KR20200035829A - Adhesive composition - Google Patents
Adhesive composition Download PDFInfo
- Publication number
- KR20200035829A KR20200035829A KR1020190047779A KR20190047779A KR20200035829A KR 20200035829 A KR20200035829 A KR 20200035829A KR 1020190047779 A KR1020190047779 A KR 1020190047779A KR 20190047779 A KR20190047779 A KR 20190047779A KR 20200035829 A KR20200035829 A KR 20200035829A
- Authority
- KR
- South Korea
- Prior art keywords
- meth
- weight
- pressure
- sensitive adhesive
- parts
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 92
- 239000000853 adhesive Substances 0.000 title claims abstract description 55
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 55
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 48
- 239000002216 antistatic agent Substances 0.000 claims abstract description 30
- 150000008040 ionic compounds Chemical class 0.000 claims abstract description 15
- 239000002313 adhesive film Substances 0.000 claims abstract description 14
- 238000002844 melting Methods 0.000 claims abstract description 11
- 230000008018 melting Effects 0.000 claims abstract description 11
- 150000001450 anions Chemical class 0.000 claims abstract description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims abstract description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims abstract description 6
- NQRYJNQNLNOLGT-UHFFFAOYSA-O Piperidinium(1+) Chemical compound C1CC[NH2+]CC1 NQRYJNQNLNOLGT-UHFFFAOYSA-O 0.000 claims abstract description 6
- WTKZEGDFNFYCGP-UHFFFAOYSA-O Pyrazolium Chemical compound C1=CN[NH+]=C1 WTKZEGDFNFYCGP-UHFFFAOYSA-O 0.000 claims abstract description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-O Pyrrolidinium ion Chemical compound C1CC[NH2+]C1 RWRDLPDLKQPQOW-UHFFFAOYSA-O 0.000 claims abstract description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000001768 cations Chemical class 0.000 claims abstract description 6
- ZRALSGWEFCBTJO-UHFFFAOYSA-O guanidinium Chemical compound NC(N)=[NH2+] ZRALSGWEFCBTJO-UHFFFAOYSA-O 0.000 claims abstract description 6
- 125000005462 imide group Chemical group 0.000 claims abstract description 6
- YNAVUWVOSKDBBP-UHFFFAOYSA-O morpholinium Chemical compound [H+].C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-O 0.000 claims abstract description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 claims abstract description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 claims abstract description 6
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims abstract description 6
- JUHDUIDUEUEQND-UHFFFAOYSA-N methylium Chemical compound [CH3+] JUHDUIDUEUEQND-UHFFFAOYSA-N 0.000 claims abstract description 5
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 106
- 239000010408 film Substances 0.000 claims description 102
- 239000010410 layer Substances 0.000 claims description 83
- -1 trifluoromethanesulfonate anion Chemical class 0.000 claims description 71
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 53
- 150000001875 compounds Chemical class 0.000 claims description 48
- 239000000178 monomer Substances 0.000 claims description 43
- 238000004132 cross linking Methods 0.000 claims description 26
- 239000013522 chelant Substances 0.000 claims description 25
- 230000001681 protective effect Effects 0.000 claims description 22
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 21
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 229920001577 copolymer Polymers 0.000 claims description 20
- 239000012790 adhesive layer Substances 0.000 claims description 18
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 18
- 239000003431 cross linking reagent Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 15
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 15
- 229920002554 vinyl polymer Polymers 0.000 claims description 15
- 150000002222 fluorine compounds Chemical class 0.000 claims description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 14
- 239000011241 protective layer Substances 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 12
- 239000012298 atmosphere Substances 0.000 claims description 12
- 238000011109 contamination Methods 0.000 claims description 11
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 230000003373 anti-fouling effect Effects 0.000 claims description 8
- 239000012788 optical film Substances 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000009477 glass transition Effects 0.000 claims description 4
- 239000012948 isocyanate Substances 0.000 claims description 4
- 239000011342 resin composition Substances 0.000 claims description 4
- MMEJYPZZFYTVLJ-WAYWQWQTSA-N (z)-2-(2-prop-2-enoyloxyethyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\CCOC(=O)C=C MMEJYPZZFYTVLJ-WAYWQWQTSA-N 0.000 claims description 3
- NQUXRXBRYDZZDL-UHFFFAOYSA-N 1-(2-prop-2-enoyloxyethyl)cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1(CCOC(=O)C=C)C(O)=O NQUXRXBRYDZZDL-UHFFFAOYSA-N 0.000 claims description 3
- PWMLMBQHHBLIQM-UHFFFAOYSA-N 1-(3-prop-2-enoyloxypropyl)cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1(CCCOC(=O)C=C)C(O)=O PWMLMBQHHBLIQM-UHFFFAOYSA-N 0.000 claims description 3
- IEQWWMKDFZUMMU-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethyl)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)CCOC(=O)C=C IEQWWMKDFZUMMU-UHFFFAOYSA-N 0.000 claims description 3
- YDRQKFSCVSLQKI-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethyl)cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1(CCOC(=O)C=C)C(O)=O YDRQKFSCVSLQKI-UHFFFAOYSA-N 0.000 claims description 3
- UXTGJIIBLZIQPK-UHFFFAOYSA-N 3-(2-prop-2-enoyloxyethyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(CCOC(=O)C=C)=C1C(O)=O UXTGJIIBLZIQPK-UHFFFAOYSA-N 0.000 claims description 3
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 claims description 3
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 claims description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 3
- 239000000126 substance Substances 0.000 abstract description 6
- GKNWQHIXXANPTN-UHFFFAOYSA-M 1,1,2,2,2-pentafluoroethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-M 0.000 abstract 1
- 239000004971 Cross linker Substances 0.000 abstract 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 17
- 229920002284 Cellulose triacetate Polymers 0.000 description 14
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 238000004381 surface treatment Methods 0.000 description 9
- 239000004721 Polyphenylene oxide Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229920000570 polyether Polymers 0.000 description 7
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 239000004014 plasticizer Substances 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 238000010998 test method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 125000002015 acyclic group Chemical group 0.000 description 4
- 150000002148 esters Chemical group 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229920006243 acrylic copolymer Polymers 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- VOQYJODKNTZYEA-UHFFFAOYSA-M 2-methyl-1-octylpyridin-1-ium trifluoromethanesulfonate Chemical compound FC(S(=O)(=O)[O-])(F)F.C(CCCCCCC)[N+]1=C(C=CC=C1)C VOQYJODKNTZYEA-UHFFFAOYSA-M 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 150000001718 carbodiimides Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001610 polycaprolactone Polymers 0.000 description 2
- 239000004632 polycaprolactone Substances 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- XPBZJPYTVNYDNV-UHFFFAOYSA-M 1,1,2,2,2-pentafluoroethanesulfonate 1,2,3-trimethylimidazol-1-ium Chemical compound FC(C(S(=O)(=O)[O-])(F)F)(F)F.C[N+]1=C(N(C=C1)C)C XPBZJPYTVNYDNV-UHFFFAOYSA-M 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- KSOGGGZFEJTGPZ-UHFFFAOYSA-M 1-butyl-2,3-dimethylimidazol-3-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+]=1C=CN(C)C=1C KSOGGGZFEJTGPZ-UHFFFAOYSA-M 0.000 description 1
- QAHXJAJZOWWYEV-UHFFFAOYSA-M 1-hexyl-4-methylpyridin-1-ium 1,1,2,2,2-pentafluoroethanesulfonate Chemical compound FC(C(S(=O)(=O)[O-])(F)F)(F)F.C(CCCCC)[N+]1=CC=C(C=C1)C QAHXJAJZOWWYEV-UHFFFAOYSA-M 0.000 description 1
- PAAKYHOZGRVXDW-UHFFFAOYSA-M 1-octylpyridin-1-ium;trifluoromethanesulfonate Chemical class [O-]S(=O)(=O)C(F)(F)F.CCCCCCCC[N+]1=CC=CC=C1 PAAKYHOZGRVXDW-UHFFFAOYSA-M 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- JSCDRVVVGGYHSN-UHFFFAOYSA-N 8-hydroxyoctyl prop-2-enoate Chemical compound OCCCCCCCCOC(=O)C=C JSCDRVVVGGYHSN-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- KCHWKBCUPLJWJA-UHFFFAOYSA-N dodecyl 3-oxobutanoate Chemical compound CCCCCCCCCCCCOC(=O)CC(C)=O KCHWKBCUPLJWJA-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010556 emulsion polymerization method Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- PFPFCUBRZNXVTG-UHFFFAOYSA-N fluoroform 3-methyl-1-octylpyridin-1-ium Chemical compound FC(F)F.C(CCCCCCC)[N+]1=CC(=CC=C1)C PFPFCUBRZNXVTG-UHFFFAOYSA-N 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BMOMBHKAYGMGCR-UHFFFAOYSA-N octadecyl 3-oxobutanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CC(C)=O BMOMBHKAYGMGCR-UHFFFAOYSA-N 0.000 description 1
- IKYDDBGYKFPTGF-UHFFFAOYSA-N octyl 3-oxobutanoate Chemical compound CCCCCCCCOC(=O)CC(C)=O IKYDDBGYKFPTGF-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical group 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/255—Polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/017—Additives being an antistatic agent
-
- C09J2201/622—
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/122—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/006—Presence of polyester in the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
본 발명은 대전 방지제를 함유하는 점착제 조성물 및 그것을 사용한 점착 필름, 표면 보호 필름에 관한 것이다. 보다 상세하게는, 저속 박리 속도 및 고속 박리 속도에 있어서, 밸런스가 잡힌 점착력을 갖는 등 우수한 점착 성능과 함께, 대전 방지 성능과 내오염 성능의 양립을 도모하는 것이 가능한 점착제 조성물 및 그것을 사용한 점착 필름, 표면 보호 필름을 제공하는 것에 관한 것이다.The present invention relates to an adhesive composition containing an antistatic agent, an adhesive film using the same, and a surface protection film. More specifically, at a low-speed peeling speed and a high-speed peeling speed, an adhesive composition capable of achieving both antistatic performance and fouling resistance performance together with excellent adhesive performance such as having a balanced adhesive force, and an adhesive film using the adhesive composition, It relates to providing a surface protection film.
종래부터, 액정 디스플레이를 구성하는 부재인 편광판 등의 광학 부재의 제조 공정에 있어서는, 광학 부재의 표면을 일시적으로 보호하기 위한 표면 보호 필름이 첩합된다. 이러한 표면 보호 필름은 광학 부재를 제조하는 공정에만 사용되고, 광학 부재를 액정 디스플레이에 장착하는 시점에 광학 부재로부터 박리하여 제거된다. 이러한 광학 부재의 표면을 보호하기 위한 표면 보호 필름은 광학 부재의 제조 공정에 있어서만 사용되기 때문에, 일반적으로 공정 필름으로 불리는 경우도 있다.Conventionally, in the manufacturing process of an optical member, such as a polarizing plate, which is a member constituting a liquid crystal display, a surface protection film for temporarily protecting the surface of the optical member is pasted. This surface protection film is used only in the process of manufacturing the optical member, and is removed by peeling from the optical member at the time of attaching the optical member to the liquid crystal display. Since the surface protection film for protecting the surface of such an optical member is used only in the manufacturing process of an optical member, it may be called a process film in general.
이와 같이 광학 부재를 제조하는 공정에 있어서 사용되는 표면 보호 필름은 광학적으로 투명성을 갖는 폴리에틸렌테레프탈레이트(PET) 수지 필름의 한쪽 면에 점착제층이 형성되어 있다. 표면 보호 필름은 광학 부재에 첩합시킬 때까지 그 점착제층을 보호하기 위해, 이형 처리된 이형 필름이 점착제층의 표면에 첩합되어 있다.In this way, the surface protection film used in the process of manufacturing the optical member is provided with an adhesive layer on one side of a polyethylene terephthalate (PET) resin film having optical transparency. In order to protect the pressure-sensitive adhesive layer until the surface protection film is pasted to the optical member, the release film subjected to the release treatment is pasted on the surface of the pressure-sensitive adhesive layer.
그리고, 편광판 등의 광학 부재는 표면 보호 필름이 첩합된 상태로 액정 표시판의 표시 능력, 색상, 콘트라스트, 이물질 혼입 등의 광학적 평가를 수반하는 제품 검사를 받는다. 이 때문에, 표면 보호 필름에 대한 요구 성능으로는 점착제층에 기포나 이물질 및 점착제 조성물의 저분자량 성분이 부착되어 있지 않은 것, 즉 내오염 성능을 갖는 것이 요구되고 있다.Then, an optical member such as a polarizing plate is subjected to a product inspection that involves optical evaluation such as display ability, color, contrast, foreign matter mixing, etc. of the liquid crystal display panel while the surface protection film is stuck. For this reason, as the required performance for the surface protective film, it is required that air bubbles, foreign substances, and low-molecular-weight components of the pressure-sensitive adhesive composition are not adhered to the pressure-sensitive adhesive layer, that is, have contamination resistance.
또한, 편광판 등의 광학 부재로부터 표면 보호 필름을 박리할 때, 점착제층과 피착체가 박리될 때 발생하는 정전기에 수반하여 생기는 박리 대전이 액정 디스플레이의 전기 제어 회로의 고장에 영향을 주는 것이 염려된다. 이 때문에, 표면 보호 필름의 점착제층은 우수한 대전 방지 성능을 갖는 것이 요구되고 있다.In addition, when peeling the surface protection film from an optical member such as a polarizing plate, it is feared that peeling charges generated by static electricity generated when the pressure-sensitive adhesive layer and the adherend peel off affect the failure of the electric control circuit of the liquid crystal display. For this reason, the pressure-sensitive adhesive layer of the surface protection film is required to have excellent antistatic performance.
나아가, 근래에는 편광판의 편광자 보호층(보호 필름으로 불리는 경우도 있다)으로서, 종래 사용되고 있는 트리아세틸셀룰로오스(TAC) 이외에 폴리메틸메타크릴레이트(PMMA) 등의 아크릴계 수지, 폴리에틸렌테레프탈레이트(PET) 등의 폴리에스테르계 수지, 고리형 올레핀계 폴리머, 폴리카보네이트 등의, 편광판의 표면 보호 필름을 박리할 때 박리 대전을 일으키기 쉬운 재료의 채용이 확대되고 있다. 이 때문에, 편광판의 표면 보호 필름용 점착제층에 요구되는 대전 방지 성능이 종래에 비해 우수한 것이 필요로 되고 있다.Furthermore, in recent years, as a polarizer protective layer (sometimes referred to as a protective film) of a polarizing plate, in addition to conventionally used triacetyl cellulose (TAC), acrylic resins such as polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), etc. The use of materials that are liable to cause peeling electrification when peeling the surface protective film of the polarizing plate, such as polyester-based resins, cyclic olefin polymers, and polycarbonates, is expanding. For this reason, it is required that the antistatic performance required for the pressure-sensitive adhesive layer for the surface protective film of the polarizing plate is superior to that of the prior art.
또한, 최종적으로 편광판 등의 광학 부재에서 표면 보호 필름을 박리할 때는 신속하게 박리할 수 있는 것이 요구되고 있다. 이른바, 고속 박리에 의해서도 신속하게 박리할 수 있도록, 점착력이 박리 속도에 의해 변화가 적은 것이 요구되고 있다.Moreover, when peeling a surface protection film from an optical member, such as a polarizing plate, finally, it is calculated | required that it can peel quickly. So-called peeling force is required to have little change in peeling speed due to peeling speed so that peeling can be performed quickly even by high-speed peeling.
이와 같이, 근래에는 표면 보호 필름을 구성하는 점착제층에 대해, (1) 저속 박리 속도 및 고속 박리 속도에 있어서 점착력의 밸런스를 갖는 것, (2) 내오염 성능을 갖는 것, (3) 우수한 대전 방지 성능을 갖는 것 등이 표면 보호 필름을 사용함에 있어서의 사용 용이성의 점에서 요구되고 있다.As described above, in recent years, with respect to the pressure-sensitive adhesive layer constituting the surface protection film, (1) having a balance of adhesion at low-speed peeling speed and high-speed peeling speed, (2) having fouling resistance, (3) excellent charging What has a preventive performance etc. is calculated | required from the point of the ease of use in using a surface protection film.
그러나, 표면 보호 필름을 구성하는 점착제층에 대한 요구 성능에 대해, 이들 (1)∼(3)의 개개의 요구 성능을 각각 만족시킬 수는 있더라도, 표면 보호 필름의 점착제층에 요구되는 (1)∼(3)의 요구 성능을 전부 동시에 만족시키는 것은 매우 곤란한 과제였다.However, with respect to the required performance for the pressure-sensitive adhesive layer constituting the surface protection film, although the respective required performance of (1) to (3) can be satisfied, (1) required for the pressure-sensitive adhesive layer of the surface protection film It was a very difficult task to satisfy all of the required performances of (3) at the same time.
이러한 과제를 해결하기 위해, 예를 들면, (1) 저속 박리 속도 및 고속 박리 속도에 있어서 점착력의 밸런스를 갖는 것, (2) 내오염 성능을 갖는 것, (3) 우수한 대전 방지 성능을 갖는 것에 대해서는 각각 다음과 같은 제안이 알려져 있다.In order to solve such a problem, for example, (1) having a balance of adhesion in low-speed peeling speed and high-speed peeling speed, (2) having fouling resistance, and (3) having excellent antistatic performance For each, the following proposals are known.
(1) 저속 박리 속도 및 고속 박리 속도에 있어서 점착력의 밸런스를 갖는 것에 관해서는, 탄소수가 7 이하인 알킬기를 갖는 (메타)아크릴산알킬에스테르와 카르복실기 함유 공중합성 화합물의 공중합체를 주성분으로 하고, 이를 가교제로 가교 처리하여 이루어지는 아크릴계의 점착제층에서는, 장기간 접착했을 경우에 점착제의 피착체측으로의 이착이 발생하고, 또한 피착체에 대한 접착력의 경시 상승성이 크다는 문제가 있었다. 이를 회피하기 위해, 탄소수가 8∼10인 알킬기를 갖는 (메타)아크릴산알킬에스테르와 알코올성 수산기를 갖는 공중합성 화합물의 공중합체를 사용하고, 이를 가교제로 가교 처리한 점착제층을 형성한 것이 알려져 있다(특허문헌 1).(1) Regarding having a balance of adhesive strength at a low-speed peeling speed and a high-speed peeling speed, a copolymer of a (meth) acrylic acid alkyl ester having an alkyl group having 7 or less carbon atoms and a carboxyl group-containing copolymerizable compound is a main component, and this is a crosslinking agent. In the acrylic pressure-sensitive adhesive layer formed by crosslinking with, there is a problem that, when adhered for a long period of time, adhesion of the pressure-sensitive adhesive to the adherend side occurs, and the synergism of the adhesive force with respect to the adherend is large. To avoid this, it is known to use a copolymer of a (meth) acrylic acid alkyl ester having an alkyl group having 8 to 10 carbon atoms and a copolymerizable compound having an alcoholic hydroxyl group, and to form an adhesive layer cross-linked with a crosslinking agent ( Patent Document 1).
또한, 상기와 동일한 공중합체에 (메타)아크릴산알킬에스테르와 카르복실기 함유 공중합성 화합물의 공중합체를 소량 배합하고, 이를 가교제로 가교 처리한 점착제층을 형성한 것 등이 제안되어 있다. 그러나, 이들은 표면 장력이 낮아서 표면이 평활한 플라스틱판 등의 표면 보호용으로 사용하면, 가공시나 보존시의 가열에 의해 들뜸 등의 박리 현상을 발생시키는 문제나, 수작업 영역인 고속에서의 박리시의 재박리성이 열악하다는 문제도 있었다.In addition, a small amount of a copolymer of a copolymer of a (meth) acrylic acid alkyl ester and a carboxyl group-containing copolymerizable compound is prepared in the same copolymer as described above, and a crosslinked adhesive layer has been proposed. However, these are used for protecting surfaces such as a plastic plate having a smooth surface due to low surface tension, causing problems such as exfoliation due to heating during processing or preservation, or ashing at high speed, which is a manual work area. There was also a problem that the peelability was poor.
이들 문제를 해결하기 위해, a) 탄소수가 8∼10인 알킬기를 갖는 (메타)아크릴산알킬에스테르를 주성분으로 하는 (메타)아크릴산알킬에스테르 100중량부에, b) 카르복실기 함유 공중합성 화합물 1∼15중량부와, c) 탄소수가 1∼5인 지방족 카르복실산의 비닐에스테르 3∼100중량부를 첨가하여 이루어지는 단량체 혼합물의 공중합체에, 상기 b) 성분의 카르복실기에 대해 당량 이상의 가교제를 배합한 점착제 조성물이 제안되어 있다(특허문헌 2).In order to solve these problems, a) 100 parts by weight of (meth) acrylic acid alkyl ester mainly composed of (meth) acrylic acid alkyl ester having an alkyl group having 8 to 10 carbon atoms, b) 1 to 15 weight of carboxyl-containing copolymerizable compound A pressure-sensitive adhesive composition containing a crosslinking agent equal to or greater than the equivalent of the carboxyl group of the component b) in a copolymer of a monomer mixture comprising parts and c) 3 to 100 parts by weight of a vinyl ester of an aliphatic carboxylic acid having 1 to 5 carbon atoms It has been proposed (Patent Document 2).
특허문헌 2에 기재된 점착제 조성물에서는 가공시나 보존시에 있어서 들뜸 등의 박리 현상을 발생시키는 경우가 없고, 또한 접착력의 경시 상승이 작아 재박리성이 우수하며, 장기 보존, 특히 고온 분위기하에서 장기 보존해도 작은 힘으로 재박리할 수 있고, 그 때 피착체 상에 점착제 잔여물을 발생시키지 않으며, 또한 고속 박리를 행했을 때에도 작은 힘으로 재박리할 수 있다고 되어 있다.In the pressure-sensitive adhesive composition described in Patent Literature 2, there is no occurrence of peeling phenomenon such as excitation during processing or storage, and the rise in adhesive strength over time is small, resulting in excellent removability, and long-term storage, especially long-term storage under a high temperature atmosphere It is said that it can be peeled off with a small force, does not generate an adhesive residue on the adherend at that time, and can be peeled off with a small force even when high-speed peeling is performed.
그러나, 특허문헌 2에 기재된 점착제 조성물에서는 실시예 1∼3에 있어서의 점착제층의 겔분율이 90%라는 점에서, 공중합체로부터 미중합 모노머 혹은 올리고머가 용출되기 쉽다. 또한, 특허문헌 2에는 대전 방지 성능 및 내오염 성능에 관한 기재는 없으며, 박리 대전을 일으키기 쉬운 재료를 피착체로 한 경우 우수한 대전 방지 성능 및 내오염 성능을 구비한 점착제층으로 하는 것이 곤란하다는 문제가 있었다.However, in the pressure-sensitive adhesive composition described in Patent Document 2, since the gel fraction of the pressure-sensitive adhesive layers in Examples 1 to 3 is 90%, unpolymerized monomers or oligomers are easily eluted from the copolymer. In addition, Patent Document 2 does not describe the antistatic performance and the anti-pollution performance, and it is difficult to form a pressure-sensitive adhesive layer having excellent anti-static and anti-pollution performance when a material that is prone to peeling electrification is used as an adherend. there was.
또한, (2) 내오염 성능을 갖는 것에 대해서는, 0질량부 이상 0.5질량부 미만의 카르복실기 함유 모노머, 0.6∼9질량부의 히드록시기 함유 (메타)아크릴계 모노머 및 99.4∼90.5질량부의 (메타)아크릴산에스테르 모노머로 이루어지고, 중량 평균 분자량이 10만 이상 100만 미만인 (메타)아크릴계 공중합체 100질량부; 및 카르보디이미드계 가교제 0.1∼5질량부를 포함하는 점착제 조성물이 개시되어 있다(특허문헌 3).Moreover, as for (2) having pollution resistance, 0 mass parts or more and less than 0.5 mass parts of carboxyl group-containing monomers, 0.6-9 mass parts of hydroxy group-containing (meth) acrylic monomers, and 99.4-90.5 mass parts of (meth) acrylic acid ester monomers 100 parts by weight of a (meth) acrylic copolymer having a weight average molecular weight of 100,000 or more and less than 1 million; And an adhesive composition comprising 0.1 to 5 parts by mass of a carbodiimide-based crosslinking agent (Patent Document 3).
특허문헌 3에 기재된 점착제 조성물에서는 특정 조성의 (메타)아크릴계 공중합체의 가교제로서 카르보디이미드계 가교제를 사용하는 것을 특징으로 한다. 이로 인해, 점착제층에 오토클레이브 처리시의 압력 및 온도에 의한 수축에 추종할 수 있는 가교 구조를 형성할 수 있다. 이 때문에, 특허문헌 3에 기재된 점착제 조성물을 사용하여 형성된 점착제층은 고온·고압 조건하(오토클레이브 처리시)여도 발포를 억제·방지할 수 있고, 내오염 성능이 우수하며, 또한 투명성도 우수하다고 되어 있다.In the pressure-sensitive adhesive composition described in Patent Document 3, a carbodiimide-based crosslinking agent is used as a crosslinking agent for a (meth) acrylic copolymer having a specific composition. For this reason, it is possible to form a crosslinked structure in the pressure-sensitive adhesive layer that can follow shrinkage due to pressure and temperature during autoclave treatment. For this reason, the pressure-sensitive adhesive layer formed using the pressure-sensitive adhesive composition described in Patent Literature 3 can suppress and prevent foaming even under high temperature and high pressure conditions (at the time of autoclave treatment), and has excellent stain resistance and excellent transparency. It is done.
그러나, 특허문헌 3에 기재된 점착제 조성물에서는 내오염 성능이 개량되어 있으나, 우수한 점착 성능과 함께 대전 방지 성능을 양립시키는 것은 실현시키지 못하였으며, 추가로 해결해야 할 과제로서 남아 있다.However, in the pressure-sensitive adhesive composition described in Patent Document 3, the stain resistance performance is improved, but it is not possible to realize that the anti-static performance is compatible with the excellent adhesion performance, and it remains as a further problem to be solved.
또한, (3) 우수한 대전 방지 성능을 갖는 것에 대해서는, 표면 보호 필름에 대전 방지성을 부여시키기 위한 방법으로서, 기재 필름에 대전 방지제를 혼입시키는 방법 등이 알려져 있다. 대전 방지제로는, 예를 들면, (a) 제4급 암모늄염, 피리디늄염, 제1∼3급 아미노기 등의 양이온성기를 갖는 각종 양이온성 대전 방지제, (b) 술폰산염기, 황산에스테르염기, 인산에스테르염기, 포스폰산염기 등의 음이온성기를 갖는 음이온성 대전 방지제, (c) 아미노산계, 아미노황산에스테르계 등의 양쪽성 대전 방지제, (d) 아미노알코올계, 글리세린계, 폴리에틸렌글리콜계 등의 비이온성 대전 방지제, (e) 상기와 같은 대전 방지제를 고분자량화한 고분자형 대전 방지제 등이 개시되어 있다(특허문헌 4).In addition, as for the method having (3) excellent antistatic performance, as a method for imparting antistatic property to the surface protective film, a method of incorporating an antistatic agent in a base film is known. As the antistatic agent, for example, (a) various cationic antistatic agents having cationic groups such as quaternary ammonium salts, pyridinium salts and primary to tertiary amino groups, (b) sulfonate groups, sulfate ester bases, phosphoric acid Anionic antistatic agents having anionic groups such as ester bases and phosphonate groups, (c) amphoteric antistatic agents such as amino acid-based and aminosulfuric acid ester-based, (d) ratios of amino alcohol-based, glycerin-based, polyethylene glycol-based An ionic antistatic agent, (e) a polymer antistatic agent having a high molecular weight of the antistatic agent as described above, and the like are disclosed (Patent Document 4).
그러나, 특허문헌 4에 기재된 표면 보호 필름에 있어서는 피착체에 대한 이물질 부착에 관련된 대전 방지 성능의 부여에 관한 기재는 있지만, 우수한 점착 성능과 함께 내오염 성능을 양립시키는 수단은 기재되어 있지 않으며, 추가로 해결해야 할 과제로서 남아 있다.However, in the surface protection film described in Patent Document 4, although there is a description regarding imparting antistatic performance related to adhesion of foreign substances to an adherend, means for achieving both excellent adhesion performance and fouling resistance are not described. It remains as a task to be solved.
또한, 근래에는 기재 필름에 대전 방지제를 함유시키거나, 혹은 기재 필름의 표면에 도포하지 않고 직접 점착제층에 대전 방지제를 함유시키는 것이 제안되어 있다. 예를 들면, 플루오로기 및 술포닐기를 갖는 음이온을 구비한 염이 폴리에테르기를 주쇄 중에 포함하는 폴리에테르에스테르계 가소제에 용해된 상태로 분산되어 있는 것을 특징으로 하는 제전성 점착제 조성물이 개시되어 있다(특허문헌 5).In addition, in recent years, it has been proposed to contain an antistatic agent in the base film, or to include an antistatic agent in the pressure-sensitive adhesive layer directly without being applied to the surface of the base film. For example, an antistatic pressure-sensitive adhesive composition is disclosed, wherein a salt having an anion having a fluoro group and a sulfonyl group is dispersed in a state dissolved in a polyether ester plasticizer containing a polyether group in the main chain. (Patent Document 5).
특허문헌 5에 기재된 점착제 조성물에서는 가소제로서 포화 또는 불포화 비고리형 탄화수소기를 갖는 모노 또는 디카르복실산과, 탄소수 1∼20의 비고리형 탄화수소기를 갖는 알코올로 형성되는 에스테르, 혹은, 상기 불포화 비고리형 탄화수소기 중의 불포화기가 에폭시화된 에스테르로 이루어지는 가소제를 사용하는 것이 개시되어 있다. 이러한 포화 또는 불포화 비고리형 탄화수소기를 갖는 모노 또는 디카르복실산은 점착제층에 사용되는 아크릴계 공중합체를 구성하는 아크릴 단량체의 탄소수와 근접한 탄소수를 가짐으로써, 제전성 점착제 조성물에 있어서의 상용성이 양호해지고, 가소제 아크릴계 제전성 점착제 조성물 중에 가소제가 바람직하게 유지되기 때문에, 블리드 아웃이 억제되다고 되어 있다.In the pressure-sensitive adhesive composition described in Patent Literature 5, an ester formed of a mono or dicarboxylic acid having a saturated or unsaturated acyclic hydrocarbon group as a plasticizer, and an alcohol having an acyclic hydrocarbon group having 1 to 20 carbon atoms, or in the unsaturated acyclic hydrocarbon group It has been disclosed to use plasticizers consisting of esters in which the unsaturated groups are epoxidized. The mono or dicarboxylic acid having such a saturated or unsaturated acyclic hydrocarbon group has a carbon number close to the carbon number of the acrylic monomer constituting the acrylic copolymer used in the pressure-sensitive adhesive layer, thereby improving compatibility in the antistatic adhesive composition, Since the plasticizer is preferably retained in the plasticizer acrylic antistatic adhesive composition, it is said that bleed-out is suppressed.
그러나, 특허문헌 5에 기재된 제전성 점착제 조성물에 있어서는 대전 방지 성능 및 블리드 아웃의 개량 기술의 개시는 있으나, 저속 박리 속도 및 고속 박리 속도에 있어서의 점착력의 밸런스 등 점착 성능이 우수한 것이 얻어지는 점의 기재는 없고, 우수한 점착 성능을 갖는 점착제 조성물을 얻는다는 과제가 남아 있다.However, the antistatic pressure-sensitive adhesive composition described in Patent Document 5 discloses that antistatic performance and bleed-out improvement techniques are disclosed, but excellent adhesion performance such as balance of low-speed peeling speed and high-speed peeling power is obtained. There is no, and there remains a problem of obtaining an adhesive composition having excellent adhesive performance.
상기와 같이, 표면 보호 필름을 구성하는 점착제층에 대해, (1) 저속 박리 속도 및 고속 박리 속도에 있어서 점착력의 밸런스를 갖는 것, (2) 내오염 성능을 갖는 것, (3) 우수한 대전 방지 성능을 갖는 것을 동시에 해결하는 종래 기술은 찾을 수 없다.As described above, with respect to the pressure-sensitive adhesive layer constituting the surface protective film, (1) having a balance of adhesion at low-speed peeling speed and high-speed peeling speed, (2) having fouling resistance, (3) excellent antistatic No prior art can be found that solves simultaneously having performance.
또한, 종래부터 대전 방지 성능을 구비한 점착제 조성물을 사용하여 형성한 점착제층 및 그것을 사용한 표면 보호 필름에 있어서, 대전 방지 성능과 피착체에 대한 내오염 성능은 트레이드 오프의 관계이며, 대전 방지 성능을 유지한 채로 내오염 성능을 개선하는 것은 곤란했다.In addition, in the pressure-sensitive adhesive layer formed using a pressure-sensitive adhesive composition having antistatic performance and a surface protection film using the same, the antistatic performance and the fouling resistance to the adherend are a trade-off relationship, and the antistatic performance It was difficult to improve the stain resistance performance while maintaining it.
나아가 근래에는 표면 보호 필름이 첩합되는 피착체 재질의 종류가 증가하였으며, 또한, 피착체의 표면 처리도 다방면에 걸치기 때문에, 모든 피착체에 대해 내오염 성능과 대전 방지 성능을 동시에 발현시키는 것이 더욱 어려워지고 있다.Furthermore, in recent years, the types of adherend materials to which the surface protective film is bonded have increased, and since the surface treatment of adherends is also multifaceted, it is more difficult to simultaneously express the anti-pollution and anti-static properties for all adherends. ought.
본 발명은 상기 사정을 감안하여 이루어진 것이며, 저속 박리 속도 및 고속 박리 속도에 있어서 밸런스가 잡힌 점착력을 갖는 등 우수한 점착 성능과 함께, 대전 방지 성능과 내오염 성능의 양립을 도모하는 것이 가능한 점착제 조성물 및 그것을 사용한 점착 필름, 표면 보호 필름을 제공하는 것을 과제로 한다.The present invention has been made in view of the above circumstances, and an adhesive composition capable of achieving both antistatic performance and fouling resistance performance together with excellent adhesive performance such as having a balanced adhesive force in a low-speed peeling speed and a high-speed peeling speed, and An object is to provide an adhesive film and a surface protection film using the same.
본 발명의 발명자들은 대전 방지제로서, 융점 25∼80℃의 트리플루오로메탄술포네이트 음이온 또는 펜타플루오로에탄술포네이트 음이온을 갖는 실온에서 고체상인 이온성 화합물을 함유하는 점착제 조성물이, 피착체에 대해 대전 방지 성능과 내오염 성능을 동시에 발현할 수 있다는 것을 알아내어, 본 발명을 완성하기에 이르렀다.The inventors of the present invention, as an antistatic agent, a pressure-sensitive adhesive composition containing an ionic compound that is a solid phase at room temperature with a trifluoromethanesulfonate anion or a pentafluoroethanesulfonate anion having a melting point of 25 to 80 ° C. It has been found that the antistatic performance and the pollution resistance performance can be simultaneously expressed, and the present invention has been completed.
본 발명의 대전 방지제로서, 융점 25∼80℃의 피리디늄, 이미다졸륨, 포스포늄, 술포늄, 피롤리디늄, 구아니디늄, 암모늄, 이소우로늄, 티오우로늄, 피페리디늄, 피라졸륨, 메틸륨, 모르폴리늄으로 이루어지는 군으로부터 선택한 1종의 양이온, 및 트리플루오로메탄술포네이트 음이온 또는 펜타플루오로에탄술포네이트 음이온을 갖는 실온에서 고체상인 이온성 화합물을 함유하는 점착제 조성물 및 그것을 사용한 점착 필름, 표면 보호 필름은 우수한 점착 성능과 함께, 대전 방지 성능과 내오염 성능의 양립을 실현할 수 있으며, 종래 기술의 과제를 해결한 것이다.As an antistatic agent of the present invention, pyridinium, imidazolium, phosphonium, sulfonium, pyrrolidinium, guanidinium, ammonium, isouronium, thiouronium, piperidinium, pyrazolium having a melting point of 25 to 80 ° C , A pressure-sensitive adhesive composition containing an ionic compound that is a solid phase at room temperature with a cation selected from the group consisting of methyllium, morpholinium, and a trifluoromethanesulfonate anion or a pentafluoroethanesulfonate anion, and using the same The adhesive film and the surface protection film are capable of realizing both antistatic performance and fouling resistance performance together with excellent adhesive performance, and solve the problems of the prior art.
상기 과제를 해결하기 위해, 본 발명은 아크릴계 폴리머와, (F) 대전 방지제와, (C) 가교제를 함유하는 점착제 조성물로서, 상기 (F) 대전 방지제가 하기 화학식 (1)로 나타내는 융점 25∼80℃의 이온성 화합물이고,In order to solve the above problems, the present invention is an adhesive composition containing an acrylic polymer, (F) an antistatic agent, and (C) a crosslinking agent, wherein the (F) antistatic agent is represented by the following formula (1): ℃ is an ionic compound,
K+·A- (1)K + · A - (1)
[화학식 (1) 중, K+는 피리디늄, 이미다졸륨, 포스포늄, 술포늄, 피롤리디늄, 구아니디늄, 암모늄, 이소우로늄, 티오우로늄, 피페리디늄, 피라졸륨, 메틸륨, 모르폴리늄으로 이루어지는 군으로부터 선택한 1종의 양이온이며, A-는 이미드기를 함유하지 않는 트리플루오로메탄술포네이트 음이온, 펜타플루오로에탄술포네이트 음이온으로 이루어지는 군으로부터 선택되는 1종의 음이온이다][In the formula (1), K + is pyridinium, imidazolium, phosphonium, sulfonium, pyrrolidinium, guanidinium, ammonium, isouronium, thiuronium, piperidinium, pyrazolium, methylium , Is a type of cation selected from the group consisting of morpholinium, and A - is a type of anion selected from the group consisting of trifluoromethanesulfonate anion that does not contain an imide group, and pentafluoroethanesulfonate anion. ]
상기 아크릴계 폴리머가 유리 전이점 온도가 0℃ 이하인 아크릴계 폴리머이며, 상기 아크릴계 폴리머 100중량부에 대해, 상기 이온성 화합물을 0.01∼10중량부의 비율로 필수 성분으로서 함유하여 이루어지는 것을 특징으로 하는 점착제 조성물을 제공한다.The acrylic polymer is an acrylic polymer having a glass transition point temperature of 0 ° C. or less, and an adhesive composition comprising 100 parts by weight of the acrylic polymer containing the ionic compound as an essential component in a proportion of 0.01 to 10 parts by weight. to provide.
상기 아크릴계 폴리머가 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부에 대해, (B-1) 수산기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상의 합계를 0.01∼10중량부, 및/또는, (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상의 합계를 0.01∼0.5중량부의 비율로 공중합시킨 공중합체의 아크릴계 폴리머이고, 상기 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부 중, 이소옥틸(메타)아크릴레이트, 이소노닐(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트로 이루어지는 군으로부터 선택한 적어도 1종을 50중량부 이상의 비율로 함유하여 이루어지며, 상기 아크릴계 폴리머의 100중량부에 대해, 상기 (C) 가교제로서 3관능 이상의 이소시아네이트 화합물을 0.1∼10중량부의 비율로 함유하여 이루어지고, 상기 점착제 조성물이 추가로 (D) 금속 킬레이트 화합물의 가교 촉진제와, (E) 케토엔올 호변이성체 화합물을 함유하여 이루어지는 것이 바람직하다.At least one or more of the copolymerizable vinyl monomer containing a hydroxyl group (B-1) with respect to 100 parts by weight of the at least one or more of the (meth) acrylic acid ester monomers in which the acrylic polymer has (C) C1 to C18 of the alkyl group. A total of 0.01 to 10 parts by weight, and / or (B-2) an acrylic polymer of a copolymer obtained by copolymerizing a total of at least one of copolymerizable vinyl monomers containing a carboxyl group at a ratio of 0.01 to 0.5 parts by weight, wherein ( A) Among 100 parts by weight of at least one or more of (meth) acrylic acid ester monomers having C1 to 18 carbon atoms in the alkyl group, isooctyl (meth) acrylate, isononyl (meth) acrylate, 2-ethylhexyl (meth) acrylic It is made by containing at least one selected from the group consisting of a ratio in a proportion of 50 parts by weight or more, and with respect to 100 parts by weight of the acrylic polymer, the (C) crosslinking agent is a trifunctional or more Cyano is accomplished by containing a proportion from 0.1 to 10 parts by weight of the carbonate compound, preferably a crosslinking accelerator in the adhesive composition are added in (D) a metal chelate compound, comprising a compound all tautomeric keto Yen (E).
상기 점착제 조성물을 가교시킨 점착제층의 표면 저항률이 1.0×10+ 12Ω/□ 이하이고, 상기 점착제층의 PMMA 기재 및 TAC 기재의 표면에 불소 화합물을 함유하는 저굴절률층 형성용 수지 조성물을 사용하여 형성된 저굴절률층에 대한 박리 대전압, 및, PMMA 기재 및 TAC 기재의 표면에 아무 처리도 되어 있지 않은 플레인층에 대한 박리 대전압이 모두 ±0.3㎸ 이하이며, 상기 점착제층이 편광자에 보호층을 적층하고, 보호층의 표면이 불소 화합물을 함유하는 조성물로 저반사 표면 처리된 편광판인 피착체에 첩합 후, 온도 60℃, 습도 90%RH의 분위기하에 48hr 방치하고, 상기 분위기하로부터 꺼내어 1일 후의 내오염 성능이 상기 피착체의 표면에 대해 「오염 없음」이고, 상기 점착제층의, 상기 PMMA 기재의 표면에 실시된 상기 저굴절률층에 대한 점착력이 저속 박리 속도 0.3m/min에서의 점착력이 0.04∼0.2N/25㎜이며, 또한, 고속 박리 속도 30m/min에서의 점착력이 2.0N/25㎜ 이하인 것이 바람직하다.The resin composition for forming a low-refractive-index layer containing a fluorine compound on the surfaces of the PMMA substrate and the TAC substrate of the pressure-sensitive adhesive layer having a surface resistivity of 1.0 × 10 + 12 Ω / □ or less, wherein the pressure-sensitive adhesive layer is crosslinked, is used. The peeling voltage for the formed low-refractive-index layer, and the peeling voltage for the plain layer which has no treatment on the surfaces of the PMMA substrate and the TAC substrate are both ± 0.3 MPa or less, and the pressure-sensitive adhesive layer provides a protective layer to the polarizer. After lamination, and the surface of the protective layer was adhered to an adherend which is a polarizing plate treated with a low-reflection surface with a composition containing a fluorine compound, the mixture was left under an atmosphere of 60 ° C at a temperature of 90% RH for 48hr, taken out from the above atmosphere for 1 day. The post-pollution resistance is "no contamination" with respect to the surface of the adherend, and the adhesive strength of the pressure-sensitive adhesive layer to the low-refractive-index layer applied to the surface of the PMMA substrate is low. It is preferable that the adhesive strength at a peeling rate of 0.3 m / min is 0.04 to 0.2 N / 25 mm, and the adhesive strength at a high speed peeling speed of 30 m / min is 2.0 N / 25 mm or less.
상기 (B-1) 수산기를 함유하는 공중합성 비닐 모노머가 8-히드록시옥틸(메타)아크릴레이트, 6-히드록시헥실(메타)아크릴레이트, 4-히드록시부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, N-히드록시(메타)아크릴아미드, N-히드록시메틸(메타)아크릴아미드, N-히드록시에틸(메타)아크릴아미드로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상이고,The (B-1) copolymerizable vinyl monomer containing a hydroxyl group is 8-hydroxyoctyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2- At least one selected from the group of compounds consisting of hydroxyethyl (meth) acrylate, N-hydroxy (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, and N-hydroxyethyl (meth) acrylamide ego,
상기 (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머가 (메타)아크릴산, 카르복시에틸(메타)아크릴레이트, 카르복시펜틸(메타)아크릴레이트, 2-(메타)아크릴로일옥시에틸헥사히드로프탈산, 2-(메타)아크릴로일옥시프로필헥사히드로프탈산, 2-(메타)아크릴로일옥시에틸프탈산, 2-(메타)아크릴로일옥시에틸숙신산, 2-(메타)아크릴로일옥시에틸말레산, 카르복시폴리카프로락톤모노(메타)아크릴레이트, 2-(메타)아크릴로일옥시에틸테트라히드로프탈산으로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상인 것이 바람직하다.The (B-2) copolymerizable vinyl monomer containing a carboxyl group is (meth) acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, 2- (meth) acryloyloxypropylhexahydrophthalic acid, 2- (meth) acryloyloxyethylphthalic acid, 2- (meth) acryloyloxyethylsuccinic acid, 2- (meth) acryloyloxyethylmaleic acid , It is preferable that it is at least 1 sort (s) or more selected from the compound group which consists of carboxy polycaprolactone mono (meth) acrylate and 2- (meth) acryloyloxyethyl tetrahydrophthalic acid.
상기 점착제 조성물이 상기 아크릴계 폴리머의 100중량부에 대해, 상기 (D) 금속 킬레이트 화합물의 가교 촉진제를 0.001∼0.5중량부와, 상기 (E) 케토엔올 호변이성체 화합물을 0.1∼300중량부의 비율로 함유하여 이루어지고, 상기 (D) 금속 킬레이트 화합물의 가교 촉진제가 알루미늄 킬레이트 화합물, 티탄 킬레이트 화합물, 철 킬레이트 화합물로 이루어지는 군 중에서 선택된 적어도 1종 이상이며, 상기 (E)/상기 (D)의 중량부 비율이 70∼1000인 것이 바람직하다.The pressure-sensitive adhesive composition in a proportion of 0.001 to 0.5 parts by weight of the cross-linking accelerator of the (D) metal chelate compound, and 0.1 to 300 parts by weight of the (E) ketoenol tautomer compound relative to 100 parts by weight of the acrylic polymer. It is made to contain, and the crosslinking accelerator of the metal chelate compound (D) is at least one selected from the group consisting of aluminum chelate compounds, titanium chelate compounds, and iron chelate compounds, and parts by weight of (E) / (D) It is preferable that the ratio is 70 to 1000.
또한, 본 발명은 수지 필름의 한쪽 면에 상기 점착제 조성물을 가교시킨 점착제층이 적층되어 있는 것을 특징으로 하는 점착 필름을 제공한다.In addition, the present invention provides a pressure-sensitive adhesive film characterized in that the pressure-sensitive adhesive layer cross-linking the pressure-sensitive adhesive composition is laminated on one side of the resin film.
또한, 본 발명은 상기 점착 필름이 사용된 표면 보호 필름을 제공한다.In addition, the present invention provides a surface protection film using the adhesive film.
또한, 본 발명은 상기 점착 필름이 사용된 편광판용 표면 보호 필름을 제공한다.In addition, the present invention provides a surface protection film for a polarizing plate using the adhesive film.
또한, 본 발명은 광학 필름의 적어도 한쪽 면에 상기 점착제 조성물을 가교시킨 점착제층이 적층되어 있는 점착제층이 형성된 광학 필름을 제공한다.In addition, the present invention provides an optical film having an adhesive layer on which an adhesive layer cross-linking the adhesive composition is formed on at least one side of the optical film.
또한, 본 발명은 상기 수지 필름의 한쪽 면의, 상기 점착제층이 형성된 측과는 반대면에 대전 방지 처리 및 방오 처리가 되어 있는 점착 필름을 제공한다.In addition, the present invention provides an adhesive film on one side of the resin film, on the opposite side to which the pressure-sensitive adhesive layer is formed, on which an antistatic treatment and an antifouling treatment are applied.
본 발명에 따른 점착제 조성물은 종래의 표면 보호 필름용 점착제 조성물과 비교하여 우수한 점착 성능 및 경시 열화되지 않으며 우수한 박리 대전 방지 성능을 갖는다.The pressure-sensitive adhesive composition according to the present invention has excellent adhesion performance and does not deteriorate over time and has excellent anti-peeling performance compared to the pressure-sensitive adhesive composition for a conventional surface protection film.
특히, 본 발명에 따른 표면 보호 필름은 피착체가 광학 필름의 표면에 적층된, 불소 화합물을 함유하는 방오층, 또는, 불소 화합물을 함유하는 저굴절률층 형성용 조성물을 사용하여 형성된 저굴절률층에 있어서, 종래 기술에 의한 표면 보호 필름에 비해, 우수한 점착 성능 및 경시 열화되지 않으며 우수한 박리 대전 방지 성능을 갖고 있고, 대전 방지 성능과 내오염 성능의 양립에 현저한 효과가 있다.In particular, the surface protection film according to the present invention is a low-refractive-index layer formed by using an antifouling layer containing a fluorine compound or a composition for forming a low-refractive-index layer containing a fluorine compound, in which the adherend is laminated on the surface of the optical film. , Compared to the surface protection film according to the prior art, it has excellent adhesion performance and does not deteriorate with time, has excellent peeling antistatic performance, and has a remarkable effect on both antistatic performance and fouling resistance.
즉, 본 발명에 따른 점착제 조성물 및 그것을 사용한 표면 보호 필름은 우수한 점착 성능 및 경시 열화되지 않으며 우수한 박리 대전 방지 성능을 갖추고 있기 때문에, 산업상 이용가치가 매우 크다.That is, since the pressure-sensitive adhesive composition according to the present invention and the surface protection film using the same have excellent adhesion performance and do not deteriorate with time, and have excellent peeling anti-static performance, the value of industrial use is very high.
이하, 바람직한 실시형태에 기초하여 본 발명을 설명한다.Hereinafter, the present invention will be described based on preferred embodiments.
본 실시형태의 점착제 조성물은 아크릴계 폴리머와, (F) 대전 방지제와, (C) 가교제를 함유하는 점착제 조성물로서, 상기 (F) 대전 방지제가 하기 화학식 (1)로 나타내는 융점 25∼80℃의 이온성 화합물이고,The pressure-sensitive adhesive composition of the present embodiment is an pressure-sensitive adhesive composition containing an acrylic polymer, (F) an antistatic agent, and (C) a crosslinking agent, wherein the (F) antistatic agent is an ion having a melting point of 25 to 80 ° C represented by the following formula (1). Sex compound,
K+·A- (1)K + · A - (1)
[화학식 (1) 중, K+는 피리디늄, 이미다졸륨, 포스포늄, 술포늄, 피롤리디늄, 구아니디늄, 암모늄, 이소우로늄, 티오우로늄, 피페리디늄, 피라졸륨, 메틸륨, 모르폴리늄으로 이루어지는 군으로부터 선택한 1종의 양이온이며, A-는 이미드기를 함유하지 않는 트리플루오로메탄술포네이트 음이온, 펜타플루오로에탄술포네이트 음이온으로 이루어지는 군으로부터 선택되는 1종의 음이온이다][In the formula (1), K + is pyridinium, imidazolium, phosphonium, sulfonium, pyrrolidinium, guanidinium, ammonium, isouronium, thiuronium, piperidinium, pyrazolium, methylium , Is a type of cation selected from the group consisting of morpholinium, and A - is a type of anion selected from the group consisting of a trifluoromethanesulfonate anion that does not contain an imide group, and a pentafluoroethanesulfonate anion. ]
상기 아크릴계 폴리머가 유리 전이점 온도가 0℃ 이하인 아크릴계 폴리머이며, 상기 아크릴계 폴리머 100중량부에 대해, 상기 이온성 화합물을 0.01∼10중량부의 비율로 필수 성분으로서 함유하여 이루어지는 것을 특징으로 한다.The acrylic polymer is an acrylic polymer having a glass transition point temperature of 0 ° C. or less, and is characterized by containing the ionic compound as an essential component in a proportion of 0.01 to 10 parts by weight with respect to 100 parts by weight of the acrylic polymer.
본 실시형태의 점착제 조성물에 사용되는 아크릴계 폴리머는 점착제 조성물의 주제 폴리머이며, 유리 전이점 온도가 0℃ 이하인 아크릴계 폴리머이다. 또한, 아크릴계 폴리머는 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머를 주성분으로 하는 공중합체가 바람직하다.The acrylic polymer used in the pressure-sensitive adhesive composition of the present embodiment is the main polymer of the pressure-sensitive adhesive composition, and is an acrylic polymer having a glass transition point temperature of 0 ° C or lower. Further, the acrylic polymer is preferably a copolymer comprising (A) an alkyl group having a (meth) acrylic acid ester monomer having C1 to 18 carbon atoms as a main component.
(A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머로는, 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 프로필(메타)아크릴레이트, 부틸(메타)아크릴레이트, 이소부틸(메타)아크릴레이트, 펜틸(메타)아크릴레이트, 헥실(메타)아크릴레이트, 헵틸(메타)아크릴레이트, 옥틸(메타)아크릴레이트, 이소옥틸(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트, 노닐(메타)아크릴레이트, 이소노닐(메타)아크릴레이트, 데실(메타)아크릴레이트, 운데실(메타)아크릴레이트, 도데실(메타)아크릴레이트, 트리데실(메타)아크릴레이트, 테트라데실(메타)아크릴레이트, 펜타데실(메타)아크릴레이트, 헥사데실(메타)아크릴레이트, 헵타데실(메타)아크릴레이트, 옥타데실(메타)아크릴레이트, 시클로펜틸(메타)아크릴레이트, 시클로헥실(메타)아크릴레이트 등을 들 수 있다. 알킬(메타)아크릴레이트 모노머의 알킬기는 직쇄, 분기형, 고리형의 어느 것이어도 된다.(A) Examples of the (meth) acrylic acid ester monomer having C1 to 18 carbon atoms in the alkyl group include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, and isobutyl ( Meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate , Nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, tridecyl (meth) acrylate, tetradecyl ( Meth) acrylate, pentadecyl (meth) acrylate, hexadecyl (meth) acrylate, heptadecyl (meth) acrylate, octadecyl (meth) acrylate, cyclopentyl (meth) acrylate, cyclohexyl (meth) Acrylate, etc. The can. The alkyl group of the alkyl (meth) acrylate monomer may be linear, branched or cyclic.
본 실시형태의 점착제 조성물에 사용되는 아크릴계 폴리머는 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부 중, 이소옥틸(메타)아크릴레이트, 이소노닐(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트로 이루어지는 군으로부터 선택한 적어도 1종을 50중량부 이상의 비율로 함유하여 이루어지는 것이 바람직하고, 60중량부 이상의 비율로 함유하는 것이 보다 바람직하며, 75중량부 이상의 비율로 함유하는 것이 특히 바람직하다.The acrylic polymer used in the pressure-sensitive adhesive composition of the present embodiment comprises (A) 100 parts by weight of at least one or more of (meth) acrylic acid ester monomers having 1 to 18 carbon atoms in the alkyl group, isooctyl (meth) acrylate, isononyl ( It is preferable to contain at least one selected from the group consisting of meth) acrylate and 2-ethylhexyl (meth) acrylate in a proportion of 50 parts by weight or more, more preferably 60 parts by weight or more, and 75 It is particularly preferable to contain it in a proportion of parts by weight or more.
본 실시형태의 점착제 조성물에 사용되는 아크릴계 폴리머는 (B-1) 수산기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상, 및/또는, (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상을 공중합시킨 공중합체의 아크릴계 폴리머인 것이 바람직하다. 상기 아크릴계 폴리머에는 (B-1) 수산기를 함유하는 공중합성 비닐 모노머, (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머의 적어도 한쪽이 공중합되면 되고, 양쪽 모두가 공중합되어도 된다.The acrylic polymer used in the pressure-sensitive adhesive composition of the present embodiment includes (B-1) at least one copolymerizable vinyl monomer containing a hydroxyl group, and / or (B-2) at least one copolymerizable vinyl monomer containing a carboxyl group. It is preferable that it is an acrylic polymer of the copolymer which copolymerized 1 or more types. The acrylic polymer may be copolymerized with at least one of a copolymerizable vinyl monomer (B-1) containing a hydroxyl group and a copolymerizable vinyl monomer containing a (B-2) carboxyl group, and both may be copolymerized.
상기 아크릴계 폴리머가 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부에 대해, (B-1) 수산기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상의 합계를 0.01∼10중량부, 및/또는, (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상의 합계를 0.01∼0.5중량부의 비율로 공중합시킨 공중합체의 아크릴계 폴리머인 것이 바람직하다.At least one or more of the copolymerizable vinyl monomer containing a hydroxyl group (B-1) with respect to 100 parts by weight of the at least one or more of the (meth) acrylic acid ester monomers in which the acrylic polymer has (C) C1 to C18 of the alkyl group. It is preferable that the total is 0.01 to 10 parts by weight, and / or an acrylic polymer of a copolymer obtained by copolymerizing a total of at least one or more of the (B-2) carboxyl-containing copolymerizable vinyl monomers at a ratio of 0.01 to 0.5 parts by weight. .
본 실시형태의 점착제 조성물에 사용되는 아크릴계 폴리머에는 (B-1) 수산기를 함유하는 공중합 가능한 모노머를 공중합시켜도 된다. (B-1) 수산기를 함유하는 공중합 가능한 모노머로는, 8-히드록시옥틸(메타)아크릴레이트, 6-히드록시헥실(메타)아크릴레이트, 4-히드록시부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, N-히드록시(메타)아크릴아미드, N-히드록시메틸(메타)아크릴아미드, N-히드록시에틸(메타)아크릴아미드 등으로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상인 것이 바람직하다.You may copolymerize (B-1) the copolymerizable monomer containing a hydroxyl group in the acrylic polymer used for the adhesive composition of this embodiment. (B-1) As a copolymerizable monomer containing a hydroxyl group, 8-hydroxyoctyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2- At least one member selected from the group of compounds consisting of hydroxyethyl (meth) acrylate, N-hydroxy (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, and N-hydroxyethyl (meth) acrylamide. It is preferable that it is above.
(B-1) 수산기를 함유하는 공중합 가능한 모노머를 공중합시키는 경우에는 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부에 대해, (B-1) 수산기를 함유하는 공중합 가능한 모노머를 0.01∼10.0중량부의 비율로 함유하여 이루어지는 것이 바람직하고, 0.5∼7.0중량부의 비율로 함유하여 이루어지는 것이 보다 바람직하며, 1.0∼6.0중량부의 비율로 함유하여 이루어지는 것이 특히 바람직하다.(B-1) In the case of copolymerizing a copolymerizable monomer containing a hydroxyl group, (B-1) based on 100 parts by weight of at least one or more of (meth) acrylic acid ester monomers having C1 to 18 carbon atoms in the alkyl group, (B-1) It is preferable that the copolymerizable monomer containing a hydroxyl group is contained in a proportion of 0.01 to 10.0 parts by weight, more preferably 0.5 to 7.0 parts by weight, and particularly preferably 1.0 to 6.0 parts by weight. Do.
본 실시형태의 점착제 조성물에 사용되는 아크릴계 폴리머에는 (B-2) 카르복실기를 함유하는 공중합 가능한 모노머를 공중합시켜도 된다. (B-2) 카르복실기를 함유하는 공중합 가능한 모노머로는, (메타)아크릴산, 카르복시에틸(메타)아크릴레이트, 카르복시펜틸(메타)아크릴레이트, 2-(메타)아크릴로일옥시에틸헥사히드로프탈산, 2-(메타)아크릴로일옥시프로필헥사히드로프탈산, 2-(메타)아크릴로일옥시에틸프탈산, 2-(메타)아크릴로일옥시에틸숙신산, 2-(메타)아크릴로일옥시에틸말레산, 카르복시폴리카프로락톤모노(메타)아크릴레이트, 2-(메타)아크릴로일옥시에틸테트라히드로프탈산 등으로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상인 것이 바람직하다.You may copolymerize the copolymerizable monomer containing a (B-2) carboxyl group in the acrylic polymer used for the adhesive composition of this embodiment. (B-2) As a copolymerizable monomer containing a carboxyl group, (meth) acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, 2- (meth) acryloyloxypropylhexahydrophthalic acid, 2- (meth) acryloyloxyethylphthalic acid, 2- (meth) acryloyloxyethylsuccinic acid, 2- (meth) acryloyloxyethylmaleic acid , It is preferable that it is at least 1 sort (s) or more selected from the compound group which consists of carboxy polycaprolactone mono (meth) acrylate, 2- (meth) acryloyloxyethyl tetrahydrophthalic acid, etc.
(B-2) 카르복실기를 함유하는 공중합성 비닐 모노머를 공중합시키는 경우에는 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부에 대해, 0.01∼0.5중량부의 비율로 함유하여 이루어지는 것이 바람직하고, 0.01∼0.4중량부의 비율로 함유하여 이루어지는 것이 보다 바람직하며, 0.01∼0.3중량부의 비율로 함유하여 이루어지는 것이 특히 바람직하다.(B-2) When copolymerizing a copolymerizable vinyl monomer containing a carboxyl group, (A) 0.01 to 0.5 weight based on 100 parts by weight of at least one or more of (meth) acrylic acid ester monomers having C1 to 18 carbon atoms in the alkyl group. It is preferably made to contain in a proportion of parts, more preferably made to contain in a proportion of 0.01 to 0.4 parts by weight, and particularly preferably made to contain in a proportion of 0.01 to 0.3 parts by weight.
본 실시형태에 따른 점착제 조성물에 함유시키는 아크릴계 폴리머의 제조 방법은 특별히 한정되지 않으며, 용액 중합법, 유화 중합법 등, 적절히 공지의 중합 방법이 사용 가능하다. 아크릴계 폴리머의 공중합체의 중량 평균 분자량은 예를 들면, 50만∼300만을 들 수 있다. 아크릴계 폴리머의 산가는 0.1∼1.0인 것이 바람직하다. 이로 인해, 내오염 성능을 개선할 수 있다. 여기서 「산가」란, 산의 함유량을 나타내는 지표 중 하나이며, 카르복실기를 함유하는 폴리머 1g을 중화하는데 필요로 하는 수산화 칼륨의 ㎎수로 나타낸다.The manufacturing method of the acrylic polymer contained in the adhesive composition which concerns on this embodiment is not specifically limited, A well-known polymerization method can be used suitably, such as a solution polymerization method and an emulsion polymerization method. The weight average molecular weight of the copolymer of the acrylic polymer is, for example, 500,000 to 3 million. It is preferable that the acid value of acrylic polymer is 0.1-1.0. For this reason, the fouling resistance performance can be improved. Here, the "acid value" is one of the indices indicating the content of the acid, and is represented by the number of mg of potassium hydroxide required to neutralize 1 g of a polymer containing a carboxyl group.
본 실시형태에 따른 점착제 조성물은 (F) 대전 방지제를 함유한다. 본 실시형태의 (F) 대전 방지제는 하기 화학식 (1)로 나타내는 융점 25∼80℃의 이온성 화합물이다.The pressure-sensitive adhesive composition according to the present embodiment contains (F) an antistatic agent. The antistatic agent (F) of the present embodiment is an ionic compound having a melting point of 25 to 80 ° C represented by the following formula (1).
K+·A- (1)K + · A - (1)
[화학식 (1) 중, K+는 피리디늄, 이미다졸륨, 포스포늄, 술포늄, 피롤리디늄, 구아니디늄, 암모늄, 이소우로늄, 티오우로늄, 피페리디늄, 피라졸륨, 메틸륨, 모르폴리늄으로 이루어지는 군으로부터 선택한 1종의 양이온이며, A-는 이미드기를 함유하지 않는 트리플루오로메탄술포네이트 음이온, 펜타플루오로에탄술포네이트 음이온으로 이루어지는 군으로부터 선택되는 1종의 음이온이다][In the formula (1), K + is pyridinium, imidazolium, phosphonium, sulfonium, pyrrolidinium, guanidinium, ammonium, isouronium, thiuronium, piperidinium, pyrazolium, methylium , Is a type of cation selected from the group consisting of morpholinium, and A - is a type of anion selected from the group consisting of trifluoromethanesulfonate anion that does not contain an imide group, and pentafluoroethanesulfonate anion. ]
상기 이온성 화합물은 상온에서 고체인 것이 바람직하다. 상온은 예를 들면, 25℃ 미만의 온도이며, 구체적으로는, 23℃에서 고체인 이온성 화합물인 것이 바람직하다. 본 실시형태에 따른 점착제 조성물은 아크릴계 폴리머 100중량부에 대해, 상기 이온성 화합물을 0.01∼10중량부의 비율로 필수 성분으로서 함유하여 이루어진다.It is preferable that the ionic compound is a solid at room temperature. The normal temperature is, for example, a temperature of less than 25 ° C, and specifically, it is preferably a solid ionic compound at 23 ° C. The pressure-sensitive adhesive composition according to the present embodiment is made by containing the ionic compound as an essential component in a proportion of 0.01 to 10 parts by weight based on 100 parts by weight of the acrylic polymer.
(F) 대전 방지제의 구체예로는, 예를 들면, 1-옥틸-2-메틸피리디늄트리플루오로메탄술포네이트염, 1,2,3-트리메틸이미다졸륨 펜타플루오로에탄술포네이트염, 1-부틸-2,3-디메틸이미다졸륨 트리플루오로메탄술포네이트염, 1-헥실-4-메틸피리디늄 펜타플루오로에탄술포네이트염, 1-옥틸-3-메틸피리디늄 트리플루오로메탄술포네이트염, n-옥틸피리디늄 트리플루오로메탄술포네이트염 등을 들 수 있다.(F) Specific examples of the antistatic agent include, for example, 1-octyl-2-methylpyridinium trifluoromethanesulfonate salt, 1,2,3-trimethylimidazolium pentafluoroethanesulfonate salt, 1-butyl-2,3-dimethylimidazolium trifluoromethanesulfonate salt, 1-hexyl-4-methylpyridinium pentafluoroethanesulfonate salt, 1-octyl-3-methylpyridinium trifluoromethane And sulfonate salts and n-octylpyridinium trifluoromethanesulfonate salts.
본 실시형태에 따른 점착제 조성물은 또한 (C) 가교제로서 3관능 이상의 이소시아네이트 화합물을 함유한다. 3관능 이상의 이소시아네이트 화합물로는, 예를 들면, 헥사메틸렌디이소시아네이트, 이소포론디이소시아네이트, 디페닐메탄디이소시아네이트, 톨릴렌디이소시아네이트, 자일릴렌디이소시아네이트 등의 디이소시아네이트류의 뷰렛 변성체나 이소시아누레이트 변성체, 트리메틸올프로판이나, 글리세린 등의 3가 이상의 폴리올과의 어덕트체 등을 들 수 있다. (C) 가교제인 3관능 이상의 이소시아네이트 화합물의 비율로는, 예를 들면, 아크릴계 폴리머의 100중량부에 대해 0.1∼10중량부의 비율로 함유하는 것이 바람직하고, 0.1∼6중량부의 비율로 함유하는 것이 보다 바람직하다.The pressure-sensitive adhesive composition according to the present embodiment also contains a trifunctional or higher isocyanate compound as the crosslinking agent (C). Examples of the trifunctional or higher isocyanate compound include, for example, a burette-modified product of diisocyanates such as hexamethylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, tolylene diisocyanate, and xylylene diisocyanate, and isocyanurate modification. And adducts with trivalent or higher polyols such as sieves, trimethylolpropane, and glycerin. (C) As a ratio of the trifunctional or higher isocyanate compound which is a crosslinking agent, it is preferable to contain it in the ratio of 0.1-10 weight part with respect to 100 weight part of acrylic polymers, for example, and to contain it in the ratio of 0.1-6 weight part. It is more preferable.
본 실시형태에 따른 점착제 조성물은 (E) 케토엔올 호변이성체 화합물을 함유해도 된다. (E) 케토엔올 호변이성체 화합물로는, 아세토초산메틸, 아세토초산에틸, 아세토초산옥틸, 아세토초산올레일, 아세토초산라우릴, 아세토초산스테아릴 등의 β-케토에스테르나, 아세틸아세톤, 2,4-헥산디온, 벤조일아세톤 등의 β-디케톤을 들 수 있다. 이들은 폴리이소시아네이트 화합물을 가교제로 하는 점착제 조성물에 있어서, 가교제가 갖는 이소시아네이트기를 블록함으로써, 가교제의 배합 후에 있어서의 점착제 조성물의 과도한 점도 상승이나 겔화를 억제하고, 점착제 조성물의 포트 라이프를 연장할 수 있다. (E) 케토엔올 호변이성체 화합물은 특히 아세틸아세톤, 아세토초산에틸로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상인 것이 바람직하다. 상기 아크릴계 폴리머의 100중량부에 대해, (E) 케토엔올 호변이성체 화합물을 0.1∼300중량부의 비율로 함유하는 것이 바람직하다.The pressure-sensitive adhesive composition according to the present embodiment may contain (E) a ketoenol tautomeric compound. (E) Ketoenol tautomeric compounds include β-ketoesters such as methyl acetoacetate, ethyl acetoacetate, octyl acetoacetate, oleyl acetoacetate, lauryl acetoacetate, and stearyl acetoacetate, acetylacetone, 2 And β-diketones such as, 4-hexanedione and benzoyl acetone. In the pressure-sensitive adhesive composition comprising a polyisocyanate compound as a crosslinking agent, by blocking the isocyanate group possessed by the crosslinking agent, excessive viscosity increase and gelation of the pressure-sensitive adhesive composition after the crosslinking agent can be suppressed, and the pot life of the pressure-sensitive adhesive composition can be extended. (E) The ketoenol tautomeric compound is particularly preferably at least one selected from the group consisting of acetylacetone and ethyl acetoacetate. It is preferable to contain the (E) ketoenol tautomeric compound in a proportion of 0.1 to 300 parts by weight with respect to 100 parts by weight of the acrylic polymer.
본 실시형태에 따른 점착제 조성물은 (D) 금속 킬레이트 화합물의 가교 촉진제를 함유해도 된다. (D) 금속 킬레이트 화합물의 가교 촉진제는 폴리이소시아네이트 화합물을 가교제로 하는 경우에, 상기 공중합체와 가교제의 반응(가교 반응)에 대해 촉매로서 기능하는 물질이면 된다. (D) 금속 킬레이트 화합물의 가교 촉진제는 중심 금속 원자 M에 1 이상의 다좌 배위자 L이 결합한 화합물이다. 금속 킬레이트 화합물은 금속 원자 M에 결합하는 1 이상의 단좌 배위자 X를 가져도 되고, 갖지 않아도 된다. 금속 킬레이트 화합물의 구체예로는, 트리스(2,4-펜탄디오네이트)철(III), 철 트리스아세틸아세토네이트, 티타늄 트리스아세틸아세토네이트, 루테늄 트리스아세틸아세토네이트, 아연 비스아세틸아세토네이트, 알루미늄 트리스아세틸아세토네이트, 지르코늄 테트라키스아세틸아세토네이트, 트리스(2,4-헥산디오네이트)철(III), 비스(2,4-헥산디오네이트)아연, 트리스(2,4-헥산디오네이트)티탄, 트리스(2,4-헥산디오네이트)알루미늄, 테트라키스(2,4-헥산디오네이트)지르코늄 등을 들 수 있다.The pressure-sensitive adhesive composition according to the present embodiment may contain (D) a crosslinking accelerator of the metal chelate compound. (D) When the crosslinking accelerator of the metal chelate compound is a polyisocyanate compound, a substance that functions as a catalyst for the reaction (crosslinking reaction) between the copolymer and the crosslinking agent may be used. (D) The crosslinking accelerator of the metal chelate compound is a compound in which one or more polydentate ligands L are bound to the central metal atom M. The metal chelate compound may or may not have one or more monodentate ligands X that bind to the metal atom M. Specific examples of the metal chelate compound include tris (2,4-pentanedionate) iron (III), iron trisacetylacetonate, titanium trisacetylacetonate, ruthenium trisacetylacetonate, zinc bisacetylacetonate, and aluminum tris Acetylacetonate, zirconium tetrakisacetylacetonate, tris (2,4-hexanedionate) iron (III), bis (2,4-hexanedionate) zinc, tris (2,4-hexanedionate) titanium, And tris (2,4-hexanedionate) aluminum, tetrakis (2,4-hexanedionate) zirconium, and the like.
(D) 금속 킬레이트 화합물의 가교 촉진제로는, 알루미늄 킬레이트 화합물, 티탄 킬레이트 화합물, 철 킬레이트 화합물로 이루어지는 군 중에서 선택된 적어도 1종 이상의 금속 킬레이트 화합물인 것이 바람직하다. 상기 아크릴계 폴리머의 100중량부에 대해, (D) 금속 킬레이트 화합물의 가교 촉진제를 0.001∼0.5중량부의 비율로 함유하는 것이 바람직하다.(D) As a crosslinking accelerator of a metal chelate compound, it is preferable that it is at least 1 or more types of metal chelate compounds selected from the group which consists of an aluminum chelate compound, a titanium chelate compound, and an iron chelate compound. It is preferable that the crosslinking accelerator of the metal chelate compound (D) is contained in a proportion of 0.001 to 0.5 parts by weight with respect to 100 parts by weight of the acrylic polymer.
(E) 케토엔올 호변이성체 화합물은 (D) 금속 킬레이트 화합물의 가교 촉진제와는 반대로 가교를 억제하는 효과를 갖는다는 점에서, (E) 케토엔올 호변이성체 화합물과 (D) 금속 킬레이트 화합물의 가교 촉진제의 비율을 적절히 설정하는 것이 바람직하다. 점착제 조성물의 포트 라이프를 길게 하고, 저장 안정성을 향상시키려면, (E)/(D)의 중량부 비율이 70∼1000인 것이 바람직하고, 70∼700인 것이 보다 바람직하며, 70∼300인 것이 특히 바람직하다. 여기서, (E)/(D)의 중량부 비율이란, (E)의 중량부를 (D)의 중량부로 나누어 얻어진 몫의 값이다.(E) The ketoenol tautomeric compound has the effect of inhibiting crosslinking as opposed to the crosslinking accelerator of (D) the metal chelate compound, and (E) the ketoenol tautomeric compound and (D) the metal chelate compound. It is preferable to properly set the proportion of the crosslinking accelerator. In order to lengthen the pot life of the pressure-sensitive adhesive composition and improve storage stability, the ratio by weight of (E) / (D) is preferably 70 to 1000, more preferably 70 to 700, and 70 to 300 Especially preferred. Here, the weight part ratio of (E) / (D) is the value of the quotient obtained by dividing the weight part of (E) by the weight part of (D).
본 실시형태에 따른 점착제 조성물은 임의 성분으로서, (H) 폴리에테르 변성 실록산 화합물을 함유해도 된다. (H) 폴리에테르 변성 실록산 화합물은 폴리에테르기를 갖는 실록산 화합물이고, 통상의 실록산 단위〔-SiR1 2-O-〕외에, 폴리에테르기를 갖는 실록산 단위〔-SiR1(R2O(R3O)nR4)-O-〕를 갖는다. 여기서, R1은 1종 또는 2종 이상의 알킬기 또는 아릴기, R2 및 R3은 1종 또는 2종 이상의 알킬렌기, R4는 1종 또는 2종 이상의 알킬기나 아실기 등(말단기)을 나타낸다. 폴리에테르기로는, 폴리옥시에틸렌기〔(C2H4O)n〕나 폴리옥시프로필렌기〔(C3H6O)n〕등의 폴리옥시알킬렌기를 들 수 있다. 폴리에테르기를 갖는 실록산 단위에 있어서, 폴리에테르기의 말단이 OH기(상기 화학식에 있어서 R4=H)여도 된다.The pressure-sensitive adhesive composition according to the present embodiment may contain (H) a polyether-modified siloxane compound as an optional component. (H) The polyether-modified siloxane compound is a siloxane compound having a polyether group, and in addition to the usual siloxane unit [-SiR 1 2 -O-], a siloxane unit having a polyether group [-SiR 1 (R 2 O (R 3 O ) n R 4 ) -O-]. Here, R 1 is one or two or more alkyl groups or aryl groups, R 2 and R 3 are one or two or more alkylene groups, R 4 is one or two or more alkyl groups or acyl groups (terminal groups). Shows. Examples of the polyether group include polyoxyalkylene groups such as polyoxyethylene groups [(C 2 H 4 O) n ] and polyoxypropylene groups [(C 3 H 6 O) n ]. In the siloxane unit having a polyether group, the terminal of the polyether group may be an OH group (R 4 = H in the above formula).
(H) 폴리에테르 변성 실록산 화합물은 HLB값이 6∼12인 폴리에테르 변성 실록산 화합물인 것이 바람직하다. 또한, 상기 아크릴계 폴리머의 100중량부에 대해, (H) 폴리에테르 변성 실록산 화합물이 0.01∼0.5중량부 포함되는 것이 바람직하고, 0.02∼0.35중량부 포함되는 것이 보다 바람직하며, 0.02∼0.25중량부 포함되는 것이 특히 바람직하다. HLB값이란, 예를 들면 JIS K3211(계면활성제 용어) 등으로 규정하는 친수 친유 밸런스(친수성 친유성비)이다.(H) The polyether-modified siloxane compound is preferably a polyether-modified siloxane compound having an HLB value of 6 to 12. In addition, it is preferable that (H) the polyether-modified siloxane compound is contained in an amount of 0.01 to 0.5 parts by weight, more preferably 0.02 to 0.35 parts by weight, and more preferably 0.02 to 0.25 parts by weight, based on 100 parts by weight of the acrylic polymer. It is particularly preferred. The HLB value is, for example, a hydrophilic lipophilic balance (hydrophilic lipophilic ratio) specified in JIS K3211 (surfactant term) or the like.
폴리에테르 변성 실록산 화합물은 예를 들면, 수소화규소기를 갖는 폴리오르가노실록산 주쇄에 대해, 불포화 결합 및 폴리옥시알킬렌기를 갖는 유기 화합물을 히드로실릴화 반응에 의해 그래프트시킴으로써 얻을 수 있다. 구체적으로는, 디메틸실록산·메틸(폴리옥시에틸렌)실록산 공중합체, 디메틸실록산·메틸(폴리옥시에틸렌)실록산·메틸(폴리옥시프로필렌)실록산 공중합체, 디메틸실록산·메틸(폴리옥시프로필렌)실록산 중합체 등을 들 수 있다.The polyether-modified siloxane compound can be obtained, for example, by grafting an organic compound having an unsaturated bond and a polyoxyalkylene group to a polyorganosiloxane main chain having a silicon hydride group by a hydrosilylation reaction. Specifically, dimethylsiloxane-methyl (polyoxyethylene) siloxane copolymer, dimethylsiloxane-methyl (polyoxyethylene) siloxane-methyl (polyoxypropylene) siloxane copolymer, dimethylsiloxane-methyl (polyoxypropylene) siloxane polymer, etc. Can be mentioned.
(H) 폴리에테르 변성 실록산 화합물을 점착제 조성물에 배합함으로써, 점착제층의 점착력 및 리워크 성능을 개선할 수 있다. (H) 폴리에테르 변성 실록산 화합물의 중량 평균 분자량은 10000 이하인 것이 바람직하다. 아크릴계 폴리머와의 상용성의 관점에서는 HLB값이 낮고, 분자량이 낮은 편이 상용성은 양호하지만, 분자량이 낮은 폴리에테르 변성 실록산 화합물이면, HLB값이 비교적 높고, 폴리머와의 상용성이 약간 낮아도 우수한 대전 방지성이 얻어진다.(H) By blending the polyether-modified siloxane compound with the pressure-sensitive adhesive composition, the pressure-sensitive adhesive layer and the rework performance of the pressure-sensitive adhesive layer can be improved. (H) The weight average molecular weight of the polyether-modified siloxane compound is preferably 10000 or less. From the viewpoint of compatibility with the acrylic polymer, the HLB value is low and the molecular weight is lower, the compatibility is good, but if the polyether-modified siloxane compound having a low molecular weight, the HLB value is relatively high, and the antistatic property is excellent even if the compatibility with the polymer is slightly low. This is obtained.
본 실시형태의 점착제 조성물은 상술한 첨가제에 한정하지 않고, 계면활성제, 경화 촉진제, 가소제, 충전제, 경화 지연제, 가공 보조제, 노화 방지제, 산화 방지제 등의 공지의 첨가제가 적당하게 배합되어도 된다. 이들은 단독으로, 혹은 2종 이상을 함께 사용할 수 있다.The pressure-sensitive adhesive composition of the present embodiment is not limited to the above-described additives, and well-known additives such as surfactants, curing accelerators, plasticizers, fillers, curing retarders, processing aids, anti-aging agents, and antioxidants may be suitably blended. These may be used alone or in combination of two or more.
본 실시형태의 점착제 조성물은 편광판의 편광자 보호층에 첩합되는 표면 보호 필름용 점착제 조성물로서 바람직하다. 여기서, 편광판의 편광자 보호층이 TAC계 필름, PMMA계 필름, PET계 필름으로 이루어지는 군으로부터 선택된 1종을 들 수 있다. 여기서, TAC는 트리아세틸셀룰로오스, PMMA는 폴리메틸메타크릴레이트, PET는 폴리에틸렌테레프탈레이트의 약칭이다.The pressure-sensitive adhesive composition of the present embodiment is preferable as the pressure-sensitive adhesive composition for a surface protective film bonded to the polarizer protective layer of the polarizing plate. Here, one type selected from the group consisting of a TAC-based film, a PMMA-based film, and a PET-based film may be mentioned. Here, TAC is an abbreviation of triacetyl cellulose, PMMA is polymethyl methacrylate, and PET is polyethylene terephthalate.
또한, 편광판의 편광자 보호층의 표면에 실시되어 있는 표면 처리가 미처리, AG 처리, LR 처리, AR 처리, AG-LR 처리, AG-AR 처리로 이루어지는 군으로부터 선택된 1종이어도 된다. 여기서, AG란 안티 글레어(Anti Glare), LR이란 로우 리플렉션(Low Reflection), AR이란 안티 리플렉션(Anti Reflection)이다.Further, the surface treatment applied to the surface of the polarizer protective layer of the polarizing plate may be one selected from the group consisting of untreatment, AG treatment, LR treatment, AR treatment, AG-LR treatment, and AG-AR treatment. Here, AG is anti-glare, LR is low reflection, and AR is anti-reflection.
본 실시형태의 점착제 조성물을 가교시킨 점착제층은 점착제층의 표면 저항률이 1.0×10+ 12Ω/□ 이하인 것이 바람직하고, 5.0×10+ 11Ω/□ 이하인 것이 보다 바람직하며, 1.0×10+ 11Ω/□ 이하인 것이 특히 바람직하다. 표면 저항률이 크면, 점착제층을 피착체로부터 박리할 때 발생한 정전기를 빠져나가게 하는 성능이 열악하다. 이 때문에, 표면 저항률을 충분히 작게 함으로써, 점착제층을 피착체로부터 박리할 때 발생하는 정전기에 수반하여 생기는 박리 대전압이 저감되고, 피착체에 영향을 주는 것을 억제할 수 있다.In the pressure-sensitive adhesive layer in which the pressure-sensitive adhesive composition of the present embodiment is crosslinked, the surface resistivity of the pressure-sensitive adhesive layer is preferably 1.0 × 10 + 12 Ω / □ or less, more preferably 5.0 × 10 + 11 Ω / □ or less, and more preferably 1.0 × 10 + 11 It is particularly preferable to be Ω / □ or less. When the surface resistivity is large, the ability to escape static electricity generated when the pressure-sensitive adhesive layer is peeled from the adherend is poor. For this reason, by sufficiently reducing the surface resistivity, the peeling voltage generated due to static electricity generated when the pressure-sensitive adhesive layer is peeled from the adherend is reduced, and it is possible to suppress the influence on the adherend.
본 실시형태의 점착제 조성물을 가교시킨 점착제층은 불소 화합물을 함유하는 저굴절률층 형성용 수지 조성물을 사용하여 형성된 저굴절률층에 대한, 점착제층의 박리 대전압이 ±0.3㎸ 이하, 즉 ―0.3∼+0.3㎸의 범위 내인 것이 바람직하다. 저굴절률층 형성용 조성물에 사용되는 불소 화합물로는, 불소화 올레핀류, 불소화 비닐에테르류, 불소화 알킬(메타)아크릴레이트 등의 1종 또는 2종 이상의 중합물인 함불소 공중합체, 불소화 알킬기 함유 실란 화합물 등의 축합물을 들 수 있다. 함불소 공중합체는 불소화된 모노머를 비롯하여, 올레핀류, 비닐에테르류, (메타)아크릴레이트 등의 불소화되어 있지 않은 모노머가 공중합되어 있어도 된다. 저굴절률층은 고굴절률층 등과 조합하여 반사 방지층을 구성해도 된다.In the pressure-sensitive adhesive layer obtained by crosslinking the pressure-sensitive adhesive composition of the present embodiment, the peeling voltage of the pressure-sensitive adhesive layer with respect to the low-refractive-index layer formed using the resin composition for forming a low-refractive-index layer containing a fluorine compound is ± 0.3 MPa or less, that is, -0.3 to It is preferably within the range of +0.3 kPa. Examples of the fluorine compound used in the composition for forming the low refractive index layer include fluorinated copolymers, fluorinated copolymers containing fluorinated olefins, fluorinated vinyl ethers, and fluorinated alkyl (meth) acrylates, or fluorinated alkyl groups. And condensation products such as. The fluorinated copolymer may be copolymerized with fluorinated monomers, and non-fluorinated monomers such as olefins, vinyl ethers, and (meth) acrylates. The low-refractive-index layer may be combined with a high-refractive-index layer or the like to form an antireflection layer.
저굴절률층에 대한 박리 대전압을 측정할 때, 표면에 저굴절률층을 형성하기 위한 기재로는, PMMA 기재 및 TAC 기재를 들 수 있다. 또한, 본 실시형태의 점착제 조성물을 가교시킨 점착제층은 PMMA 기재 및 TAC 기재의 표면에 아무 처리도 되어 있지 않은 플레인층에 대한 박리 대전압이 ±0.3㎸ 이하, 즉, ―0.3∼+0.3㎸의 범위 내인 것이 바람직하다.When measuring the peeling voltage against the low-refractive-index layer, examples of the substrate for forming the low-refractive-index layer on the surface include a PMMA substrate and a TAC substrate. The pressure-sensitive adhesive layer in which the pressure-sensitive adhesive composition of the present embodiment is crosslinked has a peeling voltage of ± 0.3 kPa or less for the plane layer on which the PMMA substrate and the TAC substrate are not treated, that is, -0.3 to +0.3 kPa. It is preferably within the range of.
점착제층은 피착체에 첩합한 후, 온도 60℃, 습도 90%RH의 분위기하에 48hr 방치하고, 상기 분위기하로부터 꺼내어 1일 후의 내오염 성능이 상기 피착체의 표면에 대해 「오염 없음」인 것이 바람직하다. 피착체로는 편광자에 보호층을 적층하고, 보호층의 표면이 불소 화합물을 함유하는 조성물로 저반사 표면 처리된 편광판을 들 수 있다. 저반사 표면 처리에 사용되는 불소 화합물을 함유하는 조성물은 상술한 불소 화합물을 함유하는 저굴절률층 형성용 수지 조성물과 동일해도 되고 상이해도 된다. 보호층으로는 PMMA 기재 및 TAC 기재 등을 들 수 있다.After the adhesive layer is adhered to the adherend, it is left for 48 hr under an atmosphere of 60 ° C. at a temperature of 90% RH, and taken out from the atmosphere, the stain resistance after 1 day is “no contamination” on the surface of the adherend. desirable. As an adherend, a polarizing plate in which a protective layer is laminated on a polarizer and the surface of the protective layer is treated with a low-reflection surface with a composition containing a fluorine compound is mentioned. The composition containing the fluorine compound used for the low-reflection surface treatment may be the same or different from the resin composition for forming a low refractive index layer containing the fluorine compound described above. Examples of the protective layer include a PMMA substrate and a TAC substrate.
본 실시형태의 점착제 조성물을 가교시켜 이루어지는 점착제층의 상기 PMMA 기재의 표면에 실시된 상기 저굴절률층에 대한 점착력은 저속 박리 속도 0.3m/min에서의 점착력이 0.04∼0.2N/25㎜이고, 고속 박리 속도 30m/min에서의 점착력이 2.0N/25㎜ 이하인 것이 바람직하며, 고속 박리 속도 30m/min에서의 점착력이 0.2∼1.6N/25㎜인 것이 보다 바람직하다. 이로 인해, 점착력이 박리 속도에 의해서도 변화가 적은 성능이 얻어지고, 고속 박리에 의해서도 신속하게 박리하는 것이 가능해진다. 또한, 재접착을 위해 일단 표면 보호 필름을 박리할 때도, 과대한 힘을 필요로 하지 않고, 피착체로부터 박리하기 용이하다.The adhesive strength of the pressure-sensitive adhesive layer formed by crosslinking the pressure-sensitive adhesive composition of the present embodiment to the low-refractive-index layer applied to the surface of the PMMA substrate is 0.04 to 0.2 N / 25 mm at a low peel rate of 0.3 m / min, and a high speed. It is preferable that the adhesive strength at a peeling speed of 30 m / min is 2.0 N / 25 mm or less, and it is more preferable that the adhesive strength at a high-speed peeling speed of 30 m / min is 0.2 to 1.6 N / 25 mm. For this reason, the performance with little change in adhesive force with the peeling speed is obtained, and it is possible to peel quickly even with high-speed peeling. Moreover, even when peeling off a surface protection film once for re-adhesion, it does not require excessive force, and is easy to peel from an adherend.
본 실시형태의 점착제 조성물을 가교하여 이루어지는 점착제층의 겔분율은 95∼100%인 것이 바람직하고, 97∼100%인 것이 보다 바람직하다. 이와 같이 점착제층의 겔분율이 높음으로써, 저속 박리 속도에 있어서 점착력이 과대해지지 않고, 공중합체로부터의 미중합 모노머 혹은 올리고머의 용출이 저감되며, 리워크성이나 고온·고습도에 있어서의 내구성이 개선되어 피착체의 오염을 억제할 수 있다.The gel fraction of the pressure-sensitive adhesive layer formed by crosslinking the pressure-sensitive adhesive composition of the present embodiment is preferably 95 to 100%, and more preferably 97 to 100%. The high gel fraction of the pressure-sensitive adhesive layer prevents excessive adhesion at low-speed peeling speeds, reduces the dissolution of unpolymerized monomers or oligomers from the copolymer, and improves reworkability and durability at high temperature and high humidity. As a result, contamination of the adherend can be suppressed.
본 실시형태의 점착 필름은 본 실시형태의 점착제 조성물을 가교하여 이루어지는 점착제층을 수지 필름의 한쪽 면 또는 양면에 형성하여 이루어지는 것이다. 또한, 본 실시형태의 표면 보호 필름은 본 실시형태의 점착제 조성물을 가교하여 이루어지는 점착제층을 수지 필름의 한쪽 면에 형성하여 이루어지는 표면 보호 필름이다. 본 실시형태의 점착제 조성물은 우수한 대전 방지 성능을 구비하고, 저속 박리 속도 및 고속 박리 속도에 있어서 점착력의 밸런스가 우수하며, 또한 내오염 성능을 갖는다. 이 때문에, 편광판의 표면 보호 필름의 용도로서 바람직하게 사용할 수 있다.The adhesive film of this embodiment is formed by forming the adhesive layer formed by crosslinking the adhesive composition of this embodiment on one side or both sides of the resin film. Moreover, the surface protection film of this embodiment is a surface protection film formed by forming the adhesive layer formed by crosslinking the adhesive composition of this embodiment on one surface of a resin film. The pressure-sensitive adhesive composition of the present embodiment has excellent antistatic performance, excellent balance of adhesion in low-speed peeling speed and high-speed peeling speed, and also has fouling resistance performance. For this reason, it can use suitably as a use of the surface protection film of a polarizing plate.
점착제층의 기재 필름이나, 점착면을 보호하는 이형 필름(세퍼레이터)으로는 폴리에스테르 필름 등의 수지 필름 등을 사용할 수 있다.As a base film of an adhesive layer or a release film (separator) which protects an adhesive surface, resin films, such as a polyester film, etc. can be used.
수지 필름의 한쪽 면의 상기 점착제층이 형성된 측과는 반대면에 대전 방지 처리 및 방오 처리가 되어 있어도 된다. 대전 방지 처리로는, 대전 방지제의 도포나 혼입 등을 들 수 있다. 방오 처리로는, 실리콘계, 불소계의 이형제나 코트제, 실리카 미립자 등에 의한 처리를 들 수 있다. 이형 필름에는 점착제층의 점착면과 맞춰지는 측의 면에 실리콘계, 불소계, 장쇄 알킬계의 이형제 등에 의해 이형 처리가 실시되어도 된다.An antistatic treatment and an antifouling treatment may be performed on the surface opposite to the side on which the pressure-sensitive adhesive layer is formed on one side of the resin film. Examples of the antistatic treatment include coating and mixing of antistatic agents. Examples of the antifouling treatment include treatment with silicone-based, fluorine-based release agents and coating agents, and silica fine particles. The release film may be subjected to a release treatment with a silicone-based, fluorine-based, long-chain alkyl-based release agent or the like on the side of the pressure-sensitive adhesive layer that is aligned with the adhesive surface.
또한, 광학 필름의 적어도 한쪽 면에 본 실시형태의 점착제 조성물을 가교시킨 점착제층을 적층함으로써, 점착제층이 형성된 광학 필름을 얻을 수 있다. 광학 필름으로는, 편광 필름, 위상차 필름, 반사 방지 필름, 방현(안티 글레어) 필름, 자외선 흡수 필름, 적외선 흡수 필름, 광학 보상 필름, 휘도 향상 필름 등을 들 수 있다. 광학 부재가 적용되는 기기로는, 액정 패널, 유기 EL 패널, 터치 패널 등을 들 수 있다.Moreover, the optical film with an adhesive layer can be obtained by laminating | stacking the adhesive layer which bridge | crosslinked the adhesive composition of this embodiment on at least one side of an optical film. Examples of the optical film include a polarizing film, a retardation film, an antireflection film, an anti-glare (anti-glare) film, an ultraviolet absorbing film, an infrared absorbing film, an optical compensation film, and a brightness enhancing film. Examples of the device to which the optical member is applied include a liquid crystal panel, an organic EL panel, and a touch panel.
편광판용 표면 보호 필름 등의 광학용 표면 보호 필름 및 점착 필름의 경우, 기재 필름 및 점착제층은 충분한 투명성을 갖는 것이 바람직하다.In the case of an optical surface protection film and an adhesive film, such as a surface protection film for a polarizing plate, it is preferable that a base film and an adhesive layer have sufficient transparency.
실시예Example
이하, 실시예를 들어 본 발명을 구체적으로 설명한다.Hereinafter, the present invention will be described in detail with reference to Examples.
<아크릴계 폴리머의 제조><Production of acrylic polymers>
[실시예 1][Example 1]
교반기, 온도계, 환류 냉각기 및 질소 도입관을 구비한 반응 장치에 질소 가스를 도입하고, 반응 장치 내의 공기를 질소 가스로 치환했다. 그 후, 반응 장치에 2-에틸헥실아크릴레이트 100중량부, 8-히드록시옥틸아크릴레이트 6.0중량부, 아크릴산 0.1중량부와 함께, 용제(초산에틸)를 첨가했다. 그 후, 중합 개시제로서 아조비스이소부티로니트릴 0.1중량부를 2시간에 걸쳐 적하시키고, 65℃에서 6시간 반응시켜, 실시예 1에 사용되는 아크릴계 폴리머를 얻었다.Nitrogen gas was introduced into the reactor equipped with a stirrer, thermometer, reflux cooler, and nitrogen introduction tube, and the air in the reactor was replaced with nitrogen gas. Then, a solvent (ethyl acetate) was added to the reaction apparatus together with 100 parts by weight of 2-ethylhexyl acrylate, 6.0 parts by weight of 8-hydroxyoctyl acrylate, and 0.1 parts by weight of acrylic acid. Thereafter, 0.1 part by weight of azobisisobutyronitrile was added dropwise over 2 hours as a polymerization initiator, and reacted at 65 ° C for 6 hours to obtain an acrylic polymer used in Example 1.
[실시예 2∼6 및 비교예 1∼3][Examples 2 to 6 and Comparative Examples 1 to 3]
모노머의 조성을 각각 표 1의 (A), (B-1), (B-2)의 기재와 동일하게 한 것 이외에는 상기 실시예 1에 사용되는 아크릴계 폴리머 용액과 동일하게 하여, 실시예 2∼6 및 비교예 1∼3에 사용되는 아크릴계 폴리머 용액을 얻었다.Examples 2 to 6 were carried out in the same manner as in the acrylic polymer solution used in Example 1, except that the monomer compositions were the same as those described in Tables 1 (A), (B-1), and (B-2), respectively. And acrylic polymer solutions used in Comparative Examples 1 to 3.
<점착제 조성물 및 표면 보호 필름의 제조><Production of adhesive composition and surface protection film>
[실시예 1][Example 1]
상기와 같이 제조한 실시예 1의 아크릴계 폴리머 용액에 대해, 가교제(코로네이트 HX) 2.5중량부, 대전 방지제(1-옥틸-2-메틸피리디늄 트리플루오로메탄술포네이트염) 1.5중량부, 가교 촉매(티타늄 트리스아세틸아세토네이트) 0.1중량부, 아세틸아세톤 8.5중량부를 첨가해 교반 혼합하여, 실시예 1의 점착제 조성물을 얻었다. 이 점착제 조성물을 이형 필름(실리콘 수지 코트된 PET 필름) 위에 도포 후, 90℃에서 건조시킴으로써 용제를 제거하고, 두께가 20㎛인 점착제층을 얻었다. 그 후, 기재 필름(한쪽 면에 대전 방지 및 방오 처리된 PET 필름)의, 대전 방지 및 방오 처리된 면과는 반대의 면에 이형 필름이 형성된 점착제층을 전사시켜, 「기재 필름/점착제층/이형 필름」의 적층 구성을 갖는 실시예 1의 표면 보호 필름을 얻었다.With respect to the acrylic polymer solution of Example 1 prepared as described above, 2.5 parts by weight of a crosslinking agent (coronate HX), 1.5 parts by weight of an antistatic agent (1-octyl-2-methylpyridinium trifluoromethanesulfonate salt), crosslinking 0.1 parts by weight of catalyst (titanium trisacetylacetonate) and 8.5 parts by weight of acetylacetone were added and mixed with stirring to obtain the pressure-sensitive adhesive composition of Example 1. After apply | coating this adhesive composition on a release film (silicone resin-coated PET film), the solvent was removed by drying at 90 degreeC, and the adhesive layer with a thickness of 20 micrometers was obtained. Thereafter, the pressure-sensitive adhesive layer having a release film formed on a surface opposite to the surface of the antistatic and antifouling treatment of the base film (an antistatic and antifouling treated PET film on one side) was transferred to the substrate layer, and the substrate layer / adhesive layer / Release film ”to obtain a surface protective film of Example 1 having a laminated structure.
[실시예 2∼6 및 비교예 1∼3][Examples 2 to 6 and Comparative Examples 1 to 3]
첨가제의 조성을 각각 표 1의 (C)∼(F)의 기재와 같이 한 것 이외에는 상기 실시예 1의 표면 보호 필름과 동일하게 하여, 실시예 2∼6 및 비교예 1∼3의 표면 보호 필름을 얻었다.The surface protective films of Examples 2 to 6 and Comparative Examples 1 to 3 were prepared in the same manner as in the surface protective films of Example 1, except that the composition of the additives was as described in Tables (C) to (F) in Table 1, respectively. Got.
표 1에 있어서, 각 성분의 중량부는 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 합계를 100중량부로 하여 구했다.In Table 1, the weight part of each component was calculated | required by making the total of (meth) acrylic acid ester monomers of (C) C18 to C18 of an alkyl group into 100 weight part.
여기서, 표 1에 있어서, (C)∼(F)의 각 란에서는 아크릴계 폴리머를 100중량부로 하여, 각 성분의 함유 비율(중량부)을 괄호( ) 안의 수치로 나타냈다.Here, in Table 1, in each column of (C) to (F), the acrylic polymer was used as 100 parts by weight, and the content ratio (parts by weight) of each component was shown in numerical values in parentheses.
또한, 표 1에 사용된 각 성분의 약기호의 화합물명을 표 2에 나타낸다. 여기서, 코로네이트(등록상표) HX, HL 및 L은 도소 주식회사의 상품명이고, 타케네이트(등록상표) D-140N, D-127N, D-110N은 미츠이 화학 주식회사의 상품명이다.In addition, the compound names of the abbreviations of each component used in Table 1 are shown in Table 2. Here, Coronate (registered trademark) HX, HL and L are trade names of Tosoh Corporation, and Takenate (registered trademark) D-140N, D-127N, and D-110N are trade names of Mitsui Chemicals.
(F) 대전 방지제 중, F-1∼F-6 및 F-9는 융점이 25℃ 이상 80℃ 이하이고, 상온에서 고체인 이온성 화합물이다. F-7 및 F-8은 융점이 80℃ 초과이고, 상온에서 고체인 이온성 화합물이다.(F) Among the antistatic agents, F-1 to F-6 and F-9 are ionic compounds having a melting point of 25 ° C or higher and 80 ° C or lower, and solid at room temperature. F-7 and F-8 are ionic compounds having a melting point of more than 80 ° C and being solid at room temperature.
<시험 방법 및 평가><Test method and evaluation>
실시예 1∼6 및 비교예 1∼3에 있어서의 표면 보호 필름을 각각 온도 23℃, 습도 50%RH의 분위기하에서 7일간 에이징한 후, 이하의 시험 방법에 의해 평가했다.The surface protective films in Examples 1 to 6 and Comparative Examples 1 to 3 were aged for 7 days in an atmosphere of 23 ° C and 50% RH humidity, respectively, and then evaluated by the following test methods.
<점착력의 시험 방법><Testing method for adhesive strength>
이형 필름을 박리하여 점착제층을 표출시킨 표면 보호 필름을 점착제층을 개재하여 편광판의 표면에 첩합하고, 1일 방치한 후, 50℃, 5기압, 20분간 오토클레이브 처리하여, 실온에서 추가로 12시간 방치한 것을 점착력의 측정 시료로 했다. 얻어진 측정 시료를 180°방향으로 인장 시험기를 사용하여 저속도(0.3m/min) 또는 고속도(30m/min)에 있어서 박리하여 측정한 박리 강도를 점착력으로 했다.The release film was peeled off and the surface protection film exposing the pressure-sensitive adhesive layer was pasted onto the surface of the polarizing plate via the pressure-sensitive adhesive layer, left to stand for 1 day, and autoclaved at 50 ° C, 5 atmospheres, and 20 minutes, and additionally 12 at room temperature. What was left for time was used as the measurement sample of adhesive force. The obtained measurement sample was peeled off at a low speed (0.3 m / min) or a high speed (30 m / min) using a tensile tester in the direction of 180 ° to determine the peel strength measured.
여기서, 상기 편광판의 편광자 보호층은 트리아세틸셀룰로오스(TAC), 폴리메틸메타크릴레이트(PMMA), 폴리에틸렌테레프탈레이트(PET)로 이루어지는 군으로부터 선택한 1종이다.Here, the polarizer protective layer of the polarizing plate is one selected from the group consisting of triacetyl cellulose (TAC), polymethyl methacrylate (PMMA), and polyethylene terephthalate (PET).
또한, LR 편광판 및 AG-LR 편광판은 상기 편광판의 편광자 보호층의 표면이 불소 화합물을 함유하는 조성물로 저반사 표면 처리가 실시되어 있다.In addition, the LR polarizing plate and the AG-LR polarizing plate have a low-reflective surface treatment with a composition in which the surfaces of the polarizer protective layer of the polarizing plate contain a fluorine compound.
<표면 저항률의 시험 방법><Test method for surface resistivity>
표면 보호 필름을 에이징한 후, 편광판에 첩합하기 전에, 이형 필름을 박리하여 점착제층을 표출하고, 저항률계 하이레스타 UP-HT450(미츠비시 화학 애널리테크 제조)을 사용하여 점착제층의 표면 저항률을 측정했다.After aging the surface protection film, before attaching it to the polarizing plate, the release film is peeled off to expose the pressure-sensitive adhesive layer, and the surface resistivity of the pressure-sensitive adhesive layer is measured using a resistivity meter Hyresta UP-HT450 (manufactured by Mitsubishi Chemical Analytech). did.
<박리 대전압의 시험 방법><Test method of peeling high voltage>
이형 필름을 박리하여 점착제층을 표출시킨 표면 보호 필름을 피착면에 불소 화합물을 함유하는 저굴절률층 형성용 조성물을 사용하여 형성된 저굴절률층을 갖는 편광판에 첩합했다. 표면 보호 필름을 30m/min의 인장 속도로 180°박리했을 때, 피착체가 대전하여 발생하는 전압(대전압)을 고정밀도 정전기 센서 SK-035, SK-200(주식회사 키엔스 제조)을 사용하여 측정하고, 측정값의 최대값을 박리 대전압으로 했다.The release film was peeled off and the surface protective film exposing the pressure-sensitive adhesive layer was adhered to a polarizing plate having a low refractive index layer formed using a composition for forming a low refractive index layer containing a fluorine compound on the adherend. When the surface protection film was peeled 180 ° at a tensile speed of 30 m / min, the voltage (high voltage) generated by charging of the adherend was measured using high-accuracy electrostatic sensors SK-035 and SK-200 (manufactured by Keyence Co., Ltd.). , The maximum value of the measured value was taken as the peeling large voltage.
<내오염 성능의 시험 방법><Test method for pollution resistance>
유리판의 한쪽 면 상에 저반사(LR) 표면 처리를 실시한 편광판을 첩합기를 사용해, 점착제층(양면 점착 테이프)을 개재하여 첩합했다. 그 후, 상기 편광판의 표면에 표면 보호 필름을 첩합기를 사용하여 첩합했다. 피착체에 첩합 후, 온도 60℃, 습도 90%RH의 분위기하에 48hr 방치하고, 상기 분위기하로부터 꺼내어 1일 후에 표면 보호 필름을 박리하여, 편광판 표면의 오염 상태를 육안으로 관찰했다. 내오염 성능의 판단 기준은 상기 편광판의 표면에 대해 오염 없음의 경우를 「○」, 약간 오염이 있는 경우를 「△」, 오염 있음의 경우를 「×」로 평가했다.A polarizing plate subjected to low-reflection (LR) surface treatment on one side of the glass plate was pasted through an adhesive layer (double-sided adhesive tape) using a bonding machine. Then, the surface protection film was stuck on the surface of the said polarizing plate using the bonding machine. After bonding to the adherend, the mixture was left for 48 hr under an atmosphere of 60 ° C. at a temperature of 90% RH, taken out from the atmosphere, and after 1 day, the surface protective film was peeled off, and the contamination state of the polarizing plate surface was visually observed. As a criterion for determining the stain resistance, the surface of the polarizing plate was evaluated as "○" for no contamination, "△" for some contamination, and "X" for contamination.
표 3에 실시예 1∼6 및 비교예 1∼3에 있어서의 표면 보호 필름에 대한 평가 결과를 나타낸다. 「표면 저항률」은 「m×10+n」를 「mE+n」으로 하는 방식(다만, m은 임의의 실수값, n은 양의 정수)에 의해 표기했다.Table 3 shows the evaluation results for the surface protective films in Examples 1 to 6 and Comparative Examples 1 to 3. "Surface resistivity" is expressed by a method in which "m x 10 + n " is "mE + n" (where m is an arbitrary real value and n is a positive integer).
「박리 대전압」의 란은 시험에서 사용한 편광판의 편광자 보호층의 재질(TAC 또는 PMMA) 및 표면 처리(Plain 또는 AG-LR)를 나타낸다. 「표면 처리」의 Plain은 미처리를 의미한다. 「내오염 성능」의 란에도 동일하게 하여, 시험에서 사용한 편광판의 편광자 보호층의 재질(PMMA) 및 표면 처리(AG-LR)를 나타냈다.The column of "peelable high voltage" indicates the material (TAC or PMMA) and surface treatment (Plain or AG-LR) of the polarizer protective layer of the polarizing plate used in the test. Plain of "surface treatment" means untreated. The same was applied to the column of "antifouling performance", and the material (PMMA) and surface treatment (AG-LR) of the polarizer protective layer of the polarizing plate used in the test were shown.
실시예 1∼6의 표면 보호 필름은 피착체인 편광판에 대한 저속 박리 속도 0.3m/min에서의 점착력이 0.04∼0.2N/25㎜이고, 고속 박리 속도 30m/min에서의 점착력이 2.0N/25㎜ 이하이며, 점착 성능이 우수했다.The surface protective films of Examples 1 to 6 had an adhesive strength at a low-speed peeling rate of 0.3 m / min to a polarizing plate as an adherend of 0.04 to 0.2 N / 25 mm, and an adhesive strength at a high-speed peeling speed of 30 m / min of 2.0 N / 25 mm. It was as follows and was excellent in adhesive performance.
또한, 실시예 1∼6의 표면 보호 필름은 점착제층의 표면 저항률이 1.0×10+12Ω/□ 이하이고, 불소 화합물을 함유하는 저굴절률층 형성용 조성물을 사용하여 형성된 저굴절률층에 대한, 점착제층의 박리 대전압이 ―0.3∼+0.3㎸의 범위 내이며, 대전 방지 성능이 우수했다.In addition, the surface protective films of Examples 1 to 6 had a surface resistivity of 1.0 × 10 +12 Ω / □ or less of the pressure-sensitive adhesive layer, and the pressure-sensitive adhesive to the low-refractive-index layer formed using a composition for forming a low-refractive-index layer containing a fluorine compound The peeling high voltage of the layer was within the range of -0.3 to +0.3 kPa, and the antistatic performance was excellent.
또한, 실시예 1∼6의 표면 보호 필름은 저굴절률층을 갖지 않는 미처리의 PMMA 기재 및 TAC 기재에 대해서도, 점착제층의 박리 대전압이 ―0.3∼+0.3㎸의 범위 내이며, 대전 방지 성능이 우수했다.In addition, the surface protection films of Examples 1 to 6 also had an untreated PMMA base material and a TAC base material that did not have a low refractive index layer, and the peeling voltage of the pressure-sensitive adhesive layer was within the range of -0.3 to +0.3 kPa, antistatic performance. This was excellent.
나아가, 실시예 1∼6의 표면 보호 필름은 피착체에 첩합 후, 온도 60℃, 습도 90%RH의 분위기하에 48hr 방치하고, 상기 분위기하로부터 꺼내어 1일 후에도 피착체인 저반사 표면 처리를 실시한 편광판에 대한 오염이 없고, 내오염 성능도 우수했다.Further, the surface protective films of Examples 1 to 6 were adhered to the adherend, left for 48 hr under an atmosphere of 60 ° C. at a temperature of 90% RH, and taken out from the atmosphere, and after 1 day, the polarizing plate was subjected to low-reflection surface treatment as an adherend. There was no contamination on the soil, and the fouling resistance was excellent.
즉, 실시예 1∼6의 표면 보호 필름에 대한 표 3에 나타난 평가 결과에서 본 발명의 과제를 해결할 수 있음이 실증되었다.That is, it was proved that the problems of the present invention can be solved from the evaluation results shown in Table 3 for the surface protective films of Examples 1 to 6.
비교예 1의 표면 보호 필름에서는 융점이 80℃ 초과인 대전 방지제를 함유하고 있다. 이 때문에, 비교예 1의 표면 보호 필름은 점착제층의 점착력이 크고, 박리 대전압이 높으며, 내오염 성능도 열악했다.In the surface protection film of Comparative Example 1, an antistatic agent having a melting point of more than 80 ° C was contained. For this reason, the surface protection film of Comparative Example 1 had a large adhesive strength of the pressure-sensitive adhesive layer, high peeling voltage, and poor stain resistance.
또한, 비교예 2의 표면 보호 필름은 융점이 80℃ 초과인 대전 방지제를 함유하고 있다. 이 때문에, 비교예 2의 표면 보호 필름은 점착제층의 점착력이 크고, 박리 대전압이 높으며, 내오염 성능도 열악했다.In addition, the surface protection film of Comparative Example 2 contained an antistatic agent having a melting point of more than 80 ° C. For this reason, the surface protection film of Comparative Example 2 had a large adhesive strength of the pressure-sensitive adhesive layer, high peeling voltage, and poor stain resistance.
또한, 비교예 3의 표면 보호 필름은 융점이 25∼80℃이지만, 음이온이 이미드기를 갖는 대전 방지제를 함유하고 있다. 이 때문에, 비교예 3의 표면 보호 필름은 PMMA 기재에 대해 박리 대전압이 높고, 내오염 성능도 열악했다.In addition, the surface protection film of Comparative Example 3 has a melting point of 25 to 80 ° C, but anion contains an antistatic agent having an imide group. For this reason, the surface protection film of Comparative Example 3 had a high peeling voltage with respect to the PMMA substrate, and the fouling performance was also poor.
이와 같이, 비교예 1∼3의 표면 보호 필름에서는 본 발명의 과제를 해결할 수 없었다.Thus, the problems of the present invention could not be solved in the surface protective films of Comparative Examples 1 to 3.
Claims (10)
상기 (F) 대전 방지제가 하기 화학식 (1)로 나타내는 융점 25∼80℃의 이온성 화합물이고,
K+·A- (1)
[화학식 (1) 중, K+는 피리디늄, 이미다졸륨, 포스포늄, 술포늄, 피롤리디늄, 구아니디늄, 암모늄, 이소우로늄, 티오우로늄, 피페리디늄, 피라졸륨, 메틸륨, 모르폴리늄으로 이루어지는 군으로부터 선택한 1종의 양이온이며, A-는 이미드기를 함유하지 않는 트리플루오로메탄술포네이트 음이온, 펜타플루오로에탄술포네이트 음이온으로 이루어지는 군으로부터 선택되는 1종의 음이온이다]
상기 아크릴계 폴리머가 유리 전이점 온도가 0℃ 이하인 아크릴계 폴리머이며,
상기 아크릴계 폴리머 100중량부에 대해, 상기 이온성 화합물을 0.01∼10중량부의 비율로 필수 성분으로서 함유하여 이루어지는 것을 특징으로 하는 점착제 조성물.As an adhesive composition containing an acrylic polymer, (F) antistatic agent, and (C) crosslinking agent,
The antistatic agent (F) is an ionic compound having a melting point of 25 to 80 ° C represented by the following formula (1),
K + · A - (1)
[In the formula (1), K + is pyridinium, imidazolium, phosphonium, sulfonium, pyrrolidinium, guanidinium, ammonium, isouronium, thiuronium, piperidinium, pyrazolium, methylium , Is a type of cation selected from the group consisting of morpholinium, and A - is a type of anion selected from the group consisting of trifluoromethanesulfonate anion that does not contain an imide group, and pentafluoroethanesulfonate anion. ]
The acrylic polymer is an acrylic polymer having a glass transition point temperature of 0 ° C or less,
An adhesive composition comprising 100 parts by weight of the acrylic polymer containing the ionic compound as an essential component in a proportion of 0.01 to 10 parts by weight.
상기 아크릴계 폴리머가
(A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부에 대해, (B-1) 수산기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상의 합계를 0.01∼10중량부, 및/또는, (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머의 적어도 1종 이상의 합계를 0.01∼0.5중량부의 비율로 공중합시킨 공중합체의 아크릴계 폴리머이고,
상기 (A) 알킬기의 탄소수 C1∼18인 (메타)아크릴산에스테르 모노머의 적어도 1종 이상의 합계 100중량부 중, 이소옥틸(메타)아크릴레이트, 이소노닐(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트로 이루어지는 군으로부터 선택한 적어도 1종을 50중량부 이상의 비율로 함유하여 이루어지며,
상기 아크릴계 폴리머의 100중량부에 대해, 상기 (C) 가교제로서 3관능 이상의 이소시아네이트 화합물을 0.1∼10중량부의 비율로 함유하여 이루어지고,
상기 점착제 조성물이 추가로 (D) 금속 킬레이트 화합물의 가교 촉진제와, (E) 케토엔올 호변이성체 화합물을 함유하여 이루어지는 것을 특징으로 하는 점착제 조성물.According to claim 1,
The acrylic polymer
(A) The total amount of at least one or more of the (B-1) copolymerizable vinyl monomer containing a hydroxyl group is 0.01 to 100 parts by weight of at least one or more of the (meth) acrylic acid ester monomers having C1 to C18 carbon atoms in the alkyl group. 10 parts by weight, and / or (B-2) an acrylic polymer of a copolymer obtained by copolymerizing at least one or more total of copolymerizable vinyl monomers containing a carboxyl group at a ratio of 0.01 to 0.5 parts by weight,
Of (A) 100 parts by weight of at least one or more total of (meth) acrylic acid ester monomers having 1 to 18 carbon atoms in the alkyl group, isooctyl (meth) acrylate, isononyl (meth) acrylate, 2-ethylhexyl (meth) ) Is made by containing at least one selected from the group consisting of acrylates in a proportion of 50 parts by weight or more,
With respect to 100 parts by weight of the acrylic polymer, the (C) is a crosslinking agent containing a trifunctional or higher isocyanate compound in a proportion of 0.1 to 10 parts by weight,
The pressure-sensitive adhesive composition further comprises (D) a crosslinking accelerator of the metal chelate compound and (E) a ketoenol tautomer compound.
상기 점착제 조성물을 가교시킨 점착제층의 표면 저항률이 1.0×10+ 12Ω/□ 이하이고,
상기 점착제층의 PMMA 기재 및 TAC 기재의 표면에 불소 화합물을 함유하는 저굴절률층 형성용 수지 조성물을 사용하여 형성된 저굴절률층에 대한 박리 대전압, 및, PMMA 기재 및 TAC 기재의 표면에 아무 처리도 되어 있지 않은 플레인층에 대한 박리 대전압이 모두 ±0.3㎸ 이하이며,
상기 점착제층이 편광자에 보호층을 적층하고, 보호층의 표면이 불소 화합물을 함유하는 조성물로 저반사 표면 처리된 편광판인 피착체에 첩합 후, 온도 60℃, 습도 90%RH의 분위기하에 48hr 방치하고, 상기 분위기하로부터 꺼내어 1일 후의 내오염 성능이 상기 피착체의 표면에 대해 「오염 없음」이고,
상기 점착제층의, 상기 PMMA 기재의 표면에 실시된 상기 저굴절률층에 대한 점착력이 저속 박리 속도 0.3m/min에서의 점착력이 0.04∼0.2N/25㎜이며, 또한, 고속 박리 속도 30m/min에서의 점착력이 2.0N/25㎜ 이하인 것을 특징으로 하는 점착제 조성물.According to claim 2,
The surface resistivity of the pressure-sensitive adhesive layer crosslinked with the pressure-sensitive adhesive composition is 1.0 × 10 + 12 Ω / □ or less,
Peeling high voltage for the low refractive index layer formed using the resin composition for forming a low refractive index layer containing a fluorine compound on the surfaces of the PMMA substrate and the TAC substrate of the pressure-sensitive adhesive layer, and no treatment on the surfaces of the PMMA substrate and the TAC substrate All peeling voltages for the unplanned plain layer are ± 0.3 kV or less,
After the pressure-sensitive adhesive layer is laminated with a protective layer on a polarizer, the surface of the protective layer is adhered to an adherend which is a polarizing plate treated with a low-reflection surface with a composition containing a fluorine compound, and then left for 48 hrs under an atmosphere of 60 ° C. and 90% RH humidity. And the contamination resistance after 1 day after taking out from the atmosphere is "no contamination" with respect to the surface of the adherend,
The adhesive strength of the pressure-sensitive adhesive layer to the low-refractive-index layer applied to the surface of the PMMA substrate is 0.04 to 0.2 N / 25 mm at a low-speed peeling rate of 0.3 m / min, and at a high-speed peeling speed of 30 m / min. The adhesive composition is characterized in that the adhesive force of 2.0N / 25㎜ or less.
상기 (B-1) 수산기를 함유하는 공중합성 비닐 모노머가 8-히드록시옥틸(메타)아크릴레이트, 6-히드록시헥실(메타)아크릴레이트, 4-히드록시부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, N-히드록시(메타)아크릴아미드, N-히드록시메틸(메타)아크릴아미드, N-히드록시에틸(메타)아크릴아미드로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상이고,
상기 (B-2) 카르복실기를 함유하는 공중합성 비닐 모노머가 (메타)아크릴산, 카르복시에틸(메타)아크릴레이트, 카르복시펜틸(메타)아크릴레이트, 2-(메타)아크릴로일옥시에틸헥사히드로프탈산, 2-(메타)아크릴로일옥시프로필헥사히드로프탈산, 2-(메타)아크릴로일옥시에틸프탈산, 2-(메타)아크릴로일옥시에틸숙신산, 2-(메타)아크릴로일옥시에틸말레산, 카르복시폴리카프로락톤모노(메타)아크릴레이트, 2-(메타)아크릴로일옥시에틸테트라히드로프탈산으로 이루어지는 화합물군 중에서 선택된 적어도 1종 이상인 것을 특징으로 하는 점착제 조성물.The method of claim 2 or 3,
The (B-1) copolymerizable vinyl monomer containing a hydroxyl group is 8-hydroxyoctyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2- At least one selected from the group of compounds consisting of hydroxyethyl (meth) acrylate, N-hydroxy (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, and N-hydroxyethyl (meth) acrylamide ego,
The (B-2) copolymerizable vinyl monomer containing a carboxyl group is (meth) acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, 2- (meth) acryloyloxypropylhexahydrophthalic acid, 2- (meth) acryloyloxyethylphthalic acid, 2- (meth) acryloyloxyethylsuccinic acid, 2- (meth) acryloyloxyethylmaleic acid , At least one selected from the group consisting of carboxypolycaprolactone mono (meth) acrylate and 2- (meth) acryloyloxyethyltetrahydrophthalic acid.
상기 점착제 조성물이 상기 아크릴계 폴리머의 100중량부에 대해, 상기 (D) 금속 킬레이트 화합물의 가교 촉진제를 0.001∼0.5중량부와, 상기 (E) 케토엔올 호변이성체 화합물을 0.1∼300중량부의 비율로 함유하여 이루어지고,
상기 (D) 금속 킬레이트 화합물의 가교 촉진제가 알루미늄 킬레이트 화합물, 티탄 킬레이트 화합물, 철 킬레이트 화합물로 이루어지는 군 중에서 선택된 적어도 1종 이상이며,
상기 (E)/상기 (D)의 중량부 비율이 70∼1000인 것을 특징으로 하는 점착제 조성물.The method of claim 2 or 3,
The pressure-sensitive adhesive composition in a proportion of 0.001 to 0.5 parts by weight of the cross-linking accelerator of the (D) metal chelate compound, and 0.1 to 300 parts by weight of the (E) ketoenol tautomer compound relative to 100 parts by weight of the acrylic polymer. Is made of,
The crosslinking accelerator of the metal chelate compound (D) is at least one selected from the group consisting of aluminum chelate compounds, titanium chelate compounds, and iron chelate compounds,
The pressure-sensitive adhesive composition, characterized in that the weight part ratio of (E) / (D) is 70 to 1000.
상기 수지 필름의 한쪽 면의, 상기 점착제층이 형성된 측과는 반대면에 대전 방지 처리 및 방오 처리가 되어 있는 점착 필름.The method of claim 6,
An adhesive film which has an antistatic treatment and an antifouling treatment on one side of the resin film opposite to the side on which the adhesive layer is formed.
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