JP6792731B2 - Systems and methods for providing ion beams - Google Patents

Description

Explanation
[001] The disclosed embodiments generally relate to improving ion beam generation, including proton beam generation, and specifically to ion beam generation through the interaction between an electromagnetic radiation beam and an ion generation target.

background
[002] Aspects of the present disclosure include a number of systems, subsystems, components and subcomponents. The present specification does not repeat the known background details. Such background information can be found in the following materials:
U.S. Pat. No. 8,229,075 to Cowan et al., Named "Targets and Processes for Fabricating Same," issued July 24, 2012,
U.S. Pat. No. 8,389,954 to Zigler et al., Named "System for Fast Ions Generation and a Method Thereof," issued March 5, 2013,
U.S. Pat. No. 8,530,852 to Le Galloudec entitled "Micro-Cone Targets for Producing High Energy and Low Divergence Particle Beams" issued on September 10, 2013,
U.S. Pat. No. 8,750,459 to Cowan et al., Named "Targets and Processes for Fabricating Same," issued June 10, 2014,
U.S. Pat. No. 9,236,215 to Zigler et al., Named "System for Fast Ions Generation and a Method Thereof," issued January 12, 2016,
U.S. Pat. No. 9,345,119 to Adams et al., Named "Targets and Processes for Fabricating Same," issued May 17, 2016,
It may include information contained in US Pat. No. 9,530,605 to Nahum et al. Named "Laser Activated Magnetic Field Manipulation of Laser Driven Ion Beams" issued December 27, 2016.

[003] Particle radiation therapy performed by ions can be used to treat disease. In one form of particle therapy called proton therapy, the tumor is treated by irradiation with protons (eg, hydrogen ions). Proton therapy has advantages over traditional photon-based therapies (such as X-ray and gamma ray therapies) due in part to the way protons and photons interact with the patient's tissue.

[004] Figure 1 shows radiation dose as a function of tissue depth in both photon and proton therapies. Before the particles can irradiate the treatment volume 106 as defined by the patient's treatment plan, the particles must typically traverse the patient's skin and other healthy tissues before reaching the patient's treatment volume 106. Must be. In doing this, the particles can damage healthy tissue, which is an unwanted side effect of treatment. As shown in curve 102 of FIG. 1, photons (eg, X-rays) supply most of their energy to areas near the patient's skin. For deeper tumors in the patient's body, this interaction can damage healthy tissue. In addition, some photons also traverse the patient's body beyond the treatment volume 106, thereby still healthier tissue behind the tumor before finally withdrawing from the other side of the patient's body. Irradiate. The radiation dose to these other healthy tissues is lower than the dose delivered in the vicinity of the patient's skin, which is also still undesirable.

[005] Unlike photons, protons exhibit a highly desirable interaction with the patient's tissue. As shown by curve 104 in FIG. 1, the peak interaction of protons with the patient's tissue occurs deeper within the patient and can terminate abruptly after the peak interaction. In addition, protons interact much less with surface tissue than photons, which means that most of the proton beam energy can be delivered to the therapeutic volume 106 and the irradiation of healthy tissue can be reduced. means. Therefore, by leveraging these benefits, proton therapy allows for more accurate administration of energy to unhealthy tissue within a patient, while avoiding damage to healthy tissue. For example, proton therapy can reduce damage to surrounding healthy tissue by 2-6 times compared to x-ray therapy, thereby improving the survival and quality of life of the patient. Protons can reduce the lifetime risk of secondary cancer in children by 97% compared to x-rays.

[006] Commercial proton therapy centers are currently rare due to the shortcomings of existing proton therapy systems that generate proton beams by using large and costly particle accelerators. Accelerator-based systems are not large and scalable. As an example, FIG. 2 shows a schematic size comparison of an accelerator-based proton therapy system for a football field. In addition, the energy requirements and maintenance costs associated with the operation of accelerator-based systems are enormous. Taken together, these shortcomings are linked to the tremendous structure and maintenance costs associated with proton therapy. In addition to the enormous costs associated with accelerator-based proton beam generation, in such systems, adjusting certain properties of the proton beam (eg, beam energy and beam flux) can be cumbersome and time consuming. It can be necessary. This results in longer treatment times and lower patient throughput, resulting in a smaller number of patients sharing the cost burden, further increasing the cost of individual treatments. Correspondingly, the number of proton therapy centers that exist at this time is small, and the treatment that patients receive is often inferior, in part due to the availability of proton therapy.

[007] The present disclosure is directed to alternative methods of proton therapy. Although the embodiments disclosed herein envision medical applications of proton therapy, those skilled in the art will appreciate the novel proton beam generation methods and systems described below for any application in which proton beams are desired. You will understand that it can be used in.

A brief overview of the disclosed embodiments for illustration
[008] Some of the embodiments disclosed herein provide methods and systems for improved generation of proton beams. For example, the disclosed embodiments provide, for example, improved speed, accuracy and configurability, as described above, which allows proton beam generation to be performed more efficiently and at a lower cost. By doing so, the drawbacks of some conventional proton generation techniques can be remedied. The disclosed embodiments can further reduce the size and complexity of existing systems.

[009] Consistent with the present embodiment, the system for producing a proton beam includes an interaction chamber configured to support an ion generation target and an electromagnetic radiation source configured to provide an electromagnetic radiation beam. Measure at least one laser-target interaction property with one or more optics components configured to direct an electromagnetic radiating beam to an ion-generating target, thereby producing the resulting proton beam. Generates a feedback signal based on a detector configured as described above and at least one laser-target interaction property measured by the detector, and for an electromagnetic radiation source, one or more optics components and an ion-generating target. It may include at least one processor configured to alter the proton beam by adjusting at least one of the relative positions and orientations of the electromagnetic radiation beam.

[010] Some embodiments provide an electromagnetic radiation beam and direct the electromagnetic radiation beam to an ion-generating target in the interaction chamber, thereby producing the resulting proton beam. Measuring at least one laser-target interaction property and adjusting at least one of the position and orientation of the electromagnetic radiation beam relative to the electromagnetic radiation source, one or more optics components and the ion generation target. By doing so, it may include methods including generating a feedback signal based on at least one measured laser-target interaction property to alter the proton beam.

[011] As an example, at least one laser-target interaction property may include a proton beam property (eg, proton beam energy or proton beam flux).

[012] Laser-target interaction properties may include secondary electron emission properties, such as X-ray emission properties.

[013] The electromagnetic radiation source may be configured to provide one or more of a laser beam or, for example, a pulsed electromagnetic radiation beam for producing a pulsed proton beam.

[014] The interaction chamber may include a target stage that supports the ion-generating target, and at least one processor may be further configured to cause relative movement between the target stage and the electromagnetic radiation beam. ..

[015] The structure of the ion-generating target can be determined, at least in part, based on the feedback signal generated, eg, from the measured laser-target interaction properties.

[016] Further, in line with this embodiment, at least one laser-target interaction property may include proton beam energy.

[017] Further, in line with this embodiment, at least one laser-target interaction property may include proton beam flux.

[018] Further, in line with this embodiment, the electromagnetic radiation source may be configured to change the time profile of the electromagnetic radiation beam in response to a feedback signal.

[019] Further, in accordance with the present embodiment, the electromagnetic radiation source may be configured to generate at least main pulses and prepulses, and at least one processor is such that the electromagnetic radiation source responds to a feedback signal and is main. It may be configured to cause a change in the contrast ratio of the prepulse to the pulse.

[020] Further, in line with the present embodiment, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electrical radiation beam in response to the feedback signal.

[021] Further, in conformity with the present embodiment, one or more processors are used in an electromagnetic radiation beam, for example, by the electromagnetic radiation source changing the spot size of the electromagnetic radiation beam in response to a feedback signal. It may be configured to cause changes in the spatial profile.

[022] Further, in conformity with this embodiment, at least one processor causes electromagnetic radiation by one or more optics components, eg, changing the spot size of the electromagnetic radiation beam in response to a feedback signal. It can be configured to cause changes in the spatial profile of the beam.

[023] Further, in line with this embodiment, at least one processor causes the motor to change the relative orientation between the electromagnetic emission beam and the ion generation target in response to the feedback signal. Can be configured in.

Another embodiment conforming to the present disclosure may include a system for producing proton beams, such that the system provides an interaction chamber configured to support an ion generation target and an electromagnetic radiation beam. An electromagnetic radiation source configured in, an adaptive mirror configured to direct the electromagnetic radiation beam to an ion generation target in the interaction chamber, thereby generating a proton beam, and the spatial profile and electromagnetic waves of the electromagnetic radiation beam. Includes at least one processor configured to control the adaptive mirror to adjust at least one of the relative positions and orientations between the radiated beam and the ion generation target.

[025] In some embodiments, by providing an electromagnetic radiating beam and using an adaptive mirror, the electromagnetic radiating beam is directed to an ion generation target in the interaction chamber, thereby resulting. At least one processor to generate the proton beam to be generated and to adjust at least one of the spatial profile of the electromagnetic radiation beam and at least one of the relative positions and orientations between the electromagnetic radiation beam and the ion generation target. It may include methods including controlling adaptive mirrors by.

[026] As an example, an adaptive mirror is configured to guide an electromagnetic radiation beam by adjusting the electromagnetic radiation beam, redirecting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. obtain.

[027] Further, in conformity with the present embodiment, the adaptive mirror may be configured to rasterly scan the electromagnetic radiation beam over the ion generation target.

[028] Further, in conformity with the present embodiment, the adaptive mirror may include a plurality of surfaces, each of which can be independently controlled by a digital logic circuit.

[029] Further, in line with the present disclosure, the adaptive mirror may include a laser pulse focused on an antireflection coated substrate, one or both of the laser pulse and the antireflection coated substrate. Can be controlled by a digital logic circuit.

[030] Further, in line with this embodiment, at least one processor may be configured to cause an adaptive mirror to direct an electromagnetic radiation beam to an ion-generating target in response to a feedback signal.

[031] Further, in conformity with this embodiment, at least one processor may be configured to cause an adaptive mirror to direct an electromagnetic radiation beam to a predetermined location on the surface of an ion-generating target.

[032] Further, in line with this embodiment, the surface of the ion generation target may include a patterned array.

[033] Further, in conformity with the present embodiment, the surface of the ion generation target may include a plurality of ion generation structures oriented substantially along a common axis.

[034] Further, in conformity with the present embodiment, the surface of the ion generation target can include at least one knife edge.

[035] Consistent with this embodiment, the proton beam generating system provides an interaction chamber configured to support the ion-generating target at the target location and an electromagnetically radiated beam along the trajectory. A constructed electromagnetic radiation source, the electromagnetic radiation beam has an energy, polarization, spatial profile and a time profile, and the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and the surface of the electromagnetic radiation source and the ion generation target. One or more optics components positioned along the electromagnetic radiation to cause the electromagnetic radiation beam to illuminate the ion-generating target, thereby facilitating the formation of a proton beam with energy and flux. Proton beam flux and protons while one or more optics components configured to work with the beam and at least one processor holding the proton beam energy substantially constant. Controlling at least one of the electromagnetic radiation sources and one or more optics components to regulate at least one of the proton beam energies while keeping the line flux substantially constant, it It may include at least one processor configured to alter at least one of the energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam.

[036] Some embodiments may include a method of producing a proton beam, the method of supporting an ion-generating target at a target location within an interaction chamber and electromagnetically along a trajectory by an electromagnetic radiation source. To provide a radiating beam, the electromagnetic radiating beam has an energy, polarization, spatial and temporal profile, providing and the trajectory of the electromagnetic radiating beam between the electromagnetic radiation source and the surface of the ion-generating target. By irradiating the ion-generating target with an electromagnetic radiation beam by one or more optics components positioned along, the one or more optics components form a proton beam with energy and flux. The proton beam flux and the proton beam flux while irradiating and keeping the proton beam energy substantially constant, which are configured to cooperate with the electromagnetic radiation beam to promote The energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam are adjusted by at least one processor to regulate at least one of the proton beam energies while kept substantially constant. It involves controlling at least one of the electromagnetic radiation sources and one or more optics components to change at least one of the time profiles of the electromagnetic radiation beam.

[037] Further, in conformity with the present embodiment, the proton beam generating system provides an interaction chamber configured to support the ion-generating target at the target location and an electromagnetic radiation beam along the trajectory. An electromagnetic radiation source configured in such a manner that the electromagnetic radiation beam has an energy, polarization, spatial and temporal profiles, and is between the electromagnetic radiation source and the surface of the electromagnetic radiation source and the ion-generating target. To cause one or more optics components positioned along the trajectory of the electromagnetic radiation beam to illuminate the ion-generating target, thereby facilitating the formation of a proton beam with energy and flux. One or more optics components configured to work with the electromagnetic radiation beam and the proton beam flux while changing the proton beam energy and the proton beam while changing the proton beam flux. To regulate at least one of the energy of the beam, it controls at least one of the electromagnetic radiation source and one or more optics components, thereby the energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the electromagnetic radiation beam. It may include at least one processor configured to change at least one of the spatial profile of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam.

[038] Some embodiments may include a method of producing a proton beam, the method of supporting an ion-generating target at a target location within an interaction chamber and electromagnetically along a trajectory by an electromagnetic radiation source. To provide a radiated beam, the electromagnetic radiated beam has an energy, polarization, spatial and temporal profile, and the trajectory of the electromagnetic radiated beam between the providing and the surface of the electromagnetic radiating source and the ion-generating target. By irradiating the ion-generating target with an electromagnetically radiated beam by one or more optics components positioned along, the one or more optics components facilitate the formation of proton beams with energy and flux. It is configured to work with an electromagnetically radiating beam to irradiate and change the energy of the proton beam and the flux of the proton beam and the proton beam while changing the flux of the proton beam. At least one to change at least one of the energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic radiation beam, and the time profile of the electromagnetic radiation beam to adjust at least one of the energy of the beam. One processor includes controlling an electromagnetic radiation source and at least one of one or more optics components.

[039] As an example, at least one processor may be configured to change the spatial profile of an electromagnetically radiated beam by changing the spot size of the electromagnetically radiated beam.

[040] Further, in conformity with the present embodiment, at least one processor may be configured to change the time profile of the electromagnetic radiation beam by changing the chirp of the electromagnetic radiation beam.

[041] Further, in line with this embodiment, at least one processor may be configured to change the time profile of the electromagnetic radiation beam by changing the timing of one or more pump sources.

[042] Further, in conformity with the present embodiment, the polarization of the electromagnetic radiation beam can be such that the electromagnetic radiation beam is unpolarized.

[043] Further, in conformity with the present embodiment, the electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam, thereby producing a pulsed proton beam.

[044] Further, in conformity with the present embodiment, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam.

[045] Further, in conformity with the present embodiment, one or more processors may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam.

[046] Further, in conformity with the present embodiment, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam, and at least one processor is one. Alternatively, multiple optics components may be configured to cause changes in the spatial profile of the electromagnetic radiation beam.

[047] Further, in conformity with the present embodiment, at least one processor is configured to cause one or more optics components to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam. obtain.

[048] Consistent with the present embodiment, the proton beam generating system comprises an interaction chamber configured to support an ion generation target provided with a plurality of patterned features and a plurality of patterns. An electromagnetic radiation source configured to provide an electromagnetic radiation beam for irradiating the characterized features, and the electromagnetic radiation beam hitting and resulting in each individual of a plurality of patterned features. It may include at least one processor configured to produce a proton beam.

[049] In some embodiments, the ion generation target provided with the plurality of patterned features is supported in the interaction chamber, and the electromagnetic radiation source irradiates the plurality of patterned features. A method comprising providing an electromagnetic radiating beam for the purpose of irradiating the electromagnetic radiating beam to an individual one of a plurality of patterned features and thereby producing a resulting proton beam. Can include.

[050] Further, in accordance with the present embodiment, the proton beam generating system includes an interaction chamber configured to support an ion generation target patterned with at least one knife edge, and an ion generation target. An electromagnetic radiation source configured to provide an electromagnetic radiation beam for irradiating at least one knife edge of the beam and a proton beam resulting in the electromagnetic radiation beam hitting at least one knife edge. It may include at least one processor configured to cause this to occur.

[051] In addition, some embodiments support an ion-generating target patterned with at least one knife edge within the interaction chamber and by means of an electromagnetic radiation source, at least one knife of the ion-generating target. It may include methods including providing an electromagnetic radiating beam for irradiating an edge and irradiating the electromagnetic radiating beam to at least one knife edge and thereby producing a resulting proton beam.

[052] Further, in conformity with the present embodiment, the electromagnetic radiation source may be configured to provide a laser beam having a wavelength, and at least one of the plurality of patterned features is the wavelength of the laser beam. Can have smaller dimensions. Similarly, the knife edge can have dimensions smaller than the wavelength of the laser beam.

[053] Further, in line with the present embodiment, a plurality of patterned features include protrusions extending away from the surface of the ion-generating target.

[054] Further, in line with this embodiment, at least one processor may be configured to raster scan the ion generation target.

[055] Further, in line with the present embodiment, at least one processor may be configured to cause the electromagnetic radiation beam to continuously or discontinuously scan the surface of the ion-generating target.

[056] Further, in line with the present embodiment, at least one processor results in the adaptive mirror adjusting the electromagnetic radiation beam to scan at least one knife edge continuously or discontinuously. Can be configured to allow.

[057] Further, in line with the present embodiment, the plurality of patterned features or knife edges can include ice.

[058] Further, in line with this embodiment, the plurality of patterned features or knife edges may include silicon.

[0059] Further, in line with this embodiment, the plurality of patterned features or knife edges may contain carbon.

[060] Further, in line with this embodiment, the plurality of patterned features or knife edges can include plastic.

[061] Further, in line with this embodiment, the plurality of patterned features or knife edges can include stainless steel.

[062] Further, in conformity with the present embodiment, at least one processor is electromagnetic so that the adaptive mirror hits each one of the plurality of patterned features in sequence or simultaneously or hits the knife edge. It can be configured to result in the regulation of the radiated beam.

[063] Further, in conformity with the present embodiment, at least one processor is configured to adjust the motor to cause the electromagnetic radiation beam to sequentially hit each one of the patterned features. obtain.

[064] Further, in line with this embodiment, at least one processor may be configured to provide a continuous scan of the electromagnetic radiation beam over a continuous one of a plurality of patterned features.

[065] Further, in line with this embodiment, the target can be patterned with two or more knife edges.

[066] Consistent with the present embodiment, a system for generating proton beams is composed of an ion source configured to generate a pulsed ion beam containing at least one group of ions, at least one electromagnet, and an electromagnet. A nearby zone in which the pulsed beam is oriented to traverse through it and at least one electrically connected to at least one electromagnet to selectively activate at least one electromagnet. An automated switch, a radiation trigger source configured to activate at least one automated switch, and at least one configured to activate at least one electromagnet as the ion group traverses the zone. May include a processor.

Another embodiment conforming to the present disclosure may include a method of deriving a pulsed beam of charged particles, the method of which is to generate a pulsed ion beam containing at least one group of ions. The ion beam is configured to traverse through a zone in the vicinity of at least one electromagnet, to generate and to activate at least one automated switch with a radiation trigger source, at least one. One automated switch is electrically connected to at least one electromagnet, by at least one processor based on the activation and activation of the automated switch as the ion group crosses the zone. Includes selectively activating at least one electromagnet.

[068] By way of example, in accordance with this embodiment, the radiation trigger source may include one or more sources of ion, X-ray, electron and laser radiation.

[069] Further, in conformity with the present embodiment, the electromagnet may be configured to generate an electromagnetic field, and the zone may be oriented to be within the electromagnetic field when the electromagnet is activated. Consistent with this embodiment, the zone can have dimensions smaller than about 1 inch.

[070] Further, in accordance with the present embodiment, the ion source may include a radiation trigger source and an ion generation target, and the radiation trigger source activates an automated switch and irradiates the ion generation target. And thereby it can be configured to both generate a pulsed ion beam.

[071] Further, in line with this embodiment, the time point at which the radiated trigger source activates the automated switch can be adjusted by a controlled delay line. The controlled delay line may be configured, for example, to coordinate the time point at which the radiation trigger source activates the automated switch with the pulsed ion beam.

[072] Further, according to this embodiment, the automated switch may include a photoconducting semiconductor switch or a spark switch.

[073] Further, in accordance with the present embodiment, at least one electromagnet may include a plurality of electromagnets in series along the trajectory of the pulsed ion beam, and at least one automated switch may include a plurality of automations. Each of the plurality of automated switches may be associated with a different one of the plurality of electromagnets. At least one processor may be configured to sequentially activate a plurality of automated switches as a group of ions traverses each electromagnet.

[074] Further, in line with the present embodiment, the first electromagnet of one or more electromagnets in series will redirect a portion of the pulsed ion beam from the original trajectory to a redirected trajectory. The second electromagnet of one or more electromagnets in series can be composed of a redirected portion of the pulsed ion beam from the reoriented trajectory to a path substantially parallel to the original trajectory. It may be configured to reorient at least in part.

[075] Consistent with the present embodiment, the system for producing a proton beam is a proton source configured to provide a proton beam having multiple proton energies within a proton energy spread and at least one processor. To control the relative movement between the proton beam and the treatment volume in the two dimensions of the three-dimensional coordinate system, and to maintain the substantially fixed coordinates in the other two dimensions. It may include at least one processor configured to control the proton energy spread to adjust the depth of the therapeutic volume in a third dimension of the coordinate system.

Another embodiment conforming to the present disclosure may include a method of treating a therapeutic volume with protons, the method of providing a proton beam with multiple proton energies within a proton energy spread by means of a proton source. And, at least one processor controls the relative movement between the proton beam and the therapeutic volume in two dimensions of the three-dimensional coordinate system, and at least one processor provides substantially fixed coordinates. It involves controlling the proton energy spread to adjust the depth of the treatment volume in the third dimension of the three-dimensional coordinate system while maintaining it in the other two dimensions.

[077] By way of example, in accordance with the present embodiment, at least one processor with the proton beam, for example, by rotating the gantry, guiding the proton beam with an electromagnet and / or moving the patient support platform. It may be configured to control relative movement to and from the treatment volume.

[078] Further, in conformity with the present embodiment, the system for treating the therapeutic volume with protons is such that the proton energy spread and the proton energy distribution are controlled by at least one of a magnetic analyzer, a flight time control unit and an energy degrader. Can be configured in.

[079] Consistent with other disclosed embodiments, the non-temporary computer-readable storage medium is any of the methods performed by one or more processor devices and described herein. The program instruction to be executed can be saved.

[080] The above overview is a brief overview of only a few disclosed embodiments and is not intended to limit the number of invention concepts described in the drawings, detailed description and claims below. Absent.

A brief description of the drawing
[081] The accompanying drawings, which are incorporated herein by reference and constitute a portion thereof, show a particular aspect of the disclosed embodiment and describe the disclosed embodiment with description.

[082] A graph depicting radiation levels associated with tissue depth. [083] A schematic representation of the size of the particle therapy system based on some of the conventional accelerators described above. [084] FIG. 6 is an example diagram of interconnected components of a system providing proton therapy that conforms to the disclosed embodiments. [085] An example of an ion generation target for proton beam generation that conforms to the disclosed embodiments. [085] An example of an ion generation target for proton beam generation that conforms to the disclosed embodiments. [085] An example of an ion generation target for proton beam generation that conforms to the disclosed embodiments. [085] An example of an ion generation target for proton beam generation that conforms to the disclosed embodiments. [085] An example of an ion generation target for proton beam generation that conforms to the disclosed embodiments. [086] FIG. 6 is a schematic representation of an example controller that controls a proton therapy system, according to a disclosed embodiment. [087] FIG. 6 is a schematic representation of an example of an electromagnetic radiation source that conforms to the disclosed embodiments. [088] FIG. 6 is a schematic representation of an example of a gantry that conforms to the disclosed embodiments. [089] FIG. 6 is a schematic representation of another example of a gantry that conforms to the disclosed embodiments. [090] FIG. 6 is a flow chart of an example of a proton therapy process that conforms to the disclosed embodiments. [091] Shown is an example embodiment of an interaction chamber that conforms to the disclosed embodiments. [092] FIG. 6 is a flow chart of an example of a process of controlling proton therapy by proton production feedback, which is consistent with the disclosed embodiments. [093] Draw the energy of an exemplary proton beam pulse, consistent with the disclosed embodiments. [094] An example of a proton energy selection system conforming to the disclosed embodiments is drawn. [094] An example of a proton energy selection system conforming to the disclosed embodiments is drawn. [095] FIG. 6 is a flow chart of an example of a process of controlling proton therapy treatment in a three-dimensional space based on proton production feedback, which is consistent with the disclosed embodiments. [096] A mode of proton therapy treatment for illustration based on the process of FIG. 14 is depicted. [096] A mode of proton therapy treatment for illustration based on the process of FIG. 14 is depicted. [096] A mode of proton therapy treatment for illustration based on the process of FIG. 14 is depicted. [096] A mode of proton therapy treatment for illustration based on the process of FIG. 14 is depicted.

Detailed explanation
[097] Here, an example is illustrated in the accompanying drawings and the exemplary embodiments disclosed herein are referenced in detail. As appropriate, the same reference numerals are used throughout the drawing to refer to the same or similar parts.

[098] The present specification provides systems and methods for providing ion beam therapy. The following embodiments are described in relation to proton therapy. As used herein, "proton therapy" refers to a particle therapy medical procedure that uses proton beams to irradiate diseased tissue, most commonly in the treatment of cancer. Although this description refers to this therapeutic procedure, it should be understood that the intended scope of innovation herein is not limited to therapeutic or medical procedures. Rather, the present invention can be applied at any time during which a proton beam is generated for any purpose. In addition, the present disclosure is not limited to the generation of proton beams and also applies to other forms of ion beam generation.

[099] A system that produces proton beams in accordance with the present disclosure may include one or more sources of electromagnetic radiation. As used herein, "electromagnetic radiation" can mean any form of electromagnetic radiation having any wavelength, frequency, energy, power, polarization and / or spatial or temporal profile. In some embodiments, the electromagnetic radiation can propagate in the form of a beam. For example, the electromagnetic radiation beam can be any form of electromagnetic radiation suitable for irradiating a desired location. In some embodiments, the system providing the proton therapy system may be configured to provide an electromagnetic radiation beam along the trajectory. The electromagnetic radiation beam irradiates, for example, a plurality of patterned features on the ion-forming target (as described in more detail below) or on the ion-generating target (as described in more detail below). It may be configured to irradiate one or more knife edges.

[0100] The electromagnetic emission beam may include defined energies, wavelengths, powers, energies, polarization (or which may not be polarized), spatial profile and / or time profile. Any of these properties can be fixed or variable. As an example, an electromagnetic radiation source may be configured to provide a laser beam with properties adapted to the properties of the ion-generating target. The electromagnetic radiation beam can be pulsed to result in a pulsed proton beam, or can be continuous to result in a continuous proton beam.

[0101] The system for producing proton beams according to the present disclosure can include an ion generation target. The ion generation target used in the present disclosure can mean any combination of materials, devices or elements configured to generate ions in response to electromagnetic radiation. As will be described later, the ion generation target may be configured to generate a proton beam, but the proton beam is only an example. In some embodiments, the ion generation target can be provided with a plurality of patterned features. For example, a plurality of patterned features may include protrusions extending from the surface of the ion-generating target. In some embodiments, the ion generation target can be patterned with one or more knife edges. For example, the knife edge of an ion-generating target may include one or more narrow edges that resemble the edges of a ridge or blade.

[0102] A system that produces proton beams in accordance with the present disclosure may include one or more optics components. Any one or more optics components used in the present disclosure may include, for example, shaping, waveguideing, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping and / or reflecting an electromagnetic irradiation beam. It can mean any one or more components for manipulating and / or controlling an electromagnetic radiation beam by method. As an example, the optics component can be positioned along the trajectory of the electromagnetic radiation beam, for example, between the surface of the electromagnetic radiation source and the ion generation target. In some embodiments, the optics component may be configured to direct an electromagnetic radiation beam to an ion-generating target, for example, to produce the resulting proton beam. In addition, the electromagnetic radiation source can include one or more optics components to facilitate the formation of the electromagnetic radiation beam.

[0103] Consistent with the present disclosure, the optics component may include one or more adaptive mirrors. Adaptive mirrors as used in the present disclosure can mean elements that include reflective surfaces that can be adapted. For example, an adaptive mirror can be a deformable mirror that includes a plurality of faces, each of which can be independently controlled by a digital logic circuit. As another example, the adaptive mirror can be a plasma mirror containing a laser pulse focused on an antireflection coated substrate, and one or both of the laser pulse and the antireflection coated substrate can be digital. It can be controlled by a logic circuit. In some embodiments, the adaptive mirror can be configured to direct the electromagnetic radiation beam to the ion generation target, or in some examples, the electromagnetic radiation beam illuminates the ion generation target, thereby producing a proton beam. It can be configured to work with an electromagnetic radiation beam to result in facilitating the formation of. Adaptive mirrors according to the present disclosure adjust or control the spatial profile of the electromagnetic radiation beam and / or adjust or control at least one of the relative positions and orientations between the electromagnetic beam and the ion generation target. Can be configured. In some examples, the adaptive mirror may be configured to guide the electromagnetic radiating beam by adjusting the properties of one or more of the electromagnetic radiating beams. For example, the adjustment can be achieved by adjusting the focus of the electromagnetic radiation beam, turning the electromagnetic radiation beam, and scanning the electromagnetic radiation beam.

[0104] Consistent with the present disclosure, a system that produces proton beams can be configured, for example, to rasterly scan an electromagnetic radiation beam over an ion generation target. The raster scan used in the present disclosure can mean a pattern of continuous scans on a surface or volume of any shape. Raster scanning can be achieved, for example, by one or more motors configured to cause the electromagnetic radiation beam to continuously scan the surface or volume. In some embodiments, the electromagnetic emission beam can be raster-scanned over the individual patterned features of the ion-generating target or the knife edge of the ion-producing target. In some embodiments, the adaptive mirror may be configured to direct an electromagnetic radiating beam to address the individual characteristics of the ion-generating target.

[0105] The system for producing proton beams according to the present disclosure can include one or more proton beam adjusting components. One or more proton beam conditioning components used in the present disclosure may include, for example, proton beam acceleration, analysis, waveguide, shaping, filtering, splitting, delay, modulation, absorption, amplification, focusing, chopping and / or. It can mean any one or more components for manipulating and / or controlling the proton beam by any method, including reflection. For example, the proton beam adjustment component includes one or more quadrupole lenses, a cylindrical mirror lens / analyzer (“CMA”), a spherical mirror lens / analyzer (“SMA”), a collimator, an energy degrader, and flight time control. It may include a unit, a magnetic dipole or any other component suitable for manipulating charged ions.

[0106] A system that produces a proton beam in accordance with the present disclosure can be used in the context of a system for treating a therapeutic volume with protons. For medical treatment, the volume can be a group of cells or an area of tissue. When used outside the medical field, the volume can be any area or area where benefits can be realized through the application of radiation.

[0107] According to the present disclosure, a gantry can be provided. A gantry can mean any device configured to assist in the waveguide of radiation towards a target. The target to be irradiated can be, for example, a therapeutic volume such as a tumor in the patient's body. It should be understood that this is only an example, as the system for treating therapeutic volumes with protons, which is consistent with the present disclosure, is only one application of the disclosed proton beam generating system. The gantry can also be used to direct a proton beam or other radiation beam towards any target to be irradiated.

[0108] According to the present disclosure, a patient support platform can be provided. The patient support platform can mean any surface, foundation or other structure configured to support the patient during irradiation therapy. The patient support platform can be fixed or adjustable in any dimension.

[0109] Any of the systems according to the present disclosure may include at least one processor configured to monitor, control and / or facilitate the use of any component contained within the system. Consistent with the disclosed embodiments, the processor includes, for example, an application specific integrated circuit (ASIC), a digital signal processor (DSP), a programmable logic device (PLD), a field programmable gate array (FPGA), and the like. It can mean any one or more processing devices including controllers, microprocessors or other similar electronic devices and / or combinations thereof. The processor can include one or more modules of the control system.

[0110] In some embodiments conforming to the present disclosure, at least one processor provides that the electromagnetic radiation beam hits the individual patterned features that make up the plurality of patterned features of the ion generation target. It can be configured to result in the production of the resulting proton beam. In some embodiments conforming to the present disclosure, at least one processor provides that the electromagnetic radiation beam hits one or more knife edges of an ion-generating target and thereby produces the resulting proton beam. It can be configured to give rise.

[0111] In some embodiments, at least one processor can control at least one of the electromagnetic radiation sources and / or optics components. For example, a processor or group of processors may include energy of the electromagnetic radiation beam, flux of the electromagnetic radiation beam, polarization of the electromagnetic radiation beam, spatial profile of the electromagnetic radiation beam, time profile of the electromagnetic radiation beam or at least other aspects of the electromagnetic radiation beam. One can be controlled. More specifically, at least one processor can generate instructions for the electromagnetic radiation source to change the spatial profile of the electromagnetic radiation beam by changing the spot size of the electromagnetic radiation beam. As another example, at least one processor can change the time profile of the electromagnetic radiation beam by changing the chirp of the electromagnetic radiation beam. As a further example, at least one processor can change the time profile of the electromagnetic radiation beam by changing the timing of one or more laser pump sources.

[0112] In embodiments conforming to the present disclosure, at least one processor may be configured to cause an adaptive mirror to direct an electromagnetic radiation beam to a predetermined location on the surface of an ion-generating target. For example, one or more processors may be configured to cause an electromagnetic radiation beam to rasterly scan an ion-generating target. Such a raster scan may include a continuous scan of the electromagnetic radiation beam over the continuous patterned features that make up the plurality of patterned features. Hitting the individual patterned features can include, for example, continuous or discontinuous scanning of the surface of the ion-generating target. In some embodiments, the processor may be configured to result in the adaptive mirror adjusting the electromagnetic radiation beam to individually hit the patterned features, or the processor may be individually patterned. It can be configured to hit the features made at the same time.

[0113] According to the present disclosure, at least one processor may be configured to control multiple aspects of the system independently or simultaneously. For example, at least one processor may be configured to regulate the flux of the proton beam while keeping the energy of the proton beam substantially constant, or while keeping the flux of the proton beam substantially constant. , Can be configured to regulate the energy of the proton beam. Alternatively, at least one processor may be configured to simultaneously regulate the flux of the proton beam and the energy of the proton beam.

[0114] FIG. 3 depicts an exemplary system 300 for providing proton therapy, including an exemplary system for producing proton beams. The system 300 is also an example of a system in which the treatment volume is treated with protons. According to the disclosed embodiments, the system 300 includes an electromagnetic radiation source 302, an ion generation target 304, one or more optics components 306, one or more proton beam regulation components 308, a gantry 310, a patient support platform 312. And may include one or more of control systems 314 configured to communicate with any one or more of the above.

[0115] The patient can be positioned on the patient support platform 312. The patient support platform 312 can be in any shape or form that is suitable for use with other components of the system 300 and is useful for patient support during treatment. The patient support platform 312 may be anchored in place with respect to the gantry 310, or the patient support platform 312 may be configured for translation and / or rotation before or during treatment. In some embodiments, the patient support platform 312 can accommodate patients of different sizes or be adjusted to position the treatment volume within the proton beam pathway. In addition, in some embodiments, the patient support platform 312 can be adjusted during treatment to reposition the treatment volume with respect to the proton beam.

[0116] The gantry 310 may be configured to direct a proton beam towards a therapeutic volume, such as a tumor, within the patient's body. The gantry 310 can be configured to be manipulated by one or more methods to influence the proton beam path, can be composed of several materials, and can incorporate a large number of components. Examples of gantry 310 that conform to the embodiments of the present disclosure will be described in more detail below, but these are not intended to be limiting.

The electromagnetic radiation source 302 can emit an electromagnetic radiation beam 316, such as a laser beam, which is guided toward the ion generation target 304. In some embodiments, the electromagnetic radiation source 302 is one or more gas lasers (eg, CO2 lasers), diode-excited solid-state (DPSS) lasers (eg, ittelbium lasers, neodymium-doped yttrium aluminum garnet lasers). (Nd: YAG) or titanium-sapphire laser (Ti: sapphire)) and / or flash lamp excitation type solid-state lasers (eg, Nd: YAG or neodymium glass) may be included. In a broader sense, any radiation source capable of resulting in the release of ions from the target can be utilized.

The electromagnetic radiation source 302 can be selected based on its intensity, ie the energy divided by the duration of the pulse and the spot size of the laser on the ion generation target 304. Various combinations of spatial profile (eg, spot size), wavelength, duration and energy can be used while still providing the same intensity. For example, in some embodiments, the electromagnetic radiation beam 316 can have an energy range of 1J to 25000J and a wavelength range of 400nm to 10000nm. The electromagnetic radiation beam 316 can be pulsed, for example, in a pulse width range of 10 fs to 100 ns. The electromagnetic radiation beam 316 can have various spot sizes. In some embodiments, spot sizes of 1 μm ^{2 to} 1 cm ² can be used. The spatial profile of the electromagnetic radiation beam 316 can have any beam profile, but in some embodiments the spatial profile may include a Gaussian, supergaussian, top hat, vessel or annular beam file.

[0117] In some embodiments, the electromagnetic radiation source 302 may be configured to generate a main pulse after one or more prepulses. The contrast ratio (ie, the ratio between the main pulse and the prepulse called the "pedestal" that arrives before the main pulse) can affect proton production. The contrast ratio can be defined more specifically as the intensity of the laser increases. As an example, on a time scale shorter than 100 ps, the contrast ratio can range from ^10-8 to ^10-12 .

[0118] As a more specific example, the electromagnetic radiation source 302 can be a Ti: sapphire laser. In the example of Ti: sapphire laser, the electromagnetic radiation beam 316 can have an energy range of about 1J to 25J and can have a wavelength of about 800nm. In this example, the electromagnetic radiation beam 316 can have a pulse width range of about ¹⁰ fs to 400 fs, a spot size of about 2 μm ^{2 to 1} mm ² , and a Gaussian or top hat spatial profile. These properties are for illustrative purposes only, and other configurations may be utilized.

[0119] The electromagnetic radiation beam 316 can be guided to the ion generation target 304, for example, by one or more optics components 306 arranged along the trajectory between the electromagnetic radiation source 302 and the ion generation target 304. it can. One or more optics components 306 are configured to change the properties of the electromagnetic emission beam 316, including spectral properties, spatial properties, temporal properties, energy, polarization, contrast ratio or other properties. It may include optical and / or mechanical components of. One or more components 306 may be involved, for example, in the generation, optimization, steering, alignment, modification and measurement of the electromagnetic radiation beam 316 or other aspects of the system 300. One or more optics components 306 include lenses, mirrors, laser crystals and other laser oscillating materials, piezoelectric activated mirrors, plates, prisms, beam splitters, filters, optical pipes, windows, blanks, fiber optics, frequency shifters. , Optical amplifiers, lattices, pulse shapers, XPWs, muzzler (or dazzler) filters, polarizers, pockels cells, optical modulators, apertures, saturable absorbers and other optical elements can be included.

[0120] One or more optics components 306 may be fixed or adaptive. For example, one or more optics components 306 may be one such as deformable mirrors, plasma mirrors, Pockels cells, phase shifters, optical modulators, irises, shutters (manual and computer controlled) and other similar components. Or it may include multiple active, adaptive or reconfigurable components. Adaptive properties can manipulate the optics themselves, as in the case of deformable mirrors or plasma mirrors. Further, the orientation of the one or more optics components 306 can be adjusted by translating the one or more optics components 306, or rotating one or more optics components 306 around a rotation axis, and the like. possible. Adjustments can be manual or automated. As an example, the control system 314 can receive a feedback signal and in response, place the control signal between the electromagnetic emission beam 316 and the ion generation target 304, one or more optics components 306. Can be provided to motors connected to. As a result, the movement of the motor may change the relative orientation between the electromagnetic radiation beam 316 and the ion-generating target 304 (eg, by repositioning the location of the laser-target interaction). Multiple optics components 306 can be adjusted.

[0121] Examples of deformable mirrors that can be utilized within one or more optics components 306 include, for example, segmented mirrors, continuous faceplate mirrors, magnetic mirrors, MEMS mirrors, membrane mirrors, bimorph mirrors and / Or includes a ferrofluid mirror. It is also possible to use any number of other mirror techniques capable of altering the wave front of the electromagnetic radiation beam.

[0122] An example of a plasma mirror that can be utilized within one or more optics components 306 is an antireflection coating that ionizes to reflect and separate high intensity peaks from the lower intensity background of the pulse. Includes laser pulses focused on the substrate. As an example, a plasma mirror can be established by directing a laser pulse towards a parabolic mirror placed in front of an antireflection coated substrate. Other methods of mounting plasma mirrors are also known to those of skill in the art and are suitable for use with embodiments of the systems and methods described herein.

[0123] One or more optics components 306 can be adapted to the parameters associated with the intended beam. For example, the optics component 306 can be adapted in terms of intended beam wavelength, intensity, temporal pulse shape (eg, pulse width), spatial size and energy distribution, polarization and other properties. Such beam parameters include optics substrate material, size (eg, lateral size or thickness), coating material (if present), shape (eg, flat, spherical or otherwise), orientation in relation to the beam. Or it may be related to other specifications.

[0124] One or more optics components 306 hold the element in place while allowing the element to be positioned with an appropriate degree of accuracy, such as translation and rotation, as well as other degrees of freedom. It may include one or more corresponding holders configured as such. In one embodiment, such a holder may include an optical mechanical mount held in place by an optical table or any other mechanical holder. Such degrees of freedom can be manipulated manually or via any suitable automatic means such as an electric motor.

[0125] One or more optics components 306 may be placed in specific environmental conditions such as vacuum and / or an environment purified by one or more gases. In addition, the optics component 306 is located at various locations along the path of the electromagnetic radiation source 302 between the electromagnetic radiation source 302 and the ion generation target 304, or in any other system of system 300 where an optical component is desired. It can be arranged. One or more optics components 306 may be configured for various uses such as laser beam steering, laser beam diagnostics, laser-target interaction diagnostics and / or observation and positioning of ion-generating targets. ..

[0126] In some embodiments, the lifetime of one or more optics components 306 can vary. The one or more several optics components 306 can be equipment for long periods of time that are reused multiple times. Alternatively or additionally, one or more several optics components 306 may be consumable and are replaced after being used a smaller number of times. Such classification can be based on several factors such as laser intensity and the presence of debris / contamination. In some embodiments, debris shields can be installed in the vicinity of expensive or delicate optics to reduce the need for frequent replacement. Regular inspections can be performed for suspected damaged optics. A dedicated optical system can be installed to inspect optics at risk.

[0127] One or more optics components 306 may be operated manually, automatically or in any combination thereof. Input types for manipulating the optics component 306 may include high voltage signals, trigger signals, optical pumping or any other form of input. In addition, the optics component 306 can also be monitored by one or more cameras, such as a CCD camera. For example, automatic operation of one or more adaptive mirrors may be performed in response to one or more signals provided by control system 314. The control system 314 controls, for example, one or more motors, one or more piezoelectric elements, one or more microelectromechanical (MEMS) elements and / or similar ones associated with deformable mirrors. can do. Alternatively or additionally, the control system 314 controls, for example, one or more laser pulses, one or more antireflection coated substrates and / or similar ones associated with plasma mirrors. Can be done.

[0128] In some embodiments, one or more optics components 306 may include an adaptive deformable mirror, such as a deformable mirror having multiple faces, each of which faces independently. It is controllable. The surface can be controlled by a digital control logic circuit such as a digital control logic circuit included in the control system 314. As another example, an adaptive mirror is a focused laser that ionizes an antireflection coated substrate, thereby reflecting and separating high intensity peaks from the lower intensity background of the laser pulse. It can be a plasma mirror that uses pulses. The laser pulse and / or antireflection coated substrate can be controlled by a digital control logic circuit such as a digital control logic circuit included in the control system 314.

[0129] The adaptive mirror is configured to guide the electromagnetic radiation beam 316 by adjusting the focus of the electromagnetic radiation beam, reorienting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. Can be done. Adaptive mirrors can be configured to adjust the focus of the electromagnetic radiation beam by any method apparent to those skilled in the art. For example, the electromagnetic radiation beam 316 can hit a plurality of surfaces of the deformable mirror, or the electromagnetic radiation beam 316 can hit a plasma mirror. In some configurations, it may be desirable to adjust where the electromagnetic radiation beam 316 is guided or to adjust the properties of the electromagnetic radiation beam 316. The multiple faces of the deformable mirror have an electromagnetic radiation beam 316 such that the spot size at the desired location is smaller, larger, or shaped differently than the spot size immediately prior to hitting the deformable mirror. Can be controlled to reflect. Similarly, the plasma mirror also reflects the electromagnetic radiation beam 316 so that its spot size at the desired location is smaller, larger, or shaped differently than its spot size just before it hits the plasma mirror. Can be controlled to.

[0130] Also, the adaptive mirror may be configured to redirect the electromagnetic radiation beam 316. For example, the system 300 is configured such that the electromagnetic radiation beam 316 continuously or simultaneously hits a plurality of ion generation targets 304 arranged at a plurality of locations on the ion generation target 304 or at different locations within the system 300. obtain. In such a configuration, the adaptive mirror or one or more other optics components 306 reroute the electromagnetic beam 316 to direct the beam over multiple locations and / or multiple ion generation targets. Can be done. For example, an adaptive mirror or one or more other optics components 306 continuously or discontinuously adjacent electromagnetic radiation beams 316 from one location in a predetermined pattern, such as by a stepwise scheme. It is possible to continuously change direction (for example, scan) to the place where it is to be used. In an automated process, the control system 314 may be configured to cause the adaptive mirror to direct the electromagnetic radiation beam 316 to a predetermined location on the surface of the ion generation target 304. For example, it may be advantageous to scan the electromagnetic emission beam 316 on a patterned array of ion generation features provided on the surface of the ion generation target 304. Also, the electromagnetic radiation beam 316 is on the ion generation target 304, which includes a plurality of ion generation structures oriented substantially along a common axis, such as protrusions that substantially extend away from the surface of the ion generation target 304. It may be advantageous to scan for. Also, the electromagnetic radiation beam 316 is placed on an ion generation target 304 patterned with one or more knife edges, such as an ion generation target containing one or more features with narrow edges similar to the edges of a ridge or blade. Sometimes it is advantageous to scan. Adaptive mirrors are described as an example. Those skilled in the art will recognize that one or more other optics components 306 may perform the same or similar functions as described above with reference to adaptive mirrors.

[0131] According to the present disclosure, an ion generation target may be configured to promote ion production. For example, an ion-forming target may include a surface having one or more ion-forming structures or features. Such structures or features include any of ice (also referred to as snow), plastic, silicon, stainless steel or various metals, and any other material from which carbon and / or ion beams can be generated. It can be composed of one or more suitable materials. Such structures can be arranged randomly, as defined by the growth or deposition process, and / or as a patterned array. Alternatively or additionally, such a structure may include one or more narrow edges similar to ridges or blade edges. The structure may be constructed based on one or more attributes of the electromagnetic radiation beam. For example, such a structure may have dimensions smaller than the wavelength of an electromagnetic radiation beam such as a laser.

[0132] The ion generation target 304 may emit a variety of particles, including electrons, protons, X-rays and other particles, when hit by the electromagnetic radiation beam 316. The ion generation target 304 can be composed of various materials. The ion generation target 304 may be configured to include one or more individual features configured to interact with the electromagnetic radiation beam 316. Alternatively or additionally, the ion generation target 304 can also include a continuous surface or texture formed from a material that is favorable for interaction with the electromagnetic radiation beam 316. Those skilled in the art will appreciate that there are numerous configurations that can be utilized to emit particles when interacting with an electromagnetic radiating beam, and the disclosed embodiments are only exemplary.

[0133] In some embodiments, the ion generation target 304 can be prefabricated. In other embodiments, the ion generation target 304 can be generated in situ within the system 300 or an attached sample preparation system. For example, the ion generation target 304 can be arranged in an interaction chamber such as the interaction chamber 1000 described later. This may involve forming an ion generation target from the appropriate material, including the formation of such a material on the substrate. Such materials include any gas, solid or liquid chemical source of any type commonly known in techniques such as evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition and the like. obtain. For example, in an embodiment where the ion generation target 304 contains ice, the materials used to form the ion generation target are water vapor (H ₂ O), hydrogen gas (H ₂ ) and / or oxygen gas (O ₂ ). Can include. Further, in the embodiment in which the ion generation target 304 contains silicon, the materials used to form the ion generation target 304 are, for example, silane (SiH ₄ ), disilane (Si ₂ H ₆ ), trichlorosilane (SiHCl ₃ ). ) Or any other silicon source may be included. Further, in embodiments where the ionization target 304 comprises a plastic, the source may include, for example, a polytetrafluoroethylene (PTFE) polymer source material or any other PTFE source. As will be appreciated by those skilled in the art, these are just examples for some of the many available target materials and target source materials. In addition, the interaction chamber can also vary in structure to suit the form of the target utilized. For example, if the target is ice, the interaction chamber may be specifically configured to maintain an appropriate temperature to support the ice. Each target material can have different persistence requirements, and therefore the structure of the interaction chamber can be varied to suit the target.

[0134] FIG. 4 depicts an exemplary ion generation target that can be used as the ion generation target 304. For example, FIG. 4A shows an ion generation target 402 containing a cap structure 404 placed on a hollow hourglass-shaped cone 406. In one embodiment, the distance between at least two opposite points of the cone can be less than about 15 pm. In certain examples, this distance can be less than about 1 pm. In some embodiments, the feature of the ion generation target 402 can be self-sustaining. Such features may include any number of shapes, including, for example, structures with cones, pyramids, hemispheres and caps. The structure of the exemplary ion generation target 402 (and other embodiments of the ion generation target 304) shown in FIG. 4 can be formed by using a lithography technique such as a photolithography technique. In a specific example, the ion generation target cone 406 can be manufactured on silicon wafer 408 and then coated with one or more metals 410. In some embodiments, the protons can be released through the back opening 412. FIG. 4B depicts another exemplary ion generation target suitable as the ion generation target 304 used with the present invention. FIG. 4B depicts a portion of an ion-generating target having one or more microcone targets 420 on its surface. Each microcone target 420 may be suitable for producing a high energy, low divergence particle beam. In one embodiment, the microcone target 420 may include a substantially cone-shaped body 422 having an outer surface 424, an inner surface 426, a nearly flat and round open-ended base 428 and a tip 430 defining apex. .. The cone-shaped body 422 can be tapered along its length from a nearly flat and round open-ended base 428 to a vertex-defining tip 430. The outer surface 424 and the inner surface 426 can connect the base 428 to the tip 430.

[0135] FIGS. 4C, 4D and 4E depict other exemplary ion generation targets 304 suitable for use with embodiments of the present invention. Specifically, FIGS. 4C, 4D and 4E depict the surface of a snow target that can be formed from ice crystals. Ice can be advantageous for use as an ion generation target, because water is rich in hydrogen. Further, as shown in FIG. 4C, the structure on the ion generation target may exhibit a needle-like shape. Such a shape can improve the electric field generated by the interaction between the electromagnetic radiation beam 316 and the ion generation target 304. The individual needle-like structures on the ion generation target 304 can be approximately identical to the wavelength of the electromagnetic radiation beam 316. As an example, the structure can be from about 1 μm to 10 μm.

[0136] Individual patterned features on the surface of the ion generation target 304 can be physically configured on the ion generation target 304 so that they can be continuously scanned. For example, such a structure can be configured as an array on a nearly flat surface. The individual structures can be dispersed to form a pattern evenly over the entire surface, as shown in FIG. 4C. Alternatively, the structure can also be configured as a repeating pattern with spaces between the structures, as shown in FIGS. 4D and 4E.

[0137] With reference to FIG. 3 again, one or more proton beam regulating components 308 form proton beam 318 from the protons produced by the ion generation target 304, and the proton beam is treated with gantry 310 and in the patient. It may include one or more components configured to lead to volume. The proton beam adjusting component 308 may include any device capable of manipulating charged particles such as protons. For example, one or more proton beam conditioning components 308 may include electromagnetic components. More specifically, one or more proton beam adjusting components 308 include a quadrupole lens, a cylindrical mirror lens / analyzer (“CMA”), a spherical mirror lens / analyzer (“SMA”), a collimator, and an energy degrader. It may include one or more electromagnetic components such as a flight time control unit, a magnetic dipole or any other component suitable for manipulating charged ions. The proton beam adjusting component 308 can also adjust one or more properties of the proton beam 318. For example, the beam conditioning component 308 can manipulate properties such as flux or spot size. Also, one or more proton beam conditioning components 308 can filter particles with specific energies or reduce the energies of various particles.

[0138] One or more proton beam conditioning components 308 may be located inside the interaction chamber, along the proton beam line, inside the gantry 310, or at various locations within the system 300, including any combination thereof. It can be arranged. For example, the proton beam conditioning component can be arranged along a beamline extending between the ion generation target 304 and the gantry 310. The beamline may be configured to maintain various conditions such as temperature, pressure (eg, vacuum) or one or more other conditions useful for propagating and / or manipulating the proton beam 318. The beamline may further include, without limitation, other components for accommodating the charged particle beam, including elements such as beam dumps, beam attenuators and protective shields.

[0139] Control system 314 can monitor and / or control various aspects of system 300. For example, the control system 314 is associated with electromagnetic radiation sources 302, one or more optics components 306, ion generation targets 304, one or more proton beam regulation components 308, gantry 310 and / or patient support platform 312. Can monitor various detectors. The control system 314 can also receive input from users of the system 300, such as engineers or other operators. The control system 314 may also accept, store, and perform operations related to the system 300, including, for example, starting and maintaining any function of the system 300. The control system 314 can also be configured to implement feedback between one or more detectors and one or more of the various components of the system 300. For example, such feedback may improve the accuracy, efficiency, speed and / or other aspects of the system 300 or its operation. An example of such feedback will be described in more detail below.

[0140] FIG. 5 is a diagram of an exemplary arithmetic system 500 showing configurations that may be associated with control system 314 and may be consistent with the disclosed embodiments. As those skilled in the art will understand, some or all of the functions associated with the control system 314 can be performed or facilitated by software, hardware or any combination thereof associated with the arithmetic system 500. In one embodiment, the arithmetic system 500 may have one or more processors 520, one or more memories 540 and one or more input / output (I / O) devices 530. In some embodiments, the computing system 500 can have the form of a server, a general purpose computer, a customized dedicated computer, a mainframe computer, a laptop, a mobile device or any combination of these components. In certain embodiments, the arithmetic system 500 (or system including the arithmetic system 500) is based on the storage, execution, and / or implementation of software instructions capable of performing one or more operations consistent with the disclosed embodiments. Can be configured as a particular device, system or similar. The computing system 500 can be stand-alone, or it can be part of a subsystem that can be part of a larger system.

[0141] Processor 520 includes application specific integrated circuits (ASICs), digital signal processors (DSPs), programmable logic devices (PLDs), field programmable gate arrays (FPGAs), processors, controllers, microprocessors, and more. Electronic units and one or more known processors such as combinations thereof may be included. For example, the processor 520 is any of a variety of processors manufactured by the Pentium ™ or Xeon ™ family manufactured by Intel ™, the Turion ™ family manufactured by AMD ™, or Sun Microsystems. Can include processors from. The processor 520 may constitute a single core or may constitute a plurality of core processors that simultaneously execute parallel processes. For example, the processor 520 can be a single core processor configured by virtual processing technology. In certain embodiments, processor 520 can use a logical processor to execute and control multiple processes simultaneously. Processor 520 can implement virtual machine technology or other known technology to provide the ability to execute, control, run, operate, store, etc. multiple software processes, applications, programs, and the like. The processor 520 may include a multi-core processor configuration (eg, dual or quad-core) configured to provide parallel processing capabilities to allow the arithmetic system 500 to run multiple processes simultaneously. Those skilled in the art will appreciate that other types of processor configurations may be implemented that provide the capabilities disclosed herein. The disclosed embodiments are not limited to any type of processor.

[0142] Memory 540 may include one or more storage devices configured to store instructions used by processor 520 to perform functions related to the disclosed embodiments. For example, memory 540 may consist of one or more software instructions, such as one or more programs 550, which may perform one or more operations when executed by processor 520. The disclosed embodiments are not limited to separate programs or computers configured to perform specialized tasks. For example, the memory 540 may include a program 550 that executes the functions of the arithmetic system 500, or the program 550 may also include a plurality of programs. In addition, the processor 520 can also execute one or more programs located away from the arithmetic system 500. For example, controller 314 can access one or more remote programs that, when executed, perform functions related to a particular disclosed embodiment through arithmetic system 500 (or a variant thereof). .. Processor 520 may further execute one or more programs located in database 570. In some embodiments, the program 550 may be stored in an external storage device such as a server located outside the arithmetic system 500, and the processor 520 may remotely execute the program 550.

[0143] The memory 540 can also store data that may reflect any type of information in any format that the system may use to perform operations that conform to the disclosed embodiments. .. The memory 540 may store instructions that allow the processor 520 to execute one or more applications such as server applications, network communication processes and any other type of application or software. Alternatively, instructions, application programs, and the like can be stored in external storage (not shown) that is in communication with the computing system 500 over a suitable network, including a local area network or the Internet. Memory 540 can be a volatile or non-volatile, magnetic, semiconductor, tape, optical, removable, non-detachable or other type of storage device or tangible (ie, non-transient) computer-readable medium.

[0144] Memory 540 can include data 560. Data 560 may include any form of data used by controller 314 in controlling the treatment of ion (eg, proton) therapy via system 300. For example, data 560 may include data relating to the operation of various components of system 300, feedback parameters associated with various components of operating system 300, data collected from one or more detectors associated with system 300, and the like. It may include treatment plans for a particular patient or a particular disease, calibration data for various components of system 300, and the like.

[0145] The I / O device 530 may include one or more devices configured to allow reception and / or transmission of data by the arithmetic system 500. The I / O device 530 is one or more digital and / or analog communication devices that allow the arithmetic system 500, such as other components of the system 300 shown in FIG. 3, to communicate with other machines and devices. May include. For example, the computing system 500 may include interface components such as one or more keyboards, mouse devices, displays, touch screens, card readers, biometric readers, cameras, scanners, microphones, wireless communication devices and these. It may provide an interface to one or more input devices, such as those similar to, so that the arithmetic system 500 can receive input from the operator of controller 314. Further, the I / O device includes one or more devices configured to allow the control system 314 to communicate with one or more of the various devices of the system 300 through a wired or wireless communication channel or the like. obtain.

[0146] The arithmetic system 500 may also include one or more databases 570. Alternatively, the arithmetic system 500 can communicatively connect to one or more databases 570. The arithmetic system 500 can communically connect to one or more databases 570 via a network such as a wired or wireless network. Database 570 may include one or more memory devices that store information and are accessed and / or managed through computing system 500.

[0147] FIG. 6 is a schematic diagram of an electromagnetic radiation source 302 for illustration. As shown in FIG. 6, the electromagnetic radiation source 302 includes one or more oscillators 602, pump source 604, optics component 606, diagnostic component 608, stretcher 610, amplifier 612, compressor 614 and controller 616. Can be done. The configuration of FIG. 6 is merely an example and, in conformity with the disclosed embodiments, implements a number of other configurations incorporating one or more of the electromagnetic radiation source 302, the components of the system 300 or other components. can do.

[0148] The oscillator 602 may include one or more lasers to generate an initial laser pulse 618 that is manipulated (eg, molded and / or amplified) to reach the requirements of the electromagnetic radiation beam 316. Various lasers or laser systems, including commercial laser systems, can be used as oscillator 602.

[0149] The pump source 604 may include an independent laser or one or more laser systems configured to transfer energy to the laser pulse 618. In some embodiments, the pump source 604 can be connected to the output of oscillator 602 by an optical beamline that incorporates one or more optics components 306. In addition or instead, the pump source 604 can also include other pump mechanisms such as flash lamps, diode lasers and diode excited solids (DPSS) lasers or the like. In some embodiments, the pump source 604 may be configured to change the time profile of the electromagnetic radiation beam 316. For example, the control system 314 may be configured to control the timing of the pump source 604, thereby controlling the timing of the prepulse and pedestal of the electromagnetic radiation beam.

[0150] The optics component 606 can include any of the components described in relation to the optics component 306 and any of the roles and / or functions described in relation to the optics component 306. Can be executed.

[0151] The diagnostic 608 includes optical, optomechanical or electronic components designed to monitor the laser pulse 618, for example, its temporal and spatial properties, spectral properties, timing and / or other properties. obtain. More specifically, the diagnostic 608 includes one or more photodiodes, oscilloscopes, cameras, spectrum meters, phase sensors, autocorrelators, cross-correlators, power meters or energy meters, laser position and / or direction sensors (eg, for example. , Pointing sensor), dazzler (or muzzler), etc. The diagnostic 608 may also include or include any of the components identified above in relation to the optics component 606.

[0152] The stretcher 610 may be configured to charm or stretch the laser pulse 618. More specifically, the stretcher 610 may include one or more diffraction gratings, or may include other dispersion components such as prisms, chirped mirrors and the like.

[0153] The amplifier 612 can include an amplification medium such as a titanium sapphire crystal, CO ₂ gas or Nd: YAG crystal. The amplifier 612 can also include a holder for the amplification medium. The holder may be configured to adapt to the conditions of the supporting environment, such as positioning, temperature and others. The amplifier 612 may be configured to receive energy from the pump source 604 and transfer this energy to the laser pulse 618.

[0154] The compressor 614 may include an optical component configured to compress the laser pulse 618 in time, eg, to the final duration. The compressor 614 can be constructed from a diffraction grating that is positioned on the holder and positioned in the vacuum chamber. Alternatively, the compressor 614 can also be constructed, for example, from distributed fibers or prisms. In addition, the compressor 614 can also include a mirror or other optics component 306 as well as a motor and other electronically controlled optical mechanics.

[0155] Controller 616 may include one or more electronic systems that control and / or synchronize various components of the electromagnetic radiation source 302. The controller 616 may include any combination of controller, power supply, computer, processor, pulse generator, high voltage power supply and other components. As an example, the controller 616 may include one or more arithmetic systems 500, which may be dedicated to the electromagnetic radiation source 302 or shared with other components of the system 300. Can be done. In some embodiments, some or all of the functions of controller 616 can be performed by controller 314 of system 300.

[0156] Controller 616 can interface with various components of the electromagnetic radiation source 302 and other components of the system 300 via various communication channels. The communication channel may be configured to transmit electrical or other signals to control various optical and opto-mechanical components associated with the radiation source 302 or system 300. Communication channels can include high voltage, electrical triggers, various wired or wireless communication protocols, optical communications and conductors compatible with other components. The controller 616 can receive input from an optical and mechanical diagnostic device along the electromagnetic radiation source 302 and from a diagnostic device 608 along the other part of the system 300. Further, the controller 616 may also receive signals from or based on user input, such as a patient treatment plan input signal input by the user.

[0157] FIG. 7 depicts an example of a gantry 700 conforming to an embodiment of the present disclosure. In some embodiments, the gantry 310 (FIG. 3) may be configured in the form of the gantry 700, but this is not intended to be limiting and other gantry designs may be utilized. The gantry 700 can supply the proton beam 318 to the isocenter 712. In some embodiments, the isocenter 712 may represent a location in or within a treatment volume. The gantry 700 can also be configured for beam conditioning and reconstruction to properly guide the proton beam 318 before or during treatment. The gantry 700 may include a solenoid 704, a coupling 706, one or more beam conditioning components 708, one or more collimators 718 and one or more scanning magnets 710. The height 714 and width 716 can vary widely based on a number of possible configurations of the gantry 700. In some embodiments, either or both of height 714 and width 716 can be as small as 2.5 meters.

[0158] In some embodiments, the gantry 700 can be separated from other components of the system 300 by a wall 702 or other barrier. The wall 702 may include one or more openings (not shown) to allow the passage of the proton beam 318 and any beamline or other device configured to supply the proton beam 318. .. The location of the wall 702 can vary depending on several factors, and in some embodiments the wall 702 may not be present.

[0159] Solenoid 704 may be configured to capture the protons emitted by the ion generation target 304. In some embodiments, the protons released by the ion generation target 304 may exhibit large divergence. As an example, the beam size of protons emitted from the ion generation target 304 can expand at a magnification of 100 at short distances such as 1 cm. The solenoid 704 may be configured to reduce the convergence of the proton beam 318.

[0160] Solenoid 704 may include, for example, a high magnetic field solenoid such as a superconducting solenoid at 9-15T. The magnetic field strength can be related to the length of the solenoid and the resulting beam size. The greater the magnetic field strength of the solenoid, the smaller the beam size and aperture required in the solenoid 704 can result. Solenoid 704 can vary in length based on magnetic field strength and other factors. In some embodiments, the solenoid 704 can be 0.55 m to 0.85 m in length with an aperture of 4 cm to 20 cm. In some embodiments, the solenoid 704 can be used in the context of one or more collimators. Further, in some embodiments, one or more quadrupoles may be utilized in addition to or in place of the solenoid 704.

[0161] The coupling 706 can be any mechanical and optical connection configured to facilitate physical movement of the gantry 700, such as rotation about a rotation axis such as shaft 716. The gantry can be configured to physically move with any suitable configuration of motors and / or actuators that can be controlled by control system 314. The coupling 706 may include one or more bearings or bushings and may be connected to and / or integrated into a beamline carrying the proton beam 318. Thus, the coupling 706 may be configured to maintain a seal or other barrier to prevent loss of vacuum or other environmental conditions within the beamline. In addition, the coupling 706 can include, for example, optics that are invariant in terms of rotation in order to reduce tuning dependence as a function of gantry position.

[0162] The gantry 700 may further include one or more beam conditioning components 708. The beam conditioning component 708 may include any of the beam conditioning components 308 described above configured to guide the proton beam 318 through the gantry. In some embodiments, the beam conditioning component 708 may include electromagnets such as dipoles and / or quadrupoles configured to divert the proton beam 318 through the gantry 700. The beam adjusting component 708 may include a normal conducting dipole, a superferromagnetic superconducting dipole, a stripline dipole, and the like.

[0163] In some embodiments, the beam conditioning component 708 is used to form a rectangle (or any other combination of angles to form a rectangle or another desired shape) (eg, about each). It may include a dipole pair (which bends the proton beam 318 by 45 °). The dipole pair can operate at about 4.8T and can be about 0.6m in length. The section of the straight line between the dipole pairs can be adjusted independently, thereby providing customization within electromagnetic optics according to tuning range, flexibility arrangement. By splitting the 90 ° bend in two, reference trajectory control is improved when each dipole is adjusted independently, eg, via a shunt on a single power supply, thereby at least 10%. Fluctuations (20% total relative change when the two are considered) can be provided. Therefore, the dipole pair can facilitate independent trajectory correction on each arm of the gantry 700, thereby reducing tolerance and cost.

[0164] The gantry 700 may also include one or more collimators 718. The collimator 718 may be configured to filter the proton beam 318 so that only protons that move in the desired direction and / or have the desired amount of movement are allowed to pass. The collimator 718 can be arranged at various locations within the gantry 700. For example, if the beam conditioning component 708 has a colorless property that produces unwanted effects on the downstream beam, the collimator 718 may be configured to offset such effects.

[0165] The gantry 700 may further include one or more scanning magnets 710. The scanning magnet 710 can include beam conditioning components such as beam conditioning components 308 or 708 configured to adjust the location of the isocenter 712 in space. The scanning magnet 710 can be controlled, for example, by the control system 314 to adjust the location of treatment provided to the treatment volume. The scanning magnet 710 can be arranged at any location within the gantry 700. For example, the scanning magnet 710 may be located upstream of one or more of the beam conditioning components 708, downstream of all beam conditioning components, or such, as shown in FIG. It can be located as a combination of upstream and downstream locations.

[0166] The system 300 may be configured such that the scanning magnet operates in collaboration with other components to control the location of treatment within the patient. For example, the control system 314 can control any combination of scanning magnets 710, movement of the gantry 700 and movement of the patient support platform 312. One or more components may be configured for control of specific dimensions and / or degrees of freedom. For example, the patient support platform may be configured to adjust patient position in one dimension while the scanning magnet 710 adjusts in another dimension orthogonal to this first dimension.

[0167] Alternatively or additionally, the system 300 can be configured such that coarse adjustments, rather than fine adjustments, in a given dimension can be performed by different components. For example, coarse adjustments in a particular dimension can be performed by a motor configured to operate the patented support platform 312 in a state where fine adjustments can be performed by the scanning magnet 710. Many combinations of such adjustments will be apparent to those skilled in the art.

[0168] FIG. 8 depicts a further example of the Gantry 800. The gantry 800 includes some or all of the same components as the gantry 700, such as solenoid 704, coupling 706, one or more beam conditioning components 708, one or more collimators 718 and one or more scanning magnets 710. It can include and can further include an additional quadrupole element 802. The quadrupole element 802 is a magnetic element that is part of a magnetic beamline and supports the supply of proton beams to the treatment volume. The quadrupole element 802 focuses or defocuses the beam of charged particles, in contrast to some larger dipoles, which can often be used as bending magnets to bend the proton beam. Used for. The quadrupole element 802 provides a permanent magnet (eg, made from rare earth elements and / or other magnetic materials), normal electromagnets, superconducting magnets, pulsed magnets or suitable fixed or tunable magnetic fields. It can be another device capable of

[0169] FIG. 9 is a flowchart for exemplifying the process 900 for proton beam formation. In step 902, the electromagnetic radiation source (eg, source 302) may emit an electromagnetic radiation beam (eg, beam 316). In step 904, the electromagnetic radiation beam may hit an ion-generating target (eg, target 304). In step 906, particles containing protons can be generated by the interaction of the electromagnetic radiation beam with the ion generation target. In step 908, one or more proton beam regulating components (eg, component 308) can form a proton beam (eg, beam 318) from the particles and guide the proton beam to the therapeutic volume within the patient. Can be done. The steps of process 900 can be automatically executed by the control system 314 or the like. Also, the steps of process 900 can be performed in response to user input, such as through a control system, or by a combination of automatic and manual actions of various components. In some embodiments, process 900 can be performed based on specifications in the treatment plan, which specifications can be customized to varying degrees based on the particular patient, treatment type and / or treatment volume.

[0170] The electromagnetic radiation beam emitted in step 902 can be generated via any component capable of generating a radiation beam, for example, various combinations of components described in relation to FIG. it can.

[0171] In step 904, the electromagnetic radiation beam may hit the ion-generating target. For example, the ion generation target 304 can be arranged in an interaction chamber that isolates the ion generation target from the external environment. Upon hitting the ion-generating target 304, the interaction between the electromagnetic radiation beam 316 and the ion-generating target 304 can produce various particles containing protons that can be used on the proton beam 318. In some embodiments, protons may be emitted with a proton energy of about 250 MeV from a location on the ion generation target 304 hit by an electromagnetic irradiation beam 316 focused on a spot size of about 10-100 μm. .. The two-dimensional divergence angle of the protons emitted from the ion generation target 304 can be about 0.2 radians (ie about 11 degrees). In addition, the proton energy angle distribution ∂Ω / ∂E and the proton number energy distribution ∂N / ∂E can be very small so that the energy angle distribution and the proton number energy distribution are reasonably constant. As an example, pulses of electromagnetic radiation beam can result in the release of 10 ⁸ protons result, and pulses may be repeated in the rate of 10 to 1000 Hz. Therefore, the pulsed electromagnetic radiation beam 316 can generate a pulsed proton beam 318 thereby. Also, the proton pulse can be referred to as a proton "group".

[0172] According to the present disclosure, the ion generation target can be supported by and / or housed within an interaction chamber. The interaction chamber used in the present disclosure can mean any structure configured to isolate the target from ambient conditions and provide a suitable environment for ion generation.

[0173] According to the present disclosure, the interaction chamber can include, for example, a target stage. The target stage used in the present disclosure can mean any structure configured to support an ion generation target. In some embodiments, the target stage can be controlled by a processor configured to produce relative movement between the target stage and the electromagnetic radiation beam.

[0174] According to the present disclosure, the interaction chamber may include one or more detectors. As used herein, a detector can mean a device that detects one or more properties of a sample chamber state, an electromagnetic radiation source or beam, a proton beam and / or a laser-target interaction. The detector can observe, for example, any condition in and / or in the vicinity of the interaction chamber. In some embodiments, the proton beam generating system may include other detectors separate from the interaction chamber. As an example, the detector may be configured to measure at least one laser-target interaction property.

[0175] The laser-target interaction used in the present disclosure can mean an observable property related to the interaction of an electromagnetically radiated beam with an ion-generating target. The laser-target interaction property indicates, for example, the interaction between the proton beam property, the secondary electron emission property, the X-ray emission property, the proton beam energy, the proton beam flux and / or the electromagnetic radiation beam and the ion generation target. It may include other properties.

[0176] FIG. 10 depicts an example of the interaction chamber 1000. The interaction chamber 1000 can have any size and shape and can be constructed from any one or more materials capable of accommodating the target during laser-target interaction. Stainless steel is an example of a material that can be used to build the interaction chamber 1000.

[0177] The interaction chamber 1000 is an ion generation target 304 and / or other within the interaction chamber 1000 such as one or more optics components, one or more beam conditioning components, detectors or the like. It may include one or more stages 1002 configured to support the equipment of. One or more stages 1002 may be fixed or adjustable. The adjustable stage can be configured for translation and / or rotation along one or more axes. Adjustment of one or more stages 1002 can be manual or automated. The automated adjustment can be performed, for example, in response to one or more signals provided by the control system 314. One or more stages 1002 may optionally be configured to heat or cool the ion generation target 304 or maintain its temperature. Temperature control can be achieved, for example, by monitoring the temperature of the ion generation target 304 and raising, lowering, or maintaining the temperature of the ion generation target 304 in response to the measured temperature. Temperature monitoring can be achieved, for example, by one or more thermocouples, one or more infrared temperature sensors and / or any other technique used to measure temperature. Temperature control can be performed, for example, by adjusting the amount of current flowing through the heating element. The heating element can be a refractory metal such as, for example, tungsten, rhenium, tantalum, molybdenum niobium and / or alloys thereof. Further, for temperature control, for example, a refrigerant (liquid oxygen, liquid helium, liquid nitrogen, etc.) such as water or a low-temperature fluid is flowed through a conduit arranged in a state of thermal communication with the ion generation target 304 directly or indirectly. It can also be carried out by. As will be appreciated by those skilled in the art, these exemplary methods of regulating temperature may be compatible and combined. Of course, these temperature control methods are not intended to be limiting, and any other known method for heating, cooling, and maintaining the temperature of the ion generation target 304 is described herein. Can be used with disclosure in writing.

[0178] The interaction chamber 1000 may include one or more related vacuum pumps 1004. For example, sample preparation and / or proton beam formation may have sub-atmospheric atmospheric pressure requirements or may achieve optimum performance within certain ranges of sub-atmospheric pressure. One or more vacuum pumps 1004 can be used to influence the pressure conditions within the interaction chamber 1000 and / or the components associated with the interaction chamber 1000. For example, one or more vacuum pumps 1004 can maintain a vacuum or near vacuum in the interaction chamber 1000. Examples of one or more vacuum pumps 1004 may include one or more turbo molecular pumps, low temperature pumps, ion pumps or mechanical pumps such as diaphragm or roots pumps. One or more vacuum pumps 1004 can operate in the context of one or more pressure regulators (not shown).

[0179] Interaction chamber 1000 may include optics component 1006. Any of the components described above in relation to one or more optics components 306 can be used inside the interaction chamber to further guide the electromagnetic radiation beam 316. For example, as shown in FIG. 10, the interaction chamber may include a mirror 1006a configured to direct the electromagnetic radiation beam 316 towards the ion generation target 304. In one embodiment, the interaction chamber 1000 may include a parabolic mirror 1006b configured to focus the electromagnetic radiation beam 316 onto the ion generation target 304.

[0180] The interaction chamber 800 may include any number of proton beam regulating components 308. For example, as shown in FIG. 8, the interaction chamber 1000 may include a collimator 1010. Those skilled in the art will appreciate that one or more other proton beam regulating components 308 may be included within the interaction chamber 800 instead or in addition. In various embodiments, any one or more beam conditioning components 308 can be incorporated into the interaction chamber 1000.

[0181] The interaction chamber 1000 can include and interface with a beamline 1012, as described above in the context of one or more proton beam conditioning components 308. Beamline 1012 may include conduits maintained at pressures below atmospheric pressure to facilitate the propagation of proton beams 318. The beamline 812 may include proton beam conditioning components such as any of the elements referenced above in relation to one or more proton beam conditioning components 308. The beamline 812 may also include vacuum pumps, such as any of the pumps described in relation to one or more vacuum pumps 1004, to achieve and / or maintain sub-atmospheric pressure conditions.

[0182] The interaction chamber 1000 may include one or more valves 1014. One or more suitable valves may be used and may be located, for example, in various parts of the interaction chamber 1000 or between the interaction chamber 1000 and other components of the system 300 or its surroundings. .. One or more valves 1014 may be configured to isolate, for example, one or more vacuum pumps 1004 or beamlines 1012. One or more valves 1014 can be manual or automatic. The automatic valve can be, for example, gas pressure / or electronic. The one or more valves 1014 may be a simple on-off valve such as a two-position gate valve, or the one or more valves 1014 may be configured to be partially open. One or more valves 1014 associated with one or more vacuum pumps 1004 may include, for example, one or more butterfly valves that may change continuously between open and closed states. One or more valves 1014 may be configured to maintain pressure, retain or release material, and / or allow access to the interaction chamber 800 for maintenance or replacement of a portion of the ion-generating target. ..

[0183] The interaction chamber 1000 may include one or more shutters 1016. One or more shutters 1016 may be configured to block or tolerate, for example, the electromagnetic radiation beam 1016 into chamber 1000. The one or more shutters 1016 can be, for example, a simple open / closed shutter. Also, the one or more shutters 1016 may be configured to chop the electromagnetic radiation beam 316 as appropriate. The operation of one or more shutters 1016 can be manual or automated. The automated operation can occur, for example, in response to one or more signals provided by the control system 314.

[0184] The interaction chamber 1000 may include one or more windows 1018. The window 1018 may be composed of any material suitable for the pressure, temperature and other environmental factors associated with the interaction chamber 1000.

[0185] As mentioned above, the interaction chamber 1000 can be configured to form an ion generation target in situ. Also, the system 300 is a separate or substantially separate preparation chamber (not shown in FIG. 6 or 10) connected to the interaction chamber 1000 and configured for target preparation and / or conditioning. ) Can be included. Preparation chambers are a variety of equipment for preparing ion generation targets, including equipment that can be found in systems that perform evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition and similar. Can include equipment. The preparation chamber may also include one or more stages holding a target substrate that will serve as a template for forming the ion generation target 304 or the ion generation target 304. The preparation chamber may also include a mechanism for transferring the ion generation target to a location within the interaction chamber following preparation. Instead of or in addition to the use of separate or substantially separate preparation chambers, the interaction chamber 1000 may also have equipment such that sample preparation or conditioning can occur within the interaction chamber 1000. Yes (not shown in FIG. 6 or 10).

[0186] Also, the preparation chamber is one or more samples such as a temperature control element (described in relation to stage 1002), a transfer arm or any other transfer device well known to those skilled in the art for vacuum systems. It may also include a transfer mechanism. The system 300 can also include a load lock between the sample preparation chamber and the interaction chamber 1000.

[0187] The interaction chamber 1000 may further include heating and / or cooling elements (not shown in FIG. 10). Either or both sample preparation and particle beam formation may have temperature requirements or may achieve optimum performance over a certain range of temperatures. The interaction chamber may include heating and / or cooling elements configured to achieve and maintain such temperature conditions. The heating and cooling elements are described in relation to one or more stages 1002, provided that they are configured to control the temperature state of other parts of the interaction chamber 1000 or the overall temperature of the interaction chamber 1000. It may include any of the temperature control devices and / or methods used.

[0188] The interaction chamber 1000 may include one or more detectors 1020. The detector 1020 may be configured to measure the condition associated with the interaction chamber 1000. In some embodiments, the measurements can be obtained one by one. That is, the detector 1020 may be configured to measure the properties associated with the individual interactions between the electromagnetic radiation beam 316 and the ion generation target 304. The detector 1020 can also measure the same or different properties in a more continuous manner, for example, providing the result after processing.

[0189] The placement of the detector 1020 can vary based on several factors, including spatial constraints of measurement and optimal location. As shown in FIG. 10, the detector 1020 is located along the outer wall of the interaction chamber 1000 (such as the detector 1020a) and the ion generation target 304 (such as the detectors 1020b and 1020c). It can be placed in the vicinity of or along the proton beam 318 (such as 1020d).

[0190] For some detectors 1020, there are advantages in detecting in the vicinity of the ion generation target 304 and thus the interaction (laser-target interaction) between the electromagnetic radiation beam 316 and the ion generation target 304. Can be done. In one embodiment, the system 300 will stabilize over time, after which such proximity may be unnecessary. In some embodiments, one or more detectors 1020 can be mounted outside the interaction chamber 1000. For example, FIG. 10 depicts a detector 1020e outside the interaction chamber 1000 near window 1018. The detector 1020 can be arranged so that it is exposed to a property that is essentially intended for measurement, or the conditions within the interaction chamber 1000 can be modified to facilitate measurement. For example, one or more optics components 1006 include steering mirrors configured to temporarily or intermittently deflect a signal from the interaction area to a detector such as the detector 1020e through window 1018. obtain. The detector arrangements described above are for illustration purposes only, and many others may be apparent to those skilled in the art.

[0191] In some embodiments, one or more detectors 1020 may be configured to measure one or more laser-target interaction properties of an electromagnetic radiation beam 316 or a proton beam 318. In some embodiments, the detector 1020 is a quadrupole analyzer, a spherical mirror analyzer (“SMA”), a cylindrical mirror analyzer (“CMA”), a secondary electron detector, a photomultiplier tube, a scintillator, a solid. It may include a detector, a time-of-flight detector, a laser-on-target optical diagnostic detector, an X-ray detector, a camera, a Faraday cup or other detector. The detector 1020 may detect properties such as absorption or reflection, secondary electron emission properties, plasma properties such as electron temperature and / or density and / or X-ray emission properties. Secondary emissions, such as emission of electrons and / or X-rays, may indicate laser-target interaction properties and / or properties of proton beam 318. For example, the electron and / or X-ray energy spectrum and / or flux may exhibit proton beam properties. As a result, these signals are, for example, the positions of the electromagnetic radiation source 302, one or more optics components 306, one or more proton beam conditioning components 308 and the ion generation target 304, as described in more detail below. By adjusting one or more of the orientations, it can be used as an input in a feedback loop to change the laser-target interaction.

[0192] The detector 1020 may be configured to detect the direction of the proton beam, the spatial spread, the intensity, the flux, the energy, the proton energy and / or the energy spread. For example, in some embodiments, the Thompson parabola can be utilized. In such an embodiment, the proton beam 318 can be guided into an area where the magnetic and electric fields deflect the protons to a location on the detection screen. Where the protons come into contact with the screen can indicate proton energy. For such screens, devices with sensitivity to any proton can be used, such as CR-39 plates, image plates and / or scintillators (coupled to imaging devices such as CCD cameras). As another example, the spatial proton beam distribution can be detected by a screen sensitive to protons, such as CR-39 and an image plate, or a scintillator with a detector (such as a camera) can be used.

[0193] The detector 1020 may also include a flight time detector. The flight time detector can measure the average proton energy. In some embodiments, the flight time detector may include a proton scintillator and a detector with sufficient time resolution, such as a photomultiplier tube (PMT). The time when the proton signature is detected on the PMT can indicate the proton velocity and thus the proton energy.

[0194] The detector 1020 is also an apparatus configured for plasma diagnosis, such as an X-ray spectrometer configured to detect electron temperature and density or an interferometer configured to detect plasma density. Can also be included. Optical diagnostics may include imaging a reflected laser beam to measure laser absorption efficiency. These detectors can be used during initial system design, calibration and testing, and they can optionally be included in the final system.

[0195] With reference to FIG. 9 again, in step 906, the interaction of the electromagnetic radiation beam (eg, 316) with the ion-generating target (eg, 304) can produce particles containing protons. In some embodiments, the surface of the ion generation target 304 can be scanned by an electromagnetic radiation beam 316. For example, the electromagnetic beam 316 can be continuously scanned on the surface of the ion generation target 304 by continuous or discontinuous rastering, stepped scanning or any other scanning waveform desired. Instead, the electromagnetic beam 316 can be scanned discontinuously on the surface of the ion generation target 304. Scanning of the electromagnetic radiation beam can be achieved by manually or automatically adjusting one or more optics components 306 located between the electromagnetic radiation source 302 and the ion generation target 304. Automatic adjustment of one or more optics components 306 can be achieved, for example, in response to one or more signals provided by control system 314. The one or more control signals provided by the control system 314 can be defined by a program such as a program stored in the arithmetic system 500, or various of the system 300 such as one or more detectors. It may be provided in response to one or more feedbacks received from the element. For example, information from one or more detectors in the system 300 may indicate that it is desirable to relocate the site of the laser-target interaction. This and other examples of feedback will be discussed in more detail below.

[0196] In step 908, the system 300 can form a proton beam 318 from the particles and can guide the proton beam 318 to a therapeutic volume. The protons produced in step 906 may not initially be disposed in a useful configuration or trajectory. Protons can be formed as proton beams, for example, by one or more beam conditioning components 308. Proton beam properties can vary based on the configuration of system 300 and between uses. In one embodiment, the proton energy can be about 250 MeV and can have a range of, for example, 60-250 MeV, as described above. The proton flux can be about 2 Gy / min and the proton pulse duration can be less than 100 psec. Also, the protons produced by system 300 can have a symmetric phase space profile, which allows improved proton beam steering and filtering compared to accelerator-based proton generation systems, thereby allowing protons. The accuracy and efficiency of line supply and treatment are improved. Of course, the above ranges are merely examples, and these specific energies and fluxes can vary based on the details of the configuration.

[0197] According to the present disclosure, feedback can be used to adjust the properties of one or more proton beams. The feedback used in the present disclosure is that one or more system outputs are returned into the system as one or more inputs (ie, fed back into the system) as part of a chain of "causes and effects". Can mean a control protocol. For example, the processor (described above) may be configured to generate a feedback signal to control the mode of electromagnetic radiation beam, proton beam and / or laser-target interaction. Such feedback signals can be based on, for example, one or more properties of electromagnetic radiation beams, proton beams and / or laser-target interactions. In some embodiments, the feedback signal is a proton by adjusting at least one of the positions and orientations of the electromagnetic radiation beam in relation to the electromagnetic radiation source, one or more optics components and / or ion generation targets. You can change the line. Feedback can be used in some examples to determine the structure of the ion generation target.

[0198] The feedback signal may be configured to alter the mode of the electromagnetic radiation beam. For example, the processor can generate one or more feedback signals configured to tune the electromagnetic radiation source to change the time profile of the electromagnetic radiation beam. In addition, the electromagnetic source can be configured to generate the main and prepulses of the electromagnetic beam, and the processor can change the contrast ratio of the prepulse to the main pulse in response to the feedback signal. It can be configured to give rise.

[0199] Further, the processor may be configured to generate a feedback signal to change the energy of the electromagnetic radiation beam or the spatial or temporal profile of the electromagnetic radiation beam. For example, one or more optics components can change the spot size of the electromagnetic radiation beam in response to the feedback signal. In some embodiments, the motor can reorient the electromagnetic radiation beam and the ion generation target in response to a feedback signal. Also, in some embodiments, the adaptive mirror can direct the electromagnetic radiation beam to the ion generation target in response to the feedback signal.

[0200] In some embodiments, feedback can be used to adjust the properties of the proton beam 318. FIG. 11 depicts a process flow in process 1100 for illustration to take advantage of such feedback. In step 1102, the system 300 can determine the desired value of the laser-target interaction property or can be programmed thereby. Laser-target interaction properties can be based on any of the properties detected by any of the detectors 1020 described above. The desired value may be based on, for example, a nominal value related to the desired quality of the proton beam 318, a value based on the desired property in the treatment plan, a nominal value related to the optimal operating state of the system 300, and the like.

[0201] In step 1104, the system 300 can generate one or more feedback signals based on the detected laser-target interaction properties. Feedback can be received and / or processed by the control system 314. For example, control system 314 can calculate adjustments for various components of system 300 by comparing the laser-target interaction property with the desired value of the laser-target interaction property established in step 1102. .. In some embodiments, adjustments and comparisons can be performed according to feedback control algorithms such as PID (proportional-integral-differential) control loops. One or more relationships defined by one or more feedback signals can be linear (eg, an increase in pulse duration can affect proton energy in inverse proportion.

). The feedback signal can often be set to zero (eg, during the start-up or idle period) and can be set to an initial value indicating that no adjustment is required, or to a default value indicating an initial state. ..

[0202] In step 1106, the system 300 can adjust one or more system components based on the feedback signal. For example, in some embodiments, the control system 314 may be configured to adjust the properties of the electromagnetic radiation beam 316 based on the feedback signal. The feedback generated can allow the motor to regulate the path of the electromagnetic radiation beam 316. The motor can, for example, adjust one or more of one or more optics components 306. Such adjustments, for example, allow the electromagnetic radiation beam 316 to hit the ion generation target 304 at one or more more desirable locations, thereby producing the proton beam as a result of the electromagnetic radiation beam 316 hitting the ion generation target 304. You can change the properties of 318. Such adjustments can also allow the electromagnetic radiation beam to continuously hit a plurality of continuous features of the ion generation target 304 so that the features are irradiated at the desired rate. In addition, one or more optics components 306 can be configured to scan the electromagnetic radiation beam 316 on the surface of the ion generation target 304. As another example, the ion generation target 304 can be operated by a motor based on a feedback signal for moving the ion generation target 304 in any of the six degrees of freedom.

[0203] In some embodiments, in step 1108, the control system 314 causes the electromagnetic radiation source 302 to change the energy, wavelength or time or spatial profile of the electromagnetic radiation beam 316 in response to a feedback signal. Can be done. The control system 314 can also allow the electromagnetic radiation source 302 to change the contrast ratio of the prepulse to the main pulse in response to the feedback signal. Such adjustment of the electromagnetic radiation beam 316 via the electromagnetic radiation source 302 can be performed, for example, via one or more controllers 616, one or more oscillators 602, one or more pump sources 604, optics 606. This can be achieved by adjusting one or more of one or more stretchers 610, one or more amplifiers 612 and one or more compressors 614. In some embodiments, the electromagnetic radiation source 302 or any optical element or other component of one or more optics components 306 is modified, moved, or oriented based on the feedback signal. , Or other methods, which can result in any number of changes. The above examples are not intended to be limiting.

[0204] In step 1108, the system 300 may guide the electromagnetic radiation beam 316 in relation to steps 902 and 904 of process 900 shown in FIG. 9, eg, to hit the ion generation target 304 as described above. it can.

[0205] In step 1110, the system 300 can detect the laser-target interaction property. The detected laser-target interaction properties are generated by the properties described above in relation to the detector 1020 and / or any component of the electromagnetic emission beam 316, proton beam 318, laser-target interaction, fault condition or system. It may include any one or more of any properties detected in relation to any other signal.

[0206] The laser-target interaction properties detected in step 1110 can be returned to step 1104, and process 1100 can be repeated any number of times. For example, process 1100 may be repeated over a standard fixed number of times, a preset number of times by control system 314, a number of times defined by a treatment regimen, or a variable number of times determined in real time.

[0207] In some embodiments, selection of protons of a particular energy and / or flux may be desired. For example, as described above in relation to the benefits of proton therapy, treatment of a treatment volume at a particular depth within the patient may be desired. The depth of treatment can be defined by selectively releasing protons at a particular energy level or range of energy levels. The dose of radiation delivered to the treatment volume depends in part on the flux of the proton beam. Therefore, it may be desirable to regulate the proton flux and proton energy produced by the system 300.

[0208] According to the present disclosure, a system for guiding a pulsed beam of charged particles may include an ion source. The ion source used in the present disclosure can mean any structure or apparatus configured to produce a continuous or pulsed ion beam. A pulsed ion beam can mean any group of ions, including at least one group of ions (eg, clusters of ions). In some embodiments, the ion source may include at least a radiation beam and an ion generation target, as described above, but this example is not intended to be limiting. For example, a system for deriving a pulsed beam of charged particles conforming to the present disclosure may be used with any beam of charged particles produced by any method or device (including, for example, a cyclotron, synchrotron or other particle accelerator). can do.

[0209] Further, according to the present disclosure, a system for guiding a pulsed beam of charged particles may include at least one electromagnet. As used herein, an electromagnet can mean any device that can be controlled to generate an electromagnetic field. In some embodiments, the at least one electromagnet may include multiple electromagnets in series along the trajectory of the pulsed ion beam.

[0210] Further, in line with the present disclosure, a system that guides a pulsed beam of charged particles may include at least a zone in the vicinity of the electromagnet. The zone in the vicinity of the electromagnet used in the present disclosure can mean any place where the electromagnetic field generated by the electromagnet has the ability to change the trajectory of charged particles placed within the zone. For example, a zone in the vicinity of an electromagnet can include any location oriented so that an ion beam can traverse through it. In some embodiments, the zone may include a location within the electromagnetic field generated by the activation of the electromagnet. The size of the zone can vary depending on several factors, but in some embodiments the zone can have dimensions smaller than about 1 inch.

[0211] According to the present disclosure, a system that guides a pulsed beam of charged particles may include at least one automated switch. The automated switch used in the present disclosure is configured to be electrically connected to an electromagnet and to selectively start or stop at least one electromagnet when triggered by a signal. Can mean a device. The automated switch can be any switch that can be selectively started or stopped. For example, an automated switch may include a photoconducting semiconductor switch or a spark switch. In some embodiments, the at least one automated switch may include a plurality of automated switches. The individual automated switches can be associated with different electromagnets or with the same electromagnet. In some embodiments, the first electromagnet may be configured to redirect a portion of the pulsed ion beam from the original trajectory to a redirected trajectory. In some embodiments, at least a portion of the redirected portion of the pulsed ion beam is re-directed from the redirected trajectory in series with the first electromagnet to a path substantially parallel to the original trajectory. It may further include a second electromagnet configured to turn around.

[0212] According to the present disclosure, a system that guides a pulsed beam of charged particles may include a radiation trigger source. The radiation trigger source used in the present disclosure may include any structure capable of generating a radiation trigger to activate or stop at least one automated switch. For example, the radiation trigger source may include one or more of an ion source, an X-ray source, an electron source and a light source (eg, a laser). In some embodiments, the radiated trigger generated by the radiated trigger source may be configured to activate or deactivate an automated switch and illuminate the ion-producing target, thereby producing a pulsed ion beam. ..

[0213] According to the present disclosure, at least one processor may be configured to activate at least one electromagnet as a group of ions traverses a zone in the vicinity of the electromagnet. The at least one processor can include any of the processors described above and may be configured to sequentially activate a plurality of automated switches as a group of ions traverses a series of electromagnets.

[0214] According to the present disclosure, a controlled delay line can be provided. The controlled delay line used in the present disclosure can mean a path configured to extend the time required for a beam of radiation or charged particles to traverse it. For example, a controlled delay line can be used to delay the point in time when a group of ions crosses a zone near the electromagnet. As another example, a controlled delay line can be used to delay the point at which the emitted beam activates the automated switch. In some embodiments, the controlled delay line is configured to synchronize the time when the radiating beam activates the automated switch of the electromagnet with the time when the pulsed ion beam traverses the zone near the electromagnet. obtain.

[0215] FIG. 12 is a graph for exemplifying the proton energy profile in an ion group such as a proton group in the proton beam 318. The pulse (ie, "group") 1202 shown in FIG. 12 can be generated as described above in relation to the system 300 and the ion generation target 304. However, the use of the ion generation target 304 is merely an example and is not intended to be limited. Other ion sources and types of ions can also be used.

[0216] In connection with proton therapy, protons of a particular energy may be desired to irradiate a therapeutic volume located at a particular depth within the patient. To isolate protons of the desired energy, the system 300 filters the proton beam 318 to supply the patient with the protons of the desired energy by removing the protons of the other energy from the proton beam. Can be done. For example, to supply protons 1204 with energies from energy 1206 to energy 1208, system 300 filters the proton group 1202 by removing all protons with energies less than energy 1206 and more than energy 1208. Can be done.

[0217] Such filtering can be achieved by combining specific proton beam conditioning components 308. For example, the proton beam conditioning component 308 can manipulate the proton beam 318 so that a proton with a particular energy is redirected along a different trajectory than a proton with another energy. This can be achieved in several ways. For example, the proton beam conditioning component 308 may be configured as a passband filter for isolating protons with energies from energy 1206 to energy 1208. In another embodiment, the proton beam conditioning component 308 can be configured as a high pass filter for isolating protons with energies above the energy cutoff, such as energies 1206 or 1208. In another embodiment, the proton beam conditioning component 308 can be configured as a lowpass filter to isolate protons with energies below the energy cutoff, such as energy 1206 or 1208.

[0218] The above embodiments can be combined and multiple filters can be used. For example, a low pass filter and a high pass filter can be combined in series to generate a band pass filter. In such embodiments, the low pass filter may be configured to isolate protons with energies less than 1208, and the high pass filter may isolate protons with energies greater than 1206. Can be configured. This can be particularly advantageous for selecting protons in a narrow energy band, especially in a narrower energy band than a stand-alone bandpass filter can handle.

[0219] To achieve proton energy filtering, one or more of the proton beam conditioning components 308 are selectively activated and / or by one or more automated switches such as spark switches or photoconducting switches. Or it can be controlled. Selective activation can be controlled by controller 314, which may have an interface between the automated switch and the proton beam conditioning component 308. The automated switch can be started or stopped by a signal generated by the controller 314. The signal can be generated based on feedback, such as any of the forms of feedback described above.

[0220] In addition or instead, in some embodiments, the automated switch can also be configured for activation or shutdown by electromagnetic radiation, such as a laser or another light source. For example, the automated switch can include a photoconducting semiconductor switch arranged along the path of the electromagnetic radiation beam 316. Alternatively, the electromagnetic emission beam 316 can be redirected by one or more of the optics components 306, or split into multiple beams by the optics component 306, and one or more of the multiple beams are automated. Delivered to the switch. In such an embodiment, the automated switch can be activated or deactivated when hit by the electromagnetic radiation beam 316. Therefore, the electromagnetic radiation beam can be configured for both automated switch activation and irradiation of the ion generation target 304 to generate the proton beam 318.

[0221] In other embodiments, the switching electromagnetic radiation source may be unrelated to the electromagnetic radiation source 302 or the electromagnetic radiation source 316. For example, the control system 314 has a separate switching electromagnetic radiation source illuminating one or more photoconducting semiconductor switches or spark switches, thereby activating or stopping the proton beam conditioning component 308 of one or more proton energy filters. Can cause to do.

[0222] A controlled delay line configured to adjust when the radiated beam activates the automated switch, at least in part, at the timing associated with the activation of the automated switch within the proton energy filter. It can be influenced by flight time control units such as. For example, a controlled delay line can be configured to synchronize the timing of an automated switch with the emitted beam. In addition or instead, the timing associated with the activation of the automated switch in the proton energy filter is, for example, in response to a user command, in response to a feedback signal from the system 300, or according to a predetermined program, control system 314. It can also be controlled by.

[0223] Although the above description envisions applications where protons are filtered within a proton therapy system, those skilled in the art will appreciate that these filtering systems and methods have wide applicability. For example, these methods and systems described in connection with proton filtering can also be used to filter any variety of other charged particles used in any variety of other systems and applications. it can.

[0224] FIG. 13 depicts an example of the configuration of the proton beam conditioning component 308 configured to achieve proton energy selection as described above. Such a configuration may include one or more proton beam conditioning components 1302 and 1306 and a beam dump 1304.

[0225] In some embodiments, the beam conditioning components 1302 and 1306 may include multiple electromagnets arranged in series along the trajectory of the proton beam 318. Multiple automated switches can be associated with one or more different magnets or groups of magnets. The control system 314 may be configured to activate a plurality of such switches in various combinations to operate the proton beam 318. For example, the control system 314 can sequentially activate automated switches as the proton group traverses the magnets of a plurality of electromagnets. In one embodiment, the beam conditioning component 1302 may be configured to redirect a portion of the proton beam 318 from the original trajectory to a redirected trajectory. The beam conditioning component 1302 may be configured to reorient at least a portion of the redirected portion of the pulsed proton beam from the redirected trajectory to a path substantially parallel to the original trajectory.

[0226] As shown in FIG. 13, the proton beam 318 may pass through a zone in the vicinity of the proton beam adjusting component 1302. The zone can be of any size, but in some embodiments it can have dimensions less than 1 inch. The zone in the vicinity of the proton beam conditioning component 1302 can be configured and / or oriented such that the proton beam 318 (eg, a continuous beam or a pulsed beam containing a pulse such as pulse 1202) traverses the zone. The proton regulation component 1302 may include any of the proton beam adjustment components 308, such as, for example, a dipole, a CMA, a SMA or an electromagnet such as a flight time analyzer. When the proton beam traverses the zone in the vicinity of the proton beam conditioning component 1302, the automated switch switches the proton with the desired energy to the beam adjusting component 1306 along the trajectory 1310, as shown in FIG. 13A. The proton beam adjusting component 1302 can be activated so as to be turned toward. When a proton with energy to be removed by filtering from the proton beam 318 traverses a zone near the proton beam conditioning component 1302, the automated switch does not have to be activated, or an alternative switch can be activated. Therefore, the proton can move towards the beam dump 1304 along the locus 1308, as shown in FIG. 13B. Protons with the desired energy can pass through the beam conditioning component 1306, which are redirected back along the beamline trajectory 1312 and finally towards the therapeutic volume.

[0227] In some embodiments (not shown), the proton energy filter may include only a single beam conditioning component and a beam dump. Instead of redirecting the proton with the desired energy towards the second electromagnetic element, the proton with the desired energy is allowed to pass through the zone in the vicinity of the proton beam adjusting component without being redirected. can do. When protons with energy to be removed by filtering from the proton beam pass through the zone near the proton beam conditioning component, they can be redirected along the trajectory towards the beam dump.

[0228] In some embodiments, the proton energy filter may include an energy grader. For example, the energy grader can be used as part of beam dump 1304. In addition, energy graders can be used to reduce the energy and / or flux of protons that are not redirected towards the beam dump. To filter protons using an energy grader, the protons can be redirected through the grader, in which case these protons interact with the grader. Protons that have passed through the degrader along the trajectory of the protons have the resulting reduced energy, which in turn reduces the energy of the proton beam. The other protons can be absorbed by the energy degrader or redirected from the trajectory of the proton beam, thereby no longer forming part of the transmitted proton beam, and thereby the flux of the transmitted proton beam. Is reduced. The energy grader may include, for example, a metal such as carbon, plastic, beryllium, copper or lead or any material that is effective in reducing the energy or flux of the proton beam. The energy degrader also includes wedges, double wedges separated by gaps (which can be filled with air or another material), cylinders, rectangles or any other material or configuration capable of degrading the beam. It can be composed of any shape that is effective in reducing the energy or flux of the proton beam.

[0229] Those skilled in the art will appreciate that the above-mentioned proton beam filter configurations are for illustrative purposes only, and that other configurations may be envisioned in line with the embodiments described herein. You will recognize.

[0230] According to the present disclosure, a system for treating a therapeutic volume with protons may include a proton source. The proton source used in the present disclosure can mean any material, system or subsystem that has or is capable of releasing protons. The proton source can be configured to provide a proton beam with multiple proton energies within the proton energy spread.

[0231] Further, according to the present disclosure, a system for treating a therapeutic volume with protons is configured to control the relative movement between the proton beam and the therapeutic volume in two dimensions of a three-dimensional coordinate system. May include at least one processor. The at least one processor may include, for example, any of the processors described above. In some embodiments, the processor adjusts the depth of the treatment volume in the third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions. It can be configured to control the spread. For example, the third dimension of the three-dimensional coordinate system can mean the proper direction of the proton beam trajectory, and the other two dimensions mean the plane orthogonal to the third dimension.

Control of the relative movement between the proton beam and the therapeutic volume in the two dimensions of the three-dimensional coordinate system can be achieved by a number of methods. For example, control of the relative movement between the proton beam and the treatment volume can be achieved by rotating the gantry. Alternatively or additionally, control of relative movement between the proton beam and the treatment volume can be achieved by guiding the proton beam with an electromagnet and / or moving the patient support platform.

Similarly, control of energy spreads and distributions or protons can be achieved in a variety of ways. According to the present disclosure, energy spread control can be achieved, for example, via one or more of a magnetic analyzer, flight time control unit and energy grader.

[0234] System 300 may be configured to change one or more properties of the proton beam 318 while others remain in a substantially fixed state. In some embodiments, such variation can be achieved through feedback, such as those described in relation to process 1100. For example, the control system 314 may be able to keep the flux of the proton beam 318 substantially constant while independently adjusting the energy of the proton beam 318, or may adjust the flux independently of the proton beam 318. Energy can be kept substantially constant. Such independent adjustments may not be feasible in accelerator-based systems due to their large size and slow response time. However, the systems and methods disclosed herein are to reconstruct the properties of the electromagnetic radiation beam 316 and the laser-target interaction, thereby adjusting the energy and flak of the proton beam 318 independently. Independent energy and flux control can be achieved by combining the feedback (described above) with the adjustable components of the system 300 (also described above). Therefore, accurate treatment can be delivered more quickly than conventional systems, thereby reducing patient time consumed in treatment and increasing patient throughput. In addition, treatment can be provided more accurately and with less damage to healthy tissue. Instead, the systems and methods disclosed herein are to reconstruct the properties of the electromagnetic radiation beam 316 and the laser-target interaction, thereby simultaneously regulating the energy and flux of the proton beam 318 (above). Simultaneous control of energy and flux can also be achieved by combining the feedback (as described above) with the adjustable components of the system 300.

[0235] In one embodiment, the energy and flux of the proton beam 318 are the intensity of the electromagnetic radiation beam 316, the location of the electromagnetic radiation beam on the ion generation target 304, the time profile of the electromagnetic radiation beam 316, the spatial profile of the radiation beam 316. It can be adjusted according to the settings and options of one or more proton beam adjustment components 308. As an example, the energy of the proton beam 318 can be proportional to the intensity of the electromagnetic radiation beam 316, and the flux of the proton beam 318 can be proportional to the energy of the electromagnetic radiation beam 316. This has the following relationship :,

And φ _p ~E _L (2)
Can be expressed by, where, _{I L} is the intensity of the electromagnetic radiation beam 316, _{E L} is the intensity of the electromagnetic radiation beam 316, A is the spatial profile of the beam of electromagnetic radiation 316 (e.g., spot Size), Δτ represents the time profile (eg, pulse duration) of the electromagnetic radiation beam 316, E _p is the energy of the proton beam 318, and φ _p is the flux of the proton beam 318. Therefore, by appropriately adjusting one or more of the energy, spatial profile, and time profile of the electromagnetic radiation beam 316, the energy of the proton beam 318 is kept substantially constant in a state where the flux of the proton beam 318 changes. Can be done, and vice versa. For example, in order to change the proton energy of the proton beam 318 without changing the proton flux, the energy of the electromagnetic radiation beam 316 is changed at about 1 MeV while changing the pulse duration and / or spot size at the ion generation target 304. It can be kept constant.

[0236] Alternatively or additionally, the energy and flux of the proton beam 318 can be independently altered by selecting or adjusting one or more proton beam conditioning components 308 as appropriate. For example, this can be achieved by using one of the filtering systems and methods described above in relation to FIG. 13, or by using, for example, one or more energy graders.

[0237] When adjusting the flux of the proton beam 318 independently, the fluctuation of the energy of the available proton beam 318 can be as large as ± 25% or more, in which case the proton beam 318 is formed first. And the system 300 may have the ability to reduce such fluctuations further downstream of the beamline to about ± 5% or less. When adjusting the energy of the proton beam 318 independently, the flux variation of the available proton beam 318 can be as large as ± 25% or more, in which case the proton beam 318 is formed first and the system. The 300 may have the ability to reduce such fluctuations further downstream of the beamline to about ± 5% or less.

[0238] As an alternative to independent regulation of the energy and flux of the proton beam 318, the energy and flux of the proton beam 318 are simultaneously altered, as appropriate, for example by selecting or adjusting one or more proton beam conditioning components 308. be able to. For example, this can be achieved by using one of the filtering systems and methods described above in relation to FIG. 13, or by using, for example, one or more energy graders.

[0239] Independent changes in the energy and flux of the proton beam 318 benefit greatly from the feedback regulation described above in relation to FIG. 11 as the process variables fluctuate during operation. For example, during operation, when the detected laser-target interaction property changes in step 1108, the control system 314 will automatically adapt the system 300 in step 1104 via the feedback signal determined in step 1110. Can be adjusted to.

[0240] System 300 retains other properties of the proton beam 318 in a fixed state in the process for systematic treatment of the treatment volume, while varying one or more properties of such proton beam 318. Can be configured to take advantage of. FIG. 14 depicts an example of Process 1400 for such systematic treatment. In step 1402, the control system 314 can position the proton beam (eg, beam 318) with respect to the therapeutic volume in two dimensions of the three-dimensional coordinate system. For example, the third dimension can be defined by the trajectory of the proton beam when leaving the gantry (eg, gantry 310), and the two dimensions of the three-dimensional coordinate system are protons when leaving the gantry 310. It can be defined by a plane perpendicular to the locus of line 318. The relative movement between the proton beam 318 and the treatment volume in the two dimensions can be controlled by one or more components of the system 300. For example, relative movement can be controlled by any combination of one or more motors associated with the gantry 310 and / or magnets and / or one or more motors associated with the patient support platform 312. More specifically, the control system 314 is relative to the proton beam 318 and the treatment volume by controlling one or more of the rotation of the gantry 310, the adjustment of the scanning magnet 710 and the repositioning of the patient support platform 312. Can be configured to control the movement.

[0241] In step 1404, the control system (eg, system 314) may be configured to control the relative movement between the proton beam and the therapeutic volume in the third dimension of the three-dimensional coordinate system. The control system 314 may be configured to control such relative movements in a third dimension while maintaining substantially fixed coordinates in the other two dimensions. For example, the control system 314 can control the proton energy to adjust the depth of treatment while leaving the position of the proton beam 318 in the other two dimensions fixed. The control of proton energy in step 1404 can be achieved via one or more of the techniques described above (with or without reference to the particular structure described above). For example, at least one of the energy, time profile and spatial profile of the electromagnetic radiation beam 316 can be adjusted according to Equation 1 above, the proton energy selection in FIGS. 12 and 13 can be used and / or the magnetic analyzer, flight time. One or more control units and energy degraders may be used.

[0242] An example of step 1404 is shown in FIGS. 15A, 15B and 15C, which draw a proton beam 318 penetrating the skin 1502 of patient 1504 to provide treatment to treatment volume 1506. ing. 15A, 15B and 15C may represent a series of treatment locations consistent with the disclosed embodiments. System 300 is shown in FIG. 15C as shown in FIG. 15B and by treating area 1510 by reducing the energy of the proton beam 318 and then further reducing the energy of the proton beam 318. Before treating the area 1512, it can be configured to treat the area 1508 shown in FIG. 15A, which is a greater distance in the third dimension (ie, away from the skin 1502 of patient 1504). Instead, area 1512 of FIG. 15C is treated, then the energy of proton beam 318 is increased to treat area 1510 of FIG. 15B, and then the energy of proton beam 318 is further increased to treat area 1508 of FIG. 15A. Thereby, the order can be reversed.

[0243] Step 1404 can include additional locations of treatment before, after, and between the areas 1508, 1510, and 1512 shown in FIGS. 15A, 15B, and 15C. The control system 314 can also be configured to optimize treatment to take into account the effects of a particular sequence. For example, protons passing through a treatment volume 1506 intended to treat area 1508 (ie, shown in FIG. 15A) provide some accompanying treatment for areas 1510 and 1512 before reaching 1508. obtain. The control system 314 can take into account the associated doses administered to areas 1510 and 1512 by adjusting the doses in the patient's treatment plan accordingly. For example, the control system 314 integrates all of the associated doses that will be delivered to areas 1510 and 1512 while directly treating other areas such as area 1508, and for the treatment of areas 1510 and 1512. It may be configured to subtract its associated dose from the direct dose as appropriate. As a result, more accurate treatment can be realized.

[0244] In step 1406, the control system (eg, control system 314) can determine if another location requires treatment or if treatment is complete. If the treatment is complete (step 1006: yes), process 1400 can be terminated. If the treatment is not complete (step 1006: no), process 1000 can return to step 1002, which repositions the proton beam 318 for the two dimensions, as shown in FIG. 15D. And by changing the energy of the proton beam 318, the process of scanning the depth in the third dimension is repeated.

[0245] Although embodiments have been described herein for illustration purposes, their scope, as will be understood by those skilled in the art based on the present disclosure, are equal elements, modifications, abbreviations, etc. Includes any and all embodiments having combinations, conforming forms and / or modifications (of aspects spanning various embodiments). For example, the number and orientation of the components shown in the exemplary system can be varied. In addition, the order and order of the steps can be changed and steps can be added or removed in relation to the exemplary methods shown in the accompanying drawings.

[0246] Aspects of the invention may include a system that produces proton beams, the system being configured to provide an electromagnetic radiation beam with an interaction chamber configured to support an ion-generating target. At least one laser-target interaction property with one or more optics components configured to direct the radiating source and the electromagnetic radiating beam to the ion-generating target, thereby producing the resulting proton beam. Generates a feedback signal based on a detector configured to measure and at least one laser-target interaction property measured by the detector, and an electromagnetic radiation source, one or more optics components and ions. Includes a processor configured to alter the proton beam by adjusting at least one of the positions and orientations of the electromagnetic radiation beam relative to the generation target.

[0247] The laser-target interaction property can include proton beam properties such as, for example, proton beam energy and proton beam flux, and this property can also include a secondary electron emission property. As another example, the laser-target interaction property can include an X-ray emission property.

[0248] The electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam, thereby producing a pulsed proton beam.

[0249] The interaction chamber can include a target stage to support the ion-generating target, and the processor is further configured to cause relative movement between the target stage and the electromagnetic radiation beam. obtain.

[0250] The structure of the ion-generating target can be determined, at least in part, based on the generated feedback signal generated from the measured laser-target interaction properties.

[0251] The electromagnetic radiation source may be configured to change the time profile of the electromagnetic radiation beam in response to a feedback signal and / or to generate main and prepulses. At least one processor may be configured to cause the electromagnetic radiation source to change the contrast ratio of the prepulse to the main pulse in response to the feedback signal.

[0252] In response to the feedback signal, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of one or more of the electromagnetic radiation beams or the spot size of the electromagnetic radiation beam. ..

[0253] In at least one processor, one or more optics components change the spot size of the electromagnetic emission beam in response to the feedback signal, and / or the motor responds to the feedback signal to generate the electromagnetic emission beam and ions. It can be configured to result in a change in orientation relative to the target.

[0254] Aspects of the invention may also include a system that produces proton beams, the system being configured to provide an electromagnetic radiation beam with an interaction chamber configured to support an ion generation target. An electromagnetic radiation source, an adaptive mirror configured to guide the electromagnetic radiation beam to an ion generation target in the interaction chamber, thereby generating a proton beam, the spot size of the electromagnetic radiation beam, and the electromagnetic radiation beam. Includes at least one processor configured to control the adaptive mirror to adjust at least one of the relative positions and orientations to and from the ion generation target.

[0255] The adaptive mirror may be configured to guide the electromagnetic radiation beam by adjusting the focus of the electromagnetic radiation beam, reorienting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. .. Adaptive mirrors can also be configured to rasterly scan an electromagnetic radiation beam over an ion-generating target. The adaptive mirror may include multiple faces, each of which can be independently controlled by a digital logic circuit. The adaptive mirror may include a laser pulse focused on an antireflection coated substrate, and one or both of the laser pulse and the antireflection coated substrate can be controlled by digital logic circuits.

[0256] At least one processor, the adaptive mirror directs the electromagnetic emission beam to the ion generation target in response to the feedback signal, and / or the adaptive mirror directs the electromagnetic radiation beam to the ion generation target at a predetermined location on the surface of the ion generation target. Can be configured to result in leading to. The surface of the ion generation target may include a patterned array and / or multiple ion generation structures oriented substantially along a common axis. Alternatively or additionally, the surface of the ion-generating target may include one or more knife edges.

[0257] Aspects of the invention may include a system that produces proton beams, the system being configured to provide an electromagnetic radiation beam with an interaction chamber configured to support an ion generation target. At least one laser-target interaction property with one or more optics components configured to direct the radiating source and the electromagnetic radiating beam to the ion-generating target, thereby producing the resulting proton beam. Generates a feedback signal based on a detector configured to measure and at least one laser target interaction property measured by the detector, and an electromagnetic radiation source, one or more optics components and ion generation. Includes one or more processors configured to alter the proton beam by adjusting at least one of the positions and orientations of the electromagnetic radiation beam relative to the target.

[0258] Laser-target interaction properties can include secondary electron emission properties, such as proton beam energy and / or proton beam properties such as proton beam flux. As another example, the laser-target mutual property may include an X-ray emission property.

[0259] The electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam, thereby producing a pulsed proton beam.

[0260] The interaction chamber can include a target stage to support the ion-generating target, and one or more processors cause relative movement between the target stage and the electromagnetic radiation beam. Can be further configured as such.

[0261] The structure of the ion-generating target can be determined, at least in part, on the basis of the generated feedback signal generated from the measured laser-target interaction properties.

[0262] Laser-target interaction properties may include proton beam energy and / or proton beam flux.

[0263] In response to the feedback signal, at least one processor allows the electromagnetic radiation source to have the energy of the electromagnetic radiation beam, the time profile of the electromagnetic radiation beam and / or the spatial profile of the electromagnetic radiation beam (eg, spot size of the electromagnetic radiation beam). ) Can be configured to result in a change.

[0264] In response to the feedback signal, at least one processor has one or more optics components that have the energy of the electromagnetic radiation beam, the time profile of the electromagnetic radiation beam and / or the spatial profile of the electromagnetic radiation beam (eg, electromagnetic radiation). It can be configured to cause changes in the spot size of the beam).

[0265] The electromagnetic radiation source can be configured to change the time profile of the electromagnetic radiation beam in response to the feedback signal and / or to generate at least the main and prepulses. At least one processor may be configured to cause the electromagnetic radiation source to change the contrast ratio of the prepulse to the main pulse in response to the feedback signal.

[0266] At least one processor may be configured to cause the motor to change the relative orientation between the electromagnetic emission beam and the ion generation target in response to the feedback signal.

[0267] Aspects of the invention may also include a system that produces proton beams, the system being configured to provide an electromagnetic radiation beam with an interaction chamber configured to support an ion generation target. Electromagnetic radiation sources, adaptive mirrors configured to direct the electromagnetic radiation beam to an ion generation target in the interaction chamber, thereby generating proton beams, and the spatial profile and electromagnetic radiation beam of the electromagnetic radiation beam. Includes at least one processor configured to control the adaptive mirror to adjust at least one of the relative positions and orientations to and from the ion generation target.

[0268] The adaptive mirror may be configured to guide the electromagnetic radiation beam by adjusting the focus of the electromagnetic radiation beam, reorienting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. .. Adaptive mirrors can also be configured to rasterly scan an electromagnetic radiation beam over an ion-generating target. The adaptive mirror may include multiple faces, each of which can be independently controlled by a digital logic circuit. The adaptive mirror may include a laser pulse focused on an antireflection coated substrate, and one or both of the laser pulse and the antireflection coated substrate can be controlled by digital logic circuits.

[0269] At least one processor, the adaptive mirror directs the electromagnetic emission beam to the ion generation target in response to the feedback signal, and / or the adaptive mirror directs the electromagnetic radiation beam to the ion generation target at a predetermined location on the surface of the ion generation target. Can be configured to result in leading to. The surface of the ion generation target may include a patterned array and / or multiple ion generation structures oriented substantially along a common axis. Alternatively or additionally, the surface of the ion-generating target may include one or more knife edges.

[0270] Aspects of the invention may include a system that produces a proton beam, the system providing an ion generation chamber configured to support the ion generation target at the target location and an electromagnetically radiating beam along the trajectory. An electromagnetic radiation source configured to do so, the electromagnetic radiation beam has an energy, polarization, spatial and temporal profile, electromagnetic radiation between the electromagnetic radiation source and the surface of the electromagnetic radiation source and the ion-generating target. To cause one or more optics components positioned along the trajectory of the beam to cause the electromagnetically radiated beam to illuminate the ion-generating target, thereby facilitating the formation of a proton beam with energy and flux. One or more optics components that are configured to work with an electromagnetically radiating beam, and the proton beam flux and the proton beam flux while keeping the proton beam energy substantially constant. Control at least one of the electromagnetic radiation sources and one or more optics components to regulate at least one of the proton beam energies while keeping them constant. It includes at least one processor configured to change the energy, polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam.

[0271] Further, aspects of the invention may include a system that produces a proton beam, the system being an interaction chamber configured to support an ion-generating target at the target location and an electromagnetically radiating beam along the trajectory. An electromagnetic radiation source configured to provide, the electromagnetic radiation beam has an energy, polarization, spatial profile and time profile between the electromagnetic radiation source and the surface of the electromagnetic radiation source and the ion-generating target. One or more optics components positioned along the trajectory of the electromagnetic emission beam, resulting in the electromagnetic emission beam illuminating the ion-generating target, thereby facilitating the formation of a proton beam with energy and flux. One or more optics components that are configured to work with the electromagnetic radiation beam to make the proton beam flux and the proton beam flux changing while changing the proton beam energy. Controlling at least one of the electromagnetic radiation sources and one or more optics components to regulate at least one of the proton beam energies between them, thereby the energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, It includes at least one processor configured to modify at least one of the spatial profile of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam.

[0272] At least one processor may be configured to change the spatial profile of the electromagnetic radiation beam by changing the spot size of the electromagnetic radiation beam.

[0273] At least one processor may be configured to change the time profile of the electromagnetic radiated beam by changing the chirp of the electromagnetic radiated beam.

[0274] At least one processor may be configured to change the time profile of the electromagnetic radiated beam by changing the timing of one or more pump sources.

[0275] The electromagnetic radiation beam does not have to be polarized.

[0276] The electron emission source can be configured to provide a pulsed electromagnetic emission beam, thereby producing a pulsed proton beam.

[0277] At least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the time profile of the electromagnetic radiation beam. Also, at least one processor may be configured to cause the electromagnetic radiation source to alter the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam. Also, at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and one or more optics components to change the spatial profile of the electromagnetic radiation beam. Also, at least one processor may be configured to cause one or more optics components to alter the energy of the electromagnetic emission beam and the spatial profile of the electromagnetic emission beam.

[0278] Aspects of the invention may include a system for producing proton beams, the system comprising a plurality of interaction chambers configured to support an ion generation target provided with a plurality of patterned features. An electromagnetic radiation source configured to provide an electromagnetic radiation beam for irradiating the patterned features of the, and an electromagnetic radiation beam hitting each individual of the multiple patterned features, and thereby resulting in Includes at least one processor configured to produce the resulting proton beam.

[0279] Aspects of the invention may also include a system for producing proton beams, the system comprising an interaction chamber configured to support an ion generation target patterned with at least one knife edge. An electromagnetic radiation source configured to provide an electromagnetic radiation beam for irradiating at least one knife edge of the ion-generating target, and a proton that the electromagnetic radiation beam hits and results in at least one knife edge. Includes at least one processor configured to produce a line.

[0280] The electromagnetic radiation source can be configured to provide a laser beam with a wavelength, and at least one of the plurality of patterned features can have dimensions smaller than the wavelength of the laser beam. Similarly, the knife edge can have dimensions smaller than the wavelength of the laser beam. Multiple patterned features may include protrusions that extend away from the surface of the ion-generating target.

[0281] At least one processor may be configured to raster scan an ion-generating target. In addition, at least one processor is configured to cause the electromagnetic radiation beam to continuously or discontinuously scan the surface of the ion-generating target, for example by controlling a motor and / or adaptive mirror. Can be done. The surface of the ion generation target can include, for example, a plurality of patterned features and / or one or more knife edges and can include, for example, ice, silicon, carbon, plastic or steel. At least one processor results in the motor and / or adaptive mirror adjusting the electromagnetic radiation beam to hit each one of the multiple patterned features continuously or simultaneously or to hit the knife edge. Can be configured to allow. Further, at least one processor may be configured to produce a continuous scan of the electromagnetic radiation beam over one continuous pattern of multiple patterned features.

[0282] Aspects of the invention may include a system that produces proton beams, the system comprising an ion source configured to produce a pulsed ion beam containing at least one group of ions and at least one. An electromagnet, a zone in the vicinity of the electromagnet that is oriented so that the pulsed beam traverses through it, and an electrical connection to at least one electromagnet to selectively activate at least one electromagnet. At least one automated switch, a radiation trigger source configured to activate at least one automated switch, and at least one electromagnet configured to activate the ion group as it traverses the zone. Includes at least one processor.

[0283] The radiation trigger source may include one or more sources of ion, X-ray, electron and laser radiation.

[0284] The electromagnet can be configured to generate an electromagnetic field, and the zone can be oriented to be within the electromagnetic field when the electromagnet is activated. Zones can have dimensions smaller than about 1 inch.

[0285] The ion source can include a radiation trigger source and an ion generation target, and the radiation trigger source activates an automated switch and irradiates the ion generation target to generate a pulsed ion beam. It can be configured to do both with and to do.

[0286] The point at which the radiated trigger source activates the automated switch can be adjusted by a controlled delay line. The controlled delay line may be configured, for example, to coordinate the time point at which the radiation trigger source activates the automated switch with the pulsed ion beam.

[0287] The automated switch may include a photoconductive semiconductor switch or a spark switch.

[0288] At least one electromagnet may include a plurality of electromagnets in series along the trajectory of the pulsed ion beam, and at least one automated switch may include a plurality of automated switches and a plurality of automations. Each of the switches made is associated with a different one of multiple electromagnets. At least one processor may be configured to sequentially activate a plurality of automated switches as a group of ions traverses each electromagnet.

[0289] The first electromagnet of one or more electromagnets in series may be configured to redirect a portion of the pulsed ion beam from the original trajectory to a redirected trajectory, and one in series. Alternatively, the second electromagnet of the plurality of electromagnets may redirection at least a portion of the pulsed ion beam from the redirected trajectory into a path substantially parallel to the original trajectory. Can be configured.

[0290] Aspects of the present invention may include a system that produces a proton beam, the system being configured to provide a proton beam with multiple proton energies within a proton energy spread, with a proton source and three-dimensional coordinates. A third of the three-dimensional coordinate system, controlling the relative movement of the proton beam between the proton beam and the treatment volume in the two dimensions of the system, and maintaining substantially fixed coordinates in the other two dimensions. Includes at least one processor configured to control and perform proton energy spreads to adjust the depth of treatment volume in the dimension of.

[0291] At least one processor performs relative movement between the proton beam and the treatment volume, for example by rotating the gantry, guiding the proton beam with an electromagnet, and / or moving the patient support platform. It can be configured to control.

[0292] A system for treating a therapeutic volume with protons may be configured to control the proton energy spread and the proton energy distribution by at least one of a magnetic analyzer, a flight time control unit and an energy grader.

[0293] The present specification and claims may refer to elements in the singular, such as "processor" or "detector". It should be understood that this notation is intended to include multiple such elements. That is, a particular function can be split across multiple processors located on the same board or system, or remotely located on another board or within another system. References to processors need to be construed as "at least one processor", as it is believed that the cited functionality may occur across multiple processors and is still within the scope of this disclosure and claims. Please be understood as meaning that it can be done. This also applies to detectors and other elements described and referenced in the singular throughout the specification and claims.

[0294] Further, the above description is provided for illustration purposes. This is not exhaustive and is not intended to be limited to accurate disclosed embodiments and embodiments. Modifications and conformances will be apparent to those skilled in the art from the examination and implementation of the disclosed embodiments herein. For example, if proton production is described above in relation to laser irradiation of the ion generation target, other proton generation processes such as radiofrequency coupling can be used. Moreover, although some of the above description relates to the use of protons in medicine as a treatment for radiation therapy, the systems and methods described herein are other than other uses of proton beams and protons. It can also be used in applications involving other ions.

[0295] The claims require broad interpretation based on the language used in the claims and are not limited to the examples described herein, these examples are non-exclusive. It needs to be interpreted as a thing. Further, the steps of the disclosed method can be modified by any method, including by reordering the steps and / or inserting or deleting the steps.

Claims (18)

A system that generates proton beams,
With an interaction chamber configured to support the ion generation target,
With an electromagnetic radiation source configured to provide an electromagnetic radiation beam,
With one or more optics components configured to direct the electromagnetic radiation beam to the ion-generating target, thereby producing the resulting proton beam.
With a detector configured to measure at least one laser - target interaction property,
At least one processor
Receiving a feedback signal based on the at least one laser-target interaction property measured by the detector, the feedback signal indicates a relationship between the proton beam and the electromagnetic radiation beam. To receive and
Based on the feedback signal received,
(A) The electromagnetic radiation source,
(B) The one or more optics components,
(C) It is configured to change the proton beam by adjusting at least one item of at least one of the positions and directions of the electromagnetic radiation beam relative to the ion generation target. Including at least one processor
Changing the proton beam is based on the relationship between the proton beam and the electromagnetic radiation beam indicated in the received feedback signal, and by changing the charp of the electromagnetic radiation beam. , A system comprising changing the time profile of the electromagnetic radiation beam. The system for generating a proton beam according to claim 1, wherein the laser-target interaction property includes a proton beam property. The system for generating a proton beam according to claim 1, wherein the laser-target interaction property includes an X-ray emission property. The system for generating a proton beam according to claim 1, wherein the laser-target interaction property includes an energy spectrum of electromagnetic radiation. The interaction chamber further comprises a target stage for supporting the ion generation target, and the at least one processor further causes a relative movement between the target stage and the electromagnetic radiation beam. The system for generating the proton beam according to claim 1, which is configured. The system for generating a proton beam according to claim 2, wherein the proton beam property includes proton beam energy. The system for generating a proton beam according to claim 2, wherein the proton beam property includes a proton beam flux. The electromagnetic radiation source is configured to generate a main pulse and a prepulse, and the at least one processor is such that the electromagnetic radiation source is the proton beam and the proton beam indicated in the received feedback signal. The system for generating a proton beam according to claim 1, wherein the contrast ratio of the pre-pulse to the main pulse is changed based on the relationship with the electromagnetic radiation beam. The at least one processor changes the energy of the electromagnetic radiation beam based on the relationship between the proton beam and the electromagnetic radiation beam indicated by the electromagnetic radiation source in the received feedback signal. The system for generating a proton beam according to claim 1, which is configured to cause the above. The at least one processor modifies the spatial profile of the electromagnetic radiation beam based on the relationship between the proton beam and the electromagnetic radiation beam indicated by the electromagnetic radiation source in the received feedback signal. The system for generating proton beams according to claim 1, which is configured to cause this to occur. The at least one processor is such that the one or more optics components of the electromagnetic radiation beam are based on the relationship between the proton beam and the electromagnetic radiation beam indicated in the received feedback signal. The system for generating proton beams according to claim 1, which is configured to cause a change in spot size. The at least one processor has a motor between the electromagnetic beam and the ion generation target based on the relationship between the proton beam and the electromagnetic beam indicated in the received feedback signal. The system for generating a proton beam according to claim 1, which is configured to cause the relative orientation of the above. The proton beam of claim 1, wherein the at least one processor is configured to change the time profile of the electromagnetic radiation beam by changing the timing of one or more laser pump sources. The system to generate. The electromagnetic radiation source is configured to generate a main pulse and a pre-pulse, and the at least one processor is between the proton beam and the electromagnetic radiation beam indicated in the received feedback signal. The system for generating a proton beam according to claim 1, which is configured to control the timing of the prepulse based on the above relationship. A system that generates proton beams,
With an interaction chamber configured to support the ion generation target,
With an electromagnetic radiation source configured to provide an electromagnetic radiation beam,
With one or more optics components configured to direct the electromagnetic radiation beam to the ion-generating target, thereby producing the resulting proton beam.
A detector configured to measure at least one laser-target interaction property, wherein the laser-target interaction property includes a secondary electron emission property.
At least one processor
Receiving a feedback signal based on the at least one laser-target interaction property measured by the detector, the feedback signal indicates a relationship between the proton beam and the electromagnetic radiation beam. To receive and
Based on the received feedback signal, the following: (A) the electromagnetic radiation source, (B) the one or more optics components, (C) the relative position of the electromagnetic radiation beam with respect to the ion generation target and A system comprising at least one processor configured to do so to change the proton beam by adjusting at least one item of orientation. It ’s a way to generate a proton beam,
To generate an electromagnetic radiation beam and
To guide the electromagnetic radiation beam to an ion generation target, thereby producing the resulting proton beam.
Measuring at least one laser-target interaction property with a detector,
Receiving a feedback signal based on the at least one laser-target interaction property measured by the detector, the feedback signal indicates a relationship between the proton beam and the electromagnetic radiation beam. To receive and
Based on the received feedback signal, the following: (A) the electromagnetic radiation source, (B) one or more optics components, (C) the relative position and orientation of the electromagnetic radiation beam with respect to the ion generation target. Including changing the proton beam by adjusting at least one item of at least one.
Changing the proton beam is the relationship between the proton beam and the electromagnetic radiation beam indicated in the received feedback signal by changing the timing of one or more laser pump sources. A method comprising modifying the time profile of the electromagnetic radiation beam based on. Measuring the at least one laser-target interaction property includes the following categories: (A) proton beam property, (B) secondary electron emission property, (C) X-ray emission property, (D) electromagnetic radiation. 16. The method of claim 16, comprising measuring at least one element of the energy spectrum. 16. The method of claim 16, wherein changing the time profile of the electromagnetic radiation beam is achieved by changing the chirp of the electromagnetic radiation beam.