KR20190131916A - Heater block, apparatus and method for heating processing - Google Patents

Abstract

The present invention relates to a heater block, which includes: a lamp extended in one direction; a housing formed to be possible to receive the lamp; a storage unit mounted on one surface of the housing and having a concave part capable of receiving the lamp; and a contamination preventing unit installed on the storage unit so as to be possible to generate gas flow in a space between the lamp and the storage unit. The present invention also relates to a heat treatment apparatus having the same and a heat treatment method applied thereto. Provided are a heater block, a heat treatment apparatus and a method, which are possible to minimize contamination of a storage unit by foreign substances by using gas flow.

Description

HEATER BLOCK, APPARATUS AND METHOD FOR HEATING PROCESSING}

The present invention relates to a heater block, a heat treatment apparatus and a method, and more particularly, to a heater block, a heat treatment apparatus and a method capable of minimizing contamination of a reflector by foreign matter.

Semiconductors and display devices are manufactured by repeating various unit processes such as thin film deposition, ion implantation, and heat treatment on a substrate to form elements having desired operating characteristics of the circuit on the substrate. Among them, the heat treatment process of the substrate is generally performed in a rapid heat treatment apparatus. In general, the rapid heat treatment apparatus includes a plurality of reflectors and a plurality of reflectors arranged in a linear arrangement on a predetermined plane parallel to the substrate support, the chamber being disposed above the chamber, a substrate support disposed inside the chamber, and a substrate support. And a plurality of lamps each housed in a linear array. In this case, the lamp emits light in the form of infrared rays and ultraviolet rays, and the reflector concentrates the light emitted from the lamp on the substrate.

Reflectors are structurally vulnerable to foreign matter. Therefore, foreign matter is introduced between the lamp and the reflector during the heat treatment process and is easily attached to the reflector. If the reflector is contaminated by foreign matters, it is difficult to accurately control the temperature of the substrate, and the efficiency of the reflector decreases, thereby reducing the thermal efficiency of the heat treatment process. In addition, foreign matter is dropped during the heat treatment process to contaminate the substrate or the chamber.

The background art of this invention is published in the following patent document.

KR 10-2015-0138496 A

The present invention provides a heater block, a heat treatment apparatus, and a method capable of minimizing contamination of a reflector by foreign substances using a gas.

The present invention provides a heater block, a heat treatment apparatus, and a method capable of preventing foreign substances from entering between a reflector and a lamp by using a gas.

The present invention provides a heater block, a heat treatment apparatus, and a method that can prevent gas from being injected directly into a lamp and a substrate.

The present invention provides a heater block, a heat treatment apparatus, and a method capable of evenly forming a gas flow and a heat transfer flow between a reflector and a substrate.

Heater block according to an embodiment of the present invention, the lamp extending in one direction; A housing formed to receive the lamp; An accommodating part mounted on one surface of the housing and having a concave part to accommodate the lamp; And a pollution prevention part installed in the accommodation part to generate a gas flow in the space between the lamp and the accommodation part.

The contamination prevention unit may include: a guide member at least partially positioned between the lamp and the accommodation unit and configured to move gas in one direction; Injection means connected to the guide member so as to inject the gas into the concave portion facing the lamp; And a gas supply source connected to the guide member.

The guide member may extend in one direction, and a flow path through which the gas may pass may be formed therein.

The guide member may be formed to surround an outer side of the lamp, extend in one direction along an outer circumferential surface of the lamp, and may form a flow path through which the gas may pass between the outer circumferential surface and spaced apart from the outer circumferential surface. .

The guide member may include a material capable of transmitting light.

The injection means may include injection holes penetrating the guide member, communicating with the flow path, and arranged in one direction.

The injection holes may face a central portion of the recess.

The injection holes may be spaced apart from each other to cross in one direction to form a plurality of arrays, and the plurality of arrays may be equally spaced apart from both sides of the central axis in one direction of the lamp.

The inner angle between the center point of the guide member and the connection lines connecting the injection holes on the cross section of the guide member may be within 180 °.

The injection holes may be equally spaced apart in one direction, and may have different diameters depending on a distance from an upstream side of the flow path.

The injection holes are formed to have the same diameter, and the spacing may be different from each other depending on the distance from the upstream of the flow path.

The plurality of lamps are provided, arranged in the other direction to form a heat source in the form of a plate, the receiving portion is provided with a plurality of accommodating each lamp, the plurality of guide members are provided to face each of the receiving portion, the injection Means may be provided in each guide member.

A heat treatment apparatus according to an embodiment of the present invention includes a chamber in which a space capable of processing a substrate is formed; A substrate support disposed inside the chamber; And a heater block facing the substrate support part and mounted to one side of the chamber, wherein the heater block includes a lamp extending in one direction on one surface facing the substrate support part, an accommodating part accommodating the lamp, and It is provided with a pollution prevention unit for preventing contamination of the surface facing the lamp of the housing.

The accommodating portion has a concave portion for accommodating the lamp, the concave portion is exposed to the interior of the chamber, and the contamination prevention portion is configured to allow gas flow to a space between the lamp and the concave surface of the concave portion facing the lamp. It can be formed to produce.

The pollution prevention unit may include a guide member having a hollow tube structure extending in one direction and accommodating the lamp therein, and having an inner circumferential surface spaced apart from an outer circumferential surface of the lamp; Injection holes penetrating the guide member to inject gas into the concave surface and arranged in one direction on the guide member; And a gas supply source connected to the guide member, wherein the guide member may include a material capable of transmitting light.

The injection holes are opposed to the center of the concave surface or spaced apart in other directions crossing one direction to form a plurality of arrangements on the guide member, symmetrical to one direction central axis of the guide member, and a rear surface of the guide member. It can be located on the side.

The injection holes may be equally spaced apart in one direction and formed in different diameters, or may be formed in the same diameter and have different distances from each other in one direction.

A heat treatment method according to an embodiment of the present invention includes a method of heat treating a substrate using a lamp disposed to face the substrate, the method comprising: generating light using the lamp; Concentrating the light on the substrate using a concave surface disposed on a rear surface of the lamp; And generating a gas flow in a space between the lamp and the concave surface to prevent contamination of the concave surface.

The preventing of the contamination may include moving the gas in a direction in which the lamp extends along an outer circumferential surface of the lamp through a guide member disposed outside the lamp; Injecting the gas into the concave surface by using injection holes arranged on the guide member in a direction in which the lamp extends; And protecting the concave surface with the gas.

The preventing of the contamination may include supplying the gas to the substrate while refracting the gas flow toward the substrate using the concave surface.

The light passes through the guide member and is radiated to the substrate and the concave surface, the injection holes uniformly inject the gas to the concave surface, the gas includes an inert gas, and the lamp extends in a direction in which the lamp extends. It can be heated in contact with and heat exchanged with the lamp during movement.

According to an embodiment of the present invention, while the gas is moved along the outer circumferential surface of the lamp in a direction in which the lamp is extended, the gas is injected into the reflector at a plurality of positions on the outer circumferential surface of the lamp to form a protective film layer of gas in the space between the lamp and the reflector. can do. Thus, foreign matters may be prevented from flowing between the reflector and the lamp, and contamination of the reflector by the foreign matter may be minimized.

Further, according to the embodiment of the present invention, after the gas is brought into contact with the lamp to increase the temperature, the gas is refracted by the reflector using the reflector while spraying the gas with the reflector to form and maintain the protective film layer. Gas can be supplied to the substrate. As a result, the gas may be prevented from being directly injected to the lamp and the substrate, the gas flow may be evenly formed between the reflector and the substrate, and the heat transfer flow through the gas may be evenly formed.

Therefore, during the heat treatment process of the substrate, it is possible to prevent the thermal efficiency from decreasing and to precisely control the temperature. Therefore, since the defect of the heat-treated substrate can be reduced and the quality can be improved, the reliability of the heat treatment process of the substrate can be improved.

1 is a schematic view of a heat treatment apparatus according to an embodiment of the present invention.
2 is a schematic view of a heater block according to an embodiment of the present invention.
3 is a front sectional view of a heater block according to an embodiment of the present invention.
4 is a side cross-sectional view of a heater block according to an exemplary embodiment of the present invention.
5 is a partially enlarged view of a contamination prevention unit according to an exemplary embodiment of the present invention.
6 is a partially enlarged view of a contamination prevention unit according to a modification of the present invention.
7 is a process chart of the heat treatment apparatus according to an embodiment of the present invention.
8 is a graph illustrating a gas flow between a lamp and a reflector during a heat treatment process of a substrate according to an exemplary embodiment of the present disclosure.
9 is a graph showing a gas injection flow rate for each gas supply flow rate of the pollution prevention unit according to a modification of the present invention.
10 is a graph illustrating a gas injection flow rate for each gas supply flow rate of the pollution prevention unit according to an exemplary embodiment of the present invention.

Hereinafter, with reference to the accompanying drawings, it will be described an embodiment of the present invention; However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms. Only embodiments of the present invention are provided to complete the disclosure of the present invention and to fully inform those skilled in the art the scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS The drawings may be exaggerated to illustrate embodiments of the invention, and like reference numerals designate like elements in the drawings.

1 is a schematic view of a heat treatment apparatus according to an embodiment of the present invention, Figure 2 is a schematic diagram of a heater block according to an embodiment of the present invention. 1 and 2 will be described in detail the heat treatment apparatus according to an embodiment of the present invention.

In the heat treatment apparatus according to an embodiment of the present invention, a chamber 200 in which a space capable of processing the substrate S is formed, a substrate support 300 disposed in the chamber 200, and a substrate support 300 ) And a heater block 100 mounted on one side of the chamber 200 facing the.

Substrate S comprises a large area glass substrate that can be used, for example, in the manufacture of display devices, and may be rectangular in shape. Of course, the substrate S may include a substrate applied to a process for manufacturing various electronic devices such as a semiconductor chip and a solar cell, in addition to a large glass substrate, and the shape of the substrate S may also vary.

The chamber 200 may be formed in a rectangular cylinder shape, and a space capable of processing the substrate S may be formed therein. Of course, the shape of the chamber 200 may vary depending on the shape of the substrate (S). For example, the chamber 200 may be cylindrical. The chamber 200 may have an opening formed thereon. The opening may have a rectangular shape, for example, corresponding to the shape of the substrate S. The chamber 200 may further include a gate (not shown) and a vacuum pump (not shown).

The substrate support part 300 may be formed to support the substrate S and may be disposed on a bottom surface of the inside of the chamber 200. For example, the substrate support part 300 may be located under the chamber 200. The substrate support part 300 may be provided with a lift pin on an upper surface thereof. The substrate S may be seated on the lift pins. The substrate support part 300 may include an edge ring (not shown), and may seat the substrate S thereon.

The heater block 100 may be installed by sealing the opening of the chamber 200. Accordingly, the substrate support part 300 and the heater block 300 may be disposed to face each other in the vertical direction Z. At this time, the arrangement facing each other is referred to as the opposite arrangement.

The heater block 100 may generate light and provide the light to the substrate S, and heat the substrate S by using the light. For example, the heater block 100 may be used as a heat source of a rapid heat treatment apparatus for performing a process of heat treating the substrate (S).

One surface of the heater block 100 may face the substrate support part 300. Here, one surface of the heater block 100 may be, for example, a lower surface. The heater block 100 has a lamp L extending in one direction X on one surface, an accommodating part 120 accommodating the lamp L, and a surface facing the lamp L of the accommodating part 120. It may be provided with a pollution prevention part to prevent contamination.

One direction X is referred to as a front-rear direction, the vertical direction Z is referred to as a height direction, and the other direction Y, which is a direction intersecting both the one direction X and the vertical direction Z, may be referred to as a left-right direction. It may be.

The accommodating part 120 may include a concave part to accommodate the lamp L. FIG. The concave portion may be formed concave based on one surface of the heater block 100 to accommodate the lamp (L). The concave portion may include a concave groove 121 and a concave surface 122. Concave groove 121 is formed in the lower portion of the receiving portion 120, it may be formed concave upward. The lamp L may be located in the concave groove 121. The concave surface 122, which is an inner surface of the concave portion, may face the lamp L.

At least one lamp L may be provided. When there are a plurality of lamps L, the lamps L may be arranged in the other direction Y and form a plate-shaped heat source. In addition, when there are a plurality of lamps L, a plurality of accommodating parts 120 may be provided, and each lamp L may be accommodated in each accommodating part 120.

Of course, the number of lamps L and the number of housing portions 120 are not particularly limited. The number of lamps L and the number of accommodating parts 120 may vary. For example, the heater block 100 may include one lamp L and one housing 120.

One surface of the heater block 100 is exposed to the inside of the chamber 200, and the recessed groove 121 and the recessed surface 122 are also exposed to the inside of the chamber 200, and the lamp L is also exposed to the interior of the chamber 200. May be exposed internally.

Therefore, in order to prevent the concave surface 122, which is an inner circumferential surface of the concave groove 121, from being contaminated by foreign matters, the heater block 100 may flow a gas into a space between the lamps L and the accommodating part 120. It may be provided with a pollution prevention unit is installed in the receiving unit 120 to generate a.

That is, the pollution prevention unit may generate a gas flow in the space between the lamp L and the concave surface 122, and may use this to prevent contamination of the concave surface 122.

The pollution prevention part extends in one direction X, accommodates the lamp L therein, and has an inner circumferential surface spaced apart from the outer circumferential surface of the lamp L, and includes a guide member 130 having a hollow tube structure including a light transmissive material, Jet holes penetrating the guide member 130 to inject the gas into the concave surface 122, the injection holes arranged in one direction X on the guide member 130, and a gas supply source connected to the guide member 130. 160 may be included.

3 is a front sectional view of a heater block according to an embodiment of the present invention, Figure 4 is a side sectional view of a heater block according to an embodiment of the present invention. 5 is a partially enlarged view of a contamination prevention unit according to an exemplary embodiment of the present invention, and FIG. 6 is a partially enlarged view of a pollution prevention unit according to a modified example of the present invention. 7 is a process chart of the heat treatment apparatus according to an embodiment of the present invention.

Hereinafter, the heater block 100 according to an exemplary embodiment of the present invention will be described with reference to FIGS. 1 to 7. Heater block 100 according to an embodiment of the present invention, the lamp (L) extending in one direction (Z), the housing 110 is formed so as to accommodate the lamp (L), one surface of the housing 110 It is mounted, and provided in the housing 120 having a concave portion for accommodating the lamp (L), to generate a gas flow in the space between the lamp (L) and the housing 120 (120) And a pollution prevention unit.

The lamp L may include a linear lamp formed in the form of a tube. The lamp L may include a quartz material. The lamp L may have a light emitter disposed therein, and both ends thereof may be sealed by an electrode. Light emitters include various configurations for generating electromagnetic waves of various wavelengths, and may include, for example, filaments. The light emitter may be connected to an electrode, and radiate light in at least one of infrared, visible and ultraviolet rays to provide radiant heat to the substrate S. FIG. The lamp L may be accommodated in the accommodating part 120, may be disposed in one direction X, and may be exposed to an outer side of the surface of the housing 110, for example, a lower side thereof.

The housing 110 is formed with an area that can accommodate the lamp L. The housing 110 may include a main body 111 and a lid 112. The main body 111 may be formed in, for example, a rectangular cylinder shape, an opening may be provided at an upper portion thereof, and an inside thereof may be opened through the opening. The lead 112 may be formed, for example, in a rectangular plate shape, may be mounted in the opening of the main body 111, and may seal the opening of the main body 111. Shapes of the main body 111 and the lid 112 may vary depending on the shape of the chamber 200.

In order to support the lamp L, the lamp sockets 140 may be mounted through the main body 111 in one direction X. The lamp socket 140 may be positioned at both ends of the lamp L, respectively, and may be connected to electrodes at both ends of the lamp L at respective positions, and may support the lamp L. FIG. The external power source 150 may be electrically connected to electrodes at both ends of the lamp L through the lamp socket 140.

The accommodating part 120 may be disposed inside the housing 110 and may be mounted on one surface of the housing 110. The accommodating part 120 may extend in one direction X to accommodate the lamp L. FIG. In addition, the accommodating part 120 may be formed to be concave to an upper side of the housing 110, for example, to the inside of the housing 110 based on one surface of the housing 110 to accommodate the lamp L, and the cross section may have an arch shape. have. That is, the accommodating part 120 may have a concave groove 121 concave upward in order to accommodate the lamp L at the bottom thereof. The recessed groove 121 may accommodate the lamp L, and the recessed surface 122, which is an inner circumferential surface of the recessed groove 121, may face the rear surface of the lamp L. Here, the lower region of the outer circumferential surface facing the substrate support part 300 in the entire outer circumferential surface area of the lamp L is referred to as the front of the lamp L, and the upper region, which is the remainder of the outer circumferential surface other than this, is referred to as the rear surface of the lamp L.

The concave surface 122 may include a reflector. The reflector may refrac the light toward the substrate support 300, and may concentrate the light onto the substrate S seated on the substrate support 300. The reflector may be formed integrally with the concave surface 122 or may be provided as a separate member to be detachably attached to the concave surface 122. The specific curved shape and material of the reflector for refraction and concentration of light are not particularly limited.

The receiving part 120 may have a protrusion formed at an upper side thereof, and the protrusion may extend in one direction (X). The protrusion may be supported by the cover 112.

Meanwhile, a coolant passage may be formed in a space between the main body 111, the lead 112, and the accommodating part 120. The refrigerant passage may be connected to refrigerant pipes (not shown). The refrigerant pipes may supply the refrigerant to the refrigerant passage and recover the refrigerant from the refrigerant passage. The coolant may flow along the coolant passage and contact the accommodating part 120, and may cool the temperature of the accommodating part 120 to a temperature below the heat resistance characteristic of the accommodating part 120. The refrigerant may for example comprise water.

The pollution prevention part may be installed in the accommodating part 120 to generate a gas flow in the space between the lamp L and the accommodating part 120. At least a portion of the pollution prevention part is located between the lamp L and the storage part 120, and the guide part 130 and the storage part facing the lamp L are formed to move the gas in one direction X. It may include the injection means connected to the guide member 130 and the gas supply source 160 connected to the guide member 130 to inject a gas to the concave surface 122 of the (120).

The guide member 130 may be at least partially positioned between the lamp L and the concave surface 122, and may be formed to move the gas in one direction X. The guide member 130 is disposed in the concave groove 121, extends in one direction X, and a flow path may be formed therein to allow gas to pass therethrough. In addition, the guide member L may include a material capable of transmitting light. For example, the guide member L may include a quartz material.

The guide member 130 corresponds to the shape of the lamp L and may include, for example, a linear member formed in the form of a tube. The guide member 130 may also be referred to as a quartz gas tube.

In particular, the guide member 130 is formed to surround the outside of the lamp (L), extend in one direction (X) along the outer peripheral surface of the lamp (L), spaced apart from the outer peripheral surface of the lamp (L), the lamp (L) A flow path through which gas can pass can be formed between the outer circumferential surface of the "

As such, the guide member 130 may have a hollow tube structure and accommodate the lamp L therein. The inner circumferential surface of the guide member 130 may be spaced apart from the outer circumferential surface of the lamp (L). Therefore, it is not necessary to secure an additional space for installing the guide member 130 in the accommodating part 120, and a space given in the accommodating part 120 without structural change of the accommodating part 120 and the lamp L is not required. By utilizing the guide member 130 can be configured smoothly. Therefore, the fall of light intensity and illumination intensity distribution can be prevented. Of course, the guide member 130 may be disposed separately in the space between the lamp (L) and the concave surface 122, in this case, the lamp (L) may be disposed outside the guide member 130.

The injection means may be connected to the guide member 130 to inject gas into the concave surface 122. For example, the injection means may include injection holes h passing through the guide member 130, communicating with the flow path, and arranged in one direction X. Of course, the injection means is configured in the form of a separate nozzle or injection tube, it may be mounted on the guide member 130 may be connected to the flow path. That is, the injection means may have various configurations that satisfy the ability to directly inject the gas in the guide member 130 to the concave surface 122.

Referring to FIG. 5, the injection holes h may be spaced apart from each other in order to form a plurality of arrangements, and the plurality of arrangements of the injection holes h may be formed in one direction central axis of the lamp L (not shown). It may be spaced at the same distance on both sides of). That is, the injection holes h may form a plurality of arrangements in one direction X on the rear surface of the guide member 130, and each arrangement may be formed at the center of the rear surface of the guide member 130, for example, at the peak region of the rear surface. Spaced at equal intervals. At this time, the array consisting of the injection holes (h) may be configured in an even number. On the other hand, for example, when the arrangement is an odd number, one arrangement may be arranged in one direction X in the peak region of the rear surface of the guide member 130. At this time, the inner angle θ between the connecting lines connecting the injection holes h forming the outermost arrays in the center direction and the other direction Y on the cross section of the guide member 130 is 180 °. It can be within. That is, the injection holes h may be spaced apart from the front surface of the guide member 130 and arranged on the rear surface.

Alternatively, referring to FIG. 6, the injection holes h may be arranged to face the central portion of the concave surface 122 while forming one direction. That is, the injection holes h may be arranged in one direction X in the peak region, which is the center of the rear surface of the guide member 130, so as to face the center of the concave surface 122.

By the arrangement of the injection holes h, the flow of gas refracted in the concave surface 122 toward the substrate support 300 may be uniformly formed in the other direction (Y). That is, according to the above-described arrangement of the injection holes h, the gas flow flowing in the concave groove 121 toward the substrate support 300 toward the lower side of the concave surface 122 may be uniform in the other direction (Y). .

In addition, according to the arrangement of the injection holes h, the gas does not flow directly toward the substrate support 300, the gas is first injected toward the concave surface 122 and then refracted to the concave surface 122 to support the substrate support 300. Can be guided to the side. Therefore, the lamp L and the substrate S can be prevented from being damaged by the injection pressure of the gas. Therefore, the gas is supplied at a sufficient injection pressure to cover the concave surface 122 with the gas and protect it from foreign matter. Can be sprayed smoothly.

The injection holes h form a gas flow toward the concave surface 122, and the gas injected into the concave surface 122 forms a gas passivation layer on the concave surface 122 to clean the concave surface 122. I can protect it. Thereafter, the gas may be sealed downward while sealing a narrow gap between the lamp L and the concave surface 122 to prevent foreign substances from flowing into the central portion of the concave surface 122. In particular, since the gas flow is formed to the lower side of the lamp (L), it is possible to block the inflow of foreign matters.

The guide member 130 and the injection holes h may be collectively referred to as a shower tube.

According to the embodiment of the present invention, since the shower tube is adopted as a structure for forming a gas flow in the concave groove 121, for example, the concave surface 122 does not have to be separately provided with injection holes. Thus, the parabolic shape of the concave surface 122, for example, the reflector, can be maintained in a circular shape, and the light can be evenly refracted toward the substrate support 300 without loss of radiation, reflection, and refraction. That is, the shower tube may be used to form a gas flow in the concave groove 121 without structural deformation and damage of the reflector.

On the other hand, since the heater block according to the embodiment of the present invention is used for heat treatment of the substrate, the gas distribution in one direction X is also important.

8 is a graph illustrating a gas flow between a lamp and a reflector during a heat treatment process of a substrate according to an exemplary embodiment of the present invention, and FIG. 9 is a flow velocity of gas for each gas supply flow rate of a pollution prevention unit according to a modified example of the present invention. 10 is a graph showing the injection flow rate of gas for each gas supply flow rate of the pollution prevention unit according to an exemplary embodiment of the present invention.

8 to 10, the diameter of each position in one direction X of the injection holes h will be described.

Model a heater block according to an embodiment of the present invention using a commercial program capable of simulating fluid flow, and inject gas at various flow rates into the guide member by varying the diameter, arrangement, and number of injection holes from the injection holes. The flow rate of the injected gas was analyzed by computer.

The numerical values set forth below are one example for describing the embodiments of the present invention, and are not intended to limit the embodiments of the present invention.

8 is a result of modeling the length of one direction of the guide member to 118.55 cm, modeling the number of one direction of the injection hole to 17, and analyzing the flow velocity for each position of the guide member. The analysis result of FIG. 8 is a result in which the change in diameter is not taken into consideration so that the flow velocity of each position of the injection holes is uniform.

Subsequently, when looking at the analysis result of FIG. 9A, the injection holes are configured in one array, the number of injection holes is 17, the spacing between injection holes is 70 mm, and the flow rate of the gas supplied to the guide member. 3 l / min, 5 l / min, 10 l / min, 20 l / min, 30 l / min, 40 l / min, 50 l / min, 60 l / min, 70 l / min, 80 l / min, 90 l / min and 100 l / min, respectively. While varying, the flow rate values measured in the injection holes are shown as A-L lines. At this time, the diameter of the injection hole was 1.1 mm.

(B) of FIG. 9, in the analysis conditions of FIG. 9 (a), after changing the diameter of the injection holes to 1.0 mm, changing the number to 20, and changing the pitch, that is, the interval between the injection holes to 60 mm, the analysis Is the result of

(A) and (b) of FIG. 10 show the results of analyzing each of the injection holes after changing the arrangement of the injection holes to two in the analysis conditions of FIGS. At this time, the left injection holes forming one arrangement and the right injection holes forming the other arrangement were interpreted to have the same flow rate for each position in one direction.

9 and 10, it can be seen that the flow velocity is uniformly formed in the injection holes. That is, when the relationship between the length of the guide member and the diameter of the injection holes is properly adjusted as described above, it can be seen that gas can be injected at the uniform speed in the injection holes.

Of course, in addition to the above-described method, it is possible to uniformly control the flow rate of the gas injected from the injection holes in each direction in one direction.

Hereinafter, the heater block 100 according to an exemplary embodiment of the present invention will be described with reference to FIGS. 1 to 7.

For example, the injection holes h are equally spaced apart in one direction X and have a diameter different according to a distance from an upstream of the flow path, so that the flow velocity of the gas injected in the injection holes h is changed in one direction X. Can be uniformly controlled. Alternatively, by forming the injection holes (h) of the same diameter, and by forming a distance between the injection holes (h) according to the distance from the upstream of the flow path, the flow rate of the gas injected from the injection holes (h) by one The direction X can be controlled uniformly. In addition, the method of uniformly controlling the flow rate of the gas injected from the injection holes for each position in one direction may vary.

Here, the upstream is the portion through which the gas passes first, and the downstream is the portion through which the gas passes later.

The gas source 160 may be connected to the guide member 130 through the lamp socket 140. The gas source 160 may be connected to both ends of the guide member 130, supply an inert gas such as argon gas or nitrogen gas to one end of the guide member 130, and inert at the other end of the guide member 130. Gas can be recovered. Thus, the gas may flow in the direction X in the guide member 130. It may be injected to the concave surface 122 through the respective injection holes (h).

In the above, the structure of the heater block 100 has been described based on one lamp L, but a plurality of lamps L may be provided and arranged in the other direction Y to form a heat source having a plate shape. That is, the number of lamps L may vary. For example, the number of lamps L may be at least one, and may be linearly arranged on one surface of the heater block 100.

When a plurality of lamps L are provided in the heater block 100, a plurality of accommodating parts 120 may be provided to accommodate each lamp L, and a plurality of guide members 130 may be provided to each accommodating part. Opposite 120, each lamp L may be received therein, and each inner circumferential surface may be spaced apart from an outer circumferential surface of each lamp L. As shown in FIG. The gas source 160 may be connected in parallel to the guide members 130. Of course, a plurality of gas sources 160 may be provided and connected to each guide member 130 in series.

In addition, the injection means may be provided in each guide member 130. That is, the injection holes h penetrate each guide member 130 to inject gas into the concave surface 122 facing the lamps L, and in one direction X on each guide member 130. ) Can be arranged. At this time, the injection holes (h) are opposed to the center of the concave surface 122, or spaced apart in the other direction (Y) to form a plurality of arrangement on the guide member 130, the central axis in one direction of the guide member 130 ( It may be symmetrical to (not shown) and located on the back of the guide member 130.

In addition, the injection holes h may be spaced apart at equal intervals in one direction X and have different diameters, or may be formed at the same diameter and have different intervals in one direction.

Hereinafter, a heat treatment method according to an embodiment of the present invention will be described. In this case, a description overlapping with the above description will be omitted. Heat treatment method according to an embodiment of the present invention, a method of heat-treating the substrate using a lamp disposed to face the substrate, the process of generating light using the lamp (L), disposed on the back of the lamp (L) Concentrating light on the substrate S using the concave surface 122, and generating a gas flow in the space between the lamp L and the concave surface 122 to prevent contamination of the concave surface 122. Include.

If the concave surface 122 is contaminated by foreign matter while generating light from the lamp L and concentrating the light on the substrate S using the concave surface 122 to heat-treat the substrate S, the concave surface Thermal efficiency of 122 may be lowered.

Therefore, a gas flow is generated in the space between the lamp L and the concave surface 122 by using the contamination prevention part during heat treatment of the substrate S to prevent contamination of the concave surface 122.

Specifically, the gas moves in the direction in which the lamp L extends along the outer circumferential surface of the lamp L through the guide member 130 disposed outside the lamp L. As shown in FIG. At this time, the gas includes an inert gas. In addition, the gas may be heated in contact with and heat exchange with the lamp while the lamp L moves in the extended direction.

Subsequently, the gas is sprayed onto the concave surface 122 using the injection holes h arranged on the guide member 130 in the direction in which the lamp L extends, and the concave surface 122 is protected by the gas. At this time, the gas is uniformly sprayed on the concave surface 122 in one direction and the other direction. Then, the gas flow is refracted to the substrate S side using the concave surface 122, and the gas heated up is supplied to the substrate S.

This process may be carried out simultaneously or together, or may be performed sequentially in any order. On the other hand, while preventing the contamination of the concave surface 122 using a gas, the light may pass through the guide member 130, it may be smoothly emitted to the substrate (S) and the concave surface (122). Subsequently, when the heat treatment of the substrate S is completed, the supply of gas is stopped, the substrate S is replaced, and the next heat treatment of the substrate S is performed.

According to the embodiment of the present invention, it is possible to prevent the contamination of the concave surface, that is, the reflector, and to maintain the thermal efficiency of the process. In addition, the temperature of the substrate S can be more uniformly controlled using gas. That is, the pollution prevention unit may use the gas in various ways for two purposes: pollution prevention of the reflector and temperature control of the substrate S. FIG.

The above embodiment of the present invention is for the description of the present invention, not for the limitation of the present invention. It is to be noted that the configurations and manners disclosed in the above embodiments of the present invention will be modified in various forms by combining or crossing each other, and such modifications can be regarded as the scope of the present invention. That is, the present invention will be implemented in various different forms within the scope of the appended claims and equivalent technical ideas, and various embodiments of the present invention may be made by those skilled in the art to which the present invention pertains. You will understand.

100: heater block 110: housing
120: storage part L: lamp
130: guide member h: injection hole
140: lamp socket 150: power supply
160: gas source 200: chamber
300: substrate support S: substrate

Claims (21)

A lamp extending in one direction;
A housing formed to receive the lamp;
An accommodating part mounted on one surface of the housing and having a concave part to accommodate the lamp; And
And a pollution prevention part installed in the accommodation part to generate a gas flow in the space between the lamp and the accommodation part. The method according to claim 1,
The pollution prevention unit,
A guide member at least partially positioned between the lamp and the housing and configured to move gas in one direction;
Injection means connected to the guide member so as to inject the gas into the concave portion facing the lamp; And
And a gas supply source connected to the guide member. The method according to claim 2,
The guide member extends in one direction, and a heater block is formed therein that allows the gas to pass through. The method according to claim 2,
The guide member is formed to surround the outside of the lamp, the heater block extends in one direction along the outer circumferential surface of the lamp, spaced apart from the outer circumferential surface to form a flow path for passing the gas between the outer circumferential surface . The method according to any one of claims 2 to 4,
The guide member is a heater block comprising a material capable of transmitting light. The method according to claim 3 or 4,
The injection means is a heater block penetrating the guide member, the communication block and the injection hole which is arranged in one direction arranged in one direction. The method according to claim 6,
The heater block is the heater block facing the central portion of the recess. The method according to claim 6,
The injection holes are spaced apart from each other to cross in one direction to form a plurality of arrangement,
The plurality of arrays are heater blocks spaced apart by the same distance on both sides of the central axis in one direction of the lamp. The method according to claim 8,
The heater block on the cross-section of the guide member between the center point of the guide member and the connecting lines connecting the injection holes, respectively, is within 180 °. The method according to claim 6,
The injection holes are equally spaced apart in one direction, the heater block having a different diameter depending on the distance from the upstream of the flow path. The method according to claim 6,
The heater holes are formed of the same diameter, the heater block different from each other according to the distance from the upstream of the flow path. The method according to claim 2,
The lamp is provided with a plurality, arranged in the other direction to form a heat source in the form of a plate,
The accommodating part is provided with a plurality of accommodating each lamp,
The guide member is provided with a plurality of opposing each receiving portion,
The heater block is provided in each guide member. A chamber in which a space capable of processing a substrate is formed;
A substrate support disposed inside the chamber; And
And a heater block facing the substrate support and mounted to one side of the chamber.
The heater block is on one surface facing the substrate support,
And a contamination prevention unit for preventing contamination of a lamp extending in one direction, an accommodating part accommodating the lamp, and a surface facing the lamp of the accommodating part. The method according to claim 13,
The accommodating portion has a concave portion to accommodate the lamp, the concave portion is exposed to the interior of the chamber,
And the pollution prevention unit is configured to generate a gas flow in a space between the lamp and the concave surface of the recess facing the lamp. The method according to claim 14,
The pollution prevention unit,
A guide member having a hollow tube structure extending in one direction and accommodating the lamp therein and having an inner circumferential surface spaced apart from an outer circumferential surface of the lamp;
Injection holes penetrating the guide member to inject gas into the concave surface and arranged in one direction on the guide member; And
A gas source connected to the guide member;
The guide member is a heat treatment apparatus comprising a material capable of transmitting light. The method according to claim 15,
The injection holes are opposed to the center of the concave surface or spaced apart in other directions crossing one direction to form a plurality of arrangements on the guide member, symmetrical to one direction central axis of the guide member, and a rear surface of the guide member. Heat treatment device located on the side. The method according to claim 15,
The injection holes are spaced apart in the same direction in one direction and formed with different diameters, or formed with the same diameter and the heat treatment apparatus different from each other in one direction. A method of heat treating a substrate using a lamp disposed to face the substrate,
Generating light using the lamp;
Concentrating the light on the substrate using a concave surface disposed on a rear surface of the lamp; And
Generating a gas flow in a space between the lamp and the concave surface to prevent contamination of the concave surface. The method according to claim 18,
The process of preventing the contamination,
Moving a gas in a direction in which the lamp extends along an outer circumferential surface of the lamp through a guide member disposed outside the lamp;
Injecting the gas into the concave surface by using injection holes arranged on the guide member in a direction in which the lamp extends;
And protecting the concave surface with the gas. The method according to claim 19,
The process of preventing the contamination,
Refracting the gas flow toward the substrate using the concave surface and supplying the gas to the substrate. The method according to claim 19,
The light is transmitted through the guide member and radiated to the substrate and the concave surface,
The injection holes uniformly inject the gas to the concave surface,
The gas comprises an inert gas and is heated in contact with and heat exchanged with the lamp while the lamp is moving in an extended direction.

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