KR20200096727A - Systems and methods for providing an ion beam - Google Patents

Abstract

A system for generating a proton beam may include a beam of electromagnetic radiation directed at an ion-generating target. The detector can be configured to measure the laser-target interaction, and the processor can be used to generate feedback to steer the proton beam. To filter the energy of the pulsed ion beam and/or provide the pulsed ion radiation at a desired time, the system may include an electromagnet and an automated switch. The proton beam system can be used to treat patients with proton therapy by controlling the relative motion between the proton beam and the patient, including the depth of penetration of the proton beam. These systems reduce the size, complexity and cost of generating proton beams, while also improving speed, precision and configurability. When used in proton therapy, these systems allow for shorter treatment times, higher patient therapeutics, more precise treatment of the desired area and less collateral damage to healthy tissue.

Description

System and method for providing an ion beam TECHNICAL FIELD [SYSTEMS AND METHODS FOR PROVIDING AN ION BEAM]

The disclosed embodiments generally relate to improvements in ion beam generation, including proton beam generation, and in particular to ion beam generation through interaction between an electromagnetic radiation beam and an ion-generating target.

Aspects of the present disclosure include many systems, subsystems, components and subcomponents. The details of the known background art are not repeated herein. This background information may include information contained in the following sources:

US Patent No. 8,229,075 to Cowan et al. issued on July 24, 2012 and entitled "Targets and Processes for Manufacturing Targets";

US Patent No. 8,389,954 to Zigler et al. issued on March 5, 2013, entitled "System and Method for Rapid Ion Generation";

US Patent No. 8,530,852 to Le Galloudec, issued on September 10, 2013, entitled "Micro-Cone Targets for High Energy and Low Diverging Particle Beam Generation";

US Patent No. 8,750,459 to Cowan et al. issued on June 10, 2014 and entitled "Targets and Processes for Manufacturing Targets";

US Patent No. 9,236,215 to Zigler et al. issued on January 12, 2016 and entitled "System and Method for Rapid Ion Generation";

US Patent No. 9,345,119 to Adams et al. issued May 17, 2016, entitled "Targets and Processes for Manufacturing Targets"; And

U.S. Patent No. 9,530,605 to Nahum et al. issued on December 27, 2016 and entitled "Laser Activated Magnetic Field Manipulation of Laser Driven Ion Beam".

Particle radiation-therapy performed with ions can be used to treat disease. In one form of particle therapy called proton therapy, tumors are treated by irradiating protons (eg, hydrogen ions). Proton therapy has advantages over conventional photon-based therapy (eg x-ray and gamma ray therapy), in part due to the way protons and photons interact with the patient's tissues.

1 shows the radiation dose as a function of tissue depth for both photon and proton therapy. Before the particles can irradiate the treatment volume 106 defined by the patient's treatment plan, they typically have to traverse the patient's skin and other healthy tissue before reaching the patient's treatment volume 106. By doing so, the particles can damage healthy tissue, which is an undesirable side effect of treatment. As shown by curve 102 of FIG. 1, photons (eg, x-rays) transfer most of the energy to an area near the patient's skin. In the case of tumors located deeper in the patient's body, this interaction can damage healthy tissue. In addition, some photons traverse the patient's body beyond the treatment volume 106 to irradiate healthier tissue behind the tumor before ultimately leaving the other side of the patient's body. The dose of radiation to these other healthy tissues is lower than the dose delivered near the patient's skin, but is still undesirable.

Unlike photons, protons exhibit highly desirable interactions with the patient's tissues. As indicated by curve 104 of FIG. 1, the peak interaction of the patient tissue and the proton occurs deeper inside the patient and may be abruptly stopped after the peak interaction. In addition, protons interact with much less surface tissue than photons, which means that most of the energy of the proton beam can be transferred to the treatment volume 106 and irradiation of healthy tissue can be reduced. Utilizing these advantages, proton therapy allows a more precise administration of energy to unhealthy tissues of a patient while avoiding damage to healthy tissues. For example, proton therapy can reduce damage to surrounding healthy tissue by 2 to 6 times as compared to x-ray therapy, thereby improving patient survival and quality of life. Protons can reduce the risk of lifespan of secondary cancer in children by 97% compared to x-rays.

Commercial proton therapy centers are rare today due to the shortcomings of existing proton therapy systems that use large and expensive particle accelerators to generate proton beams. Accelerator-based systems can be large and not scalable. For example, FIG. 2 shows an approximate size comparison of an accelerator-based proton therapy system for a soccer field. The energy requirements and maintenance costs inherent in operating accelerator-based systems are also enormous. Taken together, these drawbacks lead to the enormous construction and maintenance costs associated with proton therapy. In addition to the excessive cost associated with accelerator-based proton beam generation, adjusting certain properties of the proton beam (eg, beam energy and beam flux) in such systems can be cumbersome and time consuming. This leads to longer treatment times and lower patient treatment volumes, further increasing individual treatment costs as fewer patients share the cost burden. Thus, currently few proton therapy centers exist, and patients often receive inferior treatment, in part due to the inability to use proton therapy.

The present disclosure relates to an alternative approach to proton therapy. While the embodiments disclosed herein contemplate the medical application of proton beam therapy, those skilled in the art will understand that the novel proton beam generation method and system described below can be used in any application where a proton beam is required. will be.

Some embodiments disclosed herein provide methods and systems for improved generation of proton beams. For example, the disclosed embodiments provide improved speed, precision and configurability, for example, so that proton beam generation can be performed more efficiently and at a lower cost, so that some of the conventional proton generation techniques as described above are It can be improved for the shortcomings. The disclosed embodiments can further reduce the size and complexity of existing systems.

In accordance with this embodiment, a system for generating a proton beam includes an interaction chamber configured to support an ion-generating target; An electromagnetic radiation source configured to provide a beam of electromagnetic radiation; One or more optical components configured to direct the beam of electromagnetic radiation to the ion-generating target to generate a resulting proton beam; A detector configured to measure at least one laser-target interaction characteristic; And generating a feedback signal based on the at least one laser-target interaction characteristic measured by the detector, and at least one of an electromagnetic radiation source, one or more optical components, and a position and orientation of the electromagnetic radiation beam relative to the ion-generating target. And at least one processor configured to change the proton beam by adjusting at least one of the ones.

Some embodiments include providing a beam of electromagnetic radiation; Directing a beam of electromagnetic radiation to an ion-generating target in the interaction chamber to generate a resulting beam of protons; Measuring at least one laser-target interaction characteristic; And generating a feedback signal based on the at least one measured laser-target interaction characteristic, such that at least one of an electromagnetic radiation source, one or more optical components, and a position and orientation of the electromagnetic radiation beam relative to the ion-generating target. It may comprise altering the proton beam by adjusting at least one.

For example, the at least one laser-target interaction characteristic may include a proton beam characteristic (eg, proton beam energy or proton beam flux).

The laser-target interaction characteristics may include secondary electron emission characteristics such as, for example, x-ray emission characteristics.

The electromagnetic radiation source may be configured to provide one or more laser beams or, for example, pulsed electromagnetic radiation beams to generate a pulsed proton beam.

The interaction chamber may include a target stage for supporting the ion-generating target, and at least one processor may be further configured to cause relative movement between the target stage and the electromagnetic radiation beam.

The structure of the ion-generating target can be determined based at least in part on a feedback signal generated from, for example, measured laser-target interaction properties.

Further, according to this embodiment, at least one laser-target interaction characteristic may include proton beam energy.

Further, according to this embodiment, at least one laser-target interaction characteristic may include a proton beam flux.

Further, according to this embodiment, the electromagnetic radiation source may be configured to change the temporal profile of the electromagnetic radiation beam in response to a feedback signal.

Further, according to this embodiment, the electromagnetic radiation source may be configured to generate a main pulse and a pre-pulse, and the at least one processor causes the electromagnetic radiation source to respond to the feedback signal to provide a contrast of the pre-pulse with respect to the main pulse. It can be configured to change the ratio.

Further, according to this embodiment, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam in response to the feedback signal.

Further, according to this embodiment, the at least one processor may be configured to cause the electromagnetic radiation source to change the spatial profile of the electromagnetic radiation beam in response to the feedback signal, for example, by changing the spot size of the electromagnetic radiation beam. .

Further, according to this embodiment, the at least one processor is configured to cause one or more optical components to change the spatial profile of the electromagnetic radiation beam, for example, by changing the spot size of the electromagnetic radiation beam in response to the feedback signal. Can be.

Further, according to this embodiment, the at least one processor may be configured to cause the motor to change the relative orientation between the electromagnetic radiation beam and the ion-generating target in response to the feedback signal.

Another embodiment according to the present disclosure may include a system for generating a beam of protons, the system comprising: an interaction chamber configured to support an ion-generating target; An electromagnetic radiation source configured to provide a beam of electromagnetic radiation; An adaptive mirror configured to direct the beam of electromagnetic radiation to the ion-generating target of the interaction chamber to produce a proton beam; And at least one processor configured to control the adaptive mirror to adjust at least one of at least one of a spatial profile of the electromagnetic radiation beam and a relative position and orientation between the electromagnetic radiation beam and the ion-generating target.

Some embodiments include providing a beam of electromagnetic radiation; Directing the beam of electromagnetic radiation to an ion-generating target in the interaction chamber using an adaptive mirror to generate a resulting proton beam; A method comprising controlling the adaptive mirror with at least one processor to adjust at least one of a spatial profile of the electromagnetic radiation beam and at least one of a relative position and orientation between the electromagnetic radiation beam and the ion-generating target. I can.

For example, the adaptive mirror may be configured to direct the electromagnetic radiation beam by at least one of refocusing the electromagnetic radiation beam, redirecting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam.

Further, according to this embodiment, the adaptive mirror can be configured to raster the electromagnetic radiation beam over the ion-generating target.

Further, according to this embodiment, the adaptive mirror includes a plurality of facets, and each of the plurality of facets may be independently controlled by a digital logic circuit.

Further, according to this embodiment, the adaptive mirror comprises a laser pulse focused on an anti-reflective coated substrate, and one or both of the laser pulse and the anti-reflective coated substrate may be controlled by a digital logic circuit. I can.

Further, according to this embodiment, the at least one processor may be configured to cause the adaptive mirror to direct the electromagnetic radiation beam to the ion-generating target in response to the feedback signal.

Further, according to this embodiment, the at least one processor may be configured to cause the adaptive mirror to direct the electromagnetic radiation beam to predetermined locations on the surface of the ion-generating target.

Further, according to this embodiment, the surface of the ion-generating target may include a patterned array.

Further, according to this embodiment, the surface of the ion-generating target may include a plurality of ion-generating structures oriented substantially along a common axis.

Further, according to this embodiment, the surface of the ion-generating target may include at least one knife edge.

In accordance with this embodiment, a system for generating a proton beam comprises: an interaction chamber configured to support an ion-generating target at a target location; An electromagnetic radiation source configured to provide an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, polarization, spatial profile and temporal profile; Electromagnetic to facilitate the formation of a proton beam with energy and flux by being positioned along the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the ion-generating target, causing the electromagnetic radiation beam to irradiate the ion-generating target. One or more optical components configured to cooperate with the radiation beam; And the flux of the proton beam while keeping the energy of the proton beam substantially constant. And controlling at least one of the electromagnetic radiation source and one or more optical components to adjust at least one of the energy of the proton beam while maintaining the flux of the proton beam substantially constant. It may include at least one process configured to change at least one of polarization, a spatial profile of an electromagnetic radiation beam, and a temporal profile of an electromagnetic radiation beam.

Some embodiments may include a method for generating a proton beam, the method comprising: supporting an ion-generating target at a target location within an interaction chamber; Providing, by an electromagnetic radiation source, an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, polarization, spatial profile and a temporal profile; Irradiating the ion-generating target with an electromagnetic radiation beam by one or more optical components positioned along a trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the ion-generating target, wherein the one or more optical components And configured to cooperate with the electromagnetic radiation beam to facilitate formation of a proton beam having a flux; By at least one processor, the flux of the proton beam while maintaining the energy of the proton beam substantially constant; And controlling at least one of the electromagnetic radiation source and one or more optical components to adjust at least one of the energy of the proton beam while maintaining the flux of the proton beam substantially constant. Changing at least one of polarization, the spatial profile of the electromagnetic radiation beam, and the temporal profile of the electromagnetic radiation beam.

Further, in accordance with this embodiment, a system for generating a proton beam includes: an interaction chamber configured to support an ion-generating target at a target location; An electromagnetic radiation source configured to provide an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, polarization, spatial profile and temporal profile; Electromagnetic to facilitate the formation of a proton beam with energy and flux by being positioned along the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the ion-generating target, causing the electromagnetic radiation beam to irradiate the ion-generating target. One or more optical components configured to cooperate with the radiation beam; And the flux of the proton beam while changing the energy of the proton beam. And the energy of the electromagnetic radiation beam, polarization of the electromagnetic radiation beam, and electromagnetic radiation by controlling at least one of the electromagnetic radiation source and one or more optical components to adjust at least one of the energy of the proton beam while changing the flux of the proton beam. And at least one process configured to change at least one of the spatial profile of the beam and the temporal profile of the electromagnetic radiation beam.

Some embodiments may include a method for generating a proton beam, the method comprising: supporting an ion-generating target at a target location within an interaction chamber; Providing, by an electromagnetic radiation source, an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, polarization, spatial profile and a temporal profile; Irradiating the ion-generating target with an electromagnetic radiation beam by one or more optical components positioned along a trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the ion-generating target, wherein the one or more optical components And configured to cooperate with the electromagnetic radiation beam to facilitate formation of a proton beam having a flux; The flux of the proton beam while changing the energy of the proton beam by at least one processor; And the energy of the electromagnetic radiation beam, polarization of the electromagnetic radiation beam, and electromagnetic radiation by controlling at least one of the electromagnetic radiation source and one or more optical components to adjust at least one of the energy of the proton beam while changing the flux of the proton beam. And changing at least one of the spatial profile of the beam and the temporal profile of the electromagnetic radiation beam.

For example, at least one processor may be configured to change the spatial profile of the electromagnetic radiation beam by changing the spot size of the electromagnetic radiation beam.

Further, according to the present embodiment, at least one processor may be configured to change the time profile of the electromagnetic radiation beam by changing a chirp of the electromagnetic radiation beam.

Further, according to this embodiment, the at least one processor may be configured to change the time profile of the electromagnetic radiation beam by changing the timing of one or more pump sources.

In addition, according to the present embodiment, the electromagnetic radiation beam may be polarized so that the electromagnetic radiation beam is not polarized.

Further, according to this embodiment, the electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam to generate a pulsed proton beam.

Further, according to the present embodiment, the at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam.

Further, according to the present embodiment, the at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam.

Further, according to the present embodiment, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam, and the at least one processor allows the one or more optical components to cause the space of the electromagnetic radiation beam. It can be configured to change the profile.

Further, according to this embodiment, the at least one processor may be configured to cause one or more optical components to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam.

Further, in accordance with this embodiment, a system for generating a proton beam includes: an interaction chamber configured to support an ion-generating target provided with a plurality of patterned features; An electromagnetic radiation source configured to provide an electromagnetic radiation beam to irradiate the plurality of patterned features; And at least one processor configured to cause the electromagnetic radiation beam to strike individual ones of the plurality of patterned features to produce a resulting proton beam.

Some embodiments include supporting an ion-generating target provided with a plurality of patterned features within an interaction chamber; Providing, by an electromagnetic radiation source, an electromagnetic radiation beam to irradiate a plurality of patterned features; And striking individual ones of the plurality of patterned features with an electromagnetic radiation beam to produce a resulting proton beam.

Further, in accordance with this embodiment, a system for generating a proton beam includes an interaction chamber configured to support an ion-generating target patterned with at least one knife edge; An electromagnetic radiation source configured to provide an electromagnetic radiation beam for irradiating at least one knife edge of the ion-generating target; And at least one processor configured to cause the beam of electromagnetic radiation to strike at least one knife edge to generate a resulting beam of protons.

Additionally, some embodiments include supporting a patterned ion-generating target with at least one knife edge within an interaction chamber; Providing, by an electromagnetic radiation source, an electromagnetic radiation beam for irradiating at least one knife edge of the ion-generating target; And striking at least one knife edge with a beam of electromagnetic radiation to generate a resulting beam of protons.

Further, according to this embodiment, the electromagnetic radiation source may be configured to provide a laser beam having a wavelength, and at least one of the plurality of patterned features may have a dimension smaller than the wavelength of the laser beam. Similarly, the knife edge can have a dimension smaller than the wavelength of the laser beam.

Further, according to this embodiment, the plurality of patterned features include protrusions extending away from the surface of the ion-generating target.

Further, according to this embodiment, at least one processor may be configured to rasterize the ion-generating target.

Further, according to this embodiment, the at least one processor may be configured to cause the electromagnetic radiation beam to continuously or discontinuously scan the surface of the ion-generating target.

Further, according to this embodiment, the at least one processor may be configured to cause the adaptive mirror to adjust the electromagnetic radiation beam to continuously or discontinuously scan the at least one knife edge.

Further, according to this embodiment, the plurality of patterned features or knife edges may include ice.

Further, according to this embodiment, the plurality of patterned features or knife edges may include silicon.

Further, according to this embodiment, the plurality of patterned features or knife edges may include carbon.

Further, according to this embodiment, the plurality of patterned features or knife edges may include plastic.

Further, according to the present embodiment, the plurality of patterned features or knife edges may include stainless steel.

Further, according to the present embodiment, the at least one processor causes the adaptive mirror to adjust the electromagnetic radiation beam to strike the individual features of the plurality of patterned features sequentially or simultaneously, or to strike the knife edge. Can be configured to

Further, according to this embodiment, at least one processor may be configured to adjust the motor to cause the electromagnetic radiation beam to sequentially strike individual features among the patterned features.

Further, according to this embodiment, at least one processor may be configured to cause sequential scanning of an electromagnetic radiation beam over adjacent ones of a plurality of patterned features.

Further, according to this embodiment, the target may be patterned with more than one knife edge.

In accordance with this embodiment, a system for generating a proton beam comprises an ion source configured to generate a pulsed ion beam comprising at least one ion bunch; At least one electromagnet; A zone proximate the electromagnet and oriented to traverse through the pulsed beam; At least one automated switch electrically connected to the at least one electromagnet for selectively activating the at least one electromagnet; A radiation trigger source configured to activate at least one automated switch; And at least one processor configured to activate the at least one electromagnet as the ion bundle traverses the region.

Another embodiment according to the present disclosure may include a method for directing a pulsed beam of charged particles, the method comprising generating a pulsed ion beam comprising at least one ion bundle, pulsed The ion beam being configured to traverse through a region proximate the at least one electromagnet; Activating at least one automated switch by a radiation trigger source, wherein the at least one automated switch is electrically connected to the at least one electromagnet; And selectively activating, by the at least one processor, at least one electromagnet as the ion bundle traverses the zone based on the activation of the automated switch.

For example, according to the present embodiment, the radiation trigger source may include one or more of ion, x-ray, electron, and laser radiation.

Further, according to this embodiment, the electromagnet is configured to generate an electromagnetic field, and the zone may be oriented to be within the electromagnetic field when the electromagnet is activated. According to this embodiment, the zone may have dimensions less than about 1 inch.

Further, according to this embodiment, the ion source may include a radiation trigger source and an ion-generating target, and the radiation trigger source activates an automated switch and irradiates the ion-generating target to generate a pulsed ion beam. Can be configured.

Further, according to this embodiment, the time for the radiation trigger source to activate the automated switch can be adjusted by a controlled delay line. The controlled delay line can be configured, for example, to adjust the time for the radiation trigger source to activate the automated switch in synchronization with the pulsed ion beam.

In addition, according to this embodiment, the automated switch may include a photoconductive semiconductor switch or a spark switch.

Further, according to the present embodiment, at least one electromagnet may include a plurality of electromagnets in series along the trajectory of the pulsed ion beam, and at least one automated switch may include a plurality of automated switches, , Each of the plurality of automated switches is associated with another of the plurality of electromagnets. The at least one processor may be configured to sequentially activate a plurality of automated switches as the ion bundle traverses each electromagnet.

In addition, according to the present embodiment, the first electromagnet among the one or more electromagnets in the series may be configured to redirect a part of the pulsed ion beam to a directional trajectory from the original trajectory, and one or more electromagnets in the series Among them, the second electromagnet may be configured to redirect at least a portion of the redirected portion of the pulsed ion beam back from the redirected trajectory to a path substantially parallel to the original trajectory.

In accordance with this embodiment, a system for generating a proton beam includes a proton source configured to provide a proton beam having a plurality of proton energies within the proton energy diffusion; And at least one processor, wherein the at least one processor controls relative movement between the proton beam and the treatment volume in two dimensions of the three-dimensional coordinate system; And controlling the proton energy diffusion to adjust the depth of the treatment volume in the third dimension of the three-dimensional coordinate system while maintaining the substantially fixed coordinates in the other two dimensions.

Another embodiment according to the present disclosure may include a method for treating a treatment volume with protons, the method comprising: providing a proton beam having a plurality of proton energies in the proton energy diffusion by a proton source; Controlling, by at least one processor, the relative movement between the proton beam and the treatment volume in two dimensions of the three-dimensional coordinate system; And controlling, by at least one processor, the proton energy diffusion to adjust the depth of the treatment volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions.

For example, according to the present embodiment, the at least one processor may be configured with the proton beam and the treatment volume, for example by rotating the gantry, directing the proton beam to the electromagnet, and/or moving the patient support platform. It can be configured to control the relative movement between.

In addition, according to the present embodiment, the system for treating the treatment volume with protons uses at least one of a magnetic analyzer, a time-of-flight control unit, and an energy reduction to provide proton energy diffusion and proton energy. It can be configured to control distribution.

According to another disclosed embodiment, a non-transitory computer-readable storage medium may store program instructions that are executed by one or more processor devices and perform any of the methods described herein.

The above general description is merely a brief summary of some disclosed embodiments and is not intended to limit the concepts of the many inventions set forth in the following drawings, detailed description, and claims.

BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated herein and constitute a part of this specification, illustrate certain aspects of the disclosed embodiments, and together with the description, describe the disclosed embodiments. In the drawing:
1 is a graph showing radiation dose correlated with tissue depth.
2 is an approximate representation of the size of some conventional accelerator-based particle therapy systems, as described above.
3 is a diagram of an example of interconnected components of a system for providing proton therapy in accordance with a disclosed embodiment.
4A, 4B, 4C, 4D and 4E are examples of an ion-generating target for generating a proton beam according to the disclosed embodiment.
5 is a schematic diagram of an example of a controller for controlling a proton therapy system in accordance with a disclosed embodiment.
6 is a schematic diagram of an example of an electromagnetic radiation source according to a disclosed embodiment.
7 is a schematic diagram of an example of a gantry according to the disclosed embodiment.
8 is a schematic diagram of another example of a gantry according to the disclosed embodiment.
9 is a flow diagram of an example of a proton therapy process according to a disclosed embodiment.
10 shows aspects of an example of an interaction chamber according to the disclosed embodiments.
11 is a flow diagram of an example of a process for controlling proton therapy with proton generation feedback in accordance with a disclosed embodiment.
12 shows the energy of an exemplary proton beam pulse according to a disclosed embodiment.
13A and 13B illustrate an example of a proton energy selection system according to the disclosed embodiment.
14 is a flow diagram of an example of a process for controlling proton therapy treatment in a three dimensional space based on proton generation feedback in accordance with disclosed embodiments.
15A, 15B, 15C and 15D illustrate an embodiment of an exemplary proton therapy treatment based on the process of FIG. 14.

Reference is made in detail to exemplary embodiments below, examples of which are shown in the accompanying drawings and disclosed herein. Where convenient, the same reference numbers are used throughout the drawings to refer to the same or similar parts.

Systems and methods for providing ion beam therapy are provided herein. The examples described below are described in connection with proton therapy. As used herein, “proton therapy” refers to a particle therapy medical procedure that most often uses a proton beam in cancer treatment to examine diseased tissue. While this description refers to such a therapy procedure, it is to be understood that the intended scope of the innovations herein is not limited to therapy or medical procedures. Rather, it can be applied at any time at which a proton beam is generated for any purpose. Further, the present disclosure is not limited to the generation of a proton beam, but also applies to other types of ion beam generation.

A system for generating a beam of protons according to the present disclosure may include one or more sources of electromagnetic radiation. “Electromagnetic radiation” as used in this disclosure may refer to any form of electromagnetic radiation having any wavelength, frequency, energy, power, polarization, and/or spatial or temporal profile. In some embodiments, the electromagnetic radiation may be propagated in the form of a beam. For example, the electromagnetic radiation beam can be any form of electromagnetic radiation suitable for irradiating a desired location. In some embodiments, a system for providing a proton therapy system may be configured to provide a beam of electromagnetic radiation along a trajectory. The electromagnetic radiation beam, for example, to irradiate a plurality of patterned features to an ion-generating target (also described in more detail below) or to irradiate one or more knife edges to an ion-generating target (also described in more detail below). Can be configured.

The electromagnetic radiation beam may comprise a defined energy, wavelength, power, energy, polarized (or may not be polarized), spatial profile and/or temporal profile. Any of these properties can be fixed or variable. For example, the electromagnetic radiation source can be configured to provide a laser beam with properties tailored to the properties of the ion-generating target. The electromagnetic radiation beam can be pulsed to generate a pulsed proton beam, or can be continuous to generate a continuous beam of protons.

) 또는 블레이드의 에지와 유사한 하나 이상의 좁은 에지를 포함할 수 있다.A system for generating a proton beam according to the present disclosure may comprise an ion-generating target. As used in this disclosure, an ion-generating target may refer to any material, device, or combination of elements configured to generate ions in response to electromagnetic irradiation. As described below, the ion-generating target may be configured to generate a proton beam; The proton beam is just an example. In some embodiments, the ion-generating target may be provided with a plurality of patterned features. For example, the plurality of patterned features can include protrusions extending from the surface of the ion-generating target. In some embodiments, the ion-generating target may be patterned with one or more knife edges. For example, the knife edge of the ion-generating target is the Arete (

) Or one or more narrow edges similar to the edge of the blade.

A system for generating a proton beam in accordance with the present disclosure may include optical component(s). As used in the present disclosure, the optical component(s) may, for example, shape, direct, filter, split, delay, modulate, absorb, amplify, focus, chop and/or reflect an electromagnetic radiation beam. It may refer to any one or more components for manipulating and/or controlling an electromagnetic radiation beam in any manner including. As an example, the optical component may be positioned along the trajectory of the electromagnetic radiation beam, for example between the electromagnetic radiation source and the surface of the ion-generating target. In some embodiments, the optical component may be configured to direct a beam of electromagnetic radiation to an ion-generating target, eg, to generate a resulting beam of protons. Additionally, the electromagnetic radiation source may include one or more optical components to facilitate formation of the electromagnetic radiation beam.

In accordance with the present disclosure, an optical component may include one or more adaptive mirror(s). As used in this disclosure, an adaptive mirror may refer to an element comprising a reflective surface that may be adapted. For example, the adaptive mirror may be a deformable mirror including a plurality of facets, and each of the plurality of facets can be independently controlled by a digital logic circuit. As another example, the adaptive mirror may be a plasma mirror comprising a laser pulse focused on an anti-reflective coated substrate, and one or both of the laser pulse and the anti-reflective coated substrate are controlled by a digital logic circuit. Can be. In some embodiments, the adaptive mirror may be configured to direct the beam of electromagnetic radiation to the ion-generating target, or in some cases cause the beam of electromagnetic radiation to irradiate the ion-generating target to facilitate formation of the proton beam. It can be configured to cooperate with the electromagnetic radiation beam for harm. The adaptive mirror according to the present disclosure may be configured to adjust or control the spatial profile of the electromagnetic radiation beam and/or to adjust or control at least one of the relative position and orientation between the electromagnetic beam and the ion-generating target. In some examples, the adaptive mirror may be configured to direct the electromagnetic radiation beam by adjusting one or more properties of the electromagnetic radiation beam. For example, the adjustment may be achieved by at least one of adjusting the focus of the electromagnetic radiation beam, redirecting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam.

According to the present disclosure, a system for generating a beam of protons may be configured to rasterize a beam of electromagnetic radiation over an ion-generating target, for example. As used in this disclosure, rasterization can refer to a pattern of sequential scanning over a surface or volume having any shape. Rasterization may be achieved, for example, by one or more motors configured to cause a beam of electromagnetic radiation to sequentially scan a surface or volume. In some embodiments, the electromagnetic radiation beam may be rasterized over the ion-generating target or individual patterned features of the knife edge of the ion-generating target. In some embodiments, the adaptive mirror may be configured to direct the beam of electromagnetic radiation to strike individual features of the ion-generating target.

A system for generating a proton beam in accordance with the present disclosure may include a proton beam steering component(s). As used in this disclosure, the proton beam steering component(s) can be used to accelerate, analyze, direct, shape, filter, split, delay, modulate, absorb, amplify, focus, chop, and/or a proton beam, for example. It may refer to any one or more components for manipulating and/or controlling a proton beam in any manner, including reflecting. For example, the proton beam steering component may be one or more quadrupole lenses, cylindrical mirror lenses/analyzers ("CMA"), spherical mirror lenses/analyzers ("spherical mirror lens/analyzers"). ), a collimator, energy reduction, time-of flight control unit, magnetic dipole, or other components suitable for manipulating charged ions.

The system for generating a proton beam according to the present disclosure can be used in conjunction with a system for treating a treatment volume with a proton. For medical treatment, the volume can be a group of cells or an area of tissue. When employed outside of the medical field, the volume can be any area or area where benefits can be achieved through the application of radiation.

According to the present disclosure, a gantry may be provided. Gantry may refer to any device configured to assist in directing radiation towards a target. The target to be irradiated may be a therapeutic volume, such as a tumor in the patient's body, for example. It should be understood that the system for treating a treatment volume with a proton according to the present disclosure is only one application of the disclosed system to generate a proton beam, so this is only an example. The gantry can also be used to direct a beam of protons or other radiation towards any target to be irradiated.

According to the present disclosure, a patient support platform may be provided. The patient support platform may refer to any surface, foundation, or other structure configured to support a patient during an irradiation therapy. The patient support platform may be fixed or may be adjustable to any dimension.

Any system according to the present disclosure may include at least one processor configured to monitor, control and/or facilitate the use of any component included in the system. According to the disclosed embodiment, the processor includes, for example, an application specific integrated circuit (ASIC), a digital signal processor (DSP), a programmable logic device (PLC), and a field programmable gate. Arrays (FPGAs), controllers, microprocessors, or other similar electronic devices, and/or combinations thereof. The processor may include one or more modules of the control system.

In some embodiments according to the present disclosure, the at least one processor is configured to cause the beam of electromagnetic radiation to strike individual patterned features that make up the plurality of patterned features of the ion-generating target to produce the resulting proton beam. Can be. In some embodiments according to the present disclosure, the at least one processor may be configured to cause the beam of electromagnetic radiation to strike one or more knife edges of the ion-generating target to produce a resulting beam of protons.

In some embodiments, at least one processor may control at least one of an electromagnetic radiation source and/or an optical component. For example, the processor or group of processors may comprise at least one of the energy of the electromagnetic radiation beam, the flux of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic energy beam, the temporal profile of the electromagnetic radiation beam, or other aspects of the electromagnetic radiation beam. Can be controlled. More specifically, the at least one processor may generate instructions that cause the electromagnetic radiation source to change the spatial profile of the electromagnetic radiation beam by changing the spot size of the electromagnetic radiation beam. As another example, the at least one processor may change the temporal profile of the electromagnetic radiation beam by changing a chirp of the electromagnetic radiation beam. As another example, the at least one processor may change the temporal profile of the electromagnetic radiation beam by changing the timing of one or more laser pump sources.

In an embodiment according to the present disclosure, the at least one processor may be configured to cause the adaptive mirror to direct the electromagnetic radiation beam to a predetermined location on the surface of the ion-generating target. For example, the processor or processors may be configured to cause the electromagnetic radiation beam to rasterize the ion-generating target. Such rasterization may include sequential scanning of a beam of electromagnetic radiation over adjacent patterned features comprising a plurality of patterned features. Striking individual patterned features may include, for example, continuously or discontinuously scanning the surface of an ion-generating target. In some embodiments, the processor may be configured to cause the adaptive mirror to adjust the electromagnetic radiation beam to individually strike the patterned features, or may be configured to strike individual patterned features simultaneously.

In accordance with the present disclosure, at least one processor may be configured to independently or simultaneously control multiple aspects of the system. For example, the at least one processor may be configured to adjust the flux of the proton beam while keeping the energy of the proton beam substantially constant, or to adjust the energy of the proton beam while keeping the flux of the proton beam substantially constant. Can be configured. Alternatively, the at least one processor may be configured to simultaneously adjust the flux of the proton beam and the energy of the proton beam.

3 depicts an exemplary system 300 for providing proton therapy, including an exemplary system for generating a proton beam. System 300 is also an example of a system for treating a treatment volume with a proton. In accordance with the disclosed embodiment, the system 300 comprises an electromagnetic radiation source 302, an ion-generating target 304, an optical component(s) 306, a proton beam steering component(s) 308, a gantry ( 310), a patient support platform 312, and a control system 314 configured to communicate with any one or more of the foregoing.

The patient may be positioned on the patient support platform 312. The patient support platform 312 may be of any shape or shape suitable for use with other components of the system 300 and assist in supporting the patient during treatment. The patient support platform 312 may be secured in place relative to the gantry 310 or the patient support platform 312 may be configured for translation and/or rotation before or during treatment. In some embodiments, the patient support platform 312 may be adjusted to accommodate patients of different sizes or to position the treatment volume in the path of the proton beam. Further, in some embodiments, the patient support platform 312 may be adjusted during treatment to reposition the treatment volume for the proton beam.

The gantry 310 may be configured to direct the proton beam toward a treatment volume, such as a tumor, within the patient's body. The gantry 310 may be configured to be manipulated in one or more ways to influence the path of the proton beam, and may be constructed of a number of materials and may include a number of components. An example of the gantry 310 according to an embodiment of the present disclosure will be described later in more detail, and this is not intended to be limiting.

The electromagnetic radiation source 302 may emit an electromagnetic radiation beam 316, eg, a laser beam, directed towards the ion-generating target 304. In some embodiments, the electromagnetic radiation source 302 is one or more gas lasers (e.g., CO2 lasers), diode pumped solid state (DPSS) lasers (e.g., ytterbium lasers, neodymium-doped lasers). Yttrium aluminum garnet laser (Nd: YAG) or titanium-sapphire laser (Ti: sapphire)) and/or flash lamp pumped solid state laser (e.g., Nd: YAG or neodymium glass). In a broader sense, any radiation source capable of emitting ions from the target may be employed.

The electromagnetic radiation source 302 may be selected based on its intensity, the temporal duration of the pulse, and the energy divided by the spot size of the laser on the ion-generating target 304. Various combinations of spatial profile (eg, spot size), wavelength, temporal duration and energy can be used while still providing the same intensity. For example, in some embodiments, the electromagnetic radiation beam 316 may be in an energy range of 1 J to 25,000 J and a wavelength range of 400 nm to 10,000 nm. The electromagnetic radiation beam 316 may be pulsed in a pulse width range of 10 fs to 100 ns, for example. The electromagnetic radiation beam 316 can have various spot sizes. In some embodiments, a spot size of 1 μm ² to 1 cm ² may be used. Although the spatial profile of the electromagnetic radiation beam 316 can have any beam profile, in some embodiments the spatial profile is Gaussian, Super-Gaussian, Top Hat, Bessel, or annular beam profile. It may include.

In some embodiments, the electromagnetic radiation source 302 may be configured to generate a main pulse after one or more pre-pulses. The contrast ratio (ie, the ratio between the main pulse and the pre-pulse, also referred to as "pedestal" that arrives before the main pulse) can affect proton generation. The contrast ratio can be more specifically defined as the intensity of the laser increases. As an example, at a time scale shorter than 100 ps, the contrast ratio may range from 10 ^-8 to 10 ^-12 .

As a more specific example, the electromagnetic radiation source 302 may be a Ti: sapphire laser. In the example of a Ti:sapphire laser, the electromagnetic radiation beam 316 can be in the energy range of about 1 J to 25 J, and can have a wavelength of about 800 nm. In this example, the electromagnetic radiation beam 316 may have a pulse width range of about 10 fs to 400 fs, a spot size of about 2 μm ² to 1 mm ² , and a Gaussian or top hat spatial profile. These characteristics are merely exemplary, and other configurations may be employed.

The electromagnetic radiation beam 316 is, for example, by one or more optical component(s) 306 disposed along a trajectory between the electromagnetic radiation source 302 and the ion-generating target 304. 304). The optical component(s) 306 may be configured to modify one or more optical and/or mechanical properties of the electromagnetic radiation beam 316, including spectral properties, spatial properties, temporal properties, energy, polarization, contrast ratio, or other properties. It may contain components. Optical component(s) 306 may be related to, for example, generating, optimizing, steering, aligning, modifying, and/or measuring an electromagnetic radiation beam 316, or to other aspects of system 300. have. Optical component(s) 306 may include lenses, mirrors, laser crystals and other lasing materials, piezo activated mirrors, plates, prisms, beam splitters, filters, light pipes, windows, blanks, optical fibers, frequency shifters, optical amplifiers. , Gratings, pulse shapers, XPWs, Mazzler (or Dazzler) filters, polarizers, pocket cells, light modulators, diaphragms, foamable absorbers, and other optical elements.

Optical component(s) 306 may be stationary or adaptive. For example, optical component(s) 306 may be one or more active components such as deformable mirrors, plasma mirrors, pocket cells, phase shifters, light modulators, irises, shutters (manual and computer controlled), and other similar components. , Adaptive or reconfigurable components. As in the case of deformable mirrors or plasma mirrors, adaptive properties can manipulate the optical component itself. The orientation of the optical component(s) 306 may also be adjustable, such as translating the optical component(s) 306 or rotating the optical component(s) 306 about an axis of rotation. Adjustment can be manual or automatic. As an example, the control system 314 may receive a feedback signal, in response to which is connected to the optical component(s) 306 located between the electromagnetic radiation beam 316 and the ion-generating target 304. It can provide control signals to the motor. Consequently, movement of the motor changes the relative orientation between the electromagnetic radiation beam 316 and the ion-generating target 304 (e.g., by repositioning the laser-target interaction) of the optical component(s). ) 306 can be adjusted.

Examples of deformable mirrors that can be employed in the optical component(s) 306 are, for example, segmented mirrors, mirrors of continuous faceplates, magnetic mirrors, MEMS mirrors, membrane mirrors, bimorph mirrors. And/or a ferrofluid mirror. Any number of other mirror techniques that can change the wavefront of the electromagnetic radiation beam can also be used.

Examples of plasma mirrors that may be employed in the optical component(s) 306 include laser pulses focused on an anti-reflective coated substrate, which reflects and separates high intensity peaks from the low intensity background of the pulses. Ionize. As an example, a plasma mirror can be established by directing a laser pulse toward a parabolic mirror positioned in front of an anti-reflective coated substrate. Other ways of implementing plasma mirrors are also known to those skilled in the art and are suitable for use with embodiments of the systems and methods described herein.

The optical component(s) 306 can be customized to parameters related to the intended beam. For example, the optical component 306 can be customized in terms of wavelength, intensity, time pulse shape (eg, pulse width), spatial size and energy dispersion, polarization, and other properties of the intended beam. These beam parameters depend on the optical substrate material, size (e.g., transverse size or thickness), coating material (if present), shape (e.g., flat, spherical or other), orientation to the beam, or other specifications. Can be related.

The optical component(s) 306 may include one or more corresponding holders configured to hold the element in place while allowing appropriate accuracy, e.g., translation and rotation, as well as positioning of the element in other degrees of freedom. have. In one embodiment, such a holder may include an opto-mechanical mount held in place by an optical table or any other mechanical holder. These degrees of freedom can be manipulated manually or through any suitable automated means such as an electric motor.

Optical component(s) 306 may be placed in specific environmental conditions, such as vacuum and/or an environment purged by one or more gases. In addition, the optical component 306 can be located at various locations along the path of the electromagnetic radiation source 302 between the electromagnetic radiation source 302 and the ion-generating target 304, or any other system where the optical component is required. Can be placed at 300. The optical component(s) 306 may be configured for a variety of uses, such as laser beam steering, laser beam diagnostics, laser-target interaction diagnostics, and/or ion-generating target viewing and positioning.

In some embodiments, the lifetime of the optical component(s) 306 may vary. Some optical component(s) 306 may be long-term equipment that is reused multiple times. Alternatively or additionally, some optical component(s) 306 may be consumable that are used and replaced fewer times. This classification can be based on many factors such as laser intensity and the presence of debris/contamination. In some embodiments, debris shielding can be installed in close proximity to expensive or delicate optics to reduce the need for frequent replacement. Periodic inspections may be performed on optical instruments suspected of damage. Special optical systems can be installed to inspect dangerous optical instruments.

The optical component(s) 306 can be manipulated manually, automatically, or any combination thereof. Input types for manipulating the optical component 306 may include high voltage signals, triggering signals, optical pumping, or any other form of input. Additionally, the optical component(s) 306 may be monitored by one or more cameras, such as a CCD camera. Automatic manipulation of the adaptive mirror(s) may occur, for example, in response to one or more signals provided by the control system 314. The control system 314 may control, for example, one or more motor(s) associated with the deformable mirror, piezoelectric element(s), microelectromechanical (MEMS) element(s), and the like. Alternatively or additionally, the control system 314 may control one or more laser pulse(s) associated with the plasma mirror, anti-reflective coated substrate(s), and the like, for example.

In some embodiments, optical component(s) 306 may include an adaptive deformable mirror, such as a deformable mirror having a plurality of facets, each of the plurality of facets being independently controllable. The facets may be controlled by digital control logic circuitry, such as digital control logic circuitry included in control system 314. As another example, the adaptive mirror may be a plasma mirror that reflects and separates high intensity peaks from the low intensity background of laser pulses by ionizing an anti-reflective coated substrate using a focused laser pulse. The laser pulsed and/or anti-reflective coated substrate may be controlled by digital control logic circuitry, such as digital control logic circuitry included in control system 314.

The adaptive mirror may be configured to direct the electromagnetic radiation beam 316 by one or more of refocusing the electromagnetic radiation beam, redirecting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. The adaptive mirror can be configured to adjust the focus of the electromagnetic radiation beam in any manner apparent to one of ordinary skill in the art. For example, the electromagnetic radiation beam 316 may strike a plurality of facets of the deformable mirror, or the electromagnetic radiation beam 316 may strike the plasma mirror. In some configurations, it may be desirable to adjust where the electromagnetic radiation beam 316 is directed or to adjust the properties of the electromagnetic radiation beam 316. The plurality of facets of the deformable mirror may be controlled to reflect the electromagnetic radiation beam 316 such that the spot size at a desired location is smaller, larger or shaped differently than the spot size just before striking the deformable mirror. Likewise, the plasma mirror can be controlled to reflect the electromagnetic radiation beam 316 such that the spot size at the desired location is smaller, larger, or shaped differently than the spot size immediately before striking the plasma mirror.

The adaptive mirror can also be configured to redirect the electromagnetic radiation beam 316. For example, the system 300 may sequentially target a plurality of ion-generating targets 304 where the electromagnetic radiation beam 316 is disposed at a plurality of locations on the ion-generating target 304 or at different locations within the system 300. Or it can be configured to strike simultaneously. In this configuration, the adaptive mirror or other optical component(s) 306 can redirect the electromagnetic radiation beam 316 to direct the beam to a plurality of locations and/or to a plurality of ion-generating targets. For example, the adaptive mirror or other optical component(s) 306 may sequentially redirect the electromagnetic radiation beam 316 from one location to an adjacent location in a continuous or discontinuous pattern, such as in a stepwise manner. For example, you can scan). In an automated process, the control system 314 can be configured to cause the adaptive mirror to direct the electromagnetic radiation beam 316 to a predetermined location on the surface of the ion-generating target 304. For example, it may be advantageous to scan the electromagnetic radiation beam 316 over a patterned array of ion-generating features provided on the surface of the ion-generating target 304. Also, an electromagnetic radiation beam 316 over the ion-generating target 304 comprising a plurality of ion-generating structures oriented substantially along a common axis, such as protrusions extending substantially away from the surface of the ion-generating target 304. ) Can be advantageous. Also, scanning an electromagnetic radiation beam 316 over an ion-generating target 304 patterned with one or more knife edges, such as an ion-generating target comprising one or more features with narrow edges similar to the edge of an arete or blade. It can be advantageous to do. An adaptive mirror is described as an example. One of ordinary skill in the art will recognize that other optical component(s) 306 may perform the same or similar functions as described above with reference to the adaptive mirror.

According to the present disclosure, an ion-generating target may be configured to facilitate ion generation. For example, an ion-generating target can include a surface having one or more ion-generating structures or features. Such structures or features may be composed of one or more suitable materials, including ice (also referred to as snow), plastic, silicon, stainless steel, or any of a variety of metals, carbon, and/or any other material from which an ion beam can be generated. I can. These structures may be randomly arranged, arranged as defined by the growth or deposition process, and/or arranged in a patterned array. Such structures may alternatively or additionally include one or more narrow edges similar to the edges of aretes or blades. The structure may be constructed based on one or more properties of the electromagnetic radiation beam. For example, such structures may have dimensions smaller than the wavelength of an electromagnetic radiation beam such as a laser.

When hit by the electromagnetic radiation beam 316, the ion-generating target 304 can emit a variety of particles including electrons, protons, x-rays and other particles. The ion-generating target 304 can be made of a variety of materials. The ion-generating target 304 may be configured to include one or more individual features configured to interact with the electromagnetic radiation beam 316. Alternatively or additionally, the ion-generating target 304 may include a continuous surface or texture formed of a material advantageous for interacting with the electromagnetic radiation beam 316. One of ordinary skill in the art will appreciate that there are a number of configurations that can be employed to emit particles when interacting with a beam of electromagnetic radiation, and the disclosed embodiments are merely exemplary.

In some embodiments, the ion-generating target 304 may be prefabricated. In other embodiments, the ion-generating target 304 may be created in situ within the system 300 or an attached sample preparation system. For example, the ion-generating target 304 may be disposed within an interaction chamber such as the interaction chamber 1000 described below. This may include forming an ion-generating target from a suitable material, including forming such a material on a substrate. Such materials may include any gaseous, solid or liquid chemical source of the type commonly known in techniques such as evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. For example, in embodiments where the ion-generating target 304 comprises ice, the material used to form the ion-generating target is water vapor (H ₂ O), hydrogen gas (H ₂ ), and/or oxygen gas. It may contain (O ₂ ). Further, in an embodiment in which the ion-generating target 304 comprises silicon, the material used to form the ion-generating target 304 is, for example, silane (SiH ₄ ), disilane (Si ₂ H _{6 ).} ), trichlorosilane (SiHCl ₃ ), or any other silicon source. Further, in embodiments where the ion-generating target 304 comprises plastic, the source may comprise, for example, a polytetrafluoroethylene (PTFE) polymer source material or any other PTFE source. As those skilled in the art will recognize, these are only a few illustrative examples of the many available target materials and target source materials. In addition, the interaction chamber may have various structures according to the shape of the target to be employed. For example, if the target is ice, the interaction chamber can be specifically configured to maintain an appropriate temperature to support the ice. Each target material may have different maintenance requirements, and thus the structure of the interaction chamber may be varied to suit the target.

4 shows an exemplary ion-generating target that may be employed as the ion-generating target 304. For example, FIG. 4A shows an ion-generating target 402 comprising a cap structure 404 positioned over a hollow, hourglass-shaped cone 406. In one embodiment, the distance between at least two opposing points of the cone may be less than about 15 pm. In certain examples, the distance may be less than about 1 pm. In some embodiments, features of ion-generating target 402 may be free standalone. Such features can include any number of shapes including, for example, cones, pyramids, hemispheres and capped structures. The structure of the exemplary ion-generating target 402 shown in FIG. 4 (as well as other embodiments of the ion-generating target 304) can be formed using a lithographic technique such as a photolithographic technique. In certain examples, the ion-generating target cone 406 may be fabricated on a silicon wafer 408 and then coated with one or more metals 410. In some embodiments, protons may be released from rear opening 412. 4B shows another exemplary ion-generating target suitable as an ion-generating target 304 for use in the present invention. 4B shows a portion of an ion-generating target having one or more micro-conical targets 420 on its surface. Each micro-cone target 420 may be suitable for generating a high energy, low diverging particle beam. In one embodiment, the micro-conical target 420 is a substantially conical body having an outer surface 424, an inner surface 426, a generally flat and rounded open base 428, and a tip 430 defining an apex. (422) may be included. The conical body 422 can be tapered along the length from the generally flat rounded open base 428 to the tip 430, which defines the apex. The outer surface 424 and the inner surface 426 can connect the base 428 to the tip 430.

4C, 4D and 4E illustrate another exemplary ion-generating target 304 suitable for use with embodiments of the present invention. Specifically, FIGS. 4C, 4D and 4E illustrate the surface of a snow target that may be formed from ice crystals. Because water is rich in hydrogen, ice can be advantageous for use as an ion-generating target. Further, as shown in FIG. 4C, the structure on the ion-generating target may exhibit a needle-like shape. This shape can enhance the electric field generated by the interaction of the electromagnetic radiation beam 316 and the ion-generating target 304. Individual needle-like structures on the ion-generating target 304 may be approximately equal to the wavelength of the electromagnetic radiation beam 316. As an example, the structure may be approximately 1 μm to 10 μm.

Individual patterned features on the surface of the ion-generating target 304 may be physically arranged on the ion-generating target 304 so that they can be sequentially scanned. For example, these structures can be arranged in an array on a generally planar surface. As shown in Fig. 4c, individual structures can be dispersed uniformly forming a pattern over the entire surface. Alternatively, the structures can be arranged in a repeating pattern with spaces between the structures, as shown in Figs. 4D and 4E.

Referring again to Figure 3, the proton beam steering component(s) 308 forms a proton beam 318 from the protons produced by the ion-generating target 304 and directs the proton beam to the gantry 310 and the patient. It may include one or more components configured to be directed to a therapeutic volume. The proton beam steering component 308 may include any equipment capable of manipulating charged particles such as protons. For example, the proton beam steering component(s) 308 may comprise an electromagnetic component. More specifically, the proton beam steering component(s) 308 includes a quadrupole lens, a cylindrical mirror lens/analyzer ("CMA"), a spherical mirror lens/analyzer ("SMA"), a collimator, energy reduction, flight- It may include one or more electromagnetic components such as a time control unit, a magnetic dipole, or other components suitable for manipulating charged ions. The proton beam steering component(s) 308 may also adjust one or more properties of the proton beam 318. For example, beam steering component 308 can manipulate properties such as flux or spot size. The proton beam steering component(s) 308 may also filter out particles having a specific energy or reduce the energies of various particles.

The proton beam steering component(s) 308 may be placed at various locations within the system 300, including within the interaction chamber, along the proton beam line, within the gantry 310, or any combination thereof. . For example, the proton beam steering component may be disposed along a beam line extending between the ion-generating target 304 and the gantry 310. The beam line may be configured to maintain various conditions such as temperature, pressure (eg, vacuum) or other condition(s) to aid in propagating and/or manipulating the proton beam 318. The beam line may further include other components for receiving the charged particle beam including, but not limited to, elements such as a beam dump, a beam attenuator, and a protective shield.

The control system 314 can monitor and/or control various aspects of the system 300. For example, control system 314 may include an electromagnetic radiation source 302, optical component(s) 306, ion-generating target 304, proton beam steering component(s) 308, gantry 310 ), and/or various detectors associated with the patient support platform 312. The control system 314 may also accept input from a user of the system 300 such as a technician or other operator. Control system 314 may also accept, store, and execute operations pertaining to system 300, including, for example, initiating and maintaining any function of system 300. Control system 314 may also be configured to implement feedback between one or more detectors and one or more various components of system 300. For example, such feedback may improve the precision, efficiency, speed and/or other aspects of system 300 or its operation. Examples of such feedback are described in much more detail below.

5 is a diagram of an exemplary computing system 500 that may be associated with the control system 314 and represents a configuration in accordance with the disclosed embodiments. As will be appreciated by those of ordinary skill in the art, some or all of the functionality associated with the control system 314 may be executed or facilitated by software, hardware, or any combination thereof associated with the computing system 500. In one embodiment, computing system 500 may have one or more processors 520, one or more memories 540, and one or more input/output (I/O) devices 530. In some embodiments, computing system 500 may take the form of a server, a general purpose computer, a custom dedicated computer, a mainframe computer, a laptop, a mobile device, or any combination of these components. In certain embodiments, computing system 500 (or a system including computing system 500) is based on storage, execution, and/or implementation of software instructions capable of performing one or more actions in accordance with the disclosed embodiments. It can be composed of devices, systems, and the like. Computing system 500 may be standalone, or may be part of a subsystem that may be part of a larger system.

The processor 520 includes an application specific integrated circuit (ASIC), a digital signal processor (DSP), a programmable logic device (PLC), a field programmable gate array (FPGA), a processor, a controller, a microprocessor, other electronic units, and combinations thereof. It may include one or more of the same known processing devices. For example, the processor 520 may include a Pentium™ or Xeon™ family manufactured by Intel™, a Turion™ family manufactured by AMD™, or any of a variety of processors manufactured by Sun Microsystems. . The processor 520 may constitute a single core or multiple core processors that simultaneously execute parallel processes. For example, the processor 520 may be a single core processor configured with virtual processing technology. In certain embodiments, processor 520 may use a logical processor to execute and control multiple processes simultaneously. The processor 520 may implement virtual machine technology or other known technology to provide capabilities such as execution, control, execution, manipulation, storage, etc. of multiple software processes, applications, programs, and the like. Processor 520 may include an array of multi-core processors (eg, dual, quad core, etc.) configured to provide parallel processing functionality so that computing system 500 can execute multiple processes simultaneously. One of ordinary skill in the art will understand that other types of processor arrangements may be implemented that provide the capabilities disclosed herein. The disclosed embodiment is not limited to any type of processor(s).

Memory 540 may include one or more storage devices configured to store instructions used by processor 520 to perform functions related to the disclosed embodiments. For example, the memory 540 may be composed of one or more software instructions such as program(s) 550 that can perform one or more operations when executed by the processor 520. The disclosed embodiment is not limited to a separate program or computer configured to perform a dedicated task. For example, the memory 540 may include a program 550 that performs a function of the computing system 500, or the program 550 may include a plurality of programs. Additionally, processor 520 may execute one or more programs located remotely from computing system 500. For example, the controller 314 can access one or more remote programs that, when executed through the computing system 500 (or variations thereof), perform functions related to a particular disclosed embodiment. The processor 520 may additionally execute one or more programs located in the database 570. In some embodiments, the program 550 may be stored in an external storage device such as a server located outside the computing system 500, and the processor 520 may remotely execute the program 550.

Memory 540 may also store data that may reflect any type of information in any format the system may use to perform operations in accordance with the disclosed embodiments. The memory 540 may store instructions that enable the processor 520 to execute one or more applications, such as server applications, network communication processes, and any other type of application or software. Alternatively, instructions, application programs, and the like may be stored in an external storage (not shown) that communicates with the computing system 500 over a local area network or a suitable network including the Internet. Memory 540 may be volatile or nonvolatile, magnetic, semiconductor, tape, optical, removable, non-removable, or other type of storage device or tangible (ie, non-transitory) computer-readable medium.

The memory 540 may include data 560. Data 560 may include any form of data used by controller 314 to control ion (eg, proton) therapy treatment through system 300. For example, data 560 may be data related to the operation of various components of system 300, feedback parameters associated with various components of operating system 300, and data collected from one or more detectors associated with system 300. , A treatment plan for a specific patient or a specific disease, correction data for various components of the system 300, and the like.

The I/O device 530 may include one or more devices configured to allow data to be received and/or transmitted by the computing system 500. I/O devices 530 may include one or more digital and/or analog communication devices that enable computing system 500 to communicate with other machines and devices, such as other components of system 300 shown in FIG. I can. For example, computing system 500 may include one or more keyboards, mouse devices, displays, touch sensors, card readers, biometric readers, cameras, and/or other devices that enable computing system 500 to receive input from an operator of controller 314. It may include an interface component capable of providing an interface to one or more input devices such as scanners, microphones, wireless communication devices, and the like. In addition, the I/O devices may include one or more devices configured to allow the control system 314 to communicate with one or more of the various devices of the system 300, such as over a wired or wireless communication channel.

Computing system 500 may also include one or more database(s) 570. Alternatively, computing system 500 may be communicatively connected to one or more database(s) 570. The computing system 500 may be communicatively connected to the database(s) 570 through a network such as a wired or wireless network. Database 570 may include one or more memory devices that store information and are accessed and/or managed through computing system 500.

6 is a general schematic diagram of an exemplary electromagnetic radiation source 302. As shown in Figure 6, the electromagnetic radiation source 302 includes one or more oscillators 602, pump sources 604, optical components 606, diagnostic components 608, expanders 610, amplifiers 612. , A compressor 614 and a controller 616 may be included. The configuration of FIG. 6 is merely an example, and many other configurations according to the disclosed embodiments may be implemented by incorporating one or more components of the electromagnetic radiation source 302, system 300, or other components.

Oscillator 602 may include one or more lasers to generate initial laser pulses 618 to be manipulated (eg, shaped and/or amplified) to reach the requirements for electromagnetic radiation beam 316. A wide variety of lasers or laser systems can be used as the oscillator 602, including commercial laser systems.

Pump source 604 may include an independent laser or laser system(s) configured to deliver energy in laser pulses 618. In some embodiments, pump source 604 may be connected to the output of oscillator 602 by an optical beam line comprising one or more optical component(s) 306. Additionally or alternatively, the pump source 604 may include other pump mechanisms such as flash lamps, diode lasers, and diode-pumped solid-state (DPSS) lasers. In some embodiments, the pump source 604 may be configured to change the temporal profile of the electromagnetic radiation beam 316. For example, the control system 314 can be configured to control the timing of the pre-pulse and pedestal of the electromagnetic radiation beam by controlling the timing of the pump source 604.

Optical component 606 may include any component discussed with respect to optical component 306 and may perform any of the roles and/or functions described with respect to optical component 306. I can.

Diagnostic component 608 may include optical, opto-mechanical or electronic components designed to monitor laser pulses 618, such as, for example, temporal and spatial properties, spectral properties, timing and/or other properties. have. More specifically, diagnostic component 608 includes one or more photodiodes, oscilloscopes, cameras, spectrometers, phase sensors, auto-correlators, cross-correlators, power meters or energy meters, laser position and/or orientation sensors (e.g. , A pointing sensor), a dazzler (or a mazzler), and the like. Diagnostic component 608 may also include or incorporate any of the components identified above with respect to optical component 606.

The stretcher 610 may be configured to chirip or stretch the laser pulse 618. More specifically, the stretcher 610 may include diffraction grating(s) or other dispersive components such as prisms, chirped mirrors, and the like.

The amplifier 612 may include an amplification medium such as, for example, titanium sapphire crystal, CO ₂ gas, or Nd:YAG crystal. Amplifier 612 may also include a holder for the amplification medium. The holder can be configured to be compatible with supporting environmental conditions such as positioning, temperature, and the like. Amplifier 612 may be configured to receive energy from pump source 604 and deliver this energy to laser pulses 618.

Compressor 614 may include an optical component configured to temporarily compress laser pulses 618, for example, up to a duration of the final time. Compressor 614 may consist of a diffraction grating placed on a holder and placed in a vacuum chamber. Alternatively, the compressor 614 may be constructed of, for example, dispersing fibers or prisms. Additionally, the compressor 614 may include a motor and other electronically controlled opto-mechanical, as well as a mirror or other optical component 306.

The controller 616 can include electronic system(s) that control and/or synchronize the various components of the electromagnetic radiation source 302. The controller 616 may include any combination of a controller, a power supply, a computer, a processor, a pulse generator, a high voltage power supply, and other components. As an example, the controller 616 may include one or more computing systems 500 that may be dedicated to the electromagnetic radiation source 302 or may be shared with other components of the system 300. In some embodiments, some or all of the functions of controller 616 may be performed by controller 314 of system 300.

The controller 616 may interface with various components of the electromagnetic radiation source 302 and other components of the system 300 through various communication channels. The communication channel may be configured to transmit electrical or other signals to control the radiation source 302 or various optical and opto-mechanical components associated with the system 300. Communication channels may include conductors compatible with high voltages, electrical triggers, various wired or wireless communication protocols, optical communication, and other components. The controller 616 may receive input from the optical and mechanical diagnostic components along with the electromagnetic radiation source 302 and from the diagnostic components 608 along other portions of the system 300. Further, the controller 616 may receive a signal from a user or a signal based on an input, for example, a signal based on a patient treatment plan input by the user.

7 shows an example of a gantry 700 according to an embodiment of the present disclosure. In some embodiments, gantry 310 (FIG. 3) may be arranged in the form of gantry 700, but this is not intended to be limiting and other gantry designs may be employed. The gantry 700 can deliver the proton beam 318 to an isocenter 712. In some embodiments, the isocenter 712 may represent a location of a treatment volume or a location within a treatment volume. The gantry 700 may also be configured for beam conditioning and reconstruction to properly direct the proton beam 318 before and during treatment. The gantry 700 may include a solenoid 704, a coupling 706, a beam steering component(s) 708, a collimator(s) 718, and a scanning magnet(s) 710. The height 714 and width 716 can vary widely based on the many possible configurations of the gantry 700. In some embodiments, either or both of height 714 and width 716 may be as small as 2.5 meters.

In some embodiments, gantry 700 may be separated from other components of system 300 by walls 702 or other barriers. The wall 702 may include one or more openings (not shown in the drawings) to allow passage of the proton beam 318 and any beam line or other equipment configured to deliver the proton beam 318. The location of wall 702 may vary depending on a number of factors, and in some embodiments wall 702 may not exist.

Solenoid 704 may be configured to capture protons emitted by ion-generating target 304. In some embodiments, protons emitted by ion-generating target 304 may exhibit large divergence. As an example, the beam size of protons emitted from the ion-generating target 304 can be expanded by a factor of 100 over a short distance, such as 1 cm. Solenoid 704 can be configured to reduce the convergence of proton beam 318.

The solenoid 704 may include a high-field solenoid, such as a 9 to 15 T superconducting solenoid, for example. The field strength can be related to the solenoid length and the resulting beam size. The higher the solenoid field strength, the smaller the beam size and opening required for the solenoid 704 may be. The solenoid 704 may vary in length based on field strength and other factors. In some embodiments, the solenoid 704 may be 0.55 m to 0.85 m long with an opening of 4 cm to 20 cm. In some embodiments, solenoid 704 may be used in conjunction with one or more collimators. Also, in some embodiments, one or more quadrupoles may be employed in addition to or alternatively to the solenoid 704.

Coupling 706 may be any mechanical and/or optical connection configured to facilitate physical movement of gantry 700, such as rotation around it, to an axis of rotation, such as axis 716. The gantry may be configured to be physically moved by any suitable motor and/or arrangement of actuators, which may be controlled by the control system 314. The coupling 706 may include one or more bearings or bushings and may be connected and/or integrated into a beam line carrying the proton beam 318. Accordingly, the coupling 706 may be configured to maintain a seal or other barrier to prevent loss of vacuum or other environmental conditions within the beam line. Further, the coupling 706 may include rotation-invariant optics, for example, to reduce tuning dependence as a function of gantry position.

The gantry 700 can further include a beam steering component(s) 708. The beam steering component 708 may include any of the beam steering components 308 discussed above configured to guide the proton beam 318 through the gantry. In some embodiments, the beam steering component 708 may include an electromagnet such as a dipole and/or quadrupole configured to redirect the proton beam 318 through the gantry 700. The beam steering component 708 may include a normal conductive dipole, a superferric superconducting dipole, a stripline dipole, and the like.

In some embodiments, the beam steering component 708 is each dipole pair (e.g., approximately 45° each) to form a rectangle (or any other combination of angles to form a rectangle or other desired shape). It may include a bending proton beam (318). The dipole pair can operate at about 4.8 T and can be about 0.6 m long. The straight section between the dipole pairs can be independently adjusted, providing tuning range, flexibility and thus customization in the electromagnetic optics. Splitting the 90° bend into two allows each dipole to be adjusted independently, e.g. through a shunt of a single power supply, to provide at least 10% variation (20% total relative change taking two). Reference trajectory control can be improved. Thus, the dipole pair facilitates independent trajectory correction for each arm of the gantry 700, thereby reducing tolerance and cost.

The gantry 700 may also include one or more collimators 718. The collimator 718 may be configured to filter the proton beam 318 such that only protons having a desired momentum can pass through and/or traveling in a desired direction. The collimator 718 may be disposed at various locations within the gantry 700. For example, if the beam steering component 708 has an achromatic property that creates an undesired effect downstream of the beam, the collimator 718 may be configured to counteract this effect.

The gantry 700 may further include a scanning magnet(s) 710. The scanning magnet 710 may include a beam steering component such as a beam steering component 308 or 708 configured to adjust the position of the isocenter 712 in space. The scanning magnet 710 may be controlled by the control system 314, for example, to adjust the treatment position provided by the treatment volume. The scanning magnet 710 may be placed in any number of locations within the gantry 700. For example, the scanning magnet 710 may be upstream from one or more beam steering components 708, downstream of all beam steering components, or a combination of these upstream and downstream positions, as shown in FIG. 7.

System 300 may be configured such that the scanning magnet is operated in collaboration with other components to control the treatment location within the patient. For example, control system 314 can control any combination of scanning magnet 710, movement of gantry 700 and movement of patient support platform 312. One or more components may be configured for control of specific dimensions and/or degrees of freedom. For example, the patient support platform may be configured to adjust the patient position in one dimension, while the scanning magnet 710 adjusts to another dimension orthogonal to one dimension.

Alternatively or additionally, system 300 may be configured such that coarse adjustments in a given dimension may be performed by components other than fine adjustments. For example, coarse adjustment in a particular dimension may be performed by a motor configured to manipulate the patient support platform 312, and fine adjustment may be performed by a scanning magnet 710. Many combinations of these adjustments will be apparent to those skilled in the art.

8 shows a further example of a gantry 800. The gantry 800 includes a gantry 700 such as a solenoid 704, coupling 706, beam steering component(s) 708, collimator(s) 718, and scanning magnet(s) 710. Some or all of the same components may be included, and additional quadrupole elements 802 may be additionally included. The quadrupole element 802 is a magnetic element that is part of a magnetic beam line and helps to deliver the proton beam to the treatment volume. The quadrupole element 802 is typically used to focus or defocus a beam of charged particles, as opposed to some larger dipoles, which can often be used as bending magnets to warp a beam of protons. The quadrupole element 802 may be a permanent magnet (e.g., made of a rear-earth element and/or other magnetic material), a normal conducting electromagnet, a superconducting electromagnet, a pulsed magnet or a suitable fixed or tunable It may be another device capable of providing a magnetic field.

9 is an exemplary flow diagram of a process 900 for proton beam formation. In step 902, an electromagnetic radiation source (eg, source 302) may emit an electromagnetic radiation beam (eg, beam 316). In step 904, the electromagnetic radiation beam may strike an ion-generating target (eg, target 304). At step 906, the interaction of the beam of electromagnetic radiation and the ion-generating target may produce particles comprising protons. In step 908, the proton beam steering component(s) (e.g., component 308) forms a proton beam (e.g., beam 318) from the particle and directs the proton beam to the patient's treatment volume. I can make it. The steps of process 900 may be performed automatically, such as by control system 314. The steps of process 900 may also be performed in response to user input, such as through control system 314, or may be performed by a combination of automatic and manual actions of various components. In some embodiments, process 900 may be performed based on the specifications of a treatment plan, which may be tailored to varying degrees based on a particular patient, treatment type, and/or treatment volume.

The electromagnetic radiation beam emitted in step 902 may be generated through any component capable of generating a radiation beam, such as, for example, various combinations of components described in connection with FIG. 6.

In step 904, the electromagnetic radiation beam may strike the ion-generating target. For example, the ion-generating target 304 may be placed within an interaction chamber that isolates the ion-generating target from the external environment. Upon striking the ion-generating target 304, the interaction of the electromagnetic radiation beam 316 and the ion-generating target 304 can generate a variety of particles, including protons that can be used in the proton beam 318. . In some embodiments, protons may be emitted at a proton energy of about 250 MeV from a location on ion-generating target 304 striking by an electromagnetic radiation beam 316 focused to a spot size of about 10-100 μm. . The two-dimensional divergence angle of protons emitted from the ion-generating target 304 may be about 0.2 radians (ie, about 11 degrees). In addition, the angular proton energy distribution ∂Ω/∂E and the proton number energy distribution ∂N/∂E can be very small, so that the energy angular distribution and the proton number energy distribution are fairly constant. As an example, a pulse of an electromagnetic radiation beam can cause the emission of 10 ⁸ protons, and the pulse can be repeated at a rate of 10 to 1000 Hz. Thus, the pulsed beam of electromagnetic radiation 316 can thereby produce a pulsed beam of protons 318. A pulse of protons may also be referred to as a “bunch” of protons.

According to the present disclosure, the ion-generating target may be supported by and/or received within the interaction chamber. As used in the present disclosure, an interaction chamber may refer to any structure configured to isolate the target from ambient conditions and provide an appropriate environment for ion generation.

According to the present disclosure, the interaction chamber may comprise a target stage, for example. As used in this disclosure, a target stage can refer to any structure configured to support an ion-generating target. In some embodiments, the target stage may be controlled by a processor configured to cause relative movement between the target stage and the electromagnetic radiation beam.

In accordance with the present disclosure, the interaction chamber may include one or more detectors. As used herein, a detector may refer to a device that detects one or more properties of a sample chamber state, an electromagnetic radiation source or beam, a proton beam, and/or a laser-target interaction. The detector may, for example, observe any condition within and/or in proximity to the interaction chamber. In some embodiments, the system for generating the proton beam may include another detector separate from the interaction chamber. As an example, the detector may be configured to measure at least one laser-target interaction characteristic.

As used in this disclosure, laser-target interaction may refer to an observable property associated with the interaction of an electromagnetic radiation beam and an ion-generating target. The laser-target interaction properties are, for example, proton beam properties, secondary electron emission properties, x-ray emission properties, proton beam energy, proton beam flux, and/or interaction between the electromagnetic radiation beam and the ion-generating target. It may contain other characteristics that indicate.

10 shows an example of an interaction chamber 1000. The interaction chamber 1000 can be of any size and shape, and can be constructed of any suitable material or materials capable of receiving a target during laser-target interaction. Stainless steel is an example of a material that can be used to construct the interaction chamber 1000.

The interaction chamber 1000 is one or more configured to support the ion-generating target 304 and/or other equipment within the interaction chamber 1000, such as optical component(s), beam steering component(s), detectors, etc. A stage 1002 may be included. Stage(s) 1002 may be fixed or adjustable. The adjustable stage can be configured to translate and/or rotate along one or more axes. Adjustment of stage(s) 1002 may be manual or automatic. Automated adjustment may be performed, for example, in response to one or more signals provided by control system 314. The stage(s) 1002 can optionally be configured to heat, cool or maintain the temperature of the ion-generating target 304. Temperature control can be achieved, for example, by monitoring the temperature of the ion-generating target 304 and raising, lowering or maintaining the temperature of the ion-generating target 304 in response to the measured temperature. Temperature monitoring can be achieved, for example, with one or more thermocouples, one or more infrared temperature sensors and/or other techniques used to measure temperature. Temperature adjustment can be made, for example, by adjusting the amount of current flowing through the heating element. The heating element can be a refractory metal such as tungsten, rhenium, tantalum, molybdenum niobium and/or alloys thereof, for example. The temperature regulation is, for example, through a conduit arranged directly or indirectly to thermally communicate a coolant such as water or cryogenic fluid (e.g., liquid oxygen, liquid helium, liquid nitrogen, etc.) with the ion-generating target 304. It can also be done by flowing. As one of ordinary skill in the art will appreciate, these exemplary ways of adjusting the temperature are compatible and can be combined. Of course, this method of temperature adjustment is not limiting, and any other known method for heating, cooling and/or maintaining the temperature of the ion-generating target 304 may be used with the disclosure herein.

The interaction chamber 1000 may include one or more associated vacuum pump(s) 1004. For example, either or both of sample preparation and proton beamforming may have sub-atmospheric pressure requirements or achieve optimal performance within a specific range of sub-atmospheric pressures. Vacuum pump(s) 1004 may be used to influence pressure conditions within interaction chamber 1000 and/or components associated with interaction chamber 1000. For example, the vacuum pump(s) 1004 may maintain a vacuum state or an almost vacuum state in the interaction chamber 1000. Examples of vacuum pump(s) 1004 may include one or more turbo-molecular pumps, cryogenic pumps, ion pumps, or mechanical pumps such as diaphragm or root pumps. The vacuum pump(s) 1004 may operate in conjunction with one or more pressure regulators (not shown in the drawings).

The interaction chamber 1000 may include an optical component 1006. Any of the components mentioned above with respect to the optical component(s) 306 may be used inside the interaction chamber to further direct the electromagnetic radiation beam 316. For example, as shown in FIG. 10, the interaction chamber may include a mirror 1006a configured to direct an electromagnetic radiation beam 316 toward an ion-generating target 304. In one embodiment, the interaction chamber 1000 may include a parabolic mirror 1006b configured to focus the electromagnetic radiation beam 316 onto the ion-generating target 304.

The interaction chamber 800 may include any number of proton beam steering component(s) 308. For example, as shown in FIG. 8, the interaction chamber 1000 may include a collimator 1010. One of ordinary skill in the art will appreciate that, alternatively or additionally, other proton beam steering component(s) 308 may be included in the interaction chamber 800. In various embodiments, any of the beam steering component(s) 308 may be incorporated into the interaction chamber 1000.

The interaction chamber 1000 may include or interface with the beam line 1012 as described above in connection with the proton beam steering component(s) 308. The beam line 1012 may include a conduit maintained below atmospheric pressure to facilitate propagation of the proton beam 318. Beam line 812 may include proton beam steering components, such as any of the elements mentioned above with respect to proton beam steering component(s) 308. Beam line 812 may also include a vacuum pump, such as any of the pumps described in connection with vacuum pump(s) 1004 to achieve and/or maintain a condition below atmospheric pressure.

The interaction chamber 1000 may include one or more valve(s) 1014. Any suitable valve(s) may be used, for example located between the various parts of the interaction chamber 1000 or between the interaction chamber 1000 and the system 300 or other components of the surrounding environment. Can be. Valve(s) 1014 may be configured to isolate vacuum pump(s) 1004 or beam line 1012, for example. The valve(s) 1014 can be manual or automatic. Automatic valves can be pneumatic and/or electronic, for example. The valve(s) 1014 may be a simple open/closed valve, such as a two-position gate valve, or the valve(s) 1014 may be configured to be partially open. The valve(s) 1014 associated with the vacuum pump(s) 1004 may include, for example, one or more butterfly valve(s) that may change continuously between an open state and a closed state. The valve(s) 1014 may be configured to maintain pressure, retain or release material, and/or allow access to the interaction chamber 800 for maintenance or replacement of parts of the ion-generating target. have.

The interaction chamber 1000 may include one or more shutter(s) 1016. Shutter(s) 1016 may be configured to block or allow electromagnetic radiation beam 1016 into chamber 1000, for example. The shutter(s) 1016 is, for example, a simple open/closed shutter. The shutter(s) 1016 may also be configured to chop the electromagnetic radiation beam 316 if desired. The operation of the shutter(s) 1016 may be manual or automatic. Automated actions may occur, for example, in response to one or more signals provided by control system 314.

The interaction chamber 1000 may include one or more windows 1018. Window 1018 may be constructed of any material suitable for pressure, temperature, and other environmental factors associated with interaction chamber 1000.

As described above, the interaction chamber 1000 may be configured to form an ion-generating target in place. System 300 may also include a separate or substantially separate preparation chamber (not shown in FIGS. 6 or 10) connected to the interaction chamber 1000 and configured for target preparation and/or conditioning. The preparation chamber will contain a variety of equipment and instruments for preparing the ion-generating target, such as equipment that can be found in the system to perform evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, etc. I can. The preparation chamber may also include one or more stage(s) for holding the ion-generating target 304 or a target substrate that will serve as a template for forming the ion-generating target 304. The preparation chamber may also include a mechanism for delivering the ion-generating target to a location within the interaction chamber following preparation. Alternatively or in addition to using a separate or substantially separate preparation chamber, the interaction chamber 1000 allows sample preparation or conditioning within the interaction chamber 1000 (not shown in FIG. 6 or 10). It can be fitted similarly so that it can take place in.

The preparation chamber may also contain one or more sample delivery mechanisms, such as a temperature control element (as described above with respect to stage 1002), a delivery arm, or any other delivery device known to those familiar with vacuum systems. System 300 may also include a load lock between the sample preparation chamber and the interaction chamber 1000.

The interaction chamber 1000 may further include heating and/or cooling elements (not shown in FIG. 10 ). Either or both of sample preparation and particle beamforming can have temperature requirements or can achieve optimal performance within a specific temperature range. The interaction chamber may include heating elements and/or cooling elements configured to achieve and maintain this temperature condition. The heating and cooling elements are described with respect to the stage(s) 1002, but any temperature control equipment and/or method configured to control the temperature conditions of the interaction chamber 1000 as a whole or other parts of the interaction chamber 1000. It may include.

The interaction chamber 1000 may include one or more detectors 1020. The detector 1020 may be configured to measure a condition associated with the interaction chamber 1000. In some embodiments, measurements may be performed on a single-shot basis. That is, the detector 1020 may be configured to measure characteristics associated with the individual interactions between the electromagnetic radiation beam 316 and the ion-generating target 304. The detector 1020 may also measure the same or different properties on a more continuous basis, for example, providing results after processing.

The placement of the detector 1020 may vary based on a number of factors including space constraints and optimal location for measurement. As shown in Fig. 10, the detector 1020 is applied to the ion-generating target 304 (such as the detectors 1020b and 1020c) along the outer wall of the interaction chamber 1000 (such as the detector 1020a). It may be positioned in close proximity or along the proton beam 318 (such as 1020d).

For some detectors 1020, it may be beneficial for detection in proximity to the ion-generating target 304, and thus close to the interaction (laser-target interaction) between the electromagnetic radiation beam 316 and the ion-generating target 304. I can. In one embodiment, system 300 may stabilize over time, and then such proximity may be unnecessary. In some embodiments, one or more detectors 1020 may be mounted outside the interaction chamber 1000. For example, FIG. 10 shows detector 1020e outside interaction chamber 1000 proximate window 1018. The detector 1020 may be arranged to be dependent on a characteristic originally intended to be measured or the condition within the interaction chamber 1000 may be altered to facilitate measurement. For example, the optical component(s) 1006 may include a steering mirror configured to temporarily or intermittently deflect a signal from the interaction area to a detector, such as detector 1020e, through window 1018. have. The detector arrangement described above is merely exemplary, and many others may be apparent to one of ordinary skill in the art.

In some embodiments, one or more detectors 1020 may be configured to measure one or more laser-target interaction characteristics of the electromagnetic radiation beam 316 or proton beam 318. In some embodiments, detector 1020 is a quadrupole analyzer, spherical mirror analyzer ("SMA"), cylindrical mirror analyzer ("CMA"), secondary electron detector, photomultiplier, scintillator, solid-state detector, flight -Time detector, laser-on-target optical diagnostic detector, x-ray detector, camera, Faraday cup or other detectors. The detector 1020 may detect properties such as absorption or reflection, secondary electron emission properties, plasma properties such as electron temperature and/or density, and/or x-ray emission properties. Secondary emission, such as emission of electrons and/or x-rays, may indicate the properties of the laser-target interaction and/or of the proton beam 318. For example, the energy spectrum and/or flux of electrons and/or x-rays may exhibit proton beam properties. Thereafter, these signals are, for example, electromagnetic radiation source 302, optical component(s) 306, proton beam steering component(s) 308, and ion- It can be used as an input in a feedback loop to modify the laser-target interaction by adjusting one or more of the position/orientation of the generating target 304.

The detector 1020 may be configured to detect proton beam direction, spatial diffusion, intensity, flux, energy, proton energy and/or energy diffusion. For example, in some embodiments, a Thompson parabolic may be employed. In this embodiment, the proton beam 318 may be directed into a region where the magnetic and electric fields deflect the protons to locations on the detection screen. The location where the proton comes into contact with the screen can represent the proton energy. For such a screen, any proton sensing device can be used such as a CR-39 plate, an image plate and/or a scintillator (coupled to an imaging device such as a CCD camera). As another example, the spatial proton beam distribution can be detected with a proton sensitive screen such as CR-39 and a scintillator with an image plate or detection device (such as a camera) can be used.

Detector 1020 may also include a time-of-flight detector. The time-of-flight detector can measure the average proton energy. In some embodiments, the time-of-flight detector may include a detector with suitable temporal resolution, such as a proton scintillator and a photo-multiplier-tube (PMT). The time at which a proton signature is detected on the PMT can represent the proton velocity and thus the proton energy.

The detector 1020 may also include an instrument configured for plasma diagnosis, such as an x-ray spectrometer configured to detect electron temperature and density, or an interferometer configured to detect plasma density. Optical diagnostics can include imaging of the reflected laser beam to measure laser absorption efficiency. These detectors can be used during initial system design, calibration and testing and can optionally be included in the final system.

Referring back to FIG. 9, the interaction of the electromagnetic radiation beam (eg, 316) and the ion-generating target (eg, 304) in step 906 may generate particles containing protons. In some embodiments, the surface of the ion-generating target 304 may be scanned by the electromagnetic radiation beam 316. For example, the electromagnetic beam 316 may be sequentially scanned over the surface of the ion-generating target 304 by continuous or discontinuous rasterization, stepwise scanning, or any other scanning waveform desired. Alternatively, the electromagnetic beam 316 may be scanned out of sequence over the surface of the ion-generating target 304. Electromagnetic radiation beam scanning may be accomplished by manually or automatically adjusting one or more optical component(s) 306 positioned between the electromagnetic radiation source 302 and the ion-generating target 304. Automatic adjustment of the optical component(s) 306 may be accomplished, for example, in response to one or more signals provided by the control system 314. One or more control signals provided by control system 314 may be predefined by a program, such as a program stored in computing system 500, or one or more control signals received from various elements of system 300, such as one or more detectors. It may be provided in response to a feedback signal. For example, information from one or more detectors of system 300 may indicate that it is desirable to change the location of the laser-target interaction site. These and other examples of feedback are described in more detail below.

At step 908, the system 300 can form a proton beam 318 from the particles and direct the proton beam 318 to the treatment volume. The protons generated in step 906 may not be initially placed in useful configurations or trajectories. Protons may be formed into a proton beam, for example by one or more beam steering component(s) 308. The characteristics of the proton beam may vary depending on the configuration and use of the system 300. In one embodiment, the proton energy may be about 250 MeV as described above, for example in the range of 60 to 250 MeV. The proton flux can be about 2 Gy/min, and the proton pulse duration can be less than 100 psec. The protons produced by system 300 may also have a symmetrical phase space profile, enabling improved proton beam steering and filtering for accelerator-based proton generation systems, thereby improving the accuracy and efficiency of proton beam delivery and treatment. Improve. Of course, the above ranges are only examples, and specific energies and fluxes may vary based on the specifics of the configuration.

In accordance with the present disclosure, feedback may be used to adjust one or more properties of the proton beam. As used in this disclosure, feedback may refer to a control protocol in which one or more system outputs are routed back to the system (ie, fed back to the system) as one or more inputs as part of a cause and effect chain. For example, the processor may be configured to generate a feedback signal to control aspects of the electromagnetic radiation beam, proton beam, and/or laser-target interaction (as described above). Such feedback signals may be based, for example, on one or more properties of an electromagnetic radiation beam, a proton beam and/or a laser-target interaction. In some embodiments, the feedback signal may alter the proton beam by adjusting at least one of the electromagnetic radiation source, one or more optical components, and/or the position or orientation of the electromagnetic radiation beam relative to the ion-generating target. In some cases, feedback can be used to determine the structure of the ion-generating target.

The feedback signal can be configured to change the aspect of the electromagnetic radiation beam. For example, the processor may generate one or more feedback signals configured to adjust the electromagnetic radiation source to change the temporal profile of the electromagnetic radiation beam. Further, the electromagnetic radiation source can be configured to generate a main pulse and a pre-pulse of the electromagnetic radiation beam, and the processor is configured to cause the electromagnetic radiation source to change the contrast ratio of the pre-pulse to main pulse in response to the feedback signal. Can be.

Further, the processor may be configured to generate a feedback signal to change the energy of the electromagnetic radiation beam or the spatial or temporal profile of the electromagnetic radiation beam. For example, one or more optical component(s) may change the spot size of the electromagnetic radiation beam in response to the feedback signal. In some embodiments, the motor may change the relative orientation between the electromagnetic radiation beam and the ion-generating target in response to the feedback signal. And, in some embodiments, the adaptive mirror can direct the beam of electromagnetic radiation to the ion-generating target in response to the feedback signal.

In some embodiments, feedback can be used to adjust the properties of the proton beam 318. 11 shows a process flow in an exemplary process 1100 for employing such feedback. At step 1102, system 300 may determine or program a desired value of the laser-target interaction characteristic. The laser-target interaction characteristics may be based on any characteristics detected by any of the detectors 1020 described above. The desired value may be based, for example, on a nominal value related to a desired quality in the proton beam 318, a value based on a desired characteristic in a treatment plan, an optimal operating condition of the system 300, and the like.

)). 피드백 신호는 때로는(예를 들어, 기동 또는 휴지 기간 동안) 제로로 설정될 수 있거나, 조정이 필요하지 않음을 나타내는 초기값으로 설정되거나, 초기 상태를 나타내는 디폴트값으로 설정될 수 있다.In step 1104, system 300 may generate one or more feedback signal(s) based on the detected laser-target interaction characteristics. Feedback may be received and/or processed by the control system 314. For example, the control system 314 may calculate adjustments for the various components of the system 300 by comparing the laser-target interaction characteristics to a desired value of the laser-target interaction characteristics established in step 1102. . In some embodiments, adjustments and comparisons may be performed according to a feedback control algorithm such as a proportional-integral-differential (PID) control loop. The relationship(s) defined by the feedback signal(s) may be linear (e.g., an increase in pulse duration may adversely affect proton energy (

)). The feedback signal can sometimes be set to zero (e.g., during a start-up or idle period), can be set to an initial value indicating that no adjustment is required, or can be set to a default value indicating an initial state.

In step 1106, system 300 may adjust one or more system components based on the feedback signal. For example, in some embodiments, the control system 314 may be configured to adjust the properties of the electromagnetic radiation beam 316 based on the feedback signal. The generated feedback can cause the motor to orient the path of the electromagnetic radiation beam 316. The motor may, for example, adjust one or more optical component(s) 306. This adjustment, for example, causes the beam of electromagnetic radiation 316 to strike the ion-generating target 304 at more desirable locations or locations from the electromagnetic radiation beam 316 striking the ion-generating target 304. The properties of the generated proton beam 318 can be changed. This adjustment may also cause the beam of electromagnetic radiation to sequentially strike a plurality of adjacent features of the ion-generating target 304 so that the features are irradiated at a desired rate. Additionally, the optical component(s) 306 can be configured to scan the electromagnetic radiation beam 316 over the surface of the ion-generating target 304. As another example, the ion-generating target 304 can be manipulated by a motor based on a feedback signal to move the ion-generating target 304 in any six degrees of freedom.

In some embodiments, at step 1108, the control system 314 may cause the electromagnetic radiation source 302 to change the energy, wavelength, or temporal or spatial profile of the electromagnetic radiation beam 316 in response to the feedback signal. . The control system 314 may also cause the electromagnetic radiation source 302 to change the contrast ratio of the pre-pulse to main pulse in response to the feedback signal. This adjustment to the electromagnetic radiation beam 316 through the electromagnetic radiation source 302 can be performed, for example, via the controller(s) 616, the oscillator(s) 602, the pump source(s) 604, optical This may be achieved by adjusting one or more of component 606, expander(s) 610, amplifier(s) 612, and compressor(s) 614. In some embodiments, any optical element or other component of the electromagnetic radiation source 302 or optical component(s) 306 may be changed, moved, oriented, or otherwise configured based on a feedback signal, such that any It causes a change in number. The above examples are not intended to be limiting.

In step 1108, the system 300 directs the electromagnetic radiation beam 316 to the ion-generating target 304, for example, as described above with respect to steps 902 and 904 of the process 900 shown in FIG. 9. ) Can be directed.

In step 1110, the system 300 may detect a laser-target interaction characteristic. The detected laser-target interaction characteristics may be any one or more characteristics described above with respect to detector 1020 and/or electromagnetic radiation beam 316, proton beam 318, laser-target interaction, defect condition, or system. May include any other signal generated by any component of.

The laser-target interaction characteristics detected in step 1110 may be passed back to step 1104, and the process 1100 may be repeated any number of times. For example, the process 1100 may repeat a standard, fixed number of times, a number preset by the control system 314, a number specified by a treatment plan, or a variable number of times determined in real time.

In some embodiments, it may be necessary to select a specific energy and/or flux of protons. For example, as described above with respect to the benefits of proton therapy, treatment of a treatment volume of a certain depth within a patient may be necessary. The depth of treatment can be specified by selectively releasing protons at a specific energy level or range of energy levels. The dose of radiation delivered to the treatment volume depends in part on the flux of the proton beam. Thus, it may be desirable to adjust the proton flux and proton energies produced by system 300.

In accordance with the present disclosure, a system for directing a pulsed beam of charged particles may include an ion source. As used in this disclosure, an ion source can refer to any structure or device configured to generate a continuous or pulsed ion beam. A pulsed ion beam can refer to any ion group comprising at least one ion bundle (eg, a cluster of ions). In some embodiments, the ion source may include at least a radiation beam and an ion-generating target as described above; This example is not limiting. For example, a system for directing a pulsed beam of charged particles according to the present disclosure includes a beam of charged particles generated by any method or device (including, for example, a cyclotron, synchrotron or other particle accelerator) and Can be used together.

Further, according to the present disclosure, a system for directing a pulsed beam of charged particles may include at least one electromagnet. As used herein, an electromagnet can refer to any device that is controllable to generate an electromagnetic field. In some embodiments, the at least one electromagnet may include a plurality of electromagnets in series along the trajectory of the pulsed ion beam.

Further, according to the present disclosure, a system for directing a pulsed beam of charged particles may comprise at least a region proximate the electromagnet. As used in this disclosure, a region proximate an electromagnet may refer to any location in which an electromagnetic field generated by an electromagnet may change the trajectory of charged particles located within the region. For example, a region proximate an electromagnet may include any location oriented such that the ion beam can traverse through it. In some embodiments, a zone may include a location within an electromagnetic field created by activation of an electromagnet. The size of the zone can vary depending on many factors; In some embodiments, the zone may have dimensions less than about 1 inch.

According to the present disclosure, a system for directing a pulsed beam of charged particles may include at least one automated switch. As used in this disclosure, an automated switch may refer to a device configured to be electrically connected to an electromagnet and configured to selectively activate or deactivate at least one electromagnet when triggered by a signal. The automated switch can be any switch that can be selectively activated or deactivated. For example, an automated switch may comprise a photoconductive semiconductor switch or a spark switch. In some embodiments, at least one automated switch may comprise a plurality of automated switches. Individual automated switches can be associated with different electromagnets or with the same electromagnet. In some embodiments, the first electromagnet may be configured to redirect a portion of the pulsed ion beam from an original trajectory to a redirected trajectory. Some embodiments further include a second electromagnet in series with the first electromagnet and configured to redirect at least a portion of the diverted portion of the pulsed ion beam back from the diverted trajectory to a path substantially parallel to the original trajectory. can do.

In accordance with the present disclosure, a system for directing a pulsed beam of charged particles may include a radiation trigger source. As used in this disclosure, a radiation trigger source may comprise any structure capable of generating a radiation trigger to activate or deactivate at least one automated switch. For example, the radiation trigger source may include one or more of an ion source, an x-ray source, an electron source, and a light source (eg, laser). In some embodiments, the radiation trigger generated by the radiation trigger source may be configured to activate or deactivate an automated switch and irradiate the ion-generating target to generate a pulsed ion beam.

In accordance with the present disclosure, the at least one processor may be configured to activate the at least one electromagnet when the ion bundle traverses a region proximate the electromagnet. The at least one processor may include any of the processors described above and may be configured to sequentially activate a plurality of automated switches as the ion bundle traverses a series of electromagnets.

According to the present disclosure, a controlled delay line can be provided. As used in this disclosure, a controlled delay line may refer to a path configured to extend the time it takes for a beam of radiation or charged particles to traverse. For example, a controlled delay line can be used to delay the time the ion bundle traverses a region proximate the electromagnet. As another example, a controlled delay line can be used to delay the time the radiation beam activates an automated switch. In some embodiments, the controlled delay line may be configured to synchronize the time the radiation beam activates the automated switch of the electromagnet with the time the pulsed ion beam traverses the region proximate the electromagnet.

12 is an exemplary graph of a proton energy profile for an ion bundle, eg, a proton bundle in a proton beam 318. The pulses (ie, “bundles”) 1202 shown in FIG. 12 can be generated as described above with respect to the system 300 and ion-generating target 304. However, the use of the ion-generating target 304 is by way of example only and is not intended to be limiting. Other ion sources and ion types can also be used.

In terms of proton therapy, a specific energy of proton may be required to investigate a treatment volume located at a specific depth within a patient. To isolate a proton of a desired energy, the system 300 may filter the proton beam 318 to deliver a proton having the desired energy to the patient to remove protons of other energy from the proton beam. For example, to transfer a proton 1204 having an energy between energy 1206 and energy 1208, the system 300 may have any proton having an energy less than energy 1206 and greater than energy 1208. It is possible to filter the proton bundle 1202 by removing.

This filtering can be achieved by combining specific proton beam steering components 308. For example, the proton beam steering component 308 can manipulate the proton beam 318 such that a proton with a certain energy is diverted along a different trajectory than a proton with a different energy. This can be achieved in many ways. For example, the proton beam steering component 308 can be configured as a band pass filter to isolate protons having energies between energy 1206 and energy 1208. In another embodiment, the proton beam steering component 308 may be configured as a high-pass filter to isolate protons having an energy greater than an energy cut-off, such as energy 1206 or 1208. In another embodiment, the proton beam steering component 308 may be configured as a low pass filter to isolate protons having less energy than the energy cut-off, such as energy 1206 or 1208.

The above-described embodiments may be combined, and more than one filter may be used. The low pass filter and the high pass filter can be combined in series to create, for example, a band pass filter. In this embodiment, the low pass filter may be configured to isolate protons having energy less than energy 1208 and the high pass filter may be configured to isolate protons having energy greater than energy 1206. This can be particularly advantageous for selecting protons within a narrow energy band, particularly narrow energy bands than the standalone band pass filter can accommodate.

To achieve proton energy filtering, one or more proton beam steering components 308 may be selectively activated and/or controlled by one or more automated switches such as spark switches or photoconductive switches. Selective activation can be regulated by a controller 314 that can have an automated switch and interface with the proton beam steering component 308. The automated switch can be activated or deactivated by a signal generated by the controller 314. The signal can be generated based on feedback, such as any form of feedback described above.

Additionally or alternatively, in some embodiments, an automated switch may be configured for activation or deactivation by electromagnetic radiation such as a laser or other light source. For example, the automated switch may include a photoconductive semiconductor switch disposed along the path of the electromagnetic radiation beam 316. Alternatively, the electromagnetic radiation beam 316 may be diverted by one or more optical components 306 or split into a plurality of beams by the optical component 306, one or more of the plurality of beams being automated. Delivered to the switch. In this embodiment, an automated switch may be activated or deactivated when struck by the electromagnetic radiation beam 316. Thus, the electromagnetic radiation beam can be configured to activate an automated switch and irradiate the ion-generating target 304 to generate a proton beam 318.

In other embodiments, the switching electromagnetic radiation source may not be associated with the electromagnetic radiation source 302 or the electromagnetic radiation beam 316. For example, the control system 314 causes a separate switching electromagnetic radiation source to irradiate one or more photoconductive semiconductor switches or spark switches to activate the proton beam conditioning component 308 of the proton energy filter(s) or Can be deactivated.

The timing associated with activating the automated switch in the proton energy filter can be influenced, at least in part, by a time-of-flight control unit, such as a controlled delay line, configured to adjust the time the radiation beam activates the automated switch. . For example, the controlled delay line can be configured to synchronize the timing of the automated switch with the radiation beam. Additionally or alternatively, the timing associated with activating the automated switch in the proton energy filter is determined by the control system 314, e.g., in response to a user command, a feedback signal from the system 300, or a predetermined It can be controlled according to the program.

While the above discussion contemplates applications in which protons are filtered in proton therapy systems, those skilled in the art will understand that these filtering systems and methods have wide applicability. For example, these methods and systems described in terms of proton filtering can also be used to filter any of a variety of other charged particles used in any of a variety of other systems and applications.

13 shows an example configuration of a proton beam steering component 308 configured to achieve proton energy selection, as described above. Such a configuration can include one or more proton beam steering components 1302 and 1306 and a beam dump 1304.

In some embodiments, beam steering components 1302 and 1306 may include a plurality of electromagnets arranged in series along the trajectory of proton beam 318. The plurality of automated switches may be associated with one or more different magnets or groups of magnets. The control system 314 can be configured to activate a plurality of such switches in various combinations to manipulate the proton beam 318. For example, the control system 314 may sequentially activate an automated switch as a bundle of protons traverses the magnets of a plurality of electromagnets. In one embodiment, the beam steering component 1302 may be configured to redirect a portion of the proton beam 318 from an original trajectory to a redirected trajectory. The beam steering component 1302 may be configured to redirect at least a portion of the redirected portion of the pulsed proton beam back from the redirected trajectory to a path substantially parallel to the original trajectory.

As shown in FIG. 13, the proton beam 318 may pass through an area proximate to the proton beam steering component 1302. The zone may be of any size, but in some embodiments may have a dimension of less than 1 inch. The region proximate the proton beam steering component 1302 is configured such that the proton beam 318 (e.g., a continuous beam or a pulsed beam comprising a pulse such as pulse 1202) traverses the region and/or Can be oriented. The proton beam steering component 1302 may include any proton beam steering component 308, for example an electromagnet such as a dipole, CMA, SMA, or time-of-flight analyzer. 13A, as the proton beam traverses a region proximate to the proton beam steering component 1302, an automated switch causes the beam steering component 1306 to follow the trajectory 1310 with a proton having the desired energy. The proton beam steering component 1302 can be activated to be diverted toward. When a proton with energy to be filtered from the proton beam 318 traverses a region proximate to the proton beam steering component 1302, the automated switch may not be activated, or an alternative switch may be activated, and the proton may be As shown in FIG. 13B, it can move along trajectory 1308 toward beam dump 1304. A proton with the desired energy can pass through the beam steering component 1306, where it is redirected along the beam line trajectory 1312 and eventually back towards the treatment volume.

In some embodiments (not shown), the proton energy filter may include only a single beam steering component and a beam dump. Instead of redirecting a proton with the desired energy towards the second electromagnetic element, the proton with the desired energy may be allowed to pass through a region proximate the proton beam steering component without being diverted. As protons with energy to be filtered out of the proton beam pass through a region proximate the proton beam steering component, they can be diverted along the trajectory toward the beam dump.

In some embodiments, the proton energy filter may include an energy reducer. For example, the energy reducer can be used as part of the beam dump 1304. Additionally, energy reducers can be used to reduce the energy and/or flux of protons that have not been redirected to the beam dump. In order to filter the proton beam using the energy dropper, the protons can be diverted through the dropper, where they interact with the dropper. Protons transferred through the lowering group along the trajectory of the proton beam are then reduced in energy, reducing the energy of the proton beam. Other protons can be absorbed by the energy degradation or diverted from the trajectory of the proton beam, thereby reducing the flux of the delivered proton beam by no longer forming part of the delivered proton beam. The energy reducer may include, for example, a metal such as carbon, plastic, beryllium, copper or lead, or any material effective to reduce the energy or flux of the proton beam. Energy reducers also include wedges, double wedges separated by gaps (which may be filled with air or other materials), cylinders, rectangles, or any other material or configuration that can degrade the beam, It can be configured into any shape effective to reduce the energy or flux of the proton beam.

One of ordinary skill in the art will recognize that the proton beam filter configuration described above is merely exemplary, and other configurations are contemplated in accordance with the embodiments described herein.

According to the present disclosure, a system for treating a treatment volume with a proton may comprise a proton source. As used in this disclosure, a proton source may refer to any material, system, or subsystem that has or is capable of emitting protons. The proton source can be configured to provide a proton beam having a plurality of proton energies within the proton energy diffusion.

Further, according to the present disclosure, a system for treating a treatment volume with a proton may include at least one processor configured to control a relative movement between a proton beam and a treatment volume in two dimensions of a three-dimensional coordinate system. At least one processor may include, for example, any of the processors described above. In some embodiments, the processor may be configured to control proton energy diffusion to adjust the depth of the processing volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions. For example, the third dimension of the 3D coordinate system may refer to an approximate direction of a proton beam trajectory, and the other 2D refers to a plane orthogonal to the 3D.

Controlling the relative movement between the proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system can be achieved in many ways. For example, controlling the relative movement between the proton beam and the treatment volume can be achieved by rotating the gantry. Alternatively or additionally, controlling the relative movement between the proton beam and the treatment volume can be achieved by directing the proton beam to an electromagnet and/or moving the patient support platform.

Likewise, controlling energy diffusion and dispersion or protons can be accomplished in a variety of ways. In accordance with the present disclosure, controlling the energy diffusion can be achieved through one or more of, for example, a magnetic analyzer, a time-of-flight control unit and energy reduction.

System 300 may be configured to change one or more properties of proton beam 318 while others remain substantially stationary. In some embodiments, this change may be achieved through feedback as described above with respect to process 1100. For example, the control system 314 may independently adjust the energy of the proton beam 318 while keeping the flux of the proton beam 318 substantially constant, or the proton beam 318 while independently adjusting the flux. The energy of can be kept substantially constant. This independent adjustment may not be possible in accelerator-based systems because of the large size and slow response speed. However, the systems and methods disclosed herein provide feedback (also as described above) of the system 300 (as described above) to reconstruct the properties and laser-target interactions of the electromagnetic radiation beam 316. Independent energy and flux control can be achieved by coupling with adjustable components, thereby independently adjusting the energy and flux of the proton beam 318. Thus, accurate treatment can be provided more quickly than conventional systems, reducing the time spent by the patient on treatment and increasing the amount of patient treatment. In addition, treatment can be provided more accurately and with less damage to healthy tissue. The systems and methods disclosed herein provide feedback (as described above) with adjustable components of system 300 (as described above) to reconstruct the properties of the electromagnetic radiation beam 316 and laser-target interactions. Simultaneous energy and flux control can be achieved by coupling, whereby the energy and flux of the proton beam 318 can be adjusted simultaneously.

In one embodiment, the energy and flux of the proton beam 318 is the intensity of the electromagnetic radiation beam 316, the position of the electromagnetic radiation beam on the ion-generating target 304, the time profile of the electromagnetic radiation beam 316, the radiation beam. The spatial profile of 316, can be adjusted according to the setting and selection of the proton beam steering component(s) 308. For example, the energy of the proton beam 318 may be proportional to the intensity of the electromagnetic radiation beam 316 and the flux of the proton beam 318 may be proportional to the energy of the electromagnetic radiation beam 316. This can be expressed by the following relationship.

(1)

(One)

And

(2)

(2)

는 양성자 빔(318)의 플럭스이다. 따라서, 전자기 방사선 빔(316)의 에너지, 공간 프로파일, 시간 프로파일 중 하나 이상을 적절히 조정함으로써 양성자 빔(318)의 에너지는 실질적으로 일정하게 유지될 수 있으며, 양성자 빔(318)의 플럭스는 변하며, 그 역도 가능하다. 예를 들어, 양성자 플럭스를 변화시키지 않고 양성자 빔(318)의 양성자 에너지를 변경하기 위해, 전자기 방사선 빔(316)의 에너지는, 이온-생성 타겟(304)에서 펄스 지속 기간 및/또는 스폿 크기를 변화시키면서 약 1 MeV에서 일정하게 유지될 수 있다.Where I _L is the intensity of the electromagnetic radiation beam 316, E _L is the intensity of the electromagnetic radiation beam 316, A represents the spatial profile (e.g., spot size) of the electromagnetic radiation beam 316, Δτ represents the time profile (e.g., pulse duration) of the electromagnetic radiation beam 316, E _p is the energy of the proton beam 318,

Is the flux of the proton beam 318. Thus, by appropriately adjusting one or more of the energy, spatial profile, and temporal profile of the electromagnetic radiation beam 316, the energy of the proton beam 318 can be kept substantially constant, and the flux of the proton beam 318 changes, The reverse is also possible. For example, in order to change the proton energy of the proton beam 318 without changing the proton flux, the energy of the electromagnetic radiation beam 316 can be adjusted to the pulse duration and/or spot size at the ion-generating target 304. It can remain constant at about 1 MeV while changing.

Alternatively or additionally, the energy and flux of the proton beam 318 can be changed independently, for example by selecting or adjusting the proton beam steering component(s) 308 as appropriate. For example, this may be achieved by using one of the filtering systems and methods described above with respect to FIG. 13 or by using, for example, one or more energy condensers.

When independently adjusting the flux of the proton beam 318, the available change in the energy of the proton beam 318 can be as large as ±25% or more if the proton beam 318 is initially formed, and the system 300 Can reduce these fluctuations further down the beam line by about ±5% or less. Similarly, when adjusting the energy of the proton beam 318 independently, the usable fluctuation of the flux of the proton beam 318 can be as large as ±25% or more when the proton beam 318 is initially formed, and the system ( 300) can reduce these fluctuations further down the beam line by about ±5% or less.

As an alternative to independently adjusting the energy and flux of the proton beam 318, the energy and flux of the proton beam 318 may, for example, select or adjust the proton beam steering component(s) 308 as appropriate. By doing so, you can change at the same time. For example, this may be accomplished using one of the filtering systems and methods described above with respect to FIG. 13 or using, for example, one or more energy concentrators.

Since process variables may fluctuate during operation, independent changes in the energy and flux of the proton beam 318 are significantly beneficial from the feedback adjustment described above with respect to FIG. 11. For example, since the detected laser-target interaction characteristic changes during operation at step 1108, control system 314 can automatically adjust system 300 accordingly at step 1104 via the feedback signal determined at step 1110. .

The system 300 may be configured to employ such changes in one or more properties of the proton beam 318 while maintaining other properties of the proton beam 318 fixed in the process for systematic treatment of the treatment volume. 14 shows an example of a process 1400 for this systematic treatment. In step 1402, the control system 314 may position the proton beam (eg, beam 318) for the treatment volume in two dimensions of the three-dimensional coordinate system. For example, the third dimension may be defined by the trajectory of the proton beam when exiting the gantry (for example, the gantry 310), and the second dimension of the 3D coordinate system is the proton when exiting the gantry 310. It can be defined by a plane perpendicular to the trajectory of the beam 318. The relative movement between the proton beam 318 and the treatment volume in two dimensions may be controlled by one or more components of the system 300. For example, the relative movement may be controlled by any combination of one or more motors and/or magnets associated with gantry 310 and/or one or more motors associated with patient support platform 312. More specifically, the control system 314 controls one or more of the rotation of the gantry 310, the adjustment of the scanning magnet 710, and the repositioning of the patient support platform 312, thereby controlling the distance between the proton beam 318 and the treatment volume. It can be configured to control relative movement.

In step 1404, the control system (eg, system 314) may be configured to control the relative movement between the proton beam and the treatment volume in the third dimension of the three-dimensional coordinate system. The control system 314 may be configured to control this relative movement in the third dimension while maintaining substantially fixed coordinates in the other two dimensions. For example, the control system 314 can control the proton energy to adjust the treatment depth while fixing the position of the proton beam 318 in another two-dimensional. Controlling the proton energy in step 1404 can be accomplished through one or more techniques described above (with or without reference to the specific structures described above). For example, at least one of the energy, temporal profile and spatial profile of the electromagnetic radiation beam 316 may be adjusted according to Equation 1 above, and the proton energy selection in FIGS. 12 and 13 may be used, and/or One or more of a magnetic analyzer, a time-of-flight control unit and an energy reduction may be used.

An example of step 1404 is shown in FIGS. 15A, 15B and 15C, which shows a proton beam 318 penetrating the skin 1502 of a patient 1504 to provide treatment for the treatment volume 1506. . 15A, 15B and 15C may represent a series of treatment locations in accordance with the disclosed embodiments. The system 300 reduces the energy of the proton beam 318 as shown in FIG. 15B, then treats the area 1512 shown in FIG. 15C, and further reduces the energy of the proton beam 318 to thereby reduce the energy of the proton beam 318. ) In a third dimension (ie, further away from the skin 1502 of the patient 1504) before treating the area 1508 shown in FIG. 15A. Alternatively, the sequence can be reversed, after treating the region 1512 of FIG. 15C, increasing the energy of the proton beam 318 to treat the region 1510 of FIG. 15B, and then the region of FIG. 15A. The energy of the proton beam 318 is further increased to treat 1508.

Additional treatment locations may be included in step 1404 before, after, or midway regions 1508, 1510 and 1512 shown in FIGS. 15A, 15B and 15C. The control system 314 can also be configured to optimize treatment taking into account the effects of a particular sequence. For example, a proton passing through the treatment volume 1506 intended to treat the region 1508 (i.e., as shown in FIG. 15A) will undergo some collateral treatment to the regions 1510 and 1512 before reaching 1508. Can provide. The control system 314 may account for the incidental doses administered for the regions 1510 and 1512 by adjusting the dose in the patient's treatment plan accordingly. For example, control system 314 incorporates all incidental doses to be delivered to areas 1510 and 1512 while directly treating other areas, such as area 1508, and is suitable for treating areas 1510 and 1512. It can be configured to subtract this incidental dosage from the direct dosage. Thus, a more accurate treatment can be achieved.

At step 1406, the control system (eg, control system 314) may determine if another location requires treatment or if treatment has been completed. When treatment is complete (step 1006; YES), process 1400 may end. If the treatment is not complete (step 1006; no), the process 1000 returns to step 1002, repositioning the proton beam 318 for two dimensions as shown in Figure 15D, and the energy of the proton beam 318 It is possible to repeat the process of scanning the depth in the third dimension by changing.

Although exemplary embodiments have been described herein, as will be understood by those of ordinary skill in the art based on the present disclosure, the scope is limited to equivalent elements, modifications, omissions, (e.g., aspects of aspects spanning various embodiments. ) Any and all embodiments with combinations, adaptations and/or modifications. For example, the number and orientation of components shown in the exemplary system can be modified. Further, with respect to the exemplary method shown in the accompanying drawings, the order and sequence of steps may be modified, and steps may be added or deleted.

Aspects of the present invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion-generating target; An electromagnetic radiation source configured to provide a beam of electromagnetic radiation; One or more optical components configured to direct the beam of electromagnetic radiation to the ion-generating target to generate a resulting proton beam; A detector configured to measure at least one laser-target interaction characteristic; And generating a feedback signal based on the at least one laser-target interaction characteristic measured by the detector, and at least one of an electromagnetic radiation source, one or more optical components, and a position and orientation of the electromagnetic radiation beam relative to the ion-generating target. And a processor configured to alter the proton beam by adjusting at least one of the ones.

The laser-target interaction properties can include, for example, proton beam properties, such as proton beam energy and/or proton beam flux, which properties can include secondary electron emission properties. As another example, the laser-target interaction characteristic may include an x-ray emission characteristic.

The electromagnetic radiation source can be configured to provide a pulsed beam of electromagnetic radiation to generate a pulsed beam of protons.

The interaction chamber can include a target stage for supporting the ion-generating target, and the processor can be further configured to cause relative movement between the target stage and the electromagnetic radiation beam.

The structure of the ion-generating target can be determined based at least in part on a feedback signal generated from the measured laser-target interaction characteristics.

The electromagnetic radiation source may be configured to change the temporal profile of the electromagnetic radiation beam in response to the feedback signal, and/or may be configured to generate a main pulse and a pre-pulse. The at least one processor may be configured to cause the electromagnetic radiation source to change the contrast ratio of the pre-pulse to the main pulse in response to the feedback signal.

In response to the feedback signal, the at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the one or more electromagnetic radiation beams or the spot size of the electromagnetic radiation beam.

The at least one processor causes one or more optical components to change the spot size of the electromagnetic radiation beam in response to the feedback signal, and/or cause the motor to change the size of the spot between the electromagnetic radiation beam and the ion-generating target in response to the feedback signal. It can be configured to change the relative orientation.

Aspects of the invention also include a system for generating a beam of protons, the system comprising: an interaction chamber configured to support an ion-generating target; An electromagnetic radiation source configured to provide a beam of electromagnetic radiation; An adaptive mirror configured to direct the beam of electromagnetic radiation to the ion-generating target of the interaction chamber to produce a proton beam; And at least one processor configured to control the adaptive mirror to adjust at least one of at least one of a spot size of the electromagnetic radiation beam and a relative position and orientation between the electromagnetic radiation beam and the ion-generating target.

The adaptive mirror may be configured to direct the electromagnetic radiation beam by at least one of refocusing the electromagnetic radiation beam, redirecting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. The adaptive mirror can also be configured to raster the electromagnetic radiation beam over the ion-generating target. The adaptive mirror may include a plurality of facets, and each of the plurality of facets may be independently controlled by a digital logic circuit. The adaptive mirror may comprise a laser pulse focused on an anti-reflective coated substrate, and one or both of the laser pulse and the anti-reflective coated substrate may be controlled by a digital logic circuit.

The at least one processor causes the adaptive mirror to direct the electromagnetic radiation beam to the ion-generating target in response to the feedback signal, and/or the adaptive mirror to direct the electromagnetic radiation beam to a predetermined location on the surface of the ion-generating target. Can be configured to be oriented. The surface of the ion-generating target may include a patterned array and/or a plurality of ion-generating structures oriented substantially along a common axis. Alternatively or additionally, the surface of the ion-generating target may comprise one or more knife edges.

Aspects of the present invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion-generating target; An electromagnetic radiation source configured to provide a beam of electromagnetic radiation; One or more optical components configured to direct the beam of electromagnetic radiation to the ion-generating target to generate a resulting proton beam; A detector configured to measure at least one laser-target interaction characteristic; And generating a feedback signal based on the at least one laser-target interaction characteristic measured by the detector, and at least one of an electromagnetic radiation source, one or more optical components, and a position and orientation of the electromagnetic radiation beam relative to the ion-generating target. And one or more processors configured to change the proton beam by adjusting at least one of the ones.

The laser-target interaction properties can include, for example, proton beam properties, such as proton beam energy, proton beam flux, which can include secondary electron emission properties. As another example, the laser-target interaction characteristic may include an x-ray emission characteristic.

The electromagnetic radiation source can be configured to provide a pulsed beam of electromagnetic radiation to generate a pulsed beam of protons.

The interaction chamber may include a target stage for supporting the ion-generating target, and one or more processors may be further configured to cause relative movement between the target stage and the electromagnetic radiation beam.

The structure of the ion-generating target can be determined based at least in part on a feedback signal generated from the measured laser-target interaction characteristics.

The laser-target interaction properties may include proton beam energy and/or proton beam flux.

In response to the feedback signal, the at least one processor causes the electromagnetic radiation source to cause the energy of the electromagnetic radiation beam, the temporal profile of the electromagnetic radiation beam, and/or the spatial profile of the electromagnetic radiation beam (e.g., spot size of the electromagnetic radiation beam). Can be configured to change.

In response to the feedback signal, the at least one processor causes the one or more optical components to cause the energy of the electromagnetic radiation beam, the temporal profile of the electromagnetic radiation beam, and/or the spatial profile of the electromagnetic radiation beam (e.g., Spot size) can be configured to change.

The electromagnetic radiation source may be configured to change the temporal profile of the electromagnetic radiation beam in response to the feedback signal, and/or may also be configured to generate at least a main pulse and a pre-pulse. The at least one processor may be configured to cause the electromagnetic radiation source to change the contrast ratio of the pre-pulse to the main pulse in response to the feedback signal.

The at least one processor may be configured to cause the motor to change the relative orientation between the electromagnetic radiation beam and the ion-generating target in response to the feedback signal.

Aspects of the invention also include a system for generating a beam of protons, the system comprising: an interaction chamber configured to support an ion-generating target; An electromagnetic radiation source configured to provide a beam of electromagnetic radiation; An adaptive mirror configured to direct the beam of electromagnetic radiation to the ion-generating target of the interaction chamber to produce a proton beam; And at least one processor configured to control the adaptive mirror to adjust at least one of at least one of a spatial profile of the electromagnetic radiation beam and a relative position and orientation between the electromagnetic radiation beam and the ion-generating target.

The adaptive mirror may be configured to direct the electromagnetic radiation beam by at least one of refocusing the electromagnetic radiation beam, redirecting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. The adaptive mirror can also be configured to rasterize the electromagnetic radiation beam over the ion-generating target. The adaptive mirror may include a plurality of facets, and each of the plurality of facets may be independently controlled by a digital logic circuit. The adaptive mirror may comprise a laser pulse focused on an anti-reflective coated substrate, and one or both of the laser pulse and the anti-reflective coated substrate may be controlled by digital logic circuitry.

The at least one processor causes the adaptive mirror to direct the electromagnetic radiation beam to the ion-generating target in response to the feedback signal, and/or the adaptive mirror to direct the electromagnetic radiation beam to a predetermined location on the surface of the ion-generating target. Can be configured to be oriented. The surface of the ion-generating target may include a patterned array and/or a plurality of ion-generating structures oriented substantially along a common axis. Alternatively or additionally, the surface of the ion-generating target may comprise one or more knife edges.

Aspects of the present invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion-generating target at a target location; An electromagnetic radiation source configured to provide an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, polarization, spatial profile and temporal profile; Electromagnetic to facilitate the formation of a proton beam with energy and flux by being positioned along the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the ion-generating target, causing the electromagnetic radiation beam to irradiate the ion-generating target. One or more optical components configured to cooperate with the radiation beam; And the flux of the proton beam while keeping the energy of the proton beam substantially constant. And controlling at least one of the electromagnetic radiation source and one or more optical components to adjust at least one of the energy of the proton beam while maintaining the flux of the proton beam substantially constant. And at least one process configured to change at least one of polarization, the spatial profile of the electromagnetic radiation beam, and the temporal profile of the electromagnetic radiation beam.

In addition, aspects of the invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion-generating target at a target location; An electromagnetic radiation source configured to provide an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, polarization, spatial profile and temporal profile; Electromagnetic to facilitate the formation of a proton beam with energy and flux by being positioned along the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the ion-generating target, causing the electromagnetic radiation beam to irradiate the ion-generating target. One or more optical components configured to cooperate with the radiation beam; And the flux of the proton beam while changing the energy of the proton beam. And the energy of the electromagnetic radiation beam, polarization of the electromagnetic radiation beam, and electromagnetic radiation by controlling at least one of an electromagnetic radiation source and one or more optical components to adjust at least one of the energy of the proton beam while changing the flux of the proton beam. And at least one process configured to change at least one of the spatial profile of the beam and the temporal profile of the electromagnetic radiation beam.

The at least one processor may be configured to change the spatial profile of the electromagnetic radiation beam by changing the spot size of the electromagnetic radiation beam.

The at least one processor may be configured to change the temporal profile of the electromagnetic radiation beam by changing a chirp of the electromagnetic radiation beam.

The at least one processor may be configured to change the temporal profile of the electromagnetic radiation beam by changing the timing of the one or more pump sources.

The electromagnetic radiation beam may not be polarized.

The electromagnetic radiation source can be configured to provide a pulsed beam of electromagnetic radiation to generate a pulsed beam of protons.

The at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the temporal profile of the electromagnetic radiation beam. The at least one processor may also be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam. The at least one processor may also be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam, and to cause the one or more optical components to change the spatial profile of the electromagnetic radiation beam. The at least one processor may also be configured to cause the one or more optical components to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam.

Aspects of the invention may include a system for generating a beam of protons, the system comprising: an interaction chamber configured to support an ion-generating target provided with a plurality of patterned features; An electromagnetic radiation source configured to provide an electromagnetic radiation beam to irradiate the plurality of patterned features; And at least one processor configured to cause the electromagnetic radiation beam to strike individual ones of the plurality of patterned features to produce a resulting proton beam.

Aspects of the present invention may include a system for generating a beam of protons, the system comprising: an interaction chamber configured to support an ion-generating target patterned with at least one knife edge; An electromagnetic radiation source configured to provide an electromagnetic radiation beam for irradiating at least one knife edge of the ion-generating target; And at least one processor configured to cause the electromagnetic radiation beam to strike at least one knife edge to generate a resulting proton beam.

The electromagnetic radiation source may be configured to provide a laser beam having a wavelength, and at least one of the plurality of patterned features may have a dimension less than the wavelength of the laser beam. Similarly, the knife edge can have a dimension smaller than the wavelength of the laser beam. The plurality of patterned features may include protrusions extending away from the surface of the ion-generating target.

At least one processor may be configured to rasterize the ion-generating target. Further, the at least one processor may be configured to cause the electromagnetic radiation beam to continuously or discontinuously scan the surface of the ion-generating target, for example by controlling a motor and/or an adaptive mirror. The surface of the ion-generating target may include, for example, a plurality of patterned features and/or one or more knife edges, and may include, for example, ice, silicon, carbon, plastic or steel. The at least one processor may be configured to cause the motor and/or the adaptive mirror to adjust the electromagnetic radiation beam to sequentially or simultaneously strike individual features of the plurality of patterned features, or to strike a knife edge. have. Further, the at least one processor may be configured to cause sequential scanning of the electromagnetic radiation beam over adjacent ones of the plurality of patterned features.

Aspects of the present invention may include a system for generating a beam of protons, the system comprising: an ion source configured to generate a pulsed ion beam comprising at least one ion bundle; At least one electromagnet; A zone proximate the electromagnet and oriented to traverse through the pulsed beam; At least one automated switch electrically connected to the at least one electromagnet for selectively activating the at least one electromagnet; A radiation trigger source configured to activate at least one automated switch; And at least one processor configured to activate the at least one electromagnet as the ion bundle traverses the region.

The radiation trigger source may include one or more of ion, x-ray, electron, and laser radiation.

The electromagnet can be configured to generate an electromagnetic field, and the zone can be oriented to be within the electromagnetic field when the electromagnet is activated. The zone may have a dimension of less than about 1 inch.

The ion source can include a radiation trigger source and an ion-generating target, and the radiation trigger source can be configured to activate an automated switch and irradiate the ion-generating target to generate a pulsed ion beam.

The time at which the radiation trigger source activates the automated switch can be adjusted by a controlled delay line. The controlled delay line can be configured, for example, to adjust the time for the radiation trigger source to activate the automated switch in synchronization with the pulsed ion beam.

The automated switch may include a photoconductive semiconductor switch or a spark switch.

The at least one electromagnet may include a plurality of electromagnets in series along the trajectory of the pulsed ion beam, the at least one automated switch may include a plurality of automated switches, each of the plurality of automated switches Is associated with another of the plurality of electromagnets. The at least one processor may be configured to sequentially activate a plurality of automated switches as the ion bundle traverses each electromagnet.

A first electromagnet of one or more electromagnets in series may be configured to redirect a portion of the pulsed ion beam from an original trajectory to a redirected trajectory, and a second electromagnet of one or more electromagnets in the series is pulsed. It may be configured to redirect at least a portion of the diverted portion of the ion beam from the diverted trajectory back to a path substantially parallel to the original trajectory.

Aspects of the invention may include a system for generating a proton beam, the system comprising: a proton source configured to provide a proton beam having a plurality of proton energies within the proton energy diffusion; And at least one processor, wherein the at least one processor controls a relative movement between the proton beam and the treatment volume in two dimensions of the three-dimensional coordinate system; And controlling the proton energy diffusion to adjust the depth of the treatment volume in the third dimension of the three-dimensional coordinate system while maintaining the substantially fixed coordinates in the other two dimensions.

The at least one processor may be configured to control the relative movement between the proton beam and the treatment volume, for example by rotating the gantry, directing the proton beam with an electromagnet, and/or moving the patient support platform.

A system for treating a treatment volume with protons may be configured to control proton energy diffusion and proton energy dissipation with at least one of a magnetic analyzer, a time-of-flight control unit and an energy reduction.

The specification and claims may refer to the singular element, such as “processor” or “detector”. It is to be understood that this syntax is intended to include a plurality of these elements. That is, certain functions may be partitioned across multiple processors located on the same board or system or remotely located on different boards or systems. Reference to a processor is to be interpreted as “at least one processor”, meaning that the stated function may occur across multiple processors and is still contemplated within the scope of this disclosure and claims. The same is true of detectors and other elements described or referenced in the singular throughout the specification and claims.

In addition, the above description has been presented for purposes of illustration. It is not exhaustive and is not limited to the precise forms or examples disclosed. Modifications and modifications will be apparent to those skilled in the art in view of the specifications and implementation of the disclosed embodiments. For example, if the generation of protons is described above for a laser striking an ion-generating target, other proton generation processes such as radio frequency coupling may be used. Further, while some of the above descriptions relate to the use of protons in medicine as radiotherapy, the systems and methods described herein can be used in other applications of proton beams and in applications involving ions other than protons.

The claims are to be interpreted broadly based on the language employed in the claims, and are not to be construed as limited to the examples described herein, which examples are to be interpreted as non-exclusive. Further, the steps of the disclosed method may be modified in any way, including rearranging the steps and/or inserting or deleting steps.

Claims (18)

As a system for generating a proton beam,
An interaction chamber configured to support an ion-generating target;
An electromagnetic radiation source configured to provide a beam of electromagnetic radiation;
One or more optical components configured to direct the electromagnetic radiation beam to the ion-generating target to generate a resulting proton beam;
A detector configured to measure at least one laser-target interaction characteristic; And
At least one processor, wherein the at least one processor:
Receiving a feedback signal based on the at least one laser-target interaction characteristic measured by the detector, wherein the feedback signal indicates a relationship between the proton beam and the electromagnetic radiation beam; And
Based on the received feedback signal:
(A) the electromagnetic radiation source,
(B) the one or more optical components,
(C) at least one of the position and orientation of the electromagnetic radiation beam relative to the ion-generating target
Configured to change the proton beam by adjusting an item between at least one of;
Changing the proton beam changes the temporal profile of the electromagnetic radiation beam based on the relationship between the proton beam and the electromagnetic radiation beam represented in the received feedback signal, and by changing the chirp of the electromagnetic radiation beam. A system for generating a proton beam. The method of claim 1,
The system for generating a proton beam, wherein the laser-target interaction characteristic comprises a proton beam characteristic. The method of claim 1,
The system for generating a proton beam, wherein the laser-target interaction characteristic comprises an x-ray emission characteristic. The method of claim 1,
The system for generating a proton beam, wherein the laser-target interaction characteristic comprises an energy spectrum of electromagnetic radiation. The method of claim 1,
The interaction chamber comprises a target stage for supporting the ion-generating target, and the at least one processor is further configured to cause relative movement between the target stage and the electromagnetic radiation beam. System for doing. The method of claim 2,
The system for generating a proton beam, wherein the proton beam characteristic comprises proton beam energy. The method of claim 2,
The system for generating a proton beam, wherein the proton beam characteristic comprises a proton beam flux. The method of claim 1,
The electromagnetic radiation source is configured to generate a main pulse and a pre-pulse, and the at least one processor causes the electromagnetic radiation source to be based on a relationship between the electromagnetic radiation beam and the proton beam represented in the received feedback signal. To change the contrast ratio of the pre-pulse to the main pulse. The method of claim 1,
The at least one processor is configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam based on a relationship between the electromagnetic radiation beam and the proton beam represented in the received feedback signal. System to create. The method of claim 1,
The at least one processor is configured to cause the electromagnetic radiation source to change the spatial profile of the electromagnetic radiation beam based on a relationship between the electromagnetic radiation beam and the proton beam represented in the received feedback signal. System for creating. The method of claim 1,
The at least one processor is configured to cause the one or more optical components to change the spot size of the electromagnetic radiation beam based on a relationship between the electromagnetic radiation beam and the proton beam indicated in the received feedback signal. , A system for generating a proton beam. The method of claim 1,
The at least one processor is configured to cause a motor to change the relative orientation between the electromagnetic radiation beam and the ion-generating target based on a relationship between the electromagnetic radiation beam and the proton beam indicated in the received feedback signal. A system for generating a proton beam. The method of claim 1,
The at least one processor is configured to change the temporal profile of the electromagnetic radiation beam by changing the timing of one or more laser pump sources. The method of claim 1,
The electromagnetic radiation source is configured to generate a main pulse and a pre-pulse, and the at least one processor is configured to generate the pre-pulse based on a relationship between the proton beam and the electromagnetic radiation beam indicated in the received feedback signal. A system for generating a proton beam, configured to control timing. As a system for generating a proton beam,
An interaction chamber configured to support an ion-generating target;
An electromagnetic radiation source configured to provide a beam of electromagnetic radiation;
One or more optical components configured to direct the electromagnetic radiation beam to the ion-generating target to generate a resulting proton beam;
A detector configured to measure at least one laser-target interaction characteristic, the laser-target interaction characteristic comprising a secondary electron emission characteristic; and
At least one processor, wherein the at least one processor:
Receiving a feedback signal based on the at least one laser-target interaction characteristic measured by the detector, wherein the feedback signal indicates a relationship between the proton beam and the electromagnetic radiation beam; And
Based on the received feedback signal, at least one of (A) the electromagnetic radiation source, (B) the one or more optical components, (C) the position and orientation of the electromagnetic radiation beam relative to the ion-generating target.
A system for generating a proton beam, configured to alter the proton beam by adjusting an item between at least one of. As a method for generating a proton beam,
Generating a beam of electromagnetic radiation;
Directing the electromagnetic radiation beam to an ion-generating target to generate a resulting proton beam;
Measuring at least one laser-target interaction characteristic with a detector;
Receiving a feedback signal based on the at least one laser-target interaction characteristic measured by the detector, the feedback signal indicative of a relationship between the proton beam and the electromagnetic radiation beam; And
Based on the received feedback signal, at least one of (A) the electromagnetic radiation source, (B) the one or more optical components, (C) the position and orientation of the electromagnetic radiation beam relative to the ion-generating target.
Modifying the proton beam by adjusting an item between at least one of,
The step of changing the proton beam comprises changing the timing profile of the electromagnetic radiation beam based on the relationship between the electromagnetic radiation beam and the proton beam represented in the received feedback signal by changing the timing of one or more laser pump sources. The method comprising the step of. The method of claim 16,
The measuring of the at least one laser-target interaction characteristic includes (A) proton beam characteristics, (B) secondary electron emission characteristics, (C) x-ray emission characteristics, (D) energy spectrum categories of electromagnetic radiation. Measuring at least one member of. The method of claim 16,
Wherein the step of changing the temporal profile of the electromagnetic radiation beam is achieved by changing a chirp of the electromagnetic radiation beam.

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