surface can be a relatively rough surface with a number of irregular features formed thereon.

In some embodiments, a vaporizable coating may be disposed on the surface of the carrier member. For example, the carrier member may be provided in the form of a sheet, plate, block, cylinder, sphere or other shape. In some embodiments, the carrier member comprises a porous member. For example, the carrier member may be provided in the form of a perforated body, a mesh, a sieve, a porous body, or a combination thereof.

The carrier member generally comprises an inorganic material or a carbon material. For example, the carrier member may comprise metal, graphite and/or ceramic. In some cases, it may be particularly advantageous to provide a carrier member that is non-reactive (eg, inert) at elevated temperatures. For example, the carrier member may be composed of a material that does not substantially (physically or chemically) reacts at the vaporization temperature of the vaporizable coating. Alternatively, or in addition to, the carrier member may be provided with a coating to inhibit this reaction. For example, the material used to form the carrier member and/or the non-reactive coating may exhibit a vaporization temperature higher than the vaporization temperature of the vaporizable coating. Examples of metals that may be used to form the carrier member and/or non-reactive coating include, but are not limited to, tantalum, molybdenum and titanium. In some cases, it may be particularly advantageous to form the carrier member from a material that exhibits a relatively high thermal conductivity. For example, materials with high thermal conductivity generally conduct heat more easily, thus reducing the likelihood that some of the carrier members will be heated to a higher temperature than others.

19A-19F illustrate various embodiments of a carrier member in which a vaporizable coating may be provided.

In FIG. 19A a portion of a planar body 1910 with a substantially flat surface 1912 is shown. For example, the planar body 1910 may be a metal or ceramic plate.

In FIG. 19B, a portion of a mesh body 1920 with a mesh-like surface 1922 is shown. For example, the mesh body 1920 may be formed of a woven metal wire or other woven wire.

In FIG. 19C, a portion of a porous body 1930 having a porous surface 1932 is shown. The porous surface 1932 defines a plurality of cavities or pores 1935. For example, the porous body 1930 may be formed of a ceramic material.

In FIG. 19D, a portion of a perforated body 1940 is shown defining a plurality of perforations 1945. For example, the perforated body 1940 may be provided in the form of a perforated plate or an extruded member. The perforations 1945 may be substantially square or rectangular, as shown in FIG. 19D. However, in other embodiments, perforations 1945 of other shapes, sizes and configurations may be provided. For example, perforations 1945 may be substantially circular, elliptical, elliptical, hexagonal, pentagonal, or other shape.

In FIG. 19E, a portion of a corrugated member 1950 having a corrugated surface 1952 is shown. For example, corrugated surface 1952 includes an alternating series of ridges and grooves formed thereon.

In FIG. 19F, a portion of another corrugated member 1960 having a corrugated surface 1962 is shown. For example, corrugated surface 1962 includes a plurality of protrusions. The protrusion can be, for example, in the shape of a pyramid shown or any other shape and configuration.

20A-20E illustrate cross-sectional views of a carrier member when providing a vaporizable coating thereon in accordance with various embodiments.

In Fig. 20A, a cross section of the planar body 1910 of Fig. 19A is shown. In FIG. 20A, a vaporizable coating 2010 is provided to coat a substantially flat surface 1912.

In FIG. 20B, a cross section of the mesh-like body 1920 of FIG. 19B is shown. In FIG. 20B, a vaporizable coating 2020 is provided to substantially coat the meshed surface 1922. For example, vaporizable coating 2020 may coat the outer surface of an element (eg, a wire) forming mesh-like surface 1922.

In Fig. 20c, a cross section of the porous body 1930 of Fig. 19c is shown. In FIG. 20C, a vaporizable coating 2030 is provided to substantially coat the porous surface 1932. For example, the vaporizable coating 2030 may coat portions of the surface that form pores or cavities 1935 as well as portions of the surface between adjacent pores or cavities 1935. Specifically, the vaporizable coating 2030 may be provided inside the pores or cavity 1935 formed in the surface 1932.

In Fig. 20D, a cross section of the perforated body 1940 of Fig. 19D is shown. In FIG. 20D, a vaporizable coating 2040 is provided to coat the exposed surface of the perforated body 1940. For example, the vaporizable coating 2040 may be provided over portions of the perforated body 1940 forming the perforations 1945 as well as on the upper and lower surfaces.

In Fig. 20E, a cross section of the corrugated body 1950 of Fig. 19E is shown. In FIG. 20E, a vaporizable coating 2050 is provided to coat the corrugated surface 1952 of the corrugated body 1950. For example, the vaporizable coating 2050 may be provided over portions of the corrugated surface 1952 forming ridges and grooves formed thereon.

In some cases, it may be particularly advantageous to provide a vaporizable coating disposed over an uneven surface. Carrier members having a non-flat surface such as a mesh-like surface, a porous surface, a perforated surface and/or a corrugated surface generally exhibit a relatively large carrier surface area to volume ratio (SA:V). Such a carrier element may be particularly desirable for depositing a vaporizable coating thereon, because a higher amount of vaporizable coating surface is a higher carrier SA:V, for a given amount of vaporizable material coated on the surface. , Because it can be exposed. That is, the surface area to volume ratio of a carrier is generally directly related to the surface area to volume ratio of the vaporizable coating deposited thereon.

In some embodiments, it may be particularly desirable to provide a vaporizable coating that exhibits a relatively high surface area to volume ratio. This is further described with reference to FIG. 21 in which a carrier member 2110 provided with a vaporizable coating 2120 is shown. As shown in FIG. 21, a portion of the vaporizable coating 2120 disposed close to the exposed surface 2122 of the vaporizable coating is indicated by 2131 (also referred to as the proximal portion 2131), and the exposed surface 2122 A portion of the vaporizable coating 2120 disposed away from is indicated as 2133 (also referred to as the distal portion 2133). Exposed surface 2122 is generally the surface of vaporizable coating 2120 exposed to a reduced pressure environment (eg, a vacuum environment) during the PVD process. As will be appreciated, any gaseous material resulting from vaporizing the material forming the vaporizable coating 2120 can move relatively undisturbed in such a reduced pressure environment. The average diffusion distances from the proximal portion 2131 and the distal portion 2133 are denoted D1 and D2, respectively. For clarity, it will be appreciated that the average diffusion distance generally refers to the average distance a vaporized material (eg, a gaseous material) travels to reach the exposed surface 2122.

Heating element 2160 is provided to heat and vaporize vaporizable coating 2120. As shown in FIG. 21, based on the relative arrangement of the heating elements 2160, the proximal portion 2131 disposed closer to the heating element 2160 is generally to a greater extent than the distal portion 2133 (e.g., It can be seen that it will heat up faster and/or to a higher temperature). Moreover, any gaseous material produced by vaporizing the vaporizable material disposed in the proximal portion 2131 has an average diffusion distance D1, which is less than the average diffusion distance D2 of the distal portion 2133. Without wishing to be bound by any particular theory, a portion of the vaporizable coating 2120 heated to a greater degree and positioned to have a shorter average diffusion distance is the portion of the coating 2120 heated to a lesser degree and positioned to have a larger average diffusion distance. It is assumed that it will vaporize more preferentially than some. It is further contemplated that this preferential vaporization of the vaporizable coating 2120 may result in a change in the total area of the exposed surface 2122. For example, such changes in the total area of the exposed surface 2122 can lead to non-uniform vaporization rates during the PVD process, which is generally undesirable. It is contemplated that by increasing the SA:V of the vaporizable coating, the thickness of the vaporizable coating can be reduced for a given amount (eg, mass) of the material for forming the vaporizable coating. In this way, the vaporizable coating can be heated more evenly and the mismatch in the average diffusion distance between different parts of the coating can also be reduced. It is further contemplated that the construction of such a vaporizable coating can provide relatively stable vaporization of the material forming the vaporizable coating by keeping the total area of the exposed surface relatively constant for a long period of time during the PVD process.

While some embodiments have been illustrated in which a vaporizable coating is provided over a planar or substantially planar surface, it will be understood that the vaporizable coating may similarly be provided over a non-planar surface. For example, such surfaces may be curved or curved or folded.

In some examples, various features provided on a non-planar surface may be a structure that repeats periodically. For example, substantially identical features may be arranged in a repeating pattern to form a non-planar surface. In another example, features provided on a non-planar surface may be substantially random or pseudo-random. For example, features may be substantially random in shape, size, distribution, and/or other configuration.

In one aspect, a cartridge is provided, the cartridge comprising a housing and one or more carrier members arranged within the housing. Each carrier member of the at least one carrier member comprises a surface coated with a vaporizable coating. This cartridge may be for use in a PVD device and/or process. In some embodiments, the housing of such a cartridge may be configured to receive a heating element therein. In another embodiment, the cartridge may be configured to be heated by a heating element arranged outside the housing.

22 is a schematic diagram of a cartridge 2200 according to one embodiment. In FIG. 22, cartridge 2200 includes a housing 2210 defining an outlet 2220. One or more carrier members 2240 are disposed inside the housing 2210. In some embodiments, one or more spacers 2242 may be provided between adjacent carrier members 2240. In the embodiment illustrated in FIG. 22, one or more carrier members 2240 are arranged substantially parallel to outlet 2220. 23 is a schematic view of another embodiment of a cartridge 2200, wherein one or more carrier members 2240 are arranged substantially perpendicular to outlet 2220.

24 is a schematic diagram of a cartridge 2400 according to one embodiment, provided with a substantially cylindrical housing 2410 defining an outlet 2420. One or more carrier members 2440 are shown disposed within housing 2410 and arranged to be in a vertically stacked configuration. One or more spacers or support members may be provided within the cartridge 2400 to space and/or support the carrier members 2440 from each other. FIG. 25 shows a top cross-sectional view of the cartridge 2400 shown in FIG. 24.

26 is a plan view of a cartridge 2600 according to another embodiment, in which one or more carrier members 2640 are arranged in a radial direction and disposed within a housing 2610. For example, one or more carrier members 2640 may be arranged such that such carrier members 2640 are radially distributed about the central support member 2660. In some embodiments, the central support member 2660 may be provided in the form of a filled rod. In another embodiment, the central support member 2660 may be provided in the form of a hollow rod. As further shown in FIG. 27, the central support member 2660 provided in the form of a hollow rod may form a space or recess 2662 for receiving a temperature control element (not shown). Examples of such temperature control elements include, but are not limited to, heating elements and cooling elements. It is contemplated that the radial arrangement of one or more carrier members 2640 about the central support member 2660 facilitates heating and/or cooling of the carrier member 2640 to achieve a more uniform temperature profile.

28 shows an embodiment of a cartridge 2800 in which the housing 2810 is provided in the form of a hollow triangular prism. The housing 2810 is provided with an outlet 2820. One or more carrier members 2840 are provided within the housing 2810.

FIG. 29 shows another embodiment of a cartridge 2900 in which the housing 2910 is provided in the form of a hollow triangular prism having a through hole 2912 extending therethrough. An outlet 2920 is provided in the housing 2910. One or more carrier members 2940 are provided within the housing 2910.

30 shows an embodiment in which a non-planar carrier member 3040 accommodated in the housing 3010 is provided in the cartridge 3000. For example, the carrier member 3040 may be a rigid carrier member formed in a non-planar configuration, or the carrier member 3040 may be a flexible carrier member bent or folded in such a non-planar configuration.

In one aspect, a cartridge is provided comprising a housing, at least a portion of the housing surface coated with a vaporizable coating. The housing may form an inner surface and an outer surface. In some embodiments, the outer surface of the housing may be coated with a vaporizable coating. In another embodiment, the inner surface of the housing may be coated with a vaporizable coating. In some embodiments, both the inner and outer surfaces of the housing may be coated with a vaporizable coating.

31A-31D illustrate various embodiments of a cartridge 3100 in which the housing 3110 forms an inner surface 3112 and an outer surface 3114. A vaporizable coating 3140 is disposed over a portion of the inner surface 3112. In one embodiment according to FIG. 31A, vaporizable coating 3140 coats a lower portion of inner surface 3112. In another embodiment according to FIG. 31B, the vaporizable coating 3140 substantially coats a lower portion, a side portion and an upper portion of the inner surface 3112. In another embodiment according to FIG. 31C, the housing 3110 includes a protrusion 3120 extending into the chamber formed by the housing 3110, and the vaporizable coating 3140 coats the protrusion 3120. In another embodiment according to FIG. 31D, a side portion of the inner surface 3112 is coated with a vaporizable coating 3140.

32A and 32B show an embodiment of a cartridge 3200 in which the housing 3210 is provided in the form of a hollow triangular prism. The housing 3210 defines a plurality of outlets 3220 that allow vapor material generated from vaporization of the vaporizable coating 3240 to escape. For example, the plurality of outlets 3220 may be arranged along the vertices of the housing 3210. The housing 3210 may optionally form a through hole 3212 extending substantially therethrough. For example, the through hole 3212 may be configured to receive a temperature control element (eg, a heating element) therein. As further illustrated in FIG. 32B showing a cross-sectional view of cartridge 3200, the inner surface of housing 3210 may be coated with a vaporizable coating 3240. Although not specifically shown, in some embodiments, a portion of the housing 3210 forming the through hole 3212 may also be coated with a vaporizable coating 3240.

33A and 33B show another embodiment of a cartridge 3300 in which a housing 3310 is provided with an elongated outlet 3320. For example, the elongated outlet 3320 may extend substantially from one longitudinal end of the housing 3310 to the other end. In another example, the elongated outlet 3320 can extend over a portion of the housing 3310. The housing 3310 may optionally form a through hole 3312 extending substantially through itself.

34A shows the arrangement of the cartridge 3200 in the vaporizer 3400 according to an embodiment. In FIG. 34A, the heating element 3440 of the vaporizer 3400 is received in the through hole 3212 of the cartridge 3200. In this arrangement, the housing 3210 and the vaporizable coating 3240 of the cartridge 3200 can be heated by the heating element 3440 to vaporize the vaporizable coating 3240 to produce a vapor material. The vapor material can then be delivered through one or more outlets (not shown). In some embodiments, the housing 3210 of the cartridge 3200 may also serve as a housing for various components of the carburetor 3400.

In another embodiment shown in FIG. 34B, the carburetor 3400' includes a casing 3410 for forming a housing of the carburetor 3400'. In this configuration, the cartridge 3200 is housed in a chamber formed by the casing 3410. The heating element 3440 may be provided to extend through the through hole 3212. Casing 3410 may optionally include a portion for receiving heating element 3440.

35A and 35B show an embodiment in which a carrier member 3510 is provided and the outer surface 3512 of the carrier member 3510 is coated with a vaporizable coating 3540. The carrier member 3510 may be provided in the form of a rod. For example, the vaporizable coating 3540 can be provided around substantially the entire circumference of the rod-shaped carrier member 3510.

FIG. 36 shows another embodiment in which the carrier member 3610 is provided with a plurality of ribs 3615 formed in the outer surface 3612. The plurality of ribs 3615 may extend radially outward, and the ribs 3615 may be spaced apart from each other along the longitudinal axis of the carrier member 3610. The vaporizable coating 3640 is provided to substantially coat the outer surface 3612 of the carrier member 3610, including the surface of the ribs 3615. In some embodiments, ribs 3615 may be formed in a continuous spiral (eg, thread).

37 shows another embodiment in which the carrier member 3710 is formed as a hollow tubular member. Specifically, the carrier member 3710 defines an outer surface 3712 and an inner surface 3715. The recess 3718 is formed by the inner surface 3715 of the carrier member 3710. The outer surface 3712 of the carrier member 3710 is coated by a vaporizable coating 3740. For example, recess 3718 can be configured to receive a temperature control element, such as a heating element. In some embodiments, recess 3718 may extend substantially through carrier member 3710. In another embodiment, the recess 3718 extends partially through the carrier member 3710.

For example, the rod-shaped carrier members 3510, 3610, and 3710 coated with the vaporizable coating according to the embodiments of FIGS. 35A to 37 may be disposed in the vaporizer. For example, referring now to the embodiment illustrated in FIGS. 16A and 16B, the rod-shaped carrier members 3510, 3610 and 3710 may be disposed inside the carburetor 900 through the charging hole 940. In another example, the rod-shaped carrier members 3510, 3610, and 3710 coated with the vaporizable coating according to the embodiments of FIGS. 35A to 37 may be accommodated in the cartridge. 38 shows an embodiment of a cartridge 3800, wherein the housing 3810 of the cartridge 3800 is provided with one or more rod-shaped carrier members 3840. Each carrier member 3840 is coated with a vaporizable coating.

39 shows an embodiment of a cartridge 3900 having a substantially annular cylindrical body 3901. 40 is a cross-sectional view of a cartridge 3900 arranged inside a vaporizer according to an embodiment. The body 3901 of the cartridge 3900 includes an upper portion 3910, a lower portion 3912, and an inner portion 3922 extending between the inner edge and lower portion 3912 of the upper portion 3910, and an upper portion. It is formed by an outer portion 3920 extending between the outer edge of 3910 and the lower portion 3912. The inner portion 3922 defines an opening 3930. In some embodiments, the upper portion 3910 may be formed by an impermeable member such that vapor material cannot permeate through the portion. The lower portion 3912 can also be formed by an impermeable member. For example, the upper portion 3910 and/or the lower portion 3912 may be formed of a substantially solid member formed by, for example, metal or ceramic. The inner portion 3922 and the outer portion 3920 may be formed of a gas permeable member. Examples of such gas permeable members include, but are not limited to, screens, perforated plates, membranes, meshes, sieves, porous members (including porous ceramic members), and combinations thereof. The gas permeable member is generally configured to allow the vaporized source material to pass through it while inhibiting the passage of the solid material. The body 3901 of the cartridge 3900 forms a chamber 3950 for receiving the source material to be vaporized. For example, the source material can be provided in the form of a vaporizable coating or in a dispersible form. Examples of dispersible forms of the source material include powders, pellets and granules. As shown in FIG. 40, one or more heating elements 4010 may be arranged to heat cartridge 3900. For example, one or more heating elements 4010 may be provided within aperture 3930 and/or adjacent to outer portion 3920. According to the arrangement and configuration of the cartridge 3900, the vapor material generated by vaporizing the source material contained in the chamber 3950 can be selectively discharged through the gas-permeable inner portion 3922 and the outer portion 3920. Able to know. Specifically, vapor material is substantially inhibited from being discharged or delivered through the upper portion 3910. In this way, the likelihood that any particles, which may also be referred to as “spatter” or “spitting,” will be ejected from the cartridge 3900 is reduced, at least for certain materials.

In some embodiments, the cartridge 3900 may be provided with an additional member. In a further embodiment, the cartridge 3900 further comprises an additional annular cylindrical body. For example, such an additional annular cylindrical body may be arranged concentrically around the body 3901. In this embodiment, an additional annular cylindrical body may be disposed radially away from the body 3901. A gap may be provided between the body 3901 and this additional annular cylindrical body to accommodate the heating element 4010 and any additional heating elements that may be provided.

In one embodiment, a cartridge is provided, and the cartridge comprises a housing. The housing defines a chamber for receiving the vaporizable material. An opening is formed in the housing to allow vapor flux of the vaporizable material to exit the chamber. In some embodiments, a baffle is arranged inside the chamber. The baffle is configured such that at least a portion of the vapor flux enters the baffle prior to expelling the vapor flux through the aperture. Cartridges can be used within or in conjunction with PVD devices.

41 shows a cartridge 4100 according to one embodiment. The cartridge 4100 includes a housing 4110 having one or more apertures 4120 to allow permeation of vapor through it. In the illustrated embodiment, the housing 4110 is a substantially cylindrical housing. Referring to FIG. 42A, a cross-sectional view of the cartridge 4100 is shown along line III-III. In the illustrated embodiment, the housing 4110 includes a receptacle portion 4112 and a cap portion 4113. The housing 4110 defines an inner surface 4117 and an outer surface 4118, which may be provided by the receptacle portion 4112 and corresponding surfaces of the cap portion 4113. The chamber 4240 is formed by the housing 4110. For example, the chamber 4240 may be formed by the receptacle portion 4112 and the inner surface 4117 of the cap portion 4113. One or more apertures 4120 are shown formed in the cap portion 4113 of the housing 4110. In the specifically illustrated embodiment, each aperture of one or more apertures 4120 extends between an inner opening 4127 provided in the inner surface 4117 and an outer opening 4128 provided in the outer surface 4118 In this way, the vaporizable material (not shown) may be transmitted through one or more apertures 4120 to be discharged from the chamber 4240. The cartridge 4100 further includes a baffle 4220. In some embodiments, baffles 4220 are arranged within chamber 4240 to reduce or inhibit the flow of vapor flux through one or more apertures 4120. For example, the baffle 4220 may be configured to block at least a portion of the vapor flux from reaching the inner opening 4127. For example, the baffles 4220 may be arranged adjacent to and spaced apart from the inner opening 4127. In the illustrated embodiment, baffle 4220 includes a blocking portion 4222 that extends substantially laterally to cover inner opening 4127. A gap 4230 is provided between the opening 4127 and the blocking portion 4222 of the baffle 4220 so that the vapor reaches the opening 4127 and exits the chamber 4240 through one or more apertures 4120. can do. However, due to the arrangement and configuration of the baffles 4220 for the one or more apertures 4120, direct line of sight from the vaporizable material (not shown) contained in the chamber 4240 to the one or more apertures 4120 is substantially prevented. . Accordingly, at least a portion of the vapor flux generated from the chamber 4240 is incident on the baffle 4220 and exits through the one or more apertures 4120 before reaching the inner opening 4127. Without wishing to be bound by any particular theory, it is assumed that such a configuration can increase the average holding time of the vapor flux inside the cartridge 4100 and thus reduce the average free path of the vapor flux material. As a result, it is further assumed that the likelihood of any particle (e.g., spatter) or cluster of atoms or molecules exiting through one or more apertures 4120 is reduced, because such particles or clusters are generally This is because it collides with the surface of the housing 4110 prior to reaching the inner opening 4127, thereby increasing the likelihood that these particles or clusters will decompose or spray due to such collision. As can be appreciated, the release of these particles or clusters is generally very undesirable during the thin film formation process because depositing these particles or clusters on the target substrate can cause defects to form and in some cases cause device failure. Because there is. Additionally, limiting the vapor flow through one or more apertures 4120 in this manner increases the partial pressure of the vapor flux material inside the cartridge 4100, and the stability of the rate at which the vapor flux exits the cartridge 4100. It is additionally assumed that it can be improved. For example, the baffle 4220 may be a substantially annular member.

In some embodiments, the cartridge 4100 further includes a spacer 4250. For example, the spacer 4250 may be provided on the outer surface 4118 of the housing 4110. The spacer 4250 may be provided on and integrally formed with the bottom surface 4116 of the receptacle portion 4112. Spacers 4250 are generally provided to insulate the cartridge 4100 from the cartridge 4100 by limiting or inhibiting heat conduction between the elements of the PVD system (eg, crucibles or heaters). For example, the spacer 4250 may include a material exhibiting relatively low thermal conductivity. In some embodiments, spacer 4250 is configured to physically support or retain cartridge 4100 in an operative configuration. For example, in use, the cartridge 4100 may be placed inside the crucible of the PVD system in an upright direction so that the cartridge 4100 is supported and held in an upright direction (e.g., in an operative configuration) by a spacer 4250. . In this example, the spacer 4250 may be configured to reduce the total surface area of the cartridge 4100 in direct physical contact with the crucible to inhibit heat conduction between the cartridge 4100 and the crucible. For example, the spacer 4250 may protrude from the bottom surface 4116 and exhibit a tapered profile to reduce the contact area with the crucible while providing sufficient structural integrity to support the cartridge 4100. .

42B shows a cross-sectional view of a cartridge 4100' according to an embodiment in which the baffle 4220 includes one or more through holes 4226 for allowing the passage of vapor. For example, one or more through holes 4226 may be oriented substantially vertically with respect to one or more apertures 4120, and the vapor flux generated inside the chamber 4240 collides with the surface of the cartridge 4100'. May be arranged to substantially inhibit exit through one or more apertures 4120 without. For example, one or more through holes 4226 may be arranged between the blocking portion 4222 of the baffle 4220 and the one or more apertures 4120.

42C shows a cross-sectional view of a cartridge 4100 ″ according to another embodiment in which the blocking portion 4222 ″ of the baffle 4220 ″ is flared radially outward. In the illustrated embodiment, the blocking portion 4222 ″ extends downwardly and radially outward from the cap portion 4113 at an angle that generally forms a conical blocking portion. A gap 4230 may be provided between the conical blocking portion 4222 ″ and one or more apertures 4120 formed in the cap portion 4113.

43A and 43B illustrate bottom views of cartridges 4100 and 4100"' according to various embodiments. In FIG. 43A, the bottom surface 4116 of the cartridge 4100 includes a substantially annular spacer 4250. In FIG. 43B, the bottom surface 4116 of the cartridge 4100"' includes a plurality of spacers 4250, and the spacers 4250 are arranged to be spaced apart from each other.

In some embodiments, the cartridge 4100 further includes a vaporizable material contained therein. For example, a vaporizable material may be provided inside the chamber 4240.

44A shows an embodiment in which the vaporizable material is provided in the form of a vaporizable coating 4420. For example, the vaporizable coating 4420 may coat the inner surface 4117. As described above, in some embodiments, baffles 4220 are arranged between vaporizable coating 4420 and inner openings 4127 of one or more apertures 4120.

44B shows an embodiment in which one or more carrier members 4440 are arranged inside the chamber 4240. As described above, at least one carrier member 4440 is provided with a vaporizable coating 4420.

44C shows an embodiment in which a vaporizable material 4241 is provided in the chamber 4240. For example, the vaporizable material 4241 may be a single integral or continuous structure. In the illustrated embodiment, an inner spacer 4419 is provided on the inner surface 4117 to form a gap 4118 between the vaporizable material 4241 and the inner surface 4117 of the receptacle portion 4112. For example, a gap 4118 may be provided between a substantially vertically oriented surface of vaporizable material 4241 and a substantially vertical portion (eg, sidewall) of the inner surface 4117. In such an arrangement, for example, the gap 4118 is a substantially vertical vapor stream that is generated by vaporizing the vaporizable material 4241 through which the vapor stream can move through it, before exiting through the one or more apertures 4120. Provide a channel. Without being bound by any particular theory, it is assumed that at least some of the contaminants that may be included in the vaporizable material 4241 may be discharged during the thermal vaporization process. By providing the gap 4118, at least some of such contaminants generated during vaporization of the vaporizable material 4241 can fall through the gap 4118 and accumulate near the bottom of the chamber 4240 of the cartridge 4100, and Thus, the likelihood of such contaminants exiting the cartridge 4100 and depositing on the target substrate is reduced. In some embodiments, an inner spacer 4419 may be provided on the bottom portion of the inner surface 4117 to provide a gap or physical separation between the bottom surface and the inner surface 4117 of the vaporizable material 4241. For example, these gaps can provide space for contaminants to accumulate without significantly affecting the vaporization process. In some embodiments, vaporizable material 4241 may include one or more cavities or through holes. For example, such cavities or through holes can extend substantially vertically to provide additional surface area from which a vapor stream can be produced.

44D shows an embodiment in which a plurality of vaporizable materials 4241 are provided within the chamber 4240. For example, each vaporizable material 4241 may have a rod, plate, disk, block, or other shape. In some embodiments, vaporizable material 4241 is oriented substantially vertically. For example, each vaporizable material 4241 can be spaced apart from each other to provide an additional surface area upon which a vapor stream can be produced upon heating.

45 shows a cartridge 4500 according to another embodiment. Cartridge 4500 includes a housing 4510 having one or more apertures 4520 formed therein. FIG. 46 shows a cross-sectional view of cartridge 4500 taken along line IV-IV of FIG. 45. As further shown in FIG. 46, the housing 4510 includes a receptacle portion 4512 and a cap portion 4513. The housing 4510 defines an inner surface 4517 and an outer surface 4518 that may be provided by the corresponding surfaces of the receptacle portion 4512 and the cap portion 4513. The chamber 4650 is formed by the housing 4510. For example, chamber 4650 may be formed by receptacle portion 4512 and inner surface 4517 of cap portion 4513. One or more apertures 4520 are shown formed in the cap portion 4513 of the housing 4510. One or more carrier members 4640 are disposed within the chamber 4650. In some embodiments, one or more carrier members 4640 are arranged correspondingly with respect to one or more openings 4520 such that each carrier member 4640 is disposed substantially aligned with each corresponding opening 4520. . For example, in such an arrangement, the central axis of the carrier member 4640 may be substantially aligned with the central axis of the corresponding aperture 4520. In some embodiments, one or more carrier members 4640 may be configured to act as a baffle by restricting vapor flow out of the cartridge 4500 from the chamber 4650 through the one or more apertures 4520. have. For example, each carrier member 4640 has a restriction portion disposed close to the corresponding aperture 4520 to substantially prevent a direct line of sight from a vaporizable material (not shown) to one or more apertures 4520. It may include (4642). Thus, at least a portion of the vapor flux generated from chamber 4650 is incident on one or more carrier members 4640 prior to being discharged through one or more apertures 4520. For example, the limiting portion 4462 may include a surface of the carrier member 4640 arranged proximate the corresponding aperture 4520. The limiting portion 4462 is apertured by a gap to allow vapor generated inside the chamber 4650 to escape through the aperture 4520 while substantially preventing a direct line of sight from the vaporizable material to the aperture 4520. Can be separated from (4520). Without wishing to be bound by any particular theory, it is assumed that such an arrangement may contribute to improving the stability of the rate at which the vapor flux exits through one or more apertures 4520.

In the embodiment shown in FIG. 46, each of the one or more carrier members 4640 is a substantially cylindrical member. However, it will be appreciated that a variety of other configurations and shapes of carrier member 4640 may also be used. In some embodiments, one or more carrier members 4640 are thermally coupled to housing 4510 of cartridge 4500. For example, a threaded hole for fixing one or more carrier members 4640 to the inner surface 4517 of the receptacle portion 4512 may be provided. For example, one or more of the carrier members 4640 may include a thermally conductive material to achieve relatively uniform heating of the various parts or elements of the cartridge 4500. For example, in this way, the vaporizable material contained inside the cartridge 4500 can be evenly heated to reduce the likelihood of creating a hot spot or overheating a portion of the vaporizable material. In some embodiments, one or more carrier members 4640 may be integrally formed with receptacle portion 4512 or cap portion 4513 of housing 4510.

One or more carrier members 4640 are generally configured to support or receive a vaporizable material. For example, such vaporizable material may be provided on one or more carrier members 4640 in the form of a vaporizable coating. In some embodiments, a vaporizable coating may be further provided on the inner surface 4517 of the housing 4510. 47 shows an embodiment in which the vaporizable coating 4720 is disposed on the surface of one or more carrier members 4640 and on the inner surface 4517 of the housing 4510.

In some embodiments, the surface on which the vaporizable coating is disposed is arranged non-horizontal to the direction of gravity. For example, the surface on which the vaporizable coating is disposed is arranged substantially perpendicular to the direction of gravity, such that it is substantially parallel to the direction of gravity. Thus, in some embodiments in which the cartridge contains a vaporizable coating, the vaporizable coating may be disposed on a surface oriented substantially vertically in the operating configuration of the cartridge. Without being bound by any particular theory, it is assumed that at least some of the contaminants contained in the vaporizable coating may be released during the thermal vaporization process. By placing the vaporizable coating on a substantially vertical surface, at least some of such contaminants can accumulate near the bottom of the cartridge chamber, thus reducing the likelihood that such contaminants will exit the cartridge and deposit on the target substrate. I assume. Moreover, by placing the vaporizable coating on a substantially vertical surface, it is possible to prevent such contaminants from redepositing to the vaporizable coating surface.

47 shows an embodiment in which the cartridge 4500 includes a vaporizable coating 4720. The vaporizable coating 4720 is illustrated as being disposed on the inner surface 4517 of the receptacle portion 4512 of the housing 4510 and the surface of one or more carrier members 4640.

In one aspect, a method of vaporizing a vaporizable coating is provided. The method includes providing a carrier surface coated with a vaporizable coating, and heating the vaporizable coating to vaporize the vaporizable coating. Vapor materials can be produced by vaporizing the vaporizable coating. In some embodiments, the carrier surface is provided by one or more carrier members. In another embodiment, one or more carrier members are disposed within the housing of the cartridge. In some other embodiments, the carrier surface is provided by the surface of the housing of the cartridge. For example, this surface can be an inner surface or an inner surface of the housing.

48A shows an embodiment in which the cartridge 4800 includes a housing 4810 including a tapered portion. For example, in the illustrated embodiment, the housing 4810 is tapered such that the base portion 4811 of the housing 4810 is narrower than the top portion 4813 of the cartridge 4800. The housing 4810 of the cartridge 4800 further includes an aperture 4820 formed in the top portion 4813.

48B shows an embodiment where the housing 4810 of the cartridge 4800' is tapered at the base portion 4811 to form a conical housing 4810. The upper portion 4813 of the housing 4810 is configured wider than the base portion 4811, and the upper portion 4813 is provided with an aperture 4820.

For example, the cartridges 4800 and 4800' according to the embodiment of FIGS. 48A and 48B may be configured to fit inside a correspondingly shaped crucible for use in a PVD system.

In one aspect, a system for depositing a thin film coating on a surface is provided. In accordance with some embodiments, a system includes a cartridge, a vaporizable material disposed therein, and a heating element configured to heat the cartridge to vaporize the vaporizable material to produce a first vapor stream. The cartridge includes a receptacle for receiving a vaporizable material, an aperture configured to allow vapor to be expelled from the cartridge, a gas permeable member, and a baffle arranged in the vapor path between the gas permeable member and the aperture. In some embodiments, the system is configured such that the first vapor stream is condensed onto the gas permeable member to form an intermediate coating on the gas permeable member. The intermediate coating is regasified to produce a second vapor stream. Then, a second vapor stream is discharged through the aperture.

49 shows a cartridge 4900 according to one embodiment. The cartridge 4900 includes a housing 4910 and one or more apertures 4920 for allowing vapor to exit from the cartridge 4900. 50A shows a cross-sectional view of the cartridge 4900 taken along the line V-V shown in FIG. 49.

As shown in FIG. 50A, cartridge 4900 includes a receptacle or chamber 4940 formed by a housing 4910 configured to receive a vaporizable material therein. The cartridge 4900 includes a sleeve 4915 that is fitted and inserted into the housing 4910. The sleeve 4915 includes a cavity portion 4911 defining a cavity 4970 for receiving a gas permeable member 4991 therein. The cap portion 4913 is fitted and inserted into the sleeve 4915, and the cap portion 4913 includes a baffle 4930 and forms an aperture 4920. The housing 4910, the sleeve 4915, and the cap portion 4913 may be collectively referred to as the body of the cartridge 4900. The cavity 4970 is connected to the receptacle 4940 through a first opening 4971 formed in the bottom portion of the cavity 4970 (and formed in the bottom of the cavity portion 4991 ). A second opening 4973 is also provided in the upper portion of the cavity 4970 (and formed at the top of the cavity portion 491) whereby the vapor flows toward the cap portion 4913 and exits through the aperture 4920 Make it possible. The auxiliary gas permeable members 4959 and 4963 are provided in the first opening 4971 and the second opening 4973, respectively. In the illustrated embodiment, the auxiliary gas permeable members 4963 and 4963 and the gas permeable member 4951 are arranged such that any vapor traveling from the receptacle 4940 to the aperture 4920 is incident on these members. Additionally, the baffle 4930 is provided with the baffle 4930 before any vapor moving from the cavity 4970 through the second opening 4973 toward the cap portion 4913 is discharged through the aperture 4920. It is arranged with respect to the second opening 4973 to be incident on. For example, in the illustrated embodiment, baffle 4930 includes a substantially laterally extending obstruction portion 4932 to inhibit direct flow of vapor to aperture 4920. Due to the arrangement and configuration of the baffles 4930 with respect to the aperture 4920 and the second opening 4973, a direct line of sight from the second opening 4973 to the aperture 4920 is substantially prevented.

Without wishing to be bound by any particular theory, it is assumed that such a configuration may increase the average retention time of the vapor flux inside the cartridge 4900, thereby reducing the average free path of the vapor flux material. As a result, it is further assumed that the likelihood that any particle (e.g., spatter) or cluster of atoms or molecules will be ejected through one or more apertures 4920 is reduced, because any such particle or cluster This is because before being discharged, it generally collides with the surface of the cartridge 4900. In addition, this arrangement of the gas permeable members 4959, 4951 and 4963, in particular in combination with the baffle 4930, reduces the likelihood that contaminants (which may be present in the vaporizable material) are discharged from the cartridge 4900 during the vaporization process I assume. For example, particles generated in the receptacle 4940 as well as any contaminants in the non-vapor phase can be substantially inhibited from entering the cavity 4970 due to the presence of the auxiliary gas permeable member 4959. The arrangement of the gas permeable member 491 and the auxiliary gas permeable member 4963 and the baffle 4930 creates a serpentine path so that spatters generated at or near the cavity 4970 can pass through the aperture 4920. By suppressing discharge, the likelihood of such contaminants and particles being discharged from the cartridge 4900 is further reduced.

50B shows an embodiment in which the cartridge 4900 is provided with a plurality of gas permeable members 4951a, 4951b, 4951c. In this embodiment, the vapor generated by vaporizing a vaporizable material (not shown) in the receptacle 4940 comprises the first gas-permeable member 4951a, the second gas-permeable member 4991b, and the third gas-permeable member 4991c. Pass sequentially. In some embodiments, the gas permeable members 4951a, 4951b, and 4951c may be configured to have different finenesses. For example, the third transparent member 4991c may be finer than the second transparent member 4991b, which is finer than the first transparent member 4991a. For example, vapors traveling through the cavity 4970 may enter the finer gas permeable member. As will be understood, the fineness of the gas permeable members 4951a, 4951b, 4951c is, for example, by pore size (for foam or other porous members), density and/or mesh size (for sieves or meshes). Can be determined.

The operation of the cartridge 4900 in a PVD system is shown in FIGS. 51A and 51B. Referring to Fig. 51A, there is shown a cartridge 4900 according to the embodiment of Fig. 50A. The cartridge 4900 contains a vaporizable material in the form of a vaporizable coating 5110 provided within the receptacle 4940. For example, the vaporizable coating 5110 is disposed directly on the inner surface 4917 of the housing 4910. In another embodiment, a vaporizable coating 5110 may be provided on the surface of the carrier member. In some embodiments, vaporizable coating 5110 is provided on a substantially vertically oriented surface (eg, a vertical portion of inner surface 4917). A heating element 5101 is provided to the system to heat the cartridge 4900. The system is configured to vaporize the vaporizable coating 5110 when heating the cartridge 4900 to produce a first vapor stream. For example, a first vapor stream can be produced when the vaporizable coating 5110 is heated to a first temperature. For example, the first temperature may generally correspond to the sublimation temperature of the material for forming the vaporizable coating 5110. The first vapor stream is configured to travel from the receptacle 4940 through the first opening 4971 into the cavity 4970. By passing the first vapor stream through the auxiliary gas permeable member 4959, particles or contaminants entrained or otherwise carried in the first vapor stream can be filtered. In some embodiments, the system is configured such that the first vapor stream condenses onto the gas permeable member 4501 to form an intermediate coating (not shown) thereon. For example, the cartridge 4900 may be configured such that the gas permeable member 4501 is heated to a lower temperature than the housing 4910 so that the first vapor stream condenses thereon. In another example, the cartridge 4900 has a temperature and gas permeability of the receptacle 4940, such that the partial pressure or vapor pressure of the vaporizable material in the receptacle 4940 is different from the partial pressure or vapor pressure of the vaporizable material in the cavity 4970. Even when the temperature of the member 4501 is substantially similar, it may be configured such that the first vapor stream is condensed on the gas permeable member 491. In some embodiments, the temperature of the gas permeable member 4501 can be varied in different portions to create a temperature gradient. For example, a portion of the gas permeable member 491 disposed proximate to the cap portion 4913 may be at a higher temperature than other portions disposed proximate to the first opening 4971. For example, this temperature gradient may occur due to a large thermal load that is applied to the cap portion 4913 and conducts or radiates toward the portion of the gas permeable member 491 proximate the cap portion 4913. The system is configured such that the intermediate coating is vaporized from the gas permeable member 491 to produce a second vapor stream. For example, the gas permeable member 4501 can be configured to be heated at a second temperature to produce a second vapor stream. In some embodiments, the second temperature is lower than the first temperature. Nevertheless, the second temperature may be sufficient to vaporize the intermediate coating. The second vapor stream then passes through the second opening 4973 and an auxiliary gas permeable member 4963 provided therein. In this way, passage of any particles or impurities through the auxiliary gas permeable member 4963 can be substantially suppressed. The second vapor stream exits the cavity 4970 through the second opening 4973 and enters the baffle 4930 before exiting through the opening 4920. In some embodiments, the baffle 4930 is configured to substantially suppress the direct line of sight between the gas permeable member 491 and the aperture 4920, such that, before substantially all of the second vapor stream is discharged, the cartridge He was entered as part of (4900). A second vapor stream exiting the cartridge 4900 may be deposited on a substrate (not shown) to form a thin film layer or device.

51B shows another embodiment in which the vaporizable material 5110 is provided as a single integral or continuous structure. For example, the vaporizable material 5110 may be in the form of a toroid or an open cylinder. The vaporizable material 5110 includes a substantially vertically oriented surface 4981 and a non-vertically oriented surface 4883, and the surface area corresponding to the substantially vertically oriented surface 481 is non-vertically oriented. For example, about 1.1 times or more, about 1.3 times or more, about 1.5 times or more, about 2 times or more, about 5 times or more, or about 10 times or more than the surface area corresponding to the surface 4883.

In some embodiments, the cartridge 4900 is configured to inhibit heat conduction between the housing 4910 and the gas permeable member 491. In some embodiments, the cavity 4970 formed by the sleeve 4915 is spaced apart from the housing 4910. Examples of gas permeable members 491, 4961, 4963 include, but are not limited to, perforated members, meshes, sieves, porous members, or any combination thereof. For example, the transparent members 4991, 4961, and 4963 may be formed of metal or ceramic. In some embodiments, the purity of the material for forming the intermediate coating is greater than the purity of the material for forming the starting vaporizable material.

In some embodiments, the gas permeable member 4501 is a metallic mesh. The metallic mesh may have a mesh size of about 100 or more, about 150 or more, about 200 or more, about 300 or more, about 500 or more, about 600 or more, or about 700 or more. For example, the gas permeable member 4951 may include a metal mesh having a mesh size of about 100 to about 2000.

In some embodiments, aperture 4920 may be configured to improve the uniformity of the vapor flux exiting cartridge 4900. For example, the cartridge 4900 may further include a nozzle connected to or integrally formed with the aperture 4920 for this purpose.

As described above, various embodiments of the apparatus, including a cartridge and a carrier member provided with a vaporizable coating, may, in some embodiments, be used to deposit a conductive coating or portions thereof. Accordingly, in one aspect, a method of manufacturing an optoelectronic device is provided, the method comprising the steps of: (i) providing a substrate, the substrate comprising a first electrode and at least one semiconductor layer disposed over at least a portion of the first electrode. Providing a substrate comprising; And (ii) (a) providing a carrier surface coated with a vaporizable coating; (b) heating the vaporizable coating to produce a vapor stream; And (c) depositing a second electrode on the substrate by exposing the substrate to a vapor stream to deposit the second electrode on the substrate. For example, such an optoelectronic device may be an organic optoelectronic device including an organic light emitting diode (OLED) and an organic photovoltaic device (OPV). In some embodiments, in (c), the surface of one or more semiconductor layers is exposed to a vapor stream to deposit a second electrode on the surface of the one or more semiconductor layers. For example, in the case of an OLED, the one or more semiconductor layers may comprise a light emitting layer or an electroluminescent layer. In some embodiments, the one or more semiconductor layers may include a hole injection layer, an electron blocking layer, a hole transport layer, an electron transport layer, a hole blocking layer, and/or an electron injection layer. In some embodiments, the first electrode may be an anode and the second electrode may be a cathode. For example, the second electrode may be deposited on the surface of the electron injection layer.

As described herein, it will be appreciated that the different features of the various embodiments of the cartridge, carrier member and vaporizable coating may be combined with each other in different ways. In other words, the features described in connection with one embodiment of the cartridge, carrier member or members or vaporizable coating, although not specifically mentioned, apply to other embodiments of the cartridge, carrier member or members and/or vaporizable coating. I can.

As used herein, the terms “substantially”, “substantially”, “approximately” and “about” are used to indicate and describe small deviations. When used in conjunction with an event or situation, this term may refer not only to a case where the event or situation occurs correctly, but also to a case where the event or situation occurs in a close approximation. For example, when used in conjunction with a number, these terms mean a range of deviations of ±10% or less of that value, for example ±5% or less, ±4% or less, ±3% or less, ±2% or less, ±1%. Hereinafter, it may refer to a deviation range of ±0.5% or less, ±0.1% or less, or ±0.05% or less. For example, if the first value is within a deviation range of less than or equal to ±10% of the second value, for example, the first value is ±5% or less, ±4% or less, ±3% of the second value. The first value may be "substantially" equal to the second value if it is within the range of deviations of less than or equal to ±2%, less than ±1%, less than ±0.5%, less than ±0.1%, or less than ±0.05%. have. For example, “substantially” parallel means that the angular deviation from 0° is ±10° or less, for example ±5° or less, ±4° or less, ±3° or less, ±2° or less, ±1° Hereinafter, ±0.5° or less, or less ±0.1° or ±0.05° or less may be indicated.

Additionally, amounts, ratios and other numerical values are sometimes presented herein in range format. These range formats are used for convenience and brevity, and are not only numbers explicitly specified as limits of the range, as well as all individual numbers contained within that range, as if each number and sub-ranges were explicitly specified, or It should be understood flexibly to include subranges.

While the present disclosure has been described with reference to some specific embodiments, various modifications thereof will be apparent to those skilled in the art. Any examples provided herein are included for purposes of describing this disclosure only and are not intended to limit the disclosure in any way. Any drawings provided herein are for the sole purpose of illustrating various aspects of the present disclosure, and are not intended to be exhaustive or limiting of the disclosure in any way. The scope of the patent claims appended in this specification should not be limited by the specific embodiments presented in the above description, and as a whole should be given the broadest interpretation consistent with the present disclosure. The disclosures of all documents cited in this specification are incorporated herein by reference in their entirety.

Claims (34)

As a system for thin film deposition,
(i) the cartridge forming a receptacle for receiving the vaporizable material and forming an aperture configured to allow vapor to escape from the cartridge,
(a) a gas permeable member arranged in a vapor path between the receptacle and the aperture; And
(b) the cartridge comprising a baffle arranged in a vapor path between the gas permeable member and the aperture; And
(ii) a heating element configured to heat the cartridge to vaporize the vaporizable material to produce a first vapor stream,
The system is configured such that the first vapor stream condenses onto the gas permeable member to form an intermediate coating on the gas permeable member,
The system is configured to regasify the intermediate coating to produce a second vapor stream, wherein the second vapor stream exits through the aperture. The method of claim 1, wherein the system is configured to heat the vaporizable material at a first temperature to produce the first vapor stream, and heat the intermediate coating at a second temperature to produce the second vapor stream. And the second temperature is lower than the first temperature. 3. The system of claim 1 or 2, wherein the baffle is configured to suppress a direct line of sight between the gas permeable member and the aperture. 4. The system according to any of the preceding claims, wherein the cartridge further comprises a housing, wherein the receptacle, the gas permeable member and the baffle are arranged inside the housing. The receptacle of claim 4, wherein the cartridge further comprises a cap portion fitted to the housing, the cap portion forming the aperture, and the aperture forming the receptacle so that vapor can be discharged from the cartridge. In fluid communication with the system. 6. The system of claim 4 or 5, wherein the cartridge is configured to inhibit heat conduction between the housing and the gas permeable member. 7. The system of any of claims 4-6, wherein the cartridge further comprises a cavity portion defining a cavity for receiving the gas permeable member therein. 8. The system of claim 7, wherein the cavity portion is arranged inside the housing and the cavity portion is spaced apart from the wall of the housing. 9. The system of claim 8, wherein the cavity portion is centrally disposed within the housing. 10. The system of any of claims 7-9, wherein the cartridge further comprises a sleeve comprising the cavity portion, the sleeve fitted to the housing. 11. The method of any one of claims 7 to 10, wherein the cavity is through a first opening in the cavity portion such that the first vapor stream generated in the receptacle can enter the gas permeable member in the cavity portion. In fluid communication with the receptacle. 12. The method of claim 11, wherein before the second vapor stream exits through the aperture, a second opening for leading the second vapor stream such that the second vapor stream generated in the cavity portion enters the baffle is provided. Provided in the cavity portion. The system of any of the preceding claims, wherein the gas permeable member comprises a perforated member, a mesh, a sieve, a porous member, or any combination of two or more of them. 14. The system of any of the preceding claims, further comprising the vaporizable material disposed in the receptacle. 15. The system of claim 14, wherein the vaporizable material is a vaporizable coating and the vaporizable coating is disposed on a carrier surface oriented in a non-horizontal direction. 16. The system of claim 15, wherein the carrier surface is oriented substantially vertically. 17. The system of claim 15 or 16, wherein the housing provides the carrier surface. 15. The system of claim 14, wherein the vaporizable material is a single one-piece structure. 19. The method of claim 18, wherein the vaporizable material comprises a substantially vertically oriented surface and a non-vertically oriented surface, and the surface area corresponding to the substantially vertically oriented surface is the non-vertically oriented surface. Larger than the corresponding surface area, the system. 20. The system of claim 18 or 19, wherein a gap is provided between the vaporizable material and the housing. 20. The system of claim 19, wherein a gap is provided between the housing and the substantially vertically oriented surface of the vaporizable material. 22. The system of any of claims 14-21, wherein the vaporizable material comprises an inorganic material. 22. The system of any of claims 14-21, wherein the vaporizable material comprises fullerene. The system of claim 23, wherein the fullerene comprises C ₆₀ , C ₇₀ , C ₇₆ , C ₈₄ , or any mixture of two or more thereof. 22. The system of any of claims 14-21, wherein the vaporizable material comprises a metal. 26. The system of claim 25, wherein the vaporizable material comprises aluminum, silver, copper, magnesium, ytterbium, zinc, cadmium, or any mixture of two or more thereof. 26. The system of claim 25, wherein the vaporizable material comprises magnesium. As a cartridge for use in thin film deposition,
(i) a body forming a receptacle for receiving a vaporizable material and forming an aperture configured to allow vapor to be discharged from the cartridge;
(ii) a gas permeable member arranged inside the body in a vapor path between the receptacle and the aperture; And
(iii) a cartridge comprising a baffle arranged inside the body in a vapor path between the gas permeable member and the aperture. 29. The cartridge of claim 28, wherein the body comprises a housing, and the receptacle, the gas permeable member and the baffle are arranged inside the housing. The method of claim 29, wherein the body further comprises a cap portion fitted to the housing, the cap portion forming the aperture, the aperture being in fluid communication with the receptacle so that vapor can be discharged from the cartridge. , cartridge. 31. A cartridge according to claim 29 or 30, wherein the gas permeable member is arranged inside the housing and spaced from the wall of the housing. 32. The cartridge of claim 31, wherein the gas permeable member is centrally disposed within the housing. 33. The cartridge of any of claims 28-32, wherein the gas permeable member comprises a perforated member, a mesh, a sieve, a porous member, or any combination of two or more of them. 34. The cartridge of any of claims 28-33, further comprising the vaporizable material disposed within the receptacle.

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