KR20200142933A - Mask and skin care device including the same - Google Patents

Abstract

The present invention provides a mask and a skin care device having variability and improved reliability. The mask according to an embodiment of the present invention comprises: a first wiring disposed on a first base layer; a piezoelectric element disposed on the first wiring; a second wiring disposed on the piezoelectric element; a second base layer disposed on the second wiring; a protective layer disposed between the first and second base layers and covering the first wiring, the second wiring and the piezoelectric element; and a barrier layer disposed on at least one of the first and second wirings. The barrier layer includes a material having a lower elastic modulus than that of at least one of the first base layer, the second base layer, and the protective layer. In addition, the skin care device according to an embodiment of the present invention comprises: a main body having one side opened and including an accommodation space inside the open area; and the mask disposed inside the open area and connected to the main body.

Description

A mask and a skin care device including the same TECHNICAL FIELD [MASK AND SKIN CARE DEVICE INCLUDING THE SAME}

The embodiment relates to a mask and a skin care device including the same.

Human skin may be damaged or contaminated depending on external factors such as environmental pollution, ultraviolet rays, and stress, and wrinkles may occur due to internal factors such as aging and hormonal changes. Recently, as interest in skin increases, various devices for skin treatment, beauty, and anti-aging have been developed.

In detail, devices capable of applying thermal energy to the skin, such as devices capable of improving skin elasticity by applying infrared energy, have been developed. In addition, devices using sound waves or light rays have been developed to effectively inject cosmetics or drugs into the skin. For example, a device capable of forming a path through which cosmetics or drugs are injected into the skin by using sonophoresis and laser pollination are being developed. In addition, devices using electric propulsion force have been developed to effectively inject cosmetics or drugs into the skin. For example, a device that can effectively inject ionic substances contained in cosmetics or drugs into the skin using iontophoresis, electroporation, and electroosmosis has been developed. have. That is, various devices are being developed that can care or treat a user's skin by providing light energy, microcurrent, and vibration to the skin.

In general, the above-described devices may be provided in the form of a patch detachable to the skin, and are attached to a specific skin area to care or treat the skin of the attached area. In addition, the above-described devices are provided in the form of a mask pack disposed to cover the entire user's face to care or treat facial skin.

However, since the devices are formed to have a predetermined thickness, it may be difficult to effectively contact the user's skin.

In addition, the devices may be difficult to effectively contact the user's skin in a relatively curved area such as both cheeks and nose. In detail, it may be difficult to effectively contact the user's skin due to the material and variable characteristics of the device. Accordingly, the device may be operated in a state not in close contact with the user's skin, and may be separated from the user's skin due to the user's movement and vibration of the device during the operation process. For this reason, the care or treatment effect using the device may be insignificant.

In addition, there is a problem in that the device is deformed while the device is in close contact with the user's skin. As a result, there is a problem that the transmittance characteristics of ultrasonic waves generated from the piezoelectric element of the device are deteriorated.

In addition, there is a problem in that the internal wires are damaged due to deformation of the device that occurs while the device is in close contact with the user's skin. In particular, there is a problem in that the electric wire in the area of the device corresponding to the relatively curved skin is disconnected due to deformation of the device that occurs when the device is worn.

Accordingly, the device has a problem in that it is difficult to effectively transmit ultrasonic energy to the user's skin, and it is difficult to evenly transmit ultrasonic energy to the entire skin area.

Therefore, a new mask capable of solving the above-described problem is required.

The embodiment is to provide a mask and skin care device having variability and improved reliability.

In addition, the embodiment is to provide a mask and a skin care device capable of effectively contacting the user's skin.

In addition, the embodiment is to provide a mask and a skin care device capable of providing uniform ultrasonic energy to a user's skin.

In addition, the embodiment is to provide a mask and skin care device capable of reducing the overall thickness and weight.

In addition, the embodiment is to provide a mask and a skin care device capable of minimizing the loss of ultrasonic energy generated during operation.

The mask according to the embodiment includes a first wiring disposed on a first base layer, a piezoelectric element disposed on the first wiring, a second wiring disposed on the piezoelectric element, and a second wiring disposed on the second wiring. A base layer, a protective layer disposed between the first and second base layers and surrounding the first wire, the second wire, and the piezoelectric element, and a barrier disposed on at least one of the first and second wires A layer, and the barrier layer includes a material having a lower elastic modulus than at least one of the first base layer, the second base layer, and the protective layer.

In addition, a skin care device according to an embodiment includes a body having one side open and an accommodation space in the open area, and the mask disposed in the open area and connected to the body.

The mask according to the embodiment may be elastically deformed according to the shape of the user's curved skin by the first base layer, the second base layer, or the like. Accordingly, the mask can effectively contact the user's skin.

Also, the mask according to the embodiment may provide uniform ultrasonic energy to the user's skin. In detail, the mask may include a barrier layer disposed in a region corresponding to the piezoelectric element. Accordingly, even when the mask is elastically deformed, changes in the thickness of the first and second base layers disposed in a region corresponding to the piezoelectric element can be minimized. Accordingly, in the embodiment, even when the mask is elastically deformed, uniform ultrasonic energy can be provided to the user.

In addition, the wiring of the mask according to the embodiment may have improved reliability. In detail, the barrier layer may be disposed in a region corresponding to the wiring. For example, the barrier layer may be disposed in a region of the interconnection with relatively low reliability, and stress applied to the interconnection may be minimized. Accordingly, when the mask is elastically deformed, stress applied to the wiring can be minimized, and the wiring can have excellent reliability against repeated elastic deformation of the mask.

In addition, the barrier layer of the mask according to the embodiment may include a material capable of reflecting or transmitting ultrasonic energy emitted from the piezoelectric element. Accordingly, the thickness of the first base layer and the second base layer can be reduced, thereby providing a slimmer mask.

In addition, the mask according to the embodiment includes a plurality of piezoelectric elements, and the piezoelectric elements may generate ultrasonic energy in the entire area of the mask. Accordingly, ultrasonic energy having a uniform intensity may be provided to a user wearing the mask.

In addition, the piezoelectric elements according to the embodiment may be disposed at different intervals according to the shape of the user's face. For example, piezoelectric elements arranged in relatively curved areas such as the user's nose and cheeks, and flat areas such as forehead are arranged at different intervals, so that the ultrasonic energy of uniform intensity is applied to the curved area of the user's face. Can provide.

1 is a front view of a mask according to an embodiment.
FIG. 2 is an exploded perspective view of area A1 of FIG. 1.
3 is a top view of area A1 of FIG. 1.
4 is another top view of area A1 of FIG. 1.
5 is a cross-sectional view showing a cross-section AA′ of FIG. 4.
6 is an enlarged view of area A2 of FIG. 5.
7 is another cross-sectional view showing a cross-section AA′ of FIG. 4.
FIG. 8 is another cross-sectional view showing a cross-section AA′ of FIG. 4.
9 is another top view of area A1 of FIG. 1.
10 is a cross-sectional view illustrating a cross-sectional view taken along BB′ of FIG. 9.
11 is another exploded perspective view of area A1 of FIG. 1.
12 is a cross-sectional view illustrating a cross-section CC' of FIG. 11.
13 to 15 are diagrams illustrating examples in which indicators and protrusions are provided to a mask according to an embodiment.
16 is a diagram illustrating a user wearing a mask according to an embodiment.
17 is a diagram illustrating a skin care device to which a mask is applied according to an embodiment.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

However, the technical idea of the present invention is not limited to some embodiments to be described, but may be implemented in various different forms, and within the scope of the technical idea of the present invention, one or more of the constituent elements may be selectively selected between the embodiments. It can be combined with and substituted with.

In addition, terms (including technical and scientific terms) used in the embodiments of the present invention are generally understood by those of ordinary skill in the art, unless explicitly defined and described. It can be interpreted as a meaning, and terms generally used, such as terms defined in a dictionary, may be interpreted in consideration of the meaning in the context of the related technology.

In addition, terms used in the embodiments of the present invention are for describing the embodiments and are not intended to limit the present invention. In the present specification, the singular form may include the plural form unless specifically stated in the phrase, and when described as "at least one (or more than one) of A and (and) B and C", it is combined with A, B, C It may contain one or more of all possible combinations.

In addition, terms such as first, second, A, B, (a), and (b) may be used in describing the constituent elements of the embodiment of the present invention. These terms are only for distinguishing the component from other components, and are not limited to the nature, order, or order of the component by the term. And, when a component is described as being'connected','coupled' or'connected' to another component, the component is not only directly connected, coupled or connected to the other component, but also the component and The case of being'connected','coupled', or'connected' due to another element between the other elements may also be included.

In addition, when it is described as being formed or disposed on the “top (top) or bottom (bottom)” of each component, the top (top) or bottom (bottom) is one as well as when the two components are in direct contact It also includes a case in which the above other component is formed or disposed between the two components. In addition, when expressed as "upper (upper) or lower (lower)", the meaning of not only an upward direction but also a downward direction based on one component may be included.

In addition, before describing the embodiments of the present invention, the first direction may refer to the x-axis direction shown in the drawings, and the second direction may be a different direction from the first direction. For example, the second direction may mean a y-axis direction shown in the drawing in a direction perpendicular to the first direction. In addition, the horizontal direction may mean first and second directions, and the vertical direction may mean a direction perpendicular to at least one of the first and second directions. For example, the horizontal direction may mean the x-axis and y-axis directions of the drawing, and the vertical direction may be a direction perpendicular to the x-axis and y-axis directions in the z-axis direction of the drawing.

1 is a front view of a mask according to an embodiment, and FIG. 2 is an exploded perspective view of area A1 of FIG. 1. In addition, FIGS. 3 and 4 are top views of area A1 of FIG. 1, FIG. 5 is a cross-sectional view showing section A-A′ of FIG. 4, and FIG. 6 is an enlarged view of area A2 of FIG. 5.

1 to 6, the mask 1000 according to the embodiment may have a shape corresponding to a shape of a human face. The mask 1000 is provided in a predetermined size to cover the user's face, and may have a predetermined elasticity in order to closely contact the user's face. The mask 1000 includes one surface in contact with the user's skin and the other surface opposite to the one surface, and one surface of the mask 1000 is made of a material that is harmless to the human body, so that it may be harmless even if it is in contact with the user's skin for a long time. have.

The mask 1000 may include at least one of an opening 1010 and a cutout 1020. In detail, the opening 1010 may be formed in a portion corresponding to the user's eyes or mouth. The opening 1010 is a region penetrating one surface and the other surface of the mask 1000 facing the user's skin. When the user wears the mask 1000, the user's eyes, mouth, etc. are in the opening 1010. It may be inserted, and the area excluding the opening 1010 may be in close contact with the user's face.

In addition, the cutting portion 1020 may be formed in a portion corresponding to the relatively curved both ball lines, chins, etc. in order to improve adhesion between the mask 1000 and the skin, but is not limited thereto. The cutting part 1020 may have a form in which one surface and the other surface of the mask 1000 are partially cut.

The mask 1000 is adhered to the user's skin and may provide ultrasound to the user's skin through a piezoelectric member included therein. Accordingly, a drug or cosmetics between the mask 1000 and the skin can be effectively provided to the user.

In the mask 1000 according to the embodiment, the first base layer 110, the first wiring 200, the piezoelectric element 400, the second wiring 300, and the second base layer are regions excluding the opening 1010. 120, a protective layer 550, and a barrier layer 600 may be included. In detail, the mask 1000 includes a first wiring 200, a piezoelectric element 400, a second wiring 300, and a second base layer 120 sequentially disposed on the first base layer 110. It may include, and may include a protective layer 550 disposed between the first base layer 110 and the second base layer 120.

The first base layer 110 may include a material harmless to the human body. In addition, the first base layer 110 may include a soft and elastic material. For example, the first base layer 110 is polyvinyl chloride to which silicone, thermoplastic resin, thermoplastic silicone resin, thermoplastic elastomer, polyurethane elastomer, ethylene vinyl acetate (EVA), a harmless plasticizer and a stabilizer are added ( PVC) may include at least one material. Preferably, the first base layer 110 is relatively light, can minimize irritation upon contact with the user's skin, and may include a silicone elastomer having a predetermined elasticity.

The first base layer 110 may reflect a wavelength emitted from the piezoelectric element 400 to be described later in the direction of one surface of the mask 1000. That is, the first base layer 110 may be a reflective layer.

To this end, the thickness t1 of the first base layer 110 may be smaller than or equal to the thickness t2 of the second base layer 120 to be described later. In detail, the thickness t1 of the first base layer 110 in order to reflect the wavelength emitted from the piezoelectric element 400 toward the first base layer 110 to the first base layer 110 is It may be thinner than or equal to the thickness t2 of the second base layer 120. That is, the second base layer 120 may be a base layer facing the user's skin, and the first base layer 110 may be a base layer disposed in an area opposite to the second base layer 120. .

The thickness t1 of the first base layer 110 may be about 50 μm to about 10 mm. When the thickness t1 of the first base layer 110 is less than about 50 μm, the thickness t1 of the first base layer 110 is relatively thin, so that the configuration is disposed on the first base layer 110 Cannot effectively protect them. In detail, when the mask 1000 is elastically deformed and the first base layer 110 is elastically deformed, the wirings 200 and 300 and the piezoelectric element 400 on the first base layer 110 can be effectively protected. Can't.

In addition, when the thickness t1 of the first base layer 110 exceeds about 10 mm, the thickness of the entire mask 1000 may increase, and the first base layer 110 in the piezoelectric element 400 The amount of most of the wavelengths emitted in the) direction passes through the first base layer 110 and is reflected in the direction of one surface of the mask 1000 may be small.

In addition, when the thickness t1 of the first base layer 110 exceeds about 10 mm, the required thickness of the second base layer 120 may increase for reflection in the direction of one surface of the mask 1000. In addition, since the range of wavelengths generated by the piezoelectric element 400 for reflection is high, it may not be suitable for use in the mask 1000.

In addition, when the thickness t1 of the first base layer 110 exceeds about 10 mm, the elastic deformation characteristics of the mask 1000 may be deteriorated. Accordingly, the mask 1000 may not be elastically deformed effectively in a shape corresponding to the user's skin.

Therefore, it is preferable that the thickness t1 of the first base layer 110 satisfies the above-described range in order to prevent the above problems. More preferably, the thickness t1 of the first base layer 110 may be about 100 μm to about 1000 μm. That is, it is preferable that the first base layer 110 has a thickness range of about 100 μm to about 1000 μm in consideration of reliability, reflection characteristics, variability of the manufactured mask 1000, thickness, weight, and ultrasonic impedance characteristics. Do.

In addition, the first base layer 110 may have grooves and pores formed therein to effectively reflect the wavelength generated by the piezoelectric element 400. For example, the grooves and pores may be disposed in a region overlapping with the piezoelectric element 400 for effective reflection, but is not limited thereto.

A first wiring 200 may be disposed on the first base layer 110. The first wiring 200 may be disposed on one surface of the first base layer 110 facing the piezoelectric element 400. The first wiring 200 may extend on the first base layer 110 in a first direction (x-axis direction). The first wiring 200 may directly contact one surface of the first base layer 110. The first wiring 200 may be formed on one surface of the first base layer 110 by a process such as deposition, printing, or bonding. The first wiring 200 may be electrically connected to the piezoelectric element 400.

The first wiring 200 may include a conductive material. For example, the first wiring 200 is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti) And it may include at least one metal of these alloys. In addition, the first wiring 200 may include a non-metal such as carbon, and may include a conductive elastic body.

The first wiring 200 may have a single layer or a multilayer structure. As an example, the first wiring 200 may have a single layer structure including one selected from the above-described materials. In addition, the first wiring 200 may have a multilayer structure including a metal material selected from the above-described materials and a conductive elastic body.

The first wiring 200 may include a plurality of first sub-wirings 201 disposed on the first base layer 110. Each of the plurality of first sub-wires 201 may extend in a first direction and may be disposed to be spaced apart from each other in a second direction different from the first direction. The plurality of first sub-wires 201 may be electrically connected to each other. Here, the second direction may be a direction perpendicular to the first direction in a direction different from the first direction, but is not limited thereto.

The thickness of the first sub-wiring 201 may be about 2 μm to about 50 μm. In detail, the thickness of the first sub-wire 201 may be about 2 μm to about 40 μm. When the thickness of the first sub-wiring 201 is less than about 2 μm, electrical characteristics may be deteriorated, and it may be difficult to form uniformly. In addition, when the thickness of the first sub-wire 201 exceeds about 50 μm, the total thickness of the mask 1000 may increase, and the manufacturing time of the first wire 200 may increase. In addition, the first sub-wiring 201 may be too thick to reduce stretchable characteristics. Preferably, the thickness of the first sub-wire 201 may be about 5 μm to about 35 μm or less in consideration of stretchable characteristics, reliability, and process efficiency in the horizontal direction.

In addition, the line width of the first sub-wire 201 may be about 50 μm to about 500 μm. In detail, the line width of the first sub-wire 201 may be about 100 μm to about 450 μm. A line width of the first sub-wire 201 may be greater than a thickness of the first sub-wire 201. If the line width of the first sub-wire 201 is less than about 50 μm, reliability may be degraded, and if the line width of the first sub-wire 201 exceeds about 500 μm, the elongation rate decreases, resulting in a stretchable characteristic. It can be degraded. Preferably, the line width of the first sub-wire 201 may be about 100 μm to about 400 μm in consideration of stretchable characteristics.

The first wiring 200 may include a first connection part 210 and a first extension part 220.

The first connection part 210 may be disposed in a region corresponding to a lower surface of the piezoelectric element 400. In detail, the first connection part 210 may be disposed in a region overlapping the lower surface of the piezoelectric element 400 in a vertical direction. The first connection part 210 may face a lower surface of the piezoelectric element 400. The first connector 210 may be provided in a number corresponding to the piezoelectric element 400.

The first connection part 210 may have a shape corresponding to a lower surface of the piezoelectric element 400. The first connection part 210 may have a width corresponding to a lower surface of the piezoelectric element 400. For example, the width in the horizontal direction of the first connector 210 may be less than or equal to the width in the horizontal direction of the bottom surface of the piezoelectric element 400. In detail, the width of the first connection part 210 in the horizontal direction may be about 50% to about 100% of the width of the lower surface of the piezoelectric element 400 in the horizontal direction. When the width of the first connection part 210 in the horizontal direction is less than about 50%, electrical characteristics between the first wiring 200 and the piezoelectric element 400 may be deteriorated. In addition, when the width in the horizontal direction of the first connector 210 is larger than the width of the lower surface of the piezoelectric element 400, the transmittance of ultrasonic energy may be reduced. Accordingly, it is preferable that the horizontal width of the first connection part 210 satisfies the above-described range.

The first extension part 220 may extend in a first direction from the first connection part 210. The first extension part 220 may be disposed between a plurality of first connection parts 210. In detail, the first extension part 220 may be disposed between the first connection parts 210 spaced apart in a first direction. That is, the first extension part 220 may connect between adjacent first connection parts 210.

The first wiring 200 may have various shapes. For example, when viewed in a plan view, each of the plurality of first sub-wires 201 may extend in a first direction in a linear shape as shown in FIG. 3. In detail, the plurality of first sub-wires 201 are spaced apart from the adjacent first sub-wires 201 in the second direction at equal intervals, and may extend in the first direction in the form of a straight line. That is, the first extension part 220 of the first wiring 200 may have a shape of a straight line extending in the first direction.

In contrast, when viewed in a plan view, each of the plurality of first sub-wires 201 may extend in the first direction in a curved shape as shown in FIG. 4. For example, each of the plurality of first sub-wires 201 may be provided in a form in which a wavy pattern is repeated. That is, the first extension part 220 of the first wiring 200 may have a curved shape extending in the first direction.

In this case, the first extension part 220 may have a curvature pattern of about 3R to about 20R (mm). Accordingly, when the mask 1000 is stretched or contracted in one direction, the first wiring 200 has a stretchable characteristic and may not be cut off. Preferably, the first extension part 220 may have a curvature pattern of about 5R to about 15R (mm). In addition, the first extension part 220 may have an elongation of about 10% to about 50%. Accordingly, since the first wiring 200 may have improved stretchable characteristics, reliability may be improved, and adhesion with the user's skin may be improved.

Alternatively, although not shown in the drawings, the first extension part 220 may have a shape in which a pattern in which a straight line and a curve extending in a first direction are mixed is repeated. For example, the first extension part 220 located in an area overlapping with a relatively curved area (nose, cheek, etc.) of the user's face when viewed from a plane may be provided in a curved shape, and a relatively flat area The first extension part 220 located in a region overlapping with (forehead, etc.) may be provided in a straight line. Accordingly, when the mask 1000 is attached to the user's face, it is possible to prevent the first wiring 200 from being damaged due to the deformation of the mask 1000. In addition, since the first extension part 220 is provided in a form in which a straight line and a curved line are mixed, an electrical characteristic can be maintained and a ratio occupied by the first wiring 200 can be reduced.

Accordingly, the manufacturing cost of the first wiring 200 may be reduced, and loss of ultrasonic energy emitted from the piezoelectric element 400 may be minimized.

A piezoelectric element 400 may be disposed on the first base layer 110. The piezoelectric element 400 may be disposed on the first wiring 200. In detail, the piezoelectric element 400 may be disposed on the first connection part 210 of the first wire 200 to be electrically connected to the first wire 200.

The piezoelectric element 400 may include a ceramic material. For example, the piezoelectric element 400 includes ZnO, AlN, LiNbO ₄ , lead antimony stannate, lead magnesium tantalate, lead nickel tantalate, and titanate ( titanates), tungstates, zirconates, or lead zirconate titanate [Pb(Zr _x Ti _1-x )O ₃ (PZT)], lead lanthanum zirconate titanate (PLZT), lead niobium Zirconate titanate (PNZT), BaTiO ₃ , SrTiO ₃ , lead magnesium niobate, lead nickel niobate, lead manganese niobate, lead zinc niobate, lead including lead titanate, barium, bismuth, or niobium of strontium It may contain at least one of niobates.

A plurality of piezoelectric elements 400 may be disposed on the first wiring 200. The plurality of piezoelectric elements 400 may be disposed to be spaced apart from each other on the first sub-wire 201. For example, the plurality of piezoelectric elements 400 may be disposed on the first connection part 210 on the first sub-wire 201. In detail, one piezoelectric element 400 may be disposed on one first connection part 210. The center of the lower surface of the piezoelectric element 400 may overlap the first sub-wire 201 in a vertical direction. In detail, the center of the lower surface of the piezoelectric element 400 may overlap the first connection part 210. In more detail, the center of the lower surface of the piezoelectric element 400 may overlap the center of the first connection part 210.

The plurality of piezoelectric elements 400 may be spaced apart from each other at equal intervals on the first sub-wiring 201. For example, a plurality of piezoelectric elements 400 disposed on one first sub-wire 201 may be disposed at equal intervals based on the first direction. Further, the piezoelectric elements 400 disposed on the adjacent first sub-wires 201 may be disposed at equal intervals based on the second direction. Accordingly, a virtual line connecting the centers of the adjacent piezoelectric elements 400 in the first direction and the second direction may have a mesh shape.

In addition, the piezoelectric element 400 disposed on one first sub-wire 201 is the piezoelectric element 400 disposed on the first sub-wire 201 closest to the one first sub-wire 201 And may or may not overlap in the second direction. For example, when viewed in a plan view, the piezoelectric element 400 may be arranged in a zigzag shape on the adjacent first sub-wire 201.

In addition, some of the piezoelectric elements 400 may be spaced at equal intervals, and the remaining piezoelectric elements 400 may not be disposed at equal intervals. For example, in a region overlapping with a relatively flat region of the user's face surface, spaces between the piezoelectric elements 400 may be arranged at equal intervals. However, in a region overlapping with a relatively curved skin region, the spacing between the piezoelectric elements 400 may not be arranged at equal intervals. That is, the spacing between the piezoelectric elements 400 may be relatively narrow or large depending on the degree of curvature of the skin surface. For example, a gap between the piezoelectric elements 400 in a region overlapping with a curved region, such as a user's nose and both cheeks, may be relatively narrow. Accordingly, the mask 1000 according to the embodiment may effectively provide ultrasonic energy even to curved skin.

The piezoelectric element 400 may be disposed on the entire area of the mask 1000 to evenly generate ultrasonic energy. For example, the piezoelectric element 400 may generate ultrasonic energy of about 1 MHz or less by an applied current. In detail, the piezoelectric element 400 may generate ultrasonic energy of about 10 kHz to about 1 MHz. In more detail, the piezoelectric element 400 may generate ultrasonic energy of about 100 KHz to about 800 KHz. The ultrasonic energy generated by the piezoelectric element 400 may move in a direction of one surface of the mask 1000, and may be transferred to the user's skin and massage the user's skin.

The thickness of the piezoelectric element 400 may be about 1500 μm or less. In detail, the thickness of the piezoelectric element 400 may be about 1200 μm or less. Preferably, the thickness of the piezoelectric element 400 may be about 1000 μm or less. It is preferable that the thickness of the piezoelectric element 400 satisfies the above-described range in consideration of the overall thickness and variable characteristics of the mask 1000.

The piezoelectric element 400 may have various shapes. For example, the piezoelectric element 400 may have a polygonal column shape with a lower surface and an upper surface thereof, and the lower surface and an upper surface may have a circular column shape. In addition, the piezoelectric element 400 may have one of a lower surface and an upper surface of a polygonal surface, and the other surface may have a pillar shape. For example, an area of at least one of a lower surface and an upper surface of the piezoelectric element 400 may be about 100 mm ² or less.

As described above, the piezoelectric element 400 may have various pillar shapes, and the intensity of ultrasonic energy generated according to the pillar shape, the oscillation direction, and the like can be controlled. In addition, the intensity of ultrasonic energy delivered to the user's skin may be adjusted according to the size, arrangement interval, and arrangement density of the piezoelectric element 400.

The piezoelectric element 400 may generate various waves. For example, the piezoelectric element 400 may generate at least one wave of a horizontal wave in which a direction in which the wave travels and a vibration direction of the medium are perpendicular, and a longitudinal wave in which the direction in which the wave travels and the vibration direction of the medium are the same. In addition, the piezoelectric element 400 may resonate multiple times. For example, the piezoelectric element 400 may include at least one via hole, and may resonate multiple times by the formed via hole. In this case, the upper area of the via hole may be about 10% to about 45% of the upper surface area of the piezoelectric element 400 for multiple resonance. In addition, when the piezoelectric element 400 has multiple resonances by the via holes, the number of multiple resonance frequency domains may correspond to the number of via holes. That is, the piezoelectric element 400 may emit wavelengths of various frequency ranges, for example, ultrasonic energy, as the number of via holes increases within a set number range of via holes.

A second base layer 120 may be disposed on the piezoelectric element 400. The second base layer 120 is a portion that faces the user's skin and can contact the skin, and may include a material harmless to the human body. In addition, the second base layer 120 may include a soft and elastic material. For example, the second base layer 120 is polyvinyl chloride to which silicone, thermoplastic resin, thermoplastic silicone resin, thermoplastic elastomer, polyurethane elastomer, ethylene vinyl acetate (EVA), harmless plasticizer and stabilizer are added ( PVC) may include at least one material. Preferably, the second base layer 120 is relatively light, can minimize irritation upon contact with the user's skin, and may include a silicone elastomer having a predetermined elasticity. The first base layer 110 may be made of the same material as the second base layer 120.

The second base layer 120 may pass the wavelength emitted from the piezoelectric element 400 in the direction of one surface of the mask 1000 to transmit the wavelength to the user's skin. That is, the second base layer 120 may be a transmission layer and may be a matching layer.

To this end, the thickness t2 of the second base layer 120 may vary according to an impedance of the second base layer 120 and a driving frequency of the piezoelectric element 400. In addition, the thickness t2 of the second base layer 120 may be greater than or equal to the thickness t1 of the first base layer 110.

For example, when the driving frequency of the piezoelectric element 400 is about 1 MHz or less, the thickness t2 of the second base layer 120 may be about 50 μm to about 10 mm. When the thickness (t2) of the second base layer 120 is less than about 50 μm, the thickness (t2) of the second base layer 120 is relatively thin, so that the configuration is disposed on the second base layer 120 Cannot effectively protect them. In detail, when the mask 1000 is elastically deformed and the second base layer 120 is elastically deformed, the wirings 200 and 300 and the piezoelectric element 400 on the second base layer 120 are It cannot be effectively protected.

In addition, when the thickness t2 of the second base layer 120 exceeds about 10 mm, the thickness of the entire mask 1000 may increase. It is preferable that the thickness t2 of the second base layer 120 satisfies the above-described range in order to effectively pass the wavelength emitted from the piezoelectric element 400. Preferably, the thickness t2 of the second base layer 120 is about 100 μm to about 1000 μm in consideration of reliability, transmission characteristics, variability of the manufactured mask 1000, thickness, weight, and ultrasonic impedance characteristics. It can have a thickness range.

That is, some of the ultrasonic energy emitted from the piezoelectric device 400 according to the embodiment may be emitted toward the second base layer 120 and passed through the second base layer 120 to be transmitted to the user's skin. have. In addition, another part of the ultrasonic energy may be emitted toward the first base layer 110 and reflected toward the second base layer 120 by the first base layer 110. Thereafter, the reflected ultrasonic energy may pass through the second base layer 120 and be transferred to the user's skin.

A second wiring 300 may be disposed on the second base layer 120. The second wiring 300 may be disposed on one surface of the second base layer 120 facing the piezoelectric element 400. The second wiring 300 may extend on the second base layer 120 in a different direction from the first wiring 200. For example, the second wiring 300 may extend in a second direction (y-axis direction) perpendicular to the first direction. The second wiring 300 may directly contact one surface of the second base layer 120. The second wiring 300 may be formed on one surface of the second base layer 120 by a process such as deposition, printing, or bonding. The second wiring 300 may be electrically connected to the piezoelectric element 400.

The second wiring 300 may include a conductive material. For example, the second wiring 300 is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti) And it may include at least one metal of these alloys. In addition, the second wiring 300 may include a non-metal such as carbon, and may include a conductive elastic body. The second wiring 300 may include the same material as the first wiring 200.

The second wiring 300 may have a single layer or a multilayer structure. As an example, the second wiring 300 may have a single layer structure including one selected from the above-described materials. In addition, the second wiring 300 may have a multilayer structure including a metal selected from the above-described materials and a conductive elastic body. The second wiring 300 may have the same structure as the first wiring 200.

The second wiring 300 may include a plurality of second sub-wirings 301 disposed on the second base layer 120. Each of the plurality of second sub-wires 301 may extend in the second direction and may be disposed to be spaced apart from each other in the first direction. The plurality of second sub-wires 301 may be electrically connected to each other.

The thickness of the second sub-wire 301 may be about 2 μm to about 50 μm. In detail, the thickness of the second sub-wire 301 may be about 2 μm to about 40 μm. When the thickness of the second sub-wire 301 is less than about 2 μm, electrical characteristics may be deteriorated, and it may be difficult to form uniformly. In addition, when the thickness of the second sub-wire 301 exceeds about 50 μm, the overall thickness of the mask 1000 may increase, and the manufacturing time of the second wire 300 may increase. In addition, the thickness of the second sub-wiring 301 is too thick, so that stretchable characteristics may be deteriorated. Preferably, the thickness of the second sub-wire 301 may be about 5 μm to about 35 μm or less in consideration of stretchable characteristics, reliability, and process efficiency in the horizontal direction.

Also, the line width of the second sub-wiring 301 may be about 50 μm to about 500 μm. In detail, the line width of the second sub-wire 301 may be about 100 μm to about 450 μm. A line width of the second sub-wire 301 may be greater than a thickness of the second sub-wire 301. When the line width of the second sub-wire 301 is less than about 50 μm, reliability may be degraded, and when the line width of the second sub-wire 301 exceeds about 500 μm, the elongation decreases, resulting in a stretchable characteristic. It can be degraded. Preferably, the line width of the second sub-wire 301 may be about 100 μm to about 400 μm in consideration of stretchable characteristics.

The second wiring 300 may include a second connection part 310 and a second extension part 320.

The second connection part 310 may be disposed in a region corresponding to the upper surface of the piezoelectric element 400. In detail, the second connection part 310 may be disposed in a region overlapping the upper surface of the piezoelectric element 400 in a vertical direction. The second connection part 310 may face an upper surface of the piezoelectric element 400. The second connector 310 may be provided in a number corresponding to the piezoelectric element 400.

The second connection part 310 may have a shape corresponding to an upper surface of the piezoelectric element 400. The second connection part 310 may have a width corresponding to the upper surface of the piezoelectric element 400. For example, the width of the second connection part 310 in the horizontal direction may be less than or equal to the width of the upper surface of the piezoelectric element 400 in the horizontal direction. In detail, the width of the second connection part 310 in the horizontal direction may be about 50% to about 100% of the width of the upper surface of the piezoelectric element 400 in the horizontal direction. When the width of the second connection part 310 in the horizontal direction is less than about 50%, electrical characteristics between the second wiring 300 and the piezoelectric element 400 may be deteriorated. In addition, when the width of the second connection part 310 in the horizontal direction is greater than the width of the lower surface of the piezoelectric element 400, the transmittance of ultrasonic energy may decrease. Therefore, it is preferable that the width of the second connection part 310 in the horizontal direction satisfies the above-described range.

The second extension part 320 may extend in a second direction from the second connection part 310. The second extension part 320 may be disposed between the plurality of second connection parts 310. In detail, the second extension part 320 may be disposed between the second connection parts 310 spaced apart in a second direction. That is, the second extension part 320 may connect between the adjacent second connection parts 310.

The second wiring 300 may have various shapes. For example, when viewed in a plan view, each of the plurality of second sub-wires 301 may extend in the second direction in the form of a straight line as shown in FIG. 3. In detail, the plurality of second sub-wires 301 are spaced apart from the adjacent second sub-wires 301 in the first direction at equal intervals, and may extend in the second direction in the form of a straight line. That is, the second extension part 320 of the second wiring 300 may have a straight line extending in the second direction.

In contrast, when viewed in a plan view, each of the plurality of second sub-wires 301 may extend in the second direction in a curved shape as shown in FIG. 4. For example, each of the plurality of second sub-wires 301 may be provided in a form in which a wavy pattern is repeated. That is, the second extension part 320 of the second wiring 300 may have a curved shape extending in the second direction.

In this case, the second extension part 320 may have a curvature pattern of about 3R to about 20R (mm). Accordingly, when the mask 1000 is stretched or contracted in one direction, the second wiring 300 has a stretchable characteristic and may not be cut off. Preferably, the second extension part 320 may have a curvature pattern of about 5R to about 15R (mm). In addition, the second extension part 320 may have an elongation of about 10% to about 50%. Accordingly, since the second wiring 300 may have improved stretchable characteristics, reliability may be improved, and adhesion with the user's skin may be improved.

Alternatively, although not shown in the drawings, the second extension part 320 may have a repeating pattern in which a straight line and a curved line extending in the second direction are mixed. For example, the second extension part 320 located in a region overlapping with a relatively curved region (nose, cheek, etc.) of the user's face when viewed from a plane may be provided in a curved shape, and a relatively flat region The second extension part 320 located in a region overlapping with (forehead, etc.) may be provided in a straight line. Accordingly, when the mask 1000 is attached to the user's face, damage to the second wiring 300 due to the deformation of the mask 1000 may be prevented. In addition, since the second extension part 320 is provided in a form in which straight lines and curves are mixed, it is possible to maintain electrical characteristics and reduce a ratio occupied by the second wires 300.

Accordingly, the manufacturing cost of the second wiring 300 may be reduced, and loss of ultrasonic energy emitted from the piezoelectric element 400 may be minimized.

The first wiring 200 and the second wiring 300 may be disposed to cross each other. In detail, when viewed in a plan view as shown in FIG. 3, the first sub-wire 201 and the second sub-wire 301 may be disposed to cross each other in a mesh shape, and the sub-wires 201 and 301 ), an open area in which the wirings 200 and 300 are not disposed may be formed.

The piezoelectric element 400 may be disposed on an area where the first wiring 200 and the second wiring 300 cross each other. In detail, the center of the piezoelectric element 400 may overlap with an intersection point of the first sub-wire 201 and the second sub-wire 301. In more detail, the center of each of the lower and upper surfaces of the piezoelectric element 400 is the center of the first connection part 210 of the first wire 200 and the center of the second connection part 310 of the second wire 300 Can overlap with

Further, although not shown in the drawings, a vibration member (not shown) may be further disposed on the piezoelectric element. In order to improve the vibration characteristics of the piezoelectric element 400, a vibration member may be further disposed on the upper surface of the piezoelectric element 400. For example, the vibration member may be a vibration plate. The vibration member may be disposed between the piezoelectric element 400 and the second wiring 300.

The vibration member may be electrically connected to the piezoelectric element 400. The vibration member may include a metal material. As an example, the vibration member is aluminum (Al), copper (Cu), zinc (Zn), iron (Fe), nickel (Ni), chromium (Cr), silver (Ag), gold (Pt), stainless steel ( SUS) and at least one of the alloys thereof may be included.

The vibration member may have a shape corresponding to the piezoelectric element 400. For example, the vibration member may have a planar shape corresponding to an upper surface of the piezoelectric element 400. In addition, the vibration member may have a horizontal width corresponding to the upper surface of the piezoelectric element 400.

The thickness of the vibration member may be about 1500 μm or less. In detail, the thickness of the vibration member may be about 1200 μm or less. Preferably, the thickness of the vibration member may be about 1000 μm or less. The thickness of the vibration member preferably satisfies the above-described range in consideration of the variable characteristics of the mask 1000 and the vibration characteristics of the piezoelectric element 400.

The mask 1000 according to the embodiment may include a protective layer 550. The protective layer 550 may be disposed between the first base layer 110 and the second base layer 120. The protective layer 550 may be disposed in direct contact with one surface of the first base layer 110 and one surface of the second base layer 120.

The protective layer 550 may be disposed between the first base layer 110 and the second base layer 120 to protect the piezoelectric element 400. In detail, the protective layer 550 may be disposed between the base layers 110 and 120 to surround the piezoelectric element 400 and the wires 200 and 300 to protect the components.

The protective layer 550 may include a soft and elastic material. For example, the protective layer 550 is a polyvinyl chloride (PVC) containing silicone, a thermoplastic resin, a thermoplastic silicone resin, a thermoplastic elastomer, a polyurethane elastomer, an ethylene vinyl acetate (EVA), a harmless plasticizer and a stabilizer At least one of the materials may be included. Among them, the protective layer 550 may be relatively light and may minimize irritation upon contact with the user's skin, and may preferably include a silicone elastomer having a predetermined elasticity.

The protective layer 550 may be connected to the first base layer 110 and the second base layer 120. For example, the protective layer 550 may be integrally formed with the first base layer 110 and the second base layer 120. The protective layer 550 may be physically connected to the first base layer 110 and the second base layer 120 to protect components disposed therein.

The protective layer 550 may include the same material as the first base layer 110 and the second base layer 120. That is, the first base layer 110, the second base layer 120, and the protective layer 550 may have improved bonding strength as they include the same material.

Referring to FIG. 6, a connection relationship between the piezoelectric element 400, the first wiring 200, and the second wiring 300 will be described in more detail.

Referring to FIG. 6, the piezoelectric element 400 may be electrically connected to the first wiring 200 and the second wiring 300. In detail, the piezoelectric element 400 may include a first electrode 410 disposed on a lower surface. The first electrode 410 may be disposed in an area of about 80% or more of the total area of the lower surface of the piezoelectric element 400 in consideration of electrical characteristics. The first electrode 410 may be disposed in an area of about 90% of the total area of the lower surface of the piezoelectric element 400. In addition, the first electrode 410 may be disposed on the entire lower surface of the piezoelectric element 400.

The first electrode 410 may include a conductive material. For example, the first electrode 410 may include a metal material. In detail, the first electrode 410 includes aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and It may include at least one metal among these alloys.

The first electrode 410 may be disposed facing the first wire 200 and may be electrically connected to the first wire 200. In detail, a first bonding layer 451 may be disposed between the first electrode 410 and the first wiring 200. The first bonding layer 451 may physically and electrically connect the first electrode 410 and the first wiring 200. The overlapping ratio between the first bonding layer 451 and the first wiring 200 may be about 20% or more in consideration of physical and electrical characteristics. In detail, an overlapping ratio of one surface of the first wiring 200 facing the piezoelectric element 400 and the first bonding layer 451 may be about 20% or more.

The first bonding layer 451 is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and these It may include at least one metal of the alloy.

The thickness of the first bonding layer 451 may be about 100 μm or less. In detail, the thickness of the first bonding layer 451 may be about 20 μm to about 80 μm. Preferably, the thickness of the first bonding layer 451 may be about 30 μm to about 60 μm.

The first bonding layer 451 may be disposed between the first electrode 410 and the first wiring 200 to serve as a conductive adhesive. As an example, the first bonding layer 451 may be applied in the form of a paste on the first wiring 200, and a piezoelectric structure including the first electrode 410 on the first bonding layer 451 The device 400 may be disposed. Accordingly, the piezoelectric element 400 may be physically and electrically connected to the first wiring 200.

The piezoelectric element 400 may include a second electrode 420 disposed on an upper surface. The second electrode 420 may be disposed in an area of about 80% or more of the total area of the top surface of the piezoelectric element 400 in consideration of electrical characteristics. In detail, the second electrode 420 may be disposed in an area of about 90% of the total area of the upper surface of the piezoelectric element 400. In addition, the second electrode 420 may be disposed on the entire lower surface of the piezoelectric element 400.

The second electrode 420 may include a conductive material. For example, the second electrode 420 may include a metal material. In detail, the second electrode 420 includes aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and It may include at least one metal among these alloys.

The second electrode 420 may be disposed facing the second wiring 300 and may be electrically connected to the second wiring 300. In detail, a second bonding layer 452 may be disposed between the second electrode 420 and the second wiring 300. The second bonding layer 452 may physically and electrically connect the second electrode 420 and the second wiring 300. The overlapping ratio between the second bonding layer 452 and the second wiring 300 may be about 20% or more in consideration of physical and electrical characteristics. In detail, an overlapping ratio between one surface of the second wiring 300 facing the piezoelectric element 400 and the second bonding layer 452 may be about 20% or more.

The second bonding layer 452 includes aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and these It may include at least one metal of the alloy.

The thickness of the second bonding layer 452 may be about 100 μm or less. In detail, the thickness of the second bonding layer 452 may be about 20 μm to about 80 μm. Preferably, the thickness of the second bonding layer 452 may be about 30 μm to about 60 μm.

The second bonding layer 452 may be disposed between the second electrode 420 and the second wiring 300 to serve as a conductive adhesive. For example, the second bonding layer 452 may be applied in the form of a paste on the second wiring 300, and a piezoelectric structure including the second electrode 420 on the second bonding layer 452 The device 400 may be disposed. Accordingly, the piezoelectric element 400 may be physically and electrically connected to the second wiring 300.

The thickness of the first bonding layer 451 may be the same as or different from the thickness of the second bonding layer 452. For example, since the first bonding layer 451 has the same thickness as the second bonding layer 452, the variability of the mask 1000 may be improved. As another example, the thickness of the first bonding layer 451 may be thicker than the thickness of the second bonding layer 452. Accordingly, a wavelength emitted from the piezoelectric element 400 toward the first base layer 110 may be reflected by the first bonding layer 451 and may move toward the second base layer 120.

Thereafter, as described above, the protective layer 550 may be filled in the space between the first substrate 510 and the second substrate 520. The protective layer 550 includes the piezoelectric element 400, the first wiring 200, the second wiring 300, the first electrode 410, the second electrode 420, and the first bonding It may be disposed to surround the layer 451 and the second bonding layer 452, and it is possible to prevent the components from being exposed to the outside.

5 and 6, the mask 1000 according to the embodiment may include a barrier layer 600. The barrier layer 600 may maintain the thickness of the mask 1000 when the mask 1000 is elastically deformed, and may protect the internal structure of the mask 1000.

The barrier layer 600 may be disposed on at least one of the first wiring 200 and the second wiring 300. The barrier layer 600 may be disposed in a region corresponding to the piezoelectric element 400 in a vertical direction.

The barrier layer 600 may include at least one of a metal and a polymer material. For example, the barrier layer 600 is polypropylene (PP), polyethylene (PE), polycarbonate (PC), polyimide, polyethylene terephthalate (PET), poly It may contain at least one of polyetherether ketone (PEEK).

The barrier layer 600 may include a material having a lower elastic modulus than at least one selected from among the first base layer 110, the second base layer 120, and the protective layer 550. For example, the barrier layer 600 may be about 80% or less of the elastic modulus of the first base layer 110, the second base layer 120, and the protective layer 550. In detail, the elastic modulus of the barrier layer 600 may be about 70% or less of the elastic modulus of the components 110, 120, and 550.

The thickness of the barrier layer 600 may be thinner than the thickness of each of the first and second base layers 110 and 120. For example, the thickness of the barrier layer 600 may be about 1 μm to about 100 μm. When the thickness of the barrier layer 600 is less than about 1 μm, deterioration of the deformation characteristics of the components 110, 120, and 550 by the barrier layer 600 may be insignificant. In addition, when the thickness of the barrier layer 600 exceeds about 100 μm, the total thickness of the mask 1000 may increase, and elastic deformation characteristics may be deteriorated, so that adhesion to the user's skin may decrease.

The barrier layer 600 may include a first barrier layer 610 disposed on the first base layer 110. The first barrier layer 610 may be disposed on the other surface opposite to one surface of the first base layer 110. The first barrier layer 610 may be disposed below the first base layer 110 in a vertical direction.

The first barrier layer 610 may be disposed in the third base layer 130. For example, the first barrier layer 610 may be disposed in the third base layer 130 disposed on the other surface of the first base layer 110.

The third base layer 130 may include a material harmless to the human body. The third base layer 130 may include a soft and elastic material. For example, the third base layer 130 may be relatively light and may include a silicone elastomer having a predetermined elasticity and may minimize irritation upon contact with the user's skin.

The third base layer 130 may be disposed surrounding the first barrier layer 610. Accordingly, the third base layer 130 may prevent the first barrier layer 610 from being exposed to the outside. In addition, the third base layer 130 may include the same material as the first base layer 110. The third base layer 130 may be integrally formed with the first base layer 110. Accordingly, the third base layer 130 may have an improved bonding force with the first base layer 110.

The first barrier layer 610 may be disposed in a region corresponding to the piezoelectric element 400. In detail, the first barrier layer 610 may overlap the piezoelectric element 400 in a vertical direction. In more detail, the center of the first barrier layer 610 may overlap the center of the lower surface of the piezoelectric element 400 in a vertical direction. In addition, the first barrier layer 610 may overlap the first connection part 210 in a vertical direction. In detail, the center of the first barrier layer 610 may overlap the center of the first connection part 210 in a vertical direction.

The width of the first barrier layer 610 may be the same as or different from the width of the piezoelectric element 400. In detail, the horizontal direction width w1 of the first barrier layer 610 may be about 0.8 times to about 2 times the width of the lower surface of the piezoelectric element 400.

For example, when the width w1 of the first barrier layer 610 in the horizontal direction is less than about 0.8 times the width of the lower surface of the piezoelectric element 400, the reliability of the first wiring 200 may be deteriorated. . In detail, the first barrier layer 610 may not deteriorate the elastic deformation characteristic of the protective layer 550 corresponding to the boundary between the first connection part 210 and the first extension part 220. For this reason, during repeated elastic deformation, a disconnection may occur between the first connection part 210 and the first extension part 220. In addition, when the width w1 in the horizontal direction of the first barrier layer 610 exceeds about twice the width of the lower surface of the piezoelectric element 400, the elastic deformation characteristic of the mask 1000 may be deteriorated. . Accordingly, the adhesion property between the user and the mask 1000 may be deteriorated. Therefore, it is preferable that the width w1 of the first barrier layer 610 in the horizontal direction satisfies the above-described range in consideration of the reliability of the first wiring 200 and the reflective characteristics of the first base layer 110. .

More preferably, the width w1 in the horizontal direction of the first barrier layer 610 may be about 1 to about 1.5 times the width of the lower surface of the piezoelectric element 400. Accordingly, the first wiring 200 may have improved reliability, and the first base layer 110 may effectively reflect ultrasonic energy.

The barrier layer 600 may include a second barrier layer 620 disposed on the second base layer 120. The second barrier layer 620 may be disposed on the other surface opposite to the one surface of the second base layer 120. The second barrier layer 620 may be disposed above the second base layer 120 in a vertical direction.

The second barrier layer 620 may be disposed in the fourth base layer 140. For example, the second barrier layer 620 may be disposed in the fourth base layer 140 disposed on the other surface of the second base layer 120.

The fourth base layer 140 may include a material harmless to the human body. The fourth base layer 140 may include a soft and elastic material. For example, the fourth base layer 140 may be relatively light and may include a silicone elastomer having a predetermined elasticity and may minimize irritation upon contact with the user's skin.

The fourth base layer 140 may be disposed surrounding the second barrier layer 620. Accordingly, the fourth base layer 140 may prevent the second barrier layer 620 from being exposed to the outside. In addition, the fourth base layer 140 may include the same material as the second base layer 120. The fourth base layer 140 may be integrally formed with the second base layer 120. Accordingly, the fourth base layer 140 may have an improved bonding force with the second base layer 120.

The second barrier layer 620 may be disposed in a region corresponding to the piezoelectric element 400. In detail, the second barrier layer 620 may overlap the piezoelectric element 400 in a vertical direction. In more detail, the center of the second barrier layer 620 may overlap the center of the upper surface of the piezoelectric element 400 in a vertical direction. In addition, the second barrier layer 620 may overlap the second connection part 310 in a vertical direction. In detail, the center of the second barrier layer 620 may overlap the center of the second connection part 310 in a vertical direction.

The width of the second barrier layer 620 may be the same as or different from the width of the piezoelectric element 400. In detail, the width w1 in the horizontal direction of the second barrier layer 620 may be about 0.8 times to about 2 times the width of the top surface of the piezoelectric element 400.

For example, when the width w2 in the horizontal direction of the second barrier layer 620 is less than about 0.8 times the width of the top surface of the piezoelectric element 400, the reliability of the second wiring 300 may be degraded. . In detail, the second barrier layer 620 may not deteriorate the elastic deformation characteristic of the protective layer 550 corresponding to the boundary between the second connection part 310 and the second extension part 320. For this reason, a disconnection between the second connection part 310 and the second extension part 320 may be caused during repeated elastic deformation. In addition, when the width w2 in the horizontal direction of the second barrier layer 620 exceeds about twice the width of the lower surface of the piezoelectric element 400, the elastic deformation characteristic of the mask 1000 may be deteriorated. . Accordingly, the adhesion property between the user and the mask 1000 may be deteriorated. Therefore, it is preferable that the width w2 of the second barrier layer 620 in the horizontal direction satisfies the above-described range in consideration of the reliability of the second wiring 300 and the transmission characteristics of the second base layer 120. .

More preferably, the width w2 in the horizontal direction of the second barrier layer 620 may be about 1 to 1.5 times the width of the lower surface of the piezoelectric element 400. Also, the width w2 in the horizontal direction of the second barrier layer 620 may be the same as the width w1 in the horizontal direction of the first barrier layer 610. Accordingly, the second wiring 300 may have improved reliability, and the second base layer 120 may effectively transmit ultrasonic energy.

In addition, the second barrier layer 620 may include the same material as the first barrier layer 610. Alternatively, the second barrier layer 620 may include a material different from the first barrier layer 610. For example, the first barrier layer 610 may include a material capable of reflecting ultrasonic energy emitted from the piezoelectric element 400. In addition, the second barrier layer 620 may include a material capable of transmitting ultrasonic energy emitted from the piezoelectric element 400. Accordingly, the thickness of the first base layer 110 and the second base layer 120 may be reduced, and a slimmer mask may be provided.

The mask 1000 according to the embodiment may be elastically deformed by the user's wearing or the like. In this case, the first base layer 110, the second base layer 120, and the protective layer 550 may be elastically deformed. In particular, when the mask 1000 is elastically deformed, the thicknesses t1 and t2 of the first base layer 110 and the second base layer 120 may be changed. For example, a predetermined stress may be applied to the mask 1000 in order for the user to adhere the mask 1000 to the skin, and the thickness of the first base layer 110 and the second base layer 120 (t1, t2) can be thinner compared to before the stress is applied. Accordingly, the ultrasonic energy reflection characteristic of the first base layer 110 and the ultrasonic energy transmission characteristic of the second base layer 120 may be changed.

However, the mask 1000 according to the embodiment may reduce elastic deformation characteristics of some regions of the first base layer 110, the second base layer 120, and the protective layer 550. In detail, the embodiment may include a first barrier layer 610 and a second barrier layer 620 disposed in a region corresponding to the piezoelectric element 400 in a vertical direction. Accordingly, elastic deformation characteristics of the first base layer 110, the second base layer 120, and the protective layer 550 on which the barrier layers 610 and 620 are disposed may be deteriorated. In detail, it is possible to minimize changes in the thicknesses t1 and t2 of each of the first and second base layers 110 and 120 in the region in which the barrier layers 610 and 620 are disposed.

Accordingly, the mask 1000 according to the embodiment may be effectively elastically deformed according to the shape of a person's skin, thereby making it close to the skin. In addition, even when the mask 1000 is elastically deformed due to the user's wearing or the like, ultrasonic energy can be effectively reflected and transmitted to provide the user with the same. In addition, even if the user repeatedly uses and wears the mask 1000, the first wiring 200 and the second wiring 300 may have improved reliability.

Further, although not shown in the drawings, the first and second barrier layers 610 and 620 may have a structure in which a hole is formed. For example, when viewed in a plan view, the first and second barrier layers 610 and 620 may have a ring shape in which a hole is formed in a central region. In this case, the planar area of the first barrier layer 610 may be about 10% or more of the bottom surface area of the piezoelectric element 400. In addition, a plan area of the second barrier layer 620 may be about 10% or more of a top area of the piezoelectric element 400.

7 and 8 are other cross-sectional views illustrating a cross-section A-A' of FIG. 4. In the description using FIGS. 7 and 8, descriptions of the same and similar configurations as those of the above-described mask are omitted, and the same reference numerals are assigned to the same and similar configurations.

Referring to FIG. 7, the barrier layer 600 may include a third barrier layer 630 and a fourth barrier layer 640.

The third barrier layer 630 may be disposed on the first wiring 200. The third barrier layer 630 may be spaced apart from the first wiring 200. For example, the third barrier layer 630 may be spaced apart from the first interconnection 200 in a vertical direction and may be disposed below the first interconnection 200. That is, the third barrier layer 630 may be closer to the other surface of the mask 1000 than the first wiring 200.

The third barrier layer 630 may be disposed in the first base layer 110. The third barrier layer 630 may be inserted and disposed in the first base layer 110. The first base layer 110 may be disposed surrounding the third barrier layer 630.

The third barrier layer 630 may be disposed in a region corresponding to the piezoelectric element 400. In detail, the third barrier layer 630 may overlap the piezoelectric element 400 in a vertical direction. In more detail, the center of the third barrier layer 630 may overlap the center of the lower surface of the piezoelectric element 400 in a vertical direction. In addition, the third barrier layer 630 may vertically overlap the first connection part 210. In detail, the center of the third barrier layer 630 may overlap the center of the first connection part 210 in a vertical direction.

The width of the third barrier layer 630 may be the same as or different from the width of the piezoelectric element 400. In detail, the width of the third barrier layer 630 in the horizontal direction may be about 0.8 times to about 2 times the width of the lower surface of the piezoelectric element 400.

For example, when the width of the third barrier layer 630 in the horizontal direction is less than about 0.8 times the width of the lower surface of the piezoelectric element 400, the reliability of the first wiring 200 may be deteriorated. In detail, the third barrier layer 630 may not deteriorate the elastic deformation characteristics of the protective layer 550 corresponding to the boundary between the first connection part 210 and the first extension part 220. For this reason, during repeated elastic deformation, a disconnection may occur between the first connection part 210 and the first extension part 220. In addition, when the width of the third barrier layer 630 in the horizontal direction exceeds about twice the width of the lower surface of the piezoelectric element 400, the elastic deformation characteristics of the mask 1000 may be deteriorated. Accordingly, the adhesion property between the user and the mask 1000 may be deteriorated. Accordingly, it is preferable that the width of the third barrier layer 630 in the horizontal direction satisfies the above-described range in consideration of the reliability of the first wiring 200 and reflection characteristics of the first base layer 110.

More preferably, the width in the horizontal direction of the third barrier layer 630 may be about 1 to about 1.5 times the width of the lower surface of the piezoelectric element 400. Accordingly, the first wiring 200 may have improved reliability, and the first base layer 110 may effectively reflect ultrasonic energy.

The fourth barrier layer 640 may be disposed on the second wiring 300. The fourth barrier layer 640 may be spaced apart from the second wiring 300. For example, the fourth barrier layer 640 may be spaced apart from the second wiring 300 in a vertical direction and disposed below the second wiring 300. That is, the fourth barrier layer 640 may be closer to one surface of the mask 1000 than the second wiring 300.

The fourth barrier layer 640 may be disposed in the second base layer 120. The fourth barrier layer 640 may be inserted and disposed in the second base layer 120. The second base layer 120 may be disposed surrounding the fourth barrier layer 640.

The fourth barrier layer 640 may be disposed in a region corresponding to the piezoelectric element 400. In detail, the fourth barrier layer 640 may overlap the piezoelectric element 400 in a vertical direction. In more detail, the center of the fourth barrier layer 640 may overlap the center of the upper surface of the piezoelectric element 400 in a vertical direction. In addition, the fourth barrier layer 640 may overlap the second connection part 310 in a vertical direction. In detail, the center of the fourth barrier layer 640 may overlap the center of the second connection part 310 in a vertical direction.

The width of the fourth barrier layer 640 may be the same as or different from the width of the piezoelectric element 400. In detail, the width of the fourth barrier layer 640 in the horizontal direction may be about 0.8 times to about 2 times the width of the top surface of the piezoelectric element 400.

For example, when the width of the fourth barrier layer 640 in the horizontal direction is less than about 0.8 times the width of the upper surface of the piezoelectric element 400, the reliability of the second wiring 300 may be deteriorated. In detail, the fourth barrier layer 640 may not deteriorate the elastic deformation characteristics of the protective layer 550 corresponding to the boundary between the second connection part 310 and the second extension part 320. For this reason, a disconnection between the second connection part 310 and the second extension part 320 may be caused during repeated elastic deformation. In addition, when the width of the fourth barrier layer 640 in the horizontal direction exceeds about twice the width of the upper surface of the piezoelectric element 400, the elastic deformation characteristic of the mask 1000 may be deteriorated. Accordingly, the adhesion property between the user and the mask 1000 may be deteriorated. Therefore, it is preferable that the width of the fourth barrier layer 640 in the horizontal direction satisfies the above-described range in consideration of the reliability of the second wiring 300 and the reflection characteristics of the second base layer 120.

More preferably, the width of the fourth barrier layer 640 in the horizontal direction may be about 1 to about 1.5 times the width of the upper surface of the piezoelectric element 400. Accordingly, the second wiring 300 may have improved reliability, and the second base layer 120 may effectively transmit ultrasonic energy.

In addition, the fourth barrier layer 640 may include the same material as the third barrier layer 630. Alternatively, the fourth barrier layer 640 may include a material different from that of the third barrier layer 630. For example, the third barrier layer 630 may include a material capable of reflecting ultrasonic energy emitted from the piezoelectric element 400. In addition, the fourth barrier layer 640 may include a material capable of transmitting ultrasonic energy emitted from the piezoelectric element 400. Accordingly, the thickness of the first base layer 110 and the second base layer 120 may be reduced, and a slimmer mask may be provided.

Referring to FIG. 8, the barrier layer 600 may include a plurality of barrier layers. For example, the barrier layer 600 includes a first barrier layer 610 disposed on the first base layer 110, a second barrier layer 620 disposed on the second base layer 120, and A third barrier layer 630 disposed in the first base layer 110 and a fourth barrier layer 640 disposed in the second base layer 120 may be included.

The first barrier layer 610 and the third barrier layer 630 may overlap the piezoelectric element 400 in a vertical direction. In detail, the centers of each of the first barrier layer 610 and the third barrier layer 630 may overlap in a vertical direction with the center of the lower surface of the piezoelectric element 400.

The first barrier layer 610 and the third barrier layer 630 may be spaced apart in a vertical direction. For example, the first barrier layer 610 and the third barrier layer 630 may be spaced apart by a distance defined by a first interval d1. The first interval d1 may be about 5 μm to about 1000 μm. In detail, the first interval d1 may be about 10 μm to about 1000 μm. When the first gap d1 is less than about 5 μm, the elastic deformation characteristics of the first base layer 110 and the protective layer 550 corresponding to the barrier layers 610 and 630 may be rapidly deteriorated. have. Accordingly, since the elastic deformation characteristics of the mask 1000 may be deteriorated, it may be difficult to effectively contact the user's skin. In addition, when the first gap d1 exceeds about 1000 μm, the thickness of the first base layer 110 may increase, so that the total thickness of the mask 1000 may increase.

The first barrier layer 610 and the third barrier layer 630 may include the same material. For example, the first barrier layer 610 and the third barrier layer 630 may include at least one of a metal and a polymer material. The first barrier layer 610 and the third barrier layer 630 may include a material capable of reflecting ultrasonic energy emitted from the piezoelectric element 400.

The second barrier layer 620 and the fourth barrier layer 640 may overlap the piezoelectric element 400 in a vertical direction. In detail, the centers of each of the second barrier layer 620 and the fourth barrier layer 640 may overlap the center of the upper surface of the piezoelectric element 400 in a vertical direction.

The second barrier layer 620 and the fourth barrier layer 640 may be spaced apart in a vertical direction. For example, the second barrier layer 620 and the fourth barrier layer 640 may be spaced apart by a distance defined by a second interval d2. The second interval d2 may be about 5 μm to about 1000 μm. In detail, the second interval d2 may be about 5 μm to about 1000 μm. When the second gap d2 is less than about 5 μm, the elastic deformation characteristics of the second base layer 120 and the protective layer 550 corresponding to the barrier layers 620 and 640 may be rapidly deteriorated. . Accordingly, since the elastic deformation characteristics of the mask 1000 may be deteriorated, it may be difficult to effectively contact the user's skin. In addition, when the second gap d2 exceeds about 1000 μm, the thickness of the second base layer 120 may increase, so that the total thickness of the mask 1000 may increase.

The second barrier layer 620 and the fourth barrier layer 640 may include the same material. For example, the second barrier layer 620 and the fourth barrier layer 640 may include at least one of a metal and a polymer material. The second barrier layer 620 and the fourth barrier layer 640 may include a material capable of transmitting ultrasonic energy emitted from the piezoelectric element 400.

In addition, the first and third barrier layers 610 and 630 may include the same material as the second and third barrier layers 620 and 640. Alternatively, the first and third barrier layers 610 and 630 may include a material different from the second and third barrier layers 620 and 640. For example, the first and third barrier layers 610 and 630 may include a material capable of reflecting ultrasonic energy, and the second and fourth barrier layers 620 and 640 may transmit ultrasonic energy. It may contain a material that can be. Accordingly, the thickness of the first base layer 110 and the second base layer 120 may be reduced, and a slimmer mask may be provided.

In addition, since the mask 1000 according to the embodiment includes a plurality of barrier layers 610, 620, 630, and 640, it may have improved reliability, and the ultrasonic energy provided in the direction of one surface of the mask 1000 Efficiency can be maximized.

FIG. 9 is another top view of the area A1 of FIG. 1, and FIG. 10 is a cross-sectional view illustrating a cross-sectional view taken along line B-B' of FIG. 9. In the description using FIGS. 9 and 10, descriptions of the same and similar configurations as the above-described mask are omitted, and the same reference numerals denote the same and similar configurations.

9 and 10, the barrier layer 600 may be disposed on at least one of the first wiring 200 and the second wiring 300. The barrier layer 600 may be disposed in a region corresponding to the piezoelectric element 400 and the wirings 200 and 300.

The barrier layer 600 may include a third barrier layer 630 disposed on the first wiring 200 as shown in FIG. 7. The third barrier layer 630 may be disposed in a region corresponding to the piezoelectric element 400. In detail, a part of the third barrier layer 630 may overlap the piezoelectric element 400 in a vertical direction. In addition, the third barrier layer 630 may be disposed in a region spaced apart from the bottom surface of the piezoelectric element 400 without overlapping in a vertical direction.

In addition, the third barrier layer 630 may be disposed in a region corresponding to the first wiring 200. For example, a part of the third barrier layer 630 may overlap the first connection part 210, and another part may overlap the first extension part 220. In detail, the third barrier layer 630 may be disposed in a region overlapping the boundary of the first connection part 210 and the first extension part 220 in a vertical direction.

In addition, the third barrier layer 630 may be disposed in a region corresponding to a bending region of the first extension part 220. For example, when the first extension part 220 is provided in a curved shape in which a wavy pattern is repeated as shown in FIG. 9, the third barrier layer 630 is formed in a vertical direction to a bending area in which the extension direction is changed. It can be placed in an overlapping area.

In addition, the barrier layer 600 may include a fourth barrier layer 640 disposed on the second wiring 300 as shown in FIG. 7. The fourth barrier layer 640 may be disposed in a region corresponding to the piezoelectric element 400. In detail, a part of the fourth barrier layer 640 may overlap the piezoelectric element 400 in a vertical direction. In addition, the fourth barrier layer 640 may be disposed in a region spaced apart from the bottom surface of the piezoelectric element 400 without overlapping in a vertical direction.

In addition, the fourth barrier layer 640 may be disposed in a region corresponding to the second wiring 300. For example, a part of the fourth barrier layer 640 may overlap the second connection part 310, and another part of the fourth barrier layer 640 may overlap the second extension part 320. In detail, the fourth barrier layer 640 may be disposed in a region perpendicular to the boundary of the second connection part 310 and the second extension part 320.

In addition, the fourth barrier layer 640 may be disposed in a region corresponding to a bending region of the second extension part 320. For example, when the second extension part 320 is provided in a curved shape in which a wavy pattern is repeated as shown in FIG. 9, the fourth barrier layer 640 is formed in a vertical direction to a bending area in which the extension direction is changed. It can be placed in an overlapping area.

Each of the third and fourth barrier layers 630 and 640 may have a width smaller than that of the piezoelectric element 400 in the horizontal direction. In detail, each of the third and fourth barrier layers 630 and 640 may be about 80% or less of the width of the piezoelectric element 400 in the horizontal direction.

Accordingly, the wirings 200 and 300 of the mask 1000 may have improved reliability. In detail, when the mask 1000 is elastically deformed, the wirings 200 and 300 may also be deformed. At this time, the boundary between the connection portions 210 and 310 and the extension portions 220 and 320 having relatively low reliability among the wirings 200 and 300, and the third and fourth barrier layers on the bending area of the extension portions 220 and 320 (630, 640) may be placed. Accordingly, the barrier layers 630 and 640 may reduce elastic deformability of a region in which the barrier layers 630 and 640 are disposed, thereby minimizing stress applied to the wirings 200 and 300.

In addition, although not shown in the drawing, each of the first and second barrier layers 610 and 620 is similar to the third and fourth barrier layers 630 and 640, and the first and second wirings 110 and 120 It may be disposed on the border area and the banding area of, but is not limited thereto.

FIG. 11 is another exploded perspective view of the area A1 of FIG. 1, and FIG. 12 is a cross-sectional view showing a cross-section C-C' of FIG. 11. In the description using FIGS. 11 and 12, descriptions of the same and similar configurations as the above-described mask are omitted, and the same reference numerals are assigned to the same and similar configurations.

11 and 12, the mask 1000 according to the embodiment may further include a first substrate 510 and a second substrate 520.

The first substrate 510 may be disposed on the first base layer 110. The first substrate 510 may be disposed between the first base layer 110 and the first wiring 200. The first substrate 510 may directly contact one surface of the first base layer 110. In this case, the first wiring 200 may be spaced apart from the first base layer 110 and may directly contact the first substrate 510. In addition, the first barrier layer 610 may be disposed below the first substrate 510. The first barrier layer 610 may be disposed to be spaced apart from or in direct contact with the first substrate 510, but is not limited thereto.

The first substrate 510 is transparent and may include a material in consideration of moisture barrier properties and thermal stability. In addition, the first substrate 510 may include a material that has flexibility and elastically deforms according to the shape of the user's skin. For example, the first substrate 510 may include a resin material such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polyimide (PI). The first substrate 510 may be provided in the form of a film.

The first substrate 510 may have a thickness of about 0.5 μm to about 5 μm or less. When the thickness of the first substrate 510 is less than about 0.5 μm, the components disposed on the first substrate 510, for example, the first substrate 510 overlapped with the components by the weight of the piezoelectric element 400 1 There may be a problem that the area of the substrate 510 is struck. Accordingly, reliability of the first substrate 510 may be deteriorated, and a problem of alignment of components disposed on the first substrate 510 may occur. In addition, when the thickness of the first substrate 510 exceeds about 5 μm, the total thickness of the mask 1000 may be increased. Accordingly, there is a problem in that the mask 1000 cannot be elastically deformed efficiently according to the shape of the user's skin, and thus cannot be effectively in close contact with the user's skin. Preferably, the first substrate 510 may have a thickness of about 0.5 μm to about 3 μm. When the thickness of the first substrate 510 satisfies the above-described range, reliability and alignment characteristics can be maintained and elastically deformed efficiently into a shape corresponding to the user's skin, and the total thickness of the mask 1000 and Weight can be reduced.

The second substrate 520 may be disposed on the second base layer 120. The second substrate 520 may be disposed between the second base layer 120 and the second wiring 300. The second substrate 520 may directly contact one surface of the second base layer 120. In this case, the second wiring 300 may be spaced apart from the second base layer 120 and may directly contact the second substrate 520. In addition, the second barrier layer 620 may be disposed above the second substrate 520. The second barrier layer 620 may be disposed to be spaced apart from or in direct contact with the second substrate 520, but is not limited thereto.

The second substrate 520 is transparent and may include a material in consideration of moisture barrier properties and thermal stability. In addition, the second substrate 520 may include a material that has flexibility and is elastically deformed according to the shape of the user's skin. For example, the second substrate 520 may include a resin material such as polyethylene terephthalate (PET), polyethylene nattalate (PEN), and polyimide (PI). The second substrate 520 may be provided in the form of a film. The second substrate 520 may have the same material and shape as the first substrate 510, but is not limited thereto.

The second substrate 520 may have a thickness of about 0.5 μm to about 5 μm. When the thickness of the second substrate 520 is less than about 0.5 μm, components disposed on the second substrate 520, for example, the second substrate 520 overlapping the components by the weight of the piezoelectric element 400 2 There may be a problem that the area of the substrate 520 is hit. Accordingly, reliability of the second substrate 520 may be deteriorated, and an alignment problem may occur between components disposed on the second substrate 520. In addition, when the thickness of the second substrate 520 exceeds about 5 μm, the total thickness of the mask 1000 may be increased. Accordingly, there is a problem in that the mask 1000 cannot be elastically deformed efficiently according to the shape of the user's skin, and thus cannot be effectively in close contact with the user's skin. Preferably, the second substrate 520 may have a thickness of about 0.5 μm to about 3 μm. When the thickness of the second substrate 520 satisfies the above-described range, reliability and alignment characteristics can be maintained and elastically deformed efficiently into a shape corresponding to the user's skin, and the total thickness of the mask 1000 and Weight can be reduced. The second substrate 520 may have the same thickness as the first substrate 510, but is not limited thereto.

According to the embodiment, as the first substrate 510 and the second substrate 520 are added, alignment characteristics of the piezoelectric element 400 during a manufacturing process may be improved. In addition, since the first substrate 510 and the second substrate 520 are added, an inflow path of moisture and foreign substances introduced from the outside may be increased, and thus the mask 1000 may have improved reliability.

13 to 15 are diagrams illustrating examples in which indicators and protrusions are provided to a mask according to an embodiment.

Referring to FIG. 13, the mask 1000 may include an indicator 710. The indicator 710 may include at least one of members such as an LED, a display, a buzzer, and the like, which can transmit information to a user, such as visually or aurally.

The indicator 710 may be disposed outside the mask 1000 to display an operation state of the mask 1000. For example, the indicator 710 may provide information on the start of the operation of the mask 1000, information indicating that the operation is in progress, and information on the completion of the operation through auditory information generated from a buzzer. In addition, the indicator 710 may display an operation state according to the emission color of the LED. In addition, the indicator may display information on an operating frequency domain through the display.

Further, referring to FIGS. 14 and 15, the mask 1000 may include a protrusion 720 disposed on an outer surface. In detail, the protrusion 720 may be disposed on the second base layer 120 facing the user's skin. For example, the protrusion 720 may be disposed on the other surface opposite to one surface of the second base layer 120 on which the second wiring 300 is disposed. Also, the protrusion 720 may be disposed on one surface of the fourth base layer 140 facing the user's skin. The protrusion 720 may be disposed on one surface of the mask 1000 facing the user's skin.

The protrusion 720 includes a material that is harmless to the human body and may be disposed to protrude from the other surface of the second base layer 120 and one surface of the fourth base layer 140 in the direction of the user's skin. The protrusion 720 may be disposed in the form of a plurality of points spaced apart from each other on the other surface of the second base layer 120 and the one surface of the fourth base layer 140. In addition, the protrusions 720 may be disposed on the other surface of the second base layer 120 and the first surface of the fourth base layer 140 in a plurality of straight or curved shapes spaced apart from each other. In addition, the protrusion 720 may be disposed in the form of at least one line on the other surface of the second base layer 120 and the first surface of the fourth base layer 140. As an example, the protrusion 720 may be disposed on the other surface of the second base layer 120 and on one surface of the fourth base layer 140 in at least one spiral shape.

When the user wears the mask 1000, the protrusion 720 may form a predetermined space between the mask 1000 and the user's skin. Accordingly, by the pressure generated when the mask 1000 is worn and/or the ultrasonic energy generated from the piezoelectric element 400, cosmetics or drugs between the mask 1000 and the skin are at the edge of the mask 1000 It can prevent being pushed into the area. That is, the protrusion 720 may serve as a partition wall preventing cosmetics or drugs from escaping from the mask 1000. Accordingly, the user can effectively inject cosmetics or drugs into the skin by using the mask 1000.

16 is a diagram illustrating a user wearing a mask according to an exemplary embodiment, and FIG. 17 is a diagram illustrating a skin care device to which the mask according to the exemplary embodiment is applied.

Referring to FIG. 16, the user 50 may wear the mask 1000. The mask 1000 may include the above-described opening 1010, and the user 50 may secure a view through the opening 1010. In addition, the mask 1000 may include the above-described cutting portion 1020, and the mask 1000 may be effectively in close contact with the curved skin by the cutting portion 1020. In this case, one surface of the second base layer 120 may directly contact the skin of the user 50. In addition, drugs or cosmetics are disposed between the second bath layer 520 and the skin of the user 50 so that the base layer 520 may directly or indirectly contact the skin of the user 50.

The mask 1000 may be operated by receiving power through an external power connected to the mask 1000. In addition, the mask 1000 may be operated by receiving power through a power supply unit (not shown) disposed outside the mask 1000, for example, on the other surface of the first base layer 110.

Also, referring to FIG. 24, the mask 1000 may be applied to and operated on the skin care device 1.

In detail, referring to FIG. 24, one side of the skin care device 1 is open and may include a body 10 including an accommodation space 11 therein.

The body 10 is light and may include a material capable of preventing damage from external impact or contact. For example, the body 10 may include a plastic or ceramic material, and may have improved reliability from an external environment, and may protect the mask 1000 disposed inside the accommodation space 11. In addition, the main body 10 may include a viewing part 13 formed at a position corresponding to the user's eyes. The viewing part 13 is formed in an area corresponding to the opening 1010 of the mask 1000, and a user can secure an external view through the viewing part 13.

The mask 1000 may be disposed in the receiving space 11 of the body 10. The mask 1000 may be disposed between the body 10 and the skin of the user 50. In detail, the first base layer 110 of the mask 1000 may be disposed to face the receiving space 11 of the body 10, and the second base layer 120 of the mask 1000 is 50 may be arranged to face the skin.

The mask 1000 may be coupled to the body 10. For example, the mask 1000 may be fixed to a set position of the receiving space 11 by a fastening member (not shown), and may have a structure that is detachable from the main body 10.

The mask 1000 may receive power through a power supply (not shown) disposed outside the mask 1000, for example, on the other surface of the first base layer 110. Alternatively, the mask 1000 may be connected to the body 10 to receive power through a power supply unit (not shown) disposed on the body 10.

The mask 1000 may include a deformable member (not shown) disposed on the lower surface of the first base layer 110. The deformable member may directly contact the first base layer 110 and may be disposed facing the receiving space 11 of the main body 10. That is, the deformable member may be disposed between the body 10 and the first base layer 110 of the mask 1000.

The deformable member may include a material whose shape is changed by external pressure. For example, the deformable member may include a material such as an air gap or a sponge, but is not limited thereto, and may include various materials whose shape is changed by external pressure. Accordingly, when the user 50 wears the skin care device 1, the deformable member may be transformed into a form corresponding to the face form of the user 50. Accordingly, the mask 1000 and the skin of the user 50 can be effectively brought into close contact. In addition, when a plurality of users wear the skin care device 1, the skin of the user 50 and the mask 1000 may be effectively brought into close contact with each other by deforming to correspond to each face shape.

Features, structures, effects, and the like described in the above embodiments are included in at least one embodiment of the present invention, and are not necessarily limited to only one embodiment. Further, the features, structures, effects, etc. illustrated in each embodiment may be implemented by combining or modifying other embodiments by a person having ordinary knowledge in the field to which the embodiments belong. Accordingly, contents related to such combinations and modifications should be interpreted as being included in the scope of the present invention.

In addition, although the embodiments have been described above, these are only examples and do not limit the present invention, and those of ordinary skill in the field to which the present invention belongs are illustrated above within the scope not departing from the essential characteristics of the present embodiment. It will be seen that various modifications and applications that are not available are possible. For example, each component specifically shown in the embodiment can be modified and implemented. And differences related to these modifications and applications should be construed as being included in the scope of the present invention defined in the appended claims.

Claims (14)

A first wiring disposed on the first base layer;
A piezoelectric element disposed on the first wiring;
A second wiring disposed on the piezoelectric element;
A second base layer disposed on the second wiring;
A protective layer disposed between the first and second base layers and surrounding the first wiring, the second wiring, and the piezoelectric element; And
A barrier layer disposed on at least one of the first and second wirings,
The barrier layer is a mask comprising a material having a lower elastic modulus than at least one of the first base layer, the second base layer, and the protective layer. The method of claim 1,
The first wiring may include: a first connection part overlapping the piezoelectric element in a vertical direction and facing a lower surface of the piezoelectric element; And a first extension part extending from the first connection part,
The second wiring may include a second connection part overlapping the piezoelectric element in a vertical direction and facing an upper surface of the piezoelectric element; And a second extension part extending from the second connection part. The method of claim 2,
The barrier layer,
A first barrier layer disposed on the first base layer; And
Including a second barrier layer disposed on the second base layer,
In a vertical direction, the first barrier layer is disposed below the first base layer, and the second barrier layer is disposed above the second barrier layer. The method of claim 3,
The first barrier layer is disposed on a region overlapping the center of the first connection in a vertical direction,
The second barrier layer is a mask disposed on an area perpendicular to the center of the second connection part. The method of claim 4,
The barrier layer,
A third barrier layer disposed within the first base layer; And
Including a fourth barrier layer disposed in the second base layer,
The third barrier layer is disposed on a region overlapping the first barrier layer in a vertical direction,
The fourth barrier layer is a mask disposed on a region overlapping the second barrier layer in a vertical direction. The method of claim 5,
The distance between the first barrier layer and the third barrier layer is 5 μm to 1000 μm,
A mask having a spacing between the second barrier layer and the fourth barrier layer of 5 μm to 1000 μm. The method of claim 5,
The third barrier layer includes the same material as the first barrier layer,
The fourth barrier layer is made of the same material as the second barrier layer. The method of claim 3,
The width of the first barrier layer in the horizontal direction is 0.8 to 2 times the width of the lower surface of the piezoelectric element in the horizontal direction,
A mask having a width of the second barrier layer in a horizontal direction of 0.8 to 2 times a width of an upper surface of the piezoelectric element in a horizontal direction. The method of claim 2,
The barrier layer,
A third barrier layer disposed within the first base layer; And
Including a fourth barrier layer disposed in the second base layer,
The third barrier layer is disposed in a region overlapping a boundary of the first connection part and the first extension part and spaced apart from the center of the piezoelectric element in a vertical direction,
The fourth barrier layer overlaps a boundary of the second connection part and the second extension part and is disposed in a region vertically spaced apart from the center of the piezoelectric element. The method of claim 3,
The first barrier layer and the second barrier layer are made of different materials. The method of claim 1,
The barrier layer is a mask including at least one of a metal and a polymer material. The method of claim 1,
The first base layer, the second base layer, and the protective layer are made of the same material. The method of claim 1,
The thickness of the first base layer is less than or equal to the thickness of the second base layer. A main body having one side open and an accommodation space in the open area; And
A mask disposed in the open area and connected to the main body,
The skin care device, wherein the mask is a mask according to any one of claims 1 to 13.

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