CN111212679A

CN111212679A - System and method for providing an ion beam

Info

Publication number: CN111212679A
Application number: CN201780093793.8A
Authority: CN
Inventors: E.佩皮尔; A.沙汉姆; S.艾森曼; Y.费伯; Y.赫费茨; O.沙维特; B.温菲尔德; S.布林克-达南
Original assignee: HIL Applied Medical Ltd
Current assignee: HIL Applied Medical Ltd
Priority date: 2017-10-11
Filing date: 2017-10-11
Publication date: 2020-05-29
Also published as: JP2020526242A; WO2019074497A1; KR20200096727A; EP3634576A4; IL282569B; IL271088B; KR102195159B1; IL271088A; KR102234757B1; KR20200038429A; IL282569A; KR102195160B1; IL270996B; IL271089A; IL270996A; CN111603688A; IL271089B; EP3634576A1; KR20200102339A; CN111603687A

Abstract

A system for generating a proton beam may include a beam of electromagnetic radiation directed onto an ion generation target. The detector can be configured to measure the laser target interaction, which the processor can use to generate feedback for adjusting the proton beam. To filter the energy of the pulsed ion beam and/or to provide pulsed ion radiation at a desired time, the system may include an electromagnet and an automatic switch. Proton beam systems can be used to treat a patient with proton therapy by controlling the relative motion between the proton beam and the patient, including the penetration depth of the proton beam. Such systems reduce the size, complexity and cost of proton beam generation while also improving their speed, accuracy and configurability. When used in proton therapy, these systems enable shorter treatment times, increased patient throughput, more precise treatment of desired areas, and reduced collateral damage to healthy tissue.

Description

System and method for providing an ion beam

Technical Field

The disclosed embodiments relate generally to improvements in ion beam generation (including proton beam generation), and more particularly to ion beam generation via interaction between a beam of electromagnetic radiation and an ion generating target.

Background

Aspects of the present disclosure include a number of systems, subsystems, components, and subcomponents. Known background details are not repeated herein. Such background information may include information contained in the following materials:

U.S. Pat. No. 8,229,075 entitled "Targets and Processes for textile Same", issued to Cowan et al, 24/7/2012;

U.S. Pat. No. 8,389,954 to Zigler et al, entitled "System for fast Ions Generation and a Method Thereof, 3, 5, 2013;

U.S. Pat. No. 8,530,852 to Le Galloudec, entitled "Micro-ConeTargets for Producing High Energy and Low university Particle Beams", on 10.9.2013;

U.S. Pat. No. 8,750,459 entitled "Targets and Processes for textile Same", issued to Cowan et al on 6/10/2014;

U.S. Pat. No. 9,236,215 to Zigler et al, entitled "System for fast Ions Generation and a Method of Thereof", 2016, 1, 12;

U.S. Pat. No. 9,345,119 to Adams et al entitled "Targets and Processes for textile Same", 2016, 5, 17; and

nahum et al, U.S. Pat. No. 9,530,605 entitled "Laseractivated Magnetic Field management of Laser drive Ion Beams", 2016, 12, 27.

Particle radiation therapy with ions can be used to treat diseases. In one form of particle therapy, known as proton therapy, tumors are treated by irradiation with protons (e.g., hydrogen ions). Proton therapy is superior to traditional photon-based therapies (e.g., X-ray and gamma ray therapies), in part because of the way protons and photons interact with patient tissue.

Figure 1 shows the radiation dose as a function of tissue depth for both photon and proton therapy. Before particles can irradiate the treatment volume 106 defined by the patient's treatment plan, they typically must first pass through the patient's skin and other healthy tissue before reaching the patient's treatment volume 106. As such, the particles can damage healthy tissue, thereby causing undesirable therapeutic side effects. As shown by curve 102 of fig. 1, a photon (e.g., an X-ray) delivers most of its energy to a site near the patient's skin. For tumors deeper within the patient, this interaction may damage healthy tissue. In addition, some photons pass through the patient's body and pass through the treatment volume 106, illuminating more healthy tissue behind the tumor before eventually leaving the other side of the patient's body. Although the radiation dose to these other healthy tissues is lower than the radiation dose near the patient's skin, this is still undesirable.

Unlike photons, protons exhibit very desirable interactions with the tissue of a patient. As shown by curve 104 in fig. 1, the peak interaction of protons with patient tissue occurs deeper within the patient's body and may abruptly terminate after the peak interaction. In addition, protons interact much less with surface tissue than photons, which means that most of the energy of the proton beam can be delivered to the treatment volume 106 and irradiation of healthy tissue can be reduced. Proton therapy can therefore take advantage of these advantages to more accurately manage energy to unhealthy tissue of a patient while avoiding damage to healthy tissue. For example, proton therapy can reduce damage to surrounding healthy tissue by 2 to 6 times compared to X-ray therapy, thereby improving patient survival and quality of life. Protons can reduce the risk of secondary cancer in children by 97% over life, compared to X-rays.

Commercial proton therapy centers are currently rare due to the deficiencies of existing proton therapy systems that generate proton beams using large and expensive particle accelerators. Accelerator-based systems can be very bulky and cannot be scaled. As an example, fig. 2 shows an approximate size comparison of an accelerator-based proton therapy system to a football pitch. The energy requirements and maintenance costs inherent in operating accelerator-based systems are also significant. Taken together, these drawbacks result in high construction and maintenance costs associated with proton therapy. In addition to the expensive costs associated with accelerator-based proton beam generation, in such systems, adjusting certain characteristics of the proton beam (e.g., beam energy and beam flux) can be cumbersome and time-consuming. This results in longer treatment times and lower patient turnover, further increasing the cost of individual treatment, as less patients share the cost burden. Thus, there is currently little focus on proton therapy, and patients often receive poor treatment due in part to the inability to obtain proton therapy.

The present disclosure relates to alternative methods of proton therapy. Although the embodiments disclosed herein contemplate medical applications for proton beam therapy, one of ordinary skill in the art will appreciate that the novel proton beam generation methods and systems described below may be used in any application where a proton beam is desired.

Disclosure of Invention

Some embodiments disclosed herein provide methods and systems for improved generation of proton beams. For example, the disclosed embodiments may ameliorate the shortcomings of certain conventional proton generation techniques, e.g., by providing improved speed, accuracy, and configurability, allowing proton beam generation to be performed more efficiently and at lower cost. The disclosed embodiments may further reduce the size and complexity of existing systems.

Consistent with the present embodiment, a system for generating a proton beam may include: an interaction chamber configured to support an ion generating target; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation; one or more optical assemblies configured to direct a beam of electromagnetic radiation at an ion generation target, thereby causing a resultant proton beam; a detector configured to measure at least one laser target interaction characteristic; and at least one processor configured to generate a feedback signal based on the at least one laser target interaction characteristic measured by the detector and modify the proton beam by adjusting at least one of: a source of electromagnetic radiation, one or more optical components, and at least one of a relative position and orientation of the beam of electromagnetic radiation to the ion generating target.

Some embodiments may include a method comprising: providing a beam of electromagnetic radiation; directing a beam of electromagnetic radiation at an ion generating target in an interaction chamber, thereby causing a resultant proton beam; measuring at least one laser target interaction characteristic; and generating a feedback signal based on the at least one measured laser target interaction characteristic to modify the proton beam by adjusting at least one of: a source of electromagnetic radiation, one or more optical components, and at least one of a relative position and orientation of the beam of electromagnetic radiation to the ion generating target.

For example, the at least one laser target interaction characteristic may include a proton beam characteristic (e.g., proton beam energy or proton beam flux).

The laser target interaction characteristics may include secondary electron emission characteristics, such as x-ray emission characteristics.

The electromagnetic radiation source may be configured to provide one or more of a laser beam or, for example, a pulsed electromagnetic radiation beam to cause a pulsed proton beam.

The interaction chamber may comprise a target table for supporting an ion generating target, and the at least one processor may be further configured to cause relative motion between the target table and the beam of electromagnetic radiation.

The structure of the ion generating target may be determined, for example, based at least in part on a generated feedback signal generated from the measured laser target interaction characteristics.

Further, consistent with the present embodiments, the at least one laser target interaction characteristic may include a proton beam energy.

Further, consistent with the present embodiments, the at least one laser target interaction characteristic may include a proton beam flux.

Further, consistent with the present embodiments, the electromagnetic radiation source may be configured to alter the temporal distribution of the beam of electromagnetic radiation in response to the feedback signal.

Further, consistent with the present embodiments, the electromagnetic radiation source may be configured to generate at least one main pulse and a pre-pulse, and the at least one processor may be configured to cause the electromagnetic radiation source to alter a contrast of the pre-pulse to the main pulse in response to the feedback signal.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the electromagnetic radiation source to alter the energy of the beam of electromagnetic radiation in response to the feedback signal.

Further, consistent with the present embodiments, the one or more processors may be configured to cause the electromagnetic radiation source to alter the spatial distribution of the beam of electromagnetic radiation in response to the feedback signal, for example by altering a spot size of the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the one or more optical components to alter the spatial distribution of the beam of electromagnetic radiation, for example by altering a spot size of the beam of electromagnetic radiation in response to the feedback signal.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the motor to alter a relative orientation between the beam of electromagnetic radiation and the ion generating target in response to the feedback signal.

Another embodiment consistent with the present disclosure may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation; an adaptive mirror configured to direct a beam of electromagnetic radiation at an ion generation target in an interaction chamber, thereby generating a proton beam; and at least one processor configured to control the adaptive mirror so as to adjust at least one of: a spatial distribution of the beam of electromagnetic radiation, and at least one of a relative position and orientation between the beam of electromagnetic radiation and the ion generating target.

Some embodiments may include a method comprising: providing a beam of electromagnetic radiation; directing a beam of electromagnetic radiation at an ion generating target in an interaction chamber using an adaptive mirror, thereby causing a resultant proton beam; controlling, with at least one processor, an adaptive mirror to adjust at least one of: a spatial distribution of the beam of electromagnetic radiation, and at least one of a relative position and orientation between the beam of electromagnetic radiation and the ion generating target.

For example, the adaptive mirror may be configured to direct the beam of electromagnetic radiation by at least one of: adjusting a focus of a beam of electromagnetic radiation, steering the beam of electromagnetic radiation, and scanning the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the adaptive mirror may be configured to grating the beam of electromagnetic radiation on the ion generating target.

Further, consistent with the present embodiments, the adaptive mirror may include a plurality of facets, each facet of the plurality of facets being independently controllable by the digital logic circuit.

Further, consistent with this embodiment, the adaptive mirror may include laser pulses focused on an anti-reflective coating substrate, one or both of the laser pulses and the anti-reflective coating substrate being controllable by digital logic circuitry.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the adaptive mirror to direct the beam of electromagnetic radiation at the ion generation target in response to the feedback signal.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the adaptive mirror to direct the beam of electromagnetic radiation at a predetermined location on the surface of the ion generation target.

Further, consistent with the present embodiments, the surface of the ion generating target may include a patterned array.

Further, consistent with the present embodiments, the surface of the ion generating target may comprise a plurality of ion generating structures oriented substantially along a common axis.

Further, consistent with the present embodiments, the surface of the ion generating target may include at least one knife edge.

Consistent with the present embodiments, a system for generating a proton beam may include: an interaction chamber configured to support an ion generating target at a target location; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation along the trajectory, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution; one or more optical assemblies positioned along a trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical assemblies configured to cooperate with the beam of electromagnetic radiation to cause the beam of electromagnetic radiation to illuminate the ion generating target, thereby facilitating formation of a proton beam having energy and flux; and at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optical components, thereby altering at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation, so as to adjust at least one of: a proton beam flux while keeping a proton beam energy substantially constant; and proton beam energy while keeping the proton beam flux substantially constant.

Some embodiments may include a method for generating a proton beam, the method comprising: supporting an ion generating target at a target position within an interaction chamber; providing a beam of electromagnetic radiation along the trajectory by a source of electromagnetic radiation, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution; illuminating the ion generating target with a beam of electromagnetic radiation by one or more optical components positioned along a trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical components configured to cooperate with the beam of electromagnetic radiation to facilitate formation of a proton beam having energy and flux; and controlling, by the at least one processor, at least one of the electromagnetic radiation source and the one or more optical components, thereby altering at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation, so as to adjust at least one of: a proton beam flux while keeping a proton beam energy substantially constant; and proton beam energy while keeping the proton beam flux substantially constant.

Further, consistent with the present embodiment, a system for generating a proton beam may include: an interaction chamber configured to support an ion generating target at a target location; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation along the trajectory, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution; one or more optical assemblies positioned along a trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical assemblies configured to cooperate with the beam of electromagnetic radiation to cause the beam of electromagnetic radiation to illuminate the ion generating target, thereby facilitating formation of a proton beam having energy and flux; and at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optical components, thereby altering at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation, so as to adjust at least one of: proton beam flux at varying proton beam energies; and proton beam energy at varying proton beam fluxes.

Some embodiments may include a method for generating a proton beam, the method comprising: supporting an ion generating target at a target position within an interaction chamber; providing a beam of electromagnetic radiation along the trajectory by a source of electromagnetic radiation, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution; illuminating the ion generating target with a beam of electromagnetic radiation by one or more optical components positioned along a trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical components configured to cooperate with the beam of electromagnetic radiation to facilitate formation of a proton beam having energy and flux; and controlling, by the at least one processor, at least one of the electromagnetic radiation source and the one or more optical components to alter at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation to adjust at least one of: proton beam flux at varying proton beam energies; and proton beam energy at varying proton beam fluxes.

As an example, the at least one processor may be configured to alter the spatial distribution of the beam of electromagnetic radiation by altering a spot size of the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the at least one processor may be configured to alter the temporal distribution of the beam of electromagnetic radiation by altering a chirp of the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the at least one processor may be configured to alter the temporal distribution of the beam of electromagnetic radiation by altering the timing of the one or more pump sources.

Further, consistent with the present embodiments, the polarization of the beam of electromagnetic radiation may be such that the beam of electromagnetic radiation is not polarized.

Further, consistent with the present embodiments, the electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam and thereby cause a pulsed proton beam.

Further, consistent with this embodiment, the at least one processor may be configured to cause the electromagnetic radiation source to alter the energy of the beam of electromagnetic radiation and the temporal distribution of the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the one or more processors may be configured to cause the electromagnetic radiation source to modify the energy of the beam of electromagnetic radiation and the spatial distribution of the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the electromagnetic radiation source to alter the energy of the beam of electromagnetic radiation, and the at least one processor may be configured to cause the one or more optical components to alter the spatial distribution of the beam of electromagnetic radiation.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the one or more optical components to alter the energy of the beam of electromagnetic radiation and the spatial distribution of the beam of electromagnetic radiation.

Consistent with the present embodiments, a system for generating a proton beam may include: an interaction chamber configured to support an ion generating target provided with a plurality of patterned features; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation to illuminate the plurality of patterned features; and at least one processor configured to cause a beam of electromagnetic radiation to impinge each patterned feature of the plurality of patterned features and thereby generate a resultant proton beam.

Some embodiments may include a method comprising: supporting an ion generating target provided with a plurality of patterned features within an interaction chamber; providing a beam of electromagnetic radiation by an electromagnetic radiation source to illuminate the plurality of patterned features; and impinging each of the plurality of patterned features with a beam of electromagnetic radiation and thereby generating a resultant proton beam.

Further, consistent with the present embodiment, a system for generating a proton beam may include: an interaction chamber configured to support an ion generation target patterned with at least one knife edge; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation to illuminate at least one knife edge of an ion generating target; and at least one processor configured to impinge a beam of electromagnetic radiation on the at least one knife edge and thereby generate a resultant proton beam.

Further, some embodiments may include a method comprising: supporting an ion generation target patterned with at least one knife edge within an interaction chamber; providing a beam of electromagnetic radiation by an electromagnetic radiation source to illuminate at least one knife edge of an ion generating target; a beam of electromagnetic radiation is caused to impinge on at least one knife edge and thereby generate a resultant proton beam.

Further, consistent with the present embodiments, the electromagnetic radiation source may be configured to provide a laser beam having a wavelength, and at least one of the plurality of patterned features may have a dimension that is less than the wavelength of the laser beam. Similarly, the knife edge may have a dimension less than the wavelength of the laser beam.

Further, consistent with the present embodiment, the plurality of patterned features includes protrusions extending away from the surface of the ion generating target.

Further, consistent with the present embodiments, the at least one processor may be configured to rasterize the ion generation target.

Further, consistent with this embodiment, the at least one processor may be configured to cause the beam of electromagnetic radiation to scan the surface of the ion generating target continuously or discontinuously.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the adaptive mirror to condition the beam of electromagnetic radiation so as to scan the at least one knife edge continuously or discontinuously.

Further, consistent with the present embodiments, the plurality of patterned features or knife edges may include ice.

Further, consistent with the present embodiments, the plurality of patterned features or knife edges may comprise silicon.

Further, consistent with the present embodiments, the plurality of patterned features or knife edges may include carbon.

Further, consistent with the present embodiments, the plurality of patterned features or knife edges may comprise plastic.

Further, consistent with the present embodiments, the plurality of patterned features or knife edges may comprise stainless steel.

Further, consistent with the present embodiments, the at least one processor may be configured to cause the adaptive mirror to condition the beam of electromagnetic radiation to impinge each patterned feature of the plurality of patterned features, or to impinge the knife edge, sequentially or simultaneously.

Further, consistent with the present embodiments, the at least one processor may be configured to adjust the motor so as to cause the beam of electromagnetic radiation to sequentially impinge individual ones of the patterned features.

Further, consistent with this embodiment, the at least one processor may be configured to cause a sequential scan of the beam of electromagnetic radiation over adjacent patterned features of the plurality of patterned features.

Further, consistent with this embodiment, multiple knife edges may be utilized to pattern the target.

Consistent with the present embodiments, a system for generating a proton beam may include: an ion source configured to generate a pulsed ion beam comprising at least one ion bunch; at least one electromagnet; a region adjacent the electromagnet, the region oriented to pass the pulsed beam therethrough; at least one automatic switch electrically connected to the at least one electromagnet for selectively activating the at least one electromagnet; a radiation trigger source configured to activate at least one automatic switch; and at least one processor configured to activate the at least one electromagnet when the ions bunch across the region.

Another embodiment consistent with the present disclosure may include a method for directing a pulsed beam of charged particles, the method comprising: generating a pulsed ion beam comprising at least one ion bunch, the pulsed ion beam configured to pass through an area adjacent to at least one electromagnet; activating at least one recloser by a radiation trigger source, the at least one recloser electrically connected to the at least one electromagnet; and selectively activating, by the at least one processor, the at least one electromagnet as the ion bunch passes through the region based on activation of the automatic switch.

As an example, consistent with the present embodiments, the radiation trigger source may include one or more of ions, X-rays, electrons, and laser radiation.

Further, consistent with the present embodiments, the electromagnet may be configured to generate an electromagnetic field, and the region is oriented within the electromagnetic field when the electromagnet is activated. Consistent with this embodiment, the area may have a size of less than about one inch.

Further, consistent with the present embodiments, the ion source may include a radiation trigger source and an ion generating target, and the radiation trigger source may be configured to activate the automatic switch and irradiate the ion generating target, thereby generating a pulsed ion beam.

Further, consistent with the present embodiment, the time at which the radiation trigger source activates the recloser may be adjusted by a controlled delay line. The controlled delay line may, for example, be configured to adjust the timing of the radiation trigger source activating the automatic switch in synchronization with the pulsed ion beam.

Further, consistent with the present embodiment, the automatic switch may comprise a photoconductive semiconductor switch or a spark switch.

Further, consistent with the present embodiments, the at least one electromagnet may comprise a plurality of electromagnets in series along the trajectory of the pulsed ion beam, and the at least one recloser may comprise a plurality of reclosers, each of the plurality of reclosers associated with a different electromagnet of the plurality of electromagnets. The at least one processor may be configured to sequentially activate the plurality of automatic switches as the ion bunches pass through each electromagnet.

Further, consistent with the present embodiments, a first electromagnet of the one or more series-connected electromagnets may be configured to divert a portion of the pulsed ion beam from an original trajectory to a divert trajectory, and a second electromagnet of the one or more series-connected electromagnets may be configured to re-divert at least a portion of the diverted portion of the pulsed ion beam from the divert trajectory to a path substantially parallel to the original trajectory.

Consistent with the present embodiments, a system for generating a proton beam may include: a proton source configured to provide a proton beam having a plurality of proton energies within a proton energy spread; and at least one processor configured to: controlling relative motion between the proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system; and controlling the proton energy divergence to adjust the depth of the treatment volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions.

Another embodiment consistent with the present disclosure may include a method for treating a treatment volume with protons, the method comprising: providing, by a proton source, a proton beam having a plurality of proton energies within a proton energy divergence; controlling, by at least one processor, relative motion between the proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system; and controlling, by the at least one processor, the proton energy divergence to adjust the depth of the treatment volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions.

For example, consistent with the present embodiments, the at least one processor may be configured to control relative motion between the proton beam and the treatment volume by, for example, rotating the gantry, guiding the proton beam with an electromagnet, and/or moving the patient support platform.

Further, consistent with the present embodiments, a system for treating a treatment volume with protons may be configured to control proton energy spread and proton energy distribution using at least one of a magnetic analyzer, a time-of-flight control unit, and an energy attenuator.

Consistent with other disclosed embodiments, a non-transitory computer-readable storage medium may store program instructions for execution by one or more processor devices and to perform any of the methods described herein.

The foregoing general description is merely a brief summary of a few disclosed embodiments and is not intended to limit the numerous inventive concepts set forth in the following drawings, detailed description, and claims.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate certain aspects of the disclosed embodiments and, together with the description, explain the disclosed embodiments. In the drawings:

fig. 1 is a graph depicting radiation dose as a function of tissue depth.

Fig. 2 is an approximate representation of the size of some conventional accelerator-based particle therapy systems, as described above.

Fig. 3 is a diagram of an example of interconnected components of a system for providing proton therapy consistent with the disclosed embodiments.

Fig. 4A, 4B, 4C, 4D, and 4E are ion generation targets for proton beam generation consistent with the disclosed embodiments.

Fig. 5 is a schematic diagram of an example of a controller for controlling a proton therapy system, consistent with the disclosed embodiments.

FIG. 6 is a schematic diagram of an example of an electromagnetic radiation source consistent with the disclosed embodiments.

FIG. 7 is a schematic view of an example of a gantry consistent with the disclosed embodiments.

FIG. 8 is a schematic view of another example of a gantry consistent with the disclosed embodiments.

Fig. 9 is a flow chart of an example of a proton therapy process consistent with the disclosed embodiments.

FIG. 10 illustrates aspects of an example interaction chamber consistent with disclosed embodiments.

Fig. 11 is a flow chart of an example of a process for controlling proton therapy with proton generation feedback consistent with the disclosed embodiments.

Fig. 12 depicts energies of example proton beam pulses consistent with disclosed embodiments.

Fig. 13A and 13B depict an example of a proton energy selection system consistent with the disclosed embodiments.

Fig. 14 is a flow chart of an example of a process of controlling proton therapy treatment in three-dimensional space based on proton generation feedback consistent with disclosed embodiments.

15A, 15B, 15C, and 15D depict aspects of an exemplary proton therapy treatment based on the process of FIG. 14.

Detailed Description

Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings and disclosed herein. Wherever convenient, the same reference numbers will be used throughout the drawings to refer to the same or like parts.

Systems and methods for providing ion beam therapy are provided herein. The following examples are described with respect to proton therapy. As used herein, "proton therapy" refers to a particle therapy medical procedure that uses a proton beam to irradiate diseased tissue, which is most often used for the treatment of cancer. Although the description refers to such a therapeutic procedure, it should be understood that the intended scope of the innovations herein is not limited to treatment or medical procedures. Rather, it may be applied at any time to generate a proton beam for any purpose. In addition, the present disclosure is not limited to proton beam generation, but is also applicable to other forms of ion beam generation.

A system for generating a proton beam according to the present disclosure may include one or more electromagnetic radiation sources. As used in this disclosure, "electromagnetic radiation" may refer to any form of electromagnetic radiation having any wavelength, frequency, energy, power, polarization, and/or spatial or temporal distribution. In some embodiments, the electromagnetic radiation may propagate in the form of a beam. For example, the beam of electromagnetic radiation may be any form of electromagnetic radiation suitable for illuminating the desired location. In some embodiments, a system for providing a proton therapy system may be configured to provide a beam of electromagnetic radiation along a trajectory. The beam of electromagnetic radiation may, for example, be configured to illuminate a plurality of patterned features on the ion generating target (as described in further detail below), or to illuminate one or more knife edges on the ion generating target (as also described in further detail below).

The beam of electromagnetic radiation may comprise a defined energy, wavelength, power, energy, polarization (or it may not be polarized), spatial distribution and/or temporal distribution. Any of these features may be fixed or may vary. As an example, the electromagnetic radiation source may be configured to provide a laser beam having characteristics tailored to the characteristics of the ion generating target. The beam of electromagnetic radiation may be pulsed, thereby causing a pulsed proton beam, or the beam of electromagnetic radiation may be continuous, thereby causing a continuous proton beam.

A system for generating a proton beam according to the present disclosure can include an ion generating target. As used in this disclosure, an ion generation target may refer to any material, device, or combination of elements configured to generate ions in response to electromagnetic radiation. As described below, the ion generating target may be configured to generate a proton beam; however, proton beams are merely examples. In some embodiments, the ion generating target may be provided with a plurality of patterned features. For example, the plurality of patterned features can include protrusions extending away from the surface of the ion generating target. In some embodiments, the ion generating target may be patterned with one or more knife edges. For example, the knife edge of the ion generating target may include one or more narrow edges, similar to a knife ridge or blade edge.

A system for generating a proton beam according to the present disclosure may include optical component(s). As used in this disclosure, optical component(s) may refer to any component or components used to manipulate and/or control a beam of electromagnetic radiation in any manner, including, for example, shaping, directing, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping, and/or reflecting the beam of electromagnetic radiation. As an example, the optical assembly may be positioned along a trajectory of the beam of electromagnetic radiation, for example between the electromagnetic radiation source and a surface of the ion generating target. In some embodiments, the optical assembly may be configured to direct a beam of electromagnetic radiation at the ion generation target, for example, thereby causing a resultant proton beam. Furthermore, the electromagnetic radiation source may comprise one or more optical components to facilitate the formation of the beam of electromagnetic radiation.

Consistent with the present disclosure, an optical assembly may include one or more adaptive mirrors. As used in this disclosure, an adaptive mirror may refer to an element that includes a reflective surface that may be adapted. For example, the adaptive mirror may be a deformable mirror comprising a plurality of facets, each of which is independently controllable by digital logic circuitry. As another example, the adaptive mirror may be a plasma mirror that includes laser pulses focused onto an anti-reflective coated substrate, one or both of which may be controlled by digital logic circuitry. In some embodiments, the adaptive mirror may be configured to direct the beam of electromagnetic radiation at the ion generation target, or in some cases, may be configured to cooperate with the beam of electromagnetic radiation to cause the beam of electromagnetic radiation to illuminate the ion generation target, thereby facilitating formation of a proton beam. An adaptive mirror according to the present disclosure may be configured to adjust or control a spatial distribution of a beam of electromagnetic radiation and/or to adjust or control at least one of a relative position and orientation between the electromagnetic beam and an ion generating target. In some cases, the adaptive mirror may be configured to direct the beam of electromagnetic radiation by adjusting one or more characteristics of the beam of electromagnetic radiation. For example, the adjusting may be achieved by at least one of adjusting a focus of the beam of electromagnetic radiation, steering the beam of electromagnetic radiation, and scanning the beam of electromagnetic radiation.

Consistent with the present disclosure, a system for generating a proton beam may be configured to, for example, grid a beam of electromagnetic radiation on an ion generating target. As used in this disclosure, rasterization may refer to a pattern that is sequentially scanned over a surface or volume having any shape. For example, rasterization may be achieved by one or more motors configured to cause a beam of electromagnetic radiation to sequentially scan a surface or volume. In some embodiments, the beam of electromagnetic radiation may be rastered over various patterned features of the ion generating target or a knife edge of the ion generating target. In some embodiments, the adaptive mirror may be configured to direct the beam of electromagnetic radiation to impinge various features of the ion generation target.

A system for generating a proton beam according to the present disclosure can include a proton beam adjustment assembly(s). As used in this disclosure, proton beam conditioning component(s) may refer to any component or components used to manipulate and/or control a proton beam in any manner, including, for example, accelerating, analyzing, guiding, shaping, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping, and/or reflecting the proton beam. For example, the proton beam conditioning assembly may include one or more quadrupole lenses, cylindrical lens/analyzer ("CMA"), spherical lens/analyzer ("SMA"), collimator, energy attenuator, time-of-flight control unit, magnetic dipole, or any other assembly suitable for manipulating charged ions.

A system for generating a proton beam according to the present disclosure may be used in conjunction with a system for treating a treatment volume with protons. In the case of medical treatment, the volume may be a group of cells or a tissue region. If used outside the medical field, the volume may be any region or site that may benefit from the application of radiation.

According to the present disclosure, a gantry may be provided. A gantry may refer to any device configured to assist in directing radiation toward a target. The target to be irradiated may be, for example, a treatment volume, such as a tumor in a patient. Since a system for treating a treatment volume with protons consistent with the present disclosure is but one application of the disclosed system for generating a proton beam, it should be understood that this is merely an example. The gantry can also be used to direct a proton beam or other radiation beam toward any target to be irradiated.

According to the present disclosure, a patient support platform may be provided. A patient support platform may refer to any surface, foundation, or other structure configured to support a patient during radiation therapy. The patient support platform may be fixed or adjustable in any dimension.

Any system according to the present disclosure may include at least one processor configured to monitor, control, and/or facilitate use of any component included in the system. Consistent with the disclosed embodiments, a processor may refer to any one or more processing devices including, for example, an Application Specific Integrated Circuit (ASIC), a Digital Signal Processor (DSP), a Programmable Logic Device (PLD), a Field Programmable Gate Array (FPGA), a controller, a microprocessor, or other similar electronic device, and/or combinations thereof. The processor may include one or more modules of the control system.

In some embodiments consistent with the present disclosure, the at least one processor may be configured to impinge a beam of electromagnetic radiation on each patterned feature of a plurality of patterned features comprising the ion generation target, and thereby generate a resultant proton beam. In some embodiments consistent with the present disclosure, the at least one processor may be configured to impinge a beam of electromagnetic radiation on one or more knife edges of the ion generation target and thereby generate a resultant proton beam.

In some embodiments, the at least one processor may control at least one of the electromagnetic radiation source and/or the optical assembly. For example, a processor or a set of processors may control at least one of an energy of the beam of electromagnetic radiation, a flux of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic energy, a temporal distribution of the beam of electromagnetic radiation, or other aspects of the beam of electromagnetic radiation. More specifically, the at least one processor may generate instructions to cause the electromagnetic radiation source to alter a spatial distribution of the beam of electromagnetic radiation by altering a spot size of the beam of electromagnetic radiation. As another example, the at least one processor may alter the temporal distribution of the beam of electromagnetic radiation by altering a chirp of the beam of electromagnetic radiation. As another example, the at least one processor may alter the temporal distribution of the beam of electromagnetic radiation by altering the timing of one or more laser pump sources.

In embodiments consistent with the present disclosure, the at least one processor may be configured to cause the adaptive mirror to direct the beam of electromagnetic radiation at a predetermined location on a surface of the ion generation target. For example, the one or more processors may be configured to rasterize the beam of electromagnetic radiation into an ion-generating target. Such rasterization may include sequentially scanning the beam of electromagnetic radiation over successive patterned features that make up the plurality of patterned features. Impinging the individual patterned features can include, for example, continuously or discontinuously scanning the surface of the ion generating target. In some embodiments, the processor may be configured to cause the adaptive mirror to condition the beam of electromagnetic radiation to impinge the patterned features individually, or it may be configured to impinge each patterned feature simultaneously.

In accordance with the present disclosure, at least one processor may be configured to control multiple aspects of the system independently or simultaneously. For example, the at least one processor may be configured to adjust the proton beam flux while keeping the proton beam energy substantially constant, or may be configured to adjust the proton beam energy while keeping the proton beam flux substantially constant. Alternatively, the at least one processor may be configured to adjust the proton beam flux and the proton beam energy simultaneously.

Fig. 3 depicts an exemplary system 300 for providing proton therapy, including an exemplary system for generating a proton beam. System 300 is also one example of a system for treating a treatment volume with protons. In accordance with the disclosed embodiment, the system 300 may include one or more of an electromagnetic radiation source 302, an ion generation target 304, optical assembly(s) 306, proton beam conditioning assembly(s) 308, a gantry 310, a patient support platform 312, and a control system 314, the control system 314 configured to communicate with any one or more of the above components.

The patient may be positioned on a patient support platform 312. Patient support platform 312 may be any shape or form suitable for use with the other components of system 300 and to help support a patient during treatment. The patient support platform 312 may be fixed in position relative to the gantry 310, or the patient support platform 312 may be configured to translate and/or rotate prior to or during treatment. In some embodiments, the patient support platform 312 may be adjusted to accommodate different sized patients or to position a treatment volume in the path of the proton beam. Furthermore, in some embodiments, the patient support platform 312 can be adjusted during treatment to reposition the treatment volume relative to the proton beam.

The gantry 310 can be configured to direct a proton beam toward a treatment volume, such as a tumor, within a patient. The gantry 310 can be configured to be manipulated in one or more ways to affect the path of the proton beam, and can be composed of a variety of materials and contain many components. Examples of the gantry 310 consistent with embodiments of the present disclosure are discussed in further detail below, which are not intended to be limiting.

The electromagnetic radiation source 302 may emit a beam of electromagnetic radiation 316, e.g., a laser beam, directed towards the ion generating target 304. In some embodiments, electromagnetic radiation source 302 may include one or more gas lasers (e.g., a CO 2 laser), diode-pumped solid-state (DPSS) lasers (e.g., an ytterbium-doped laser, a neodymium-doped yttrium aluminum garnet laser (Nd: YAG), or a titanium-doped Sapphire laser (Ti: Sapphire)), and/or flash lamp-pumped solid-state lasers (e.g., Nd: YAG or neodymium glass). In a broad sense, any radiation source capable of causing ions to be released from the target may be used.

The electromagnetic radiation source 302 may be selected based on the intensity of the electromagnetic radiation source (i.e., the energy divided by the duration of the pulse and the spot size of the laser on the ion generating target 304). Various combinations of spatial distribution (e.g., spot size), wavelength, duration, and energy may be used while still providing the same intensity. For example, in some embodiments, the beam of electromagnetic radiation 316 may be in an energy range of 1J to 25,000J, and in a wavelength range of 400nm to 10,000 nm. The beam of electromagnetic radiation 316 may be pulsed, for example with a pulse width in the range of 10fs to 100 ns. The beam of electromagnetic radiation 316 may have various spot sizes. In some embodiments, 1 μm may be used²To 1cm²Spot size in between. Although the spatial distribution of the beam of electromagnetic radiation 316 may have any beam distribution, in some embodiments the spatial distribution may include gaussian, ultra-highA gaussian, top hat (TopHat), Bessel (Bessel) or annular beam distribution.

In some embodiments, the electromagnetic radiation source 302 may be configured to generate a main pulse after the one or more pre-pulses. The contrast (i.e. the ratio between the main pulse and the pre-pulse, also referred to as the "blanking pulse level" (petestal) reached before the main pulse) may affect proton generation. The higher the laser intensity, the more specifically the contrast can be defined. For example, on a time scale of less than 100ps, the contrast may range from 10^-8To 10^-12。

As a more specific example, the electromagnetic radiation source 302 may be a titanium sapphire laser. In the example of a titanium sapphire laser, the beam of electromagnetic radiation 316 may be in an energy range of about 1J to 25J and have a wavelength of about 800 nm. In this example, the beam of electromagnetic radiation 316 may have a pulse width in the range of about 10fs to 400fs, about 2 μm²And 1mm²Spot size in between and gaussian or top-hat spatial distribution. These characteristics are merely exemplary, and other configurations may be employed.

The beam of electromagnetic radiation 316 can be directed to the ion generating target 304 by one or more optical assemblies 306 disposed, for example, along a trajectory between the electromagnetic radiation source 302 and the ion generating target 304. The one or more optical components 306 may include one or more optical and/or mechanical components configured to alter a characteristic of the beam of electromagnetic radiation 316, including a spectral characteristic, a spatial characteristic, a temporal characteristic, an energy, a polarization, a contrast, or other characteristic. The optical component(s) 306 may, for example, participate in generating, optimizing, manipulating, aligning, modifying, and/or measuring the beam of electromagnetic radiation 316, or in other aspects of the system 300. The optical component(s) 306 may include various optical elements such as lenses, mirrors, laser crystals and other laser materials, piezo-actuated mirrors, plates, prisms, beam splitters, filters, light pipes, windows, slabs, fibers, frequency shifters, optical amplifiers, gratings, pulse shapers, XPW, Mazzler (or Dazzler) filters, polarizers, pockels cells, optical modulators, apertures, saturable absorbers, and other optical elements.

The optical component(s) 306 may be fixed or adaptive. For example, optical component(s) 306 may include one or more active, adaptive, or reconfigurable components, such as deformable mirrors, plasma mirrors, pockels cells, phase shifters, optical modulators, iris diaphragms, shutters (both manual and computer controlled), and other similar components. The adaptive properties may manipulate the optical component itself, for example in the case of a deformable mirror or a plasma mirror. The orientation of the optical component(s) 306 may also be adjustable, such as by translating the optical component(s) 306 or rotating the optical component(s) 306 about an axis of rotation. The adjustment may be manual or automatic. As one example, the control system 314 may receive a feedback signal and, in response, provide a control signal to a motor connected to the optical assembly(s) 306 located between the beam of electromagnetic radiation 316 and the ion generating target 304. The movement of the motor, in turn, can adjust the optical assembly(s) 306 to alter the relative orientation between the beam of electromagnetic radiation 316 and the ion generating target 304 (e.g., by repositioning the laser target interaction position).

Examples of deformable mirrors that may be employed in the optical component(s) 306 include, for example, segmented mirrors, continuous panel mirrors, magnetic mirrors, MEMS mirrors, membrane mirrors, bimorph mirrors, and/or ferromagnetic mirrors. Any number of other mirror techniques capable of modifying the wavefront of the beam of electromagnetic radiation may also be used.

An example of a plasma mirror that may be employed in the optical component(s) 306 includes a laser pulse focused on an anti-reflective coating substrate that is ionized to reflect a high intensity peak and separate the high intensity peak from a low intensity pulse background. As an example, a plasma mirror may be created by directing laser pulses towards a parabolic mirror located in front of an anti-reflective coating substrate. Other ways of implementing a plasma mirror are known to those of ordinary skill in the art and are suitable for use with embodiments of the systems and methods described herein.

The optical component(s) 306 may be customized to parameters associated with the desired beam. For example, the optical assembly 306 may be customized according to wavelength, intensity, temporal pulse shape (e.g., pulse width), spatial size and energy distribution, polarization, and other characteristics of the desired light beam. Such beam parameters may relate to optical substrate material, size (e.g., lateral size or thickness), coating material (if any), shape (e.g., planar, spherical, or other), orientation relative to the beam, or other specification.

The optical assembly(s) 306 may include one or more corresponding retainers configured to hold the element in place while allowing the element to be positioned to a suitable degree of precision, such as translation and rotation, and other degrees of freedom. In one embodiment, such a holder may comprise an opto-mechanical mount held in place by an optical bench or any other mechanical holder. Such degrees of freedom may be manipulated manually or via any suitable automated means, such as an electric motor.

The optical component(s) 306 may be disposed under specific environmental conditions, such as a vacuum and/or an environment purged with one or more gases. Furthermore, the optical assembly 306 may be disposed at various locations along the path of the electromagnetic radiation source 302 between the electromagnetic radiation source 302 and the ion generating target 304, or in any other system of the system 300 that requires optical assemblies. The optical component(s) 306 may be configured for various purposes, such as laser beam manipulation, laser beam diagnostics, laser target interaction diagnostics, and/or ion generating target viewing and positioning.

In some embodiments, the lifetime of the optical component(s) 306 may vary. Some optical component(s) 306 may be long-term devices that may be reused multiple times. Alternatively or additionally, some optical component(s) 306 may be consumable, used a fewer number of times, and replaced. This classification may be based on many factors, such as laser intensity and the presence of debris/contamination. In some embodiments, a debris shield may be installed near expensive or delicate optics to reduce the need for frequent replacement. Periodic inspections of the optical device suspected of suffering damage may be performed. A dedicated optical system may be installed to check for risky optics.

The optical component(s) 306 may be manipulated manually, automatically, or by any combination thereof. The type of input used to manipulate the optical component 306 may include a high voltage signal, a trigger signal, an optical pump, or any other form of input. Further, the optical component 306 may be monitored by one or more cameras (such as CCD cameras). For example, automatic manipulation of the adaptive mirror(s) may occur in response to one or more signals provided by the control system 314. The control system 314 may, for example, control one or more motors, piezoelectric element(s), microelectromechanical (MEMS) element(s), and/or the like associated with the deformable mirror. Alternatively or additionally, the control system 314 may, for example, control one or more laser pulses, an anti-reflective coating substrate, and/or the like associated with the plasma mirror.

In some embodiments, the optical component(s) 306 may include an adaptive deformable mirror, such as a deformable mirror having a plurality of facets, each of which is independently controllable. These facets may be controlled by digital control logic, such as that included in control system 314. As another example, the adaptive mirror may be a plasma mirror that ionizes the antireflective coating substrate using a focused laser pulse, thereby reflecting a high intensity peak and separating the high intensity peak from a low intensity laser pulse background. The laser pulses and/or the anti-reflective coating substrate may be controlled by digital control logic, such as digital control logic included in the control system 314.

The adaptive mirror may be configured to direct the beam of electromagnetic radiation 316 by one or more of adjusting a focus of the beam of electromagnetic radiation, steering the beam of electromagnetic radiation, and scanning the beam of electromagnetic radiation. The adaptive mirror may be configured to adjust the focus of the beam of electromagnetic radiation in any manner apparent to those skilled in the art. For example, the beam of electromagnetic radiation 316 may impinge upon a plurality of facets of a deformable mirror, or the beam of electromagnetic radiation 316 may impinge upon a plasma mirror. In some configurations, it may be desirable to adjust the position of the beam of guided electromagnetic radiation 316 or to adjust a characteristic of the beam of electromagnetic radiation 316. The facets of the deformable mirror may be controlled to reflect the beam of electromagnetic radiation 316 such that its spot size at a desired location is smaller, larger, or different in shape than its spot size prior to striking the deformable mirror. Likewise, the plasma mirror may be controlled to reflect the beam of electromagnetic radiation 316 such that its spot size at a desired location is smaller, larger, or different in shape than its spot size prior to striking the deformable mirror.

The adaptive mirror may also be configured to steer the beam of electromagnetic radiation 316. For example, the system 300 may be configured such that the beam of electromagnetic radiation 316 will sequentially or simultaneously strike multiple locations on the ion generating target 304 or multiple ion generating targets 304 disposed in different locations within the system 300. In such a configuration, an adaptive mirror or other optical assembly(s) 306 may alter the path of the beam of electromagnetic radiation 316 to direct the beam onto multiple locations and/or multiple ion generating targets. For example, the adaptive mirror or other optical component(s) 306 may sequentially steer (e.g., scan) the beam of electromagnetic radiation 316 from one position to an adjacent position in the pattern, either continuously or discontinuously (such as in a step-wise manner). In an automated process, the control system 314 may be configured to cause the adaptive mirror to direct the beam of electromagnetic radiation 316 at a predetermined location on the surface of the ion generating target 304. For example, it may be advantageous to scan the beam of electromagnetic radiation 316 over an array of patterned ion generating features provided at the surface of the ion generating target 304. It may also be advantageous to scan the beam of electromagnetic radiation 316 over the ion generating target 304 comprising a plurality of ion generating structures oriented substantially along a common axis, such as protrusions extending substantially away from the surface of the ion generating target 304. It may also be advantageous to scan the beam of electromagnetic radiation 316 over an ion generation target 304 patterned with one or more knife edges, such as an ion generation target including one or more features having a narrow edge similar to a knife ridge or blade edge. The adaptive mirror is taken as an example for explanation. Those skilled in the art will recognize that other optical component(s) 306 may perform the same or similar functions as those described above with reference to the adaptive mirror.

In accordance with the present disclosure, an ion generation target can be configured to facilitate ion generation. For example, an ion generating target may include a surface having one or more ion generating structures or features. Such structures or features may be composed of one or more suitable materials, including any of ice (also known as snow), plastic, silicon, stainless steel, or a variety of metals, carbon, and/or any other material from which an ion beam may be generated. Such structures may be arranged randomly, as defined by the growth or deposition process, and/or in a patterned array. Such structures may alternatively or additionally include one or more narrow edges, similar to knife ridges or blade edges. The structure may be configured based on one or more properties of the beam of electromagnetic radiation. For example, such structures may have dimensions smaller than the wavelength of a beam of electromagnetic radiation, such as a laser.

The ion generating target 304, when struck by the beam of electromagnetic radiation 316, can emit a variety of particles, including electrons, protons, x-rays, and other particles. The ion generating target 304 may be composed of a variety of materials. The ion generating target 304 may be configured such that it includes one or more individual features configured to interact with the beam of electromagnetic radiation 316. Alternatively or additionally, the ion generating target 304 may comprise a continuous surface or texture formed of a material that facilitates interaction with the beam of electromagnetic radiation 316. Those skilled in the art will appreciate that many configurations may be employed to emit particles when interacting with a beam of electromagnetic radiation, and the disclosed embodiments are merely exemplary.

In some embodiments, the ion generating target 304 may be pre-fabricated. In other embodiments, the ion generating target 304 may be generated in situ within the system 300 or an attached sample preparation system. For example, the ion generating target 304 may be disposed within an interaction chamber, such as the interaction chamber 1000 described below. This may involve forming the ion generating target from a suitable material, including forming such material on a substrate. Such materials may include any gas, solid or liquid chemical source commonly known in the art, such as evaporation, physical vapor phaseDeposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. For example, in embodiments where the ion generating target 304 comprises ice, the material used to form the ion generating target may comprise water vapor (H)₂O), hydrogen (H)₂) And/or oxygen (O)₂). Further, in embodiments in which ion generating target 304 comprises silicon, the material used to form ion generating target 304 may comprise, for example, Silane (SiH)₄) Disilane (Si)₂H₆) Trichlorosilane (SiHCl)₃) Or any other silicon source. Still further, in embodiments where the ion generating target 304 comprises plastic, the source may comprise, for example, a Polytetrafluoroethylene (PTFE) polymer source material or any other PTFE source. As one of ordinary skill in the art will recognize, these are merely a few illustrative examples of the many target materials and target source materials that are available. In addition, the interaction chamber may be structurally modified to suit the form of target employed. For example, when the target is ice, the interaction chamber may be specifically configured to maintain a suitable temperature to support the ice. Each target material may have different maintenance requirements and, therefore, the structure of the interaction chamber may vary to suit the target material.

Fig. 4 depicts an illustrative ion generating target that can be used as ion generating target 304. For example, fig. 4A shows an ion generating target 402, the ion generating target 402 comprising a cover structure 404 on a hollow hourglass-shaped cone 406. In one embodiment, the distance between at least two opposing points of the cone may be less than about 15 pm. In a particular example, the distance may be less than about 1 pm. In some embodiments, the features of the ion generating target 402 may be independent. Such features may include, for example, any number of shapes, including conical, pyramidal, hemispherical, and capped structures. The structure of the illustrative ion generating target 402 shown in fig. 4 (as well as other embodiments of the ion generating target 304) can be formed using lithographic techniques, such as photolithography. In a particular example, the ion generating target cone 406 can be fabricated on a silicon wafer 408 and then coated with one or more metals 410. In some embodiments, protons may be ejected from the backside opening 412. Fig. 4B shows another illustrative ion generating target suitable as ion generating target 304 for use with the present invention. Fig. 4B depicts a portion of an ion generating target having one or more micro-cone targets 420 on its surface. Each of the micro-cone targets 420 may be adapted to produce a high energy, low divergence particle beam. In one embodiment, the micro-cone target 420 may include a generally conical body 422 having an outer surface 424, an inner surface 426, a generally flat and rounded open end base 428, and a tip 430 defining an apex. The conical body 422 may taper along its length from a generally flat and rounded open end base 428 to a tip 430 defining an apex. The outer surface 424 and the inner surface 426 may connect the base 428 to the tip 430.

Fig. 4C, 4D, and 4E depict other illustrative ion generating targets 304 suitable for use with embodiments of the present invention. In particular, fig. 4C, 4D, and 4E depict the surface of a snow target, which may be formed from ice crystals. Ice may be advantageous for use as an ion generating target because water is rich in hydrogen. Further, as shown in fig. 4C, the structure on the ion generation target may take a needle-like shape. Such a shape may enhance the electric field generated by the interaction of the beam of electromagnetic radiation 316 and the ion generating target 304. Each needle-like structure on the ion generating target 304 may be approximately the same wavelength as the beam of electromagnetic radiation 316. For example, the structure may be about 1 μm to 10 μm.

Various patterned features on the surface of the ion generating target 304 may be physically arranged on the ion generating target 304 such that they may be sequentially scanned. For example, such structures may be arranged in an array on a substantially planar surface. As shown in fig. 4C, the individual structures may be evenly distributed over the entire surface to form a pattern. Alternatively, the structures may be arranged in a repeating pattern with spaces between the structures, as shown in fig. 4D and 4E.

Referring again to fig. 3, the proton beam adjustment assembly(s) 308 may include one or more assemblies configured to form a proton beam 318 from protons generated by the ion generation target 304 and direct the proton beam to the gantry 310 and a treatment volume of the patient. The proton beam modulation assembly 308 may include any component capable of manipulating charged particles, such as protons. For example, the proton beam conditioning assembly(s) 308 can include an electromagnetic assembly. More specifically, the proton beam conditioning component(s) 308 may include one or more electromagnetic components, such as quadrupole lenses, cylindrical lens/analyzers ("CMAs"), spherical lens/analyzers ("SMAs"), collimators, energy attenuators, time-of-flight control units, magnetic dipoles, or any other component suitable for manipulating charged ions. The proton beam adjustment component(s) 308 can also adjust one or more characteristics of the proton beam 318. For example, the beam adjustment assembly 308 may manipulate a characteristic such as flux or spot size. The proton beam conditioning component(s) 308 may also filter particles having a particular energy or reduce the energy of various particles.

The proton beam conditioning component(s) 308 can be disposed in various locations within the system 300, including inside the interaction chamber, along the proton beam line, within the gantry 310, or any combination thereof. For example, the proton beam conditioning assembly may be disposed along a beam line extending between the ion generating target 304 and the gantry 310. The beamline may be configured to maintain various conditions, such as temperature, pressure (e.g., vacuum), or other condition(s) conducive to propagating and/or manipulating the proton beam 318. The beamline may further include other components for receiving the charged particle beam, including, but not limited to, elements such as a beam dump, a beam attenuator, and protective shielding.

The control system 314 may monitor and/or control various aspects of the system 300. For example, the control system 314 may monitor the electromagnetic radiation source 302, the optical assembly(s) 306, the ion generation target 304, the proton beam conditioning assembly(s) 308, the gantry 310, and/or the patient support platform 312. The control system 314 may also accept input from a user (e.g., a technician or other operator) of the system 300. The control system 314 may also accept, store, and operate operations associated with the system 300, including, for example, initiating and maintaining any functions of the system 300. The control system 314 may also be configured to implement feedback between the one or more detectors and the various components of the one or more systems 300. Such feedback may, for example, improve the accuracy, efficiency, speed, and/or other aspects of the system 300 or its operation. Examples of such feedback are described in more detail below.

Fig. 5 is a diagram of an exemplary computing system 500, illustrating a configuration that may be associated with control system 314 and consistent with the disclosed embodiments. As will be appreciated by those skilled in the art, some or all of the functionality associated with the control system 314 may be run or facilitated by software, hardware, or any combination thereof associated with the computing system 500. In one embodiment, computing system 500 may have one or more processors 520, one or more memories 540, and one or more input/output (I/O) devices 530. In some embodiments, computing system 500 may take the form of a server, general purpose computer, customized special purpose computer, mainframe, laptop, mobile device, or any combination of these components. In certain embodiments, computing system 500 (or a system including computing system 500) may be configured as a particular apparatus, system, or the like, based on the storage, execution, and/or implementation of software instructions that may perform one or more operations consistent with the disclosed embodiments. Computing system 500 may be stand alone or it may be part of a subsystem, which may be part of a larger system.

Processor 520 may include one or more known processing devices such as an Application Specific Integrated Circuit (ASIC), a Digital Signal Processor (DSP), a Programmable Logic Device (PLD), a Field Programmable Gate Array (FPGA), a processor, a controller, a microprocessor, other electronic units, and combinations thereof. For example, processor 520 may include a processor from Intel^TMProduced Pentium^TMOr Xeon^TMSeries, by AMD^TMManufactured Turion^TMA family of processors, or any of the various processors manufactured by Sun Microsystems. Processor 520 may constitute a single-core or multi-core processor that simultaneously runs parallel processing. For example, processor 520 may be a single core processor configured with virtual processing techniques. In some embodiments, processor 520 may use a logical processor to run and control multiple processes simultaneously. Processor 520 may implement virtual machine technology or other known technology to provide execution, control, run, manipulate, store, and/or provide forThe capabilities of a plurality of software processes, applications, programs, etc. Processor 520 may include a multi-core processor arrangement (e.g., dual core, quad core, etc.) configured to provide parallel processing functionality to allow computing system 500 to allow multiple processes simultaneously. One of ordinary skill in the art will appreciate that other types of processor arrangements that provide the capabilities disclosed herein may be implemented. The disclosed embodiments are not limited to any type of processor(s).

Memory 540 may include one or more memory devices configured to store instructions used by processor 520 to perform functions associated with the disclosed embodiments. For example, memory 540 may be configured with one or more software instructions, such as program(s) 550, which when executed by processor 520 may perform one or more operations. The disclosed embodiments are not limited to a separate program or computer configured to perform the specialized tasks. For example, memory 540 may include a program 550 that performs the functions of computing system 500, or program 550 may include multiple programs. Additionally, processor 520 may run one or more programs located remotely from computing system 500. For example, controller 314 may access, via computing system 500 (or variations thereof), one or more remote programs that, when executed, perform functions associated with certain disclosed embodiments. Processor 520 may further run one or more programs located in database 570. In some embodiments, program 550 may be stored in an external storage device, such as a server located external to computing system 500, and processor 520 may execute program 550 remotely.

Memory 540 may also store data that may reflect any type of information in any format that a system may use to perform operations consistent with the disclosed embodiments. Memory 540 may store instructions to enable processor 520 to execute one or more applications, such as server applications, network communication processes, and any other type of application or software. Alternatively, instructions, applications, and the like may be stored in external storage (not shown) that is in communication with computing system 500 via a suitable network, including a local area network or an Ethernet network. The memory 540 may be a volatile or nonvolatile, magnetic, semiconductor, tape, optical, removable, non-removable, or other type of storage device or tangible (i.e., non-transitory) computer-readable medium.

The memory 540 may include data 560. Data 560 may include any form of data used by controller 314 in controlling ion (e.g., proton) therapy treatment via system 300. For example, the data 560 may include data related to the operation of various components of the system 300, feedback parameters associated with operating various components of the system 300, data collected from one or more detectors associated with the system 300, treatment plans for a particular patient or for a particular disease, calibration data for various components of the system 300, and so forth.

The I/O device 530 may include one or more devices configured to allow the computing system 500 to receive and/or transmit data. I/O device 530 may include one or more digital and/or analog communication devices that allow computing system 500 to communicate with other machines and devices, such as other components of system 300 shown in fig. 3. For example, the computing system 500 may include interface components that may provide an interface to one or more input devices, such as one or more keyboards, mouse devices, displays, touch sensors, card readers, biometric readers, cameras, scanners, microphones, wireless communication devices, etc., that may enable the computing system 500 to receive input from an operator of the controller 314. Further, the I/O devices may include one or more devices configured to allow the control system 314 to communicate with one or more of the various devices of the system 300, such as through wired or wireless communication channels.

Computing system 500 may also include one or more databases 570. Alternatively, the computing system 500 may be communicatively connected to one or more databases 570. Computing system 500 may be communicatively connected to database(s) 570 via a network, such as a wired or wireless network. Database 570 may include one or more storage devices that store information and are accessed and/or managed by computing system 500.

Fig. 6 is a general schematic diagram of an exemplary electromagnetic radiation source 302. As shown in fig. 6, electromagnetic radiation source 302 may include one or more oscillators 602, pump sources 604, optics 606, diagnostic devices 608, extenders 610, amplifiers 612, compressors 614, and controllers 616. The configuration of fig. 6 is merely an example, and many other configurations, incorporating one or more of electromagnetic radiation source 302, a component of system 300, or other components, may be implemented consistent with the disclosed embodiments.

The oscillator 602 may include one or more lasers for generating initial laser pulses 618 to be manipulated (e.g., shaped and/or amplified) to meet requirements of the beam of electromagnetic radiation 316. As the oscillator 602, various lasers or laser systems, including commercially available laser systems, can be used.

The pump source 604 may include a separate laser or laser system(s) configured to deliver energy into the laser pulses 618. In some embodiments, the pump source 604 may be connected to the output of the oscillator 602 through a beamline that incorporates one or more optical components 306. Additionally or alternatively, the pump source 604 may include other pumping mechanisms, such as flash lamps, diode lasers, Diode Pumped Solid State (DPSS) lasers, and the like. In some embodiments, the pump source 604 may be configured to alter the temporal distribution of the beam of electromagnetic radiation 316. For example, the control system 314 may be configured to control the timing of the pump source 604, thereby controlling the timing of the pre-pulse and the pedestal level of the beam of electromagnetic radiation.

Optics 606 may include any of the components discussed with respect to optical component 306 and may perform any of the roles and/or functions described with respect to optical component 306.

The diagnostic device 608 may include optical, opto-mechanical, or electronic components designed to monitor the laser pulses 618, such as their temporal and spatial characteristics, spectral characteristics, timing, and/or other characteristics. More specifically, the diagnostic device 608 may include one or more photodiodes, oscilloscopes, cameras, spectrometers, phase sensors, autocorrelators, cross-correlators, power or energy meters, laser position and/or orientation sensors (e.g., pointing sensors), dazzlers (or mazzlers), and the like. The diagnostic device 608 may also include or incorporate any of the components identified above with respect to the optical device 606.

The stretcher 610 may be configured to chirp (chirp) or stretch the laser pulse 618. More specifically, extender 610 may include diffraction grating(s) or other dispersive components, such as prisms, chirped mirrors, and the like.

Amplifier 612 may comprise, for example, titanium sapphire crystal, CO₂Gas or Nd: an amplifying medium such as a YAG crystal. The amplifier 612 may also include a holder for the amplification medium. The holder may be configured to be compatible with supporting environmental conditions such as positioning, temperature, and the like. Amplifier 612 may be configured to receive energy from pump source 604 and transmit this energy to laser pulse 618.

Compressor 614 may include an optical assembly configured to compress laser pulses 618 in time, e.g., to a final duration. The compressor 614 may be comprised of a diffraction grating located on the holder and within the vacuum chamber. Alternatively, the compressor 614 may be constituted by a dispersive fiber or a prism, for example. Additionally, the compressor 614 may include a mirror or other optical assembly 306, as well as motors and other electronically controlled opto-mechanics.

Controller 616 may include electronic system(s) to control and/or synchronize the various components of electromagnetic radiation source 302. The controller 616 may include any combination of controllers, power supplies, computers, processors, pulse generators, high voltage power supplies, and other components. As an example, controller 616 may include one or more computing systems 500, which may be dedicated to electromagnetic radiation source 302 or shared with other components of system 300. In some embodiments, some or all of the functions of the controller 616 may be performed by the controller 314 of the system 300.

Controller 616 may interface with various components of electromagnetic radiation source 302 and other components of system 300 via various communication channels. The communication channel may be configured to send electrical or other signals to control various optical and opto-mechanical components associated with the radiation source 302 or the system 300. The communication channel may include conductors compatible with high voltage, electrical triggers, various wired or wireless communication protocols, optical communications, and other components. Controller 616 may receive inputs from optical and mechanical diagnostic components along electromagnetic radiation source 302 and inputs from self-diagnostic device 608 along other portions of system 300. Further, the controller 616 may receive signals from the user or based on signals input from the user, such as signals based on a patient treatment plan input by the user.

Fig. 7 depicts an example of a gantry 700 consistent with an embodiment of the present disclosure. In some embodiments, the gantry 310 (fig. 3) can be arranged in the form of a gantry 700, although this is not intended to be limiting and other gantry designs can be employed. The gantry 700 can deliver the proton beam 318 to an isocenter 712. In some embodiments, the isocenter 712 may represent a location of or within the treatment volume. The gantry 700 can also be configured for beam conditioning and reconfiguration to properly direct the proton beam 318 before and during treatment. The gantry 700 can include a solenoid 704, a connector 706, a beam conditioning component(s) 708, a collimator(s) 718, and a scanning magnet(s) 710. The height 714 and width 716 may vary widely based on the many possible configurations of the gantry 700. In some embodiments, either or both of the height 714 and width 716 may be as little as 2.5 meters.

In some embodiments, the gantry 700 may be separated from other components of the system 300 by walls 702 or other barriers. The wall 702 may include one or more openings (not shown in the figures) to allow passage of the proton beam 318 and any beamline or other equipment configured to transport the proton beam 318. The position of the wall 702 may vary depending on a number of factors, and in some embodiments, the wall 702 may not be present.

The solenoid 704 may be configured to capture protons emitted by the ion generating target 304. In some embodiments, the protons emitted by the ion generating target 304 may exhibit a large divergence. As an example, the beam size of protons emitted from the ion generating target 304 may be expanded by a factor of 100 over a short distance such as 1 cm. The solenoid 704 can be configured to reduce convergence of the proton beam 318.

The solenoid 704 may comprise a high field solenoid, such as a 9 to 15T superconducting solenoid. The field strength may be related to the solenoid length and the resulting beam size. Higher solenoid field strengths may result in smaller beam sizes and apertures required for the solenoid 704. The length of the solenoid 704 may vary based on field strength and other factors. In some embodiments, the length of the solenoid 704 may be between 0.55m and 0.85m, while the aperture is between 4cm and 20 cm. In some embodiments, the solenoid 704 may be used in conjunction with one or more collimators. Further, in some embodiments, one or more quadrupoles may be employed in addition to or instead of the solenoid 704.

The connector 706 may be any mechanical and/or optical connection configured to facilitate physical movement of the gantry 700, such as rotation about a rotational axis, such as axis 716. The gantry can be configured to physically move by any suitable arrangement of motors and/or actuators, which can be controlled by the control system 314. The connector 706 may include one or more bearings or bushings and may be connected to and/or integrated into the beamline carrying the proton beam 318. Thus, the connector 706 may be configured to maintain a seal or other barrier to prevent loss of vacuum or other environmental conditions within the beam. In addition, the connector 706 may include rotation-invariant optics, for example, to reduce tuning dependence as a function of gantry position.

The gantry 700 may further include a beam adjustment assembly 708. The beam adjustment assembly 708, which may include any of the beam adjustment assemblies 308 described above, is configured to direct the proton beam 318 through the gantry. In some embodiments, the beam conditioning assembly 708 may include an electromagnet, such as a dipole and/or a quadrupole, configured to steer the proton beam 318 through the gantry 700. The beam conditioning assembly 708 may include a normal conducting dipole, a super-iron superconducting dipole, a stripline dipole, and the like.

In some embodiments, the beam conditioning assembly 708 may include a dipole pair (e.g., each dipole bends the proton beam 318 by approximately 45 °) to form a rectangle (or any other combination of angles to form a rectangle or another desired shape). The dipole pair may operate at about 4.8T and a length of about 0.6 m. The straight sections between the dipole pairs can be independently adjusted to provide tuning range, flexibility, and thus customization of the electromagnetic optics. Dividing the 90 bend into two improves the reference trajectory control because each dipole can be adjusted independently, for example via a shunt on a single power supply, to provide a variation of at least 10% (overall relative change is 20% considering both dipoles). Thus, dipole pairs may facilitate independent trajectory correction on each arm of gantry 700, thereby reducing tolerances and cost.

The gantry 700 can also include one or more collimators 718. The collimator 718 may be configured to filter the proton beam 318 such that only protons traveling in a desired direction and/or having a desired momentum are allowed to pass. The collimator 718 may be disposed at various locations within the gantry 700. For example, if beam conditioning assembly 708 has achromatic properties, thereby causing undesirable effects on the downstream beam, collimator 718 may be configured to counteract such effects.

The gantry 700 may further include a scanning magnet(s) 710. The scanning magnet 710 may include a beam adjustment assembly, such as

beam adjustment assembly

308 or 708, configured to adjust the position of an isocenter 712 in space. The scanning magnet 710 may be controlled by the control system 314, for example, to adjust the treatment position provided to the treatment volume. The scanning magnet 710 may be disposed in any one of a number of positions within the gantry 700. For example, the scanning magnet 710 may be upstream of one or more of the beam conditioning assemblies 708, downstream of all of the beam conditioning assemblies, or a combination of these upstream and downstream locations, as shown in fig. 7.

The system 300 may be configured such that the scanning magnet operates in conjunction with other components to control the treatment location within the patient. For example, the control system 314 may control any combination of the motion of the scanning magnet 710, the gantry 700, and the patient support platform 312. One or more components may be configured to control a particular dimension and/or degree of freedom. For example, the patient support platform may be configured to adjust the patient position in one dimension while the scanning magnet 710 is adjusted in another dimension orthogonal to the first dimension.

Alternatively or additionally, the system 300 may be configured such that coarse tuning of a given dimension may be performed by a different component than fine tuning. For example, coarse adjustments of a particular dimension may be performed by a motor configured to manipulate the patient support platform 312, while fine adjustments may be made by scanning the magnet 710. Various combinations of such adjustments will be apparent to those skilled in the art.

Fig. 8 depicts another example of a gantry 800. The gantry 800 may include some or all of the same components as the gantry 700, such as solenoids 704, connectors 706, beam conditioning component(s) 708, collimator(s) 718, and scanning magnet(s) 710, and may also include other quadrupole elements 802. Quadrupole element 802 is a magnetic element that is part of the magnetic beam line and helps to deliver the proton beam to the treatment volume. Quadrupole element 802 is typically used to focus or defocus the charged particle beam, as opposed to some larger dipole, which is typically used as a bending magnet to bend the proton beam. Quadrupole element 802 can be a permanent magnet (e.g., made of a back grounded element and/or other magnetic material), a normally conductive electromagnet, a superconducting electromagnet, a pulsed magnet, or other device capable of providing a suitable fixed or adjustable magnetic field.

Fig. 9 is an exemplary flow diagram of a process 900 for proton beam formation. In step 902, an electromagnetic radiation source (e.g., source 302) may emit a beam of electromagnetic radiation (e.g., beam 316). At step 904, a beam of electromagnetic radiation may impinge a particle-generating target (e.g., target 304). In step 906, interaction of the beam of electromagnetic radiation with the ion generating target may generate particles including protons. At step 908, a proton beam adjustment component(s) (e.g., component 308) can form a proton beam (e.g., beam 318) from the particles and direct the proton beam to a treatment volume within the patient. The steps of process 900 may be performed automatically, such as by control system 314. The steps of process 900 may also be performed in response to user input, such as by control system 314, or by a combination of automatic and manual operation of various components. In some embodiments, process 900 may be performed based on specifications in a treatment plan that may be customized to varying degrees based on a particular patient, treatment type, and/or treatment volume.

In step 902, the emitted beam of electromagnetic radiation may be generated via any component capable of radiation beam generation, for example, various combinations of the components described with respect to fig. 6.

In step 904, a beam of electromagnetic radiation may impinge an ion generating target. For example, the ion generating target 304 may be disposed within an interaction chamber to isolate the ion generating target from an external environment. Upon striking the ion generating target 304, the interaction of the beam of electromagnetic radiation 316 and the ion generating target 304 may generate various particles, including protons, which may be used in the proton beam 318. In some embodiments, protons may be emitted from a location on the ion generating target 304 that is impinged by the beam of electromagnetic radiation 316 at a proton energy of about 250MeV, the beam of electromagnetic radiation 316 focused to a spot size of about 10 to 100 μm. The two-dimensional divergence angle of the protons emitted from the ion generating target 304 may be about 0.2 radians (i.e., about 11 degrees). In addition, proton energy angular distribution

And proton number energy distribution

Can be very small so that the energy angular distribution and proton number energy distribution are reasonably constant. As an example, a pulse of a beam of electromagnetic radiation may result in emission 10⁸And the pulses may be repeated at a rate of 10 to 1000 Hz. Thus, the pulsed electromagnetic radiation beam 316 may thereby produce a pulsed proton beam 318. The proton pulse may also be referred to as proton "bunching".

In accordance with the present disclosure, an ion generating target may be supported by and/or housed within an interaction chamber. As used in this disclosure, an interaction chamber may refer to any structure configured to isolate a target from ambient conditions and provide an appropriate environment for ion generation.

According to the present disclosure, the interaction chamber may, for example, comprise a target table. As used in this disclosure, a target table may refer to any structure configured to support an ion generating target. In some embodiments, the target table may be controlled by a processor configured to cause relative motion between the target table and the beam of electromagnetic radiation.

According to the present disclosure, the interaction chamber may comprise one or more detectors. As used herein, a detector may refer to a device that detects one or more characteristics of a sample chamber condition, electromagnetic radiation source or beam, proton beam, and/or laser target interaction. The detector may for example observe any conditions within and/or near the interaction chamber. In some embodiments, the system for generating a proton beam may include other detectors separate from the interaction chamber. As an example, the detector may be configured to measure at least one laser target interaction characteristic.

As used in this disclosure, laser target interaction may refer to an observable property related to the interaction of a beam of electromagnetic radiation with an ion generating target. The laser target interaction characteristics may include, for example, proton beam characteristics, secondary electron emission characteristics, x-ray emission characteristics, proton beam energy, proton beam flux, and/or other characteristics indicative of an interaction between the beam of electromagnetic radiation and the ion generating target.

Fig. 10 depicts an example of an interaction chamber 1000. The interaction chamber 1000 can be of any size and shape and can be constructed of any suitable material or materials capable of holding a target during laser target interaction. Stainless steel is one example of a material that may be used to construct interaction chamber 1000.

The interaction chamber 1000 may include one or more tables 1002 configured to support the ion generation target 304 and/or other equipment within the interaction chamber 1000, such as optical component(s), beam conditioning component(s), detectors, and the like. The table(s) 1002 may be fixed or adjustable. The adjustable stage may be configured to translate and/or rotate along one or more axes. The adjustment of the stage(s) 1002 may be manual or automatic. The automatic adjustment may be performed, for example, in response to one or more signals provided by the control system 314. The stage(s) 1002 may optionally be configured to heat, cool, or maintain the temperature of the ion generating target 304. Temperature control may be achieved, for example, by monitoring the temperature of the ion generating target 304 and increasing, decreasing, or maintaining the temperature of the ion generating target 304 in response to the measured temperature. For example, temperature monitoring may be accomplished using one or more thermocouples, one or more infrared temperature sensors, and/or any other technique for measuring temperature. The temperature adjustment may be performed, for example, by adjusting the amount of current flowing through the heating element. The heating element may be, for example, a refractory metal such as tungsten, rhenium, tantalum, niobium molybdenum, and/or alloys thereof. For example, temperature adjustment may also be performed by flowing a coolant, such as water or a cryogenic fluid (e.g., liquid oxygen, liquid helium, liquid nitrogen, etc.), through a conduit placed in direct or indirect thermal communication with the ion generating target 304. As will be appreciated by one of ordinary skill in the art, these exemplary ways of adjusting the temperature are compatible and may be combined. Of course, these temperature adjustment methods are not limiting, and any other known methods for heating, cooling, and/or maintaining the temperature of the ion generating target 304 may be used with the disclosure herein.

The interaction chamber 1000 may include one or more associated vacuum pumps 1004. For example, one or both of sample preparation and proton beam formation may have subatmospheric atmospheric pressure requirements, or may achieve optimum performance within a particular subatmospheric pressure range. Vacuum pump(s) 1004 may be used to affect pressure conditions within interaction chamber 1000 and/or components associated with interaction chamber 1000. For example, vacuum pump(s) 1004 may maintain vacuum conditions or near vacuum conditions in interaction chamber 1000. Examples of vacuum pump(s) 1004 may include one or more turbomolecular, cryogenic, ion, or mechanical pumps, such as diaphragm or roots pumps. Vacuum pump(s) 1004 may operate in conjunction with one or more pressure regulators (not shown in the figures).

The interaction chamber 1000 may include an optical assembly 1006. Any of the components noted above with respect to optical component(s) 306 may be used within the interaction chamber to further direct the beam of electromagnetic radiation 316. As shown in fig. 10, for example, the interaction chamber can include a mirror 1006a configured to direct the beam of electromagnetic radiation 316 toward the ion generation target 304. In one embodiment, the interaction chamber 1000 may include a parabolic mirror 1006b configured to focus the beam of electromagnetic radiation 316 onto the ion generating target 304.

The interaction chamber 800 can include any number of proton beam conditioning assembly(s) 308. For example, as shown in FIG. 8, the interaction chamber 1000 may include a collimator 1010. Those skilled in the art will recognize that other proton beam conditioning assembly(s) 308 may alternatively or additionally be included in the interaction chamber 800. In various embodiments, any beam conditioning assembly(s) 308 may be incorporated into the interaction chamber 1000.

The interaction chamber 1000 may include or interface with a beam line 1012, as described above in connection with the proton beam conditioning component(s) 308. The beam line 1012 may include a conduit maintained at a pressure below atmospheric pressure to facilitate propagation of the proton beam 318. The beamline 812 may include proton beam conditioning components, such as any of the elements mentioned above with respect to the proton beam conditioning component(s) 308. The beamline 812 may also include a vacuum pump, such as any of the pumps described with respect to the vacuum pump(s) 1004, to achieve and/or maintain sub-atmospheric conditions.

The interaction chamber 1000 may include one or more valves 1014. Any suitable valve(s) may be used, and may be located, for example, between various portions of the interaction chamber 1000, or between the interaction chamber 1000 and other components of the system 300 or its surroundings. The valve(s) 1014 can be configured to isolate, for example, the vacuum pump(s) 1004 or the beamline 1012. The valve(s) 1014 can be manual or automatic. For example, the automatic valve may be pneumatic and/or electronic. The valve(s) 1014 can be simple open/close valves (such as two-position gate valves), or the valve(s) 1014 can be configured to be partially open. Valve(s) 1014 associated with vacuum pump(s) 1004 may, for example, comprise one or more butterfly valves that may be continuously variable between an open state and a closed state. The valve(s) 1014 can be configured to maintain pressure, retain or release material, and/or allow access to the interaction chamber 800 to maintain components or replace ion generating targets.

Interaction chamber 1000 can include one or more shutters 1016. The shutter 1016 may be configured to, for example, block or allow the beam of electromagnetic radiation 1016 to enter the chamber 1000. For example, shutter(s) 1016 may be a simple open/close shutter. Shutter(s) 1016 may also be configured to chop electromagnetic radiation beam 316, if desired. Operation of shutter(s) 1016 may be manual or automatic. The automatic operation may occur, for example, in response to one or more signals provided by the control system 314.

The interaction chamber 1000 may include one or more windows 1018. Window 1018 may be constructed of any material suitable for the pressure, temperature, and other environmental factors associated with interaction chamber 1000.

As described above, the interaction chamber 1000 may be configured for in situ formation of an ion generating target. The system 300 may also include a separate or substantially separate preparation chamber (not shown in fig. 6 or 10) connected to the interaction chamber 1000 and configured for target preparation and/or conditioning. The preparation chamber may include various equipment and instruments for preparing ion generating targets, such as equipment that may be found in systems for performing evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. The preparation chamber may also include platform(s) for holding the ion generating target 304 or a target substrate to be used as a template for forming the ion generating target 304. The preparation chamber may further comprise a mechanism for transferring the ion generating target to a location in the interaction chamber after preparation. The interaction chamber 1000 may be similarly equipped, alternatively or in addition to using a separate or substantially separate preparation chamber, such that sample preparation or conditioning may be performed within the interaction chamber 1000 (not shown in fig. 6 or 10).

The preparation chamber may also include temperature control elements (as described above with respect to platform 1002), one or more sample transfer mechanisms, such as a transfer arm or any other transfer device known to those familiar with vacuum systems. The system 300 may also include a load lock between the sample preparation chamber and the interaction chamber 1000.

The interaction chamber 1000 may further comprise heating and/or cooling elements (not shown in fig. 10). One or both of sample preparation and particle beam formation may have temperature requirements, or may achieve optimal performance within a particular temperature range. The interaction chamber may comprise a heating element and/or a cooling element configured to reach and maintain such temperature conditions. The heating and cooling elements may include any of the temperature control devices and/or methods described with respect to the platform(s) 1002 but configured to generally control the temperature conditions of other portions of the interaction chamber 1000 or the interaction chamber 1000.

The interaction chamber 1000 may include one or more detectors 1020. The detector 1020 may be configured to measure a condition associated with the interaction chamber 1000. In some embodiments, the measurements may be made on a single-shot basis. That is, the detector 1020 may be configured to measure a characteristic associated with the individual interaction between the beam of electromagnetic radiation 316 and the ion generating target 304. The detector 1020 may also measure the same or different characteristics on a more continuous basis, e.g., to provide results after processing.

The placement of the detector 1020 may vary based on a number of factors, including space limitations and the optimal location for measurement. As shown in fig. 10, the detector 1020 may be positioned along an outer wall of the interaction chamber 1000 (such as detector 1020a), adjacent to the ion generating target 304 (such as

detectors

1020b and 1020c), or in-line with the proton beam 318 (such as 1020 d).

For some detectors 1020, it may be advantageous to detect at a location adjacent to the ion generating target 304, and thus adjacent to the interaction between the beam of electromagnetic radiation 316 and the ion generating target 304 (laser target interaction). In one embodiment, the system 300 may stabilize over time, after which such proximity may not be necessary. In some embodiments, one or more detectors 1020 may be mounted outside of the interaction chamber 1000. For example, fig. 10 depicts detector 1020e adjacent window 1018 outside of interaction chamber 1000. The detectors 1020 may be arranged such that they are inherently subject to the characteristics intended to be measured, or the conditions within the interaction chamber 1000 may be altered to facilitate the measurement. For example, optical component(s) 1006 may include a turning mirror configured to temporarily or intermittently deflect a signal from the interaction region to a detector, such as through window 1018 to detector 1020 e. The above described detector placement is merely exemplary and many other placements may be apparent to those skilled in the art.

In some embodiments, the one or more detectors 1020 may be configured to measure one or more laser target interaction characteristics of the beam of electromagnetic radiation 316 or the proton beam 318. In some embodiments, detector 1020 may include a quadrupole analyzer, spherical mirror analyzers ("SMAs"), cylindrical mirror analyzers ("CMA"), secondary electron detectors, photomultipliers, scintillators, solid state detectors, time-of-flight detectors, laser target optical diagnostic detectors, X-ray detectors, cameras, faraday cups, or other detectors. Detector 1020 may detect characteristics such as absorption or reflection, secondary electron emission characteristics, plasma characteristics such as electron temperature and/or density, and/or x-ray emission characteristics. Secondary emissions, such as emissions of electrons and/or X-rays, may be indicative of laser target interaction characteristics and/or characteristics of proton beam 318. For example, the energy spectrum and/or flux of electrons and/or X-rays may be indicative of proton beam characteristics. These signals can then be used as inputs in a feedback loop to modify the laser target interaction, for example, by adjusting one or more of the position/orientation of the electromagnetic radiation source 302, optical assembly(s) 306, proton beam adjustment assembly(s) 308, ion generating target 304, as described in more detail below.

The detector 1020 may be configured to detect proton beam direction, spatial spread, intensity, flux, energy, proton energy, and/or energy spread. For example, in some embodiments, a Thompson parabola (Thompson parabola) may be employed. In such embodiments, the proton beam 318 may be directed into a region where the magnetic and electric fields deflect the protons to a location on the detection screen. The position at which the protons contact the screen may indicate the proton energy. For such a screen, any proton sensitive device may be used, such as a CR-39 plate, an image plate, and/or a scintillator (which is coupled to an imaging device, such as a CCD camera). As another example, a proton-sensitive screen (such as CR-39 and an image plate) may be utilized to detect spatial proton beam distribution, or a scintillator with a detection device (such as a camera) may be used.

Detector 1020 may also include a time-of-flight detector. The time-of-flight detector may measure the average proton energy. In some embodiments, the time-of-flight detector may include a proton scintillator and a detector with sufficient time resolution, such as a photomultiplier tube (PMT). The time at which the proton signature is detected on the PMT may be indicative of the proton velocity, and therefore the proton energy.

The detector 1020 may also include an instrument configured for plasma diagnostics, such as an x-ray spectrometer configured for detecting electron temperature and density or an interferometer configured for detecting plasma density. Optical diagnostics may include imaging of reflected laser beams to measure laser absorption efficiency. These detectors may be used during initial system design, calibration and testing, and may be selectively included in the final system.

Referring again to fig. 9, in step 906, interaction of the beam of electromagnetic radiation (e.g., 316) with the ion generating target (e.g., 304) may generate particles including protons. In some embodiments, the surface of the ion generating target 304 may be scanned by a beam of electromagnetic radiation 316. For example, the electromagnetic beam 316 may be sequentially scanned across the surface of the ion generating target 304 by continuous or discontinuous rasterization, step-wise scanning, or any other desired scanning waveform. Alternatively, the electromagnetic beam 316 may be scanned non-sequentially over the surface of the ion generating target 304. Scanning of the beam of electromagnetic radiation may be achieved by manually or automatically adjusting one or more optical components 306 located between the electromagnetic radiation source 302 and the electromagnetic radiation source 302. For example, automatic adjustment of the optical component(s) 306 may be achieved in response to one or more signals provided by the control system 314. The one or more control signals provided by the control system 314 may be predetermined by a program, such as a program stored in the computing system 500, or they may be provided in response to one or more feedback signals received from various elements of the system 300, such as one or more detectors. For example, information from one or more detectors in the system 300 may indicate that it is desired to alter the position of the laser target interaction site. This and other examples of feedback will be discussed in more detail below.

In step 908, the system 300 can form a proton beam 318 from the particles and direct the proton beam 318 to the treatment volume. The protons generated in step 906 may not initially be set in a useful configuration or trajectory. The protons may be formed into a proton beam, for example, by one or more beam conditioning assemblies 308. The characteristics of the proton beam may vary based on the configuration and use of the system 300. In one embodiment, as described above, the proton energy may be about 250MeV, and may range from 60 to 250MeV, for example. The proton flux may be about 2Gy/min and the proton pulse duration may be less than 100psec (picoseconds). The protons generated by the system 300 may also have a symmetric phase-space distribution, allowing for improvements in proton beam steering and filtering on accelerator-based proton generation systems, thereby improving accuracy and efficiency of proton beam delivery and therapy. Of course, the above ranges are merely examples, and the specific energies and fluxes may vary based on the details of the configuration.

In accordance with the present disclosure, feedback can be used to adjust one or more characteristics of the proton beam. As used in this disclosure, feedback may refer to a control protocol in which one or more system outputs are routed back into the system (i.e., fed back into the system) as one or more inputs that are part of a chain of causal relationships. For example, a processor (as described above) may be configured to generate feedback signals to control aspects of the electromagnetic radiation beam, proton beam, and/or laser target interaction. Such feedback signals may be based, for example, on one or more characteristics of the electromagnetic radiation beam, proton beam, and/or laser target interaction. In some embodiments, the feedback signal may alter the proton beam by adjusting at least one of a position or an orientation of the electromagnetic radiation source, the one or more optical components, and/or the electromagnetic radiation beam relative to the ion generation target. In some cases, feedback can be used to determine the structure of the ion generating target.

The feedback signal may be configured to alter an aspect of the beam of electromagnetic radiation. For example, the processor may generate one or more feedback signals configured to adjust the electromagnetic radiation source to alter the temporal profile of the beam of electromagnetic radiation. Further, the electromagnetic radiation source may be configured to generate a main pulse and a pre-pulse of the beam of electromagnetic radiation, and the processor may be configured to cause the electromagnetic radiation source to alter a contrast of the pre-pulse to the main pulse in response to the feedback signal.

Further, the processor may be configured to generate a feedback signal to alter the energy of the beam of electromagnetic radiation or the spatial or temporal distribution of the beam of electromagnetic radiation. For example, one or more optical components may alter a spot size of the beam of electromagnetic radiation in response to the feedback signal. In some embodiments, the motor may alter the relative orientation between the beam of electromagnetic radiation and the ion generating target in response to the feedback signal. And in some embodiments the adaptive mirror may direct the beam of electromagnetic radiation at the ion generating target in response to the feedback signal.

In some embodiments, the feedback may be used to adjust characteristics of the proton beam 318. Fig. 11 depicts a process flow in an exemplary process 1100 for employing such feedback. At step 1102, the system 300 can determine or program a desired value for the laser target interaction characteristic. The laser target interaction characteristics may be based on any characteristics detected by any of the detectors 1020 described above. The desired value may be based, for example, on a nominal value related to a desired mass in the proton beam 318, a value based on a desired characteristic in the treatment plan, an optimal operating state of the system 300, and so forth.

At step 1104, the system 300 can generate one or more feedback signals based on the detected laser target interaction characteristics. The feedback may be received and/or processed by the control system 314. For example, the control system 314 can calculate adjustments to the various components of the system 300 by comparing the laser target interaction characteristic to the desired value for the laser target interaction characteristic established in step 1102. In some embodiments, the adjustment and comparison may be performed according to a feedback control algorithm, such as a PID (proportional integral derivative) control loop. The relationship(s) defined by the feedback signal(s) may be linear (e.g., an increase in pulse duration may inversely affect proton energy

). The feedback signal may be set to zero at times (e.g., during startup or idle periods), to an initial value indicating that no adjustment is required, or to a default value indicating an initial state.

At step 1106, the system 300 may adjust one or more system components based on the feedback signal. For example, in some embodiments, the control system 314 may be configured to adjust a characteristic of the beam of electromagnetic radiation 316 based on the feedback signal. The generated feedback may cause the motor to adjust the path of the beam of electromagnetic radiation 316. The motor may, for example, adjust one or more optical assemblies 306. Such adjustments may, for example, cause the beam of electromagnetic radiation 316 to strike the ion generating target 304 at a more desirable location or locations, thereby altering the characteristics of the proton beam 318 resulting from the beam of electromagnetic radiation 316 striking the ion generating target 304. Such adjustments may also cause the beam of electromagnetic radiation to sequentially impinge multiple adjacent features of the ion generating target 304 such that the features are irradiated at a desired rate. Additionally, the optical assembly(s) 306 may be configured to scan the beam of electromagnetic radiation 316 over the surface of the ion generating target 304. As another example, the ion generating target 304 may be manipulated by a motor based on a feedback signal to move the ion generating target 304 in any one of six degrees of freedom.

In some embodiments, at step 1108, the control system 314 may cause the electromagnetic radiation source 302 to alter the energy, wavelength, or temporal or spatial distribution of the beam of electromagnetic radiation 316 in response to the feedback signal. The control system 314 may also cause the electromagnetic radiation source 302 to alter the contrast of the pre-pulse to the main pulse in response to the feedback signal. Such adjustment of the beam of electromagnetic radiation 316 via the source of electromagnetic radiation 302 may be achieved, for example, by adjusting one or more of the oscillator(s) 602, pump source(s) 604, optics 606, extender(s) 610, amplifier(s) 612, and compressor(s) 614. In some embodiments, any optical element or other component of the electromagnetic radiation source 302 or the optical component(s) 306 may be changed, moved, oriented, or otherwise configured in accordance with the feedback signal, resulting in a number of modifications. The above examples are not intended to be limiting.

At step 1108, the system 300 may direct the beam of electromagnetic radiation 316 to strike the ion generating target 304, e.g., as described above with respect to

steps

902 and 904 of the process 900, as shown in fig. 9.

At step 1110, the system 300 can detect the laser target interaction characteristics. The detected laser target interaction characteristics may include any one or more of the characteristics described above with respect to detector 1020 and/or any characteristics detected with respect to electromagnetic radiation beam 316, proton beam 318, laser target interaction, fault conditions, or any other signal generated by any component of the system.

The laser target interaction characteristics detected at step 1110 can be passed back to step 1104 and process 1100 can be repeated any number of times. For example, the process 1100 may be repeated a regular fixed number of times, a number of times preset by the control system 314, a number of times defined by the treatment plan, or a variable number of times determined in real-time.

In some embodiments, it may be desirable to select protons of a particular energy and/or flux. For example, as described above with respect to the advantages of proton therapy, it may be desirable to treat a treatment volume at a particular depth within a patient. The treatment depth may be specified by selectively emitting protons at a particular energy level or range of energy levels. The radiation dose delivered to the treatment volume depends in part on the proton beam flux. Thus, the proton flux and proton energy produced by the system 300 may need to be adjusted.

According to the present disclosure, a system for directing a pulsed beam of charged particles may include an ion source. As used in this disclosure, an ion source may refer to any structure or device configured to generate a continuous or pulsed ion beam. A pulsed ion beam may refer to any group of ions that includes at least one bunching of ions (e.g., cluster of ions). In some embodiments, the ion source may comprise at least a radiation beam and an ion generating target as described above; however, this example is not limiting. For example, a system for directing a pulsed beam of charged particles consistent with the present disclosure may be used with any charged particle beam generated by any method or apparatus, including, for example, a cyclotron, synchrotron, or other particle accelerator.

Further, according to the present disclosure, a system for directing a pulsed beam of charged particles may comprise at least one electromagnet. As used herein, an electromagnet may refer to any device that is controllable to generate an electromagnetic field. In some embodiments, the at least one electromagnet may comprise a plurality of electromagnets in series along the trajectory of the pulsed ion beam.

Further, consistent with the present disclosure, a system for directing a pulsed beam of charged particles may include at least one region proximate to an electromagnet. As used in this disclosure, an area proximate to an electromagnet may refer to any location where an electromagnetic field generated by the electromagnet is capable of altering the trajectories of charged particles located within the area. For example, the region proximate to the electromagnet may include any location oriented such that the ion beam may pass therethrough. In some embodiments, the region may include a location within an electromagnetic field created by activation of an electromagnet. The size of the region may vary due to a number of factors; however, in some embodiments, the region may have a size of less than about one inch.

According to the present disclosure, a system for directing a pulsed beam of charged particles may include at least one automatic switch. As used in this disclosure, an automatic switch may refer to a device configured to be electrically connected to an electromagnet and configured to selectively activate or deactivate at least one electromagnet when triggered by a signal. The automatic switch may be any switch that may be selectively activated or deactivated. For example, the automatic switch may include a photoconductive semiconductor switch or a spark switch. In some embodiments, the at least one recloser switch may comprise a plurality of reclosers. Each automatic switch may be associated with a different electromagnet or the same electromagnet. In some embodiments, the first electromagnet may be configured to divert a portion of the pulsed ion beam from an original trajectory to a diverted trajectory. Some embodiments may further include a second electromagnet in series with the first electromagnet and configured to re-steer at least a portion of the steered pulsed ion beam from the steered trajectory to a path substantially parallel to the original trajectory.

According to the present disclosure, a system for directing a pulsed beam of charged particles may include a radiation trigger source. As used in this disclosure, a radiation activation source may include any structure capable of generating a radiation activation to activate or deactivate at least one automatic switch. For example, the radiation trigger source may include one or more of an ion source, an x-ray source, an electron source, and a light source (e.g., a laser). In some embodiments, a radiation trigger fabricated by a radiation trigger source may be configured to activate or deactivate an automatic switch and irradiate an ion generation target, thereby generating a pulsed ion beam.

According to the present disclosure, the at least one processor may be configured to activate the at least one electromagnet when the ion bunches across a region adjacent to the electromagnet. The at least one processor may include any of the processors described above, and may be configured to sequentially activate the plurality of automatic switches as the ion bunches pass through the series of electromagnets.

According to the present disclosure, a controlled delay line may be provided. As used in this disclosure, a controlled delay line may refer to a path configured to extend the time for a radiation beam or charged particle beam to pass through it. For example, a controlled delay line may be used to delay the time at which ion bunches pass through a region adjacent to an electromagnet. As another example, a controlled delay line may be used to delay the time at which the radiation beam activates the automatic switch. In some embodiments, the controlled delay line may be configured to synchronize the time at which the beam of radiation activates the automatic switching of the electromagnet with the time at which the pulsed ion beam traverses the region proximate the electromagnet.

Fig. 12 is an exemplary plot of a proton energy distribution of an ion beam, such as a proton beam within proton beam 318. The pulses (i.e., "bunching") 1202 shown in fig. 12 can be generated as described above with respect to the system 300 and the ion generating target 304. However, the use of the ion generating target 304 is merely an example and is not intended to be limiting. Other ion sources and ion types may also be used.

In the context of proton therapy, protons of a certain energy may be required in order to irradiate a treatment volume located at a specific depth within a patient. To isolate protons of a desired energy, the system 300 may filter the proton beam 318 to deliver protons of a desired energy to the patient, eliminating protons of other energies from the proton beam. For example, to deliver protons 1204 having an energy between energy 1206 and energy 1208, the system 300 may filter the proton beam 1202 by removing any protons having energies less than the energy 1206 and greater than the energy 1208.

Such filtering can be achieved by combining certain proton beam conditioning components 308. For example, the proton beam adjustment assembly 308 may manipulate the proton beam 318 such that protons having certain energies are steered along a different trajectory than protons having other energies. This can be achieved in a number of ways. For example, the proton beam tuning assembly 308 may be configured as a band pass filter to isolate protons having energies between energy 1206 and energy 1208. In another embodiment, the proton beam adjustment assembly 308 may be configured as a high pass filter to isolate protons having energies above an energy cutoff (such as energy 1206 or 1208). In another embodiment, the proton beam adjustment assembly 308 may be configured as a low pass filter to isolate protons having energies below an energy cut-off (such as energies 1206 or 1208).

The above embodiments may be combined and more than one filter may be used. For example, a low pass filter and a high pass filter may be combined in series to create a band pass filter. In such an embodiment, the low pass filter may be configured to isolate protons having an energy less than energy 1208, while the high pass filter may be configured to isolate protons having an energy greater than energy 1206. This may be particularly advantageous for selecting protons within a narrow energy band, in particular a narrower energy band than can be accommodated by a separate band-pass filter.

To achieve proton energy filtering, one or more proton beam conditioning components 308 can be selectively activated and/or controlled by one or more automatic switches, such as spark switches or photoconductive switches. The selective activation may be managed by a controller 314, which controller 314 may have an interface with an automatic switch and proton beam conditioning assembly 308. The automatic switch may be activated or deactivated by a signal generated by the controller 314. The signal may be generated based on feedback, such as any form of feedback described above.

Additionally or alternatively, in some embodiments, the automatic switch may be configured to be activated or deactivated by electromagnetic radiation (such as a laser or another light source). For example, the automatic switch may comprise a photoconductive semiconductor switch disposed along the path of the beam of electromagnetic radiation 316. Alternatively, the beam of electromagnetic radiation 316 may be diverted by one or more optical assemblies 306 or split by the optical assembly 306 into a plurality of beams, one or more of which are delivered to an automatic switch. In such embodiments, the automatic switch may be activated or deactivated when the beam of electromagnetic radiation 316 strikes the automatic switch. Accordingly, the beam of electromagnetic radiation may be configured to activate the automatic switch and illuminate the ion generating target 304 to generate a proton beam 318.

In other embodiments, the switched electromagnetic radiation source may not be associated with the electromagnetic radiation source 302 or the electromagnetic radiation beam 316. For example, the control system 314 may cause a separate switching electromagnetic radiation source to illuminate one or more photoconductive semiconductor switches or spark switches, thereby activating or deactivating the proton beam conditioning assembly 308 of the proton energy filter(s).

The timing associated with activating the automatic switch in the proton energy filter may be affected, at least in part, by a time-of-flight control unit, such as a controlled delay line configured to adjust the time at which the radiation beam activates the automatic switch. For example, the controlled delay line may be configured to synchronize the timing of the automatic switch with the beam of radiation. Additionally or alternatively, the timing associated with activating an automatic switch in the proton energy filter may be controlled by the control system 314, for example, in response to user commands, feedback signals from the system 300, or according to a predetermined program.

Although the above discussion contemplates the use of filtering protons in a proton therapy system, one of ordinary skill in the art will appreciate that these filtering systems and methods have broad applicability. For example, the methods and systems described in the context of filtering protons may also be used to filter any of a variety of other charged particles used in any of a variety of other systems and applications.

Fig. 13 depicts an example of a configuration of a proton beam conditioning assembly 308 configured to implement proton energy selection as described above. Such a configuration may include one or more proton

beam conditioning assemblies

1302 and 1306, and a beam collector 1304.

In some embodiments,

beam conditioning assemblies

1302 and 1306 may include a plurality of electromagnets arranged in series along the trajectory of proton beam 318. Multiple reclosers may be associated with one or more different magnets or sets of magnets. The control system 314 may be configured to activate such multiple switches in various combinations to manipulate the proton beam 318. For example, the control system 314 may sequentially activate an automatic switch as the proton beam passes through the magnets of the plurality of electromagnets. In one embodiment, the beam adjustment assembly 1302 may be configured to steer a portion of the proton beam 318 from an original trajectory to a steered trajectory. The beam adjustment assembly 1302 may be configured to re-steer at least a portion of the steered pulsed ion beam from the steered trajectory to a path that is substantially parallel to the original trajectory.

As shown in fig. 13, the proton beam 318 may pass through an area adjacent to the proton beam modulation assembly 1302. The area may be of any size, but in some embodiments it may have dimensions less than one inch. An area adjacent to the proton beam modulation assembly 1302 can be configured and/or oriented to pass the proton beam 318 (e.g., a continuous beam or a pulsed beam including pulses such as pulse 1202) therethrough. The proton beam conditioning assembly 1302 may include any proton beam conditioning assembly 308, for example, an electromagnet such as a dipole, a CMA, an SMA, or a time-of-flight analyzer. As the proton beam traverses an area adjacent to the proton beam conditioning assembly 1302, the automatic switch may activate the proton beam conditioning assembly 1302 such that protons of a desired energy are diverted along trajectory 1310 toward the beam conditioning assembly 1306, as shown in fig. 13A. When protons having energy to be filtered from the proton beam 318 pass through an area adjacent to the proton beam tuning assembly 1302, the automatic switch may not be activated, or an alternative switch may be activated, and the protons may travel along a trajectory 1308 toward the beam collector 1304, as shown in fig. 13B. Protons of a desired energy may pass through the beam conditioning assembly 1306 where they are redirected back along the beam line trajectory 1312 and ultimately toward the treatment volume at the beam conditioning assembly 1306.

In some embodiments (not shown), the proton energy filter may include only a single beam conditioning assembly and beam dump. Instead of diverting protons of desired energy towards the second electromagnetic element, protons of desired energy may be allowed to pass through an area adjacent to the proton beam modulation assembly without being diverted. As the protons having energy to be filtered out of the proton beam pass through the region adjacent to the proton beam conditioning assembly, these protons may be diverted along a trajectory toward the beam collector.

In some embodiments, the proton energy filter may include an energy attenuator. For example, an energy attenuator may be used as part of the beam dump 1304. Additionally, an energy attenuator may be used to reduce the energy and/or flux of protons that are not diverted to the beam dump. To filter the proton beam using an energy attenuator, the protons may be diverted through the attenuator where they interact with the attenuator. Then, the protons transmitted through the attenuator along the trajectory of the proton beam have a reduced energy, thereby reducing the proton beam energy. Other protons may be absorbed by the energy attenuator or diverted from the trajectory of the proton beam without forming part of the transmitted proton beam and thereby reducing the transmitted proton beam flux. The energy attenuator may comprise, for example, carbon, plastic, beryllium, a metal such as copper or lead, or any material effective to reduce proton beam energy or flux. The energy attenuator may also be comprised of any shape effective to reduce the energy or flux of the proton beam, including a wedge, a double wedge separated by a gap (which may be filled with air or other material), a cylinder, a rectangle, or any other material or configuration capable of degrading the beam.

Those of ordinary skill in the art will recognize that the proton beam filter configurations described above are merely illustrative, and that other configurations are considered consistent embodiments described herein.

In accordance with the present disclosure, a system for treating a treatment volume with protons may include a proton source. As used in this disclosure, a proton source may refer to any material, system, or subsystem having a releasable proton or capable of releasing a proton. The proton source may be configured to provide a proton beam having a plurality of proton energies within a proton energy divergence.

Further in accordance with the present disclosure, a system for treating a treatment volume with protons may include at least one processor configured to control relative motion between a proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system. The at least one processor may, for example, comprise any of the processors described above. In some embodiments, the processor may be configured to control the proton energy divergence to adjust the depth of the treatment volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions. For example, a third dimension of the three-dimensional coordinate system may refer to the approximate direction of the proton beam trajectory, while the other two dimensions refer to planes orthogonal to the third dimension.

Controlling the relative motion between the proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system can be accomplished in a variety of ways. Controlling the relative motion between the proton beam and the treatment volume can be accomplished, for example, by rotating the gantry. Alternatively or additionally, controlling the relative motion between the proton beam and the treatment volume may be accomplished by guiding the proton beam with an electromagnet and/or moving the patient support platform.

Likewise, controlling energy divergence and distribution or protons may be accomplished in a variety of ways. According to the present disclosure, controlling the energy spread may be achieved, for example, via one or more of a magnetic analyzer, a time-of-flight control unit, and an energy attenuator.

The system 300 may be configured to alter one or more properties of the proton beam 318 while other characteristics remain substantially fixed. In some embodiments, such changes may be accomplished via feedback, such as described above with respect to process 1100. For example, the control system 314 may keep the flux of the proton beam 318 substantially constant while independently adjusting the energy of the proton beam 318, or keep the energy of the proton beam 318 substantially constant while independently adjusting its flux. Such independent adjustment may not be feasible in an accelerator-based system due to the large size and slow response time of the system. However, by coupling feedback (as described above) to adjustable components of the system 300 (also as described above) to reconfigure the characteristics of the electromagnetic radiation beam 316 and laser target interaction, the systems and methods disclosed herein can achieve independent energy and flux control, thereby independently adjusting the energy and flux of the proton beam 318. Thus, accurate therapy can be delivered more quickly than conventional systems, thereby reducing the time a patient spends on therapy and increasing the patient's turnover. In addition, treatment can be provided more accurately and with less damage to healthy tissue. By coupling feedback (as described above) to adjustable components of the system 300 (also described above) to reconfigure the characteristics of the electromagnetic radiation beam 316 and laser target interaction, the systems and methods disclosed herein can alternatively achieve synchronized energy and flux control, thereby synchronously adjusting the energy and flux of the proton beam 318.

In one embodiment, the energy and flux of proton beam 318 may be adjusted based on the intensity of electromagnetic radiation beam 316, the position of the electromagnetic radiation beam on ion generation target 304, the temporal distribution of electromagnetic radiation beam 316, the spatial distribution of radiation beam 316, the settings and selection of proton beam adjustment assembly(s) 308. As one example, the energy of proton beam 318 may be proportional to the intensity of electromagnetic radiation beam 316, and the flux of proton beam 318 may be proportional to the energy of electromagnetic radiation beam 316. This can be represented by the following relation:

and

wherein, I_LIs the intensity of the beam of electromagnetic radiation 316, E_LIs the intensity of the beam of electromagnetic radiation 316, A represents the spatial distribution (e.g., spot size) of the beam of electromagnetic radiation 316, Δ τ represents the temporal distribution (e.g., pulse duration) of the beam of electromagnetic radiation 316, E_pIs the energy of the proton beam 318, and

is the flux of the proton beam 318. Thus, by appropriately adjusting one or more of the energy, spatial distribution, and temporal distribution of the beam of electromagnetic radiation 316, the energy of the proton beam 318 may be kept substantially constant while the flux of the proton beam 318 varies, and vice versa. For example, to alter the proton energy without altering the proton flux of the proton beam 318, the energy of the electromagnetic radiation beam 316 may be held constant at about 1MeV while changing the pulse duration and/or spot size at the ion generating target 304.

Alternatively or additionally, the energy and flux of the proton beam 318 may be independently varied, for example, by appropriately selecting or adjusting the proton beam adjustment assembly(s) 308. This may be accomplished, for example, by using one of the filtration systems and methods described above with respect to fig. 13 or by using one or more energy attenuators.

When independently adjusting the flux of the proton beam 318, the available variation in energy of the proton beam 318 may be as large as ± 25% or more where the proton beam 318 is initially formed, while the system 300 is able to reduce this fluctuation to approximately ± 5% or less further down the beam line. Similarly, when independently adjusting the energy of the proton beam 318, the available variation in flux of the proton beam 318 may be as large as ± 25% or more where the proton beam 318 is initially formed, while the system 300 is able to reduce this fluctuation to approximately ± 5% or less further down the beamline.

As an alternative to independently adjusting the energy and flux of the proton beam 318, the energy and flux of the proton beam 318 may be varied simultaneously, for example, by appropriately selecting or adjusting the proton beam adjustment assembly(s) 308. This may be accomplished, for example, by using one of the filtration systems and methods described above with respect to fig. 13 or by using one or more energy attenuators.

Because process variables may fluctuate during operation, the independent variance of energy and flux of the proton beam 318 significantly benefits from the feedback adjustments described above with reference to fig. 11. For example, when the detected laser target interaction characteristic changes, the control system 314 may automatically adjust the system 300 accordingly at step 1104 via the feedback signal determined in step 1110 in step 1108 during operation.

During system therapy for a treatment volume, the system 300 may be configured to employ such changes in one or more characteristics of the proton beam 318 while keeping other characteristics of the proton beam 318 fixed. Fig. 14 depicts an example of a process 1400 for such system treatment. At step 1402, the control system 314 can position the proton beam (e.g., beam 318) relative to the treatment volume in two dimensions of a three-dimensional coordinate system. For example, the third dimension may be defined by the trajectory of the proton beam as it exits the gantry (e.g., gantry 310), and the two dimensions of the three-dimensional coordinate system may be defined by planes orthogonal to the trajectory of the proton beam 318 as it exits the gantry 310. Relative motion between the proton beam 318 and the treatment volume in two dimensions can be controlled by one or more components of the system 300. For example, the relative motion may be controlled by any combination of one or more motors and/or magnets associated with the gantry 310 and/or one or more motors associated with the patient support platform 312. More specifically, the control system 314 may be configured to control the relative motion between the proton beam 318 and the treatment volume by controlling one or more of: rotation of the gantry 310, adjustment of the scanning magnet 710, and repositioning of the patient support platform 312.

In step 1404, a control system (e.g., system 314) can be configured to control relative motion between the proton beam and the treatment volume in three dimensions of a three-dimensional coordinate system. The control system 314 may be configured to control such relative motion in a third dimension while maintaining substantially fixed coordinates in the other two dimensions. For example, the control system 314 may control the proton energy to adjust the depth of treatment while fixing the position of the proton beam 318 in the other two dimensions. Controlling proton energy at step 1404 may be accomplished via one or more of the techniques described above (with or without reference to the specific structures described above). For example, at least one of the energy, temporal distribution, and spatial distribution of the beam of electromagnetic radiation 316 may be adjusted according to equation 1 above, proton energy selection as in fig. 12 and 13 may be used, and/or one or more of a magnetic analyzer, a time-of-flight control unit, and an energy attenuator may be used.

An example of step 1404 is shown in fig. 15A, 15B, and 15C, which depict the proton beam 318 penetrating the skin 1502 of a patient 1504 to provide therapy to a therapy volume 1506. Fig. 15A, 15B, and 15C may represent a series of treatment positions consistent with the disclosed embodiments. The system 300 can be configured to treat a region 1508 that is a greater distance in the third dimension (i.e., away from the skin 1502 of the patient 1504) as shown in fig. 15A, before treating the region 1510 by reducing the energy of the proton beam 318 as shown in fig. 15B, and then treating the region 1512 as shown in fig. 15C by further reducing the energy of the proton beam 318. Alternatively, the order may be reversed, processing region 1512 of fig. 15C, then increasing the energy of proton beam 318 to process region 1510 of fig. 15B, then further increasing the energy of proton beam 318 to process region 1508 of fig. 15A.

Additional treatment locations may be included at step 1404 before, after, or within the

regions

1508, 1510, and 1512 shown in fig. 15A, 15B, and 15C. The control system 314 may also be configured to optimize the treatment to account for the effects of a particular sequence. For example, protons that pass through the treatment volume 1506 that are intended to treat the region 1508 (i.e., as shown in fig. 15A) may provide some incidental treatment to the

regions

1510 and 1512 before reaching 1508. The control system 314 can account for the incidental dose administered to the

regions

1510 and 1512 by adjusting the dose in the patient's treatment plan accordingly. For example, the control system 314 may be configured to integrate all of the incidental doses to be delivered to the

regions

1510 and 1512 while directly treating other regions (such as region 1508), and subtract those incidental doses from the direct doses appropriate for treating the

regions

1510 and 1512. Thus, more accurate treatment can be achieved.

At step 1406, the control system (e.g., control system 314) may determine whether another location requires treatment or whether the treatment is complete. If the treatment is complete (step 1006; yes), process 1400 may end. If the treatment is not complete (step 1006; no), the process 1000 can return to step 1002, reposition the proton beam 318 relative to the two dimensions, as shown in figure 15D, and repeat the process of scanning depth in the third dimension by varying the energy of the proton beam 318.

Although illustrative embodiments have been described herein, the scope thereof includes any and all embodiments having equivalent elements, modifications, omissions, combinations (e.g., of aspects across various embodiments), adaptations and/or alterations as would be appreciated by those in the art based on the present disclosure. For example, the number and orientation of components shown in the exemplary system may be modified. Further, with respect to the exemplary methods illustrated in the figures, the order and sequence of steps may be modified, and steps may be added or deleted.

Aspects of the invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation; one or more optical assemblies configured to direct a beam of electromagnetic radiation at an ion generation target, thereby causing a resultant proton beam; a detector configured to measure at least one laser target interaction characteristic; and at least one processor configured to generate a feedback signal based on the at least one laser target interaction characteristic measured by the detector and modify the proton beam by adjusting at least one of: a source of electromagnetic radiation, one or more optical components, and at least one of a relative position and orientation of the beam of electromagnetic radiation to the ion generating target.

The laser target interaction characteristics may include proton beam characteristics, e.g., proton beam energy, proton beam flux, and the characteristics may include secondary electron emission characteristics. As another example, the laser target interaction characteristics may include x-ray emission characteristics.

The electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam and thereby cause a pulsed proton beam.

The interaction chamber may comprise a target table for supporting an ion generating target, and the processor may be further configured to cause relative motion between the target table and the beam of electromagnetic radiation.

The structure of the ion generating target may be determined based at least in part on a generated feedback signal generated from the measured laser target interaction characteristic.

The electromagnetic radiation source may be configured to alter a temporal distribution of the beam of electromagnetic radiation in response to the feedback signal, and/or may further be configured to generate a main pulse and a pre-pulse. The at least one processor may be configured to cause the electromagnetic radiation source to alter a contrast of the pre-pulse to the main pulse in response to the feedback signal.

In response to the feedback signal, the at least one processor may be configured to cause the electromagnetic radiation source to alter the energy of the one or more beams of electromagnetic radiation, or the spot size of the beams of electromagnetic radiation.

The at least one processor may be configured to cause the one or more optical assemblies to alter a spot size of the beam of electromagnetic radiation in response to the feedback signal, and/or to cause the motor to alter a relative orientation between the beam of electromagnetic radiation and the ion generating target in response to the feedback signal.

Aspects of the invention may also include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation; an adaptive mirror configured to direct a beam of electromagnetic radiation at an ion generation target in an interaction chamber, thereby generating a proton beam; and at least one processor configured to control the adaptive mirror so as to adjust at least one of: a spatial distribution of the beam of electromagnetic radiation, and at least one of a relative position and orientation between the beam of electromagnetic radiation and the ion generating target.

The adaptive mirror may be configured to direct the beam of electromagnetic radiation by at least one of: adjusting a focus of a beam of electromagnetic radiation, steering the beam of electromagnetic radiation, and scanning the beam of electromagnetic radiation. The adaptive mirror may also be configured to grating the beam of electromagnetic radiation on the ion generating target. The adaptive mirror may comprise a plurality of facets, each facet of the plurality of facets being independently controllable by digital logic circuitry. The adaptive mirror may include a laser pulse focused on an anti-reflective coating substrate, one or both of the laser pulse and the anti-reflective coating substrate being controllable by digital logic circuitry.

The at least one processor may be configured to cause the adaptive mirror to direct the beam of electromagnetic radiation at the ion generating target in response to the feedback signal, and/or to cause the adaptive mirror to direct the beam of electromagnetic radiation at a predetermined location on a surface of the ion generating target. The surface of the ion generating target may comprise a patterned array, and/or a plurality of ion generating structures oriented substantially along a common axis. Alternatively or additionally, the surface of the ion generating target may include one or more knife edges.

Aspects of the invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation; one or more optical assemblies configured to direct a beam of electromagnetic radiation at an ion generation target, thereby causing a resultant proton beam; a detector configured to measure at least one laser target interaction characteristic; and one or more processors configured to generate a feedback signal based on the at least one laser target interaction characteristic measured by the detector and to alter the proton beam by adjusting at least one of: a source of electromagnetic radiation, one or more optical components, and at least one of a relative position and orientation of the beam of electromagnetic radiation to the ion generating target.

The laser target interaction characteristics may include proton beam characteristics, e.g., proton beam energy and/or proton beam flux, which may include secondary electron emission characteristics. As another example, the laser target interaction characteristics may include x-ray emission characteristics.

The laser target interaction characteristics may include proton beam energy and/or proton beam flux.

In response to the feedback signal, the at least one processor may be configured to cause the electromagnetic radiation source to alter an energy of the beam of electromagnetic radiation, a temporal distribution of the beam of electromagnetic radiation, and/or a spatial distribution of the beam of electromagnetic radiation (e.g., a spot size of the beam of electromagnetic radiation).

The at least one processor may be configured to cause the motor to alter a relative orientation between the beam of electromagnetic radiation and the ion generating target in response to the feedback signal.

Aspects of the invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target at a target location; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation along the trajectory, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution; one or more optical assemblies positioned along a trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical assemblies configured to cooperate with the beam of electromagnetic radiation to cause the beam of electromagnetic radiation to illuminate the ion generating target, thereby facilitating formation of a proton beam having energy and flux; and at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optical components, thereby altering at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation, so as to adjust at least one of: a proton beam flux while keeping a proton beam energy substantially constant; and proton beam energy while keeping the proton beam flux substantially constant.

Further, aspects of the invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target at a target location; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation along the trajectory, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution; one or more optical assemblies positioned along a trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical assemblies configured to cooperate with the beam of electromagnetic radiation to cause the beam of electromagnetic radiation to illuminate the ion generating target, thereby facilitating formation of a proton beam having energy and flux; and at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optical components, thereby altering at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation, so as to adjust at least one of: proton beam flux at varying proton beam energies; and proton beam energy at varying proton beam fluxes.

The at least one processor may be configured to alter the spatial distribution of the beam of electromagnetic radiation by altering a spot size of the beam of electromagnetic radiation.

The at least one processor may be configured to alter the temporal distribution of the beam of electromagnetic radiation by altering a chirp of the beam of electromagnetic radiation.

The at least one processor may be configured to alter the temporal distribution of the beam of electromagnetic radiation by altering the timing of the one or more pump sources.

The beam of electromagnetic radiation may be unpolarized.

The at least one processor may be configured to cause the electromagnetic radiation source to alter the energy of the beam of electromagnetic radiation and the temporal distribution of the beam of electromagnetic radiation. The at least one processor may be further configured to cause the electromagnetic radiation source to alter an energy of the beam of electromagnetic radiation and a spatial distribution of the beam of electromagnetic radiation. The at least one processor may be further configured to cause the electromagnetic radiation source to alter an energy of the beam of electromagnetic radiation and cause the one or more optical components to alter a spatial distribution of the beam of electromagnetic radiation. The at least one processor may be further configured to cause the one or more optical components to alter the energy of the beam of electromagnetic radiation and the spatial distribution of the beam of electromagnetic radiation.

Aspects of the invention may include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generating target provided with a plurality of patterned features; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation to illuminate the plurality of patterned features; and at least one processor configured to cause a beam of electromagnetic radiation to impinge each patterned feature of the plurality of patterned features and thereby generate a resultant proton beam.

Aspects of the invention may also include a system for generating a proton beam, the system comprising: an interaction chamber configured to support an ion generation target patterned with at least one knife edge; an electromagnetic radiation source configured to provide a beam of electromagnetic radiation to illuminate at least one knife edge of an ion generating target; and at least one processor configured to impinge a beam of electromagnetic radiation on the at least one knife edge and thereby generate a resultant proton beam.

The electromagnetic radiation source may be configured to provide a laser beam having a wavelength, and at least one of the plurality of patterned features may have a dimension that is less than the wavelength of the laser beam. Similarly, the knife edge may have a dimension less than the wavelength of the laser beam. The plurality of patterned features can include protrusions extending away from a surface of the ion generating target.

The at least one processor may be configured to rasterize the ion generating target. Further, the at least one processor may be configured to scan the beam of electromagnetic radiation continuously or discontinuously over the surface of the ion generating target, e.g., by controlling the motor and/or the adaptive mirror. The surface of the ion generating target may include, for example, a plurality of patterned features and/or one or more knife edges, and may include, for example, ice, silicon, carbon, plastic, or steel. The at least one processor may be configured to cause the motor and/or the adaptive mirror to condition the beam of electromagnetic radiation to sequentially or simultaneously impinge individual patterned features of the plurality of patterned features, or to impinge the knife edge. Further, the at least one processor may be configured to cause a sequential scan of the beam of electromagnetic radiation over adjacent patterned features of the plurality of patterned features.

Aspects of the invention may include a system for generating a proton beam, the system comprising: an ion source configured to generate a pulsed ion beam comprising at least one ion bunch; at least one electromagnet; a region adjacent the electromagnet, the region oriented to pass the pulsed beam therethrough; at least one automatic switch electrically connected to the at least one electromagnet for selectively activating the at least one electromagnet; a radiation trigger source configured to activate at least one automatic switch; and at least one processor configured to activate the at least one electromagnet when the ions bunch across the region.

The radiation triggering source may include one or more of ions, X-rays, electrons, and laser radiation.

The electromagnet may be configured to generate an electromagnetic field, and the region may be oriented within the electromagnetic field when the electromagnet is activated. The region may have a size of less than about one inch.

The ion source may include a radiation trigger source and an ion generating target, and the radiation trigger source may be configured to activate an automatic switch and illuminate the ion generating target, thereby generating a pulsed ion beam.

The time at which the radiation trigger source activates the automatic switch may be adjusted by a controlled delay line. The controlled delay line may, for example, be configured to adjust the timing of the radiation trigger source activating the automatic switch in synchronization with the pulsed ion beam.

The automatic switch may comprise a photoconductive semiconductor switch or a spark switch.

The at least one electromagnet may comprise a plurality of electromagnets in series along a trajectory of the pulsed ion beam, and the at least one recloser may comprise a plurality of reclosers, each of the plurality of reclosers associated with a different electromagnet of the plurality of electromagnets. The at least one processor may be configured to sequentially activate the plurality of automatic switches as the ion bunches pass through each electromagnet.

A first electromagnet of the one or more series-connected electromagnets may be configured to divert a portion of the pulsed ion beam from an original trajectory to a diverted trajectory, and a second electromagnet of the one or more series-connected electromagnets may be configured to re-divert at least a portion of the diverted portion of the pulsed ion beam from the diverted trajectory to a path substantially parallel to the original trajectory.

Aspects of the invention may include a system for generating a proton beam, the system comprising: a proton source configured to provide a proton beam having a plurality of proton energies within a proton energy spread; and at least one processor configured to: controlling relative motion between the proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system; and controlling the proton energy divergence to adjust the depth of the treatment volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions.

The at least one processor may be configured to control relative motion between the proton beam and the treatment volume by, for example, rotating the gantry, guiding the proton beam with electromagnets, and/or moving the patient support platform.

A system for treating a treatment volume with protons may be configured to control proton energy spread and proton energy distribution using at least one of a magnetic analyzer, a time-of-flight control unit, and an energy attenuator.

The specification and claims may refer to an element in the singular, such as a "processor" or a "detector". It should be understood that the syntax is intended to contain a plurality of such elements. That is, certain functions may be divided among multiple processors located on the same board or system, or remotely located on multiple processors on another board or another system. It should be understood that reference to a processor will be interpreted as "at least one processor," meaning that the recited functionality may occur across multiple processors and still be considered within the scope of the disclosure and claims. The same is true for detectors and other elements described or referenced in the singular throughout the specification and claims.

Furthermore, the foregoing description has been presented for purposes of illustration. It is not intended to be exhaustive or to limit the precise form or embodiment disclosed. Modifications and adaptations will be apparent to those skilled in the art in view of the specification and practice of the disclosed embodiments. For example, where the generation of protons is described above with respect to a laser striking an ion generating target, other proton generation processes, such as radio frequency coupling, may be used. Furthermore, although some of the above description relates to the use of protons in medicine as radiotherapy, the systems and methods described herein may be used in other applications of proton beams and in applications involving other ions besides protons.

The claims are to be interpreted broadly based on the language employed in the claims and not limited to examples described in the specification, which examples are to be construed as non-exclusive. Further, the steps of the disclosed methods may be modified in any manner, including by reordering steps and/or inserting or deleting steps.

Claims

1. A system for generating a proton beam, the system comprising:

an interaction chamber configured to support an ion generating target;

an electromagnetic radiation source configured to provide a beam of electromagnetic radiation;

one or more optical assemblies configured to direct the beam of electromagnetic radiation at the ion generation target, thereby causing a resultant proton beam;

a detector configured to measure at least one laser target interaction characteristic; and

at least one processor configured to generate a feedback signal based on the at least one laser target interaction characteristic measured by the detector and alter the proton beam by adjusting at least one of: the electromagnetic radiation source, the one or more optical components, and at least one of a relative position and orientation of the beam of electromagnetic radiation to the ion generation target.

2. The system for generating a proton beam of claim 1, wherein the laser target interaction characteristics comprise proton beam characteristics.

3. The system for generating a proton beam of claim 1, wherein the laser target interaction characteristic comprises a secondary electron emission characteristic.

4. The system for generating a proton beam of claim 1, wherein the laser target interaction characteristic comprises an x-ray emission characteristic.

5. The system for generating a proton beam of claim 1, wherein at least one of the electromagnetic radiation source and the at least one processor is configured to provide a pulsed electromagnetic radiation beam and thereby cause a pulsed proton beam.

6. The system for generating a proton beam of claim 1, wherein the interaction chamber comprises a target table for supporting the ion-generating target, and the at least one processor is further configured to cause relative motion between the target table and the beam of electromagnetic radiation.

7. The system for generating a proton beam of claim 1, wherein a structure of the ion generating target can be determined based at least in part on a resulting feedback signal generated from a measured laser target interaction characteristic.

8. The system for generating a proton beam of claim 2, wherein the at least one laser target interaction characteristic comprises a proton beam energy.

9. The system for generating a proton beam of claim 2, wherein the at least one laser target interaction characteristic comprises proton beam flux.

10. The system for generating a proton beam of claim 1, wherein the electromagnetic radiation source is configured to alter a temporal profile of the electromagnetic radiation beam in response to the feedback signal.

11. The system for generating a proton beam of claim 1, wherein the electromagnetic radiation source is configured to generate a main pulse and a pre-pulse, and the at least one processor is configured to cause the electromagnetic radiation source to alter a pre-pulse to main pulse contrast in response to the feedback signal.

12. The system for generating a proton beam of claim 1, wherein the at least one processor is configured to cause the electromagnetic radiation source to alter an energy of the electromagnetic radiation beam in response to the feedback signal.

13. The system for generating a proton beam of claim 1, wherein the at least one processor is configured to cause the electromagnetic radiation source to alter a spatial distribution of the beam of electromagnetic radiation in response to the feedback signal.

14. The system for generating a proton beam of claim 1, wherein the at least one processor is configured to cause the one or more optical assemblies to alter a spot size of the beam of electromagnetic radiation in response to the feedback signal.

15. The system for generating a proton beam of claim 1, wherein the at least one processor is configured to cause a motor to alter a relative orientation between the beam of electromagnetic radiation and the ion generating target in response to the feedback signal.

16. A system for generating a proton beam, the system comprising:

an interaction chamber configured to support an ion generating target;

an adaptive mirror configured to direct the beam of electromagnetic radiation at the ion generation target in the interaction chamber, thereby generating a proton beam; and

at least one processor configured to control the adaptive mirror to adjust at least one of: a spatial distribution of the beam of electromagnetic radiation, and at least one of a relative position and orientation between the beam of electromagnetic radiation and the ion generating target.

17. The system for generating a proton beam of claim 16, wherein the adaptive mirror is configured to direct the beam of electromagnetic radiation by at least one of: adjusting a focus of the beam of electromagnetic radiation, steering the beam of electromagnetic radiation, and scanning the beam of electromagnetic radiation.

18. The system for generating a proton beam of claim 16, wherein the adaptive mirror is configured to rasterize the beam of electromagnetic radiation on the ion-generating target.

19. The system for generating a proton beam of claim 16, wherein the adaptive mirror comprises a plurality of facets, each of which is independently controllable by digital logic circuitry.

20. The system for generating a proton beam of claim 16, wherein the adaptive mirror comprises a laser pulse focused on an anti-reflective coated substrate, one or both of the laser pulse and anti-reflective coated substrate controllable by digital logic circuitry.

21. The system for generating a proton beam of claim 16, wherein the at least one processor is configured to cause the adaptive mirror to direct the beam of electromagnetic radiation at the ion generating target in response to a feedback signal.

22. The system for generating a proton beam of claim 16, wherein the at least one processor is configured to cause the adaptive mirror to direct the beam of electromagnetic radiation at a predetermined location on a surface of the ion generating target.

23. The system for generating a proton beam of claim 22, wherein the surface of the ion generating target comprises a patterned array.

24. The system for generating a proton beam of claim 22, wherein the surface of the ion generating target comprises a plurality of ion generating structures oriented substantially along a common axis.

25. The system for generating a proton beam of claim 22, wherein the surface of the ion generating target includes at least one knife edge.

26. A system for generating a proton beam, the system comprising:

an interaction chamber configured to support an ion generating target at a target location;

an electromagnetic radiation source configured to provide a beam of electromagnetic radiation along a trajectory, the beam of electromagnetic radiation having an energy, a polarization, a spatial distribution, and a temporal distribution;

one or more optical components positioned along the trajectory of the beam of electromagnetic radiation between the source of electromagnetic radiation and a surface of the ion generating target, the one or more optical components configured to cooperate with the beam of electromagnetic radiation to cause the beam of electromagnetic radiation to irradiate the ion generating target, thereby facilitating formation of a proton beam having energy and flux; and

at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optical components, thereby altering at least one of an energy of the beam of electromagnetic radiation, a polarization of the beam of electromagnetic radiation, a spatial distribution of the beam of electromagnetic radiation, and a temporal distribution of the beam of electromagnetic radiation, so as to adjust at least one of:

a proton beam flux while keeping a proton beam energy substantially constant; and

proton beam energy while keeping the proton beam flux substantially constant.

27. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to alter a spatial distribution of the beam of electromagnetic radiation by altering a spot size of the beam of electromagnetic radiation.

28. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to alter the temporal distribution of the beam of electromagnetic radiation by altering a chirp of the beam of electromagnetic radiation.

29. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to alter a temporal distribution of the beam of electromagnetic radiation by altering a timing of one or more pump sources.

30. The system for generating a proton beam of claim 26, wherein the beam of electromagnetic radiation is unpolarized.

31. The system for generating a proton beam of claim 26, wherein the electromagnetic radiation source is configured to provide a pulsed electromagnetic radiation beam and thereby cause a pulsed proton beam.

32. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to cause the electromagnetic radiation source to change an energy of the beam of electromagnetic radiation and a temporal distribution of the beam of electromagnetic radiation.

33. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to cause the electromagnetic radiation source to change an energy of the beam of electromagnetic radiation and a spatial distribution of the beam of electromagnetic radiation.

34. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to cause the electromagnetic radiation source to alter an energy of the beam of electromagnetic radiation, and the at least one processor is configured to cause the one or more optical components to alter a spatial distribution of the beam of electromagnetic radiation.

35. The system for generating a proton beam of claim 26, wherein the at least one processor is configured to cause the one or more optical assemblies to alter an energy of the beam of electromagnetic radiation and a spatial distribution of the beam of electromagnetic radiation.

36. A system for generating a proton beam, the system comprising:

proton beam flux at varying proton beam energies; and

proton beam energy at varying proton beam flux.

37. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to alter a spatial distribution of the beam of electromagnetic radiation by altering a spot size of the beam of electromagnetic radiation.

38. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to alter the temporal distribution of the beam of electromagnetic radiation by altering a chirp of the beam of electromagnetic radiation.

39. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to alter the temporal distribution of the beam of electromagnetic radiation by altering the timing of one or more pump sources.

40. The system for generating a proton beam of claim 36, wherein the beam of electromagnetic radiation is unpolarized.

41. The system for generating a proton beam of claim 36, wherein the electromagnetic radiation source is configured to provide a pulsed electromagnetic radiation beam and thereby cause a pulsed proton beam.

42. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to cause the electromagnetic radiation source to change an energy of the beam of electromagnetic radiation and a temporal distribution of the beam of electromagnetic radiation.

43. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to cause the electromagnetic radiation source to change an energy of the beam of electromagnetic radiation and a spatial distribution of the beam of electromagnetic radiation.

44. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to cause the electromagnetic radiation source to alter an energy of the beam of electromagnetic radiation, and the at least one processor is configured to cause the one or more optical components to alter a spatial distribution of the beam of electromagnetic radiation.

45. The system for generating a proton beam of claim 36, wherein the at least one processor is configured to cause the one or more optical assemblies to alter the energy of the beam of electromagnetic radiation and the spatial distribution of the beam of electromagnetic radiation.

46. A system for generating a proton beam, the system comprising:

an interaction chamber configured to support an ion generating target provided with a plurality of patterned features;

an electromagnetic radiation source configured to provide a beam of electromagnetic radiation to illuminate the plurality of patterned features; and

at least one processor configured to cause the beam of electromagnetic radiation to impinge each patterned feature of the plurality of patterned features and thereby generate a resultant proton beam.

47. The system for generating a proton beam of claim 46, wherein the electromagnetic radiation source is configured to provide a laser beam having a wavelength, and at least one of the plurality of patterned features has a dimension that is less than the wavelength of the laser.

48. The system for generating a proton beam of claim 46, wherein the plurality of patterned features comprise protrusions extending away from a surface of the ion generating target.

49. The system for generating a proton beam of claim 46, wherein the at least one processor is configured to rasterize the ion-generating target.

50. The system for generating a proton beam of claim 46, wherein sequentially impinging each patterned feature of the plurality of patterned features comprises continuously scanning a surface of the ion generation target.

51. The system for generating a proton beam of claim 46, wherein sequentially impinging each patterned feature of the plurality of patterned features comprises discontinuously scanning a surface of the ion generation target.

52. The system for generating a proton beam of claim 46, wherein the plurality of patterned features comprises ice.

53. The system for generating a proton beam of claim 46, wherein the plurality of patterned features comprises silicon.

54. The system for generating a proton beam of claim 46, wherein the plurality of patterned features comprises carbon.

55. The system for generating a proton beam of claim 46, wherein the plurality of patterned features comprises plastic.

56. The system for generating a proton beam of claim 46, wherein the plurality of patterned features comprises stainless steel.

57. The system for generating a proton beam of claim 46, further comprising a motor configured to sequentially impinge the beam of electromagnetic radiation on each patterned feature of the plurality of patterned features.

58. The system for generating a proton beam of claim 48, wherein the at least one processor is configured to cause sequential scanning of the beam of electromagnetic radiation over adjacent patterned features of the plurality of patterned features.

59. The system for generating a proton beam of claim 46, wherein the at least one processor is configured to cause an adaptive mirror to condition the beam of electromagnetic radiation to impinge on each patterned feature of the plurality of patterned features.

60. The system for generating a proton beam of claim 46, wherein the at least one processor is configured to cause a plasma mirror to condition the beam of electromagnetic radiation to impinge on each patterned feature of the plurality of patterned features.

61. The system for generating a proton beam of claim 46, wherein impinging individual patterned features of the plurality of patterned features occurs sequentially.

62. The system for generating a proton beam of claim 61, further comprising an adaptive mirror configured to direct the beam of electromagnetic radiation to impinge on each patterned feature of the plurality of patterned features.

63. The system for generating a proton beam of claim 61, further comprising a plasma mirror configured to direct the beam of electromagnetic radiation to impinge on each patterned feature of the plurality of patterned features.

64. The system for generating a proton beam of claim 46, wherein impinging each patterned feature of the plurality of patterned features occurs simultaneously.

65. The system for generating a proton beam of claim 64, further comprising an adaptive mirror configured to direct the beam of electromagnetic radiation to impinge on each patterned feature of the plurality of patterned features.

66. The system for generating a proton beam of claim 64, further comprising a plasma mirror configured to direct the beam of electromagnetic radiation to impinge on each patterned feature of the plurality of patterned features.

67. A system for generating a proton beam, the system comprising:

an interaction chamber configured to support an ion generating target patterned with at least one knife edge;

an electromagnetic radiation source configured to provide a beam of electromagnetic radiation to illuminate the at least one knife edge of the ion generating target; and

at least one processor configured to cause the beam of electromagnetic radiation to impinge the at least one knife edge and thereby generate a resultant proton beam.

68. The system for generating a proton beam of claim 67, wherein the electromagnetic radiation source is configured to provide a laser beam having a wavelength, and the at least one knife edge has a dimension less than the wavelength of the laser.

69. The system for generating a proton beam of claim 67, wherein the target is patterned with a plurality of knife edges.

70. The system for generating a proton beam of claim 67, wherein the at least one processor is configured to rasterize the ion-generating target.

71. The system for generating a proton beam of claim 67, wherein impacting the at least one knife edge comprises continuously scanning a surface of the ion generating target.

72. The system for generating a proton beam of claim 67, wherein impacting the at least one knife edge comprises discontinuously scanning a surface of the ion generation target.

73. The system for generating a proton beam of claim 67, wherein the knife edge comprises ice.

74. The system for generating a proton beam of claim 67, wherein the knife edge comprises silicon.

75. The system for generating a proton beam of claim 67, wherein the knife edge comprises carbon.

76. The system for generating a proton beam of claim 67, wherein the knife edge comprises plastic.

77. The system for generating a proton beam of claim 67, wherein the knife edge comprises stainless steel.

78. The system for generating a proton beam of claim 67, wherein the at least one processor is configured to cause an adaptive mirror to condition the beam of electromagnetic radiation to impinge the at least one knife edge.

79. A system for directing a pulsed beam of charged particles, the system comprising:

an ion source configured to generate a pulsed ion beam comprising at least one ion bunch;

at least one electromagnet;

a region adjacent to the electromagnet, the region oriented to pass the pulsed beam therethrough;

at least one automatic switch electrically connected to the at least one electromagnet for selectively activating the at least one electromagnet;

a radiation trigger source configured to activate the at least one automatic switch; and

at least one processor configured to activate the at least one electromagnet as the ions bunch across the region.

80. The system for directing a pulsed beam of charged particles according to claim 79, wherein said radiation trigger source comprises one or more of ions, x-rays, electrons, and laser radiation.

81. The system for guiding a pulsed beam of charged particles according to claim 79, wherein said electromagnet is configured to generate an electromagnetic field, and wherein said region is oriented within said electromagnetic field when said electromagnet is activated.

82. The system for directing a pulsed beam of charged particles according to claim 79, wherein said ion source comprises said radiation trigger source and an ion generation target.

83. The system for directing the pulsed beam of charged particles of claim 82, wherein said radiation trigger source is configured to activate said automatic switch and illuminate said ion generating target, thereby generating said pulsed ion beam.

84. The system for directing a pulsed beam of charged particles according to claim 79, further comprising a controlled delay line configured to adjust a time at which said radiation trigger activates said automatic switch.

85. The system for directing a pulsed beam of charged particles of claim 84, wherein said controlled delay line is configured to adjust a time at which said radiation trigger source activates said automatic switch in synchronization with said pulsed ion beam.

86. The system for directing a pulsed beam of charged particles of claim 79, wherein said automatic switch comprises a photoconductive semiconductor switch.

87. The system for directing a pulsed beam of charged particles according to claim 79, wherein said automatic switch comprises a spark switch.

88. The system for directing a pulsed charged particle beam of claim 79, wherein said region has a size of less than about one inch.

89. The system for directing the pulsed beam of charged particles of claim 79, wherein said at least one electromagnet comprises a plurality of electromagnets connected in series along the trajectory of said pulsed ion beam, and wherein said at least one automatic switch comprises a plurality of automatic switches, each of said plurality of automatic switches associated with a different electromagnet of the plurality of electromagnets.

90. The system for directing a pulsed beam of charged particles of claim 89, wherein said at least one processor is further configured to sequentially activate said plurality of automatic switches as said ion bunch passes through each electromagnet.

91. The system for directing the pulsed beam of charged particles of claim 89, wherein a first electromagnet in the series is configured to divert a portion of the pulsed ion beam from an original trajectory to a diverted trajectory, and wherein a second electromagnet in the series is configured to re-divert the portion of the diverted pulsed ion beam from the diverted trajectory to a path that is substantially parallel to the original trajectory.

92. A system for treating a treatment volume with protons, the system comprising:

a proton source configured to provide a proton beam having a plurality of proton energies within a proton energy spread; and

at least one processor configured to:

controlling relative motion between the proton beam and the treatment volume in two dimensions of a three-dimensional coordinate system; and

controlling the proton divergence to adjust a depth of the treatment volume in a third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions.

93. The system for treating a treatment volume with protons of claim 92, wherein controlling relative motion between the proton beam and the treatment volume comprises rotating a gantry.

94. The system for treating a treatment volume with protons of claim 92, wherein controlling relative motion between the proton beam and the treatment volume comprises directing the proton beam with an electromagnet.

95. The system for treating a treatment volume with protons of claim 92, wherein controlling relative motion between the proton beam and the treatment volume comprises moving a patient support platform.

96. The system for treating a volume with protons of claim 92, wherein the energy divergence and distribution is controlled using at least one of a magnetic analyzer, a time-of-flight control unit, and an energy attenuator.

97. A method for operating a system according to any one of the preceding claims.