KR20200024042A - Apparatus for measuring quantity of deposition material and depositing apparatus comprising the same - Google Patents

Abstract

One embodiment of the present invention provides an apparatus for measuring a deposition amount, which includes: a sensor housing in which a drive unit is provided inside and an opening unit is provided on one surface; a plurality of measurement sensors provided inside the sensor housing, one of which is exposed through the opening unit; a sensor confirmation member disposed to face the opening unit of the sensor housing and confirming a position of the measurement sensor exposed through the opening unit; a display unit which displays data output from the sensor confirmation member; and a control unit controlling the position of the measurement sensor by driving the drive unit based on data output to the display unit.

Description

Deposition amount measuring device and deposition equipment having the same {APPARATUS FOR MEASURING QUANTITY OF DEPOSITION MATERIAL AND DEPOSITING APPARATUS COMPRISING THE SAME}

The present invention relates to a deposition amount measuring apparatus for measuring the deposition amount of a deposition material deposited on a substrate and a deposition apparatus having the same.

Among the display devices, the organic light emitting display device is attracting attention as a next generation display device because of its advantages of having a wide viewing angle, excellent contrast, and fast response speed.

In general, the organic light emitting diode display has a stacked structure in which a light emitting layer is interposed between the anode and the cathode so that colors can be realized on the principle that holes and electrons injected from the anode and the cathode recombine in the light emitting layer to emit light.

However, since such a structure is difficult to obtain high-efficiency light emission, an intermediate layer such as an electron injection layer, an electron transport layer, a hole transport layer, and a hole injection layer is selectively inserted between each electrode and the light emitting layer.

In a flat panel display such as an organic light emitting diode display, an organic material, a metal used as an electrode, or the like is used by a vacuum deposition method in which a material is deposited in a vacuum atmosphere to form a thin film on a flat plate. In the vacuum deposition method, a substrate in which an organic thin film is to be formed in a vacuum chamber is placed, a mask having the same pattern as the pattern of the thin film to be formed is disposed, and then an organic material is evaporated or sublimed using a deposition source to be deposited on the substrate. Is done.

Meanwhile, in order to determine the thickness of the thin film formed by attaching the deposition material to the substrate W during the deposition process, as illustrated in FIG. 1, the deposition apparatus 10 is deposited from the deposition source 12 in the chamber 11. It may include a deposition amount measuring device 13 for measuring the amount of.

The deposition rate measuring apparatus 13 includes a plurality of measurement sensors 13b, and when one of the measurement sensors 13b reaches the end of their life, the deposition amount measuring device 13b is replaced with another adjacent measurement sensor to measure the deposition amount of the deposition material.

At this time, when replacing with another adjacent measuring sensor, the measuring sensor 13b to be replaced as shown in Figure 2 must be precisely position control through the opening 13a of the deposition amount measuring device 13, but in the past the operator By checking the position of the measuring sensor 13b while checking, there was a problem that the accuracy of the position control is degraded as shown in FIG. 3.

Korea Patent Publication 10-2006-0060126

An embodiment of the present invention provides a deposition amount measuring apparatus and deposition equipment to enable accurate position control when the measurement sensor is replaced.

The object of the present invention is not limited to the above, and other objects and advantages of the present invention which are not mentioned may be understood by the following description.

Deposition amount measuring apparatus according to an embodiment of the present invention, the drive unit is provided therein, the sensor housing having an opening on one side; A plurality of measurement sensors provided inside the sensor housing and exposed through the opening; A sensor identification member disposed to face the opening of the sensor housing and confirming a position of a measurement sensor exposed to the opening; And a controller configured to control the position of the measurement sensor by driving the driving unit based on the data input to the sensor confirmation member.

In an embodiment of the present invention, the sensor identifying member may be detachably coupled to the sensor housing by a frame.

In an embodiment of the present invention, the sensor identifying member may be a CCD camera.

In an embodiment of the present invention, the measurement sensor may be a QCM (Quartz Crystal Microbalance) sensor.

In an embodiment of the present invention, the display unit may further include a display unit displaying data output from the sensor checking member, and the controller may drive the driving unit based on the data output from the display unit.

In addition, the deposition apparatus according to an embodiment of the present invention, the chamber containing a substrate; A deposition source for evaporating a deposition material on the substrate; The deposition amount measuring apparatus described above may include.

In addition, the deposition amount measuring method according to an embodiment of the present invention, the step of mounting a sensor confirmation member in the sensor housing having a measuring sensor; Exposing the measurement sensor to the opening of the sensor housing; Confirming whether the position of the exposed measuring sensor corresponds to the setting position; And performing a deposition process to measure the deposition amount of the deposition material deposited on the substrate.

In an embodiment of the present invention, the measuring sensor is provided with a plurality of equiangular, and after confirming whether the position of the exposed measuring sensor corresponds to the set position, to set the rotation value of the measuring sensor corresponding to the angle of the measuring sensors It may further comprise the step.

According to an embodiment of the present invention, the position information of the measuring sensor is output to the display unit by the CCD camera, the operator can accurately check the position of the measuring sensor exposed to the opening through the display unit, after which the operator through the control housing When the signal is transmitted to the driving unit, the measuring sensors rotate by a predetermined angle, and the position of the targeted measuring sensor can be accurately controlled.

As the position of the measurement sensor is precisely controlled, the measurement accuracy of the deposition amount of the deposition material deposited on the substrate may also increase.

The effects of the present invention are not limited to the above-described effects, but should be understood to include all the effects deduced from the configuration of the invention described in the detailed description or claims of the present invention.

1 is a view schematically showing a deposition apparatus according to the prior art.
2 is a view showing a deposition amount measuring apparatus according to the prior art.
3 is a view showing a setting state of the deposition amount measuring apparatus according to the prior art.
4 is a view schematically showing a deposition equipment according to an embodiment of the present invention.
5 is a perspective view showing the deposition amount measuring apparatus according to an embodiment of the present invention.
6 is a diagram illustrating a setting state of the deposition amount measuring equipment according to an embodiment of the present invention.
7 is a flowchart illustrating a deposition amount measuring method according to an embodiment of the present invention.

Hereinafter, with reference to the accompanying drawings will be described in detail an embodiment of the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

In order to clearly describe the present invention, parts irrelevant to the essence of the present invention may be omitted, and the same reference numerals may be assigned to the same or similar elements throughout the specification.

In addition, when a part is said to "include" a certain component, this means that it may further include other components, except to exclude other components unless otherwise stated. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention, unless otherwise defined herein, as understood by one of ordinary skill in the art to which the invention pertains. It can be interpreted as a concept.

4 is a view schematically showing the deposition equipment according to an embodiment of the present invention, Figure 5 is a perspective view showing the deposition amount measuring equipment according to an embodiment of the present invention.

4 and 5, the deposition apparatus 100 according to an embodiment includes a chamber 110, a deposition source 120, and a deposition amount measurement device 130.

The substrate W may be accommodated in the chamber 110, and the substrate W may be deposited in a vacuum atmosphere. For example, a support (not shown) is installed above the inside of the chamber 110, and the substrate W may be horizontally disposed by the support. The substrate W may be disposed such that a surface to be deposited faces downward.

The deposition source 120 evaporates the deposition material to be deposited on the substrate W, and is installed below the chamber 110. The deposition source 120 may be disposed in the form of a point or a line. The deposition source 120 includes a container 121 containing a deposition material such as an organic material and a heater 122 for heating the container 121.

The container 121 of the deposition source 120 may be formed of a ceramic such as alumina or pyrolytic boron nitride, or a metal material such as titanium. The container 121 has an opening at an upper surface thereof, and the organic material to be evaporated in the form of powder or pallet of high purity is contained in the container 121. The heater 122 may be a hot wire provided along the outer circumference of the container 121. Therefore, the heater 122 heats the container 121 when power is applied, and when the container 121 is heated, the deposition material is evaporated through the opening of the container 121.

The deposition amount measuring apparatus 130 measures the thickness of the film on which the deposition material evaporated from the deposition source 120 is deposited on the substrate (W). The deposition amount measuring apparatus 130 may be disposed at a position close to the substrate (W). Deposition amount measuring apparatus 130 may be fixed inside the chamber 110 by a support (not shown).

The deposition amount measuring apparatus 130 includes a sensor housing 131 and a measurement sensor 132 provided in the sensor housing 131.

The sensor housing 131 has a substantially cylindrical shape, and an opening 131a is formed at one side of the sensor housing 131 so that any one of the measuring sensors 132 provided therein is exposed.

The measuring sensor 132 is to measure the deposition amount of the deposition material evaporated from the deposition source 120 to the substrate (W) in real time, the measuring sensor 132 as a quartz crystal microbalance sensor (QCM Sensor) Can be applied.

The deposition material evaporated from the deposition source 120 may be deposited on the substrate (W). At the same time, the deposition material evaporated from the deposition source 120 may be deposited on the crystal oscillator sensor. The deposition material collides with the crystal vibrator sensor, and the crystal vibrator sensor may detect this and measure the deposition amount of the deposition material.

That is, the crystal oscillator sensor is configured by the electrode disposed on the outermost surface of the quartz plate, when the AC voltage is applied to the electrode to vibrate at the resonance frequency of the quartz plate. When the deposition material evaporated from the deposition source 120 in the vacuum chamber 110 is deposited on the crystal oscillator sensor, a weight change may occur. Since the resonance frequency of the quartz plate changes according to the weight change, it is possible to detect the deposition amount of the deposition material in real time.

The measuring sensor 132 may be provided in plural in the sensor housing 131. After one measurement sensor 132 is used for a certain time, it may be replaced by another measurement sensor 132 that is waiting.

In this case, in order to replace the measurement sensor 132 that is waiting, accurate position control of at least one measurement sensor 132 is required. For example, in the past, the operator controls the position of the measuring sensor 132 while visually confirming it, but in this case, the position control of the measuring sensor may not be accurately performed, and as a result, the accuracy of the deposition amount detection is reduced.

To this end, in one embodiment, a sensor checking member 133 is provided on the opposite side of the measuring sensor 132. The sensor checking member 133 may be fixed to the sensor housing 131 by the frame 134.

The frame 134 includes a first frame 134a disposed to face the measuring sensor 132 and a second frame 134b connected to both ends of the first frame 134a and fixed to the sensor housing 131. . The first frame 134a and the second frame 134b may be integrally formed or separately provided and fixedly coupled to each other. The sensor checking member 133 may be fixed to the first frame 134a. The second frame 134b may be detachably coupled to the sensor housing 131 by bolts or the like.

The sensor checking member 133 used in one embodiment may be a charge coupled device (CCD) camera. A CCD camera is one of digital cameras, which converts an image into an electrical signal using a charge coupled device (CCD) to store digital data in a storage medium such as a flash memory.

7 illustrates a method for measuring deposition amount according to an embodiment of the present invention.

4 and 7, the sensor checking member 133 is mounted in the sensor housing 131 before the deposition process is performed (S10). In this case, the sensor checking member 133 may be disposed to be spaced apart from each other at a position corresponding to the opening 131a (see FIG. 5) of the sensor housing 131. To this end, the sensor checking member 133 may be arranged to be spaced apart from the sensor housing 131 by a predetermined interval through the frame 134.

The measuring sensor 132 (refer to FIG. 5) may be exposed through the opening 131a of the sensor housing 131 by rotating by a driving unit that is operated according to a signal of the controller 150 (S20). As such, when the position of the measurement sensor 132 exposed to the opening 131a matches the set position input to the sensor checking member 133 and / or the controller 150 as shown in FIG. 6, the controller may proceed with the deposition process. (S30). However, when the position of the measurement sensor 132 exposed to the opening 131a does not match the setting position, it is necessary to re-adjust the position of the measurement sensor 132 by the operation of the driving unit.

As such, when the position control of any one of the measurement sensors is completed, the sensor identification member 133 and the frame 134 may be separated from the sensor housing 131 and proceed with the deposition process, and the measurement sensor 132 may have a substrate. The deposition amount of the deposition material deposited on (W) can be accurately measured (S40 ~ S60).

In this case, since the measuring sensors 132 are disposed at an equilateral angle, when the measuring sensor needs to be replaced during the deposition process, the measuring sensors 132 may be in one direction by a predetermined angle according to a set value of a driving unit (not shown). When rotated, another measurement sensor can be accurately exposed through the opening 131a.

On the other hand, the operator may adjust the exposure position of the measurement sensor 132 through the control unit 150. For example, the position information of the measurement sensor exposed through the opening 131a may be output to the display unit 140 by the CCD camera, and the operator may expose the measurement sensor exposed through the display unit 140 to the opening 131a. You can check the location of.

Then, when the operator transmits a signal to the driving unit in the sensor housing 131 through the control unit 150, the measuring sensors rotate by a predetermined angle, the position of the target measuring sensor can be controlled.

As those skilled in the art to which the present invention pertains may implement the present invention in other specific forms without changing the technical spirit or essential features, the embodiments described above are intended to be illustrative in all respects and are not intended to be limiting. Should be.

The scope of the present invention is shown by the following claims rather than the detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included in the scope of the present invention. .

100; Deposition equipment 110; chamber
120; Evaporation source 121; Vessel
122; Heater 130; Deposition amount measuring device
131; Sensor housing 131a; Opening
132; Measuring sensor 133; Sensor checking member
134; Frame 140; Display part
150; Control

Claims (8)

A deposition amount measuring device for measuring the deposition amount of the deposition material deposited on the substrate,
A sensor housing having a driving unit provided therein and an opening provided at one side thereof;
A plurality of measurement sensors provided inside the sensor housing and exposed through the opening;
A sensor identification member disposed to face the opening of the sensor housing and confirming a position of a measurement sensor exposed to the opening;
A control unit controlling the position of the measurement sensor by driving the driving unit based on the data input to the sensor checking member;
Deposition amount measuring apparatus comprising a.
The method of claim 1,
The sensor checking member is a deposition amount measuring device is detachably coupled to the sensor housing by a frame.
The method of claim 1,
The sensor checking member is a deposition amount measuring device is a CCD camera.
The method of claim 1,
The measuring sensor is a QCM (Quartz Crystal Microbalance) sensor deposition amount measuring device.
The method of claim 1,
And a display unit which displays data output from the sensor checking member, wherein the control unit drives the driving unit based on the data output from the display unit.
Deposition equipment for depositing a deposition material on a substrate,
A chamber containing a substrate;
A deposition source for evaporating a deposition material on the substrate;
Deposition amount measuring apparatus of any one of claims 1 to 5;
Deposition equipment comprising a.
A method of measuring the deposition amount of a deposition material deposited on a substrate,
Mounting a sensor identification member on a sensor housing having a measurement sensor;
Exposing the measurement sensor to the opening of the sensor housing;
Confirming whether the position of the exposed measuring sensor corresponds to the setting position;
Measuring a deposition amount of a deposition material deposited on a substrate by performing a deposition process;
Deposition amount measurement method comprising a.
The method of claim 7, wherein
The measuring sensor is provided with a plurality of equiangular,
And after determining whether the exposed position of the measuring sensor corresponds to a setting position, setting a rotation value of the measuring sensors corresponding to the angle of the measuring sensors.

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